TW201927713A - Surface treatments to substrates to reduce display corrosion - Google Patents

Surface treatments to substrates to reduce display corrosion Download PDF

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Publication number
TW201927713A
TW201927713A TW107145420A TW107145420A TW201927713A TW 201927713 A TW201927713 A TW 201927713A TW 107145420 A TW107145420 A TW 107145420A TW 107145420 A TW107145420 A TW 107145420A TW 201927713 A TW201927713 A TW 201927713A
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glass substrate
glass
substrate
processing
mol
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TW107145420A
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Chinese (zh)
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路易斯喬瑟夫 史丹平二世
汪妲賈妮娜 華柴克
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美商康寧公司
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    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C23/00—Other surface treatment of glass not in the form of fibres or filaments
    • C03C23/0095—Solution impregnating; Solution doping; Molecular stuffing, e.g. of porous glass
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C21/00—Treatment of glass, not in the form of fibres or filaments, by diffusing ions or metals in the surface
    • C03C21/001—Treatment of glass, not in the form of fibres or filaments, by diffusing ions or metals in the surface in liquid phase, e.g. molten salts, solutions
    • C03C21/002—Treatment of glass, not in the form of fibres or filaments, by diffusing ions or metals in the surface in liquid phase, e.g. molten salts, solutions to perform ion-exchange between alkali ions
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C15/00—Surface treatment of glass, not in the form of fibres or filaments, by etching
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C3/00—Glass compositions
    • C03C3/04—Glass compositions containing silica
    • C03C3/076—Glass compositions containing silica with 40% to 90% silica, by weight
    • C03C3/083—Glass compositions containing silica with 40% to 90% silica, by weight containing aluminium oxide or an iron compound
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C3/00—Glass compositions
    • C03C3/04—Glass compositions containing silica
    • C03C3/076—Glass compositions containing silica with 40% to 90% silica, by weight
    • C03C3/083—Glass compositions containing silica with 40% to 90% silica, by weight containing aluminium oxide or an iron compound
    • C03C3/085—Glass compositions containing silica with 40% to 90% silica, by weight containing aluminium oxide or an iron compound containing an oxide of a divalent metal
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C3/00—Glass compositions
    • C03C3/04—Glass compositions containing silica
    • C03C3/076—Glass compositions containing silica with 40% to 90% silica, by weight
    • C03C3/089—Glass compositions containing silica with 40% to 90% silica, by weight containing boron
    • C03C3/091—Glass compositions containing silica with 40% to 90% silica, by weight containing boron containing aluminium

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  • Chemical & Material Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Chemical & Material Sciences (AREA)
  • Geochemistry & Mineralogy (AREA)
  • Materials Engineering (AREA)
  • Organic Chemistry (AREA)
  • Surface Treatment Of Glass (AREA)
  • Liquid Crystal (AREA)

Abstract

Methods of treating glass-based substrates such as glass substrates to reduce or prevent corrosion on the surface of the glass-based substrates are disclosed. Treated glass-based substrates are configured to be used as light guide plates in displays and lighting devices.

Description

用以降低顯示器腐蝕之對基板的表面處理Surface treatment of substrates to reduce display corrosion

相關申請案之交叉引用Cross-reference to related applications

本申請案依據專利法請求2017年12月21日提出之美國臨時申請案第62/608721號之優先權權益，其內容被依賴並參照其全文以併入本文。This application claims the priority right of US Provisional Application No. 62/608721 filed on December 21, 2017 in accordance with the Patent Law, the content of which is relied on and incorporated herein by reference.

本發明大體上係關於可例如用在顯示器與顯示裝置(尤其是包含光導板的顯示器)中的基板之表面處理。The present invention relates generally to the surface treatment of substrates that can be used, for example, in displays and display devices, particularly displays including light guide plates.

包括聚合物光導與漫射膜之用於產生漫射光的習知部件已經包括漫射結構，其已被利用在顯示器產業中的若干應用中。這些應用包括無邊框電視系統、液晶顯示器(LCD)、電泳顯示器(EPD)、有機發光二極體顯示器(OLED)、電漿顯示面板(PDP)、微機電結構(MEMS)顯示器、電子閱讀器(e-reader)裝置、等等。Conventional components for generating diffused light, including polymer light guides and diffuser films, have included diffuser structures, which have been used in several applications in the display industry. These applications include bezel-less TV systems, liquid crystal displays (LCDs), electrophoretic displays (EPDs), organic light emitting diode displays (OLEDs), plasma display panels (PDPs), micro-electromechanical structure (MEMS) displays, e-readers ( e-reader) device, etc.

對於更薄、更輕、與更有能源效益的顯示器的需求已經導致開發所謂的透明顯示器。透明顯示器現在被商用地實施在數種變化中，包括販賣機門、冷凍庫門、零售廣告、擴增實境螢幕、汽車產業中的抬頭顯示器、辦公室的智慧視窗、可攜式消費者電子裝置、及安全監控。The demand for thinner, lighter, and more energy efficient displays has led to the development of so-called transparent displays. Transparent displays are now commercially implemented in several changes, including vending machine doors, freezer doors, retail advertising, augmented reality screens, head-up displays in the automotive industry, smart windows in offices, portable consumer electronics devices, And security monitoring.

遺憾地是，透明顯示器易遭受數種不良的效能特徵。現行可得的顯示器僅部分地透射與反射光，因此大幅限制顯示器的對比率。商用可得的透明顯示器通常僅提供約15%透射率，且在反射模式中的效能甚至更低。Unfortunately, transparent displays are susceptible to several undesirable performance characteristics. Presently available displays only partially transmit and reflect light, thus significantly limiting the contrast ratio of the display. Commercially available transparent displays typically provide only about 15% transmittance and are even less effective in reflective mode.

對於許多實際應用，透明顯示器需要背板照明(經由透明的背光元件)的支持。為了保持透明性，背光需要在關閉態為完全地透明而在開啟態為完全地照明。具有磨砂(frosted)外觀的背光通常是不可接受的。此外，透明背光的使用必然消除習知反射媒介的使用。提供背板照明的現行技術不能令人滿意地符合對於透明顯示器之市場的某些成本與效能要求。For many practical applications, transparent displays require support for backplane lighting (via transparent backlight elements). To maintain transparency, the backlight needs to be completely transparent in the off state and fully illuminated in the on state. Backlights with a frosted appearance are often unacceptable. In addition, the use of a transparent backlight necessarily eliminates the use of conventional reflective media. Current technologies that provide back panel lighting do not satisfactorily meet certain cost and performance requirements for the transparent display market.

一般指稱設置以提供照明的裝置之光發射器可包括用於使用在顯示裝置中的背光元件，或光發射器可設置以提供一般照明，諸如用於房間或車輛的照明。光發射器包括光導板，藉由一或多個光源，光可耦合在光導板中且耦合光透過光導板而傳遞。光導板通常是包含相對主表面的基板。在此使用時，用語「基板」大致指稱板形基板，且其在某些實施例中適用於使用作為光導板。對於光發射器應用，相對主表面的至少一者包括表面紋理，其設置以散射在光導中傳遞的光的至少一部分。表面紋理具體地設置以使光導為可見地透明，而沒有可察覺的霧度，從而使光導特別有益於使用在透明顯示裝置中的背光元件的建構中。表面紋理的配置也提供出色的視角表現。A light emitter of a device generally referred to as being provided to provide illumination may include a backlight element for use in a display device, or a light emitter may be provided to provide general illumination, such as for a room or a vehicle. The light transmitter includes a light guide plate, and through one or more light sources, light can be coupled in the light guide plate and the coupled light can be transmitted through the light guide plate. The light guide plate is usually a substrate containing opposite major surfaces. As used herein, the term "substrate" refers generally to a plate-shaped substrate, and it is suitable for use as a light guide plate in some embodiments. For light emitter applications, at least one of the opposing major surfaces includes a surface texture disposed to scatter at least a portion of the light transmitted in the light guide. The surface texture is specifically set so that the light guide is visible and transparent without appreciable haze, making the light guide particularly useful in the construction of backlight elements used in transparent display devices. The configuration of the surface texture also provides excellent viewing angle performance.

光發射器可定位在相對於顯示面板的觀看者之透明顯示面板之後。光可沿著基板的一或多個邊緣表面、及/或沿著基板的一或多個邊界而耦合進光導板，其中此等邊界代表鄰近邊緣表面的主表面的部分。光在光導板內以波導方式傳遞，例如藉由全內反射，且入射在至少一主表面的光散射部分上。因此，透過光導板傳遞的光與可被入射在基板的紋理表面上的光可被散射出光導以照明顯示裝置的顯示面板，諸如LCD顯示面板。The light emitter may be positioned behind a transparent display panel of a viewer relative to the display panel. Light may be coupled into the light guide plate along one or more edge surfaces of the substrate, and / or along one or more boundaries of the substrate, where such boundaries represent portions of the major surface adjacent the edge surface. Light is transmitted in a waveguide manner within the light guide plate, such as by total internal reflection, and incident on a light scattering portion of at least one major surface. Therefore, light transmitted through the light guide plate and light that can be incident on the textured surface of the substrate can be scattered out of the light guide to illuminate a display panel of a display device, such as an LCD display panel.

蝕刻可用於製造紋理表面，諸如顯示器應用的紋理表面。除了蝕刻之外，製備光導板的製程可包括額外步驟，諸如在蝕刻、沖洗及乾燥之前，清潔基板。Etching can be used to make textured surfaces, such as textured surfaces for display applications. In addition to etching, the process of preparing the light guide plate may include additional steps such as cleaning the substrate before etching, rinsing, and drying.

當顯示裝置的耀度不在規格之內時，顯示的圖像失出清晰度。顯示裝置上耀度的衰減傳統上已經藉由參照非劣化像素決定電壓衰減與透過修正因數補償電流而解決。期望提供其他方法降低或避免顯示裝置中耀度的衰減。When the brightness of the display device is not within specifications, the displayed image loses sharpness. The attenuation of the brightness on the display device has traditionally been solved by determining the voltage attenuation with reference to the non-degraded pixels and compensating the current through a correction factor. It is desirable to provide other methods to reduce or avoid attenuation of glare in a display device.

本發明的第一態樣關於一種處理玻璃基板的方法，方法包含：處理玻璃基板，玻璃基板包含至少一主表面與一邊緣，邊緣界定在從約0.1 mm至約3 mm的範圍中的厚度，基板被設置用於作為液晶顯示器的光導板，以散布光遍及顯示器並展現正交於至少一主表面之在從400 nm至700 nm的波長範圍中大於90%的透射率，其中處理步驟包含處理玻璃基板以防止鈉離子遷移至玻璃基板的表面。A first aspect of the present invention relates to a method for processing a glass substrate, the method comprising: processing a glass substrate, the glass substrate including at least a main surface and an edge, the edge defining a thickness in a range from about 0.1 mm to about 3 mm, The substrate is configured as a light guide plate for a liquid crystal display to spread light throughout the display and exhibit a transmittance greater than 90% in a wavelength range from 400 nm to 700 nm orthogonal to at least one major surface, wherein the processing step includes processing A glass substrate to prevent sodium ions from migrating to the surface of the glass substrate.

在第二態樣中，一種處理玻璃基板的方法包含：處理玻璃基板，玻璃基板包含至少一主表面與一邊緣，邊緣界定在從約0.1 mm至約3 mm的範圍中的厚度，基板被設置用於作為液晶顯示器的光導板，以散布光遍及顯示器並展現正交於至少一主表面之在從400 nm至700 nm的波長範圍中大於90%的透射率，其中處理步驟包含使玻璃基板接觸蝕刻劑，蝕刻劑選自由氫氟酸、氟化銨、二氟化銨、氟化鈉、氟化鉀、乙酸、乙二酸、HCl、HNO3 、H2 SO4 、及H3 PO4 所構成的群組，及使玻璃基板經受浸析(leaching)反應，其中氧化矽富集玻璃基板的一表面，而自基板的表面耗乏金屬離子。In a second aspect, a method for processing a glass substrate includes: processing a glass substrate. The glass substrate includes at least a main surface and an edge. The edge defines a thickness in a range from about 0.1 mm to about 3 mm. The substrate is disposed. Used as a light guide plate for a liquid crystal display to diffuse light throughout the display and exhibit a transmittance greater than 90% in a wavelength range from 400 nm to 700 nm orthogonal to at least one major surface, wherein the processing step includes contacting a glass substrate Etchant, selected from hydrofluoric acid, ammonium fluoride, ammonium difluoride, sodium fluoride, potassium fluoride, acetic acid, oxalic acid, HCl, HNO 3 , H 2 SO 4 , and H 3 PO 4 The formed group, and subjecting the glass substrate to a leaching reaction, in which silicon oxide enriches one surface of the glass substrate and depletes metal ions from the surface of the substrate.

在第三態樣中，一種處理玻璃基板的方法包含：處理玻璃基板，玻璃基板包含至少一主表面與一邊緣，邊緣界定在從約0.1 mm至約3 mm的範圍中的厚度，基板被設置用於作為液晶顯示器的光導板，以散布光遍及顯示器並展現正交於至少一主表面之在從400 nm至700 nm的波長範圍中大於90%的透射率，其中處理步驟包含處理玻璃基板，處理玻璃基板包含使玻璃基板接觸溶液，溶液含有選自由ZnCl2 、AlCl3 、CaCl2 、MgCl2 、ZnCl2 、AlBr3 、CaBr2 、MgBr2 、ZnF2 、AlF3 、CaF2 、及MgF2 所構成的群組之化合物。In a third aspect, a method for processing a glass substrate includes: processing a glass substrate. The glass substrate includes at least a main surface and an edge. The edge defines a thickness in a range from about 0.1 mm to about 3 mm. The substrate is disposed. A light guide plate used as a liquid crystal display to spread light throughout the display and exhibit a transmittance greater than 90% in a wavelength range from 400 nm to 700 nm orthogonal to at least one major surface, wherein the processing step includes processing a glass substrate, Processing the glass substrate includes contacting the glass substrate with a solution selected from the group consisting of ZnCl 2 , AlCl 3 , CaCl 2 , MgCl 2 , ZnCl 2 , AlBr 3 , CaBr 2 , MgBr 2 , ZnF 2 , AlF 3 , CaF 2 , and MgF 2 A group of compounds.

第四態樣關於一種處理基板的方法包含：提供玻璃基板，玻璃基板包含至少一主表面與一邊緣，邊緣界定在從約0.1 mm至約3 mm的範圍中的厚度；及藉由以下至少一者處理玻璃基板：(a)耗乏玻璃基板中的單價金屬離子及(b)吸引相對離子(counter ion)二價陽離子。在某些實施例中，方法包括耗乏玻璃基板中的單價金屬離子及吸引相對離子二價陽離子兩者。在某些實施例中，單價金屬離子包含Na。在某些實施例中，處理玻璃基板包含藉由耗乏玻璃基板的一層，此層具有在從1 nm 至10 nm的範圍中之厚度的Na，而耗乏玻璃基板中的單價金屬離子。在某些實施例中，處理玻璃基板進一步包含使玻璃基板接觸蝕刻劑並使玻璃基板經受浸析反應，其中氧化矽富集玻璃基板的一表面，而金屬離子由基板的表面耗乏。A fourth aspect relates to a method for processing a substrate, including: providing a glass substrate, the glass substrate including at least a main surface and an edge, the edge defining a thickness in a range from about 0.1 mm to about 3 mm; and by at least one of the following One deals with glass substrates: (a) depletes monovalent metal ions in the glass substrate and (b) attracts counter ion divalent cations. In some embodiments, the method includes depleting both monovalent metal ions in the glass substrate and attracting opposite ion divalent cations. In certain embodiments, the monovalent metal ion comprises Na. In some embodiments, processing a glass substrate comprises depleting a monovalent metal ion in the glass substrate by depleting a layer of the glass substrate having a thickness of Na in a range from 1 nm to 10 nm. In some embodiments, processing the glass substrate further comprises contacting the glass substrate with an etchant and subjecting the glass substrate to a leaching reaction, wherein silicon oxide enriches one surface of the glass substrate and metal ions are depleted from the surface of the substrate.

可致使顯示裝置中耀度改變為時間的函數之多個要素的一者為玻璃表面本身由於「風化(weathering)」或玻璃表面的腐蝕。本文所述為可降低或避免顯示裝置的表面上腐蝕之表面處理。在特定實施例中，所述的表面處理可降低使用於光導板與包含光導板之光導組件的玻璃系表面上的腐蝕。One of the multiple factors that can cause the glare in a display device to change as a function of time is that the glass surface itself is due to "weathering" or corrosion of the glass surface. Described herein is a surface treatment that can reduce or avoid corrosion on the surface of a display device. In a specific embodiment, the surface treatment can reduce the corrosion on the light guide plate and the glass-based surface of the light guide assembly including the light guide plate.

在此使用時，片語「玻璃系物件」與「玻璃系基板」使用其最廣泛的意義以包括完全或部分地由玻璃製成的任何物體。玻璃系基板包括玻璃與非玻璃材料的積層、玻璃與結晶材料的積層、及玻璃-陶瓷(包括非晶相與結晶相)。除非另外指明，所有的玻璃組成以莫耳百分率(mol%)形式而表示。As used herein, the phrases "glass-based object" and "glass-based substrate" are used in their broadest sense to include any object made entirely or partially of glass. The glass-based substrate includes a laminated layer of glass and a non-glass material, a laminated layer of glass and a crystalline material, and a glass-ceramic (including an amorphous phase and a crystalline phase). Unless otherwise specified, all glass compositions are expressed in mole percentages (mol%).

本文所述的玻璃系基板與玻璃基板可用於作為光導板。本文所述之光導板與光導組件可使用在顯示器、照明、及電子裝置中，例如，電視、電腦、電話、平板、及其他顯示面板、照明器具、固態照明、告示牌、及其他建築元件。The glass-based substrate and the glass substrate described herein can be used as a light guide plate. The light guide plates and light guide assemblies described herein can be used in displays, lighting, and electronic devices, such as televisions, computers, phones, tablets, and other display panels, lighting appliances, solid state lighting, billboards, and other building elements.

諸如使用在顯示器玻璃中之玻璃基板的玻璃系基板已被顯示在潮溼環境(例如，90%相對溼度)與高溫(例如，60°C)中腐蝕。此種腐蝕被確定為致使耀度增加，並隨後造成顯示品質的衰退。Glass-based substrates, such as glass substrates used in display glass, have been shown to corrode in humid environments (e.g., 90% relative humidity) and high temperatures (e.g., 60 ° C). This corrosion was determined to cause an increase in brightness, and subsequently caused a decline in display quality.

本發明的實施例關於可降低或避免此種腐蝕的表面處理，藉由利用可在相對快速的時間框架(例如，數分鐘)易於應用於現存顯示器製造加工產線的簡單方法。例如，本發明的一或多個實施例提供一種製程以藉由玻璃表面之浸析(leaching)與隨後可選的退火移除腐蝕副產物中的問題陽離子。在本發明的一或多個實施例中，提供使用玻璃加工處理的最終步驟之沖洗水中的腐蝕抑制劑。在某些實施例中，提供表面處理對策以降低諸如玻璃基板之玻璃系基板上白斑形成形式的腐蝕，隨後降低或消除由此種腐蝕導致之所得耀度增加的程度。Embodiments of the present invention pertain to a surface treatment that can reduce or avoid such corrosion, by using a simple method that can be easily applied to an existing display manufacturing process line in a relatively fast time frame (for example, several minutes). For example, one or more embodiments of the present invention provide a process to remove problem cations in corrosion by-products by leaching of glass surfaces and subsequent optional annealing. In one or more embodiments of the invention, a corrosion inhibitor is provided in the rinse water using the final step of the glass processing process. In some embodiments, surface treatment countermeasures are provided to reduce corrosion in the form of white spots on glass-based substrates, such as glass substrates, and subsequently reduce or eliminate the degree of increase in glare resulting from such corrosion.

圖1繪示包含玻璃系基板110與複數個微結構130的光導板(LGP)組件100的範例實施例。當然，所示的微結構130僅為示例。再者，微結構130的尺寸及/或形狀可改變，取決於LGP之期望的光輸出及/或光學功能。光導板(LGP)組件100進一步包含至少一光源140，其可光學地耦接至玻璃系基板110的邊緣表面150，例如，定位成鄰接邊緣表面150。在此使用時，用語「光學地耦接」意於表示光源定位在LGP的邊緣，以便引導光進入LGP。光源可光學地耦接於LGP，即使其與LGP未實體接觸。額外光源(未圖示)也可光學地耦接於LGP的其他邊緣表面，諸如鄰近或相對邊緣表面。本發明不限於任何特定照明佈置，且可包括邊緣光照與直接光照配置。來自光源140的光發射的一般方向藉由實箭頭描繪於圖1中。射入LGP的光由於全內反射(TIR)可沿著LGP的長度L而傳播，直到其以小於臨界角的入射角撞擊界面。TIR為在包含第一折射率的第一材料(例如，玻璃、塑膠、等等)中傳播的光可在與包含低於第一折射率的第二折射率之第二材料(例如，空氣、等等)的界面處完全地反射的現象。TIR可使用司乃耳定律解釋：

其說明在不同折射率的兩種材料之間的界面處之光的折射。根據司乃耳定律，n1 為第一材料的折射率，n2 為第二材料的折射率，θi 為入射在界面處的光相對於界面的法線之角度(入射角)，且θr 為折射光相對於法線之折射角。當折射角(θr )為90° 時，例如，sin(θr )=1，司乃耳定律可表示成：

在這些條件下的入射角θi 也可稱為臨界角θc 。具有大於臨界角的入射角(θi ＞ θc )之光在第一材料內會完全地內部反射，然而具有等於或小於臨界角的入射角(θi ≤ θc )的光會被第一材料傳遞。FIG. 1 illustrates an exemplary embodiment of a light guide plate (LGP) assembly 100 including a glass-based substrate 110 and a plurality of microstructures 130. Of course, the microstructure 130 shown is merely an example. Furthermore, the size and / or shape of the microstructures 130 may vary depending on the desired light output and / or optical function of the LGP. The light guide plate (LGP) assembly 100 further includes at least one light source 140 that can be optically coupled to the edge surface 150 of the glass-based substrate 110, for example, positioned adjacent to the edge surface 150. As used herein, the term "optically coupled" is intended to indicate that the light source is positioned at the edge of the LGP in order to guide light into the LGP. The light source may be optically coupled to the LGP, even if it is not in physical contact with the LGP. Additional light sources (not shown) may also be optically coupled to other edge surfaces of the LGP, such as adjacent or opposite edge surfaces. The invention is not limited to any particular lighting arrangement, and may include edge lighting and direct lighting configurations. The general direction of light emission from the light source 140 is depicted in FIG. 1 by solid arrows. The light incident on the LGP can propagate along the length L of the LGP due to total internal reflection (TIR) until it hits the interface at an incident angle less than a critical angle. TIR is that light propagating in a first material (e.g., glass, plastic, etc.) containing a first refractive index can interact with a second material (e.g., air, Etc.) phenomenon of complete reflection at the interface. TIR can be explained using Snell's law:

It illustrates the refraction of light at the interface between two materials of different refractive indices. According to Snell's law, n 1 is the refractive index of the first material, n 2 is the refractive index of the second material, θ i is the angle (incident angle) of the light incident at the interface with respect to the normal of the interface, and θ r is the refraction angle of the refracted light with respect to the normal. When the refraction angle (θ r ) is 90 ° , for example, sin (θ r ) = 1, Snell's law can be expressed as:

The incidence angle θ i under these conditions can also be referred to as the critical angle θ c . Light having an incident angle (θ i > θ c ) greater than the critical angle is completely internally reflected in the first material, but light having an incident angle (θ i ≦ θ c ) equal to or smaller than the critical angle is first Material delivery.

在空氣(n1 =1)與玻璃(n2 =1.5)之間的範例界面的情況中，臨界角(θc )可計算為41° 。因此，若在玻璃中傳播的光以大於41° 的入射角撞擊空氣-玻璃界面，所有入射光會從界面以等同入射角的角度而反射。若反射光遭遇包含與第一界面相同折射率關係之第二界面，則入射在第二界面上的光會再次以等同入射角的反射角被反射。In the case of an exemplary interface between air (n 1 = 1) and glass (n 2 = 1.5), the critical angle (θ c ) can be calculated as 41 ° . Therefore, if light propagating through glass hits the air-glass interface at an angle of incidence greater than 41 ° , all incident light will be reflected from the interface at an angle equal to the angle of incidence. If the reflected light encounters a second interface containing the same refractive index relationship as the first interface, the light incident on the second interface will be reflected again at a reflection angle equivalent to the incident angle.

複數個微結構130可安置在玻璃系基板110的主表面上，諸如光發射表面160。複數個微結構130可與LGP之其他可選部件將光傳遞為前進方向(例如，朝向使用者)，如虛箭頭所示。在某些實施例中，光源140可為朗伯(Lambertian)光源，諸如發光二極體(LED)。來自LED的光快速地散布在LGP內，其會使得實現區域調光(例如，藉由關閉一或多個LED)是具挑戰性的。然而，藉由提供一或多個微結構在LGP的表面上，其在光傳播的方向上伸長(如圖1中實箭頭所示)，會能夠限制光的散布，使得各LED光源有效地僅照明LGP的窄條帶。此照明條帶可例如從在LED處的起始點延伸至在相對邊緣上的類似端點。The plurality of microstructures 130 may be disposed on a main surface of the glass-based substrate 110, such as a light emitting surface 160. The plurality of microstructures 130 and other optional components of the LGP can transmit light in a forward direction (eg, toward a user), as indicated by the dashed arrows. In some embodiments, the light source 140 may be a Lambertian light source, such as a light emitting diode (LED). The light from the LEDs is quickly dispersed within the LGP, which can make achieving area dimming (eg, by turning off one or more LEDs) challenging. However, by providing one or more microstructures on the surface of the LGP, which are elongated in the direction of light propagation (as shown by the solid arrow in Fig. 1), the spread of light can be restricted, making each LED light source effectively only Narrow strip of illuminated LGP. This lighting strip may, for example, extend from a starting point at the LED to a similar endpoint on the opposite edge.

根據各種實施例，玻璃系基板110的表面160或第二主表面170可圖案化具有複數個光萃取特徵。在此使用時，用語「圖案化」意指複數個光萃取特徵以任何給定圖案或設計存在於基板表面之上或之中，其例如可為隨機或排列的、重覆或非重覆、均勻或非均勻。在其他實施例中，光萃取特徵可位在鄰近表面(例如，表面下)之玻璃系基板的基質內。例如，光萃取特徵可分配遍及表面，例如，構成粗糙化或浮雕表面的紋理特徵，或可分配在基板或其部分之內或貫穿基板或其部分，例如，雷射破壞特徵。According to various embodiments, the surface 160 or the second main surface 170 of the glass-based substrate 110 may be patterned with a plurality of light extraction features. As used herein, the term "patterned" means that a plurality of light extraction features are present on or in the substrate surface in any given pattern or design, which may be, for example, randomly or arranged, repeated or non-repeated, Uniform or non-uniform. In other embodiments, the light extraction features may be located within a matrix of a glass-based substrate adjacent a surface (eg, below the surface). For example, light extraction features may be assigned throughout the surface, for example, texture features constituting a roughened or embossed surface, or may be assigned within or through a substrate or part thereof, such as a laser damage feature.

在各種實施例中，可選地存在於LGP的表面160或第二主表面170之光萃取特徵可包含光散射位置。根據各種實施例，光萃取特徵可圖案化成合適密度，以便產生實質上均勻光輸出強度遍布玻璃系基板的光發射表面。在某些實施例中，鄰近光源的光萃取特徵的密度會低於在遠離光源位點處的光萃取特徵的密度，或反之亦然，諸如從一端至另一端的梯度，以適當地產生遍布LGP之期望的光輸出分配。In various embodiments, light extraction features optionally present on the surface 160 or the second major surface 170 of the LGP may include light scattering locations. According to various embodiments, the light extraction features may be patterned to a suitable density so as to produce a light emitting surface with a substantially uniform light output intensity throughout the glass-based substrate. In some embodiments, the density of light extraction features adjacent to the light source will be lower than the density of light extraction features at sites far from the light source, or vice versa, such as a gradient from one end to the other to appropriately produce LGP's desired light output distribution.

可處理LGP以產生光萃取特徵，按照發明領域中已知的任何方法，例如，揭示在共同申請與共同擁有的國際專利申請公開第WO2014058748號與WO2015095288號中之方法，其各自在此以引用全文方式併入。例如，LGP的表面可被研磨及/或拋光以達到期望厚度及/或表面品質。表面可接著被可選地清潔及/或將被蝕刻的表面可經受移除汙染物的製程，諸如使表面暴露於臭氧。作為非限制性實施例，將被蝕刻的表面可暴露於酸浴，例如，以例如範圍從約1：1至約9：1之比率的冰醋酸(GAA)與氟化銨(NH4 F)的混合物。蝕刻時間可例如在從約30秒至約15分鐘的範圍，且蝕刻可發生在室溫或高溫下。諸如酸濃度/比率、溫度、及或時間的處理參數會影響所得的萃取特徵之尺寸、形狀、及分布。The LGP can be processed to produce light extraction features, according to any method known in the field of the invention, for example, methods disclosed in co-filed and co-owned International Patent Application Publication Nos. WO2014058748 and WO2015095288, each of which is incorporated herein by reference in its entirety Ways merge. For example, the surface of the LGP may be ground and / or polished to achieve a desired thickness and / or surface quality. The surface may then be optionally cleaned and / or the surface to be etched may be subjected to a process of removing contaminants, such as exposing the surface to ozone. As a non-limiting example, the surface to be etched may be exposed to an acid bath, such as, for example, glacial acetic acid (GAA) and ammonium fluoride (NH 4 F) at a ratio ranging from about 1: 1 to about 9: 1, for example. mixture. The etching time may be, for example, in a range from about 30 seconds to about 15 minutes, and the etching may occur at room temperature or high temperature. Processing parameters such as acid concentration / ratio, temperature, and / or time can affect the size, shape, and distribution of the resulting extraction features.

玻璃系基板110可具有任何期望尺寸及/或形狀適以產生期望光分布。玻璃系基板110可包含相對於光發射表面160的第二主表面170。主表面在某些實施例中可為平面或實質平面的，例如，實質平坦的。第一與第二主表面在各種實施例中可為平行或實質平行的。玻璃系基板110可包含四個邊緣，如圖1所示，或可包含超過四個邊緣，例如，多側多邊形。在其他實施例中，玻璃系基板110可包含少於四個邊緣，例如，三角形。作為非限制性實例，光導板可包含矩形、方形、或具有四個邊緣的菱形片材，然而其他形狀與配置意欲落在本發明的範疇中，包括那些具有一或多個曲線部分或邊緣。The glass-based substrate 110 may have any desired size and / or shape suitable to produce a desired light distribution. The glass-based substrate 110 may include a second main surface 170 opposite to the light emitting surface 160. The major surface may be planar or substantially planar in some embodiments, for example, substantially planar. The first and second major surfaces may be parallel or substantially parallel in various embodiments. The glass-based substrate 110 may include four edges, as shown in FIG. 1, or may include more than four edges, for example, a multi-sided polygon. In other embodiments, the glass-based substrate 110 may include less than four edges, such as a triangle. As a non-limiting example, the light guide plate may include rectangular, square, or diamond-shaped sheets with four edges, however other shapes and configurations are intended to fall within the scope of the present invention, including those with one or more curved portions or edges.

在本發明的處理基板的一或多個實施例中，諸如玻璃基板的玻璃系基板110可具有厚度d1 為小於或等於約3 mm，例如，範圍從約0.1 mm至約3 mm、從約0.1 mm至約2.5 mm、從約0.3 mm至約2 mm、從約0.5 mm至約1.5 mm、或從約0.7 mm至約1 mm，包括之間的所有範圍與子範圍。玻璃系基板110可包含用於顯示裝置之發明領域中任何已知材料。例如，玻璃系基板可包含鋁矽酸鹽玻璃、鹼金屬鋁矽酸鹽玻璃、硼矽酸鹽玻璃、鹼金屬硼矽酸鹽玻璃、鋁硼矽酸鹽玻璃、鹼金屬鋁硼矽酸鹽玻璃、鈉鈣玻璃、或其他合適玻璃。適用作為玻璃光導的商業上可獲得玻璃之非限制性實例包括例如取自康寧公司的EAGLE XG® 、LotusTM 、Willow® 、IrisTM 、及Gorilla® 玻璃。In one or more embodiments of the processing substrate of the present invention, a glass-based substrate 110 such as a glass substrate may have a thickness d 1 of less than or equal to about 3 mm, for example, ranging from about 0.1 mm to about 3 mm, from about 0.1 mm to about 2.5 mm, from about 0.3 mm to about 2 mm, from about 0.5 mm to about 1.5 mm, or from about 0.7 mm to about 1 mm, including all ranges and subranges therebetween. The glass-based substrate 110 may include any material known in the field of the invention for display devices. For example, the glass-based substrate may include aluminosilicate glass, alkali metal aluminosilicate glass, borosilicate glass, alkali metal borosilicate glass, aluminoborosilicate glass, alkali metal aluminoborosilicate glass , Soda lime glass, or other suitable glass. Glass useful as a light guide Non-limiting examples include commercially available, for example, glass from Corning EAGLE XG ®, Lotus TM, Willow ®, Iris TM, and Gorilla ® glass.

某些非限制性玻璃組成物可包括約50 mol %至約90 mol%之間的SiO2 、0 mol%至約20 mol%之間的Al2 O3 、0 mol%至約20 mol%之間的B2 O3 、及0 mol%至約25 mol%之間的Rx O，其中R是Li、Na、K、Rb、Cs的一者或多者且x為2、或R是Zn、Mg、Ca、Sr或Ba的一者或多者且x為1。在某些實施例中，Rx O – Al2 O3 ＞ 0；0 ＜ Rx O – Al2 O3 ＜ 15；x = 2且R2 O – Al2 O3 ＜ 15；R2 O – Al2 O3 ＜ 2；x=2且R2 O – Al2 O3 – MgO ＞ -15；0 ＜ (Rx O – Al2 O3 ) ＜ 25、-11 ＜ (R2 O – Al2 O3 ) ＜ 11、及-15 ＜ (R2 O – Al2 O3 – MgO) ＜ 11；及/或-1 ＜ (R2 O – Al2 O3 ) ＜ 2且-6 ＜ (R2 O – Al2 O3 – MgO) ＜ 1。在某些實施例中，玻璃包含小於1 ppm之Co、Ni、及Cr的每一者。在某些實施例中， Fe的濃度為＜約50 ppm、＜約20 ppm、或＜約10 ppm。在其他實施例中，Fe + 30Cr + 35Ni ＜約60 ppm、Fe + 30Cr + 35Ni ＜約40 ppm、Fe + 30Cr + 35Ni ＜約20 ppm、或Fe + 30Cr + 35Ni ＜約10 ppm。在其他實施例中，玻璃包含約60 mol %至約80 mol%之間的 SiO2 、約0.1 mol%至約15 mol%之間的Al2 O3 、0 mol%至約12 mol%的B2 O3 、及約0.1 mol%至約15 mol%的R2 O及約0.1 mol%至約15 mol%的RO，其中R為Li、Na、K、Rb、Cs之一者或多者且x為2、或R為Zn、Mg、Ca、Sr或Ba之一者或多者且x為1。Certain non-limiting glass compositions may include SiO 2 between about 50 mol% and about 90 mol%, Al 2 O 3 between 0 mol% and about 20 mol%, and 0 mol% to about 20 mol%. B 2 O 3 , and R x O between 0 mol% and about 25 mol%, where R is one or more of Li, Na, K, Rb, Cs and x is 2, or R is Zn Or Mg, Ca, Sr or Ba and x is 1. In certain embodiments, R x O-Al 2 O 3 >0; 0 <R x O-Al 2 O 3 <15; x = 2 and R 2 O-Al 2 O 3 <15; R 2 O- Al 2 O 3 <2; x = 2 and R 2 O – Al 2 O 3 – MgO>-15; 0 <(R x O – Al 2 O 3 ) <25, -11 <(R 2 O – Al 2 O 3 ) <11 and -15 <(R 2 O – Al 2 O 3 – MgO) <11; and / or -1 <(R 2 O – Al 2 O 3 ) <2 and -6 <(R 2 O-Al 2 O 3 -MgO) <1. In some embodiments, the glass contains less than 1 ppm of each of Co, Ni, and Cr. In certain embodiments, the concentration of Fe is <about 50 ppm, <about 20 ppm, or <about 10 ppm. In other embodiments, Fe + 30Cr + 35Ni <about 60 ppm, Fe + 30Cr + 35Ni <about 40 ppm, Fe + 30Cr + 35Ni <about 20 ppm, or Fe + 30Cr + 35Ni <about 10 ppm. In other embodiments, the glass comprises from about 60 mol% to between about 80 mol% of SiO 2, between about 0.1 mol Al%% to about 15 mol 2 O 3, 0 mol % to about 12 mol% of B 2 O 3 , and about 0.1 mol% to about 15 mol% of R 2 O and about 0.1 mol% to about 15 mol% of RO, wherein R is one or more of Li, Na, K, Rb, Cs and x is 2, or R is one or more of Zn, Mg, Ca, Sr, or Ba and x is 1.

在其他實施例中，玻璃組成物可包含約65.79 mol %至約78.17 mol%之間的SiO2 、約2.94 mol%至約12.12 mol%之間的Al2 O3 、約0 mol%至約11.16 mol%之間的B2 O3 、約0 mol%至約2.06 mol%之間的Li2 O、約3.52 mol%至約13.25 mol%之間的Na2 O、約0 mol%至約4.83 mol%之間的K2 O、約0 mol%至約3.01 mol%之間的ZnO、約0 mol%至約8.72 mol%之間的MgO、約0 mol%至約4.24 mol%之間的CaO、約0 mol%至約6.17 mol%之間的SrO、約0 mol%至約4.3 mol%之間的BaO、及約0.07 mol%至約0.11 mol%之間的SnO2 。In other embodiments, the glass composition may comprise between SiO% to about 78.17 mol% to about 65.79 mol 2, between about 2.94 mol Al%% to about 12.12 mol 2 O 3, from about 0 mol% to about 11.16 B 2 O 3 between mol%, Li 2 O between about 0 mol% and about 2.06 mol%, Na 2 O between about 3.52 mol% and about 13.25 mol%, about 0 mol% to about 4.83 mol K 2 O between%, ZnO between about 0 mol% and about 3.01 mol%, MgO between about 0 mol% and about 8.72 mol%, CaO between about 0 mol% and about 4.24 mol%, between about 0 mol SrO% to about 6.17 mol%, and between about 0 mol BaO% percent to about 4.3 mol, and between about 0.07 mol SnO%% to about 0.11 mol 2.

在額外實施例中，玻璃系基板110可包含0.95與3.23之間的Rx O/Al2 O3 比率，其中R為Li、Na、K、Rb、Cs之一者或多者且x為2。在進一步實施例中，玻璃系基板可包含1.18與5.68之間的Rx O/Al2 O3 比率，其中R是Li、Na、K、Rb、Cs之任一者或多者且x為2，或R是Zn、Mg、Ca、Sr或Ba之任一者或多者且x為1。在又進一步實施例中，玻璃系基板可包含-4.25與4.0之間的Rx O – Al2 O3 – MgO，其中R是Li、Na、K、Rb、Cs之任一者或多者且x為2。在更進一步實施例中，玻璃系基板可包含約66 mol %至約78 mol%之間的SiO2 、約4 mol%至約11 mol%之間的Al2 O3 、約4 mol%至約11 mol%之間的B2 O3 、約0 mol%至約2 mol%之間的Li2 O、約4 mol%至約12 mol%之間的Na2 O、約0 mol%至約2 mol%之間的K2 O、約0 mol%至約2 mol%之間的ZnO、約0 mol%至約5 mol%之間的MgO、約0 mol%至約2 mol%之間的CaO、約0 mol%至約5 mol%之間的SrO、約0 mol%至約2 mol%之間的BaO、及約0 mol%至約2 mol%之間的SnO2 。In additional embodiments, the glass-based substrate 110 may include an R x O / Al 2 O 3 ratio between 0.95 and 3.23, where R is one or more of Li, Na, K, Rb, Cs and x is 2 . In a further embodiment, the glass-based substrate may include an R x O / Al 2 O 3 ratio between 1.18 and 5.68, where R is any one or more of Li, Na, K, Rb, Cs and x is 2 Or R is any one or more of Zn, Mg, Ca, Sr, or Ba and x is 1. In still further embodiments, the glass-based substrate may include R x O-Al 2 O 3 -MgO between -4.25 and 4.0, where R is any one or more of Li, Na, K, Rb, Cs and x is 2. In still further embodiments, the glass-based substrate may include SiO 2 between about 66 mol% and about 78 mol%, Al 2 O 3 between about 4 mol% and about 11 mol%, and about 4 mol% to about B 2 O 3 between 11 mol%, Li 2 O between about 0 mol% and about 2 mol%, Na 2 O between about 4 mol% and about 12 mol%, about 0 mol% to about 2 K 2 O between mol%, ZnO between about 0 mol% and about 2 mol%, MgO between about 0 mol% and about 5 mol%, CaO between about 0 mol% and about 2 mol% , from about 0 mol% to about 5 mol SrO between percent, between about 0 mol BaO percent to about 2 mol, and between about 0 mol SnO% percent to about 2 mol 2.

在額外實施例中，玻璃系基板110可包含約72 mol %至約80 mol%之間的SiO2 、約3 mol%至約7 mol%之間的Al2 O3 、約0 mol%至約2 mol%之間的B2 O3 、約0 mol%至約2 mol%之間的Li2 O、約6 mol%至約15 mol%之間的Na2 O、約0 mol%至約2 mol%之間的K2 O、約0 mol%至約2 mol%之間的ZnO、約2 mol%至約10 mol%之間的MgO、約0 mol%至約2 mol%之間的CaO、約0 mol%至約2 mol%之間的SrO、約0 mol%至約2 mol%之間的BaO、及約0 mol%至約2 mol%之間的SnO2 。在某些實施例中，玻璃系基板可包含約60 mol %至約80 mol%之間的SiO2 、約0 mol%至約15 mol%之間的Al2 O3 、約0 mol%至約15 mol%之間的B2 O3 、及約2 mol%至約50 mol%之Rx O，其中R是Li、Na、K、Rb、Cs之任一者或多者且x為2、或R是Zn、Mg、Ca、Sr或Ba之任一者或多者且x為1，及其中Fe + 30Cr + 35Ni ＜約60 ppm。In additional embodiments, the glass-based substrate 110 may include SiO 2 between about 72 mol% and about 80 mol%, Al 2 O 3 between about 3 mol% and about 7 mol%, and about 0 mol% to about B 2 O 3 between 2 mol%, Li 2 O between about 0 mol% and about 2 mol%, Na 2 O between about 6 mol% and about 15 mol%, about 0 mol% to about 2 K 2 O between mol%, ZnO between about 0 mol% and about 2 mol%, MgO between about 2 mol% and about 10 mol%, CaO between about 0 mol% and about 2 mol% , from about 0 mol% to about 2 mol SrO between percent, between about 0 mol BaO percent to about 2 mol, and between about 0 mol SnO% percent to about 2 mol 2. In some embodiments, the glass-based substrate may include SiO 2 between about 60 mol% and about 80 mol%, Al 2 O 3 between about 0 mol% and about 15 mol%, and about 0 mol% to about B 2 O 3 between 15 mol% and R x O from about 2 mol% to about 50 mol%, where R is any one or more of Li, Na, K, Rb, Cs and x is 2, Or R is any one or more of Zn, Mg, Ca, Sr, or Ba and x is 1, and Fe + 30Cr + 35Ni is less than about 60 ppm.

玻璃系基板110在某些實施例中可被化學強化，例如，藉由離子交換而強化。在離子交換處理期間，玻璃片內在玻璃片的表面處或接近玻璃片的表面之離子可被交換成例如來自鹽浴之更大的金屬離子。併入較大離子進入玻璃可藉由在近表面區域產生壓縮應力強化片材。對應的抗拉應力會被誘發在玻璃片的中央區域以平衡壓縮應力。The glass-based substrate 110 may be chemically strengthened in some embodiments, for example, by ion exchange. During the ion exchange process, ions within the glass sheet at or near the surface of the glass sheet can be exchanged for larger metal ions from a salt bath, for example. The incorporation of larger ions into the glass can strengthen the sheet by generating compressive stress in the near surface area. Corresponding tensile stress is induced in the central region of the glass sheet to balance the compressive stress.

可例如藉由將玻璃浸沒在熔融鹽浴持續預定時間期間而執行離子交換。範例鹽浴包括但不限於KNO3 、LiNO3 、NaNO3 、RbNO3 、及其組合。熔融鹽浴的溫度與處理時間期間可變動。發明領域的熟習技藝者能夠根據期望應用而決定時間與溫度。作為非限制性實例，熔融鹽浴的溫度可為範圍從約400ºC至約800o C，諸如從約400o C至約500o C，且預定時間期間可為範圍從約4小時至約24小時，諸如從約4小時至約10小時，但能構想到其他溫度與時間結合。作為非限制性實例，玻璃可浸沒在KNO3 浴中，例如在約450o C持續約6小時以獲得富含K層，其給予表面壓縮應力。Ion exchange can be performed, for example, by immersing the glass in a molten salt bath for a predetermined time. Example salt baths include, but are not limited to, KNO 3 , LiNO 3 , NaNO 3 , RbNO 3 , and combinations thereof. The temperature and processing time of the molten salt bath can vary. Skilled artisans in the field of the invention are able to determine time and temperature depending on the desired application. By way of non-limiting example, the temperature of the molten salt bath may range from about 400ºC to about 800 o C, such as from about 400 o C to about 500 o C, and during a predetermined time to be in the range of from about 4 hours to about 24 hours , Such as from about 4 hours to about 10 hours, but other temperature and time combinations are conceivable. By way of non-limiting example, the glass can be immersed in a bath of KNO 3, for example at about 450 o C for about 6 hours to obtain K-rich layer, which gives the surface compressive stress.

本發明的實施例提供處理玻璃系基板的方法，例如，設置用於顯示裝置中的玻璃基板，及在某些實施例中，設置用於作為光導板的玻璃基板。Embodiments of the present invention provide a method for processing a glass-based substrate, for example, providing a glass substrate for use in a display device, and in some embodiments, providing a glass substrate for use as a light guide plate.

在一或多個實施例中，相較於未按照本發明提供的方法而處理的對照玻璃基板，諸如玻璃基板之經處理玻璃系基板展現降低的風化效應。藉由以下至少一者來確定降低的風化效應：當玻璃在60o C與在90%相對溼度下熟成並與未處理基板相較時，觀察相較於未處理基板之在經處理玻璃基板上的白斑形成之有效減少，及防止耀度增加或減少耀度增加的程度。In one or more embodiments, a treated glass-based substrate, such as a glass substrate, exhibits a reduced weathering effect compared to a control glass substrate that is not processed in accordance with the methods provided by the present invention. Determine the reduced weathering effect by at least one of the following: when the glass is matured at 60 o C and 90% relative humidity and compared to an untreated substrate, observe that it is on a treated glass substrate compared to the untreated substrate Effectively reduce the formation of white spots, and prevent the increase in brightness or reduce the degree of increase in brightness.

根據一或多個實施例，相對溫和的處理條件可用於防止或降低顯示裝置中耀度增加的程度。在某些實施例中，由於處理時間範圍可從約1分鐘至約1小時，而可達成高產量。在某些實施例中，可藉由在處理期間用於沖洗玻璃基板的沖洗水中放置合適化學品而實現處理。According to one or more embodiments, relatively mild processing conditions may be used to prevent or reduce the degree of increase in brightness in a display device. In some embodiments, high throughput can be achieved because the processing time can range from about 1 minute to about 1 hour. In some embodiments, processing may be accomplished by placing a suitable chemical in the rinse water used to rinse the glass substrate during processing.

在第一實施例中，提供處理玻璃基板的方法，方法包含處理玻璃基板，玻璃基板包含至少一主表面與一邊緣，邊緣界定在從約0.1 mm至約3 mm的範圍中的厚度，基板被設置用於作為液晶顯示器的光導板，以散布光遍及顯示器並展現正交於至少一主表面之在從400 nm至700 nm的波長範圍中大於90%的透射率，其中處理步驟包含處理玻璃基板以防止鈉離子遷移至玻璃基板的表面。In a first embodiment, a method for processing a glass substrate is provided. The method includes processing a glass substrate. The glass substrate includes at least a major surface and an edge. The edge defines a thickness in a range from about 0.1 mm to about 3 mm. A light guide plate for liquid crystal display is provided to spread light throughout the display and exhibit a transmittance greater than 90% in a wavelength range from 400 nm to 700 nm orthogonal to at least one major surface, wherein the processing step includes processing a glass substrate This prevents sodium ions from migrating to the surface of the glass substrate.

在第二實施例中，玻璃系基板包含玻璃或玻璃陶瓷或顯示器玻璃。在第三實施例中，第二實施例的玻璃系基板選自由鋁矽酸鹽玻璃、硼矽酸鹽玻璃、與鈉鈣玻璃所構成的群組。In the second embodiment, the glass-based substrate includes glass or glass ceramic or display glass. In the third embodiment, the glass-based substrate of the second embodiment is selected from the group consisting of aluminosilicate glass, borosilicate glass, and soda lime glass.

在第四實施例中，處理在第一至第三實施例之任一者的玻璃系基板包含以下一者：(a)耗乏玻璃系基板中單價金屬離子及(b)吸引相對離子二價陽離子。在第五實施例中，第四實施例的方法包含耗乏玻璃系基板中單價金屬離子。在第六實施例中，第五實施例的單價金屬離子包含Na。In the fourth embodiment, the glass-based substrate processed in any one of the first to third embodiments includes one of: (a) depleting monovalent metal ions in the glass-based substrate and (b) attracting relative ion divalents cation. In a fifth embodiment, the method of the fourth embodiment includes depleting monovalent metal ions in the glass-based substrate. In the sixth embodiment, the monovalent metal ion of the fifth embodiment contains Na.

在第七實施例中，第四至第六實施例的任一者之方法包含耗乏具有厚度為1 nm至10 nm範圍之Na的玻璃系基板的一層。In the seventh embodiment, the method of any one of the fourth to sixth embodiments includes depleting a layer of a glass-based substrate having Na having a thickness in the range of 1 nm to 10 nm.

在第八實施例中，第一至第七實施例之任一者的方法執行在溫度為範圍從約20°C至約90°C、或從約20°C至約80°C、或從約20°C至約70°C、或從約20°C至約60°C、或從約20°C至約50°C、或從約20°C至約50°C。在第九實施例中，第一至第八實施例之任一者的方法中，此處理執行在時間期間為範圍為從約1分鐘至約120分鐘、約1分鐘至約90分鐘、約1分鐘至約60分鐘、約1分鐘至約45分鐘、約1分鐘至約30分鐘、約1分鐘至約20分鐘、約1分鐘至約15分鐘、約1分鐘至約10分鐘、或約1分鐘至約5分鐘。In an eighth embodiment, the method of any one of the first to seventh embodiments is performed at a temperature ranging from about 20 ° C to about 90 ° C, or from about 20 ° C to about 80 ° C, or from About 20 ° C to about 70 ° C, or from about 20 ° C to about 60 ° C, or from about 20 ° C to about 50 ° C, or from about 20 ° C to about 50 ° C. In the ninth embodiment, the method of any one of the first to eighth embodiments, this process is performed over a time period ranging from about 1 minute to about 120 minutes, about 1 minute to about 90 minutes, about 1 Minutes to about 60 minutes, about 1 minute to about 45 minutes, about 1 minute to about 30 minutes, about 1 minute to about 20 minutes, about 1 minute to about 15 minutes, about 1 minute to about 10 minutes, or about 1 minute To about 5 minutes.

在第十實施例中，第一至第九實施例之任一者中，處理玻璃系基板包含使玻璃系基板接觸蝕刻劑及使玻璃系基板經受浸析反應，其中氧化矽富集玻璃基板的一表面，而金屬離子由基板的表面耗乏。在第十一實施例中，第十實施例的蝕刻劑含有至少一種氟化物。在第十二實施例中，第十一實施例的氟化物選自由氫氟酸、氟化銨、二氟化銨、氟化鈉、及氟化鉀所構成的群組。In the tenth embodiment, in any one of the first to ninth embodiments, processing the glass-based substrate includes contacting the glass-based substrate with an etchant and subjecting the glass-based substrate to an leaching reaction, wherein silicon oxide enriches the glass substrate. One surface, while metal ions are depleted from the surface of the substrate. In the eleventh embodiment, the etchant of the tenth embodiment contains at least one fluoride. In the twelfth embodiment, the fluoride of the eleventh embodiment is selected from the group consisting of hydrofluoric acid, ammonium fluoride, ammonium difluoride, sodium fluoride, and potassium fluoride.

在第十三實施例中，第十實施例之使玻璃系基板經受浸析反應包含使玻璃系基板接觸一酸，此酸選自由無機酸與有機酸所構成的群組。在第十四實施例中，第十三實施例的無機酸選自由HCl、HNO3 、H2 SO4 、及H3 PO4 所構成的群組。In the thirteenth embodiment, subjecting the glass-based substrate to the leaching reaction in the tenth embodiment includes contacting the glass-based substrate with an acid selected from the group consisting of an inorganic acid and an organic acid. In the fourteenth embodiment, the inorganic acid of the thirteenth embodiment is selected from the group consisting of HCl, HNO 3 , H 2 SO 4 , and H 3 PO 4 .

在第十五實施例中，第十三實施例的有機酸選自由乙酸及乙二酸所構成的群組。在第十六實施例中，第十三至第十五實施例之任一者的蝕刻劑在酸：水比率為約1：200至約1：20，例如，比率為約1：150、約1：20、約1：80、約1：60、約1：50、或約1：40。在某些實施例中，蝕刻劑僅含有無機酸。In the fifteenth embodiment, the organic acid of the thirteenth embodiment is selected from the group consisting of acetic acid and oxalic acid. In the sixteenth embodiment, the etchant of any one of the thirteenth to fifteenth embodiments has an acid: water ratio of about 1: 200 to about 1:20, for example, a ratio of about 1: 150, about 1:20, about 1:80, about 1:60, about 1:50, or about 1:40. In some embodiments, the etchant contains only an inorganic acid.

在第十七實施例中，第十三至第十六實施例之任一者中，方法進一步包含在接觸步驟之後退火玻璃系基板，其中退火執行在溫度在範圍為約250°C至約700°C、約250 °C至約600°C、約250°C至約500°C、或約250°C至約400°C，持續時間期間在範圍為從約20分鐘至約3小時、從約20分鐘至約2小時、從約20分鐘至約1小時、從約20分鐘至約45分鐘、或從約20分鐘至約30分鐘。In a seventeenth embodiment, in any one of the thirteenth to sixteenth embodiments, the method further includes annealing the glass-based substrate after the contacting step, wherein the annealing is performed at a temperature in a range of about 250 ° C to about 700 ° C, about 250 ° C to about 600 ° C, about 250 ° C to about 500 ° C, or about 250 ° C to about 400 ° C, with durations ranging from about 20 minutes to about 3 hours, from About 20 minutes to about 2 hours, from about 20 minutes to about 1 hour, from about 20 minutes to about 45 minutes, or from about 20 minutes to about 30 minutes.

在第十八實施例中，根據第一至第四實施例之任一者處理玻璃系基板包含使玻璃系基板接觸二價陽離子溶液。在第十九實施例中，第十八實施例的二價陽離子溶液包含一化合物，其選自由ZnCl2 、AlCl3 、CaCl2 、MgCl2 、ZnCl2 、AlBr3 、CaBr2 、MgBr2 、ZnF2 、AlF3 、CaF2 、及MgF2 所構成之群組。在第二十實施例中，第十八或第十九實施例的溶液包含沖洗溶液，其進一步包含水。在第二十一實施例中，根據第一至第二十實施例之任一者的表面處理降低或防止玻璃系基板上白斑的形成。In the eighteenth embodiment, processing the glass-based substrate according to any one of the first to fourth embodiments includes contacting the glass-based substrate with a divalent cation solution. In the nineteenth embodiment, the divalent cation solution of the eighteenth embodiment includes a compound selected from the group consisting of ZnCl 2 , AlCl 3 , CaCl 2 , MgCl 2 , ZnCl 2 , AlBr 3 , CaBr 2 , MgBr 2 , ZnF 2. A group consisting of AlF 3 , CaF 2 , and MgF 2 . In the twentieth embodiment, the solution of the eighteenth or nineteenth embodiment comprises a rinsing solution, which further comprises water. In the twenty-first embodiment, the surface treatment according to any one of the first to twentieth embodiments reduces or prevents the formation of white spots on the glass-based substrate.

根據一或多個實施例，藉由浸析與退火改質玻璃系基板可圖解顯示在圖2中。如圖2所示，顯示了藉由浸析與退火含鈉玻璃基板的玻璃系基板之改質。在某些實施例中，由於只有表面層(藉由交叉影線部分顯示)被改質，浸析處理時間如上所述為相對短時間，且溫度是相對溫和(例如，在上述提供的範圍中約室溫)。在處理之後，玻璃表面層包含沒有或非常少鈉離子，及形成碳酸鈉及/或碳酸鎂副產物的能力被大幅縮減。According to one or more embodiments, a glass-based substrate modified by leaching and annealing may be shown diagrammatically in FIG. 2. As shown in FIG. 2, the modification of a glass-based substrate by leaching and annealing a sodium-containing glass substrate is shown. In some embodiments, since only the surface layer (shown by the cross-hatched portion) is modified, the leaching treatment time is relatively short as described above, and the temperature is relatively mild (e.g., in the ranges provided above) About room temperature). After processing, the glass surface layer contains no or very little sodium ions, and the ability to form sodium carbonate and / or magnesium carbonate by-products is greatly reduced.

如圖3所示，在範例實施例中，可藉由暴露於相對二價陽離子改質含鈉玻璃基板。在某些實施例中，由於只有表面層被改質，處理時間如上所述為相對短時間，且溫度是相對溫和(例如，在上述提供的範圍中約室溫)。在處理之後，玻璃表面層包含沒有或非常少鈉離子，及形成碳酸鈉及/或碳酸鎂副產物(其造成表面腐蝕)的能力被大幅縮減。As shown in FIG. 3, in an exemplary embodiment, a sodium-containing glass substrate may be modified by exposure to a relatively divalent cation. In some embodiments, since only the surface layer is modified, the processing time is relatively short as described above, and the temperature is relatively mild (e.g., about room temperature in the range provided above). After treatment, the glass surface layer contains no or very little sodium ions, and the ability to form sodium carbonate and / or magnesium carbonate by-products, which cause surface corrosion, is greatly reduced.

根據一或多個實施例，藉由利用可被可選地與隨後加熱步驟使用之表面化學處理，提供降低玻璃系基板中白斑形成與造成耀度改變的方法。然而本發明不應受限於特定理論，某些玻璃基板在玻璃表面含有許多單價物種，諸如Na。在表面層內的鈉離子(Na+ )可與空氣中的碳酸反應以形成小的白色析出物(尺寸小於1微米)，其在風化處理期間可成核或成長。已經發現在潮溼腔室(例如，在60°C與90%相對溼度)中加速成核與成長，且這些析出物已被偵測為碳酸鈉及或/氫氧化鈉(如圖7所示)，並造成之後實例1與2所示的耀度增加。According to one or more embodiments, a method for reducing white spot formation and causing a change in brilliance in a glass-based substrate is provided by utilizing a surface chemical treatment that can be optionally used with a subsequent heating step. However, the present invention should not be limited to a particular theory. Some glass substrates contain many monovalent species on the glass surface, such as Na. The sodium ions (Na + ) in the surface layer can react with carbonic acid in the air to form small white precipitates (less than 1 micron in size) that can nucleate or grow during the weathering process. Accelerated nucleation and growth have been found in humid chambers (e.g., 60 ° C and 90% relative humidity), and these precipitates have been detected as sodium carbonate and / or sodium hydroxide (as shown in Figure 7) And cause an increase in the brightness shown in Examples 1 and 2 later.

在某些實施例中，使用酸的浸析處理可耗乏這些析出物的形成，藉由選擇性移除諸如鈉的金屬離子與防止成核行為，驅使少量留存的金屬離子呈成核行為，其顯示為對耀度或霧度具有較小影響。在某些實施例中，酸處理或浸析之後可退火，以助於抑制在玻璃中鈉的任何滲透，防止從較深處遷移至表面。In some embodiments, the formation of these precipitates can be depleted by leaching with an acid. By selectively removing metal ions such as sodium and preventing nucleation behavior, a small amount of remaining metal ions is driven to nucleation behavior. It appears to have a smaller effect on brilliance or haze. In some embodiments, annealing may be performed after acid treatment or leaching to help inhibit any penetration of sodium in the glass and prevent migration from deeper to the surface.

在其他實施例中，以多價物種(例如，Zn)之處理提供不同相對離子，使空氣中的碳酸與任何存在的鈉表面物種反應。此多價物種相較於鈉對耀度行為具有較小影響。因為只有表面層需要改質，處理時間是相對短且使用的溫度是相對溫和的。根據某些實施例，在處理之後，玻璃表面層包含沒有或非常少鈉離子，與以熟成之耀度改變被大幅降低。In other embodiments, treatment with a multivalent species (e.g., Zn) provides different relative ions to react carbonic acid in the air with any sodium surface species present. This multivalent species has a smaller effect on brilliance behavior than sodium. Because only the surface layer needs to be modified, the processing time is relatively short and the temperature used is relatively mild. According to some embodiments, after the treatment, the glass surface layer contains no or very little sodium ions, and the glazing change with maturation is greatly reduced.

本發明的各種實施例藉由接下來的非限制性實例而進一步闡明。Various embodiments of the invention are further elucidated by the following non-limiting examples.

實例Examples

接下來的實例提供化學處理步驟的非限制性實例、測定粒子尺寸分布與耀度的相關試驗方法及相對應的結果。The following examples provide non-limiting examples of chemical treatment steps, related test methods for determining particle size distribution and brilliance, and corresponding results.

測定粒子尺寸分布之耀度與共焦方法。Measurement of particle size distribution brilliance and confocal method.

用於耀度量測的樣品試驗設置顯示在圖8中。使用電荷耦合裝置(CCD)成像光度計與色度計(相機) 而獲得影像，其型號PM1423F-1，可從Radiant Imaging，Redmond，WA (www.radiantimaging.com)取得。相機CCD陣列為1526 X 1024。藉由使用來自Sony 1080p電視背光單元的LED條帶而照明樣品。光被射入樣品的平坦邊緣，與最終耀度以尼特(nit)記錄。對於粒子尺寸分的光學量測，使用在暗視野模式的Zeiss Imager Z1m光學顯微鏡。以50X倍率拍攝400張圖像並使用ImageJ程式測定粒子尺寸與其他相關參數。A sample test setup for flares measurements is shown in FIG. 8. The image was obtained using a charge coupled device (CCD) imaging photometer and colorimeter (camera). Its model PM1423F-1 can be obtained from Radiant Imaging, Redmond, WA (www.radiantimaging.com). The camera CCD array is 1526 X 1024. The samples were illuminated by using LED strips from a Sony 1080p TV backlight unit. Light was incident on the flat edges of the sample, and the final brightness was recorded in nits. For optical measurement of particle size, a Zeiss Imager Z1m optical microscope in dark field mode was used. 400 images were taken at 50X magnification and the particle size and other related parameters were determined using the ImageJ program.

實例1Example 1

1.1 mm厚與4吋乘4吋的尺寸之IRISTM 玻璃樣品以下列步驟處理：The 1.1 mm thick and 4 "by 4" IRIS TM glass samples were processed as follows:

以Semiclean KG清潔劑(Yokohama Oil and Fats，日本)在Crest 超音波清洗機(http://www.crest-ultrasonics.com/)中清洗各基板以移除任何有機殘留物。各基板的清洗循環包括：下列：The substrates were cleaned with a Semiclean KG cleaner (Yokohama Oil and Fats, Japan) in a Crest ultrasonic cleaner (http://www.crest-ultrasonics.com/) to remove any organic residues. The cleaning cycle of each substrate includes the following:

以超音波之標準4% Semiclean清洗：
4% Semiclean溶液中15分鐘@ 160°F於洗盆#1中。
去離子水沖洗5分鐘@ 160°F於洗盆#3中。
去離子水中5分鐘超音波@ 160°F於洗盆#3中。
去離子水中5分鐘超音波@ 160°F於洗盆#1中。
去離子水中5分鐘超音波@ 160°F於洗盆#3中。
7.75分鐘緩慢拉引@ 80°F於洗盆#4中。Ultrasonic cleaning 4% Semiclean:
15% in 4% Semiclean solution @ 160 ° F in sink # 1.
Rinse in deionized water for 5 minutes @ 160 ° F in sink # 3.
5 minutes ultrasound @ 160 ° F in deionized water in wash basin # 3.
5 minutes ultrasound @ 160 ° F in deionized water in wash basin # 1.
5 minutes ultrasound @ 160 ° F in deionized water in wash basin # 3.
7.75 minutes slowly pull @ 80 ° F into sink # 4.

完整清洗循環的總時間為42.75分鐘，超音波頻率為40 MHz。The total time for a complete cleaning cycle is 42.75 minutes and the ultrasonic frequency is 40 MHz.

完成表面接著暴露於1：200 HCl持續時間範圍在1分鐘與50分鐘之間，經由浸泡於65°C，之後在N2 中乾燥1分鐘。完成表面可選地暴露於在700°C持續1小時的退火步驟。完成玻璃表面接著被保持原樣或被熟成不同時間(96小時、240小時、480小時、960小時)，於60°C 90 Rh，且樣品基板被定期移除以分析表面的風化行為。The finished surface was then exposed to 1: 200 HCl for a duration ranging between 1 minute and 50 minutes, by immersion in 65 ° C, and then dried in N 2 for 1 minute. The finished surface is optionally exposed to an annealing step at 700 ° C for 1 hour. The finished glass surface was then left as is or aged for different times (96 hours, 240 hours, 480 hours, 960 hours) at 60 ° C 90 Rh, and the sample substrate was periodically removed to analyze the weathering behavior of the surface.

如上所述量測耀度，較大熟成時間減去各基板在時間=0的耀度，以測定耀度增加。Measure the brilliance as described above. Subtract the brilliance of each substrate at time = 0 for larger maturation time to determine the increase in brilliance.

藉由使用如上所述的Zeiss Imager Z1m光學顯微鏡與在暗視野模式中掃描表面而光學測定白斑點數目以估算風化。斑點以400張連續圖像中的尺寸、面積%與其他屬性而計算。Weathering was estimated by optically measuring the number of white spots by using a Zeiss Imager Z1m optical microscope as described above and scanning the surface in dark field mode. Blobs are calculated based on the size, area%, and other attributes in 400 consecutive images.

藉由檢查表面的耀度行為與將其和在相同方式處理的未熟成玻璃基板(對照組)比較，而替代地估算風化。結果顯示處理可有效地降低存在於表面的鈉數量。因為原始對照組基板表面被含有鈉加合物的白斑點所充滿(如圖7所示)，確定若沒有鈉時會減少這些斑點。圖4顯示耀度之最終變化。此外，觀察因熟成發生在對於樣品上HCl處理與未處理的玻璃表面之粒子尺寸分布。圖4顯示相較於未處理(對照組)基板，對於HCl處理表面實際上沒有觀察到耀度變化。Weathering was estimated instead by examining the surface's brilliance behavior and comparing it to a green glass substrate (control group) treated in the same manner. The results show that treatment can effectively reduce the amount of sodium present on the surface. Because the surface of the original control substrate was filled with white spots containing sodium adduct (as shown in Figure 7), it was determined that these spots would be reduced without sodium. Figure 4 shows the final change in brightness. In addition, observe the particle size distribution of HCl-treated and untreated glass surfaces due to aging on the sample. Figure 4 shows that no change in brightness was actually observed for the HCl treated surface compared to the untreated (control) substrate.

顯示按照實例1處理的樣品之動態二次離子質譜法(SIMS)資料顯示由於浸析與退火而發生的鈉離子耗乏。結果顯示在圖6中。Dynamic secondary ion mass spectrometry (SIMS) data showing a sample processed according to Example 1 showed sodium ion depletion due to leaching and annealing. The results are shown in FIG. 6.

如上所述量測樣品的經處理與未處理表面的粒子尺寸分布。對於對照組基板，大部分的粒子尺寸為0至1微米且獨立於熟成時間。對於按照實例1處理的樣品，粒子尺寸成長是熟成時間的函數。尤其，對於熟成960小時的樣品，粒子在從1微米至7微米的範圍中。The particle size distribution of the treated and untreated surfaces of the sample was measured as described above. For the control substrate, most of the particle sizes are 0 to 1 micron and are independent of the maturation time. For samples treated according to Example 1, particle size growth is a function of maturation time. In particular, for samples aged for 960 hours, the particles are in the range from 1 to 7 microns.

使用飛行時間(TOF)SIMS掃描熟成96小時的未處理之對照組基板，粒子中的物種顯示在圖7中。偵測到碳酸鈉及/或氫氧化鈉的析出物。An untreated control substrate that was matured for 96 hours was scanned using a time of flight (TOF) SIMS, and the species in the particles are shown in FIG. 7. A precipitate of sodium carbonate and / or sodium hydroxide was detected.

實例2Example 2

1.1 mm厚與4吋乘4吋尺寸的IRISTM 玻璃之玻璃樣品的玻璃系基板在Crest超音波清洗器中以Semiclean KG清潔劑清洗，以移除任何有機殘留物。清洗循環與實例1中所述相同。樣品基板的完成表面在室溫下以ZnCl2 的水溶液(pH = 4.8)處理3分鐘。顯示出表面上Zn的吸附發生在小於界達電位研究之時間框架，其中此吸附造成改變玻璃表面電荷(見圖9)。The glass substrate of the 1.1 mm thick and 4 inch by 4 inch IRIS ™ glass glass sample was cleaned in a Crest ultrasonic cleaner with Semiclean KG cleaner to remove any organic residues. The cleaning cycle is the same as described in Example 1. The finished surface of the sample substrate was treated with an aqueous solution of ZnCl 2 (pH = 4.8) at room temperature for 3 minutes. It is shown that the adsorption of Zn on the surface occurs at a time frame that is smaller than the boundary potential study, where this adsorption causes a change in the surface charge of the glass (see Figure 9).

如實例1，基板接著以N2 乾燥並保持原樣或在60°C中於90%相對溼度下以各種時間熟成。As in Example 1, the substrate was then dried under N 2 and left as is or matured at 60 ° C. and 90% relative humidity for various times.

如上所述量測耀度，自各基板在時間=0的耀度減去較大熟成時間，以測定耀度增加。圖5顯示耀度的改變。顯示出相較於未處理表面，ZnCl2 處理的表面具有降低的耀度改變行為。The brilliance was measured as described above, and the larger maturation time was subtracted from the brilliance of each substrate at time = 0 to determine the increase in brilliance. Figure 5 shows the change in brightness. It is shown that the ZnCl 2 treated surface has a reduced change in brightness compared to the untreated surface.

如上方關於實例1所述，量測未處理與經處理表面的粒子尺寸分布。As described above with respect to Example 1, the particle size distribution of the untreated and treated surfaces was measured.

對於按照實例2處理的樣品，粒子尺寸成長為熟成時間的函數。尤其，對於熟成480與960小時的樣品，粒子在從1微米至100微米的範圍中。For the samples treated according to Example 2, the particle size grew as a function of the maturation time. In particular, for samples aged for 480 and 960 hours, the particles are in the range from 1 micron to 100 microns.

在按照實例2沖洗並熟成480小時的樣品上執行TOF SIMS。TOF SIMS顯示Na、Mg、及Zn的存在。然而，沒有偵測到碳酸鈉物種。TOF SIMS was performed on the samples rinsed and aged for 480 hours according to Example 2. TOF SIMS shows the presence of Na, Mg, and Zn. However, no sodium carbonate species were detected.

可對本文所述的材料、方法、及物件進行各種修改與變化。在考量到說明書與本文揭示的材料、方法、及物件的實例，本文所述的材料、方法、及物件的其他態樣是顯而易見的。說明書與實例意為被當作範例。在不背離本發明的精神與範疇，各種修改與變化對於發明領域的熟習此項技術者是顯而易見的。Various modifications and changes can be made to the materials, methods, and articles described herein. Other aspects of the materials, methods, and objects described herein are apparent when considering the specification and examples of the materials, methods, and objects disclosed herein. The descriptions and examples are meant as examples. Various modifications and changes will be apparent to those skilled in the art in the field of the invention without departing from the spirit and scope of the invention.

100‧‧‧光導板(LGP)組件100‧‧‧light guide plate (LGP) components

110‧‧‧玻璃系基板 110‧‧‧ glass substrate

130‧‧‧微結構 130‧‧‧microstructure

140‧‧‧光源 140‧‧‧light source

150‧‧‧邊緣表面 150‧‧‧Edge surface

160‧‧‧光發射表面 160‧‧‧light emitting surface

170‧‧‧第二主表面 170‧‧‧Second major surface

當與隨附圖式一同閱讀時，可進一步理解接下來的實施方式。The following embodiments can be further understood when read with the accompanying drawings.

圖1繪示根據本發明的某些實施例之光導組件；Figure 1 illustrates a light guide assembly according to some embodiments of the invention;

圖2圖解地顯示根據一或多個實施例藉由浸析與退火改質玻璃基板表面；FIG. 2 schematically illustrates the modification of the surface of a glass substrate by leaching and annealing according to one or more embodiments;

圖3圖解地顯示藉由暴露於二價陽離子改質玻璃基板表面；Figure 3 shows diagrammatically the surface of a glass substrate modified by exposure to a divalent cation;

圖4顯示對於按照實例1處理的樣品之耀度的改變為熟成時間(aging time)的函數；Figure 4 shows the change in the brilliance of the samples treated according to Example 1 as a function of aging time;

圖5顯示對於按照實例2處理的樣品之耀度的改變為熟成時間的函數；Figure 5 shows the change in the brilliance of the sample treated according to Example 2 as a function of the maturation time;

圖6顯示對於按照實例1處理的樣品之動態二次離子質譜法(SIMS)資料；Figure 6 shows dynamic secondary ion mass spectrometry (SIMS) data for a sample processed according to Example 1;

圖7顯示對於熟成96小時之未處理對照基板的飛行時間(TOF)SIMS資料；FIG. 7 shows time-of-flight (TOF) SIMS data for an untreated control substrate that matures for 96 hours;

圖8為繪示如何在樣品上量測耀度的示意圖；及FIG. 8 is a schematic diagram showing how to measure flares on a sample; and

圖9為顯示對於按照實例2處理之樣品的界達電位(Zeta potential)相對pH的圖表。FIG. 9 is a graph showing Zeta potential vs. pH for samples treated according to Example 2. FIG.

國內寄存資訊 (請依寄存機構、日期、號碼順序註記)
無Domestic storage information (please note in order of storage organization, date, and number)
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一種處理一玻璃基板的方法，該方法包含： 處理一玻璃基板，該玻璃基板包含至少一主表面與一邊緣，該邊緣界定在從約0.1 mm至約3 mm的一範圍中的一厚度，該基板被設置用於作為一液晶顯示器的一光導板，以散布光遍及該顯示器並展現正交於該至少一主表面之在從400 nm至700 nm的一波長範圍中大於90%的一透射率，其中該處理步驟包含處理該玻璃基板以防止鈉離子遷移至該玻璃基板的一表面。A method for processing a glass substrate, the method includes: A glass substrate is processed, the glass substrate including at least a main surface and an edge, the edge defining a thickness in a range from about 0.1 mm to about 3 mm, the substrate being configured to serve as a light guide for a liquid crystal display Plate to diffuse light throughout the display and exhibit a transmittance greater than 90% in a wavelength range from 400 nm to 700 nm orthogonal to the at least one major surface, wherein the processing step includes processing the glass substrate to prevent Sodium ions migrate to a surface of the glass substrate. 如請求項1所述之方法，其中該玻璃基板是顯示器玻璃。The method according to claim 1, wherein the glass substrate is a display glass. 如請求項2所述之方法，其中該玻璃基板選自由鋁矽酸鹽玻璃、硼矽酸鹽玻璃、與鈉鈣玻璃組成的群組。The method according to claim 2, wherein the glass substrate is selected from the group consisting of aluminosilicate glass, borosilicate glass, and soda lime glass. 如請求項2所述之方法，其中處理該玻璃基板包含以下至少一者：(a) 耗乏該玻璃基板中的多個單價金屬離子及(b)吸引一相對離子(counter ion)二價陽離子。The method of claim 2, wherein processing the glass substrate comprises at least one of: (a) depleting a plurality of monovalent metal ions in the glass substrate and (b) attracting a counter ion divalent cation . 如請求項4所述之方法，其中多個單價金屬離子包含Na。The method of claim 4, wherein the plurality of monovalent metal ions include Na. 如請求項4所述之方法，其中耗乏多個單價金屬離子包含耗乏該玻璃基板的一層，該層具有在從1 nm 至10 nm的範圍中之一厚度的Na。The method of claim 4, wherein depleting the plurality of monovalent metal ions includes depleting a layer of the glass substrate, the layer having a thickness of Na in a range from 1 nm to 10 nm. 如請求項4所述之方法，其中該方法在從約20°C至約90°C的一範圍中的一溫度實行。The method of claim 4, wherein the method is performed at a temperature in a range from about 20 ° C to about 90 ° C. 如請求項7所述之方法，其中實行處理持續在約1分鐘至約60分鐘的一範圍中的一時間期間。The method according to claim 7, wherein the performing the treatment is performed for a time period in a range of about 1 minute to about 60 minutes. 如請求項4所述之方法，其中處理該玻璃基板包含使該玻璃基板接觸一蝕刻劑並使該玻璃基板經受一浸析(leaching)反應，其中氧化矽富集該玻璃基板的一表面，而該等金屬離子由該基板的該表面耗乏。The method of claim 4, wherein processing the glass substrate comprises contacting the glass substrate with an etchant and subjecting the glass substrate to a leaching reaction, wherein silicon oxide enriches a surface of the glass substrate, and The metal ions are depleted from the surface of the substrate. 如請求項9所述之方法，其中該蝕刻劑含有至少一氟化物。The method of claim 9, wherein the etchant contains at least one fluoride. 如請求項10所述之方法，其中該氟化物選自由氫氟酸、氟化銨、二氟化銨、氟化鈉、及氟化鉀所構成的群組。The method according to claim 10, wherein the fluoride is selected from the group consisting of hydrofluoric acid, ammonium fluoride, ammonium difluoride, sodium fluoride, and potassium fluoride. 如請求項9所述之方法，其中使該玻璃基板經受一浸析反應包含使該玻璃系基板接觸選自由一無機酸與一有機酸所構成的群組的一酸。The method according to claim 9, wherein subjecting the glass substrate to an leaching reaction comprises contacting the glass-based substrate with an acid selected from the group consisting of an inorganic acid and an organic acid. 如請求項12所述之方法，其中該無機酸選自由HCl、HNO3 、H2 SO4 、及H3 PO4 所構成的群組。The method of item 12 wherein the request, wherein the inorganic acid selected from the group consisting of HCl, HNO 3, H 2 SO 4, H 3 PO 4 and groups constituted. 如請求項12所述之方法，其中該有機酸選自由乙酸及乙二酸所構成的群組。The method according to claim 12, wherein the organic acid is selected from the group consisting of acetic acid and oxalic acid. 如請求項13所述之方法，其中該蝕刻劑含有在水中之僅一無機酸，該無機酸在從約1：200至約1：20之一範圍中的酸：水之濃度比率。The method according to claim 13, wherein the etchant contains only an inorganic acid in water, and the inorganic acid has an acid: water concentration ratio in a range from about 1: 200 to about 1:20. 如請求項9所述之方法，進一步包含在該接觸步驟之後退火該玻璃基板，其中在從50°C至700°C的一範圍中的一溫度並持續從20分鐘至3小時的一範圍中的一時間期間而實行退火。The method of claim 9, further comprising annealing the glass substrate after the contacting step, wherein the glass substrate is at a temperature in a range from 50 ° C to 700 ° C and in a range from 20 minutes to 3 hours. The annealing is performed during a period of time. 如請求項4所述之方法，其中處理該玻璃基板包含使該玻璃基板接觸一二價陽離子溶液。The method of claim 4, wherein processing the glass substrate comprises contacting the glass substrate with a divalent cation solution. 如請求項17所述之方法，其中該二價陽離子溶液包含選自由ZnCl2 、AlCl3 、CaCl2 、MgCl2 、ZnCl2 、AlBr3 、CaBr2 、MgBr2 、ZnF2 、AlF3 、CaF2 、及MgF2 所構成之群組的一化合物。The method according to claim 17, wherein the divalent cation solution comprises a material selected from the group consisting of ZnCl 2 , AlCl 3 , CaCl 2 , MgCl 2 , ZnCl 2 , AlBr 3 , CaBr 2 , MgBr 2 , ZnF 2 , AlF 3 , CaF 2 , And a compound of the group consisting of MgF 2 . 如請求項18所述之方法，其中該溶液包含一沖洗溶液，該沖洗溶液進一步包含水。The method of claim 18, wherein the solution comprises a rinsing solution, and the rinsing solution further comprises water. 如請求項2所述之方法，其中處理該基板降低或避免該玻璃基板上形成多個白斑。The method according to claim 2, wherein processing the substrate reduces or avoids forming a plurality of white spots on the glass substrate. 一種處理一玻璃基板的方法，該方法包含： 處理一玻璃基板，該玻璃基板包含至少一主表面與一邊緣，該邊緣界定在從約0.1 mm至約3 mm的一範圍中的一厚度，該基板被設置用於作為一液晶顯示器的一光導板，以散布光遍及該顯示器並展現正交於該至少一主表面之在從400 nm至700 nm的一波長範圍中大於90%的一透射率，其中該處理步驟包含使該玻璃基板接觸一蝕刻劑，該蝕刻劑選自由氫氟酸、氟化銨、二氟化銨、氟化鈉、氟化鉀、乙酸、乙二酸、HCl、HNO3 、H2 SO4 、及H3 PO4 所構成的群組，及使該玻璃基板經受一浸析反應，其中氧化矽富集該玻璃基板的一表面，而該等金屬離子由該基板的該表面耗乏。A method of processing a glass substrate, the method comprising: processing a glass substrate, the glass substrate including at least a major surface and an edge, the edge defining a thickness in a range from about 0.1 mm to about 3 mm, the The substrate is configured to serve as a light guide plate for a liquid crystal display to diffuse light throughout the display and exhibit a transmittance greater than 90% in a wavelength range from 400 nm to 700 nm orthogonal to the at least one major surface. Wherein, the processing step includes contacting the glass substrate with an etchant selected from the group consisting of hydrofluoric acid, ammonium fluoride, ammonium difluoride, sodium fluoride, potassium fluoride, acetic acid, oxalic acid, HCl, HNO 3 , H 2 SO 4 , and H 3 PO 4 groups, and subjecting the glass substrate to an leaching reaction, wherein silicon oxide enriches a surface of the glass substrate, and the metal ions are transferred from the substrate by The surface is depleted. 一種處理一玻璃基板的方法，該方法包含： 處理一玻璃基板，該玻璃基板包含至少一主表面與一邊緣，該邊緣界定在從約0.1 mm至約3 mm的一範圍中的一厚度，該基板被設置用於作為一液晶顯示器的一光導板，以散布光遍及該顯示器並展現正交於該至少一主表面之在從400 nm至700 nm的一波長範圍中大於90%的一透射率，其中該處理步驟包含處理該玻璃基板，處理該玻璃基板包含使該玻璃基板接觸一溶液，該溶液含有選自由ZnCl2 、AlCl3 、CaCl2 、MgCl2 、ZnCl2 、AlBr3 、CaBr2 、MgBr2 、ZnF2 、AlF3 、CaF2 、及MgF2 所構成的群組之一化合物。A method of processing a glass substrate, the method comprising: processing a glass substrate, the glass substrate including at least a major surface and an edge, the edge defining a thickness in a range from about 0.1 mm to about 3 mm, the The substrate is configured to serve as a light guide plate for a liquid crystal display to diffuse light throughout the display and exhibit a transmittance greater than 90% in a wavelength range from 400 nm to 700 nm orthogonal to the at least one major surface. Wherein, the processing step includes processing the glass substrate, and processing the glass substrate includes contacting the glass substrate with a solution selected from the group consisting of ZnCl 2 , AlCl 3 , CaCl 2 , MgCl 2 , ZnCl 2 , AlBr 3 , CaBr 2 , One of the compounds consisting of MgBr 2 , ZnF 2 , AlF 3 , CaF 2 , and MgF 2 . 一種處理一基板的方法，該方法包含： 提供一玻璃基板，該玻璃基板包含至少一主表面與一邊緣，該邊緣界定在從約0.1 mm至約3 mm的一範圍中的一厚度；及 藉由以下至少一者處理該玻璃基板：(a)耗乏該玻璃基板中的多個單價金屬離子及(b)吸引一相對離子二價陽離子。A method for processing a substrate, the method includes: Providing a glass substrate including at least a major surface and an edge, the edge defining a thickness in a range from about 0.1 mm to about 3 mm; and The glass substrate is processed by at least one of: (a) depleting a plurality of monovalent metal ions in the glass substrate and (b) attracting a counter ion divalent cation. 如請求項23所述之方法，其中該方法包含耗乏該玻璃基板中的多個單價金屬離子及吸引一相對離子二價陽離子。The method of claim 23, wherein the method comprises depleting a plurality of monovalent metal ions in the glass substrate and attracting a counter ion divalent cation. 如請求項23所述之方法，其中該基板被設置用於作為一液晶顯示器的一光導板，以散布光遍及該顯示器並展現正交於該至少一主表面之在從400 nm至700 nm的一波長範圍中大於90%的一透射率。The method according to claim 23, wherein the substrate is configured to serve as a light guide plate of a liquid crystal display to diffuse light throughout the display and exhibit a wavelength from 400 nm to 700 nm orthogonal to the at least one major surface. A transmittance greater than 90% in a wavelength range. 如請求項23所述之方法，其中多個單價金屬離子包含Na。The method according to claim 23, wherein the plurality of monovalent metal ions include Na. 如請求項23所述之方法，其中處理該玻璃基板包含藉由耗乏該玻璃基板的一層，該層具有在從1 nm 至10 nm的一範圍中之一厚度的Na，而耗乏該玻璃基板中的多個單價金屬離子。The method of claim 23, wherein processing the glass substrate comprises depleting the glass by depleting a layer of the glass substrate having a thickness of Na in a range from 1 nm to 10 nm. A plurality of monovalent metal ions in the substrate. 如請求項23所述之方法，其中處理該玻璃基板進一步包含使該玻璃基板接觸一蝕刻劑並使該玻璃基板經受一浸析反應，其中氧化矽富集該玻璃基板的一表面，而該等金屬離子由該基板的該表面耗乏。The method of claim 23, wherein processing the glass substrate further comprises contacting the glass substrate with an etchant and subjecting the glass substrate to an leaching reaction, wherein silicon oxide enriches a surface of the glass substrate, and such Metal ions are depleted from the surface of the substrate.
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