TW201638669A - 著色感光樹脂組合物、彩色濾光片和液晶顯示裝置 - Google Patents
著色感光樹脂組合物、彩色濾光片和液晶顯示裝置 Download PDFInfo
- Publication number
- TW201638669A TW201638669A TW105105438A TW105105438A TW201638669A TW 201638669 A TW201638669 A TW 201638669A TW 105105438 A TW105105438 A TW 105105438A TW 105105438 A TW105105438 A TW 105105438A TW 201638669 A TW201638669 A TW 201638669A
- Authority
- TW
- Taiwan
- Prior art keywords
- weight
- anhydride
- chemical formula
- resin composition
- photosensitive resin
- Prior art date
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/0045—Photosensitive materials with organic non-macromolecular light-sensitive compounds not otherwise provided for, e.g. dissolution inhibitors
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/20—Filters
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
- G03F7/0007—Filters, e.g. additive colour filters; Components for display devices
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
- G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
- G03F7/033—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders the binders being polymers obtained by reactions only involving carbon-to-carbon unsaturated bonds, e.g. vinyl polymers
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Optics & Photonics (AREA)
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Materials For Photolithography (AREA)
- Optical Filters (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR1020150034971A KR20160109834A (ko) | 2015-03-13 | 2015-03-13 | 착색 감광성 수지 조성물 |
Publications (1)
Publication Number | Publication Date |
---|---|
TW201638669A true TW201638669A (zh) | 2016-11-01 |
Family
ID=56988987
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
TW105105438A TW201638669A (zh) | 2015-03-13 | 2016-02-24 | 著色感光樹脂組合物、彩色濾光片和液晶顯示裝置 |
Country Status (3)
Country | Link |
---|---|
KR (1) | KR20160109834A (ko) |
CN (1) | CN105974734A (ko) |
TW (1) | TW201638669A (ko) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP4112671A4 (en) * | 2020-02-27 | 2024-04-03 | Zeon Corporation | CYCLIC OLEFIN RING-OPENED COPOLYMER, COMPOSITION FOR INSULATING MATERIAL, AND INSULATING MATERIAL |
Families Citing this family (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR102033414B1 (ko) * | 2017-02-09 | 2019-10-17 | 동우 화인켐 주식회사 | 적색 화소용 착색 감광성 수지 조성물, 컬러필터 및 화상표시장치 |
KR102364239B1 (ko) * | 2017-12-21 | 2022-02-16 | 동우 화인켐 주식회사 | 착색 감광성 조성물, 컬러필터 및 화상 표시 장치 |
KR102335614B1 (ko) * | 2018-03-21 | 2021-12-03 | 동우 화인켐 주식회사 | 착색 감광성 수지 조성물, 이를 포함하는 컬러필터 및 화상표시장치 |
KR102094372B1 (ko) * | 2019-04-23 | 2020-03-27 | 주식회사 신아티앤씨 | 알칼리 가용성 수지, 이를 포함하는 감광성 수지 조성물 및 컬러필터 |
CN113121940B (zh) * | 2019-12-31 | 2022-12-30 | 广东生益科技股份有限公司 | 一种热固性树脂组合物及使用其的预浸料、层压板和印制线路板 |
Family Cites Families (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP5143240B2 (ja) | 2011-01-06 | 2013-02-13 | 富士フイルム株式会社 | 着色感光性組成物、カラーフィルタの製造方法、カラーフィルタ、液晶表示装置、及び有機el表示装置 |
KR20130055937A (ko) * | 2011-11-21 | 2013-05-29 | 동우 화인켐 주식회사 | 컬러필터 형성용 조성물 및 이로부터 제조되는 컬러필터 |
JP6157193B2 (ja) * | 2013-04-22 | 2017-07-05 | 昭和電工株式会社 | (メタ)アクリレート系ポリマー、該ポリマーを含む組成物及びその用途 |
KR101707908B1 (ko) * | 2013-08-02 | 2017-02-17 | 제일모직 주식회사 | 컬러필터용 감광성 수지 조성물 및 이를 이용한 컬러필터 |
-
2015
- 2015-03-13 KR KR1020150034971A patent/KR20160109834A/ko not_active Application Discontinuation
-
2016
- 2016-02-24 TW TW105105438A patent/TW201638669A/zh unknown
- 2016-03-04 CN CN201610124943.4A patent/CN105974734A/zh not_active Withdrawn
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP4112671A4 (en) * | 2020-02-27 | 2024-04-03 | Zeon Corporation | CYCLIC OLEFIN RING-OPENED COPOLYMER, COMPOSITION FOR INSULATING MATERIAL, AND INSULATING MATERIAL |
Also Published As
Publication number | Publication date |
---|---|
CN105974734A (zh) | 2016-09-28 |
KR20160109834A (ko) | 2016-09-21 |
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