TW201922348A - Method for calculating illumination intensity of ultraviolet rays irradiated from an LED, and storage medium storing a program therefore - Google Patents
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Abstract
Description
本發明係關於一種算出將發光二極體(以下稱為LED)作為紫外線光源之光反應裝置內之任意受光位置之紫外線照度的方法及記憶用於其之程式之記憶媒體。The present invention relates to a method for calculating an ultraviolet illuminance at an arbitrary light receiving position in a light reaction device using a light emitting diode (hereinafter referred to as LED) as an ultraviolet light source, and a memory medium for storing a program for the same.
於藉由照射紫外線(以下稱為UV)進行殺菌或微生物分解等處理之液體處理裝置或者水處理設備等中，較理想為能夠預測用於處理之光反應器之性能。為了預測光反應器之性能，需要該反應器內之照度分佈、相對於照射量之被反應物(液體等)之反應速度、進而於該反應器為流通式時需要反應器內之流動模式之資訊。根據照度分佈及流動模式算出照射量，根據該照射量及反應速度式算出反應器出口之未反應物濃度。In a liquid treatment device or a water treatment device that performs treatment such as sterilization or microbial decomposition by irradiating ultraviolet rays (hereinafter referred to as UV), it is desirable to predict the performance of a photoreactor for treatment. In order to predict the performance of a photoreactor, the distribution of the illuminance in the reactor, the reaction speed of the reactant (liquid, etc.) relative to the irradiation amount, and the flow mode in the reactor are required when the reactor is a flow-through type. Information. The irradiation amount was calculated based on the illuminance distribution and the flow pattern, and the unreacted substance concentration at the outlet of the reactor was calculated based on the irradiation amount and the reaction rate formula.
關於照度分佈之測定，先前係使用物理性之UV照度計或利用溶液之光化學反應之化學光量計而進行。但是，於使用紫外線發光二極體(以下稱為UV-LED)作為UV光源之情形時，關於利用UV照度計測定照度，當前狀況下因UV輸出較小而必須縮短測定距離，因此，不適於測定光反應器內之立體之照度分佈。又，化學光量計係構成為，於培養皿上配置會與UV發生反應之溶液，根據對培養皿上照射UV時之溶液反應化學性地進行照度測定，因此，其亦無法簡便地測定光反應器內之立體之照度分佈。The measurement of the illuminance distribution was previously performed using a physical UV lux meter or a chemiluminometer using a photochemical reaction of a solution. However, in the case of using an ultraviolet light emitting diode (hereinafter referred to as UV-LED) as a UV light source, the measurement of the illuminance using a UV lux meter requires a shorter measurement distance due to the small UV output under the current situation, and is therefore not suitable. The stereo illuminance distribution in the photoreactor was measured. In addition, the chemiluminescence meter is configured such that a solution that reacts with UV is disposed on a petri dish, and the illuminance is chemically measured based on the reaction of the solution when the UV is irradiated on the petri dish. Therefore, it cannot easily measure the photoreaction Three-dimensional illumination distribution in the device.
另一方面，例如，如下述專利文獻1、2、3般，亦已知有基於利用電腦解析而測定照明用LED而非UV-LED之立體之照度分佈之技術。但是，該等係進行高度之光學模擬者，無法以簡便且低成本地測定光反應器內之立體之照度分佈之目的應用。 [先前技術文獻] [專利文獻]On the other hand, for example, as in the following Patent Documents 1, 2, and 3, a technique for measuring a three-dimensional illuminance distribution of a lighting LED rather than a UV-LED based on a computer analysis is also known. However, those who perform high-level optical simulation cannot use it for the purpose of measuring the three-dimensional illumination distribution in a photoreactor simply and at low cost. [Prior Art Literature] [Patent Literature]
[專利文獻1]日本專利特開平9-138862號公報 [專利文獻2]日本專利特開2001-155181號公報 [專利文獻3]日本專利特開2012-79537號公報[Patent Literature 1] Japanese Patent Laid-Open No. 9-138862 [Patent Literature 2] Japanese Patent Laid-Open No. 2001-155181 [Patent Literature 3] Japanese Patent Laid-Open No. 2012-79537
本發明係鑒於上述方面而完成者，欲提供一種能夠簡便地測定或推定利用UV-LED之光反應裝置內之立體之照度分佈的照度計算方法及記憶用於其之程式之記憶媒體。The present invention has been made in view of the above-mentioned aspects, and it is intended to provide an illuminance calculation method capable of simply measuring or estimating a three-dimensional illuminance distribution in a UV-LED light reaction device, and a memory medium for storing a program for the same.
本發明之照度計算方法係將LED作為紫外線光源之光反應裝置內之任意受光位置之照度計算方法，包括如下步驟：基於上述LED所固有之配光分佈，求出由該配光分佈所示之立體之比表面積；及基於上述比表面積、上述LED之總光通量及上述配光分佈，算出上述受光位置之照度。又，進而具備如下步驟：基於執行關於上述光反應裝置內之複數個受光位置算出上述照度之步驟，產生表示該光反應裝置中之紫外線照度特性之資訊。The illuminance calculation method of the present invention is an illuminance calculation method for an arbitrary light receiving position in a light reaction device using an LED as an ultraviolet light source, and includes the following steps: Based on the light distribution inherent to the LED, obtain the light distribution indicated by the light distribution Three-dimensional specific surface area; and based on the specific surface area, the total luminous flux of the LED, and the light distribution, calculate the illuminance at the light receiving position. Furthermore, the method further includes the step of generating information indicating the ultraviolet illuminance characteristics in the photoreaction device based on the step of calculating the illuminance with respect to a plurality of light receiving positions in the photoreaction device.
本發明之特徵在於：基於LED所固有之配光分佈，求出由該配光分佈所示之立體之比表面積，基於該比表面積、上述LED之總光通量及上述配光分佈，算出上述受光位置之照度。因此，無需複雜之光學模擬，且不使用UV照度計或化學光量計，故能夠以簡單之構成測定或推定光反應器內之任意受光位置之照度。而且，能夠藉由關於複數個受光位置算出上述照度，而簡便地測定或推定該光反應裝置中之UV-LED之照度分佈。The present invention is characterized in that the three-dimensional specific surface area indicated by the light distribution is obtained based on the light distribution inherent in the LED, and the light receiving position is calculated based on the specific surface area, the total luminous flux of the LED, and the light distribution. The illumination. Therefore, no complicated optical simulation is required, and no UV light meter or chemiluminometer is used, so it is possible to measure or estimate the illuminance at any light receiving position in the photoreactor with a simple structure. Furthermore, by calculating the above-mentioned illuminance with respect to a plurality of light-receiving positions, it is possible to easily measure or estimate the illuminance distribution of the UV-LED in the photoreaction device.
UV-LED之進步非常顯著，不斷研發出新製品。又，假想於因壽命原因而更換光源時，數年後、十數年後難以獲取到與裝置中所使用之當前之UV-LED相同規格者作為替換用。因此，適當地測定或推定光反應裝置中之UV-LED之照度分佈很有必要，故本發明之簡便且低成本之UV-LED之照度分佈測定技術極為有益。The progress of UV-LED is very significant, and new products are continuously developed. In addition, when it is assumed that the light source is replaced due to life span, it is difficult to obtain the same specifications as the current UV-LED used in the device for replacement after a few years or ten years. Therefore, it is necessary to appropriately measure or estimate the illuminance distribution of the UV-LED in the photoreaction device. Therefore, the simple and low-cost illuminance distribution measurement technique of the UV-LED of the present invention is extremely beneficial.
圖1係表示應用本發明之一實施例之照度計算方法之光反應裝置之一例的前視概略圖，該光反應裝置係由1000[ml]之聚對苯二甲酸乙二酯(PET)瓶型光反應器10構成。該光反應器10包含最大能夠收容1000[ml]左右之液體(例如水)之圓筒形之容器本體11、及覆蓋其上部之裝卸自如之蓋12。於蓋12之底面之大致中央設置UV-LED13，UV-LED13由半球圓頂狀之以UV透過性之石英玻璃構成之保護罩14液密地覆蓋。又，於蓋12之內部組入有將來自UV-LED13之發熱冷卻之冷卻構造。為便於圖示，以可自外側透視容器本體11內之UV-LED13及保護罩14之方式描繪，但較佳為無法自外側透視。FIG. 1 is a schematic front view showing an example of a photoreaction device to which an illuminance calculation method according to an embodiment of the present invention is applied. The photoreaction device is a 1000 [ml] polyethylene terephthalate (PET) bottle. The photoreactor 10 is configured. The photoreactor 10 includes a cylindrical container body 11 capable of holding a liquid (for example, water) at a maximum of about 1000 [ml], and a removable lid 12 covering an upper portion thereof. A UV-LED 13 is disposed approximately at the center of the bottom surface of the cover 12. The UV-LED 13 is covered in a liquid-tight manner by a hemispherical dome-shaped protective cover 14 made of UV-transmitting quartz glass. In addition, a cooling structure for cooling heat generated from the UV-LED 13 is incorporated in the cover 12. For the convenience of illustration, the UV-LED 13 and the protective cover 14 in the container body 11 can be seen from the outside, but it is preferably not seen from the outside.
繼而，參考圖2之流程圖對本發明之一實施例之照度計算方法進行說明。典型而言，該照度計算方法之流程圖係安裝於適當之個人電腦內之本發明之照度計算方法相關之應用程式之概略流程，由該電腦內之處理器(CPU)執行。例如，該應用程式記憶於非短暫性之電腦可讀取之記憶媒體內，記憶於該記憶媒體內之應用程式被安裝於電腦內。Next, an illumination calculation method according to an embodiment of the present invention will be described with reference to the flowchart of FIG. 2. Typically, the flowchart of the illuminance calculation method is a schematic flow of an application program related to the illuminance calculation method of the present invention installed in a suitable personal computer, and executed by a processor (CPU) in the computer. For example, the application program is stored in a non-transitory computer-readable storage medium, and the application program stored in the storage medium is installed in the computer.
首先，於步驟S1中，取得作為照度計算對象之UV-LED(例如圖1中之UV-LED13)之規格資訊。該規格資訊中包含該UV-LED所固有之總光通量P[mW]及配光分佈f(θ)。再者，該等總光通量P[mW]及配光分佈f(θ)可自該UV-LED之製品目錄或規格書等容易地得知，因此，藉由以使用者操作輸入至電腦，電腦之處理器可取得該等規格資訊。First, in step S1, obtain the specification information of the UV-LED (for example, UV-LED13 in FIG. 1) as the illumination calculation target. The specification information includes the total luminous flux P [mW] and the light distribution f (θ) inherent to the UV-LED. In addition, the total luminous flux P [mW] and the light distribution f (θ) can be easily obtained from the catalog or specification of the UV-LED product. Therefore, by inputting to the computer by the user, the computer The processor can obtain these specifications.
再者，自該UV-LED之製品目錄或規格書等獲知之配光分佈(配光特性)大多為例如圖3所示之分佈圖。圖3係藉由圓周方向表示放射角θ、半徑方向表示相對UV強度(0～100%)之極座標表示配光分佈之圖。再者，所謂放射角θ係指相對於自發光點垂直(例如朝正下方)延伸之垂直線所成之角度。圖3中，作為簡單之例示，以實線描繪某一UV-LED A之配光分佈，以虛線描繪另一UV-LED B之配光分佈，進而以單點鏈線描繪擴散光模式之配光分佈作為參考。於根據該UV-LED之製品目錄或規格書等，未以函數f(θ)教示該UV-LED之配光分佈之情形時，將如圖3所示之配光分佈以放射角θ之函數f(θ)之形式表現並輸入至電腦。例如，圖3中之UV-LED A之配光分佈之函數f(θ)由下述式(1)表現，UV-LED B之配光分佈之函數f(θ)由下述式(2)表現，擴散光模式之配光分佈之函數f(θ)由下述式(3)表現。In addition, most of the light distribution (light distribution characteristics) known from the catalog or specification of the UV-LED product are distribution maps such as those shown in FIG. 3. FIG. 3 is a graph showing the light distribution by polar coordinates representing the radiation angle θ in the circumferential direction and relative UV intensity (0 to 100%) in the radial direction. The radiation angle θ refers to an angle formed by a vertical line extending perpendicularly (for example, directly below) from a light emitting point. In Figure 3, as a simple example, the light distribution of one UV-LED A is depicted by a solid line, the light distribution of another UV-LED B is depicted by a dashed line, and the distribution of the diffused light mode is depicted by a single-dot chain line. Light distribution as a reference. When the light distribution of the UV-LED is not taught by the function f (θ) according to the product catalog or specification of the UV-LED, the light distribution as shown in FIG. 3 is a function of the radiation angle θ f (θ) is expressed and input to the computer. For example, the function f (θ) of the light distribution of UV-LED A in FIG. 3 is represented by the following formula (1), and the function f (θ) of the light distribution of UV-LED B is represented by the following formula (2) The function f (θ) of the light distribution of the diffused light mode is expressed by the following formula (3).
返回至圖2，於步驟S2中，基於上述對象UV-LED所固有之上述配光分佈f(θ)，求出由該配光分佈所示之立體之比表面積A。於此情形時，首先，依據下述式(4)、(5)，將由極座標表示之上述配光分佈之函數f(θ)轉換成以圖3之橫軸為x軸、以縱軸為y軸之xy座標。Returning to FIG. 2, in step S2, based on the light distribution f (θ) inherent to the target UV-LED, a three-dimensional specific surface area A indicated by the light distribution is obtained. In this case, first, according to the following formulae (4) and (5), convert the above-mentioned light distribution function f (θ) expressed by the polar coordinates to the horizontal axis of FIG. 3 as the x-axis and the vertical axis as y. The xy coordinates of the axis.
x＝f(θ)sinθ (4) y＝f(θ)cosθ (5)x = f (θ) sinθ (4) y = f (θ) cosθ (5)
所謂由配光分佈f(θ)所示之立體係指使如圖3所示之二維配光分佈f(θ)繞對應於放射角θ之0度之y軸旋轉所得之旋轉體。因此，於步驟S2中，比表面積A可基於如下述式(6)所示之求出旋轉體之表面積之公式而算出。The so-called standing system represented by the light distribution f (θ) refers to a rotating body obtained by rotating the two-dimensional light distribution f (θ) shown in FIG. 3 around a y axis corresponding to 0 degrees of the radiation angle θ. Therefore, in step S2, the specific surface area A can be calculated based on a formula for obtaining the surface area of the rotating body as shown in the following formula (6).
繼而，於步驟S3中，關於任意受光位置(受光點)，基於上述比表面積A與上述UV-LED之總光通量及上述配光分佈f(θ)，算出照度lu。氣體中(發光點與受光點之間不存在吸收UV之物質之條件)之任意位置處之UV照度lu[mW/cm2 ]可使用比表面積A由下式求出。再者，以下，方便起見，假設自光反應裝置(光反應器10)之內壁面之UV反射為0之情形。Next, in step S3, regarding an arbitrary light receiving position (light receiving point), the illuminance lu is calculated based on the total luminous flux of the specific surface area A and the UV-LED and the light distribution distribution f (θ). The UV illuminance lu [mW / cm 2 ] at any position in the gas (a condition where no substance that absorbs UV exists between the light-emitting point and the light-receiving point) can be obtained by the following formula using the specific surface area A. In the following, for convenience, it is assumed that the UV reflection from the inner wall surface of the photoreaction device (photoreactor 10) is zero.
lu＝(P/A)・{f(θ)/L2 } (7) 此處，P係總光通量[mW]，L係發光點至受光點之距離(光路長)[cm]。即，任意受光位置(受光點)之照度lu可基於上述UV-LED之總光通量P相對於上述比表面積A之比(P/A)與上述配光分佈相對於該UV-LED之發光位置(發光點)至上述受光位置(受光點)之距離L之平方之比(f(θ)/L2 )的積而算出。此處，比「P/A」表示對應於比表面積A之「光通量分配單位量」，於總光通量P相同之情形時，比表面積A越大，「光通量分配單位量」越小。比「f(θ)/L2 」係至1受光點之特定放射角θ之配光分佈上之相對UV強度(即，對於θ之f(θ)之值)除以至該受光點之距離L之平方所得之值，即，表示對應於距離L以平方之比率減少之「經距離換算後之相對UV強度」。藉由對該「經距離換算後之相對UV強度」乘以上述「光通量分配單位量」，該「經距離換算後之相對UV強度」被換算為絕對值，可求出該1受光點之照度lu。lu = (P / A) · {f (θ) / L 2 } (7) Here, P is the total luminous flux [mW], and L is the distance from the light-emitting point to the light-receiving point (light path length) [cm]. That is, the illuminance lu at any light receiving position (light receiving point) can be based on the total luminous flux P of the UV-LED relative to the specific surface area A (P / A) and the light distribution position relative to the light emitting position of the UV-LED ( The product of the ratio (f (θ) / L 2 ) of the square of the distance L from the light emitting point) to the light receiving position (light receiving point). Here, the ratio "P / A" represents the "luminous flux distribution unit amount" corresponding to the specific surface area A. When the total luminous flux P is the same, the larger the specific surface area A, the smaller the "luminous flux distribution unit amount". The ratio “f (θ) / L 2 ” is the relative UV intensity (ie, the value of f (θ) for θ) on the light distribution of a specific emission angle θ to 1 light receiving point divided by the distance L to the light receiving point The value obtained by squaring means "the relative UV intensity after distance conversion" corresponding to the decrease in the distance L by a square ratio. By multiplying the "relative UV intensity after distance conversion" by the above "luminous flux distribution unit amount", the "relative UV intensity after distance conversion" is converted into an absolute value, and the illuminance of the 1 light receiving point can be obtained. lu.
於光反應器10內不存在液體之情形時，在步驟S3中，可依據上述式(7)算出任意受光位置(受光點)之照度lu。此種實施形態可應用於在光反應裝置(光反應器10)中對液體以外之處理對象物進行處理之情形(即，自發光點放射之UV通過空氣中照射至處理對象物之情形)。When there is no liquid in the photoreactor 10, in step S3, the illuminance lu at an arbitrary light receiving position (light receiving point) can be calculated according to the above formula (7). This embodiment can be applied to a case where a processing object other than a liquid is processed in a photoreaction device (photoreactor 10) (that is, a case where UV emitted from a light-emitting point is irradiated to the processing object through air).
其次，假設圖1所示之光反應器10之容器本體11內中完全充滿被處理液體之情形。於此情形時，由於保護罩14為半球狀，故自發光點放射之UV光線未折射亦未反射地通過容器本體11內之被處理液體。於此情形時，作為對UV照度lu造成影響之要素，只要追加考慮該被處理液體之UV透過率即可。即，於此情形時，在步驟S3中，依據下式，考慮介存於上述發光位置(發光點)至上述受光位置(受光點)之光路上之上述光反應裝置(光反應器10)內之被處理液體的厚度m[cm]及其UV透過率T，算出上述受光點之UV照度lu。Next, suppose that the container body 11 of the photoreactor 10 shown in FIG. 1 is completely filled with the liquid to be processed. In this case, since the protective cover 14 is hemispherical, the UV light emitted from the light emitting point passes through the liquid to be processed in the container body without being refracted or reflected. In this case, as a factor that affects the UV illuminance lu, the UV transmittance of the liquid to be processed may be additionally considered. That is, in this case, in step S3, the photoreaction device (photoreactor 10) stored in the light path from the light emitting position (light emitting point) to the light receiving position (light receiving point) according to the following formula is considered. The thickness m [cm] of the liquid to be treated and its UV transmittance T are used to calculate the UV illuminance lu of the light receiving point.
lu＝[(P/A)・{f(θ)/L2 }]Tm (8) 此處，T係上述被處理液體之每1[cm]之相應UV波長之透過率，Tm 係將到達至受光點為止該UV光線通過之被處理液體之厚度m[cm]作為冪指數而對T進行冪運算所得之值。藉此，可算出考慮了被處理液體之UV透過率之UV照度lu。lu = [(P / A) ・ {f (θ) / L 2 }] T m (8) Here, T is the transmittance of the corresponding UV wavelength per 1 [cm] of the liquid to be treated, and T m is Take the thickness m [cm] of the liquid to be processed through which the UV light passes up to the light-receiving point as a power index, and perform a power operation on T. Thereby, the UV illuminance lu considering the UV transmittance of the liquid to be treated can be calculated.
其次，假設圖1所示之光反應器10之容器本體11內未完全充滿被處理液體之情形。於此情形時，自發光點放射之UV光線首先於氣體中行進，然後於被處理液體之液面(氣液界面)部分反射且其餘折射後於被處理液體中行進。因此，於此情形時，作為對UV照度lu造成影響之要素，必須追加考慮該被處理液體之表面上之部分反射及折射。以下，參照圖4對此點進行考察。Next, suppose that the container body 11 of the photoreactor 10 shown in FIG. 1 is not completely filled with the liquid to be processed. In this case, the UV light emitted from the luminous point travels in the gas first, and then is partially reflected on the liquid surface (gas-liquid interface) of the liquid to be processed and the rest is refracted to travel in the liquid to be processed. Therefore, in this case, it is necessary to additionally consider partial reflection and refraction on the surface of the liquid to be treated as an element that affects the UV illumination lu. Hereinafter, this point will be examined with reference to FIG. 4.
圖4係表示UV光線於液面(氣液界面)部分反射並折射之狀態之參考圖。於考慮到液面上之光之折射及反射之情形時，對液面之入射角與上述放射角θ相同，若將折射角設為f，則折射率n由次式(9)表示。該折射率n係UV之波長及被處理液體所固有之數值。 FIG. 4 is a reference diagram showing a state in which UV rays are partially reflected and refracted on a liquid surface (gas-liquid interface). When considering the refraction and reflection of light on the liquid surface, the incident angle to the liquid surface is the same as the above-mentioned radiation angle θ. If the refraction angle is set to f, the refractive index n is expressed by the following formula (9). The refractive index n is a wavelength of UV and a value inherent in the liquid to be treated.
若將發光點至液面之鉛直距離設為r1 ，將液面至受光點之鉛直距離設為r2 ，則發光點至受光點之水平距離z由下式(10)表示。因此，藉由將關於所需之受光位置(受光點)之水平距離z及距離r1 、r2 以及上述折射率n代入式(10)，可算出折射角f。 If the vertical distance from the light emitting point to the liquid surface is set to r 1 and the vertical distance from the liquid surface to the light receiving point is set to r 2 , the horizontal distance z from the light emitting point to the light receiving point is expressed by the following formula (10). Therefore, the refraction angle f can be calculated by substituting the horizontal distance z, the distances r 1 , r 2, and the refractive index n with respect to a desired light receiving position (light receiving point) into the formula (10).
又，藉由下述式(11)，可求出氣液界面(液面)處之反射率R。 The reflectance R at the gas-liquid interface (liquid surface) can be obtained by the following formula (11).
若考慮如此求出之折射角f及反射率R、關於所需之受光位置(受光點)之水平距離z及距離r1 、r2 而改寫上述式(8)，則該所需之受光位置(受光點)之UV照度lu可依據下述式(12)而算出。 If the refraction angle f and reflectance R thus obtained, the horizontal distance z and the distances r 1 and r 2 with respect to the required light receiving position (light receiving point) are rewritten, the required light receiving position is rewritten. The (light-receiving point) UV illuminance lu can be calculated according to the following formula (12).
因此，於考慮氣液界面(液面)處之UV光線之折射及反射而算出任意受光位置(受光點)之UV照度lu之情形時，只要在圖2之步驟S3中，基於上述式(10)、(11)算出折射角f及反射率R，並基於上述式(12)算出UV照度lu即可。Therefore, when considering the refraction and reflection of UV rays at the gas-liquid interface (liquid surface), to calculate the UV illuminance lu at any light receiving position (light receiving point), as long as in step S3 of FIG. 2, based on the above formula (10 ) And (11) may calculate the refraction angle f and the reflectance R, and may calculate the UV illuminance lu based on the above formula (12).
再者，於光反應裝置(光反應器10)內存在氣液界面(液面)之情形時並非必須依據上述式(12)算出UV照度lu，於例如不那麼要求精細精度之用途中，亦可依據上述式(8)(即，僅考慮被處理液體之UV透過率)算出UV照度lu。又，於對液體進行處理之類型之光反應裝置(光反應器10)中並非必須依據上述式(8)或(12)算出UV照度lu，於例如不那麼要求精細精度之用途中，亦可依據上述式(7)(即，不考慮被處理液體之UV透過率)算出UV照度lu。In addition, when the gas-liquid interface (liquid surface) exists in the photoreaction device (photoreactor 10), it is not necessary to calculate the UV illuminance lu according to the above formula (12). The UV illuminance lu can be calculated according to the above formula (8) (that is, considering only the UV transmittance of the liquid to be treated). In addition, in a photoreaction device (photoreactor 10) of a type that processes a liquid, it is not necessary to calculate the UV illuminance lu according to the above formula (8) or (12), and it can also be used in applications that do not require fine precision, for example. The UV illuminance lu is calculated according to the above formula (7) (that is, without considering the UV transmittance of the liquid to be treated).
返回至圖2，於步驟S4中，針對光反應器10內之複數個受光位置(受光點)分別進行上述步驟S3之上述照度lu之計算處理，關於如此算出之複數個受光位置(受光點)，基於UV照度lu，產生表示光反應器10中之UV-LED13之UV照度特性之資訊。作為該UV照度特性，例如可藉由所算出之關於複數個受光位置(受光點)之UV照度lu之組合，呈現該光反應器10中之UV-LED13之紫外線照度分佈。作為另一例，UV照度特性亦可藉由根據所算出之複數個受光位置(受光點)之UV照度lu求出平均照度，而呈現該光反應器10中之UV-LED13之平均UV照度。Returning to FIG. 2, in step S4, the calculation processing of the above-mentioned illuminance lu in step S3 is performed separately for the plurality of light receiving positions (light receiving points) in the photoreactor 10, and the plurality of light receiving positions (light receiving points) thus calculated are performed. Based on the UV illuminance lu, information indicating the UV illuminance characteristics of the UV-LED 13 in the photoreactor 10 is generated. As the UV illuminance characteristic, for example, the calculated UV illuminance lu for a plurality of light receiving positions (light receiving points) can be used to present the ultraviolet illuminance distribution of the UV-LED 13 in the photoreactor 10. As another example, the average illuminance of the UV-LED 13 in the photoreactor 10 can also be represented by determining the average illuminance based on the calculated UV illuminance lu of the plurality of light receiving positions (light receiving points).
再者，步驟S4中之表示UV照度特性之資訊之製成處理為選項，並非必需。總之，只要根據應用目的對步驟S3中所算出之任意受光位置(受光點)之UV照度lu之資料適當利用或加工等即可。In addition, the preparation processing of the information indicating the UV illuminance characteristic in step S4 is an option and is not necessary. In short, the data of the UV illuminance lu at any light receiving position (light receiving point) calculated in step S3 may be appropriately used or processed according to the application purpose.
再者，應用本發明之一實施例之照度計算方法之光反應裝置當然並不限定於如圖1所示之光反應器10，於任何類型之UV液體處理裝置或設備中均可應用，又，於對液體以外之處理對象物進行UV處理之裝置中亦可應用。Furthermore, the photoreaction device to which the illuminance calculation method of one embodiment of the present invention is applied is of course not limited to the photoreactor 10 shown in FIG. 1, and can be applied to any type of UV liquid processing device or equipment. It can also be applied to a device for performing UV treatment on a processing object other than a liquid.
如上所述，根據本發明，可不使用UV照度計或化學光量計等而簡便地測定或推定UV-LED之UV照射性能。因此，利用此種可用性較高之本發明之技術，亦可實現先前無法進行之驗證。作為此種驗證之一，以下對UV-LED之配光特性對UV照射性能造成之影響進行考察。As described above, according to the present invention, the UV irradiation performance of a UV-LED can be easily measured or estimated without using a UV lux meter, a chemiluminometer, or the like. Therefore, using the technology of the present invention with higher availability can also achieve verification that could not be performed previously. As one of such verifications, the influence of the light distribution characteristics of UV-LEDs on the UV irradiation performance is examined below.
作為一例，於圖5中示出圖3中之UV-LED A之配光分佈f(θ)之若干變化。該UV-LED A之配光分佈f(θ)如上述式(1)所示般，但於圖5中示出了將UV-LED A之配光分佈f(θ)之指數部「θ2 」變更為「αθ2 」、將「α」之值變更為「0.1」、「1」、「10」、「100」、「1000」該5種之5個變化。圖中，註釋中明確示出描繪與「α」之各值對應之配光分佈之線型。作為驗證對象之光反應裝置設為與圖1所示之光反應器10相同之構成，具體而言，將容器本體11之內徑設為8[cm]，將高度設為20[cm]，將作為光源之UV-LED13之總光通量P設為16.3[mW]。針對配光分佈f(θ)之上述變化之各者，列舉95%與80%之兩種作為被處理液體之透過率T，將半球狀之石英製保護罩14之半徑設為1.25[cm](包含石英之厚度0.15[cm])，關於複數個受光點，依據上述式(8)算出各者之UV照度lu，且根據所算出之UV照度lu，算出各事例之平均UV照度。As an example, FIG. 5 shows some changes in the light distribution f (θ) of the UV-LED A in FIG. 3. The light distribution f (θ) of the UV-LED A is as shown in the above formula (1), but FIG. 5 shows the exponent part “θ 2 of the light distribution f (θ) of the UV-LED A "" To "αθ 2 ", and the value of "α" to 5 changes of "0.1", "1", "10", "100", and "1000". In the figure, the annotation clearly shows a line type that describes the light distribution distribution corresponding to each value of "α". The photoreaction device to be verified is the same configuration as the photoreactor 10 shown in FIG. 1. Specifically, the inner diameter of the container body 11 is 8 [cm], and the height is 20 [cm]. The total luminous flux P of the UV-LED 13 as a light source is set to 16.3 [mW]. For each of the above changes in the light distribution f (θ), two of 95% and 80% are listed as the transmittance T of the liquid to be treated, and the radius of the hemispherical quartz protective cover 14 is set to 1.25 [cm]. (Including the thickness of quartz 0.15 [cm]), regarding a plurality of light receiving points, calculate the UV illuminance lu of each of them according to the above formula (8), and calculate the average UV illuminance of each case based on the calculated UV illuminance lu.
繼而，針對各事例，算出藉由依照上述算出之平均UV照度之UV照射獲得一定之消毒效果所必需之照射時間。其計算條件係將作為254 nm光之必要UV照射量設為26[mJ/cm2 ]，將保護罩14中之UV透過率設為90%，將UV-LED發光波長對254 nm光之消毒效果(GF值)設為70%，將光源壽命末期時之照度維持率設為70%，將保護罩14之因污物附著引起之透過率設為95%。設為反應器10內充滿被處理液體，針對上述係數α之每一變化算出達到必要UV照射量為止之必要照射時間。圖6係關於各透過率T示出其結果。根據圖6亦判明，當然只要配光分佈相同，則被處理液體之透過率T較高者，必要照射時間較短。根據相對於係數α之值之變化的必要照射時間之行為可知，配光分佈對平均UV照度產生影響，若以相同之總光通量P之條件算出平均UV照度，則係數α之值存在最佳值，且可知，此時之係數α會根據液體之透過率T而不同。例如，於圖6所示之驗證結果中，可知於透過率T為95%之情形時，具有係數α之值為「1」之配光分佈之UV-LED成為最短之必要照射時間，於透過率T為80%之情形時，具有係數α之值為「10」之配光分佈之UV-LED具有最短之必要照射時間。因此，藉由應用本發明，可簡便地進行此種驗證，從而於存在例如包含不同之配光分佈之兩種UV-LED之情形時，能夠根據用途判斷哪種UV-LED為高性能，進而，亦能夠設計最佳之反應器10之形狀及最佳之配光分佈。Next, for each case, calculate the irradiation time necessary to obtain a certain disinfection effect by UV irradiation based on the average UV illuminance calculated as described above. The calculation condition is to set the necessary UV irradiation amount as 254 nm light to 26 [mJ / cm 2 ], set the UV transmittance in the protective cover 14 to 90%, and disinfect the 254 nm light with UV-LED emission wavelength. The effect (GF value) is set to 70%, the illuminance maintenance rate at the end of the light source life is set to 70%, and the transmittance of the protective cover 14 due to dirt adhesion is set to 95%. It is assumed that the reactor 10 is filled with the liquid to be processed, and the necessary irradiation time until the necessary UV irradiation amount is reached is calculated for each change of the coefficient α. The results are shown for each transmittance T in FIG. 6. It is also clear from FIG. 6 that, as long as the light distribution is the same, the higher the transmittance T of the liquid to be treated, the shorter the necessary irradiation time. According to the behavior of the necessary irradiation time relative to the change in the value of the coefficient α, it can be known that the light distribution affects the average UV illuminance. If the average UV illuminance is calculated under the same condition of the total luminous flux P, the value of the coefficient α has an optimal value It can be seen that the coefficient α at this time will be different according to the transmittance T of the liquid. For example, in the verification result shown in FIG. 6, when the transmittance T is 95%, it can be seen that the UV-LED with the light distribution of the coefficient α having a value of “1” becomes the shortest necessary irradiation time. When the rate T is 80%, a UV-LED having a light distribution having a value of the coefficient α of "10" has the shortest necessary irradiation time. Therefore, by applying the present invention, such verification can be easily performed, and when, for example, there are two types of UV-LEDs having different light distributions, it can be judged which UV-LED is high-performance according to the application, and further, It is also possible to design the best shape of the reactor 10 and the best light distribution.
10‧‧‧光反應器10‧‧‧Photoreactor
11‧‧‧容器本體11‧‧‧ container body
12‧‧‧蓋12‧‧‧ cover
13‧‧‧UV-LED13‧‧‧UV-LED
14‧‧‧保護罩14‧‧‧ protective cover
S1‧‧‧步驟S1‧‧‧step
S2‧‧‧步驟S2‧‧‧step
S3‧‧‧步驟S3‧‧‧step
S4‧‧‧步驟S4‧‧‧step
圖1係表示應用本發明之一實施例之照度計算方法之光反應裝置之一例的前視概略圖。 圖2係本發明之一實施例之照度計算方法之流程圖。 圖3係例示若干個UV-LED之配光分佈之圖。 圖4係表示UV光線於液面部分反射並折射之狀態之參考圖。 圖5係例示圖3所示之UV-LED A之配光分佈之若干變化之圖。 圖6係表示針對圖5所示之配光分佈之各變化，關於各透過率T求出之必要照射時間之計算結果之圖表。FIG. 1 is a schematic front view showing an example of a photoreaction device to which an illuminance calculation method according to an embodiment of the present invention is applied. FIG. 2 is a flowchart of an illumination calculation method according to an embodiment of the present invention. FIG. 3 is a diagram illustrating the light distribution of several UV-LEDs. FIG. 4 is a reference diagram showing a state in which UV rays are reflected and refracted on a liquid surface portion. FIG. 5 is a diagram illustrating some changes in the light distribution of the UV-LED A shown in FIG. 3. FIG. 6 is a graph showing the calculation results of the necessary irradiation time for each change in the transmittance T for each change in the light distribution shown in FIG. 5.
Claims (9)
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| JP2017-183892 | 2017-09-25 | ||
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| TW201922348A true TW201922348A (en) | 2019-06-16 |
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| JPH11319817A (en) * | 1998-05-12 | 1999-11-24 | Mitsubishi Electric Corp | Apparatus for sterilization by ultra violet radiation |
| JP4168348B2 (en) * | 2005-12-06 | 2008-10-22 | 千代田工販株式会社 | Ultraviolet illuminance measurement device and ultraviolet irradiation device |
| JP4901250B2 (en) * | 2006-03-17 | 2012-03-21 | 株式会社東芝 | UV disinfection equipment |
| US8012412B2 (en) * | 2007-08-02 | 2011-09-06 | Vollara, Llc | Method and device for purifying ambient air and surfaces |
| TWI615575B (en) * | 2012-01-19 | 2018-02-21 | 佛塞安科技公司 | Light sources, methods of irradiating light and lighting systems |
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| JP6627053B2 (en) | 2020-01-08 |
| JPWO2019059205A1 (en) | 2019-12-12 |
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