TW201239550A - Discharge lamp - Google Patents

Discharge lamp Download PDF

Info

Publication number
TW201239550A
TW201239550A TW101105585A TW101105585A TW201239550A TW 201239550 A TW201239550 A TW 201239550A TW 101105585 A TW101105585 A TW 101105585A TW 101105585 A TW101105585 A TW 101105585A TW 201239550 A TW201239550 A TW 201239550A
Authority
TW
Taiwan
Prior art keywords
light
line
sensitivity
spectral
discharge lamp
Prior art date
Application number
TW101105585A
Other languages
Chinese (zh)
Other versions
TWI536119B (en
Inventor
Akiyoshi Fujimori
Nobuo Kanai
Kazumasa FUJIHARA
Kei Kamijo
Yosuke Magumo
Original Assignee
Orc Mfg Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Orc Mfg Co Ltd filed Critical Orc Mfg Co Ltd
Publication of TW201239550A publication Critical patent/TW201239550A/en
Application granted granted Critical
Publication of TWI536119B publication Critical patent/TWI536119B/en

Links

Classifications

    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70Microphotolithographic exposure; Apparatus therefor
    • G03F7/70483Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
    • G03F7/7055Exposure light control in all parts of the microlithographic apparatus, e.g. pulse length control or light interruption
    • G03F7/70558Dose control, i.e. achievement of a desired dose
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01JMEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
    • G01J1/00Photometry, e.g. photographic exposure meter
    • G01J1/02Details
    • G01J1/0219Electrical interface; User interface
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01JMEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
    • G01J1/00Photometry, e.g. photographic exposure meter
    • G01J1/02Details
    • G01J1/0233Handheld
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01JMEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
    • G01J1/00Photometry, e.g. photographic exposure meter
    • G01J1/02Details
    • G01J1/04Optical or mechanical part supplementary adjustable parts
    • G01J1/0488Optical or mechanical part supplementary adjustable parts with spectral filtering
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J61/00Gas-discharge or vapour-discharge lamps
    • H01J61/82Lamps with high-pressure unconstricted discharge having a cold pressure > 400 Torr
    • H01J61/822High-pressure mercury lamps
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J61/00Gas-discharge or vapour-discharge lamps
    • H01J61/84Lamps with discharge constricted by high pressure
    • H01J61/86Lamps with discharge constricted by high pressure with discharge additionally constricted by close spacing of electrodes, e.g. for optical projection
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05BELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
    • H05B41/00Circuit arrangements or apparatus for igniting or operating discharge lamps
    • H05B41/14Circuit arrangements
    • H05B41/36Controlling
    • H05B41/38Controlling the intensity of light

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Engineering & Computer Science (AREA)
  • Human Computer Interaction (AREA)
  • Photometry And Measurement Of Optical Pulse Characteristics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Plasma & Fusion (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)

Abstract

An exposure apparatus of the present invention is provided with: a discharge lamp, which radiates light that includes emission lines, i.e., the g line (436 nm), the h line (405 nm) and the i line (365 nm); a light measuring means, which has a light receiving section, and measures the light radiated from the discharge lamp; and an illumination adjusting means, which, on the basis of a measurement value obtained from the light measuring means, adjusts power to be supplied to the discharge lamp. The light measuring means has spectral sensitivity characteristics having peak sensitivities between two adjacent emission lines among the g line, the h line and the i line.

Description

201239550 六、發明說明: 【發明所屬之技術領域】 本發明係有關於測定光照度等之測光裝置,特別是關 於被使用於曝光裝置的放電燈的放射光的光測定。 【先前技術】 曝光裝置中’對於塗布了光阻劑等的感光材料的基板 投影圖形光,在感光材料上形成圖形。為了形成高精度的 圖形,在曝光動作時,必須要以一定的照射量照射光。因 此’在曝光的空隙時使用測光裝置測量照度等,以調整對 放電燈的供應電力進行亮燈控制(例如參照專利文獻1、2)。 在曝光裝置中係使用發出包含g線(436nm)、h線 (405nm)、i線(365nm)的亮線的高壓/超高壓水銀燈(參照 專利文獻3 )。感光材料具有基於亮線的感度特性,在照度 測疋裝置中’設有去除g線、h線、i線之外的光的濾器, 依據透過濾器的光测定照度(例如參照專利文獻4)。 先前技術文獻 專利文獻 [專利文獻1 ]特開平8-8154號公報 [專利文獻2]特開20 0 2-5 736號公報 [專利文獻3]特開2010_85954號公報 [專利文獻4]特開2〇〇2_34〇667號公報 【發明内容】 [發明欲解決的課題] 在上述的放電燈中,因為放電管内為高壓,容易出現 3 201239550 放射照度被放電變動造成的雜訊支配的狀態。尤其是在其 線附近’因為光能的自我吸收而產生變化,被測量的亮線 附近的光譜值,明顯地被雜訊的放電變動影響。 因此,即使沒有發生實質性的燈輸出下降、放射光譜 分佈全體的變化小,也會發生亮線附近的放射光譜變動狀 況。另一方面,即使實際上因為燈的輸出下降而使得放射 光譜分佈全體變動,和該全體變動量相比,也會發生亮線 附近的放射光譜變動小的狀況。 對於具有這種放射特性的放電燈’若使用具有配合亮 線的峰值透過率的濾器進行照度檢出,就會被峰值附近的 雜訊光譜變動所影響,而無法正確檢出光譜全體的照度。 其結果為,依據錯誤的照度測量進行電力調整,在燈點燈 時,不必要的電力變動頻繁地連續不斷,而給燈壽命帶來 景/響另外,在照度以外的測光演算中,也檢測出錯誤的 測光值。 [用於解決課題的手段] 本發明的曝光裝置,包括:放電燈,其放射包含§線 (436rnn)、h線(405nm)、丨線(365測)的亮線的光;光測定 單元’其具有受光部’測定從前述放電燈放射的光;以及 …月調整單元,依據前述光測定單元的測定值,調整向前 述放電燈提供的電力。 可以使用鬲壓或者超高壓水銀燈作為放電燈,在這種 凊况下,產生包含g線、h線、i線的亮線光譜的光譜放 射光的光5普分佈為,在對應於三個亮線的窄波長域中具有 201239550 大的相對光譜強度的連續的分光分佈曲線。例如放電燈可 以使用將0.2mg/_3以上的水銀封入放電管的水銀燈。 光測定單元的受来部i ,,, 例如,具有光電變換部件等 的受光部件、以及配置在入射光路上的渡器等,依據入射 到受光部件的光所產生的電氣訊號測定。受光部的分光感 度特性係可以依據受光部件的分光感度特性以及渡器的分 光透過特性決定。當受光部件的分光感度並不在特定波長 域有偏向感度’而在全體波長域大致為一定的情況下,遽 器的分光透過特性直接被顯現為受光部的分光感度特性。 光測定單元能夠測定照度、亮度、光量等和放電燈的 放射光相關的各種各樣的物理量中的任何一種,以作為測 定值。光調整單元調整供應電力,使得被測出的測光值維 持在適當的值或一定的值。 一在本發明中’光測定單㈣分光感度特性為,在相鄰 2條亮線之間設立學值感度,亦即匕線⑼㈣和匕線⑷㈣ 之間或者h線(405nm)和g線(436nm)之間。 亦即,受光部的峰值感度是在從本來應該要注視之匕 線、1線移開的位置’在分光感度特性中h線和i線的感 度(光譜值)低於峰值感度。以峰值感度作為頂點而向丨線 以及h線的感度(光譜值)變低,所以,即使在亮線附近發 生雜訊的支配性放電變動,也不會被該變動大幅影響,而 能夠測定放電燈的光。 / θ 例如,進行定照度點燈控制的時候’可以對應於正確 疋的照度來調整電力’而不會因為錯誤的電力調整而產 5 201239550 生本來不需要的電力變動,而能夠實現穩定的定照度點燈。 分光感度特性可以用以峰值感度為中心的略高斯分佈 曲線(正規分佈)表示,或者,也可以用帶通(區域)來表示。 分光感度曲線被構成為使其峰值感度盡可能從丄線,匕線 或g線移開即可,例如使峰值在中間域亦可。 一方面避免雜訊的支配性放電變動的影響,另一方面 Γ能在大範圍無遺漏地檢出1線和1線間二皮長域或h 的波長域的光。例如’光測定單元之有效感度 特I1 生最好為其分光感度曲線的半 ..^ ^ s 干見度比1線和h線之間的 :皮IS 此,可以精確地檢測出在1線和h線間的 波長域中的整體的光譜強度。 M 備的有效感度特性為 ==度的_下’分光感度曲線的半寬度… 、’· 3的波長域更大即可。藉此,排除雜訊的影響, 而旎夠更確實執行全體光譜變動的檢出。 ,、 另-方面,本發明的另一樣態的測光裳置,其包括: 交先部’其具有光電轉換部件等的受光部件和 光路上的濾器;測定部,其根據入 、’ 則迷文光部件的光, 進订測光演算;前述受光部具 ^ A nr 、 八 宮線(436nm)、h 線 (4〇5mn)、工線(36511111)中相鄰的二個 ' 分光感度特性。 4間有峰值感度的 在本發明中,也可以藉由受 量正確的昭度、宾产、φ θ & 的刀先感度特性而測 嘴H 7C度、先量等,而能 的測光。上述的分光感度特性作燈的正確 ^用作為更具體的受光 201239550 部的分光感度特性。 測光裝置可以檢出例如照度 別構成為照度計' 亮度計、光量計:二=等,可以分 例如手提(handcarry)型的測光裝置 <、可以構成為 以構成為-體。或者,也 雙光部和測定部可 透過訊號電纜連接。 ’’·、焚光部和測定部之間 於查另方面也可以構成為將受光部構成為以電纜連接 於桌上型的測光農置主體 巧乂電纜連接 力外’將測光裝置安# 裝置、或者光源裝置内使用,或 、" 一 在曝光準備階段中蔣 測光裝置設置於描繪台以進行測光亦可。 在本發明的另一樣態的測光裝置,其包括:受光邱, 其具有受光部件和配置於入射光路上的遽器;測定部,立 根據入射到前述受光部件的A,進行測光演算;前述受光 部具有在相鄰的二個亮線間有峰值感度的分光感度特性。 [發明的效果] 依據本發明,不會被雜訊的支配性放電變動影響,而 能夠恰當地測定放電燈的光。 【實施方式】 以下參照圖式說明本發明的實施形態。 第1圖為第1實施形態的曝光裝置的概略方塊圖。 曝光裝置10,係為在表面上形成光阻劑等感光材料的 基板SW上直接形成圖形的無光罩曝光裝置,包括:放電燈 21、DMD( Dig it al Micro-mirror Dev ice) 24。根據從放電 燈21而來的光照射基板sw,在基板sW的表面上形成圖形 201239550 放電燈21為高壓或者是超高壓水銀燈,例如含有 0. 2mg/mm3以上的水銀。放電燈的光譜在大約330nm-480nm 是連續的光譜分佈’而且,放射出g線(43 6nm)、h線 (405nm)、i線(365nm)的亮線光請光。 從放電燈21放射出的光,藉由照明光學系23形成為 平行光,經過鏡25、半透明反射鏡27A、鏡27B而被導向 DMD24。DMD24為將數# m-數十"m的微鏡2次元排列為矩 陣狀的光變調部件陣列(例如1〇24*768),被曝光控制部6〇 所控制。 DMD24中,依據從曝光控制部6〇傳送過來的曝光數 據’控制使得各微鏡分別選擇地被開/關(〇N/〇FF )❶在 ON狀態的微鏡反射的光,透過半透明反射鏡27被導引向 投影光學彡28 °而且’由QN狀態鏡的反射光所形成的光 束,亦即圖形像的光被照射到基板sw。一邊使基板別移 動一邊在基板全體形成圖形。 曝光裝置10包括由照度演算控制部30、受光部40構 成的’居度測疋控制裝置50。照度測定控制裝置5。測定放 電:旦21的照度’進行定照度點燈控制。藉由受光部40移 :扠々光干系28的照射領域’放電燈21的光被引向受光 P 在、束對一個基板的描畫之後到開始對下一個基板 描畫的期間,依摅 r 康入射到文光部40的光進行照度測定。 支光部4 〇句枯· · & ϊ ^ 匕括.由光電變換部件等構成的受光部件 41配置為面對受弁邮杜j! 又九件41的受光面的濾器42,從框體 部分的窗(去m-、 不)入射的光’通過設置在入射光路上的 201239550 濾器4 2 ’入射到受光部件41。 如後述,濾器42具有使包含g線(436nm)、h線 U05mn) ' i線(365nm)的特定帶域的光通過的分光透過率 特性,去除該帶域之外的波長域的光。因為入射到受光部 件41的光而產生的訊號,被傳送到照度演算控制部。 輸入到照度演算控制部30的訊號,被放大器35施以 增幅處理之後,在A/D變換器34中被轉換為數位訊號。而 且,在演算部36中算出照度。關於照度算出方法,可以用 傳統周知的方法。 照度控制部33,依據照度數據調整由燈驅動部32向 放電燈21提供的電力。藉此,在燈被點亮的期間,係以一 定的照度從放電燈21向基板SW照射光。 第2圖為顯示受光部的分光感度特性的圖。第3圖為 顯不党光部的分光感度特性與放電燈的分光分佈特性的 圖。使用第2、3圖,說明受光部的分光感度特性。 由曝光裝置10形成圖形的基板SW的感光材料多半具 有反應於作為水銀線之g線、h線或丨線上的感光特性。 :第2圖所示’受光部40的分光感度曲線L1係為按照這 些亮線跨波長域34〇_48〇nm的類似高斯分佈的曲線在 385nin有峰值感度P1。在h線(405nm)感度是P2,在i線 (365nm)感度是p3,以相對光譜值最高的峰值η為中心, 約略對稱的分佈曲線。 ^ 在第3圖中,顯示受光部的分光感度曲線li以及放電 燈21的分光分佈曲線SP。在此,受光部的分光感度曲線 201239550 L1係基於濾器42的分光透過率特性和受光部件4丨的分光 感度特性。放電燈21放射包含g線(436nm)、h線(4〇5nm)、 丄線(365ηπ〇亮線的連續的光譜光,在436nm、4〇5nm、365四 左右的狹窄的波長幅具有銳利的光譜能量。另外,因為是 超高壓水銀燈’所以光譜變化相對較緩,而成為在大範圍 展開的連續的分佈曲線。 在燈點亮時,放電燈21的分光分佈因為自我吸收(吸 收光譜)而變動。在第3圖中’顯示在g W436nm)、匕線 U05nm)、i線㈠旰⑽)附近光譜值急劇地下降的分光分佈 曲線’圖示了顯著表現放電燈21的自我吸收現象的分光分 佈特!·生 <象坆樣在特定的狹窄的波長域中的光譜變動在亮 燈中不規則地產生。 ~ 本實施形態的受光部4。的分光感度曲線u的峰值 從h線(405nm)、i線(365nm)偏離,對於相鄰二個亮線 致中間的波長的光有最大的感度。另外’相較於ρι,在 線的波長的感度比R11、及在卜線的波長感度比⑽ 相對於pi = i.G,ru=g.7()、r12=() 61,均為ρι的㈣以下 此外,分光感度曲線的半寬度(AA/2Wh線和卜 之間的波長域寬’ “/2,nm。像這樣,將分光感度^ U中感度高的波長域從h線、i線脫離,不會受到: 收的分光分佈變動的影響,並且,跨越h線和 波長域全體的光透過。 a 其結果為’入射到受光部件41的光的光譜能 _ 會被雜訊的光譜變動支配的光,而能夠恰當地檢出實:: 10 201239550 照度。而且,依據恰當地檢出的照度,執行調整對放電燈 21的供應電力的定照度點燈,以避免頻繁的電力調整。 像這樣地根據本實施形態,使用放電燈21形成圖形的 曝光裝置1 0 ’具有由照度演算控制部3〇以及受光部4〇構 成的照度測定控制裝置5 0,受光部4 0的分光感度曲線l 1 之峰值P1從h線(405nm)、i線(365nm)移開,而設於在相 鄰的二個亮線之大致中間的波長域。在h線和i線的感度 低於峰值感度,在h線的波長的感度比R1、以及在丨線的 波長的感度比R2是P1之85%以下。此外分光感度曲線的 半寬度(△ λ / 2 )較h線和i線之間的波長域寬。 繼之,使用第4〜6圖,說明第2實施形態的測光裝置。 第2貫施形怨中,從曝光裝置獨立的測光裝置被使用於照 度測定。 第4圖為第2實施形態的照度計的模式圖。 手提(handcarry)型的照度計1〇〇包括:具有表示部 129的主體120及受光部11〇’受光部11〇透過安裝於受光 部110的訊號電纜130,連接至主體12〇的接續部127。為 了在未圖示的曝光裝置中進行照度測定,將照度計1〇〇的 文光部11〇設置於基板裝載平台上,並將受光部11〇移向 特疋的測定點。繼之,確認表示於主體i 2〇的表示部】Μ 的照度’調整對放電燈的供應電力。 的方塊圖。 Π0Η的上面的窗112 116’受光部11〇配 第5圖為第2實施形態的照度計 受光部110,在設置於受光部主體 的下方,設有濾器114以及受光部件 201239550 置為和受光部件1 1 6 *日机人 , 向。在此,不僅是具有和第丨t 的刀先感度特性的受光部11〇,還 地將具有後述的分光 乂選擇性 尤4度特性的受光部11〇, 120。 史钱於主體 第6圖為顯示不同於第, 、弟1實施形態的受光部的 度特性的圖。 丨的刀先感 /如第6圖所示’受光部110’的分光感度分佈曲線L2, 係為以大約422nm作為峰值P2的▲你、士 、 值P2的近似尚斯分佈的曲線,峰 子在於g線(436_)和h線(405mn)略中心位置。另 卜相較於P2,在g線的波長的感度比⑵、以及在匕線 的波長的感度比R22較低,相對於P2 = i q r2i = 〇务 R22 = 〇. 71 ’均為P1的85%以下。 此外’分光感度曲線的半寬度(△又/2)較§線和h、線 之間的波長域寬,△又/2 = 43nm。像這樣因為分光感度曲線 ^在々g線和h線的略中間有峰值p 2,所以,不會受到自我 吸收等造成的雜訊支配的光譜變動的影響,並且,讓^線 和1線之間的波長域全體的光譜光適當地通過,引導向受 光部件11 6。 在受光部uo的受光部件116,或者在受光部分110, 的又光。卩件116產生的電氣訊號,經過放大器122施以增 處理之後,由A/D轉換器124轉換為數位訊號。繼之, 在演算部128計算照度。求出的照度數據顯示於表示部 129。控制單疋i26控制主體内部的電源電路、及訊號處理 電路。 201239550 再者,第1、第2實施形態中係構成為照度計作為測 光裝置,但也可以適用亮度計、積算光量計、積算強度計 等別的測光裝置。在此情況下’纟測光裝置主體中,:基 於受光的訊號依據習知的計算處理方法算出亮度、光量、 強度等3外,不僅可以構成為手提()型的, 也可以構成為桌上型的。此外’纟可以藉由使用導溝的滑 動機構等’選擇性地將濾器對受光部裝卸自在地安裝。 也可以使用除上述之外的水銀燈作為放電燈,可以適 用發出連續光譜’而且發出包含g線、h線' i線的亮線之 連續光譜光的放電燈。或者,也可以使用發出包含其他的 複^線的連續光譜光的放電燈。在這種情況下,測光裝 置係構成為具有配合放電燈的特性的分光感度特性。另 外,像第1實施形態-樣,把照度測定裝置組裝於曝光裝 置時,也可以為藉由濾器而具有感度特性的構成。 以下針對本發明的實施例說明。 [實施例] 总本實施例由具有第1、2實施形態說明的分光感度特性 t光部的照度計構成。執行和具有習知的分光感度特性 白’文光部的照度計的比較實驗。 下,7圖為表示對應於i線(3 6 5⑽)的傳統的受光部(以 示稱為第1傳統受光部)的分光感度特性的圖。第8圖為表 A 於h線(405nm)的傳統的受光部(以下稱為第2傳統 又光。卩)的分光感度特性的圖。 第7圖所示的分光感度曲線L3為以大約355mn作為峰 13 201239550 值感度的分佈曲線,在i線(36 5nm)附近的短波長側有最大 的感度。在h線(405nm)波長的感度比R31 = 0,在i線(365nm) 波長的感度比R32 = 0. 90,分光感度曲線的半寬度△又/2 = 是 4 0 nm。 第8圖所示的分光感度曲線L4,係以大約405mn作為 峰值感度的分佈曲線,在h線(405nm)附近的短波長側有最 大的感度。在g線(436nm)波長的感度比R41 = 〇.75,在h 線(405nm)波長的感度比R42 = 0. 99,在i線(365nm)波長的 感度比R43 = 0. 35,分光感度曲線的半寬度△ λ /2 = 75nm。 不論是哪一條分光感度曲線,其峰值感度都是位於容易受 到因為自我吸收的雜訊光譜變動的影響的波長域。 制時的電力變動的圖表。在山 的超高壓水銀燈作為放電燈, 第9圖顯示使用第7圖、第8圖所示之第1、第2傳 統受光部執行定照度點燈控制時的燈供應電力的變動的圖 表。第10圖顯示使用本實施例的受光部進行定照度點燈控 。在此, ’使用水銀〇. 2mg/_3以 ’進行定照度點燈控制。 在使用如第7圖及第8 部的照度計時在燈使用期間 生(參照第9 圖的Ml、M2)。此係表示,201239550 VI. Description of the Invention: [Technical Field] The present invention relates to a photometric device for measuring illuminance and the like, and more particularly to light measurement of emitted light of a discharge lamp used in an exposure device. [Prior Art] In the exposure apparatus, pattern light is projected onto a substrate on which a photosensitive material such as a photoresist is applied, and a pattern is formed on the photosensitive material. In order to form a high-precision pattern, it is necessary to irradiate light with a certain amount of exposure during the exposure operation. Therefore, the illuminance or the like is measured using a photometric device during the exposure of the gap to adjust the lighting power supply to the discharge lamp (see, for example, Patent Documents 1 and 2). A high-pressure/ultra-high pressure mercury lamp emitting a bright line including a g-line (436 nm), an h-line (405 nm), and an i-line (365 nm) is used in the exposure apparatus (see Patent Document 3). The photosensitive material has a sensitivity characteristic based on a bright line, and a filter for removing light other than the g-line, the h-line, and the i-line is provided in the illuminance measuring device, and the illuminance is measured in accordance with the light transmitted through the filter (for example, refer to Patent Document 4). [Patent Document 1] JP-A-2010-85954 (Patent Document 4) 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 Especially in the vicinity of its line, the change in the spectral energy near the bright line, which is measured by the self-absorption of light energy, is obviously affected by the discharge fluctuation of the noise. Therefore, even if the substantial lamp output falls and the change in the entire radiation spectrum distribution is small, the radiation spectrum in the vicinity of the bright line changes. On the other hand, even if the radiation spectrum distribution changes in general due to the decrease in the output of the lamp, a change in the radiation spectrum near the bright line is small as compared with the total fluctuation amount. When a discharge lamp having such a radiation characteristic is used for illuminance detection using a filter having a peak transmittance corresponding to a bright line, it is affected by fluctuations in the noise spectrum near the peak, and the illuminance of the entire spectrum cannot be accurately detected. As a result, power adjustment is performed based on the illuminance measurement of the error, and unnecessary power fluctuations are frequently continued when the lamp is turned on, and the scene/sound is brought to the life of the lamp. In addition, in the photometry calculation other than the illuminance, the power is also detected. The wrong metering value. [Means for Solving the Problem] The exposure apparatus of the present invention includes a discharge lamp that emits light including a bright line of § line (436rnn), h line (405nm), and 丨 line (365 measured); light measuring unit' The light receiving unit ′ measures the light emitted from the discharge lamp; and the ... month adjustment unit adjusts the electric power supplied to the discharge lamp in accordance with the measured value of the light measuring unit. A rolling or ultra-high pressure mercury lamp can be used as the discharge lamp. Under such conditions, the light spectrum of the spectrum of the bright line spectrum including the g line, the h line, and the i line is generated, corresponding to three bright A continuous spectral distribution curve with a relative spectral intensity of 201239550 in the narrow wavelength domain of the line. For example, a discharge lamp can use a mercury lamp in which mercury of 0.2 mg/_3 or more is sealed in a discharge tube. The receiving portion i of the light measuring unit, for example, a light receiving member having a photoelectric conversion member or the like, a ferrite disposed on the incident light path, or the like, is measured based on an electrical signal generated by light incident on the light receiving member. The spectral sensitivity characteristic of the light receiving portion can be determined according to the spectral sensitivity characteristics of the light receiving member and the spectral transmission characteristics of the resonator. When the spectral sensitivity of the light-receiving member is not biased in the specific wavelength region and the entire wavelength region is substantially constant, the spectral transmission characteristic of the device is directly expressed as the spectral sensitivity characteristic of the light-receiving portion. The light measuring unit can measure any one of various physical quantities related to the emitted light of the discharge lamp such as illuminance, brightness, amount of light, and the like as a measured value. The light adjustment unit adjusts the supplied electric power so that the measured photometric value is maintained at an appropriate value or a certain value. In the present invention, the light-sensing single (four) spectral sensitivity characteristic is such that a sensitivity value is established between adjacent two bright lines, that is, between the 匕 line (9) (four) and the 匕 line (4) (four) or the h line (405 nm) and the g line ( Between 436nm). In other words, the peak sensitivity of the light-receiving portion is a position at which the h-line and the i-line (spectral value) are lower than the peak sensitivity in the spectral sensitivity characteristic at the position where the line is supposed to be viewed and the line is removed. Since the sensitivity (spectral value) of the squall line and the h line is lowered as the peak sensitivity, the dominant discharge fluctuation of the noise occurs in the vicinity of the bright line, and the discharge can be measured without being greatly affected by the fluctuation. The light of the light. / θ For example, when the illuminance lighting control is performed, 'the power can be adjusted according to the illuminance of the correct ' 而 而 而 2012 2012 2012 2012 2012 2012 2012 2012 2012 2012 2012 2012 2012 2012 2012 2012 2012 2012 2012 2012 2012 2012 2012 2012 2012 2012 2012 2012 2012 2012 Illumination lights. The spectral sensitivity characteristic can be expressed as a slightly Gaussian distribution curve (normal distribution) centered on the peak sensitivity, or can be represented by a band pass (region). The spectral sensitivity curve is configured such that its peak sensitivity is removed as much as possible from the squall line, the squall line or the g line, for example, the peak is in the intermediate domain. On the one hand, it avoids the influence of the dominant discharge fluctuation of the noise, and on the other hand, it can detect the light in the wavelength range of the two-field length or the h-direction between the 1 line and the 1 line in a wide range. For example, the effective sensitivity of the light measuring unit is preferably half of the spectral sensitivity curve.. ^ ^ s Between the 1 line and the h line: the skin IS, which can be accurately detected in the 1 line The overall spectral intensity in the wavelength domain between the h line and the h line. The effective sensitivity characteristic of the M device is half width of the _lower spectral sensitivity curve of == degrees, and the wavelength domain of '·3 is larger. In this way, the influence of noise is eliminated, and the detection of the entire spectral change is performed more reliably. According to another aspect of the present invention, there is provided a light measuring skirt according to another aspect of the present invention, comprising: a light receiving member having a photoelectric conversion member or the like and a filter on an optical path; and a measuring portion according to the input, 'the fan light The light of the component, the bookbinding light metering calculation; the light-receiving part has two adjacent light-splitting characteristics of the adjacent ones of the A nr , the eighth line (436 nm), the h line (4〇5mn), and the line (36511111). In the present invention, it is also possible to measure the light by measuring the H 7C degree, the first amount, etc., by the correct sensitivity characteristics of the illuminance, the φ θ & The above-mentioned spectral sensitivity characteristics are used as the correctness of the lamp as a more specific spectral sensitivity characteristic of the received light of 201239550. The photometric device can detect, for example, an illuminance meter, a illuminometer, a illuminance meter, a light meter, a second, etc., and can be divided into, for example, a hand-carrying type photometric device <; Alternatively, the dual light section and the measuring section can be connected via a signal cable. In addition, the light-receiving unit and the measuring unit may be configured to connect the light-receiving unit to a meter-type metering agricultural main body by a cable. Or, used in the light source device, or, "In the exposure preparation stage, the Jiang metering device is installed at the drawing station for metering. A photometric apparatus according to another aspect of the present invention includes: a light receiving member having a light receiving member and a buffer disposed on the incident light path; and a measuring unit that performs light metering calculation based on A incident on the light receiving member; and the light receiving operation The portion has a spectral sensitivity characteristic having a peak sensitivity between two adjacent bright lines. [Effects of the Invention] According to the present invention, it is possible to appropriately measure the light of the discharge lamp without being affected by the fluctuation of the dominant discharge of the noise. [Embodiment] Hereinafter, embodiments of the present invention will be described with reference to the drawings. Fig. 1 is a schematic block diagram of an exposure apparatus according to a first embodiment. The exposure apparatus 10 is a maskless exposure apparatus that directly forms a pattern on a substrate SW on which a photosensitive material such as a photoresist is formed on the surface, and includes a discharge lamp 21 and a DMD (Dig it al Micro-mirror Dev ice) 24. The substrate sw is irradiated with light from the discharge lamp 21, and a pattern is formed on the surface of the substrate sW. The current discharge lamp 21 is a high pressure or an ultrahigh pressure mercury lamp, for example, containing mercury of 0.2 mg/mm3 or more. The spectrum of the discharge lamp is a continuous spectral distribution at about 330 nm to 480 nm and emits light from the bright line of the g line (43 6 nm), the h line (405 nm), and the i line (365 nm). The light emitted from the discharge lamp 21 is formed into parallel light by the illumination optical system 23, and is guided to the DMD 24 via the mirror 25, the half mirror 27A, and the mirror 27B. The DMD 24 is an array of optically modulating components (for example, 1 〇 24 * 768) in which the micromirrors of the number # m - tens of "m" are arranged in a matrix, and are controlled by the exposure control unit 6A. In the DMD 24, the light reflected from the micro-mirror in which the respective micromirrors are selectively turned on/off (〇N/〇FF) in the ON state is transmitted in accordance with the exposure data transmitted from the exposure control unit 6 through the semi-transparent reflection. The mirror 27 is guided to the projection optical 彡 28 ° and the light beam formed by the reflected light of the QN state mirror, that is, the light of the pattern image is irradiated onto the substrate sw. A pattern is formed on the entire substrate while moving the substrate. The exposure device 10 includes a home temperature measurement control device 50 composed of an illuminance calculation control unit 30 and a light receiving unit 40. The illuminance measurement control device 5. The discharge is measured: the illuminance of 21 is performed by the illuminance lighting control. By the light-receiving portion 40, the light of the discharge light 21 of the fork light-drying system 28 is guided to the light-receiving P, and after the drawing of one of the substrates is started until the next substrate is drawn, the light is incident. The light to the light portion 40 is measured for illuminance. The light-receiving unit 4 is configured to face the light-receiving surface of the light-receiving surface of the nine-piece 41, and the light-receiving member 41 is provided. Part of the window (to m-, no) incident light 'is incident on the light-receiving member 41 through the 201239550 filter 4 2 ' provided on the incident light path. As will be described later, the filter 42 has a spectral transmittance characteristic that passes light of a specific band including the g-line (436 nm) and the h-line U05mn) 'i line (365 nm), and removes light in a wavelength range other than the band. The signal generated by the light incident on the light receiving unit 41 is transmitted to the illuminance calculation control unit. The signal input to the illuminance calculation control unit 30 is subjected to an amplification process by the amplifier 35, and then converted into a digital signal by the A/D converter 34. Further, the illuminance is calculated by the calculation unit 36. Regarding the illuminance calculation method, a conventionally known method can be used. The illuminance control unit 33 adjusts the electric power supplied from the lamp driving unit 32 to the discharge lamp 21 based on the illuminance data. Thereby, the light is irradiated from the discharge lamp 21 to the substrate SW with a certain illuminance while the lamp is being turned on. Fig. 2 is a view showing the spectral sensitivity characteristics of the light receiving portion. Fig. 3 is a graph showing the spectral sensitivity characteristics of the light portion of the party and the spectral distribution characteristics of the discharge lamp. The spectral sensitivity characteristics of the light receiving unit will be described using Figs. 2 and 3 . The photosensitive material of the substrate SW patterned by the exposure device 10 is mostly responsive to the photosensitive characteristics of the g-line, the h-line or the ridge line as the mercury line. The diffracted sensitivity curve L1 of the light-receiving portion 40 shown in Fig. 2 is a curve having a similar Gaussian distribution across the wavelength range of 34 〇 _ 48 〇 nm in accordance with these bright lines, and has a peak sensitivity P1 at 385 nin. The sensitivity at the h line (405 nm) is P2, the sensitivity at the i line (365 nm) is p3, and the distribution curve is approximately symmetric with the peak η having the highest relative spectral value as the center. ^ In Fig. 3, the spectral sensitivity curve li of the light receiving portion and the spectral distribution curve SP of the discharge lamp 21 are displayed. Here, the spectral sensitivity curve of the light-receiving portion 201239550 L1 is based on the spectral transmittance characteristics of the filter 42 and the spectral sensitivity characteristics of the light-receiving member 4A. The discharge lamp 21 emits continuous spectral light including a g-line (436 nm), an h-line (4 〇 5 nm), and a 丄 line (365 η π 〇 bright line, and has a sharp wavelength range of 436 nm, 4 〇 5 nm, and 365 or so. Spectral energy. In addition, because it is an ultra-high pressure mercury lamp, the spectral change is relatively slow, and it becomes a continuous distribution curve spread over a wide range. When the lamp is turned on, the spectral distribution of the discharge lamp 21 is self-absorption (absorption spectrum). The spectroscopic distribution curve in which the spectral value sharply decreases in the vicinity of 'the display line at the g W436 nm) and the i line (a) 旰 (10) in Fig. 3 illustrates the spectroscopic representation of the self-absorption phenomenon of the discharge lamp 21 remarkably. The distribution of the spectral changes in the specific narrow wavelength domain is irregularly generated in the lighting. ~ The light receiving unit 4 of the present embodiment. The peak of the spectral sensitivity curve u deviates from the h line (405 nm) and the i line (365 nm), and has the greatest sensitivity to the light of the intermediate wavelength between the adjacent two bright lines. In addition, compared with ρι, the sensitivity ratio of the wavelength of the line is R11, and the wavelength sensitivity ratio (10) of the line is relative to pi = iG, ru=g.7(), r12=() 61, both are ρι (4) or less. In addition, the half width of the spectral sensitivity curve (the wavelength range between the AA/2Wh line and the pad is '/2, nm.) Thus, the wavelength range in which the sensitivity is high in the spectral sensitivity is separated from the h line and the i line. It is not affected by the variation of the received spectral distribution, and the light passing through the h-line and the entire wavelength domain is transmitted. a The result is that the spectral energy of the light incident on the light-receiving member 41 is governed by the spectral variation of the noise. Light can be properly detected: 10 201239550 Illuminance. Further, according to the appropriately detected illuminance, the illuminance lighting for adjusting the supply power to the discharge lamp 21 is performed to avoid frequent power adjustment. According to the present embodiment, the exposure apparatus 10' that forms the pattern by the discharge lamp 21 has the illuminance measurement control unit 50 composed of the illuminance calculation control unit 3A and the light receiving unit 4, and the spectral sensitivity curve l1 of the light receiving unit 40. Peak P1 is removed from h line (405 nm) and i line (365 nm) And in the wavelength domain substantially in the middle of the adjacent two bright lines. The sensitivity of the h line and the i line is lower than the peak sensitivity, the sensitivity ratio of the wavelength at the h line, and the sensitivity ratio of the wavelength at the 丨 line. R2 is 85% or less of P1. Further, the half width (Δ λ / 2 ) of the spectral sensitivity curve is wider than the wavelength range between the h line and the i line. Next, the fourth embodiment will be described with reference to the fourth embodiment. Photometric apparatus. In the second embodiment, the photometric apparatus independent of the exposure apparatus is used for illuminance measurement. Fig. 4 is a schematic diagram of the illuminance meter of the second embodiment. The handcarry type illuminance meter 1〇〇 The main body 120 having the display portion 129 and the light receiving portion 11'' the light receiving portion 11'' are transmitted through the signal cable 130 attached to the light receiving portion 110, and are connected to the connecting portion 127 of the main body 12A. In order to perform the exposure device (not shown) In the illuminance measurement, the light-receiving portion 11 of the illuminance meter is placed on the substrate loading platform, and the light-receiving portion 11 is moved to the measurement point of the feature. Then, the display portion indicated on the main body i 2 is confirmed. Μ Illumination' adjusts the power supply to the discharge lamp. The upper surface of the window 112 116' is received by the light-receiving unit 11 and the fifth embodiment is the illuminance unit 110 of the second embodiment. The filter unit 114 and the light-receiving member 201239550 are disposed below the light-receiving unit. In the meantime, not only the light receiving unit 11 having the knives sensitivity characteristic of the second 丨t but also the light receiving unit 11 having the spectroscopic 乂 selectivity and the fourth characteristic which will be described later 〇 120. The text of the main body is shown in Fig. 6 as a graph showing the degree characteristics of the light receiving unit different from the first and second embodiments. The knives of the 丨 / / / / / / / / / / / / / / / / / / / / / / / / / / / / / / / / / / / / / / / / / / / / / / / / / / / / / / / / / / / / / / The g line (436_) and the h line (405mn) are slightly centered. In addition, compared with P2, the sensitivity ratio (2) of the wavelength of the g line and the sensitivity ratio R22 of the wavelength of the 匕 line are lower, compared with P2 = iq r2i = RR22 = 〇. 71 'all 85 of P1 %the following. In addition, the half-width (Δ2/2) of the 'splitting sensitivity curve is wider than the wavelength range between the § line and h and the line, and Δ is /2 = 43 nm. In this way, since the spectral sensitivity curve ^ has a peak p 2 in the middle of the 々g line and the h line, it is not affected by the spectral variation of the noise dominated by self-absorption, etc., and let the ^ line and the 1 line The spectral light of the entire wavelength region is appropriately passed through and guided to the light receiving member 116. The light receiving member 116 of the light receiving portion uo or the light receiving portion 110 is again light. The electrical signal generated by the component 116 is amplified by the amplifier 122 and converted to a digital signal by the A/D converter 124. Next, the calculation unit 128 calculates the illuminance. The obtained illuminance data is displayed on the display unit 129. The control unit i26 controls the power supply circuit and the signal processing circuit inside the main body. In the first and second embodiments, the illuminometer is used as the photometric device. However, other photometric devices such as a luminance meter, an integrated photometer, and an integrated intensity meter may be applied. In this case, in the main body of the photometric device, the light-receiving signal is calculated based on a conventional calculation processing method, and the brightness, the amount of light, the intensity, and the like are calculated, and the configuration may be not only a portable type but also a desktop type. of. Further, the filter can be selectively detachably attached to the light receiving portion by a sliding mechanism or the like using a guide groove. It is also possible to use a mercury lamp other than the above as the discharge lamp, and it is possible to use a discharge lamp which emits a continuous spectrum 'and emits continuous spectrum light including a bright line of the g line and the h line 'i line. Alternatively, a discharge lamp that emits continuous spectral light containing other complex lines may be used. In this case, the photometric device is configured to have a spectral sensitivity characteristic that matches the characteristics of the discharge lamp. Further, as in the first embodiment, when the illuminance measuring device is incorporated in the exposure device, it may have a configuration in which the filter has a sensitivity characteristic. The following is a description of embodiments of the invention. [Embodiment] This embodiment is composed of an illuminometer having the spectral sensitivity characteristic t-light portion described in the first and second embodiments. Execution and comparison experiments with well-known spectral sensitivity characteristics of the white 'Wenguang Department's illuminometer. Next, Fig. 7 is a view showing the spectral sensitivity characteristics of a conventional light receiving portion (referred to as a first conventional light receiving portion) corresponding to the i line (3 6 5 (10)). Fig. 8 is a graph showing the spectral sensitivity characteristics of the conventional light-receiving portion (hereinafter referred to as the second conventional light) of Table A on the h-line (405 nm). The spectral sensitivity curve L3 shown in Fig. 7 is a distribution curve having a sensitivity of about 355 nm as a peak 13 201239550, and has a maximum sensitivity on the short-wavelength side near the i-line (36 5 nm). The sensitivity ratio at the h line (405 nm) wavelength is R31 = 0, the sensitivity ratio at the i line (365 nm) wavelength is R32 = 0.90, and the half width Δ and /2 of the spectral sensitivity curve are 40 nm. The spectral sensitivity curve L4 shown in Fig. 8 has a distribution curve of about 405 nm as the peak sensitivity, and has the largest sensitivity on the short wavelength side near the h line (405 nm). The sensitivity ratio at the wavelength of the g line (436 nm) is R41 = 〇.75, the sensitivity ratio at the wavelength of the h line (405 nm) is R42 = 0.91, and the sensitivity ratio at the wavelength of the i line (365 nm) is R43 = 0.35, the spectral sensitivity The half width of the curve Δ λ /2 = 75 nm. Regardless of which spectral sensitivity curve, the peak sensitivity is in the wavelength domain that is susceptible to changes in the spectral spectrum of the self-absorbed noise. A chart of power fluctuations during the system. The ultrahigh pressure mercury lamp in the mountain is used as the discharge lamp, and Fig. 9 is a view showing the fluctuation of the lamp supply power when the first and second conventional light receiving units shown in Fig. 7 and Fig. 8 are used to perform the illumination illumination control. Fig. 10 shows the use of the light receiving portion of the embodiment to perform the illuminance lighting control. Here, 'the illuminance lighting control is performed using '2mg/_3'. The illuminance timing using the seventh and eighth portions is generated during the use of the lamp (refer to M1 and M2 in Fig. 9). This department says that

定照度點燈 幾乎不會產生大幅的電力 圖所示之第1、第2傳統受光 ,大幅電力變動連續不斷地產 示艾被雜訊支配性的 的照度,並為了與此配合而 第10圖所示,執行電力調整 變動。此係表示,藉由使用 14 201239550 如上述的本實施例的受光部,不會被雜訊支配性的放射光 譜變動所影響,而能夠確實檢出全體的光譜能量,執行恰 當的電力調整。再者,第丨0圖係顯示對應於第i實施形態 的實施例的放電燈的電力變動,與此同樣在對應於第2實 施形態的實施例的放電燈中也沒有大幅電力變動。 繼之,針對變化對放電燈的供應電力時的光譜相對積 异強度以及光譜相對積算強度的變化,執行比較實驗。關 於照度計,係使用本實施例中對應於帛】實施形態的實施 例’來和傳統例比較。 第11圖顯不階段式調整供應電力時所測定得到的分 光分佈的變化的圖。使電力在【70w_25〇w的範圍中以每2〇w 為-階而階段式地變化’圖示該時間點的光譜分佈 SU-SL5。供應電力減少,則分光分佈曲線的光譜強度總體 了降。再者,第11圖所示的光譜分佈’係基於用複合測光 系統MC-3_-28C(大琢電子股份公司生產)測定從放電燈 被放射’並通過光學系的光所得到的分光分佈曲線作成: 第12圖顯示對每個電力綠製光譜相對積算強度的圖 表。在此,對於各供應電力測量的分光分佈曲線…光 部的感度曲線乘算的值加以積算的相對積算值二 部對比並圖表化。在此’以供應電力25"時的 : 受光部的積算值為基準(100%), 、 力的積算強度的比例。 …先部的供應電 例如’就本實施例的受光部來說,對於第U圖所示各 201239550 ”電:計算的分光分佈曲線,以第2圖所示分光感度曲 ^各早位波長(lnm)乘算,求出從到之間的 並表丁為相對於以同樣方法算出的供應電力為 2,時的第2傳統受光部的積算值的比例。 如第1 2圖所示,U AMl 供應電力250W作為基準,各受光 部的光譜相對積算強度下降,積算強度的下降和電力變化 量大致成比例。使用本實施例受光部以及帛2傳統受光部 時,整體的光譜相對積算強度大。 第13圖顯示光譜相對積算強度的變化率的圖表。在 此’係藉由以輸入電卿時作為基準的積算強度的變化 2來表示。變化率越大,分解能越高,能夠檢出更細的積 算強度的變化’而能更精密地掌握照度變動。如第Μ圖所 不,在使用本實施例的受光部的時候的變化率最大。 如上所示,藉由使用本實施例的受光部,能夠不被雜 訊的支配性的放電變動影響,而1,能夠精密地掌握實際 的放㈣“照度變化卜因此’藉由使用本實施例的受 光部,可以正確地執行亮度測定’光量測定等其他的測光 計算。 【圖式簡單說明】 第1圖為第1實施形態的曝光裝置的概略方塊圖 第2圖為顯示受光部的分光感度特性的圖。 第3圖為顯示放電燈的分光分佈特性的圖。 第4圖為第2實施形態的照度計的模式圖。 第5圖為第2實施形態的照度計的方塊圖。 16 201239550 度特性的:為顯不不同於第1實施形態的受光部的分光感 下稱I; it::對應於1線(365nm)的傳統的受光部(以 為第1傳統受光部)的分光感度特性的圖。 第8圖為表示對應於h線(4〇 下稱為第2值铽兵丄 ^ ]得統的党光部(以 卜 統X光部)的分光感度特性的圖。 第9圖顯示使用第« m ^ -統受光部執行定0” 之第卜第2傳 表。 "、、度點燈控制時的燈供應電力的變動的圖 控制:二二Γ用本實施例的受光部進行定照度點燈 亍扪罨力變動的圖表。 :11圖顯示階段式調整供應電力時所測定得到的分 光刀佈的變化的圖。 第12圖顯不對每個雷六給制本上並| 表。 判寬力繪以⑸目對積算強度的圖 的圖表 第13圖顯示光譜相對積算強度的變化率 主要元件符號說明】 1 〇曝光裝置 21放電燈 3 〇照度演算控制部 4 0受光部 41受光部件 42濾器 5 〇照度測定控制裝置 17 201239550 I 0 0照度計 II ο受光部 114濾器 120主體 18The illumination of the illuminance hardly produces the first and second conventional light receptions shown in the large power map, and the large-scale power fluctuations continuously illuminate the illuminance of the AI-controlled noise, and in order to cooperate with this, Figure 10 Show that the power adjustment changes are performed. This means that by using the light-receiving portion of the present embodiment as described above, it is possible to reliably detect the entire spectral energy and perform proper power adjustment by using the light-receiving portion of the present embodiment as described above. Further, the ninth graph shows the electric power fluctuation of the discharge lamp according to the embodiment of the first embodiment, and similarly, in the discharge lamp according to the embodiment of the second embodiment, there is no large electric power fluctuation. Next, a comparative experiment was performed in response to changes in the relative integrative intensity of the spectrum and the relative integrated intensity of the spectrum when the electric power was supplied to the discharge lamp. Regarding the illuminance meter, the embodiment corresponding to the embodiment of the present embodiment is used to compare with the conventional example. Fig. 11 is a diagram showing the change of the spectral distribution measured when the power is supplied in a stepwise manner. The power distribution SU-SL5 at this point in time is shown by changing the power in a range of [70w_25〇w in a range of 2〇w as a -step. When the supply power is reduced, the spectral intensity of the spectral distribution curve is generally reduced. In addition, the spectral distribution shown in Fig. 11 is based on the measurement of the spectral distribution curve obtained by the composite photometric system MC-3_-28C (manufactured by Otsuka Electronics Co., Ltd.) from the discharge lamp and passing through the optical system. Composition: Figure 12 shows a graph of the relative integrated strength of each power green spectrum. Here, the relative integrated value obtained by multiplying the values of the sensitivity curves of the light supply distributions of the light supply sections is compared and graphed. Here, when the power supply is 25": the integrated value of the light receiving unit is the reference (100%), and the ratio of the integrated power of the force. ...the supply power of the first part, for example, for the light-receiving part of the present embodiment, for each of the 201239550" electric powers shown in Fig. U: the calculated spectral distribution curve, and the spectral sensitivity of each of the early wavelengths shown in Fig. 2 ( In the case of the multiplication, the ratio of the sum of the values from the arrival to the second conventional light-receiving unit when the supply power calculated by the same method is 2 is obtained. With the AM1 power supply of 250 W as a reference, the spectral total integrated intensity of each light receiving unit decreases, and the reduction of the integrated intensity is approximately proportional to the amount of power change. When the light receiving unit of the present embodiment and the conventional light receiving unit of 帛2 are used, the overall spectral relative total intensity is large. Fig. 13 is a graph showing the rate of change of the relative integrated intensity of the spectrum. Here, it is represented by the change 2 of the integrated intensity based on the input of the singularity. The higher the rate of change, the higher the decomposition energy and the ability to detect more. The illuminance variation can be more accurately grasped by the change in the intensity of the integrated calculation. As shown in the figure, the rate of change when the light-receiving portion of the present embodiment is used is the largest. As shown above, by using the present embodiment The light portion can be accurately influenced by the dominant discharge fluctuation of the noise, and the actual light can be accurately grasped. (4) "Illuminance change" Therefore, the brightness measurement can be accurately performed by using the light receiving portion of the present embodiment. Other photometric calculations such as light measurement. BRIEF DESCRIPTION OF THE DRAWINGS Fig. 1 is a schematic block diagram of an exposure apparatus according to a first embodiment. Fig. 2 is a view showing a spectral sensitivity characteristic of a light receiving unit. Fig. 3 is a view showing the spectral distribution characteristics of the discharge lamp. Fig. 4 is a schematic view showing an illuminometer according to a second embodiment. Fig. 5 is a block diagram of the illuminometer of the second embodiment. In the case of the 201239550 degree characteristic, it is said that the light-receiving part of the light-receiving part of the first embodiment is called I; it:: the light-receiving part of the conventional light-receiving unit (which is the first conventional light-receiving part) corresponding to one line (365 nm) A graph of sensitivity characteristics. Fig. 8 is a view showing the spectral sensitivity characteristics of the party light portion (the X-ray portion of the Buddhism) corresponding to the h line (hereinafter referred to as the second value 铽兵丄^). « m ^ - The second transmission of the light-receiving part of the light-receiving unit is set to 0. ", and the control of the fluctuation of the lamp supply power during the lighting control: the second light-emitting unit is determined by the light-receiving unit of the present embodiment. A graph showing the change in illuminance of the illuminance. Fig. 11 shows a graph of the change of the spectroscopic knives measured when the power is supplied in a phased manner. Fig. 12 shows that the spectroscopy of each ray is given. Fig. 13 showing the graph of the cumulative intensity of the spectrum (5) showing the rate of change of the relative integrated intensity of the spectrum. Main component symbol description 1 〇 Exposure device 21 Discharge lamp 3 〇 Illumination calculation control unit 40 Light receiving unit 41 42 filter 5 〇 illuminance measurement control device 17 201239550 I 0 0 illuminance meter II ο light receiving unit 114 filter body 18

Claims (1)

201239550 七、申請專利範圍: L 一種曝光裝置,其包括: 放電燈,其放射包含g線(436nm)、h線(405nm)、i線 (365nm)的亮線的光; 、 光測疋單几,其具有受光部,測定從前述放電燈放射 的光;以及 照明調整單元’依據前述光測定單元的測定值,調整 向前述放電燈提供的電力; &gt;剛述光測定單元具有在g線、h線、i線中相鄰的二個 亮線間有峰值感度的分光感度特性。 2. 如申請專利範圍第1項所述的曝光裝置,在前述分 ^感度特性的分光感度曲線的半寬度(_心⑴,比 前述相鄰的二個亮線間的波長域更寬。 3. 如申請專利範圍第】項所述的曝光裝置,在前述分 光感度特性中,在前述相鄰的- 4州的一個壳線的感度,均為前述 峰值感度的85%以下。 項中任一項所述的曝光裝 線和h線之間的波長域 3項任一項所述的曝光裝 線和g線之間的波長域 4. 如申請專利範圍第1〜2 置’前述分光感度特性,在i (365nm-405nm)有峰值感度。 5. 如申請專利範圍第1〜 置,前述分光感度特性,在h (405nm-436nm)有峰值感度。 6. 如申請專利範圍筮 p 1〜5項中任一項所述的曝光裝 置,在前述分光感度特性的八 吁注的刀先感度曲線,係以前述峰值 19 201239550 感度為中心的略高斯分佈曲線表示。 7.如申請專利範圍第卜6項中任—項所述的曝光裝 置,刚述光測定單元測定從前述放電燈放射的光的昭产, 前述照明調整單元,調整供應電力以維持—定照度*。、又 如申請專利範圍第卜7項中任—項所述的曝光裝 置,刖述放電燈為封入〇.2mg/mm3水銀的水銀燈。 9. 一種測光裝置,其包括: 受其具有受光部件和配置於入射光路上的濾器; —叙部,其根據人射到前述受光部件的光,進行測光 演异, 則述又光邛具有在g線(436nm)、h線(挪⑽)、i ^ (365測)中相鄰的二個亮線間有峰值感度的分光感度特性 10.如中請專利«第9項所述的測光裝置,在❸ 分光感度特性的分光感度曲線的半寬度(hal“_ 比前述相鄰的二個亮線間的波長域更寬。 所述的測光裝置 二個亮線的感度 在前述 均為前 11.如申請專利範圍第9項 分光感度特性中,在前述相鄰的 述峰值感度的85%以下。 12.如申請專利範圍第 裝置’前述分光感度特性, (365nm-405nm)有峰值感度。 9〜11項中任一項所述的測光 在i線和h線之間的波長域 項所述的測光裝 線之間的波長域 13·如申請專利範圍第9〜u項任 置,前述分光感度特性,在h線和g (405nm-436nm)有峰值感度。 20 201239550 種測光裝置的党光部’其可以透過訊號電纜和 測光裝置主體連接,其包括: 受光部件;以及 配置於入射光路上的濾器; ,、特徵在於具有在亮線g線(436nm)、h線(405nm)、i Κ 5ηπ〇 +相鄰的二個亮線間有峰值感度的分光感度 性。 iD· 一種測光裝置,其包括: 文光部,其具有受光部件和配置於入射光路上的濾器; 測定部,其根據入射到前述受光部件的光,進行測先 演算; 分 月IJ述爻光部具有在相鄰的二個亮線間有峰值感度的 光感度特性。 21201239550 VII. Patent application scope: L An exposure apparatus comprising: a discharge lamp that emits light of a bright line including g line (436 nm), h line (405 nm), and i line (365 nm); a light receiving unit that measures the light emitted from the discharge lamp; and an illumination adjusting unit that adjusts the electric power supplied to the discharge lamp based on the measured value of the light measuring unit; &gt; the light measuring unit has the g line, There is a spectral sensitivity characteristic of peak sensitivity between two adjacent bright lines in the h line and the i line. 2. The exposure apparatus according to claim 1, wherein a half width (_heart (1) of the spectral sensitivity curve of the sensitivity characteristic is wider than a wavelength range between the adjacent two bright lines. 3 In the exposure apparatus according to the above aspect of the invention, in the spectral sensitivity characteristic, the sensitivity of one of the adjacent -4 states is 85% or less of the peak sensitivity. The wavelength range between the exposure line and the g line according to any one of the wavelength range 3 items between the exposure line and the h line, as described in the item 4. In the patent application range 1 to 2, the aforementioned spectral sensitivity characteristics are set. The peak sensitivity is obtained at i (365 nm - 405 nm). 5. The spectral sensitivity characteristic has a peak sensitivity at h (405 nm - 436 nm) as in the first to the right of the patent application. 6. For the patent application range 筮p 1 to 5 In the exposure apparatus according to any one of the preceding claims, the knife sensitivity curve of the above-mentioned spectral sensitivity characteristic is expressed by a slightly Gaussian distribution curve centered on the peak 19 201239550 sensitivity. Exposure device according to any one of the six items The light-measuring unit measures the light emitted from the discharge lamp, and the illumination adjusting unit adjusts the supplied electric power to maintain the illuminance*. Further, the exposure is as described in any one of the claims. The discharge lamp is a mercury lamp sealed with 〇2 mg/mm3 mercury. 9. A photometric device comprising: a filter having a light-receiving member and a light path disposed on the incident light; - a segment, which is irradiated according to a person The light of the light-receiving member is subjected to photometry, and the aperture has a peak sensitivity between the two bright lines adjacent to the g line (436 nm), the h line (Nove (10), and the i ^ (365). </ RTI> </ RTI> <RTIgt; </ RTI> <RTIgt; </ RTI> <RTIgt; </ RTI> <RTIgt; </ RTI> <RTIgt; </ RTI> <RTIgt; </ RTI> <RTIgt; The sensitivities of the two bright lines of the photometric device are all in the foregoing. 11. The illuminance sensitivity characteristic of the ninth item of the patent application range is 85% or less of the adjacent peak sensitivity. Device 'the aforementioned spectral sensitivity characteristics (365 nm - 405 nm) having a peak sensitivity. The wavelength range between the metering lines described in the wavelength field between the i-line and the h-line according to any one of items 9 to 11 is as claimed in the patent application. In the 9th to the uth, the spectral sensitivity characteristic has a peak sensitivity in the h line and g (405 nm to 436 nm). 20 201239550 The party light part of the photometric device can be connected to the main body of the photometric device through a signal cable, which includes : a light-receiving member; and a filter disposed on the incident light path; characterized by having a peak sensitivity between two bright lines adjacent to the bright line g line (436 nm), h line (405 nm), i Κ 5ηπ〇+ Spectral sensitivity. iD· A photometric apparatus comprising: a light-receiving unit having a light-receiving member and a filter disposed on the incident light path; and a measuring unit that performs measurement and calculation based on light incident on the light-receiving member; The portion has a light sensitivity characteristic having a peak sensitivity between two adjacent bright lines. twenty one
TW101105585A 2011-03-30 2012-02-21 Photometric devices and exposure devices TWI536119B (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2011074420A JP5723652B2 (en) 2011-03-30 2011-03-30 Photometric apparatus and exposure apparatus

Publications (2)

Publication Number Publication Date
TW201239550A true TW201239550A (en) 2012-10-01
TWI536119B TWI536119B (en) 2016-06-01

Family

ID=46931318

Family Applications (1)

Application Number Title Priority Date Filing Date
TW101105585A TWI536119B (en) 2011-03-30 2012-02-21 Photometric devices and exposure devices

Country Status (5)

Country Link
JP (1) JP5723652B2 (en)
KR (1) KR101867527B1 (en)
CN (1) CN103460137B (en)
TW (1) TWI536119B (en)
WO (1) WO2012133616A1 (en)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI629568B (en) 2013-08-09 2018-07-11 日商奧克製作所股份有限公司 Illumination device and exposure device including the same
KR20150134527A (en) 2014-05-22 2015-12-02 주식회사 만도 Apparatus for inspecting coil current of hydraulic valve and method for inspecting coil current thereof

Family Cites Families (18)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4319830A (en) * 1979-08-06 1982-03-16 Terence Roach Multispectral light detection system
JPS58165324A (en) * 1982-03-25 1983-09-30 Nec Corp Measurement of integrated exposure of mask aliner
JPS62137527A (en) * 1985-12-12 1987-06-20 Toshiba Corp Spectral distribution inspecting device
JPH036011A (en) * 1989-06-02 1991-01-11 Nec Yamagata Ltd Wafer aligner for semiconductor-device manufacture
JPH04142020A (en) * 1990-10-02 1992-05-15 Nec Yamagata Ltd Aligner
JPH04343032A (en) * 1991-05-21 1992-11-30 Nec Yamagata Ltd Illumination meter for exposure device
JP2947303B2 (en) * 1991-07-08 1999-09-13 三菱電機株式会社 Discharge lamp lighting device
JP3526652B2 (en) * 1995-05-11 2004-05-17 倉敷紡績株式会社 Optical measuring method and optical measuring device
JP2002005736A (en) 2000-06-23 2002-01-09 Orc Mfg Co Ltd Measuring device for ultraviolet ray illuminance distribution
JP2002340667A (en) 2001-05-15 2002-11-27 Nikon Corp Instrument for measuring illuminance, and exposure device
JP2003257846A (en) * 2002-03-07 2003-09-12 Nikon Corp Light source unit, lighting system, and system and method for exposure
JP2004170325A (en) 2002-11-22 2004-06-17 Shimadzu Corp Spectrometric measuring instrument
JP4262032B2 (en) 2003-08-25 2009-05-13 キヤノン株式会社 EUV light source spectrum measurement device
JP4428403B2 (en) * 2006-06-28 2010-03-10 ソニー株式会社 Infrared signal receiver, liquid crystal display and optical element
JP5181138B2 (en) 2006-11-02 2013-04-10 友達光電股▲ふん▼有限公司 Liquid crystal panel manufacturing apparatus and liquid crystal panel manufacturing method
JP2009021971A (en) * 2007-06-15 2009-01-29 Toshiba Lighting & Technology Corp Optical communication system
JP2009251551A (en) * 2008-04-11 2009-10-29 Ushio Inc Ultraviolet irradiator, and control method of irradiator thereof
JP5320006B2 (en) 2008-10-03 2013-10-23 株式会社オーク製作所 Exposure drawing device

Also Published As

Publication number Publication date
CN103460137A (en) 2013-12-18
JP2012208351A (en) 2012-10-25
KR101867527B1 (en) 2018-06-15
TWI536119B (en) 2016-06-01
KR20140061305A (en) 2014-05-21
JP5723652B2 (en) 2015-05-27
WO2012133616A1 (en) 2012-10-04
CN103460137B (en) 2016-05-25

Similar Documents

Publication Publication Date Title
JP5486692B2 (en) Integrating sphere photometer and measuring method thereof
WO2012036213A1 (en) Reflectivity measuring device, reflectivity measuring method, membrane thickness measuring device, and membrane thickness measuring method
US6535278B1 (en) Apparatus and method for measuring spectral property of fluorescent sample
JP5917513B2 (en) Integrating sphere photometer and measuring method thereof
US8049882B2 (en) Spectrometric optical method and system providing required signal-to-noise of measurements
JP2011089961A (en) Spectroscope and photometric equipment provided with the same
JP2005326393A (en) Spectral transmittance measuring instrument, transmission type thickness gage, color value measuring instrument, spectral transmittance measuring method, thickness measuring method, and color value measuring method
JP2001515744A (en) Measuring device for measuring autofluorescence of the cornea of the eye
TW201239550A (en) Discharge lamp
JP5541198B2 (en) Light irradiation device
JP2017120200A (en) Spectral radiation measuring device
JP2022159109A5 (en)
JP2011242314A (en) Spectral characteristic measuring device and calibration method of the same
JP5440609B2 (en) Color densitometer and density measuring method
TW594384B (en) Apparatus for exposing a face of a printed circuit panel
JP6822660B2 (en) Integrating sphere dimmer
JP6984651B2 (en) A method for measuring the spectral radiation characteristics of a fluorescent whitening sample and a device for measuring the spectral radiation characteristics of a fluorescent whitening sample.
JP7136136B2 (en) Light-receiving characteristic evaluation device and light-receiving characteristic evaluation method for optical sensor
JP2020101409A (en) Portable measurement device
Huriev et al. The Measurement Standard of the Luminous Flux for Metrological Traceability of Measurements of LED Lamps
JPS5813303Y2 (en) Bunko Koudokei
JPH036011A (en) Wafer aligner for semiconductor-device manufacture
JPS60168026A (en) Method and device for measuring illuminance distribution
JP2004108781A (en) Small spectroscope
TWM410876U (en) Detecting apparatus for anti-ultraviolet lens