TW201241561A - Photosensitive resin composition, and color filter and liquid crystal display device made by using the composition - Google Patents
Photosensitive resin composition, and color filter and liquid crystal display device made by using the composition Download PDFInfo
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201241561 六、發明說明： 【發明所屬之技術領域】 本發明是有關於-種感光性樹脂組成物及使用其之彩 色滤光片與液晶顯示裝置，特別是指一種於微影製程中具 極佳顯影性的感光性樹脂組成物、其畫素著色層是由該感 光性樹脂組成物所形成且具極佳耐職性的彩色遽光片， 以及使用該彩色遽光片且無泡狀顯示缺陷的液晶顯示裝 置。 【先前技術】 隨著彩色遽光片已被廣泛地應用在彩色液晶顯示器、 彩色傳真機、彩色攝影機等應用領域，彩色遽光片的製作 技術f相當多樣化，如染色法、印刷法、電㈣、顏❹ 散法專，其中以顏料分散法為當下主流。 所謂以顏料分散法來製作彩色渡光片，通常是先在— 玻璃基板上’以金屬鉻/氧化鉻等金屬或感光性樹脂形成 一遮光用的黑色矩陣（blaek matrix)，再將分散有紅色顏料的 感光性樹脂(或稱彩色光阻劑)塗布在該玻璃基板上，隨後進 行光罩曝光、顯影固化等處理，以形成紅色子晝素，重覆 同樣步驟以陸續在該玻璃基板上形成綠色子晝素、藍色子 =1述紅色子畫素、綠色子畫素與藍色子晝素是被該 陣所隔開’至此即在該玻璃基板上形成一晝素著色 層，視需求可先在該晝素著色層上形成-保護膜，接著在 該保護膜上形成—透明導電臈，最後進行 該彩色濾光片之製作。 便“成 201241561 在上述顏料分散法的製程中，該感光性樹脂一般是由 顏料、驗可溶性樹脂、多官能性單體、光起始劑及溶劑所 組成，如日本專利第特公平6_95211號案、日本專利第特開 平8.819號案’與日本專利第特開平仙㈣號案所揭 示，所使用之該驗可溶性樹脂常見是以（甲基）丙稀酸為單體 成分所聚合成的共聚物。 不過’為了追求彩色攄光片之製程簡化與高透光率， 將所述保能省略已為業界所普遍使料手段。但伴隨而 來的問題是，由於所述保護膜的省略，在後續透明導電臈 的歲鑛成形過私中’該畫素著色層勢必會因無法直接承受 減鍍過程的強力電子束，而產生裂解現象。 為了改善上述問題，如日本專利第特開2〇必287352號 :斤a戶斤使用之感光性樹脂組成物中的驗可溶性樹脂成 伤，疋由含芳香族衍生物之不飽和單體聚合而成，藉以能 增加以遠感光性樹脂組成物形成一彩色濾光片之晝素著色 光，蝕刻、耐濺鍍…等性能，但縱使如此’利用該感 先= 曰組成物所製成的彩色渡光片’在用以製造液晶顯 不裝置時，卻會產生泡狀顯示缺陷的問題。 【發明内容】 本發明之目的，即在提供一種於微影製程中聚 士 ^’員〜丨生的感光性樹脂組成物、一種具有一由該感光性 樹月曰組成物所形成且具極佳耐濺鍍性之畫素著色層的彩色 、 及—種使用該彩色濾光片且無泡狀顯示缺陷的 液晶顯示裝置。 201241561 於是’本發明之感光性樹脂組成物，包含一鹼可溶性 樹脂、一含乙烯性不飽和基的化合物、一光起始劑、一有 機溶劑，以及一顏料。該鹼可溶性樹脂包括一第一鹼可溶 性樹脂，該第一鹼可溶性樹脂是一具有一含羧酸基之第一 不飽和單體、一含芳香環結構之第二不飽和單體，以及一 含脂環結構之第三不飽和單體的混合物的聚合反應產物， 該第二不飽和單體與該第三不飽和單體的重量比值介於 0.01〜0.40之間。 本發明之彩色渡光片，包含一由該感光性樹脂組成物 經微影處理後所形成的畫素著色層。 本發明之液晶顯示裝置，包含該彩色濾光片。 本發明之功效在於，該感光性樹脂組成物是將該第一 不飽和單體、該第二不飽和單體與該第三不飽和單體混合 得之該混合物，進而共聚合成該第一鹼可溶性樹脂，基於 該混合物100重量份，該第二不飽和單體與該第三不飽和 單體的重量比值介於0.01〜0.40之間。藉以，讓該感光性 樹脂組成物於微影製程中，會有較佳的顯影性，讓使用該 感光性樹脂組成物以形成該畫素著色層之彩色遽光片，其 晝素著色層能具有極佳财濺鍵性，進一步地，讓使用該彩 色;慮光片所製成之液aa顯示裝置，完全無泡狀顯示缺陷。 【實施方式】 首要說明的是，在本文中’該（曱基）丙烯酸酯〔 (meth)acrylate〕表示丙烯酸酯（acrylate)及/或甲基丙烯酸 酯（methacrylate)，而（曱基）丙烯酸s旨基〔（meth)acryl〇xy〕 201241561 又被稱為（曱基）丙烯醯氧基。 •本發明之感光性樹脂組成物，包含一鹼可溶性樹脂、 一含乙烯性不飽和基的化合物、一光起始劑、一有機溶 劑，以及一顏料。 / 其中，該鹼可溶性樹脂包括一第一鹼可溶性樹脂，該 第一鹼可溶性樹脂是一具有一含羧酸基之第一不飽和單 體 3芳香環結構之第二不飽和單體，以及一含脂環結 構之第三不飽和單體的混合物的聚合反應產物該第二不 飽和早體與該第三不飽和單體的重量比值介於〇 〇 1〜〇钓 之間σ 若該第二不飽和單體與該第三不飽和單體的重量比值 J、於0.01，該感光性樹脂組成物經曝光、顯影製程時，會 有顯影性差的問題，若該第二不飽和單體與該第三不飽和 單體的重量比值大力0.40,該液晶顯示裝置則會有泡狀顯 示缺fe問題。杈佳地，該第二不飽和單體與該第三不飽和 單體的重量比值介於0.01〜0 35之間H也，該第二不 飽和單體與該第三不飽和單體的重量比值介於〇 〇 1〜〇川 之間。 如此一來，在使用該感光性樹脂組成物製造本發明之 彩色濾光片的過程中，該感光性樹脂組成物在經曝光、顯 影製程時，會有較佳的顯影性，且該感光性樹脂組成物在 經由微影製程後，可形成一具有極佳耐濺鍍性的畫素著色 層，更進一步地，在使用該彩色濾光片製造出本發明之液 晶顯示裝置時，能使該液晶顯示裝置完全無泡狀顯示缺 201241561 陷。 所谓該第一不飽和單體是選自於丙烯酸、甲基丙烯 酸、2-甲基丙烯醯乙氧基丁二酸酯、丁烯酸、氣丙烯 酸、乙基丙烯酸、肉桂酸、馬來酸、馬來酸酐、富馬酸、 衣康酸、衣康酸酐、擰康酸、檸康酸酐，或此等之—組 合。較佳地’該第一不飽和單體是選自於丙烯酸、甲基丙 烯酸、2-甲基丙烯醯乙氧基丁二酸酯，或此等之一組合。 以該混合物總重為100重量份計，該第一不飽和單體 的含量是介於20重量份〜60重量份之間，又以22重量份 〜58重量份為較佳，使得該感光性樹脂組成物在進行曝 光、顯影等微影製程時，會有較佳的顯影性。 所謂該第二不飽和單體是選自於苯乙烯、α -曱基苯乙 烯、乙烯基甲苯、對氯苯乙烯、二乙烯基苯、苯甲基曱基 丙烯酸酯、苯曱基丙烯酸酯、苯基曱基丙烯酸酯、苯基丙 稀酸醋、2 -石肖基苯基丙稀酸醋、4 -硝基苯基丙稀酸S旨、2 -硝 基苯甲基丙烯酸酯、2-硝基苯曱基曱基丙烯酸酯、2-硝基苯 基曱基丙烯酸酯、2-氣苯基甲基丙烯酸酯、4-氯苯基曱基丙 烯酸酯、2-氣苯基丙烯酸酯、4-氣苯基丙烯酸酯、苯氧基乙 基甲基丙烯酸酯、苯氧基聚乙二醇丙烯酸酯、苯氧基聚乙 二醇甲基丙烯酸酯、壬基苯氧基聚乙二醇丙烯酸酯、壬基 苯氧基聚乙二醇甲基丙烯酸酯、氮-苯基馬來醯亞胺、氮·鄰 -羥基苯基馬來醯亞胺、氮-間-羥基苯基馬來醯亞胺、氮_對_ 羥基苯基馬來醯亞胺、氮-鄰-曱基苯基馬來醯亞胺、氮_間_ 甲基苯基馬來醯亞胺、氮-對-甲基苯基馬來醯亞胺、氮-鄰- 201241561 曱氧基苯基馬來醯亞胺、氮-間-曱氧基苯基馬來醯亞胺、氮 -對-曱氧基苯基馬來醯亞胺、鄰-乙烯基笨酚、間-乙烯基笨 酚、對-乙烯基苯酚、2-甲基-4-乙烯基苯酚、3-甲基-4-乙烯 基苯酚、鄰-異丙烯基苯酚、間-異丙烯基苯酚、對-異丙烯 基苯酚、2-乙烯基-1-萘酚、3-乙烯基-1-萘酚、1-乙烯基-2-萘酚、3-乙烯基-2-萘酚' 2-異丙烯基-1-萘酚、3-異丙烯基_ 1-萘酚、鄰-曱氧基苯乙烯、間·曱氧基笨乙烯、對-甲氧基苯 乙烯、鄰-曱氧基曱基苯乙烯、間-甲氧基曱基苯乙烯、對-甲氧基曱基苯乙烯、鄰-(乙烯基苯甲基）環氧丙基醚、間-(乙 烯基苯甲基）環氧丙基醚、對-(乙烯基苯甲基）環氧丙基醚、 茚、乙酸基萘，或此等之一組合。其中，該第二不飽和單 體以苯乙烯、α -曱基苯乙烯、苯基甲基丙烯酸酯、苯基丙 稀酸酯、氮-苯基馬來醯亞胺、氮-鄰-經基笨基馬來酸亞 胺、氮-間-經基苯基馬來酿亞胺與氮-對-經基苯基馬來醯亞 胺等為較佳。 以該混合物總重為100重量份計，該第二不飽和單體 的含量是介於0.5重量份〜20重量份之間，較佳為0 8重量 份〜18重量份’可使該感光性樹脂組成物在經由微影製程 後，所形成的晝素著色層能呈現極佳耐濺鍍性。 該第三不飽和單體是選自於具雙環戊基基困 (dicyclopentanyl group)的不飽和化合物、具雙環戊烯基 團（dicyclopentenyl group)的不飽和化合物，或此等之一 組合。 具體來說’該第三不飽和單體可以是雙環戊基丙稀酸 201241561 酯、雙環戊基乙氧基丙烯酸酯、雙環戊烯基丙烯酸酯、雙 環戊烯基乙氧基丙烯酸酯、雙環戊基甲基丙烯酸酯、雙環 戊基乙氧基曱基丙烯酸酯、雙環戊烯基曱基丙烯酸酯、雙 環戊稀基乙氧基曱基丙烯酸s旨，或此等之一組合。 以該混合物總重100重量份計，該第三不飽和單體的 含量是介於20重量份〜50重量份之間，可使用以形成之該 彩色濾光片的晝素著色層具有極佳耐濺鍍性。 較佳地，該第二不飽和單體與該第三不飽和單體的含 量總合介於25重量份〜60重量份之間，能使用以形成之該 彩色濾光片的晝素著色層具有極佳的耐濺鍍性。 用以聚合反應生成該第一驗可溶性樹脂的該混合物， 還具有一第四不飽和單體。 所謂的該第四不飽和單體是選自於氮-環己基馬來醯亞 胺、丙烯酸曱酯、丙烯酸乙酯、丙烯酸正丙酯、丙稀酸異 丙酯、丙烯酸正丁酯、丙稀酸異丁酯、丙稀酸第二丁酷、 丙烯酸第三丁酯、丙烯酸2-羥基乙酯、丙烯酸2-羥基丙 酯、丙烯酸3-羥基丙酯、丙烯酸2-羥基丁酯、丙稀酸3-經 基丁酯 '丙烯酸4-羥基丁酯、丙烯酸烯丙酯、丙稀酸三乙 二醇甲氧酯、氮，氮-二曱基氨基丙烯酸乙酯、氮，氮-二乙基 氨基丙烯酸丙酯、氮，氮-二丁基氨基丙烯酸丙酯、丙烯酸環 氧丙基酯、甲基丙烯酸甲酯、甲基丙烯酸乙酯、曱基丙稀 酸正丙酯、甲基丙烯酸異丙酯、曱基丙烯酸正丁 g旨、曱基 丙烯酸異丁酯、曱基丙浠酸第二丁酯、曱基丙烯酸第三丁 酯、甲基丙烯酸2-經基乙酯、甲基丙烯酸2-經基丙酯、甲 10 201241561 基丙烯酸3-羥基丙酯、曱基丙烯酸2-羥基丁酯、曱基丙稀 酸3 -經基丁醋、曱基丙稀酸4 -經基丁醋 '曱基丙稀酸稀丙 醋、曱基丙稀酸三乙二醇曱氧醋、曱基丙稀酸十二垸基 酯、甲基丙稀酸十四院基酯、曱基丙稀酸十六烧基酯、甲 基丙烯酸十八烷基酯、甲基丙烯酸二十烷基酯、曱基丙稀 酸二十二院基酯、曱基丙稀酸氮，氮-二曱基氨基乙酯、氮，氮 -二甲基氨基曱基丙稀酸丙酯、氮-異-丁基氨基曱基丙稀酸 乙酯、曱基丙烯酸環氧丙基酯、乙酸乙烯酯、丙酸乙稀 6旨、丁酸乙稀酯、乙稀基曱醚、乙稀基乙驗、烯丙基環氧 丙基趟、曱代浠丙基環氧丙基轉（methallyl glyddyl ether)、丙烯腈、曱基丙烯腈、α-氣丙烯腈、氰化亞乙稀、 丙烯醯胺、曱基丙烯醯胺、α_氣丙烯醯胺、氮_羥乙基丙烯 醯胺、氮-羥乙基曱基丙烯醯胺、1,3-丁二烯、異戊烯 '氣 化丁二烯’或此等之一組合，其中又以丙烯酸曱酯、丙烯 酸乙醋、丙烯酸正丙酯、丙烯酸異丙酯、丙烯酸正丁酯、 丙烯酸異丁酯、丙烯酸第二丁酯、丙烯酸第三丁酯、丙烯 酸2-羥基乙酯' 丙烯酸2_羥基丙酯、曱基丙烯酸曱酯、甲 基丙稀酸乙酯、甲基丙烯酸正丙酯、曱基丙烯酸異丙酯、 甲基丙烯酸正丁酯、甲基丙烯酸異丁酯、甲基丙烯酸第二 丁酯、甲基丙烯酸第三丁酯、曱基丙烯酸2_羥基乙酯、甲 基丙稀酸2-經基丙酯、甲基丙烯酸環氧丙基酯、乙酸乙稀 酉曰、丙烯腈、甲基丙烯腈、丨,3_丁二烯、異戊烯為較佳。 以該混合物總重為100重量份計，該第四不飽和單體 的含置是介於〇重量份〜15重量份之間，又以〇重量份〜 11 201241561 12重量份為較佳，會使該感光性樹脂組成物之顯影性車交 好。以該鹼可溶性樹脂總重為100重量份計’該第一驗可 溶性樹脂的含量是介於30重量份〜90重量份之間，較佳為 35重量份〜85重量份，能讓該液晶顯示裝置完全無泡狀顯 示缺陷。 該鹼可溶性樹脂還包括一第二驗可溶性樹脂，該第二 鹼可溶性樹脂包括一具有式（1)結構的單體：201241561 VI. Description of the Invention: Technical Field of the Invention The present invention relates to a photosensitive resin composition, a color filter and a liquid crystal display device using the same, and particularly to an excellent lithography process. The developable photosensitive resin composition, the pixel colored layer thereof is a color calender sheet formed of the photosensitive resin composition and having excellent workability, and the use of the color calender sheet without bubble display defects Liquid crystal display device. [Prior Art] With the application of color calenders in color liquid crystal displays, color facsimile machines, color cameras, etc., the production techniques of color calenders are quite diverse, such as dyeing, printing, and electricity. (4), Yan Yan Disperse law, which uses the pigment dispersion method as the current mainstream. In the case of producing a color light-transmitting sheet by a pigment dispersion method, a black matrix (blaek matrix) for light-shielding is formed on a glass substrate by a metal such as metal chromium/chromium oxide or a photosensitive resin, and then a red matrix is dispersed. A photosensitive resin (or a color photoresist) of the pigment is coated on the glass substrate, followed by photomask exposure, development curing, and the like to form a red meringin, and repeating the same steps to form on the glass substrate one after another. Green scorpion, blue sub =1, red sub-pixel, green sub-pixel and blue scorpion are separated by the array', thus forming a halogen-colored layer on the glass substrate, as needed A protective film may be formed on the halogen colored layer, and then a transparent conductive conductive layer is formed on the protective film, and finally the color filter is produced. In the process of the above pigment dispersion method, the photosensitive resin is generally composed of a pigment, a soluble resin, a polyfunctional monomer, a photoinitiator and a solvent, such as the Japanese Patent No. 6_95211. Japanese Patent Laid-Open No. 8.819, and Japanese Patent No. JP-A-Ping (4), disclose that the soluble resin used is a copolymer obtained by polymerizing (meth)acrylic acid as a monomer component. However, in order to pursue the simplification of the process and the high transmittance of the color grading sheet, the omitting of the energy-saving has been widely used in the industry. However, the problem is that due to the omission of the protective film, The subsequent transparent conductive iridium is formed in the private sector. The coloring layer of the pixel is bound to be cracked due to the inability to directly withstand the strong electron beam of the deplating process. In order to improve the above problems, such as the Japanese Patent Special Open 2 No. 287,352: The photosensitive resin composition used in the kilogram of the household is damaged by the test of the soluble resin, and the hydrazine is polymerized from the unsaturated monomer containing the aromatic derivative, thereby increasing the sense of distance. The photoreceptor composition forms a color filter such as halogen colored light, etching, sputtering resistance, etc., but even if the color of the composition is used first, the color of the composition is used. When a liquid crystal display device is manufactured, there is a problem that a bubble-like display defect occurs. SUMMARY OF THE INVENTION An object of the present invention is to provide a photosensitive resin composition which is a member of a lithography process. A liquid crystal display device having a pixel coloring layer formed of the photosensitive tree composition and having excellent sputter resistance, and a liquid crystal display device using the color filter and having no bubble display defects. 201241561 Thus, the photosensitive resin composition of the present invention comprises an alkali-soluble resin, a compound containing an ethylenically unsaturated group, a photoinitiator, an organic solvent, and a pigment. The alkali-soluble resin includes a first An alkali-soluble resin, the first alkali-soluble resin having a first unsaturated monomer having a carboxylic acid group, a second unsaturated monomer having an aromatic ring structure, and a third non-alicyclic structure The polymerization product of the mixture of the monomer, the weight ratio of the second unsaturated monomer to the third unsaturated monomer is between 0.01 and 0.40. The color light-emitting sheet of the present invention comprises a photosensitive property The pixel coloring layer formed by the lithographic treatment of the resin composition. The liquid crystal display device of the present invention comprises the color filter. The effect of the present invention is that the photosensitive resin composition is the first unsaturated single sheet. a mixture of the second unsaturated monomer and the third unsaturated monomer, and further copolymerizing the first alkali-soluble resin, and based on 100 parts by weight of the mixture, the second unsaturated monomer and the first The weight ratio of the triunsaturated monomer is between 0.01 and 0.40. Therefore, the photosensitive resin composition has better developability in the lithography process, and the photosensitive resin composition is used to form the photosensitive resin composition. The color grading sheet of the pixel coloring layer, the enamel coloring layer can have excellent splattering property, and further, the color is used; the liquid aa display device made of the light absorbing sheet has a completely bubble-free display defect. . [Embodiment] Firstly, in the present description, 'meth"acrylate means acrylate and/or methacrylate, and (mercapto)acrylic acid s The base [(meth)acryl〇xy] 201241561 is also known as (fluorenyl) propylene oxime. The photosensitive resin composition of the present invention comprises an alkali-soluble resin, a compound containing an ethylenically unsaturated group, a photoinitiator, an organic solvent, and a pigment. Wherein the alkali-soluble resin comprises a first alkali-soluble resin, the first alkali-soluble resin is a second unsaturated monomer having a first unsaturated monomer having a carboxylic acid group, 3 aromatic ring structure, and Polymerization reaction product of a mixture of a third unsaturated monomer having an alicyclic structure, the weight ratio of the second unsaturated precursor to the third unsaturated monomer is between 〇〇1 and 〇, if the second The weight ratio J of the unsaturated monomer to the third unsaturated monomer is 0.01, and the photosensitive resin composition has a problem of poor developability upon exposure and development processes, if the second unsaturated monomer and the second unsaturated monomer The weight ratio of the third unsaturated monomer is vigorously 0.40, and the liquid crystal display device has a bubble-like display defect. Preferably, the weight ratio of the second unsaturated monomer to the third unsaturated monomer is between 0.01 and 0 35, and the weight of the second unsaturated monomer and the third unsaturated monomer. The ratio is between 〇〇1~〇川. In this way, in the process of producing the color filter of the present invention using the photosensitive resin composition, the photosensitive resin composition has better developability upon exposure and development processes, and the photosensitivity The resin composition can form a pixel coloring layer having excellent sputter resistance after the lithography process, and further, when the color filter is used to manufacture the liquid crystal display device of the present invention, The liquid crystal display device has no bubble-like display and lacks 201241561. The first unsaturated monomer is selected from the group consisting of acrylic acid, methacrylic acid, 2-methylpropenyl ethoxy succinate, crotonic acid, gaseous acrylic acid, ethacrylic acid, cinnamic acid, maleic acid, Maleic anhydride, fumaric acid, itaconic acid, itaconic anhydride, tumconic acid, citraconic anhydride, or a combination thereof. Preferably, the first unsaturated monomer is selected from the group consisting of acrylic acid, methacrylic acid, 2-methylpropenyl ethoxy succinate, or a combination thereof. The content of the first unsaturated monomer is between 20 parts by weight and 60 parts by weight, and preferably 22 parts by weight to 58 parts by weight, based on 100 parts by weight of the total weight of the mixture, so that the photosensitive property is obtained. The resin composition has better developability when subjected to a photolithography process such as exposure or development. The second unsaturated monomer is selected from the group consisting of styrene, α-mercaptostyrene, vinyl toluene, p-chlorostyrene, divinylbenzene, benzylidene acrylate, benzoyl acrylate, Phenylmercapto acrylate, phenyl acrylate vinegar, 2-cytyl phenyl acrylate vinegar, 4-nitrophenyl acrylate acid, 2-nitrophenyl methacrylate, 2-nitro Benzoyl methacrylate, 2-nitrophenyl methacrylate, 2-phenyl phenyl methacrylate, 4-chlorophenyl methacrylate, 2-phenyl phenyl acrylate, 4-gas Phenyl acrylate, phenoxyethyl methacrylate, phenoxy polyethylene glycol acrylate, phenoxy polyethylene glycol methacrylate, nonyl phenoxy polyethylene glycol acrylate, hydrazine Phenoxy ethoxy polyethylene glycol methacrylate, nitrogen-phenyl maleimide, nitrogen o-hydroxyphenyl maleimide, nitrogen-m-hydroxyphenyl maleimide, nitrogen _p-hydroxyphenylmaleimide, nitrogen-o-nonylphenylmaleimide, nitrogen_m-methylphenylmaleimide, nitrogen-p-methylphenylmalay Yttrium, nitrogen-o- 201241561 曱oxyphenylmaleimide, nitrogen-m-methoxy phenyl maleimide, nitrogen-p-methoxy phenyl maleimide, o-vinyl phenol, inter-, -vinyl phenol, p-vinyl phenol, 2-methyl-4-vinyl phenol, 3-methyl-4-vinyl phenol, o-isopropenyl phenol, m-isopropenyl phenol, p- Isopropenylphenol, 2-vinyl-1-naphthol, 3-vinyl-1-naphthol, 1-vinyl-2-naphthol, 3-vinyl-2-naphthol' 2-isopropenyl -1-naphthol, 3-isopropenyl-1-naphthol, o-nonyloxystyrene, m-decyloxy bromide, p-methoxystyrene, o-nonyloxydecyl styrene , m-methoxydecyl styrene, p-methoxydecyl styrene, o-(vinylbenzyl) epoxypropyl ether, m-(vinylbenzyl)epoxypropyl ether , p-(vinylbenzyl)epoxypropyl ether, hydrazine, acetoxynaphthalene, or a combination thereof. Wherein, the second unsaturated monomer is styrene, α-mercaptostyrene, phenyl methacrylate, phenyl acrylate, nitrogen-phenyl maleimide, nitrogen-o-ruthenyl Peptidyl maleimide, nitrogen-m-phenylphenylmaleimide and nitrogen-p-p-phenylphenylmaleimide are preferred. The content of the second unsaturated monomer is from 0.5 part by weight to 20 parts by weight, preferably from 80 parts by weight to 18 parts by weight, based on 100 parts by weight of the total weight of the mixture. After the resin composition is subjected to the lithography process, the formed halogen-colored layer can exhibit excellent sputter resistance. The third unsaturated monomer is an unsaturated compound selected from the group consisting of a dicyclopentanyl group, an unsaturated compound having a dicyclopentenyl group, or a combination thereof. Specifically, the third unsaturated monomer may be dicyclopentylacrylic acid 201241561 ester, dicyclopentyl ethoxy acrylate, dicyclopentenyl acrylate, dicyclopentenyl ethoxy acrylate, dicyclopentane A methacrylate, a dicyclopentylethoxy decyl acrylate, a dicyclopentenyl decyl acrylate, a biscyclopentyl ethoxy methacrylate, or a combination thereof. The content of the third unsaturated monomer is between 20 parts by weight and 50 parts by weight based on 100 parts by weight of the total weight of the mixture, and the halogen colored layer which can be used to form the color filter has excellent Sputter resistance. Preferably, the total content of the second unsaturated monomer and the third unsaturated monomer is between 25 parts by weight and 60 parts by weight, and the halogen colored layer of the color filter can be formed. Excellent resistance to sputtering. The mixture used to polymerize to form the first soluble resin further has a fourth unsaturated monomer. The so-called fourth unsaturated monomer is selected from the group consisting of nitrogen-cyclohexylmaleimide, decyl acrylate, ethyl acrylate, n-propyl acrylate, isopropyl acrylate, n-butyl acrylate, propylene Isobutyl acrylate, butyl diacetate, tert-butyl acrylate, 2-hydroxyethyl acrylate, 2-hydroxypropyl acrylate, 3-hydroxypropyl acrylate, 2-hydroxybutyl acrylate, acrylic acid 3-butyl butyl acrylate ' 4-hydroxybutyl acrylate, allyl acrylate, triethylene glycol methoxy acrylate, nitrogen, nitrogen - di- hydroxyaminoethyl acrylate, nitrogen, nitrogen - diethylamino Propyl acrylate, nitrogen, nitro-dibutylamino propyl acrylate, glycidyl acrylate, methyl methacrylate, ethyl methacrylate, n-propyl decyl acrylate, isopropyl methacrylate , n-butyl methacrylate, isobutyl methacrylate, second butyl thioglycolate, tert-butyl methacrylate, 2-ethyl methacrylate, 2- methacrylate Propyl propyl ester, methyl 10 201241561 3-hydroxypropyl acrylate, 2-hydroxybutyl methacrylate, mercapto acrylate 3 - Butyl vinegar, mercapto acrylic acid 4 - butyl vinegar 'mercapto acrylic acid dilute vinegar, mercapto acrylic acid triethylene glycol oxime vinegar, mercapto acrylate didecyl methacrylate, A Benzoyl acid tetradecyl ester, mercaptopropyl hexadecanoate, octadecyl methacrylate, eicosyl methacrylate, decyl acrylate , mercapto-acrylic acid nitrogen, nitrogen-didecylaminoethyl ester, nitrogen, nitro-dimethylaminodecyl propyl acrylate, nitrogen-iso-butylaminomethyl propyl acrylate, sulfhydryl Epoxypropyl acrylate, vinyl acetate, ethylene propionate 6, ethyl butyrate, ethyl ether, ethyl acetate, allyl epoxypropyl hydrazine, hydrazine propyl Methallyl glyddyl ether, acrylonitrile, mercapto acrylonitrile, alpha-gas acrylonitrile, ethylene cyanide, acrylamide, mercapto acrylamide, alpha propylene amide, nitrogen _ a combination of hydroxyethyl acrylamide, nitrogen-hydroxyethyl decyl acrylamide, 1,3-butadiene, isoamylene 'gasified butadiene' or the like, wherein decyl acrylate, Ethyl acrylate, n-propyl acrylate Isopropyl acrylate, n-butyl acrylate, isobutyl acrylate, dibutyl acrylate, tert-butyl acrylate, 2-hydroxyethyl acrylate '2-hydroxypropyl acrylate, decyl methacrylate, methyl propyl Ethyl dilute acid, n-propyl methacrylate, isopropyl methacrylate, n-butyl methacrylate, isobutyl methacrylate, second butyl methacrylate, tert-butyl methacrylate, hydrazine 2-Hydroxyethyl acrylate, 2-propyl propyl methacrylate, glycidyl methacrylate, acetraacetate, acrylonitrile, methacrylonitrile, hydrazine, 3-butadiene Isopentene is preferred. The content of the fourth unsaturated monomer is between 〜1 part by weight and 15 parts by weight, based on the total weight of the mixture, and is preferably 11 重量 〜 11 201241561 12 parts by weight. The developable car of the photosensitive resin composition is delivered. The content of the first test soluble resin is between 30 parts by weight and 90 parts by weight, preferably 35 parts by weight to 85 parts by weight, based on the total weight of the alkali-soluble resin, and the liquid crystal display can be made. The device is completely blister-free to display defects. The alkali-soluble resin further comprises a second test soluble resin, the second alkali-soluble resin comprising a monomer having the structure of formula (1):
式（1)中，R1及R2分別表示氫原子、C|〜C5之直鏈或支鏈烧 基、苯基，或鹵素原子。 具有式（1)結構的該單體是由含有式（1)結構的化合物， 與其他可共聚合反應之化合物反應而得。 其中，所述含有式（1 )結構的化合物，可以是式（1 _ 1 )所 示含環氧基（epoxy)的雙酚芴（bisphenol fluorene)型化 合物，或式（卜2)所示含經基（hydroxy )的雙齡苟型化合 物。In the formula (1), R1 and R2 each independently represent a hydrogen atom, a linear or branched alkyl group of C| to C5, a phenyl group, or a halogen atom. The monomer having the structure of the formula (1) is obtained by reacting a compound having a structure of the formula (1) with another compound which can be copolymerized. Wherein the compound containing the structure of the formula (1) may be an epoxy group-containing bisphenol fluorene type compound represented by the formula (1 _1) or a formula (B) A double-aged compound of the hydroxy group.
式（M)中，R3與式（1)之R1相同，R4與式⑴之R2相同。 12 201241561In the formula (M), R3 is the same as R1 of the formula (1), and R4 is the same as R2 of the formula (1). 12 201241561
式（1-2)中，R5與式（1)之R1相同，R6與式（1)之R2相 同；R7及R8分別表示C,〜C2〇的伸烷基或伸脂環基；k、J 分別為1〜4之間的整數。 而所指其他可共聚合反應之化合物’可列舉如：丙稀 酸、曱基丙烯酸、丁烯酸、α -氣丙烯酸、乙基丙烯酸、肉 桂酸等不飽和一元羧酸類；馬來酸、衣康酸' 琥珀酸 '笨 二甲酸、四氫化苯二甲酸、六氫化苯二曱酸、甲基四氫化 苯二曱酸、曱基六氫化苯二甲酸、甲基橋亞甲基四氫化笨 二甲酸（methyl endo-methylene tetrahydro phthalic acid )、 氣茵酸（chlorendic acid)、戊二酸…等二元緩酸類及其酸 無水物；1，2,4-苯三甲酸（trimellitic acid)等三元竣酸類及 其酸無水物；以及1,2,4,5-笨四曱酸（pyromellitic acid )、 二苯甲酮四缓酸（benzophenone tetracarboxylic acid)、雙 苯四缓酸（biphenyl tetracarboxylic acid )、雙苯醚四叛酸 (biphenylether tetracarboxylic acid )等四元缓酸類及其酸 無水物。 更具體地’該第二鹼可溶性樹脂為新日鐵化學製，品 名為V259ME、V301ME等產品。 以該鹼可溶性樹脂總重為100重量份計，該第二鹼可 溶性樹脂的含量是介於1〇重量份〜70重量份之間，較佳為 15〜65重量份’能讓該液晶顯示裝置較無泡狀顯示缺陷。 13 201241561 該含乙稀性不飽和基的化合物是選自於一第一化合 物、一第二化合物，或此等之一組合。 該第一化合物是由經己内酯改質之多元醇與（曱基）丙烯 酸反應而得的（曱基）丙烯酸酯系化合物。 該經己内酯改質之多元醇是由該己内酯與具有4個官 能基以上之多元醇反應而製得，其中，該己内酯可以是γ_ 己内酯、δ-己内酯，或ε-己内酯，且以ε_己内酯為佳。該具 有4個g能基以上之多元醇可以是季戊四醇、二三經曱基 丙烷、二季戊四醇…等。較佳地，以該具有4個官能基以上 之多元醇的含量為1莫耳計，該己内酯的含量範圍為丨〜12 莫耳。 該第一化合物的具體例如：季戊四醇己内酯改質之四 (甲基）丙烯酸酯類化合物、二三羥甲基丙烷己内酯改質之四 (甲基）丙烯酸酯類化合物、二季戊四醇己内酯改質之多（曱 基）丙烯酸酯類化合物··等，其中，該二季戊四醇己内酯改質 之多（甲基）丙烯酸酯類化合物可以是二季戊四醇己内酯改質 之一（甲基）丙烯酸醋類化合物、二季戊四醇己内醋改質之三 (甲基）丙稀酸自旨類化合物、二季戊四醇己内g旨改質之四（甲 基）丙烯酸酯類化合物、二季戊四醇己内酯改質之五（曱基） 丙烯酸酯類化合物、二季戊四醇己内酯改質之六（甲基）丙烯 酸酯類化合物等。 進一步地’上述二季戊四醇己内酯改質之多（曱基）丙烯 酸酯類的結構可以式P)表示·· 14 201241561 -oh2c ch2o— A -oh2c ch2o-ch2\ /Ch2o-—oh2cx xch2o- u -c— CH2CH2CH2CH2CH2-〇.In the formula (1-2), R5 is the same as R1 of the formula (1), R6 is the same as R2 of the formula (1); and R7 and R8 each represent an alkyl or alicyclic group of C, ~C2?; J is an integer between 1 and 4, respectively. The other compounds which can be copolymerized may be exemplified by unsaturated monocarboxylic acids such as acrylic acid, mercaptoacrylic acid, crotonic acid, α-gas acrylic acid, ethacrylic acid, and cinnamic acid; maleic acid and clothing; Kang acid 'succinic acid' stearic dicarboxylic acid, tetrahydrophthalic acid, hexahydrophthalic acid, methyl tetrahydrophthalic acid, mercapto hexahydrophthalic acid, methyl bridged methylene tetrahydrogen Methyl endo-methylene tetrahydro phthalic acid, chlorendic acid, glutaric acid, etc., and their acid anhydride; 1,2,4-benzenetricarboxylic acid (trimellitic acid) Tannins and their acid anhydrides; and 1,2,4,5-pyromellitic acid, benzophenone tetracarboxylic acid, biphenyl tetracarboxylic acid, A tetrabasic acid such as biphenylether tetracarboxylic acid and an acid anhydride thereof. More specifically, the second alkali-soluble resin is manufactured by Nippon Steel Chemical Co., Ltd. under the names of V259ME, V301ME, and the like. The content of the second alkali-soluble resin is between 1 part by weight and 70 parts by weight, preferably 15 to 65 parts by weight, based on 100 parts by weight of the total weight of the alkali-soluble resin. Less blister-like display defects. 13 201241561 The ethylenically unsaturated group-containing compound is selected from a first compound, a second compound, or a combination thereof. The first compound is a (mercapto) acrylate-based compound obtained by reacting a caprolactone-modified polyol with (mercapto)acrylic acid. The caprolactone-modified polyol is obtained by reacting the caprolactone with a polyol having four or more functional groups, wherein the caprolactone may be γ-caprolactone or δ-caprolactone. Or ε-caprolactone, and preferably ε-caprolactone. The polyol having four g groups or more may be pentaerythritol, ditrimethylpyridyl propane, dipentaerythritol or the like. Preferably, the content of the caprolactone is in the range of 1 to 20 moles based on the content of the polyol having 4 functional groups or more. Specific examples of the first compound include: pentaerythritol caprolactone modified tetra(meth)acrylate compound, ditrimethylolpropane caprolactone modified tetra(meth)acrylate compound, dipentaerythritol The lactone is modified by a poly(indenyl) acrylate compound, etc., wherein the poly(meth) acrylate compound modified by the dipentaerythritol caprolactone may be one of the modifications of dipentaerythritol caprolactone ( Methyl)acrylic acid vinegar compound, dipentaerythritol caprolactone modified tris(meth)acrylic acid self-cultivating compound, dipentaerythritol, g-modified tetra(meth)acrylate compound, dipentaerythritol The caprolactone modified pentadyl (meth) acrylate compound, dipentaerythritol caprolactone modified hexa (meth) acrylate compound, and the like. Further, the structure of the poly(indenyl) acrylate modified by the above dipentaerythritol caprolactone can be represented by the formula P). 14 201241561 -oh2c ch2o- A -oh2c ch2o-ch2\ /Ch2o--oh2cx xch2o-u -c- CH2CH2CH2CH2CH2-〇.
RIO -C-C=CH2 \ O 'b 舞ch2 式(2) 式（2)中，RlRl。分別表示氫或甲基；〜2的整數· a為1〜6的整數，b為0〜5的整數，其中H2〜6， 較佳為a+b=3〜6,更佳為a+b=5〜6,最佳為3+卜RIO -C-C=CH2 \ O 'b Dance ch2 Equation (2) In equation (2), RlRl. Respectively represent hydrogen or methyl; integers of 〜2, a is an integer from 1 to 6, and b is an integer from 0 to 5, wherein H2~6, preferably a+b=3~6, more preferably a+b =5~6, the best is 3+
更具體地’該第-化合物為日本化藥株式會社製，品 名 kAYARAD®DPCA_20 ' DPCA 3〇、DpCA 6〇 DpcA 120···等產品。 該第二化合物具有如式（3)所示的官能基。 R" —c—c=ch2 0 式⑶ 式（3)中，R11分別表示氫或甲基。 該第二化合物可列舉如：丙烯醯胺、（曱基）丙烯醯嗎 啉、（甲基）丙烯酸-7-氨基-3,7-二甲基辛酯、異丁氧基曱基 (甲基）丙烯醯胺、（甲基）丙烯酸異冰片基氧乙酯、（甲基）丙 烯酸異冰片酯、（曱基）丙烯酸-2-乙基己酯、乙基二甘醇（曱 基）丙稀酸酯、第三辛基（曱基）丙烯醯胺、二丙酮（甲基）丙稀 醯胺、（甲基）丙烯酸二曱氨基酯、（甲基）丙烯酸十二烷基 酯、（曱基）丙烯酸二環戊烯氧乙酯、（曱基）丙烯酸二環戊烯 15 201241561 酯、氮，氮-二曱基（甲基）丙烯醯胺、（甲基）丙烯酸四氣苯 酯、（曱基）丙烯酸-2-四氣苯氧基乙酯、（甲基）丙烯酸四氫糠 酯、（甲基）丙烯酸四溴苯酯、（甲基）丙烯酸-2-四溴苯氧基乙 酯、（甲基）丙烯酸-2-三氣苯氧基乙酯、（甲基）丙烯酸三溴苯 酯、（曱基）丙烯酸-2-三溴苯氧基乙酯、（曱基）丙烯酸-2-羥乙 酯、（甲基）丙烯酸-2-經丙酯、乙烯基己内醯胺、氮-乙稀基 皮酪烷酮、（曱基）丙烯酸苯氧基乙酯、（曱基）丙烯酸五氣苯 酯、（曱基）丙浠酸五溴苯酯、聚單（曱基）丙烯酸乙二醇酯、 聚單（甲基）丙烯酸丙二醇酯 '(甲基）丙烯酸冰片酯、乙二醇 二（甲基）丙烯酸酯、二（甲基）丙烯酸二環戊烯酯、三甘醇二 丙烯酸酯、四甘醇二（曱基）丙烯酸酯、三（2-羥乙基）異氰酸 酯二（甲基）丙烯酸酯、三（2-羥乙基）異氰酸酯三（甲基）丙稀 酸酯、己内酯改質之三（2-羥乙基）異氰酸酯三（曱基）丙烯酸 醋、三（曱基）丙烯酸三羥曱基丙酯、環氧乙烷（以下簡稱 EO )改質之三（曱基）丙烯酸三羥曱基丙酯、環氧丙烷（以 下簡稱PO)改質之三（曱基）丙烯酸三羥甲基丙酯、三甘醇 二（曱基）丙烯酸酯、新戊二醇二（曱基）丙烯酸酯、1，4_ 丁二 醇二（曱基）丙烯酸酯、1，6-己二醇二（曱基）丙烯酸酯、季戊 四醇三（曱基）丙烯酸酯、季戊四醇四（甲基）丙烯酸酯、聚酯 二（曱基）丙烯酸酯、聚乙二醇二（甲基）丙烯酸酯、二季戊四 醇六（曱基）丙烯酸酯、二季戊四醇五（曱基）丙烯酸酯、二季 戊四醇四（甲基）丙烯酸酯、己内酯改質之二季戊四醇六（甲 基）丙烯酸酯、己内酯改質之二季戊四醇五（曱基）丙烯酸 酉旨、四（曱基）丙烯酸二三羥甲基丙酯、E〇改質之雙盼A二 16 201241561More specifically, the first compound is manufactured by Nippon Kayaku Co., Ltd., and the product name is kAYARAD®DPCA_20 'DPCA 3〇, DpCA 6〇 DpcA 120···. This second compound has a functional group as shown in the formula (3). R" —c—c=ch2 0 In the formula (3), R11 represents hydrogen or a methyl group, respectively. The second compound may, for example, be acrylamide, (mercapto) propylene morpholine, (meth) acrylate-7-amino-3,7-dimethyloctyl ester, isobutoxy fluorenyl (methyl) ) acrylamide, isobornyl oxyethyl (meth)acrylate, isobornyl (meth)acrylate, 2-ethylhexyl (meth) acrylate, ethyl diglycol (meth) propylene Acid ester, third octyl (decyl) acrylamide, diacetone (meth) acrylamide, diamyl amino (meth) acrylate, dodecyl (meth) acrylate, Dicyclopentyloxyethyl acrylate, dicyclopentene (mercapto) acrylate 15 201241561 ester, nitrogen, nitrogen-dimercapto (meth) acrylamide, tetrakis (phenyl) acrylate, (曱Acetyl-2-tetraphenoxyethyl acrylate, tetrahydrofurfuryl (meth) acrylate, tetrabromophenyl (meth) acrylate, 2-tetrabromophenoxyethyl (meth) acrylate, (3-) phenoxyethyl (meth) acrylate, tribromophenyl (meth) acrylate, 2-tribromophenoxyethyl (meth) acrylate, (mercapto) acrylate 2-hydroxyethyl ester, 2-propyl propyl (meth)acrylate, vinyl caprolactam, nitrogen-ethylene benzotyrone, phenoxyethyl (meth) acrylate, Phenylpentene acrylate, pentabromophenyl benzoate, ethylene glycol poly(mono(decyl) acrylate, propylene glycol (meth) acrylate (meth) acrylate, B Glycol di(meth)acrylate, dicyclopentenyl di(meth)acrylate, triethylene glycol diacrylate, tetraethylene glycol bis(indenyl) acrylate, tris(2-hydroxyethyl)isocyanate (Meth) acrylate, tris(2-hydroxyethyl)isocyanate tri(methyl) acrylate, caprolactone modified tris(2-hydroxyethyl)isocyanate tris(decyl)acrylic acid vinegar, three (fluorenyl) trihydroxymercaptopropyl acrylate, ethylene oxide (hereinafter referred to as EO) modified tris(mercapto)acrylic acid trishydroxypropyl propyl ester, propylene oxide (hereinafter referred to as PO) modified three ( Mercapto) trimethylolpropyl acrylate, triethylene glycol bis(indenyl) acrylate, neopentyl glycol bis(indenyl) acrylate, 1,4_butyl Alcohol bis(mercapto) acrylate, 1,6-hexanediol bis(indenyl) acrylate, pentaerythritol tri(indenyl) acrylate, pentaerythritol tetra(meth) acrylate, polyester bis(indenyl) acrylate Ester, polyethylene glycol di(meth)acrylate, dipentaerythritol hexakisyl acrylate, dipentaerythritol penta(indenyl) acrylate, dipentaerythritol tetra(meth) acrylate, caprolactone modified Dipentaerythritol hexa(meth) acrylate, caprolactone modified dipentaerythritol penta (indenyl) acrylate, tetrakis(mercapto)acrylic acid ditrimethylolpropyl propyl ester, E 〇 modified double expectant A two 16 201241561
(甲基）丙烯酸酯、PO改質之雙酚A二（甲基）丙烯酸酯、EO 改質之氫化雙酚A二（甲基）丙烯酸酯、p〇改質之氫化雙酚 A二（甲基）丙烯醆酯、p〇改質之甘油三丙酸酯、EO改質之 雙酚F二（甲基）丙烯酸酯、酚醛聚縮水甘油醚（甲基）丙烯酸 酯...等。 較佳地’該第二化合物是選自於三丙烯酸三羥曱基丙 酯、EO改質之三丙烯酸三羥甲基丙酯、p〇改質之三丙烯 酸三羥甲基丙酯、季戊四醇三丙烯酸酯、季戊四醇四丙烯 酸酯、二季戊四醇六丙烯酸酯、二季戊四醇五丙烯酸酯、 二季戊四醇四丙烯酸酯、己内酯改質之二季戊四醇六丙烯 酸酿、四丙烯酸二三羥曱基丙醋、p〇改質之甘油三丙酸 酯 '曰本東亞合成株式會社製τ〇_1382，或此等之一組合。 以該鹼可溶性樹脂總重為1〇〇重量份計，該第一化合 物的含量是介於35重量份〜1〇。重量份之間，較佳為％ ; 量份〜95重量份，更佳為40重量份〜9〇重量份，藉由該 弟-化合物的己内醋結構’可以讓該液晶顯示裝置較無泡 沫顯示缺陷。 以該鹼可溶性樹脂總重為1〇〇重量份計，嗜第二化人 :的含量是介於45重量份〜9〇重量份之間，較佳為-Μ 里伤〜85重量份’更佳為5〇重量份〜8〇重量份，以讓該 感光性樹脂組成物呈現優異的顯影性。 以該鹼可溶性樹脂總重為1〇〇 ^ ^ 里物彳’该含乙烯性 不飽和基的化合物的含量是介於 1於重量份〜500重量份之 間，以20重量份〜450重量份較佳， 住又以3〇重量份〜400 17 201241561 重量份更佳，能讓該感光性樹脂組成物具有良好的顯影 性。 本發明之該光起始劑，可選自於苯乙酮系化合物 (acetophenone )、二咪唑系化合物（biimidazole )、醯肟系 化合物（acyl oxime )，或此等之一組合。 所指的苯乙酮系化合物如：對二甲胺苯乙酮（口_ dimethylamino-acetophenone )、α，α’-二曱氧基氧化偶氮苯 乙酮（α,α’-dimethoxyazoxy-acetophenone)、2,2’-二甲基-2-苯基苯乙 i5! ( 2,2’-dimethyl-2-phenyl-acetophenone)、對曱 氧基笨乙酮（p-methoxy-acetophenone )、2-甲基-1-(4-甲基 硫代苯基）-2-嗎琳代-1-丙嗣〔2-methyl-l-(4-methylthio phenyl)-2-morpholino-l-propanone〕、2-苄基-2-氮，氮-二甲胺 -1-(4-嗎琳代苯基）-1-丁嗣〔2-benzyl-2-N，N-dimethy lam ino-l-(4-morpholinophenyl)-l-butanone ] ° 所指的二咪唑系化合物如：2,2’-雙（鄰-氣苯基）-4,4’，5,5’ -四苯基二°米。坐〔SJ’-bisCo-chlorophenyD-AUJ’-tetraphenyl-biimidazole 〕 、 2,2’-雙 （鄰- 氟苯基）-4,4,5,5’-四苯 基二咪唑〔2,2’-bis(o-fluorophenyl)-4,4’,5,5’-tetraphenyl-biimidazole〕、2,2’-雙（鄰-甲基苯基）-4,4’，5,5’-四苯基二咪唑 〔 2,2’-bis(o-methyl phenyl)-4,4’，5,5’-tetraphenyl- biimidazole〕、2,2’-雙（鄰-曱氧基苯基）-4,4’，5,5’-四苯基二咪 唾 〔 2,2’-bis(o-methoxyphenyl)-4,4’，5,5’-tetraphenyl-biimidazole〕、2,2’-雙（鄰-乙基苯基）-4,4’，5,5’-四苯基二咪 °坐 〔2,2’-bis(o-ethylphenyl)-4,4’ ， 5,5’-tetraphenyl- 18 201241561 biimidazole〕、2,2’-雙（對曱氧基苯基）-4,4’，5,5’-四苯基二咪 0坐 〔 2,2’-bis(p-methoxyphenyl)-4,4’，5,5’-tetraphenyl- biimidazole〕、2,2’-雙（2,2，，4,4’-四甲氧基苯基）-4,4’，5,5，-四 本基二咪 °坐〔2,2’-bis(2,2，，4,4’-tetramethoxyphenyl)-4,4’，5,5’-tetraphenyl-biimidazole〕、2,2，-雙（2-氣苯基）-4,4’，5,5’-四苯基二咪唾〔2,2’-bis(2-chlorophenyl)-4,4，，5,5’-tetraphenyl-biimidazole〕 、 2,2’-雙 （2,4-二 氣苯基）-4,4，，5,5，-四本基一咪。圭〔2,2’-bis(2,4-dichlorophenyl)-4,4,，5，5，-tetraphenyl-biimidazole〕等。 所指的醯肟系化合物如：乙烷酮，1_[9_乙基_6-(2-甲基苯 曱醯基）-9氫-咔唑-3-取代基]-，l-(氧-乙醯肟）〔扮1^11〇1^,1- [9-ethyl-6-(2-methylbenzoyl)-9H-carbazole-3-yl]-,l-(O-acetyl oxime)，如 Ciba Specialty Chemicals 製之品名為 c：Gi-242 者，其結構見式（4)所示〕、1-(4-笨基-硫代-苯基）_辛烷 二酮 2-肟-氧-苯曱酸酯〔1_(4-1)1^1^1-如0-1)1161^1)-〇(^1^- l，2-di〇n 2-oxime-O-benzoate’ 如 Ciba Specialty Chemicals 製之品名為CGI-124者，其結構見式（5)所示〕、乙烷酮，卜 [9-乙基-6-(2-氣-4-苯曱基-硫代-笨甲醯基）_9氫_咔唑_3_取代 基]-，1-(氧-乙 benzyl-thio-benzoyl)-9H-carbazole-3-yl].5l^〇_acetyl oxime)，旭電化公司製，其結構見式（6)所示〕。 19 201241561(Meth) acrylate, PO modified bisphenol A di(meth) acrylate, EO modified hydrogenated bisphenol A di(meth) acrylate, p 〇 modified hydrogenated bisphenol A II Acryl decyl ester, p-modified glycerol tripropionate, EO-modified bisphenol F di(meth) acrylate, phenolic polyglycidyl ether (meth) acrylate, and the like. Preferably, the second compound is selected from trishydroxypropyl propyl triacrylate, EO modified trimethylol propyl triacrylate, p〇 modified trimethylol propyl triacrylate, pentaerythritol three Acrylate, pentaerythritol tetraacrylate, dipentaerythritol hexaacrylate, dipentaerythritol pentaacrylate, dipentaerythritol tetraacrylate, caprolactone modified dipentaerythritol hexaacrylic acid, ditrihydroxydecyl propylene glycol tetraacrylate, p〇 Modified glycerol tripropionate 曰 东亚 东亚 382, 382, or a combination of these. The content of the first compound is 35 parts by weight to 1 Torr based on the total weight of the alkali-soluble resin of 1 part by weight. Between parts by weight, preferably %; parts by weight to 95 parts by weight, more preferably 40 parts by weight to 9% by weight, by means of the internal vinegar structure of the compound - the liquid crystal display device can be made less foamy Display defects. The content of the second-order human is: between 45 parts by weight and 9 parts by weight, preferably - 里 〜 - 85 parts by weight, based on the total weight of the alkali-soluble resin. It is preferably 5 parts by weight to 8 parts by weight to give the photosensitive resin composition excellent developability. The total weight of the alkali-soluble resin is 1 〇〇 ^ ^ 彳 彳 ' The content of the ethylenically unsaturated group-containing compound is between 1 part by weight and 500 parts by weight, and 20 parts by weight to 450 parts by weight Preferably, it is more preferably used in an amount of 3 parts by weight to 400 parts by weight, and more preferably 400 parts by weight, and the photosensitive resin composition can have good developability. The photoinitiator of the present invention may be selected from the group consisting of an acetophenone compound, a biimidazole compound, an acyl oxime compound, or a combination thereof. The acetophenone-based compound referred to is: p-dimethylamino-acetophenone, α,α'-dimethoxyacetoxy acetophenone (α,α'-dimethoxyazoxy-acetophenone) , 2,2'-dimethyl-2-phenylphenethyl i5! (2,2'-dimethyl-2-phenyl-acetophenone), p-methoxy-acetophenone, 2- Methyl-1-(4-methylthiophenyl)-2-methyl-l-(4-methylthio phenyl)-2-morpholino-l-propanone, 2 -benzyl-2-nitrogen, nitrogen-dimethylamine-1-(4-morphinylphenyl)-1-butanthene [2-benzyl-2-N,N-dimethy lam ino-l-(4- The morpholinophenyl)-l-butanone ] ° refers to a diimidazole compound such as 2,2'-bis(o-phenylphenyl)-4,4',5,5'-tetraphenyl 2 nm. Sitting [SJ'-bisCo-chlorophenyD-AUJ'-tetraphenyl-biimidazole], 2,2'-bis(o-fluorophenyl)-4,4,5,5'-tetraphenyldiimidazole [2,2' -bis(o-fluorophenyl)-4,4',5,5'-tetraphenyl-biimidazole], 2,2'-bis(o-methylphenyl)-4,4',5,5'-tetraphenyl 2,2'-bis(o-methyl phenyl)-4,4',5,5'-tetraphenyl-biimidazole, 2,2'-bis(o-decyloxyphenyl)-4, 4',5,5'-o-methoxyphenyl-4,4',5,5'-tetraphenyl-biimidazole, 2,2'-double (neighbor) -ethylphenyl)-4,4',5,5'-tetraphenyldimetho[2,2'-bis(o-ethylphenyl)-4,4', 5,5'-tetraphenyl- 18 201241561 biimidazole], 2,2'-bis(p-methoxyphenyl)-4,4',5,5'-tetraphenyldimetho[2,2'-bis(p-methoxyphenyl)-4 , 4',5,5'-tetraphenyl-biimidazole], 2,2'-bis(2,2,4,4'-tetramethoxyphenyl)-4,4',5,5,-four 2,2'-bis(2,2,4,4'-tetramethoxyphenyl-4,4',5,5'-tetraphenyl-biimidazole], 2,2 -Bis(2-Phenylphenyl)-4,4',5,5'-tetraphenyl-diphenyl-[2,2'-bis(2-chlorophenyl)-4,4,5,5'-tetraphenyl -biimidazole], 2,2'-bis(2,4-diphenyl)-4,4,5,5,-tetrabenyl-mi. 2,2'-bis(2,4-dichlorophenyl)-4,4,5,5,-tetraphenyl-biimidazole]. The lanthanide compound referred to is: ethane ketone, 1-[9-ethyl_6-(2-methylphenylhydrazino)-9hydro-oxazol-3-substituted group]-, 1-(oxygen) -乙醯肟)[Looking 1^11〇1^,1-[9-ethyl-6-(2-methylbenzoyl)-9H-carbazole-3-yl]-, l-(O-acetyl oxime), such as Ciba The product name of Specialty Chemicals is c:Gi-242, and its structure is shown in formula (4). 1-(4-Phenyl-thio-phenyl)-octanedione 2-indole-oxy-benzene Phthalate [1_(4-1)1^1^1-such as 0-1)1161^1)-〇(^1^- l,2-di〇n 2-oxime-O-benzoate' as Ciba Specialty The product of Chemicals is called CGI-124, and its structure is shown in formula (5).] Ethyl ketone, Bu [9-ethyl-6-(2- gas-4-phenylindenyl-thio-acne Sulfhydryl)_9-hydrogen-carbazole_3_substituent]-,1-(oxy-ethylbenzyl-thio-benzoyl)-9H-carbazole-3-yl].5l^〇_acetyl oxime), manufactured by Asahi Chemical Co., Ltd. , the structure is shown in formula (6)]. 19 201241561
較佳地，該光起始劑是2-甲基-1-(4-甲基硫代苯基）-2-嗎琳代-1-丙嗣、2 -节基-2 -氮，氣-二曱胺-1-(4 -嗎琳代苯基）- 20 201241561 1-丁酮、2,2’-雙（鄰-氣苯基）-4,4’，5,5’-四苯基二咪唑、乙烷 酮，1-[9-乙基-6-(2-曱基苯曱醯基）-9氫-咔唑-3-取代基]-,1-(氧-乙醯肟），或此等之一組合。 本發明之該光起始劑，可進一步添加下列之化合物： 嘆》頓嗣（thioxanthone )、2,4-二乙基 °塞 °镇酮（2,4-diethyl-thioxanthanone ) ' 〇塞0镇酮-4-颯（thioxanthone-4-sulfone )、 二苯曱酮（benzophenone )、4,4’-雙（二曱胺）二苯曱酮〔 4,4’-bis(dimethylamino)benzophenone〕、4,4’-雙（二乙胺）二 苯甲酮〔4,4’-bis(diethylamino)benzophenone〕等二笨曱酮 (benzophenone )系化合物；苯偶酸（benzil )、乙醯基 (acetyl )等 α -二 _( a -diketone )類；二苯乙醇酮 (benzoin )等之酮醇（acyloin )類；二苯乙醇酮甲醚 (benzoin methylether )、二苯乙醇嗣***（benzoin ethylether)、二苯乙醇酮異丙醚（benzoin isopropyl ether) 等酮醇S|(acyloin ether)類；2,4,6-三甲基苯醯二苯基膦氧化 物(2,4,6-trimethyl-benzoyl-diphenyl -phosphineoxide )、雙-(2,6-二曱氧基苯醯）-2,4,4-三甲基苯基膦氧化物〔1^-(2,6-dimethoxy-benzoyl)-2,4,4-trimethy 1-benzyl-phosphineoxide ) 等贐膦氧化物 （acylphosphineoxide ) 類；蒽酿 (anthraquinone )、1,4-萘酿（l，4-naphthoquinone)等酿 (quinone )類；苯醯甲基氯（phenacyl chloride)、三溴甲基 苯石風（tribromomethyl-phenylsulfone)、三（三氣曱基）-s-三0秦 〔tris(trichloromethyl)-s-triazine〕等鹵化物；以及二-第三 丁基過氧化物（di-tertbutylperoxide)等過氧化物。其中， 21 201241561 以二苯曱酮（benzophenone)系化合物較佳，尤以4,4，雙 (二乙胺）二苯甲酮為最佳。 以該驗可溶性樹脂總重4⑽重量份計，該光起始劑 的含量是介於2重量份〜100重量份之間，較佳為3重量份 〜75重量份，更佳為5重量份〜5〇重量份。 本發明之該有機溶劑能將該鹼可溶性樹脂、該含乙烯 性不飽和基的化合物與該光起始劑溶解，且不會與其進行. 反應，並具有適當揮發性。 該有機溶劑較常用的具體例如：乙二醇甲醚、乙二醇 *** '二甘醇曱醚、二甘醇***、二甘醇正丙醚、二甘醇 正丁醚、三甘醇曱醚、三甘醇*** '丙二醇甲醚 '丙二醇 ***、一縮二丙二醇曱醚、一縮二丙二醇***、一縮二丙 _· 二醇正丙醚、一縮二丙二醇正丁醚、二縮三丙二醇曱醚 (tripropylene glycol mono methyl ether)、二縮三丙二醇乙 峻（tripropylene glycol mono ethyl ether)等之（聚）亞烧基二 醇單烷醚類，乙二醇曱醚醋酸酯、乙二醇***醋酸酯、丙 二醇甲醚醋酸酯、丙二醇***醋酸酯等（聚）亞烷基二醇單烷 醚醋酸酯類；二甘醇二甲醚、二甘醇甲***、二甘醇二乙 趟、四氫呋喃等其他醚類；曱乙酮、環己酮、2_庚酮、3_庚 酮等酮類；2-羥基丙酸甲酯、2_羥基丙酸乙酯等乳酸烷酯 類；2-羥基-2-曱基丙酸甲酯、2-羥基_2-曱基丙酸乙酯、3_ 曱氧基丙酸曱酯、3-甲氧基丙酸乙酯、3_乙氧基丙酸曱酯、 3-乙氧基丙酸乙酯、乙氧基乙酸乙酯、羥基乙酸乙酯、2_羥 基-3-曱基丁酸曱酯、3-甲基-3-曱氧基丁基乙酸酯、3_曱基_ 22 201241561 3-甲氧基丁基丙酸酯、乙酸乙酯、乙酸正丁酯、乙酸正丙 酯、乙酸異丙酯、乙酸正丁酯、乙酸異丁酯、乙醆正戊 醋：乙酸異戊酯、㈣正丁酯、丁酸乙酯、丁酸正丙酯、 丁酸異丙酯、丁酸正丁酯、丙酮酸甲酯、丙酮酸乙酯、丙 _酸正丙S旨、乙酿乙酸甲醋、乙醯乙酸乙g旨、2氧基丁酸乙 醋等其他酷類；甲$、二甲苯等芳香族碳氫化合物類广以 及亂-甲基対貌酮、氮，氮_二甲基甲醯胺、氮，氮.二甲基乙 醯胺等叛酸醯胺類等。 較佳地，該有機溶劑是以丙二醇甲醚醋酸酯' 3_乙氧基 丙酸乙酯擇一使用或混合使用。 Z鹼可溶性樹脂總线i⑼重量份計，該有機溶劑 的^是介於5GG重量份〜5_重量份之間較佳為_ 重量份〜40〇〇重量份。 5玄顏料可為無機顏料、有機顏料，或此等之一組合。 所述無機顏料為金屬氧化物、金屬錯鹽等金屬化合 物’具體例如：鐵、钻、銘、鎖、錯、鋼、鈦、鎖、絡、 亞鉛、銻等金屬的氧化物，以及前述金屬的複合氧化物。 所述之有機顏料，可由以下列舉者中擇_單獨使用或 混合多種使用顏料黃 16 ’ 17，20，24，31，53，55，60，61，65，71 , 73， 74 ’ 81 ’ 83，93 ’ 95，97 ’ ％，99，ι〇〇，ι〇ι，_， 1〇6,⑽，109, 110, 113, 114, 116, 117 , 119 , 12〇, 126 ’ 127，128，129 ’ 138 ’ 139，15〇，151，152，153， 154，155 ’ 156 ’ 166 167 ’ 168 ’ 175 ; C.I·顏料橙 1，5， 23 561 13 14，16 > Π > 24 -34 ，36， 38，40，43，46， 49， 51， 61，63 ，64 ，71， 73 ； C.I.顏料紅 1， 2，3，4 ，5， 6， 7，8，9 ，10 ，11， 12， 14，15 ，16， 17， 18，19 21 » 22， 23，30 ，31 ，32， 37， 38 ， 40 ， 41 ， 42 48 ： 1 48 ： 2， 48 : 3， 48 ： 4，49 ：1 ，49 : 2，50 ：1 ? 52 : 1， 53 ： 1， 57，57 1， 57 ： 2 ，58 :2， 58 ： 4 ，60 :1，63 :1， 63 ： 2，64 : 1， 81 ： 1 ，83 ，88， 90 ： 1 ，97 ，HH， 102， 104 ，105， 106， 108， 112 ，113 ，114， 122 ，123， 144， 146 ，149， 150， 151， 155 ，166 ，168， 170 ，171， 172， 174 ，175， 176， 177， 178 ，179 ，180， 185 ，187， 188， 190，193，194，202，206 220，224，226，242，243 C.I.顏料紫 1，19，23，29 207，208，209，215，216， 245，254，255，264，265 ; 32 ’ 36 ’ 38 ’ 39 ; C.I.顏料藍 1，2，15，15 : 3，15 : 4，15 : 6，16，22，60，66 ; C.I. 顏料綠7，36 ’ 37 ; C.I.顏料棕23，25，28 ;以及C.I.顏料 黑 1，7 0 該顏料的一次粒子之平均粒子徑較佳為10nm~200nm， 更佳為20nm〜150nm，最佳為30nm〜130nm。 必要時，該顏料（E)也能伴隨使用分散劑，例如：陽離 子系、陰離子系、非離子系、兩性、聚碎氧炫系、I系等 界面活性劑。 所述之界面活性劑可以從以下列舉者中擇一單獨使用 或混合多種使用：聚環氧乙烧十二燒基醚、聚環氧乙燒硬 脂醯醚、聚環氧乙院油料聚環氧乙院絲聚環氧 201241561 乙烷辛基笨醚、聚環氧乙烷壬基笨醚等聚環氧乙烷烷基笨 醚類；聚乙二醇二月桂酸酯、聚乙二醇二硬脂酸酯等聚乙 二醇二酯類；山梨糖醇酐脂肪酸酯類；脂肪酸改質的聚醋 類；三級胺改質的聚胺基曱酸酯類；信越化學工業製的κρ 產品、Toray Dow Corning Silicon 製的 SF-8427 產品、共榮 社油脂化學工業製的普利弗隆（Polyflow )產品、得克姆公 司製（Tochem Products Co.，Ltd.)的愛夫多普（ρ— τ〇ρ) 產品、大曰本印墨化學工業製的美卡夫克（Megafac )產 品 '住友3M製的弗洛多（Fluorade)產品、旭硝子製的阿 薩卡夕（Asahi Guard)產品、旭硝子製的薩弗隆（surfi〇n )產 品〇 以該鹼可溶性樹脂總重為1〇〇重量份計，該顏料的含 量是介於100重量份〜500重量份之間，較佳為12〇重量份 〇重量^ I發明之感光性樹脂組成物，是卩前述該驗 可溶性樹脂、該含乙稀性不飽和基的化合物、該光起始 :、該有機溶劑，以及該顏料為必要成分，並可視需求進 -步添加-添加物’例如：卩面活性劑、填充劑、高分子 化合物（指祕可純樹脂以外者）、密著促進劑、抗氧化 劑、紫外線吸收劑、防凝集劑等。 、中，所叙界面活性劑能提高本發明之塗布性，其 具體例如同前述該顏料所 π伴使用的界面活性劑者；以該 驗可溶性樹脂總重為1〇 旦 Β 重里伤计，该界面活性劑的含量 疋）丨於〇重量份〜6重量份$ M Vi Λ Λ Jl- 里伤之間，較佳為〇重量份〜4重量 物’更加為0重量份〜3重量份。 25 201241561 再者’該填充劑可以是玻璃、鋁；該高分子化合物可 以是聚乙稀醇、聚乙二醇單烷基醚、聚氟丙烯酸烷酯；該 密著促進劑可以是乙烯基三曱氧基矽烷、乙烯基三乙氧基 矽烷、乙烯基三（2-曱氧乙氧基）矽烷、氮_(2_氨基乙基）_3_氨 基丙基曱基二曱氧基矽烷、氮_(2_氨基乙基）_3_氨基丙基三 曱氧基矽烷、3-氨基丙基三乙氧基矽烷、3_環氧丙醇丙基三 曱氧基矽烷、3-環氧丙醇丙基曱基二甲氧基矽烷、2_(3,4_環 氧環己基）乙基三甲氧基矽烷、3_氣丙基甲基二甲氧基矽 烷、3-氣丙基三曱氧基矽烷、3_甲基丙烯氧基丙基三曱氧基 矽烷、3-硫醇基丙基三甲氧基矽烷；該抗氧化劑可以是2,2_ 硫代雙（4-甲基-6-第三丁基苯酚）、2,6-二-第三丁基苯酚；該 紫外線吸收劑可以是2-(3 -第三丁基_5_甲基-2·羥基苯基）_5_ 氣苯基疊氮、烷氧基苯酮；該防凝集劑可以是聚丙烯酸 納。 以該鹼可溶性樹脂總重1〇〇重量份計，所述填充劑、 該鹼可溶性樹脂以外之高分子化合物、密著促進劑、抗氧 化劑、紫外線吸收劑、防凝集劑等添加物的含量是介於〇 重量份〜10重量份之間，較佳為〇重量份〜6重量份，更 佳為0重量份〜3重量份。 本發明之感光樹脂組成物的製備，是使該鹼可溶性樹 脂、該含乙烯性不飽和基的化合物與該光起始劑等，混 合、溶解在該有機溶劑中後，再加入該顏料，必要時另添 加入界面活性劑、密著促進劑…等添加物，以予均勻混合， 便可調製得呈溶液狀態之該感光樹脂組成物。 26 201241561 本發明之彩色滤光片，包含一由該感光性樹脂組成物 經微影處理後所形成的畫素著色層。 在進行該彩色遽光片的製作成形時，是藉由迴轉塗 布μ延塗布或輥式塗布等塗布方式，將上述呈溶液狀態 之本發明感光樹脂組成物塗布在一基板上。該基板可以是 用於液晶顯示裝置的無鹼玻璃、鈉鈣玻璃、硬質玻璃（派 勒斯玻璃）、石英玻璃，以及附著有透明導電膜的此等玻璃 者，或是用於光電變換裝置（如固體攝影裝置）的基板 夕基板），而且，在將該感光樹脂組成物塗布在該基板 上之則，疋已先將能隔離紅、綠、藍等畫素著色層之遮光 用黑色矩陣（black matrix)加工成形於該基板上。 塗布後，先以減壓乾燥方式去除該感光樹脂組成物所 含大部分的有機溶劑，再以預烤（pre_bake)方式將殘餘的 有機岭劑完全去除，使其形成一預烤塗膜。過程中，減壓 乾燥及預烤之操作條件是依各成份之種類、配合比率而 異通吊，減壓乾燥乃在OmmHg〜200mmHg之壓力下進行 1秒鐘〜60秒鐘’而預烤乃在7〇°C〜1HTC溫度下進行i分 鐘〜15分鐘。 預烤後，以具有特定圖案之一光罩對該預烤塗膜進行 曝光。在曝光過程中所使用的光線，M g線、b線、i線等 I外線為佳，而用以發出紫外線的設備可為（超）高壓水銀燈 及金屬_素燈。 曝光後’將該預烤塗膜浸潰於溫度介於23±2°C的一顯 液中進行約15秒〜5分鐘的顯影，去除該預烤塗膜之 27 201241561 不需要的部分，以於該基板上形成預定之圖案。 所使用之顯影液可以是由氫氧化鈉、氫氧化鉀、碳酸 鈉、碳酸氫鈉、碳酸鉀、碳酸氫鉀、矽酸鈉、曱基矽酸 鈉氨水、乙胺、二乙胺、二曱基乙醇胺、氫氧化四甲 銨、氫氧化四乙銨、膽鹼、吡咯、呱啶，或u-二氮雜二環 -(5,4,0)-7-十—烯等鹼性化合物所構成的鹼性水溶液，其濃 度一般介於0.001重量％〜10重量％之間，較佳為〇〇〇5重 量％〜5重量％之間’更佳為〇·〇1重量％〜1重量％之間。 之後’用水將該基板上的圖案洗淨，再用壓縮空氣或 壓縮氮軋將該圖案風乾，最後以熱板或烘箱等加熱裝置對 該圖案進行加熱處理（post-bake )，加熱溫度設定在15〇°C 〜250 C之間’使用熱板時的加熱時間為5分鐘〜6〇分鐘， 使用烘箱時的加熱時間則為15分鐘〜150分鐘，藉以使該 圖案固定、成形為一畫素著色層。 重覆上述步驟’便能依序在該基板上成形紅、綠、藍 等畫素著色層。 接著，在溫度介於220°C〜250°C之間的真空環境下， 於所述晝素著色層之表面濺鍍成形一 IT0保護膜，必要 時，對該IT0保護膜施行蝕刻暨佈線，再於該IT0保護膜 表面塗布一配向膜，便能製作成形出該彩色濾光片。 本發明之液晶顯示裝置，包含該彩色濾光片。 進一步地，簡單就該液晶顯示裝置（如液晶面板）的 製造來說，另取一鑲嵌有薄膜電晶體（Thin Film Transistor，TFT )且已塗布上一配向膜的玻璃基板，在前述 28 201241561 該彩色濾光片與該玻璃基板之間介入間隙作對向配置，再 於該間隙注入液晶分子，隨後分別在該彩色濾光片與該玻 璃基板之一外表面貼合一偏光板，即能製得該液晶顯示裝 置。 本發明將就以下實施例來作進一步說明，但應瞭解的 是，所示實施例僅為例示說明之用，而不應被解釋為本發 明實施之限制。 〔第一驗可溶性樹脂的合成例1至12〕 在一容積1000毫升之四頸錐瓶上設置氮氣導入口、攪 拌器、加熱器、冷凝管及溫度計，並依照纟！所示成分種 類與使用量比例，準備用以合成該驗可溶性樹脂所需的第 -不飽和單體、第二不飽和單體、第三不飽和單體、第四 不飽和單體、聚合用起始劑與溶劑等成分。 進仃聚合時，先將該第一不飽和單體、該第二不飽和 單體、該第三不飽和單體與該第四不飽和單體等連續添加 入該四頸錐瓶中，並予授拌混合，同時將該四頸錐瓶的油 =溫度提升至10(rc ;另將該起始劑溶解於該溶劑中並予 分成五等份量，每間隔—小時添加—等份量到該四頸錐瓶 中。整個聚合過程的反應溫度維持在⑽。c，聚合時間持择 6小時’聚合完成後，將聚合產物自該四頸錐瓶中取出，: 把溶劑脫揮，便可得該第一鹼可溶性樹脂。 〔感光性樹脂組成物的實施例！至8，與比較例】至8〕 :照4 2所示成分種類與使用量比例，準備用 该感光性樹脂組成物所需的驗可溶性樹脂（包含第—驗可 29 201241561 溶性樹脂與第二驗可溶性樹脂）、含乙稀性不飽和基的化 合物（包含該第-化合物與第二化合物）、光起始劑、有機 溶劑與顏料等成分。 將該驗可溶性樹脂、該含乙稀性不飽和基的化合物、 該光起始劑與該顏料加入該有機溶劑後，透過搖動式授拌 器加以溶解混合’即可調製得該感光性樹脂組成物，再以 後述之評價方式來進行特性測定，所得評價結果如表2所 示0 〔評價方式〕 一、对賤鑛性 利用所調製得之該感光性樹脂組成物，在一玻璃 基板上形成一畫素著色層，再於該晝素著色層上濺鑛 成形一膜阻值為14.6n/sq、膜厚為2〇4〇 a的IT〇薄 膜’㈣溫度為22代，以製得該彩色遽光片。然後， 利用100倍的光學顯微鏡分別觀察該彩色濾光片之 紅、藍、綠等晝素著色層的表面狀況，並根據下列標 準進行評價： 〇：無裂痕或擦傷 _△.少許裂痕及表面擦傷 X :裂痕及表面擦傷报多 二、泡狀顯示缺陷 將使用該彩色渡光片所製得的液晶顯示裝置，放 置在溫度1GG°C、濕度95RH%的環境中，α肉眼觀察 泡狀顯示缺陷出現的時間ti，並根據下列標準進行評 30 201241561 價： ◎ : I > 500 小時 〇：300小時< ti$ 500小時 △ · 1 〇〇小時< ti $ 300小時 X : I < 100 小時 三、顯影性（或稱顯影速度） 將所調製得之感光性樹脂組成物，以旋轉塗佈的 方式塗佈在-⑽麵灣麵的玻璃基板上，先進行 壓力為1〇〇mmHg、時間為30秒鐘的減壓乾燥，再進 ^皿度為80 C、a夺間為3分鐘的預烤，使其形成—膜 厚為Ι.Ο/zm的預烤塗膜。 然後’取2重量。，°氫氧化鉀水溶液2ml，滴在該預 烤塗膜上，測量該預烤塗膜溶解所需的時間t2，即相 當於顯影時間，並根據下列標準進行評價： 〇：t2 $ 1 〇秒 X : t2> ίο 秒 〔結果分析〕 仗表2的結果可知，如會始你丨〗〇 斯貫她例1〜8，以該鹼可溶性樹 脂總重為100重量份計，A .. T 在s亥第一鹼可溶性樹脂的使用重 量介於30〜90重量份之間， 且以該第一〜第四不飽和單體 所構成混合物總重為1 〇〇番旦 + υυ重里份计’該第二不飽和單體與 該第三不飽和單體的使用番Θ 丈用重$比例、使用重量總和是分別 "於0.01〜0.40之間、25〜6〇重量份之間所調製得之感 光性樹脂組成物在用以成形彩色滤光片之畫素著色層的過 31 201241561 程中’其確實能呈現出相當優異的耐職鍍性與顯影性，同 時，以此彩色濾光片製作成的液晶顯示穿 「展置，也完全不會 產生泡狀顯示缺陷。 相對地’如比較例2〜5’所使用之第_驗可溶性樹脂 (即合成例7〜9) ’其第二不飽和單體與該第三不飽和單 體的使用重量比值大於〇.4〇’再如比較例卜？、8，所使用 之第一鹼可溶性樹脂（即合成例1〇〜12) ，1 ’ ’、弟一不飽和 單體與該第三不飽和單體的使用重量比值小於〇 〇1，且不 含有第二不飽和單體或第三不飽和單體，所調製得之感光 性樹脂組成物在用以成形彩色渡光片之晝素著色層的過程 中，於耐韻性與顯影性等表現較差，㈣，以此彩色據 光片製造的液晶顯示裝置’更會產生較嚴重的泡狀顯示: 陷。 綜上所述’本發明之感光性樹脂組成物及使用其之彩 色濾光片與液晶顯示裝置，透過控制該感光性樹脂組成物 所使用之第-驗可溶性樹脂，其該第二不鮮單體與該第 三不飽和單體的重量比值是介於G()1〜㈣之間的方式， 讓該感光性樹脂組成物於微影製程中能呈現極佳的顯影 性’並，該彩色渡光片之使用該感光性樹脂組成物所形成 之晝素者色層能呈現極佳的耐濺難，同時讓使用該彩色 濾光片所製侍的液晶顯示裝置完全無泡狀顯示缺陷。 准以上所述者，僅為本發明之較佳實施例而已，當不 二以此限定本發明實施之範圍，即大凡依本發明巾請專利 1巳圍及發月說明内容所作之簡單的等效變化與修飾，皆仍 32 201241561 屬本發明專利涵盖之範圍内 33 201241561 <0f:.^ 遨K--T ,d %Preferably, the photoinitiator is 2-methyl-1-(4-methylthiophenyl)-2-morphin-1-propene, 2-phenyl-2-nitrogen, gas- Diammonium-1-(4-cylinylphenyl)- 20 201241561 1-butanone, 2,2'-bis(o-phenyl)-4,4',5,5'-tetraphenyl Diimidazole, ethane ketone, 1-[9-ethyl-6-(2-mercaptobenzoyl)-9hydro-oxazol-3-substituted]-, 1-(oxy-acetamidine) , or a combination of these. In the photoinitiator of the present invention, the following compounds may be further added: thioxanthone, 2,4-diethyl-thioxanthanone ' Thioxanthone-4-sulfone, benzophenone, 4,4'-bis(dimethylamino)benzophenone, 4 , benzophenone-based compound such as 4'-bis(diethylamino)benzophenone; benzil, ethenyl (acetyl) A-diketone, acyloin, benzoin methylether, benzoin ethylether, Alkaloids such as benzoin isopropyl ether S|(acyloin ether); 2,4,6-trimethylphenylhydrazine diphenylphosphine oxide (2,4,6-trimethyl-benzoyl- Diphenyl-phosphineoxide), bis-(2,6-dimethoxybenzoquinone)-2,4,4-trimethylphenylphosphine oxide [1^-(2,6-dimethoxy-benzoyl)-2, 4,4-trimethy 1-benzyl-phosphineoxide ) Acylphosphine oxide; anthraquinone, 1,4-one (1,4-naphthoquinone), etc.; phenacyl chloride, tribromomethylbenzene a halide such as tribromomethyl-phenylsulfone, tris(trichloromethyl)-s-triazine, and di-tertbutylperoxide Wait for peroxides. Among them, 21 201241561 is preferably a benzophenone-based compound, particularly 4,4, bis(diethylamine)benzophenone. The content of the photoinitiator is between 2 parts by weight and 100 parts by weight, preferably 3 parts by weight to 75 parts by weight, more preferably 5 parts by weight, based on 4 parts by weight of the total weight of the soluble resin. 5 parts by weight. The organic solvent of the present invention can dissolve the alkali-soluble resin, the ethylenically unsaturated group-containing compound and the photoinitiator, and does not react with it, and has appropriate volatility. The organic solvent is more commonly used, for example, ethylene glycol methyl ether, ethylene glycol ether 'diethylene glycol oxime ether, diethylene glycol ethyl ether, diethylene glycol n-propyl ether, diethylene glycol n-butyl ether, triethylene glycol oxime ether, three Glycol ether 'propylene glycol methyl ether' propylene glycol ethyl ether, dipropylene glycol oxime ether, dipropylene glycol diethyl ether, dipropylene di-glycol n-propyl ether, dipropylene glycol n-butyl ether, tripropylene glycol oxime ether ( Tripropylene glycol mono methyl ether), tripropylene glycol mono ethyl ether (poly) alkylene glycol monoalkyl ether, ethylene glycol oxime ether acetate, ethylene glycol ethyl ether acetate, (poly)alkylene glycol monoalkyl ether acetates such as propylene glycol methyl ether acetate, propylene glycol ethyl ether acetate; other ethers such as diglyme, diethylene glycol methyl ether, diethylene glycol diethyl hydrazine, tetrahydrofuran, etc. Ketones such as acetophenone, cyclohexanone, 2-heptanone, and 3_heptanone; alkyl lactate such as methyl 2-hydroxypropionate or ethyl 2-hydroxypropionate; 2-hydroxy-2- Methyl mercaptopropionate, ethyl 2-hydroxy-2-mercaptopropionate, decyl 3-methoxypropionate, 3-methoxy Ethyl propionate, decyl 3-ethoxypropionate, ethyl 3-ethoxypropionate, ethyl ethoxyacetate, ethyl hydroxyacetate, decyl 2-hydroxy-3-indolylbutyrate, 3-methyl-3-decyloxybutyl acetate, 3_mercapto_ 22 201241561 3-methoxybutyl propionate, ethyl acetate, n-butyl acetate, n-propyl acetate, acetic acid Propyl ester, n-butyl acetate, isobutyl acetate, acetamidine acetate: isoamyl acetate, (tetra) n-butyl ester, ethyl butyrate, n-propyl butyrate, isopropyl butyrate, n-butyrate Ester, methyl pyruvate, ethyl pyruvate, propionate, propionate, ethyl acetate, ethyl acetate, ethyl acetoacetate, etc.; Alkaloids such as a wide range of aromatic hydrocarbons, such as chaotic-methyl ketone, nitrogen, nitrogen-dimethylformamide, nitrogen, nitrogen, dimethylacetamide, and the like. Preferably, the organic solvent is used singly or in combination with propylene glycol methyl ether acetate '3_ethoxypropionate. The amount of the organic solvent is from 5 GG parts by weight to 5% by weight, preferably from _ parts by weight to 40 parts by weight, based on the weight of the Z-base soluble resin bus i (9). 5 Xuan pigments can be inorganic pigments, organic pigments, or a combination of these. The inorganic pigment is a metal compound such as a metal oxide or a metal salt, and specifically, for example, an oxide of a metal such as iron, diamond, diamond, lock, steel, titanium, lock, complex, lead, or antimony, and the foregoing metal. Composite oxide. The organic pigment may be selected from the following ones alone or in combination of a plurality of pigment yellows 16 ' 17, 20, 24, 31, 53, 55, 60, 61, 65, 71, 73, 74 ' 81 ' 83 ,93 ' 95,97 ' %,99,ι〇〇,ι〇ι,_, 1〇6,(10),109,110,113,114,116,117, 119, 12〇, 126 ' 127,128, 129 ' 138 ' 139,15〇,151,152,153, 154,155 ' 156 ' 166 167 ' 168 ' 175 ; CI·Pigment Orange 1,5, 23 561 13 14,16 > Π > 24 -34 ,36, 38,40,43,46, 49, 51, 61,63 ,64 ,71, 73 ; CI Pigment Red 1, 2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12, 14,15,16, 17, 18,19 21 » 22, 23,30 , 31 , 32 , 37 , 38 , 40 , 41 , 42 48 : 1 48 : 2, 48 : 3, 48 : 4,49 :1 , 49 : 2,50 :1 ? 52 : 1, 53 : 1, 57,57 1, 57 : 2 , 58 : 2 , 58 : 4 , 60 : 1, 63 : 1, 63 : 2, 64 : 1, 81 : 1 , 83 , 88 , 90 : 1 , 97 , HH , 102 , 104 , 105 , 106 , 108 , 112 , 113 , 114 , 1 22,123, 144, 146, 149, 150, 151, 155, 166, 168, 170, 171, 172, 174, 175, 176, 177, 178, 179, 180, 185, 187, 188, 190, 193, 194,202,206 220,224,226,242,243 CI Pigment Violet 1,19,23,29 207,208,209,215,216,245,254,255,264,265 ; 32 ' 36 ' 38 ' 39; CI Pigment Blue 1,2,15,15 : 3,15 : 4,15 : 6,16,22,60,66 ; CI Pigment Green 7,36 ' 37 ; CI Pigment Brown 23,25,28 ; CI Pigment Black 1,70 The average particle diameter of the primary particles of the pigment is preferably from 10 nm to 200 nm, more preferably from 20 nm to 150 nm, most preferably from 30 nm to 130 nm. If necessary, the pigment (E) may be accompanied by a dispersing agent such as a surfactant such as a cationic system, an anionic system, a nonionic system, an amphoteric group, a polyoxane system or a system I. The surfactant may be used alone or in combination of one or more of the following: polyepoxyethane t-dodecyl ether, polyepoxylybdenum decyl ether, polyepoxy furnace oil polycyclic ring Oxygen ethene polyepoxy 201241561 Ethylene octyl phenyl ether, polyethylene oxide fluorenyl ether, and other polyethylene oxide alkyl ether ethers; polyethylene glycol dilaurate, polyethylene glycol II Polyethylene glycol diesters such as stearate; sorbitan fatty acid esters; fatty acid modified polyacetates; tertiary amine modified polyamine phthalates; Sigma-Phase products manufactured by Shin-Etsu Chemical Co., Ltd. SF-8427 from Toray Dow Corning Silicon, Polyflow from Kyoei Oil & Fat Chemical Industry, and Love Dopp (by Tochem Products Co., Ltd.) — τ〇ρ) Products, Megafac products manufactured by Otsuka Ink Chemical Industry Co., Ltd. 'Suluo 3M's Fluorade products, Asahi Guard's Asahi Guard products, Asahi Glass's surfi〇n product is 1 part by weight based on the total weight of the alkali-soluble resin. The content of the pigment is between 100 parts by weight and 500 parts by weight, preferably 12 parts by weight, based on the weight of the photosensitive resin composition of the invention, which is the aforementioned soluble resin, the ethylene-containing a compound of an unsaturated group, the photoinitiator: the organic solvent, and the pigment are essential components, and can be further added as needed - for example: a surfactant, a filler, a polymer compound (referring to Other than pure resin, adhesion promoter, antioxidant, ultraviolet absorber, anti-aggregation agent, and the like. In the above, the interfacial activator can improve the applicability of the present invention, and is specifically, for example, the surfactant used in conjunction with the pigment π; the total weight of the soluble resin is 1 〇 Β, The content of the surfactant is 丨 丨 〇 〜 〜 〜 〜 〜 〜 〜 M M l l l l l l l l l l l l l l l l l l l l l l l l l l l l l l l l l l l 。 。 25 201241561 Furthermore, the filler may be glass or aluminum; the polymer compound may be polyethylene glycol, polyethylene glycol monoalkyl ether or polyfluoroalkyl acrylate; the adhesion promoter may be vinyl three曱 decyl decane, vinyl triethoxy decane, vinyl tris(2-decyloxyethoxy) decane, nitrogen _(2_aminoethyl)_3_aminopropyl decyl decyloxydecane, nitrogen _(2_Aminoethyl)_3_aminopropyltrimethoxy decane, 3-aminopropyltriethoxydecane, 3-glycidylpropyltrimethoxy decane, 3-epoxypropanol Propylmercaptodimethoxydecane, 2-(3,4-epoxycyclohexyl)ethyltrimethoxydecane, 3-propylmethyldimethoxydecane, 3-cyclopropyltrimethoxyl Decane, 3-methacryloxypropyltrimethoxyoxydecane, 3-thiolpropyltrimethoxydecane; the antioxidant may be 2,2_thiobis(4-methyl-6-third Butylphenol), 2,6-di-tert-butylphenol; the ultraviolet absorber may be 2-(3-t-butyl-5-methyl-2.hydroxyphenyl)_5_phenylphenyl azide , alkoxybenzophenone; the anti-agglomerating agent may be polypropylene Acid sodium. The content of the filler, the polymer compound other than the alkali-soluble resin, the adhesion promoter, the antioxidant, the ultraviolet absorber, the anti-aggregation agent, and the like is 1 part by weight based on the total weight of the alkali-soluble resin. It is between 〜10 parts by weight, preferably 〇6 parts by weight, more preferably 0 parts by weight to 3% by weight. The photosensitive resin composition of the present invention is prepared by mixing and dissolving the alkali-soluble resin, the ethylenically unsaturated group-containing compound, the photoinitiator, and the like in the organic solvent, and then adding the pigment. Further, an additive such as a surfactant, a adhesion promoter, or the like is added to uniformly mix, and the photosensitive resin composition in a solution state can be prepared. 26 201241561 The color filter of the present invention comprises a pixel colored layer formed by subjecting the photosensitive resin composition to lithography. In the production of the color calender sheet, the photosensitive resin composition of the present invention in a solution state is applied onto a substrate by a coating method such as spin coating or roll coating. The substrate may be an alkali-free glass, a soda-lime glass, a hard glass (Pyles glass), a quartz glass, and the like, or a glass-attached transparent conductive film, or a photoelectric conversion device (for a liquid crystal display device). For example, the substrate of the solid-state imaging device), and further, when the photosensitive resin composition is coated on the substrate, the black matrix for shielding the coloring layer of the pixel, such as red, green, and blue, is first isolated. The black matrix is formed on the substrate. After coating, most of the organic solvent contained in the photosensitive resin composition is removed by vacuum drying, and the residual organic ridge agent is completely removed by pre-bake (pre_bake) to form a pre-baked coating film. In the process, the operating conditions under reduced pressure drying and pre-baking are different depending on the type and mixing ratio of each component, and the drying under reduced pressure is carried out under the pressure of OmmHg~200mmHg for 1 second to 60 seconds. Perform i minutes to 15 minutes at a temperature of 7 ° C to 1 HTC. After prebaking, the prebaked film is exposed by a mask having a specific pattern. The light used in the exposure process, the M g line, the b line, the i line, etc., the outer line is preferred, and the device for emitting ultraviolet light may be an (ultra) high pressure mercury lamp and a metal lamp. After the exposure, the pre-baked coating film is immersed in an developing solution having a temperature of 23±2° C. for about 15 seconds to 5 minutes, and the undesired portion of the pre-baked coating film 27 201241561 is removed. A predetermined pattern is formed on the substrate. The developing solution used may be sodium hydroxide, potassium hydroxide, sodium carbonate, sodium hydrogencarbonate, potassium carbonate, potassium hydrogencarbonate, sodium citrate, sodium decyl citrate ammonia, ethylamine, diethylamine, hydrazine. Alkaline compounds such as ethanolamine, tetramethylammonium hydroxide, tetraethylammonium hydroxide, choline, pyrrole, acridine or u-diazabicyclo-(5,4,0)-7-deca-ene The alkaline aqueous solution is generally composed at a concentration of between 0.001% by weight and 10% by weight, preferably between 5% and 5% by weight, and more preferably 〇·〇1% by weight to 1% by weight. between. Then, the pattern on the substrate is washed with water, and the pattern is air-dried by compressed air or compressed nitrogen. Finally, the pattern is heat-treated (post-bake) by a heating device such as a hot plate or an oven, and the heating temperature is set at Between 15 ° ° C and 250 ° C 'The heating time when using the hot plate is 5 minutes to 6 minutes, and the heating time when using the oven is 15 minutes to 150 minutes, so that the pattern is fixed and formed into a single pixel. Colored layer. By repeating the above steps, a pixel colored layer such as red, green, or blue can be formed on the substrate in this order. Next, an IOT protective film is sputter-sputtered on the surface of the halogen-colored layer under a vacuum environment having a temperature between 220 ° C and 250 ° C, and if necessary, etching and wiring the IT 0 protective film is performed. Further, an alignment film is coated on the surface of the IT0 protective film to form the color filter. The liquid crystal display device of the present invention comprises the color filter. Further, in the manufacture of the liquid crystal display device (such as a liquid crystal panel), a glass substrate in which a thin film transistor (TFT) is mounted and an alignment film is coated is used in the above-mentioned 28 201241561. An intervening gap is disposed between the color filter and the glass substrate, and liquid crystal molecules are injected into the gap, and then a polarizing plate is attached to the outer surface of the color filter and the outer surface of the glass substrate. The liquid crystal display device. The invention is further illustrated by the following examples, but it is understood that the illustrated embodiments are only illustrative and not to be construed as limiting. [Synthesis Examples 1 to 12 of the First Test Solvent Resin] A nitrogen inlet port, a stirrer, a heater, a condenser tube, and a thermometer were placed on a four-necked cone bottle having a volume of 1000 ml, and according to 纟! The ratio of the type of the component to the amount used is prepared, and the first unsaturated monomer, the second unsaturated monomer, the third unsaturated monomer, the fourth unsaturated monomer, and the polymerization required for synthesizing the soluble resin are prepared. Ingredients such as initiator and solvent. When the polymerization is carried out, the first unsaturated monomer, the second unsaturated monomer, the third unsaturated monomer and the fourth unsaturated monomer are continuously added to the four-necked flask, and Mix and mix, while raising the oil temperature of the four-necked flask to 10 (rc; the other initiator is dissolved in the solvent and divided into five equal parts, each interval - hour added - equal parts to the In the four-necked flask, the reaction temperature of the whole polymerization process is maintained at (10). c, the polymerization time is maintained for 6 hours. After the polymerization is completed, the polymerization product is taken out from the four-necked flask, and the solvent is devolatilized. The first alkali-soluble resin. [Examples of the photosensitive resin composition! to 8, and comparative examples] to 8]: The ratio of the type of the component to the amount of use shown in 4 2 is required to prepare the photosensitive resin composition. Soluble resin (including the first test 29 201241561 soluble resin and the second test soluble resin), the ethylenically unsaturated group-containing compound (including the first compound and the second compound), a photoinitiator, an organic solvent With pigments and other ingredients. The ethylenically unsaturated group-containing compound, the photoinitiator, and the pigment are added to the organic solvent, and then dissolved and mixed by a shaking type stirrer to prepare the photosensitive resin composition, which will be described later. The evaluation method was carried out to measure the characteristics, and the evaluation results obtained are shown in Table 2. [Evaluation method] 1. The photosensitive resin composition prepared by the use of the antimony minerality forms a pixel colored layer on a glass substrate. Then, an IT 〇 film having a film resistance of 14.6 n/sq and a film thickness of 2 〇 4 〇a was sputtered on the enamel colored layer to have a temperature of 22 generations to obtain the color enamel sheet. The surface condition of the colored layers of red, blue, green, etc. of the color filter was observed by a 100-fold optical microscope, and evaluated according to the following criteria: 〇: no cracks or scratches _△. a few cracks and surface scratches X: Cracks and surface scratches are more than two. Bubble-like display defects. The liquid crystal display device produced by using the color light-diffusing sheet is placed in an environment of a temperature of 1 GG ° C and a humidity of 95 RH %, and the macroscopic observation of the bubble-like display defects When it appears Between ti and based on the following criteria 30 201241561 Price: ◎ : I > 500 hours 300: 300 hours < ti$ 500 hours △ · 1 〇〇 hours < ti $ 300 hours X : I < 100 hours three Development property (or development speed) The prepared photosensitive resin composition was applied by spin coating on a glass substrate of a - (10) surface, and the pressure was first set to 1 mmHg for a period of time. Drying under reduced pressure for 30 seconds, and then pre-baking with a dish size of 80 C and a 3 minute period to form a pre-baked film with a film thickness of Ι.Ο/zm. Then 'take 2 weight 2 ml of a potassium hydroxide aqueous solution was dropped on the prebaked coating film, and the time t2 required for the dissolution of the prebaked coating film was measured, which corresponds to the development time, and was evaluated according to the following criteria: 〇: t2 $ 1 〇 Seconds X: t2> ίο Seconds [Results Analysis] The results of Table 2 show that if you will start, you will find her examples 1 to 8, based on the total weight of the alkali-soluble resin, 100 parts by weight, A .. T The use weight of the first alkali-soluble resin in shai is between 30 and 90 parts by weight, and the first to fourth unsaturated sheets are The total weight of the mixture of the body is 1 〇〇 旦 + υυ υυ 里 ' ' ' ' ' ' ' ' ' ' ' ' ' ' ' ' ' ' ' ' ' ' ' ' ' ' ' ' ' ' ' ' ' ' ' ' ' ' ' ' ' ' ' ' ' ' ' ' ' ' ' ' ' ' ' ' ' ' ' ' ' ' ' ' ' ' ' ' ' ' ' ' ' ' ' ' The photosensitive resin composition prepared between 0.01 to 0.40 and between 25 and 6 parts by weight is used in the process of forming a color filter of a color filter. Excellent resistance to plating and developability, and the liquid crystal display made of this color filter is "expanded, and there is no bubble display defect at all." In contrast, the comparatively soluble resin (i.e., Synthesis Examples 7 to 9) used in Comparative Examples 2 to 5' has a weight ratio of the second unsaturated monomer to the third unsaturated monomer greater than 〇.4. 〇 'More like a comparison example? 8, the first alkali-soluble resin used (ie, Synthesis Examples 1 to 12), 1 '', the weight ratio of the monounsaturated monomer to the third unsaturated monomer is less than 〇〇1, and Containing a second unsaturated monomer or a third unsaturated monomer, the prepared photosensitive resin composition exhibits rhythm and developability in the process of forming a coloring layer of a color light-passing sheet. Poor, (4), the liquid crystal display device manufactured by this color light film will produce a more serious bubble display: trapping. In the above, the photosensitive resin composition of the present invention, the color filter using the same, and the liquid crystal display device, the first-time soluble resin used for controlling the photosensitive resin composition, the second non-fresh single The weight ratio of the body to the third unsaturated monomer is between G()1 and (4), so that the photosensitive resin composition can exhibit excellent developability in the lithography process. The toner layer formed by using the photosensitive resin composition of the light-receiving sheet can exhibit excellent splash resistance, and at the same time, the liquid crystal display device manufactured by using the color filter has no bubble-like display defects. The above is only the preferred embodiment of the present invention, and the scope of the present invention is limited thereto, that is, the simple content of the invention according to the invention and the contents of the monthly description. 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| TW100112232A TWI420244B (en) | 2011-04-08 | 2011-04-08 | Photosensitive resin composition, and color filter and liquid crystal display device made by using the composition |
| CN201210077899.8A CN102736411B (en) | 2011-04-08 | 2012-03-22 | Photosensitive resin composition, and color filter and liquid crystal display device using same |
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| TW100112232A TWI420244B (en) | 2011-04-08 | 2011-04-08 | Photosensitive resin composition, and color filter and liquid crystal display device made by using the composition |
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| US20140246633A1 (en) * | 2013-03-01 | 2014-09-04 | Chi Mei Corporation | Photosensitive resin composition for color filters and uses thereof |
| TWI483072B (en) * | 2013-08-09 | 2015-05-01 | Chi Mei Corp | Photosensitive resin composition and its application |
| US9392688B2 (en) | 2014-07-07 | 2016-07-12 | Industrial Technology Research Institute | Biomass photosensitive material and method for manufacturing the same, and printed circuit board |
| CN107003604A (en) * | 2014-10-15 | 2017-08-01 | 奇美实业股份有限公司 | Photosensitive resin composition, the manufacture method of colored filter, colored filter and liquid crystal display device |
| CN108287452A (en) * | 2018-01-24 | 2018-07-17 | 浙江福斯特新材料研究院有限公司 | It is a kind of that there is rapid development and the excellent Photosensitve resin composition for covering special-shaped pore performance |
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| JP3912405B2 (en) * | 2003-11-11 | 2007-05-09 | 三菱化学株式会社 | Curable composition, cured product, color filter, and liquid crystal display device |
| CN1248052C (en) * | 2004-03-26 | 2006-03-29 | 奇美实业股份有限公司 | Light sensitive resin compsn. for black matrix |
| CN101082771B (en) * | 2006-05-30 | 2010-06-16 | 奇美实业股份有限公司 | Photosensitive resin composition for colorful color filter |
| JP5256645B2 (en) * | 2006-05-31 | 2013-08-07 | 三菱化学株式会社 | Thermosetting composition for protective film, cured product, and liquid crystal display device |
| JP4640505B2 (en) * | 2006-09-12 | 2011-03-02 | 日立化成工業株式会社 | Black photosensitive resin composition, method for forming black matrix, method for producing color filter, and color filter |
| JP5205940B2 (en) * | 2006-12-22 | 2013-06-05 | 住友化学株式会社 | Photosensitive resin composition |
| JP5083540B2 (en) * | 2007-03-20 | 2012-11-28 | Ｊｓｒ株式会社 | Radiation-sensitive protective film forming resin composition, method for forming protective film from the composition, liquid crystal display element, and solid-state imaging element |
| JP5528677B2 (en) * | 2008-03-31 | 2014-06-25 | 富士フイルム株式会社 | Polymerizable composition, light-shielding color filter for solid-state image sensor, solid-state image sensor, and method for producing light-shielding color filter for solid-state image sensor |
| CN101750892B (en) * | 2008-12-02 | 2012-01-18 | 奇美实业股份有限公司 | Photosensitive resin composite and color filter therefrom |
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2011
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| US20140246633A1 (en) * | 2013-03-01 | 2014-09-04 | Chi Mei Corporation | Photosensitive resin composition for color filters and uses thereof |
| TWI483071B (en) * | 2013-03-01 | 2015-05-01 | Chi Mei Corp | Photosensitive resin composition for color filters and uses thereof |
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| TWI483072B (en) * | 2013-08-09 | 2015-05-01 | Chi Mei Corp | Photosensitive resin composition and its application |
| US9568763B2 (en) | 2013-08-09 | 2017-02-14 | Chi Mei Corporation | Photosensitive resin composition and uses thereof |
| US9392688B2 (en) | 2014-07-07 | 2016-07-12 | Industrial Technology Research Institute | Biomass photosensitive material and method for manufacturing the same, and printed circuit board |
| CN107003604A (en) * | 2014-10-15 | 2017-08-01 | 奇美实业股份有限公司 | Photosensitive resin composition, the manufacture method of colored filter, colored filter and liquid crystal display device |
| TWI620011B (en) * | 2014-10-15 | 2018-04-01 | 奇美實業股份有限公司 | Photosensitive resin composition, manufacturing method for color filter, color filter and liquid crystal display element using the same |
| CN107003604B (en) * | 2014-10-15 | 2020-08-11 | 奇美实业股份有限公司 | Photosensitive resin composition, method for producing color filter, and liquid crystal display device |
| CN108287452A (en) * | 2018-01-24 | 2018-07-17 | 浙江福斯特新材料研究院有限公司 | It is a kind of that there is rapid development and the excellent Photosensitve resin composition for covering special-shaped pore performance |
| CN108287452B (en) * | 2018-01-24 | 2021-04-06 | 浙江福斯特新材料研究院有限公司 | Photosensitive resin composition with rapid development and excellent irregular hole covering performance |
Also Published As
| Publication number | Publication date |
|---|---|
| CN102736411B (en) | 2014-10-15 |
| TWI420244B (en) | 2013-12-21 |
| CN102736411A (en) | 2012-10-17 |
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