TW201638669A - 著色感光樹脂組合物、彩色濾光片和液晶顯示裝置 - Google Patents

著色感光樹脂組合物、彩色濾光片和液晶顯示裝置 Download PDF

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Publication number
TW201638669A
TW201638669A TW105105438A TW105105438A TW201638669A TW 201638669 A TW201638669 A TW 201638669A TW 105105438 A TW105105438 A TW 105105438A TW 105105438 A TW105105438 A TW 105105438A TW 201638669 A TW201638669 A TW 201638669A
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TW
Taiwan
Prior art keywords
weight
anhydride
chemical formula
resin composition
photosensitive resin
Prior art date
Application number
TW105105438A
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English (en)
Chinese (zh)
Inventor
權鳳壹
裵辰哲
Original Assignee
東友精細化工有限公司
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 東友精細化工有限公司 filed Critical 東友精細化工有限公司
Publication of TW201638669A publication Critical patent/TW201638669A/zh

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Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/0045—Photosensitive materials with organic non-macromolecular light-sensitive compounds not otherwise provided for, e.g. dissolution inhibitors
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/20—Filters
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
    • G03F7/0007—Filters, e.g. additive colour filters; Components for display devices
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
    • G03F7/033—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders the binders being polymers obtained by reactions only involving carbon-to-carbon unsaturated bonds, e.g. vinyl polymers

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Optics & Photonics (AREA)
  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials For Photolithography (AREA)
  • Optical Filters (AREA)
TW105105438A 2015-03-13 2016-02-24 著色感光樹脂組合物、彩色濾光片和液晶顯示裝置 TW201638669A (zh)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
KR1020150034971A KR20160109834A (ko) 2015-03-13 2015-03-13 착색 감광성 수지 조성물

Publications (1)

Publication Number Publication Date
TW201638669A true TW201638669A (zh) 2016-11-01

Family

ID=56988987

Family Applications (1)

Application Number Title Priority Date Filing Date
TW105105438A TW201638669A (zh) 2015-03-13 2016-02-24 著色感光樹脂組合物、彩色濾光片和液晶顯示裝置

Country Status (3)

Country Link
KR (1) KR20160109834A (ko)
CN (1) CN105974734A (ko)
TW (1) TW201638669A (ko)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP4112671A4 (en) * 2020-02-27 2024-04-03 Zeon Corporation CYCLIC OLEFIN RING-OPENED COPOLYMER, COMPOSITION FOR INSULATING MATERIAL, AND INSULATING MATERIAL

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR102033414B1 (ko) * 2017-02-09 2019-10-17 동우 화인켐 주식회사 적색 화소용 착색 감광성 수지 조성물, 컬러필터 및 화상표시장치
KR102364239B1 (ko) * 2017-12-21 2022-02-16 동우 화인켐 주식회사 착색 감광성 조성물, 컬러필터 및 화상 표시 장치
KR102335614B1 (ko) * 2018-03-21 2021-12-03 동우 화인켐 주식회사 착색 감광성 수지 조성물, 이를 포함하는 컬러필터 및 화상표시장치
KR102094372B1 (ko) * 2019-04-23 2020-03-27 주식회사 신아티앤씨 알칼리 가용성 수지, 이를 포함하는 감광성 수지 조성물 및 컬러필터
CN113121940B (zh) * 2019-12-31 2022-12-30 广东生益科技股份有限公司 一种热固性树脂组合物及使用其的预浸料、层压板和印制线路板

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5143240B2 (ja) 2011-01-06 2013-02-13 富士フイルム株式会社 着色感光性組成物、カラーフィルタの製造方法、カラーフィルタ、液晶表示装置、及び有機ｅｌ表示装置
KR20130055937A (ko) * 2011-11-21 2013-05-29 동우 화인켐 주식회사 컬러필터 형성용 조성물 및 이로부터 제조되는 컬러필터
JP6157193B2 (ja) * 2013-04-22 2017-07-05 昭和電工株式会社 （メタ）アクリレート系ポリマー、該ポリマーを含む組成物及びその用途
KR101707908B1 (ko) * 2013-08-02 2017-02-17 제일모직 주식회사 컬러필터용 감광성 수지 조성물 및 이를 이용한 컬러필터

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP4112671A4 (en) * 2020-02-27 2024-04-03 Zeon Corporation CYCLIC OLEFIN RING-OPENED COPOLYMER, COMPOSITION FOR INSULATING MATERIAL, AND INSULATING MATERIAL

Also Published As

Publication number Publication date
CN105974734A (zh) 2016-09-28
KR20160109834A (ko) 2016-09-21

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