TW201811997A - Cleaning compositions for microelectronic substrates containing aluminum - Google Patents
Cleaning compositions for microelectronic substrates containing aluminum Download PDFInfo
- Publication number
- TW201811997A TW201811997A TW106119387A TW106119387A TW201811997A TW 201811997 A TW201811997 A TW 201811997A TW 106119387 A TW106119387 A TW 106119387A TW 106119387 A TW106119387 A TW 106119387A TW 201811997 A TW201811997 A TW 201811997A
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- TW
- Taiwan
- Prior art keywords
- weight
- composition
- cleaning
- substrate
- water
- Prior art date
Links
- 239000000203 mixture Substances 0.000 title claims abstract description 76
- 238000004140 cleaning Methods 0.000 title claims abstract description 53
- 239000000758 substrate Substances 0.000 title claims abstract description 38
- 238000004377 microelectronic Methods 0.000 title claims abstract description 25
- 229910052782 aluminium Inorganic materials 0.000 title claims abstract description 20
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 title claims abstract description 20
- MTHSVFCYNBDYFN-UHFFFAOYSA-N diethylene glycol Chemical compound OCCOCCO MTHSVFCYNBDYFN-UHFFFAOYSA-N 0.000 claims abstract description 33
- SECXISVLQFMRJM-UHFFFAOYSA-N N-Methylpyrrolidone Chemical compound CN1CCCC1=O SECXISVLQFMRJM-UHFFFAOYSA-N 0.000 claims abstract description 25
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims abstract description 20
- 238000000034 method Methods 0.000 claims abstract description 16
- QIGBRXMKCJKVMJ-UHFFFAOYSA-N Hydroquinone Chemical compound OC1=CC=C(O)C=C1 QIGBRXMKCJKVMJ-UHFFFAOYSA-N 0.000 claims abstract description 15
- POAOYUHQDCAZBD-UHFFFAOYSA-N 2-butoxyethanol Chemical compound CCCCOCCO POAOYUHQDCAZBD-UHFFFAOYSA-N 0.000 claims abstract description 14
- HZAXFHJVJLSVMW-UHFFFAOYSA-N 2-Aminoethan-1-ol Chemical compound NCCO HZAXFHJVJLSVMW-UHFFFAOYSA-N 0.000 claims abstract description 10
- AVXURJPOCDRRFD-UHFFFAOYSA-N Hydroxylamine Chemical compound ON AVXURJPOCDRRFD-UHFFFAOYSA-N 0.000 claims abstract description 9
- 229910052751 metal Inorganic materials 0.000 claims description 28
- 239000002184 metal Substances 0.000 claims description 28
- 230000007797 corrosion Effects 0.000 claims description 20
- 238000005260 corrosion Methods 0.000 claims description 20
- HQFQTTNMBUPQAY-UHFFFAOYSA-N cyclobutylhydrazine Chemical compound NNC1CCC1 HQFQTTNMBUPQAY-UHFFFAOYSA-N 0.000 claims description 10
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 claims description 7
- NRTOMJZYCJJWKI-UHFFFAOYSA-N Titanium nitride Chemical compound [Ti]#N NRTOMJZYCJJWKI-UHFFFAOYSA-N 0.000 claims description 7
- 239000010936 titanium Substances 0.000 claims description 7
- 229910052719 titanium Inorganic materials 0.000 claims description 7
- 238000000637 aluminium metallisation Methods 0.000 claims description 4
- 230000008569 process Effects 0.000 claims description 3
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 claims 1
- HXJUTPCZVOIRIF-UHFFFAOYSA-N sulfolane Chemical compound O=S1(=O)CCCC1 HXJUTPCZVOIRIF-UHFFFAOYSA-N 0.000 abstract 1
- YCIMNLLNPGFGHC-UHFFFAOYSA-N catechol Chemical compound OC1=CC=CC=C1O YCIMNLLNPGFGHC-UHFFFAOYSA-N 0.000 description 23
- QTBSBXVTEAMEQO-UHFFFAOYSA-N Acetic acid Chemical compound CC(O)=O QTBSBXVTEAMEQO-UHFFFAOYSA-N 0.000 description 18
- -1 methylene phosphonic acid Chemical compound 0.000 description 15
- 229920002120 photoresistant polymer Polymers 0.000 description 15
- 239000004094 surface-active agent Substances 0.000 description 10
- IAZDPXIOMUYVGZ-UHFFFAOYSA-N Dimethylsulphoxide Chemical compound CS(C)=O IAZDPXIOMUYVGZ-UHFFFAOYSA-N 0.000 description 9
- 239000002253 acid Substances 0.000 description 8
- 239000003112 inhibitor Substances 0.000 description 6
- 239000000126 substance Substances 0.000 description 6
- 125000000217 alkyl group Chemical group 0.000 description 5
- 239000002280 amphoteric surfactant Substances 0.000 description 5
- 150000001875 compounds Chemical class 0.000 description 5
- 150000002009 diols Chemical class 0.000 description 5
- 239000004615 ingredient Substances 0.000 description 5
- 239000000243 solution Substances 0.000 description 5
- 235000012431 wafers Nutrition 0.000 description 5
- 150000001412 amines Chemical class 0.000 description 4
- 239000004065 semiconductor Substances 0.000 description 4
- KWIUHFFTVRNATP-UHFFFAOYSA-N Betaine Natural products C[N+](C)(C)CC([O-])=O KWIUHFFTVRNATP-UHFFFAOYSA-N 0.000 description 3
- MUBZPKHOEPUJKR-UHFFFAOYSA-N Oxalic acid Chemical compound OC(=O)C(O)=O MUBZPKHOEPUJKR-UHFFFAOYSA-N 0.000 description 3
- 229920003171 Poly (ethylene oxide) Polymers 0.000 description 3
- OFOBLEOULBTSOW-UHFFFAOYSA-N Propanedioic acid Natural products OC(=O)CC(O)=O OFOBLEOULBTSOW-UHFFFAOYSA-N 0.000 description 3
- 239000003945 anionic surfactant Substances 0.000 description 3
- 229960003237 betaine Drugs 0.000 description 3
- 239000003093 cationic surfactant Substances 0.000 description 3
- 239000003795 chemical substances by application Substances 0.000 description 3
- 230000000052 comparative effect Effects 0.000 description 3
- 230000000536 complexating effect Effects 0.000 description 3
- 238000009472 formulation Methods 0.000 description 3
- 150000002739 metals Chemical class 0.000 description 3
- 239000002736 nonionic surfactant Substances 0.000 description 3
- 239000002904 solvent Substances 0.000 description 3
- WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical compound [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 description 3
- 229910052721 tungsten Inorganic materials 0.000 description 3
- 239000010937 tungsten Substances 0.000 description 3
- NECRQCBKTGZNMH-UHFFFAOYSA-N 3,5-dimethylhex-1-yn-3-ol Chemical compound CC(C)CC(C)(O)C#C NECRQCBKTGZNMH-UHFFFAOYSA-N 0.000 description 2
- PGSWEKYNAOWQDF-UHFFFAOYSA-N 3-methylcatechol Chemical compound CC1=CC=CC(O)=C1O PGSWEKYNAOWQDF-UHFFFAOYSA-N 0.000 description 2
- RGHNJXZEOKUKBD-SQOUGZDYSA-N D-gluconic acid Chemical compound OC[C@@H](O)[C@@H](O)[C@H](O)[C@@H](O)C(O)=O RGHNJXZEOKUKBD-SQOUGZDYSA-N 0.000 description 2
- RTZKZFJDLAIYFH-UHFFFAOYSA-N Diethyl ether Chemical compound CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 2
- ROSDSFDQCJNGOL-UHFFFAOYSA-N Dimethylamine Chemical class CNC ROSDSFDQCJNGOL-UHFFFAOYSA-N 0.000 description 2
- KCXVZYZYPLLWCC-UHFFFAOYSA-N EDTA Chemical compound OC(=O)CN(CC(O)=O)CCN(CC(O)=O)CC(O)=O KCXVZYZYPLLWCC-UHFFFAOYSA-N 0.000 description 2
- KWIUHFFTVRNATP-UHFFFAOYSA-O N,N,N-trimethylglycinium Chemical compound C[N+](C)(C)CC(O)=O KWIUHFFTVRNATP-UHFFFAOYSA-O 0.000 description 2
- NBIIXXVUZAFLBC-UHFFFAOYSA-N Phosphoric acid Chemical compound OP(O)(O)=O NBIIXXVUZAFLBC-UHFFFAOYSA-N 0.000 description 2
- ZTHYODDOHIVTJV-UHFFFAOYSA-N Propyl gallate Chemical compound CCCOC(=O)C1=CC(O)=C(O)C(O)=C1 ZTHYODDOHIVTJV-UHFFFAOYSA-N 0.000 description 2
- 239000002738 chelating agent Substances 0.000 description 2
- 239000008139 complexing agent Substances 0.000 description 2
- DIOQZVSQGTUSAI-UHFFFAOYSA-N decane Chemical compound CCCCCCCCCC DIOQZVSQGTUSAI-UHFFFAOYSA-N 0.000 description 2
- NFDRPXJGHKJRLJ-UHFFFAOYSA-N edtmp Chemical compound OP(O)(=O)CN(CP(O)(O)=O)CCN(CP(O)(O)=O)CP(O)(O)=O NFDRPXJGHKJRLJ-UHFFFAOYSA-N 0.000 description 2
- LNTHITQWFMADLM-UHFFFAOYSA-N gallic acid Chemical compound OC(=O)C1=CC(O)=C(O)C(O)=C1 LNTHITQWFMADLM-UHFFFAOYSA-N 0.000 description 2
- 231100000206 health hazard Toxicity 0.000 description 2
- JVTAAEKCZFNVCJ-UHFFFAOYSA-N lactic acid Chemical compound CC(O)C(O)=O JVTAAEKCZFNVCJ-UHFFFAOYSA-N 0.000 description 2
- 238000012986 modification Methods 0.000 description 2
- 230000004048 modification Effects 0.000 description 2
- 230000000269 nucleophilic effect Effects 0.000 description 2
- XNGIFLGASWRNHJ-UHFFFAOYSA-N phthalic acid Chemical compound OC(=O)C1=CC=CC=C1C(O)=O XNGIFLGASWRNHJ-UHFFFAOYSA-N 0.000 description 2
- WQGWDDDVZFFDIG-UHFFFAOYSA-N pyrogallol Chemical compound OC1=CC=CC(O)=C1O WQGWDDDVZFFDIG-UHFFFAOYSA-N 0.000 description 2
- GHMLBKRAJCXXBS-UHFFFAOYSA-N resorcinol Chemical compound OC1=CC=CC(O)=C1 GHMLBKRAJCXXBS-UHFFFAOYSA-N 0.000 description 2
- YGSDEFSMJLZEOE-UHFFFAOYSA-N salicylic acid Chemical compound OC(=O)C1=CC=CC=C1O YGSDEFSMJLZEOE-UHFFFAOYSA-N 0.000 description 2
- 239000012085 test solution Substances 0.000 description 2
- QBYIENPQHBMVBV-HFEGYEGKSA-N (2R)-2-hydroxy-2-phenylacetic acid Chemical compound O[C@@H](C(O)=O)c1ccccc1.O[C@@H](C(O)=O)c1ccccc1 QBYIENPQHBMVBV-HFEGYEGKSA-N 0.000 description 1
- RBNPOMFGQQGHHO-UHFFFAOYSA-N -2,3-Dihydroxypropanoic acid Natural products OCC(O)C(O)=O RBNPOMFGQQGHHO-UHFFFAOYSA-N 0.000 description 1
- 150000005206 1,2-dihydroxybenzenes Chemical class 0.000 description 1
- MAJIKLZBGZBLGA-UHFFFAOYSA-N 1-ethoxy-2,4,7,9-tetramethyldec-5-yne-4,7-diol Chemical compound O(CC)CC(CC(C#CC(CC(C)C)(O)C)(O)C)C MAJIKLZBGZBLGA-UHFFFAOYSA-N 0.000 description 1
- VILCJCGEZXAXTO-UHFFFAOYSA-N 2,2,2-tetramine Chemical compound NCCNCCNCCN VILCJCGEZXAXTO-UHFFFAOYSA-N 0.000 description 1
- FCKYPQBAHLOOJQ-UWVGGRQHSA-N 2-[[(1s,2s)-2-[bis(carboxymethyl)amino]cyclohexyl]-(carboxymethyl)amino]acetic acid Chemical compound OC(=O)CN(CC(O)=O)[C@H]1CCCC[C@@H]1N(CC(O)=O)CC(O)=O FCKYPQBAHLOOJQ-UWVGGRQHSA-N 0.000 description 1
- ZBCATMYQYDCTIZ-UHFFFAOYSA-N 4-methylcatechol Chemical compound CC1=CC=C(O)C(O)=C1 ZBCATMYQYDCTIZ-UHFFFAOYSA-N 0.000 description 1
- XESZUVZBAMCAEJ-UHFFFAOYSA-N 4-tert-butylcatechol Chemical compound CC(C)(C)C1=CC=C(O)C(O)=C1 XESZUVZBAMCAEJ-UHFFFAOYSA-N 0.000 description 1
- 206010000087 Abdominal pain upper Diseases 0.000 description 1
- DHMQDGOQFOQNFH-UHFFFAOYSA-M Aminoacetate Chemical compound NCC([O-])=O DHMQDGOQFOQNFH-UHFFFAOYSA-M 0.000 description 1
- QPRDKAJJYCDOFV-UHFFFAOYSA-N CCCCCCCCCCCCOC(=O)CCNCCC(O)=O Chemical compound CCCCCCCCCCCCOC(=O)CCNCCC(O)=O QPRDKAJJYCDOFV-UHFFFAOYSA-N 0.000 description 1
- KXDHJXZQYSOELW-UHFFFAOYSA-N Carbamic acid Chemical class NC(O)=O KXDHJXZQYSOELW-UHFFFAOYSA-N 0.000 description 1
- 235000005979 Citrus limon Nutrition 0.000 description 1
- 244000131522 Citrus pyriformis Species 0.000 description 1
- 244000060011 Cocos nucifera Species 0.000 description 1
- 235000013162 Cocos nucifera Nutrition 0.000 description 1
- PMPVIKIVABFJJI-UHFFFAOYSA-N Cyclobutane Chemical compound C1CCC1 PMPVIKIVABFJJI-UHFFFAOYSA-N 0.000 description 1
- FCKYPQBAHLOOJQ-UHFFFAOYSA-N Cyclohexane-1,2-diaminetetraacetic acid Chemical compound OC(=O)CN(CC(O)=O)C1CCCCC1N(CC(O)=O)CC(O)=O FCKYPQBAHLOOJQ-UHFFFAOYSA-N 0.000 description 1
- RGHNJXZEOKUKBD-UHFFFAOYSA-N D-gluconic acid Natural products OCC(O)C(O)C(O)C(O)C(O)=O RGHNJXZEOKUKBD-UHFFFAOYSA-N 0.000 description 1
- RBNPOMFGQQGHHO-UWTATZPHSA-N D-glyceric acid Chemical compound OC[C@@H](O)C(O)=O RBNPOMFGQQGHHO-UWTATZPHSA-N 0.000 description 1
- FEWJPZIEWOKRBE-JCYAYHJZSA-N Dextrotartaric acid Chemical compound OC(=O)[C@H](O)[C@@H](O)C(O)=O FEWJPZIEWOKRBE-JCYAYHJZSA-N 0.000 description 1
- RPNUMPOLZDHAAY-UHFFFAOYSA-N Diethylenetriamine Chemical compound NCCNCCN RPNUMPOLZDHAAY-UHFFFAOYSA-N 0.000 description 1
- PIICEJLVQHRZGT-UHFFFAOYSA-N Ethylenediamine Chemical compound NCCN PIICEJLVQHRZGT-UHFFFAOYSA-N 0.000 description 1
- DBVJJBKOTRCVKF-UHFFFAOYSA-N Etidronic acid Chemical compound OP(=O)(O)C(O)(C)P(O)(O)=O DBVJJBKOTRCVKF-UHFFFAOYSA-N 0.000 description 1
- 206010019233 Headaches Diseases 0.000 description 1
- BAVYZALUXZFZLV-UHFFFAOYSA-N Methylamine Chemical class NC BAVYZALUXZFZLV-UHFFFAOYSA-N 0.000 description 1
- YNAVUWVOSKDBBP-UHFFFAOYSA-N Morpholine Chemical class C1COCCN1 YNAVUWVOSKDBBP-UHFFFAOYSA-N 0.000 description 1
- 239000002202 Polyethylene glycol Substances 0.000 description 1
- XBDQKXXYIPTUBI-UHFFFAOYSA-M Propionate Chemical compound CCC([O-])=O XBDQKXXYIPTUBI-UHFFFAOYSA-M 0.000 description 1
- IWYDHOAUDWTVEP-UHFFFAOYSA-N R-2-phenyl-2-hydroxyacetic acid Natural products OC(=O)C(O)C1=CC=CC=C1 IWYDHOAUDWTVEP-UHFFFAOYSA-N 0.000 description 1
- FEWJPZIEWOKRBE-UHFFFAOYSA-N Tartaric acid Natural products [H+].[H+].[O-]C(=O)C(O)C(O)C([O-])=O FEWJPZIEWOKRBE-UHFFFAOYSA-N 0.000 description 1
- 239000013504 Triton X-100 Substances 0.000 description 1
- 229920004890 Triton X-100 Polymers 0.000 description 1
- 206010047700 Vomiting Diseases 0.000 description 1
- 230000005856 abnormality Effects 0.000 description 1
- 230000037374 absorbed through the skin Effects 0.000 description 1
- 150000007513 acids Chemical class 0.000 description 1
- 230000009471 action Effects 0.000 description 1
- 239000002318 adhesion promoter Substances 0.000 description 1
- 230000002411 adverse Effects 0.000 description 1
- 150000003973 alkyl amines Chemical class 0.000 description 1
- 150000001346 alkyl aryl ethers Chemical class 0.000 description 1
- 125000006177 alkyl benzyl group Chemical group 0.000 description 1
- 125000005907 alkyl ester group Chemical group 0.000 description 1
- AZDRQVAHHNSJOQ-UHFFFAOYSA-N alumane Chemical group [AlH3] AZDRQVAHHNSJOQ-UHFFFAOYSA-N 0.000 description 1
- 150000003863 ammonium salts Chemical class 0.000 description 1
- 238000004380 ashing Methods 0.000 description 1
- 230000004888 barrier function Effects 0.000 description 1
- QRUDEWIWKLJBPS-UHFFFAOYSA-N benzotriazole Chemical compound C1=CC=C2N[N][N]C2=C1 QRUDEWIWKLJBPS-UHFFFAOYSA-N 0.000 description 1
- 239000012964 benzotriazole Substances 0.000 description 1
- 125000003354 benzotriazolyl group Chemical class N1N=NC2=C1C=CC=C2* 0.000 description 1
- 150000007942 carboxylates Chemical class 0.000 description 1
- 150000001735 carboxylic acids Chemical class 0.000 description 1
- MRUAUOIMASANKQ-UHFFFAOYSA-O carboxymethyl-[3-(dodecanoylamino)propyl]-dimethylazanium Chemical group CCCCCCCCCCCC(=O)NCCC[N+](C)(C)CC(O)=O MRUAUOIMASANKQ-UHFFFAOYSA-O 0.000 description 1
- 125000002091 cationic group Chemical group 0.000 description 1
- CFBGXYDUODCMNS-UHFFFAOYSA-N cyclobutene Chemical compound C1CC=C1 CFBGXYDUODCMNS-UHFFFAOYSA-N 0.000 description 1
- SCIGVHCNNXTQDB-UHFFFAOYSA-N decyl dihydrogen phosphate Chemical compound CCCCCCCCCCOP(O)(O)=O SCIGVHCNNXTQDB-UHFFFAOYSA-N 0.000 description 1
- 239000003599 detergent Substances 0.000 description 1
- 150000005690 diesters Chemical class 0.000 description 1
- 235000014113 dietary fatty acids Nutrition 0.000 description 1
- 238000009792 diffusion process Methods 0.000 description 1
- 150000005205 dihydroxybenzenes Chemical class 0.000 description 1
- XPPKVPWEQAFLFU-UHFFFAOYSA-J diphosphate(4-) Chemical compound [O-]P([O-])(=O)OP([O-])([O-])=O XPPKVPWEQAFLFU-UHFFFAOYSA-J 0.000 description 1
- 235000011180 diphosphates Nutrition 0.000 description 1
- DUYCTCQXNHFCSJ-UHFFFAOYSA-N dtpmp Chemical compound OP(=O)(O)CN(CP(O)(O)=O)CCN(CP(O)(=O)O)CCN(CP(O)(O)=O)CP(O)(O)=O DUYCTCQXNHFCSJ-UHFFFAOYSA-N 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 238000005530 etching Methods 0.000 description 1
- LYCAIKOWRPUZTN-UHFFFAOYSA-N ethylene glycol Natural products OCCO LYCAIKOWRPUZTN-UHFFFAOYSA-N 0.000 description 1
- 229930195729 fatty acid Natural products 0.000 description 1
- 239000000194 fatty acid Substances 0.000 description 1
- 210000003754 fetus Anatomy 0.000 description 1
- 239000000796 flavoring agent Substances 0.000 description 1
- 235000019634 flavors Nutrition 0.000 description 1
- 229940074391 gallic acid Drugs 0.000 description 1
- 235000004515 gallic acid Nutrition 0.000 description 1
- 239000000174 gluconic acid Substances 0.000 description 1
- 235000012208 gluconic acid Nutrition 0.000 description 1
- 239000000383 hazardous chemical Substances 0.000 description 1
- 231100000869 headache Toxicity 0.000 description 1
- 230000036541 health Effects 0.000 description 1
- 229960004337 hydroquinone Drugs 0.000 description 1
- WGCNASOHLSPBMP-UHFFFAOYSA-N hydroxyacetaldehyde Natural products OCC=O WGCNASOHLSPBMP-UHFFFAOYSA-N 0.000 description 1
- 238000010348 incorporation Methods 0.000 description 1
- 230000005764 inhibitory process Effects 0.000 description 1
- 239000004310 lactic acid Substances 0.000 description 1
- 235000014655 lactic acid Nutrition 0.000 description 1
- VZCYOOQTPOCHFL-UPHRSURJSA-N maleic acid Chemical compound OC(=O)\C=C/C(O)=O VZCYOOQTPOCHFL-UPHRSURJSA-N 0.000 description 1
- 239000011976 maleic acid Substances 0.000 description 1
- 230000036244 malformation Effects 0.000 description 1
- 229960002510 mandelic acid Drugs 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 230000003472 neutralizing effect Effects 0.000 description 1
- QJGQUHMNIGDVPM-UHFFFAOYSA-N nitrogen group Chemical group [N] QJGQUHMNIGDVPM-UHFFFAOYSA-N 0.000 description 1
- 230000009972 noncorrosive effect Effects 0.000 description 1
- 235000006408 oxalic acid Nutrition 0.000 description 1
- FJKROLUGYXJWQN-UHFFFAOYSA-N papa-hydroxy-benzoic acid Natural products OC(=O)C1=CC=C(O)C=C1 FJKROLUGYXJWQN-UHFFFAOYSA-N 0.000 description 1
- 239000000575 pesticide Substances 0.000 description 1
- UEZVMMHDMIWARA-UHFFFAOYSA-M phosphonate Chemical compound [O-]P(=O)=O UEZVMMHDMIWARA-UHFFFAOYSA-M 0.000 description 1
- 235000011007 phosphoric acid Nutrition 0.000 description 1
- 231100000614 poison Toxicity 0.000 description 1
- 229920001223 polyethylene glycol Polymers 0.000 description 1
- 229920001343 polytetrafluoroethylene Polymers 0.000 description 1
- 239000004810 polytetrafluoroethylene Substances 0.000 description 1
- 239000002243 precursor Substances 0.000 description 1
- 235000010388 propyl gallate Nutrition 0.000 description 1
- 239000000473 propyl gallate Substances 0.000 description 1
- 229940075579 propyl gallate Drugs 0.000 description 1
- 229940079877 pyrogallol Drugs 0.000 description 1
- 229960001755 resorcinol Drugs 0.000 description 1
- 229960004889 salicylic acid Drugs 0.000 description 1
- 235000013599 spices Nutrition 0.000 description 1
- 229940071182 stannate Drugs 0.000 description 1
- 125000005402 stannate group Chemical group 0.000 description 1
- 235000000346 sugar Nutrition 0.000 description 1
- 150000003871 sulfonates Chemical class 0.000 description 1
- 150000003467 sulfuric acid derivatives Chemical class 0.000 description 1
- 239000011975 tartaric acid Substances 0.000 description 1
- 235000002906 tartaric acid Nutrition 0.000 description 1
- 150000003568 thioethers Chemical class 0.000 description 1
- 239000003440 toxic substance Substances 0.000 description 1
- VZCYOOQTPOCHFL-UHFFFAOYSA-N trans-butenedioic acid Natural products OC(=O)C=CC(O)=O VZCYOOQTPOCHFL-UHFFFAOYSA-N 0.000 description 1
- 238000012546 transfer Methods 0.000 description 1
- 238000009736 wetting Methods 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
- H01L21/31—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to form insulating layers thereon, e.g. for masking or by using photolithographic techniques; After treatment of these layers; Selection of materials for these layers
- H01L21/3105—After-treatment
- H01L21/311—Etching the insulating layers by chemical or physical means
- H01L21/31127—Etching organic layers
- H01L21/31133—Etching organic layers by chemical means
-
- C—CHEMISTRY; METALLURGY
- C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
- C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
- C11D7/00—Compositions of detergents based essentially on non-surface-active compounds
- C11D7/22—Organic compounds
- C11D7/26—Organic compounds containing oxygen
- C11D7/261—Alcohols; Phenols
-
- C—CHEMISTRY; METALLURGY
- C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
- C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
- C11D7/00—Compositions of detergents based essentially on non-surface-active compounds
- C11D7/22—Organic compounds
- C11D7/26—Organic compounds containing oxygen
- C11D7/263—Ethers
-
- C—CHEMISTRY; METALLURGY
- C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
- C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
- C11D7/00—Compositions of detergents based essentially on non-surface-active compounds
- C11D7/22—Organic compounds
- C11D7/32—Organic compounds containing nitrogen
- C11D7/3218—Alkanolamines or alkanolimines
-
- C—CHEMISTRY; METALLURGY
- C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
- C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
- C11D7/00—Compositions of detergents based essentially on non-surface-active compounds
- C11D7/22—Organic compounds
- C11D7/34—Organic compounds containing sulfur
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- C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
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- G03F7/42—Stripping or agents therefor
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- H01L21/02041—Cleaning
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Abstract
Description
本發明係關於用於微電子基板且特定言之用於自含鋁之微電子組件清除含金屬之殘留物而不引起不適當鋁腐蝕之清潔及剝除組合物。This invention relates to cleaning and stripping compositions for microelectronic substrates and, in particular, for the removal of metal-containing residues from aluminum-containing microelectronic components without causing undue aluminum corrosion.
在微電子裝置之製造期間,採用光阻劑將影像轉印至一微電子基板以建立所要電路層。用鋁金屬化許多微電子裝置。此等微電子基板亦可由諸如鈦、氮化鈦、鎢及類似者之金屬構成及/或採用該等金屬作為助黏劑及擴散障壁。 已提出許多鹼性微電子剝除及清潔組合物用於自此等微電子基板移除交聯且硬化光阻劑及其他殘留物(諸如蝕刻後殘留物)。然而,伴隨此剝除及清潔組合物之一個問題係由於使用此等清潔組合物而發生之金屬腐蝕之可能性。至少部分歸因於裝置基板中之金屬與採用之鹼性剝除劑之反應,此腐蝕導致金屬線之晶鬚、點蝕、切蝕。在美國專利第5,308,745號中揭示一種此鹼性微電子剝除及清潔組合物。雖然已在商業上採用該專利之剝除及清潔組合物以自基板剝除硬化且交聯光阻劑,但已發現,嘗試使用此專利之清潔組合物來清潔具有鋁金屬化且含有來自層(諸如鈦層、氮化鈦層、鎢層及類似者)之金屬之殘留物之微電子基板已導致顯著鋁腐蝕或金屬殘留物之不充分清潔。因此,在清潔穿通下伏鈦層、氮化鈦層、鎢層及類似者之導通孔中使用該專利之清潔組合物方面存在一限制。 當前,鋁技術之半導體清潔市場由基於羥胺(HA)及/或N-甲基吡咯啶酮(NMP)之化學物主導。出於安全、健康及成本原因,半導體產業正遠離NMP及HA化學物。在美國專利第8,178,482號中例示此技術,該專利揭示包含N-甲基吡咯啶酮(NMP)之剝除及清潔組合物。NMP在特殊健康危害物質清單上,且可在意外地吸入或吸收穿過皮膚時不利地影響一僱員,從而引起頭痛、胃痛、惡心及嘔吐。NMP亦可為一致畸物,即,可能導致孕婦之胎兒之畸形之一物質。因此,需要在自含Al之半導體裝置移除殘留物以及陰性及陽性塊狀光阻劑方面有效之無HA及NMP之清潔組合物及方法。 因此,需要微電子剝除及清潔組合物,其等可有效地移除此等金屬殘留物且如此做而無源自剝除及清潔組合物之任何顯著鋁腐蝕。亦需要剝除及清潔組合物,其等除清潔此等金屬殘留物以外,亦將有效地清潔來自其他導通孔及來自金屬線之灰化後殘留物,以及清潔來自基板之未灰化光阻劑殘留物。亦需要無NMP、HA及其他環境有害及/或有毒物質之此等組合物。During fabrication of the microelectronic device, a photoresist is used to transfer the image to a microelectronic substrate to create the desired circuit layer. Many microelectronic devices are metallized with aluminum. Such microelectronic substrates can also be constructed of metals such as titanium, titanium nitride, tungsten, and the like and/or use such metals as adhesion promoters and diffusion barriers. A number of alkaline microelectronic stripping and cleaning compositions have been proposed for removing crosslinks and hardening photoresists and other residues (such as post-etch residues) from such microelectronic substrates. However, one problem associated with this stripping and cleaning composition is the likelihood of metal corrosion due to the use of such cleaning compositions. This is due, at least in part, to the reaction of the metal in the device substrate with the alkaline stripping agent employed, which causes whiskers, pitting, and etching of the metal lines. One such alkaline microelectronic stripping and cleaning composition is disclosed in U.S. Patent No. 5,308,745. While the stripping and cleaning compositions of this patent have been commercially employed to strip harden and crosslink photoresist from the substrate, it has been found that attempts have been made to clean the aluminum metallization and contain the layer from the cleaning composition of this patent. Microelectronic substrates of residues of metals such as titanium, titanium nitride, tungsten, and the like have resulted in significant aluminum corrosion or insufficient cleaning of metal residues. Therefore, there is a limitation in using the cleaning composition of the patent in cleaning the through-hole underlying titanium layer, the titanium nitride layer, the tungsten layer, and the like. Currently, the semiconductor cleaning market for aluminum technology is dominated by chemicals based on hydroxylamine (HA) and/or N-methylpyrrolidone (NMP). The semiconductor industry is moving away from NMP and HA chemicals for safety, health and cost reasons. This technique is exemplified in U.S. Patent No. 8,178,482, which discloses a stripping and cleaning composition comprising N-methylpyrrolidone (NMP). NMP is on the list of special health hazard substances and can adversely affect an employee when accidentally inhaled or absorbed through the skin, causing headache, stomach pain, nausea and vomiting. NMP can also be a consistent abnormality, that is, a substance that may cause malformation of a pregnant woman's fetus. Accordingly, there is a need for cleaning compositions and methods free of HA and NMP that are effective in removing residues and negative and positive bulk photoresist from semiconductor devices containing Al. Accordingly, there is a need for microelectronic stripping and cleaning compositions that are effective in removing such metal residues and doing so without any significant aluminum corrosion from the stripping and cleaning compositions. There is also a need to strip and clean the composition which, in addition to cleaning the metal residues, will also effectively clean the remaining residues from the other vias and from the metal lines, as well as clean the unashed photoresist from the substrate. Residue of the agent. Such compositions without NMP, HA and other environmentally harmful and/or toxic substances are also required.
根據本發明,提供用於清潔微電子基板之剝除及清潔組合物,該組合物包含:約30重量%至約50重量%之乙二醇丁醚;約20重量%至約30重量%之環丁碸;約10重量%至約45重量%之單乙醇胺;約3重量%至約15重量%之二甘醇;約0.5重量%至約10重量%之二羥基苯;及約0.5重量%至約50重量%之水。組合物可額外地包括一或多種成分,諸如金屬絡合/耐腐蝕化合物、其他腐蝕抑制劑及表面活性劑。 在一實施例中,本發明之組合物用於剝除且清潔含鋁之基板。在一實施例中,基板包含具有導通孔且含有金屬殘留物之一鋁金屬化基板。在另一實施例中,金屬殘留物包含選自由鈦層及氮化鈦層組成之群組之至少一個層。在另一實施例中,剝除及清潔組合物包含:約35重量%至約45重量%之乙二醇丁醚;約24重量%至約27重量%之環丁碸;約13重量%至約15重量%之單乙醇胺;約4重量%至約10重量%之二甘醇;約3重量%至約8重量%之二羥基苯;及約9重量%至約13重量%之水。 在一實施例中,組合物用於剝除且清潔含鋁之基板。在一實施例中,本發明組合物實質上無羥胺。在其另一實施例中,本發明組合物實質上無N-甲基吡咯啶酮(NMP)。 在另一實施例中,本發明包含一種用於清潔微電子基板而不對一鋁基板產生任何實質腐蝕之方法,該程序包括使基板與一清潔組合物接觸達足以清潔基板之一時間,其中該清潔組合物包括:約30重量%至約50重量%之乙二醇丁醚;約20重量%至約30重量%之環丁碸;約10重量%至約45重量%之單乙醇胺;約3重量%至約15重量%之二甘醇;約0.5重量%至約10重量%之二羥基苯;及約0.5重量%至約50重量%之水。 根據本發明之用於清潔微電子基板之方法包括一種用於清潔微電子基板而不產生任何實質金屬腐蝕之方法,該基板含有至少一種光阻劑聚合材料、蝕刻殘留物及金屬殘留物,該程序包括使基板與一清潔組合物接觸達足以清潔基板之一時間,其中該清潔組合物包含:約30重量%至約50重量%之乙二醇丁醚;約20重量%至約30重量%之環丁碸;約10重量%至約45重量%之單乙醇胺;約5重量%至約15重量%之二甘醇;約0.5重量%至約10重量%之二羥基苯;及約0.5重量%至約50重量%之水。 組合物可額外地包括一或多種成分,諸如金屬絡合/耐腐蝕化合物、其他腐蝕抑制劑及表面活性劑。根據本發明之清潔微電子基板之方法尤其可用於清潔包括具有導通孔且含有金屬殘留物之鋁金屬化基板之基板,且在一實施例中金屬殘留物係來自鈦層及/或氮化鈦層之至少一者。According to the present invention, there is provided a stripping and cleaning composition for cleaning a microelectronic substrate, the composition comprising: from about 30% by weight to about 50% by weight of ethylene glycol butyl ether; from about 20% by weight to about 30% by weight Cyclobutanthene; from about 10% by weight to about 45% by weight of monoethanolamine; from about 3% by weight to about 15% by weight of diethylene glycol; from about 0.5% by weight to about 10% by weight of dihydroxybenzene; and about 0.5% by weight Up to about 50% by weight of water. The composition may additionally include one or more ingredients such as metal complexing/corrosion resistant compounds, other corrosion inhibitors, and surfactants. In one embodiment, the compositions of the present invention are used to strip and clean aluminum-containing substrates. In one embodiment, the substrate comprises an aluminum metallization substrate having via holes and containing one of the metal residues. In another embodiment, the metal residue comprises at least one layer selected from the group consisting of a titanium layer and a titanium nitride layer. In another embodiment, the stripping and cleaning composition comprises: from about 35% to about 45% by weight of ethylene glycol butyl ether; from about 24% to about 27% by weight of cyclobutyl hydrazine; about 13% by weight to About 15% by weight of monoethanolamine; about 4% by weight to about 10% by weight of diethylene glycol; about 3% by weight to about 8% by weight of dihydroxybenzene; and about 9% by weight to about 13% by weight of water. In one embodiment, the composition is used to strip and clean an aluminum-containing substrate. In one embodiment, the compositions of the invention are substantially free of hydroxylamine. In another embodiment thereof, the compositions of the invention are substantially free of N-methylpyrrolidone (NMP). In another embodiment, the present invention comprises a method for cleaning a microelectronic substrate without causing any substantial corrosion to an aluminum substrate, the process comprising contacting the substrate with a cleaning composition for a time sufficient to clean the substrate, wherein The cleaning composition comprises: from about 30% by weight to about 50% by weight of ethylene glycol butyl ether; from about 20% by weight to about 30% by weight of cyclobutyl hydrazine; from about 10% by weight to about 45% by weight of monoethanolamine; From about 0.5% by weight to about 15% by weight of diethylene glycol; from about 0.5% by weight to about 10% by weight of dihydroxybenzene; and from about 0.5% by weight to about 50% by weight of water. A method for cleaning a microelectronic substrate according to the present invention includes a method for cleaning a microelectronic substrate without any substantial metal corrosion, the substrate comprising at least one photoresist polymeric material, an etch residue, and a metal residue, The procedure includes contacting the substrate with a cleaning composition for a time sufficient to clean the substrate, wherein the cleaning composition comprises: from about 30% to about 50% by weight of ethylene glycol butyl ether; from about 20% to about 30% by weight Cyclobutyl hydrazine; from about 10% by weight to about 45% by weight of monoethanolamine; from about 5% by weight to about 15% by weight of diethylene glycol; from about 0.5% by weight to about 10% by weight of dihydroxybenzene; and about 0.5% by weight % to about 50% by weight of water. The composition may additionally include one or more ingredients such as metal complexing/corrosion resistant compounds, other corrosion inhibitors, and surfactants. The method of cleaning a microelectronic substrate according to the present invention is particularly useful for cleaning a substrate comprising an aluminum metallization substrate having via holes and containing metal residues, and in one embodiment the metal residue is from a titanium layer and/or titanium nitride. At least one of the layers.
本發明亦係關於清潔穿通微電子組件之金屬層(諸如鈦層或氮化鈦層) 之導通孔,同時可與下伏鋁結構相容(即,於微電子組件中引起極少或無金屬腐蝕)。本發明進一步係關於亦能夠清潔來自其他導通孔及來自金屬線之灰化後殘留物以及清潔或剝除來自微電子基板之未灰化光阻劑之此等清潔組合物。本發明之一進一步態樣係一種清潔或剝除來自含鋁之微電子組件之光阻劑及殘留物而不引起不適當鋁腐蝕之程序。 如本文中使用之二羥基苯包含兒茶酚(亦稱為焦兒茶酚或1,2-二羥基苯),且具有C6
H4
(OH)2
之分子式。其係三種同分異構苯二醇之鄰位異構體。現在,每年合成產生約2000萬公斤作為商品有機化學品,主要作為農藥、香料及香精之前驅體。亦可使用兒茶酚之衍生物,包含3-甲基兒茶酚、4-甲基兒茶酚及4-第三丁基兒茶酚。 本發明之組合物亦可視需要含有其他額外成分。此等選用額外成分包含金屬絡合/耐腐蝕化合物、其他腐蝕抑制劑及表面活性劑。 有機或無機螯合或金屬絡合劑/腐蝕抑制劑並非必需,但可視需要包含於本發明之組合物中,但提供實質益處,諸如(舉例而言)在併入至本發明之水性清潔組合物中時之改良產品穩定性。適合螯合或絡合劑之實例包含(但不限於)反式-1,2-環己烷二胺四乙酸(CyDTA)、乙二胺四乙酸(EDTA)、錫酸鹽、焦磷酸鹽、亞烷基-二膦酸衍生物(例如,乙烷-1-羥基-1,1-二膦酸鹽)、含乙二胺之膦酸鹽、二亞乙基三胺或三亞乙基四官能部分[例如,乙二胺四(亞甲基膦酸)(EDTMP)、二亞乙基三胺五(亞甲基膦酸)、三亞乙基四胺六(亞甲基膦酸)]。螯合劑將基於組合物之重量以自0重量%至約5重量%、較佳地自約0.1重量%至約2重量%之量存在於組合物中。 本發明之水性清潔組合物亦可視需要含有微電子清潔劑組合物中採用之其他腐蝕抑制劑及類似非腐蝕性成分。化合物可包含間苯二酚、沒食子酸、沒食子酸丙酯、焦五倍子酚、對苯二酚、苯并***及苯并***之衍生物,及多官能羧酸(諸如檸檬酸、酒石酸、葡萄糖酸、糖酸、甘油酸、草酸、鄰苯二甲酸、馬來酸、扁桃酸、丙二酸、乳酸及水楊酸)。此等其他腐蝕抑制劑可以任何適合量(通常以自約0重量%至約5重量%、較佳地自約0.1重量%至約3重量%且更佳地自約0.2重量%至約2重量%之量)存在。 本發明之組合物亦可視需要含有任何適合之水溶性兩性、非離子、陽離子或陰離子表面活性劑。添加表面活性劑將減小配方之表面張力且改良待清潔表面之潤濕且因此改良組合物之清潔作用。若期望進一步的鋁腐蝕抑制,則亦可添加表面活性劑以降低鋁腐蝕速率。可用於本發明之組合物中之兩性表面活性劑包含:甜菜鹼及磺基甜菜鹼,諸如烷基甜菜鹼、醯胺基烷基甜菜鹼、烷基磺基甜菜鹼及醯胺基烷基磺基甜菜鹼;胺基羧酸衍生物,諸如兩性甘胺酸鹽、兩性丙酸鹽、兩性二甘胺酸鹽及兩性二丙酸鹽;亞胺基二酸,諸如烷氧基烷基亞胺基二酸或烷氧基烷基亞胺基二酸;胺氧化物,諸如烷基胺氧化物及烷醯胺基烷基胺氧化物;氟烷基磺酸鹽及氟化烷基兩性表面活性劑;及其混合物。 較佳地,兩性表面活性劑係椰油醯胺丙基甜菜鹼、椰油醯胺丙基二甲基甜菜鹼、椰油醯胺丙基羥基磺基甜菜鹼、辛醯基兩性二丙酸鹽、椰油醯胺基二丙酸鹽、椰油兩性丙酸鹽、椰油兩性羥基乙基丙酸鹽、異癸基氧基丙基亞胺基二丙酸、月桂基亞胺基二丙酸鹽、椰油醯胺基丙基胺氧化物及椰油胺氧化物及氟化烷基兩性表面活性劑。可用於本發明之組合物中之非離子表面活性劑包含炔二醇、乙氧基化炔二醇、氟化烷基烷氧化物、氟化烷基酯、氟化聚氧乙烯烷醇、多羥基醇之脂肪酸酯、聚氧乙烯單烷基醚、聚氧乙烯二醇、矽氧烷型表面活性劑及烷二醇單烷基醚。較佳地,非離子表面活性劑係炔二醇或乙氧基化炔二醇。可用於本發明之組合物中之陰離子表面活性劑包含羧酸鹽、N-醯基肌胺酸鹽、磺酸鹽、硫酸鹽,及正磷酸之單酯及二酯(諸如磷酸癸酯)。 較佳地,陰離子表面活性劑係無金屬之表面活性劑。可用於本發明之組合物中之陽離子表面活性劑包含胺乙氧基化物、二烷基二甲基銨鹽、二烷基嗎啉鎓鹽、烷基苄基二甲基銨鹽、烷基三甲基銨鹽及烷基吡啶鎓鹽。較佳地,陽離子表面活性劑係無鹵素之表面活性劑。特別適合表面活性劑之實例包含(但不限於) 3,5-二甲基-1-己炔-3-醇(Surfynol-61)、乙氧基2,4,7,9-四甲基-5-癸炔-4,7-二醇(Surfynol-465)、聚四氟乙烯環氧丙基甜菜鹼(Zonyl FSK)、Zonyl FSH、Triton X-100 (即,聚乙二醇辛基苯基醚)及類似者。表面活性劑將通常基於組合物之重量以自0重量%至約5重量%、較佳地0.001重量%至約3重量%之量存在。實例
藉由下列代表性實例進一步例示(但不限制)本發明,該等實例意欲圖解說明本發明且不應解釋為對其之限制。實例 1
本發明之配方A:
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