201243984 六、發明說明： C 明所屬斗舒々頁】 發明領域 本發明係有關於一種可均一地支撐基板整面，而可防 止於基板之處理途中基板因自身重量而變形之用於支撐基 板之皿具及使用該皿具之支撐單元。 L先前技冬好；3 發明背景 基板處理裝置用於平板顯示器之製造時，大致分為蒸 氣沉積（Vapor Deposition)裝置、及退火(Annealing)裝置。 蒸氣沉積裝置係用以形成構成平板顯示器之核心結構 之透明導電層、絕緣層、金屬層或矽層的裝置，有諸如 LPCVD(Low Pressure Chemical Vapor Deposition)或 PECVD(Plasma-Enhanced Chemical Vapor Deposition)等之 化學氣相沉積裝置、及諸如濺鍍(Sputtering)等之物理氣相 沉積裝置。 又，退火裝置係將膜蒸氣沉積於基板後，使經蒸氣沉 積之膜之特性提高的裝置，係使經蒸氣沉積之膜結晶化或 相變化之熱處理裝置。 一般熱處理裝置有將1個基板進行熱處理之牧葉式 (Single Substrate Type)及將複數基板進行熱處理之批式 (Bathe Type)。枚葉式熱處理裝置具有結構簡單之優點，但 有生產性降低之缺點，大量生產多使用批式熱處理裝置。 於批式熱處理裝置形成提供熱處理空間之腔室，於腔 201243984 室必須使用分別支撐搬入至腔室之複數基板之支撐機構。 然而’由於習知之支撐機構支承基板之緣部份而支 撐’故於將基板進行熱處理時，有基板因基板之自身重量 而撓曲變形之虞。藉此，由於平板顯示器之特性降低，故 有基板處理步驟之可靠度降低之問題。 【考务明内^】 發明概要 發明欲解決之課題 本發明係為解決上述習知技術之問題而發明者，其目 的在於提供均一地支撐基板整面，而可防止於基板之處理 途中基板因自身重量而變形之用於支撐基板之皿具及使用 該皿具之支撐單元。 用以欲解決課題之手段 用以達成上述目的之本發明之用於支撐基板之皿具係 支撐投入至基板處理裝置之腔室以供處理之基板者，其包 含有相互對向之一對主桿、將前述一對主桿相互連結之複 數連結桿'及設於前述主桿，以搭載支撐前述基板之複數 第1支撐銷。 又’用以達成上述目的之本發明之用於支撐基板之支 撐單元係支撐投入至基板處理裝置之腔室以供處理之基板 者，其包含有支台、橫支撐桿及孤具，該支台係分別具有 與前述腔室之底面接觸之台座、從前述台座之一端部垂直 地延伸設置之支撐台、及從前述支撐台之一側面水平地延 伸設置並以相互具有間隔而上下積層之形態形成的複數支 4 201243984 撐肋，且相互對向之一對構成—組而分別設於前述腔室之 前面側及後面側者；該橫支撐桿係一端部側及另—端部側 分別支撐於構成一組之前述支台之前述支撐肋者；該風具 係具有複數第1支撐銷，該等複數第i支樓銷係一端部側及 另一端部側分別支撐於位於前述腔室之前面側之前述橫支 撐桿及位於前述腔室之後面側之前述橫支撐桿，而 支撐前述基板者。 ° 發明效果 本發明之用於支撐基板之皿具及使用該皿具之支撐單 兀由於以複數第1支撐銷及第2支撐銷均一地支撐基板整 面，故可防止於基板之處理時，基板因自身重量而下垂。 因此，因即使處理基板，基板之特性亦無變化，而具有基 板處理步驟之可靠度提高之效果。 圖式簡單說明 第1圖係設有本發明一實施形態之用於支撐基板之支 撐單元之基板處理裝置的立體圖。 第2圖係第1圖所示之支撐單元之放大圖。 第3圖係第2圖所示之支台之放大圖。 第4圖係第3圖之「B」部之放大圖。 第5圖係第2圖所示之皿具之放大圖。 第6圖係第2圖之「A」部之放大圖。 第7圖之第5圖之「C」部之放大圖。 第8圖係顯示本發明一實施形態之皿具之使用狀態的圖。 第9圖係本發明另一實施形態之皿具之立體圖。 201243984 第10圖係顯示本發明另一實施形態之第1支撐銷之多 種形狀的圖。 第11圖係顯示本發明另一實施形態之第1支撐銷之多 種形狀的圖。 I：實施方式3 用以實施發明之形態 後述之關於本發明之詳細說明參照將本發明可實施之 特定實施形態作為例示而顯示之附加圖式。充分詳細地說 明該等實施形態，以使該業者可實施本發明。務必理解本 發明之多種實施形態雖相互不同，但不需相互排斥。舉例 言之，於此記載之特定形狀、構造及特性與一實施形態相 關，在不脫離本發明之精神及範圍之範圍内可以其他實施 形態實現。又，務必理解各個揭示之實施形態之個別構成 要件之位置或配置在不脫離本發明之精神及範圍之範圍内 可變更。因而，後述之詳細說明非以限定之涵義領會者， 本發明之範圍適當地說明時，僅以與其請求項主張均等之 所有範圍一同附加之請求項限定。在圖式中，類似之參照 標號在各方面指示同一或類似之功能，長度及面積、厚度 等與其形態為方便，亦有誇張呈現之情形。 以下，參照附加之圖式，詳細地說明本發明實施形態 之用於支撐基板之皿具及使用該皿具之支撐單元。 第1圖係設有本發明一實施形態之用於支撐基板之支 撐單元之基板處理裝置的立體圖。 如圖所示，基板處理裝置100包含有形成約略長方體形 6 201243984 狀而構成外觀之本體lio，並於本體110之内部形成處理基 板50之腔室110a。本體110不僅可形成長方體形狀，亦可按 基板50之形狀，形成多種形狀，腔室ii〇a以密閉之空間而設。 以下，務必理解基板50之處理係包含將基板50加熱及 冷卻之步驟、用以將預定膜蒸氣沉積於基板50上之所有步 驟、用以將經蒸氣沉積於基板50上之預定膜退火、結晶化 或相變化之所有熱處理步驟等的概念。又，基板50之材質 未特別限定，可以諸如玻璃、塑膠、聚合物、矽晶圓或不 鏽鋼等之材質形成。 本體110之前面開放且設門113，門113可將腔室110a開 關。在開啟門113而開放腔室110a之狀態下，以機器人之手 臂（圖中未示）等支撐基板50，將基板50搬入至腔室110a。 又，在關閉門113而封閉腔室ll〇a之狀態下，處理基板50。 於本體110之内部設用以支撐基板50之支撐單元120、 用以將基板50加熱之加熱器（圖中未示）、用以使基板50冷卻 之冷卻管（圖中未示）等。 就本實施形態之支撐單元120，參照第1圖〜第4圖來說 明。第2圖係第1圖所示之支撐單元之放大圖，第3圖係第2 圖所示之支台之放大圖，第4圖係第3圖之「B」部之放大圖。 如圖所示，本實施形態之支撐單元120包含有支台 130、橫支撐桿140、皿具150。 支台130具有接觸形成腔室ii〇a之本體110之底面的台 座131、從台座131之一端部垂直地延伸設置之支撐台133、 從支撐台133之一側面水平地延伸設置，且以相互具有間隔 201243984 而上下積層之形態形成之複數支撐肋135。 支台130以相互對向之一對構成一組，構成一組之支台 130分別設於本體11〇之前面側之兩角部及後面側之兩角 部。又，構成一組之支台130之支撐肋135相互對向。 於第2圖顯示配置有2組支台130 ’以將相互相鄰之各支 台130相互連結之假想線構成之形狀係約略矩形。即，各支 台130位於矩形之頂點部位，以各支台13〇構成之形狀對應 於基板50之形狀。 構成一組而相互對向之支台130間之距離及構成一組 之支台130間之距離可按基板50之大小，適當地調整。 於構成一組之支台130之支撐肋135分別固定支撐橫支 撐桿140之左端部側及右端部側。又，分別支撐於位於腔室 110a之刚面側及後面側而分別構成一組之支台130之支撲 肋135的橫支撐桿140分別上下配置而相互構成平行是無須 贅言的。又’分別支撐於位於腔室110a之前面側而構成一 組之支台130之支撐肋135的各橫支撐桿140、分別支撐於位 於腔室110a之後面側而構成一組之支台13〇之支揮肋135的 各橫支撐桿140位於相同之高度是無須贅言的。 於支撐肋135形成有形成為對應於橫支撐桿14〇之形 狀，而可供橫支撐桿140之端部側***支撐之載置溝i35a, 俾使橫支撐桿140可穩定地支撐於支台130。又，於形成有 載置溝135a之支撐肋135之部位與載置溝135&之長度方向 垂直地形成卡止溝135b，於橫支撐桿140之端部側之外周面 分別形成***卡止於卡止溝135b之卡止環141。 201243984 由於橫支撐桿MO***支樓於載置溝咖，故可防止橫 支撐桿140在支撐肋135上於前後方向滑^又，藉垂直於 載置溝135a之卡止溝135b及卡止環⑷，可防止橫支撐桿 140在支撐肋135上於左右方向滑動。 於第2圖顯示橫支撐桿14〇亦支撐於台座⑶，此時，亦 於台座ι31之上面同樣地形成形成於支撐肋135之上面之載 置溝135a及卡止溝135b。 於位於腔室110a之前面側之橫支撐桿14〇及位於後面 側之橫支撐桿M0搭載支撐可搭載支撐基板5〇之皿具15〇。 就皿具15〇，參照第2圖、第5圖〜第7圖來說明。第5圖係第2 圖所示之皿具之放大圖，第6圖係第2圖之「A」部之放大圖， 第7圖之第5圖之「C」部之放大圖。 如圖所示，皿具150具有相互具有間隔而對向配置之— 對主桿161、將主桿161相互連結之複數連結桿171。 主桿161之前端部侧分別保持設置於位於腔室u〇a(參 照第1圖）之前面側之任一橫支撐桿14〇,後端部側分別保持 設置於位於腔室1 l〇a之後面側之另一橫支撐桿14〇。 為將皿具150穩固地支撐於橫支撐桿14〇，而於主桿161 之刖端部設卡止固定於位於腔室H〇a之前面側之橫支撑桿 140的弧狀支撐片163。弧狀支撐片163之形狀形成對應於橫 支撐桿140之外形之形狀的半圓形。 又，於位於主桿161之後端部側之連結桿171設搭載支 撐於橫支撐桿140之桿形狀的直線狀支撐片164。直線狀支撐 片164與橫支撐桿140垂直地配置而搭載支撐於橫支撐桿14〇。 9 201243984 由於派狀支撐片163***支撑於橫支標桿140，直線狀 支樓片164搭載支樓於橫支樓桿刚，故皿具15〇可穩固地搭 載支撐於板支#桿14〇。又，由於弧狀支撑片163形成半圓 形而插人支撐於橫支撐桿14Q，直線狀支樓片164形成條狀 而搭載支撐於橫支撐桿141，故僅將皿具15〇往上側舉起， 便可將皿具150從橫支撐桿14〇分離。因而，可易將皿具15〇 從橫支撐桿140分離。 於主桿161及連結桿171分別設複數個搭載支撐基板5〇 之第1及第2支撐銷166、173。由於第1及第2支撐銷166、173 於主桿161及連結桿171以一定間隔設複數個，故可均一地 支撐基板50之整面。因而，可防止處理基板5〇時，基板5〇 因自身重量而下垂。 可接觸支撐基板50之第1及第2支撐銷166、173之上端 4且形成圓形而與基板5〇點接觸。如此一來，由於基板％ 之下面亦與上面同樣地形成完全露出之狀態，故可更均一 地處理基板50。 如第2圖所示，皿具15〇按基板50之大小，大小不同之2 個皿具150a、150b可搭載支撐於橫支撐桿14〇。 又，於橫支撐桿140設複數個防止皿具15〇在橫支撐桿 140上沿著橫支撐桿140滑動之制動器143(參照第6圖）。制動 器143設於位於腔室ll〇a之前面側之橫支撐桿14〇而與弧狀 支撐片163點接觸。 可以1個皿具150支撐1個基板50，如第2圖所示，可以 複數皿具150a、150b支撐1個基板50。因而，對應於設在皿 201243984 具150之主桿161之弧狀支撐片163之個數而設制動器143之 個數是無須贅言的。 連結桿171與主桿161構成約略直角，而將1對主桿161 相互連結成一體。連結桿171宜配置於低於主桿161之位置 而結合。因此，連結桿171得以具有位於一對主桿161間且 配置於比主桿161下側，並設有第2支撐銷173之水平桿 17 la、從水平桿πia之兩端部分別於上側形成彎曲，且分 別結合於主桿161之結合桿171b。結合桿17lb可按皿具15〇 之構造，從水平桿171a形成複數次彎曲是無須贅言的。 使連結桿171配置成低於主桿161之理由係因將基板50 搭載於第1及第2支撐銷166、173而處理基板50時，可於基 板50與連結桿171間形成足夠之間隔’以於處理基板50時投 入之基板之處理氣體可平順地流動之故。 連結桿171可具有相互不同之間隔。當連結桿171以相 互不同之間隔配置時，設於具有相互不同之間隔之連結桿 171之第2支撐銷173可形成複數次彎曲。 加以詳細地說明，第2支撐銷173(參照第7圖）之中間部 位形成彎曲173a，分別通過第2支撐銷173之上側部位及下 側部位之長度方向之中心的假想直線LI、L2相互形成平 行。即，由於上側部位位於結合於連結桿171之第2支撐銷 173之下側部位之外側，故與第2支撐銷173之下側部位之外 側拉開間隔之上側部位支撐基板5〇。如此一來’連結桿171 間之間隔非一定時，設於連結桿171之第2支撐銷Π3具有一 定間隔而可均一地支撐基板50整面。 11 201243984 第2支撐銷173之下側部位形成圓形，第2支撐銷i73可 旋轉時’使第2支樓銷173旋轉，而可易支樓基板％(參照第 1圖）下垂之部位。 於皿具150之主桿161之端部側分別設與基板邓之角部 側接觸，以防止基板50在第1及第2支撐銷166、173上滑動 之第3支撐銷167。 使用1個孤具150，支撐基板50時，第3支撐銷167分別 設於一對主桿161之兩端部側。然而，如第2圖所示，使用2 個皿具150a ' 150b，支撐1個基板5〇時，僅於相互拉開間隔 之其中任一孤具150a之任一主桿161及另一皿具15〇b之任 一主桿161設第3支撐銷167。 又，於主桿161之兩端部側分別設供機器人手臂（圖中 未示）***卡止之卡止鉤169。當前述機器人之手臂***至 卡止鉤169而使卡止鉤169升降時，皿具15〇便升降。 將前述機器人之手臂卡止於卡止鉤169時，可適當地調 整卡止鉤169之高度及位置，俾使前述機器人之手臂不與第 1支撐銷166干擾。 第8圖係顯示本發明一實施形態之m具之使用狀態的 圖，說明此第8圖。 如圖所示，孤具150按基板50之大小，寬度大之皿具 150a與宽度小之皿具150b皆可使用。此時，於相互相鄰之 皿具150a之主桿161與皿具150b之主桿161不設第3支撐銷 167，而於相互拉開間隔之皿具150a之主桿161及皿具150b 之主桿161分別設第3支撐銷167。 12 201243984 本實施形態之用於支撐基板之皿具及使用該皿具之支 撐單元由於以複數第1及第2支撐銷166、173均一地支撐基 板50之整面，故可防止於處理基板50時，基板50因自身重 量而下垂。 第9圖係本發明另一實施形態之血具之立體圖，說明此 第9圖。 如圖所示，在本發明另一實施形態之皿具250，第1支 撐銷266之下部側及第2支撐銷273之下部側分別可裝卸地 結合於主桿261及連結桿271。因此，於主桿261及連結桿271 分別形成供第1支撐銷266及第2支撐銷273插脫之第1結合 溝261a及第2結合溝271a。 由於第1及第2支撐銷266、273可裝卸，故可將第1及第 2支撐銷266、273集中地配置於處理基板50時，基板50因基 板50之自身重量而下垂之部位。因而，可更完全防止基板 50變形。 第1及第2支撐銷266、273之下部側之形狀與第1及第2 結合溝261a、271a之形狀分別相互對應是無須贅言的。 第10圖及第11圖係顯示本發明另一實施形態之第1支 撐銷之多種形狀的圖，說明此第1〇圖及第11圖。 第10圖顯示第1支撐銷366之下部側之截面形狀為橢圓 形，第11圖顯示第1支撐銷466之下部側之截面形狀為角 形。此時，供第1支撐銷366、466插脫之第1結合溝361a、 461a之形狀應對應於第1支撐銷366、466之形狀是無須贅言 的0 13 201243984 又，在第9圖所說明之第2支撐銷273及第2結合溝271a 之形狀亦可分別形成為相互對應之截面形狀為橢圓形或截 面形狀為角形。 當第1支撐銷166、266、366、466之形狀互異，第2支 撐銷173、273之形狀互異時，可發揮顯示第1支撐銷166、 266、366、466之結合位置及第2支撑銷173、273之結合位 置的功能。 上述關於本發明實施形態之圖式係省略詳細之輪廓線 者，係為易了解屬於本發明之技術性思想之部份而概略地 顯示者。又，上述實施形態非形成為限定本發明之技術思 想’僅為用以理解本發明之申請專利範圍所含之技術事項 之參照事項。 【圖式簡單說明】 第1圖係設有本發明一實施形態之用於支撐基板之支 撐單元之基板處理裝置的立體圖。 第2圖係第1圖所示之支撐單元之放大圖。 第3圖係第2圖所示之支台之放大圖。 第4圖係第3圖之ΓΒ」部之放大圖。 第5圖係第2圖所示之皿具之放大圖。 第6圖係第2圖之「a」部之放大圖。 第7圖之第5圖之「c」部之放大圖。 第8圖係顯示本發明一實施形態之皿具之使用狀態的圖。 第9圖係本發明另一實施形態之皿具之立體圖。 第10圖係顯示本發明另一實施形態之第1支撐銷之多 201243984 種形狀的圖。 第11圖係顯示本發明另一實施形態之第1支撐銷之多 種形狀的圖。 【主要元件符號說明】 50.. .基板 100.. .基板處理裝置 110.. .本體 110a...腔室 113…門 120.. .支撐單元 130.. .支台 131.. .台座 133.. .支撐台 135.. .支撐肋 135a...載置溝 135b...卡止溝 140.. .橫支撐桿 141.. .卡止環 143.. .制動器 150，150a，150b，250···皿具 161，261··.主桿 163.. .弧狀支撐片 164.. .直線狀支撐片 166，266，366，466…第 1 支樓鎖 167…第3支撐銷 169.. .卡止鉤 171，271...連結桿 171a...水平桿 171b...結合桿 173，273...第2支撐銷 173a...彎曲 261a，361a，461a...第 1 結合溝 271a…第2結合溝 LI，L2...直線 A，B，C···部 15201243984 VI. OBJECTS OF THE INVENTION: C. PCT TECHNIQUES OF THE INVENTION The present invention relates to a substrate for supporting a substrate which can uniformly support the entire surface of the substrate while preventing deformation of the substrate due to its own weight during processing of the substrate. A dish and a support unit using the dish. BACKGROUND OF THE INVENTION The substrate processing apparatus is generally classified into a vapor deposition apparatus (Vapor Deposition) apparatus and an annealing (Annealing) apparatus when it is used for the manufacture of flat panel displays. The vapor deposition apparatus is a device for forming a transparent conductive layer, an insulating layer, a metal layer or a germanium layer constituting a core structure of a flat panel display, such as LPCVD (Low Pressure Chemical Vapor Deposition) or PECVD (Plasma-Enhanced Chemical Vapor Deposition). A chemical vapor deposition apparatus, and a physical vapor deposition apparatus such as sputtering. Further, the annealing apparatus is a heat treatment apparatus which vapor-deposits a film after vapor deposition on a substrate to improve the characteristics of the vapor-deposited film. A general heat treatment apparatus includes a single substrate type in which one substrate is heat-treated and a batch type (Bathe Type) in which a plurality of substrates are heat-treated. The leaf-type heat treatment device has the advantages of simple structure, but has the disadvantage of reduced productivity, and uses a batch heat treatment device in mass production. The batch heat treatment device forms a chamber providing a heat treatment space, and a support mechanism for supporting a plurality of substrates carried into the chamber must be used in the chamber 201243984. However, since the conventional support mechanism supports the edge portion of the substrate, when the substrate is subjected to heat treatment, the substrate is deflected and deformed by the weight of the substrate itself. Thereby, since the characteristics of the flat panel display are lowered, there is a problem that the reliability of the substrate processing step is lowered. SUMMARY OF THE INVENTION The present invention has been made to solve the above problems of the prior art, and an object of the invention is to provide a uniform support for the entire surface of a substrate and prevent the substrate from being processed during the processing of the substrate. A dish for supporting a substrate and a supporting unit using the same, which is deformed by its own weight. Means for Solving the Problems The apparatus for supporting a substrate of the present invention for achieving the above object supports a substrate that is put into a chamber of a substrate processing apparatus for processing, and includes a pair of opposite sides. A rod, a plurality of connecting rods that connect the pair of main rods to each other, and the main rods are provided to mount a plurality of first support pins that support the substrate. Further, the support unit for supporting the substrate of the present invention for achieving the above object supports a substrate which is put into a chamber of the substrate processing apparatus for processing, and includes a support, a lateral support rod and a lone, the branch Each of the stages has a pedestal that is in contact with the bottom surface of the chamber, a support base that extends perpendicularly from one end of the pedestal, and a form that extends horizontally from one side surface of the support base and is vertically stacked at intervals Forming a plurality of branches 4 201243984 ribs, and one pair of opposite pairs is formed as a group and respectively disposed on the front side and the rear side of the chamber; the horizontal support rods are supported on one end side and the other end side respectively And a plurality of first support pins, wherein the plurality of i-th floor pins are respectively supported at the one end side and the other end side of the plurality of i-branch pins The lateral support bar on the front side and the lateral support bar on the back side of the chamber support the substrate. According to the present invention, the device for supporting the substrate and the support unit using the same can support the entire surface of the substrate by the plurality of first support pins and the second support pin, thereby preventing the substrate from being processed. The substrate hangs down due to its own weight. Therefore, since the characteristics of the substrate are not changed even when the substrate is processed, the reliability of the substrate processing step is improved. BRIEF DESCRIPTION OF THE DRAWINGS Fig. 1 is a perspective view showing a substrate processing apparatus provided with a supporting unit for supporting a substrate according to an embodiment of the present invention. Fig. 2 is an enlarged view of the supporting unit shown in Fig. 1. Figure 3 is an enlarged view of the abutment shown in Figure 2. Fig. 4 is an enlarged view of a portion "B" of Fig. 3. Figure 5 is an enlarged view of the dish shown in Figure 2. Fig. 6 is an enlarged view of the "A" portion of Fig. 2. An enlarged view of the "C" portion of Fig. 5 of Fig. 7. Fig. 8 is a view showing a state of use of the dish according to the embodiment of the present invention. Figure 9 is a perspective view of a dish according to another embodiment of the present invention. 201243984 Fig. 10 is a view showing various shapes of a first support pin according to another embodiment of the present invention. Fig. 11 is a view showing a plurality of shapes of a first support pin according to another embodiment of the present invention. I. EMBODIMENT 3 EMBODIMENT OF THE INVENTION The detailed description of the present invention will be described with reference to the specific embodiments of the present invention. The embodiments are described in sufficient detail to enable the practitioner to practice the invention. It is to be understood that the various embodiments of the invention are different from each other, but need not be mutually exclusive. For example, the specific shapes, structures, and characteristics of the present invention may be embodied in other embodiments without departing from the spirit and scope of the invention. Further, it is to be understood that the position and arrangement of the individual components of the embodiments disclosed herein may be modified without departing from the spirit and scope of the invention. Therefore, the detailed descriptions which follow are not intended to limit the scope of the invention, and the scope of the present invention is only limited by the claims appended to the claims. In the drawings, similar reference numerals indicate the same or similar functions in various aspects, and the length, the area, the thickness, and the like are convenient and exaggerated. Hereinafter, a dish for supporting a substrate and a supporting unit using the same according to an embodiment of the present invention will be described in detail with reference to the accompanying drawings. Fig. 1 is a perspective view showing a substrate processing apparatus provided with a supporting unit for supporting a substrate according to an embodiment of the present invention. As shown in the figure, the substrate processing apparatus 100 includes a body lio which is formed into a substantially rectangular parallelepiped shape and forms an appearance, and a chamber 110a for processing the substrate 50 is formed inside the body 110. The main body 110 can be formed not only in a rectangular parallelepiped shape but also in a variety of shapes in accordance with the shape of the substrate 50, and the chamber ii〇a is provided in a sealed space. Hereinafter, it is to be understood that the processing of the substrate 50 includes a step of heating and cooling the substrate 50, all steps of vapor deposition of the predetermined film on the substrate 50, annealing and crystallization of a predetermined film vapor-deposited on the substrate 50. The concept of all heat treatment steps, such as changes in phase or phase. Further, the material of the substrate 50 is not particularly limited, and may be formed of a material such as glass, plastic, polymer, tantalum wafer or stainless steel. The front surface of the body 110 is open and a door 113 is provided, and the door 113 can open the chamber 110a. In a state where the door 113 is opened and the chamber 110a is opened, the substrate 50 is supported by a robot arm (not shown) or the like, and the substrate 50 is carried into the chamber 110a. Further, the substrate 50 is processed in a state where the door 113 is closed and the chamber 11a is closed. A support unit 120 for supporting the substrate 50, a heater for heating the substrate 50 (not shown), a cooling tube for cooling the substrate 50 (not shown), and the like are disposed inside the body 110. The support unit 120 of the present embodiment will be described with reference to Figs. 1 to 4 . Fig. 2 is an enlarged view of the support unit shown in Fig. 1, Fig. 3 is an enlarged view of the support shown in Fig. 2, and Fig. 4 is an enlarged view of a portion "B" of Fig. 3. As shown in the figure, the support unit 120 of the present embodiment includes a support 130, a lateral support rod 140, and a dish 150. The support 130 has a pedestal 131 contacting the bottom surface of the body 110 forming the chamber ii〇a, a support table 133 extending perpendicularly from one end of the pedestal 131, horizontally extending from one side of the support table 133, and mutually A plurality of support ribs 135 having a shape of a layer of 201243984 and a layer of upper and lower layers. The abutments 130 are formed in a pair of opposite directions, and the abutments 130 constituting one set are respectively provided at the two corner portions on the front side of the main body 11 and the two corner portions on the rear side. Further, the support ribs 135 of the set of the stand 130 are opposed to each other. Fig. 2 shows a configuration in which two sets of pedestals 130' are arranged to connect imaginary lines connecting mutually adjacent pedestals 130 to each other in a substantially rectangular shape. That is, each of the stages 130 is located at the vertex of the rectangle, and the shape of each of the stages 13 is corresponding to the shape of the substrate 50. The distance between the groups 130 that form a group and oppose each other and the distance between the groups 130 that form a group can be appropriately adjusted according to the size of the substrate 50. The support ribs 135 constituting the set of the standoffs 130 are fixedly supported to support the left end side and the right end side of the cross strut 140. Further, it is needless to say that the lateral support rods 140 which are respectively supported on the rigid surface side and the rear side of the chamber 110a and which constitute the support ribs 135 of the set of the standoffs 130 are vertically arranged to be parallel to each other. Further, each of the lateral support rods 140, which are respectively supported by the support ribs 135 of the set 130, which are located on the front side of the chamber 110a, are respectively supported by the abutments 13 which are located on the back side of the chamber 110a to form a group. It is needless to say that the horizontal support bars 140 of the support ribs 135 are at the same height. The support rib 135 is formed with a shape corresponding to the lateral support rod 14 ,, and the end side of the lateral support rod 140 is inserted into the supporting load groove i35a, so that the horizontal support rod 140 can be stably supported on the support 130 . Further, in the portion where the support rib 135 of the mounting groove 135a is formed, the locking groove 135b is formed perpendicularly to the longitudinal direction of the mounting groove 135& and the outer peripheral surface of the lateral support rod 140 is inserted and locked. The locking ring 141 of the locking groove 135b. 201243984 Since the horizontal support bar MO is inserted into the branch to mount the ditch, the horizontal support bar 140 can be prevented from sliding on the support rib 135 in the front-rear direction, and the locking groove 135b and the locking ring perpendicular to the mounting groove 135a can be prevented. (4) The horizontal support bar 140 can be prevented from sliding on the support rib 135 in the left-right direction. In Fig. 2, the horizontal support bar 14 is also supported by the pedestal (3). At this time, the mounting groove 135a and the locking groove 135b formed on the upper surface of the support rib 135 are formed similarly on the upper surface of the pedestal ι31. The horizontal support bar 14A located on the front side of the chamber 110a and the lateral support bar M0 on the rear side are mounted with a support 15 for supporting the support substrate 5. The container is 15 inches, and it will be described with reference to Fig. 2 and Fig. 5 to Fig. 7. Fig. 5 is an enlarged view of the dish shown in Fig. 2, and Fig. 6 is an enlarged view of a portion "A" of Fig. 2, and an enlarged view of a portion "C" of Fig. 5 of Fig. 7. As shown in the figure, the dish 150 has a plurality of connecting rods 171 which are disposed opposite to each other with respect to the main rod 161 and the main rod 161. The front end side of the main rod 161 is respectively held on any of the lateral support rods 14 位于 located on the front side of the chamber u 〇 a (refer to FIG. 1 ), and the rear end side is respectively disposed and disposed in the chamber 1 l〇a Then, the other lateral support bar 14〇 on the face side. In order to stably support the dish 150 to the lateral support rod 14〇, an arc-shaped support piece 163 which is fixed to the lateral support rod 140 on the front side of the chamber H〇a is provided at the end portion of the main rod 161. The shape of the arcuate support piece 163 is formed into a semicircular shape corresponding to the shape of the lateral support bar 140. Further, the connecting rod 171 located on the end side of the main rod 161 is provided with a linear supporting piece 164 which is supported by the rod shape of the horizontal supporting rod 140. The linear support piece 164 is disposed perpendicular to the lateral support bar 140 and is mounted and supported by the lateral support bar 14A. 9 201243984 Since the pie-shaped support piece 163 is inserted and supported by the cross-branch ruler 140, the linear-shaped branch piece 164 is mounted on the cross-height of the cross-height floor, so that the bag 15 〇 can be stably supported and supported on the plate support #杆14〇. Further, since the arc-shaped support piece 163 is formed in a semicircular shape and is inserted and supported by the lateral support rod 14Q, the linear branch piece 164 is formed in a strip shape and supported by the lateral support rod 141, so that only the dish 15 is lifted upward. The dish 150 can be separated from the transverse support rod 14〇. Thus, the dish 15〇 can be easily separated from the lateral support rod 140. A plurality of first and second support pins 166 and 173 on which the support substrate 5 is mounted are provided on the main rod 161 and the connecting rod 171, respectively. Since the first and second support pins 166 and 173 are provided in plural at a predetermined interval between the main rod 161 and the connecting rod 171, the entire surface of the substrate 50 can be uniformly supported. Therefore, it is possible to prevent the substrate 5 from sagging due to its own weight when the substrate 5 is processed. The upper ends 4 of the first and second support pins 166 and 173 of the support substrate 50 are contacted and formed in a circular shape to be in point contact with the substrate 5. As a result, since the lower surface of the substrate % is completely exposed as in the above, the substrate 50 can be processed more uniformly. As shown in Fig. 2, the dishes 15 are supported by the horizontal support bars 14A by the two containers 150a and 150b having different sizes depending on the size of the substrate 50. Further, the horizontal support bar 140 is provided with a plurality of stoppers 143 for preventing the dish 15 from sliding along the lateral support bars 140 on the lateral support bars 140 (see Fig. 6). The brake 143 is disposed on the lateral support rod 14A on the front side of the chamber 〇a to be in point contact with the arc-shaped support piece 163. One substrate 50 can be supported by one dish 150. As shown in Fig. 2, one substrate 50 can be supported by a plurality of dishes 150a and 150b. Therefore, it is needless to say that the number of the brakes 143 is set corresponding to the number of the arc-shaped supporting pieces 163 provided in the main shaft 161 of the dish 201243984. The connecting rod 171 and the main rod 161 form a substantially right angle, and the pair of main rods 161 are integrally coupled to each other. The connecting rod 171 is preferably disposed to be placed below the main rod 161 to be joined. Therefore, the connecting rod 171 is provided between the pair of main rods 161 and disposed on the lower side of the main rod 161, and the horizontal rod 17 la provided with the second supporting pin 173 is formed on the upper side from the both ends of the horizontal rod πia Bending, and respectively coupled to the coupling rod 171b of the main rod 161. It is needless to say that the coupling rod 17lb can be constructed in a plurality of times from the horizontal rod 171a. When the connecting rod 171 is disposed lower than the main rod 161, when the substrate 50 is mounted on the first and second support pins 166 and 173, the substrate 50 can be processed, and a sufficient interval can be formed between the substrate 50 and the connecting rod 171. The processing gas for the substrate that is placed when the substrate 50 is processed can flow smoothly. The connecting rods 171 may have different intervals from each other. When the connecting rods 171 are arranged at mutually different intervals, the second supporting pins 173 provided at the connecting rods 171 having mutually different intervals can be formed in a plurality of times of bending. In detail, the intermediate portion of the second support pin 173 (see FIG. 7) is formed with a curved line 173a, and each of the imaginary straight lines LI and L2 passing through the center of the longitudinal direction of the upper side portion and the lower side portion of the second support pin 173 is formed. parallel. In other words, since the upper portion is located on the outer side of the lower side portion of the second support pin 173 of the connecting rod 171, the upper side portion of the second support pin 173 is spaced apart from the upper side portion to support the substrate 5A. When the interval between the connecting rods 171 is not constant, the second supporting pins 3 provided on the connecting rod 171 have a predetermined interval and can uniformly support the entire surface of the substrate 50. 11 201243984 The lower portion of the second support pin 173 is rounded, and when the second support pin i73 is rotatable, the second branch pin 173 is rotated, and the portion of the support base substrate % (see Fig. 1) is suspended. On the end side of the main rod 161 of the dish 150, a third support pin 167 which is in contact with the side surface of the substrate Deng to prevent the substrate 50 from sliding on the first and second support pins 166 and 173 is provided. When the single substrate 150 is used and the substrate 50 is supported, the third support pins 167 are respectively provided on the both end sides of the pair of main rods 161. However, as shown in Fig. 2, when two substrates 150a' 150b are used to support one substrate 5, only one of the main rods 161 and the other of the ones 150a are separated from each other. The main support rod 161 of any of 15〇b is provided with a third support pin 167. Further, on both end sides of the main rod 161, locking hooks 169 for inserting a locking arm into a robot arm (not shown) are provided. When the arm of the aforementioned robot is inserted into the locking hook 169 to raise and lower the locking hook 169, the holder 15 is lifted and lowered. When the arm of the robot is locked to the locking hook 169, the height and position of the locking hook 169 can be appropriately adjusted so that the arm of the robot does not interfere with the first supporting pin 166. Fig. 8 is a view showing the state of use of an embodiment of the present invention, and Fig. 8 is explained. As shown, the loner 150 can be used according to the size of the substrate 50, and the width of the dish 150a and the width of the dish 150b can be used. At this time, the main rod 161 of the mutually adjacent dish 150a and the main rod 161 of the dish 150b are not provided with the third support pin 167, and the main rod 161 and the dish 150b of the container 150a are separated from each other. The main rod 161 is provided with a third support pin 167, respectively. 12 201243984 The device for supporting a substrate and the supporting unit using the same according to the present embodiment support the substrate 50 by uniformly supporting the entire surface of the substrate 50 by the plurality of first and second support pins 166 and 173 At the time, the substrate 50 hangs down due to its own weight. Fig. 9 is a perspective view showing a blood apparatus according to another embodiment of the present invention, and Fig. 9 is explained. As shown in the figure, in the dish 250 according to another embodiment of the present invention, the lower side of the first support pin 266 and the lower side of the second support pin 273 are detachably coupled to the main rod 261 and the connecting rod 271, respectively. Therefore, the first coupling groove 261a and the second coupling groove 271a for inserting and removing the first support pin 266 and the second support pin 273 are formed in the main rod 261 and the connecting rod 271, respectively. Since the first and second support pins 266 and 273 are detachable, the first and second support pins 266 and 273 can be placed on the processing substrate 50 in a concentrated manner, and the substrate 50 can be suspended by the weight of the substrate 50. Thus, the deformation of the substrate 50 can be more completely prevented. It is needless to say that the shapes of the lower side of the first and second support pins 266 and 273 and the shapes of the first and second coupling grooves 261a and 271a correspond to each other. Fig. 10 and Fig. 11 are views showing various shapes of the first support pins according to another embodiment of the present invention, and the first and eleventh drawings will be described. Fig. 10 shows that the cross-sectional shape of the lower side of the first support pin 366 is elliptical, and Fig. 11 shows that the cross-sectional shape of the lower side of the first support pin 466 is angular. In this case, the shape of the first coupling grooves 361a and 461a for inserting and detaching the first support pins 366 and 466 should correspond to the shape of the first support pins 366 and 466, and it is not necessary to say that it is 0 13 201243984, and is illustrated in FIG. The shape of the second support pin 273 and the second coupling groove 271a may be formed such that the cross-sectional shape corresponding to each other is elliptical or the cross-sectional shape is angular. When the shapes of the first support pins 166, 266, 366, and 466 are different from each other, and the shapes of the second support pins 173 and 273 are different from each other, the combination position of the first support pins 166, 266, 366, and 466 and the second position can be displayed. The function of supporting the combined positions of the pins 173, 273. The above description of the embodiments of the present invention is omitted from the detailed description of the technical idea of the present invention. Further, the above-described embodiments are not intended to limit the technical idea of the present invention, and are merely a reference for understanding the technical matters contained in the scope of the patent application of the present invention. BRIEF DESCRIPTION OF THE DRAWINGS Fig. 1 is a perspective view showing a substrate processing apparatus provided with a supporting unit for supporting a substrate according to an embodiment of the present invention. Fig. 2 is an enlarged view of the supporting unit shown in Fig. 1. Figure 3 is an enlarged view of the abutment shown in Figure 2. Figure 4 is an enlarged view of the section of Figure 3. Figure 5 is an enlarged view of the dish shown in Figure 2. Fig. 6 is an enlarged view of a portion "a" of Fig. 2. An enlarged view of the portion "c" of Fig. 5 of Fig. 7. Fig. 8 is a view showing a state of use of the dish according to the embodiment of the present invention. Figure 9 is a perspective view of a dish according to another embodiment of the present invention. Fig. 10 is a view showing the shape of the 201243984 type of the first support pin according to another embodiment of the present invention. Fig. 11 is a view showing a plurality of shapes of a first support pin according to another embodiment of the present invention. [Major component symbol description] 50.. substrate 100.. substrate processing device 110.. body 110a... chamber 113... door 120.. support unit 130.. .. support table 135.. support rib 135a... mounting groove 135b... locking groove 140.. transverse support rod 141.. locking ring 143.. brake 150, 150a, 150b, 250···Table 161,261··. Main rod 163.. Arc-shaped support piece 164.. Linear support piece 166, 266, 366, 466... 1st building lock 167... 3rd support pin 169 . . . locking hooks 171, 271... connecting rod 171a... horizontal rod 171b... coupling rod 173, 273... second supporting pin 173a... bending 261a, 361a, 461a... 1 joint groove 271a... second joint groove LI, L2... straight line A, B, C··· part 15