TW201729865A - Heavy particle beam therapy system - Google Patents
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- 238000006243 chemical reaction Methods 0.000 claims description 30
- 238000002347 injection Methods 0.000 claims description 25
- 239000007924 injection Substances 0.000 claims description 25
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 claims description 4
- 229910052742 iron Inorganic materials 0.000 claims description 2
- 230000001678 irradiating effect Effects 0.000 claims 1
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- 239000000463 material Substances 0.000 description 1
- 238000000034 method Methods 0.000 description 1
- 238000002727 particle therapy Methods 0.000 description 1
- 230000005855 radiation Effects 0.000 description 1
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- 238000004904 shortening Methods 0.000 description 1
- 125000006850 spacer group Chemical group 0.000 description 1
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Abstract
Description
本發明係有關於藉由加速器將重粒子,例如碳離子予以加速至高能量為止,進而照射於腫瘍部位的重粒子線治療裝置之相關技術。 The present invention relates to a technique for a heavy particle beam therapeutic device that irradiates heavy particles, for example, carbon ions, to high energy by an accelerator, and then irradiates the tumor site.
習知之重粒子線治療裝置係具備:射入器,其係產生荷電粒子而進行預備加速;同步加速器,其係將由射入器進行預備加速後之低能量的荷電粒子加速成高能量的粒子射束;以及高能量搬送路徑,其係將由同步加速器加速後之粒子射束輸送至照射裝置為止(例如,參考專利文獻1)。該習知之重粒子線治療裝置中,射入器係設置於同步加速器的外側,使得將離子源及射入器包含於同步加速器之加速器系統的地基面積增大。 The conventional heavy particle line therapy apparatus includes an injector that generates charged particles to perform preliminary acceleration, and a synchrotron that accelerates low-energy charged particles that are pre-accelerated by the injector into high-energy particle shots. And a high-energy transport path that transports the particle beam accelerated by the synchrotron to the irradiation device (for example, refer to Patent Document 1). In the conventional heavy particle beam therapy device, the injector is disposed outside the synchrotron, so that the area of the base of the accelerator system including the ion source and the emitter included in the synchrotron is increased.
此外,同步加速器所使用之習知的偏向電磁鐵係使用銅製的常電導線圈之電磁鐵,最大磁場為軛之鐵材的磁場飽和以下,亦即2特斯拉(磁束密度)以下。因此,由於無法縮小荷電粒子的偏向半徑,故同步加速器係形成大徑化,且加速器系統之地基面積增大。 Further, a conventional biasing electromagnet used in the synchrotron uses an electromagnet of a constant electric conducting coil made of copper, and the maximum magnetic field is equal to or less than the magnetic field of the iron material of the yoke, that is, 2 Tesla (magnetic flux density) or less. Therefore, since the deflection radius of the charged particles cannot be reduced, the synchrotron is formed to have a large diameter, and the ground area of the accelerator system is increased.
有鑑於如此之狀況,則提案將離子源及射 入器設置於多拿滋(環)型之同步加速器的內周側,而縮小加速器系統之地基面積的習知之重粒子線治療裝置(例如,參考非專利文獻1)。 In view of such a situation, the proposal will ion source and shoot A conventional heavy particle beam treatment device in which the inlet is disposed on the inner peripheral side of the cistern accelerator of the venous (ring) type and the base area of the accelerator system is reduced (for example, refer to Non-Patent Document 1).
另一方面,將H+離子加速至高能量為止而照射於腫瘍部位的習知之重粒子線治療裝置,其係使用不需要射入器之迴旋加速器或同步迴旋加速器,以取代同步加速器,而達成小型化之系統(例如,參考專利文獻2)。 On the other hand, a conventional heavy particle beam therapy device that irradiates a high-energy H-ion to a tumor site uses a cyclotron or a synchrocyclotron that does not require an injector to replace the synchrotron and achieve miniaturization. The system (for example, refer to Patent Document 2).
此外,使用同步加速器的習知之質子線治療裝置,其係提案將同步加速器設置於多拿滋(環)型之同步加速器的內周側,且將該同步加速器作為射入器來使用而達成小型化之系統(例如,參考專利文獻3)。由於該習知之質子線治療裝置係將同步加速器作為射入器來使用故藉由同步加速器將離子源所產生之H-離子予以初期加速至同步加速器能加速之能量為止,且藉由設置於迴旋加速器和同步加速器之間的射束輸送路徑的荷電極性變換裝置,將H-離子的極性反轉成H+離子之後,射入於同步加速器。 Further, a conventional proton therapy device using a synchrotron is proposed to provide a synchrotron on the inner circumference side of a dorazo (ring) type synchrotron, and use the synchrotron as an injector to achieve a small size. System (for example, refer to Patent Document 3). Since the conventional proton therapy device uses the synchrotron as an emitter, the H-ion generated by the ion source is initially accelerated by the synchrotron to the energy that the synchrotron can accelerate, and is set by the maneuver. The charge polarity conversion device of the beam transport path between the accelerator and the synchrotron reverses the polarity of the H-ion to H+ ions and then enters the synchrotron.
專利文獻1:專利第3993338號公報 Patent Document 1: Patent No. 3993338
專利文獻2:專利第3472657號公報 Patent Document 2: Patent No. 3472657
專利文獻3:特開平10-50500號公報 Patent Document 3: Japanese Patent Publication No. 10-50500
非專利文獻1:E. Takashita, et. al., “COMMISSIONING REPORT OF KANAGAWA CANCER CENTER”, Proceedings of the 12th Annual Meeting of Particle Accelerator Society of Japan, Tsuruga, Japan, 2015, August 5-7, p. 361-364 Non-Patent Document 1: E. Takashita, et. al., "COMMISSIONING REPORT OF KANAGAWA CANCER CENTER", Proceedings of the 12th Annual Meeting of Particle Accelerator Society of Japan, Tsuruga, Japan, 2015, August 5-7, p. 361 -364
非專利文獻1之習知之重粒子線治療裝置係將射入器設置於同步加速器的內周側,以達成加速器系統之地基面積的縮小。但是,由於射入器係線形加速器,且必需將荷電粒子加速至同步加速器能加速之能量為止,故射入器的全長係變長。此外,由於偏向電磁鐵係由使用常電導線圈的電磁鐵所構成,故荷電粒子的偏向半徑較大,而無法縮短同步加速器的周長。因此,非專利文獻1之習知之重粒子線治療裝置係無法達成加速器系統的小型化。 The conventional heavy particle beam therapy apparatus of Non-Patent Document 1 mounts an injector on the inner peripheral side of the synchrotron to achieve a reduction in the ground area of the accelerator system. However, since the injector is a linear accelerator and it is necessary to accelerate the charged particles to the energy that the synchrotron can accelerate, the total length of the injector is long. Further, since the deflecting electromagnet is constituted by an electromagnet using a constant conducting coil, the biasing radius of the charged particles is large, and the circumference of the synchrotron cannot be shortened. Therefore, the conventional heavy particle line treatment apparatus of Non-Patent Document 1 cannot achieve miniaturization of the accelerator system.
有鑑於如此之狀況,則嘗試由使用超電導線圈的電磁鐵而構成偏向電磁鐵,產生超過2特斯拉(磁束密度)的強磁場而縮小荷電粒子的偏向半徑,且縮短同步加速器的周長而達成加速器系統的小型化。 In view of such a situation, an electromagnet using a superconducting coil is used to construct a deflecting electromagnet, and a strong magnetic field exceeding 2 Tesla (magnetic flux density) is generated to reduce the deflection radius of the charged particles and shorten the circumference of the synchrotron. Achieve miniaturization of the accelerator system.
但是,由於藉由使用超電導線圈的電磁鐵而構成偏向電磁鐵,且能蓄積於周長被縮短的同步加速器(以下,作成超電導同步加速器)的荷電粒子數減少,故必需將離子源所產生的荷電粒子數增大。此外,在超電導同 步加速器內,為了防止增大的荷電粒子之間的反發力(空間荷電效果)所造成的射束損失,則必需將射入器之初期加速能量增大。基於此等因素,由離子產生源及線形加速器所構成之射入器的全長即增大。或者,必需將線形加速器的台數增多,使得射入器的全長增大。其結果,即使能實現超電導同步加速器的小型化,亦存在有無法將離子源及射入器設置於超電導同步加速器的內周側,且反而使加速器系統之地基面積增大之新的課題。 However, since the electromagnet of the superconducting coil is used to form the deflecting electromagnet, and the number of charged particles that can be accumulated in the synchrotron whose circumference is shortened (hereinafter, the superconducting synchrotron is reduced) is reduced, it is necessary to generate the ion source. The number of charged particles increases. In addition, in the superconducting In the step accelerator, in order to prevent the beam loss caused by the increased counter force (space charging effect) between the charged particles, it is necessary to increase the initial acceleration energy of the injector. Based on these factors, the total length of the injector composed of the ion generating source and the linear accelerator increases. Alternatively, it is necessary to increase the number of linear accelerators so that the total length of the injector is increased. As a result, even if the size of the superconducting synchrotron can be reduced, there is a new problem that the ion source and the emitter cannot be disposed on the inner peripheral side of the superconducting synchrotron, and the ground area of the accelerator system is increased.
此處,迴旋加速器係能藉由作成連續射束而增加荷電粒子數。但,同步加速器在原理上係無法射入連續射束。此外,重粒子線治療裝置係無法將質子線治療裝置所進行之加速粒子的極性予以反轉。基於此等因素,習知之質子線治療裝置所使用之迴旋加速器係無法被採用於重粒子線治療裝置之加速器系統的射入器。 Here, the cyclotron can increase the number of charged particles by making a continuous beam. However, the synchrotron is not capable of injecting a continuous beam in principle. In addition, the heavy particle beam therapy device cannot reverse the polarity of the accelerated particles by the proton therapy device. Based on these factors, the cyclotron system used in the conventional proton therapy device cannot be used in the injector of the accelerator system of the heavy particle therapy device.
本發明係為了解決上述之課題而創作,其目的為取得重粒子線治療裝置,其係將使用超電導線圈的電磁鐵採用於偏向電磁鐵而縮短周長的超電導同步加速器、以及由使用相位穩定性原理的圓形加速器所構成的射入器予以組合,而能縮小加速器系統之地基面積。 The present invention has been made to solve the above problems, and an object of the invention is to obtain a heavy particle beam therapy apparatus which uses an electromagnet using a superconducting coil to bias a electromagnet to shorten a circumference of a superconducting synchrotron, and to use phase stability. The principle of the circular accelerator consists of an injector that combines to reduce the ground area of the accelerator system.
本發明之重粒子線治療裝置係具備:離子源,其係產生變換前荷電粒子;射入器,其係將上述離子源所產生之上述變換前荷電粒子予以初期加速至低能量為止;同步加速器,其係將上述射入器所加速之上述變換前 荷電粒子進行荷電變換而取得之變換後荷電粒子加速至高能量;照射裝置,其係設置於治療室;以及高能量搬送路徑,其係自上述同步加速器將高能量的上述變換後荷電粒子搬送至上述治療室之上述照射裝置。上述射入器係使用相位穩定性原理之圓形加速器,上述同步加速器係將具有超電導線圈之超電導電磁鐵作為偏向電磁鐵而使用,並且具有將上述變換前荷電粒子變換成荷電子數不同的上述變換後荷電粒子之正離子荷電變換裝置之超電導同步加速器,上述離子源及上述圓形加速器係設置於上述超電導同步加速器的內周側。 The heavy particle beam therapy apparatus according to the present invention includes: an ion source that generates pre-conversion charge particles; and an emitter that accelerates the pre-conversion charge particles generated by the ion source to a low energy; the synchrotron , which is the above-mentioned transformation before the above-mentioned injector is accelerated The charged particles are charged to the high energy after the conversion of the charged particles; the irradiation device is disposed in the treatment room; and the high energy transport path is configured to transfer the high energy converted particles from the synchrotron to the synchrotron The above irradiation device of the treatment room. The emitter is a circular accelerator using a phase stability principle, and the synchrotron uses a superconducting electromagnet having a superconducting coil as a deflecting electromagnet, and has the above-described converted pre-charged particles converted into charged electron numbers. A superconducting synchrotron of a positive ion charge converting device for converting charged particles, wherein the ion source and the circular accelerator are disposed on an inner circumference side of the superconducting synchrotron.
根據本發明,由於使用超電導同步加速器作為同步加速器,故能縮短周長而達成小型化。此外,由於使用相位穩定性原理之圓形加速器作為射入器,故能將多數的粒子數射入超電導同步加速器。據此,即能將離子源及圓形加速器設置於超電導同步加速器的內周側,且達成將離子源及圓形加速器包含於超電導同步加速器而構成的加速器系統之小型化,能縮小加速器系統之地基面積。 According to the present invention, since the superconducting synchrotron is used as the synchrotron, the circumference can be shortened and the size can be reduced. In addition, since a circular accelerator using the principle of phase stability is used as an injector, a large number of particles can be incident on the superconducting synchrotron. According to this, the ion source and the circular accelerator can be disposed on the inner peripheral side of the superconducting synchrotron, and the accelerator system including the ion source and the circular accelerator included in the superconducting synchrotron can be miniaturized, and the accelerator system can be reduced. Foundation area.
1‧‧‧離子源 1‧‧‧Ion source
2‧‧‧圓形加速器 2‧‧‧Circular accelerator
3‧‧‧超電導同步加速器 3‧‧‧Superconducting Synchrotron
4‧‧‧真空導管 4‧‧‧vacuum catheter
4a‧‧‧真空導管部 4a‧‧‧vacuum ducts
5、5A‧‧‧射入裝置 5, 5A‧‧‧Injection device
6‧‧‧間隔電磁鐵 6‧‧‧Interval electromagnet
7‧‧‧正離子荷電變換裝置 7‧‧‧Positive ion charge conversion device
8、81、82、83、84、9、207‧‧‧偏向電磁鐵 8, 8 1 , 8 2 , 8 3 , 8 4 , 9, 207‧‧‧ bias electromagnet
10‧‧‧收束用電磁鐵 10‧‧‧Electrical magnets for converging
11‧‧‧高頻加速空洞 11‧‧‧High frequency acceleration cavity
12‧‧‧射出裝置 12‧‧‧Injection device
13‧‧‧低能量搬送路徑 13‧‧‧Low energy transport path
14‧‧‧偏向電磁鐵 14‧‧‧ biased electromagnet
20、21‧‧‧射束旁路 20, 21‧‧ ‧beam bypass
100‧‧‧重粒子線治療裝置 100‧‧‧heavy particle line treatment device
201‧‧‧加速器系統 201‧‧‧Accelerator System
202‧‧‧治療室 202‧‧‧ treatment room
203‧‧‧照射裝置 203‧‧‧Irrigation device
204‧‧‧高能量輸送路徑 204‧‧‧High energy transport path
205‧‧‧真空導管 205‧‧‧vacuum catheter
206‧‧‧切換電磁鐵 206‧‧‧Switching electromagnet
qc、qi‧‧‧荷電粒子 Qc, qi‧‧‧charged particles
T、Tr‧‧‧週期 T, Tr‧‧ cycle
Tw‧‧‧時間範圍 Tw‧‧‧ time range
第1圖說明本發明之實施形態1的重粒子線治療裝置的構成之示意圖。 Fig. 1 is a schematic view showing the configuration of a heavy particle beam therapy apparatus according to a first embodiment of the present invention.
第2圖表示使用於本發明之實施形態1的重粒子線治療裝置的加速器系統的構成之示意圖。 Fig. 2 is a view showing the configuration of an accelerator system used in the heavy particle beam therapy system according to the first embodiment of the present invention.
第3圖表示使用於本發明之實施形態1的重粒子線治療裝置的加速器系統之射入裝置的構成之示意圖。 Fig. 3 is a view showing the configuration of an injection device of an accelerator system used in the heavy particle beam therapy system according to the first embodiment of the present invention.
第4圖說明使用於本發明之實施形態1的重粒子線治療裝置的加速器系統之射入裝置的荷電粒子之射入角度之圖示。 Fig. 4 is a view showing the angle of incidence of charged particles of the injection device of the accelerator system used in the heavy particle beam therapy device according to the first embodiment of the present invention.
第5圖表示迴旋加速器、以及同步迴旋加速器的輸出射束波形之圖示。 Figure 5 shows an illustration of the output beam waveform of the cyclotron and the synchrocyclotron.
第6圖表示施加於高頻加速空洞的高頻電壓波形之圖示。 Fig. 6 is a view showing a waveform of a high-frequency voltage applied to a high-frequency acceleration cavity.
第7圖表示使用於本發明之實施形態2的重粒子線治療裝置的加速器系統的構成之示意圖。 Fig. 7 is a view showing the configuration of an accelerator system used in the heavy particle beam therapy apparatus according to the second embodiment of the present invention.
第1圖係說明本發明之實施形態1的重粒子線治療裝置的構成之示意圖,第2圖係表示使用於本發明之實施形態1的重粒子線治療裝置的加速器系統的構成之示意圖。 1 is a schematic view showing a configuration of a heavy particle beam therapy device according to a first embodiment of the present invention, and FIG. 2 is a schematic view showing a configuration of an accelerator system used in the heavy particle beam therapy device according to the first embodiment of the present invention.
在第1圖當中,重粒子線治療裝置100係具備:加速器系統201,其係成為荷電粒子射束的供應源;照射裝置203,其係設置於各治療室202;以及高能量輸送路徑204,其係連結加速器系統201及照射裝置203,且自加速器系統201將荷電粒子射束搬送至各治療室202之照射裝置203。此處,為了方便於說明,以射入的荷電粒子之C4+離子,迴旋的荷電粒子之C6+離子為例而說明。此外,變換前荷電粒子為C4+離子,變換後荷電粒子為 C6+離子。 In the first embodiment, the heavy particle beam therapy apparatus 100 includes an accelerator system 201 that serves as a supply source of charged particle beams, an irradiation device 203 that is disposed in each of the treatment rooms 202, and a high-energy delivery path 204. The accelerator system 201 and the irradiation device 203 are connected, and the charged particle beam is transported from the accelerator system 201 to the irradiation device 203 of each treatment room 202. Here, for convenience of explanation, the C6+ ion of the charged charged particles and the C6+ ion of the swirled charged particles will be described as an example. In addition, the charged particles before conversion are C4+ ions, and the charged particles after conversion are C6+ ion.
加速器系統201係由離子源1、作為射入器之圓形加速器2、以及超電導同步加速器3所構成。離子源1係例如由反射鏡線圈及6極電磁鐵所構成之ECR(Electron Cycrotron Resonance;電子迴旋共振)離子源,且導入甲烷而產生C4+離子。圓形加速器2係使用相位穩定性原理之同步迴旋加速器。C4+離子係射入於同步迴旋加速器的中心部,例如,初期加速至8Me V/u為止。 The accelerator system 201 is composed of an ion source 1, a circular accelerator 2 as an injector, and a superconducting synchrotron 3. The ion source 1 is, for example, an ECR (Electron Cycrotron Resonance) ion source composed of a mirror coil and a 6-electromagnet, and introduces methane to generate C4+ ions. The circular accelerator 2 is a synchronous cyclotron using the principle of phase stability. The C4+ ion is incident on the center of the synchrocyclotron, for example, at an initial acceleration of 8 Me V/u.
超電導同步加速器3係具備:環狀的真空導管4,其係使C6+離子迴旋;射入裝置5,其係將圓形加速器2所供應的C4+離子射入至真空導管4內的迴旋射束軌道A;偏向電磁鐵9,其係以C6+離子能沿著真空導管4內的迴旋射束軌道A而迴旋之方式,將C6+離子的軌道予以偏向;收束用電磁鐵10,其係以能不使將迴旋射束軌道A上迴旋之C6+離子不發散之方式而予以收束;高頻加速空洞11,其係供應同步於迴旋之C6+離子的高頻電壓;以及射出裝置12,其係將真空導管4內的迴旋射束軌道A予以迴旋而加速之C6+離子取出至真空導管4外側,且射出至高能量輸送路徑204。 The superconducting synchrotron 3 includes an annular vacuum duct 4 for swirling C6+ ions, and an injection device 5 for injecting C4+ ions supplied from the circular accelerator 2 into the swirling beam orbit in the vacuum duct 4. A; a biasing electromagnet 9 which deflects the orbit of C6+ ions in such a manner that C6+ ions can be swirled along the orbiting beam orbit A in the vacuum conduit 4; the electromagnet 10 for converging is capable of The C6+ ions which are convoluted on the orbiting beam A are not diverged; the high frequency accelerating cavity 11 is supplied with a high frequency voltage synchronized with the convoluted C6+ ions; and the injection device 12 is vacuumed The gyroscopic beam orbit A in the duct 4 is swirled and the accelerated C6+ ions are taken out to the outside of the vacuum duct 4 and ejected to the high energy transport path 204.
偏向電磁鐵9係使用超電導線圈的超電導電磁鐵。偏向電磁鐵9係於圓周方向互相分離而設置複數台於真空導管4,產生超過2特斯拉(磁束密度)的強磁場而將迴旋真空導管4之C6+離子的軌道予以偏向,且沿著真空導管4內的迴旋射束軌道A而將C6+離子予以迴旋。 真空導管4係在偏向電磁鐵9的設置部將直線狀的真空導管部4a結合而構成環狀。收束用電磁鐵10係由四極電磁鐵所構成,且設置於相鄰之偏向電磁鐵9之間的各真空導管部4a。高頻加速空洞11係設置於相鄰之偏向電磁鐵9之間的真空導管部4a。 The deflecting electromagnet 9 is a superconducting electromagnet using a superconducting coil. The deflecting electromagnets 9 are separated from each other in the circumferential direction to provide a plurality of stages in the vacuum duct 4, generating a strong magnetic field exceeding 2 Tesla (magnetic flux density) to deflect the orbit of the C6+ ions of the cycloidal vacuum conduit 4, and along the vacuum The C6+ ions are swirled by the swirling beam orbit A in the conduit 4. The vacuum duct 4 is formed in a ring shape by joining the linear vacuum duct portions 4a in the installation portion of the deflecting electromagnet 9. The collecting electromagnet 10 is composed of a quadrupole electromagnet and is provided in each of the vacuum conduit portions 4a between the adjacent deflecting electromagnets 9. The high-frequency acceleration hole 11 is provided in the vacuum duct portion 4a between the adjacent deflecting electromagnets 9.
射入裝置5係由下列所構成:射束旁路20;間隔電磁鐵6,其係將圓形加速器2所供應的C4+離子的軌道予以偏向而射入至射束旁路20內;正離子荷電變換裝置7,其係將射入至射束旁路20內之C4+離子藉由正離子荷電變換法而變換成C6+離子;以及4個偏向電磁鐵8,其係將C4+離子的軌道予以偏向而導入於正離子荷電變換裝置7,並且將荷電變換之C6+離子的軌道予以偏向而回到真空導管4。該正離子荷電變換裝置7係將電子附加於C4+離子,不改變電荷的極性而改變電荷質量比。 The injection device 5 is composed of the following: a beam bypass 20; a spacing electromagnet 6 that deflects the orbit of the C4+ ions supplied by the circular accelerator 2 into the beam bypass 20; a charge conversion device 7 for converting C4+ ions incident into the beam bypass 20 into C6+ ions by positive ion charge conversion; and four deflection electromagnets 8, which bias the orbit of C4+ ions The positive ion charge conversion device 7 is introduced, and the orbit of the charge-converted C6+ ion is deflected to return to the vacuum conduit 4. The positive ion charge converting device 7 adds electrons to the C4+ ions, and changes the charge mass ratio without changing the polarity of the charges.
繼而使用第3圖及第4圖而具體的說明有關於射入裝置5的構成。第3圖係表示使用於本發明之實施形態1的重粒子線治療裝置的加速器系統之射入裝置的構成之示意圖,第4圖係說明使用於本發明之實施形態1的重粒子線治療裝置的加速器系統之射入裝置的荷電粒子之射入角度之圖示。又,在第3圖及第4圖當中,qc係迴旋的荷電粒子,亦即C6+離子,qi係射入的荷電粒子,亦即C4+離子。此外,為了方便於說明,依射入裝置5的排列順序而將81、82、83、84附加於4個偏向電磁鐵8。 Next, the configuration of the injection device 5 will be specifically described using FIGS. 3 and 4 . 3 is a schematic view showing a configuration of an injection device of an accelerator system used in the heavy particle beam therapy device according to the first embodiment of the present invention, and FIG. 4 is a view showing a heavy particle beam therapy device used in the first embodiment of the present invention. An illustration of the angle of incidence of charged particles of the injection device of the accelerator system. Further, in Fig. 3 and Fig. 4, qc is a charged particle which is swirled, that is, C6+ ion, and qi is a charged particle, that is, C4+ ion. Further, for convenience of explanation, 8 1 , 8 2 , 8 3 , and 8 4 are added to the four deflection electromagnets 8 in accordance with the arrangement order of the injection device 5.
射束旁路20係自真空導管4的真空導管部 4a而分歧於內周側,和真空導管部4a平行而通過真空導管部4a的內周側,且自內周側而連結於真空導管部4a。4個偏向電磁鐵81~84係設置於射束旁路20的從真空導管部4a分歧之分歧部、和真空導管部4a平行的部分之兩端部、以及和真空導管部4a連結之連結部。 The beam bypass 20 is branched from the vacuum duct portion 4a of the vacuum duct 4 on the inner peripheral side, and passes through the inner peripheral side of the vacuum duct portion 4a in parallel with the vacuum duct portion 4a, and is connected to the vacuum duct portion from the inner peripheral side. 4a. The four deflecting electromagnets 8 1 to 8 4 are provided at both end portions of the beam bypass 20 which are branched from the vacuum duct portion 4a and which are parallel to the vacuum duct portion 4a, and are connected to the vacuum duct portion 4a. Linkage.
射束旁路20係將迴旋於射束軌道A之荷電粒子qc藉由偏向電磁鐵81而偏向於內周側,繼而藉由偏向電磁鐵82而偏向於外周側,形成和迴旋射束軌道A略為平行之軌道,繼而藉由偏向電磁鐵83而偏向於外周側,繼而藉由偏向電磁鐵84而偏向於內周側,且回到迴旋射束軌道A之構成。此外,藉由間隔電磁鐵6所偏向之荷電粒子qi係在偏向電磁鐵8的位置而射入於射束旁路20。正離子荷電變換裝置7係設置於射束旁路20的偏向電磁鐵83和偏向電磁鐵84之間,且將荷電粒子qi變換成荷電粒子qc。 The cyclotron beam bypass line 20 to charged particle beam orbit qc A deflection by the deflection electromagnet 81 and the inner circumferential side, followed by the electromagnet 82 and biased toward the outer circumferential side, and swing beam forming A somewhat parallel to the rail track, and then by the electromagnet 83 and biased toward the outer circumferential side, followed by the electromagnet 84 and deflection toward the inner periphery side, and back to the A constituting swirl beam orbit. Further, the charged particles qi deflected by the spacer electromagnet 6 are incident on the beam bypass 20 at a position biased toward the electromagnet 8. Positive ion charge conversion means 7 is provided to the beam line toward the bypass 83 and the electromagnet 20 between the deflection electromagnet 84, electrically charged particles and the charged particles into qi qc.
荷電粒子qc係如第4圖所示,藉由磁場固定的偏向電磁鐵83而僅偏向角度θc於外周側。另一方面,荷電粒子qi係如第4圖所示,藉由磁場固定的偏向電磁鐵83而僅偏向角度θi於外周側。此處,由於荷電粒子qc和荷電粒子qi的價數並不相同,故偏向電磁鐵83所產生之相同磁場的偏向角度亦不相同。因此,藉由偏向電磁鐵83而偏向之荷電粒子qi係以能進入藉由偏向電磁鐵83所偏向之荷電粒子qc的軌道之方式,設定往荷電粒子qi的射束旁路20的射入角度。 Charged particles qc system shown in Figure 4, the fixed magnetic field by the electromagnet 83 only deflecting the deflection angle θc on the outer peripheral side. On the other hand, charged particles qi system as shown in FIG. 4, the fixed magnetic field by the electromagnet 83 only deflecting the deflection angle θi to the outer circumferential side. Here, since the valence of charged particles and charged particles qi qc is not the same, so that the same deflection angle of deflection magnetic field generated by the electromagnet 83 nor the same. Thus, the electromagnet 83 by deflecting the charged particles is deflected at line qi can enter by way of deflecting electromagnets 83 qc slant to the charged particle orbit, to set exit charged particle beam bypass qi 20 Into the angle.
由於荷電粒子qc(C6+離子)的價數係多於 荷電粒子qi(C4+離子)的價數,故荷電粒子qc之藉由偏向電磁鐵83而偏向之角度θc係大於荷電粒子qc之藉由偏向電磁鐵83而偏向之角度θi。因此,無法直接自內周側將荷電粒子qi射入於迴旋射束軌道A,亦即真空導管4。實施形態1係藉由4個偏向電磁鐵81~84,構成自真空導管4迂迴於內周側而回到真空導管4之射束旁路20,並實現來自荷電粒子qi的內周側之射入動作。 Since the charged particles qc (C6 + ions) valence based more charged particles qi (C4 + ions) valence, so the charged particles qc of by deflection electromagnets 83 and deflection of the angle θc based greater than by charged particles qc of charge deflection electromagnet 83 and the deflection angle θi. Therefore, it is not possible to directly inject the charged particles qi from the inner peripheral side into the swirling beam orbit A, that is, the vacuum duct 4. In the first embodiment, the four deflection electromagnets 8 1 to 8 4 are formed so as to return from the vacuum conduit 4 to the inner peripheral side and return to the beam bypass 20 of the vacuum conduit 4, and the inner peripheral side from the charged particles qi is realized. The injection action.
該加速器系統201中,自圓形加速器2輸出之C4+離子係藉由偏向電磁鐵14將軌道予以偏向而通過低能量搬送路徑13,且自超電導同步加速器3的內周側供應至射入裝置5。此外,供應至射入裝置5之C4+離子係藉由間隔電磁鐵6而偏向,且在偏向電磁鐵83的位置而射入於射束旁路20。因此,C4+離子係藉由偏向電磁鐵83而偏向於外周側,且進入射束旁路20內之C6+離子的軌道,並藉由正離子荷電變換裝置7而荷電變換成C6+離子。繼而C6+離子係藉由偏向電磁鐵84而偏向於內周側,且進入真空導管4內之迴旋射束軌道A。 In the accelerator system 201, the C4+ ions outputted from the circular accelerator 2 are deflected by the deflecting electromagnet 14 to pass through the low-energy transport path 13 and supplied from the inner peripheral side of the superconducting synchrotron 3 to the injection device 5. . In addition, the supply unit 5 is incident to the C4 + ions by line spacing electromagnet 6 is deflected, and the position of the deflection electromagnet 83 is incident to the beam 20 pass. Thus, ionic C4 + by the electromagnet 83 and biased toward the outer circumferential side, and into the C6 + ions of the beam bypass track 20, and charged by the positive ion charge conversion device 7 is converted into C6 + ions. C6 + ions followed by line deflection electromagnet 84 biased to the inner peripheral side, and into the vacuum duct 4 of the swirl within the beam orbit A.
另一方面,C6+離子係將真空導管4內之迴旋射束軌道A予以迴旋,且加速至高能量。此外,在C4+離子的射入時,將迴旋射束軌道A予以迴旋之C6+離子係藉由偏向電磁鐵81而偏向於內周側,且自迴旋射束軌道A分歧而進入射束旁路20。繼而藉由偏向電磁鐵82而偏向於外周側且將軌道角度返回原點,並且藉由偏向電磁鐵83而偏向於外周側。繼而藉由偏向電磁鐵84而偏向於內周側, 且回到真空導管4內之迴旋射束軌道A。 On the other hand, the C6+ ion system rotates the swirling beam orbit A in the vacuum conduit 4 and accelerates to high energy. Further, when the incident C4 + ion beam orbit A swirling of the swirling C6 + ions to be based by deflecting the beam toward the bypass solenoid 81 and the inner peripheral side, and since the cyclotron beam orbit divided into A 20. Followed by the electromagnet 82 and biased toward the outer circumferential side rail and the return to the origin angle, and by the electromagnet 83 and biased toward the outer circumferential side. Followed by the electromagnet 84 and deflection toward the inner periphery side, and back to the vacuum duct 4 of the swirl within the beam orbit A.
繼而說明有關於作為圓形加速器2而使用同步迴旋加速器的功效。第5圖係表示迴旋加速器、以及同步迴旋加速器的輸出射束波形之圖示。 Next, the effect of using the synchrocyclotron as the circular accelerator 2 will be explained. Figure 5 is a graphical representation of the output beam waveform of a cyclotron and a synchrocyclotron.
迴旋加速器係如第5圖所示,輸出連續射束。另一方面,同步迴旋加速器係如第5圖所示,輸出1m秒等級間隔之脈衝射束。一般而言,由於同步迴旋加速器係使用高頻加速裝置的相位穩定性原理,故其輸出的電流峰值為高於迴旋加速器之輸出的電流峰值。 The cyclotron system outputs a continuous beam as shown in Fig. 5. On the other hand, the synchrocyclotron outputs a pulse beam of 1 m second-level interval as shown in Fig. 5. In general, since the synchrocyclotron uses the phase stability principle of the high-frequency acceleration device, the peak value of the output current is a current peak higher than the output of the cyclotron.
超電導同步加速器3係決定接收射入射束的時間。例如,第5圖中,Tw作成接收超電導同步加速器3之射入射束的時間範圍時,則來自同步迴旋加速器的一方即為能藉由來自同步迴旋加速器的輸出而射入的全部電流量,亦即粒子數變多。因此,若使用同步迴旋加速器作為圓形加速器2,則由於能射入於超電導同步加速器3之粒子數增大,故能解決起因於縮短超電導同步加速器3的周長而能蓄積之粒子數減少的課題。 The superconducting synchrotron 3 determines the time at which the incident beam is received. For example, in FIG. 5, when Tw is made to receive the time range of the incident beam of the superconducting synchrotron 3, the one from the synchrocyclotron is the total amount of current that can be injected by the output from the synchrocyclotron. That is to say, the number of particles increases. Therefore, when the synchrocyclotron is used as the circular accelerator 2, the number of particles that can be incident on the superconducting synchrotron 3 is increased, so that the number of particles that can be accumulated due to the shortening of the circumference of the superconducting synchrotron 3 can be solved. Question.
繼而說明有關於使用相位穩定性原理之同步迴旋加速器的動作。第6圖係表示施加於高頻加速空洞的高頻電壓波形之圖示。在第6圖當中,縱軸為電壓值,橫軸為時間。 Next, the operation of the synchrocyclotron using the principle of phase stability will be described. Fig. 6 is a view showing a waveform of a high-frequency voltage applied to a high-frequency acceleration cavity. In Fig. 6, the vertical axis is the voltage value and the horizontal axis is the time.
高頻加速空洞11係施加正弦波狀的高頻電壓。此處,將同步於該高頻電壓之同步粒子的相位作成s,將該週期作成Tr時,則該s係在π/2及π之間。此外, 由於在較s而相位更前進之a點,自高頻加速空洞11接收之能量係大於同步粒子所接收之能量,故該週期T係較週期Tr為更長。其結果,該粒子係在下一個週期的b點接收能量,同步粒子在下一個週期則接近接收能量之週期s。 The high-frequency acceleration cavity 11 applies a sinusoidal high-frequency voltage. Here, the phase of the synchronous particles synchronized with the high frequency voltage is made. s, when the cycle is made to Tr, then s is between π/2 and π. In addition, due to The point at which the phase advances further, the energy received from the high frequency acceleration cavity 11 is greater than the energy received by the synchronous particles, so the period T is longer than the period Tr. As a result, the particle receives energy at point b of the next cycle, and the synchronized particle approaches the period of received energy in the next cycle. s.
相反的,雖未圖示,但是,由於粒子係在較s相位更遲緩之點,自高頻加速空洞11接收之能量係小於同步粒子所接收之能量,故該週期T係較週期Tr為更短。其結果,該粒子係在下一個週期接收能量的點,同步粒子係在下一個週期則接近接收能量之週期s。 On the contrary, although not shown, the particle system is The point where the s phase is more sluggish, the energy received from the high-frequency acceleration cavity 11 is smaller than the energy received by the synchronous particles, so the period T is shorter than the period Tr. As a result, the particle is at the point where energy is received in the next cycle, and the synchronized particle is close to the period of receiving energy in the next cycle. s.
如此,以同步相位s為中心而振動相位。亦即,某個範圍的相位之粒子係自動的和加速高頻取得同步。因此,在高頻的相位之範圍內,僅通過高頻加速空洞11之粒子係正常被加速,且同步迴旋加速器係能輸出脈衝射束。 Synchronous phase s is centered and vibrates in phase. That is, the particles of a certain range of phases are automatically synchronized with the acceleration of the high frequency. Therefore, in the range of the phase of the high frequency, only the particle system of the high-frequency acceleration cavity 11 is normally accelerated, and the synchrocyclotron system can output the pulse beam.
高能量輸送路徑204係具備:真空導管205,其係形成自加速器系統201所取出之C6+離子的輸送路徑;切換電磁鐵206,其係切換C6+離子的射束軌道;以及偏向電磁鐵207,其係將C6+離子的射束軌道予以偏向。此外,進入真空導管205內之C6+離子係因應於需求而使用切換電磁鐵206改變該射束軌道,並導入設置於指定的治療室202之照射裝置203,且照射於腫瘍部位。 The high energy transmission path 204 includes a vacuum conduit 205 that forms a transport path for C6+ ions taken out from the accelerator system 201, a switching electromagnet 206 that switches a beam trajectory of C6+ ions, and a biasing electromagnet 207. The beam orbit of the C6+ ion is biased. Further, the C6+ ion entering the vacuum duct 205 changes the beam trajectory using the switching electromagnet 206 as needed, and introduces it into the irradiation device 203 provided in the designated treatment room 202, and irradiates the tumor portion.
如此,由於實施形態1的加速器系統201係使用超電導同步加速器3作為同步加速器,故能縮短超 電導同步加速器3的周長,且達成小型化。此外,由於使用同步迴旋加速器作為同步加速器而作為圓形加速器2,故能將多數的粒子數射入於超電導同步加速器3。因此,能將離子源1、以及圓形加速器2設置於超電導同步加速器3的內周側,且達成加速器系統201的小型化。 As described above, since the accelerator system 201 of the first embodiment uses the superconducting synchrotron 3 as the synchrotron, it is possible to shorten the super The circumference of the synchrotron 3 is electrically controlled and miniaturized. Further, since the synchrocyclotron is used as the synchrotron as the circular accelerator 2, a large number of particles can be incident on the superconducting synchrotron 3. Therefore, the ion source 1 and the circular accelerator 2 can be disposed on the inner peripheral side of the superconducting synchrotron 3, and the size of the accelerator system 201 can be reduced.
此外,將荷電粒子的荷電子數予以變換之正離子荷電變換裝置7係設置於射束旁路20,且將射入於射束旁路20之C4+離子變換成C6+離子。因此,由於將迴旋之C6+離子、以及射入之C4+離子的固定磁場之偏向角度的差異利用於C4+離子的射入,故不會將射入裝置5作成複雜的構成,且能將C4+離子射入於周長縮短之超電導同步加速器3。 Further, the positive ion charge conversion device 7 that converts the number of charges of the charged particles is provided in the beam bypass 20, and the C4+ ions incident on the beam bypass 20 are converted into C6+ ions. Therefore, since the difference in the deflection angle of the C6+ ion of the convolution and the fixed magnetic field of the incident C4+ ion is utilized for the injection of the C4+ ion, the injection device 5 is not complicated, and the C4+ ion can be injected. Enter the superconducting synchrotron 3 with a shortened circumference.
此外,由於離子源1係設置於圓形加速器2的外周側,故能僅選擇C4+離子而作為加速粒子,且能減低圓形加速器2內的放射污染。此外,由於重粒子線治療裝置100係使用加速器系統201,故能縮小加速器系統201的地基面積,且能減低重粒子線治療設施的建設成本。 Further, since the ion source 1 is provided on the outer peripheral side of the circular accelerator 2, only C4+ ions can be selected as the accelerated particles, and the radiation contamination in the circular accelerator 2 can be reduced. Further, since the heavy particle beam treatment apparatus 100 uses the accelerator system 201, the area of the foundation of the accelerator system 201 can be reduced, and the construction cost of the heavy particle line treatment facility can be reduced.
第7圖係表示使用於本發明之實施形態2的重粒子線治療裝置的加速器系統的構成之示意圖。 Fig. 7 is a schematic view showing the configuration of an accelerator system used in the heavy particle beam therapy apparatus according to the second embodiment of the present invention.
在第7圖當中,加速器系統211係具備離子源1、作為射入器之圓形加速器2、以及超電導同步加速器3,自圓形加速器2所射出的C4+離子係藉由偏向電磁鐵14而偏向,且通過低能量輸送路徑13而自超電導同步加 速器3的外周側供應於射入裝置5A。此外,圓形加速器2係使用相位穩定性原理之同步迴旋加速器。 In Fig. 7, the accelerator system 211 includes an ion source 1, a circular accelerator 2 as an injector, and a superconducting synchrotron 3, and the C4+ ion emitted from the circular accelerator 2 is biased by the biasing electromagnet 14. And self-superconducting synchronously through the low energy transport path 13 The outer peripheral side of the speed governor 3 is supplied to the injection device 5A. Further, the circular accelerator 2 is a synchronous cyclotron using the principle of phase stability.
射入裝置5A係由下列所構成:射束旁路21;間隔電磁鐵6,其係將圓形加速器2所供應的C4+離子的軌道予以偏向而輸入於射束旁路21內;正離子荷電變換裝置7,其係將射入於射束旁路21內之C4+離子藉由正離子荷電變換法而變換成C6+離子;以及4個偏向電磁鐵81~84,其係將C4+離子的軌道予以偏向而導入於正離子荷電變換裝置7,並且將荷電變換之C6+離子的軌道予以偏向而回到真空導管4。 The injection device 5A is composed of the following: a beam bypass 21; a spacing electromagnet 6 that biases the orbit of the C4+ ions supplied from the circular accelerator 2 into the beam bypass 21; positive ion charging The conversion device 7 converts C4+ ions incident in the beam bypass 21 into C6+ ions by positive ion charge conversion; and 4 deflection electromagnets 8 1 to 8 4 , which are C4+ ions The track is deflected and introduced into the positive ion charge conversion device 7, and the orbit of the charge-converted C6+ ion is deflected back to the vacuum conduit 4.
射束旁路21係自真空導管4的真空導管部4a而分歧於外周側,和真空導管部4a平行而通過真空導管部4a的外周側,且自外周側而連結於真空導管部4a。4個偏向電磁鐵81~84係設置於射束旁路21的從真空導管部4a分歧之分歧部、和真空導管部4a平行的部分之兩端部、以及和真空導管部4a連結之連結部。 The beam bypass 21 is branched from the vacuum duct portion 4a of the vacuum duct 4 on the outer peripheral side, and passes through the outer peripheral side of the vacuum duct portion 4a in parallel with the vacuum duct portion 4a, and is connected to the vacuum duct portion 4a from the outer peripheral side. The four deflecting electromagnets 8 1 to 8 4 are provided at both end portions of the beam bypass 21 which are branched from the vacuum duct portion 4a and which are parallel to the vacuum duct portion 4a, and are connected to the vacuum duct portion 4a. Linkage.
射束旁路21係將迴旋射束軌道A予以迴旋之C6+離子為藉由偏向電磁鐵81而偏向於外周側,繼而藉由偏向電磁鐵82而偏向於內周側,形成和迴旋射束軌道A略為平行之軌道,繼而藉由偏向電磁鐵83而偏向於內周側,繼而藉由偏向電磁鐵84而偏向於外周側,且回到迴旋射束軌道A之構成。此外,藉由間隔電磁鐵6而予以偏向之C4+離子係在偏向電磁鐵83的位置而射入於射束旁路21。正離子荷電變換裝置7係設置於射束旁路21的偏向電磁鐵 83和偏向電磁鐵84之間,且將C4+離子變換成C6+離子。 Beam bypass line 21 will be swirling beam orbit A swirl of C6 + ions by the electromagnet 81 and biased toward the outer circumferential side, followed by the electromagnet 82 and deflection toward the inner periphery side, and forming the exit swirl A beam parallel to the track with the track slightly, followed by the electromagnet 83 and deflection toward the inner circumferential side, followed by the electromagnet 84 and biased toward the outer circumferential side, and back to the A constituting swirl beam orbit. Further, by spacing the electromagnet 6 and the C4 + ions tend to be based on a position offset of the electromagnet 83 and the bypass 21 is incident to the beam. Positive ion charge system conversion means 7 is provided to the beam deflection electromagnet 21 in the bypass 83 between the electromagnet 84 and deflection, and the C4 + C6 + ions into ions.
又,其他的構成係和上述實施形態1相同。 Further, other configurations are the same as those in the first embodiment.
在實施形態2當中,亦以藉由偏向電磁鐵83而偏向之C4+離子能進入藉由偏向電磁鐵83而偏向之C6+離子的軌道之方式,設定往C4+離子的射束旁路21的射入角度。 Among Embodiment 2, drawn up by the electromagnet 83 biased toward the + C4 + ions can enter by way of the ion orbit 83 biased toward the electromagnet of the C6, C4 + is set to the beam ions bypass 21 Injection angle.
因此,在加速器系統211中,自圓形加速器2輸出之C4+離子係藉由偏向電磁鐵14將軌道予以偏向而通過低能量搬送路徑13,且自超電導同步加速器3的外周側而供應至射入裝置5A。此外,供應至射入裝置5A之C4+離子係藉由間隔電磁鐵6而偏向,且在偏向電磁鐵83的位置射入於射束旁路21。因此,C4+離子係藉由偏向電磁鐵83而偏向於內周側並進入射束旁路21內之C6+離子的軌道,且藉由正離子荷電變換裝置7荷電變換成C6+離子。繼而C6+離子係藉由偏向電磁鐵84而偏向於外周側,且進入真空導管4內之迴旋射束軌道A。 Therefore, in the accelerator system 211, the C4+ ions output from the circular accelerator 2 are deflected by the deflecting electromagnet 14 to pass through the low-energy transport path 13 and supplied to the injection from the outer peripheral side of the superconducting synchrotron 3 Device 5A. Further, the supply means to the incident ionic 5A of C4 + by spacing the electromagnet 6 is deflected, and the position of the electromagnet 83 is biased to the beam incident on the bypass 21. Thus, ionic C4 + by the electromagnet 83 and deflection toward the inner peripheral side of the beam and into the bypass 21 C6 + ions within the track, and charged by the positive ion charge conversion device 7 is converted into C6 + ions. C6 + ions followed by line deflection electromagnet 84 biased to the outer circumferential side, and into the vacuum duct 4 of the swirl within the beam orbit A.
另一方面,C6+離子係將真空導管4內之迴旋射束軌道A予以迴旋且加速至高能量。此外,在C4+離子的射入時,將迴旋射束軌道A予以迴旋之C6+離子係藉由偏向電磁鐵81而偏向於外周側,且自迴旋射束軌道A分歧而進入射束旁路21。繼而藉由偏向電磁鐵82而偏向於內周側,並將軌道角度返回原點,且藉由偏向電磁鐵83而偏向於內周側。繼而藉由偏向電磁鐵84而偏向於外周側且回到真空導管4內之迴旋射束軌道A。 On the other hand, the C6+ ion system swirls the swirling beam orbit A in the vacuum conduit 4 and accelerates to high energy. Further, when the incident C4 + ion beam orbit A swirling of the swirling C6 + ions to be based by the electromagnet 81 and biased toward the outer circumferential side, and the differences from the cyclotron beam orbit into A beam bypass 21 . Followed by the electromagnet 82 and deflection toward the inner periphery side, and the return to the origin angle of the track, and by the electromagnet 83 and deflection toward the inner periphery side. Followed by the electromagnet 84 and deflection toward the outer peripheral side and back to the vacuum duct 4 of the swirl within the beam orbit A.
由於在實施形態2的加速器系統211中,亦使用超電導同步加速器3作為同步加速器,且使用同步迴旋加速器作為圓形加速器2,故能將離子源1、以及圓形加速器2設置於超電導同步加速器3的內周側,並達成加速器系統211的小型化。 Since the superconducting synchrotron 3 is also used as the synchrotron in the accelerator system 211 of the second embodiment, and the synchrocyclotron is used as the circular accelerator 2, the ion source 1 and the circular accelerator 2 can be disposed in the superconducting synchrotron 3 On the inner circumference side, the miniaturization of the accelerator system 211 is achieved.
又,上述各實施形態雖係使用同步迴旋加速器作為圓形加速器2,但,圓形加速器不限定於同步迴旋加速器,亦可為使用相位穩定性原理之圓形加速器,例如,亦可使用FFAG(Fixed Field Alternating Gradient:固定磁場高收束)加速器。 Further, in each of the above embodiments, a synchrocyclotron is used as the circular accelerator 2. However, the circular accelerator is not limited to the synchrocyclotron, and may be a circular accelerator using the principle of phase stability. For example, FFAG may also be used ( Fixed Field Alternating Gradient: Accelerator with a fixed magnetic field.
此外,上述各實施形態雖係說明使用C4+離子作為射入的荷電粒子,使用C6+離子作為荷電變換且迴旋的荷電粒子,但是,射入的荷電粒子及迴旋的荷電粒子並不限定碳離子,例如,亦可使用氦離子。 Further, in each of the above embodiments, the C6+ ions are used as the charged particles, and the C6+ ions are used as the charged particles that are charged and converted. However, the charged particles and the swirling charged particles do not limit carbon ions, for example. You can also use strontium ions.
此外,上述各實施形態雖係將離子源1設置於圓形加速器2的外周側,但是,離子源1亦可設置於圓形加速器2的內周側。 Further, in each of the above embodiments, the ion source 1 is provided on the outer peripheral side of the circular accelerator 2, but the ion source 1 may be provided on the inner peripheral side of the circular accelerator 2.
1‧‧‧離子源 1‧‧‧Ion source
2‧‧‧圓形加速器 2‧‧‧Circular accelerator
3‧‧‧超電導同步加速器 3‧‧‧Superconducting Synchrotron
4‧‧‧真空導管 4‧‧‧vacuum catheter
4a‧‧‧真空導管部 4a‧‧‧vacuum ducts
5‧‧‧射入裝置 5‧‧‧Injection device
6‧‧‧間隔電磁鐵 6‧‧‧Interval electromagnet
7‧‧‧正離子荷電變換裝置 7‧‧‧Positive ion charge conversion device
8‧‧‧偏向電磁鐵 8‧‧‧ biased electromagnet
9‧‧‧偏向電磁鐵 9‧‧‧ biased electromagnet
10‧‧‧收束用電磁鐵 10‧‧‧Electrical magnets for converging
11‧‧‧高頻加速空洞 11‧‧‧High frequency acceleration cavity
12‧‧‧射出裝置 12‧‧‧Injection device
13‧‧‧低能量搬送路徑 13‧‧‧Low energy transport path
14‧‧‧偏向電磁鐵 14‧‧‧ biased electromagnet
20‧‧‧射束旁路 20‧‧‧beam bypass
100‧‧‧重粒子線治療裝置 100‧‧‧heavy particle line treatment device
201‧‧‧加速器系統 201‧‧‧Accelerator System
202‧‧‧治療室 202‧‧‧ treatment room
203‧‧‧照射裝置 203‧‧‧Irrigation device
204‧‧‧高能量輸送路徑 204‧‧‧High energy transport path
205‧‧‧真空導管 205‧‧‧vacuum catheter
206‧‧‧切換電磁鐵 206‧‧‧Switching electromagnet
207‧‧‧偏向電磁鐵 207‧‧‧ biased electromagnet
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CN113454748A (en) * | 2019-04-10 | 2021-09-28 | 株式会社东芝 | Ion generation device, method, and program |
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