TW201617217A - 阻氣性薄膜、使用其之電子裝置、及阻氣性薄膜之製造方法 - Google Patents

阻氣性薄膜、使用其之電子裝置、及阻氣性薄膜之製造方法 Download PDF

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Publication number
TW201617217A
TW201617217A TW104131710A TW104131710A TW201617217A TW 201617217 A TW201617217 A TW 201617217A TW 104131710 A TW104131710 A TW 104131710A TW 104131710 A TW104131710 A TW 104131710A TW 201617217 A TW201617217 A TW 201617217A
Authority
TW
Taiwan
Prior art keywords
layer
gas barrier
inorganic layer
atom
barrier film
Prior art date
Application number
TW104131710A
Other languages
English (en)
Chinese (zh)
Inventor
Kentaro Mori
Emi Akemine
Original Assignee
Toray Industries
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toray Industries filed Critical Toray Industries
Publication of TW201617217A publication Critical patent/TW201617217A/zh

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Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B32—LAYERED PRODUCTS
    • B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B9/00—Layered products comprising a layer of a particular substance not covered by groups B32B11/00 - B32B29/00
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B32—LAYERED PRODUCTS
    • B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B27/00—Layered products comprising a layer of synthetic resin
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/08—Oxides
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
    • C23C16/30—Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
    • C23C16/42—Silicides

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Inorganic Chemistry (AREA)
  • General Chemical & Material Sciences (AREA)
  • Laminated Bodies (AREA)
  • Photovoltaic Devices (AREA)
  • Application Of Or Painting With Fluid Materials (AREA)
  • Physical Vapour Deposition (AREA)
  • Chemical Vapour Deposition (AREA)
TW104131710A 2014-09-30 2015-09-25 阻氣性薄膜、使用其之電子裝置、及阻氣性薄膜之製造方法 TW201617217A (zh)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2014200264 2014-09-30
JP2015034923 2015-02-25

Publications (1)

Publication Number Publication Date
TW201617217A true TW201617217A (zh) 2016-05-16

Family

ID=55630166

Family Applications (1)

Application Number Title Priority Date Filing Date
TW104131710A TW201617217A (zh) 2014-09-30 2015-09-25 阻氣性薄膜、使用其之電子裝置、及阻氣性薄膜之製造方法

Country Status (3)

Country Link
JP (1) JP6601216B2 (ja)
TW (1) TW201617217A (ja)
WO (1) WO2016052123A1 (ja)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP6935219B2 (ja) 2017-03-31 2021-09-15 三井化学東セロ株式会社 バリア性積層フィルム
WO2018180487A1 (ja) * 2017-03-31 2018-10-04 富士フイルム株式会社 ガスバリアフィルムおよび成膜方法

Family Cites Families (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH09175868A (ja) * 1995-12-27 1997-07-08 Tonen Corp ハードコート膜を被覆したポリカーボネート製品及びその製法
JP2011143550A (ja) * 2010-01-12 2011-07-28 Konica Minolta Holdings Inc ガスバリアフィルム
JP5447022B2 (ja) * 2010-03-11 2014-03-19 コニカミノルタ株式会社 ガスバリア性フィルム、その製造方法及びそのガスバリア性フィルムを用いた有機光電変換素子
WO2012081555A1 (ja) * 2010-12-13 2012-06-21 コニカミノルタホールディングス株式会社 ガスバリア積層体及びガスバリア積層体の製造方法
JP2012219185A (ja) * 2011-04-08 2012-11-12 Hitachi Chemical Techno Service Co Ltd シリカ膜前駆体材料、これを用いたシリカ膜、反射防止成形体及びガスバリア反射防止成形体
EP2777930B1 (en) * 2011-11-07 2020-11-25 Lintec Corporation Gas barrier film and method for producing gas barrier film
EP2805817A4 (en) * 2012-01-20 2015-09-23 Lintec Corp BARRIER FILM AGAINST GAS AND METHOD FOR PRODUCING BARRIER FILM AGAINST GAS
JP5469784B1 (ja) * 2012-07-06 2014-04-16 三井化学株式会社 積層体
KR102196648B1 (ko) * 2013-01-11 2020-12-30 도레이 카부시키가이샤 가스 배리어성 필름

Also Published As

Publication number Publication date
JP6601216B2 (ja) 2019-11-06
WO2016052123A1 (ja) 2016-04-07
JPWO2016052123A1 (ja) 2017-07-13

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