TW201609231A - A bubble separator and a method thereof - Google Patents
A bubble separator and a method thereof Download PDFInfo
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- TW201609231A TW201609231A TW103130848A TW103130848A TW201609231A TW 201609231 A TW201609231 A TW 201609231A TW 103130848 A TW103130848 A TW 103130848A TW 103130848 A TW103130848 A TW 103130848A TW 201609231 A TW201609231 A TW 201609231A
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一種氣泡分離機構與分離方法、及其應用於含有藥液供給之製程機台，尤指一種含有藥液供給的製程機台利用進料與出料之間的高度差所產生的位能差，進行氣泡分離的機構及其分離方法。 The invention relates to a bubble separation mechanism and a separation method, and a process machine for the same, which is particularly suitable for a process machine containing a supply of chemical liquid, which utilizes a difference in height between a feed and a discharge. A mechanism for separating bubbles and a separation method thereof.
先前技術中氣泡與液體的分離，如中國專利第CN201010526270.8號，使用震動方式，排除液體中的氣體，包括超音波震動。但震動方式所含震波會使液體具有震波，對於精密塗佈產業，所需含低震或無震的塗佈液體，還必須考慮減震裝置。 In the prior art, the separation of bubbles and liquids, such as Chinese Patent No. CN201010526270.8, uses vibration to exclude gases in the liquid, including ultrasonic vibration. However, the shock wave contained in the vibration mode will cause the liquid to have a shock wave. For the precision coating industry, the coating liquid containing low or no vibration is required, and the shock absorbing device must also be considered.
先前技術中氣泡與液體的分離，如中華民國專利第I349745號，揭示利用液體壓力減壓延遲，來偵測判斷液體中的氣體含量，但壓力減壓須較複雜的裝置，而且不同的液體有不同的粘度，液壓的物理現象也不盡相同，因此一種分離裝置，較難多種液體狀態下適用。 The separation of bubbles and liquids in the prior art, such as the Republic of China Patent No. I349745, discloses the use of liquid pressure decompression delay to detect and determine the gas content in a liquid, but the pressure decompression requires a more complicated device, and different liquids have Different viscosities and hydraulic physical phenomena are not the same, so a separation device is more difficult to apply in a variety of liquid states.
先前技術，半導體藥液之濾泡裝置多設於生產機臺內部，例如：光阻塗佈機、顯影機及濕式蝕刻機之裝置，若藥液之氣泡未完全排出時，氣泡將直接附著於產品上，將對製程造成負面影響降低產品良率，而造成的影響包括有：殘影(Mura)、水印(Water Mark)、針孔(Pin Hole)及種種相關受氣泡影響而造成反應不全(例如：顯影不全、蝕刻不全)之缺 陷，造成產品良率大幅降低，而有待從事此行業者加以解決。 In the prior art, the foaming device of the semiconductor chemical liquid is often disposed inside the production machine, for example, a photoresist coater, a developing machine, and a wet etching machine. If the bubble of the chemical liquid is not completely discharged, the bubble will directly adhere. In the product, it will have a negative impact on the process and reduce the yield of the product. The effects include: residual image (Mura), watermark (Water Mark), pinhole (Pin Hole) and various related reactions caused by bubbles. (eg: lack of development, incomplete etching) The trapping rate has resulted in a significant drop in product yield, which is yet to be resolved by those in the industry.
為減少先前技術藥液之氣泡未完全排出時，氣泡將直接附著於產品上，將對製程造成負面影響降低產品良率，本發明目的在於提供一種氣泡分離機構，適用於一含有藥液之製程機台，含有藥液之製程機台包含有一容置槽、至少一氣泡分離機構以及一輸出裝置之塗佈機台(Coater)、顯影機台(Developer)、清洗機台(Cleaner)、濕蝕刻機台(Wet Etching)或剝膜機台(Stripper)，而分離氣泡機構包含有一腔體；一活塞，設於腔體中的底面並且具有一初始水平高度；一第一通道，一端耦接腔體的側面並且相通於腔體，第一通道設有一第一切換閥並且具有一第一水平高度；一出料管，一端耦接腔體之側面並且相通於腔體，而出料管具有一第二水平高度；一第二通道，一端耦接腔體之頂面並且相通於腔體，而第二通道設有一第二切換閥，其中初始高度、第一高度與第三高度分別為活塞頂部表面、第一通道中心、第二通道與第三通道中心距離地面之垂直距離，而第二高度大於第一高度，第一高度大於或等於第三高度，而第三高度大於初始高度。 In order to reduce the bubble of the prior art liquid to be completely discharged, the air bubbles will directly adhere to the product, which will have a negative impact on the process and reduce the product yield. The object of the present invention is to provide a bubble separation mechanism suitable for a process containing a liquid medicine. The machine table containing the chemical liquid comprises a coating tank, at least one bubble separating mechanism and an output device coating machine (Coater), a developing machine (Developer), a cleaning machine (Cleaner), and a wet etching. a Wet Etching or Stripper, and the bubble separating mechanism includes a cavity; a piston disposed on the bottom surface of the cavity and having an initial horizontal height; and a first passage coupled to the cavity at one end The side surface is connected to the cavity, the first passage is provided with a first switching valve and has a first level; a discharge tube, one end is coupled to the side of the cavity and communicates with the cavity, and the discharge tube has a second a second channel, one end coupled to the top surface of the cavity and communicating with the cavity, and the second channel is provided with a second switching valve, wherein the initial height, the first height and the third height are respectively The top surface of the piston, a first central passage, a second passage and a third passage from the center of the vertical distance from the ground, and the second height is greater than the first height, the first height is greater than or equal to the third height, and the third height is greater than the initial height.
本發明另一目的在於提供一種氣泡分離方法，適用於一外側分別連接有一第一通道、一第二通道與一第三通道之腔體，腔體具有一初始內部容積，而腔體之內部容積為可壓縮，包含有以下步驟： Another object of the present invention is to provide a bubble separation method, which is suitable for a cavity in which a first channel, a second channel and a third channel are respectively connected to an outer side, the cavity has an initial internal volume, and the internal volume of the cavity To be compressible, the following steps are included:
開啟第一通道並且封閉第二通道，提供一流體經第一通道進入腔體中。 Opening the first passage and closing the second passage provides a fluid into the cavity through the first passage.
封閉第一通道並開啟第二通道，而存於流體中的氣泡受浮力 而朝液面方向移動，並經第二通道排出至腔體外部。 Closing the first passage and opening the second passage, and the bubbles stored in the fluid are buoyant It moves toward the liquid surface and is discharged to the outside of the chamber through the second passage.
封閉第二通道後，壓縮腔體以形成一第一內部容積，使第三通道位置的液壓增加而迫使流體經第三通道排出至腔體外部。 After closing the second passage, the cavity is compressed to form a first internal volume that increases the hydraulic pressure at the third passage location to force fluid to exit the cavity through the third passage.
完成壓縮後再開啟第一通道，以使流體再進入腔體中，其中連接腔體處之第一通道、第二通道與第三通道於通道的中心距離地面分別具有一第一高度、一第二高度與一第三高度，而第二高度大於第一高度，第一高度大於或等於第三高度。。 After the compression is completed, the first channel is opened to allow the fluid to re-enter the cavity, wherein the first channel, the second channel and the third channel at the connection cavity have a first height and a first distance from the ground at the center of the channel respectively. The second height is greater than a first height, and the second height is greater than or equal to the third height. .
本發明之技術特徵在於提供更精簡的氣泡分離裝置結構及其方法，並可適用於不同黏滯度的液體的氣泡分離，以及廣泛應用於半導體製程中的各種含有藥液的製程機台，有效解決本案所欲達成的目的。 The technical feature of the invention is to provide a more compact bubble separation device structure and method thereof, and can be applied to bubble separation of liquids with different viscosities, and widely used in various semiconductor-containing process machines for semiconductor processes, effective Solve the purpose of the case.
21‧‧‧第一通道 21‧‧‧First Passage
22‧‧‧第三通道 22‧‧‧ third channel
23‧‧‧腔體 23‧‧‧ cavity
231‧‧‧尖椎體 231‧‧‧ vertebral body
24‧‧‧第二通道 24‧‧‧second channel
31‧‧‧第一切換閥 31‧‧‧First switching valve
32‧‧‧第二切換閥 32‧‧‧Second switching valve
33‧‧‧第三切換閥 33‧‧‧ Third switching valve
41‧‧‧流體 41‧‧‧ Fluid
42‧‧‧氣泡 42‧‧‧ bubbles
h1‧‧‧第一高度 H1‧‧‧first height
h2‧‧‧第二高度 H2‧‧‧second height
h3‧‧‧第三高度 H3‧‧‧ third height
p0‧‧‧初始高度 Initial height of p0‧‧
p1‧‧‧第一壓縮高度 P1‧‧‧first compression height
p2‧‧‧第二壓縮高度 P2‧‧‧second compression height
100‧‧‧容置槽 100‧‧‧ accommodating slots
110‧‧‧供給管路 110‧‧‧Supply pipeline
120‧‧‧供料泵 120‧‧‧feeding pump
200‧‧‧氣泡分離機構 200‧‧‧ bubble separation mechanism
210‧‧‧氣泡分離機構 210‧‧‧ bubble separation mechanism
300‧‧‧輸出裝置 300‧‧‧output device
310‧‧‧輸送管路 310‧‧‧Transportation line
320‧‧‧噴嘴 320‧‧‧Nozzles
S1~S4‧‧‧氣泡分離方法步驟(被動洩壓排泡) S1~S4‧‧‧ Bubble separation method steps (passive pressure relief bubble discharge)
S10~S40‧‧‧氣泡分離方法步驟(主動壓縮排泡) S10~S40‧‧‧ Bubble separation method steps (active compression defoaming)
第1圖繪製本案一實施例之氣泡分離機構之剖面示意圖。 Fig. 1 is a cross-sectional view showing the bubble separating mechanism of an embodiment of the present invention.
第2圖繪製本案另一實施例之氣泡分離機構之剖面示意圖。 Fig. 2 is a schematic cross-sectional view showing the bubble separating mechanism of another embodiment of the present invention.
第3圖繪製本案之氣泡分離機構之進料示意圖。 Figure 3 is a schematic view showing the feeding of the bubble separating mechanism of the present invention.
第4圖繪製本案之氣泡分離機構之排泡示意圖。 Fig. 4 is a schematic view showing the bubble discharge of the bubble separating mechanism of the present invention.
第5圖繪製本案之氣泡分離機構之出料示意圖。 Fig. 5 is a schematic view showing the discharge of the bubble separating mechanism of the present invention.
第6圖繪製一種氣泡與液體的分離效率曲線圖。 Figure 6 plots the separation efficiency of a bubble and a liquid.
第7圖繪製一種應用氣泡分離機構之製程機台示意圖。 Figure 7 is a schematic view of a process machine using a bubble separation mechanism.
第8圖繪製本案一實施例之氣泡分離方法步驟示意圖。 Figure 8 is a schematic view showing the steps of the bubble separation method of an embodiment of the present invention.
第9圖繪製本案另一實施例之氣泡分離方法步驟示意 圖。 Figure 9 is a schematic diagram showing the steps of the bubble separation method in another embodiment of the present invention. Figure.
第10圖繪製本案一實施例之氣泡分離機構的作動時序示意圖。 Fig. 10 is a view showing the timing of the operation of the bubble separating mechanism of an embodiment of the present invention.
第11圖繪製本案另一實施例之氣泡分離機構的作動時序示意圖。 Fig. 11 is a view showing the timing of the operation of the bubble separating mechanism of another embodiment of the present invention.
第12圖繪製本案一實施例之氣泡分離機構(含第三切換閥)的作動時序示意圖。 Fig. 12 is a view showing the timing of the operation of the bubble separating mechanism (including the third switching valve) according to an embodiment of the present invention.
第13圖繪製本案另一實施例之氣泡分離機構(含第三切換閥)的作動時序示意圖。 Fig. 13 is a view showing the timing of the operation of the bubble separating mechanism (including the third switching valve) of another embodiment of the present invention.
請參考第1圖所示，本發明揭露一種氣泡分離機構200，適用於一含有藥液之製程機台，而含有藥液之製程機台用以在一基材上(如矽晶圓、玻璃基板、金屬基板、塑膠基板或軟性基板)進行塗佈藥液、清洗、蝕刻、去膜之製程，例如半導體製程之一塗佈製程機台(Coater)、一顯影製程機台(Developer)、一清洗製程機台(Cleaner)、一濕蝕刻製程機台(Wet Etching)或者一剝膜製程機台(Stripper)等，但不依此為限。 Referring to FIG. 1 , the present invention discloses a bubble separation mechanism 200 suitable for a processing machine containing a chemical liquid, and a processing machine containing a chemical liquid for use on a substrate (eg, wafer, glass). a substrate, a metal substrate, a plastic substrate or a flexible substrate) is a process for applying a chemical solution, cleaning, etching, and film removal, for example, a coating process machine (Coater), a development process machine (Developer), and a semiconductor process. Cleaning the process machine (Cleaner), a wet etching process machine (Wet Etching) or a stripping process machine (Stripper), etc., but not limited to this.
請參考第7圖所示，圖示中繪製之含有藥液之製程機台表示為塗佈機台，而圖式中僅依此塗佈機台的架構為例做說明，但不以此為限，含有藥液之製程機台包含有一容置槽100、至少一氣泡分離機構200，以及一輸出裝置300。 Please refer to Figure 7. The process table containing the liquid medicine drawn in the figure is shown as a coating machine. In the drawings, only the structure of the coating machine is taken as an example, but it is not The processing machine containing the chemical liquid includes a receiving tank 100, at least one bubble separating mechanism 200, and an output device 300.
容置槽100之內部含有一製程藥液，例如光阻液、顯影液、蝕刻液、去離子水、剝離液，而容置槽100對外連接至少一供給管路110與 一供料泵120，其中該供給管路110一端連接氣泡分離機構200，透過供料泵120用以將容置槽100中的製程藥液輸送至氣泡分離機構200。 The inside of the accommodating tank 100 contains a process liquid, such as a photoresist liquid, a developing solution, an etching liquid, a deionized water, and a stripping liquid, and the accommodating tank 100 is externally connected to at least one supply line 110 and A feed pump 120, wherein one end of the supply line 110 is connected to the bubble separation mechanism 200, and the feed pump 120 is used to transport the process liquid in the accommodating tank 100 to the bubble separation mechanism 200.
輸出裝置300一側設有至少一輸送管路310，另一側設置有至少一噴嘴320，而輸送管路310一端連接氣泡分離機構200，另一端連接輸出裝置300，其中輸出裝置300用以接收經氣泡分離機構200處理後之製程藥液，並經噴嘴320將製程藥液輸出至基材上。 At least one delivery line 310 is disposed on one side of the output device 300, and at least one nozzle 320 is disposed on the other side, and one end of the delivery line 310 is connected to the bubble separation mechanism 200, and the other end is connected to the output device 300, wherein the output device 300 is configured to receive The process liquid is processed by the bubble separation mechanism 200, and the process liquid is output to the substrate through the nozzle 320.
請參考第1圖所示，圖式繪製本案之氣泡分離機構200的其一實施例，氣泡分離機構200包含有一腔體腔體23、一第一通道第一通道21、一第三通道22、一第二通道24與一活塞25、一第一切換閥31，以及一第二切換閥32。 Please refer to FIG. 1 , which illustrates an embodiment of the bubble separation mechanism 200 of the present invention. The bubble separation mechanism 200 includes a cavity body 23 , a first channel first channel 21 , a third channel 22 , and a first channel . The second passage 24 is coupled to a piston 25, a first switching valve 31, and a second switching valve 32.
腔體23具有至少一頂面、一底面與一側面，腔體23內部用以容置製程藥液，腔體23可為一柱狀的腔體結構，例如圓柱狀，而位於腔體結構的頂端可為一漸縮的結構型態，例如一尖錐體231的結構型態，但不以此為限，此結構型態設計提供腔體23中製程液體的氣泡易於集中至鄰近於第二通道24，以提升氣泡排除的效率。 The cavity 23 has at least one top surface, a bottom surface and a side surface. The cavity 23 is used for accommodating the process liquid, and the cavity 23 can be a columnar cavity structure, such as a cylindrical shape, and located in the cavity structure. The top end may be a tapered structural type, such as a structural form of a pointed cone 231, but not limited thereto. The structural design provides that the bubbles of the process liquid in the cavity 23 are easily concentrated to be adjacent to the second. Channel 24 to increase the efficiency of bubble removal.
第一通道21設於腔體23的側面且一端耦接含有藥液之製程機台的供給管路110(未圖示)，另一端耦接腔體23的側面並且相通於腔體23，第一通道21用以輸送製程液體進入腔體23中，而第一通道21具有一第一高度h1，其中第一高度h1為以平行地面為參考點至第一通道21之孔徑中心的垂直軸向距離，進一步說明，第一通道21可為一管體結構，其內徑介於0.3~6公分之間，但 不以此為限。 The first channel 21 is disposed on the side of the cavity 23 and has one end coupled to the supply line 110 (not shown) of the processing machine containing the chemical liquid, and the other end is coupled to the side of the cavity 23 and communicates with the cavity 23, first The passage 21 is for conveying the process liquid into the cavity 23, and the first passage 21 has a first height h1, wherein the first height h1 is a vertical axial distance from the parallel ground as a reference point to the center of the aperture of the first passage 21. Further, the first channel 21 can be a tube structure having an inner diameter of between 0.3 and 6 cm, but Not limited to this.
第二通道24設於腔體23的頂面且一端耦接腔體23並且相通於腔體23，第二通道24用以提供腔體23中的氣體釋放的管道，而第二通道24的結構型態於圖式中雖呈現為一直管型態，但不以此為限，可為一具有曲度的彎管型態，而第二通道24具有一第二高度h2，其中第二高度h2為以平行地面為參考點至第二通道24與腔體23耦接位置的垂直軸向距離。 The second channel 24 is disposed on the top surface of the cavity 23 and has one end coupled to the cavity 23 and communicates with the cavity 23, the second channel 24 is used to provide a gas release conduit in the cavity 23, and the second channel 24 is of a structural type. Although the state of the figure is a straight tube type, but not limited thereto, it may be a curved shape with a curvature, and the second channel 24 has a second height h2, wherein the second height h2 is The vertical axial distance from the parallel ground as a reference point to the coupling position of the second passage 24 to the cavity 23.
第三通道22設於腔體23的側面且一端耦接含有藥液之製程機台的輸送管路310(未圖示)，另一端耦接腔體23的側面並且相通於腔體23，而第三通道22與第一通道21所設置於腔體23側面位置可為同一側面、相反側或任意一側面，在此不限定，依實際需求做設計，而第三通道22用以輸出完成排泡後的製程液體至輸送管路310，其中第三通道22具有一第三高度h3，第三高度h3為以平行地面為參考點至第三通道22中心的垂直軸向距離，進一步說明，第三通道22可為一管體結構，其內徑介於0.3~6公分之間，但不以此為限，而第三通道22的內徑可小於或等於第一通道21之內徑，在此不限定，依實際需求做設計。 The third channel 22 is disposed at a side of the cavity 23 and has one end coupled to a delivery line 310 (not shown) of the processing machine containing the chemical liquid, and the other end is coupled to the side of the cavity 23 and communicates with the cavity 23, and The three channels 22 and the first channel 21 may be disposed on the side of the cavity 23 at the same side, the opposite side or any one side, which is not limited thereto, and is designed according to actual needs, and the third channel 22 is used for outputting and discharging. The process liquid to the delivery line 310, wherein the third channel 22 has a third height h3, and the third height h3 is a vertical axial distance from the reference point of the parallel ground to the center of the third channel 22, further illustrating that The passage 22 may be a tubular structure having an inner diameter of between 0.3 and 6 cm, but not limited thereto, and the inner diameter of the third passage 22 may be less than or equal to the inner diameter of the first passage 21, where Not limited, design according to actual needs.
活塞25設於腔體23的底面且一端耦接驅動裝置(圖未示)，另一端嵌入於腔體23中，用以進行往復作動以壓縮腔體23的內部容積而使腔體內形成正壓或負壓狀態，腔體中呈負壓狀態時以進一步增加第一通道21中的製程液體進入腔體23中的吸入，腔體中呈正壓狀態時以提供腔體中氣體經第二通道24排出，以及 增加腔體23中的製程液體經第三通道22至輸送管路310的動力，進一步說明，活塞25未作動進行壓縮時具有一初始高度p0，初始高度p0為以平行地面為參考點至活塞25頂面的垂直軸向距離，其中初始高度p0、第一高度h1、第高度h2與第三高度h3之間的關係為第二高度h2大於第一高度h1，第一高度h1大於或等於第三高度h3，而第三高度h3大於初始高度p0，再者，第一高度h1與第三高度h3之間具有一預定間距，而預定間距為第一通道21孔徑中心與第三通道22孔徑中心的間距，其中預定間距介於該第一通道21內徑的0.5~3.5倍之間。 The piston 25 is disposed on the bottom surface of the cavity 23 and has one end coupled to a driving device (not shown), and the other end is embedded in the cavity 23 for reciprocating to compress the internal volume of the cavity 23 to form a positive pressure in the cavity. Or a negative pressure state, when the cavity is in a negative pressure state to further increase the suction of the process liquid in the first passage 21 into the cavity 23, when the cavity is in a positive pressure state to provide the gas in the cavity through the second passage 24 Discharge, and Increasing the power of the process liquid in the cavity 23 through the third passage 22 to the delivery line 310 further indicates that the piston 25 has an initial height p0 when it is not actuated for compression, and the initial height p0 is a reference point to the piston 25 from the parallel ground. a vertical axial distance of the top surface, wherein the relationship between the initial height p0, the first height h1, the first height h2, and the third height h3 is that the second height h2 is greater than the first height h1, and the first height h1 is greater than or equal to the third The height h3, and the third height h3 is greater than the initial height p0. Further, the first height h1 and the third height h3 have a predetermined interval, and the predetermined spacing is the aperture center of the first channel 21 and the aperture center of the third channel 22. The spacing, wherein the predetermined spacing is between 0.5 and 3.5 times the inner diameter of the first passage 21.
第一切換閥31連接於第一通道21，經外部控制系統(圖未示)的控制以進行切換閥門開啟或關閉，用以開放或阻擋製程液體進入腔體23中，而第二切換閥32連接於第二通道24，經外部控制系統(圖未示)的控制以進行切換閥門開啟或關閉，以開放氣泡排出腔體23外部，而第一切換閥31與第二切換閥32可為一電磁切換閥，或者為一壓力切換閥，在此不限定，依實際需求做設計。 The first switching valve 31 is connected to the first passage 21, and is controlled by an external control system (not shown) to switch the valve to open or close to open or block the process liquid into the cavity 23, and the second switching valve 32 Connected to the second passage 24, controlled by an external control system (not shown) to switch the valve to open or close to open the outside of the bubble discharge chamber 23, and the first switching valve 31 and the second switching valve 32 may be one The electromagnetic switching valve, or a pressure switching valve, is not limited herein, and is designed according to actual needs.
請參考第2圖所示，圖式繪製本案另一實施例之一氣泡分離機構210，本實施例中與前一實施例的主要差異在於氣泡分離機構210具有一第三切換閥33，而與前一實施例相似結構部分則沿用第1圖之元件符號，本實施例中僅說明主要差異部分。 Referring to FIG. 2, the drawing shows a bubble separation mechanism 210 according to another embodiment of the present invention. The main difference between the embodiment and the previous embodiment is that the bubble separation mechanism 210 has a third switching valve 33, and The similar structural portions of the previous embodiment follow the component symbols of Fig. 1, and only the main differences are explained in this embodiment.
第三切換閥33連接於第三通道22，經外部控制系統(圖未示)的控制以進行切換閥門開啟或關閉，用以開放或阻擋製程液體經第三通道22排出於腔體23，而第三切換閥33可為一電磁切 換閥，或者為一壓力切換閥，在此不限定，依實際需求做設計。 The third switching valve 33 is connected to the third passage 22, and is controlled by an external control system (not shown) to switch the valve to open or close, for opening or blocking the process liquid to be discharged to the cavity 23 through the third passage 22, and The third switching valve 33 can be an electromagnetic cut The valve is changed, or it is a pressure switching valve, which is not limited here, and is designed according to actual needs.
而本案更揭露一種氣泡分離方法，來達成本案所欲解決的問題，請參考第8圖所示，圖示繪製本案一實施例之氣泡分離方法程序步驟，，腔體23具有一初始內部容積，且腔體23之內部容積為可壓縮，該氣泡分離方法為被動式排泡，包含有以下步驟： In this case, a bubble separation method is further disclosed to solve the problem to be solved in the present case. Referring to FIG. 8 , the procedure of the bubble separation method in an embodiment of the present invention is illustrated, and the cavity 23 has an initial internal volume. And the internal volume of the cavity 23 is compressible, and the bubble separation method is passive bubble discharge, which comprises the following steps:
S1：開啟第一通道21並且封閉第二通道24，提供一流體經第一通道21進入腔體23中，進一步說明，視該流體黏滯性(Viscosity)的數值而造成流體經第三通道22洩漏於外的可能，可進一步封閉第三通道22。 S1: opening the first channel 21 and closing the second channel 24, providing a fluid entering the cavity 23 through the first channel 21, further illustrating that the fluid passes through the third channel 22 depending on the value of the fluid viscosity (Viscosity) The third passage 22 can be further closed by the possibility of leakage.
S2：封閉第一通道21並開啟第二通道24，而存於流體中的氣泡受浮力而朝液面方向移動，並經第二通道24排出至腔體外部。 S2: The first passage 21 is closed and the second passage 24 is opened, and the bubbles stored in the fluid are moved toward the liquid surface by buoyancy and discharged to the outside of the cavity through the second passage 24.
S3：封閉該第二通道，壓縮腔體23以形成一第一內部容積，使第三通道22位置的液壓增加而迫使該流體經第三通道22排出至腔體23外部，而第一內部容積小於初始內部容積，其中壓縮方式為利用活塞25作動的方式，進一步說明，若於S1步驟中所述之封閉第三通道22，則於此S3步驟需開啟第三通道22以使流體排出。 S3: closing the second passage, compressing the cavity 23 to form a first internal volume, increasing the hydraulic pressure at the position of the third passage 22 to force the fluid to be discharged to the outside of the cavity 23 through the third passage 22, and the first internal volume It is smaller than the initial internal volume, wherein the compression mode is the manner in which the piston 25 is actuated. Further, if the third passage 22 is closed as described in the step S1, the third passage 22 needs to be opened in this step S3 to discharge the fluid.
S4：再開啟第一通道21且活塞回至初始高度p0，造成腔體23內部容積膨脹以使流體再進入腔體23中。 S4: The first passage 21 is opened again and the piston returns to the initial height p0, causing the internal volume of the chamber 23 to expand to allow the fluid to re-enter the chamber 23.
再請參考第9圖所示，圖式繪製本案所述之氣泡分離方法的另一實施例，該氣泡分離方法為主動式排泡，包含有以下步驟： Referring to FIG. 9 again, the drawing illustrates another embodiment of the bubble separation method described in the present invention. The bubble separation method is active bubble discharge, and includes the following steps:
S10：開啟第一通道21並且封閉第二通道24，提供一流體經第一通道21進入腔體23中，進一步說明，視該流體黏滯性(Viscosity)的數值 而造成流體經第三通道22洩漏於外的可能，可進一步封閉第三通道22。 S10: opening the first passage 21 and closing the second passage 24, providing a fluid to enter the cavity 23 through the first passage 21, further illustrating the value of the fluid viscosity (Viscosity) The third passage 22 can be further closed by the possibility of leakage of fluid through the third passage 22.
S20：封閉第一通道21並開啟第二通道24後，壓縮腔體23以形成一第二內部容積，而存於流體中的氣泡受浮力而朝液面方向移動，並經第二通道24排出至腔體23外部，其中於此階段壓縮腔體的方式是提升氣泡排出的效率。 S20: After closing the first passage 21 and opening the second passage 24, the cavity 23 is compressed to form a second internal volume, and the bubbles stored in the fluid are moved by the buoyancy toward the liquid surface and discharged through the second passage 24. To the outside of the cavity 23, the manner in which the cavity is compressed at this stage is to increase the efficiency of bubble discharge.
S30：封閉該第二通道24後，壓縮腔體以形成一第一內部容積，使第三通道22位置的液壓增加而迫使該流體經第三通道22排出至腔體23外部，而第一內部容積、第二內部容積與初始內部容積的關係為第一內部容積小於第二內部容積，而第二內部容積小於初始內部容積，其中壓縮方式同前一實施例所述的方式，進一步說明，若於S10步驟中所述之封閉第三通道22，則於此S30步驟需開啟第三通道22以使流體排出。 S30: After closing the second passage 24, compressing the cavity to form a first internal volume, increasing the hydraulic pressure at the position of the third passage 22 to force the fluid to be discharged to the outside of the cavity 23 through the third passage 22, and the first interior The relationship between the volume, the second internal volume and the initial internal volume is such that the first internal volume is smaller than the second internal volume and the second internal volume is smaller than the initial internal volume, wherein the compression is the same as that described in the previous embodiment, further illustrating The third passage 22 is closed as described in the step S10, and the third passage 22 is opened at this step S30 to discharge the fluid.
S40：再開啟第一通道21且活塞25回至初始高度p0，造成腔體23內部容積膨脹使流體再進入腔體23中 S40: reopening the first passage 21 and returning the piston 25 to the initial height p0, causing the internal volume of the cavity 23 to expand to allow the fluid to re-enter the cavity 23.
本案特舉實施例作說明，請參考第3~5圖並配合第10圖所示，圖式繪製本案於一實施例所述之氣泡分離機構200的作動程序，以分別進行進料、排泡、出料的過程，而本案所述之氣泡分離機構200的作動程序的複數個實施例將以時序狀態進行說明，其中一實施例說明如下： In the specific embodiment of the present invention, please refer to FIGS. 3~5 and in conjunction with FIG. 10, the operation procedure of the bubble separating mechanism 200 according to the embodiment of the present invention is drawn to separately feed and discharge bubbles. The process of discharging, and the plurality of embodiments of the actuating process of the bubble separating mechanism 200 described in the present invention will be described in a time series state, one embodiment of which is explained as follows:
A.進料過程：第一切換閥31狀態為開(switch on)，第二切換閥32狀態為關(switch off)，活塞25由一第一壓縮高度p1移動至初始高度p0，以使供給管路110(圖未示)中的一流體41(製程液體)持續進入腔體23中，其中複數個氣泡42存於流體41中。 A. Feeding process: the first switching valve 31 is in the state of switch on, the second switching valve 32 is in the state of switch off, and the piston 25 is moved from a first compression height p1 to an initial height p0 to supply A fluid 41 (process liquid) in line 110 (not shown) continues into chamber 23, with a plurality of bubbles 42 being present in fluid 41.
B.排泡過程：第一切換閥31狀態為關(switch off)，第二切換閥32狀態為開(switch on)，活塞25保持於初始高度p0，以使流體41中的氣泡42逐漸集中於鄰近第二通道24的液面位置後，經第二通道24排至腔體23的外部。 B. Bubble discharging process: the first switching valve 31 is in a state of switch off, the second switching valve 32 is in a switch on state, and the piston 25 is maintained at an initial height p0 to gradually concentrate the air bubbles 42 in the fluid 41. After being adjacent to the liquid level position of the second passage 24, it is discharged to the outside of the cavity 23 via the second passage 24.
C.出料過程：第一切換閥31狀態為關(switch off)，第二切換閥32狀態為關(switch off)，活塞25朝腔體23頂面方向移動至第一壓縮高度p1，用以壓縮腔體內部容積造成腔體內壓力增加，以使腔體23中的流體41經第三通道22進入輸送管路310(圖未示)，其中第一壓縮高度p1是以平行地面為參考點至活塞25頂面的垂直軸向距離，而初始高度p0小於第一壓縮高度p1，而第一壓縮高度p1小於第三高度h3，進一步說明，本實施例中之第一切換閥31與第二切換閥32的開關切換時間範圍介於0.1~180秒之間，而於狀態切換時具有一延遲時間，該延遲時間以毫秒或微秒單位計。 C. Discharging process: the first switching valve 31 is switched off, the second switching valve 32 is switched off, and the piston 25 is moved toward the top surface of the cavity 23 to the first compression height p1. The pressure in the chamber is increased by the internal volume of the compression chamber, so that the fluid 41 in the chamber 23 enters the delivery line 310 (not shown) via the third passage 22, wherein the first compression height p1 is referenced to the parallel ground. The vertical axial distance to the top surface of the piston 25, and the initial height p0 is smaller than the first compression height p1, and the first compression height p1 is smaller than the third height h3, further illustrating the first switching valve 31 and the second in the embodiment. The switching time of the switching valve 32 ranges from 0.1 to 180 seconds, and has a delay time in the state switching, which is measured in milliseconds or microseconds.
請參考第3~5圖並配合第11圖所示，本發明之氣泡分離機構200作動程序的另一實施例說明如下： Referring to Figures 3 to 5 and in conjunction with Figure 11, another embodiment of the operation of the bubble separation mechanism 200 of the present invention is as follows:
A.進料過程：第一切換閥31狀態為開(switch on)，第二切換閥32狀態為關(switch off)，活塞25由第一壓縮高度p1移動至初始高度p0，以使供給管路110(圖未示)中的流體41持續進入腔體23中，其中複數個氣泡42存於流體41中。 A. Feeding process: the first switching valve 31 is in the state of switch on, the second switching valve 32 is in the state of switch off, and the piston 25 is moved from the first compression height p1 to the initial height p0 to make the supply pipe The fluid 41 in the path 110 (not shown) continues into the cavity 23 with a plurality of bubbles 42 in the fluid 41.
B.排泡過程：第一切換閥31狀態為關(switch off)，第二切換閥32狀態為開(switch on)，活塞25朝腔體23頂面方向移動至一第二壓縮高度p2，以使流體41中的氣泡42逐漸集中於鄰近第二 通道24的液面位置後，經第二通道24排至腔體23的外部，其中第二壓縮高度p2是以平行地面為參考點至活塞25頂面的垂直軸向距離。 B. The bubble discharging process: the first switching valve 31 is switched off, the second switching valve 32 is switched on, and the piston 25 is moved toward the top surface of the cavity 23 to a second compression height p2. So that the bubbles 42 in the fluid 41 are gradually concentrated in the vicinity of the second After the liquid level position of the passage 24, it is discharged to the outside of the cavity 23 via the second passage 24, wherein the second compression height p2 is a vertical axial distance from the parallel ground as a reference point to the top surface of the piston 25.
C.出料過程：第一切換閥31狀態為關(switch off)，第二切換閥32狀態為關(switch off)，活塞25朝腔體23頂面方向再移動至第一壓縮高度p1，用以壓縮腔體內部容積造成腔體內壓力增加，以使腔體23中的流體41經第三通道22進入輸送管路310(圖未示)，其中初始高度p0小於第二壓縮高度p2，第二壓縮高度p2小於第一壓縮高度p1，第一壓縮高度p1小於第三高度h3，進一步說明，本實施例中之第一切換閥31與第二切換閥32的開關切換時間範圍介於0.1~180秒之間，而於狀態切換時具有一延遲時間，該延遲時間以毫秒或微秒單位計。 C. Discharging process: the first switching valve 31 is switched off, the second switching valve 32 is switched off, and the piston 25 is moved to the first compression height p1 toward the top surface of the cavity 23, The pressure inside the cavity is increased to cause the pressure in the cavity to increase, so that the fluid 41 in the cavity 23 enters the delivery line 310 (not shown) through the third passage 22, wherein the initial height p0 is smaller than the second compression height p2, The second compression height p2 is smaller than the first compression height p1, and the first compression height p1 is smaller than the third height h3. Further, the switching time range of the first switching valve 31 and the second switching valve 32 in the embodiment is 0.1~ Between 180 seconds, there is a delay time in the state switching, which is measured in milliseconds or microseconds.
請參考第2圖並配合第12圖所示，本案於一實施例所述之氣泡分離機構210的作動程序，以分別進行進料、排泡、出料的過程，而本案所述之氣泡分離機構210的作動程序的複數個實施例，其中一實施例說明如下 Referring to FIG. 2 and in conjunction with FIG. 12, the operation procedure of the bubble separating mechanism 210 according to an embodiment of the present invention is to separately perform a process of feeding, discharging, and discharging, and the bubble separation described in the present case. A plurality of embodiments of the actuation process of the mechanism 210, one embodiment of which is described below
A.進料過程：第一切換閥31狀態為開(switch on)，第二切換閥32狀態為關(switch off)，第三切換閥33狀態為關(switch off)，活塞25由第一壓縮高度p1移動至初始高度p0，以使供給管路110(圖未示)中的流體41(製程液體)持續進入腔體23中，其中複數個氣泡42存於流體41中。 A. Feeding process: the first switching valve 31 is in the state of switch on, the second switching valve 32 is in the state of switch off, the third switching valve 33 is in the off state, and the piston 25 is in the first The compression height p1 is moved to an initial height p0 such that the fluid 41 (process liquid) in the supply line 110 (not shown) continues into the cavity 23 with a plurality of bubbles 42 in the fluid 41.
B.排泡過程：第一切換閥31狀態為關(switch off)，第 二切換閥32狀態為開(switch on)，第三切換閥33狀態為關(switch off)，活塞25保持於初始高度p0，以使流體41中的氣泡42逐漸集中於鄰近第二通道24的液面位置後，經第二通道24排至腔體23的外部。 B. Bubbling process: the first switching valve 31 is off (switch off), The state of the two switching valve 32 is switch on, the state of the third switching valve 33 is switch off, and the piston 25 is maintained at the initial height p0 to gradually concentrate the air bubbles 42 in the fluid 41 adjacent to the second passage 24. After the liquid level position, it is discharged to the outside of the cavity 23 via the second passage 24.
C.出料過程：第一切換閥31狀態為關(switch off)，第二切換閥32狀態為關(switch off)，第三切換閥33狀態為開(switch on)，活塞25朝腔體23頂面方向移動至第一壓縮高度p1，用以壓縮腔體內部容積造成腔體內壓力增加，以使腔體23中的流體41經第三通道22進入輸送管路310(圖未示)，其中第一壓縮高度p1是以平行地面為參考點至活塞25頂面的垂直軸向距離，而初始高度小於第一壓縮高度p1，而第一壓縮高度p1小於第三高度h3，進一步說明，本實施例中之第一切換閥31、第二切換閥32與第三切換閥33的開關切換時間範圍介於0.1~180秒之間，而於狀態切換時具有一延遲時間，該延遲時間以毫秒或微秒單位計。 C. Discharge process: the first switching valve 31 is in the state of switch off, the second switching valve 32 is in the state of switch off, the third switching valve 33 is in the state of switch on, and the piston 25 is facing the cavity. The top surface direction is moved to the first compression height p1 for compressing the internal volume of the cavity to cause an increase in the pressure in the cavity, so that the fluid 41 in the cavity 23 enters the delivery line 310 through the third passage 22 (not shown). The first compression height p1 is a vertical axial distance from the parallel ground as a reference point to the top surface of the piston 25, and the initial height is smaller than the first compression height p1, and the first compression height p1 is smaller than the third height h3, further illustrating that The switching time of the first switching valve 31, the second switching valve 32 and the third switching valve 33 in the embodiment is between 0.1 and 180 seconds, and has a delay time in the state switching, the delay time is in milliseconds. Or microsecond units.
請參考第2圖並配合第13圖所示，本發明之氣泡分離機構210的作動程序另一實施例說明如下： Referring to FIG. 2 and in conjunction with FIG. 13, another embodiment of the operation procedure of the bubble separating mechanism 210 of the present invention is as follows:
A.進料過程：第一切換閥31狀態為開(switch on)，第二切換閥32狀態為關(switch off)，第三切換閥33狀態為關(switch off)，活塞25由第一壓縮高度p1移動至初始高度p0，以使供給管路110(圖未示)中的流體41持續進入腔體23中，其中複數個氣泡42存於流體41中。 A. Feeding process: the first switching valve 31 is in the state of switch on, the second switching valve 32 is in the state of switch off, the third switching valve 33 is in the off state, and the piston 25 is in the first The compression height p1 is moved to an initial height p0 such that the fluid 41 in the supply line 110 (not shown) continues into the cavity 23 with a plurality of bubbles 42 in the fluid 41.
B.排泡過程：第一切換閥31狀態為關(switch off)，第 二切換閥32狀態為開(switch on)，第三切換閥33狀態為關(switch off)，活塞25朝腔體23頂面方向移動至第二壓縮高度p2，以使流體41中的氣泡42逐漸集中於鄰近第二通道24的液面位置後，經第二通道24排至腔體23的外部，其中第二壓縮高度p2是以平行地面為參考點至活塞25頂面的垂直軸向距離。 B. Bubbling process: the first switching valve 31 is off (switch off), The state of the two switching valve 32 is switch on, the state of the third switching valve 33 is switch off, and the piston 25 is moved toward the top surface of the cavity 23 to the second compression height p2 to cause the air bubbles 42 in the fluid 41. Gradually concentrated near the liquid level position of the second passage 24, discharged to the outside of the cavity 23 via the second passage 24, wherein the second compression height p2 is a vertical axial distance from the parallel ground as a reference point to the top surface of the piston 25. .
C.出料過程：第一切換閥31狀態為關(switch off)，第二切換閥32狀態為關(switch off)，第三切換閥33狀態為開(switch on)，活塞25朝腔體23頂面方向再移動至第一壓縮高度p1，用以壓縮腔體內部容積造成腔體內壓力增加，以使腔體23中的流體41經第三通道22進入輸送管路310(圖未示)，其中第一壓縮高度p1是以平行地面為參考點至活塞25頂面的垂直軸向距離，而初始高度p0小於第二壓縮高度p1，第二壓縮高度p2小於第一壓縮高度p1，而第一壓縮高度小於第三高度h3，進一步說明，本實施例中之第一切換閥31、第二切換閥32與第三切換閥33的開關切換時間範圍介於0.1~180秒之間，而於狀態切換時具有一延遲時間，該延遲時間以毫秒或微秒單位計。 C. Discharge process: the first switching valve 31 is in the state of switch off, the second switching valve 32 is in the state of switch off, the third switching valve 33 is in the state of switch on, and the piston 25 is facing the cavity. The top surface direction is further moved to the first compression height p1 for compressing the internal volume of the cavity to increase the pressure in the cavity, so that the fluid 41 in the cavity 23 enters the delivery line 310 through the third passage 22 (not shown). , wherein the first compression height p1 is a vertical axial distance from the parallel ground as a reference point to the top surface of the piston 25, and the initial height p0 is smaller than the second compression height p1, and the second compression height p2 is smaller than the first compression height p1, and The compression height is less than the third height h3. Further, the switching time of the first switching valve 31, the second switching valve 32, and the third switching valve 33 in the embodiment is between 0.1 and 180 seconds. The state switching has a delay time in milliseconds or microseconds.
請參考第6圖所示，圖示繪製說明第一通道21與第三通道22之間所述之預定間距對於排泡效率的影響，其中預定間距是正比於排泡減少的時間，當預定間距由0.5倍增加至3.5倍時，排泡減少的時間亦由~5%提升至~45%。 Referring to FIG. 6, the diagram illustrates the effect of the predetermined spacing between the first channel 21 and the third channel 22 on the efficiency of the bubble discharge, wherein the predetermined pitch is proportional to the time of the bubble reduction, when the predetermined pitch is When the time is increased from 0.5 times to 3.5 times, the time for defoaming is also increased from ~5% to ~45%.
本案所述之氣泡分離方法的兩個實施例中，因持續進入腔體之流體具有第一高度的高度差，使進入的流體具有的位能差轉換成存於腔體中流體內的分子動能，而進一步提供流體中的氣泡具有朝液面方向之動 量，以使黏滯度較高之流體中的氣泡移動至液面的氣泡排出的效率增加，以提升氣泡分離的效率。 In two embodiments of the bubble separation method described in the present invention, since the fluid continuously entering the cavity has a height difference of the first height, the potential energy difference of the incoming fluid is converted into molecular kinetic energy stored in the fluid in the cavity. Further providing the bubbles in the fluid to move toward the liquid surface The amount of bubble discharge to move the bubbles in the fluid having a higher viscosity to the liquid surface is increased to improve the efficiency of bubble separation.
本發明所述之氣泡分離機構、分離方法及其應用於含有藥液供給之製程機台，相較於先前技術中，透過本發明之技術手段提供更精簡的氣泡分離裝置結構與氣泡分離程序，並可適用於不同黏滯度的液體的氣泡分離，以及廣泛應用於半導體製程中的各種含有藥液的製程機台，有效解決本案所欲達成的目的。 The bubble separation mechanism and the separation method according to the present invention and the application thereof to the process machine including the supply of the chemical liquid provide a more streamlined structure of the bubble separation device and the bubble separation process by the technical means of the present invention than in the prior art. It can be applied to the separation of bubbles of liquids with different viscosities, and is widely used in various process machines containing chemical liquids in the semiconductor process, which effectively solves the purpose of the present invention.
綜上所述，乃僅記載本發明為呈現解決問題所採用的技術手段之較佳實施方式或實施例而已，並非用來限定本發明專利實施之範圍。即凡與本發明專利申請範圍文義相符，或依本發明專利範圍所做的均等變化與修飾，皆為本發明專利範圍所涵蓋。 In summary, the present invention is only described as a preferred embodiment or embodiment of the technical means for solving the problem, and is not intended to limit the scope of the invention. That is, the equivalent changes and modifications made in accordance with the scope of the patent application of the present invention or the scope of the invention are covered by the scope of the invention.
21‧‧‧第一通道 21‧‧‧First Passage
22‧‧‧第三通道 22‧‧‧ third channel
23‧‧‧腔體 23‧‧‧ cavity
231‧‧‧尖椎體 231‧‧‧ vertebral body
24‧‧‧第二通道 24‧‧‧second channel
31‧‧‧第一切換閥 31‧‧‧First switching valve
32‧‧‧第二切換閥 32‧‧‧Second switching valve
h1‧‧‧第一高度 H1‧‧‧first height
h2‧‧‧第二高度 H2‧‧‧second height
h3‧‧‧第三高度 H3‧‧‧ third height
Claims (14)
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| TW103130848A TWI636817B (en) | 2014-09-05 | 2014-09-05 | A bubble separator and a method thereof |
| CN201510485223.6A CN105396330B (en) | 2014-09-05 | 2015-08-10 | Bubble separation mechanism and bubble separation method and application thereof to process machine containing liquid medicine supply |
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| TW103130848A TWI636817B (en) | 2014-09-05 | 2014-09-05 | A bubble separator and a method thereof |
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| JPH01284312A (en) * | 1988-05-10 | 1989-11-15 | Nitsusaku:Kk | Gas-liquid separator |
| US5526684A (en) * | 1992-08-05 | 1996-06-18 | Chevron Research And Technology Company, A Division Of Chevron U.S.A. Inc. | Method and apparatus for measuring multiphase flows |
| FI110604B (en) * | 2000-08-15 | 2003-02-28 | Admets Oy | Degassing device |
| US8187370B2 (en) * | 2006-07-13 | 2012-05-29 | Shi-Apd Cryogenics, Inc. | Horizontal bulk oil separator |
| JP2008238045A (en) * | 2007-03-27 | 2008-10-09 | Citizen Holdings Co Ltd | Bubble removing apparatus |
| CN101637678B (en) * | 2008-07-30 | 2011-09-07 | 深圳迈瑞生物医疗电子股份有限公司 | Filter |
| JP2012000571A (en) * | 2010-06-17 | 2012-01-05 | Nitto Denko Corp | Porous body for deaeration, and deaeration apparatus having the same |
| IT1401274B1 (en) * | 2010-07-30 | 2013-07-18 | Nuova Pignone S R L | SUBMARINE MACHINE AND METHODS FOR SEPARATING COMPONENTS OF A MATERIAL FLOW |
| TWM394847U (en) * | 2010-08-30 | 2010-12-21 | Ampoc Far East Co Ltd | Liquid bubble removal device for substrate wet process |
| CN201899905U (en) * | 2010-12-18 | 2011-07-20 | 广东生益科技股份有限公司 | Conical piston defoaming device |
| CN102225252B (en) * | 2011-05-24 | 2014-08-27 | 涂强 | Spiral-flow type gas eliminator |
| DE102011088959B4 (en) * | 2011-12-19 | 2022-08-04 | Endress+Hauser Conducta Gmbh+Co. Kg | Device for degassing a liquid and use of this device in an analysis device |
| CN202983292U (en) * | 2012-11-23 | 2013-06-12 | 合肥市顺昌不锈钢设备制造有限公司 | Pressure release mechanism for water-air separation device |
| CN203447828U (en) * | 2013-08-07 | 2014-02-26 | 陈玉凤 | Single-well gas-liquid separation device for collection and transmission |
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