TW202241594A - Coating method - Google Patents
Coating method Download PDFInfo
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- TW202241594A TW202241594A TW111112093A TW111112093A TW202241594A TW 202241594 A TW202241594 A TW 202241594A TW 111112093 A TW111112093 A TW 111112093A TW 111112093 A TW111112093 A TW 111112093A TW 202241594 A TW202241594 A TW 202241594A
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- coating
- plasma treatment
- coated
- layer
- surface portion
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- 238000000576 coating method Methods 0.000 title claims description 66
- 238000009832 plasma treatment Methods 0.000 claims description 63
- 239000011248 coating agent Substances 0.000 claims description 62
- 238000000034 method Methods 0.000 claims description 12
- 239000002184 metal Substances 0.000 claims description 11
- 239000000463 material Substances 0.000 claims description 10
- 239000001257 hydrogen Substances 0.000 claims description 9
- 229910052739 hydrogen Inorganic materials 0.000 claims description 9
- 239000000758 substrate Substances 0.000 claims description 7
- 229920005989 resin Polymers 0.000 claims description 5
- 239000011347 resin Substances 0.000 claims description 5
- YCKRFDGAMUMZLT-UHFFFAOYSA-N Fluorine atom Chemical compound [F] YCKRFDGAMUMZLT-UHFFFAOYSA-N 0.000 claims description 4
- 229910052731 fluorine Inorganic materials 0.000 claims description 4
- 239000011737 fluorine Substances 0.000 claims description 4
- 239000002344 surface layer Substances 0.000 description 27
- 239000010410 layer Substances 0.000 description 25
- 239000011247 coating layer Substances 0.000 description 10
- 239000000853 adhesive Substances 0.000 description 8
- 230000001070 adhesive effect Effects 0.000 description 8
- 238000007747 plating Methods 0.000 description 8
- 239000007789 gas Substances 0.000 description 5
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 description 4
- 230000003373 anti-fouling effect Effects 0.000 description 4
- 125000002887 hydroxy group Chemical group [H]O* 0.000 description 4
- 239000000126 substance Substances 0.000 description 4
- 229920003002 synthetic resin Polymers 0.000 description 4
- 239000000057 synthetic resin Substances 0.000 description 4
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 4
- 229920000122 acrylonitrile butadiene styrene Polymers 0.000 description 3
- 238000005260 corrosion Methods 0.000 description 3
- 230000007797 corrosion Effects 0.000 description 3
- 239000000203 mixture Substances 0.000 description 3
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 2
- 229920001780 ECTFE Polymers 0.000 description 2
- 239000004813 Perfluoroalkoxy alkane Substances 0.000 description 2
- 238000005299 abrasion Methods 0.000 description 2
- XECAHXYUAAWDEL-UHFFFAOYSA-N acrylonitrile butadiene styrene Chemical compound C=CC=C.C=CC#N.C=CC1=CC=CC=C1 XECAHXYUAAWDEL-UHFFFAOYSA-N 0.000 description 2
- 239000004676 acrylonitrile butadiene styrene Substances 0.000 description 2
- 239000000919 ceramic Substances 0.000 description 2
- 239000003795 chemical substances by application Substances 0.000 description 2
- 238000005265 energy consumption Methods 0.000 description 2
- 229920000840 ethylene tetrafluoroethylene copolymer Polymers 0.000 description 2
- 239000003921 oil Substances 0.000 description 2
- 229920011301 perfluoro alkoxyl alkane Polymers 0.000 description 2
- 229920001343 polytetrafluoroethylene Polymers 0.000 description 2
- 239000004810 polytetrafluoroethylene Substances 0.000 description 2
- 238000007740 vapor deposition Methods 0.000 description 2
- PEVRKKOYEFPFMN-UHFFFAOYSA-N 1,1,2,3,3,3-hexafluoroprop-1-ene;1,1,2,2-tetrafluoroethene Chemical compound FC(F)=C(F)F.FC(F)=C(F)C(F)(F)F PEVRKKOYEFPFMN-UHFFFAOYSA-N 0.000 description 1
- CHJAYYWUZLWNSQ-UHFFFAOYSA-N 1-chloro-1,2,2-trifluoroethene;ethene Chemical group C=C.FC(F)=C(F)Cl CHJAYYWUZLWNSQ-UHFFFAOYSA-N 0.000 description 1
- 239000004925 Acrylic resin Substances 0.000 description 1
- 229920000178 Acrylic resin Polymers 0.000 description 1
- 239000002033 PVDF binder Substances 0.000 description 1
- 239000000654 additive Substances 0.000 description 1
- 229910052786 argon Inorganic materials 0.000 description 1
- 239000012298 atmosphere Substances 0.000 description 1
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 1
- 229920001577 copolymer Polymers 0.000 description 1
- 230000006837 decompression Effects 0.000 description 1
- 238000007772 electroless plating Methods 0.000 description 1
- 238000009713 electroplating Methods 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 125000004435 hydrogen atom Chemical group [H]* 0.000 description 1
- 150000002500 ions Chemical class 0.000 description 1
- 238000003475 lamination Methods 0.000 description 1
- 239000001301 oxygen Substances 0.000 description 1
- 229910052760 oxygen Inorganic materials 0.000 description 1
- 239000003973 paint Substances 0.000 description 1
- 239000002245 particle Substances 0.000 description 1
- -1 polytetrafluoroethylene Polymers 0.000 description 1
- 239000000843 powder Substances 0.000 description 1
- 230000035939 shock Effects 0.000 description 1
- HBMJWWWQQXIZIP-UHFFFAOYSA-N silicon carbide Chemical compound [Si+]#[C-] HBMJWWWQQXIZIP-UHFFFAOYSA-N 0.000 description 1
- 229910010271 silicon carbide Inorganic materials 0.000 description 1
- 229920002050 silicone resin Polymers 0.000 description 1
- 239000007921 spray Substances 0.000 description 1
- 238000004544 sputter deposition Methods 0.000 description 1
Images
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D3/00—Pretreatment of surfaces to which liquids or other fluent materials are to be applied; After-treatment of applied coatings, e.g. intermediate treating of an applied coating preparatory to subsequent applications of liquids or other fluent materials
- B05D3/04—Pretreatment of surfaces to which liquids or other fluent materials are to be applied; After-treatment of applied coatings, e.g. intermediate treating of an applied coating preparatory to subsequent applications of liquids or other fluent materials by exposure to gases
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D7/00—Processes, other than flocking, specially adapted for applying liquids or other fluent materials to particular surfaces or for applying particular liquids or other fluent materials
- B05D7/14—Processes, other than flocking, specially adapted for applying liquids or other fluent materials to particular surfaces or for applying particular liquids or other fluent materials to metal, e.g. car bodies
Landscapes
- Life Sciences & Earth Sciences (AREA)
- Engineering & Computer Science (AREA)
- Wood Science & Technology (AREA)
- Laminated Bodies (AREA)
- Optical Fibers, Optical Fiber Cores, And Optical Fiber Bundles (AREA)
- Surface Treatment Of Glass Fibres Or Filaments (AREA)
- Materials For Medical Uses (AREA)
- Application Of Or Painting With Fluid Materials (AREA)
Abstract
Description
本發明係關於被覆方法。The present invention relates to coating methods.
於專利文獻1(日本特開2002-030707號公報)揭露一種水龍頭。於此水龍頭之母材,作為耐蝕層,形成鍍鎳層及鍍鉻層。A faucet is disclosed in Patent Document 1 (Japanese Patent Laid-Open No. 2002-030707). The base material of this faucet is used as a corrosion-resistant layer to form a nickel-plated layer and a chrome-plated layer.
於耐蝕層上,作為防汙層,形成由單液型氟系塗料形成之底漆層、及四氟乙烯-全氟烷基乙烯基醚共聚物製之頂部塗覆層。 [習知技術文獻] [專利文獻] [專利文獻1]:日本特開2002-030707號公報 On the corrosion-resistant layer, as an antifouling layer, a primer layer made of a one-component fluorine-based paint and a top coat layer made of tetrafluoroethylene-perfluoroalkyl vinyl ether copolymer are formed. [Prior art literature] [Patent Document] [Patent Document 1]: Japanese Unexamined Patent Publication No. 2002-030707
上述防汙層,為了改善頂部塗覆層的密接性而具有底漆層。然則,作為防汙層,必須形成底漆層與頂部塗覆層兩層,故防汙層全體的厚度有所差異而不易變得均勻,難以對被覆對象物施行美觀度佳的被覆。The above-mentioned antifouling layer has a primer layer in order to improve the adhesion of the top coating layer. However, as an antifouling layer, it is necessary to form two layers of a primer layer and a top coating layer, so the thickness of the entire antifouling layer varies and is difficult to become uniform, and it is difficult to coat the object to be coated with good aesthetics.
鑑於上述事由,本發明之目的在於提供一種被覆方法,可施行黏接力優良、厚度之差異受到抑制的被覆。In view of the above, an object of the present invention is to provide a coating method capable of coating with excellent adhesive force and suppressed variation in thickness.
本發明的一態樣之被覆方法,對於至少表面部分由金屬形成之被覆對象物的該表面部分施行電漿處理,其後,於該表面部分施行藉由以氫鍵鍵結而形成被覆。In the coating method according to one aspect of the present invention, plasma treatment is performed on the surface of an object to be coated, at least the surface of which is formed of metal, and then the surface is coated by hydrogen bonding.
本發明的一態樣之被覆方法,可施行黏接力優良、且厚度之差異受到抑制的被覆。According to the coating method of one aspect of the present invention, coating with excellent adhesive force and suppressed variation in thickness can be performed.
本發明係關於被覆方法,詳而言之,關於對被覆對象物施行被覆之被覆方法。The present invention relates to a coating method, specifically, a coating method for coating an object to be coated.
(1)實施形態
本實施形態之被覆方法,例如對圖1所示之被覆對象物1施行被覆。圖1所示之被覆對象物1為水龍頭,例如設置於廚房。另,被覆對象物1並未限定於此一形態。例如,被覆對象物1,亦可為如圖8所示之設置於浴室等的水龍頭。此外,成為被覆對象物1的水龍頭,例如亦可為設置於洗手間或廁所等的其他水龍頭。此外,被覆對象物1,並未限定於水龍頭,亦可為水槽、廚房流理臺或浴槽等其他衛浴設備。此外,被覆對象物1,並未限定於衛浴設備,例如亦可為把手、照明器具或車載設備等。此外,本發明中,「被覆」,係指以可在被覆對象物1的表面之至少一部分定著的物質覆蓋,並未限定於將被覆對象物1的表面之全體被覆。
(1) Implementation form
In the covering method of this embodiment, for example, the covering
於圖2,顯示施行被覆後之被覆對象物1的剖面圖。圖中之符號2,係藉由被覆形成的被覆層。In FIG. 2 , a cross-sectional view of the coated
被覆對象物1的至少表面部分為金屬。被覆對象物1,具備基材10、及表面層11。基材10,構成被覆對象物1的主體,具有立體形狀。基材10為合成樹脂製,詳而言之,為ABS(Acrylonitrile butadiene styrene)樹脂製。表面層11,覆蓋基材10的表面。在本實施形態,表面層11為被覆對象物1的表面部分。At least the surface portion of the object to be covered 1 is metal. The object to be covered 1 includes a
表面層11(表面部分),係於基材10的表面形成之金屬層。本實施形態之被覆對象物1,僅表面部分由金屬形成。表面層11為鍍鉻,具有耐磨性、耐衝撃性、耐蝕性及光澤性等。鍍鉻,例如為硬質鍍鉻或鍍黑鉻等。表面層11,例如涵蓋基材10的表面之全體而形成。The surface layer 11 (surface portion) is a metal layer formed on the surface of the
另,基材10,亦可由ABS樹脂以外之合成樹脂形成,或亦可由合成樹脂以外的材料形成。作為合成樹脂以外的材料,例如可列舉陶瓷、玻璃或金屬等。此外,表面層11,亦可為鍍鉻以外的鍍層。表面層11,例如亦可為鍍鋅或鍍鎳等。此外,表面層11之鍍覆方法並未限定。表面層11之鍍覆方法,例如亦可為熱浸鍍、氣相沉積、電鍍或化學鍍等。此外,表面層11,亦可不為鍍覆,而為藉由壓合、蒸鍍或濺鍍等形成之金屬層。此外,表面層11,亦可僅形成於基材10的表面之一部分。此外,被覆對象物1,並未限定於僅表面部分由金屬形成者,亦可為被覆對象物1的全體由金屬形成者。In addition, the
在本實施形態,對被覆對象物1的表面部分即表面層11施行直接被覆,於表面層11的表面形成被覆層2。In this embodiment, the
形成被覆層2的被覆劑20(參考圖3),為包含氟樹脂的氟樹脂組成物。亦即,本實施形態,藉由在於被覆對象物1的表面部分施行氟樹脂被覆,而形成由氟樹脂組成物構成的被覆層2。氟樹脂,例如為PTFE(聚四氟乙烯)、PFA(全氟烷氧基烷烴)、PFEP(全氟乙烯丙烯共聚物)、ETFE(乙烯四氟乙烯共聚物、ECTFE(乙烯三氟氯乙烯共聚物)或PVDF(聚偏二氟乙烯)等。因應必要,亦可於氟樹脂組成物添加各種添加劑。The coating agent 20 (see FIG. 3 ) forming the
接著,針對本實施形態之被覆方法予以說明。本實施形態之被覆方法,包含電漿處理步驟及被覆步驟。電漿處理步驟,為被覆步驟的前步驟。電漿處理步驟,係對被覆對象物1的表面部分即表面層11施行電漿處理之步驟。被覆步驟,係於藉由電漿處理步驟電漿處理後之被覆對象物1的表面層11,施行藉由氫鍵而形成被覆之步驟。Next, the coating method of this embodiment is demonstrated. The coating method of this embodiment includes a plasma treatment step and a coating step. The plasma treatment step is a step before the coating step. The plasma treatment step is a step of performing plasma treatment on the surface portion of the
在電漿處理步驟,例如利用圖4所示之電漿處理裝置3,對被覆對象物1施行電漿處理。電漿處理裝置3為真空電漿(低壓電漿)處理裝置,在減壓而壓力變得較大氣壓更低之電漿處理庫內,對被覆對象物1施行電漿處理(真空電漿處理)。電漿處理裝置3所進行之真空電漿處理,係於減壓後的電漿處理庫內在一對電極30、30之間配置被覆對象物1的狀態下,從交流電源或直流電源對一對電極30、30之間施加電壓藉以施行。藉此,對被覆對象物1的表面層11,照射電漿(詳而言之,在電漿處理庫內產生的電漿之電子、離子)。此電漿處理,例如在使電漿處理庫內充滿係處理氣體的氬及氧的狀態下施行。處理氣體,例如在將電漿處理庫內以真空泵減壓後往電漿處理庫內供給,藉以成為使其充填於電漿處理庫內的狀態。另,「真空電漿處理」,係指在較大氣壓更為減壓的狀態下施行電漿處理,並未僅限定於在真空的氣體環境下施行電漿處理。In the plasma treatment step, for example, the
在真空電漿處理,由於電漿受到電漿處理庫內的氣體回濺,而對被覆對象物1的表面之全體均勻地照射。因此,適合將如水龍頭般具有三維形狀之被覆對象物1的表面予以電漿處理之情況。另,充填於電漿處理庫內之處理氣體並未限定。In the vacuum plasma treatment, the plasma is uniformly irradiated on the entire surface of the
在電漿處理步驟施行之電漿處理,並未限定於真空電漿處理,亦可為在大氣壓中施行電漿處理之大氣壓電漿處理。於圖5,顯示大氣壓電漿處理裝置4的一例。The plasma treatment performed in the plasma treatment step is not limited to vacuum plasma treatment, and may also be atmospheric pressure plasma treatment in which plasma treatment is performed under atmospheric pressure. In FIG. 5, an example of the atmospheric pressure plasma processing apparatus 4 is shown.
大氣壓電漿處理裝置4,例如,於大氣壓之氣體環境中在一對電極40、40之間配置被覆對象物1的狀態下,從交流電源或直流電源對一對電極40、40之間施加電壓,藉以施行電漿處理。在此大氣壓電漿處理裝置4所進行之電漿處理,從一對電極40、40中的一方,朝向另一方直線地照射電漿。因此,在被覆對象物1中施行電漿處理的面為平面之情況,可將用於形成電漿處理庫、真空泵等減壓空間的設備省略,故較為有利。The atmospheric pressure plasma processing apparatus 4, for example, applies a voltage between the pair of
於施行電漿處理步驟前之被覆對象物1的表面層11之表面,通常,如圖6所示,僅存在少量用於使被覆劑20在表面層11以氫鍵鍵結的羥基。因此,即便對表面層11施行藉由以氫鍵鍵結而形成被覆,被覆劑20之對於被覆對象物1的黏接力仍不易變高。然則,在本實施形態,藉由將被覆對象物1的表面層11在電漿處理步驟中予以電漿處理,而將表面層11之氧化膜等所含的分子之化學鍵結切斷,藉此,如圖7所示,於表面層11的表面形成大量羥基。因此,可在對表面層11提高黏接力之狀態下施行藉由以氫鍵鍵結而形成被覆。On the surface of the
在藉由電漿處理裝置3實行之電漿處理步驟中,宜以100W以上500W以下的輸出,將對於被覆對象物1之電漿處理施行10秒以上60秒以下的時間。此一情況,可抑制能量消耗量,並充分提高被覆劑20之對於表面層11的黏接力。對於被覆對象物1之電漿處理,例如以250W的輸出施行30秒。另,電漿處理之輸出時的電力及處理時間並未限定。In the plasma treatment step performed by the plasma treatment apparatus 3, it is preferable to perform the plasma treatment on the
於電漿處理步驟後,實行被覆步驟。被覆步驟,例如在電漿處理庫的外部施行。另,被覆步驟,亦可在電漿處理庫內施行。After the plasma treatment step, a coating step is performed. The coating step is performed, for example, outside the plasma treatment chamber. In addition, the coating step can also be performed in the plasma treatment chamber.
在被覆步驟,將前述包含氟樹脂之被覆劑20(參考圖3),直接被覆於在電漿處理步驟經過電漿處理的表面層11之表面。藉此,如圖3所示,使被覆劑20對被覆對象物1以氫鍵鍵結。對於被覆對象物1的被覆,例如係使用噴槍或靜電粉體塗裝機等施行。另,於被覆對象物1被覆之方法並未限定。In the coating step, the aforementioned coating agent 20 (refer to FIG. 3 ) containing fluororesin is directly coated on the surface of the
藉由在被覆步驟中施行被覆,而可對被覆對象物1賦予被覆劑20所具有之特性。本實施形態之被覆劑20,包含氟樹脂,因而對被覆對象物1賦予撥水/撥油性(防汙性)、耐熱性、耐藥性及耐磨性等。By coating in the coating step, the properties of the
另,被覆劑20,若為可對被覆對象物1之金屬製的表面部分以氫鍵鍵結者,則不含氟樹脂亦可。作為不含氟樹脂的被覆劑20,例如可列舉包含丙烯酸系樹脂或矽氧系樹脂的被覆劑。此外,不含氟樹脂的被覆劑20,亦可為包含碳化矽等陶瓷的被覆劑。In addition, the
若依本實施形態之被覆方法,則藉由將被覆對象物1予以電漿處理,而可在被覆對象物1的表面部分形成大量羥基。而後,對如此地使羥基之數量較電漿處理前變得更多的表面部分,施行藉由以氫鍵鍵結而形成被覆。因此,可對於被覆對象物1形成黏接力高的被覆層2(參考圖2)。此外,此一情況,於被覆對象物1的表面部分,可將被覆劑20直接被覆而不形成底漆層。亦即,於被覆對象物1的表面,可僅形成僅以1層被覆層2構成的層。According to the coating method of this embodiment, by subjecting the
(2)態樣 如同自上述說明之實施形態可明瞭,第1態樣之被覆方法,具備以下所示的構成。對至少表面部分(例如,表面層11)由金屬形成之被覆對象物(1)的該表面部分施行電漿處理,其後,於該表面部分施行藉由以氫鍵鍵結而形成被覆。 (2) appearance As is clear from the embodiments described above, the coating method of the first aspect has the configuration shown below. Plasma treatment is performed on the surface portion of the object to be coated (1) whose surface portion (for example, the surface layer 11) is formed of metal, and then the surface portion is coated by hydrogen bonding.
依此一態樣,則藉由將被覆對象物(1)予以電漿處理,而可於被覆對象物(1)的表面部分,形成大量用於施行藉由以氫鍵鍵結而形成被覆之羥基。因此,可對被覆對象物(1)施行黏接力優良的被覆。此外,於被覆對象物(1)的表面部分施行直接被覆,故可將底漆層省略。因此,可將在被覆對象物的表面形成之層的厚度減薄並抑制該層的厚度之差異。因而,可施行美觀佳的被覆。此外,可將形成底漆層之步驟省略,因而亦可簡單地施行被覆。According to this aspect, by subjecting the object to be coated (1) to plasma treatment, a large number of particles for forming a coating by hydrogen bonding can be formed on the surface portion of the object to be coated (1). hydroxyl. Therefore, coating with excellent adhesive force can be applied to the coating target object (1). In addition, since coating is performed directly on the surface part of the object to be coated (1), the primer layer can be omitted. Therefore, the thickness of the layer formed on the surface of the object to be coated can be reduced to suppress the variation in the thickness of the layer. Therefore, coating with good appearance can be performed. In addition, since the step of forming a primer layer can be omitted, coating can also be easily performed.
第2態樣之被覆方法,可藉由第1態樣的組合而實現。在第2態樣中,該電漿處理為真空電漿處理。The coating method of the second aspect can be realized by combining the first aspect. In the second aspect, the plasma treatment is vacuum plasma treatment.
依此一態樣,則可對具有三維形狀之被覆對象物(1),均勻地施行被覆。According to this aspect, coating can be uniformly applied to the coating target object (1) having a three-dimensional shape.
第3態樣之被覆方法,可藉由與第2態樣的組合而實現。在第3態樣中,以100W以上500W以下的輸出,將該電漿處理施行10秒以上60秒以下。The coating method of the third aspect can be realized by combining with the second aspect. In the third aspect, the plasma treatment is performed for 10 seconds to 60 seconds at an output of 100 W to 500 W.
依此一態樣,則可施行抑制能量消耗量、且黏接力高的被覆。According to this aspect, it is possible to apply coating with high adhesive force while suppressing energy consumption.
第4態樣之被覆方法,可藉由與第1~第3態樣中之任一態樣的組合而實現。在第4態樣中,該被覆為氟被覆。The coating method of the fourth aspect can be realized by combining any one of the first to third aspects. In the fourth aspect, the coating is fluorine coating.
依此一態樣,則可對被覆對象物(1),賦予撥水/撥油性(防汙性)、耐熱性、耐藥性及耐磨性等。According to this aspect, water/oil repellency (fouling resistance), heat resistance, chemical resistance, abrasion resistance, etc. can be imparted to the coating object (1).
第5態樣之被覆方法,可藉由與第1~第4態樣中之任一態樣的組合而實現。在第5態樣中,被覆對象物(1)為水龍頭。The coating method of the fifth aspect can be realized by combining any one of the first to fourth aspects. In the fifth aspect, the object to be covered (1) is a faucet.
依此一態樣,則可對水龍頭,施行黏接力優良、且厚度之差異受到抑制的被覆。According to this aspect, it is possible to apply a coating with excellent adhesive force and suppressed variation in thickness to the faucet.
第6態樣之被覆方法,可藉由與第5態樣的組合而實現。第6態樣,具備以下所示的構成。水龍頭,具備樹脂製之基材(10)、及於基材(10)的表面形成之鍍鉻層。該表面部分為該鍍鉻層。The coating method of the sixth aspect can be realized by combining with the fifth aspect. A sixth aspect has the configuration shown below. A water faucet includes a resin base (10) and a chrome-plated layer formed on the surface of the base (10). The surface portion is the chrome-plated layer.
依此一態樣,則可對表面部分為鍍鉻層之水龍頭,施行黏接力優良、且厚度之差異受到抑制的被覆。According to this aspect, it is possible to apply a coating with excellent adhesion and suppressed variation in thickness to a faucet whose surface part is a chrome-plated layer.
1:被覆對象物
2:被覆層
3,4:電漿處理裝置
10:基材
11:表面層(表面部分)
20:被覆劑
30,40:電極
1: Covered object
2: Coating layer
3,4: Plasma treatment device
10: Substrate
11: Surface layer (surface part)
20:
【圖1】圖1係顯示一實施形態之被覆對象物的立體圖。 【圖2】圖2係同上之被覆對象物及被覆層的剖面圖。 【圖3】圖3係示意同上之被覆對象物與被覆劑的結合狀態之說明圖。 【圖4】圖4係示意同上之被覆對象物的電漿處理步驟之說明圖。 【圖5】圖5係示意同上之被覆對象物的大氣壓電漿處理裝置之電漿處理的說明圖。 【圖6】圖6係示意同上之被覆對象物的電漿處理前之表面部分的說明圖。 【圖7】圖7係示意同上之被覆對象物的電漿處理後之表面部分的說明圖。 【圖8】圖8係顯示另一例之被覆對象物的立體圖。 [Fig. 1] Fig. 1 is a perspective view showing an object to be covered according to an embodiment. [Fig. 2] Fig. 2 is a cross-sectional view of the coated object and the coating layer as above. [ Fig. 3 ] Fig. 3 is an explanatory view showing the bonded state of the object to be coated and the coating agent as above. [FIG. 4] FIG. 4 is an explanatory view showing the steps of plasma treatment of the object to be coated as above. [ Fig. 5 ] Fig. 5 is an explanatory view showing the plasma treatment of the above-mentioned atmospheric pressure plasma treatment apparatus for the coated object. [FIG. 6] FIG. 6 is an explanatory view showing the surface portion of the same coating object before plasma treatment. [FIG. 7] FIG. 7 is an explanatory view showing the surface portion of the same coated object after plasma treatment. [ Fig. 8 ] Fig. 8 is a perspective view showing another example of an object to be covered.
1:被覆對象物 1: Covered object
3:電漿處理裝置 3: Plasma treatment device
30:電極 30: electrode
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JPH0429784A (en) * | 1990-05-24 | 1992-01-31 | Sekisui Chem Co Ltd | Preparation of antidim plastic |
JP2007119885A (en) * | 2005-10-31 | 2007-05-17 | Nidek Co Ltd | Substrate with metallic film and manufacturing method therefor |
JP6116949B2 (en) * | 2013-03-14 | 2017-04-19 | 新光電気工業株式会社 | WIRING BOARD FOR MOUNTING LIGHT EMITTING ELEMENT, LIGHT EMITTING DEVICE, MANUFACTURING METHOD FOR WIRING BOARD FOR LIGHT EMITTING ELEMENT MOUNTING, AND MANUFACTURING METHOD FOR LIGHT EMITTING DEVICE |
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