TW202035301A - Fluid disinfection device including a treatment chamber, a light source chamber, a partition member, and a first film - Google Patents

Fluid disinfection device including a treatment chamber, a light source chamber, a partition member, and a first film Download PDF

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TW202035301A
TW202035301A TW109104439A TW109104439A TW202035301A TW 202035301 A TW202035301 A TW 202035301A TW 109104439 A TW109104439 A TW 109104439A TW 109104439 A TW109104439 A TW 109104439A TW 202035301 A TW202035301 A TW 202035301A
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light source
film
partition member
fluid
chamber
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TW109104439A
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Chinese (zh)
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櫻井公人
加藤剛雄
藤岡純
田中貴章
聶棟興
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日商東芝照明技術股份有限公司
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    • C—CHEMISTRY; METALLURGY
    • C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F1/00—Treatment of water, waste water, or sewage
    • C02F1/30—Treatment of water, waste water, or sewage by irradiation
    • C02F1/32—Treatment of water, waste water, or sewage by irradiation with ultraviolet light
    • C02F1/325—Irradiation devices or lamp constructions
    • A—HUMAN NECESSITIES
    • A61—MEDICAL OR VETERINARY SCIENCE; HYGIENE
    • A61L—METHODS OR APPARATUS FOR STERILISING MATERIALS OR OBJECTS IN GENERAL; DISINFECTION, STERILISATION OR DEODORISATION OF AIR; CHEMICAL ASPECTS OF BANDAGES, DRESSINGS, ABSORBENT PADS OR SURGICAL ARTICLES; MATERIALS FOR BANDAGES, DRESSINGS, ABSORBENT PADS OR SURGICAL ARTICLES
    • A61L9/00—Disinfection, sterilisation or deodorisation of air
    • A61L9/16—Disinfection, sterilisation or deodorisation of air using physical phenomena
    • A61L9/18—Radiation
    • A61L9/20—Ultraviolet radiation
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D53/00—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols
    • B01D53/007—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols by irradiation
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D2259/00—Type of treatment
    • B01D2259/80—Employing electric, magnetic, electromagnetic or wave energy, or particle radiation
    • B01D2259/804—UV light
    • C—CHEMISTRY; METALLURGY
    • C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F2201/00—Apparatus for treatment of water, waste water or sewage
    • C02F2201/32—Details relating to UV-irradiation devices
    • C—CHEMISTRY; METALLURGY
    • C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F2201/00—Apparatus for treatment of water, waste water or sewage
    • C02F2201/32—Details relating to UV-irradiation devices
    • C02F2201/322—Lamp arrangement
    • C02F2201/3222—Units using UV-light emitting diodes [LED]
    • C—CHEMISTRY; METALLURGY
    • C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F2201/00—Apparatus for treatment of water, waste water or sewage
    • C02F2201/32—Details relating to UV-irradiation devices
    • C02F2201/322—Lamp arrangement
    • C02F2201/3228—Units having reflectors, e.g. coatings, baffles, plates, mirrors
    • C—CHEMISTRY; METALLURGY
    • C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F2303/00—Specific treatment goals
    • C02F2303/04—Disinfection

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  • Health & Medical Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Chemical & Material Sciences (AREA)
  • Toxicology (AREA)
  • Engineering & Computer Science (AREA)
  • Animal Behavior & Ethology (AREA)
  • Public Health (AREA)
  • Environmental & Geological Engineering (AREA)
  • Organic Chemistry (AREA)
  • Epidemiology (AREA)
  • Hydrology & Water Resources (AREA)
  • General Health & Medical Sciences (AREA)
  • Water Supply & Treatment (AREA)
  • Veterinary Medicine (AREA)
  • Analytical Chemistry (AREA)
  • General Chemical & Material Sciences (AREA)
  • Oil, Petroleum & Natural Gas (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Physical Water Treatments (AREA)
  • Apparatus For Disinfection Or Sterilisation (AREA)

Abstract

An object of the present invention is to maintain disinfection performance. One embodiment of the fluid disinfection device includes a treatment chamber, a light source chamber, a partition member, and a first film. The treatment chamber treats the fluid. The light source chamber is provided with a light source that irradiates ultraviolet rays toward the treatment chamber. The partition member has ultraviolet light permeability and divides the treatment chamber and the light source chamber. The first film covers a first surface of the partition member opposite to the treatment chamber.

Description

流體殺菌裝置Fluid sterilization device

本發明的實施方式是有關於一種流體殺菌裝置。The embodiment of the present invention relates to a fluid sterilization device.

已知如下的流體殺菌裝置，其通過將成為光源的發光元件所發出的紫外線，向用以對例如水、氣體等流體進行處理的處理室內照射，從而將流體進行殺菌。 [現有技術文獻]A fluid sterilization device is known that irradiates ultraviolet rays emitted from a light-emitting element as a light source into a treatment chamber for treating fluids such as water and gas to sterilize the fluid. [Prior Art Literature]

[專利文獻] [專利文獻1] 日本專利特開2014-233646號公報[Patent Literature] [Patent Document 1] Japanese Patent Laid-Open No. 2014-233646

[發明所要解決的問題] 此種流體殺菌裝置中，在將發出紫外線的發光二極體（Light Emitting Diode，LED）加以收納的光源室與處理室之間配置分隔構件，以使LED與流體不接觸，由此抑制LED的劣化。然而，通過配置分隔構件，會擔憂殺菌性能下降。[The problem to be solved by the invention] In this type of fluid sterilization device, a partition member is arranged between the light source chamber and the processing chamber where the light emitting diode (LED) that emits ultraviolet light is housed, so that the LED does not contact the fluid, thereby suppressing the Degrade. However, by disposing the partition member, there is a concern that the sterilization performance will decrease.

本發明所要解決的問題為提供一種能夠維持殺菌性能的流體殺菌裝置。 [解決問題的技術手段]The problem to be solved by the present invention is to provide a fluid sterilization device capable of maintaining sterilization performance. [Technical means to solve the problem]

實施方式的流體殺菌裝置包括處理室、光源室、分隔構件及第一膜。處理室對流體進行處理。光源室設置有朝向處理室照射紫外線的光源。分隔構件具有紫外線透過性，將處理室與光源室加以劃分。第一膜將與處理室相向的分隔構件的第一面加以覆蓋。 [發明的效果]The fluid sterilization device of the embodiment includes a processing chamber, a light source chamber, a partition member, and a first film. The processing chamber processes the fluid. The light source chamber is provided with a light source that irradiates ultraviolet rays toward the processing chamber. The partition member has ultraviolet light permeability and divides the processing chamber and the light source chamber. The first film covers the first surface of the partition member facing the processing chamber. [Effects of the invention]

依據本發明，能夠維持殺菌性能。According to the present invention, the sterilization performance can be maintained.

以下所說明的實施方式的流體殺菌裝置1包括：處理室30、光源室40、分隔構件50及第一膜51。處理室30對流體進行處理。光源室40設置有朝向處理室30照射紫外線的光源43。分隔構件50具有紫外線透過性，將處理室30與光源室40加以劃分。第一膜51將與處理室相向的分隔構件50的第一面50a加以覆蓋。The fluid sterilization device 1 of the embodiment described below includes a processing chamber 30, a light source chamber 40, a partition member 50, and a first film 51. The processing chamber 30 processes the fluid. The light source chamber 40 is provided with a light source 43 that irradiates ultraviolet rays toward the processing chamber 30. The partition member 50 has ultraviolet light permeability and partitions the processing chamber 30 and the light source chamber 40. The first film 51 covers the first surface 50a of the partition member 50 facing the processing chamber.

另外，以下所說明的實施方式的第一膜51為氟系樹脂。In addition, the first film 51 of the embodiment described below is a fluorine-based resin.

此外，以下所說明的實施方式的第一膜51的厚度t1為10[nm]以下。In addition, the thickness t1 of the first film 51 of the embodiment described below is 10 [nm] or less.

另外，以下所說明的實施方式的流體殺菌裝置1包括處理室30、光源室40、分隔構件50及第二膜52。處理室30對流體進行處理。光源室40設置有朝向處理室30照射紫外線的光源43。分隔構件50具有紫外線透過性，將處理室30與光源室40加以劃分。第二膜52將與光源室40相向的分隔構件50的第二面50b加以覆蓋。In addition, the fluid sterilization device 1 of the embodiment described below includes a processing chamber 30, a light source chamber 40, a partition member 50, and a second film 52. The processing chamber 30 processes the fluid. The light source chamber 40 is provided with a light source 43 that irradiates ultraviolet rays toward the processing chamber 30. The partition member 50 has ultraviolet light permeability and partitions the processing chamber 30 and the light source chamber 40. The second film 52 covers the second surface 50 b of the partition member 50 facing the light source chamber 40.

此外，以下所說明的實施方式的第二膜52是抑制由光源43照射的紫外光的反射的抗反射膜。In addition, the second film 52 of the embodiment described below is an anti-reflection film that suppresses reflection of ultraviolet light irradiated from the light source 43.

另外，以下所說明的實施方式的第二膜52的厚度t2為30[nm]以上、60[nm]以下。In addition, the thickness t2 of the second film 52 of the embodiment described below is 30 [nm] or more and 60 [nm] or less.

以下，參照圖式，對實施方式的流體殺菌裝置進行說明。此外，以下的各實施方式表示一例，並不限定發明。另外，以下所示的各實施方式能夠在不矛盾的範圍內適當組合。另外，各實施方式的說明中，對同一結構賦予同一符號，省略後述的說明。Hereinafter, the fluid sterilization device of the embodiment will be described with reference to the drawings. In addition, each of the following embodiments shows an example and does not limit the invention. In addition, each embodiment shown below can be combined suitably within the range which does not contradict. In addition, in the description of each embodiment, the same reference numerals are given to the same components, and the following description is omitted.

（第一實施方式） 圖1是表示第一實施方式的流體殺菌裝置的應用例的示意圖。圖2是表示第一實施方式的流體殺菌裝置的主要部分的剖面圖。(First Embodiment) Fig. 1 is a schematic diagram showing an application example of the fluid sterilization device of the first embodiment. Fig. 2 is a cross-sectional view showing the main part of the fluid sterilization device of the first embodiment.

如圖1所示，第一實施方式的流體殺菌裝置1與供給要照射紫外線（紫外光）的流體的供給箱8連結，且與將經紫外線照射的流體加以回收的回收箱9連結。如圖1所示，流體殺菌裝置1的上游側的一端27經由接頭等連結構件22，而與連結於供給箱8的泵12及流路構件23連結。另外，與上游側同樣，流體殺菌裝置1的下游側的另一端28經由接頭等連結構件24，而與連通於回收箱9的流量調整機構14及流路構件25連結。As shown in FIG. 1, the fluid sterilization device 1 of the first embodiment is connected to a supply tank 8 that supplies a fluid to be irradiated with ultraviolet light (ultraviolet light), and is connected to a recovery tank 9 that recovers the fluid irradiated with ultraviolet light. As shown in FIG. 1, one end 27 on the upstream side of the fluid sterilization device 1 is connected to the pump 12 and the flow path member 23 connected to the supply tank 8 via a connection member 22 such as a joint. In addition, similar to the upstream side, the other end 28 on the downstream side of the fluid sterilization device 1 is connected to the flow rate adjustment mechanism 14 and the flow path member 25 communicating with the recovery tank 9 via a connecting member 24 such as a joint.

流體殺菌裝置1例如在飲用水供給裝置中，用於對供給箱8內的水進行殺菌處理。本實施方式中，作為流體，例如應用於自來水等液體，但也可應用於氣體。The fluid sterilization device 1 is used, for example, in a drinking water supply device to sterilize the water in the supply tank 8. In this embodiment, as the fluid, for example, it is applied to a liquid such as tap water, but it can also be applied to a gas.

如圖2所示，流體殺菌裝置1包括處理室30、光源室40、分隔構件50、第一膜51及第二膜52。從處理室30的前表面31側供給的流體流向分隔構件50，進而以沿著分隔構件50而從處理室30的側面32轉入光源室40的側面44的方式流動，從流體殺菌裝置1的另一端28（參照圖1）側排出。As shown in FIG. 2, the fluid sterilization device 1 includes a processing chamber 30, a light source chamber 40, a partition member 50, a first film 51 and a second film 52. The fluid supplied from the front surface 31 side of the processing chamber 30 flows to the partition member 50, and then flows along the partition member 50 from the side surface 32 of the processing chamber 30 to the side surface 44 of the light source chamber 40, from the fluid sterilization device 1 The other end 28 (refer to FIG. 1) side is discharged.

處理室30是由例如反射紫外線的聚四氟乙烯（polytetrafluoroethylene，PTFE）所形成的空間，對收納於內部的流體進行處理。另外，也可在反射紫外線的鋁的內表面33，配置透過紫外線的石英玻璃（quartz glass），來作為處理室30。處理室30的形狀例如可設為圓筒狀，但並無特別限定，例如也可以是箱狀或者角筒狀。The processing chamber 30 is a space formed of, for example, polytetrafluoroethylene (PTFE) that reflects ultraviolet rays, and processes the fluid contained therein. In addition, a quartz glass (quartz glass) that transmits ultraviolet light may be disposed on the inner surface 33 of aluminum that reflects ultraviolet light as the processing chamber 30. The shape of the processing chamber 30 may be a cylindrical shape, for example, but is not particularly limited, and may be a box shape or a rectangular tube shape, for example.

光源室40是由例如聚四氟乙烯（PTFE）所形成的空間，設置有朝向處理室30照射紫外線的光源43。光源43包括基板41、及發光元件42。The light source chamber 40 is a space formed of, for example, polytetrafluoroethylene (PTFE), and a light source 43 that irradiates ultraviolet rays toward the processing chamber 30 is provided. The light source 43 includes a substrate 41 and a light-emitting element 42.

基板41是以金屬材料作為母材來形成。在基板41上，雖未圖示，但經由絕緣層而形成有所需的導電圖案（佈線圖案），且在導電圖案上設置有發光元件42。此外，基板41的母材並不限定於金屬材料，例如也可使用氧化鋁等陶瓷。The substrate 41 is formed using a metal material as a base material. On the substrate 41, although not shown, a desired conductive pattern (wiring pattern) is formed via an insulating layer, and a light-emitting element 42 is provided on the conductive pattern. In addition, the base material of the substrate 41 is not limited to a metal material. For example, ceramics such as alumina may be used.

發光元件42是發出紫外線的發光元件，且安裝於基板41上。發光元件42例如為LED。發光元件42是由未圖示的電源來供給電力而發光。發光元件42夾持著分隔構件50而與處理室30相向配置，對處理室30照射紫外線。另外，發光元件42例如為具有300[nm]以下的波長的元件，尤其考慮到壽命及輸出，能夠設為在波長280[nm]附近具有峰值波長的元件，但只要是例如250[nm]～300[nm]的起到殺菌作用的波長範圍即可，並不限定紫外線的波長。即，發光元件42並不限定於LED，也可以是雷射二極體（laser diode，LD）等發出既定的波長範圍的紫外線的其他半導體元件。The light emitting element 42 is a light emitting element that emits ultraviolet rays, and is mounted on the substrate 41. The light-emitting element 42 is, for example, an LED. The light emitting element 42 emits light by being supplied with electric power from a power source not shown. The light emitting element 42 is arranged opposite to the processing chamber 30 with the partition member 50 sandwiched therebetween, and irradiates the processing chamber 30 with ultraviolet rays. In addition, the light-emitting element 42 is, for example, an element having a wavelength of 300 [nm] or less. In particular, in consideration of lifetime and output, it can be an element having a peak wavelength near the wavelength of 280 [nm], but it may be, for example, 250 [nm] to The wavelength range of 300 [nm] that has a sterilization effect is sufficient, and the wavelength of ultraviolet rays is not limited. That is, the light-emitting element 42 is not limited to an LED, and may be another semiconductor element that emits ultraviolet rays in a predetermined wavelength range, such as a laser diode (LD).

分隔構件50是具有紫外線透過性的板狀構件。具體而言，能夠將例如波長250[nm]～300[nm]下的透過率為92[%]左右的石英玻璃用作分隔構件50。另外，分隔構件50的厚度t例如能設為2[mm]～4[mm]左右。分隔構件50是以收納有光源43的光源室40的內部空間成為氣密的方式，配置於處理室30與光源室40之間，將流體流動的處理室30與光源室40之間加以劃分。分隔構件50使發光元件42所發出的紫外線透過，朝向處理室30照射紫外線，由此對在處理室30的內部流動的流體進行殺菌。此外，分隔構件50的材料並不限定於石英玻璃，例如也可以是透過紫外線的氟化鈣（CaF2 ）。The partition member 50 is a plate-shaped member having ultraviolet transmittance. Specifically, for example, quartz glass having a transmittance of approximately 92 [%] at a wavelength of 250 [nm] to 300 [nm] can be used as the partition member 50. In addition, the thickness t of the partition member 50 can be set to about 2 [mm] to 4 [mm], for example. The partition member 50 is arranged between the processing chamber 30 and the light source chamber 40 such that the internal space of the light source chamber 40 accommodating the light source 43 is airtight, and partitions the processing chamber 30 and the light source chamber 40 in which the fluid flows. The partition member 50 transmits the ultraviolet rays emitted by the light emitting element 42 and irradiates the ultraviolet rays toward the processing chamber 30 to sterilize the fluid flowing in the processing chamber 30. In addition, the material of the partition member 50 is not limited to quartz glass, and may be calcium fluoride (CaF 2 ) that transmits ultraviolet rays, for example.

第一膜51是以將與處理室30相向的分隔構件50的第一面50a加以覆蓋的方式配設。第一膜51例如為PTFE及其他氟系樹脂。具體而言，可列舉：賽托普（CYTOP，注冊商標）、特氟龍（Teflon，注冊商標）、氟薩福（Fluorosurf，注冊商標）等，但並不限定於這些。另外，第一膜51的厚度t1[nm]若設為例如10[nm]以下，進而設為2[nm]～3[nm]左右，則抑制透過率的下降。另外，第一膜51與水的接觸角理想為100[°]左右。此外，不包括第一膜51的分隔構件50的接觸角為50[°]左右。The first film 51 is arranged to cover the first surface 50 a of the partition member 50 facing the processing chamber 30. The first film 51 is, for example, PTFE and other fluorine-based resins. Specifically, CYTOP (registered trademark), Teflon (registered trademark), Fluorosurf (registered trademark), etc. can be cited, but it is not limited to these. In addition, if the thickness t1 [nm] of the first film 51 is set to, for example, 10 [nm] or less, and further to about 2 [nm] to 3 [nm], the decrease in transmittance is suppressed. In addition, the contact angle of the first film 51 with water is desirably about 100 [°]. In addition, the contact angle of the partition member 50 excluding the first film 51 is about 50 [°].

第二膜52是以將與光源室40相向的分隔構件50的第二面50b加以覆蓋的方式配設。第二膜52是抑制由光源43照射的紫外光的反射的抗反射膜。具體而言，氟化鎂（MgF2 ）、五氧化二鉭（Ta2 O5 ）、二氧化矽（SiO2 ）等能夠用作第二膜52。第二膜52是以例如波長250～300[nm]下的反射率成為4[%]以下的方式來設置。第二膜52的厚度t2[nm]能夠設為例如30[nm]以上、60[nm]以下。The second film 52 is arranged to cover the second surface 50b of the partition member 50 facing the light source chamber 40. The second film 52 is an anti-reflection film that suppresses reflection of ultraviolet light irradiated by the light source 43. Specifically, magnesium fluoride (MgF 2 ), tantalum pentoxide (Ta 2 O 5 ), silicon dioxide (SiO 2 ), or the like can be used as the second film 52. The second film 52 is provided so that the reflectance at a wavelength of 250 to 300 [nm] becomes 4 [%] or less, for example. The thickness t2 [nm] of the second film 52 can be set to, for example, 30 [nm] or more and 60 [nm] or less.

另外，第二膜52可以是氟化鎂（MgF2 ）、五氧化二鉭（Ta2 O5 ）、二氧化矽（SiO2 ）等的單層膜，也可以是例如在低折射率的二氧化矽（SiO2 ）等，層疊高折射率的氟化鎂（MgF2 ）、五氧化二鉭（Ta2 O5 ）等而形成兩層膜的多層膜。在所述情況下，低折射率的層與高折射率的層的層疊順序並未限定。另外，在多層膜的情況下，所層疊的層的數量並不限定為兩層。In addition, the second film 52 may be a single-layer film of magnesium fluoride (MgF 2 ), tantalum pentoxide (Ta 2 O 5 ), silicon dioxide (SiO 2 ), etc., or may be, for example, a two-layer film with a low refractive index. Silicon oxide (SiO 2 ), etc., are laminated with high refractive index magnesium fluoride (MgF 2 ), tantalum pentoxide (Ta 2 O 5 ), etc. to form a two-layer multilayer film. In this case, the stacking order of the low refractive index layer and the high refractive index layer is not limited. In addition, in the case of a multilayer film, the number of layers laminated is not limited to two layers.

（第二實施方式） 圖3是表示第二實施方式的流體殺菌裝置的應用例的示意圖。如圖3所示，第二實施方式的流體殺菌裝置1A中，流體排出的方向與流體殺菌裝置1不同。具體而言，從處理室30的前表面31側供給的流體流向分隔構件50，進而沿著分隔構件50而從處理室30的側面32排出，在處理室30的前表面31側折返，進而從流體殺菌裝置1A的周面26（參照圖1）側排出。具有此種流體流路的流體殺菌裝置1A中也能夠維持殺菌性能。(Second Embodiment) Fig. 3 is a schematic diagram showing an application example of the fluid sterilization device of the second embodiment. As shown in FIG. 3, in the fluid sterilization device 1A of the second embodiment, the direction of fluid discharge is different from the fluid sterilization device 1. Specifically, the fluid supplied from the front surface 31 side of the processing chamber 30 flows to the partition member 50, and is further discharged from the side surface 32 of the processing chamber 30 along the partition member 50, turned back on the front surface 31 side of the processing chamber 30, and further from The fluid sterilization device 1A is discharged from the peripheral surface 26 (refer to FIG. 1) side. The fluid sterilization device 1A having such a fluid flow path can also maintain sterilization performance.

（第三實施方式） 圖4是表示第三實施方式的流體殺菌裝置的應用例的示意圖。如圖4所示，第三實施方式的流體殺菌裝置1B中，流體排出的方向與流體殺菌裝置1、流體殺菌裝置1A不同。具體而言，從處理室30的前表面31側供給的流體流向分隔構件50，進而沿著分隔構件50而從處理室30的側面32排出，在處理室30的前表面31側折返，從流體殺菌裝置1B的一端27（參照圖1）側排出。具有此種流體流路的流體殺菌裝置1B中也能夠維持殺菌性能。(Third Embodiment) Fig. 4 is a schematic diagram showing an application example of the fluid sterilization device of the third embodiment. As shown in FIG. 4, in the fluid sterilization device 1B of the third embodiment, the direction of fluid discharge is different from the fluid sterilization device 1 and the fluid sterilization device 1A. Specifically, the fluid supplied from the front surface 31 side of the processing chamber 30 flows to the partition member 50, and is further discharged from the side surface 32 of the processing chamber 30 along the partition member 50, and is turned back on the front surface 31 side of the processing chamber 30, and the fluid One end 27 (refer to FIG. 1) side of the sterilization device 1B is discharged. The fluid sterilization device 1B having such a fluid flow path can also maintain sterilization performance.

如上所述，實施方式的流體殺菌裝置1包括處理室30、光源室40、分隔構件50及第一膜51。處理室30對流體進行處理。光源室40設置有朝向處理室30照射紫外線的光源43。分隔構件50具有紫外線透過性，將處理室30與光源室40加以劃分。第一膜51將與處理室相向的分隔構件50的第一面50a加以覆蓋。由此，分隔構件50難以污染，能夠維持殺菌性能。As described above, the fluid sterilization device 1 of the embodiment includes the processing chamber 30, the light source chamber 40, the partition member 50 and the first film 51. The processing chamber 30 processes the fluid. The light source chamber 40 is provided with a light source 43 that irradiates ultraviolet rays toward the processing chamber 30. The partition member 50 has ultraviolet light permeability and partitions the processing chamber 30 and the light source chamber 40. The first film 51 covers the first surface 50a of the partition member 50 facing the processing chamber. Thus, the partition member 50 is less likely to be contaminated, and the sterilization performance can be maintained.

另外，實施方式的第一膜51為氟系樹脂。由此，分隔構件50難以污染，能夠維持殺菌性能。In addition, the first film 51 of the embodiment is a fluorine-based resin. Thus, the partition member 50 is less likely to be contaminated, and the sterilization performance can be maintained.

另外，實施方式的第一膜51的厚度t1為10[nm]以下。由此，能夠確保由第一膜51帶來的防汙性能，能夠維持殺菌性能。In addition, the thickness t1 of the first film 51 of the embodiment is 10 [nm] or less. Thereby, the antifouling performance by the first film 51 can be ensured, and the sterilization performance can be maintained.

另外，實施方式的流體殺菌裝置1包括處理室30、光源室40、分隔構件50及第二膜52。處理室30對流體進行處理。光源室40設置有朝向處理室30照射紫外線的光源43。分隔構件50具有紫外線透過性，將處理室30與光源室40加以劃分。第二膜52將與光源室40相向的分隔構件50的第二面50b加以覆蓋。由此，紫外線容易透過，能夠維持殺菌性能。In addition, the fluid sterilization device 1 of the embodiment includes a processing chamber 30, a light source chamber 40, a partition member 50, and a second film 52. The processing chamber 30 processes the fluid. The light source chamber 40 is provided with a light source 43 that irradiates ultraviolet rays toward the processing chamber 30. The partition member 50 has ultraviolet light permeability and partitions the processing chamber 30 and the light source chamber 40. The second film 52 covers the second surface 50 b of the partition member 50 facing the light source chamber 40. As a result, ultraviolet rays are easily transmitted, and sterilization performance can be maintained.

另外，實施方式的第二膜52是抑制由光源43照射的紫外光的反射的抗反射膜。由此，能夠防止紫外線的反射，能夠維持殺菌性能。In addition, the second film 52 of the embodiment is an anti-reflection film that suppresses reflection of ultraviolet light irradiated from the light source 43. As a result, reflection of ultraviolet rays can be prevented, and sterilization performance can be maintained.

另外，實施方式的第二膜52的厚度t2為30[nm]以上、60[nm]以下。由此，能夠確保由第二膜52帶來的抗紫外線反射性能，能夠維持殺菌性能。In addition, the thickness t2 of the second film 52 of the embodiment is 30 [nm] or more and 60 [nm] or less. As a result, the anti-ultraviolet reflection performance by the second film 52 can be secured, and the sterilization performance can be maintained.

此外，所述各實施方式中，在分隔構件50的表面包括第一膜51及第二膜52這兩者，但並不限定於此，只要包括第一膜51及第二膜52中的一者即可。另外，所述各實施方式中，在分隔構件50的第一面50a側設置有第一膜51，且在第二面50b側設置有第二膜52，但並不限定於此，也可在第一面50a側包括第一膜51及第二膜52這兩者，或在第二面50b側包括第二膜52及第一膜51這兩者。在所述情況下，層疊順序並未限定。In addition, in each of the above embodiments, the surface of the partition member 50 includes both the first film 51 and the second film 52, but it is not limited to this, as long as it includes one of the first film 51 and the second film 52. Who can. In addition, in each of the above embodiments, the first film 51 is provided on the first surface 50a side of the partition member 50, and the second film 52 is provided on the second surface 50b side, but it is not limited to this, and may be The first surface 50a side includes both the first film 51 and the second film 52, or the second surface 50b side includes both the second film 52 and the first film 51. In this case, the stacking order is not limited.

另外，所述各實施方式中，處理室30是作為內部不存在隔板等的一個空間而圖示，但並不限定於此。例如，也可在處理室30的內部包括一個以上的管狀構件，為了使流體的流動方向在管狀構件的內部與外部不同而為單重管以上的流路結構，也可包括由一個或多個隔板所劃分的多個處理室30。In addition, in each of the above-mentioned embodiments, the processing chamber 30 is illustrated as a space in which there is no partition or the like, but it is not limited to this. For example, more than one tubular member may be included in the processing chamber 30. In order to make the fluid flow direction different between the inside and the outside of the tubular member, a flow path structure with more than a single tube may also be included. A plurality of processing chambers 30 divided by partitions.

雖已對本發明的若干實施方式加以說明，但這些實施方式是作為例子而提出，並非想要限定發明的範圍。這些實施方式能夠以其他的多種方式來實施，能夠在不脫離發明的要旨的範圍內進行各種省略、置換、變更。這些實施方式或其變形包含於發明的範圍或要旨中，同樣包含於申請專利範圍所記載的發明及其均等的範圍內。Although some embodiments of the present invention have been described, these embodiments are presented as examples and are not intended to limit the scope of the invention. These embodiments can be implemented in various other forms, and various omissions, substitutions, and changes can be made without departing from the gist of the invention. These embodiments or their modifications are included in the scope or gist of the invention, and are also included in the invention described in the scope of patent applications and their equivalent scope.

1、1A、1B:流體殺菌裝置 8:供給箱 9:回收箱 12:泵 14:流量調整機構 22、24:連結構件 23、25:流路構件 26:周面 27:上游側的一端 28:下游側的另一端 30:處理室 31:處理室的前表面 32:處理室的側面 33:內表面 40:光源室 41:基板 42:發光元件 43:光源 44:光源室的側面 50:分隔構件 50a:分隔構件的第一面 50b:分隔構件的第二面 51:第一膜 52:第二膜 t、t1、t2:厚度1, 1A, 1B: fluid sterilization device 8: Supply box 9: Recycle bin 12: Pump 14: Flow adjustment mechanism 22, 24: connecting components 23, 25: Flow path components 26: Circumference 27: One end on the upstream side 28: The other end on the downstream side 30: processing room 31: The front surface of the processing chamber 32: The side of the processing room 33: inner surface 40: light source room 41: substrate 42: Light-emitting element 43: light source 44: The side of the light source room 50: divider 50a: The first side of the dividing member 50b: The second side of the dividing member 51: The first film 52: second film t, t1, t2: thickness

圖1是表示第一實施方式的流體殺菌裝置的應用例的示意圖。 圖2是表示第一實施方式的流體殺菌裝置的主要部分的剖面圖。 圖3是表示第二實施方式的流體殺菌裝置的主要部分的剖面圖。 圖4是表示第三實施方式的流體殺菌裝置的主要部分的剖面圖。Fig. 1 is a schematic diagram showing an application example of the fluid sterilization device of the first embodiment. Fig. 2 is a cross-sectional view showing the main part of the fluid sterilization device of the first embodiment. 3 is a cross-sectional view showing the main part of the fluid sterilization device of the second embodiment. Fig. 4 is a cross-sectional view showing the main part of the fluid sterilization device of the third embodiment.

1:流體殺菌裝置 1: Fluid sterilization device

30:處理室 30: processing room

31:處理室的前表面 31: The front surface of the processing chamber

32:處理室的側面 32: The side of the processing room

33:內表面 33: inner surface

40:光源室 40: light source room

41:基板 41: substrate

42:發光元件 42: Light-emitting element

43:光源 43: light source

44:光源室的側面 44: The side of the light source room

50:分隔構件 50: divider

50a:分隔構件的第一面 50a: The first side of the dividing member

50b:分隔構件的第二面 50b: The second side of the dividing member

51:第一膜 51: The first film

52:第二膜 52: second film

t、t1、t2:厚度 t, t1, t2: thickness

Claims (6)

一種流體殺菌裝置，包括： 處理室，對流體進行處理； 光源室，設置有朝向所述處理室照射紫外線的光源； 分隔構件，具有紫外線透過性，將所述處理室與所述光源室加以劃分；以及 第一膜，將與所述處理室相向的所述分隔構件的第一面加以覆蓋。A fluid sterilization device includes: Processing room, to process fluid; The light source room is provided with a light source that irradiates ultraviolet rays toward the processing room; A partition member that has ultraviolet light permeability and divides the processing chamber and the light source chamber; and The first film covers the first surface of the partition member facing the processing chamber. 如請求項1所述的流體殺菌裝置，其中， 所述第一膜為氟系樹脂。The fluid sterilization device according to claim 1, wherein: The first film is a fluorine-based resin. 如請求項1或2所述的流體殺菌裝置，其中， 所述第一膜的厚度為10nm以下。The fluid sterilization device according to claim 1 or 2, wherein: The thickness of the first film is 10 nm or less. 一種流體殺菌裝置，包括： 處理室，對流體進行處理； 光源室，設置有朝向所述處理室照射紫外線的光源； 分隔構件，具有紫外線透過性，將所述處理室與所述光源室加以劃分；以及 第二膜，將與所述光源室相向的所述分隔構件的第二面加以覆蓋。A fluid sterilization device includes: Processing room, to process fluid; The light source room is provided with a light source that irradiates ultraviolet rays toward the processing room; A partition member that has ultraviolet light permeability and divides the processing chamber and the light source chamber; and The second film covers the second surface of the partition member facing the light source chamber. 如請求項4所述的流體殺菌裝置，其中， 所述第二膜是抑制由所述光源照射的紫外光的反射的抗反射膜。The fluid sterilization device according to claim 4, wherein: The second film is an anti-reflection film that suppresses reflection of ultraviolet light irradiated by the light source. 如請求項4或5所述的流體殺菌裝置，其中， 所述第二膜的厚度為30nm以上、60nm以下。The fluid sterilization device according to claim 4 or 5, wherein: The thickness of the second film is 30 nm or more and 60 nm or less.
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