TW202037884A - Projection device and three-dimensional measurement apparatus - Google Patents

Projection device and three-dimensional measurement apparatus Download PDF

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TW202037884A
TW202037884A TW108138000A TW108138000A TW202037884A TW 202037884 A TW202037884 A TW 202037884A TW 108138000 A TW108138000 A TW 108138000A TW 108138000 A TW108138000 A TW 108138000A TW 202037884 A TW202037884 A TW 202037884A
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grating
pattern
light
shielding portion
period
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TW108138000A
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奧田學
大山剛
坂井田憲彥
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日商Ｃｋｄ股份有限公司
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    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B11/00—Measuring arrangements characterised by the use of optical techniques
    • G01B11/24—Measuring arrangements characterised by the use of optical techniques for measuring contours or curvatures
    • G01B11/25—Measuring arrangements characterised by the use of optical techniques for measuring contours or curvatures by projecting a pattern, e.g. one or more lines, moiré fringes on the object

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  • Length Measuring Devices By Optical Means (AREA)

Abstract

Projected are a projection device and a three-dimensional measurement apparatus that can improve measurement accuracy, etc., for carrying out three-dimensional measurement by using a pattern projection method. This projection device is provided with: a light source that emits prescribed light; a lattice unit 20 that converts the light from the light source into a stripe pattern; a projection lens unit that forms an image of the stripe pattern generated by the lattice unit 20 on a printed board; and a lattice unit moving mechanism 22 for displacing the lattice unit 20 and changing the phase of the stripe pattern projected on the printed board. The lattice unit 20 is provided with a fixed lattice plate 25, a movable lattice plate 26, and a lattice plate moving mechanism 27 for displacing the movable lattice plate 26 relatively to the fixed lattice plate 25 and changing the cycle of the stripe pattern projected on the printed board.

Description

投影裝置及三維測量裝置Projection device and three-dimensional measuring device

本發明係關於進行利用相移法等的圖案投影法之三維測量時，投影既定的圖案光之投影裝置及具備投影裝置之三維測量裝置。The present invention relates to a projection device that projects a predetermined pattern light and a three-dimensional measurement device provided with the projection device when performing three-dimensional measurement using a pattern projection method such as a phase shift method.

一般，在印刷基板上安裝電子零件時，首先係在配設於印刷基板上之既定的電極圖案上印刷焊膏。接著，依據該焊膏的黏性而將電子零件暫時固定在印刷基板上。之後，前述印刷基板被引導到迴焊(reflow)爐，經由既定的迴焊步驟，進行焊接。近年來，在被引導到迴銲爐的前階段，必須檢查焊膏的印刷狀態，進行這樣的檢查時有使用三維測量裝置之情況。Generally, when electronic components are mounted on a printed circuit board, a solder paste is first printed on a predetermined electrode pattern arranged on the printed circuit board. Then, the electronic components are temporarily fixed on the printed circuit board according to the viscosity of the solder paste. After that, the aforementioned printed circuit board is guided to a reflow furnace, and soldering is performed through a predetermined reflow step. In recent years, it is necessary to check the printing status of the solder paste before being guided to the reflow furnace, and there are cases where a three-dimensional measuring device is used for such inspection.

以往，已有提出各種投影既定的圖案光以進行三維測量之三維測量裝置。其中，利用相移法的三維測量裝置普遍為人所知。In the past, various three-dimensional measurement devices have been proposed for projecting a predetermined pattern of light for three-dimensional measurement. Among them, three-dimensional measuring devices using the phase shift method are generally known.

利用相移法的三維測量裝置係具備：投影裝置，從斜上方對印刷基板等的被測量物，投影具有條紋狀的光強度分布之圖案光(以下，稱為「條紋圖案」)；及攝像裝置，對投影有該條紋圖案的被測量物進行攝像。The three-dimensional measuring device using the phase shift method is equipped with: a projection device that projects patterned light with a striped light intensity distribution (hereinafter referred to as "striped pattern") on an object to be measured such as a printed circuit board from diagonally above; and The device images the object to be measured on which the stripe pattern is projected.

投影裝置具備發出既定光的光源、和將來自該光源的光轉換成條紋圖案之圖案生成部，在此產生的條紋圖案係透過由投影透鏡等構成的投影光學系對被測量物進行投影。The projection device includes a light source that emits predetermined light and a pattern generation unit that converts the light from the light source into a fringe pattern. The fringe pattern generated here projects the object to be measured through a projection optical system composed of a projection lens or the like.

在這種構成下，將投影到被測量物之條紋圖案的相位位移(shift)複數種(例如4種)，並且在相位相異的各條紋圖案下進行攝像，取得關於被測量物之複數種圖像資料。接著，依據此等圖像資料，進行被測量物的三維測量。In this configuration, multiple phase shifts (for example, 4) of the fringe pattern projected on the object are shifted, and images are taken under each fringe pattern with different phases to obtain multiple types of the object to be measured Image data. Then, based on these image data, three-dimensional measurement of the object to be measured is performed.

然而，實際上被測量高度的測量對象，高度有高有低者例如，以焊膏而言，以往印刷在一般的印刷基板上之焊膏的高度通常為100μm左右，惟近年來，隨著汽車的電動化而增加的車載用印刷基板等中，會搭載電源電路等，也有焊膏的高度成為300～400μm左右的情況。However, the height of the object to be measured is actually high or low. For example, in terms of solder paste, the height of solder paste printed on a general printed circuit board in the past is usually about 100μm. In the automotive printed circuit boards that have increased due to the increased motorization, power circuits and the like are mounted, and the height of the solder paste may be about 300 to 400 μm.

在此，例如，若配合車載用印刷基板，使用所投影之條紋圖案的周期比以往還長的三維測量裝置，則高度的動態範圍(dynamic range)會增加，雖然可進行車載用印刷基板的測量，但是將其使用於以往的一般的印刷基板的測量時，高度解析度會變粗，導致恐有測量精度惡化之虞。Here, for example, if a three-dimensional measuring device in which the period of the projected stripe pattern is longer than before is used in combination with a printed circuit board for vehicle, the dynamic range of the height will increase, although the measurement of printed circuit board for vehicle can be performed However, when it is used in the measurement of a conventional general printed circuit board, the high resolution will become coarse, which may cause the measurement accuracy to deteriorate.

因此，為了使三維測量裝置具有汎用性，必須以在印刷基板等被測量物的凹凸程度大時會投影周期長的條紋圖案，在凹凸程度小時會投影周期短的條紋圖案之類的方式，投影因應被測量物的凹凸程度之條紋圖案。Therefore, in order to make the 3D measurement device versatile, it is necessary to project a stripe pattern with a long period when the degree of unevenness of a printed circuit board and other objects to be measured is large, and a method such as projecting a stripe pattern with a short period when the degree of unevenness is small. Stripe pattern corresponding to the degree of unevenness of the measured object.

然而，作為圖案生成部，於使用在薄膜、玻璃板等上印刷有光柵圖案之習知的光柵板的情況，由於無法變更所印刷之光柵圖案的寬度、間距，故投影於被測量物的條紋圖案係成為一定。However, as the pattern generator is used in the case of a conventional grating plate in which a grating pattern is printed on a film, glass plate, etc., since the width and pitch of the printed grating pattern cannot be changed, the stripes projected on the object to be measured The pattern system becomes a certainty.

因此，假使想要藉由使用光柵板的三維測量裝置，投影依被測量物的凹凸程度而相異的條紋圖案時，會產生事先準備複數個所印刷之光柵圖案的寬度、間距不同的光柵板，並依具被測量物的凹凸程度，分別使用此等光柵板之必要性。像這樣，每次都必須交換光柵板的三維測量裝置，其便利性差，會有導致生產性降低之虞。Therefore, if a three-dimensional measuring device using a grating plate is used to project fringe patterns that vary according to the degree of unevenness of the object to be measured, a plurality of grating plates with different widths and pitches of the printed grating patterns will be prepared in advance. And according to the degree of unevenness of the object to be measured, it is necessary to use these grating plates. In this way, the three-dimensional measurement device of the grating plate must be exchanged every time, which is inconvenient and may cause a decrease in productivity.

另一方面，作為圖案生成部，也有使用複數個畫素二維配列成矩陣狀而成的液晶元件等之三維測量裝置等。On the other hand, as the pattern generation unit, there is also a three-dimensional measuring device or the like using a liquid crystal element in which a plurality of pixels are arranged in a two-dimensional matrix.

然而，習知的液晶元件由於畫素與畫素之間會成為暗部，故所生成的條紋圖案會在微觀上會變成不連續，故投影在被測量物的條紋圖案不會成為假定的條紋圖案，會有三維測量的測量精度降低之虞。However, the conventional liquid crystal element has a dark area between pixels, so the generated stripe pattern will become discontinuous in the microscopic view, so the stripe pattern projected on the object to be measured will not become an assumed stripe pattern , The measurement accuracy of 3D measurement may be reduced.

對此，近年來，也有提出為了解決上述不良情況，而使用特殊的液晶元件，依據被測量物的凹凸程度，變更光柵圖案的寬度、間距，可投影不同周期的條紋圖案之三維測量裝置(例如，參照專利文獻1)。In response to this, in recent years, in order to solve the above problems, a special liquid crystal element is used to change the width and pitch of the grating pattern according to the degree of unevenness of the object to be measured, and a three-dimensional measuring device that can project fringe patterns of different periods (such as , Refer to Patent Document 1).

具體而言，專利文獻1所記載的三維測量裝置係構成為：在液晶元件形成N條具有一定的間距與寬度之條紋狀電極，以3或4之倍數的電極數n將前述條紋狀電極分割成N/n個群組，依各群組一條一條形成具有正弦波狀的強度分布之光柵，依據前述電極數n將前述正弦波的一周期分割成n等分，將與該分割之各區域的正弦波的振幅、和該正弦波的偏差強度的和的強度對應之液晶驅動信號施加於前述條紋電極的每一者以產生N/n條具有正弦波強度分布的光柵圖案(條紋圖案)，並且以將該光柵圖案的一周期分割成3份或4份的周期作為單位，令施加於前述條紋電極之前述液晶驅動信號的電壓施加的配列依序改變，令前述光柵圖案的相位按2π/3或π/2間距位移(shift)，使前述電極數n改變，藉此形成適合於所測定之物體的表面形狀之光柵圖案。 [先前技術文獻] [專利文獻]Specifically, the three-dimensional measuring device described in Patent Document 1 is configured to form N stripe-shaped electrodes having a constant pitch and width on a liquid crystal element, and divide the stripe-shaped electrodes by the number n of electrodes that is a multiple of 3 or 4. In N/n groups, a grating with a sine wave-like intensity distribution is formed one by one in each group. According to the number of electrodes n, a period of the sine wave is divided into n equal parts, and the divided regions The liquid crystal drive signal corresponding to the amplitude of the sine wave and the intensity of the sum of the deviation intensities of the sine wave is applied to each of the aforementioned stripe electrodes to generate N/n grating patterns (stripe patterns) with sine wave intensity distribution, And by dividing a period of the grating pattern into 3 or 4 periods as a unit, the arrangement of the voltage application of the liquid crystal driving signal applied to the stripe electrode is sequentially changed, so that the phase of the grating pattern is 2π/ A shift of 3 or π/2 pitch changes the number n of the aforementioned electrodes, thereby forming a grating pattern suitable for the surface shape of the object to be measured. [Prior Technical Literature] [Patent Literature]

[專利文獻1]日本特開平11-83454號公報[Patent Document 1] JP 11-83454 A

[發明欲解決之課題][The problem to be solved by the invention]

然而，在專利文獻1的構成中，上述特殊的液晶元件是必要的，恐有投影裝置的製造成本增大之虞。However, in the structure of Patent Document 1, the above-mentioned special liquid crystal element is necessary, and the manufacturing cost of the projection device may increase.

再者，由於液晶元件係隔介偏光薄膜，所以恐有投影到被測量物的條紋圖案變暗之虞。其結果，恐有無法取得精度佳的亮度圖像資料，導致三維測量的測量精度降低之虞。Furthermore, since the liquid crystal element is a dielectric polarizing film, there is a possibility that the stripe pattern projected on the object may become dark. As a result, there is a possibility that high-precision luminance image data cannot be obtained, which may reduce the measurement accuracy of the three-dimensional measurement.

此外，上述課題未必限於印刷在印刷基板上之焊膏等的三維測量，於其他的三維測量領域中亦是固有的。當然，並非限定於相移法的問題。In addition, the above-mentioned problems are not necessarily limited to the three-dimensional measurement of solder paste printed on a printed circuit board, and are inherent in other three-dimensional measurement fields. Of course, it is not limited to the phase shift method.

本發明係有鑑於上述情事而完成者，其目的在提供一種在進行利用圖案投影法的三維測量時可謀求測量精度的提升等之投影裝置及三維測量裝置。 [用以解決課題之手段]The present invention was made in view of the above circumstances, and its object is to provide a projection device and a three-dimensional measurement device that can improve measurement accuracy when performing three-dimensional measurement using a pattern projection method. [Means to solve the problem]

以下，針對適於解決上述課題的各手段，分項進行說明。另外，視需要，於對應的手段附註其特有的作用效果。Hereinafter, each means suitable for solving the above-mentioned problems will be explained separately. In addition, if necessary, add specific effects to the corresponding means.

手段1.一種投影裝置，係在進行關於既定的被測量物(例如印刷基板)之三維測量時，對前述被測量物投影既定的圖案光，其特徵為： 具備： 發出既定光之光源； 將從前述光源射入的光轉換成圖案光並射出之圖案生成部；及 使從前述圖案生成部射出的圖案光對前述被測量物成像之投影光學系； 前述圖案生成部係藉由複數個光柵構件配置成在與第1方向(例如水平方向)正交的第2方向(例如上下方向)上相對向，並且具備可變更前述複數個光柵構件相對於前述第1方向的相對位置關係之光柵移動手段，而構成為可對投影到前述被測量物之圖案光的周期進行變更，其中該複數個光柵構件具有光柵圖案，該光柵圖案係以既定的透射率透射光之透光部、和遮住至少一部分的光之遮光部在前述第1方向交替排列而成。Means 1. A projection device that projects a predetermined pattern of light on the object to be measured when performing three-dimensional measurement on a predetermined object to be measured (for example, a printed circuit board), and is characterized by: have: A light source that emits a predetermined light; A pattern generating part that converts the light incident from the aforementioned light source into pattern light and emits it; and A projection optical system that makes the pattern light emitted from the pattern generating unit image the object to be measured; The pattern generation unit is configured to face each other in a second direction (e.g., up and down direction) orthogonal to the first direction (e.g., horizontal direction) by using a plurality of grating members, and is provided with the ability to change the plurality of grating members relative to the aforementioned The grating moving means for the relative positional relationship in the first direction is configured to change the period of the pattern light projected on the object to be measured, wherein the plurality of grating members have a grating pattern, and the grating pattern has a predetermined transmittance The light-transmitting parts that transmit light and the light-shielding parts that shield at least a part of the light are alternately arranged in the first direction.

另外，「光柵構件」係包含：在藉由例如玻璃、丙烯酸樹脂等的透光材料形成平板狀或薄膜狀而成的基材上，印刷(蒸鍍)形成有光柵圖案者；藉由對不透明樹脂、金屬等進行加工並形成狹縫等的開口，而形成有光柵圖案者等。In addition, the "grating member" includes: a substrate formed by a light-transmitting material such as glass, acrylic resin, etc., in a flat or film shape, and a grating pattern formed by printing (evaporation); Resin, metal, etc. are processed to form openings such as slits, and grating patterns are formed.

根據上述手段，藉由使用複數個光柵構件構成將來自光源的光轉換成圖案光之圖案生成部，可進行比使用液晶光柵等的情況更明亮之圖案光的投影。According to the above-mentioned means, by using a plurality of grating members to constitute the pattern generating unit that converts the light from the light source into the pattern light, it is possible to project brighter pattern light than when using a liquid crystal grating or the like.

又，藉由具備變更複數個光柵構件的相對位置關係之光柵移動手段，可在不交換光柵構件下，變更投影到被測量物之圖案光的周期(間距)。Furthermore, by providing a grating moving means for changing the relative positional relationship of a plurality of grating members, it is possible to change the period (pitch) of the pattern light projected on the object without replacing the grating members.

再者，由於可使用在玻璃板等基材上印刷有光柵圖案之既有光柵板等的廉價光學構件，故與使用液晶元件等的高價光學控制元件作為圖案生成部的情況相比，可抑制圖案生成部的製造成本。Furthermore, since inexpensive optical members such as existing grating plates with grating patterns printed on substrates such as glass plates can be used, it can be suppressed compared to the case where expensive optical control elements such as liquid crystal elements are used as the pattern generation unit. Manufacturing cost of the pattern generator.

此外，如使用既有的液晶元件等的情況般，也不需要進行畫素的控制，可謀求控制的簡化，並且也不會有所生成的圖案光在微觀上成為不連續之情況，所以可將更理想的圖案光投影到被測量物。In addition, as in the case of using existing liquid crystal elements, etc., there is no need to control the pixels, the control can be simplified, and the generated pattern light will not be microscopically discontinuous, so it can be Project a more ideal pattern light onto the object to be measured.

手段2.如手段1之投影裝置，其中形成於前述複數個光柵構件的光柵圖案係相同。Means 2. The projection device of means 1, wherein the grating patterns formed on the plurality of grating members are the same.

根據上述手段2，藉由使用具有相同的光柵圖案之複數個光柵構件，可謀求圖案生成部的構成的簡化、光柵構件的移動控制的簡化、抑制製造成本的增加等。According to the aforementioned means 2, by using a plurality of grating members having the same grating pattern, it is possible to achieve simplification of the structure of the pattern generator, simplification of movement control of the grating member, and suppression of increase in manufacturing cost.

在此，上述「光柵圖案相同」意指：前述第1方向之前述透光部的寬度相同、前述第1方向之前述遮光部的寬度相同、前述第1方向之前述透光部與前述遮光部的比相同、以及前述第1方向之前述透光部及前述遮光部的形成間距相同。Here, the "same grating pattern" means: the width of the light-transmitting portion in the first direction is the same, the width of the light-shielding portion in the first direction is the same, and the light-transmitting portion and the light-shielding portion in the first direction are the same. The ratio is the same, and the formation pitch of the light-transmitting portion and the light-shielding portion in the first direction is the same.

此外，關於重疊有複數個光柵構件的光柵圖案之合成光柵圖案中的透光部和遮光部之比，係以完全相同較佳，亦可為大致相同。只要成為大致相同，則在進行利用圖案投影法的三維測量方面可生成精確度充分的圖案光。In addition, with regard to the ratio of the light-transmitting portion and the light-shielding portion in the composite grating pattern in which a plurality of grating members are superimposed, it is preferable that they are completely the same, or may be substantially the same. As long as they are substantially the same, it is possible to generate pattern light with sufficient accuracy in performing three-dimensional measurement using the pattern projection method.

手段3.如手段1或2之投影裝置，其中， 前述圖案生成部係構成為以在與前述第2方向相對向的兩個前述光柵構件中之一光柵構件的前述光柵圖案的遮光部、和另一光柵構件的前述光柵圖案的遮光部在前述第1方向相連之方式，配置前述兩個光柵構件，藉此可生成長周期的圖案光， 且構成為前述一光柵構件的前述光柵圖案的遮光部、和前述另一光柵構件的前述光柵圖案的遮光部在前述第1方向分開之方式，配置前述兩個光柵構件，藉此可生成短周期的圖案光。Means 3. Such as means 1 or 2 projection device, in which, The pattern generation unit is configured such that the light shielding portion of the grating pattern of one of the two grating members facing the second direction and the light shielding portion of the grating pattern of the other grating member are in the first One-direction connection, arranging the aforementioned two grating members, by which long-period patterned light can be generated, In addition, the light shielding portion of the grating pattern of the one grating member and the light shielding portion of the grating pattern of the other grating member are separated in the first direction, and the two grating members are arranged, whereby a short period can be generated Pattern light.

根據上述手段3，可對長周期的圖案光與短周期的圖案光之兩種圖案光進行切換並投影，該長周期的圖案光係藉一光柵構件的遮光部所生成之圖案光的暗部、和藉另一光柵構件的遮光部所生成之圖案光的暗部相連而成，該短周期的圖案光係藉一光柵構件的遮光部所生成之圖案光的暗部、和藉另一光柵構件的遮光部所生成之圖案光的暗部分離而成。According to the above-mentioned means 3, it is possible to switch and project two kinds of pattern light of long-period pattern light and short-period pattern light. The long-period pattern light is the dark part of the pattern light generated by the shading part of a grating member. It is connected to the dark part of the pattern light generated by the light-shielding part of another grating member. The short-period pattern light is the dark part of the pattern light generated by the light-shielding part of one grating member and the light-shielding by another grating member The dark part of the pattern light generated by the part is separated.

手段4.如手段3之投影裝置，其中 前述圖案生成部係構成為前述一光柵構件之前述光柵圖案的遮光部的第1方向一端側之端部位置、和另一光柵構件之前述光柵圖案的遮光部的第1方向另一端側之端部位置成為在第1方向相同位置之方式，配置前述兩個光柵構件，藉此可生成前述長周期的圖案光。Means 4. As the projection device of means 3, where The pattern generating section is configured as an end position of the light shielding portion of the grating pattern of the one grating member at one end side in the first direction, and an end of the light shielding portion of the grating pattern of the other grating member at the other end side in the first direction The part positions are the same in the first direction, and the two grating members are arranged to generate the long-period pattern light.

根據上述手段4，可以長周期的圖案光及短周期的圖案光兩者，將明部與暗部的比設成相同。其結果，可對被測量物投影更理想的圖案光。According to the aforementioned means 4, it is possible to make the ratio of the bright part and the dark part the same for both the long-period pattern light and the short-period pattern light. As a result, more ideal pattern light can be projected on the object to be measured.

手段5.如手段3之投影裝置，其中前述圖案生成部係構成為以包含前述一光柵構件之前述光柵圖案的遮光部的第1方向一端部之既定範圍、和包含前述另一光柵構件之前述光柵圖案的遮光部的第1方向另一端部之既定範圍在前述第1方向上重疊之方式配置前述兩個光柵構件，藉此可生成前述長周期的圖案光。Means 5. The projection device of means 3, wherein the pattern generating unit is configured to include a predetermined range of one end of the light shielding portion of the grating pattern of the grating member in the first direction, and the predetermined range including the other grating member The two grating members are arranged such that the predetermined range of the other end of the light shielding portion of the grating pattern overlaps in the first direction, whereby the pattern light of the long period can be generated.

根據上述手段5，藉由相對向之兩個光柵構件的遮光部的一部分重疊，可降低來自該兩遮光部間的漏光。結果，可對被測量物投影更理想的圖案光。According to the aforementioned means 5, by partially overlapping the light-shielding portions of the two grating members facing each other, light leakage from between the two light-shielding portions can be reduced. As a result, more ideal pattern light can be projected on the object to be measured.

手段6.如手段1至5中任一者之投影裝置，其中前述複數個光柵構件係由一個固定的固定光柵構件、和設置成可相對於該固定光柵構件相對變位之至少一個可動光柵構件所構成。Means 6. The projection device according to any one of means 1 to 5, wherein the plurality of grating members are composed of a fixed fixed grating member and at least one movable grating member arranged to be relatively displaced relative to the fixed grating member Constituted.

根據上述手段6，可謀求光柵構件之移動控制的簡化，並且藉由具有固定光柵構件，可使圖案光的投影位置(投影基準位置)穩定。According to the aforementioned means 6, it is possible to simplify the movement control of the grating member, and by having a fixed grating member, the projection position (projection reference position) of the pattern light can be stabilized.

手段7.如手段1至6中任一手段之投影裝置，其中前述遮光部係由透射率不同的複數個部位所構成。Means 7. The projection device according to any one of means 1 to 6, wherein the shading part is composed of a plurality of parts with different transmittances.

根據上述手段7，可在透射率高的部位(例如透光部)、與透射率低的部位(例如遮光部中之透射率更低的部位)之間，設置透射率為中等程度的部位，並可對被測量物投影更理想的圖案光。According to the aforementioned means 7, it is possible to provide a part with a medium transmittance between a part with high transmittance (for example, a light-transmitting part) and a part with a low transmittance (for example, a part with a lower transmittance in a light-shielding part). And it can project more ideal pattern light to the measured object.

手段8.如手段1至7中任一者之投影裝置，其係構成為可投影具有條紋狀(例如正弦波狀)的光強度分布之圖案光作為前述圖案光。Means 8. The projection device according to any one of means 1 to 7, which is configured to project pattern light having a striped (for example, sinusoidal) light intensity distribution as the aforementioned pattern light.

根據上述手段8，藉由投影具有條紋狀的光強度分布之圖案光，可進行藉由相移法的三維測量。結果，可謀求提升三維測量的測量精度。According to the aforementioned means 8, by projecting patterned light having a striped light intensity distribution, three-dimensional measurement by the phase shift method can be performed. As a result, the measurement accuracy of three-dimensional measurement can be improved.

如相移法所示，在依據於相位不同的圖案光下攝像並取得的複數個圖像資料之亮度值的差異，進行三維測量的構成中，即便亮度值的誤差很小，也有對測量精度造成非常大的影響之虞慮。因此，在本手段的構成下，更能達成上述各手段的作用效果。尤其，具有正弦波狀的光強度分布之圖案光由於光強度分布(波形)容易崩潰，所以被要求高的投影精度。As shown in the phase shift method, in a configuration that performs three-dimensional measurement based on the difference in the brightness values of a plurality of image data captured and acquired under patterned light with different phases, even if the brightness value error is small, the measurement accuracy The fear of causing a very large impact. Therefore, with the configuration of this means, the functions and effects of the above-mentioned means can be more achieved. In particular, pattern light having a sine wave-like light intensity distribution is likely to collapse due to the light intensity distribution (waveform), so high projection accuracy is required.

手段9.一種三維測量裝置，其特徵為︰ 如請求項1至8中任一項之投影裝置； 攝像手段，可對被投影前述圖案光之前述被測量物的既定範圍進行攝像；及 圖像處理手段，可依據藉由前述攝像手段所攝像並取得的圖像資料，執行關於前述被測量物的三維測量。Means 9. A three-dimensional measuring device characterized by: Such as the projection device of any one of claims 1 to 8; The imaging means can image the predetermined range of the object to be measured on which the pattern light is projected; and The image processing means can perform three-dimensional measurement of the object to be measured based on the image data captured and obtained by the aforementioned imaging means.

根據上述手段9，可利用從如手段1至8中任一者的投影裝置所投影的圖案光來進行三維測量。通常，在進行利用圖案投影法的三維測量之際，係將從既定的光源射出的光在圖案生成部中轉換成既定的圖案光，並透過投影光學系對被測量物進行投影。且，藉由攝像手段對投影有圖案光的被測量物進行攝像，根據所取得的圖像資料進行被測量物的三維測量。According to the aforementioned means 9, it is possible to perform three-dimensional measurement using patterned light projected from a projection device such as any one of means 1 to 8. Generally, when performing three-dimensional measurement using a pattern projection method, the light emitted from a predetermined light source is converted into a predetermined pattern light in a pattern generation unit, and the object to be measured is projected through a projection optical system. In addition, the object to be measured on which the pattern light is projected is captured by the imaging means, and the three-dimensional measurement of the object is performed based on the acquired image data.

更具體而言，作為利用從上述手段8之投影裝置所投影的圖案光來進行利用相移法之三維測量的三維測量裝置的一例係列舉如下： 「一種三維測量裝置，其特徵為具備： 如手段8之投影裝置； 攝像手段，可對被投影有前述圖案光之前述被測量物的既定範圍進行攝像； 圖案光變位手段，使藉前述投影裝置投影的圖案光、與前述被測量物之相對位置關係(相位)改變；及 圖像處理手段，可在前述圖案光與前述被測量物的相對位置關係不同的狀態下，依據藉前述攝像手段攝像並取得之關於前述被測量物的複數個圖像資料，利用相移法執行關於前述被測量物之三維測量。」。More specifically, as an example series of three-dimensional measurement devices that perform three-dimensional measurement using the phase shift method using patterned light projected from the projection device of the above-mentioned means 8 are as follows: "A three-dimensional measuring device characterized by: Such as means 8 projection device; The imaging means can capture the predetermined range of the object to be measured on which the pattern light is projected; Pattern light displacement means to change the relative positional relationship (phase) between the pattern light projected by the aforementioned projection device and the aforementioned object to be measured; and The image processing means can use the phase shift method based on the multiple image data about the object to be measured and obtained by the imaging means under the state that the relative positional relationship between the pattern light and the object to be measured is different Regarding the three-dimensional measurement of the aforementioned object. ".

此外，作為上述「被測量物」，係可舉出例如印刷有焊膏之印刷基板等。亦即，藉由使用上述各手段所記載的投影裝置，可進行印刷於印刷基板之焊膏的三維測量。進而，在焊膏的檢查中，可根據該測量值進行焊膏之良否判定。因此，在該檢查中，可達成上述各手段的作用效果，能夠以良好精度進行良否判定。結果，可謀求焊料印刷檢查裝置中之檢查精度的提升。In addition, as the aforementioned "object to be measured", for example, a printed circuit board on which solder paste is printed or the like can be cited. That is, by using the projection device described in each of the above methods, three-dimensional measurement of solder paste printed on a printed circuit board can be performed. Furthermore, in the solder paste inspection, the quality of the solder paste can be judged based on the measured value. Therefore, in this inspection, the effect of each of the above-mentioned means can be achieved, and the quality judgment can be performed with good accuracy. As a result, the inspection accuracy in the solder printing inspection device can be improved.

[用以實施發明的形態][Form to implement the invention]

〔第1實施形態〕 以下，針對一實施形態，一邊參照圖式一邊進行說明。首先，針對本實施形態中作為被測量物之印刷基板1的構成詳細地說明(參照圖2、3)。圖2係顯示印刷基板1的概略構成之平面示意圖。圖3係印刷基板1的剖面示意圖。[First Embodiment] Hereinafter, an embodiment will be described with reference to the drawings. First, the configuration of the printed circuit board 1 as the object to be measured in this embodiment will be described in detail (refer to FIGS. 2 and 3). FIG. 2 is a schematic plan view showing the schematic configuration of the printed circuit board 1. FIG. 3 is a schematic cross-sectional view of the printed circuit board 1.

如圖2、3所示，印刷基板1係在由玻璃環氧樹脂等所構成之平板狀基底基板2的表面上，形成由銅箔所構成的電極圖案3A、連接盤(land)3B而成。在基底基板2的表面上，於除了連接盤3B及其附近的部分塗布有阻劑膜4。且，在連接盤3B上印刷焊膏5。As shown in Figures 2 and 3, the printed circuit board 1 is formed by forming electrode patterns 3A and lands 3B made of copper foil on the surface of a flat base substrate 2 made of glass epoxy resin or the like. . On the surface of the base substrate 2, a resist film 4 is applied to portions other than the land 3B and its vicinity. And, the solder paste 5 is printed on the land 3B.

此外，本實施形態的印刷基板1係例如搭載於電動汽車等的車載用印刷基板，係為逆變器電路(inverter circuit)等安裝流通較大的負載電流的電子零件之電源電路部PA、控制其之控制電路等安裝流通較小的信號電流之電子零件的控制電路部PB混合存在之構成。In addition, the printed circuit board 1 of the present embodiment is, for example, a printed circuit board for in-vehicle use mounted on an electric vehicle, etc., and is a power supply circuit unit PA and a control circuit for mounting electronic components such as an inverter circuit (inverter circuit) that flows a large load current. The control circuit, etc., is composed of a mixture of control circuit parts PB equipped with electronic components that flow small signal currents.

其次，就構成本實施形態之三維測量裝置的基板檢查裝置10詳細地說明(參照圖1)。圖1係表示基板檢查裝置10的概略構成之示意圖。以下，將圖1的圖面左右方向設為「X軸方向」，圖面前後方向設為「Y軸方向」，圖面上下方向(鉛直方向)設為「Z軸方向」來說明。Next, the substrate inspection apparatus 10 constituting the three-dimensional measuring apparatus of the present embodiment will be described in detail (refer to FIG. 1). FIG. 1 is a schematic diagram showing the schematic configuration of a substrate inspection apparatus 10. Hereinafter, the left-right direction of the drawing in FIG. 1 is referred to as the "X-axis direction", the front and back direction of the drawing is referred to as the "Y-axis direction", and the vertical direction (vertical direction) on the drawing is referred to as the "Z-axis direction".

基板檢查裝置10係對印刷於印刷基板1之焊膏5的印刷狀態進行檢查之焊料印刷檢查裝置。基板檢查裝置10具備有：搬送機構11，進行印刷基板1的搬送、定位等；檢查單元12，用以進行印刷基板1的檢查；及控制裝置13，用以實施搬送機構11、檢查單元12的驅動控制等基板檢查裝置10內的各種控制、圖像處理、運算處理(參照圖6)。The board inspection device 10 is a solder printing inspection device that inspects the printing state of the solder paste 5 printed on the printed board 1. The substrate inspection device 10 is provided with: a transport mechanism 11 for transporting and positioning the printed circuit board 1; an inspection unit 12 for inspecting the printed circuit board 1; and a control device 13 for implementing the transport mechanism 11 and the inspection unit 12 Various controls, image processing, and arithmetic processing in the substrate inspection apparatus 10 such as drive control (see FIG. 6).

搬送機構11係具備：沿著印刷基板1的搬送方向(Y軸方向)配置之一對搬送軌道11a；以可對各搬送軌道11a旋轉的方式配設之環狀輸送帶11b；驅動該輸送帶11b之馬達等的驅動手段(省略圖示)；和用以將印刷基板1定位於既定位置之挾持機構(省略圖示)；並可藉控制裝置13進行驅動控制。The conveying mechanism 11 is provided with: a pair of conveying rails 11a arranged along the conveying direction (Y-axis direction) of the printed circuit board 1; an endless conveyor belt 11b arranged so as to be rotatable with respect to each conveying track 11a; and driving the conveying belt 11b, a motor and other driving means (not shown); and a holding mechanism (not shown) for positioning the printed circuit board 1 at a predetermined position; and the control device 13 can be used for driving control.

在上述構成下，朝基板檢查裝置10搬入的印刷基板1，其與搬送方向正交之寬度方向(X軸方向)的兩側緣部係分別***搬送軌道11a，並載置於輸送帶11b上。接著，輸送帶11b開始動作，印刷基板1被搬送至既定的檢查位置。一旦印刷基板1到達檢查位置，輸送帶11b便停止，同時挾持機構作動。藉由此挾持機構的動作，輸送帶11b被往上推，成為藉由輸送帶11b與搬送軌道11a的上邊部挾持有印刷基板1的兩側緣部之狀態。藉此，印刷基板1被定位固定於檢查位置。當檢查完成時，便解除藉由挾持機構的固定，同時輸送帶11b開始動作。藉此，印刷基板1從基板檢查裝置10被搬出。當然，搬送機構11的構成不限定於上述形態，亦可採用其他構成。With the above configuration, the printed circuit board 1 carried into the board inspection apparatus 10 has its side edges in the width direction (X-axis direction) orthogonal to the conveying direction inserted into the conveying rail 11a and placed on the conveyor belt 11b. . Next, the conveyor belt 11b starts to move, and the printed circuit board 1 is transported to a predetermined inspection position. Once the printed circuit board 1 reaches the inspection position, the conveyor belt 11b stops and the pinching mechanism operates. By the action of the nipping mechanism, the conveyor belt 11b is pushed up, and the upper edges of the conveyor belt 11b and the conveyance rail 11a are in a state where both side edges of the printed circuit board 1 are nipped. Thereby, the printed circuit board 1 is positioned and fixed to the inspection position. When the inspection is completed, the fixing by the pinching mechanism is released, and the conveyor belt 11b starts to move at the same time. Thereby, the printed circuit board 1 is carried out from the board inspection apparatus 10. Of course, the structure of the conveying mechanism 11 is not limited to the above-mentioned form, and other structures may be adopted.

檢查單元12係配設在印刷基板1的搬送路(一對搬送軌道11a)的上方。檢查單元12係具備︰投影裝置14，從斜上方對印刷基板1上的既定檢查範圍投影條紋圖案W(參照圖4)；作為攝像手段的相機15，從正上方對投影有該條紋圖案W之印刷基板1上的既定檢查範圍進行攝像；X軸移動機構16(參照圖6)，可朝X軸方向移動；及Y軸移動機構17(參照圖6)，可朝Y軸方向移動；藉由控制裝置13進行驅動控制。The inspection unit 12 is arranged above the conveyance path (a pair of conveyance rails 11a) of the printed circuit board 1. The inspection unit 12 is provided with: a projection device 14 for projecting a stripe pattern W (see FIG. 4) on a predetermined inspection area on the printed circuit board 1 from diagonally above; a camera 15 as an imaging means projecting the stripe pattern W from directly above The predetermined inspection range on the printed circuit board 1 is imaged; the X-axis moving mechanism 16 (refer to Figure 6), which can move in the X-axis direction; and the Y-axis moving mechanism 17 (refer to Figure 6), which can move in the Y-axis direction; by The control device 13 performs drive control.

此外，如圖2所示，印刷基板1上之既定的檢查範圍，係以相機15的攝像視野(攝像範圍)K的大小作為1單位預先設定在印刷基板1上之複數個區域(檢查範圍「1」～「15」)中的一個區域。In addition, as shown in FIG. 2, the predetermined inspection range on the printed circuit board 1 is a plurality of areas (inspection range "inspection range") preset on the printed circuit board 1 with the size of the imaging field of view (imaging range) K of the camera 15 as a unit. 1"～"15").

控制裝置13係可藉由驅動控制X軸移動機構16及Y軸移動機構17，將檢查單元12(攝像視野K)朝定位固定於檢查位置之印刷基板1上的任意檢查範圍的上方位置移動。構成為一邊使檢查單元12依序移動至設定在印刷基板1上的複數個檢查範圍，一邊逐漸執行各檢查範圍的檢查處理，藉此執行印刷基板1的整個區域之焊料印刷檢查。The control device 13 can drive and control the X-axis moving mechanism 16 and the Y-axis moving mechanism 17 to move the inspection unit 12 (imaging field of view K) to the upper position of an arbitrary inspection range on the printed circuit board 1 positioned and fixed at the inspection position. The inspection unit 12 is configured to sequentially move to a plurality of inspection ranges set on the printed circuit board 1 while gradually performing inspection processing of each inspection range, thereby performing solder printing inspection of the entire area of the printed circuit board 1.

如圖5所示，投影裝置14係具備︰發出既定光的光源19；作為圖案生成部的光柵單元20，係將來自該光源19的光轉換成條紋圖案W；作為投影光學系的投影透鏡單元21，係將藉該光柵單元20生成的條紋圖案W成像於印刷基板1上；以及光柵單元移動機構22，係使光柵單元20變位，用以使投影到印刷基板1之條紋圖案W的相位改變(參照圖7)；且藉由控制裝置13進行驅動控制。As shown in FIG. 5, the projection device 14 is equipped with: a light source 19 that emits predetermined light; a grating unit 20 as a pattern generation unit that converts light from the light source 19 into a striped pattern W; and a projection lens unit as a projection optical system 21. The fringe pattern W generated by the grating unit 20 is imaged on the printed substrate 1; and the grating unit moving mechanism 22 is to displace the grating unit 20 to make the phase of the fringe pattern W projected on the printed substrate 1 Change (refer to FIG. 7); and drive control by the control device 13.

投影裝置14係以其光軸J1與X-Z平面平行，且相對於Z軸方向傾斜既定角度α(例如30°)之方式配置。The projection device 14 is arranged such that its optical axis J1 is parallel to the X-Z plane and is inclined by a predetermined angle α (for example, 30°) with respect to the Z axis direction.

光源19係由射出白色光的鹵素燈(halogen lamp)構成。從光源19射出的光係在透過未圖示的前處理透鏡群等而經平行光化的狀態下沿著光軸J1射入光柵單元20。The light source 19 is composed of a halogen lamp that emits white light. The light system emitted from the light source 19 enters the grating unit 20 along the optical axis J1 in a state of being parallelized by passing through a pre-processing lens group not shown or the like.

在此，參照圖7，詳細地說明關於光柵單元20的構成。圖7係表示光柵單元20的概略構成之示意圖。Here, referring to FIG. 7, the structure of the grating unit 20 will be described in detail. FIG. 7 is a schematic diagram showing the schematic configuration of the grating unit 20.

此外，就光柵單元20單體進行說明時，權宜上，以圖7的圖面左右方向作為「X´軸方向」，圖面前後方向作為「Y´軸方向」，圖面上下方向作為「Z´軸方向」來進行說明。In addition, when describing the grating unit 20 alone, expediently, the left and right direction of the drawing in Fig. 7 is taken as the "X´ axis direction", the front and back direction of the drawing is taken as the "Y´ axis direction", and the vertical direction on the drawing is taken as "Z ´Axis direction" for explanation.

其中，用於說明光柵單元20單體的座標系(X´,Y´,Z´)、與用於說明基板檢查裝置10(投影裝置14)整體的座標系(X,Y,Z)是不同的座標系。在此，「X´軸方向」相當於本實施形態的「第1方向」，「Z´軸方向」相當於「第2方向」。Among them, the coordinate system (X´, Y´, Z´) used to describe the grating unit 20 alone is different from the coordinate system (X, Y, Z) used to describe the entire substrate inspection device 10 (projection device 14) The coordinate system. Here, the "X´ axis direction" corresponds to the "first direction" of this embodiment, and the "Z´ axis direction" corresponds to the "second direction".

如圖7所示，光柵單元20係具備有︰構成其外殻的本體殼部24；設置於該本體殼部24內之作為固定光柵構件的固定光柵板25及作為可動光柵構件的可動光柵板26；及用以使可動光柵板26相對於該固定光柵板25相對地變位，且變更投影至印刷基板1之條紋圖案W的周期之光柵板移動機構(圖案周期變更機構)27。光柵板移動機構27係構成本實施形態的光柵移動手段。As shown in FIG. 7, the grating unit 20 is provided with: a main body casing 24 constituting its outer shell; a fixed grating plate 25 as a fixed grating member and a movable grating plate as a movable grating member provided in the main casing 24 26; and a grating plate moving mechanism (pattern cycle changing mechanism) 27 for making the movable grating plate 26 relatively displaced relative to the fixed grating plate 25 and changing the period of the stripe pattern W projected to the printed circuit board 1. The grating plate moving mechanism 27 constitutes the grating moving means of this embodiment.

本體殼部24具有透光性，其表面係成為使從光源19射出的光射入光柵單元20內部之光柵單元20的射入面20a，其背面係成為使透射光柵單元20內部的光(條紋圖案W)射出之光柵單元20的射出面20b。The main body shell 24 is light-transmissive, and its surface becomes the incident surface 20a of the grating unit 20 that allows the light emitted from the light source 19 to enter the grating unit 20, and its back surface becomes the light (stripe) that transmits the light inside the grating unit 20. The pattern W) is emitted from the emitting surface 20b of the grating unit 20.

固定光柵板25及可動光柵板26係以相對於自身的光軸J3(作為Z´軸方向之圖7的上下方向)相對向之方式配設，該自身的光軸係與光柵單元20之射入面20a及射出面20b正交。The fixed grating plate 25 and the movable grating plate 26 are arranged so as to face each other with respect to their own optical axis J3 (the up and down direction of Fig. 7 as the Z´ axis direction), and the own optical axis system and the radiation of the grating unit 20 The entrance surface 20a and the exit surface 20b are orthogonal.

固定光柵板25係以無法相對於本體殼部24相對變位的方式固定。另一方面，可動光柵板26係以可沿著與光軸J3正交的X´軸方向(圖7的左右方向)變位的方式設置。The fixed grating plate 25 is fixed in such a way that it cannot be displaced relative to the main body shell 24. On the other hand, the movable grating plate 26 is provided so as to be displaceable along the X'axis direction (left and right direction in FIG. 7) orthogonal to the optical axis J3.

光柵板移動機構27係具備：作為偏置手段的彈簧構件27a，係設置在可動光柵板26的X´軸方向一方側(圖7左側)且將該可動光柵板26朝另一方側(圖7右側)偏置；及作為驅動手段的螺線管(solenoid)27b，係設置在可動光柵板26的X´軸方向另一方側且使該可動光柵板26沿著X´軸方向滑動變位；且藉由控制裝置13進行驅動控制。The grating plate moving mechanism 27 is provided with a spring member 27a as a biasing means, which is provided on one side in the X´ axis direction of the movable grating plate 26 (left side in FIG. 7) and faces the movable grating plate 26 on the other side (FIG. 7 Right side) offset; and a solenoid (solenoid) 27b as a driving means is arranged on the other side of the movable grating plate 26 in the X´ axis direction and makes the movable grating plate 26 slide and displace along the X´ axis direction; And the drive control is performed by the control device 13.

在各光柵板25、26形成有光柵圖案30，該光柵圖案30係配置構成為以既定的透射率透射光的透光部31、和遮住至少一部分的光之遮光部32在X´軸方向交替排列〔參照圖8(a)、(b)〕。圖8(a)、(b)係用以說明固定光柵板25及可動光柵板26之相對位置關係的改變之示意圖。A grating pattern 30 is formed on each of the grating plates 25 and 26. The grating pattern 30 is arranged and configured such that a light-transmitting portion 31 that transmits light with a predetermined transmittance and a light-shielding portion 32 that shields at least a part of the light are in the X´ axis direction. Alternate arrangement [refer to Figure 8 (a), (b)]. 8(a) and (b) are schematic diagrams for explaining the change of the relative positional relationship between the fixed grating plate 25 and the movable grating plate 26.

具體而言，在本實施形態的各光柵板25、26中，於藉既定的透光材料(例如玻璃、丙烯酸樹脂等)形成平板狀或薄膜狀的基材28上，遮光部32以既定間隔印刷(蒸鍍)形成於X´軸方向，藉此形成有光柵圖案30。Specifically, in each of the grating plates 25 and 26 of this embodiment, the light-shielding portions 32 are formed at predetermined intervals on a flat or film-like base 28 formed of a predetermined light-transmitting material (for example, glass, acrylic resin, etc.) The printing (evaporation) is formed in the X´ axis direction, whereby the grating pattern 30 is formed.

且，本實施形態中，以光柵圖案30的印刷面(光柵面)朝向光源19側、即朝向光的射入側之方式配置有各光柵板25、26〔參照圖8(a)、(b)〕。而在圖7中，為了容易理解，針對與遮光部32對應的部位，不僅將各光柵板25、26的表面塗黑，也將各光柵板25、26的厚度方向的整個區域塗黑來顯示(關於後述的圖9～圖14亦同樣)。In addition, in this embodiment, the grating plates 25, 26 are arranged such that the printing surface (grating surface) of the grating pattern 30 faces the light source 19 side, that is, the light incident side [refer to FIGS. 8(a), (b) )]. In FIG. 7, for easy understanding, not only the surface of each grating plate 25, 26, but also the entire area of the thickness direction of each grating plate 25, 26 is blacked out for the part corresponding to the light-shielding portion 32. (The same applies to FIGS. 9 to 14 described later).

又，本實施形態中，形成於固定光柵板25及可動光柵板26的光柵圖案30係相同。也就是說，在兩光柵板25、26中，X´軸方向之透光部31的寬度係相同，X´軸方向之遮光部32的寬度係相同，X´軸方向之透光部31與遮光部32的比係相同，而且X´軸方向之透光部31及遮光部32的形成間距係相同。In addition, in this embodiment, the grating patterns 30 formed on the fixed grating plate 25 and the movable grating plate 26 are the same. That is to say, in the two grating plates 25 and 26, the width of the light-transmitting part 31 in the X´ axis direction is the same, the width of the light-shielding part 32 in the X´ axis direction is the same, and the light-transmitting part 31 in the X´ axis direction is the same as The ratio of the light-shielding parts 32 is the same, and the formation pitch of the light-transmitting parts 31 and the light-shielding parts 32 in the X´ axis direction is the same.

具體而言，在本實施形態的各光柵板25、26中，X´軸方向之透光部31的寬度設定成「600(30×20)μm」，X´軸方向之遮光部32的寬度設定為「200(10×20)μm」，透光部31與遮光部32的比成為「3：1」〔參照圖9(a)、(b)〕。此外，圖9中之透光部31及遮光部32的寬度的表記態樣，係設成容易與後述的圖10～圖14所示之其他實施形態比較的表記態樣。Specifically, in each of the grating plates 25 and 26 of this embodiment, the width of the light-transmitting portion 31 in the X´ axis direction is set to "600 (30×20) μm", and the width of the light-shielding portion 32 in the X´ axis direction It is set to "200 (10×20) μm", and the ratio of the light-transmitting portion 31 to the light-shielding portion 32 becomes "3:1" [see FIGS. 9(a) and (b)]. In addition, the representation aspect of the width of the light-transmitting portion 31 and the light-shielding portion 32 in FIG. 9 is set to be easy to compare with other embodiments shown in FIGS. 10 to 14 described later.

在上述構成下，光柵單元20係可將所生成的條紋圖案W切換成周期(條紋間距)不同的兩種條紋圖案W。With the above configuration, the grating unit 20 can switch the generated stripe pattern W into two types of stripe patterns W with different periods (stripe pitch).

具體而言，本實施形態中，可切換成第1周期800μm(高度解析度8μm)的第1條紋圖案W1、與第2周期400μm(高度解析度4μm)的第2條紋圖案W2之兩種條紋圖案W。「第1周期800μm」相當於本實施形態的「長周期」，「第2周期400μm」相當於「短周期」。Specifically, in this embodiment, it is possible to switch to two stripes of a first stripe pattern W1 with a first period of 800 μm (height resolution 8 μm) and a second stripe pattern W2 with a second period of 400 μm (height resolution 4 μm). Pattern W. The "first cycle of 800 μm" corresponds to the "long cycle" of this embodiment, and the "second cycle of 400 μm" corresponds to the "short cycle".

在此，於生成長周期的第1條紋圖案W1之情況，係驅動控制光柵板移動機構27以使可動光柵板26朝X´軸方向滑動變位，如圖9(a)所示，使可動光柵板26側的遮光部32之X´軸方向另一端部(左端部)與固定光柵板25側的遮光部32之X´軸方向一端部(右端部)的位置對位。Here, in the case of generating the long-period first stripe pattern W1, the grating plate moving mechanism 27 is driven and controlled so that the movable grating plate 26 is slid and displaced in the X´ axis direction, as shown in Fig. 9(a), which makes it movable The other end (left end) of the light shielding portion 32 on the side of the grating plate 26 in the X´ axis direction is aligned with the position of one end (right end) of the light shielding portion 32 on the side of the fixed grating plate 25 in the X´ axis direction.

其結果，在光柵單元20，作為重疊有兩光柵板25、26的光柵圖案30之合成光柵圖案，係形成X´軸方向之透光部的寬度為「400(20×20)μm」、X´軸方向之遮光部的寬度為「400(20×20)μm」且透光部與遮光部的比為「1：1」之假想的光柵圖案。As a result, in the grating unit 20, as a composite grating pattern in which the grating patterns 30 of the two grating plates 25 and 26 are superimposed, the width of the light-transmitting part in the X´ axis direction is formed to be "400 (20×20) μm", X ´A hypothetical grating pattern in which the width of the light-shielding part in the axial direction is "400(20×20)μm" and the ratio of the light-transmitting part to the light-shielding part is "1:1".

且，藉由此合成光柵圖案，生成第1周期800μm的第1條紋圖案W1。藉由如此的第1條紋圖案W1投影在印刷基板1上，可將在0μm～800μm的高度範圍內的焊膏5以「8μm」刻度的精度進行測量。Then, by synthesizing the grating pattern in this way, a first stripe pattern W1 with a first period of 800 μm is generated. By projecting such a first stripe pattern W1 on the printed circuit board 1, the solder paste 5 in the height range of 0 μm to 800 μm can be measured with an accuracy of "8 μm" scale.

此外，通常，通過光柵的光並非完全的平行光，起因於透光部及遮光部的交界部之繞射作用等，在被投影之條紋圖案的「明部」及「暗部」之交界部會產生中間灰階區。因此，對印刷基板1投影的條紋圖案W，係成為沿著與印刷基板1的搬送方向(Y軸方向)正交之方向(X軸方向)具有正弦波狀的光強度分布之圖案光(參照圖4)。In addition, generally, the light passing through the grating is not completely parallel light. It is caused by the diffracting effect of the boundary between the light-transmitting part and the light-shielding part. Produce intermediate grayscale areas. Therefore, the stripe pattern W projected on the printed circuit board 1 is a patterned light having a sinusoidal light intensity distribution along the direction (X axis direction) orthogonal to the transport direction (Y axis direction) of the printed circuit board 1 (see Figure 4).

但在圖4及圖9中，為求簡化而省略了中間灰階區，以明暗二值的條紋圖樣圖示了條紋圖案W。因此，圖9中之條紋圖案W的明部及暗部的寬度的表記，係表示合成光柵圖案中之透光部及遮光部的寬度(在後述的圖10～圖14中亦同樣)。However, in FIGS. 4 and 9, the middle gray scale area is omitted for simplification, and the stripe pattern W is illustrated in a light and dark binary stripe pattern. Therefore, the notation of the width of the light part and the dark part of the stripe pattern W in FIG. 9 indicates the width of the light-transmitting part and the light-shielding part in the composite grating pattern (the same applies to FIGS. 10 to 14 described later).

另一方面，在生成短周期的第2條紋圖案W2之情況，驅動控制光柵板移動機構27以使可動光柵板26沿X´軸方向滑動變位，如圖9(b)所示，使可動光柵板26側的遮光部32與固定光柵板25側的透光部31之X´軸方向中央部對位。On the other hand, when the short-period second stripe pattern W2 is generated, the grating plate moving mechanism 27 is driven and controlled so that the movable grating plate 26 slides and displaces along the X´ axis, as shown in Figure 9(b), which makes the The light-shielding portion 32 on the side of the grating plate 26 is aligned with the center portion in the X'axis direction of the light-transmitting portion 31 on the side of the fixed grating plate 25.

其結果，在光柵單元20，作為重疊有兩光柵板25、26的光柵圖案30之合成光柵圖案，係形成X´軸方向之透光部的寬度為「200(10×20)μm」、X´軸方向之遮光部的寬度為「200(10×20)μm」且透光部與遮光部的比成為「1：1」之假想的光柵圖案。As a result, in the grating unit 20, as a composite grating pattern in which the grating patterns 30 of the two grating plates 25 and 26 are superimposed, the width of the light-transmitting part in the X´ axis direction is formed as "200 (10×20) μm", X ´The width of the light-shielding part in the axial direction is "200(10×20)μm" and the ratio of the light-transmitting part to the light-shielding part becomes a virtual grating pattern of "1:1".

接著，藉由此合成光柵圖案，生成第2周期400μm的第2條紋圖案W2。藉由使這樣的第2條紋圖案W2投影在印刷基板1上，可將在0μm～400μm的高度範圍內的焊膏5以「4μm」刻度的精度進行測量。Next, by thus synthesizing the grating pattern, a second stripe pattern W2 with a second period of 400 μm is generated. By projecting such a second stripe pattern W2 on the printed circuit board 1, the solder paste 5 in the height range of 0 μm to 400 μm can be measured with an accuracy of "4 μm" scale.

此外，本實施形態中，係顯示投影光學系(投影透鏡單元21)的投影倍率設為1倍的例子，但投影倍率並不限定於此。根據投影倍率，在各光柵板25、26上之光柵圖案30的尺寸(光柵單元20的射出面20b之合成光柵圖案的尺寸)、與投影到印刷基板1上之條紋圖案W的尺寸會改變。In addition, in this embodiment, the projection magnification of the display projection optical system (projection lens unit 21) is set to 1 time, but the projection magnification is not limited to this. According to the projection magnification, the size of the grating pattern 30 on the grating plates 25 and 26 (the size of the composite grating pattern on the exit surface 20b of the grating unit 20) and the size of the stripe pattern W projected on the printed substrate 1 will change.

又，使光柵單元20變位之光柵單元移動機構22係如圖7所示，具備設置於光柵單元20的X´軸方向一方側(圖7左側)且使該光柵單元20朝另一方側(圖7右側)偏置之作為偏置手段的彈簧構件22a、以及設置於光柵單元20的X´軸方向另一方側且使該光柵單元20沿X´軸方向滑動變位之作為驅動手段的壓電元件(piezo element)22b，且藉由控制裝置13進行驅動控制。光柵單元移動機構22係構成本實施形態的圖案光變位手段。In addition, the grating unit moving mechanism 22 that displaces the grating unit 20 is provided on one side of the X´ axis direction of the grating unit 20 (left side in Fig. 7) as shown in FIG. 7 and the grating unit 20 faces the other side ( Fig. 7 (right side of Figure 7) biasing the spring member 22a as the biasing means, and the pressure as the driving means provided on the other side of the X´ axis direction of the grating unit 20 and sliding and displacing the grating unit 20 in the X´ axis direction The piezo element 22b is driven and controlled by the control device 13. The grating unit moving mechanism 22 constitutes the pattern light displacement means of this embodiment.

返回圖5的說明，投影透鏡單元21係具有射入側透鏡35及射出側透鏡36，藉由此等兩透鏡35、36構成為兩側遠心透鏡光學系(兩側遠心透鏡)。Returning to the description of FIG. 5, the projection lens unit 21 has an entrance-side lens 35 and an exit-side lens 36, and the two lenses 35 and 36 constitute a two-sided telecentric lens optical system (two-sided telecentric lens).

在此，射入側透鏡35係將自光柵單元20射出的光(條紋圖案W)聚光，具有光軸J1和主光線在射入側成為平行之遠心構造。Here, the incident side lens 35 condenses the light (stripe pattern W) emitted from the grating unit 20, and has a telecentric structure in which the optical axis J1 and the chief ray are parallel to the incident side.

射出側透鏡36係用以將穿透射入側透鏡35之光(條紋圖案W)的像成像於印刷基板1上，具有光軸J1和主光線在射出側成為平行之遠心構造。The emission side lens 36 is used to form an image of the light (stripe pattern W) transmitted through the entrance side lens 35 on the printed circuit board 1, and has a telecentric structure in which the optical axis J1 and the chief ray become parallel on the emission side.

再者，在本實施形態的投影裝置14中，係以投影在印刷基板1上的條紋圖案W在投影範圍(本實施形態中與攝像視野K為相同範圍)的整個區域對焦之方式，設定成光柵單元20(光軸J3)相對於光軸J1傾斜(參照圖5、圖7)。Furthermore, in the projection device 14 of this embodiment, the stripe pattern W projected on the printed circuit board 1 is set to focus on the entire area of the projection range (the same range as the imaging field of view K in this embodiment). The grating unit 20 (optical axis J3) is inclined with respect to the optical axis J1 (refer to FIGS. 5 and 7).

具體而言，係以光柵單元20的射出面(合成光柵面)20b及投影透鏡單元21的主面相對於印刷基板1滿足賽因福祿(Scheimpflug)的條件之方式設定。Specifically, it is set so that the emission surface (composite grating surface) 20 b of the grating unit 20 and the main surface of the projection lens unit 21 satisfy the conditions of Scheimpflug with respect to the printed substrate 1.

在此，參照圖5說明關於賽因福祿的原理。賽因福祿的原理係指︰包含光柵單元20的射出面20b之平面S1、與包含投影透鏡單元21的主面之平面S2在同一直線C(圖5上的點C之與圖面垂直的直線)上相交時，條紋圖案W在對焦狀態下被投影的物體面S3也在同一直線C上相交。因此，基於此種賽因福祿的原理之條件係為，包含光柵單元20的射出面20b之平面S1、包含投影透鏡單元21的主面之平面S2、和包含印刷基板1的表面(投影面)之平面S3係在同一直線C上彼此相交。Here, referring to FIG. 5, the principle of Sinfluh will be explained. The principle of Sainfluh refers to: the plane S1 containing the exit surface 20b of the grating unit 20 and the plane S2 containing the main surface of the projection lens unit 21 are on the same straight line C (the point C in FIG. 5 is perpendicular to the plane of the drawing) When intersecting on a straight line), the object plane S3 on which the stripe pattern W is projected in the focused state also intersects on the same straight line C. Therefore, the conditions based on the principle of Sineflux are as follows: the plane S1 including the exit surface 20b of the grating unit 20, the plane S2 including the main surface of the projection lens unit 21, and the surface (projection surface) including the printed board 1 The planes S3 of) intersect each other on the same straight line C.

在上述構成下，於投影裝置14中，自光源19射出的光係對光柵單元20的射入面20a射入。透射光柵單元20內的光係從光柵單元20的射出面20b射出作為條紋圖案W。然後，藉由投影透鏡單元21投影在印刷基板1上。藉此，本實施形態中，如圖4所示，可投影與印刷基板1的搬送方向(Y軸方向)平行之條紋圖案W。With the above configuration, in the projection device 14, the light system emitted from the light source 19 is incident on the incident surface 20 a of the grating unit 20. The light system in the transmission grating unit 20 is emitted as a fringe pattern W from the exit surface 20 b of the grating unit 20. Then, it is projected on the printed circuit board 1 by the projection lens unit 21. Thereby, in this embodiment, as shown in FIG. 4, the stripe pattern W parallel to the conveyance direction (Y-axis direction) of the printed circuit board 1 can be projected.

如圖1所示，相機15係具有複數個受光元件呈二維配列而成的受光面之攝像元件15a；和使投影有條紋圖案W之印刷基板1的攝像視野K的像對該攝像元件15a成像之作為攝像光學系的攝像透鏡單元15b；其光軸J2係沿著與印刷基板1的上面垂直的鉛直方向(Z軸方向)設定。本實施形態中，係採用CCD區域感測器作為攝像元件15a。As shown in FIG. 1, the camera 15 is an imaging element 15a having a light-receiving surface in which a plurality of light-receiving elements are arranged two-dimensionally; and an image of the imaging field K of the printed circuit board 1 on which the stripe pattern W is projected to the imaging element 15a The imaging lens unit 15b is an imaging optical system for imaging; its optical axis J2 is set along a vertical direction (Z-axis direction) perpendicular to the upper surface of the printed circuit board 1. In this embodiment, a CCD area sensor is used as the imaging element 15a.

攝像透鏡單元15b係由一體地具備有物體側透鏡、孔徑光圈、像側透鏡等之兩側遠心透鏡(兩側遠心透鏡光學系)而構成。其中，圖1中，為求簡化，係將攝像透鏡單元15b圖示成一個透鏡。The imaging lens unit 15b is composed of a two-sided telecentric lens (two-sided telecentric lens optical system) integrally provided with an object-side lens, an aperture diaphragm, an image-side lens, and the like. Among them, in FIG. 1, for simplification, the imaging lens unit 15b is illustrated as a single lens.

在此，物體側透鏡係將來自印刷基板1的反射光聚光，具有光軸J2和主光線在物體側成為平行之遠心構造。又，像側透鏡係用以使從物體側透鏡穿透孔徑光圈的光成像於攝像元件15a的受光面，具有光軸J2與主光線在像側成為平行之遠心構造。Here, the object-side lens condenses the reflected light from the printed circuit board 1, and has a telecentric structure in which the optical axis J2 and the chief ray are parallel to the object side. In addition, the image side lens is used to image the light passing through the aperture diaphragm from the object side lens on the light receiving surface of the imaging element 15a, and has a telecentric structure in which the optical axis J2 and the chief ray are parallel to the image side.

藉相機15攝像並取得的圖像資料係隨時在該相機15內部被轉換成數位信號後，以數位信號的形式輸入控制裝置13，並記憶於後述的圖像資料記憶裝置44。接著，控制裝置13係根據該圖像資料，實施如後述之圖像處理、運算處理等。控制裝置13係構成本實施形態的圖像處理手段。The image data captured and obtained by the camera 15 is converted into a digital signal inside the camera 15 at any time, and then input into the control device 13 in the form of a digital signal, and is stored in the image data storage device 44 described later. Next, the control device 13 performs image processing, arithmetic processing, etc., as described later, based on the image data. The control device 13 constitutes the image processing means of this embodiment.

接著，針對控制裝置13的電性構成，參照圖6來進行說明。圖6係顯示基板檢查裝置10的電性構成之方塊圖。Next, the electrical configuration of the control device 13 will be described with reference to FIG. 6. FIG. 6 is a block diagram showing the electrical configuration of the substrate inspection device 10.

如圖6所示，控制裝置13係具備下述等元件：掌控基板檢查裝置10整體的控制之微電腦41；由鍵盤和滑鼠、觸控面板等所構成之作為「輸入手段」的輸入裝置42；具有CRT、液晶等的顯示畫面之作為「顯示手段」的顯示裝置43；用以記憶藉相機15攝像並取得的圖像資料等之圖像資料記憶裝置44；用以記憶依據該圖像資料所得到之三維測量結果等各種運算結果之運算結果記憶裝置45；以及用以事先記憶格博資料等各種資訊之設定資料記憶裝置46等。As shown in FIG. 6, the control device 13 includes the following components: a microcomputer 41 that controls the overall control of the substrate inspection device 10; an input device 42 as an "input means" composed of a keyboard, a mouse, and a touch panel. ; A display device 43 as a "display means" with a display screen of CRT, liquid crystal, etc.; an image data storage device 44 for storing image data taken and obtained by the camera 15; for storing based on the image data The calculation result memory device 45 for various calculation results such as the obtained three-dimensional measurement results; and the setting data memory device 46 for storing various information such as Gebo data in advance.

微電腦41係具備︰作為運算手段之CPU41a、記憶各種程式之ROM41b、和將運算資料、輸出輸入資料等各種資料予以暫時記憶之RAM41c等，且與上述各裝置42～46等電性連接。並且，具有在與此等各裝置42～46等之間進行各種資料、信號的輸出輸入控制之功能。The microcomputer 41 is equipped with a CPU 41a as a computing means, a ROM 41b for storing various programs, and a RAM 41c for temporarily storing various data such as arithmetic data, output and input data, etc., and is electrically connected to the above-mentioned devices 42-46. In addition, it has the function of controlling the output and input of various data and signals between these devices 42 to 46 and the like.

於設定資料記憶裝置46記憶有︰關於設定在印刷基板1的複數個檢查範圍、與相對於此等檢查範圍之相機15的攝像視野K的移動順序之資訊等。在此，「攝像視野K的移動順序」係指︰針對設定在印刷基板1上的複數個檢查範圍，制定以什麼樣的順序使相機15的攝像視野K逐漸移動。The setting data storage device 46 stores information about a plurality of inspection ranges set on the printed circuit board 1, and the moving sequence of the imaging field K of the camera 15 relative to these inspection ranges. Here, the "movement order of the imaging field of view K" refers to determining the order in which the imaging field of view K of the camera 15 is gradually moved for a plurality of inspection ranges set on the printed circuit board 1.

此外，關於印刷基板1之複數個檢查範圍與攝像視野K相對於此等檢查範圍之移動順序的設定，係依據格博資料(Gerber Data)等事先藉由既定的程式以自動方式或由作業者以手動方式進行。In addition, the setting of the movement sequence of the plurality of inspection ranges of the printed circuit board 1 and the imaging field of view K with respect to these inspection ranges is based on Gerber Data and other pre-established programs in an automatic manner or by the operator Do it manually.

例如，在圖2所示的例子中，以右上隅角部的檢查範圍為起點，設定有攝像視野K的移動順序(檢查順序)。此外，圖2中，由兩點鏈線框所包圍的範圍係顯示攝像視野K(檢查範圍)，附加在此框內之帶有圓圈的數字「1」～「15」係表示檢查順序。又，圖2中，以點線箭頭表示攝像視野K的移動方向(移動路徑)。For example, in the example shown in FIG. 2, the movement sequence (inspection sequence) of the imaging field of view K is set with the inspection range of the upper right corner as a starting point. In addition, in FIG. 2, the range enclosed by the two-dot chain frame shows the imaging field of view K (inspection range), and the circled numbers "1" to "15" added to this frame indicate the inspection sequence. In addition, in FIG. 2, the moving direction (moving path) of the imaging field of view K is indicated by a dotted arrow.

其次，詳細地說明關於藉基板檢查裝置10所進行之印刷基板1的檢查路徑。這樣的檢查路徑係藉由控制裝置13(微電腦41)執行。Next, the inspection path of the printed circuit board 1 performed by the circuit board inspection apparatus 10 will be described in detail. Such an inspection path is executed by the control device 13 (microcomputer 41).

如上述，當被搬入基板檢查裝置10的印刷基板1定位固定於既定的檢查位置時，控制裝置13首先執行印刷基板1的位置檢測處理。As described above, when the printed circuit board 1 carried into the board inspection device 10 is positioned and fixed at a predetermined inspection position, the control device 13 first executes the position detection process of the printed circuit board 1.

更詳言之，控制裝置13係檢測附加在印刷基板1上的定位用標記(省略圖示)，並依據該檢測出之標記的位置資訊(座標)、和記憶於格博資料之標記的位置資訊(座標)，算出印刷基板1的位置資訊(傾斜、位置偏移等)。藉此，結束印刷基板1的位置檢測處理。接著，依據此印刷基板1的位置資訊，執行修正檢查單元12(相機15)與印刷基板1之相對位置關係的偏移之修正處理。In more detail, the control device 13 detects the positioning mark (not shown) attached to the printed circuit board 1, and based on the position information (coordinates) of the detected mark and the position of the mark stored in the Gebo data Information (coordinates), position information (tilt, position shift, etc.) of the printed circuit board 1 is calculated. Thereby, the position detection process of the printed circuit board 1 is ended. Then, based on the position information of the printed circuit board 1, a correction process for correcting the deviation of the relative positional relationship between the inspection unit 12 (camera 15) and the printed circuit board 1 is executed.

然後，依據記憶於設定資料記憶裝置46的檢查順序，執行使檢查單元12朝向與印刷基板1上之第「1」號的檢查範圍對應之位置移動之移動處理。Then, according to the inspection sequence stored in the setting data storage device 46, a movement process of moving the inspection unit 12 toward the position corresponding to the inspection range of No. 1 on the printed circuit board 1 is executed.

在此期間，控制裝置13係依據記憶於設定資料記憶裝置46的格博資料，執行將投影到第「1」號的檢查範圍之條紋圖案W的周期調整成與該檢查範圍對應的周期之處理。During this period, the control device 13 executes the process of adjusting the period of the stripe pattern W projected to the inspection range No. "1" to the period corresponding to the inspection range based on the Gebo data stored in the setting data storage device 46 .

如圖2所示，本實施形態中，第「1」號的檢查範圍係成為控制電路部PB，在此係設定為短周期的第2條紋圖案W2。As shown in FIG. 2, in the present embodiment, the inspection area No. "1" becomes the control circuit part PB, and here is set as the second stripe pattern W2 of a short period.

當檢查單元12的移動處理完成，相機15的攝像視野K對準印刷基板1上之第「1」號的檢查範圍時，便從投影裝置14投影第2條紋圖案W2，執行關於印刷基板1上之第「1」號的檢查範圍的檢查處理。關於這樣的檢查處理的詳情，將於後敘述(關於其他檢查範圍的檢查處理亦同樣)。When the movement processing of the inspection unit 12 is completed and the imaging field of view K of the camera 15 is aligned with the inspection area "1" on the printed circuit board 1, the second stripe pattern W2 is projected from the projection device 14 to execute the operation on the printed circuit board 1. The inspection processing of the inspection scope of No. "1". The details of such inspection processing will be described later (the same applies to inspection processing of other inspection ranges).

其後，當關於印刷基板1上之第「1」號的檢查範圍之檢查處理結束時，便依據記憶於設定資料記憶裝置46的檢查順序，開始進行使檢查單元12朝向與印刷基板1上之第「2」號的檢查範圍對應的位置移動之移動處理。After that, when the inspection process for the inspection range of No. "1" on the printed circuit board 1 is completed, the inspection unit 12 will be directed to the printed circuit board 1 according to the inspection sequence stored in the setting data storage device 46. The movement processing of the position movement corresponding to the inspection range of No. "2".

在此期間，控制裝置13係與上述同樣，執行將投影到第「2」號的檢查範圍之條紋圖案W的周期調整(變更)成與該檢查範圍對應的周期之處理。During this period, the control device 13 performs the process of adjusting (changing) the period of the stripe pattern W projected to the inspection range of No. "2" to the period corresponding to the inspection range in the same manner as described above.

如圖2所示，本實施形態中，第「2」號的檢查範圍係成為電源電路部PA，在此係設定為長周期的第1條紋圖案W1。As shown in FIG. 2, in the present embodiment, the inspection area No. "2" becomes the power supply circuit part PA, and here is set as the long-period first stripe pattern W1.

當檢查單元12的移動處理完成，相機15的攝像視野K對準印刷基板1上之第「2」號的檢查範圍時，便從投影裝置14投影第1條紋圖案W1，執行關於印刷基板1上之第「2」號的檢查範圍之檢查處理。When the movement processing of the inspection unit 12 is completed and the imaging field of view K of the camera 15 is aligned with the inspection area No. 2 on the printed circuit board 1, the first stripe pattern W1 is projected from the projection device 14 to execute the operation on the printed circuit board 1. The inspection processing of the inspection scope of No. "2".

然後，當關於印刷基板1上之第「2」號的檢查範圍之檢查處理結束時，便依據記憶於設定資料記憶裝置46的檢查順序，開始進行使檢查單元12朝向與印刷基板1上之第「3」號的檢查範圍對應的位置移動之移動處理。Then, when the inspection process for the inspection range of No. "2" on the printed circuit board 1 is completed, the inspection unit 12 is directed to the first inspection area on the printed circuit board 1 according to the inspection sequence stored in the setting data storage device 46. The movement processing of the position movement corresponding to the inspection range of "3".

之後，同樣地，針對印刷基板1上之第「3」號～第「15」號的檢查範圍，藉由與該檢查範圍對應的條紋圖案W(第1條紋圖案W1或第2條紋圖案W2)執行檢查處理，藉此結束關於印刷基板1整體的焊料印刷檢查。After that, similarly, for the inspection range "3" to "15" on the printed circuit board 1, the stripe pattern W corresponding to the inspection range (the first stripe pattern W1 or the second stripe pattern W2) The inspection process is executed, thereby ending the solder printing inspection on the entire printed circuit board 1.

其次，說明關於在印刷基板1的各檢查範圍所進行之檢查處理。這樣的檢查處理係藉控制裝置13(微電腦41)執行。Next, the inspection process performed in each inspection area of the printed circuit board 1 will be described. Such inspection processing is executed by the control device 13 (microcomputer 41).

本實施形態中，針對各檢查範圍，一邊使自投影裝置14投影之條紋圖案W的相位改變，一邊在相位不同的條紋圖案W下進行4次攝像處理，藉此取得光強度分布不同的4種圖像資料。以下，詳細地說明。In this embodiment, for each inspection range, while changing the phase of the fringe pattern W projected from the projection device 14, the imaging process is performed four times under the fringe pattern W with different phases, thereby obtaining 4 types of different light intensity distributions. Image data. Hereinafter, it will be explained in detail.

如上述，控制裝置13首先將X軸移動機構16及Y軸移動機構17進行驅動控制，以使檢查單元12移動，將相機15的攝像視野K與印刷基板1的既定的檢查範圍對位。同時，將投影裝置14的光柵單元20進行移動控制，將該光柵單元20的位置設定為既定的基準位置(例如相位「0°」的位置)。As described above, the control device 13 first drives and controls the X-axis movement mechanism 16 and the Y-axis movement mechanism 17 to move the inspection unit 12 to align the imaging field of view K of the camera 15 with the predetermined inspection range of the printed circuit board 1. At the same time, the grating unit 20 of the projection device 14 is moved and controlled, and the position of the grating unit 20 is set to a predetermined reference position (for example, the position of the phase "0°").

當光柵單元20的定位完成時，控制裝置13係使投影裝置14的光源19發光，投影既定的條紋圖案W(第1條紋圖案W1或第2條紋圖案W2)，並驅動控制相機15，以執行該條紋圖案W下之第1次攝像處理。When the positioning of the grating unit 20 is completed, the control device 13 makes the light source 19 of the projection device 14 emit light, project the predetermined stripe pattern W (the first stripe pattern W1 or the second stripe pattern W2), and drive and control the camera 15 to execute The first imaging process under this stripe pattern W.

然後，控制裝置13係在既定的條紋圖案W下於第1次攝像處理結束之同時，將光源19熄滅，並執行光柵單元20的移動處理。具體而言，使光柵單元20的位置從前述基準位置朝向條紋圖案W的相位偏移4分之1間距(90°)之第2位置移動。Then, the control device 13 turns off the light source 19 and executes the movement processing of the grating unit 20 at the same time as the first imaging processing ends under the predetermined stripe pattern W. Specifically, the position of the grating unit 20 is moved from the aforementioned reference position to the second position where the phase of the fringe pattern W is shifted by a quarter pitch (90°).

當光柵單元20的移動處理完成時，控制裝置13係使光源19發光，投影既定的條紋圖案W，並且驅動控制相機15，執行該條紋圖案W下的第2次攝像處理。When the movement processing of the grating unit 20 is completed, the control device 13 causes the light source 19 to emit light, project a predetermined stripe pattern W, and drive and control the camera 15 to execute the second imaging processing under the stripe pattern W.

之後，藉由反覆進行同樣的處理，在相位逐次相差90°(逐次4分之1間距)的條紋圖案W下取得光強度分布不同的4種圖像資料。藉此，可取得使具有正弦波狀光強度分布之條紋圖案W的相位逐次位移(shift)90°的4種圖像資料。After that, by repeatedly performing the same process, four kinds of image data with different light intensity distributions are obtained under the stripe pattern W with a phase difference of 90° (sequentially a quarter pitch). In this way, four types of image data can be obtained in which the phase of the fringe pattern W having a sinusoidal light intensity distribution is sequentially shifted by 90°.

接著，控制裝置13係依據如上述取得的4種圖像資料(各座標的4種亮度值)，藉由週知的相移法進行焊膏5的三維測量(各座標的高度測量)，將這樣的測量結果記憶於運算結果記憶裝置45。Next, the control device 13 performs three-dimensional measurement of the solder paste 5 (measurement of the height of each coordinate) by the well-known phase shift method based on the four types of image data (four brightness values of each coordinate) obtained as described above, and Such measurement results are stored in the calculation result storage device 45.

在此，就週知的相移法進行說明。上述4種圖像資料之印刷基板1上的既定座標位置的光強度(亮度)I0、I1、I2、I3，係可分別藉由下式(1)、(2)、(3)、(4)表示。Here, the well-known phase shift method will be explained. The light intensities (brightness) I0, I1, I2, and I3 of the predetermined coordinate positions on the printed circuit board 1 of the above four types of image data can be obtained by the following formulas (1), (2), (3), (4) ) Means.

I0=αsinθ＋β・・・(1) I1=αsin(θ＋90°)＋β=αcosθ＋β・・・(2) I2=αsin(θ＋180°)＋β=-αsinθ＋β・・・(3) I3=αsin(θ＋270°)＋β=-αcosθ＋β・・・(4) 其中，α：增益(gain)，β：偏移(offset)，θ：條紋圖案的相位。I0=αsinθ＋β・・・(1) I1=αsin(θ＋90°)＋β=αcosθ＋β・・・(2) I2=αsin(θ＋180°)＋β=-αsinθ＋β・・・(3) I3=αsin(θ＋270°)＋β=-αcosθ＋β・・・(4) Among them, α: gain (gain), β: offset (offset), θ: phase of the fringe pattern.

接著，針對相位θ，求解上式(1)、(2)、(3)、(4)，便可導出下式(5)。Then, for the phase θ, the above equations (1), (2), (3), (4) are solved, and the following equation (5) can be derived.

θ=tan-1｛(I0-I2)/(I1-I3)｝・・(5) 藉由使用如上述算出的相位θ，可根據三角測量的原理，求取印刷基板1上之各座標(X,Y)的高度(Z)。θ=tan-1{(I0-I2)/(I1-I3)}・・(5) By using the phase θ calculated as described above, the height (Z) of each coordinate (X, Y) on the printed circuit board 1 can be obtained based on the principle of triangulation.

接著，控制裝置13係依據以上述方式得到的三維測量結果(各座標的高度資料)，進行焊膏5之印刷狀態的良否判定處理。具體而言，控制裝置13係依據如上述得到之檢查範圍的測量結果，依各檢查範圍(電源電路部PA、控制電路部PB)檢測比制定的高度基準面變高既定長度以上之焊膏5的印刷範圍，對該範圍內的各部位的高度進行積分，藉此算出所印刷之焊膏5的量。Next, the control device 13 performs the process of judging the printing state of the solder paste 5 based on the three-dimensional measurement results (height data of each coordinate) obtained in the above-mentioned manner. Specifically, the control device 13 detects the solder paste 5 that is higher than the predetermined height reference plane by more than a predetermined length in accordance with the inspection range (power circuit section PA, control circuit section PB) based on the measurement result of the inspection range obtained as described above In the printing range of, the height of each part in the range is integrated to calculate the amount of solder paste 5 printed.

接著，控制裝置13係將以此方式求得之焊膏5的位置、面積、高度或量等的資料，與預先記憶於設定資料記憶裝置46的基準資料(格博資料等)作比較判定，依據此比較結果是否在容許範圍內來判定該檢查範圍之焊膏5的印刷狀態的良否。Next, the control device 13 compares the data such as the position, area, height or amount of the solder paste 5 obtained in this way with the reference data (gebo data, etc.) stored in the setting data storage device 46 in advance, The quality of the printing state of the solder paste 5 in the inspection range is determined based on whether the comparison result is within the allowable range.

取得上述4種圖像資料後，在進行上述良否判定處理的期間，控制裝置13係使檢查單元12朝下一個檢查範圍移動。之後，在印刷基板1上之全部的檢查範圍反覆進行上述一連串的處理，藉此完成印刷基板1整體的焊料印刷檢查。After acquiring the above-mentioned four types of image data, the control device 13 moves the inspection unit 12 to the next inspection range while the above-mentioned quality determination process is performed. After that, the above-mentioned series of processes are repeatedly performed on the entire inspection area on the printed circuit board 1, thereby completing the solder printing inspection of the entire printed circuit board 1.

如以上詳述，根據本實施形態，從投影裝置14對印刷基板1投影條紋圖案W，並取得使該條紋圖案W的相位不同的4種圖像資料，依據此等圖像資料，進行藉由相移法之印刷基板1的三維測量。As described in detail above, according to the present embodiment, the stripe pattern W is projected from the projection device 14 to the printed circuit board 1, and four types of image data with different phases of the stripe pattern W are obtained, and based on these image data, Three-dimensional measurement of printed circuit board 1 by phase shift method.

此時，在本實施形態中，構成為依據印刷基板1上的檢查範圍的凹凸程度，變更從投影裝置14所投影之條紋圖案W的周期(間距)。具體而言，將長周期的第1條紋圖案W1、與短周期的第2條紋圖案W2之兩種條紋圖案W切換並投影。At this time, in this embodiment, the period (pitch) of the stripe pattern W projected from the projection device 14 is changed according to the degree of unevenness of the inspection range on the printed circuit board 1. Specifically, two kinds of stripe patterns W of a long-period first stripe pattern W1 and a short-period second stripe pattern W2 are switched and projected.

尤其根據本實施形態的投影裝置14，藉由使用光柵單元20(光柵板25、26)作為將來自光源19的光轉換成條紋圖案W之圖案生成部，可投影比使用液晶光柵等的情況更明亮之條紋圖案W。In particular, according to the projection device 14 of the present embodiment, by using the grating unit 20 (grating plates 25, 26) as the pattern generating unit that converts the light from the light source 19 into the stripe pattern W, it is possible to project more than when a liquid crystal grating is used. Bright striped pattern W.

又，藉由具備變更兩片光柵板25、26的相對位置關係之光柵板移動機構27，可在不交換光柵板25、26下，變更投影到印刷基板1之條紋圖案W的周期。In addition, by providing the grating plate moving mechanism 27 that changes the relative positional relationship between the two grating plates 25 and 26, the period of the stripe pattern W projected on the printed circuit board 1 can be changed without replacing the grating plates 25 and 26.

再者，本實施形態中，由於可使用在玻璃板等的基材28上印刷有光柵圖案30之既有的光柵板25、26等廉價的光學構件，所以與使用液晶元件等高價的光學控制元件作為圖案生成部之情況相比較，可抑制圖案生成部的製造成本。Furthermore, in this embodiment, since the existing grating plates 25, 26 and other inexpensive optical members on which the grating pattern 30 is printed on the substrate 28 such as a glass plate can be used, it is different from the use of expensive optical control elements such as liquid crystal elements. Compared with the case where the element is used as the pattern generating part, the manufacturing cost of the pattern generating part can be suppressed.

此外，如使用既有的液晶元件等的情況，亦不需要進行畫素的控制，可謀求控制的簡化，並且也不會有所生成的條紋圖案W在微觀上成為不連續之情況，所以可對印刷基板1進行投影更理想的條紋圖案W。In addition, in the case of using existing liquid crystal elements, etc., pixel control is not required, the control can be simplified, and the generated stripe pattern W will not be microscopically discontinuous, so it can be A more ideal stripe pattern W is projected on the printed circuit board 1.

〔第2實施形態〕 接著，參照圖10，詳細說明關於第2實施形態。此外，關於與上述第1實施形態重複的部分，係使用同一構件名稱、同一符號等且省略其詳細的說明，並且以下主要針對與第1實施形態不同的部分來進行說明(關於後述的第3實施形態至第6實施形態亦同樣)。[Second Embodiment] Next, referring to FIG. 10, the second embodiment will be described in detail. In addition, with regard to the overlapping parts with the above-mentioned first embodiment, the same component names, the same symbols, etc. are used, and detailed explanations thereof are omitted, and the following explanation mainly focuses on the parts different from the first embodiment (about the third embodiment described later). The same applies to the embodiment to the sixth embodiment).

在本實施形態的固定光柵板25及可動光柵板26中，X´軸方向之透光部31的寬度設定成「580(29×20)μm」，X´軸方向之遮光部32的寬度設定成「220(11×20)μm」，透光部31與遮光部32的比成為「29：11」〔參照圖10(a)、(b)〕。In the fixed grating plate 25 and the movable grating plate 26 of this embodiment, the width of the light-transmitting part 31 in the X´ axis direction is set to "580(29×20)μm", and the width of the light-shielding part 32 in the X´ axis direction is set It becomes "220 (11×20) μm", and the ratio of the light-transmitting portion 31 to the light-shielding portion 32 is "29:11" [see Fig. 10(a), (b)].

接著，在生成長周期的第1條紋圖案W1之情況，驅動控制光柵板移動機構27以使可動光柵板26朝X´軸方向滑動變位，如圖10(a)所示，以包含固定光柵板25側的遮光部32的X´軸方向一端部(右端部)之既定範圍、與包含可動光柵板26側的遮光部32的X´軸方向另一端部(左端部)之既定範圍在X´軸方向重疊之方式進行對位。Next, when the long-period first stripe pattern W1 is generated, the grating plate moving mechanism 27 is driven and controlled to make the movable grating plate 26 slide and displace in the X´ axis direction, as shown in Figure 10(a), to include a fixed grating The predetermined range of one end (right end) in the X´ axis direction of the light shielding portion 32 on the side of the plate 25 and the predetermined range of the other end (left end) in the X´ axis direction of the light shielding portion 32 on the side of the movable grating plate 26 is in X ´Alignment is carried out with overlapping axis directions.

其結果，在光柵單元20，作為重疊有兩光柵板25、26的光柵圖案30之合成光柵圖案，係形成X´軸方向之透光部的寬度為「400(20×20)μm」、X´軸方向之遮光部的寬度為「400(20×20)μm」且透光部與遮光部的比成為「1：1」之假想的光柵圖案。且，藉由此合成光柵圖案，生成第1周期800μm的第1條紋圖案W1。As a result, in the grating unit 20, as a composite grating pattern in which the grating patterns 30 of the two grating plates 25 and 26 are superimposed, the width of the light-transmitting part in the X´ axis direction is formed to be "400 (20×20) μm", X ´The width of the light-shielding part in the axial direction is "400(20×20)μm", and the ratio of the light-transmitting part to the light-shielding part becomes a virtual grating pattern of "1:1". Then, by synthesizing the grating pattern in this way, a first stripe pattern W1 with a first period of 800 μm is generated.

另一方面，在生成短周期的第2條紋圖案W2之情況，係驅動控制光柵板移動機構27以使可動光柵板26朝X´軸方向滑動變位，如圖10(b)所示，使可動光柵板26側的遮光部32與固定光柵板25側的透光部31之X´軸方向中央部對位。On the other hand, in the case of generating the short-period second stripe pattern W2, the grating plate moving mechanism 27 is driven and controlled to make the movable grating plate 26 slide and displace in the X´ axis direction, as shown in Figure 10(b), The light-shielding portion 32 on the side of the movable grating plate 26 is aligned with the center portion in the X'axis direction of the light-transmitting portion 31 on the side of the fixed grating plate 25.

其結果，在光柵單元20，作為重疊有兩光柵板25、26的光柵圖案30之合成光柵圖案，係形成X´軸方向之透光部的寬度為「180(9×20)μm」、X´軸方向之遮光部的寬度為「220(11×20)μm」且透光部與遮光部的比成為「9：11」之假想的光柵圖案。且，藉由此合成光柵圖案，生成第2周期400μm的第2條紋圖案W2。As a result, in the grating unit 20, as a composite grating pattern in which the grating patterns 30 of the two grating plates 25 and 26 are superimposed, the width of the light-transmitting portion in the X´ axis direction is "180 (9×20) μm", X ´The width of the light-shielding part in the axial direction is "220(11×20)μm" and the ratio of the light-transmitting part to the light-shielding part becomes a virtual grating pattern of "9:11". Then, by synthesizing the grating pattern in this way, a second stripe pattern W2 with a second period of 400 μm is generated.

如以上詳述，根據本實施形態，可達成與上述第1實施形態同樣之作用效果。As described in detail above, according to this embodiment, the same effects as those of the first embodiment described above can be achieved.

尤其，根據本實施形態，於生成長周期的第1條紋圖案W1之際，藉由固定光柵板25側的遮光部32的一部分、與可動光柵板26側的遮光部32的一部分重疊，能夠抑制漏光。其結果，可將更理想的條紋圖案W投影到印刷基板1。In particular, according to the present embodiment, when the long-period first stripe pattern W1 is generated, a part of the light-shielding portion 32 on the fixed grating plate 25 side overlaps with a part of the light-shielding portion 32 on the movable grating plate 26 side, which can suppress Light leak. As a result, a more ideal stripe pattern W can be projected on the printed circuit board 1.

此外，在本實施形態中，於生成短周期的第2條紋圖案W2時，合成光柵圖案之透光部與遮光部的比並沒有成為如「1：1」完全相同，惟只要其比係如「9：11」成為大致相同，則在進行藉由相移法的三維測量上可生成具有充分精確度之正弦波狀的光強度分布之條紋圖案W。In addition, in this embodiment, when the short-period second stripe pattern W2 is generated, the ratio of the light-transmitting part to the light-shielding part of the composite grating pattern is not exactly the same as "1:1", as long as the ratio is as When "9:11" becomes approximately the same, it is possible to generate a fringe pattern W with a sine wave-like light intensity distribution with sufficient accuracy in the three-dimensional measurement by the phase shift method.

〔第3實施形態〕 接著，參照圖11，詳細說明關於第3實施形態。在本實施形態的固定光柵板25及可動光柵板26中，X´軸方向之透光部31的寬度設定成「600(30×20)μm」，X´軸方向之遮光部32的寬度設定成「200(10×20)μm」，透光部31與遮光部32的比成為「3：1」〔參照圖11(a)、(b)〕。[The third embodiment] Next, referring to FIG. 11, the third embodiment will be described in detail. In the fixed grating plate 25 and the movable grating plate 26 of this embodiment, the width of the light-transmitting part 31 in the X´ axis direction is set to "600(30×20)μm", and the width of the light-shielding part 32 in the X´ axis direction is set It becomes "200 (10×20) μm", and the ratio of the light-transmitting portion 31 to the light-shielding portion 32 is "3:1" [see FIGS. 11(a) and (b)].

接著，在生成長周期的第1條紋圖案W1之情況，驅動控制光柵板移動機構27以使可動光柵板26朝X´軸方向滑動變位，如圖11(a)所示，以包含固定光柵板25側的遮光部32之X´軸方向一端部(右端部)的既定範圍、與包含可動光柵板26側的遮光部32之X´軸方向另一端部(左端部)的既定範圍在X´軸方向重疊的方式對位。Next, when the long-period first stripe pattern W1 is generated, the grating plate moving mechanism 27 is driven and controlled to make the movable grating plate 26 slide and displace in the X´ axis direction, as shown in Figure 11(a), to include a fixed grating The predetermined range of one end (right end) in the X´ axis direction of the light shielding portion 32 on the side of the plate 25 and the predetermined range of the other end (left end) in the X´ axis direction of the light shielding portion 32 on the side of the movable grating plate 26 is in X ´Alignment with overlapping axis directions.

其結果，在光柵單元20，作為重疊有兩光柵板25、26的光柵圖案30之合成光柵圖案，係形成X´軸方向之透光部的寬度為「420(21×20)μm」、X´軸方向之遮光部的寬度為「380(19×20)μm」且透光部與遮光部的比成為「21：19」之假想的光柵圖案。且，藉由此合成光柵圖案，生成第1周期800μm的第1條紋圖案W1。As a result, in the grating unit 20, as a composite grating pattern in which the grating patterns 30 of the two grating plates 25 and 26 are superimposed, the width of the light-transmitting portion in the X´ axis direction is formed to be "420 (21×20) μm", X ´The width of the light-shielding part in the axial direction is "380(19×20)μm" and the ratio of the light-transmitting part to the light-shielding part becomes a virtual grating pattern of "21:19". Then, by synthesizing the grating pattern in this way, a first stripe pattern W1 with a first period of 800 μm is generated.

另一方面，在生成短周期的第2條紋圖案W2之情況，係驅動控制光柵板移動機構27以使可動光柵板26朝X´軸方向滑動變位，如圖11(b)所示，使可動光柵板26側的遮光部32與固定光柵板25側的透光部31之X´軸方向中央部對位。On the other hand, in the case of generating the short-period second stripe pattern W2, the grating plate moving mechanism 27 is driven and controlled to make the movable grating plate 26 slide and displace in the X´ axis direction, as shown in Figure 11(b), The light-shielding portion 32 on the side of the movable grating plate 26 is aligned with the center portion in the X'axis direction of the light-transmitting portion 31 on the side of the fixed grating plate 25.

其結果，在光柵單元20，作為重疊有兩光柵板25、26的光柵圖案30之合成光柵圖案，係形成X´軸方向之透光部的寬度為「200(10×20)μm」、X´軸方向之遮光部的寬度為「200(10×20)μm」且透光部與遮光部的比成為「1：1」之假想的光柵圖案。且，藉由此合成光柵圖案，生成第2周期400μm的第2條紋圖案W2。As a result, in the grating unit 20, as a composite grating pattern in which the grating patterns 30 of the two grating plates 25 and 26 are superimposed, the width of the light-transmitting part in the X´ axis direction is formed as "200 (10×20) μm", X ´The width of the light-shielding part in the axial direction is "200(10×20)μm" and the ratio of the light-transmitting part to the light-shielding part becomes a virtual grating pattern of "1:1". Then, by synthesizing the grating pattern in this way, a second stripe pattern W2 with a second period of 400 μm is generated.

如以上詳述，根據本實施形態，可謀求與上述第1、2實施形態同樣的作用效果。As described in detail above, according to this embodiment, the same effects as the above-mentioned first and second embodiments can be obtained.

〔第4實施形態〕 其次，參照圖12，詳細說明關於第4實施形態。本實施形態的光柵單元20係由一個固定光柵板25、和兩個可動光柵板26所構成。具體而言，具備有位於固定光柵板25的上側之第1可動光柵板26A、和位於固定光柵板25的下側之第2可動光柵板26B。[Fourth Embodiment] Next, referring to Fig. 12, the fourth embodiment will be described in detail. The grating unit 20 of this embodiment is composed of one fixed grating plate 25 and two movable grating plates 26. Specifically, a first movable grating plate 26A located on the upper side of the fixed grating plate 25 and a second movable grating plate 26B located on the lower side of the fixed grating plate 25 are provided.

在本實施形態的固定光柵板25及可動光柵板26(26A、26B)中，X´軸方向之透光部31的寬度設定為「1000(50×20)μm」，X´軸方向之遮光部32的寬度設定為「200(10×20)μm」，透光部31與遮光部32的比成為「5：1」〔參照圖12(a)、(b)〕。In the fixed grating plate 25 and the movable grating plate 26 (26A, 26B) of this embodiment, the width of the light-transmitting part 31 in the X´ axis direction is set to "1000 (50×20) μm", and the light is shielded in the X´ axis direction The width of the portion 32 is set to "200 (10×20) μm", and the ratio of the light-transmitting portion 31 to the light-shielding portion 32 is "5:1" [see FIGS. 12(a) and (b)].

接著，在生成長周期的第1條紋圖案W1之情況，驅動控制光柵板移動機構27以使第1可動光柵板26A及第2可動光柵板26B分別朝X´軸方向滑動變位，如圖12(a)所示，使第1可動光柵板26A側的遮光部32的X´軸方向另一端部(右端部)對準固定光柵板25側的遮光部32的X´軸方向一端部(左端部)的位置，並且使第2可動光柵板26B側的遮光部32的X´軸方向一端部(左端部)對準固定光柵板25側的遮光部32的X´軸方向另一端部(右端部)的位置。Next, when the long-period first stripe pattern W1 is generated, the grating plate moving mechanism 27 is driven and controlled so that the first movable grating plate 26A and the second movable grating plate 26B are respectively slid and displaced in the X´ axis direction, as shown in Figure 12 As shown in (a), the other end (right end) in the X´ axis direction of the light shielding portion 32 on the side of the first movable grating plate 26A is aligned with the X´ axis direction end (left end) of the light shielding portion 32 on the fixed grating plate 25 side Part) and align one end (left end) in the X´ axis direction of the light shielding part 32 on the side of the second movable grating plate 26B with the other end part (right end) in the X´ axis direction of the light shielding part 32 on the fixed grating plate 25 side Department).

其結果，在光柵單元20，作為重疊有三個光柵板25、26A、26B的光柵圖案30之合成光柵圖案，係形成X´軸方向之透光部的寬度為「600(30×20)μm」、X´軸方向之遮光部的寬度為「600(30×20)μm」且透光部與遮光部的比成為「1：1」之假想的光柵圖案。且，藉由此合成光柵圖案，生成第1周期1200μm的第1條紋圖案W1。As a result, in the grating unit 20, as a composite grating pattern in which the grating pattern 30 of three grating plates 25, 26A, 26B is superimposed, the width of the light-transmitting part in the X´ axis direction is formed to be "600 (30×20) μm" , The width of the light-shielding part in the X´ axis direction is "600(30×20)μm" and the ratio of the light-transmitting part to the light-shielding part becomes a virtual grating pattern of "1:1". And, by synthesizing the grating pattern in this way, a first stripe pattern W1 with a first period of 1200 μm is generated.

另一方面，在生成短周期的第2條紋圖案W2之情況，係驅動控制光柵板移動機構27以使第1可動光柵板26A及第2可動光柵板26B分別朝X´軸方向滑動變位，如圖12(b)所示，使第1可動光柵板26A側的遮光部32從固定光柵板25側的遮光部32朝X´軸方向一方側(左方)離開既定量〔200(10×20)μm〕，並且使第2可動光柵板26B側的遮光部32從固定光柵板25側的遮光部32朝X´軸方向另一方側(右方)離開既定量〔200(10×20)μm〕。On the other hand, when the short-period second stripe pattern W2 is generated, the grating plate moving mechanism 27 is driven and controlled so that the first movable grating plate 26A and the second movable grating plate 26B are slid and displaced in the X´ axis direction, respectively. As shown in Fig. 12(b), the light shielding portion 32 on the side of the first movable grating plate 26A is separated from the light shielding portion 32 on the side of the fixed grating plate 25 to one side (left) in the X´ axis direction by a predetermined amount [200(10× 20)μm], and the light-shielding portion 32 on the side of the second movable grating plate 26B is separated from the light-shielding portion 32 on the side of the fixed grating plate 25 to the other side (right) in the X´ axis direction by a predetermined amount [200 (10×20) μm].

其結果，在光柵單元20，作為重疊有三個光柵板25、26A、26B的光柵圖案30之合成光柵圖案，係形成X´軸方向之透光部的寬度為「200(10×20)μm」、X´軸方向之遮光部的寬度為「200(10×20)μm」且透光部與遮光部的比成為「1：1」之假想的光柵圖案。且，藉由此合成光柵圖案，生成第2周期400μm的第2條紋圖案W2。As a result, in the grating unit 20, as a composite grating pattern 30 superimposed on three grating plates 25, 26A, 26B, the width of the light-transmitting part in the X´ axis direction is formed to be "200 (10×20) μm" , The width of the light-shielding part in the X´ axis direction is "200(10×20)μm" and the ratio of the light-transmitting part to the light-shielding part becomes a virtual grating pattern of "1:1". Then, by synthesizing the grating pattern in this way, a second stripe pattern W2 with a second period of 400 μm is generated.

如以上詳述，根據本實施形態，可達成與上述第1實施形態同樣的作用效果。尤其，根據本實施形態，藉由使用三個光柵板25、26A、26B，可使長周期的第1條紋圖案W1、與短周期的第2條紋圖案W2之周期的差變大。As described in detail above, according to this embodiment, the same effects as those of the first embodiment described above can be achieved. In particular, according to this embodiment, by using three grating plates 25, 26A, and 26B, the period difference between the first stripe pattern W1 with a long period and the second stripe pattern W2 with a short period can be increased.

〔第5實施形態〕 其次，參照圖13，詳細說明關於第5實施形態。在本實施形態之固定光柵板25及可動光柵板26中，X´軸方向之透光部31的寬度設定為「500(25×20)μm」，X´軸方向之遮光部32的寬度設定為「300(15×20)μm」，透光部31與遮光部32的比成為「5：3」〔參照圖13(a)、(b)〕。[Fifth Embodiment] Next, referring to FIG. 13, the fifth embodiment will be described in detail. In the fixed grating plate 25 and the movable grating plate 26 of this embodiment, the width of the light-transmitting part 31 in the X´ axis direction is set to "500(25×20)μm", and the width of the light-shielding part 32 in the X´ axis direction is set It is "300 (15×20) μm", and the ratio of the light-transmitting portion 31 to the light-shielding portion 32 is "5:3" [see FIGS. 13(a) and (b)].

其中，本實施形態的遮光部32係由透射率不同的複數個部位所構成。更詳言之，在透射率高的部位(透光部31)與透射率低的部位(遮光部32中之透射率較低的部位)之間，設有透射率為中等程度的部位。Among them, the light shielding portion 32 of the present embodiment is composed of a plurality of locations with different transmittances. To be more specific, between a portion with high transmittance (light-transmitting portion 31) and a portion with low transmittance (a portion with low transmittance in the light shielding portion 32), a portion with a medium transmittance is provided.

具體而言，在遮光部32的X´軸方向中央部之「100(5×20)μm」範圍設有透射率25%的高遮光部，在該高遮光部的X´軸方向兩側的「100(5×20)μm」範圍分別設有透射率50%的中遮光部。另一方面，本實施形態之透光部31的透射率為100%。Specifically, a high light-shielding part with a transmittance of 25% is provided in the center of the X´-axis direction of the light-shielding part 32 in the "100(5×20)μm" range. In the range of "100(5×20)μm", a middle light shielding part with a transmittance of 50% is provided. On the other hand, the transmittance of the light-transmitting portion 31 of this embodiment is 100%.

接著，在生成長周期的第1條紋圖案W1之情況，驅動控制光柵板移動機構27以使可動光柵板26朝X´軸方向滑動變位，如圖13(a)所示，以包含固定光柵板25側的遮光部32之X´軸方向一端部(右端部)的既定範圍(透射率50%的部位)、與包含可動光柵板26側的遮光部32之X´軸方向另一端部(左端部)的既定範圍(透射率50%的部位)在X´軸方向重疊之方式對位。Next, when the long-period first stripe pattern W1 is generated, the grating plate moving mechanism 27 is driven and controlled to make the movable grating plate 26 slide and displace in the X´ axis direction, as shown in Figure 13(a), to include a fixed grating The predetermined range (the part with 50% transmittance) in the X´ axis direction of the light shielding portion 32 on the side of the plate 25 and the other end in the X´ axis direction including the light shielding portion 32 on the movable grating plate 26 side ( The predetermined range (50% transmittance) of the left end) overlaps in the X´ axis direction.

其結果，在光柵單元20，作為重疊有兩光柵板25、26的光柵圖案30之合成光柵圖案，係形成X´軸方向之透光部的寬度為「300(15×20)μm」、X´軸方向之遮光部的寬度為「500(25×20)μm」且透光部與遮光部的比成為「3：5」之假想的光柵圖案。As a result, in the grating unit 20, as a composite grating pattern in which the grating patterns 30 of the two grating plates 25 and 26 are superimposed, the width of the light-transmitting part in the X´ axis direction is formed to be "300 (15×20) μm", X ´The width of the light-shielding part in the axial direction is "500(25×20)μm" and the ratio of the light-transmitting part to the light-shielding part becomes a virtual grating pattern of "3:5".

其中，合成光柵圖案的遮光部，其X´軸方向中央部的「300(15×20)μm」範圍係成為透射率25%的高遮光部，該高遮光部的X´軸方向兩側的「100(5×20)μm」範圍係成為透射率50%的中遮光部。Among them, the light-shielding part of the composite grating pattern, the range of "300(15×20)μm" in the center of the X´ axis direction is a high light-shielding part with a transmittance of 25%. The high light-shielding part is on both sides of the X´ axis direction. The range of "100(5×20)μm" is the middle shading part with 50% transmittance.

接著，藉由此合成光柵圖案，生成第1周期800μm的第1條紋圖案W1。Next, by combining the grating patterns in this way, a first stripe pattern W1 with a first period of 800 μm is generated.

另一方面，在生成短周期的第2條紋圖案W2之情況，驅動控制光柵板移動機構27以使可動光柵板26朝X´軸方向滑動變位，如圖13(b)所示，使可動光柵板26側的遮光部32與固定光柵板25側的透光部31的X´軸方向中央部對位。On the other hand, when the short-period second stripe pattern W2 is generated, the grating plate moving mechanism 27 is driven and controlled so that the movable grating plate 26 is slid and displaced in the X´ axis direction, as shown in Figure 13(b), making the The light shielding portion 32 on the side of the grating plate 26 is aligned with the center portion in the X´ axis direction of the light transmitting portion 31 on the side of the fixed grating plate 25.

其結果，在光柵單元20，作為重疊有兩光柵板25、26的光柵圖案30之合成光柵圖案，係形成X´軸方向之透光部的寬度為「100(5×20)μm」、X´軸方向之遮光部的寬度為「300(15×20)μm」且透光部與遮光部的比成為「1：3」之假想的光柵圖案。As a result, in the grating unit 20, as a composite grating pattern in which the grating patterns 30 of the two grating plates 25 and 26 are superimposed, the width of the light-transmitting portion in the X´ axis direction is "100 (5×20) μm", X ´The width of the light-shielding part in the axial direction is "300(15×20)μm" and the ratio of the light-transmitting part to the light-shielding part becomes a virtual grating pattern of "1:3".

其中，合成光柵圖案的遮光部，其X´軸方向中央部的「100(5×20)μm」範圍係成為透射率25%的高遮光部，該高遮光部的X´軸方向兩側的「100(5×20)μm」範圍係成為透射率50%的中遮光部。Among them, the light-shielding part of the composite grating pattern, the range of "100(5×20)μm" in the center of the X´ axis direction is a high light-shielding part with a transmittance of 25%. The high light-shielding part is on both sides of the X´ axis direction. The range of "100(5×20)μm" is the middle shading part with 50% transmittance.

接著，藉由此合成光柵圖案，生成第2周期400μm的第2條紋圖案W2。Next, by thus synthesizing the grating pattern, a second stripe pattern W2 with a second period of 400 μm is generated.

如以上詳述，根據本實施形態，可達成與上述第1實施形態同樣的作用效果。尤其，根據本實施形態，藉由遮光部32由透射率不同的複數個部位所構成，可對印刷基板1投影更理想的條紋圖案W。As described in detail above, according to this embodiment, the same effects as those of the first embodiment described above can be achieved. In particular, according to the present embodiment, since the light shielding portion 32 is composed of a plurality of locations with different transmittances, a more ideal stripe pattern W can be projected on the printed circuit board 1.

〔第6實施形態〕 其次，參照圖14，詳細說明關於第6實施形態。在本實施形態之固定光柵板25及可動光柵板26中，X´軸方向之透光部31的寬度設定為「500(25×20)μm」，X´軸方向之遮光部32的寬度設定為「300(15×20)μm」，透光部31與遮光部32的比成為「5：3」〔參照圖14(a)、(b)〕。[Sixth Embodiment] Next, referring to Fig. 14, the sixth embodiment will be described in detail. In the fixed grating plate 25 and the movable grating plate 26 of this embodiment, the width of the light-transmitting part 31 in the X´ axis direction is set to "500(25×20)μm", and the width of the light-shielding part 32 in the X´ axis direction is set It is "300 (15×20) μm", and the ratio of the light-transmitting portion 31 to the light-shielding portion 32 is "5:3" [see FIGS. 14(a) and (b)].

其中，本實施形態的遮光部32係由透射率不同的複數個部位所構成。更詳言之，在透射率高的部位(透光部31)與透射率低的部位(遮光部32中之透射率更低的部位)之間，設有透射率為中等程度的部位。Among them, the light shielding portion 32 of the present embodiment is composed of a plurality of locations with different transmittances. To be more specific, a portion with a medium transmittance is provided between a portion with high transmittance (light-transmitting portion 31) and a portion with low transmittance (a portion with lower transmittance in the light shielding portion 32).

具體而言，在遮光部32的X´軸方向中央部之「200(10×20)μm」範圍設有透射率50%的中遮光部，在該中遮光部的X´軸方向兩側的「50(2.5×20)μm」範圍分別設有透射率75%的低遮光部。另一方面，本實施形態之透光部31的透射率為100%。Specifically, a central light-shielding part with a transmittance of 50% is provided in the center of the X´-axis direction of the light-shielding part 32 in the "200(10×20)μm" range. In the "50(2.5×20)μm" area, a low light-shielding part with a transmittance of 75% is provided. On the other hand, the transmittance of the light-transmitting portion 31 of this embodiment is 100%.

接著，在生成長周期的第1條紋圖案W1之情況，驅動控制光柵板移動機構27以使可動光柵板26朝X´軸方向滑動變位，如圖14(a)所示，以包含固定光柵板25側的遮光部32之X´軸方向一端部(右端部)的既定範圍(100μm範圍)、與包含可動光柵板26側的遮光部32之X´軸方向另一端部(左端部)的既定範圍(100μm範圍)在X´軸方向重疊之方式對位。Next, when the long-period first stripe pattern W1 is generated, the grating plate moving mechanism 27 is driven and controlled so that the movable grating plate 26 is slid and displaced in the X´ axis direction, as shown in Figure 14(a), to include a fixed grating The predetermined range (100μm range) of one end (right end) in the X´ axis direction of the light shielding portion 32 on the side of the plate 25 and the other end (left end) in the X´ axis direction of the light shielding portion 32 on the side of the movable grating plate 26 Alignment in a way that the predetermined range (100μm range) overlaps in the X´ axis direction.

其結果，在光柵單元20，作為重疊有兩光柵板25、26的光柵圖案30之合成光柵圖案，係形成X´軸方向之透光部的寬度為「300(15×20)μm」、X´軸方向之遮光部的寬度為「500(25×20)μm」且透光部與遮光部的比成為「3：5」之假想的光柵圖案。As a result, in the grating unit 20, as a composite grating pattern in which the grating patterns 30 of the two grating plates 25 and 26 are superimposed, the width of the light-transmitting part in the X´ axis direction is formed to be "300 (15×20) μm", X ´The width of the light-shielding part in the axial direction is "500(25×20)μm" and the ratio of the light-transmitting part to the light-shielding part becomes a virtual grating pattern of "3:5".

其中，合成光柵圖案的遮光部，其X´軸方向中央部的「100(5×20)μm」範圍係成為透射率38%的高遮光部，該高遮光部的X´軸方向兩側的「150(7.5×20)μm」範圍係分別成為透射率50%的中遮光部，再者，其外側的「50(2.5×20)μm」範圍係分別成為透射率75%的低遮光部。Among them, the light-shielding part of the composite grating pattern, the range of "100(5×20)μm" in the center of the X´ axis direction is a high light-shielding part with 38% transmittance. The high light-shielding part is on both sides of the X´ axis direction. The "150(7.5×20)μm" range becomes the middle shading part with 50% transmittance, and the outer “50(2.5×20)μm” range becomes the low shading part with 75% transmittance.

接著，藉由此合成光柵圖案，生成第1周期800μm的第1條紋圖案W1。Next, by combining the grating patterns in this way, a first stripe pattern W1 with a first period of 800 μm is generated.

另一方面，在生成短周期的第2條紋圖案W2之情況，驅動控制光柵板移動機構27以使可動光柵板26朝X´軸方向滑動變位，如圖14(b)所示，使可動光柵板26側的遮光部32與固定光柵板25側的透光部31的X´軸方向中央部對位。On the other hand, when the short-period second stripe pattern W2 is generated, the grating plate moving mechanism 27 is driven and controlled so that the movable grating plate 26 is slid and displaced in the X´ axis direction, as shown in Fig. 14(b), making the movable The light shielding portion 32 on the side of the grating plate 26 is aligned with the center portion in the X´ axis direction of the light transmitting portion 31 on the side of the fixed grating plate 25.

其結果，在光柵單元20，作為重疊有兩光柵板25、26的光柵圖案30之合成光柵圖案，係形成X´軸方向之透光部的寬度為「100(5×20)μm」、X´軸方向之遮光部的寬度為「300(15×20)μm」且透光部與遮光部的比成為「1：3」之假想的光柵圖案。As a result, in the grating unit 20, as a composite grating pattern in which the grating patterns 30 of the two grating plates 25 and 26 are superimposed, the width of the light-transmitting portion in the X´ axis direction is "100 (5×20) μm", X ´The width of the light-shielding part in the axial direction is "300(15×20)μm" and the ratio of the light-transmitting part to the light-shielding part becomes a virtual grating pattern of "1:3".

其中，合成光柵圖案的遮光部，其X´軸方向中央部的「200(10×20)μm」範圍係成為透射率50%的中遮光部，該中遮光部的X´軸方向兩側的「50(2.5×20)μm」範圍係分別成為透射率75%的低遮光部。Among them, the light-shielding part of the composite grating pattern, the range of "200(10×20)μm" in the center of the X´-axis direction is the middle light-shielding part with a transmittance of 50%. The "50(2.5×20)μm" range is a low light-shielding part with a transmittance of 75%.

接著，藉由此合成光柵圖案，生成第2周期400μm的第2條紋圖案W2。Next, by thus synthesizing the grating pattern, a second stripe pattern W2 with a second period of 400 μm is generated.

如以上詳述，根據本實施形態，可達成與上述第1、第5實施形態同樣的作用效果。As described in detail above, according to this embodiment, the same effects as the above-mentioned first and fifth embodiments can be achieved.

此外，不限定於上述實施形態之記載內容，例如，亦可如以下般地實施。當然，亦可為以下未例示的其他應用例、變形例。In addition, it is not limited to the description content of the said embodiment, For example, you may implement as follows. Of course, other application examples and modifications not illustrated below may also be used.

(a)上述各實施形態中，雖將本案發明之投影裝置及三維測量裝置具體化成對印刷於印刷基板1之焊膏5的印刷狀態進行檢查之基板檢查裝置10，但不限定於此，例如亦可具體化成對安裝於印刷基板上的電子零件等其他對象進行檢查之裝置。當然，亦可作成將與印刷基板不同的對象物作為被測量物來進行三維測量之構成。(a) In each of the above embodiments, the projection device and the three-dimensional measuring device of the present invention are embodied as the substrate inspection device 10 that inspects the printing state of the solder paste 5 printed on the printed circuit board 1, but it is not limited to this, for example It can also be embodied as a device that inspects other objects such as electronic parts mounted on a printed circuit board. Of course, it can also be configured to perform three-dimensional measurement using an object different from the printed circuit board as the object to be measured.

(b)在上述各實施形態中，以將混合有電源電路部PA及控制電路部PB的印刷基板1作為被測量物，對該印刷基板1上的電源電路部PA投影長周期的第1條紋圖案W1來進行三維測量，且對控制電路部PB投影短周期的第2條紋圖案W2來進行三維測量之方式，作成依據印刷基板1上之各檢查範圍的凹凸程度來切換條紋圖案W的周期之構成。(b) In each of the above embodiments, the printed circuit board 1 mixed with the power supply circuit section PA and the control circuit section PB is used as the object to be measured, and the long-period first stripes are projected on the power supply circuit section PA on the printed circuit board 1. The pattern W1 is used for three-dimensional measurement, and a short-period second stripe pattern W2 is projected on the control circuit section PB to perform three-dimensional measurement. It is made to switch the period of the stripe pattern W according to the degree of unevenness of each inspection range on the printed circuit board 1. constitute.

不限定於此，亦可為以將僅具有電源電路部PA的印刷基板作為被測量物、對其僅投影長周期的第1條紋圖案W1來進行三維測量，將僅具有控制電路部PB的印刷基板作為被測量物，且對其僅投影短周期的第2條紋圖案W2來進行三維測量之方式，作成依據在製造線所製造的印刷基板的種類來切換條紋圖案W的周期之構成。It is not limited to this, and a printed circuit board with only the power circuit part PA as the object to be measured, and only the long-period first stripe pattern W1 is projected on it for three-dimensional measurement, and printing with only the control circuit part PB The substrate is used as the object to be measured, and only a short-period second stripe pattern W2 is projected on the substrate to perform three-dimensional measurement. The structure is configured to switch the period of the stripe pattern W according to the type of printed circuit board manufactured in the manufacturing line.

又，亦可作成對電源電路部PA，將長周期的第1條紋圖案W1與短周期的第2條紋圖案W2兩者分別作複數種投影之構成，並組合兩者來進行三維測量。藉此，測量時間雖然會增加，但是可在不會降低高度解析度的情況下擴大動態範圍。In addition, it is also possible to form a pair of power supply circuit parts PA in which both the long-period first stripe pattern W1 and the short-period second stripe pattern W2 are respectively projected in plural kinds, and the two are combined to perform three-dimensional measurement. In this way, although the measurement time will increase, the dynamic range can be expanded without reducing the high resolution.

(c)上述各實施形態中，在利用相移法進行三維測量方面，係構成為取得使條紋圖案W的相位逐次相差90°的4種圖像資料，但相移次數及相移量並不限定於此等。也可採用能夠利用相移法進行三維測量之其他的相移次數及相移量。例如，亦可構成為取得相位逐次相差120°或90°的3種圖像資料來進行三維測量。(c) In each of the above embodiments, the phase shift method is used to perform three-dimensional measurement. The system is configured to obtain four types of image data that make the phase of the fringe pattern W gradually differ by 90°, but the number of phase shifts and the amount of phase shift are not Limited to this. Other phase shift times and phase shift amounts that can be used for three-dimensional measurement using the phase shift method can also be used. For example, it can also be configured to acquire three types of image data whose phases are successively different by 120° or 90° to perform three-dimensional measurement.

(d)上述各實施形態中，在藉由相移法進行三維測量方面，作為條紋圖案W，係構成為投影具有正弦波狀的光強度分布之圖案光，但不限定於此，作為條紋圖案W，亦可構成為例如具有投影矩形波狀、三角波狀等非正弦波狀的光強度分布之圖案光。(d) In each of the above embodiments, in terms of performing three-dimensional measurement by the phase shift method, the fringe pattern W is configured to project patterned light having a sine wave-like light intensity distribution, but it is not limited to this, as the fringe pattern W may also be configured as patterned light having a non-sinusoidal light intensity distribution such as a projected rectangular wave shape and a triangular wave shape.

其中，比起投影具有非正弦波狀的光強度分布之圖案光並進行三維測量者，投影具有正弦波狀的光強度分布之圖案光並進行三維測量者的測量精度較佳。因此，在達成測量精度的提升這點上，較佳為構成為投影具有正弦波狀的光強度分布之圖案光並進行三維測量。Among them, the measurement accuracy is better for those who project pattern light with non-sinusoidal light intensity distribution and perform three-dimensional measurement, and those who project pattern light with sinusoidal light intensity distribution and perform three-dimensional measurement have better measurement accuracy. Therefore, in terms of achieving improvement in measurement accuracy, it is preferable to configure the projection of patterned light having a sinusoidal light intensity distribution and perform three-dimensional measurement.

(e)上述各實施形態中，係構成為對印刷基板1投影條紋圖案W，並藉由相移法進行三維測量，惟不限定於此，例如亦可構成為利用空間編碼法(space coding method)、疊紋法(moire method)等其他的圖案投影法來進行三維測量。其中，在對焊膏5等的小測量對象進行測量時，更佳為採用相移法等測量精度高的測量方法。(e) In each of the above embodiments, the stripe pattern W is projected on the printed substrate 1 and three-dimensional measurement is performed by the phase shift method. However, it is not limited to this. For example, it may be configured to use a space coding method. ), moire method and other pattern projection methods for three-dimensional measurement. Among them, when measuring small measurement objects such as solder paste 5, it is more preferable to adopt a measurement method with high measurement accuracy such as a phase shift method.

(f)上述各實施形態中，係構成為使檢查單元12(投影裝置14及相機15)相對於固定在既定位置之印刷基板1上的複數個檢查範圍依序移動，藉此進行印刷基板1的整個區域之檢查。不限定於此，亦可構成為在使檢查單元12固定的狀態下，使印刷基板1移動，藉此進行印刷基板1整個區域的檢查。(f) In each of the above-mentioned embodiments, the inspection unit 12 (projection device 14 and camera 15) is configured to move sequentially with respect to a plurality of inspection ranges on the printed circuit board 1 fixed at a predetermined position, thereby performing the printed circuit board 1. Inspection of the entire area. It is not limited to this, and it may be comprised so that the whole area|region of the printed circuit board 1 can be inspected by moving the printed circuit board 1 in the state which fixed the inspection unit 12.

又，在上述各實施形態中，藉由在投影裝置14中具備使光柵單元20變位之光柵單元移動機構22，構成為在不使檢查單元12與印刷基板1相對移動的情況下，使固定於既定位置的印刷基板1、和投影於此之條紋圖案W的相對位置關係改變(相移)，惟使條紋圖案W與印刷基板1相對變位的構成(圖案光變位手段)並不限定於上述實施形態。In addition, in each of the above-mentioned embodiments, the projection device 14 is provided with the grating unit moving mechanism 22 for displacing the grating unit 20, so that the inspection unit 12 and the printed circuit board 1 are not moved relative to each other. The relative positional relationship between the printed circuit board 1 at a predetermined position and the stripe pattern W projected thereon is changed (phase shift), but the configuration (pattern light displacement means) for relatively displacing the stripe pattern W and the printed circuit board 1 is not limited In the above embodiment.

例如，如上述在印刷基板的整個區域中，在沒有切換所投影之條紋圖案W的周期之情況下，亦可構成為藉由輸送機(conveyor)等使印刷基板連續移動，或者藉由使檢查單元12相對於所固定的印刷基板連續移動，而使該印刷基板與投影於此之條紋圖案W的相對位置關係改變(相移)。For example, as described above, in the entire area of the printed circuit board, without switching the period of the projected stripe pattern W, the printed circuit board may be continuously moved by a conveyor or the like, or by making inspection The unit 12 continuously moves relative to the fixed printed circuit board, so that the relative positional relationship between the printed circuit board and the stripe pattern W projected thereon is changed (phase shifted).

(g)上述各實施形態中，光源19係由射出白色光的鹵素燈所構成。不限定於此，亦可構成為使用白色LED等其他的光源。(g) In each of the above embodiments, the light source 19 is composed of a halogen lamp that emits white light. Not limited to this, it may be configured to use other light sources such as white LEDs.

(h)圖案生成部的構成並不限定於上述各實施形態的光柵單元20。(h) The configuration of the pattern generation unit is not limited to the grating unit 20 of the above-mentioned respective embodiments.

例如在上述各實施形態中，係構成為在具有透光性的本體殼部24內收容有固定光柵板25及可動光柵板26，但不限定於此，例如亦可作成藉由框架等使固定光柵板25及可動光柵板26等形成單元化之構成。For example, in each of the above embodiments, the fixed grating plate 25 and the movable grating plate 26 are housed in the translucent main body portion 24. However, it is not limited to this. For example, it may be fixed by a frame or the like. The grating plate 25, the movable grating plate 26, etc. form a unitized structure.

上述各實施形態中，係構成為具備一個經固定的固定光柵板25、與一個或兩個可動光柵板26，但不限定於此，亦可作成以四個以上的光柵板相對向的方式配置之構成。In each of the above embodiments, it is configured to include a fixed fixed grating plate 25 and one or two movable grating plates 26, but it is not limited to this, and four or more grating plates may be arranged facing each other. The composition.

又，亦可將所有的光柵板作成可動光柵板。例如亦可構成為藉由具備第1可動光柵板和第2可動光柵板，並藉由使此等分別移動，來變更兩者的相對位置關係。In addition, all grating plates can be made into movable grating plates. For example, it may be configured to include a first movable grating plate and a second movable grating plate, and by moving these separately to change the relative positional relationship between the two.

(i)上述各實施形態的光柵單元20中，係構成為與印刷基板1上的電源電路部PA對應，生成長周期的第1條紋圖案W1，且與控制電路部PB對應，生成短周期的第2條紋圖案W2，但光柵單元20所生成之條紋圖案W的數量(種類)、具體的周期並不限定於上述各實施形態。(i) In the grating unit 20 of each of the above-mentioned embodiments, the first stripe pattern W1 of a long period is generated corresponding to the power circuit section PA on the printed circuit board 1, and the first stripe pattern W1 of a long period is generated corresponding to the control circuit section PB to generate a short period As for the second stripe pattern W2, the number (kind) and specific period of the stripe patterns W generated by the grating unit 20 are not limited to the above-mentioned respective embodiments.

例如，亦可構成為依據印刷基板1上的檢查範圍的凹凸程度，生成周期不同之3種以上的條紋圖案W。For example, it may be configured to generate three or more types of stripe patterns W with different periods according to the degree of unevenness of the inspection range on the printed circuit board 1.

(j)光柵移動手段的構成並不限定於上述各實施形態的光柵板移動機構27。例如，上述光柵板移動機構27係使用作為使可動光柵板26滑動變位的驅動手段之螺線管27b，但並不限定於此，亦可採用壓電元件等其他的致動器。(j) The structure of the grating moving means is not limited to the grating plate moving mechanism 27 of each embodiment described above. For example, the above-mentioned grating plate moving mechanism 27 uses a solenoid 27b as a driving means for sliding and displacing the movable grating plate 26, but it is not limited to this, and other actuators such as piezoelectric elements may be used.

(k)圖案光變位手段的構成並不限定於上述各實施形態的光柵單元移動機構22。例如上述光柵單元移動機構22係使用作為使光柵單元20滑動變位的驅動手段之壓電元件22b，但並不限定於此，亦可採用螺線管等其他的致動器。(k) The configuration of the pattern light displacement means is not limited to the grating unit moving mechanism 22 of the above-mentioned respective embodiments. For example, the above-mentioned grating unit moving mechanism 22 uses a piezoelectric element 22b as a driving means for sliding and displacing the grating unit 20, but it is not limited to this, and other actuators such as a solenoid may be used.

(l)光柵構件及光柵圖案的構成並不限定於上述各實施形態之固定光柵板25及可動光柵板26與光柵圖案30。(1) The structure of the grating member and the grating pattern is not limited to the fixed grating plate 25, the movable grating plate 26 and the grating pattern 30 of the above-mentioned respective embodiments.

例如，上述各實施形態的光柵板25、26係作成光柵圖案30的印刷面配置成朝向射入側之構成，但不限定於此，例如亦可作成光柵圖案30的印刷面配置成朝向射出側之構成。For example, the grating plates 25 and 26 of the above-mentioned respective embodiments are configured such that the printing surface of the grating pattern 30 is arranged facing the incident side, but it is not limited to this. For example, the printing surface of the grating pattern 30 may be arranged facing the emission side. The composition.

又，固定光柵板25及可動光柵板26可作成光柵圖案30的印刷面彼此配置成相對向之構成，亦可作成光柵圖案30的非印刷面彼此配置成相對向之構成。光柵圖案30的印刷面配置成彼此相對向，在條紋圖案W容易對焦這點上是較佳的。In addition, the fixed grating plate 25 and the movable grating plate 26 may be configured such that the printed surfaces of the grating pattern 30 are arranged facing each other, or may be configured such that the non-printed surfaces of the grating pattern 30 are arranged facing each other. The printing surfaces of the grating pattern 30 are arranged to face each other, and it is preferable that the stripe pattern W is easily focused.

此外，上述各實施形態中，雖未特別提及，但可將固定光柵板25及可動光柵板26如圖7所示般作成在抵接的狀態下配置之構成，亦可如圖8等所示般作成在分離(接近)的狀態下配置之構成。In addition, although not specifically mentioned in the above embodiments, the fixed grating plate 25 and the movable grating plate 26 may be arranged in a contact state as shown in FIG. 7, or may be configured as shown in FIG. 8, etc. It is generally configured to be arranged in a separated (closed) state.

(m)在上述各實施形態的光柵板25、26中，在藉由既定的透光材料(例如玻璃、丙烯酸樹脂等)形成平板狀或薄膜狀的基材28上，印刷(蒸鍍)形成遮光部32，藉此形成有光柵圖案30。(m) In the grating plates 25 and 26 of each of the above embodiments, the substrate 28 is formed by printing (evaporation) on a flat or film-like substrate 28 formed of a predetermined light-transmitting material (for example, glass, acrylic resin, etc.) The light shielding portion 32 thereby forms a grating pattern 30.

不限定於此，例如亦可作成藉由雷射加工等其他的方法形成光柵圖案之構成。It is not limited to this, for example, it can also be made into the structure which forms a grating pattern by other methods, such as laser processing.

又，亦可採用藉由加工不透明樹脂、金屬等並形成狹縫(slit)等的開口而形成有光柵圖案的光柵板等。In addition, a grating plate in which a grating pattern is formed by processing an opaque resin, metal, etc. and forming slits and other openings can also be used.

又，透光部31及遮光部32的透射率並不限定於上述各實施形態。例如，透光部31的透射率並不限定為100%，亦可為95%左右的透射率。In addition, the transmittance of the light-transmitting portion 31 and the light-shielding portion 32 is not limited to the above-mentioned respective embodiments. For example, the transmittance of the light-transmitting portion 31 is not limited to 100%, and may be about 95%.

上述各實施形態中，形成於固定光柵板25及可動光柵板26的光柵圖案30係相同。不限定於此，只要可藉由此等光柵板25、26，生成周期不同的複數個條紋圖案W，則形成於此等光柵板25、26的光柵圖案30亦可不相同。In the above embodiments, the grating patterns 30 formed on the fixed grating plate 25 and the movable grating plate 26 are the same. It is not limited to this, and the grating patterns 30 formed on these grating plates 25 and 26 may be different as long as the grating plates 25 and 26 can generate a plurality of stripe patterns W with different periods.

又，透光部31、遮光部32的寬度等光柵圖案30的具體尺寸並不受上述各實施形態所限。In addition, the specific dimensions of the grating pattern 30, such as the width of the light-transmitting portion 31 and the light-shielding portion 32, are not limited by the foregoing embodiments.

(n)投影光學系的構成並不限定為上述各實施形態的投影透鏡單元21。(n) The configuration of the projection optical system is not limited to the projection lens unit 21 of each embodiment described above.

例如，上述各實施形態的投影透鏡單元21係具有射入側透鏡35及射出側透鏡36，藉由此等兩透鏡35、36構成為兩側遠心透鏡光學系(兩側遠心透鏡)。不限定於此，作為投影透鏡單元21，亦可採用物體側遠心透鏡(物體側遠心光學系)。又，亦可作成不具有遠心構造之構成。For example, the projection lens unit 21 of each of the above-mentioned embodiments has an entrance-side lens 35 and an exit-side lens 36, and the two lenses 35 and 36 constitute a two-sided telecentric lens optical system (two-sided telecentric lens). It is not limited to this, and as the projection lens unit 21, an object-side telecentric lens (object-side telecentric optical system) may be used. In addition, it can also be constructed without a telecentric structure.

(o)攝像手段並不限定於上述實施形態的相機15。例如，在上述實施形態中，係採用CCD區域感測器作為攝像元件15a，但不限定於此，亦可採用例如CMOS區域感測器等。(o) The imaging means is not limited to the camera 15 of the above-mentioned embodiment. For example, in the above embodiment, a CCD area sensor is used as the imaging element 15a, but it is not limited to this, for example, a CMOS area sensor or the like may be used.

又，攝像透鏡單元15b係由兩側遠心透鏡(兩側遠心透鏡光學系)所構成。不限定於此，亦可採用物體側遠心透鏡(物體側遠心光學系)作為攝像透鏡單元15b。又，亦可作成不具有遠心構造之構成。In addition, the imaging lens unit 15b is composed of two-sided telecentric lenses (two-sided telecentric lens optical systems). It is not limited to this, and an object-side telecentric lens (object-side telecentric optical system) may be used as the imaging lens unit 15b. In addition, it can also be constructed without a telecentric structure.

(p)上述各實施形態的投影裝置14中，係設定成光柵單元20的射出面20b及投影透鏡單元21的主面相對於印刷基板1滿足賽因福祿的條件。(p) In the projection device 14 of each of the above embodiments, the output surface 20b of the grating unit 20 and the main surface of the projection lens unit 21 are set so that the printed circuit board 1 satisfies the conditions of Sineflux.

不限定於此，根據投影範圍的整個區域之條紋圖案W的對焦狀態，亦可未必要設定成滿足賽因福祿的條件。It is not limited to this, and depending on the focus state of the stripe pattern W in the entire area of the projection range, it may not necessarily be set to satisfy the conditions of Sineflux.

又，上述賽因福祿的條件係以加入光柵板25、26的配置構成等較佳。In addition, the conditions of the above-mentioned Sainfluh are preferably such as a configuration in which the grating plates 25 and 26 are added.

形成於光柵單元20的射出面20b之合成光柵圖案，因為是重疊有光柵板25、26的光柵圖案30之光柵圖案，所以在不考量光柵板25、26的配置構成等，而配置成光柵單元20的射出面20b及投影透鏡單元21的主面滿足賽因福祿的條件之情況下，恐有產生些微的誤差之虞。The composite grating pattern formed on the exit surface 20b of the grating unit 20 is a grating pattern in which the grating patterns 30 of the grating plates 25 and 26 are superimposed, so the arrangement and configuration of the grating plates 25 and 26 are not considered, and the grating unit is arranged If the emission surface 20b of 20 and the main surface of the projection lens unit 21 meet the conditions of Sine Flow, there is a possibility that a slight error may occur.

1:印刷基板 5:焊膏 10:基板檢查裝置 12:檢查單元 13:控制裝置 14:投影裝置 15:相機 19:光源 20:光柵單元 21:投影透鏡單元 22:光柵單元移動機構 25:固定光柵板 26:可動光柵板 27:光柵板移動機構 30:光柵圖案 31:透光部 32:遮光部 J1:投影裝置的光軸 J3:光柵單元的光軸 PA:電源電路部 PB:控制電路部 W(W1,W2):條紋圖案1: Printed substrate 5: Solder paste 10: Substrate inspection device 12: Inspection unit 13: Control device 14: Projection device 15: Camera 19: light source 20: Raster unit 21: Projection lens unit 22: Grating unit moving mechanism 25: Fixed grating board 26: movable grating plate 27: Grating plate moving mechanism 30: grating pattern 31: Translucent part 32: Shading part J1: Optical axis of the projection device J3: Optical axis of grating unit PA: Power Circuit Department PB: Control Circuit Department W (W1, W2): striped pattern

圖1係表示基板檢查裝置的概略構成之示意圖。 圖2係表示印刷基板的概略構成之平面示意圖。 圖3係表示印刷基板的剖面示意圖。 圖4係表示投影在印刷基板上之條紋圖案的態樣之示意圖。 圖5係表示投影裝置的概略構成之示意圖。 圖6係表示基板檢查裝置的電性構成之方塊圖。 圖7係表示光柵單元的概略構成之示意圖。 圖8係用於說明固定光柵板及可動光柵板之相對位置關係的改變之圖，(a)係示意地表示在投影長周期的條紋圖案時之固定光柵板及可動光柵板的相對位置關係之立體圖，(b)係示意地表示在投影短周期的條紋圖案時之固定光柵板及可動光柵板的相對位置關係之立體圖。 圖9係用以說明固定光柵板及可動光柵板之相對位置關係的改變之圖，(a)係表示在投影長周期的條紋圖案時之固定光柵板及可動光柵板的相對位置關係之示意圖，(b)係表示在投影短周期的條紋圖案時之固定光柵板及可動光柵板的相對位置關係之示意圖。 圖10係用以說明第2實施形態中之固定光柵板及可動光柵板的相對位置關係的改變之圖，(a)係表示在投影長周期的條紋圖案時之固定光柵板及可動光柵板的相對位置關係之示意圖，(b)係表示在投影短周期的條紋圖案時之固定光柵板及可動光柵板的相對位置關係之示意圖。 圖11係用以說明第3實施形態中之固定光柵板及可動光柵板的相對位置關係的改變之圖，(a)係表示在投影長周期的條紋圖案時之固定光柵板及可動光柵板的相對位置關係之示意圖，(b)係表示在投影短周期的條紋圖案時之固定光柵板及可動光柵板的相對位置關係之示意圖。 圖12係用以說明第4實施形態中之固定光柵板及可動光柵板的相對位置關係的改變之圖，(a)係表示在投影長周期的條紋圖案時之固定光柵板及可動光柵板的相對位置關係之示意圖，(b)係表示在投影短周期的條紋圖案時之固定光柵板及可動光柵板的相對位置關係之示意圖。 圖13係用以說明第5實施形態中之固定光柵板及可動光柵板的相對位置關係的改變之圖，(a)係表示在投影長周期的條紋圖案時之固定光柵板及可動光柵板的相對位置關係之示意圖，(b)係表示在投影短周期的條紋圖案時之固定光柵板及可動光柵板的相對位置關係之示意圖。 圖14係用以說明第6實施形態中之固定光柵板及可動光柵板的相對位置關係的改變之圖，(a)係表示在投影長周期的條紋圖案時之固定光柵板及可動光柵板的相對位置關係之示意圖，(b)係表示在投影短周期的條紋圖案時之固定光柵板及可動光柵板的相對位置關係之示意圖。Fig. 1 is a schematic diagram showing a schematic configuration of a substrate inspection apparatus. Fig. 2 is a schematic plan view showing a schematic configuration of a printed circuit board. Fig. 3 is a schematic cross-sectional view showing a printed circuit board. FIG. 4 is a schematic diagram showing the state of the stripe pattern projected on the printed substrate. Fig. 5 is a schematic diagram showing a schematic configuration of the projection device. Fig. 6 is a block diagram showing the electrical configuration of the substrate inspection device. Fig. 7 is a schematic diagram showing the schematic configuration of the grating unit. FIG. 8 is a diagram for explaining the change of the relative positional relationship between the fixed grating plate and the movable grating plate, (a) is a schematic diagram showing the relative positional relationship between the fixed grating plate and the movable grating plate when projecting long-period fringe patterns The perspective view, (b) is a perspective view schematically showing the relative positional relationship between the fixed grating plate and the movable grating plate when the short-period fringe pattern is projected. 9 is a diagram for explaining the change of the relative positional relationship between the fixed grating plate and the movable grating plate, (a) is a schematic diagram showing the relative positional relationship between the fixed grating plate and the movable grating plate when projecting long-period fringe patterns, (b) is a schematic diagram showing the relative positional relationship between the fixed grating plate and the movable grating plate when projecting short-period fringe patterns. Fig. 10 is a diagram for explaining the change in the relative positional relationship between the fixed grating plate and the movable grating plate in the second embodiment, (a) shows the fixed grating plate and the movable grating plate when a long-period fringe pattern is projected A schematic diagram of the relative positional relationship, (b) is a schematic diagram showing the relative positional relationship between the fixed grating plate and the movable grating plate when projecting a short-period fringe pattern. Fig. 11 is a diagram for explaining the change in the relative positional relationship between the fixed grating plate and the movable grating plate in the third embodiment, (a) shows the fixed grating plate and the movable grating plate when a long-period fringe pattern is projected The schematic diagram of the relative positional relationship, (b) is a schematic diagram showing the relative positional relationship between the fixed grating plate and the movable grating plate when projecting a short-period fringe pattern. Figure 12 is a diagram for explaining the change in the relative positional relationship between the fixed grating plate and the movable grating plate in the fourth embodiment, (a) shows the fixed grating plate and the movable grating plate when projecting a long-period fringe pattern The schematic diagram of the relative positional relationship, (b) is a schematic diagram showing the relative positional relationship between the fixed grating plate and the movable grating plate when projecting a short-period fringe pattern. 13 is a diagram for explaining the change in the relative positional relationship between the fixed grating plate and the movable grating plate in the fifth embodiment, (a) shows the fixed grating plate and the movable grating plate when projecting a long-period fringe pattern The schematic diagram of the relative positional relationship, (b) is a schematic diagram showing the relative positional relationship between the fixed grating plate and the movable grating plate when projecting a short-period fringe pattern. 14 is a diagram for explaining the change in the relative positional relationship between the fixed grating plate and the movable grating plate in the sixth embodiment, (a) shows the fixed grating plate and the movable grating plate when projecting a long-period fringe pattern The schematic diagram of the relative positional relationship, (b) is a schematic diagram showing the relative positional relationship between the fixed grating plate and the movable grating plate when projecting a short-period fringe pattern.

20:光柵單元 20: Raster unit

20a:射入面 20a: Injection surface

20b:射出面 20b: Injection surface

22:光柵單元移動機構 22: Grating unit moving mechanism

22a:彈簧構件 22a: Spring member

22b:壓電元件 22b: Piezo element

24:本體殼部 24: body shell

25:固定光柵板 25: Fixed grating board

26:可動光柵板 26: movable grating plate

27:光柵板移動機構 27: Grating plate moving mechanism

31:透光部 31: Translucent part

32:遮光部 32: Shading part

J3:光軸 J3: Optical axis

Claims (12)

一種投影裝置，係在進行關於既定的被測量物之三維測量時，對前述被測量物投影既定的圖案光，其特徵為： 具備： 發出既定光之光源； 將從前述光源射入的光轉換成圖案光並射出之圖案生成部；及 使從前述圖案生成部射出的圖案光對前述被測量物成像之投影光學系； 前述圖案生成部係藉由複數個光柵構件配置成在與第1方向正交的第2方向上相對向，並且具備可變更前述複數個光柵構件相對於前述第1方向的相對位置關係之光柵移動手段，而構成為可對投影到前述被測量物之圖案光的周期進行變更，其中該複數個光柵構件具有光柵圖案，該光柵圖案係以既定的透射率透射光之透光部、和遮住至少一部分的光之遮光部在前述第1方向交替排列而成。A projection device that projects a predetermined pattern of light on the object to be measured when performing three-dimensional measurement on the object to be measured. Its characteristics are: have: A light source that emits a predetermined light; A pattern generating part that converts the light incident from the aforementioned light source into pattern light and emits it; and A projection optical system that makes the pattern light emitted from the pattern generating unit image the object to be measured; The pattern generation unit is configured to face each other in a second direction orthogonal to the first direction by a plurality of grating members, and is provided with a grating movement capable of changing the relative positional relationship of the plurality of grating members with respect to the first direction Means, and is configured to change the period of the pattern light projected on the object to be measured, wherein the plurality of grating members have a grating pattern, and the grating pattern is a light-transmitting portion that transmits light with a predetermined transmittance and shields At least a part of the light shielding parts are alternately arranged in the first direction. 如請求項1之投影裝置，其中形成於前述複數個光柵構件的光柵圖案係相同。The projection device of claim 1, wherein the grating patterns formed on the plurality of grating members are the same. 如請求項1之投影裝置，其中 前述圖案生成部係構成為以在與前述第2方向相對向的兩個前述光柵構件中之一光柵構件的前述光柵圖案的遮光部、和另一光柵構件的前述光柵圖案的遮光部在前述第1方向相連之方式，配置前述兩個光柵構件，藉此可生成長周期的圖案光， 且構成為前述一光柵構件的前述光柵圖案的遮光部、和前述另一光柵構件的前述光柵圖案的遮光部在前述第1方向分開之方式，配置前述兩個光柵構件，藉此可生成短周期的圖案光。Such as the projection device of claim 1, where The pattern generation unit is configured such that the light shielding portion of the grating pattern of one of the two grating members facing the second direction and the light shielding portion of the grating pattern of the other grating member are in the first One-direction connection, arranging the aforementioned two grating members, by which long-period patterned light can be generated, In addition, the light shielding portion of the grating pattern of the one grating member and the light shielding portion of the grating pattern of the other grating member are separated in the first direction, and the two grating members are arranged, whereby a short period can be generated Pattern light. 如請求項2之投影裝置，其中 前述圖案生成部係構成為以在與前述第2方向相對向的兩個前述光柵構件中之一光柵構件的前述光柵圖案的遮光部、和另一光柵構件的前述光柵圖案的遮光部在前述第1方向相連之方式，配置前述兩個光柵構件，藉此可生成長周期的圖案光， 且構成為前述一光柵構件的前述光柵圖案的遮光部、和前述另一光柵構件的前述光柵圖案的遮光部在前述第1方向分開之方式，配置前述兩個光柵構件，藉此可生成短周期的圖案光。Such as the projection device of claim 2, where The pattern generation unit is configured such that the light shielding portion of the grating pattern of one of the two grating members facing the second direction and the light shielding portion of the grating pattern of the other grating member are in the first One-direction connection, arranging the aforementioned two grating members, by which long-period patterned light can be generated, In addition, the light shielding portion of the grating pattern of the one grating member and the light shielding portion of the grating pattern of the other grating member are separated in the first direction, and the two grating members are arranged, whereby a short period can be generated Pattern light. 如請求項3之投影裝置，其中 前述圖案生成部係構成為前述一光柵構件之前述光柵圖案的遮光部的第1方向一端側之端部位置、和另一光柵構件之前述光柵圖案的遮光部的第1方向另一端側之端部位置成為在第1方向相同位置之方式，配置前述兩個光柵構件，藉此可生成前述長周期的圖案光。Such as the projection device of claim 3, where The pattern generating section is configured as an end position of the light shielding portion of the grating pattern of the one grating member at one end side in the first direction, and an end of the light shielding portion of the grating pattern of the other grating member at the other end side in the first direction The part positions are the same in the first direction, and the two grating members are arranged to generate the long-period pattern light. 如請求項4之投影裝置，其中 前述圖案生成部係構成為前述一光柵構件之前述光柵圖案的遮光部的第1方向一端側之端部位置、和另一光柵構件之前述光柵圖案的遮光部的第1方向另一端側之端部位置成為在第1方向相同位置之方式，配置前述兩個光柵構件，藉此可生成前述長周期的圖案光。Such as the projection device of claim 4, where The pattern generating section is configured as an end position of the light shielding portion of the grating pattern of the one grating member at one end side in the first direction, and an end of the light shielding portion of the grating pattern of the other grating member at the other end side in the first direction The part positions are the same in the first direction, and the two grating members are arranged to generate the long-period pattern light. 如請求項3之投影裝置，其中 前述圖案生成部係構成為以包含前述一光柵構件之前述光柵圖案的遮光部的第1方向一端部之既定範圍、和包含前述另一光柵構件之前述光柵圖案的遮光部的第1方向另一端部之既定範圍在前述第1方向上重疊之方式配置前述兩個光柵構件，藉此可生成前述長周期的圖案光。Such as the projection device of claim 3, where The pattern generation unit is configured to include a predetermined range of one end of the light shielding portion of the grating pattern of the one grating member in the first direction, and the other end of the light shielding portion of the grating pattern of the other grating member in the first direction. The two grating members are arranged such that the predetermined range of the portion overlaps in the first direction, whereby the long-period pattern light can be generated. 如請求項4之投影裝置，其中 前述圖案生成部係構成為以包含前述一光柵構件之前述光柵圖案的遮光部的第1方向一端部之既定範圍、和包含前述另一光柵構件之前述光柵圖案的遮光部的第1方向另一端部之既定範圍在前述第1方向上重疊之方式配置前述兩個光柵構件，藉此可生成前述長周期的圖案光。Such as the projection device of claim 4, where The pattern generation unit is configured to include a predetermined range of one end of the light shielding portion of the grating pattern of the one grating member in the first direction, and the other end of the light shielding portion of the grating pattern of the other grating member in the first direction. The two grating members are arranged such that the predetermined range of the portion overlaps in the first direction, whereby the long-period pattern light can be generated. 如請求項1之投影裝置，其中 前述複數個光柵構件係由一個固定的固定光柵構件、和設置成可相對於該固定光柵構件相對變位之至少一個可動光柵構件所構成。Such as the projection device of claim 1, where The aforementioned plural grating members are composed of a fixed fixed grating member and at least one movable grating member arranged to be relatively displaceable with respect to the fixed grating member. 如請求項1之投影裝置，其中 前述遮光部係由透射率不同的複數個部位所構成。Such as the projection device of claim 1, where The aforementioned light-shielding part is composed of a plurality of parts having different transmittances. 如請求項1之投影裝置，其係構成為可投影具有條紋狀的光強度分布之圖案光作為前述圖案光。Such as the projection device of claim 1, which is configured to project pattern light having a striped light intensity distribution as the aforementioned pattern light. 一種三維測量裝置，其特徵為具備︰ 如請求項1至11中任一項之投影裝置； 攝像手段，可對被投影前述圖案光之前述被測量物的既定範圍進行攝像；及 圖像處理手段，可依據藉由前述攝像手段所攝像並取得的圖像資料，執行關於前述被測量物的三維測量。A three-dimensional measuring device characterized by: Such as the projection device of any one of claims 1 to 11; The imaging means can image the predetermined range of the object to be measured on which the pattern light is projected; and The image processing means can perform three-dimensional measurement of the object to be measured based on the image data captured and obtained by the aforementioned imaging means.
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