TW202225637A - Laser confocal measurement system and light control module thereof - Google Patents
Laser confocal measurement system and light control module thereof Download PDFInfo
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本發明係關於一種量測系統及光控制模組,特別是關於一種基於雷測共焦量測技術的雷射共焦量測系統及雷射共焦量測系統的光控制模組。The present invention relates to a measurement system and an optical control module, in particular to a laser confocal measurement system based on the laser measurement confocal measurement technology and an optical control module of the laser confocal measurement system.
雷射共焦系統(又稱雷射共軛焦系統)係為一種可用來量測物體表面形貌的技術,其精度範圍約為1~100奈米的等級,可符合高精度量測的目的。The laser confocal system (also known as the laser confocal system) is a technology that can be used to measure the surface topography of an object. Its accuracy ranges from 1 to 100 nm, which can meet the purpose of high-precision measurement. .
習知的雷射共焦系統中,是藉由***控在兩個軸向上產生旋轉的微機電反射鏡來達到二維的掃瞄。一般而言,微機電反射鏡採用45度角之傾斜配置,以使反射光可被90度轉向而反射至待測面上,然而,這樣的配置會導致較嚴重的扇形失真(distortion),在掃描精度逐漸提高下,這樣的傾斜配置方式難以符合掃描需求。In conventional confocal laser systems, two-dimensional scanning is achieved by manipulating MEMS mirrors that rotate in two axial directions. Generally speaking, the MEMS mirror adopts an inclined configuration of 45 degrees, so that the reflected light can be turned by 90 degrees and reflected to the surface to be measured. However, such a configuration will lead to serious sector distortion. With the gradual improvement of scanning accuracy, it is difficult for such an inclined configuration to meet the scanning requirements.
另一種方式是,在微機電反射鏡前額外配置一個分光鏡(Beam splitter),雷射光束在入射微機電反射鏡前,先入射至分光鏡,經由分光鏡改變光路徑,讓入射該微機電反射鏡的光線是來自該分光鏡的反射光。而自該微機電反射鏡所反射的光線,則再經由該分光鏡的透射,朝待測面的方向入射。藉此,入射該微機電反射鏡的入射角可以小於前述舉例的傾斜配置方式,然而,由於分光鏡具有50%反射光線及50%透射光線的特性,因此光每通過一次分光鏡即會損失50%的能量,導致入射光到達待測面時衰減了75%。基於雷測共焦量測技術,自待測面發出的光線會再經過相同的反向路徑射回,因此,從待測物反射的光線沿原光路鏡返回至光電倍增管(photomultiplier tube, PMT)後,用光效率僅剩下原始出射光的6~7%。Another way is to configure an additional beam splitter in front of the MEMS mirror. Before entering the MEMS mirror, the laser beam first enters the beam splitter, and the beam splitter changes the light path so that the incident MEMS mirror The light from the reflector is the reflected light from the beam splitter. The light reflected from the MEMS mirror is then transmitted through the beam splitter and is incident in the direction of the surface to be measured. In this way, the incident angle of the MEMS mirror can be smaller than the above-mentioned inclined configuration. However, since the beam splitter has the characteristics of 50% reflected light and 50% transmitted light, the light will lose 50% each time it passes through the beam splitter. % of the energy, causing the incident light to be attenuated by 75% when it reaches the surface to be measured. Based on the confocal measurement technology of lightning measurement, the light emitted from the surface to be measured will return through the same reverse path. Therefore, the light reflected from the object to be measured will return to the photomultiplier tube (PMT) along the original optical path mirror. ), the light efficiency is only 6~7% of the original outgoing light.
據此,習知的雷射共焦系統存在失真嚴重或用光效率不佳的問題。Accordingly, the conventional laser confocal system has problems of serious distortion or poor light utilization efficiency.
本發明之一目的在於解決雷射共焦系統中的影像失真問題。One objective of the present invention is to solve the problem of image distortion in a laser confocal system.
本發明之另一目的在於提高雷射共焦系統中的用光效率。Another object of the present invention is to improve the light efficiency in the laser confocal system.
為達上述目的及其他目的,本發明提出一種雷射共焦量測系統的光控制模組,用於在一微機電反射鏡模組的進/出光路徑上進行控制,並用於接收第一偏振態的雷射光束,以及用於接收來自待測物且為第二偏振態的量測光以提供至該微機電反射鏡模組,其特徵在於:該光控制模組係用以使出射且射向該微機電反射鏡模組的該雷射光束係為圓形偏振光或橢圓偏振光,該光控制模組並用以使反射自該微機電反射鏡模組的該雷射光束轉換為線性偏振光,該第一偏振態係正交於該第二偏振態。In order to achieve the above purpose and other purposes, the present invention provides a light control module of a laser confocal measurement system, which is used to control the in/out light path of a micro-electromechanical mirror module, and is used to receive the first polarization A laser beam in a state of being, and for receiving the measurement light in the second polarization state from the object to be measured to provide to the MEMS mirror module, characterized in that: the light control module is used to make the outgoing and The laser beam directed to the MEMS mirror module is circularly polarized light or elliptically polarized light, and the light control module is used to convert the laser beam reflected from the MEMS mirror module to linear For polarized light, the first polarization state is orthogonal to the second polarization state.
於本發明之一實施例中,該光控制模組包含:極化分光器及1/4波板。極化分光器係反射該第一偏振態的入射光,以及透射該第二偏振態的入射光。1/4波板被配置於該極化分光器與該微機電反射鏡模組之間。其中,自該極化分光器出射且遠離該微機電反射鏡模組的該雷射光束係為該第二偏振態,自該極化分光器出射且遠離該微機電反射鏡模組的該量測光係為該第一偏振態。In an embodiment of the present invention, the light control module includes: a polarization beam splitter and a quarter wave plate. The polarization beam splitter reflects the incident light of the first polarization state and transmits the incident light of the second polarization state. A quarter wave plate is disposed between the polarization beam splitter and the MEMS mirror module. Wherein, the laser beam emitted from the polarization beam splitter and away from the MEMS mirror module is in the second polarization state, and the amount of the laser beam emitted from the polarization beam splitter and away from the MEMS mirror module The photometric system is the first polarization state.
於本發明之一實施例中,可更包含一極化器,該極化器配置於該極化分光器接收該第一偏振態之該雷射光束的這一側,該極化器係使通過之光線轉換為該第一偏振態的光線。In one embodiment of the present invention, a polarizer may be further included, and the polarizer is disposed on the side of the polarization beam splitter that receives the laser beam of the first polarization state, and the polarizer makes The passing light is converted to light of the first polarization state.
於本發明之一實施例中,該第一偏振態為S偏振,該第二偏振態為P偏振。In an embodiment of the present invention, the first polarization state is S polarization, and the second polarization state is P polarization.
於本發明之一實施例中,自該極化分光器出射且射向該微機電反射鏡模組之該雷射光束的線偏振方向係與該1/4波板之光軸間具有±45度的夾角。In an embodiment of the present invention, the linear polarization direction of the laser beam emitted from the polarization beam splitter and directed to the MEMS mirror module is ±45° from the optical axis of the quarter wave plate. angle of degrees.
為達上述目的及其他目的,本發明復提出一種雷射共焦量測系統,用於在第一光路徑上將雷射光束提供至待測物,並接收來自該待測物的量測光以使該量測光被導引至量測裝置,該雷射共焦量測系統包含:分光模組、微機電反射鏡模組、聚焦模組、及光控制模組。分光模組配置為透射該雷射光束,以及反射該量測光至第二路徑,使該量測光入射至該量測裝置。聚焦模組配置為透射作為掃描光束的該雷射光束,以及透射來自該待測物的該量測光。光控制模組配置為調整來自該分光模組的該雷射光束以入射至該微機電反射鏡模組,及接收來自該微機電反射鏡模組所反射的該雷射光束以入射至該聚焦模組,該光控制模組係使出射且射向該微機電反射鏡模組的該雷射光束係為圓形偏振光或橢圓偏振光,以及使反射自該微機電反射鏡模組的該雷射光束轉換為線性偏振光,以及使出射且遠離該微機電反射鏡模組的該量測光係為第一偏振態的線性偏振光,以及使出射且遠離該微機電反射鏡模組的該雷射光束係為第二偏振態的線性偏振光,該第一偏振態係正交於該第二偏振態。In order to achieve the above object and other objects, the present invention further proposes a laser confocal measurement system for providing a laser beam to an object to be measured on a first optical path, and receiving measurement light from the object to be measured In order to guide the measurement light to the measurement device, the laser confocal measurement system includes: a beam splitting module, a MEMS mirror module, a focusing module, and a light control module. The beam splitting module is configured to transmit the laser beam and reflect the measurement light to the second path, so that the measurement light is incident on the measurement device. The focusing module is configured to transmit the laser beam as a scanning beam and transmit the measurement light from the object to be measured. The light control module is configured to adjust the laser beam from the beam splitting module to be incident on the MEMS mirror module, and to receive the laser beam reflected from the MEMS mirror module to be incident on the focus A module, the light control module makes the laser beam emitted from the MEMS mirror module be circularly polarized light or elliptically polarized light, and makes the laser beam reflected from the MEMS mirror module The laser beam is converted into linearly polarized light, and the measuring light that exits and is far away from the MEMS mirror module is linearly polarized light of the first polarization state, and the light that exits and is far away from the MEMS mirror module is linearly polarized light of the first polarization state. The laser beam is linearly polarized light of a second polarization state, and the first polarization state is orthogonal to the second polarization state.
據此,藉由微機電反射鏡模組的反射機制搭配相異偏振光型態間的轉換,可讓入射至微機電反射鏡模組的光線在呈0度入射的情況下,不會有過多的用光效率的損失,進而使所形成的掃瞄光具有低失真與低光衰的特性。Accordingly, through the reflection mechanism of the MEMS mirror module and the conversion between different polarized light types, the light incident on the MEMS mirror module can be prevented from being too much under the condition of 0 degree incidence. Therefore, the formed scanning light has the characteristics of low distortion and low light attenuation.
為充分瞭解本發明之目的、特徵及功效,茲藉由下述具體之實施例,並配合所附之圖式,對本發明做一詳細說明,說明如後:In order to fully understand the purpose, features and effects of the present invention, hereby, the present invention is described in detail by the following specific embodiments and in conjunction with the accompanying drawings, and the description is as follows:
於本文中,所描述之用語「一」或「一個」來描述單元、部件、結構、裝置、模組、系統、部位或區域等。此舉只是為了方便說明,並且對本發明之範疇提供一般性的意義。因此,除非很明顯地另指他意,否則此種描述應理解為包括一個或至少一個,且單數也同時包括複數。As used herein, the terms "a" or "an" are described to describe a unit, component, structure, device, module, system, portion or region, or the like. This is done only for convenience of description and to provide a general sense of the scope of the invention. Accordingly, unless it is clear that it is meant otherwise, such descriptions should be read to include one or at least one, and the singular also includes the plural.
於本文中,所描述之用語「包含、包括、具有」或其他任何類似用語意係非僅限於本文所列出的此等要件而已,而是可包括未明確列出但卻是所述單元、部件、結構、裝置、模組、系統、部位或區域通常固有的其他要件。In this text, the terms "comprising, including, having" or any other similar terms described are not meant to be limited to the elements listed herein, but may include elements that are not explicitly listed but are the stated elements, Other elements usually inherent in a component, structure, device, module, system, location or area.
於本文中,所描述之「第一」或「第二」等類似序數之詞語,係用以區分或指關聯於相同或類似的元件或結構、部位或區域,且不必然隱含此等元件、結構、部位或區域在空間上的順序。應了解的是,在某些情況或配置下,序數詞語係可交換使用而不影響本發明之實施。In this document, words like "first" or "second" described in ordinal numbers are used to distinguish or refer to the same or similar elements or structures, parts or regions, and do not necessarily imply such elements , the spatial order of structures, parts or regions. It should be understood that under certain circumstances or configurations, ordinal words may be used interchangeably without affecting the practice of the invention.
請參照圖1,其係為本發明一實施例之雷射共焦量測系統的示意圖。雷射共焦量測系統係將雷射光源裝置100提供的雷射光束經由光束控制後,提供至聚焦模組500,進而照射置放在載台700上的待測物。Please refer to FIG. 1 , which is a schematic diagram of a laser confocal measurement system according to an embodiment of the present invention. The laser confocal measurement system supplies the laser beam provided by the laser
微機電反射鏡模組400可為一種二維微機電反射鏡(2D MEMS Mirror),藉由數位控制的微鏡來使光線反射至所需的路徑。據此,經由光控制模組300及微機電反射鏡模組400的協同運作,可形成對待測物表面上一定區域範圍內的掃描動作。作為掃描光束的雷射光束在照射待測物後,自待測物表面反射或發光的光線係為量測光。於後述實施例中,為便於區分,係稱未入射至待測物的光束為雷射光束,並將自待測物表面返回的光線統一稱為量測光。The
自待測物表面返回的光線會再次入射光控制模組300及微機電反射鏡模組400,再經由分光模組200將量測光改變至第二光路徑。其中,自雷射光源裝置100出發之雷射光束所經過的路徑以及量測光返回至分光模組200的路徑係定義為第一光路徑,自分光模組200至量測裝置600的光電倍增管630 (Photomultiplier Tube, PMT)的路徑係定義為第二光路徑。量測裝置600包含:聚焦透鏡610、針孔裝置620 (Pinhole)、及光電倍增管630、The light returning from the surface of the object to be measured will be incident on the
後續藉由聚焦透鏡610使量測光匯聚,並於焦點處設置針孔裝置620,將非聚焦面的光線排除在外,最後令聚焦面的量測光入射至光電倍增管630。自待測物表面返回的光線的出發點若是處於聚焦模組500焦點上,那麼返回至聚焦透鏡610之焦點處的針孔裝置620時,就同樣可通過針孔裝置620,其餘光線則會被針孔裝置620所阻擋,進而形成共聚焦的量測。Subsequently, the measuring light is concentrated by the focusing
雷射光源裝置100例如可透過雷射源110、導引雷射光的光纖120及使雷射光形成平行光束的準直透鏡130(Collimator lens)來形成入射該分光模組200的該雷射光束。該分光模組200可令該雷射光束透射,以及可令前述之量測光反射。The laser
聚焦模組500藉由可進一步確保雷射光束之平行化或同時擴大平行光之光束的掃描透鏡511(Scan lens)及鏡筒透鏡512(Tube lens)的組合,提高入射至待測物的光束品質。分光裝置520在圖1中係基於光路的安排而使用,於其他實施態樣下,亦可能無須使用該分光裝置520或是替換為反射鏡。分光裝置520在圖1中被繪示為作為反射鏡使用,也可利用分光裝置520透射的特性,將量測光在分光裝置520所產生的透射分量(圖未示)作為觀察使用,用以進行初步定位來對準待測物。物鏡530用於將雷射光束聚焦至載台700,同時可接收自待測物表面之所反射或發出的量測光,使該量測光透射,進而可沿著原路徑返回該分光模組200。The focusing
光控制模組300用於在微機電反射鏡模組400的進/出光路徑上進行控制。微機電反射鏡模組400的進光路徑與出光路徑係指在雷射共焦量測系統中,位於微機電反射鏡模組400前方一區段的光路徑,亦即入射至微機電反射鏡模組400的一段路徑與自微機電反射鏡模組400出射後的一段路徑。The
光控制模組300可用於接收來自雷射光源裝置100所提供之第一偏振態的雷射光束1S,以提供至微機電反射鏡模組400。以及,光控制模組300可用於接收來自待測物且為第二偏振態的量測光2P,以提供至微機電反射鏡模組400。實施例中所描述的第一偏振態與第二偏振態的光束係指光束之電磁波的偏振方向,第一偏振態與第二偏振態相垂直。其中第一偏振態可以是P偏振或S偏振,實施例中係以第一偏振態為S偏振來做為示例。The
光控制模組300可讓出射且射向該微機電反射鏡模組400的雷射光束形成為圓形偏振光或橢圓偏振光。此外,該光控制模組300並可讓自該微機電反射鏡模組400反射的雷射光束,在入射光控制模組300後,使其轉換為線性偏振光。The
光控制模組300主要可包含:極化分光器310及1/4波板320。極化分光器310主要用來將入射的光束分成兩個極化方向互相正交的光束。1/4波板是一種雙折射材料。當入射之光束的極化方向與1/4波板的光軸(或稱晶體光軸)具有非0的一夾角時, 1/4波板可發揮出相位延遲的效果,進而調整光束的極化狀態。The
如圖1所示,極化分光器310反射第一偏振態的雷射光束1S,使雷射光束改變路徑而朝向1/4波板320入射。第一偏振態的雷射光束1S經過1/4波板320後,可成為圓形偏振光或橢圓偏振光。依圖1所示例者,第一偏振態的雷射光束1S經過1/4波板320後係成為右旋的圓偏振光1R(以微機電反射鏡模組400的觀察角度)。接著,再經微機電反射鏡模組400的反射後,再次入射1/4波板320。入射至1/4波板320時,以1/4波板320的觀察角度來說,係為左旋的圓偏振光1L入射。出射後的雷射光束改變為第二偏振態的雷射光束1P。極化分光器310透射第二偏振態的雷射光束1P,此雷射光束即成為照射至待測物上的掃描光。As shown in FIG. 1 , the
如圖1所示,自待測物處所返回的量測光,可能同時有第一偏振態及第二偏振態,後續係僅對第二偏振態進行調整。第二偏振態的量測光2P進入極化分光器310後可被透射,進而入射1/4波板320。第二偏振態的量測光2P經過1/4波板320後可成為左旋的圓偏振光2L(以微機電反射鏡模組400的觀察角度),經微機電反射鏡模組400的反射後,再次入射1/4波板320。入射至1/4波板320時,以1/4波板320的觀察角度來說,係為右旋的圓偏振光2R入射,出射後的雷射光束則改變為第一偏振態的量測光2S。極化分光器310反射第一偏振態的量測光2S,此量測光後續透過分光模組200可被反射至第二路徑,進而入射量測裝置600。As shown in FIG. 1 , the measurement light returned from the object to be measured may have a first polarization state and a second polarization state at the same time, and only the second polarization state is adjusted subsequently. The
此外,為了確保入射進極化分光器310的雷射光束為線性偏振光,如圖1的示例所示,於極化分光器310與分光模組200之間可進一步加入極化器330。該極化器330可以是具過濾性質的檢偏器或是可調整偏振方向的起偏器(例如1/2波板)。是以,該極化器330用於使通過之光線轉換為第一偏振態的光線。In addition, in order to ensure that the laser beam entering the
接著請同時參照圖1及圖2,圖2為本發明一實施例之光控制模組內使用1/4波板的原理示意圖。如圖2所示,1/4波板320左邊的入射光線為線性偏振光,具有線性偏振方向322,該線性偏振方向322與1/4波板320之光軸321間的夾角為θ。當夾角θ為±45度時,自1/4波板320右邊出射的光線會形成圓形偏振光。當夾角θ非為0度或±45度時,自1/4波板320右邊出射的光線會形成橢圓偏振光。Next, please refer to FIG. 1 and FIG. 2 at the same time. FIG. 2 is a schematic diagram of the principle of using a quarter wave plate in a light control module according to an embodiment of the present invention. As shown in FIG. 2 , the incident light on the left side of the
圖2示例者為夾角θ為45度,對於微機電反射鏡模組400來說,所觀察到的出射光線係為右旋的圓形偏振光。由於微機電反射鏡模組400係為反射鏡,故反射回1/4波板320的光線會恰好相反,亦即,右旋的圓形偏振光入射微機電反射鏡模組400後,反射出來的光線對於1/4波板320的觀察角度來說,變為左旋的圓形偏振光,進而藉由1/4波板320的特性讓左旋的圓形偏振光轉變回線性偏振光且偏振態亦被轉換(第一偏振態變為第二偏振態,或第二偏振態變為第一偏振態)。其中,在橢圓偏振光的狀態下亦同。In the example shown in FIG. 2 , the included angle θ is 45 degrees. For the
是以,1/4波板320與極化分光器310的搭配,使用在微機電反射鏡模組400上,即可具有光線通過極化分光器310時不會被大幅衰減強度的優點(因偏振態的匹配),且同時又可對微機電反射鏡模組400形成0度入射(因分光鏡的使用),讓雷射共焦量測系統達到低失真且低光強損耗的目的。Therefore, the combination of the 1/4
本發明在上文中已以較佳實施例揭露,然熟習本項技術者應理解的是,該實施例僅用於描繪本發明,而不應解讀為限制本發明之範圍。應注意的是,舉凡與該實施例等效之變化與置換,均應設為涵蓋於本發明之範疇內。因此,本發明之保護範圍當以申請專利範圍所界定者為準。The present invention has been disclosed above with preferred embodiments, but those skilled in the art should understand that the embodiments are only used to describe the present invention, and should not be construed as limiting the scope of the present invention. It should be noted that all changes and substitutions equivalent to this embodiment should be considered to be included within the scope of the present invention. Therefore, the protection scope of the present invention should be defined by the scope of the patent application.
100:雷射光源裝置
110:雷射源
120:光纖
130:準直透鏡
200:分光模組
300:光控制模組
310:極化分光器
320:1/4波板
321:光軸
322:線性偏振方向
330:極化器
400:微機電反射鏡模組
500:聚焦模組
511:掃描透鏡
512:鏡筒透鏡
520:分光裝置
530:物鏡
600:量測裝置
610:聚焦透鏡
620:針孔裝置
630:光電倍增管
700:載台
1P:第二偏振態的雷射光束
1S:第一偏振態的雷射光束
1R:右旋的圓偏振光
1L:左旋的圓偏振光
2P:第二偏振態的量測光
2R:右旋的圓偏振光
2L:左旋的圓偏振光
2S:第一偏振態的量測光
θ:夾角
100: Laser light source device
110: Laser source
120: Fiber
130: collimating lens
200: Spectral module
300: Light control module
310: Polarization beam splitter
320:1/4 wave plate
321: Optical axis
322: Linear polarization direction
330: Polarizer
400: MEMS mirror module
500: Focus Module
511: Scanning Lens
512: Tube lens
520: Spectroscopic device
530: Objective lens
600: Measuring device
610: Focusing Lens
620: Pinhole Device
630: Photomultiplier tube
700:
[圖1]係為本發明一實施例之雷射共焦量測系統的示意圖。 [圖2]係為本發明一實施例之光控制模組內使用1/4波板的原理示意圖。 1 is a schematic diagram of a laser confocal measurement system according to an embodiment of the present invention. [FIG. 2] is a schematic diagram of the principle of using a quarter wave plate in a light control module according to an embodiment of the present invention.
100:雷射光源裝置 100: Laser light source device
110:雷射源 110: Laser source
120:光纖 120: Fiber
130:準直透鏡 130: collimating lens
200:分光模組 200: Spectral module
300:光控制模組 300: Light control module
310:極化分光器 310: Polarization beam splitter
320:1/4波板 320:1/4 wave plate
330:極化器 330: Polarizer
400:微機電反射鏡模組 400: MEMS mirror module
500:聚焦模組 500: Focus Module
511:掃描透鏡 511: Scanning Lens
512:鏡筒透鏡 512: Tube lens
520:分光裝置 520: Spectroscopic device
530:物鏡 530: Objective lens
600:量測裝置 600: Measuring device
610:聚焦透鏡 610: Focusing Lens
620:針孔裝置 620: Pinhole Device
630:光電倍增管 630: Photomultiplier tube
700:載台 700: Stage
1P:第二偏振態的雷射光束 1P: Laser beam of second polarization state
1S:第一偏振態的雷射光束 1S: The laser beam of the first polarization state
1R:右旋的圓偏振光 1R: Right-handed circularly polarized light
1L:左旋的圓偏振光 1L: Left-handed circularly polarized light
2P:第二偏振態的量測光 2P: Measurement light of the second polarization state
2R:右旋的圓偏振光 2R: Right-handed circularly polarized light
2L:左旋的圓偏振光 2L: Left-handed circularly polarized light
2S:第一偏振態的量測光 2S: Measurement light of the first polarization state
Claims (10)
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