TW201521571A - Greenhouse apparatus for monitoring and controlling growth factors of plant factory and the method thereof - Google Patents

Greenhouse apparatus for monitoring and controlling growth factors of plant factory and the method thereof Download PDF

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TW201521571A
TW201521571A TW102145209A TW102145209A TW201521571A TW 201521571 A TW201521571 A TW 201521571A TW 102145209 A TW102145209 A TW 102145209A TW 102145209 A TW102145209 A TW 102145209A TW 201521571 A TW201521571 A TW 201521571A
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ozone
concentration
monitoring
ethylene
greenhouse
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TW102145209A
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TWI536904B (en
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Ming-Je Kao
Chun-Kuo Liu
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Ind Tech Res Inst
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    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02ATECHNOLOGIES FOR ADAPTATION TO CLIMATE CHANGE
    • Y02A40/00Adaptation technologies in agriculture, forestry, livestock or agroalimentary production
    • Y02A40/10Adaptation technologies in agriculture, forestry, livestock or agroalimentary production in agriculture
    • Y02A40/25Greenhouse technology, e.g. cooling systems therefor

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  • Cultivation Of Plants (AREA)
  • Oxygen, Ozone, And Oxides In General (AREA)
  • Management, Administration, Business Operations System, And Electronic Commerce (AREA)

Abstract

A greenhouse apparatus for monitoring and controlling growth factors of a plant factory is provided, and the greenhouse apparatus is applied in a greenhouse. The greenhouse apparatus includes a module for monitoring and controlling carbon dioxide, a module for monitoring and controlling ozone and a module for monitoring and controlling ethylene. The module for monitoring and controlling carbon dioxide monitors and controls the concentration of the carbon dioxide in the greenhouse. The module for monitoring and controlling ozone monitors and controls the concentration of the ozone in the greenhouse, and an ozone treatment is performed in the greenhouse by the ozone supplied from the module for monitoring and controlling ozone. The module for monitoring and controlling ethylene monitors and controls the concentration of the ethylene in the greenhouse.

Description

監控植物工廠生長因子的溫室裝置及其監控方法 Greenhouse device for monitoring plant plant growth factor and monitoring method thereof

本揭露是有關於一種監控植物工廠生長因子的溫室裝置及其監控方法,且特別是有關於一種智慧型節能的監控植物工廠生長因子的溫室裝置及其監控方法。 The present disclosure relates to a greenhouse device for monitoring plant plant growth factors and a monitoring method thereof, and more particularly to a smart energy-saving greenhouse device for monitoring plant plant growth factors and a monitoring method thereof.

植物工廠(先進溫室)被公認為國際上的設施農業(facility agriculture)中最高級別的發展階段。植物工廠是一種技術高度密集,不受或很少受自然條件限制的生產方式,其可具有無農藥使用、操作省力、自動化程度高的優點。植物工廠的單位面積產量可達一般土地裁培的幾十倍甚至上百倍,因此被認為是解決人口、資源、環境問題的重要途徑。植物工廠的核心價值是能夠協助提升農業朝向精緻化發展,減少環境破壞與增加品質的控管。 Plant factories (advanced greenhouses) are recognized as the highest level of development in international facility agriculture. A plant factory is a highly technically intensive production process that is not limited or rarely restricted by natural conditions. It can have the advantages of no pesticide use, low labor and high automation. The plant area output per unit area can reach dozens or even hundreds of times of general land cultivation, so it is considered to be an important way to solve population, resource and environmental problems. The core value of a plant factory is the ability to help improve the development of agriculture towards refined development, reducing environmental damage and increasing quality.

傳統溫室僅監控空氣的溫度與濕度,並裝設天窗或風扇以進行自然或強制換氣,然而控制上卻有許多缺點,因此亟需一種簡單有效的氣體環境監控技術,以期能達到即時、穩定且精確 監控溫室中各種氣體濃度的目標。 Traditional greenhouses only monitor the temperature and humidity of the air, and install skylights or fans for natural or forced air exchange. However, there are many shortcomings in control. Therefore, a simple and effective gas environment monitoring technology is needed in order to achieve immediate and stable operation. And precise The goal of monitoring various gas concentrations in the greenhouse.

本揭露提出一種監控植物工廠生長因子的溫室裝置,應用於溫室。溫室裝置其包括二氧化碳監控模組、臭氧監控模組及乙烯監控模組。二氧化碳監控模組監控溫室中的二氧化碳濃度。臭氧監控模組監控溫室中的臭氧濃度,且藉由臭氧監控模組所供應的臭氧對溫室進行臭氧處理。乙烯監控模組監控溫室中的乙烯濃度。 The present disclosure proposes a greenhouse device for monitoring plant plant growth factors for use in a greenhouse. The greenhouse device includes a carbon dioxide monitoring module, an ozone monitoring module, and an ethylene monitoring module. The CO2 monitoring module monitors the concentration of carbon dioxide in the greenhouse. The ozone monitoring module monitors the ozone concentration in the greenhouse and treats the greenhouse with ozone through the ozone supplied by the ozone monitoring module. The ethylene monitoring module monitors the ethylene concentration in the greenhouse.

本揭露再提出一種植物工廠生長因子的監控方法,以應用於溫室,且包括下列步驟。利用二氧化碳監控模組監控溫室中的二氧化碳濃度。利用臭氧監控模組監控溫室中的臭氧濃度,且藉由臭氧監控模組所供應的臭氧對溫室進行臭氧處理。利用乙烯監控模組監控溫室中的乙烯濃度。 The present disclosure further proposes a method for monitoring plant growth factors for use in a greenhouse, and includes the following steps. The carbon dioxide monitoring module is used to monitor the concentration of carbon dioxide in the greenhouse. The ozone monitoring module is used to monitor the ozone concentration in the greenhouse, and the greenhouse is ozone treated by the ozone supplied by the ozone monitoring module. The ethylene monitoring module is used to monitor the ethylene concentration in the greenhouse.

基於上述可知,在本揭露所提出的監控植物工廠生長因子的溫室裝置及其監控方法中,可以藉由上述二氧化碳監控模組、臭氧監控模組及乙烯監控模組來有效地調控植物工廠生長因子。另外,本揭露所提出的監控植物工廠生長因子的溫室裝置及其監控方法可達成植物生長過程全程監控、植物生長速度輔助調控、以及溫室消毒淨化安全無毒。此外,相較於直接通入外氣補充來二氧化碳方式而言,由於本揭露所提出的監控植物工廠生長因子的溫室裝置及其監控方法可藉由二氧化碳監控模組直接提供二氧化碳至溫室中,因此可以減少能源的消耗。 Based on the above, in the greenhouse device for monitoring plant plant growth factors and the monitoring method thereof, the above-mentioned carbon dioxide monitoring module, ozone monitoring module and ethylene monitoring module can effectively regulate plant plant growth factors. . In addition, the greenhouse device and the monitoring method thereof for monitoring plant plant growth factors proposed by the disclosure can achieve full monitoring of the plant growth process, assisted regulation of plant growth rate, and safe and non-toxicity of greenhouse disinfection and purification. In addition, the greenhouse device for monitoring plant plant growth factors and the monitoring method thereof provided by the present disclosure can directly supply carbon dioxide to the greenhouse through the carbon dioxide monitoring module, as compared with the direct carbon dioxide supplementation method. Can reduce energy consumption.

為讓本揭露之上述特徵和優點能更明顯易懂,下文特舉出實施例,並配合所附圖式作詳細說明如下,但不以此為限。 The above features and advantages of the present invention will be more apparent from the following description.

100‧‧‧溫室裝置 100‧‧‧Greenhouse installation

102‧‧‧溫室 102‧‧ ‧ greenhouse

104‧‧‧二氧化碳監控模組 104‧‧‧CO2 monitoring module

106‧‧‧臭氧監控模組 106‧‧‧Ozone monitoring module

108‧‧‧乙烯監控模組 108‧‧‧Ethylene monitoring module

110‧‧‧二氧化碳濃度感測器 110‧‧‧Carbon dioxide concentration sensor

112‧‧‧二氧化碳供應裝置 112‧‧‧CO2 supply unit

114‧‧‧臭氧供應裝置 114‧‧‧Ozone supply unit

116‧‧‧臭氧濃度感測器 116‧‧‧Ozone concentration sensor

118‧‧‧乙烯濃度感測器 118‧‧‧Ethylene concentration sensor

120‧‧‧乙烯供應裝置 120‧‧‧Ethylene supply unit

122‧‧‧氧氣監控模組 122‧‧‧Oxygen monitoring module

124‧‧‧光源日照監控模組 124‧‧‧Light source sunshine monitoring module

126‧‧‧濕度監控模組 126‧‧‧Humidity monitoring module

128‧‧‧溫度監控模組 128‧‧‧ Temperature Monitoring Module

130‧‧‧太陽能電池 130‧‧‧Solar battery

132‧‧‧氣體循環裝置 132‧‧‧ gas circulation device

134‧‧‧回饋控制模組 134‧‧‧Feedback Control Module

136‧‧‧人機介面控制操作裝置 136‧‧‧Man-machine interface control operating device

138‧‧‧數位監控介面 138‧‧‧Digital monitoring interface

140‧‧‧氧氣供應裝置 140‧‧‧Oxygen supply unit

142‧‧‧氧氣濃度感測器 142‧‧‧Oxygen concentration sensor

144‧‧‧光合作用光源 144‧‧‧Photosynthetic light source

146‧‧‧光感測器 146‧‧‧Light sensor

148‧‧‧濕度感測器 148‧‧‧Humidity sensor

150‧‧‧濕氣系統 150‧‧‧Moisture system

152‧‧‧溫度計 152‧‧‧ thermometer

154‧‧‧升降溫裝置 154‧‧‧Lifting and lowering device

200‧‧‧植物蔬果 200‧‧‧ plants and fruits

S100、S102、S104、S106、S108、S110、S112、S200、S202、 S204、S206、S208、S210、S212、S300、S302、S304、S306、S308、S310、S312、S400、S402、S404、S406、S408、S410、S500、S502、S504、S506、S508、S510、S512、S600、S602、S604、S606、S608、S610、S612、S700、S702、S704、S706、S708、S710、S712、S800、S802、S804、S806、S808、S810、S812、S900、S902、S904、S906、S908、S910、S912、S1000、S1002、S1004、S1006、S1008‧‧‧步驟 S100, S102, S104, S106, S108, S110, S112, S200, S202, S204, S206, S208, S210, S212, S300, S302, S304, S306, S308, S310, S312, S400, S402, S404, S406, S408, S410, S500, S502, S504, S506, S508, S510, S512, S600, S602, S604, S606, S608, S610, S612, S700, S702, S704, S706, S708, S710, S712, S800, S802, S804, S806, S808, S810, S810, S900, S902, S904, S906, S908, S910, S912, S1000, S1002, S1004, S1006, S1008‧‧‧ steps

圖1所繪示為本揭露之一實施例所述之監控植物工廠生長因子的溫室裝置的示意圖。 FIG. 1 is a schematic diagram of a greenhouse apparatus for monitoring plant plant growth factors according to an embodiment of the present disclosure.

圖2所繪示為本揭露之一實施例的植物工廠的二氧化碳濃度的監控方法。 FIG. 2 illustrates a method for monitoring carbon dioxide concentration in a plant factory according to an embodiment of the present disclosure.

圖3所繪示為本揭露之一實施例的植物工廠的臭氧濃度的監控方法。 FIG. 3 illustrates a method for monitoring ozone concentration of a plant factory according to an embodiment of the present disclosure.

圖4所繪示為本揭露之一實施例的植物工廠的臭氧濃度與乙烯濃度的監控方法。 FIG. 4 illustrates a method for monitoring ozone concentration and ethylene concentration in a plant factory according to an embodiment of the present disclosure.

圖5所繪示為本揭露之另一實施例的植物工廠的臭氧濃度與乙烯濃度的監控方法。 FIG. 5 illustrates a method for monitoring ozone concentration and ethylene concentration in a plant factory according to another embodiment of the present disclosure.

圖6所繪示為本揭露之一實施例的植物工廠的乙烯濃度的監控方法。 FIG. 6 illustrates a method for monitoring ethylene concentration in a plant factory according to an embodiment of the present disclosure.

圖7所繪示為本揭露之一實施例的植物工廠的氧氣濃度的監控方法。 FIG. 7 illustrates a method for monitoring the oxygen concentration of a plant factory according to an embodiment of the present disclosure.

圖8所繪示為本揭露之一實施例的植物工廠的光照參數的監控方法。 FIG. 8 illustrates a method for monitoring illumination parameters of a plant factory according to an embodiment of the present disclosure.

圖9所繪示為本揭露之一實施例的植物工廠的濕度的監控方 法。 FIG. 9 is a diagram showing the monitoring of the humidity of a plant factory according to an embodiment of the present disclosure. law.

圖10所繪示為本揭露之一實施例的植物工廠的溫度的監控方法。 FIG. 10 illustrates a method for monitoring the temperature of a plant factory according to an embodiment of the present disclosure.

圖11所繪示為本揭露之一實施例的植物工廠利用臭氧監控模組中的臭氧內處理控制箱所進行的內循環消毒殺菌方法。 FIG. 11 illustrates an internal circulation sterilization method performed by an ozone internal treatment control box in a plant factory using an ozone monitoring module according to an embodiment of the present disclosure.

圖1所繪示為本揭露之一實施例所述之監控植物工廠生長因子的溫室裝置的示意圖。 FIG. 1 is a schematic diagram of a greenhouse apparatus for monitoring plant plant growth factors according to an embodiment of the present disclosure.

請參照圖1,監控植物工廠生長因子的溫室裝置100應用於溫室102,且包括二氧化碳監控模組104、臭氧監控模組106及乙烯監控模組108。溫室裝置100可應用於培育植物蔬果200的植物工廠。溫室102用以提供培養植物蔬果200的空間。 Referring to FIG. 1, a greenhouse device 100 for monitoring plant plant growth factors is applied to the greenhouse 102, and includes a carbon dioxide monitoring module 104, an ozone monitoring module 106, and an ethylene monitoring module 108. The greenhouse device 100 can be applied to a plant factory that cultivates plants and vegetables 200. The greenhouse 102 is used to provide a space for cultivating the plants and vegetables 200.

二氧化碳監控模組104例如是裝設於溫室102,以監控溫室102中的二氧化碳濃度,而可對植物蔬果200的生長進行控制。二氧化碳濃度監控可應用在作物育苗、定植、開花與結果階段的氣肥需求、以及儲藏與運送階段的保鮮需求。二氧化碳監控模組104包括二氧化碳濃度感測器110及二氧化碳供應裝置112。二氧化碳濃度感測器110用以感測二氧化碳濃度。二氧化碳供應裝置112用以供應二氧化碳至溫室102中,可以透過二氧化碳供應裝置112對二氧化碳的濃度調控,來減少透過外氣方式補充二氧化碳所產生的能耗。二氧化碳供應裝置112例如是二氧化碳鋼瓶或二氧 化碳廢氣儲槽。 The carbon dioxide monitoring module 104 is installed, for example, in the greenhouse 102 to monitor the concentration of carbon dioxide in the greenhouse 102 to control the growth of the plant and fruit 200. Carbon dioxide concentration monitoring can be applied to the demand for gas and fertilizer in crop seedling, planting, flowering and fruiting stages, as well as preservation needs during storage and transportation. The carbon dioxide monitoring module 104 includes a carbon dioxide concentration sensor 110 and a carbon dioxide supply device 112. The carbon dioxide concentration sensor 110 is used to sense the concentration of carbon dioxide. The carbon dioxide supply device 112 is used to supply carbon dioxide into the greenhouse 102, and can regulate the concentration of carbon dioxide through the carbon dioxide supply device 112 to reduce the energy consumption generated by supplementing carbon dioxide through the external air. The carbon dioxide supply device 112 is, for example, a carbon dioxide cylinder or a dioxane Carbon waste gas storage tank.

臭氧監控模組106例如是裝設於溫室102,以監控溫室102中的臭氧濃度,且藉由臭氧監控模組106所供應的臭氧對溫室102進行臭氧處理。臭氧濃度監控可應用在作物種苗、育苗與定植階段的殺菌與除蟲需求、採收階段的清洗與消毒需求、以及儲藏與運送階段的防黴與保鮮需求。在此實施例中,臭氧處理例如是溫室消毒殺菌處理或抑制植物生長或熟化的處理。此外,臭氧監控模組106可在密閉植物工廠內使臭氧消毒淨化及控制植物荷爾蒙達到安全有效的運作。臭氧監控模組106包括臭氧供應裝置114及臭氧濃度感測器116。臭氧供應裝置114用以供應臭氧。臭氧濃度感測器116用以感測臭氧濃度。臭氧供應裝置114例如是臭氧內處理控制箱或臭氧產生機。此外,臭氧供應裝置114例如是電暈放電臭氧產生裝置、紫外線燈管臭氧產生裝置或電解水臭氧產生裝置。臭氧供應裝置114的氣體來源可為氧氣供應裝置140、空氣鋼瓶或純化後的乾燥空氣。當要避免臭氧處理時的臭氧散逸到溫室102中時,臭氧供應裝置114可採用臭氧內處理控制箱,以在臭氧內處理控制箱完成臭氧處理,而可避免臭氧對操作者造成傷害。詳言之,臭氧內處理控制箱可具有臭氧洗滌器,因此在將氣體排出臭氧內處理控制箱之前,能藉由臭氧洗滌器將氣體中的臭氧進行降解,以將臭氧濃度降低至臭氧濃度排放設定值。臭氧洗滌器例如是加熱式臭氧洗滌器或吸附式臭氧洗滌器。然而,需注意的是,臭氧內處理控制箱亦可將其所供應的臭氧導入溫室102 中。 The ozone monitoring module 106 is installed, for example, in the greenhouse 102 to monitor the ozone concentration in the greenhouse 102, and ozone treatment is performed on the greenhouse 102 by the ozone supplied by the ozone monitoring module 106. Ozone concentration monitoring can be applied to the sterilization and de-worming needs of crop seedlings, seedlings and colonization stages, cleaning and disinfection requirements during the harvesting stage, and mold and preservation requirements during storage and transportation. In this embodiment, the ozone treatment is, for example, a greenhouse sterilization treatment or a treatment for inhibiting plant growth or ripening. In addition, the ozone monitoring module 106 can perform ozone disinfection and purification and control of plant hormones in a closed plant factory to achieve safe and effective operation. The ozone monitoring module 106 includes an ozone supply device 114 and an ozone concentration sensor 116. The ozone supply device 114 is used to supply ozone. The ozone concentration sensor 116 is used to sense the ozone concentration. The ozone supply device 114 is, for example, an ozone internal treatment control box or an ozone generator. Further, the ozone supply device 114 is, for example, a corona discharge ozone generating device, an ultraviolet lamp ozone generating device, or an electrolyzed water ozone generating device. The gas source of the ozone supply device 114 can be an oxygen supply device 140, an air cylinder, or purified dry air. When ozone in the ozone treatment is to be prevented from being dissipated into the greenhouse 102, the ozone supply device 114 can adopt an ozone internal treatment control box to complete the ozone treatment in the ozone treatment control box, and can prevent the ozone from injuring the operator. In particular, the ozone internal control box can have an ozone scrubber, so that the ozone in the gas can be degraded by the ozone scrubber to reduce the ozone concentration to the ozone concentration before the gas is discharged into the ozone treatment chamber. Set value. The ozone scrubber is, for example, a heated ozone scrubber or an adsorbent ozone scrubber. However, it should be noted that the ozone treatment control box can also introduce the ozone supplied thereto into the greenhouse 102. in.

乙烯監控模組108例如是裝設於溫室102,以監控溫室102中的乙烯濃度,而可對植物蔬果200的生長或熟化進行控制,進而能夠進行溫室102內植物蔬果200的生長荷爾蒙在室內循環控制系統內處理,達到促進生長熟成或抑制的產銷規劃運用。乙烯濃度監控可應用在作物開花與結果階段的催熟需求、以及儲藏與運送階段的保鮮需求。乙烯監控模組108包括乙烯濃度感測器118,用以感測溫室102中的乙烯濃度。在另一實施例,當臭氧供應裝置114為臭氧內處理控制箱時,乙烯濃度感測器118亦可用以感測臭氧供應裝置114中的乙烯濃度。乙烯濃度感測器118例如是光游離感測器(photo ionization detector)。此外,乙烯監控模組108更包括乙烯供應裝置120,用以供應乙烯至溫室102中,而有助於促進植物蔬果200的生長或熟化。乙烯供應裝置120例如是乙烯鋼瓶。 The ethylene monitoring module 108 is installed, for example, in the greenhouse 102 to monitor the ethylene concentration in the greenhouse 102, and can control the growth or ripening of the plant and fruit 200, thereby enabling the growth hormone of the plant and fruit 200 in the greenhouse 102 to be circulated indoors. Control system processing to achieve production and marketing planning to promote growth or inhibition. Ethylene concentration monitoring can be applied to the ripening needs of the flowering and fruiting stages of the crop, as well as the preservation requirements during the storage and transport stages. The ethylene monitoring module 108 includes an ethylene concentration sensor 118 for sensing the ethylene concentration in the greenhouse 102. In another embodiment, the ethylene concentration sensor 118 can also be used to sense the ethylene concentration in the ozone supply device 114 when the ozone supply device 114 is an ozone internal processing control box. The ethylene concentration sensor 118 is, for example, a photo ionization detector. In addition, the ethylene monitoring module 108 further includes an ethylene supply device 120 for supplying ethylene into the greenhouse 102 to help promote the growth or ripening of the plant and vegetable 200. The ethylene supply device 120 is, for example, an ethylene cylinder.

此外,溫室裝置100更可包括氧氣監控模組122、光源日照監控模組124、濕度監控模組126、溫度監控模組128、太陽能電池130、氣體循環裝置132、回饋控制模組134、人機介面控制操作裝置136及數位監控介面138中的至少一者。 In addition, the greenhouse device 100 further includes an oxygen monitoring module 122, a light source sunshine monitoring module 124, a humidity monitoring module 126, a temperature monitoring module 128, a solar battery 130, a gas circulation device 132, a feedback control module 134, and a human machine. The interface controls at least one of the operating device 136 and the digital monitoring interface 138.

氧氣監控模組122例如是裝設於溫室102,用以監控溫室102中的氧氣濃度,而可對植物蔬果200的種苗提供適度的氣肥並對呼吸作用進行調控。氧氣濃度監控可應用在作物種苗階段的催芽需求。氧氣監控模組122包括氧氣供應裝置140及氧氣濃度感 測器142。氧氣供應裝置140用以供應氧氣至溫室102中,可以透過氧氣供應裝置140對氧氣的濃度調控,來減少透過外氣方式補充氧氣所產生的能耗。氧氣供應裝置140例如是氧氣鋼瓶或氧氣產生機。氧氣濃度感測器142用以感測氧氣濃度。此外,氧氣供應裝置140亦可作為臭氧供應裝置114的氣體來源。 The oxygen monitoring module 122 is installed, for example, in the greenhouse 102 to monitor the oxygen concentration in the greenhouse 102, and can provide a moderate amount of gas fertilizer to the seed of the plant and vegetable 200 and regulate the respiration. Oxygen concentration monitoring can be applied to the germination requirements of the crop seedling stage. The oxygen monitoring module 122 includes an oxygen supply device 140 and a sense of oxygen concentration Detector 142. The oxygen supply device 140 is used to supply oxygen to the greenhouse 102, and the oxygen supply device 140 can regulate the concentration of oxygen to reduce the energy consumption of oxygen supplementation through the external air. The oxygen supply device 140 is, for example, an oxygen cylinder or an oxygen generator. The oxygen concentration sensor 142 is used to sense the oxygen concentration. In addition, the oxygen supply device 140 can also serve as a source of gas for the ozone supply device 114.

光源日照監控模組124例如是裝設於溫室102,用以監控溫室102中的光照參數,可以讓植物蔬果200在生長光合作用因子的搭配下,達到真正全天候無間斷光合作用的體系運作,以大量生長並延長產季。光源日照監控模組124包括光合作用光源144及光感測器146。光合作用光源144可用以提供植物蔬果200進行光合作用所需的光源。光合作用光源144例如是光合作用LED光源或太陽模擬光源。光感測器146用以感測溫室102中的光照參數。 The light source sunshine monitoring module 124 is installed, for example, in the greenhouse 102 to monitor the illumination parameters in the greenhouse 102, so that the plant and vegetable 200 can achieve a truly all-weather uninterrupted photosynthesis system operation under the cooperation of the growth photosynthesis factor. Large growth and extended season. The light source sunshine monitoring module 124 includes a photosynthesis light source 144 and a light sensor 146. The photosynthesis light source 144 can be used to provide the light source required for photosynthesis of the plant and vegetable 200. The photosynthesis light source 144 is, for example, a photosynthesis LED light source or a solar analog light source. The light sensor 146 is used to sense the illumination parameters in the greenhouse 102.

濕度監控模組126例如是裝設於溫室102,用以監控溫室102中的濕度。濕度監控模組126包括濕度感測器148及濕氣系統150。濕度感測器148用以感測溫室102中的濕度。濕氣系統150用以提供溫室102適當的濕氣。 The humidity monitoring module 126 is installed, for example, in the greenhouse 102 to monitor the humidity in the greenhouse 102. The humidity monitoring module 126 includes a humidity sensor 148 and a moisture system 150. Humidity sensor 148 is used to sense the humidity in greenhouse 102. The moisture system 150 is used to provide proper moisture to the greenhouse 102.

溫度監控模組128例如是裝設於溫室102,以監控溫室102中的溫度。溫度監控模組128包括溫度計152及升降溫裝置154。溫度計152用以量測溫室102中的溫度。升降溫裝置154用以調整溫室102中的溫度。 The temperature monitoring module 128 is, for example, installed in the greenhouse 102 to monitor the temperature in the greenhouse 102. The temperature monitoring module 128 includes a thermometer 152 and a temperature rise and fall device 154. Thermometer 152 is used to measure the temperature in greenhouse 102. The temperature rise and fall device 154 is used to adjust the temperature in the greenhouse 102.

太陽能電池130例如是裝設於溫室102的照光面,可用 以提供溫室裝置100再生能源,以達到綠能農業的目的。太陽能電池130的數量可依據對於溫室裝置100的設計進行調整,可全面性或部份覆蓋於溫室102的屋頂。 The solar cell 130 is, for example, installed on the illuminating surface of the greenhouse 102, and is available In order to provide renewable energy for the greenhouse device 100, the purpose of green energy agriculture is achieved. The number of solar cells 130 can be adjusted depending on the design of the greenhouse device 100, and can be comprehensively or partially covered on the roof of the greenhouse 102.

氣體循環裝置132例如是裝設於溫室102,用以使得溫室102中的氣體進行流動。氣體循環裝置132例如是風扇循環裝置。此外,氣體循環裝置132亦可具有過濾功能,而能與臭氧監控模組106共同運作而使循環式內流動空氣達到清淨、降解與消毒的目的。 The gas circulation device 132 is installed, for example, in the greenhouse 102 to allow the gas in the greenhouse 102 to flow. The gas circulation device 132 is, for example, a fan circulation device. In addition, the gas circulation device 132 can also have a filtering function, and can cooperate with the ozone monitoring module 106 to achieve the purpose of cleaning, degrading and disinfecting the circulating air.

回饋控制模組134具備多個回饋控制器。回饋控制器例如是二氧化碳回饋控制器、臭氧回饋控制器、乙烯回饋控制器、氧氣回饋控制器、光源日照回饋控制器、濕度回饋控制器及溫度回饋控制器等,分別耦接至二氧化碳監控模組104、臭氧監控模組106、乙烯監控模組108、氧氣監控模組122、光源日照監控模組124、濕度監控模組126及溫度監控模組128等,用以回饋控制二氧化碳濃度、臭氧濃度、乙烯濃度、氧氣濃度、光源日照、濕度及溫度等。回饋控制器例如是比例積分微分控制器(proportional integral derivative(PID)controller)。 The feedback control module 134 is provided with a plurality of feedback controllers. The feedback controller is, for example, a carbon dioxide feedback controller, an ozone feedback controller, an ethylene feedback controller, an oxygen feedback controller, a light source sunshine feedback controller, a humidity feedback controller, and a temperature feedback controller, respectively coupled to the carbon dioxide monitoring module. 104, ozone monitoring module 106, ethylene monitoring module 108, oxygen monitoring module 122, light source sunshine monitoring module 124, humidity monitoring module 126 and temperature monitoring module 128, etc., for feedback control of carbon dioxide concentration, ozone concentration, Ethylene concentration, oxygen concentration, sunlight, humidity and temperature. The feedback controller is, for example, a proportional integral derivative (PID) controller.

人機介面控制操作裝置136例如是耦接至二氧化碳監控模組104、臭氧監控模組106、乙烯監控模組108、氧氣監控模組122、光源日照監控模組124、濕度監控模組126及溫度監控模組128,可方便選擇所需的各種溫室裝置100的消毒淨化與控制生長或熟化的功能程序。 The human interface control operating device 136 is coupled to, for example, the carbon dioxide monitoring module 104, the ozone monitoring module 106, the ethylene monitoring module 108, the oxygen monitoring module 122, the light source sunshine monitoring module 124, the humidity monitoring module 126, and the temperature. The monitoring module 128 can conveniently select the desired functional programs for disinfecting and purifying and controlling growth or ripening of the various greenhouse devices 100.

數位監控介面138例如是耦接至二氧化碳監控模組104、臭氧監控模組106、乙烯監控模組108、氧氣監控模組122、光源日照監控模組124、濕度監控模組126及溫度監控模組128,可以透過RS232、485、網路或無線傳輸方式執行電腦(PC/NB)遠端設定控制。舉例來說,數位監控介面138,例如是數位監控印刷電路板(PCB),可以產生品質紀錄,且可以電腦端軟體執行監控操作設定,提高使用管控效率。 The digital monitoring interface 138 is coupled to the carbon dioxide monitoring module 104, the ozone monitoring module 106, the ethylene monitoring module 108, the oxygen monitoring module 122, the light source sunshine monitoring module 124, the humidity monitoring module 126, and the temperature monitoring module. 128, computer (PC / NB) remote setting control can be performed through RS232, 485, network or wireless transmission. For example, the digital monitoring interface 138, for example, a digital monitoring printed circuit board (PCB), can generate a quality record, and can perform monitoring operation settings on the computer software to improve the efficiency of use control.

在本實施例中,植物工廠生長因子的監控方法可藉由上述溫室裝置100來對植物蔬果200的生長因子進行監控。植物工廠生長因子的監控方法包括下列步驟。利用二氧化碳監控模組104監控溫室102中的二氧化碳濃度。利用臭氧監控模組106監控溫室102中的臭氧濃度,且藉由臭氧監控模組106所供應的臭氧對溫室102進行臭氧處理。利用乙烯監控模組108監控溫室102中的乙烯濃度。此外,植物工廠生長因子的監控方法更可包括利用氧氣監控模組122監控溫室102中的氧氣濃度、利用光源日照監控模組124監控溫室102中的光照參數、利用濕度監控模組126監控溫室102中的濕度與利用溫度監控模組128監控溫室102中的溫度的至少一監控程序。藉由植物工廠生長因子的監控方法可進行溫室裝置100的消毒淨化功能與監控植物蔬果200的生長或熟化所需的各種生長因子。 In the present embodiment, the method for monitoring plant plant growth factors can monitor the growth factors of the plant and vegetable 200 by the above-described greenhouse device 100. The method of monitoring plant growth factors includes the following steps. The carbon dioxide concentration in the greenhouse 102 is monitored using the carbon dioxide monitoring module 104. The ozone monitoring module 106 is used to monitor the ozone concentration in the greenhouse 102, and the greenhouse 102 is subjected to ozone treatment by the ozone supplied by the ozone monitoring module 106. The ethylene concentration in the greenhouse 102 is monitored using an ethylene monitoring module 108. In addition, the monitoring method of the plant factory growth factor may further include monitoring the oxygen concentration in the greenhouse 102 by using the oxygen monitoring module 122, monitoring the illumination parameter in the greenhouse 102 by using the light source sunshine monitoring module 124, and monitoring the greenhouse 102 by using the humidity monitoring module 126. The humidity and utilization temperature monitoring module 128 monitors at least one monitoring program of the temperature in the greenhouse 102. The sterilization and purification function of the greenhouse device 100 and various growth factors required for monitoring the growth or ripening of the plant and vegetable 200 can be performed by the monitoring method of the plant factory growth factor.

以下,藉由圖2至圖10的實施例來進行說明植物工廠生長因子的監控方法。圖2至圖10的實施例可採用圖1所示的監控 植物工廠生長因子的溫室裝置來進行說明,其中相關構件已於圖1的實施例中進行說明,故於下述實施例中將不再贅述。 Hereinafter, a method of monitoring a plant plant growth factor will be described with reference to the examples of FIGS. 2 to 10. The embodiment of Figures 2 to 10 can be monitored as shown in Figure 1. The greenhouse device of the plant plant growth factor is described, and the relevant components have been described in the embodiment of Fig. 1, and therefore will not be described again in the following examples.

圖2所繪示為本揭露之一實施例的植物工廠的二氧化碳濃度的監控方法。 FIG. 2 illustrates a method for monitoring carbon dioxide concentration in a plant factory according to an embodiment of the present disclosure.

植物工廠的二氧化碳濃度的監控方法可應用於供應二氧化碳氣肥,以控制植物蔬果200的生長速度。 The monitoring method of the carbon dioxide concentration of the plant factory can be applied to supply carbon dioxide gas fertilizer to control the growth rate of the plant and vegetable 200.

首先,請同時參照圖1及圖2,進行步驟S100,設定二氧化碳濃度設定值。 First, please refer to FIG. 1 and FIG. 2 simultaneously, and step S100 is performed to set the carbon dioxide concentration setting value.

接著,進行步驟S102,啟動二氧化碳監控模組104中的二氧化碳濃度感測器110,以感測溫室102中的二氧化碳濃度。 Next, in step S102, the carbon dioxide concentration sensor 110 in the carbon dioxide monitoring module 104 is activated to sense the concentration of carbon dioxide in the greenhouse 102.

然後,進行步驟S104,啟動二氧化碳回饋控制器,對二氧化碳濃度設定值與測得的二氧化碳濃度進行分析,來決定二氧化碳需求量。 Then, in step S104, the carbon dioxide feedback controller is activated to analyze the carbon dioxide concentration set value and the measured carbon dioxide concentration to determine the carbon dioxide demand.

接下來,進行步驟S106,啟動二氧化碳氣體控制組件,以依據二氧化碳需求量來導入二氧化碳至溫室102中。其中,二氧化碳氣體控制組件例如是用以調配二氧化碳供應裝置112所供應的二氧化碳的流量與濃度的閥件。 Next, proceeding to step S106, the carbon dioxide gas control unit is activated to introduce carbon dioxide into the greenhouse 102 in accordance with the carbon dioxide demand. The carbon dioxide gas control component is, for example, a valve member for modulating the flow rate and concentration of carbon dioxide supplied by the carbon dioxide supply device 112.

之後,進行步驟S108,在導入二氧化碳之後,判斷二氧化碳濃度是否已達到二氧化碳濃度設定值。當二氧化碳濃度低於二氧化碳濃度設定值時,則再次進行啟動二氧化碳回饋控制器的步驟與啟動二氧化碳氣體控制組件的步驟。當二氧化碳濃度已達到二氧化碳濃度設定值時,則進行步驟S110,停止導入二氧化碳 並持續監控二氧化碳濃度。 Thereafter, step S108 is performed to determine whether the carbon dioxide concentration has reached the carbon dioxide concentration setting value after the introduction of carbon dioxide. When the carbon dioxide concentration is lower than the carbon dioxide concentration set value, the step of starting the carbon dioxide feedback controller and the step of starting the carbon dioxide gas control assembly are performed again. When the carbon dioxide concentration has reached the set value of the carbon dioxide concentration, proceed to step S110 to stop the introduction of carbon dioxide. And continuously monitor the carbon dioxide concentration.

此外,二氧化碳濃度的監控方法更可進行步驟S112,在停止導入二氧化碳並持續監控二氧化碳濃度時,判斷二氧化碳濃度是否低於二氧化碳濃度設定值。當二氧化碳濃度低於二氧化碳濃度設定值時,則再次進行啟動二氧化碳回饋控制器的步驟S104與啟動二氧化碳氣體控制組件S106的步驟。當二氧化碳濃度已達到二氧化碳濃度設定值時,則進行步驟S110,停止導入二氧化碳並持續監控二氧化碳濃度。 Further, the monitoring method of the carbon dioxide concentration can be further carried out in step S112, and when the introduction of carbon dioxide is stopped and the carbon dioxide concentration is continuously monitored, it is judged whether or not the carbon dioxide concentration is lower than the carbon dioxide concentration setting value. When the carbon dioxide concentration is lower than the carbon dioxide concentration set value, the step S104 of starting the carbon dioxide feedback controller and the step of starting the carbon dioxide gas control unit S106 are performed again. When the carbon dioxide concentration has reached the carbon dioxide concentration set value, step S110 is performed to stop the introduction of carbon dioxide and continuously monitor the carbon dioxide concentration.

圖3所繪示為本揭露之一實施例的植物工廠的臭氧濃度的監控方法。 FIG. 3 illustrates a method for monitoring ozone concentration of a plant factory according to an embodiment of the present disclosure.

植物工廠的臭氧濃度的監控方法可應用於對植物工廠進行溫室消毒殺菌處理,以使溫室102內部流動的空氣達到清淨與消毒的目的。 The monitoring method of the ozone concentration of the plant factory can be applied to the greenhouse disinfection treatment of the plant factory, so that the air flowing inside the greenhouse 102 can be cleaned and disinfected.

首先,請同時參照圖1及圖3,進行步驟S200,設定臭氧濃度設定值。 First, please refer to FIG. 1 and FIG. 3 simultaneously, and step S200 is performed to set the ozone concentration setting value.

接著,進行步驟S202,啟動臭氧監控模組106中的臭氧濃度感測器116與臭氧供應裝置114,以藉由臭氧濃度感測器116感測溫室102中的臭氧濃度,且藉由臭氧供應裝置114供應臭氧。 Next, step S202 is performed to start the ozone concentration sensor 116 and the ozone supply device 114 in the ozone monitoring module 106 to sense the ozone concentration in the greenhouse 102 by the ozone concentration sensor 116, and supply the ozone by ozone. Device 114 supplies ozone.

然後,進行步驟S204,啟動臭氧回饋控制器,對臭氧濃度設定值與測得的臭氧濃度進行分析,來決定臭氧需求量。 Then, in step S204, the ozone feedback controller is started, and the ozone concentration set value and the measured ozone concentration are analyzed to determine the ozone demand amount.

接下來,進行步驟S206,啟動臭氧氣體控制組件,以依據臭氧需求量來導入臭氧至溫室102中。其中,臭氧氣體控制組 件例如是用以調配臭氧供應裝置114所供應的臭氧的流量與濃度的閥件。在導入臭氧至溫室102時,更可啟動氣體循環裝置132並導入乾燥氣源。 Next, proceeding to step S206, the ozone gas control unit is activated to introduce ozone into the greenhouse 102 in accordance with the ozone demand. Among them, the ozone gas control group The member is, for example, a valve member for arranging the flow rate and concentration of ozone supplied from the ozone supply device 114. When the ozone is introduced into the greenhouse 102, the gas circulation device 132 can be activated and introduced into the dry gas source.

之後,進行步驟S208,在導入臭氧之後,判斷臭氧濃度是否已達到臭氧濃度設定值。當臭氧濃度低於臭氧濃度設定值時,則再次進行啟動臭氧回饋控制器的步驟S204與啟動臭氧氣體控制組件的步驟S206。當臭氧濃度已達到臭氧濃度設定值時,則進行步驟S210,停止導入臭氧並持續監控臭氧濃度。 Thereafter, step S208 is performed to determine whether the ozone concentration has reached the ozone concentration setting value after the introduction of ozone. When the ozone concentration is lower than the ozone concentration set value, the step S204 of starting the ozone feedback controller and the step S206 of starting the ozone gas control unit are performed again. When the ozone concentration has reached the ozone concentration set value, step S210 is performed to stop the introduction of ozone and continuously monitor the ozone concentration.

此外,臭氧濃度的監控方法更可進行步驟S212,在停止導入臭氧並持續監控臭氧濃度時,判斷臭氧濃度是否低於臭氧濃度設定值。當臭氧濃度低於臭氧濃度設定值時,則再次進行啟動臭氧回饋控制器的步驟S204與啟動臭氧氣體控制組件的步驟S208。當臭氧濃度已達到臭氧濃度設定值時,則進行步驟S210,停止導入臭氧並持續監控臭氧濃度。 Further, the ozone concentration monitoring method can be further performed in step S212, and when the introduction of ozone is stopped and the ozone concentration is continuously monitored, it is judged whether the ozone concentration is lower than the ozone concentration setting value. When the ozone concentration is lower than the ozone concentration set value, step S204 of starting the ozone feedback controller and step S208 of starting the ozone gas control unit are performed again. When the ozone concentration has reached the ozone concentration set value, step S210 is performed to stop the introduction of ozone and continuously monitor the ozone concentration.

圖4所繪示為本揭露之一實施例的植物工廠的臭氧濃度與乙烯濃度的監控方法。 FIG. 4 illustrates a method for monitoring ozone concentration and ethylene concentration in a plant factory according to an embodiment of the present disclosure.

植物工廠的臭氧濃度與乙烯濃度的監控方法可應用於抑制植物生長或熟化的處理,以有效地控制植物蔬果200的生長與熟化。 The method for monitoring the ozone concentration and the ethylene concentration of the plant factory can be applied to the treatment for inhibiting plant growth or ripening to effectively control the growth and ripening of the plant and vegetable 200.

首先,請同時參照圖1及圖4,進行步驟S300,設定臭氧濃度設定值與乙烯濃度設定值。 First, referring to FIG. 1 and FIG. 4 simultaneously, step S300 is performed to set the ozone concentration set value and the ethylene concentration set value.

接著,進行步驟S302,啟動臭氧監控模組106中的臭氧 濃度感測器116與臭氧供應裝置114、與乙烯監控模組108中的乙烯濃度感測器118,以分別藉由臭氧濃度感測器116與乙烯濃度感測器118感測溫室102中的臭氧濃度與乙烯濃度,且藉由臭氧供應裝置114供應臭氧。 Then, step S302 is performed to start ozone in the ozone monitoring module 106. The concentration sensor 116 and the ozone supply device 114, and the ethylene concentration sensor 118 in the ethylene monitoring module 108 sense the liquid crystal 102 in the greenhouse 102 by the ozone concentration sensor 116 and the ethylene concentration sensor 118, respectively. The ozone concentration and the ethylene concentration are supplied to the ozone by the ozone supply device 114.

然後,進行步驟S304,啟動臭氧回饋控制器,對臭氧濃度設定值與測得的臭氧濃度進行分析,來決定臭氧需求量。 Then, in step S304, the ozone feedback controller is started to analyze the ozone concentration set value and the measured ozone concentration to determine the ozone demand amount.

接下來,進行步驟S306,啟動臭氧氣體控制組件,以依據臭氧需求量來導入臭氧至溫室102中。其中,臭氧氣體控制組件,例如是用以調配臭氧供應裝置114所供應的臭氧的流量與濃度的閥件。在導入臭氧至溫室102時,更可啟動氣體循環裝置132並導入乾燥氣源。 Next, proceeding to step S306, the ozone gas control unit is activated to introduce ozone into the greenhouse 102 in accordance with the ozone demand. Among them, the ozone gas control unit is, for example, a valve member for arranging the flow rate and concentration of ozone supplied from the ozone supply device 114. When the ozone is introduced into the greenhouse 102, the gas circulation device 132 can be activated and introduced into the dry gas source.

之後,進行步驟S308,在導入臭氧之後,判斷臭氧濃度是否已達到臭氧濃度設定值或乙烯濃度是否已達到乙烯濃度設定值。當臭氧濃度低於臭氧濃度設定值或乙烯濃度高於乙烯濃度設定值時,則再次進行啟動臭氧回饋控制器的步驟S304與啟動臭氧氣體控制組件的步驟S306。當臭氧濃度已達到臭氧濃度設定值或乙烯濃度已達到乙烯濃度設定值時,則進行步驟S310,停止導入臭氧並持續監控臭氧濃度或乙烯濃度。 Thereafter, in step S308, after the introduction of ozone, it is determined whether the ozone concentration has reached the ozone concentration set value or whether the ethylene concentration has reached the ethylene concentration set value. When the ozone concentration is lower than the ozone concentration set value or the ethylene concentration is higher than the ethylene concentration set value, the step S304 of starting the ozone feedback controller and the step S306 of starting the ozone gas control unit are performed again. When the ozone concentration has reached the ozone concentration set value or the ethylene concentration has reached the ethylene concentration set value, then step S310 is performed to stop the introduction of ozone and continuously monitor the ozone concentration or the ethylene concentration.

此外,臭氧濃度與乙烯濃度的監控方法更可進行步驟S312,在停止導入臭氧並持續監控臭氧濃度或乙烯濃度時,判斷臭氧濃度是否低於臭氧濃度設定值或乙烯濃度是否高於乙烯濃度設定值。當臭氧濃度低於臭氧濃度設定值或乙烯濃度高於乙烯濃 度設定值時,則再次進行啟動臭氧回饋控制器的步驟S304與啟動臭氧氣體控制組件的步驟S306。當臭氧濃度已達到臭氧濃度設定值或乙烯濃度已達到乙烯濃度設定值時,則進行步驟S310,停止導入臭氧並持續監控臭氧濃度或乙烯濃度。 In addition, the ozone concentration and the ethylene concentration monitoring method can be further performed in step S312. When the introduction of ozone is stopped and the ozone concentration or the ethylene concentration is continuously monitored, it is determined whether the ozone concentration is lower than the ozone concentration setting value or whether the ethylene concentration is higher than the ethylene concentration setting value. . When the ozone concentration is lower than the ozone concentration setting value or the ethylene concentration is higher than the ethylene concentration When the degree is set, step S304 of starting the ozone feedback controller and step S306 of starting the ozone gas control unit are performed again. When the ozone concentration has reached the ozone concentration set value or the ethylene concentration has reached the ethylene concentration set value, then step S310 is performed to stop the introduction of ozone and continuously monitor the ozone concentration or the ethylene concentration.

圖5所繪示為本揭露之另一實施例的植物工廠的臭氧濃度與乙烯濃度的監控方法。 FIG. 5 illustrates a method for monitoring ozone concentration and ethylene concentration in a plant factory according to another embodiment of the present disclosure.

圖5的實施例與圖4的實施例之差異在於:圖5是在臭氧供應裝置114中對乙烯進行降解,亦即臭氧不會散逸到溫室102中,而使得操作者可安全地進行操作。在此實施例中,臭氧供應裝置114例如是臭氧內處理控制箱。 The difference between the embodiment of Figure 5 and the embodiment of Figure 4 is that Figure 5 is the degradation of ethylene in the ozone supply unit 114, i.e., ozone does not escape into the greenhouse 102, allowing the operator to operate safely. In this embodiment, the ozone supply device 114 is, for example, an ozone internal processing control box.

首先,請同時參照圖1及圖5,進行步驟S400,設定臭氧監控模組106中的臭氧內處理控制箱的乙烯濃度排放設定值、臭氧濃度排放設定值及臭氧濃度控制設定。在此實施例中,例如是以臭氧內處理控制箱作為臭氧供應裝置114。其中,臭氧濃度控制設定是對於將乙烯濃度降低至乙烯濃度排放設定值所需供應的臭氧量進行設定。 First, referring to FIG. 1 and FIG. 5, step S400 is performed to set the ethylene concentration discharge setting value, the ozone concentration discharge setting value, and the ozone concentration control setting of the ozone internal processing control box in the ozone monitoring module 106. In this embodiment, for example, an ozone internal treatment control box is used as the ozone supply device 114. Among them, the ozone concentration control setting is set for the amount of ozone to be supplied to reduce the ethylene concentration to the ethylene concentration discharge setting value.

接著,進行步驟S402,啟動臭氧監控模組106中的臭氧濃度感測器116與臭氧內處理控制箱,以及乙烯監控模組108中的乙烯濃度感測器118。 Next, step S402 is performed to start the ozone concentration sensor 116 and the ozone internal processing control box in the ozone monitoring module 106, and the ethylene concentration sensor 118 in the ethylene monitoring module 108.

然後,進行步驟S404,將溫室102中的氣體導入臭氧內處理控制箱中,經由臭氧內處理控制箱內部所供應的臭氧直接對氣體中的乙烯進行降解。在將溫室102中的氣體導入臭氧內處理 控制箱中時,更包括啟動氣體循環裝置132,可協助溫室102中的氣體進入臭氧內處理控制箱中。 Then, in step S404, the gas in the greenhouse 102 is introduced into the ozone internal treatment control box, and the ethylene in the gas is directly degraded via the ozone supplied inside the ozone control box. Introducing the gas in the greenhouse 102 into the ozone In the control box, it further includes a start gas circulation device 132 to assist the gas in the greenhouse 102 to enter the ozone treatment control box.

接下來,進行步驟S406,啟動臭氧回饋控制器,並對乙烯濃度排放設定值與氣體中的乙烯濃度進行分析,且藉由臭氧濃度控制設定,來決定臭氧的供應量。其中,啟動臭氧回饋控制器的步驟更包括在供應臭氧後,持續監控臭氧內處理控制箱中的臭氧濃度。 Next, step S406 is performed to start the ozone feedback controller, analyze the ethylene concentration discharge set value and the ethylene concentration in the gas, and determine the ozone supply amount by the ozone concentration control setting. The step of starting the ozone feedback controller further includes continuously monitoring the ozone concentration in the ozone treatment control box after supplying the ozone.

之後,進行步驟S408,判斷氣體中的乙烯濃度是否已達到乙烯濃度排放設定值。當氣體中的乙烯濃度未達到乙烯濃度排放設定值時,則再次進行啟動臭氧回饋控制器的步驟S406。當氣體中的乙烯濃度已達到乙烯濃度排放設定值時,則停止供應臭氧,同時利用臭氧洗滌器對氣體中的臭氧進行降解,直到將氣體中的臭氧濃度降至臭氧濃度排放設定值後,再將經由臭氧進行處理後的氣體排放至溫室102中的步驟S410,同時再次進行將溫室102中的氣體導入臭氧內處理控制箱中的步驟S404,以持續監控溫室102中的乙烯濃度。 Thereafter, step S408 is performed to determine whether the ethylene concentration in the gas has reached the ethylene concentration discharge setting value. When the ethylene concentration in the gas does not reach the ethylene concentration discharge set value, step S406 of starting the ozone feedback controller is performed again. When the ethylene concentration in the gas has reached the set value of the ethylene concentration discharge, the supply of ozone is stopped, and the ozone in the gas is degraded by the ozone scrubber until the concentration of ozone in the gas is lowered to the set value of the ozone concentration discharge, and then The gas treated by the ozone is discharged to the step S410 in the greenhouse 102, while the step S404 of introducing the gas in the greenhouse 102 into the ozone internal control box is performed again to continuously monitor the ethylene concentration in the greenhouse 102.

圖6所繪示為本揭露之一實施例的植物工廠的乙烯濃度的監控方法。 FIG. 6 illustrates a method for monitoring ethylene concentration in a plant factory according to an embodiment of the present disclosure.

植物工廠的乙烯濃度的監控方法可應用於植物蔬果的生長與催熟處理,以有效地控制植物蔬果200的生長與熟化。 The monitoring method of the ethylene concentration of the plant factory can be applied to the growth and ripening treatment of the fruits and vegetables of the plant to effectively control the growth and ripening of the plant and vegetable 200.

首先,請同時參照圖1及圖6,進行步驟S500,設定乙烯濃度設定值。 First, please refer to FIG. 1 and FIG. 6 simultaneously, and step S500 is performed to set the ethylene concentration setting value.

接著,進行步驟S502,啟動乙烯監控模組108中的乙烯濃度感測器118,以感測溫室102中的乙烯濃度。 Next, step S502 is performed to activate the ethylene concentration sensor 118 in the ethylene monitoring module 108 to sense the ethylene concentration in the greenhouse 102.

然後,進行步驟S504,啟動乙烯回饋控制器,對乙烯濃度設定值與測得的乙烯濃度進行分析,來決定乙烯需求量。 Then, in step S504, the ethylene feedback controller is activated to analyze the ethylene concentration set value and the measured ethylene concentration to determine the ethylene demand.

接下來,進行步驟S506,啟動乙烯氣體控制組件,以依據乙烯需求量來導入乙烯至溫室102中。乙烯氣體控制組件例如是用以調配乙烯供應裝置120所供應的乙烯的流量與濃度的閥件。 Next, proceeding to step S506, the ethylene gas control unit is activated to introduce ethylene into the greenhouse 102 in accordance with the ethylene demand. The ethylene gas control module is, for example, a valve member for formulating the flow rate and concentration of ethylene supplied from the ethylene supply device 120.

之後,進行步驟S508,在導入乙烯之後,判斷乙烯濃度是否已達到乙烯濃度設定值。當乙烯濃度低於乙烯濃度設定值時,則再次進行啟動乙烯回饋控制器的步驟S504與啟動乙烯氣體控制組件的步驟S506。當乙烯濃度已達到乙烯濃度設定值時,則進行步驟S510,停止導入乙烯並持續監控乙烯濃度。 Thereafter, in step S508, after the introduction of ethylene, it is judged whether or not the ethylene concentration has reached the ethylene concentration setting value. When the ethylene concentration is lower than the ethylene concentration setting value, the step S504 of starting the ethylene feedback controller and the step S506 of starting the ethylene gas control unit are performed again. When the ethylene concentration has reached the ethylene concentration set value, step S510 is performed to stop the introduction of ethylene and continuously monitor the ethylene concentration.

此外,乙烯濃度的監控方法更可進行步驟S512,在停止導入乙烯並持續監控乙烯濃度時,判斷乙烯濃度是否低於乙烯濃度設定值。當乙烯濃度低於乙烯濃度設定值時,則再次進行啟動乙烯回饋控制器的步驟S504與啟動乙烯氣體控制組件的步驟S506。當乙烯濃度已達到乙烯濃度設定值時,則進行步驟S510,停止導入乙烯並持續監控乙烯濃度。 Further, the method for monitoring the ethylene concentration can be further carried out in step S512, and when the introduction of ethylene is stopped and the ethylene concentration is continuously monitored, it is judged whether or not the ethylene concentration is lower than the ethylene concentration setting value. When the ethylene concentration is lower than the ethylene concentration setting value, the step S504 of starting the ethylene feedback controller and the step S506 of starting the ethylene gas control unit are performed again. When the ethylene concentration has reached the ethylene concentration set value, step S510 is performed to stop the introduction of ethylene and continuously monitor the ethylene concentration.

圖7所繪示為本揭露之一實施例的植物工廠的氧氣濃度的監控方法。 FIG. 7 illustrates a method for monitoring the oxygen concentration of a plant factory according to an embodiment of the present disclosure.

植物工廠的氧氣濃度的監控方法可應用於對植物蔬果200的種苗提供適度的氣肥並對呼吸作用進行調控。 The monitoring method of the oxygen concentration of the plant factory can be applied to provide moderate gas fertilizer to the seedlings of the plant and vegetable 200 and regulate the respiration.

首先,請同時參照圖1及圖7,進行步驟S600,設定氧氣濃度設定值。 First, please refer to FIG. 1 and FIG. 7 simultaneously, and step S600 is performed to set the oxygen concentration setting value.

接著,進行步驟S602,啟動氧氣監控模組122中的氧氣濃度感測器142,以感測溫室102中的氧氣濃度。 Next, step S602 is performed to activate the oxygen concentration sensor 142 in the oxygen monitoring module 122 to sense the oxygen concentration in the greenhouse 102.

然後,進行步驟S604,啟動氧氣回饋控制器,對氧氣濃度設定值與測得的氧氣濃度進行分析,來決定氧氣需求量。 Then, in step S604, the oxygen feedback controller is started, and the oxygen concentration set value and the measured oxygen concentration are analyzed to determine the oxygen demand amount.

接下來,進行步驟S606,啟動氧氣氣體控制組件,以依據氧氣需求量來導入氧氣至溫室102中。氧氣氣體控制組件例如是用以調配氧氣供應裝置140所供應的氧氣的流量與濃度的閥件。 Next, step S606 is performed to activate the oxygen gas control assembly to introduce oxygen into the greenhouse 102 in accordance with the oxygen demand. The oxygen gas control assembly is, for example, a valve member for modulating the flow rate and concentration of oxygen supplied by the oxygen supply device 140.

之後,進行步驟S608,在導入氧氣之後,判斷氧氣濃度是否已達到氧氣濃度設定值。當氧氣濃度低於氧氣濃度設定值時,則再次進行啟動氧氣回饋控制器的步驟S604與啟動氧氣氣體控制組件的步驟S606。當氧氣濃度已達到氧氣濃度設定值時,則進行步驟S610,停止導入氧氣並持續監控氧氣濃度。 Thereafter, step S608 is performed to determine whether the oxygen concentration has reached the oxygen concentration setting value after the introduction of oxygen. When the oxygen concentration is lower than the oxygen concentration set value, step S604 of starting the oxygen feedback controller and step S606 of starting the oxygen gas control unit are performed again. When the oxygen concentration has reached the oxygen concentration set value, then step S610 is performed to stop the introduction of oxygen and continuously monitor the oxygen concentration.

此外,氧氣濃度的監控方法更可進行步驟S612,在停止導入氧氣並持續監控氧氣濃度時,判斷氧氣濃度是否低於氧氣濃度設定值。當氧氣濃度低於氧氣濃度設定值時,則再次進行啟動氧氣回饋控制器的步驟S604與啟動氧氣氣體控制組件的步驟S606。當氧氣濃度已達到氧氣濃度設定值時,則進行步驟S610,停止導入氧氣並持續監控氧氣濃度。 In addition, the oxygen concentration monitoring method can further perform step S612 to determine whether the oxygen concentration is lower than the oxygen concentration setting value when the introduction of oxygen is stopped and the oxygen concentration is continuously monitored. When the oxygen concentration is lower than the oxygen concentration set value, step S604 of starting the oxygen feedback controller and step S606 of starting the oxygen gas control unit are performed again. When the oxygen concentration has reached the oxygen concentration set value, then step S610 is performed to stop the introduction of oxygen and continuously monitor the oxygen concentration.

圖8所繪示為本揭露之一實施例的植物工廠的光照參數的監控方法。 FIG. 8 illustrates a method for monitoring illumination parameters of a plant factory according to an embodiment of the present disclosure.

植物工廠的光源日照的監控方法可以讓植物蔬果200在生長光合作用因子的搭配下,達到真正全天候無間斷光合作用的體系運作,以大量生長並延長產季。 The plant's light source sunshine monitoring method allows the plant and fruit 200 to achieve a truly all-weather uninterrupted photosynthesis system with a combination of growth photosynthesis factors, to grow in large quantities and extend the season.

首先,請同時參照圖1及圖8,進行步驟S700,設定光照參數設定值。 First, please refer to FIG. 1 and FIG. 8 simultaneously, and step S700 is performed to set the illumination parameter setting value.

接著,進行步驟S702,啟動光源日照監控模組124中的光感測器146,以感測溫室102中的光照參數。 Next, in step S702, the light sensor 146 in the light source sunshine monitoring module 124 is activated to sense the illumination parameter in the greenhouse 102.

然後,進行步驟S704,啟動光源日照回饋控制器,對光照參數設定值與測得的光照參數進行分析,來決定光照條件。 Then, in step S704, the light source sunshine feedback controller is activated, and the illumination parameter setting value and the measured illumination parameter are analyzed to determine the illumination condition.

接下來,進行步驟S706,啟動光合作用光源144,其是依據光源日照回饋控制器所決定的光照條件來控制光合作用光源144。 Next, in step S706, the photosynthesis light source 144 is activated, which controls the photosynthesis light source 144 according to the illumination conditions determined by the light source backlight feedback controller.

之後,進行步驟S708,在啟動光合作用光源144之後,判斷光照參數是否已達到光照參數設定值。當光照參數低於光照參數設定值時,則再次進行啟動光照參數回饋控制器的步驟S704與啟動光合作用光源144的步驟S706。當光照參數已達到光照參數設定值時,則進行步驟S710,持續監控光照參數。 Thereafter, step S708 is performed to determine whether the illumination parameter has reached the illumination parameter setting value after the photosynthetic light source 144 is activated. When the illumination parameter is lower than the illumination parameter setting value, step S704 of starting the illumination parameter feedback controller and step S706 of starting the photosynthesis light source 144 are performed again. When the illumination parameter has reached the illumination parameter setting value, then step S710 is performed to continuously monitor the illumination parameter.

此外,光照參數的監控方法更可進行步驟S712,在持續監控光照參數時,判斷光照參數是否低於光照參數設定值。當光照參數低於光照參數設定值時,則再次進行啟動光照參數回饋控制器的步驟S704與啟動光合作用光源144的步驟S706。當光照參數已達到光照參數設定值時,則進行步驟S710,持續監控光照 參數。 In addition, the monitoring method of the illumination parameter may further perform step S712, and when continuously monitoring the illumination parameter, determine whether the illumination parameter is lower than the illumination parameter setting value. When the illumination parameter is lower than the illumination parameter setting value, step S704 of starting the illumination parameter feedback controller and step S706 of starting the photosynthesis light source 144 are performed again. When the illumination parameter has reached the illumination parameter setting value, proceed to step S710 to continuously monitor the illumination. parameter.

圖9所繪示為本揭露之一實施例的植物工廠的濕度的監控方法。 FIG. 9 illustrates a method for monitoring humidity of a plant factory according to an embodiment of the present disclosure.

植物工廠的濕度的監控方法可以調整溫室102內的濕度,而建立植物蔬果200生長所需的濕度環境。 The humidity monitoring method of the plant factory can adjust the humidity in the greenhouse 102 to establish the humidity environment required for the growth of the plant and vegetable 200.

首先,請同時參照圖1及圖9,進行步驟S800,設定濕度設定值。 First, please refer to FIG. 1 and FIG. 9 simultaneously, and step S800 is performed to set the humidity setting value.

接著,進行步驟S802,啟動濕度監控模組126中的濕度感測器148,以感測溫室102中的濕度。 Next, step S802 is performed to activate the humidity sensor 148 in the humidity monitoring module 126 to sense the humidity in the greenhouse 102.

然後,進行步驟S804,啟動濕度回饋控制器,對濕度設定值與測得的濕度進行分析,來決定濕氣系統150的操作條件。 Then, in step S804, the humidity feedback controller is started, and the humidity setting value and the measured humidity are analyzed to determine the operating conditions of the moisture system 150.

接下來,進行步驟S806,啟動濕氣系統150,其是依據濕度回饋控制器所決定的操作條件來控制濕氣系統150。 Next, proceeding to step S806, the moisture system 150 is activated, which controls the moisture system 150 in accordance with the operating conditions determined by the humidity feedback controller.

之後,進行步驟S808,在啟動濕氣系統150之後,判斷濕度是否已達到濕度設定值。當濕度未達到濕度設定值時,則再次進行啟動濕度回饋控制器的步驟S804與啟動濕氣系統150的步驟S806。當濕度已達到濕度設定值時,則進行步驟S810,持續監控濕度。 Thereafter, step S808 is performed to determine whether the humidity has reached the humidity set value after the moisture system 150 is activated. When the humidity does not reach the humidity set value, step S804 of starting the humidity feedback controller and step S806 of starting the moisture system 150 are performed again. When the humidity has reached the humidity set value, step S810 is performed to continuously monitor the humidity.

此外,濕度的監控方法更可進行步驟S812,在持續監控濕度時,判斷濕度是否已達到濕度設定值。當濕度未達到濕度設定值時,則再次進行啟動濕度回饋控制器的步驟S804與啟動濕氣系統150的步驟S806。當濕度已達到濕度設定值時,則進行步驟 S810,持續監控濕度。 In addition, the humidity monitoring method can further perform step S812, and when continuously monitoring the humidity, determine whether the humidity has reached the humidity setting value. When the humidity does not reach the humidity set value, step S804 of starting the humidity feedback controller and step S806 of starting the moisture system 150 are performed again. When the humidity has reached the humidity setting, proceed to the step S810, continuously monitors humidity.

圖10所繪示為本揭露之一實施例的植物工廠的溫度的監控方法。 FIG. 10 illustrates a method for monitoring the temperature of a plant factory according to an embodiment of the present disclosure.

植物工廠的溫度的監控方法可以調整溫室102內的溫度,而建立植物蔬果200生長所需的溫度環境。 The temperature monitoring method of the plant factory can adjust the temperature inside the greenhouse 102 to establish the temperature environment required for the growth of the plant and vegetable 200.

首先,請同時參照圖1及圖10,進行步驟S900,設定溫度設定值。 First, please refer to FIG. 1 and FIG. 10 simultaneously, and step S900 is performed to set the temperature setting value.

接著,進行步驟S902,啟動溫度監控模組128中的溫度計152,以感測溫室102中的溫度。 Next, proceeding to step S902, the thermometer 152 in the temperature monitoring module 128 is activated to sense the temperature in the greenhouse 102.

然後,進行步驟S904,啟動溫度回饋控制器,對溫度設定值與測得的溫度進行分析,來決定升降溫裝置154的操作條件。 Then, in step S904, the temperature feedback controller is started, and the temperature set value and the measured temperature are analyzed to determine the operating conditions of the temperature rise and fall device 154.

接下來,進行步驟S906,啟動升降溫裝置154,其是依據溫度回饋控制器所決定的操作條件來控制升降溫裝置154。 Next, in step S906, the temperature rise and fall device 154 is activated, which controls the temperature rise and fall device 154 according to the operating conditions determined by the temperature feedback controller.

之後,進行步驟S908,在啟動升降溫裝置154之後,判斷溫度是否已達到溫度設定值。當溫度未達到溫度設定值時,則再次進行啟動溫度回饋控制器的步驟S904與啟動濕氣系統150的步驟S906。當溫度已達到溫度設定值時,則進行步驟S910,持續監控溫度。 Thereafter, in step S908, after the temperature rise and fall device 154 is activated, it is determined whether the temperature has reached the temperature set value. When the temperature does not reach the temperature set value, step S904 of starting the temperature feedback controller and step S906 of starting the moisture system 150 are performed again. When the temperature has reached the temperature set value, step S910 is performed to continuously monitor the temperature.

此外,溫度的監控方法更可進行步驟S912,在持續監控溫度時,判斷溫度是否已達到溫度設定值。當溫度未達到溫度設定值時,則再次進行啟動溫度回饋控制器的步驟S904與啟動升降溫裝置154的步驟S906。當溫度已達到溫度設定值時,則進行步 驟S910,持續監控溫度。 In addition, the temperature monitoring method can further perform step S912 to determine whether the temperature has reached the temperature set value while continuously monitoring the temperature. When the temperature does not reach the temperature set value, step S904 of starting the temperature feedback controller and step S906 of starting the temperature rise and fall device 154 are performed again. When the temperature has reached the temperature set value, then step At step S910, the temperature is continuously monitored.

圖11所繪示為本揭露之一實施例的植物工廠利用臭氧監控模組中的臭氧內處理控制箱所進行的內循環消毒殺菌方法。 FIG. 11 illustrates an internal circulation sterilization method performed by an ozone internal treatment control box in a plant factory using an ozone monitoring module according to an embodiment of the present disclosure.

首先,請參照圖11,進行步驟S1000,設定臭氧監控模組106中的臭氧內處理控制箱的臭氧供應量、臭氧處理時間及臭氧濃度排放設定值。在此實施例中,例如是以臭氧內處理控制箱作為臭氧供應裝置114。 First, referring to FIG. 11, step S1000 is performed to set the ozone supply amount, the ozone treatment time, and the ozone concentration discharge setting value of the ozone internal control control box in the ozone monitoring module 106. In this embodiment, for example, an ozone internal treatment control box is used as the ozone supply device 114.

接著,進行步驟S1002,啟動臭氧內處理控制箱。 Next, step S1002 is performed to start the ozone internal processing control box.

然後,進行步驟S1004,將溫室102中的氣體導入臭氧內處理控制箱中。在將溫室102中的氣體導入臭氧內處理控制箱中時,更包括啟動氣體循環裝置132,可協助溫室102中的氣體進入臭氧內處理控制箱中。 Then, in step S1004, the gas in the greenhouse 102 is introduced into the ozone internal processing control box. When the gas in the greenhouse 102 is introduced into the ozone treatment control box, the gas circulation device 132 is further activated to assist the gas in the greenhouse 102 to enter the ozone treatment control box.

接下來,進行步驟S1006,依據臭氧設定值供應臭氧至臭氧內處理控制箱中,且在臭氧處理時間內,利用臭氧對氣體進行消毒殺菌。在步驟S1006中,更可將臭氧內處理控制箱中的濕度控制在預定濕度,以更有效地進行消毒殺菌。 Next, step S1006 is performed to supply ozone to the ozone internal treatment control box according to the ozone setting value, and the gas is sterilized by ozone during the ozone treatment time. In step S1006, the humidity in the ozone internal control box can be controlled to a predetermined humidity to perform sterilization more effectively.

之後,進行步驟S1008,將氣體中的臭氧濃度利用臭氧洗滌器降至臭氧濃度排放設定值後,再將經由臭氧進行處理後的氣體排放至溫室102中。同時,再次進行將溫室102中的氣體導入臭氧內處理控制箱中的步驟S1004,以持續對溫室102中的氣體進行消毒殺菌。 Thereafter, in step S1008, the ozone concentration in the gas is lowered to the ozone concentration discharge set value by the ozone scrubber, and then the gas treated by the ozone is discharged to the greenhouse 102. At the same time, the step S1004 of introducing the gas in the greenhouse 102 into the ozone internal treatment control box is performed again to continuously sterilize the gas in the greenhouse 102.

基於上述實施例可知,在上述實施例所提出的監控植物 工廠生長因子的溫室裝置及其監控方法中,可以藉由上述各種監控模組來有效地調控各種植物工廠生長因子。另外,上述實施例所提出的監控植物工廠生長因子的溫室裝置及其監控方法可達成植物生長過程全程監控、植物生長速度輔助調控、以及溫室消毒淨化安全無毒。此外,當上述實施例所提出的監控植物工廠生長因子的溫室裝置及其監控方法直接通入所需氣源(如二氧化碳等)時,相較於直接通入外氣補充來所需氣源的方式而言,可以減少能源的消耗。 Based on the above embodiments, the monitoring plant proposed in the above embodiment is known. In the greenhouse device of the plant growth factor and the monitoring method thereof, various plant factory growth factors can be effectively regulated by the above various monitoring modules. In addition, the greenhouse device for monitoring plant plant growth factors and the monitoring method thereof as set forth in the above embodiments can achieve full monitoring of the plant growth process, assisted regulation of plant growth rate, and safe and non-toxicity of greenhouse disinfection and purification. In addition, when the greenhouse device for monitoring the growth factor of the plant factory proposed in the above embodiment and the monitoring method thereof directly enter the required gas source (such as carbon dioxide, etc.), compared with the required gas source directly added to the external gas supply. In terms of ways, energy consumption can be reduced.

雖然本揭露已以實施例揭露如上,然其並非用以限定本揭露,任何所屬技術領域中具有通常知識者,在不脫離本揭露之精神和範圍內,當可作些許之更動與潤飾,故本揭露之保護範圍當視後附之申請專利範圍所界定者為準。 The present disclosure has been disclosed in the above embodiments, but it is not intended to limit the disclosure, and any one of ordinary skill in the art can make some changes and refinements without departing from the spirit and scope of the disclosure. The scope of protection of this disclosure is subject to the definition of the scope of the patent application.

100‧‧‧溫室裝置 100‧‧‧Greenhouse installation

102‧‧‧溫室 102‧‧ ‧ greenhouse

104‧‧‧二氧化碳監控模組 104‧‧‧CO2 monitoring module

106‧‧‧臭氧監控模組 106‧‧‧Ozone monitoring module

108‧‧‧乙烯監控模組 108‧‧‧Ethylene monitoring module

110‧‧‧二氧化碳濃度感測器 110‧‧‧Carbon dioxide concentration sensor

112‧‧‧二氧化碳供應裝置 112‧‧‧CO2 supply unit

114‧‧‧臭氧供應裝置 114‧‧‧Ozone supply unit

116‧‧‧臭氧濃度感測器 116‧‧‧Ozone concentration sensor

118‧‧‧乙烯濃度感測器 118‧‧‧Ethylene concentration sensor

120‧‧‧乙烯供應裝置 120‧‧‧Ethylene supply unit

122‧‧‧氧氣監控模組 122‧‧‧Oxygen monitoring module

124‧‧‧光源日照監控模組 124‧‧‧Light source sunshine monitoring module

126‧‧‧濕度監控模組 126‧‧‧Humidity monitoring module

128‧‧‧溫度監控模組 128‧‧‧ Temperature Monitoring Module

130‧‧‧太陽能電池 130‧‧‧Solar battery

132‧‧‧氣體循環裝置 132‧‧‧ gas circulation device

134‧‧‧回饋控制模組 134‧‧‧Feedback Control Module

136‧‧‧人機介面控制操作裝置 136‧‧‧Man-machine interface control operating device

138‧‧‧數位監控介面 138‧‧‧Digital monitoring interface

140‧‧‧氧氣供應裝置 140‧‧‧Oxygen supply unit

142‧‧‧氧氣濃度感測器 142‧‧‧Oxygen concentration sensor

144‧‧‧光合作用光源 144‧‧‧Photosynthetic light source

146‧‧‧光感測器 146‧‧‧Light sensor

148‧‧‧濕度感測器 148‧‧‧Humidity sensor

150‧‧‧濕氣系統 150‧‧‧Moisture system

152‧‧‧溫度計 152‧‧‧ thermometer

154‧‧‧升降溫裝置 154‧‧‧Lifting and lowering device

200‧‧‧植物蔬果 200‧‧‧ plants and fruits

Claims (44)

一種監控植物工廠生長因子的溫室裝置,應用於溫室,包括:二氧化碳監控模組,以監控所述溫室中的二氧化碳濃度;臭氧監控模組,以監控所述溫室中的臭氧濃度,且藉由所述臭氧監控模組所供應的臭氧對所述溫室進行臭氧處理;以及乙烯監控模組,以監控所述溫室中的乙烯濃度。 A greenhouse device for monitoring plant plant growth factors, applied to a greenhouse, comprising: a carbon dioxide monitoring module for monitoring carbon dioxide concentration in the greenhouse; an ozone monitoring module for monitoring ozone concentration in the greenhouse, and The ozone supplied by the ozone monitoring module performs ozone treatment on the greenhouse; and an ethylene monitoring module to monitor the ethylene concentration in the greenhouse. 如申請專利範圍第1項所述之監控植物工廠生長因子的溫室裝置,其中所述二氧化碳監控模組包括:二氧化碳濃度感測器,以感測二氧化碳濃度;以及二氧化碳供應裝置,以供應二氧化碳至所述溫室中。 The greenhouse device for monitoring plant plant growth factors according to claim 1, wherein the carbon dioxide monitoring module comprises: a carbon dioxide concentration sensor to sense a carbon dioxide concentration; and a carbon dioxide supply device to supply carbon dioxide to the In the greenhouse. 如申請專利範圍第2項所述之監控植物工廠生長因子的溫室裝置,其中所述二氧化碳供應裝置至少包括二氧化碳鋼瓶或二氧化碳廢氣儲槽。 The greenhouse device for monitoring plant plant growth factors according to claim 2, wherein the carbon dioxide supply device comprises at least a carbon dioxide cylinder or a carbon dioxide waste gas storage tank. 如申請專利範圍第1項所述之監控植物工廠生長因子的溫室裝置,其中所述臭氧監控模組包括:臭氧供應裝置,以供應臭氧;以及臭氧濃度感測器,以感測臭氧濃度。 The greenhouse device for monitoring plant plant growth factors according to claim 1, wherein the ozone monitoring module comprises: an ozone supply device to supply ozone; and an ozone concentration sensor to sense the ozone concentration. 如申請專利範圍第4項所述之監控植物工廠生長因子的溫室裝置,其中所述臭氧供應裝置至少包括臭氧內處理控制箱或臭氧產生機。 The greenhouse device for monitoring plant plant growth factors according to claim 4, wherein the ozone supply device comprises at least an ozone internal treatment control box or an ozone generator. 如申請專利範圍第1項所述之監控植物工廠生長因子的溫室裝置,其中所述臭氧處理至少包括溫室消毒殺菌處理或抑制植物生長或熟化的處理。 The greenhouse device for monitoring plant plant growth factors according to claim 1, wherein the ozone treatment comprises at least a greenhouse sterilization treatment or a treatment for inhibiting plant growth or ripening. 如申請專利範圍第1項所述之監控植物工廠生長因子的溫室裝置,其中所述乙烯監控模組包括乙烯濃度感測器,以感測所述溫室中的乙烯濃度。 A greenhouse apparatus for monitoring plant plant growth factors according to claim 1, wherein the ethylene monitoring module comprises an ethylene concentration sensor to sense an ethylene concentration in the greenhouse. 如申請專利範圍第7項所述之監控植物工廠生長因子的溫室裝置,其中所述乙烯監控模組更包括乙烯供應裝置,以供應乙烯至所述 溫室中。 The greenhouse device for monitoring plant plant growth factors according to claim 7, wherein the ethylene monitoring module further comprises an ethylene supply device to supply ethylene to the In the greenhouse. 如申請專利範圍第8項所述之監控植物工廠生長因子的溫室裝置,其中所述乙烯供應裝置包括乙烯鋼瓶。 A greenhouse apparatus for monitoring a plant plant growth factor according to claim 8, wherein the ethylene supply device comprises an ethylene cylinder. 如申請專利範圍第1項所述之監控植物工廠生長因子的溫室裝置,更包括氣體循環裝置,以使得所述溫室中的氣體進行流動。 The greenhouse device for monitoring plant plant growth factors according to claim 1, further comprising a gas circulation device to allow the gas in the greenhouse to flow. 如申請專利範圍第1項所述之監控植物工廠生長因子的溫室裝置,更包括回饋控制模組,具備多個回饋控制器,以分別回饋控制二氧化碳濃度、臭氧濃度與乙烯濃度。 The greenhouse device for monitoring plant plant growth factors as described in claim 1 further includes a feedback control module having a plurality of feedback controllers for separately controlling carbon dioxide concentration, ozone concentration and ethylene concentration. 如申請專利範圍第1項所述之監控植物工廠生長因子的溫室裝置,其中所述回饋控制器包括比例積分微分控制器(proportional integral derivative(PID)controller)。 The greenhouse device for monitoring plant plant growth factors according to claim 1, wherein the feedback controller comprises a proportional integral derivative (PID) controller. 如申請專利範圍第1項所述之監控植物工廠生長因子的溫室裝置,更包括氧氣監控模組,以監控所述溫室中的氧氣濃度。 The greenhouse device for monitoring plant plant growth factors as described in claim 1 further includes an oxygen monitoring module to monitor the oxygen concentration in the greenhouse. 如申請專利範圍第13項所述之監控植物工廠生長因子的溫室裝置,其中所述氧氣監控模組包括:氧氣供應裝置,以供應氧氣至所述溫室中;以及氧氣濃度感測器,以感測氧氣濃度。 The greenhouse device for monitoring plant plant growth factors according to claim 13, wherein the oxygen monitoring module comprises: an oxygen supply device for supplying oxygen into the greenhouse; and an oxygen concentration sensor to sense Measure the oxygen concentration. 如申請專利範圍第1項所述之監控植物工廠生長因子的溫室裝置,更包括光源日照監控模組,以監控所述溫室中的光照參數。 The greenhouse device for monitoring plant plant growth factors according to claim 1, further comprising a light source sunshine monitoring module for monitoring illumination parameters in the greenhouse. 如申請專利範圍第1項所述之監控植物工廠生長因子的溫室裝置,更包括濕度監控模組,以監控所述溫室中的濕度。 The greenhouse device for monitoring plant plant growth factors according to claim 1, further comprising a humidity monitoring module for monitoring humidity in the greenhouse. 如申請專利範圍第1項所述之監控植物工廠生長因子的溫室裝置,更包括溫度監控模組,以監控所述溫室中的溫度。 The greenhouse device for monitoring plant plant growth factors according to claim 1, further comprising a temperature monitoring module for monitoring the temperature in the greenhouse. 如申請專利範圍第1項所述之監控植物工廠生長因子的溫室裝置,更包括太陽能電池。 A greenhouse device for monitoring plant plant growth factors as described in claim 1 of the patent application, further comprising a solar cell. 如申請專利範圍第1項所述之監控植物工廠生長因子的溫室 裝置,更包括人機介面控制操作裝置,耦接至所述二氧化碳監控模組、所述臭氧監控模組與所述乙烯監控模組。 Greenhouse for monitoring plant plant growth factors as described in claim 1 The device further includes a human-machine interface control operating device coupled to the carbon dioxide monitoring module, the ozone monitoring module and the ethylene monitoring module. 如申請專利範圍第1項所述之監控植物工廠生長因子的溫室裝置,更包括數位監控介面,耦接至所述二氧化碳監控模組、所述臭氧監控模組與所述乙烯監控模組。 The greenhouse device for monitoring plant plant growth factors according to claim 1, further comprising a digital monitoring interface coupled to the carbon dioxide monitoring module, the ozone monitoring module and the ethylene monitoring module. 一種植物工廠生長因子的監控方法,應用於溫室,包括:利用二氧化碳監控模組監控所述溫室中的二氧化碳濃度;利用臭氧監控模組監控所述溫室中的臭氧濃度,且藉由所述臭氧監控模組所供應的臭氧對所述溫室進行臭氧處理;以及利用乙烯監控模組監控所述溫室中的乙烯濃度。 A method for monitoring a growth factor of a plant factory, which is applied to a greenhouse, comprising: monitoring a concentration of carbon dioxide in the greenhouse by using a carbon dioxide monitoring module; monitoring an ozone concentration in the greenhouse by using an ozone monitoring module, and monitoring by the ozone The ozone supplied by the module is ozone treated to the greenhouse; and the ethylene monitoring module is used to monitor the concentration of ethylene in the greenhouse. 如申請專利範圍第21項所述之植物工廠生長因子的監控方法,其中所述二氧化碳濃度的監控方法包括:設定二氧化碳濃度設定值;啟動所述二氧化碳監控模組中的二氧化碳濃度感測器,以感測所述溫室中的二氧化碳濃度;啟動二氧化碳回饋控制器,對所述二氧化碳濃度設定值與二氧化碳濃度進行分析,來決定二氧化碳需求量;啟動二氧化碳氣體控制組件,以依據所述二氧化碳需求量來導入二氧化碳至所述溫室中;以及在導入二氧化碳之後,判斷二氧化碳濃度是否已達到所述二氧化碳濃度設定值,當二氧化碳濃度低於所述二氧化碳濃度設定值時,則再次進行啟動所述二氧化碳回饋控制器的步驟與啟動所述二氧化碳氣體控制組件的步驟,當二氧化碳濃度已達到所述二氧化碳濃度設定值時,則停止導入二氧化碳並持續監控二氧化碳濃度。 The method for monitoring a plant plant growth factor according to claim 21, wherein the monitoring method of the carbon dioxide concentration comprises: setting a carbon dioxide concentration setting value; and starting a carbon dioxide concentration sensor in the carbon dioxide monitoring module to Sensing the concentration of carbon dioxide in the greenhouse; initiating a carbon dioxide feedback controller, analyzing the carbon dioxide concentration set value and the carbon dioxide concentration to determine a carbon dioxide demand; and starting a carbon dioxide gas control component to be introduced according to the carbon dioxide demand Carbon dioxide into the greenhouse; and after introducing carbon dioxide, determining whether the carbon dioxide concentration has reached the carbon dioxide concentration setting value, and when the carbon dioxide concentration is lower than the carbon dioxide concentration setting value, starting the carbon dioxide feedback controller again The step of initiating the carbon dioxide gas control assembly, when the carbon dioxide concentration has reached the carbon dioxide concentration set value, stops introducing carbon dioxide and continuously monitors the carbon dioxide concentration. 如申請專利範圍第22項所述之植物工廠生長因子的監控方法,其中所述二氧化碳濃度的監控方法更包括:在停止導入二氧化碳並持續監控二氧化碳濃度時,判斷二氧化碳濃度是否低於所述二氧化碳濃度設定值,當二氧化碳濃度低於所述二氧化碳濃度設定值時,則再次進行啟動所述二氧化碳回饋控制器的步驟與啟動所述二氧化碳氣體控制組件的步驟,當二氧化碳濃度已達到所述二氧化碳濃度設定值時,則停止導入二氧化碳並持續監控二氧化碳濃度。 The method for monitoring plant plant growth factors according to claim 22, wherein the monitoring method of the carbon dioxide concentration further comprises: determining whether the carbon dioxide concentration is lower than the carbon dioxide concentration when the introduction of carbon dioxide is stopped and the carbon dioxide concentration is continuously monitored. a set value, when the carbon dioxide concentration is lower than the carbon dioxide concentration set value, the step of starting the carbon dioxide feedback controller and the step of starting the carbon dioxide gas control component are performed again, when the carbon dioxide concentration has reached the carbon dioxide concentration set value At that time, the introduction of carbon dioxide is stopped and the carbon dioxide concentration is continuously monitored. 如申請專利範圍第21項所述之植物工廠生長因子的監控方法,其中當所述臭氧處理為所述溫室的消毒殺菌處理時,所述臭氧濃度的監控方法包括:設定臭氧濃度設定值;啟動所述臭氧監控模組中的臭氧濃度感測器與臭氧供應裝置,以藉由所述臭氧濃度感測器感測所述溫室中的臭氧濃度,且藉由臭氧供應裝置供應臭氧;啟動臭氧回饋控制器,對所述臭氧濃度設定值與臭氧濃度進行分析,來決定臭氧需求量;啟動臭氧氣體控制組件,以依據所述臭氧需求量來導入臭氧至溫室中;以及在導入臭氧之後,判斷臭氧濃度是否已達到所述臭氧濃度設定值,當臭氧濃度低於所述臭氧濃度設定值時,則再次進行啟動所述臭氧回饋控制器的步驟與啟動所述臭氧氣體控制組件的步驟,當臭氧濃度已達到所述臭氧濃度設定值時,則停止導入臭氧並持續監控臭氧濃度。 The method for monitoring a plant plant growth factor according to claim 21, wherein when the ozone treatment is a sterilization treatment of the greenhouse, the method for monitoring the ozone concentration comprises: setting an ozone concentration setting value; An ozone concentration sensor and an ozone supply device in the ozone monitoring module to sense an ozone concentration in the greenhouse by the ozone concentration sensor, and supply ozone through an ozone supply device; start ozone feedback a controller, analyzing the ozone concentration setting value and the ozone concentration to determine an ozone demand amount; starting an ozone gas control component to introduce ozone into the greenhouse according to the ozone demand amount; and determining ozone after introducing the ozone Whether the concentration has reached the ozone concentration setting value, when the ozone concentration is lower than the ozone concentration setting value, the step of starting the ozone feedback controller and the step of starting the ozone gas control component are performed again, when the ozone concentration is When the ozone concentration set value has been reached, the introduction of ozone is stopped and the ozone concentration is continuously monitored. 如申請專利範圍第24項所述之植物工廠生長因子的監控方法,其中所述臭氧濃度的監控方法更包括:在停止導入臭氧並持續監控臭氧濃度時,判斷臭氧濃度是否低於所述臭氧濃度設定值,當臭氧濃度低於所述臭氧濃度設定值時,則再次進行啟動所述臭氧回饋控制器的步驟與啟動所述臭氧氣體控制組件的步驟,當臭氧濃度已達到所述臭氧濃度設定值時,則停止導入臭氧並持續監控臭氧濃度。 The method for monitoring plant plant growth factors according to claim 24, wherein the monitoring method of the ozone concentration further comprises: determining whether the ozone concentration is lower than the ozone concentration when the introduction of ozone is stopped and the ozone concentration is continuously monitored. a set value, when the ozone concentration is lower than the ozone concentration set value, the step of starting the ozone feedback controller and the step of starting the ozone gas control component are performed again, when the ozone concentration has reached the ozone concentration set value At the same time, the introduction of ozone is stopped and the ozone concentration is continuously monitored. 如申請專利範圍第24項所述之植物工廠生長因子的監控方法,其中所述臭氧濃度的監控方法更包括:在導入臭氧至所述溫室時,啟動氣體循環裝置。 The method for monitoring plant plant growth factors according to claim 24, wherein the monitoring method of the ozone concentration further comprises: starting the gas circulation device when introducing ozone into the greenhouse. 如申請專利範圍第24項所述之植物工廠生長因子的監控方法,其中所述臭氧濃度的監控方法更包括:在導入臭氧至所述溫室時,導入乾燥氣源。 The method for monitoring plant plant growth factors according to claim 24, wherein the method for monitoring ozone concentration further comprises: introducing a dry gas source when introducing ozone into the greenhouse. 如申請專利範圍第21項所述之植物工廠生長因子的監控方法,其中當所述臭氧處理為抑制植物生長或熟化的處理時,所述臭氧濃度與所述乙烯濃度的監控方法包括:設定臭氧濃度設定值與乙烯濃度設定值;啟動所述臭氧監控模組中的臭氧濃度感測器與臭氧供應裝置、與所述乙烯監控模組中的乙烯濃度感測器,以分別藉由所述臭氧濃度感測器與所述乙烯濃度感測器,感測所述溫室中的臭氧濃度與乙烯濃度,且藉由所述臭氧供應裝置供應臭氧;啟動臭氧回饋控制器,對所述臭氧濃度設定值與臭氧濃度進行分析,來決定臭氧需求量;啟動臭氧氣體控制組件,以依據所述臭氧需求量來導入臭氧至所述溫室中;以及 在導入臭氧之後,判斷臭氧濃度是否已達到所述臭氧濃度設定值或乙烯濃度是否已達到所述乙烯濃度設定值,當臭氧濃度低於所述臭氧濃度設定值或乙烯濃度高於所述乙烯濃度設定值時,則再次進行啟動所述臭氧回饋控制器的步驟與啟動所述臭氧氣體控制組件的步驟,當臭氧濃度已達到所述臭氧濃度設定值或乙烯濃度已達到所述乙烯濃度設定值時,則停止導入臭氧並持續監控臭氧濃度或乙烯濃度。 The method for monitoring plant plant growth factors according to claim 21, wherein when the ozone treatment is a treatment for inhibiting plant growth or ripening, the ozone concentration and the ethylene concentration monitoring method include: setting ozone a concentration setting value and an ethylene concentration setting value; starting an ozone concentration sensor and an ozone supply device in the ozone monitoring module, and an ethylene concentration sensor in the ethylene monitoring module to respectively use the ozone a concentration sensor and the ethylene concentration sensor, sensing an ozone concentration and an ethylene concentration in the greenhouse, and supplying ozone by the ozone supply device; starting an ozone feedback controller to set the ozone concentration Analysis with ozone concentration to determine ozone demand; initiation of an ozone gas control module to introduce ozone into the greenhouse in accordance with the ozone demand; After introducing the ozone, determining whether the ozone concentration has reached the ozone concentration setting value or whether the ethylene concentration has reached the ethylene concentration setting value, when the ozone concentration is lower than the ozone concentration setting value or the ethylene concentration is higher than the ethylene concentration When the value is set, the step of starting the ozone feedback controller and the step of starting the ozone gas control component are performed again, when the ozone concentration has reached the ozone concentration setting value or the ethylene concentration has reached the ethylene concentration setting value. , stop introducing ozone and continuously monitor the ozone concentration or ethylene concentration. 如申請專利範圍第28項所述之植物工廠生長因子的監控方法,其中所述臭氧濃度與所述乙烯濃度的監控方法更包括:在停止導入臭氧並持續監控臭氧濃度或乙烯濃度時,判斷臭氧濃度是否低於所述臭氧濃度設定值或乙烯濃度是否高於所述乙烯濃度設定值,當臭氧濃度低於所述臭氧濃度設定值或乙烯濃度高於所述乙烯濃度設定值時,則再次進行啟動所述臭氧回饋控制器的步驟與啟動所述臭氧氣體控制組件的步驟,當臭氧濃度已達到所述臭氧濃度設定值或乙烯濃度已達到所述乙烯濃度設定值時,則停止導入臭氧並持續監控臭氧濃度或乙烯濃度。 The method for monitoring plant plant growth factors according to claim 28, wherein the monitoring method of the ozone concentration and the ethylene concentration further comprises: determining ozone when the ozone is stopped and the ozone concentration or the ethylene concentration is continuously monitored. Whether the concentration is lower than the ozone concentration setting value or whether the ethylene concentration is higher than the ethylene concentration setting value, and when the ozone concentration is lower than the ozone concentration setting value or the ethylene concentration is higher than the ethylene concentration setting value, the concentration is performed again. a step of starting the ozone feedback controller and a step of starting the ozone gas control component, when the ozone concentration has reached the ozone concentration setting value or the ethylene concentration has reached the ethylene concentration setting value, the ozone introduction is stopped and continues Monitor ozone concentration or ethylene concentration. 如申請專利範圍第28項所述之植物工廠生長因子的監控方法,其中所述臭氧濃度與所述乙烯濃度的監控方法更包括:在導入臭氧至所述溫室時,啟動氣體循環裝置。 The method for monitoring plant plant growth factors according to claim 28, wherein the monitoring method of the ozone concentration and the ethylene concentration further comprises: starting the gas circulation device when introducing ozone into the greenhouse. 如申請專利範圍第28項所述之植物工廠生長因子的監控方法,其中所述臭氧濃度與所述乙烯濃度的監控方法更包括:在導入臭氧至所述溫室時,導入乾燥氣源。 The method for monitoring plant plant growth factors according to claim 28, wherein the monitoring method of the ozone concentration and the ethylene concentration further comprises: introducing a dry gas source when introducing ozone into the greenhouse. 如申請專利範圍第21項所述之植物工廠生長因子的監控方法,其中當所述臭氧處理為利用所述臭氧監控模組中的臭氧內處理控制箱,所進行的抑制植物生長或熟化的內循環處理時,所述臭氧濃度 與所述乙烯濃度的監控方法包括:設定所述臭氧監控模組中的所述臭氧內處理控制箱的乙烯濃度排放設定值、臭氧濃度排放設定值及臭氧濃度控制設定;啟動所述臭氧監控模組中的臭氧濃度感測器與所述臭氧內處理控制箱,以及所述乙烯監控模組中的乙烯濃度感測器;將所述溫室中的氣體導入所述臭氧內處理控制箱中,經由所述臭氧內處理控制箱內部所供應的臭氧直接對所述氣體中的乙烯進行降解;啟動臭氧回饋控制器,並對所述乙烯濃度排放設定值與所述氣體中的乙烯濃度進行分析,且藉由所述臭氧濃度控制設定,來決定臭氧供應量;判斷所述氣體中的乙烯濃度是否已達到所述乙烯濃度排放設定值,當所述氣體中的乙烯濃度未達到所述乙烯濃度排放設定值時,則再次進行啟動所述臭氧回饋控制器的步驟,當所述氣體中的乙烯濃度已達到所述乙烯濃度排放設定值時,則停止供應臭氧,同時利用臭氧洗滌器對所述氣體中的臭氧進行降解,直到將所述氣體中的臭氧濃度降至所述臭氧濃度排放設定值後,再將經由臭氧進行處理後的所述氣體排放至所述溫室中,同時再次進行將所述溫室中的所述氣體導入所述臭氧內處理控制箱中的步驟。 The method for monitoring plant plant growth factors according to claim 21, wherein when the ozone treatment is performed by using an ozone internal treatment control box in the ozone monitoring module, the plant growth or ripening is inhibited. Ozone concentration during circulation treatment And the method for monitoring the concentration of the ethylene includes: setting an ethylene concentration discharge setting value, an ozone concentration emission setting value, and an ozone concentration control setting in the ozone internal processing control box in the ozone monitoring module; and starting the ozone monitoring mode An ozone concentration sensor in the group and the ozone internal processing control box, and an ethylene concentration sensor in the ethylene monitoring module; introducing the gas in the greenhouse into the ozone internal processing control box, via The ozone supplied inside the ozone treatment control box directly degrades the ethylene in the gas; starts an ozone feedback controller, and analyzes the set value of the ethylene concentration discharge and the ethylene concentration in the gas, and Determining the ozone supply amount by the ozone concentration control setting; determining whether the ethylene concentration in the gas has reached the ethylene concentration discharge setting value, and when the ethylene concentration in the gas does not reach the ethylene concentration discharge setting At the time of the value, the step of starting the ozone feedback controller is performed again, when the ethylene concentration in the gas has reached the ethylene When the set value is discharged, the supply of ozone is stopped, and the ozone in the gas is degraded by the ozone scrubber until the ozone concentration in the gas is lowered to the ozone concentration discharge set value, and then through the ozone. The treated gas is discharged into the greenhouse while the step of introducing the gas in the greenhouse into the ozone internal control box is performed again. 如申請專利範圍第32項所述之植物工廠生長因子的監控方法,其中啟動所述臭氧回饋控制器的步驟更包括在供應臭氧後,持續監控所述臭氧內處理控制箱中的臭氧濃度。 The method for monitoring plant plant growth factors according to claim 32, wherein the step of activating the ozone feedback controller further comprises continuously monitoring the ozone concentration in the ozone internal control box after supplying ozone. 如申請專利範圍第32項所述之植物工廠生長因子的監控方法,其中在將所述溫室中的所述氣體導入所述臭氧內處理控制箱中時,更包括啟動氣體循環裝置。 The method for monitoring plant plant growth factors according to claim 32, wherein when the gas in the greenhouse is introduced into the ozone internal control box, the gas circulation device is further activated. 如申請專利範圍第21項所述之植物工廠生長因子的監控方 法,其中所述乙烯濃度的監控方法包括:設定乙烯濃度設定值;啟動所述乙烯監控模組中的乙烯濃度感測器,以感測所述溫室中的乙烯濃度;啟動乙烯回饋控制器,對所述乙烯濃度設定值與乙烯濃度進行分析,來決定乙烯需求量;啟動乙烯氣體控制組件,以依據所述乙烯需求量來導入乙烯至所述溫室中;以及在導入乙烯之後,判斷乙烯濃度是否已達到所述乙烯濃度設定值,當乙烯濃度低於所述乙烯濃度設定值時,則再次進行啟動所述乙烯回饋控制器的步驟與啟動所述乙烯氣體控制組件的步驟,當乙烯濃度已達到所述乙烯濃度設定值時,則停止導入乙烯並持續監控乙烯濃度。 The monitoring unit of the plant plant growth factor as described in claim 21 of the patent application scope The method for monitoring the ethylene concentration comprises: setting an ethylene concentration setting value; activating an ethylene concentration sensor in the ethylene monitoring module to sense an ethylene concentration in the greenhouse; and starting an ethylene feedback controller, The ethylene concentration setting value and the ethylene concentration are analyzed to determine the ethylene demand; the ethylene gas control unit is activated to introduce ethylene into the greenhouse according to the ethylene demand; and the ethylene concentration is determined after the introduction of ethylene Whether the ethylene concentration setting value has been reached, and when the ethylene concentration is lower than the ethylene concentration setting value, the step of starting the ethylene feedback controller and the step of starting the ethylene gas control component are performed again, when the ethylene concentration has been When the ethylene concentration set point is reached, the introduction of ethylene is stopped and the ethylene concentration is continuously monitored. 如申請專利範圍第35項所述之植物工廠生長因子的監控方法,其中所述乙烯濃度的監控方法更包括:在停止導入乙烯並持續監控乙烯濃度時,判斷乙烯濃度是否低於所述乙烯濃度設定值,當乙烯濃度低於所述乙烯濃度設定值時,則再次進行啟動所述乙烯回饋控制器的步驟與啟動所述乙烯氣體控制組件的步驟,當乙烯濃度已達到所述乙烯濃度設定值時,則停止導入乙烯並持續監控乙烯濃度。 The method for monitoring a plant plant growth factor according to claim 35, wherein the method for monitoring the ethylene concentration further comprises: determining whether the ethylene concentration is lower than the ethylene concentration when the introduction of ethylene is stopped and the ethylene concentration is continuously monitored. a set value, when the ethylene concentration is lower than the ethylene concentration setting value, the step of starting the ethylene feedback controller and the step of starting the ethylene gas control component are performed again, when the ethylene concentration has reached the ethylene concentration setting value At the same time, the introduction of ethylene is stopped and the ethylene concentration is continuously monitored. 如申請專利範圍第21項所述之植物工廠生長因子的監控方法,更包括利用氧氣監控模組監控所述溫室中的氧氣濃度。 The method for monitoring plant plant growth factors as described in claim 21, further comprising monitoring the oxygen concentration in the greenhouse using an oxygen monitoring module. 如申請專利範圍第37項所述之植物工廠生長因子的監控方法,其中所述氧氣濃度的監控方法包括: 設定氧氣濃度設定值;啟動所述氧氣監控模組中的氧氣濃度感測器,以感測所述溫室中的氧氣濃度;啟動氧氣回饋控制器,對所述氧氣濃度設定值與氧氣濃度進行分析,來決定氧氣需求量;啟動氧氣氣體控制組件,以依據所述氧氣需求量來導入氧氣至所述溫室中;以及在導入氧氣之後,判斷氧氣濃度是否已達到所述氧氣濃度設定值,當氧氣濃度低於所述氧氣濃度設定值時,則再次進行啟動所述氧氣回饋控制器的步驟與啟動所述氧氣氣體控制組件的步驟,當氧氣濃度已達到所述氧氣濃度設定值時,則停止導入氧氣並持續監控氧氣濃度。 The method for monitoring plant plant growth factors according to claim 37, wherein the monitoring method of the oxygen concentration comprises: Setting an oxygen concentration setting value; starting an oxygen concentration sensor in the oxygen monitoring module to sense an oxygen concentration in the greenhouse; starting an oxygen feedback controller to analyze the oxygen concentration setting value and the oxygen concentration Determining the oxygen demand; starting the oxygen gas control unit to introduce oxygen into the greenhouse according to the oxygen demand; and after introducing the oxygen, determining whether the oxygen concentration has reached the oxygen concentration set value, when oxygen When the concentration is lower than the oxygen concentration setting value, the step of starting the oxygen feedback controller and the step of starting the oxygen gas control component are performed again, and when the oxygen concentration has reached the oxygen concentration setting value, the introduction is stopped. Oxygen and continuous monitoring of oxygen concentration. 如申請專利範圍第38項所述之植物工廠生長因子的監控方法,其中所述氧氣濃度的監控方法更包括:在停止導入氧氣並持續監控氧氣濃度時,判斷所述氧氣濃度低於所述氧氣濃度設定值,當氧氣濃度低於所述氧氣濃度設定值時,則再次進行啟動所述氧氣回饋控制器的步驟與啟動所述氧氣氣體控制組件的步驟,當所述氧氣濃度已達到所述氧氣濃度設定值時,則停止導入氧氣並持續監控氧氣濃度。 The method for monitoring a plant plant growth factor according to claim 38, wherein the monitoring method of the oxygen concentration further comprises: determining that the oxygen concentration is lower than the oxygen when the introduction of oxygen is stopped and the oxygen concentration is continuously monitored. a concentration setting value, when the oxygen concentration is lower than the oxygen concentration setting value, the step of starting the oxygen feedback controller and the step of starting the oxygen gas control component are performed again, when the oxygen concentration has reached the oxygen At the concentration set point, the introduction of oxygen is stopped and the oxygen concentration is continuously monitored. 如申請專利範圍第21項所述之植物工廠生長因子的監控方法,更包括利用光源日照監控模組以監控所述溫室中的光照參數。 The method for monitoring plant plant growth factors as described in claim 21, further comprising using a light source sunshine monitoring module to monitor illumination parameters in the greenhouse. 如申請專利範圍第21項所述之植物工廠生長因子的監控方法,更包括利用濕度監控模組監控所述溫室中的濕度。 The method for monitoring plant plant growth factors according to claim 21, further comprising monitoring the humidity in the greenhouse by using a humidity monitoring module. 如申請專利範圍第21項所述之植物工廠生長因子的監控方 法,更包括利用溫度監控模組監控所述溫室中的溫度。 The monitoring unit of the plant plant growth factor as described in claim 21 of the patent application scope The method further includes monitoring the temperature in the greenhouse using a temperature monitoring module. 如申請專利範圍第21項所述之植物工廠生長因子的監控方法,其中當所述臭氧處理為利用所述臭氧監控模組中的臭氧內處理控制箱所進行的內循環消毒殺菌處理時,所述臭氧濃度的監控方法包括:設定所述臭氧監控模組中的所述臭氧內處理控制箱的臭氧供應量、臭氧處理時間及臭氧濃度排放設定值;啟動所述臭氧內處理控制箱;將所述溫室中的氣體導入所述臭氧內處理控制箱中;依據所述臭氧設定值供應臭氧至所述臭氧內處理控制箱中,且在所述臭氧處理時間內,利用臭氧對所述氣體進行消毒殺菌;以及將所述氣體中的臭氧濃度利用臭氧洗滌器降至所述臭氧濃度排放設定值後,再將經由臭氧進行處理後的所述氣體排放至所述溫室中,同時再次進行將所述溫室中的所述氣體導入所述臭氧內處理控制箱中的步驟。 The method for monitoring a plant plant growth factor according to claim 21, wherein when the ozone treatment is an internal circulation sterilization treatment by using an ozone internal treatment control box in the ozone monitoring module, The monitoring method for the ozone concentration includes: setting an ozone supply amount, an ozone treatment time, and an ozone concentration discharge setting value of the ozone internal processing control box in the ozone monitoring module; and starting the ozone internal processing control box; Introducing a gas in the greenhouse into the ozone internal treatment control box; supplying ozone to the ozone internal treatment control box according to the ozone setting value, and disinfecting the gas with ozone during the ozone treatment time Sterilizing; and after the ozone concentration in the gas is lowered to the ozone concentration discharge set value by the ozone scrubber, the gas treated by the ozone is discharged into the greenhouse, and the The step of introducing the gas in the greenhouse into the ozone internal treatment control box. 如申請專利範圍第43項所述之植物工廠生長因子的監控方法,其中在依據所述臭氧設定值提供臭氧至所述臭氧內處理控制箱中的步驟更包括將所述臭氧內處理控制箱中的濕度控制在預定濕度。 The method for monitoring plant plant growth factors according to claim 43, wherein the step of providing ozone to the ozone internal treatment control box according to the ozone setting value further comprises: The humidity is controlled at a predetermined humidity.
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