TW202325471A - Method for manufacturing glass plate - Google Patents
Method for manufacturing glass plate Download PDFInfo
- Publication number
- TW202325471A TW202325471A TW111142881A TW111142881A TW202325471A TW 202325471 A TW202325471 A TW 202325471A TW 111142881 A TW111142881 A TW 111142881A TW 111142881 A TW111142881 A TW 111142881A TW 202325471 A TW202325471 A TW 202325471A
- Authority
- TW
- Taiwan
- Prior art keywords
- grinding
- glass plate
- grinding stone
- stone
- nozzle
- Prior art date
Links
Images
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B55/00—Safety devices for grinding or polishing machines; Accessories fitted to grinding or polishing machines for keeping tools or parts of the machine in good working condition
- B24B55/02—Equipment for cooling the grinding surfaces, e.g. devices for feeding coolant
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B7/00—Machines or devices designed for grinding plane surfaces on work, including polishing plane glass surfaces; Accessories therefor
- B24B7/20—Machines or devices designed for grinding plane surfaces on work, including polishing plane glass surfaces; Accessories therefor characterised by a special design with respect to properties of the material of non-metallic articles to be ground
- B24B7/22—Machines or devices designed for grinding plane surfaces on work, including polishing plane glass surfaces; Accessories therefor characterised by a special design with respect to properties of the material of non-metallic articles to be ground for grinding inorganic material, e.g. stone, ceramics, porcelain
- B24B7/24—Machines or devices designed for grinding plane surfaces on work, including polishing plane glass surfaces; Accessories therefor characterised by a special design with respect to properties of the material of non-metallic articles to be ground for grinding inorganic material, e.g. stone, ceramics, porcelain for grinding or polishing glass
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B9/00—Machines or devices designed for grinding edges or bevels on work or for removing burrs; Accessories therefor
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B9/00—Machines or devices designed for grinding edges or bevels on work or for removing burrs; Accessories therefor
- B24B9/02—Machines or devices designed for grinding edges or bevels on work or for removing burrs; Accessories therefor characterised by a special design with respect to properties of materials specific to articles to be ground
- B24B9/06—Machines or devices designed for grinding edges or bevels on work or for removing burrs; Accessories therefor characterised by a special design with respect to properties of materials specific to articles to be ground of non-metallic inorganic material, e.g. stone, ceramics, porcelain
- B24B9/08—Machines or devices designed for grinding edges or bevels on work or for removing burrs; Accessories therefor characterised by a special design with respect to properties of materials specific to articles to be ground of non-metallic inorganic material, e.g. stone, ceramics, porcelain of glass
- B24B9/10—Machines or devices designed for grinding edges or bevels on work or for removing burrs; Accessories therefor characterised by a special design with respect to properties of materials specific to articles to be ground of non-metallic inorganic material, e.g. stone, ceramics, porcelain of glass of plate glass
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C19/00—Surface treatment of glass, not in the form of fibres or filaments, by mechanical means
Landscapes
- Engineering & Computer Science (AREA)
- Mechanical Engineering (AREA)
- Chemical & Material Sciences (AREA)
- Ceramic Engineering (AREA)
- Inorganic Chemistry (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Life Sciences & Earth Sciences (AREA)
- General Chemical & Material Sciences (AREA)
- Geochemistry & Mineralogy (AREA)
- Materials Engineering (AREA)
- Organic Chemistry (AREA)
- Grinding And Polishing Of Tertiary Curved Surfaces And Surfaces With Complex Shapes (AREA)
- Grinding Of Cylindrical And Plane Surfaces (AREA)
- Grinding-Machine Dressing And Accessory Apparatuses (AREA)
- Surface Treatment Of Glass (AREA)
Abstract
Description
本揭示是有關於一種玻璃板的製造方法。The disclosure relates to a method for manufacturing a glass plate.
玻璃板的製造步驟中包含利用研削磨石對玻璃板的端面進行加工的研削步驟、以及利用研磨磨石對藉由研削磨石加工後的端面進行加工的研磨步驟的情況為慣例(參照專利文獻1)。於研削步驟中,對玻璃板的端面進行研削來實施倒角加工,於研磨步驟中,進行使端面光滑的精加工。 [現有技術文獻] [專利文獻] It is common practice to include a grinding step of processing the end face of the glass plate with a grinding stone and a grinding step of processing the end face processed by the grinding stone with the grinding stone in the manufacturing steps of the glass plate (see Patent Document 1). In the grinding step, the end surface of the glass plate is ground and chamfered, and in the grinding step, finishing processing for smoothing the end surface is performed. [Prior art literature] [Patent Document]
專利文獻1:日本專利特開2016-40073號公報Patent Document 1: Japanese Patent Laid-Open No. 2016-40073
[發明所欲解決之課題] 然而,於研磨步驟的執行過程中存在容易於端面形成龜裂而導致端面的強度降低的問題。 [Problem to be Solved by the Invention] However, there is a problem that cracks are easily formed on the end surface during the grinding step, resulting in a decrease in the strength of the end surface.
作為如所述那樣的於研磨步驟的執行過程中容易於端面形成龜裂的原因,可例舉以下的(1)~(3)。(1)研磨磨石與研削磨石相比,研磨粒細,因此水不易進入磨石與端面之間。(2)研磨磨石必須比研削磨石更用力地壓抵於端面,並且研磨粒的數量比研削磨石多,因此對磨石旋轉的阻力容易增大。(3)研磨磨石與研削磨石不同,多數情況下使用彈性模數小的樹脂黏合劑,因研磨粒的下沉而導致磨石與端面的密接性增大,從而導致水難以進入。The following (1)-(3) can be mentioned as a reason why a crack is easy to be formed in an end surface during execution of a grinding|polishing process as mentioned above. (1) Compared with grinding stones, grinding stones have finer abrasive grains, so water is less likely to enter between the grinding stones and the end face. (2) The grinding stone must be pressed against the end face more strongly than the grinding stone, and the number of abrasive grains is larger than that of the grinding stone, so the resistance to the rotation of the grinding stone tends to increase. (3) Grinding stones are different from grinding stones. In most cases, a resin binder with a small elastic modulus is used. Due to the sinking of the abrasive grains, the adhesion between the grinding stone and the end surface increases, making it difficult for water to enter.
鑒於以上情況而應解決的技術課題是在製造玻璃板時,防止隨著研磨步驟的執行而玻璃板的端面的強度降低。 [解決課題之手段] The technical problem to be solved in view of the above situation is to prevent the strength of the end surface of the glass plate from being lowered as the grinding step is performed during the production of the glass plate. [Means to solve the problem]
用於解決所述課題的玻璃板的製造方法包括:研削步驟,利用研削磨石對玻璃板的端面進行加工;以及研磨步驟,利用研磨磨石對藉由研削磨石加工後的玻璃板的端面進行加工,其特徵在於:於研削步驟及研磨步驟中,對研削磨石及研磨磨石的圓周上的加工部中的至少研磨磨石的加工部進行冷卻,於研削磨石與研磨磨石的比較中,提高了研磨磨石的冷卻效率。A method of manufacturing a glass plate for solving the above-mentioned problems includes: a grinding step of processing the end face of the glass plate with a grinding stone; and a grinding step of processing the end face of the glass plate processed by the grinding stone with the grinding stone Processing, characterized in that: in the grinding step and the grinding step, at least the processed portion of the grinding stone and the processing portion on the circumference of the grinding stone are cooled, and the distance between the grinding stone and the grinding stone is In comparison, the cooling efficiency of the grinding stone is improved.
於本方法中,於研削步驟及研磨步驟中,分別對研削磨石及研磨磨石的圓周上的加工部中的至少研磨磨石的加工部進行冷卻。並且,對研削磨石與研磨磨石進行比較,提高了研磨磨石的冷卻效率。於研磨步驟中,因所述(1)至(3)的原因,容易於研磨磨石產生摩擦熱,因此容易於玻璃板的端面形成龜裂。然而,藉由如上所述那樣提高研磨磨石的加工部的冷卻效率,容易防止經該加工部加工的玻璃板的端面的溫度高出容許範圍。因此,能夠儘可能地避免於執行研磨步驟的過程中於端面形成龜裂。結果,能夠防止隨著研磨步驟的執行而玻璃板的端面的強度降低。In this method, in the grinding step and the polishing step, at least the processed portion of the grinding stone is cooled among the processing portions on the circumference of the grinding stone and the grinding stone. Furthermore, comparing the grinding stone and the grinding stone, the cooling efficiency of the grinding stone is improved. In the grinding step, due to the above-mentioned reasons (1) to (3), frictional heat tends to be generated on the grinding stone, so that cracks tend to be formed on the end surface of the glass plate. However, by improving the cooling efficiency of the processed portion of the grinding stone as described above, it is easy to prevent the temperature of the end surface of the glass plate processed by the processed portion from exceeding the allowable range. Therefore, the formation of cracks on the end surface during the grinding step can be avoided as much as possible. As a result, it is possible to prevent the strength of the end face of the glass plate from being reduced as the grinding step is performed.
於所述方法中,較佳為於研削步驟及研磨步驟中,向研削磨石及研磨磨石的加工部中的至少研磨磨石的加工部供給冷卻介質,於研磨步驟中,相較於研削步驟而言增加冷卻介質的供給量。In the method, preferably, in the grinding step and the grinding step, the cooling medium is supplied to at least the processing portion of the grinding stone among the grinding stone and the processing portion of the grinding stone, and in the grinding step, compared with grinding In terms of steps, increase the supply of cooling medium.
如此,藉由在研磨步驟中,相較於研削步驟而言增加冷卻介質的供給量,能夠進一步提高研磨磨石的加工部的冷卻效率。因此,於防止玻璃板的端面的強度降低的方面變得更有利。In this way, in the grinding step, the cooling efficiency of the processed portion of the grinding stone can be further improved by increasing the supply amount of the cooling medium compared with the grinding step. Therefore, it becomes more advantageous at the point which prevents the intensity|strength reduction of the end surface of a glass plate.
於所述方法中,較佳為使用水作為冷卻介質。In the method, it is preferred to use water as the cooling medium.
如此,藉由使用水作為冷卻介質,能夠簡易且低成本地享受到所述防止端面的強度降低的效果。In this way, by using water as a cooling medium, the effect of preventing the decrease in the strength of the end surface can be enjoyed simply and at low cost.
用於解決所述課題的玻璃板的製造方法包括:研削步驟,利用研削磨石對玻璃板的端面進行加工;以及研磨步驟,利用研磨磨石對藉由研削磨石加工後的玻璃板的端面進行加工,其特徵在於:於研削步驟及研磨步驟中,對研削磨石及研磨磨石的圓周上的加工部中的至少研磨磨石的加工部進行冷卻,於研削磨石與研磨磨石的比較中,使研磨磨石中與玻璃板的端面的接觸點的溫度低於研削磨石中與玻璃板的端面的接觸點的溫度。A method of manufacturing a glass plate for solving the above-mentioned problems includes: a grinding step of processing the end face of the glass plate with a grinding stone; and a grinding step of processing the end face of the glass plate processed by the grinding stone with the grinding stone Processing, characterized in that: in the grinding step and the grinding step, at least the processed portion of the grinding stone and the processing portion on the circumference of the grinding stone are cooled, and the distance between the grinding stone and the grinding stone is In comparison, the temperature of the point of contact with the end surface of the glass plate in the grinding stone was made lower than the temperature of the point of contact with the end surface of the glass plate in the grinding stone.
根據本方法,能夠獲得與針對已述玻璃板的製造方法已經說明過的作用、效果相同的作用、效果。 [發明的效果] According to this method, the same operations and effects as those already described for the above-mentioned manufacturing method of the glass plate can be obtained. [Effect of the invention]
根據本揭示的玻璃板的製造方法,在製造玻璃板時,能夠防止隨著研磨步驟的執行而玻璃板的端面的強度降低。According to the manufacturing method of the glass plate of this disclosure, when manufacturing a glass plate, it can prevent that the intensity|strength of the end surface of a glass plate falls along with execution of a grinding|polishing process.
以下,一邊參照隨附圖式,一邊對實施方式的玻璃板的製造方法進行說明。再者,實施方式的說明所參照的各圖式中所表示的X方向、Y方向、及Z方向是相互正交的方向。Hereinafter, the manufacturing method of the glass plate which concerns on embodiment is demonstrated, referring drawings and drawings. In addition, the X direction, the Y direction, and the Z direction shown in each drawing referred to in description of embodiment are mutually orthogonal directions.
如圖1所示,本製造方法包括:研削步驟P1,利用研削磨石2對玻璃板1的端面1a進行加工;以及研磨步驟P2,利用研磨磨石3對藉由研削磨石2加工後的端面1a進行加工。As shown in Figure 1, the manufacturing method includes: a grinding step P1, using a
於本實施方式中,對呈平放姿勢的矩形的玻璃板1的沿著X方向延伸的兩端面1a、1a執行研削步驟P1及研磨步驟P2。然而並不限定於此,作為本實施方式的變形例,成為執行兩步驟P1、P2的對象的玻璃板1的形狀亦可為矩形以外的形狀。In this embodiment, the grinding process P1 and the grinding|polishing process P2 are performed with respect to both end surfaces 1a, 1a extended along the X direction of the
玻璃板1利用浮式法、溢流下拉法、流孔下拉法、再引曳法等成形方法成形後,被切成規定尺寸。玻璃板1的兩端面1a、1a均成為切斷面。玻璃板1的厚度例如為0.1 mm~10 mm。玻璃板1是成為液晶顯示器或有機電致發光(EL,Electroluminescence)顯示器等所代表的顯示器用的基板的玻璃。當然,玻璃板1除作為顯示器用的玻璃以外,例如亦可為太陽電池或各種照明等所採用的玻璃。The
於本實施方式中,為了對玻璃板1的兩端面1a、1a進行加工,研削磨石2及研磨磨石3分別配置成在Y方向上隔著玻璃板1而成對。成對的研削磨石2彼此及研磨磨石3彼此針對固定於壓盤(省略圖示)上的狀態的玻璃板1,一邊在與X方向平行的T方向上移動,一邊對兩端面1a、1a進行加工。然而並不限定於此,只要使兩磨石2、3與玻璃板1相對移動即可,因此亦可與本實施方式相反,設為將兩磨石2、3固定的狀態,並且使玻璃板1移動,藉此執行兩步驟P1、P2。另外,亦可一邊使兩磨石2、3與玻璃板1雙方移動,一邊執行兩步驟P1、P2。兩磨石2、3的旋轉方向自Z方向觀察時成為逆時針方向。當然,兩磨石2、3的旋轉方向亦可為順時針方向。In this embodiment, in order to process both end surfaces 1a and 1a of the
研削磨石2是用於對玻璃板1的端面1a進行切削來實施倒角加工的磨石,在Y方向上的位置被固定的狀態下對端面1a進行加工。另一方面,研磨磨石3是用於進行使端面1a光滑的精加工的磨石,在以固定擠壓力壓抵於端面1a的狀態下對端面1a進行加工。再者,作為本實施方式的變形例,研削磨石2亦可在以固定擠壓力壓抵於端面1a的狀態下對端面1a進行加工。此處所言的「擠壓力」是與Y方向平行地作用,且單位以[N]表示的力。The
研削磨石2較佳為採用金屬結合材料(金屬黏合劑)作為研磨粒的結合材料(黏合劑)的金屬黏合劑磨石。採用作結合材料的金屬較佳為自鐵、銅、鈷、鎳、鎢等中選擇一種或選擇兩種以上並加以混合而成者,尤佳為包含鐵的金屬。結合於研削磨石2的研磨粒較佳為金剛石研磨粒,粒度較佳為#200~#600。The
研磨磨石3較佳為採用樹脂結合材料(樹脂黏合劑)作為研磨粒的結合材料(黏合劑)的樹脂黏合劑磨石。作為樹脂結合材料,較佳為熱硬化性樹脂。作為具體例,可採用酚系樹脂、環氧樹脂、聚醯亞胺樹脂、聚胺基甲酸酯樹脂等作為樹脂結合劑。作為結合於研磨磨石3的研磨粒,可使用自金剛石研磨粒、立方晶氮化硼研磨粒、碳化矽研磨粒、氧化鋁研磨粒、氧化鈰研磨粒中選擇一種或選擇兩種以上並加以混合而成者。研磨粒的粒度較佳為#400~#3000。The
圖2a表示研削步驟P1,圖2b表示研磨步驟P2。根據兩圖可以理解,研削步驟P1與研磨步驟P2於實施方式中存在共通點。以下,對研削步驟P1與研磨步驟P2的共通點進行說明。Figure 2a shows the grinding step P1 and Figure 2b shows the grinding step P2. According to the two figures, it can be understood that the grinding step P1 and the grinding step P2 have a common point in the embodiment. Hereinafter, common points between the grinding step P1 and the polishing step P2 will be described.
於研削步驟P1及研磨步驟P2中,分別向研削磨石2及研磨磨石3的圓周上的加工部2a、加工部3a供給作為冷卻介質的水4。藉此,將兩磨石2、3的加工部2a、加工部3a冷卻。於本實施方式中,供給至加工部2a的水4與供給至加工部3a的水4實質上為相同溫度。於兩磨石2、3的加工部2a、加工部3a,形成有上下多段用於對玻璃板1的端面1a進行加工的槽(省略圖示)。藉由將所述多段槽中的一個壓抵於端面1a來對端面1a進行加工。再者,於本實施方式中,使用水4作為冷卻介質,此外,亦可使用空氣、微氣泡、奈米氣泡、冷卻劑等作為冷卻介質。而且,供給至加工部2a的水4與供給至加工部3a的水4亦可設為不同溫度。具體而言,亦可使供給至加工部3a的水4的溫度低於供給至加工部2a的水4的溫度。例如,可將供給至加工部3a的水4的溫度設定為10℃~20℃,將供給至加工部2a的水4的溫度設定為15℃~25℃。於使用空氣、微氣泡、奈米氣泡、冷卻劑等作為冷卻介質之情形時,亦可將它們的溫度設定為與所述水4的溫度相同的溫度。In the grinding process P1 and the grinding process P2, the water 4 which is a cooling medium is supplied to the processing part 2a and the processing part 3a on the circumference of the
水4分別自研削步驟用噴嘴5及研磨步驟用噴嘴6供給至研削磨石2的加工部2a及研磨磨石3的加工部3a(於圖1中省略兩噴嘴5、6的圖示)。研削步驟用噴嘴5及研磨步驟用噴嘴6分別包括第一噴嘴7、第一噴嘴8及第二噴嘴9、第二噴嘴10。再者,研削步驟用噴嘴5及研磨步驟用噴嘴6分別與研削磨石2及研磨磨石3的移動聯動地沿著X方向移動。Water 4 is supplied to processing portion 2 a of grinding
第一噴嘴7、第一噴嘴8配置成於上下方向(Z方向)上的位置與玻璃板1對齊,並且自兩磨石2、3的旋轉方向的後方側指向研削點2x、研磨點3x而供給水4。研削點2x是研削磨石2的加工部2a與玻璃板1的端面1a接觸而對端面1a進行加工的部位(接觸點),研磨點3x是研磨磨石3的加工部3a與端面1a接觸而對端面1a進行加工的部位(接觸點)。再者,作為本實施方式的變形例,亦可自兩磨石2、3的旋轉方向的前方側供給水4。來自第一噴嘴7、第一噴嘴8的水4是出於降低兩磨石2、3與端面1a的摩擦,或者防止因摩擦而導致兩磨石2、3及端面1a過熱等的目的而供給。The first nozzle 7 and the first nozzle 8 are arranged to align with the
第二噴嘴9、第二噴嘴10配置成於Y方向上與研削磨石2、研磨磨石3相向。第二噴嘴9、第二噴嘴10自玻璃板1側朝向研削磨石2側、研磨磨石3側供給簇射狀的水4。來自第二噴嘴9、第二噴嘴10的水4是出於將在研削步驟P1、研磨步驟P2中產生的玻璃粉自玻璃板1、研削磨石2、及研磨磨石3中去除等的目的而供給。再者,研削步驟用噴嘴5及研磨步驟用噴嘴6並非必須包括第二噴嘴9、第二噴嘴10,亦可僅包括第一噴嘴7、第一噴嘴8。The second nozzle 9 and the second nozzle 10 are disposed so as to face the grinding
以下,對研削步驟P1與研磨步驟P2的不同點進行說明。Hereinafter, differences between the grinding step P1 and the polishing step P2 will be described.
於研磨步驟P2中,相較於研削步驟P1而言,增加水4的供給量。即,使自研磨步驟用噴嘴6(第一噴嘴8及第二噴嘴10)流出的水4的流量多於自研削步驟用噴嘴5(第一噴嘴7及第二噴嘴9)流出的水4的流量。詳細而言,使自第一噴嘴8流出的水4的流量多於第一噴嘴7,且使自第二噴嘴10流出的水4的流量多於第二噴嘴9。然而並不限定於此,只要自研磨步驟用噴嘴6流出的水4的流量多於自研削步驟用噴嘴5流出的水4的流量,第一噴嘴7與第一噴嘴8之間的流量的大小關係、及第二噴嘴9與第二噴嘴10之間的流量的大小關係可為任意。In the grinding step P2, the supply amount of the water 4 is increased compared to the grinding step P1. That is, the flow rate of the water 4 flowing out from the nozzle 6 (the first nozzle 8 and the second nozzle 10) in the grinding step is more than that of the water 4 flowing out from the nozzle 5 (the first nozzle 7 and the second nozzle 9) in the grinding step. flow. Specifically, the flow rate of the water 4 flowing out from the first nozzle 8 is made larger than that of the first nozzle 7 , and the flow rate of the water 4 flowing out from the second nozzle 10 is made larger than that of the second nozzle 9 . However, it is not limited to this, as long as the flow rate of the water 4 flowing out from the nozzle 6 in the grinding step is greater than the flow rate of the water 4 flowing out from the nozzle 5 in the grinding step, the flow rate between the first nozzle 7 and the first nozzle 8 The relation and the magnitude relation of the flow rate between the second nozzle 9 and the second nozzle 10 may be arbitrary.
此處,將自研削步驟用噴嘴5流出的水4的流量作為基準,自研磨步驟用噴嘴6流出的水4的流量較佳為設為105%以上的流量。再者,更佳為設為110%以上的流量,進而較佳為設為120%以上的流量。於本實施方式中,於研削步驟P1中,將自研削步驟用噴嘴5流出的水的流量設為10 L/min~20 L/min。另一方面,於研磨步驟P2中,將自研磨步驟用噴嘴6流出的水的流量設為12 L/min~30 L/min。Here, the flow rate of the water 4 flowing out from the nozzle 5 for the grinding step is used as a reference, and the flow rate of the water 4 flowing out from the nozzle 6 for the grinding step is preferably set at a flow rate of 105% or more. Furthermore, it is more preferable to set it as a flow rate of 110% or more, and it is more preferable to set it as a flow rate of 120% or more. In this embodiment, in the grinding step P1, the flow rate of water flowing out from the nozzle 5 for the grinding step is set to 10 L/min to 20 L/min. On the other hand, in the polishing step P2, the flow rate of water flowing out from the nozzle 6 for the polishing step is set at 12 L/min to 30 L/min.
於本製造方法中,根據所述水4的流量關係,於研削磨石2的加工部2a與研磨磨石3的加工部3a的比較中,提高了研磨磨石3的加工部3a的冷卻效率。隨之,研磨步驟P2中的研磨點3x的溫度相較於研削步驟P1中的研削點2x的溫度而言成為低溫。因此,容易防止經加工部3a加工的玻璃板1的端面1a的溫度高出容許範圍。因此,能夠儘可能地避免於執行研磨步驟P2的過程中於端面1a形成龜裂。結果,能夠防止隨著研磨步驟P2的執行而導致玻璃板1的端面1a的強度降低。In this manufacturing method, the cooling efficiency of the processing portion 3a of the grinding
此處,相對於所述實施方式,亦可應用如以下的變形例。於所述實施方式中,為了達成於研削磨石2的加工部2a與研磨磨石3的加工部3a的比較中提高研磨磨石3的加工部3a的冷卻效率的目的,於研磨步驟P2中,相較於研削步驟P1而言增加水4的供給量。然而並不限定於此,於達成所述目的時,亦可於研磨步驟P2中供給相較於研削步驟P1而言低溫的水4。而且,亦可設為僅對研削磨石2與研磨磨石3中的研磨磨石3的加工部3a供給水4。Here, the following modified examples can also be applied to the above-described embodiment. In the above embodiment, in order to achieve the purpose of improving the cooling efficiency of the processing portion 3a of the grinding
1:玻璃板 1a:端面 2:研削磨石 2a:加工部 2x:研削點(接觸點) 3:研磨磨石 3a:加工部 3x:研磨點(接觸點) 4:水 5:研削步驟用噴嘴 6:研磨步驟用噴嘴 7、8:第一噴嘴 9、10:第二噴嘴 P1:研削步驟 P2:研磨步驟 T:方向 X:方向 Y:方向 Z:方向 1: glass plate 1a: end face 2: grinding stone 2a: Processing Department 2x: Grinding point (contact point) 3: grinding stone 3a: Processing Department 3x: Grinding point (contact point) 4: water 5: Nozzle for grinding step 6: Nozzle for grinding step 7, 8: the first nozzle 9, 10: Second nozzle P1: Grinding step P2: Grinding step T: Direction X: direction Y: Direction Z: Direction
圖1是概略性地表示玻璃板的製造方法所包括的研削步驟及研磨步驟的平面圖。 圖2a是表示玻璃板的製造方法所包括的研削步驟的平面圖。 圖2b是表示玻璃板的製造方法所包括的研磨步驟的平面圖。 FIG. 1 is a plan view schematically showing a grinding step and a polishing step included in a method of manufacturing a glass plate. Fig. 2a is a plan view showing a grinding step included in the method of manufacturing a glass plate. Fig. 2b is a plan view showing a grinding step included in the manufacturing method of the glass plate.
1:玻璃板 1: glass plate
1a:端面 1a: end face
3:研磨磨石 3: grinding stone
3a:加工部 3a: Processing Department
3x:研磨點(接觸點) 3x: Grinding point (contact point)
4:水 4: water
6:研磨步驟用噴嘴 6: Nozzle for grinding step
8:第一噴嘴 8: The first nozzle
10:第二噴嘴 10: Second nozzle
P2:研磨步驟 P2: Grinding step
X:方向 X: direction
Y:方向 Y: Direction
Z:方向 Z: Direction
Claims (4)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2021-184777 | 2021-11-12 | ||
JP2021184777A JP2023072315A (en) | 2021-11-12 | 2021-11-12 | Production method of glass plate |
Publications (1)
Publication Number | Publication Date |
---|---|
TW202325471A true TW202325471A (en) | 2023-07-01 |
Family
ID=86336043
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
TW111142881A TW202325471A (en) | 2021-11-12 | 2022-11-10 | Method for manufacturing glass plate |
Country Status (3)
Country | Link |
---|---|
JP (1) | JP2023072315A (en) |
TW (1) | TW202325471A (en) |
WO (1) | WO2023085192A1 (en) |
Family Cites Families (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP4521483B2 (en) * | 2002-03-13 | 2010-08-11 | 坂東機工株式会社 | Glass plate grinding equipment |
US8721392B2 (en) * | 2011-06-28 | 2014-05-13 | Corning Incorporated | Glass edge finishing method |
JP6238117B2 (en) * | 2013-09-19 | 2017-11-29 | 旭硝子株式会社 | Processing method of plate |
JP6510866B2 (en) * | 2015-04-13 | 2019-05-08 | AvanStrate株式会社 | Method of manufacturing glass substrate |
-
2021
- 2021-11-12 JP JP2021184777A patent/JP2023072315A/en active Pending
-
2022
- 2022-11-02 WO PCT/JP2022/041038 patent/WO2023085192A1/en unknown
- 2022-11-10 TW TW111142881A patent/TW202325471A/en unknown
Also Published As
Publication number | Publication date |
---|---|
JP2023072315A (en) | 2023-05-24 |
WO2023085192A1 (en) | 2023-05-19 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
US7404756B2 (en) | Process for manufacturing optical and semiconductor elements | |
KR100713039B1 (en) | Method of processing edges of nitride semiconductor substrate | |
JP5913839B2 (en) | Polishing method | |
JPH07237120A (en) | Wafer grinding device | |
TWM465659U (en) | Chemical mechanical polishing conditioner | |
JP5373171B1 (en) | Grinding wheel and grinding / polishing apparatus using the same | |
CN104440607A (en) | Manufacturing method of grinding groove of resin binder grinding wheel, resin binder grinding wheel, processing device and processing method of plate body | |
US20060094322A1 (en) | Process for manufacturing a light emitting array | |
JP6624461B2 (en) | Glass sheet chamfering apparatus, glass sheet chamfering method, and glass sheet manufacturing method | |
WO2018073905A1 (en) | Grindstone | |
TWM500653U (en) | Polishing system and polishing pad set | |
TW202325471A (en) | Method for manufacturing glass plate | |
JPWO2014057894A1 (en) | Elastic stone dressing method | |
JP6830614B2 (en) | Flat glass manufacturing method, flat glass manufacturing equipment | |
JP4096286B2 (en) | Semiconductor wafer polishing method | |
TW201507807A (en) | A chemical mechanical polishing conditioner made from woven preform | |
TW202328022A (en) | Glass sheet manufacturing method | |
JP2005205542A (en) | Sapphire polishing grinding wheel and sapphire polishing method | |
JP4849590B2 (en) | Polishing tool and manufacturing method thereof | |
JP2013094924A (en) | Grinding method for ceramic substrate with through electrode | |
CN208020030U (en) | A kind of ceramic block and resin composite diamond flexibility mill | |
JP6231334B2 (en) | Thin plate substrate grinding method and grinding apparatus used therefor | |
JP4601317B2 (en) | Polishing tool and manufacturing method thereof | |
CN111136589B (en) | Preparation method of abrasive grain boundary bonding and fixing grinding tool | |
JP2009056517A (en) | Method and tool for truing diamond wheel |