201139855 六、發明說明： 【發明所屬之技術領域】 本發明係有關於包含二連型真空泵的裝置（二連型真 空栗裝置）、及具有該真空泵裝置之氣體精製系統。進而， 本發明係亦有關於在二連型真空泵裝置内之排氣減振裝 置。 【先前技術】 容積式真空泵用於各種用途。例如，在執行作為氣體 精製方法的壓力變動吸附法（PSA法）上，有使用將2台容 積式真空泵串接的二連型真空泵裝置的情況。 在PSA法’例如使用被填充用以吸附雜質之吸附劑的 ，附=在根據使用那種吸附塔所進行之PSA法之氣體的 精製，在吸附塔，例如包含以下的吸附工程及降壓再生製 程將反覆循年。對塔内處於相對高壓之狀態的吸附塔引入 疋犯口氣體的原料氣體’一面由吸附劑吸附該原料氣體中 :雜質’-面從該吸附塔引出非吸附氣體。此非吸附氣體 :目標氣體被豐富化的氣體，作為精製氣體所取得。在降 壓再生製帛，一面塔内被降壓而相對低壓化，一面從吸附 =除雜質’ ϋ向塔外引出包含此雜f的脫除氣體。在此 堅再生製程，為了將吸附塔内降壓，有使用容積式直空 果的情況。關於這種容穑 .. 積式真工泵，例如記載於以下的專 利文獻1、2。 [專利文獻1]特開平10- 296034號公報 201139855 [專利文獻2]特開2006 — 272325號公報 若依據這些公報的揭示，因應於將吸附塔降壓時之負 载的（吸附塔的壓力）變動，並吸附塔並列連接或串接2 a 容積式真空泵（鼓風機）。因而，需要用以切換並列連接或 串接的控制，而切換時序的設定不容易。又，在這些公報， 未考慮在使2台真空泵動作上，進行何種控制，可使2 & 真空泵之總消耗動力變成最小。又，雖然伴隨由容積式真 空泵之排氣的脈動所引起的氣流振動，但是在這些公報亦 未考慮如何避免該振動對配置於真空泵之下游側之開閉閥 所給予的不良影響。 【發明内容】 因此，本發明之目的在於提供一種可使2台真空泵之 所要動力變成最小的二連型真空泵裝置。 本發明之別的課題在於提供一種包含有如以上所示可 使所要動力變成最小之二連型真空泵裝置的氣體精製系 統。 、 本發明之另外的課題在於提供一種在二連型真空泵裝 置之排氣振動抑制裝置。 若依據本發明的第1形態，提供一種二連型真空泵裝 置。此二連型真空泵裝置包括：具有吸氣口及排氣口之容 積式第1真空泵；第2真空泵，係具有吸氣口及排氣口， 同時具有比該第1真空泵之排氣容量更小的排氣容量；連 結管線，係連結該第1真空泵之該排氣口及該第2真空系 201139855 =該吸氣口之間，·旁通管線，係具有與該連結管線連接的 们端部及用以向外部引出氣體之第2端部；及 係配置於該旁通管線中之該第1端 才1 ’ 構成為在來自該第1真空泵之兮 端部之間； 汞之該排氣口的排氣量降低至靼 該第2真空泵的排氣容量—致時， '、 換成閉狀態。 將該開閉闊從開狀態切 在使用本發明之第1形態的二連型真空泵裝置時，第 =录的吸氣口例如經由既定管線，與需要將内部降壓 :A壓更低之既定壓力的容器(降壓對象容器心。 2為那種降壓對象容器，列舉例如用以執行PSA法的 :、或半導體製造裝置的真空栗等。X，在本栗裝置運轉 時’經由連結管線所串接的第i及第2 直允；ξ + ”二泉運轉。第1 量：1二尸口的排氣量中超過第2真空录之排氣 =量的氣體對帛2真Μ是多餘氣體，若將其直接送 入第2真空泵，第2直就忐 八 、 第U以為過負載狀態，二連型真 =之：體的消耗動力增加，b，若依據本發明之 弟丄形態’在第1真空泵的妯 容量時…士 里超過第2真空栗的排氣 寺（即’有多餘氣體時），將会g其 狀態，控制本夺置的氣η “的開閉閥設為開 旁通管㈣入 ❹餘氣體從連結管線向 空⑽ 又，在帛1真空果的排氣量未超過第2真 為閉狀能品 ）’將旁通管線的開閉閥設 =合而將兩真空果設為完全串列狀態。結果，第2 多：ίΓ成為過負載狀態，而可抑制消耗動力。在發生 礼之狀態，該多餘氣體從連結管線向旁通㈣h 201139855 後，在旁通管線内，通過開閉閥，然後，從第2端部被引 出。旁通管線的第2端部例如經由從第2真空泵之排氣口 所延伸的配管，間接地與消音器連接。另一方面，在未發 生多餘氣體之狀態，處於完全串列狀態的第j及第2真空 泵協同動作，將降壓對象容器的内部降壓，而從第2真空 泵引出既定量的氣體。此時’因為旁通管線的開閉閥處於 閉狀態’所以無通過旁通管線的氣體。 一連型真空泵裝置更包括用以檢測出該第1真空杲之 該吸氣口附近之壓力的壓力檢測器，該開閉閥係構成為在 該壓力檢測器檢測出表示來自該第i真空泵之該排氣口的 排氣量降低至與該第2真空栗的排氣容量一致的壓力值 時，將該開閉閥從開狀態切換成閉狀態較佳。或者，亦可 構成為在該壓力檢測器檢測出表示在該連結管線内的壓力 =至大氣壓的壓力值時’將該開閉閥從開狀態切換成閉 π作為本發明之第i形態之二連型真空果裝置的特性’ 广為如第8圖所示的特性圖形’預先因應於第工真空泵的 吸氣口壓力’預職在排氣4(未㈣成標準狀態的排氣量） ::變化、及所要動力如何變化。此特性圖形暗示僅第丨 厂泵作帛’從連結管線經由旁通管線的開閉閥，向外部 至出對第2真空泵多餘的氣體的最佳點，吸氣口壓力降低 ^如〜42kPaG，同時連結管線的壓力降低至大氣壓，對 真空泵無多餘氣體，表示帶來第1真空泵與第2真空 ’可聯合串列地排出排氣之二連型真空泵裝置之最小且最 201139855 佳的所要動力。 的壓們發現第1真空'與第2真空“連結管線 為大氣壓時’對應於此狀態之第i真空泵之吸氣 ...m 又而艾動，具體而言，即使氣體 化度變化而氣體吸附量變 p ± 動例如在吸氣口的壓力為一 kPaG時，連結管線的壓力 ^ ^ 7 疋大軋壓，不會根據氣體溫BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a device including a two-connected vacuum pump (two-connected vacuum pump device), and a gas refining system having the vacuum pump device. Further, the present invention relates to an exhaust gas damper device in a two-connected vacuum pump device. [Prior Art] A volumetric vacuum pump is used for various purposes. For example, in the pressure swing adsorption method (PSA method) which is a method for purifying a gas, there is a case where a two-connected vacuum pump device in which two volumetric vacuum pumps are connected in series is used. In the PSA method, for example, an adsorbent filled with an impurity for adsorbing impurities is used, and the purification of the gas according to the PSA method performed by the adsorption tower is used. In the adsorption tower, for example, the following adsorption engineering and depressurization regeneration are included. The process will follow the year. In the adsorption tower in which the column is in a relatively high pressure state, the raw material gas of the foul gas is introduced, and the raw material gas is adsorbed by the adsorbent: the impurity '-plane extracts the non-adsorbed gas from the adsorption tower. This non-adsorbed gas: a gas in which the target gas is enriched is obtained as a purified gas. In the pressure reduction regeneration system, the inside of the column is depressurized and relatively low pressure, and the removal gas containing the impurity f is extracted from the adsorption = impurity removal ϋ to the outside of the column. In this regenerative process, in order to reduce the pressure inside the adsorption tower, there is a case where a volumetric straight space is used. Regarding such a capacity, the product type practical pump is described, for example, in the following patent documents 1 and 2. [Patent Document 1] Japanese Laid-Open Patent Publication No. Hei. No. Hei. No. 2006-272325. And the adsorption tower is connected in parallel or in series with a 2 a volumetric vacuum pump (blower). Therefore, it is necessary to control the parallel connection or the serial connection, and the setting of the switching timing is not easy. Further, in these publications, it is not considered which control is performed to operate the two vacuum pumps, and the total power consumption of the 2 & vacuum pump can be minimized. Further, although the airflow vibration caused by the pulsation of the exhaust gas of the positive displacement vacuum pump is not considered, it is not considered in these publications how to avoid the adverse effect of the vibration on the opening and closing valve disposed on the downstream side of the vacuum pump. SUMMARY OF THE INVENTION Accordingly, it is an object of the present invention to provide a two-connected vacuum pump apparatus that minimizes the required power of two vacuum pumps. Another object of the present invention is to provide a gas refining system including a two-connected vacuum pump device which can minimize the required power as described above. Another object of the present invention is to provide an exhaust vibration suppressing device for a two-connected vacuum pump device. According to a first aspect of the present invention, a two-connected vacuum pump device is provided. The two-connected vacuum pump device includes a first displacement type vacuum pump having an intake port and an exhaust port, and a second vacuum pump having an intake port and an exhaust port, and having a smaller exhaust capacity than the first vacuum pump. The exhaust line is connected to the exhaust port of the first vacuum pump and the second vacuum system 201139855 = between the intake ports, and the bypass line has ends connected to the connection line And a second end portion for extracting gas to the outside; and the first end 1' disposed in the bypass line is configured to be between the ends of the first vacuum pump; the exhaust of mercury When the discharge capacity of the port is reduced to the exhaust capacity of the second vacuum pump, it is replaced with a closed state. When the two-connected vacuum pump device according to the first aspect of the present invention is cut from the open state, the intake port of the first recording is passed through a predetermined line, for example, and the internal pressure is required to be lowered: a predetermined pressure lower than the A pressure. The container of the pressure-reduction target container. 2 is a pressure-reducing target container, for example, a method for performing a PSA method, or a vacuum pump for a semiconductor manufacturing device, etc. X, when the present device is in operation, via a connecting line. The first and second direct transmissions of tandem; ξ + "two springs run. The first quantity: 1 second corpse discharge exceeds the second vacuum recorded exhaust = amount of gas pair Μ 2 is really excess gas If it is directly sent to the second vacuum pump, the second straight is eight, the U is considered to be overloaded, the second type is true =: the body's power consumption is increased, b, according to the invention, the form of the sister When the capacity of the first vacuum pump is exceeded, the exhaust valve of the second vacuum pump (that is, when there is excess gas), the state of the gas η is controlled to be bypassed. Tube (4) into the residual gas from the connecting line to the air (10) again, the amount of vacuum in the 帛1 vacuum fruit is not exceeded The second product can be true in the closed form) 'on-off valve provided in the bypass line and the two together = vacuo tandem if fully set state. As a result, the second most: Γ Γ becomes an overload state, and can suppress power consumption. In the state of the ceremony, the excess gas is bypassed from the connecting line (4) h 201139855, and is opened and closed in the bypass line, and then taken out from the second end. The second end of the bypass line is indirectly connected to the muffler via a pipe extending from the exhaust port of the second vacuum pump. On the other hand, in a state where no excess gas is generated, the jth and the second vacuum pumps in the completely tandem state cooperate to lower the inside of the pressure reducing target container, and a certain amount of gas is taken out from the second vacuum pump. At this time, "because the opening and closing valve of the bypass line is in the closed state", there is no gas passing through the bypass line. The continuous vacuum pump device further includes a pressure detector for detecting a pressure in the vicinity of the suction port of the first vacuum port, wherein the opening and closing valve is configured to detect, at the pressure detector, the row from the i-th vacuum pump When the discharge amount of the port is lowered to a pressure value corresponding to the exhaust capacity of the second vacuum pump, it is preferable to switch the on-off valve from the open state to the closed state. Alternatively, when the pressure detector detects a pressure value indicating the pressure in the connecting line = atmospheric pressure, the opening and closing valve may be switched from the open state to the closed π as the second embodiment of the present invention. The characteristics of the vacuum-type device are widely described as the characteristic pattern shown in Fig. 8 'Predicting the suction port pressure of the vacuum pump of the first working force' pre-employment in the exhaust gas 4 (not (four) into the standard state of the exhaust volume) :: Change, and how the required power changes. This characteristic figure implies that only the Dijon pump is used as the 'optimal point from the connecting line through the bypass valve of the bypass line to the outside to the excess gas to the second vacuum pump, and the suction port pressure is lowered, such as ~42 kPaG, while The pressure of the connecting line is reduced to atmospheric pressure, and there is no excess gas to the vacuum pump, which means that the first vacuum pump and the second vacuum can be combined with the two-connected vacuum pump device that exhausts the exhaust gas in series, and the minimum required power is 201139855. When the first vacuum 'and the second vacuum' are connected to the line at atmospheric pressure, the inhalation of the i-th vacuum pump corresponding to this state is further increased, in particular, even if the degree of gasification changes. When the pressure of the suction port is one kPaG, the pressure of the connecting line is ^^7, and the rolling pressure is not based on the gas temperature.
度而铨化。此—42kPaG …入士 ”土力在第1真空泵與第2真空泵 的組合使第1真空泵的排氣量 ,n ^ 札里隻大時，所要動力之彎曲點 朝向一42kPaG以下的方^1& ^ 和動，而使弟2真空泵的排氣量Deterioration. This is the combination of the first vacuum pump and the second vacuum pump. When the first vacuum pump is combined with the second vacuum pump, the amount of the first vacuum pump is exhausted, and when the n ^ Zari is only large, the bending point of the required power is directed to a level of 42 kPaG or less. ^ and move, and the volume of the 2 vacuum pump
變大時，朝向—42kPaG 、 上的万向扣動。進而，關於氣體 溫度的影響，在齑濟、、w庳燃> n ^ 乳體皿度變兩的夏季（例如40t時），吸附 劑的氣體吸附量減少，降壓再生時吸氣口側的壓力降低， :如第7圖之下側的曲線所示變化。另—方面，在氣體溫 度變低的冬季（你丨9。 0 C時），吸附劑的氣體吸附量增加， 降壓再生時吸氣口相丨&两、 …町及軋彻!的壓力上昇’而如第7圖之上側的曲 線所不變化。可是，在二連型真空泵裝置使用是容積式之 泵的It況’不會受到因季節變動所引起的氣體溫度變 化所發生之氣體吸附量變化的影響，而視在排氣量不變。 在本發明之較佳實施形態，構成為在該壓力檢測器檢 測出表示來自与：笛i + 木目这第1真空泵之該排氣口的排氣量降低至與 該第2育处爷Μ丨丨丨“ “ 王，的排氣量一致的壓力值時，將該開閉閥從開 狀態切換成閉狀態。這種構成有助於使二連型真空泵裝置 门效率地運轉。若在連結管線的麼力降低至大氣壓之前關 ^ b開閉閥，則如第14圖所示，第2真空泵之所要動力增 201139855 加，又，放置成依然打開至降低至大氣壓以下之狀態時， 如第15圖所示，第i真空杲之所要動力增加。因此，預測 連結管線的麼力降低至大氣麼的點，以檢測器檢測出第ι 真空泵之吸氣口側的壓Λu t 力值並根據该信號關閉旁通管線 的開閉閥時，可抓住正確的切換時序。 該第1及第2真空果係各自具有外殼與該外殼之轉子 的魯氏泵，並構成為利用一台馬達使該第i真空系的該轉 子與該第2真空泵的該轉子連動地進行旋轉驅動較佳。這 種構成係適合降低本二連型真空泵裝置的所要動力。 士該旁通管線係在該第1端部與該開閉閥之間包括用以 抑制㈣旁通管線流人之氣體之氣流振動的緩衝管較佳。 該緩衝管係構成為在該開閉闕是開狀態的情況 自=1真空系之該排氣口的排氣量超過該第2真空2 氣谷量時》使通過令墙> 時 ，，.衝f之軋體的緩衝管内最短滞留 時間成為0· 15秒以上較佳。 該緩衝管係具有用以使通過其 變窄 、門。P之虱體的流路局部 “的郎流部，該節流部的開口率是2(M6%較佳。 變窄：係具有用以使通過其内部之氣體的流路局部 窄的複數卽流部，該福赵^^ 上游側的第i…“ 含在該流路位於最 …P與位於最下游側的第2節流部較佳。 流部係具有開口的孔口板或阻板較佳。 部分部係具有開°的孔口板’該開口之邊緣部的-“該緩衝管的内壁面成為同一面較佳。 -緩衝官係構成為在該開閉閥是開狀態的情況，該第 201139855 1真空泵之來自該排氣 氣谷置時，使通過該緩 為6〜1 2 m /秒較佳。 口的排氣量超過該第 衝管之氣體的緩衝管 2真空泵之吸 内最大流速成 若依據較佳的實施形態， 这緩衝管係具有在該旁通管 線之該第1端部側的第丨 及在該第【及第2端心： 端部側的第2端壁、 有在^辟1延伸的周壁，該旁通管線係具 有周壁之該第1端壁側的位置與該緩衝管連接之用以 向該緩衝管引入氣體的連接管部，連接之用以 m ^ u Ah ^ ^ 該連接官部係在與該周 壁之延伸方向交又的方向延伸。 若依據別的較佳實施形能 *绫之^， I、 #衝管係具有在該旁通 k第1端部側的第1端壁、兮笙〇 私壁該第2端部側的第2端 及在該第1及第2端辟 将且右4土之間延伸的周壁，該旁通管線 係，、有在該第1端壁盥 λ . ^ 該綾衝官連接之用以向該緩衝管引 入现體的連接管部， _ ^ 2, 接管〇卩係具有用以使在被向該緩 /ίίχ &引入之]|f[夕备（g^ ‘ J之軋體的流動彎曲的彎曲構造。 若依據本發明的第2报能is ,u 此氣體精製系統传2 —種氣體精製系統。 w. ,，Γρς.…’、I括.吸附塔’係用以利用壓力變動吸 附法（P S Α法）籍制备遞 月衣軋體並於内部填充吸附劑：及本發明之 第1形態之二連刮直咖石袖 之 真工泵裝置，係用以將該吸附塔的内部 降壓。 1 據本發明的第3形態’係-種排氣振動抑制裝 置，該排氣振動抑制裝置係在二連型真空系裝置設置於： 旁通管線内，而該_ 、以 ^一連里真空泵裝置係包括：具有吸氣口 及排軋口之容藉 積式苐1真空系；第2真空果，係具有吸氣 201139855 口及為_ 口 ，回η*曰, 1J時具有比該第1真空泵之排氣容量更小的 排氣容量，連纟士答姑 Λ 疋…S線’係連結該第1真空泵之該排氣口及 該第2真空轰. 衣之該吸氣口之間；旁通管線，係具有與該連 結官線連接的第1端部及用以向外部引出氣體之第2端 邙’ &開閉閥’係配置於該旁通管線中之該第1端部及該 第2端部之間；該排氣振動抑制裝置係在該第1端部與該 开’閉閥之間包括用以抑制向該旁通管線流入之氣體之氣流 振動的緩衝管。 【實施方式】 _第1圖係表示本發明之實施形態之氣體精製系統XI的 不意構成。氣體精製系統XI包括PSA裝置Υ1'二連型真 二果裝置Υ2及消音器γ3。 PSA裝置Y1包括吸附塔1〇Α、1〇β、原料鼓風機2ι、 2及配| 31〜34，並構成為利用壓力變動吸附法（psa 法）’從是混合氣體的原料氣體吸附除去雜質，而將目標氣 體成分濃縮分離。在本實施形態，是精製對象的目標氣體 成分是空氣中的氧氣。在此情況，主要的雜質是氮氣。 各吸附塔10A、10B於兩端具有氣體通過口 u、12， 在氣體通過口 U、12之間’被填充用以選擇性吸附原料氣 體中之雜質的吸附劑。在本實施形態，作為吸附劑，採用 :以選擇性吸附是主要之雜質之氮氣的彿石系吸附劑。可 是’在吸附劑使用分子筛碳的情況，，亦可吸附空氣中的氧 氣’當作雜質，並回收氣氣’作為目標氣體成分。又，亦 10 201139855 可藉由選擇原料氣體之組成與吸附劑的組合，而回收二氧 化碳、Γ氧化碳、氫氧、甲院等，作為目標氣體成分。 =科鼓風機21在本實施形態是空氣鼓風機，是用以向 n附。10A、10B供給或送出作為原料氣體所吸入的空氣。 槽22是用以暫時儲存所精製之氣體（在本實施形態為氧 氣）。 配管31具有主幹路31’及支路31a、3ib。主幹路31， 八有端。卩Ε1端部Ε1與原料鼓風機21的氣體送出口連接。 支2 31Α、31Β各自與吸附塔1〇Α、1〇Β的氣體通過口 u側 連 又於支路31A、31Β，附設可在開狀態與閉狀態之 間切換的自動閥3丨a、3丨b。 配^ 32具有主幹路32及支路32A、32B。主幹路32， 具有端部E2。端部E2與槽22連接。支路32[ 32β各自 與吸附塔10A、10B的氣體通過口 12侧連結。又，於支路 32A、32B，附設可在開狀態與閉狀態之間切換的自動閥 32a 、 32b 。 配管33具有主幹路33’及支路33A、33B。主幹路33， 具有端部E3。端部E3與二連型真空泵裝置γ2連接。支路 33A、33B各自與吸附塔10A、10B的氣體通過口 u側連結。 又，於支路33A、33B，附設可在開狀態與閉狀態之間切換 的自動閥33a、33b。於主幹路33’的端部£3附近，設置 壓力檢測器8 0，該壓力檢測器8 0 —直檢測出真空泵4 0 A 之吸氣口 41的壓力。藉由監視器此壓力檢測器8 〇所檢測 出之壓力值（入口壓力值），間接地預測與真空泵40A的排 201139855 氣口 42連接之連結管線52内的壓力（出口壓力值），此入 口壓力值成為既疋臨限值（壓力設定值）時發送信號，使 開閉閥61開閉。此入口壓力值的既定臨限值例如被設定成 該出口壓力值（連結管線52内的壓力）成為大氣壓的值。 配管34設置成橋接配管32的支路32A、32B。具體而 言，配管34與在支路32A之自動閥32a與吸附塔10A之間 連結，而且，與在支路32B之自動閥32b與吸附塔10B之 間連結。X ’於配管34 ’附設可在開狀態與閉狀態之間切 換的自動閥34a。 -連型真空泵裝i Y2包括2台真空系4GA、40B、馬 達51、連結官線52、配管53及旁通管線6〇 ,並構成為藉 由真空泵40A、40B的運轉，而可將上述之pSA裝置丫丨之 吸附塔l〇A、10B的内部降壓。 真空泵40A是容積式真空泵，在本實施形態是魯氏 栗真空系40B亦在本實施形態是魯氏泵。真空泵40B之 排氣谷置（意指每單位時間可排出氣體的最大量，與「吸氣 卜」相同）比真空系40A的排排氣容量小。真空泵40A、 4〇β分別具有吸氣口 41及排氣口 42。在上述之PSA裝置 Y1之配管33的端部Ε3與真空泵4〇α的吸氣口 41連接。 魯氏果例如如第2圖所示，具有外殼4〇a、及該外殼 4〇a内之兩個例如繭形的轉子4〇卜兩個轉子4〇b構成為彼 此朝向反向同步旋轉。在這種魯氏泵之驅動時，從吸氣口 進入外叙40a内的氣體被封入外殼40a與轉子40b之 間，藉轉子40b的旋轉而向排氣口 42被排出。又，在本實 12 201139855 施形態，用以向真空果4〇A、4〇B2各外殼4〇a内供給所謂 的密封水的密封水供給手段（省略圖示）設置於二連型真空 泵裝置Y2。利用密封水可在形成於外殼4〇a與轉子之 間的空間貫現兩的氣密性。 馬達51是用以使真空泵權、4〇β運轉。在二連型真 空泵裝置Y2’構成為利用一台馬達51使真空泵4〇a的轉 子與真空纟4GB的轉子連動地進行旋轉驅動。具體而言， 藉由單一的馬達51，使直4ΠΑ沾絲 呎具工泵4UA的轉子與真空泵4〇B的 轉子產生連動而被回榦雕;私 民、去c 褥驅動，馬達51與真空泵40Α、4〇β 之間經由軸元件或齒輪元件等機械式連結。 連結管線5 2連結直*爷4 η Λ & #产 史。具工泵40Α的排軋口 42與真空泵4〇Β 的吸氣口 41之間。配營且古姑却^When it becomes larger, the direction is -42 kPaG, and the universal direction is pulled. Further, regarding the influence of the gas temperature, in the summer (for example, 40 t) when the temperature of the milk is changed, the amount of gas adsorbed by the adsorbent is decreased, and the side of the suction port at the time of depressurization and regeneration is reduced. The pressure is reduced, as shown by the curve on the lower side of Figure 7. On the other hand, in the winter when the gas temperature becomes low (when you 丨9.00 C), the gas adsorption amount of the adsorbent increases, and the pressure of the suction port is lower and the pressure of the suction port is lower. Rise' and the curve on the upper side of Figure 7 does not change. However, in the case of a two-connected vacuum pump device, the use of a positive displacement pump is not affected by changes in the amount of gas adsorbed by changes in gas temperature caused by seasonal fluctuations, and the amount of displacement is not changed. In a preferred embodiment of the present invention, the pressure detector detects that the amount of exhaust gas from the exhaust port of the first vacuum pump from the flute i + wood mesh is reduced to the second nursery school.丨丨 “When the pressure value of the king is the same, the opening and closing valve is switched from the open state to the closed state. This configuration contributes to efficient operation of the two-connected vacuum pump device door. If the opening and closing valve is closed before the force of the connecting line is reduced to the atmospheric pressure, as shown in Fig. 14, the required power of the second vacuum pump is increased by 201139855, and when it is placed still open to a state below the atmospheric pressure, As shown in Fig. 15, the power required for the i-th vacuum is increased. Therefore, when it is predicted that the force of the connecting line is lowered to the atmosphere, the detector can detect the pressure value of the suction port side of the first vacuum pump and close the opening and closing valve of the bypass line according to the signal. Correct timing switching. Each of the first and second vacuum fruits has a Royle pump having a casing and a rotor of the casing, and is configured to rotate the rotor of the i-th vacuum system in conjunction with the rotor of the second vacuum pump by a single motor. The drive is better. This configuration is suitable for reducing the required power of the two-connected vacuum pump unit. Preferably, the bypass line includes a buffer tube for suppressing vibration of the gas flow of the gas flowing through the bypass line between the first end portion and the opening and closing valve. The buffer pipe is configured such that when the opening and closing 阙 is in an open state, when the amount of exhaust of the exhaust port of the vacuum system exceeds the amount of the second vacuum 2 gas, the wall is passed. It is preferable that the minimum residence time in the buffer tube of the rolled body of the rolled material is 0·15 seconds or more. The buffer tube has a door for narrowing through it. The flow path of the body of P is "the Lang flow portion, and the opening ratio of the throttle portion is 2 (M6% is preferable. The narrowing: has a plurality of enthalpies for narrowing the flow path of the gas passing through the inside thereof) In the flow portion, the ith i... on the upstream side of the Fu Zhao ^^ is preferably included in the most ... P and the second throttle portion located on the most downstream side. The flow portion has an orifice plate or a barrier plate having an opening. Preferably, the partial portion has an opening plate of the opening 'the edge portion of the opening - "the inner wall surface of the buffer tube is preferably the same surface. - The buffering system is configured such that the opening and closing valve is open. When the vacuum pump of the 201139855 is placed from the exhaust gas valley, the passage of the vacuum is preferably 6 to 12 m / sec. The discharge of the port exceeds the suction of the vacuum tube of the gas of the first punch tube. According to a preferred embodiment, the buffer tube has a first end on the first end side of the bypass line and a second end wall on the end side and the second end side. a peripheral wall extending from the opening 1 , the bypass line having a position on the first end wall side of the peripheral wall connected to the buffer tube for The connecting pipe portion of the flushing gas is introduced, and is connected to m ^ u Ah ^ ^. The connecting official portion extends in a direction intersecting with the extending direction of the peripheral wall. If it is according to other preferred embodiments, the shape can be The I, #冲管系 has a first end wall on the first end side of the bypass k, a second end on the second end side of the smear wall, and a first end and a second end And the peripheral wall extending between the right 4 soils, the bypass pipeline system, and the connecting pipe portion at the first end wall 盥 λ. ^ the smashing officer for introducing the current body to the buffer pipe, _ ^ 2, the take-up tether has a curved structure for bending the flow of the rolled body that is introduced to the / f 夕 g 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 Energy is, u This gas refining system transmits two kinds of gas refining systems. w. ,, Γρς....', I. The adsorption tower is used to prepare the moon coating by the pressure fluctuation adsorption method (PS Α method). The body is filled with an adsorbent: and the first real-world pump device of the first embodiment of the present invention is used to reduce the pressure inside the adsorption tower. 3 modal 'system-type exhaust vibration suppression device, the exhaust vibration suppression device is installed in the bypass line in the two-connected vacuum system, and the vacuum pump device includes: inhaling The mouth and the discharge port are filled with the 苐1 vacuum system; the second vacuum fruit has the inhalation 201139855 mouth and is _ mouth, back η*曰, 1J has a smaller exhaust capacity than the first vacuum pump The exhaust capacity, even the gentleman's answer to the Λ S ... S line 'connects the first vacuum pump to the exhaust port and the second vacuum bomb. a first end portion connected to the official line and a second end 邙' & opening and closing valve for introducing gas to the outside are disposed between the first end portion and the second end portion of the bypass line The exhaust vibration suppression device includes a buffer pipe for suppressing vibration of a gas flow of a gas flowing into the bypass line between the first end portion and the open-close valve. [Embodiment] Fig. 1 shows an unintended configuration of a gas purification system XI according to an embodiment of the present invention. The gas refining system XI includes a PSA device Υ1' two-connected true two-fruit device Υ2 and a muffler γ3. The PSA apparatus Y1 includes an adsorption tower 1〇Α, 1〇β, a raw material blower 2ι, 2, and a distribution 31 to 34, and is configured to adsorb impurities from a raw material gas which is a mixed gas by a pressure fluctuation adsorption method (psa method). The target gas component is concentrated and separated. In the present embodiment, the target gas component to be purified is oxygen in the air. In this case, the main impurity is nitrogen. Each of the adsorption columns 10A, 10B has a gas passage port u, 12 at both ends, and is filled with an adsorbent between the gas passage ports U, 12 for selectively adsorbing impurities in the raw material gas. In the present embodiment, as the adsorbent, a Fossil-based adsorbent which selectively adsorbs nitrogen which is a main impurity is used. However, in the case where the adsorbent uses molecular sieve carbon, it is also possible to adsorb oxygen in the air as an impurity and recover the gas as the target gas component. Further, 10 201139855 can be used as a target gas component by selecting a combination of a composition of a raw material gas and an adsorbent to recover carbon dioxide, carbon dioxide, hydrogen, and a hospital. In the present embodiment, the blower 21 is an air blower for attaching to n. 10A, 10B supply or deliver air taken in as a material gas. The tank 22 is for temporarily storing the purified gas (oxygen in the present embodiment). The pipe 31 has a trunk road 31' and branches 31a and 3ib. The main road 31, eight ends. The end portion 1 of the crucible 1 is connected to the gas delivery port of the material blower 21. Each of the branches 2, 31, 31, and the gas of the adsorption tower 1〇Α, 1〇Β is connected to the side of the port u and to the branches 31A and 31Β, and an automatic valve 3丨a, 3 which can be switched between an open state and a closed state is attached.丨b. The device 32 has a trunk road 32 and branches 32A, 32B. The trunk road 32 has an end portion E2. The end E2 is connected to the slot 22. Each of the branches 32 [32β] is connected to the gas passage opening 12 side of the adsorption towers 10A and 10B. Further, the branches 32A and 32B are provided with automatic valves 32a and 32b which are switchable between an open state and a closed state. The pipe 33 has a trunk road 33' and branches 33A, 33B. The trunk road 33 has an end portion E3. The end portion E3 is connected to the two-connected vacuum pump device γ2. Each of the branches 33A and 33B is connected to the gas passage opening u side of the adsorption towers 10A and 10B. Further, automatic valves 33a and 33b which are switchable between an open state and a closed state are attached to the branches 33A and 33B. Near the end portion of the main road 33', a pressure detector 80 is provided, and the pressure detector 80 detects the pressure of the suction port 41 of the vacuum pump 40 A. The pressure (outlet pressure value) in the connecting line 52 connected to the row 201139855 port 42 of the vacuum pump 40A is indirectly predicted by monitoring the pressure value (inlet pressure value) detected by the pressure detector 8 ,, the inlet pressure When the value is equal to the threshold value (pressure setting value), a signal is sent to open and close the opening and closing valve 61. The predetermined threshold value of the inlet pressure value is set, for example, to the outlet pressure value (the pressure in the connection line 52) to be the value of the atmospheric pressure. The piping 34 is provided as a branch 32A, 32B that bridges the piping 32. Specifically, the pipe 34 is connected between the automatic valve 32a of the branch 32A and the adsorption tower 10A, and is connected to the automatic valve 32b of the branch 32B and the adsorption tower 10B. The automatic valve 34a which is switchable between the open state and the closed state is attached to the pipe 34'. The continuous vacuum pump assembly i Y2 includes two vacuum systems 4GA, 40B, a motor 51, a connection official line 52, a pipe 53 and a bypass line 6〇, and is configured to operate by the operation of the vacuum pumps 40A and 40B. The internal pressure of the adsorption towers l〇A, 10B of the pSA device is reduced. The vacuum pump 40A is a positive displacement vacuum pump. In the present embodiment, the Lushi pump vacuum system 40B is also a Rogowski pump in this embodiment. The exhaust gas reservoir of the vacuum pump 40B (meaning that the maximum amount of gas that can be exhausted per unit time is the same as that of "intake") is smaller than the exhaust capacity of the vacuum system 40A. The vacuum pumps 40A, 4〇β have an intake port 41 and an exhaust port 42, respectively. The end portion 配3 of the pipe 33 of the above-described PSA device Y1 is connected to the intake port 41 of the vacuum pump 4A. For example, as shown in Fig. 2, the Roche fruit has a casing 4〇a and two rotors 4 in the casing 4〇a, for example, a dome-shaped rotor. The two rotors 4〇b are configured to rotate in synchronization with each other in the opposite direction. At the time of driving of the Rogowski pump, the gas entering the outer casing 40a from the intake port is sealed between the outer casing 40a and the rotor 40b, and is discharged to the exhaust port 42 by the rotation of the rotor 40b. In addition, in the case of the present invention, a sealed water supply means (not shown) for supplying so-called seal water to each of the outer casings 4a of the vacuum fruits 4A, 4B, B2 is provided in the two-connected vacuum pump device. Y2. The hermeticity of the two formed between the outer casing 4a and the rotor can be achieved by the sealing water. The motor 51 is for operating the vacuum pumping and 4〇β. In the two-connected type vacuum pump device Y2', the rotor of the vacuum pump 4A is rotationally driven in conjunction with the rotor of the vacuum 纟4 GB by one motor 51. Specifically, by a single motor 51, the rotor of the straight-lined pump 4UA is interlocked with the rotor of the vacuum pump 4〇B to be dried and sculpted; the private, the c drive, the motor 51 and the vacuum pump 40Α and 4〇β are mechanically connected via a shaft member or a gear member. The connecting line 5 2 is connected to the straight line of the 4th η Λ &# production history. The discharge port 42 of the 40 具 pump is connected to the suction port 41 of the vacuum pump 4 。. The camp and the Gu Gu ^
Ge bd具有鳊部E4、E5。配管53的 端部E4與真空泵40B的排翁口 49、去社 扪排轧口 42連接。配管53之另一方 的端部E5與消音器Υ3連接。 旁通管線6G具有是管線人口的端部E6及是管線出口 的端部E7 ’而且’在管線内具有開閉閥61及緩衝管Z1。 端部E6與真空泵4〇A、4〇 Π與配管53連接1閉二=7線52連接。端部 其71… 閥61位於在旁通管線6。之緩衝 間，在本實施形態，在達到壓力檢測器 :轉時:Γ值的時間點，在二連型真Μ裝置Μ …通的期間。開閉閥6;=而氣趙可在旁通管 4ηΑ61構成為檢㈣在來自真空菜 之排乳口 42的排氣量（每單位時 旦1 &古 才门μ際所排出之氣體 里）漸減而與真空系構的排氣容量—致時之吸氣口❹ 13 201139855 戶斤預先進行的測試特定），從開狀態切 壓力（該壓力係利用 換成閉狀態。如上述所示，因 计成比真空泵40A的排氣容量 為真空泵40B的排氣容量設 小，所以需要這種控制。 、緩衝管21如第1圖或第3圖所示，構成旁通管線60 的。卩刀’並包括旁通管線60之端部E6側的端壁71、端 E7側的端壁72、在端壁7卜端壁72間延伸的周壁73、 及孔口板74。在本實施形態’周壁73具有圓筒形。氣體 入口 73a設置於周壁73 +之端壁71侧的位置，而且氣體 出口 72a設置於端壁72。周壁73朝向水平方向η延伸較 佳。周壁73(即，緩衝管Ζ1)在延伸方向的長度例如是lm 以上。又，旁通管線60在設置於周壁73的氣體入口 73a 具有與緩衝管zi連接的連接f部62。此連接f部62構成 旁通管線60的一部分，緩衝管Z1位於上游側的正前並 規定即將被引入緩衝管Z1之氣體的流路。在本實施形態， 連接管部62朝向與周壁73之延伸方向（水平方向H)交又 的方向延伸。連接管部62朝向與周壁73之延伸方向垂直 的方向延伸較佳。連接管部62朝向鉛垂方向v，且從在鉛 垂方向V的下側與緩衝管Z1的周壁73連接更佳。 孔口板74是用以使通過緩衝管z 1的内部之氣體的流 路局部變窄的節流部，如第3圖及第4圖所示，具有開口 74a。在孔口板74(節流部）的開口率是20〜46%較佳，是 29〜39%更佳。開口 74a具有與緩衝管Z1之周壁73的内面 73，同一面的緣端74a’ 。即，圓筒形之緩衝管Z1的旋轉 對稱軸心與開口 74a的中心具有位置偏差，而周壁73的内 14 201139855 面73’與開口 74a之邊緣部的最下端74a’忐达 取馬同一面。 在二連型真空泵裝置Y2運轉時，具有開 a開閉閥61被設 定成開狀態而氣體可在旁通管線60㈣的期間。緩衝管 Z1構成為在旁通管線60之開閉閥6丨是開狀態的产兄在 來自真空泵40A之排氣口 42的排氣量超過直介石 、具二泵40B的排 氣容量（與吸氣容量相同）時，通過該緩衝管Z1之氣體在緩 衝管内最短滞留時間成為〇. 1 5秒以上。如上汗_ 处所示，因為 真空栗40Β的排氣容量比真空泵4〇α的排氣交θ , F札合罝小，所以 發生這種狀態。又，緩衝管Z1亦構成為在二連型真空泵裝 置Y2運轉時’在旁通管線6。之開閉閥61是開狀態的情 況’在來自真空泵40A之排氣口 42的排氣量超過真空泵 40B的排氣容量時，通過該緩衝管21之氣體在緩衝管内最 大流速成為6 ~ 12 m /秒較佳。 消音器Y3是在從本氣體精製系統χι排出氣體之該排 氣所發射的噪音變小的裝置。因Λ，若噪音不成問題： 可省略消音器Υ3’而將配管53及旁通管線6〇直接向 中開放。又’雖然在第1圖的實施形態，旁通管線60是在 與配管53匯合後與同一消音器γ3連接，但是亦可如第5 圖所不’作成將配管53及旁通管線6。分別與 器Υ3、Υ3，連接。 月曰 使用具有如以μ + π —Ge bd has jaws E4 and E5. The end portion E4 of the pipe 53 is connected to the discharge port 49 of the vacuum pump 40B and the outlet port 42 of the outlet. The other end E5 of the pipe 53 is connected to the muffler Υ3. The bypass line 6G has an end portion E6 which is a line population and an end portion E7' which is a line outlet, and has an opening and closing valve 61 and a buffer tube Z1 in the line. The end portion E6 is connected to the vacuum pump 4A, 4A, 配, and the pipe 53 by a closed second = 7 line 52. End 71. The valve 61 is located in the bypass line 6. In the present embodiment, in the present embodiment, the time at which the pressure detector is turned: the time when the voltage is turned off is during the period in which the two-connected type true device is turned on. The opening and closing valve 6; = and the gas can be configured in the bypass pipe 4nΑ61 to check (4) the amount of exhaust gas from the milk discharge port 42 (in the gas discharged from the unit 1 & Gu Caimen) The pressure is gradually reduced and the exhaust capacity of the vacuum system is — 13 201139855, the test is performed in advance, and the pressure is cut from the open state (the pressure is changed to the closed state. As shown above, It is calculated that the exhaust capacity of the vacuum pump 40A is smaller than the exhaust capacity of the vacuum pump 40B, so such control is required. The buffer tube 21 constitutes the bypass line 60 as shown in Fig. 1 or Fig. 3. The end wall 71 on the end E6 side of the bypass line 60, the end wall 72 on the end E7 side, the peripheral wall 73 extending between the end wall 7 and the end wall 72, and the orifice plate 74. In the present embodiment, the peripheral wall The gas inlet 73a is provided at a position on the side of the end wall 71 of the peripheral wall 73 +, and the gas outlet 72a is provided at the end wall 72. The peripheral wall 73 preferably extends toward the horizontal direction η. The peripheral wall 73 (i.e., the buffer tube 1) The length in the extending direction is, for example, lm or more. Further, the bypass line 60 is provided on the peripheral wall 73. The gas inlet 73a has a connection f portion 62 connected to the buffer tube zi. This connection f portion 62 constitutes a part of the bypass line 60, and the buffer tube Z1 is located directly in front of the upstream side and defines the flow of the gas to be introduced into the buffer tube Z1. In the present embodiment, the connecting pipe portion 62 extends in a direction overlapping with the extending direction (horizontal direction H) of the peripheral wall 73. The connecting pipe portion 62 preferably extends in a direction perpendicular to the extending direction of the peripheral wall 73. 62 is oriented in the vertical direction v, and is preferably connected to the peripheral wall 73 of the buffer tube Z1 from the lower side in the vertical direction V. The orifice plate 74 is for locally changing the flow path of the gas passing through the inside of the buffer tube z1. The narrow throttle portion has an opening 74a as shown in Fig. 3 and Fig. 4. The aperture ratio of the orifice plate 74 (throttle portion) is preferably 20 to 46%, more preferably 29 to 39%. The opening 74a has an inner surface 73 of the peripheral wall 73 of the buffer tube Z1, and an edge end 74a' of the same surface. That is, the rotational symmetry axis of the cylindrical buffer tube Z1 has a positional deviation from the center of the opening 74a, and the inside of the peripheral wall 73 14 201139855 Face 73' and the lowermost end 74a' of the edge of the opening 74a When the two-connected vacuum pump device Y2 is operated, the opening/closing valve 61 is set to the open state and the gas can be in the bypass line 60 (four). The buffer tube Z1 is configured as the opening and closing valve 6 of the bypass line 60. When the amount of exhaust gas from the exhaust port 42 of the vacuum pump 40A exceeds the volume of the exhaust gas of the two pumps 40B (the same as the suction capacity), the gas passing through the buffer tube Z1 is in the buffer tube. The shortest residence time is 〇. 15 seconds or more. As shown in the above sweat _, this state occurs because the exhaust capacity of the vacuum pump 40 比 is smaller than the exhaust gas θ of the vacuum pump 4 〇 α. Further, the buffer tube Z1 is also configured to be in the bypass line 6 when the two-connected vacuum pump unit Y2 is operated. When the opening and closing valve 61 is in the open state, when the amount of exhaust gas from the exhaust port 42 of the vacuum pump 40A exceeds the exhaust capacity of the vacuum pump 40B, the maximum flow velocity of the gas passing through the buffer tube 21 in the buffer tube becomes 6 to 12 m / Second is better. The muffler Y3 is a device that reduces the noise emitted from the exhaust gas which is exhausted from the gas purifying system. Therefore, if the noise is not a problem: the muffler Υ 3' can be omitted and the pipe 53 and the bypass line 6 〇 can be directly opened to the center. Further, in the embodiment of Fig. 1, the bypass line 60 is connected to the pipe 53 and connected to the same muffler γ3. However, the pipe 53 and the bypass line 6 may be formed as shown in Fig. 5. Connect to Υ3 and Υ3 respectively. The moon is used as with μ + π —
上之所不之構成的氣體精製系統X 含PSA裝置Y1及二連 ^ •具二泵裝置Y2)’可從原料氣體（ 本實施形態為空氣')镥制 > )精製目才示軋體成分（在本實施形鲅 氣）。具體而言，在PSA _番νι ^ •、马乳 任PSA裝置γ〗及二連型真空泵裝置”運 15 201139855 轉時，藉由在既定時序對PSA裝置γι中的自動閥3ia、3ib、 32a、32b ' 33a、33b、34a切換開閉狀態，而在系統内實 現所要之氣體的流動狀態，纟psA裝置γι的吸附塔1〇八、 10B重複進行由以下之步驟丨~4所構成的一個循環，可取 得精製氧氣。在一個循環(步驟卜4)，如第6圖所示在各 吸附：1G A 1 ο B ’進行吸附製程、降壓再生製程及復壓製 程。 在步驟卜在吸附塔l〇A進行吸附製程，而且，在吸 附塔10B進行降壓再生製程。在步驟i進行吸附製程的吸 附塔10A經由後述的步驟4(在吸附塔1〇A進行復壓製程）， 而塔内位於相對高壓(例如，在壓力計顯示比大氣壓稍高約 40kPaG: G表示錶壓力，以下亦相同）之狀態。而且，在步 驟1’於這種吸附塔10A的氣體通過口丨丨側，從原料鼓風 機21經由配管31中的主幹路31’及支路3U被持續引入 空氣，該S氣中之主要1氣被吸附塔1〇A _吸附劑吸 附’而且氧氣被豐富化的精製氧氣從吸附塔1〇A之氣體通 過口 12被持續引出。精製氧氣經由配管32的支路及 主幹路32，向槽22被引導，而储存於槽22。關於此精製 氧氣，亦可從槽22向既定裝置或工廠持續供給。 同時，在步驟丨，在經過了後述之步驟3〜4(在吸附塔 10B進行吸附製程）的吸附塔1〇B，利用二連型真空泵裝置 Y2將内部降壓。具體而言，將吸附塔1〇B的氣體通過口 側與二連型真空系裝置Y2之真空栗4〇A的吸氣口 4i側設 定成經由配管33連通之狀態後，利用二連型真空泵裝置 201139855 Υ 2將吸附塔1 〇 β的内 1 错此’主要從吸附塔1 OB内 的吸附劑脫除氮氣並引 丨出至4外’並將該氮氣（of f氣體） 從吸附塔1 0B的氣體7 , 、、·過口 11側經由配管33中的支路33Β 幹路33向—連型真空果褒置Y2引導。藉由從吸附 塔10B内的吸附劑脫除氣氣，而將㈣附劑再生。在這種 降壓再生製程之開私β ρ 開始時，吸附塔ί〇Β的内部壓力例如是約 G又纟降壓再生製程結束時’吸附塔⑽的最終 到達内部壓力根據氧體溫度而變，例如是-66~-72kPaG。 ,” 2在及附塔1 〇 a從步驟^繼續進行吸附製程， 而且在吸附塔10B進行犓题制和 , 逆订復&裟程。在步驟2，具體而言， 從步驟1繼續從原料赫秘〇，& '、科妓風機21向吸附塔10A的氣體通過口 11側繼續供给处齑，# „ 二、並從吸附塔1 〇 A的氣體通過口 12側 繼續引出精製氣顏。撼制 、 精t氧乱的一部分被引入並儲存於槽 22 °精製氧氣之其他的_ ^ ^ ^ ^ 〇丨刀左由配管34被引入吸附塔 10B的氣體通過口 12彳目丨丨。。 产 側在步驟2 ’藉由從吸附塔1 〇Β的 氣體通過π 12側引人精製氧氣而吸附塔⑽的内部壓力 復原。即，吸附塔10Β恢復到相對高壓（例如大氣壓〜約 40kPaG的壓力）之狀態。 在v驟3〜4，與在步驟^在吸附塔1〇A所進行的一 樣，在吸附塔1GB進行吸附製程。因此，在步冑卜2 ,從 吸附塔1 GB的氣體通過σ i 2側繼續引出精製氧氣，此精製 氧氣被引入並儲在於槽99。n>t 诚仔於摺U。冋時，在步驟3〜4，與在步驟 1〜2在吸附塔1 〇 r所推名_ υβ所進仃的一樣’在吸附塔丨〇Α進行降壓 步驟；^及復-製程（步驟4)。在步驟3之吸附塔 17 201139855 1 0A的降壓再生製程，在將吸附塔丨〇A的氣體通過口 u側 與二連型真空泵裝置Y2之真空泵40A的吸氣口 41側設定 成經由配管33連通之狀態後，利用二連型真空泵裝置γ2 將吸附塔1 0 A的内部降壓。藉此，主要從吸附塔1 〇 a内的 吸附劑脫除氮氣並引出至塔外，並將該氮氣（〇ff氣體）從 吸附塔1 0A的氣體通過口 11側經由配管33中的支路33A 及主幹路33’向二連型真空泵裝置Y2引導。藉由從吸附 塔1 0A内的吸附劑脫除氮氣，而將該吸附劑再生。 依此方式，從氣體精製系統XI可將空氣作為原料並持 續取得精製氧氣。在這種氣體精製系統χι，關於二連型真 空泵裝置Y2，具體而言，使其如以下所示運轉。 在上述的步驟U在吸附塔10B進行降壓再生製程）， PSA裝置Y1之吸附塔丨〇B的氣體通過口丨丨側與二連型真 空泵裝置Y2之真空泵40A的吸氣口 41側處於經由配管33 連通之狀態，利用馬達51驅動真空泵4〇A、4〇B(經由連結 管線52串接），而將吸附塔1〇B的内部降壓。在二連型真 空泵裝置Y2之旁通管線6〇的開閉閥6丨在步驟丨（降壓再 生製程）開始時，在吸氣口 41附近之配管33的内部壓力位 於比大氣壓稍高的壓力（因為在吸附塔B之吸附壓力例如 是4〇kPaG)，連結管線52(承受藉真空泵40A之加壓之側） 之内部亦成為大氣壓以上。因而，在pSA裝置γι的吸附塔 10B之降壓再生製程剛開始後，$自吸附塔⑽# 于氣 體通過在二連型真空泵裝置Y2的真空泵40A後，一部分通 真支0B 。卩分通過旁通管線60’再經由消音器Y3 18 201139855 向外部被排出。 又，來自繼續吸入在步驟1之來自吸附塔1〇B(進行降 壓再生製程）的off氣體之真空泵4〇A的排氣量因應於與吸 附塔1 0 B連結之真空栗4 0 A之吸氣口 41側的壓力（即，二 連型真空泵裝置Y2的入口壓力）而變化。具體而言，該降 壓再生製紅愈進行，吸附塔10B的内部壓力變成愈小（因 此，真空泵40A之吸氣口 41側的壓力亦變小），隨著來自 真空泉4 0 A的排氣量逐漸減少。 來自繼續吸入在步驟1之來自吸附塔1〇B的〇ff氣體 之真空泵40A的這種排氣量中，超過真空泵4〇B的排氣量 之流量的氣體對真空泵40B是多餘氣體（如上述所示，真空 泵40B的排氣量比真空泵4〇A的排氣量小）。對真空泵*卟 的多餘氣體僅在從吸附塔10B之降壓再生製程（步驟丨）開 始時之某期間存在。在降壓再生製程吸附塔1〇β的内部壓 力1小時’真空泵4 〇 A之吸氣口 41側的壓力亦一樣變小。 隨著，來自真空泵40A的排氣量減少至與真空泵4〇B的排 乳容量（與吸氣容量相同）一致，在該一致後，因為開閉閥 61成為閉狀態’所以來自真空泵40B的排氣量在仍然與真 空泵40B的排氣量一致下繼續減少。在降壓再生製程之真 空泵40A之吸氣口 41側的壓力變化根據氣體溫度而如第7 圖所示。即，因為氣體溫度昇高時吸附劑之氣體吸附量減 少’所以第1真空泵40A之吸氣口 41 (二連型真空果带置 Y2的入口）的壓力在降壓再生時間中快速下降，因為氣體 溫度變低時吸附劑的氣體吸附量增加，所以此壓力的下降 19 201139855 變慢。 另一方面，作為二連型真空泵装置Y2的排氣量特性， 在第8圖表示吸氣口壓力、視在排氣量（意指未換算成標準 狀態的排氣量，在意指換算成標準狀態之排氣量的情況， 附加表示標準狀態之“ Ν”的標示））及所要動力最佳之關 係。此關係不會受到氣體溫度影響，第1真空泵4〇Α與第 2真空泵40Β之連結管線52内的壓力成為大氣壓的點不會 在吸氣口 41之壓力約一42kPaG的附近移動，即使排氣氣 體的溫度變化，而吸附劑的吸附氣體量變化，亦不會變化。 因此，將壓力檢測器80設置於無氣流振動之吸氣口 41側 附近，並預先設定第1真空泵40A與第2真空泵4〇B之連 結管線52内的壓力到達成為大氣壓以上或成為大氣壓以 下時的灰化點時的入口壓力值（例如_42kPaG)，可使第1 真空泵40A與第2真空泵40B —直以無浪費的組合運轉， 而作為二連型真空泵裝置Υ2’進行最小之所要動力的運轉。 在二連型真空泵裝置Y2,在從吸附塔1〇B之降壓再生 製程開始時之多餘氣體存在的期間中（即來自真空泵40A 的排氣量超過真空泵40B的排氣量時），檢測出吸氣口 41 側的壓力大於壓力檢測器8〇的壓力設定值（例如— 42kPaG)，將旁通管線60的開閉閥61設為開狀態，控制氣 體流動，使該多餘氣體從連結管線52向旁通管線6〇流入。 又，在此壓力成為壓力檢測器8〇之該壓力設定值時，即， 來自真空果40A的排氣量漸減，而變成與真空聚4〇β的排 氣量相等時’將旁通管線60的開閉閥61設為閉狀態，而 20 201139855 將兩真空泵4〇A、40B設為完全串列狀態。 在從吸附塔1 0B之降壓再生製程開始時之發生多餘氣 體的期間中’該多餘氣體從連結管線52向旁通管線60流 入後’在旁通管線60，通過緩衝管zi，接著通過開閉閥 61 ’然後’經由端部E7與E5被引入消音器Y3(或第5圖 之另外的消音器Υ3’ ）’而該多餘氣體經由消音器γ3被排 出氣體精製系統XI外。同時，在發生多餘氣體之狀態，亦 從經由連結官線52與真空泵40Α連結之真空泵40Β的排氣 口 4 2排出氣體。但，在此情況，實質上之降壓的工作僅由 刖段的真空泵40Α進行，後段的真空泵4〇Β實質上未參與 降壓。因為真空泵4〇β的排氣口 42經由配管53與消音器 Υ3連接，所以通過了真空泵4〇β的氣體經由消音器γ3被 排出氣體精製系統XI外。 力一万囟，在吸附塔10Β之降壓再生製程未發生多 乳體之狀態’處於完全串列狀態的真空泵4〇Α、4〇β協同 作，使是降壓對象容器之吸附塔1 0Β的内部降壓，而從 二泉40B排出既定量的氣體。此排出氣體經由配管被 入消音Is Y3 ’並被排出氣體精製系、统χι外。此時，因 旁通管線60的開閉閥61處於閉狀態，所以無通過旁通 線6 0的氣體。 在上述的步驟1之關於吸附塔1 0B的降壓再生製程 &使二連型真空果裝置γ2進行降壓運轉 執行。在上诚夕丰η 步驟3之關於吸附塔ι〇Α的降壓再生製系 亦與上述之關於吸附塔10B的降壓再生製程-樣，藉由 201139855 -連型真Μ裝置Y2it行降壓運轉而執行。 在二連型真空栗裝置Y2之降壓運轉 在開始降壓時處於開狀態的開閉間61，在=返所示， 的排氣量漸減而與真空栗權的排氣容量-致二空栗4〇Α 檢測器8。檢測出吸氣口 41側的壓力， 能以壓力 成閉狀態。這種構成有助於在降壓 ；：被切換 似與真μ働串列動作，而使真空栗 效率地運轉。而且，因為可使二連型真空栗；=置”高 動力最小化之壓力檢測器8。的設定值 =要 ::響’所以與預設從開始降壓時的經過時間，：= 閥61之閉開動作的情況相 仃開閉 所要動力^的問題。 胃發^度^所造成之 用二二二連型真空栗裝置Υ2’如上述所示，構成為利 二1進行真空請的轉子傷與真空請的 《連動旋轉驅動。這種構成適合用以降低二連型 真空果裝置Υ2的所要動力。 、，其次，詳細說明緩衝管Ζ1的作用。如上述所示，在二 里真工栗裝置Υ2’來自真空果4〇α的排氣量因應於愈吸 :塔m或吸附塔10Β連結之真空請之吸氣口 41側的 ^而變化，吸氣口 41側的壓力愈小，排氣量愈小。因此， 排氣量成為最大值是降壓再生製程開始時，在發生多餘氣 =(來自真空泵40Α的排氣量中超過真空泵40Β之排氣量的 氣體量°卩分）之狀態（在發生多餘氣體時旁通管線60的開 閉閥61處於開狀態），多餘氣體量（流量）取最大值的亦是 22 201139855 開始降壓時。又’多餘氣體從連結管線5 & 流入的速度亦在此開始降壓時成 ^線60 ⑽内通過緩衝…多餘氣體滞::緩旁通管線 在從連結管線52向旁通管線間， 始:壓時多餘氣體通過緩衝管ζι的時間最 壓時多餘氣體通過緩衝管Z1的 幵〇降 友衝官Z1的時間設為緩 留時間。在二連型真_置 s内最短- 〆铁十 後衝官Z1構成為使此 緩衝官内最短滯留時間成為0.15秒以上 在降壓運轉中從真空栗40A所排出之氣體發生比較大 2氣二連型真空泵裝置Y2發生多餘氣體之狀 、结官線52向旁通管線60流入之多餘氣體亦發 t較大的孤流振動。在從二連型真空泵裝置丫2的 Γ拿掉緩衝管Z1的情況，由於那種多餘氣體的氣流： :，而助長該旁通管線60之開閉閱61之轴61a的機械性 惡化。這是由於伴隨氣流振動而持續曝露於在旁通管線60 内流動之氣體的軸61a從該氣體被賦予振動能量而不 繼續振動。軸…之這種振動誘發構成轴61a之材料：織 之局部的破壞，進而’促進轴61a之機械強度的惡 一面對真空果偏的泵機構内供給密封水，-面使該相關 泵裝置運轉的情況，軸6ia之機械強度的惡化變 著。由多餘氣體之氣流振動所造成之軸61a的振動程度可 能在振動加速度上達到約1 3 G以上。 又 相對地，在本實施形態的二連型真空系裝置Y2’藉由 緩衝s Z1 «又置於旁通s線6〇 ’而且緩衝管冓成為二緩 23 201139855 衝管内最短滯留時間成為Gl5秒以上，在多餘氣體通過旁 通管線60時多铪齑挪## ^ '、體的氧流振動在緩衝管Z1高效率地衰 f因此《刀抑制在二連型真空系裝置γ2，位於比緩衝 下斿之構件(尤其開閉閥61的軸61a)之機械強度的 惡化。 在連5L真空栗裝置γ2，如第9圖所示，亦可旁通管 線0匕括/、有止回功能的開閉閥61，，替***閉閥61。 開閉閥61 ’構点氣μ 成為在旁通官線60不是開閉閥61，，而是 緩衝S Ζ1側的壓力比端部Ε7側的壓力更高時取開狀態， 而且在緩衝官Z1側的壓力成為端部Ε7侧的壓力以下時取 閉狀態。it種具有止回功能的開閉閥61，纟二連型真空系 裝置Y2之降壓運轉時，剛開始降壓後處於開狀態，來自真 工栗4GA的排氣量漸減而與真空《權的排氣容量一致時 (那時連結管線52内的壓力成為約大氣壓）自動從開狀態 切換成閉狀癌。這種構成有助於降低真空泉_的運轉損 失而使—連型真空泵裝置Y2高效率地運轉。 如上述所示，緩衝管Z1在作為用以使通過其内部之氣 體的流路變窄的節流部上具有孔口板74，而且此孔口板Μ 的開口率是2(M難佳，是29〜⑽更佳。這種構成有助於 通過緩衝t Z1之該多餘氣體的氣流振動高效率地衰減， 又，孔口板74適合作為節流部，高精度地調整該開口率。 /〜如上述所示，開口 74a之邊緣部的最下端與緩 衝Z1的内壁s 73’成為同—面。利用這種構成，通過 緩衝管之多餘氣體所包含的水滴（來自於上述的密封水） 24 201139855 易通過緩衝管z 1。 "在緩衝管Z1 ’亦可不設置孔口板74，而構成為藉由適 田地D又疋緩衝官Z1的長度及/或内徑，使該緩衝管内最短 滞留時間成為〇. 1 5秒以上。 这所示緩衝管Z1構成為在二連型真空泵裝置 Y/之降壓運轉時旁通管線60的開閉閥61(或61’）是開狀 心的it况，來自真空泵40A之排氣口 42的排氣量超過真空 泵40B之排氣谷量（吸氣容量）時通過該緩衝管a之氣體的 緩衝管内最大流速成為6〜祕、。在旁通管線6〇内多餘 氣體通過緩衝管Z1時的流速在從連結管線52向旁通管線 6〇流入之速度成為最大的開始降壓時最大。將開始降壓時 多餘氣體通過緩衝f Z1時的該流速設為緩衝管内最大流 速。在一面在該緩衝管内最短滯留時間實現〇. 15秒一面 :旁通管線6。的端部E7高效率引出多餘氣體上，將緩衝 皆zi構成為使緩衝管内最大流速成為秒較佳。 如上述所示，旁通管線6〇具有在設置於在緩衝管Z1 之周壁73之端壁71側的位置之氣體入口 73a與緩衝管Z1 連接之用以向緩衝管Z1引入氣體的連接管部62。而且， 連接管部62在與周壁73之延伸方向(第3圖的水平方向 H)，又的方向延伸，在正交的方向⑷垂方向v)延伸較佳， 在鉛垂方向V延伸且從鉛垂方向V的下側與周壁μ連接更 佳。廷種構成適合一面在該緩衝管内最短滯留時間實現 〇 · 1 5秒以上’ 一面使緩衝管Z1小型化。 第10圖係第1變形例之緩衝管Z1，及其附近之部分 25 201139855 】面模式圖°緩衝管ΖΓ包括在旁通管線60之端部Ε6側 的總辟 71 山 % & Q、碥部Ε7側的端壁72、在端壁71、端壁72間 延伸的周壁73、及複數孔口板74 ’端壁71是圓筒形。各 恨疋用以使通過緩衝管Z1’的内部之氣體的流路 局邛良乍的節流部，並具有開口 74a。複數孔口板74沿著 B 内的氣體流路排列，包含在氣體流路位於最上 】的孔口板了4’與位於最下游側的孔口板74” 。因為這 T構成的緩衝管Z1 ’利用複數孔口板74使多餘氣體的氣 机振動分段衰減’所以氣流振動的衰減效果高。 第11圖及第12圖表示第2變形例的緩衝管ζ Γ 。緩 衝s Z1包括在旁通管線60之端部E6側的端壁71、端部 E7側的端壁72、在端壁71、端壁72間延伸的周壁73、及 阻板75，周壁73是圓筒形。阻板75是用以使通過緩衝管 的内。卩之氣體的流路局部變窄的節流部。在阻板Μ的 開：率是2。’%較佳’是29~39%更佳。阻板75的開口率 意，未被阻板75佔有之氣體流路的截面積相對緩衝管 Z之截面積的百分比。這種構成的緩衝管Z1” ’阻柘7 作用為節流部，使多餘氣體的氣流振動高效率地衰減 阻板75在該開口率的調整比孔口板更容易。 ， :二可二衝管Z1”包括複數阻板75。在此情況，複數 且 沿者氣體流路隔著適當間隔被配設，並包含 體流路位於最上游伽的贫， c #在該氣 令第1阻板與位於最下游側的 板。因為這種構成的姐& # 乐Z阻 U構成的_㈣用複數阻板Μ使多 氣流振動分段衰減，所 、軋體的 厅乂虱〜振動的衰減效果高。 26 201139855 第13圖及第14圖表示第3變形例的緩衝管a。 管Z2包括在旁通管線6〇’之端部E6側的端壁、μ衝 的端壁72、在端壁71、端壁72間延伸的周壁73、及孔3 板74,周壁73是圓筒形。氣體入口 &設置於” 而且氣體出口 72a設置於端壁72。雖然緩衝管 入口設置於端壁71而不是周壁73上，盥、 ”乐d圖所不的缓 衝管Z1相異，但是其他的構成是盥 ， Z、弟d圖所不的緩衝管 —樣。 另一方面，旁通管線60,㈣接管部62，纟設置於端 璧71的氣體入口 71a與緩衝管以連接。連接管部μ，在 爹通管線60’位於緩衝管Z2之上游側的正前並規定即 將被引入緩衝管Z 2之前之氛體的、、办 月』&轧體的流路。又，連接管部62， 異有用以使即將被引入緩衝管7?少义> a抓 之則之氣體的流動彎曲 的彎曲構造。連接管部，且女 〃有用以使即將被引入緩衝管 22之前之氣體的流動彎曲9。度的彎曲構造較佳。連接管 部62酉己設成從在鉛垂方^的下側引入氣體並向緩衝管 引入更佳。 雖然以上說明了本發明之實施形態及各種變形例，但 是這些可彼此纟且人。彳丨L > 疋 、且口例如，亦可將第9圖所示之具有止回 功能的開閉閥61’盥第n圄辦_ & 、弟U圖所不的緩衝管Z2組合。又， 在第13圖所示的緩衝 野官亦可如第1〇圖所示設置複數 孔口板74，亦可設置第 _ c、、 弗U圖所不之一片阻板75(或複數阻 板75)。進而，亦可 _ 將第3圖所不的孔口板74與第11圖 戶斤杀的阻板75組合。 27 201139855 [實施例] 其人與比較例一起說明本發明之實施例。但，應留 意比較例只$ W本專利申人為了確認本發明之效果所 進行的實驗例，不是屬於周知技術。 [第1實施例] 將二連型真空泵裝置Y2之第i真空泵4〇A的排氣容量 為14800m3/h、第2真空泵40B之排氣容量為141〇〇mVh的 魯氏系串接’在氣體溫度3〇t時，使用第（圖所示的氣體 精製系統XI ’在各吸附塔i 〇A、1 〇B重複進行由第6圖所 不之吸附製程、降壓再生製程及復壓製程所構成之一個循 環（步驟卜4)，藉此從是原料氣體的空氣取得氧氣。在本 實施例，藉PSA裝置Y1的原料鼓風機21將空氣的供給量 設為8300Nm3/h(N :表示標準狀態，以下相同）。將在吸附 製程之吸附塔l〇A、10B的内部壓力設為最大4〇kPaG。又， 在降壓再生製程之吸附塔1〇A、1〇B之内部的降壓再生製程 末期壓力成為一69kPaG ’關於在復壓製程的吸附塔丨〇A、 1 0B，使其内部壓力恢復至大氣壓。又關於吸附塔丨〇A、 10B的降壓再生製程，吸氣口 41側的壓力在如第8圖所示 的特性，以壓力檢測器8〇檢測出達到—42kPaG的壓力值 時，開閉閥61從開狀態被設定成閉狀態。 在本實施例’二連型真空泵裝置γ2如以下所示進行降 壓運轉。從降壓再生製程開始時至壓力檢測器8〇的指示值 從約大氣壓至一42kPaG之間’即來自真空泵40A的排氣量 超過真空泵40B之排氣容量時，向旁通管線60的開閉閥 28 201139855 61發送#號而設為開狀態，控制氣體流動，使該多餘氣體 從連結管線52向旁通管線60流入。然後，來自真空泵4〇A 的排氣量漸減，而變成與真空泵4〇B的排氣量—致時，即 壓力檢測器80表示約—42kPaG時，將開閉閥61從開狀態 切換成閉狀態，而將兩真空泵4〇Α、4〇β設為完全串列狀態 後’使一連型真空泵裝置Y2繼續進行降壓運轉。結果，真 空系之累加所要動力的平均值成為2〇6kW。 [第2實施例] 將二連型真空泵裝置Y2之第1真空泵40A的排氣容量 為14800m3/h、第2真空泵40B之排氣容量為14100m3/h的 魯氏泵串接，在氣體溫度40°C時，使用第1圖所示的氣體 精製系統XI ’在各吸附塔10A、1〇B重複進行由第6圖所 示之吸附製程、降壓再生製程及復壓製程所構成之一個循 環（步驟1〜4)，藉此從是原料氣體的空氣取得氧氣。又， 藉PSA裝置γι的原料鼓風機21將空氣的供給量設為 8300Nm3/h，將在吸附製程之吸附塔1〇A、1〇B的内部壓力 設為最大40kPaG。又’在降壓再生製程之吸附塔i〇A、1〇B 之内部的降壓再生製程末期壓力下降至一 72kpaG，關於在 復壓製程的吸附塔1 、1 〇B，使其内部壓力恢復至大氣壓。 又，關於吸附塔1〇Α、10B的降壓再生製程，吸氣口 41側 的壓力在如第4圖所示的特性，以壓力檢測器8〇檢測出達 到一42kPaG的壓力值時，開閉閥61從開狀態被設定成閉 狀態。 關於二連型真空泵裝置Y2，進行與第i實施例一樣的 29 201139855 操作’在壓力檢測器80表示—42kPaG時，將開閉閥61從 開狀態切換成閉狀態，而將兩真空聚4〇A、權設定成完全 串列狀m使二連型真空泵I置Υ2繼續進行降壓運轉。 結果’真空泵之累加所要動力的平均值成為2刪。 [第1比較例] 與第1實施例一樣’將二連型真空泵裝置Y2之第i真 空泵40A的排氣容量為2真空泵4〇B之排氣 容量為14100mVh的魯氏栗串接，在氣體溫度航時，使 用第1圖所示的氣體精製系統χ卜在各吸附塔1〇A、1〇B 重複進行由第6圖所示之吸附製程、降壓再生製程及復壓 製程所構成之一個循環（步驟i，藉此從是原料氣體的 空氣取得氧氣。在本比較，n PSA裝置Y1的原料鼓風機 21將空氣的供給量與第i實施例一樣設為83〇〇Nm3/h，將 在吸附製程之吸附塔l〇A、10B的内部壓力設為最大 40kPaG。又，在關於吸附塔10Α、1〇β之降壓再生製程末 期壓力成為一69kPaG。開閉閥61之從開狀態往閉狀態的切 換如第7圖所示，被設定成在降壓再生時間經過了 7.5秒 時開閉閥61從開狀態變成閉狀態。那時吸氣口 41的壓力 表示~ 35kPaG。關於在復壓製程的吸附塔1 、1 〇B，使其 内部壓力恢復至大氣壓。 二連型真空泵裝置Y2如以下所示進行降壓運轉。吸氣 口 41的壓力從降壓再生製程開始時開始7. 5秒鐘内，從約 大氣壓至一35kPaG之間，將旁通管線60的開閉閥61設定 成開狀態，然後，將開閉閥61從開狀態強迫地切換成閉狀 30 201139855The gas purification system X including the PSA device Y1 and the second pumping device Y2)' can be refined from the raw material gas (in the present embodiment, air). Ingredients (in this embodiment, helium). Specifically, the automatic valves 3ia, 3ib, 32a in the PSA device γι are at a given timing when the PSA _ _ ν ι ^ •, the horse milk is the PSA device γ 〗 and the two-connected vacuum pump device 15 15 201139855 rpm 32b '33a, 33b, and 34a switch between the open and close states, and the desired gas flow state is realized in the system. The adsorption towers of the 纟psA device γ1 are repeated one cycle of the following steps 丨~4. Refined oxygen can be obtained. In one cycle (step 4), as shown in Fig. 6, the adsorption process, the pressure reduction regeneration process and the recompression process are carried out in each adsorption: 1G A 1 ο B '. l〇A is subjected to an adsorption process, and a depressurization regeneration process is performed in the adsorption column 10B. The adsorption column 10A performing the adsorption process in the step i is subjected to the step 4 (the recompression process in the adsorption column 1A), which is described later, in the column. It is in a state of relatively high pressure (for example, when the pressure gauge shows a temperature slightly higher than atmospheric pressure by about 40 kPaG: G is the gauge pressure, and the same applies hereinafter). Moreover, in the step 1', the gas of the adsorption tower 10A passes through the port side, from Raw material blower 21 via The main road 31' and the branch 3U in the pipe 31 are continuously introduced with air, and the main gas in the S gas is adsorbed by the adsorption tower 1A__ adsorbent' and the oxygen is enriched by the purified oxygen from the adsorption tower 1A The gas is continuously drawn through the port 12. The purified oxygen is guided to the tank 22 via the branch of the pipe 32 and the trunk road 32, and is stored in the tank 22. The refined oxygen can be continuously supplied from the tank 22 to a predetermined device or factory. At the same time, in the step 丨, the adsorption tower 1〇B which has undergone the steps 3 to 4 (the adsorption process in the adsorption column 10B) described later is used to lower the internal pressure by the two-connected vacuum pump device Y2. Specifically, The gas passage of the adsorption tower 1B is set to the state of the intake port 4i of the vacuum pump 4A of the two-connected vacuum system Y2, and is connected to the state via the pipe 33, and then the two-connected vacuum pump device 201139855 Υ 2 The internal 1 of the adsorption tower 1 〇β is wrong. This is mainly to remove nitrogen from the adsorbent in the adsorption tower 1 OB and draw it out to the outside of '4' and the nitrogen (of f gas) from the adsorption tower 10B gas 7 The port 11 is routed through the branch 33 in the pipe 33. The continuous vacuum can be guided by Y2. The gas is removed from the adsorbent in the adsorption column 10B, and the (4) accessory is regenerated. At the beginning of the opening and lowering of the β ρ in the depressurization regeneration process, the adsorption tower is 〇 The internal pressure of the crucible is, for example, about G and the end of the depressurization regeneration process. The final internal pressure of the adsorption tower (10) varies depending on the oxygen temperature, for example, -66 to -72 kPaG. , 2 in and with the tower 1 〇a The adsorption process is continued from step ^, and the adsorption column 10B is subjected to the enthalpy and the reverse process. In step 2, specifically, from step 1, the supply of the material from the raw material Hermite, & ', the wind blower 21 to the gas passage port 11 side of the adsorption tower 10A continues to be supplied, # „ 2, and from the adsorption tower 1 The gas of 〇A continues to be extracted from the side of the port 12, and a part of the sputum and the sulphur is introduced and stored in the tank 22 °. The other _ ^ ^ ^ ^ of the refined oxygen is introduced by the pipe 34 from the left. The gas of the adsorption column 10B passes through the port 12. The production side recovers the internal pressure of the adsorption column (10) by introducing the oxygen from the adsorption column 1 through the π 12 side by the gas from the adsorption column 1 . The column 10 is returned to a state of relatively high pressure (e.g., atmospheric pressure to about 40 kPaG). In the steps 3 to 4 of v, the adsorption process is performed at 1 kg of the adsorption column as in the step of the adsorption column 1A. In step 2, the purified oxygen is continuously extracted from the gas of 1 GB from the adsorption tower through the σ i 2 side, and the refined oxygen is introduced and stored in the tank 99. n>t is in the case of folding U. 4, with one of the steps 1-2 in the adsorption tower 1 〇r 'Depressurization step in the adsorption tower; ^ and complex-process (step 4). In the depressurization regeneration process of the adsorption tower 17 201139855 1 0A in step 3, the gas of the adsorption tower A is passed through the port u The side of the intake port 41 of the vacuum pump 40A of the side and the two-type vacuum pump device Y2 is set to be in a state of being connected via the pipe 33, and then the inside of the adsorption tower 10A is stepped down by the two-connected vacuum pump device γ2. The adsorbent in the adsorption tower 1 〇a is desorbed with nitrogen and taken out to the outside of the column, and the nitrogen gas (〇ff gas) is passed from the gas passage port 11 side of the adsorption tower 10A via the branch 33A and the main road 33 in the pipe 33. 'Direction to the two-connected vacuum pump unit Y2. The adsorbent is regenerated by removing nitrogen from the adsorbent in the adsorption tower 10A. In this way, air can be used as a raw material from the gas purification system XI and continuously refined. Oxygen. In the gas purification system ,ι, the two-connected vacuum pump device Y2 is specifically operated as follows. In the above-described step U, the adsorption tower 10B performs a pressure reduction regeneration process, and the PSA device Y1 Gas passage of adsorption tower 丨〇B The side of the intake port 41 of the vacuum pump 40A of the two-way type vacuum pump device Y2 is in a state of being communicated via the pipe 33, and the vacuum pumps 4A and 4B are driven by the motor 51 (in series via the connecting line 52). The inside of the adsorption tower 1B is stepped down. The opening and closing valve 6 of the bypass line 6〇 of the two-connected vacuum pump unit Y2 is at the start of the step 丨 (step-down regeneration process), and the piping 33 near the intake port 41 The internal pressure is at a pressure slightly higher than the atmospheric pressure (because the adsorption pressure in the adsorption tower B is, for example, 4 kPa kPaG), and the inside of the connection line 52 (the side subjected to the pressure by the vacuum pump 40A) is also at or above atmospheric pressure. Therefore, immediately after the start of the pressure reduction regeneration process of the adsorption column 10B of the pSA device γ1, the self-adsorption column (10) # passes through the vacuum pump 40A of the two-connected vacuum pump device Y2, and a part of the true branch is 0B. The enthalpy is discharged to the outside through the bypass line 60' and via the muffler Y3 18 201139855. Further, the amount of exhaust gas from the vacuum pump 4A having continued to take in the off gas from the adsorption tower 1B (the step-down regeneration process) in the step 1 is applied to the vacuum pump 4 0 A connected to the adsorption tower 10B. The pressure on the suction port 41 side (that is, the inlet pressure of the two-connected vacuum pump device Y2) changes. Specifically, the depressurization regenerative process proceeds, and the internal pressure of the adsorption tower 10B becomes smaller (thereby, the pressure on the suction port 41 side of the vacuum pump 40A also becomes smaller), along with the row from the vacuum spring 40 A. The gas volume is gradually reduced. Among such exhaust amounts of the vacuum pump 40A that continuously inhales the 〇ff gas from the adsorption tower 1B in the step 1, the gas exceeding the flow rate of the discharge amount of the vacuum pump 4〇B is excess gas to the vacuum pump 40B (as described above). As shown, the displacement of the vacuum pump 40B is smaller than the displacement of the vacuum pump 4A. The excess gas to the vacuum pump * 存在 exists only for a certain period of time from the start of the pressure reduction regeneration process (step 丨) of the adsorption column 10B. The internal pressure of the adsorption tower 1 〇β in the depressurization regeneration process was 1 hour. The pressure on the side of the suction port 41 of the vacuum pump 4 〇 A was also reduced. The amount of exhaust gas from the vacuum pump 40A is reduced to match the discharge capacity (same as the intake capacity) of the vacuum pump 4A, and after the coincidence, since the on-off valve 61 is in the closed state, the exhaust from the vacuum pump 40B is exhausted. The amount continues to decrease while still consistent with the amount of exhaust of the vacuum pump 40B. The pressure change on the suction port 41 side of the vacuum pump 40A in the step-down regeneration process is as shown in Fig. 7 in accordance with the gas temperature. That is, since the gas adsorption amount of the adsorbent decreases when the gas temperature rises, the pressure of the suction port 41 of the first vacuum pump 40A (the inlet of the two-connected vacuum fruit zone Y2) rapidly drops during the pressure reduction regeneration time because When the gas temperature becomes lower, the gas adsorption amount of the adsorbent increases, so the pressure drop 19 201139855 becomes slower. On the other hand, as the displacement characteristic of the two-connected vacuum pump device Y2, the intake port pressure and the apparent exhaust amount are shown in Fig. 8 (meaning that the amount of exhaust gas that is not converted into the standard state is expressed as a standard. In the case of the state of the exhaust gas, an indication of the "Ν" of the standard state is added)) and the relationship between the desired power is optimal. This relationship is not affected by the gas temperature, and the point at which the pressure in the connection line 52 between the first vacuum pump 4 and the second vacuum pump 40 is at atmospheric pressure does not move in the vicinity of the pressure of the intake port 41 by about 42 kPaG, even if the exhaust gas The temperature of the gas changes, and the amount of adsorbed gas of the adsorbent does not change. Therefore, the pressure detector 80 is disposed in the vicinity of the intake port 41 side where the air flow is not vibrated, and the pressure in the connection line 52 of the first vacuum pump 40A and the second vacuum pump 4B is set to be equal to or higher than atmospheric pressure or equal to or lower than atmospheric pressure. The inlet pressure value at the ashing point (for example, _42 kPaG) allows the first vacuum pump 40A and the second vacuum pump 40B to operate in a non-waste combination, and as the two-connected vacuum pump device Υ2' performs the minimum required power. Running. In the two-connected vacuum pump device Y2, during the period in which excess gas is present from the start of the step-down regeneration process of the adsorption column 1B (that is, when the amount of exhaust gas from the vacuum pump 40A exceeds the amount of exhaust of the vacuum pump 40B), it is detected. The pressure on the side of the intake port 41 is larger than the pressure set value of the pressure detector 8 (for example, - 42 kPaG), and the on-off valve 61 of the bypass line 60 is opened, and the flow of the gas is controlled so that the excess gas flows from the connection line 52. The bypass line 6〇 flows in. Further, when the pressure becomes the pressure set value of the pressure detector 8A, that is, the amount of exhaust gas from the vacuum fruit 40A is gradually decreased, and becomes equal to the amount of exhaust gas of the vacuum poly 4β, the bypass line 60 is to be bypassed. The opening and closing valve 61 is in a closed state, and 20 201139855 sets the two vacuum pumps 4A and 40B to a completely tandem state. During the period in which excess gas is generated from the start of the pressure reduction regeneration process of the adsorption column 10B, 'the excess gas flows from the connection line 52 to the bypass line 60', in the bypass line 60, through the buffer tube zi, and then through the opening and closing The valve 61 'and then' is introduced into the silencer Y3 (or the other silencer Υ 3' of Fig. 5) via the ends E7 and E5 and the excess gas is discharged outside the gas refining system XI via the muffler γ3. At the same time, in a state where excess gas is generated, the gas is also exhausted from the exhaust port 4 2 of the vacuum pump 40 that is connected to the vacuum pump 40 through the connection of the official line 52. However, in this case, the substantially step-down operation is performed only by the vacuum pump 40 刖 of the 刖 section, and the vacuum pump 4 后 of the latter stage is substantially not involved in the pressure reduction. Since the exhaust port 42 of the vacuum pump 4〇β is connected to the muffler Υ3 via the pipe 53, the gas that has passed through the vacuum pump 4〇β is discharged to the outside of the gas purifying system XI via the muffler γ3. Ten thousand 力, in the anti-pressure regeneration process of the adsorption tower 10Β, the state of the multi-emulsion does not occur. The vacuum pump 4〇Α, 4〇β in a fully tandem state cooperates, so that the adsorption tower of the pressure-reducing container is 10 Β The internal pressure is reduced, while the two gases are discharged from Erquan 40B. This exhaust gas is supplied to the sound eliminator Is Y3 ' via a pipe and is discharged from the gas purification system and the system. At this time, since the opening and closing valve 61 of the bypass line 60 is in the closed state, there is no gas passing through the bypass line 60. The step-down regeneration process for the adsorption column 10B in the above step 1 performs the step-down operation of the two-connected vacuum fruit device γ2. The step-down regeneration system for the adsorption tower ι〇Α in the step 3 of Shangcheng Xifeng η is also the same as the above-mentioned step-down regeneration process for the adsorption tower 10B, and the pressure is reduced by the 201139855-connected true device Y2it. Run and execute. In the opening and closing interval 61 in which the pressure reduction operation of the two-connected vacuum pump device Y2 is in an open state at the start of the pressure reduction, the amount of exhaust gas is gradually decreased and the exhaust capacity of the vacuum pumping right is -2 4〇Α Detector 8. The pressure on the side of the intake port 41 is detected, and the pressure can be closed. This configuration contributes to the step-down; the switching is performed in tandem with the true μ働, and the vacuum pump operates efficiently. Moreover, since the pressure detector 8 of the two-connected vacuum pump can be set to "high" power, the set value of the pressure detector 8 is required to be: "sounds" and therefore the elapsed time from the start of the step-down, := valve 61 In the case of the closing operation, the problem of opening and closing the power is required. The 222-type vacuum pump device Υ 2' caused by the stomach ^ ^ ^ ^ ^ ^ ^ ^ ^ ^ ^ ^ ^ ^ ^ ^ ^ ^ ^ ^ ^ ^ The "rotational drive" with the vacuum is required. This configuration is suitable for reducing the required power of the two-connected vacuum device Υ2. Secondly, the function of the buffer tube Ζ1 is explained in detail. As shown above, in Erli The discharge amount of the device Υ 2' from the vacuum fruit 4 〇 α changes according to the side of the suction port 41 of the suction of the tower m or the adsorption tower 10 ,, and the pressure on the side of the suction port 41 is smaller, and the discharge is smaller. The smaller the amount of gas is, therefore, the maximum amount of exhaust gas is at the beginning of the depressurization regeneration process, and the excess gas = (the amount of gas that exceeds the displacement of the vacuum pump 40 中 from the displacement of the vacuum pump 40 卩) State (opening and closing valve 61 of bypass line 60 when excess gas is generated) In the open state), the maximum amount of excess gas (flow rate) is also 22 201139855 when the pressure is reduced. Also, the speed of the excess gas flowing from the connecting line 5 &le is also reduced to 0 (10) within the line. By buffering... excess gas lag:: slow bypass line between the connecting line 52 and the bypass line, starting: when the excess gas passes through the buffer tube, the time is the most pressure, the excess gas passes through the buffer tube Z1 The time of the official Z1 is set as the retention time. The shortest in the two-connected type _ s s - the 〆 十 十 冲 冲 冲 Z Z Z Z Z Z Z Z Z Z Z Z Z Z Z Z Z Z Z Z Z Z Z Z Z Z Z Z Z Z Z Z Z Z Z Z Z Z Z Z Z Z Z Z The gas discharged from 40A is relatively large. The excess gas is generated in the two-gas two-connected vacuum pump unit Y2, and the excess gas flowing into the bypass line 60 by the junction line 52 also generates a large orphan vibration. When the buffer tube Z1 is removed from the crucible of the vacuum pump unit ,2, the mechanical flow of the shaft 61a which promotes the opening and closing of the bypass line 60 is deteriorated due to the flow of the excess gas: Continuous exposure to the bypass The shaft 61a of the gas flowing in 60 is imparted with vibration energy from the gas without continuing to vibrate. This vibration of the shaft induces the material constituting the shaft 61a: the local damage of the weave, and further the 'promoting the mechanical strength of the shaft 61a In the case where the sealing water is supplied to the pump mechanism in the vacuum state, and the surface of the pump device is operated, the mechanical strength of the shaft 6ia is deteriorated. The vibration of the shaft 61a caused by the vibration of the air of the excess gas may be The vibration acceleration is about 13 G or more. In contrast, in the two-connected vacuum system Y2' of the present embodiment, the buffer s Z1 « is placed in the bypass s line 6 〇 ' and the buffer tube becomes the second buffer. 23 201139855 The shortest residence time in the flushing pipe becomes Gl5 seconds or more. When the excess gas passes through the bypass line 60, more than the ## ^ ', the oxygen flow vibration of the body is highly efficient in the buffer tube Z1. Therefore, the knife is suppressed in the second. The continuous vacuum system γ2 is located at a higher mechanical strength than the member under the buffer (especially the shaft 61a of the opening and closing valve 61). In the case of the 5L vacuum pump device γ2, as shown in Fig. 9, the opening/closing valve 61 having the non-return function can be bypassed by the pipe line 0, instead of the opening and closing valve 61. The opening and closing valve 61' is configured such that the bypass valve line 60 is not the opening and closing valve 61, but is opened when the pressure on the side of the buffer S Ζ 1 is higher than the pressure on the side of the end portion Ε 7 side, and is on the side of the buffer member Z1. When the pressure is equal to or lower than the pressure on the side of the end portion 7, the state is closed. It has an on-off valve 61 with a non-return function, and the anti-pressure operation of the two-connected vacuum system Y2 is in an open state immediately after the depressurization, and the displacement from the real work 4GA is gradually reduced and the vacuum When the exhaust capacities are the same (at that time, the pressure in the connecting line 52 becomes about atmospheric pressure), the state is automatically switched from the open state to the closed cancer. This configuration contributes to a reduction in the operation loss of the vacuum springs and enables the -type vacuum pump unit Y2 to operate efficiently. As described above, the buffer tube Z1 has the orifice plate 74 as a throttle portion for narrowing the flow path for the gas passing through the inside thereof, and the opening ratio of the orifice plate 是 is 2 (M is difficult, More preferably, it is 29 to (10). This configuration contributes to efficient attenuation of the airflow vibration of the excess gas by the buffer t Z1, and the orifice plate 74 is suitable as a throttle portion to adjust the aperture ratio with high precision. - As described above, the lowermost end of the edge portion of the opening 74a is flush with the inner wall s 73' of the buffer Z1. With this configuration, the water droplets contained in the excess gas passing through the buffer tube (from the above-mentioned sealing water) 24 201139855 Easy to pass the buffer tube z 1. " In the buffer tube Z1 ', the orifice plate 74 may not be provided, and the length and/or the inner diameter of the buffering officer Z1 is configured to be the shortest in the buffer tube. The residence time is 〇. 15 seconds or more. The buffer tube Z1 is configured such that the opening and closing valve 61 (or 61') of the bypass line 60 is open at the time of the pressure reduction operation of the two-connected vacuum pump device Y. The exhaust amount from the exhaust port 42 of the vacuum pump 40A exceeds that of the vacuum pump 40B. The gas flow rate (suction capacity) is the maximum flow rate in the buffer tube of the gas passing through the buffer tube a. The flow rate when the excess gas passes through the buffer tube Z1 in the bypass line 6〇 is from the connection line 52. The speed of the inflow of the pipeline 6 is the maximum at the beginning of the depressurization. The flow rate when the excess gas passes through the buffer f Z1 at the beginning of the depressurization is set as the maximum flow velocity in the buffer tube. The shortest residence time in the buffer tube is achieved on one side. 15 seconds on one side: bypass line 6. The end E7 is highly efficient to extract excess gas, and the buffer zi is configured to make the maximum flow velocity in the buffer tube to be second. As shown above, the bypass line 6〇 has been placed in A gas inlet 73a at a position on the end wall 71 side of the peripheral wall 73 of the buffer tube Z1 is connected to the buffer tube Z1 to introduce a gas connecting pipe portion 62 to the buffer tube Z1. Further, the connecting pipe portion 62 is extended with the peripheral wall 73. The direction (horizontal direction H in Fig. 3) extends in the other direction, and preferably extends in the orthogonal direction (4) in the vertical direction v), and extends in the vertical direction V and is connected to the peripheral wall μ from the lower side in the vertical direction V. good. The composition of the seed is suitable for miniaturization of the buffer tube Z1 while achieving a minimum residence time in the buffer tube for 〇 · 15 seconds or more. Fig. 10 is a buffer tube Z1 of the first modification, and a portion thereof in the vicinity of the same. 25 201139855 】 Surface pattern diagram The buffer tube ΖΓ includes the total length of the side of the bypass line 60 71 6 side 71 % & Q, 碥The end wall 72 on the side of the portion 7 and the peripheral wall 73 extending between the end wall 71 and the end wall 72 and the end wall 71 of the plurality of orifice plates 74' are cylindrical. Each hate has a flow passage for passing the inside of the buffer tube Z1', and has an opening 74a. The plurality of orifice plates 74 are arranged along the gas flow path in B, including the orifice plate 4' on the gas flow path and the orifice plate 74 on the most downstream side. Because this T constitutes the buffer tube Z1 'Using the plurality of orifice plates 74 to attenuate the vibration of the air of the excess gas, the attenuation effect of the airflow vibration is high. Fig. 11 and Fig. 12 show the buffer tube 第 of the second modification. The buffer s Z1 is included The end wall 71 on the end E6 side of the line 60, the end wall 72 on the end E7 side, the peripheral wall 73 extending between the end wall 71 and the end wall 72, and the barrier 75, the peripheral wall 73 is cylindrical. 75 is a throttle portion for narrowing the flow path of the gas passing through the inside of the buffer tube. The opening rate of the barrier plate is 2. The '% is better' is preferably 29 to 39%. The opening ratio of the plate 75 is a percentage of the cross-sectional area of the gas flow path which is not occupied by the blocking plate 75 with respect to the cross-sectional area of the buffer tube Z. The buffer tube Z1"' of this structure acts as a throttle portion, making it redundant. The gas flow vibration of the gas efficiently attenuates the resistance of the resisting plate 75 at the opening ratio more easily than the orifice plate. , the two-two-punch tube Z1" includes a plurality of barrier plates 75. In this case, the plurality of gas flow paths are disposed at appropriate intervals, and the body flow path is located at the most upstream gamma, c# The first block of the gas is arranged with the plate on the most downstream side. Because of the composition of the sister &#乐Z block U, the _(4) uses a plurality of baffles to attenuate the multi-flow vibration section, and the hall of the rolling body 2011~Vibration attenuation effect is high. 26 201139855 Figures 13 and 14 show the buffer tube a of the third modification. The tube Z2 includes the end wall on the side E6 side of the bypass line 6〇', The end wall 72, the peripheral wall 73 extending between the end wall 71 and the end wall 72, and the hole plate 73 have a cylindrical shape. The gas inlet & is disposed at "and the gas outlet 72a is disposed at the end wall 72. Although the buffer tube inlet is disposed on the end wall 71 instead of the peripheral wall 73, the buffer tube Z1 which is not the same as the d d diagram is different, but the other configuration is 缓冲, Z, the buffer tube of the D diagram. On the other hand, the bypass line 60, the (four) connecting portion 62, and the gas inlet 71a provided at the end port 71 are connected to the buffer tube. The connecting tube portion μ is located on the upstream side of the buffer tube Z2 in the bypass line 60'. Directly and arbitrarily define the flow path of the body of the body before the buffer tube Z 2 is introduced. Further, the connection pipe portion 62 is different in order to be introduced into the buffer tube 7? The flow of the gas is curved and curved. The pipe portion is connected, and the son-in-law is used to bend the flow of the gas immediately before being introduced into the buffer pipe 22. The curved structure of the degree is preferably. The connecting pipe portion 62酉It is preferable to introduce a gas from the lower side of the vertical side and introduce it into the buffer tube. Although the embodiment and various modifications of the present invention have been described above, these can be mutually exclusive. 彳丨L > 疋And the port, for example, can also be opened as shown in FIG. 9 with a non-return function. The valve 61' is the combination of the buffer tube Z2 which is not the same as the buffer tube Z2 which is not shown in Fig. 13. Further, the buffering field officer shown in Fig. 13 can also set the plurality of orifice plates 74 as shown in Fig. 1 . It is also possible to set one of the y c, and the U-shaped slabs 75 (or the plurality of slabs 75). Further, it is also possible to smash the orifice plate 74 of the third figure with the eleventh figure. 27 201139855 [Embodiment] The present invention describes an embodiment of the present invention together with a comparative example. However, it should be noted that the comparative example is only an example of the experiment performed by the patent applicant in order to confirm the effect of the present invention. [First Embodiment] The exhaust capacity of the i-th vacuum pump 4A of the two-connected vacuum pump device Y2 is 14800 m3/h, and the exhaust capacity of the second vacuum pump 40B is 141 〇〇mVh. When the gas temperature is 3〇t, the gas purification system XI' shown in the figure is used to repeat the adsorption process and the depressurization regeneration in Fig. 6 in each adsorption column i 〇A, 1 〇B. The process and the re-pressing process constitute a cycle (step 4), whereby oxygen is taken from the air which is the material gas. In this embodiment, The raw material blower 21 of the PSA apparatus Y1 sets the supply amount of air to 8300 Nm 3 /h (N: represents a standard state, the same applies hereinafter). The internal pressure of the adsorption towers 10A, 10B in the adsorption process is set to a maximum of 4 kPa. In addition, the pressure at the end of the depressurization regeneration process inside the adsorption towers 1A, 1B of the depressurization regeneration process becomes a 69 kPaG 'About the adsorption towers A, 10B in the re-pressing process, the internal pressure is restored. In the depressurization regeneration process of the adsorption towers A and 10B, the pressure on the side of the suction port 41 is as shown in Fig. 8, and when the pressure detector 8 is detected to reach a pressure value of -42 kPaG. The on-off valve 61 is set to the closed state from the open state. In the present embodiment, the two-connected vacuum pump device γ2 is subjected to a pressure reducing operation as follows. The opening and closing valve to the bypass line 60 is from the start of the step-down regeneration process until the indication value of the pressure detector 8A is from about atmospheric pressure to 42 kPaG, that is, when the amount of exhaust gas from the vacuum pump 40A exceeds the exhaust capacity of the vacuum pump 40B. 28 201139855 61 sends the # number and is set to the on state, and controls the flow of the gas so that the excess gas flows from the connection line 52 to the bypass line 60. Then, the amount of exhaust gas from the vacuum pump 4A is gradually decreased, and when the amount of exhaust gas from the vacuum pump 4A is reached, that is, when the pressure detector 80 indicates about -42 kPaG, the on-off valve 61 is switched from the open state to the closed state. Then, after the two vacuum pumps 4〇Α and 4〇β are set to the completely tandem state, the continuous vacuum pump device Y2 is continuously subjected to the step-down operation. As a result, the average value of the required power of the vacuum system becomes 2 〇 6 kW. [Second Embodiment] The Rou's pump having the first vacuum pump 40A of the two-connected vacuum pump device Y2 has an exhaust capacity of 14,800 m3/h, and the second vacuum pump 40B has an exhaust capacity of 14,100 m3/h, at a gas temperature of 40. At °C, the gas purification system XI' shown in Fig. 1 is used to repeat a cycle consisting of the adsorption process shown in Fig. 6, the pressure reduction regeneration process, and the recompression process in each adsorption column 10A, 1B. (Steps 1 to 4), whereby oxygen is taken from the air which is the material gas. Further, the raw material blower 21 of the PSA apparatus γι sets the supply amount of air to 8,300 Nm 3 /h, and the internal pressure of the adsorption towers 1A and 1B in the adsorption process is set to a maximum of 40 kPaG. In addition, the pressure at the end of the depressurization regeneration process of the adsorption tower i〇A, 1〇B in the depressurization regeneration process is reduced to 72kpaG, and the internal pressure is restored in the adsorption tower 1 and 1 〇B in the re-pressing process. To atmospheric pressure. Further, in the step-down regeneration process of the adsorption towers 1A and 10B, the pressure on the suction port 41 side is opened and closed when the pressure detector 8 detects a pressure value of 42 kPaG as shown in Fig. 4 . The valve 61 is set to the closed state from the open state. Regarding the two-connected vacuum pump device Y2, the same operation as in the i-th embodiment is performed. 29 201139855 Operation 'When the pressure detector 80 indicates -42 kPaG, the opening and closing valve 61 is switched from the open state to the closed state, and the two vacuums are collected. The weight is set to a completely tandem m, so that the two-connected vacuum pump I is set to 2 to continue the step-down operation. As a result, the average value of the required power of the vacuum pump is two. [First comparative example] As in the first embodiment, the exhaust capacity of the i-th vacuum pump 40A of the two-connected vacuum pump device Y2 is 2, and the exhaust capacity of the vacuum pump 4〇B is 14100 mVh. In the temperature voyage, the gas purification system shown in Fig. 1 is used to repeat the adsorption process, the pressure reduction regeneration process, and the recompression process shown in Fig. 6 in each adsorption column 1A, 1B. One cycle (step i, whereby oxygen is taken from the air which is the material gas. In this comparison, the raw material blower 21 of the n PSA device Y1 sets the supply amount of air to 83 〇〇 Nm 3 /h as in the first embodiment, The internal pressure of the adsorption columns 10A, 10B in the adsorption process is set to a maximum of 40 kPa G. Further, the pressure at the end of the depressurization regeneration process for the adsorption column 10 Α, 1 〇 β becomes 69 kPa G. The opening and closing valve 61 is opened from the open state. When the state is switched, as shown in Fig. 7, the on-off valve 61 is changed from the open state to the closed state when the step-down regeneration time has elapsed for 7.5 seconds. At that time, the pressure of the intake port 41 indicates ~35 kPaG. The adsorption tower 1, 1 〇 B, restores its internal pressure to The two-connected vacuum pump unit Y2 performs a step-down operation as follows. The pressure of the intake port 41 is bypassed from about atmospheric pressure to a 35 kPaG within 7.5 seconds from the start of the pressure reduction regeneration process. The opening and closing valve 61 of the line 60 is set to the open state, and then the opening and closing valve 61 is forcibly switched from the open state to the closed state 30 201139855
，而將兩真空泵40A、4〇B設定成完全串列狀態後，使二 連型真空泵裝置γ2繼續進行降壓運轉。結果，真空泵40A 累加所要動力的平均值成為216kW ,比未根據吸 氣 1側之壓力檢測器80控制的情況增加了 1 此外在第14圖的圖形表示對應於此第丨比較例的吸 氣口壓力、視在排氣量及所要動力之關係。 [第2比較例] ”第2實施例一樣，將二連型真空泵裝置之第丄真 二泵4〇A的排氣容量為14800m3/h、第2真空泵40B之排氣 令量為141〇〇m /h的魯氏栗串接’在氣體溫度時，使 用第1圖所示的氣體精製系統X1，在各吸附塔1 〇 A、1 0 B 重複進行由第6圖所示之吸附製程、降壓再生製程及復壓 製程所構成之一個循環(步驟卜4)，藉此從是原料氣體的 空氣取得氧氣。在本比較，# pSA裝置γι的原料鼓風機 21將二氣的供給量與第2實施例一樣設為83〇〇Nm3/h，將 在吸附製程之吸附m ιοΒ的内部壓力設為最大 40kPaG又，在關於吸附塔l〇A、10B之降壓再生製程，末 期壓力成為一 72kPaG。開閉閥61之從開狀態往閉狀態的切 換如第8圖所示，被設定成在降壓再生時間經過了 15秒時 開閉閥61從開狀態變成閉狀態。㉛時吸氣口 41的壓力表 示一 50kPaG。關於在復壓製程的吸附塔1〇A、1〇B，使其内 部壓力恢復至大氣壓。 一連型真空泵裝置Y2如以下所示進行降壓運轉。吸氣 口 41的壓力從降壓再生製程開始時開始15秒鐘内，從約 201139855 大氣壓至50kPaG之間，將旁通管線6〇的開閉閥61設定 成開狀態，然後，將開閉閥61從開狀態強迫地切換成閉狀 態，而將兩真空泵4〇Α、4〇β設定成完全串列狀態後，使二 連型真空泵裝置Y2繼續進行降壓運轉。結果，真空泵4〇A 及40B之累加所要動力的平均值成為22綱，比未根據吸 氣口 41側之壓力檢測器8 〇控制的情況增加了 11 —。 氣 此外在帛1 5 @ #圖形表示對應於此帛2比例的吸 壓力、視在排氣量及所要動力之關係。 [第卜第2實施例及第卜第2比較例的評價] 例 根據如以上所說明的第i〜第2實施例及第卜第2比較 可如以下所不評價。即，若在二連型真空泵裝置U之 來自上游側之真空《的排氣量降低至與來自下游側之 真空泵40B的排齑吾__功n全„ / 、量致的時間點（在該時間點，連結管線 5 2的内部壓力成為約大氣壓） &竖）將開閉閥61從開狀態切換 成閉狀態’可使在二連细直*爷肚恶 連圣具二泵裝置Y2的消耗動力變成最 J 卩使在'皿度變化的情況(第1實施例的30°C與第2 實施例的40°C )，在二遠剞直办石壯β 一連孓真二泵裝置Υ2之來自上游側之 真空請的排氣量降低至與來自下游側之真空系權的 排氣直—致的時間點之在上游側真U偏之吸氣口 41的 壓力成為大致定值（扁笼！ … 在第1及第2實施例為—42kPaG)。因 此’右測置在上游你|直介毛/ ^ 、 ㈣真：泵4GA之吸氣〇 41附近的麼力， 並控制開閉閥61的開閉，可避免、、w ί羝光概度變化的影響。 [第3實施例] 使用除了二連型真空栗裝置Y2的緩衝管21未具有孔 32 201139855 口板74以外’具有與從第i圖至第4圖所示者一樣之構成 的氣體精製系統XI’在各吸附塔1Qa、1()b重複進行由第6 圖所示之吸附製程、降壓再生製程及復壓製程所構成之一 個循環（步驟㈠），！！此從是原料氣體的空氣取得氧氣。 在本實施例’藉PSA震置γι的原料鼓風機η將空氣的供 給量設為4800Nl„Vh。將在吸附製程之吸附塔1〇Α、ι〇β的 内部壓力設為大氣壓，在降壓再生製程之吸附塔iga、 之内部的降壓再生製程末期壓力設為—53〇mmHg(錶壓力： 約~70kPaG)，關於在復壓製程的吸附塔1〇Α、ι〇Β，使其 内部壓力恢復至大氣壓。又’關於吸附塔（〇A、）〇B的降壓 再生製程，係藉由使除了緩衝管Z1未具有孔口板74以外， 具有與上述者一樣之構成的二連型真空泵裝置γ2進行降 壓運轉，而執行。作為真空泵40Α，採用排氣容量1〇〇〇〇m3/h 的魯氏泵。作為真空泵40B，採用排氣容量為6〇53m3/h的 魯氏泵。作為緩衝管zi(未具有孔口板74)，採用延伸方向 的内尺寸（長度）是4. 4mm ’且内徑是4〇〇mm者。 關於二連型真空豕裝置Y2,如以下所示進行降壓運 轉。在從降壓再生製程開始時是既定期間並有多餘氣體時 (即來自真空泵40A的排氣量超過真空泵4〇β之排氣量 時）’將旁通管線60的開閉閥61設定成開狀態，控制氣體 流動’使該多餘氣體從連結管線5 2向旁通管線6 〇流入。 然後’來自真空泵40Α的排氣量漸減，而變成與真空泵4〇β 的排氣容量一致時’將開閉閥61從開狀態自動切換成閉狀 態’而將兩真空泵40A、40Β設為完全串列狀態後’使二連 33 201139855 型真空泵裝置Y2繼續進行降壓運轉。 關於二連型真空泵裝置Υ2的緩衝管Z1，在降壓運轉 時測量多餘氣體的最短滯留時間（在剛開始降壓後，至多餘 氣體通過緩衝管Z1所需的時間），是〇. 5〇秒。又，測量作 用於處於開狀態之開閉閥61之軸61a的振動加速度，其最 大值是約3. 0G。在此振動加速度的測量，使用振動測量器 (RI ON股伤有限公司製VM ~ 61)。關於第3實施例的測量結 果，揭示於第16圖的表。 [第4〜第9實施例] 使用除了將二連型真空泵裝置Y2之緩衝管ζι(未具有 孔口板74)的長度從4. 4πι變更成3. 6m(第4實施例）、2. 8 m(第5實施例）、2· 1 m(第6實施例）、丨· 5 m(第7實施例）、 1. 3 m(第8實施例）、及丨.〇5 m(第9實施例）以外，與第3 實把例一樣的氣體精製系統X1，一面在降壓再生製程使二 連型真空泵裝置Y2進行降壓運轉，一面在各吸附塔1〇A、 1 〇 B重複進行由吸附製程、降壓再生製程及復壓製程所構 成之一個循環，藉此從是原料氣體的空氣取得氧氣。 關於在第4〜第9實施例之二連型真空泵裝置γ2的緩 衝管Z1，在二連型真空泵裝置Υ2進行降壓運轉時測量多 餘氣體的最短滞留時間，是〇_ 41秒（第4實施例）、〇. 32 秒（第5實施例）、〇. 24秒（第6實施例）、〇. 17秒（第7實 知例）、0 _ 1 5秒（第8實施例）、及〇 · 1 2秒（第g實施例）。 又，在第4〜第9實施例之二連型真空泵裝置γ2進行降壓 運轉時，測量作用於處於開狀態之開閉閥61之軸6U的振 34 201139855 動加速度’其最大值是3. 1G(第4實施例）、3.1 G (第5實 施例）、3. 2G(第6實施例）、4· 5G(第7實施例）、5. 5G(第 8實施例）、及7. 0G(第9實施例）。關於第4〜第9實施例 的測ϊ結果，揭示於第16圖的表。 [第3比較例] 使用第17圖所示的氣體精製系統X3，在各吸附拔 10A、1 0B重複進行由吸附製程、降壓再生製程及復壓製程 所構成之一個循環（步驟卜4)，藉此從是原料氣體的空氣 取得乳氣。在第3比較例所使用之氣體精製系統X3除了未 包括緩衝管Ζ1 α外，具有與例如在帛3實施例戶斤使用之氣 體精製系統X1 —樣的構成。在第3比較例’關於吸附塔 l〇A、⑽的降壓再生製程，係藉由使除了不通過緩衝管二 外，與第3實施例_楳，M= 藉由使真二栗40Α、40Β進行降壓 運轉（在降壓再生製程途 將旁通s線60的開閉閥61從開 狀態切換成閉狀態），而 仃在第3比較例之真空泵4〇A、 40B進行降壓運轉時測量 J里作用於處於開狀態之開閉閥61之 軸a的振動加速度，其最大值是135G。 關於以上的第3〜第9音#7丨n松 ^ , Λ ^ 1 〇 - 例及第3比較例的測量結 禾在第18圖的圖形，表 P益本- 於虛線上。在第18圖的圖形， k軸表不緩衝管内最短滞 轴的振動加速度⑹。又，因時二(秒）’縱軸表示開閉間之 f , m α ^ _在第3比較例未設置緩衝 「★ 軸的讀值為零。 [第10實施例] 使用 除了二連型真 空泵裝置Y2 的緩衝管Z1具有孔口 35 201139855 板74以外，與第3實施例一樣的氣體精製系統χ卜與第3 實施例一樣，一面在降壓再生製程使二連型真空泵裝置Μ 進行降壓運轉…面在各吸附塔1GA、刚重複進行^吸附 製程、降壓再生製程及復壓製程所構成之一個循環，藉此 從是原料氣體的空氣取得氧氣。關於孔口板74，在緩衝管 zi内，設置於距離位於氣體入口側之端壁71 5〇〇mm的位 置。又，在本實施例，作為孔口板74，採用開口 7切的直 徑是230mm者。在内徑400mm之緩衝管zi之該孔口板74(開 口 74a的直徑是230_)的開口率是33%。 關於在第10實施例之二連型真空泵裝置Υ2的緩衝管 Ζ1 (具有孔口板74)，與第3實施例一樣，在二連型真空泵 裝置Υ2之降壓運轉時，測量緩衝管内最短滯留時間，是 〇· 50秒。又’在二連型真空泵裝置γ2之降壓運動時，測 量作用於處於開狀態之開閉閥61之軸61a的振動加速度， 其最大值是2. 1G。關於第9實施例的測量結果，揭示於第 16圖的表。 [第1卜第16實施例] 使用除了將二連型真空泵裝置Υ2之緩衝管Ζΐ(具有孔 口板74)的長度從4. 4m變更成3. 6m(第11實施例）、2. 8 m(第12實施例）、2. 1 m(第13實施例）、1. 5 m(第14實施 例）、1. 3 m(第15實施例）、及丨.〇5 m(第丨6實施例）以外， 與第1圖所示一樣的氣體精製系統χ1，與第3實施例一樣， 一面在降壓再生製程使二連型真空泵裝置Y2進行降壓運 轉，一面在各吸附塔1 〇A、1 〇B重複進行由吸附製程、降壓 36 201139855 再生製程及復壓製程所構成之— 體的空氣取得氧氣。 目心’藉此從是原❹ 關於在第11〜第i 6實施例 71 ύ3你 一連型真空泵裝置Υ2的 緩衝g Ζ1 ’與第3實施例一樣， ^ ^ μ 4* * 在一連型真空泵裝置Y2 進订降壓運轉時測量緩衝管内最短滯留時H G 41秒 (第U實施例)、。.32秒(第12實施例)、"“少(第13實 施例）、0 · 1 7秒（第1 4音#办丨、η ^第14實化例）、0,15秒（第ΐ5實施例）、 及0. 12秒（第16竇竑你丨、ν . — 貫鈀例）。又，在二連型真空系裝置Υ2進 行降壓運轉時，浪丨旦你 、里作用於處於開狀態之開閉閥61之軸 61a的振動加速唐 豆导士古 度其最大值是2.0G(第n實施例）、 2.1G(第12實施例）、2 1G(第13實施例）、2 %(第以實 施例）、3.〇G(第15實施例）、及4.5G(第16實施例）。關 於第1卜第1 6實施例的這些測量結果，揭示於第丄6圖的 表又Μ於第9〜第16實施例及上述之第3例的測 量結果，在第丨8圖的圖形表示於粗線上。第 [第17〜第2 2實施例] 使用除了將二連型真空泵裝置γ2之緩衝管ζι的孔口 板74之開口 74a的直杈從230ιώ變更成180m(第17實施 例）、200 m(第18實施例）、215m(第19實施例） 23〇m(第 20實施例）、250 m(第21實施例）、及27〇 m(第22實施例） 以外，與第1 0實施例一樣的氣體精製系統χι，一面在降 壓再生製程使二連型真空泵裝置γ2進行降壓運轉，一面在 各吸附塔10Α、1 0Β重複進行由吸附製程、降壓再生製程及 復壓製程所構成之一個循環，藉此從是原料氣體的空氣取 37 201139855 传氧軋。在内後400mm的緩衝管71 上〜 乙1之第1 7實施例之孔口 板74的開口率是20%，第if?音说v丨 曰 乐18貫施例之孔口板74的開口率 疋25% ’第19實施例之孔口板μ的門 取Μ的開口率是29%，第20 實施例之孔口板7 4的開口率县q Q G/咕 丰疋33%，第21實施例之孔口 板74的開口率是39%，第22眚浐丨—， “實％例之孔口板74的開口率 是 46% 〇 關於在第17〜第22實施例之_ J < 一連型真空泵裝置Y2的 緩衝官Z1，與第3實施例—樣扁__ m 在一連型真空泵裝置Y2 進行降壓運轉時測量緩衝管 J里打官内最紐滯留時間，全部是〇. 15 秒。又，在二連型真空泵护番y 具裝置Y2進行降壓運轉時，測量作 用於處於開狀態之開閉閥61之舳R1 A, n 之軸61a的振動加速度，其最 大值是4.2G(第17實施例）、3.8G(第18實施例）、3 4G(第 19實施例）、3.〇G(第20實施例）、33G(第2ι實施例）' 及4.0G(第22實施例）。關於第17〜第22實施例的這些測 量結果’揭示於第19圖的表’又，在第2〇圖的圖形表示 於粗線上。在第20圖的圖形，橫軸表示孔口板74(節流部） 的開口率u)’縱軸表示開閉閥61之軸61a的振動加速度 (G)。 [評價] 從第3〜第22實施例與第3比較例之結果的比較，在 S史置了緩衝管Z1之第1圖所示的氣體精製系統χ1 (第3~ 第22實施例）’作用於開閉閥61之軸61a的振動加速度比 未設置這種緩衝管之第17圖所示的氣體精製系統χ3(第3 比較例）的更小。又，若緩衝管的長度相同，在設置孔口板 38 201139855 74者（第10〜第16實施例），作用於開閉閥6i之軸6la的 振動加速度比未設置那種孔口板的情况更小。進而，在使 用多餘氣體之最短滯留時間是〇.15秒以上之緩衝管Z1的 二連型真空系裝置Y2(第3〜第8、第1〇〜第15實施例），可 使作用於開閉閥61之軸61 a的振動加速度變成特別小 【圖式簡單說明】 第1圖係本發明之實施形態之氣體精製系統的示意構 成圖。 第2圖係沿著第1圖之魂π 口之踝Π ~ ϋ之魯氏泵的剖面圖。 第3圖係第1圖所示之淫爲^β ^ 听不之綾衝官及其附近之部分擴大剖 面圖。 第4圖係沿著第3圖之锿 〜綠iV IV的剖面圖。 第5圖係第1圖所示之教#接制么^ ^礼體積製糸統之變形例的不意 構成圖。 第6圖係表不在可藉第1圖之氣體精製系統執行的氣 體精製方法之—個循環（步驟H)的製程表。 第7圖係氣體溫度變彳卜拉 雙化時之降壓再生時間與吸氣口壓 力的關係圖形。 ^ 第8圖係表示二連型直办 、 ^ ，、二泵裝置之吸氣口壓力、視在 排氣量及最佳之所要動力 丨文勒刀之關係的圖形。 第9圖係表示在旁诵技 方逋Β線之開閉閥之變形例的圖。 第10圖係緩衝管之笛，^ 1變形例及其附近之部分别面模 式圖。 39 201139855 第11圖係緩衝管之筮9w 式圖 式圖 弟/憂形例及其附近之部分剖面模 〇 第12圖係沿著第u 圖之線X Π — X π的剖面圖。 第1 3圖係緩衝管之笛q Μ 弟3變形例及其附近之部分剖面模 〇 第14圖係表示二遠制古+ ^ 义真二系裝置之吸氣口壓力、視在 排氣量及在提早時序關閉 、 ^ ^ ]旁通官線之開閉閥的情況之所要 動力之關係的圖形。 第15圖係表示二連丨 θ i真二泵裝置之吸氣口壓力、視在 排氣3：及在落後時序關 ^ ^ ]旁通官線之開閉閥的情況之所要 動力之關係的圖形。 第16圖係整理關於筮 筮 ' 〜第16實施例之測量結果的表。 第7圖係第3比較例之氣_ 制& J、虱體精製系統的元音播 第18圖係表示關於第 "圖。 測量結果的圖形。 卑3比較例之 施例之測量結 第19圖係表示整理 ^理關於第17〜第22竇 果的表。 結果的 圖形 第2〇圖係表不關於第17~第22實施例之測量 【主要元件符號說明】 X1氣體精製系統、 I 〇 A、1 〇 β吸附塔、 II 氣體通過口、 40 201139855 12 氣體通過口、 21 原料鼓風機、 22 槽、 Y1 PSA裝置、 Y2 二連型真空泵裝置、 Y3 消音器、 31、32、33、34 配管、 31’ 、32’ 、 33’ 主幹路、 31A、31B、32A、32B、33A、33B 支路、 31a、31b、32a、32b、33a、33b、34a 自動閥、 El、E2、E3、E4、E5、E6、E7 端部、 40A、40B真空泵、 40a外殼、 40b轉子、 41 吸氣口、 42 排氣口、 51 馬達、 52 連結管線、 5 3 配管、 60 旁通管線、 61 開閉閥、 61 a 軸、 Z1 緩衝管、 71、72端壁、 41 201139855 73 周壁、 80 壓力檢測器。 42When the two vacuum pumps 40A and 4B are set to the fully tandem state, the two-stage vacuum pump unit γ2 is continuously operated in the step-down operation. As a result, the average value of the required power of the vacuum pump 40A is 216 kW, which is increased by 1 as compared with the case where the pressure detector 80 is not controlled by the pressure detector 80. Further, the graph of Fig. 14 indicates the suction port corresponding to the second comparative example. The relationship between pressure, apparent displacement and required power. [Second Comparative Example] As in the second embodiment, the exhaust capacity of the second pump 4〇A of the two-connected vacuum pump device was 14800 m 3 /h, and the exhaust amount of the second vacuum pump 40 B was 141 〇〇. When m/h is connected in series with 'Lushi', at the gas temperature, the adsorption process shown in Fig. 6 is repeated in each adsorption column 1 〇A, 1 0 B using the gas purification system X1 shown in Fig. 1, The cycle of the depressurization regeneration process and the recompression process (step 4), thereby taking oxygen from the air which is the raw material gas. In this comparison, the raw material blower 21 of the #pSA device γι supplies the supply amount of the second gas and the first 2 In the same manner as in the example, it is set to 83〇〇Nm3/h, and the internal pressure of the adsorption m ιοΒ in the adsorption process is set to a maximum of 40 kPaG. In the depressurization regeneration process regarding the adsorption columns 10A and 10B, the final pressure becomes 72 kPaG. As shown in Fig. 8, the switching of the on-off valve 61 from the open state to the closed state is set such that the on-off valve 61 is changed from the open state to the closed state when the step-down regeneration time has elapsed for 15 seconds. The pressure indicates a 50 kPaG. Regarding the adsorption tower 1〇A, 1〇B in the re-pressing process, the inside is made The partial pressure pump unit Y2 is operated as shown below. The pressure of the suction port 41 is within 15 seconds from the start of the pressure reduction regeneration process, and is from about 201139855 to 50 kPaG. The opening and closing valve 61 of the line 6〇 is set to the open state, and then the opening and closing valve 61 is forcibly switched from the open state to the closed state, and the two vacuum pumps 4〇Α, 4〇β are set to the fully tandem state, and then The continuous type vacuum pump unit Y2 continues the step-down operation. As a result, the average value of the required power of the vacuum pumps 4A and 40B becomes 22, which is 11 more than that which is not controlled by the pressure detector 8 of the intake port 41 side. — The gas is further represented by the relationship between the suction pressure, the apparent displacement, and the required power in the 帛1 5 @ #图. [Evaluation of the second and second comparative examples] For example, the i-th to the second embodiment and the second comparison as described above can be evaluated as follows. That is, if the vacuum from the upstream side of the two-connected vacuum pump device U is reduced to With vacuum from the downstream side The pump 40B is 齑 _ _ _ _ _ _, the time point of the measurement (at this point, the internal pressure of the connection line 52 becomes about atmospheric pressure) & vertical) switch the on-off valve 61 from the open state to the closed The state of the second embodiment can be changed to the case where the degree of change in the degree of the dish is changed in the case of the second embodiment of the second embodiment 40 ° C ), in the second long-distance direct Shi Zhuang β one-way true two pump device Υ 2 from the upstream side of the vacuum, please reduce the amount of exhaust to the time from the downstream side of the vacuum system At the upstream side, the pressure of the suction port 41 on the upstream side is approximately constant (flat cage! ... in the first and second embodiments - 42 kPaG). Therefore, 'right measurement is placed upstream of you|straight hair/^, (4) true: the force near the suction 〇41 of the pump 4GA, and controlling the opening and closing of the opening and closing valve 61, can avoid the influence of the change of the light profile . [Third Embodiment] A gas purification system XI having the same configuration as that shown in Figs. i to 4 is used except that the buffer tube 21 other than the two-connected vacuum pump device Y2 does not have the hole 32 201139855. 'In each of the adsorption towers 1Qa and 1()b, a cycle consisting of the adsorption process shown in Fig. 6, the pressure reduction regeneration process, and the recompression process is repeated (step (1)), ! This is obtained from the air of the raw material gas. In the present embodiment, the supply amount of air is set to 4800 Nl „Vh by the raw material blower η of the γ1 by the PSA. The internal pressure of the adsorption towers 1〇Α and 〇β in the adsorption process is set to atmospheric pressure, and the pressure is reduced. The pressure at the end of the depressurization regeneration process inside the adsorption tower iga of the process is set to -53 〇mmHg (gauge pressure: about ~70 kPaG), and the internal pressure of the adsorption tower 1 〇Α, ι 在 in the re-pressing process The pressure reduction regeneration process for the adsorption tower (〇A,)〇B is a two-connected vacuum pump having the same configuration as the above except that the buffer tube Z1 does not have the orifice plate 74. The apparatus γ2 is operated by a step-down operation, and a Rouge pump having an exhaust capacity of 1 〇〇〇〇 m 3 /h is used as the vacuum pump 40 。 , and a Rouge pump having an exhaust capacity of 6 〇 53 m 3 /h is used as the vacuum pump 40B. As the buffer tube zi (without the orifice plate 74), the inner dimension (length) in the extending direction is 4. 4 mm 'and the inner diameter is 4 mm. About the two-connected vacuum crucible device Y2, as shown below Performing a step-down operation. It is a predetermined period from the start of the step-down regeneration process. When there is excess gas (that is, when the amount of exhaust gas from the vacuum pump 40A exceeds the exhaust amount of the vacuum pump 4〇β), the on-off valve 61 of the bypass line 60 is set to the open state, and the flow of the control gas is made to "connect the excess gas". The line 5 2 flows into the bypass line 6 。. Then, the amount of exhaust gas from the vacuum pump 40 渐 is gradually decreased, and when the exhaust capacity of the vacuum pump 4 〇 β is matched, the opening and closing valve 61 is automatically switched from the open state to the closed state. After the two vacuum pumps 40A and 40 are set to the full series state, the two-stage 33 201139855 vacuum pump unit Y2 is continuously subjected to the step-down operation. About the buffer tube Z1 of the two-connected type vacuum pump unit Υ2, the excess gas is measured during the step-down operation. The minimum residence time (the time required until the excess gas passes through the buffer tube Z1 immediately after the start of the pressure reduction) is 〇 5 sec. Further, the vibration acceleration acting on the shaft 61a of the on-off valve 61 in the open state is measured, The maximum value is about 3.0 G. In the measurement of the vibration acceleration, a vibration measuring instrument (VM ~ 61 manufactured by RI ON Co., Ltd.) is used. The measurement results of the third embodiment are disclosed in the table of Fig. 16. [至4。 The fourth embodiment of the second embodiment of the present invention m (fifth embodiment), 2·1 m (sixth embodiment), 丨·5 m (seventh embodiment), 1. 3 m (eighth embodiment), and 丨.〇5 m (ninth) In the gas purification system X1, which is the same as the third embodiment, the two-stage vacuum pump device Y2 is subjected to a step-down operation in the step-down regeneration process, and is repeated in each adsorption column 1A, 1B. A cycle consisting of an adsorption process, a pressure reduction regeneration process, and a recompression process, whereby oxygen is taken from the air which is the raw material gas. In the buffer tube Z1 of the two-connected vacuum pump device γ2 of the fourth to ninth embodiments, the minimum residence time of the excess gas is measured when the two-connected vacuum pump device Υ2 performs the step-down operation, which is 〇41 seconds (fourth implementation) Example), 〇. 32 seconds (fifth embodiment), 〇. 24 seconds (sixth embodiment), 〇. 17 seconds (seventh embodiment), 0 _ 15 seconds (eighth embodiment), and 〇·1 2 seconds (gth embodiment). Further, when the two-way type vacuum pump device γ2 of the fourth to ninth embodiments performs the step-down operation, the vibration of the shaft 34U acting on the opening and closing valve 61 of the open state is measured. (4th embodiment), 3.1 G (fifth embodiment), 3. 2G (sixth embodiment), 4·5G (seventh embodiment), 5. 5G (eighth embodiment), and 7. 0G (Ninth embodiment). The results of the measurements of the fourth to ninth embodiments are disclosed in the table of Fig. 16. [Third Comparative Example] Using the gas purification system X3 shown in Fig. 17, a cycle consisting of an adsorption process, a pressure reduction regeneration process, and a recompression process is repeated for each adsorption extraction 10A and 10B (step 4). Thereby, the milk is obtained from the air which is the raw material gas. The gas refining system X3 used in the third comparative example has a configuration similar to that of the gas refining system X1 used in the example of the crucible 3, except that the buffer tube Ζ1 α is not included. In the third comparative example, the depressurization regeneration process for the adsorption columns 10A and (10) is performed by the third embodiment _楳, M = by using the buffer tube 2, M = 40Β, the step-down operation is performed (the on-off valve 61 of the bypass s line 60 is switched from the open state to the closed state in the step of the step-down regeneration process), and the vacuum pumps 4A and 40B of the third comparative example are subjected to the step-down operation. The vibration acceleration acting on the axis a of the opening and closing valve 61 in the open state is measured, and the maximum value thereof is 135G. Regarding the above 3rd to 9th sounds #7丨n loose ^ , Λ ^ 1 〇 - the measurement of the example and the third comparative example is shown in the graph of Fig. 18, and the table P is in the dotted line. In the graph of Figure 18, the k-axis table does not buffer the vibration acceleration of the shortest lag axis in the tube (6). Further, the second axis (seconds) represents the f between the opening and closing, m α ^ _ is not provided in the third comparative example, and the reading value of the ★ axis is zero. [10th embodiment] Using a vacuum pump other than the two-connected type The buffer tube Z1 of the device Y2 has the orifice 35, the 201139855 plate 74, and the gas purification system similar to that of the third embodiment is the same as that of the third embodiment, and the two-connected vacuum pump device is stepped down in the step-down regeneration process. The operation is performed on each of the adsorption towers 1GA, and the cycle of the adsorption process, the pressure reduction regeneration process, and the recompression process is repeated, thereby obtaining oxygen from the air which is the material gas. Regarding the orifice plate 74, the buffer pipe In the zi, it is disposed at a position 5 〇〇 mm from the end wall 71 on the gas inlet side. Further, in the present embodiment, as the orifice plate 74, the diameter cut by the opening 7 is 230 mm. The inner diameter is 400 mm. The opening ratio of the orifice plate 74 of the tube zi (the diameter of the opening 74a is 230 Å) is 33%. Regarding the buffer tube Ζ 1 (having the orifice plate 74) of the two-connected vacuum pump device 第 2 of the tenth embodiment, 3, like the example, in the two-connected vacuum pump device Υ2 drop During operation, the shortest residence time in the measuring buffer tube is 〇·50 seconds. In addition, during the step-down movement of the two-connected vacuum pump unit γ2, the vibration acceleration acting on the shaft 61a of the opening and closing valve 61 in the open state is measured, which is the largest. The value is 2. 1 G. The measurement results of the ninth embodiment are disclosed in the table of Fig. 16. [First 1st 16th embodiment] A buffer tube (with an orifice plate) other than the two-connected vacuum pump device Υ2 is used. The length of 74) is changed from 4. 4m to 3. 6m (11th embodiment), 2. 8 m (12th embodiment), 2. 1 m (13th embodiment), 1.5 m (14th implementation) In the same manner as in the third embodiment, the gas purification system χ1 similar to that shown in Fig. 1 is the same as the third embodiment (the fifth embodiment) and the 丨.〇5 m (the sixth embodiment). In the depressurization regeneration process, the two-connected vacuum pump device Y2 is subjected to a step-down operation, and the adsorption process, the pressure reduction 36 201139855 regeneration process, and the recompression process are repeated in each adsorption tower 1 〇A, 1 〇B. The air gets oxygen. The eyesight 'is taken from the original ❹ About the eleventh to the i-th embodiment 71 ύ3 you have a continuous vacuum pump The buffer g Ζ 1 ' of Υ 2 is the same as that of the third embodiment, ^ ^ μ 4* * When the one-stage vacuum pump device Y2 is in the step-down operation, the HG is measured for the shortest stay in the buffer tube for 41 seconds (U-th embodiment), .32 Second (12th embodiment), "less (13th embodiment), 0 · 1 7 seconds (1st 4th #丨, η^14th embodiment), 0, 15 seconds (第5实施实施) Example), and 0. 12 seconds (16th sinus 竑 丨, ν. - Palladium case). Further, when the two-connected vacuum system Υ2 performs the step-down operation, the vibration of the shaft 61a acting on the opening and closing valve 61 in the open state is accelerated to 2.0G (the maximum value of the Tangdou guide) is 2.0G ( Nth embodiment), 2.1G (12th embodiment), 2 1G (13th embodiment), 2% (first embodiment), 3.〇G (15th embodiment), and 4.5G (16th) Example). The measurement results of the first and sixth embodiments are disclosed in the table of Fig. 6 and the measurement results of the ninth to sixteenth embodiments and the third example, and the graphical representation of Fig. 8 is shown. On the thick line. [17th to 2nd Embodiment] The straight 杈 of the opening 74a of the orifice plate 74 of the buffer tube ζ1 of the two-type vacuum pump device γ2 was changed from 230 ώ to 180 m (17th embodiment), 200 m ( 18th embodiment), 215m (19th embodiment) 23〇m (20th embodiment), 250 m (21st embodiment), and 27〇m (22nd embodiment), and the 10th embodiment The same gas refining system χι, in the depressurization regeneration process, the two-connected vacuum pump device γ2 is subjected to a step-down operation, and the adsorption process, the depressurization regeneration process, and the recompression process are repeated in each adsorption tower 10Α, 10Β. One of the cycles, whereby the oxygen is taken from the air which is the raw material gas 37 201139855. The opening ratio of the orifice plate 74 of the first 7th embodiment of the buffer tube 71 of the inner 400 mm is changed to 20%, and the opening of the orifice plate 74 of the first embodiment is described. The ratio of the opening ratio of the orifice plate μ of the 19th embodiment is 29%, and the opening ratio of the orifice plate 7 of the 20th embodiment is q QG/咕丰疋 33%, the 21st The aperture ratio of the orifice plate 74 of the embodiment is 39%, and the opening ratio of the orifice plate 74 of the actual example is 46%. _ J < in the 17th to 22nd embodiments The buffering officer Z1 of the continuous vacuum pump device Y2, and the third embodiment - the flat __ m is used to measure the maximum residence time in the buffer tube J during the step-down operation of the one-connected vacuum pump device Y2, all of which are 〇. 15 seconds. Further, when the two-connected vacuum pump protection device Y2 performs the step-down operation, the vibration acceleration of the shaft 61a acting on the opening and closing valve 61 in the open state is measured, and the maximum value is 4.2. G (17th embodiment), 3.8G (18th embodiment), 3 4G (19th embodiment), 3.〇G (20th embodiment), 33G (2nd embodiment), and 4.0G (the first) 22 examples). Regarding the 17th The measurement results of the twenty-second embodiment are disclosed in the table of Fig. 19, and the graph in the second diagram is shown on the thick line. In the graph of Fig. 20, the horizontal axis represents the orifice plate 74 (throttle portion). The opening ratio u)' vertical axis indicates the vibration acceleration (G) of the shaft 61a of the opening and closing valve 61. [Evaluation] From the comparison of the results of the third to twenty-second embodiments and the third comparative example, the buffer tube was placed in the S history. The gas purification system χ1 (third to twenty-second embodiment) shown in Fig. 1 of Z1 has a vibration acceleration rate acting on the shaft 61a of the opening and closing valve 61 as compared with the gas refining system shown in Fig. 17 in which such a buffer tube is not provided. Χ3 (3rd comparative example) is smaller. Further, if the length of the buffer tube is the same, the vibration acceleration of the shaft 6la acting on the opening and closing valve 6i is provided in the orifice plate 38 201139855 74 (10th to 16th embodiments). It is smaller than the case where the orifice plate is not provided. Further, the second-stage vacuum system Y2 (3rd to 8th, 1st) in which the minimum residence time of the excess gas is 〇.15 seconds or more is the buffer tube Z1. 〇~15th embodiment), the vibration acceleration acting on the shaft 61a of the opening and closing valve 61 can be made particularly small. BRIEF DESCRIPTION OF THE DRAWINGS Fig. 1 is a schematic configuration diagram of a gas purification system according to an embodiment of the present invention. Fig. 2 is a cross-sectional view of a Rouer pump along the π mouth of the first figure. The fascination shown in Fig. 1 is a cross-sectional view of the part of the β ^ ^ ^ ^ ^ ^ ^ ^ ^ ^ ^ ^ ^ ^ ^ ^ ^ ^ ^ ^ ^ ^ ^ ^ ^ ^ ^ ^ ^ ^ ^ ^ ^ ^ ^ ^ 1 The teaching shown in Fig. #接制^ ^ The empire volume system is not intended to constitute a diagram. Fig. 6 is a flow chart showing a cycle (step H) of the gas refining method which can be carried out by the gas refining system of Fig. 1. Fig. 7 is a graph showing the relationship between the depressurization regeneration time and the suction port pressure when the gas temperature is changed. ^ Figure 8 is a graph showing the relationship between the suction pressure of the two-line type, ^, and two pump units, the apparent displacement, and the optimum power required. Fig. 9 is a view showing a modification of the opening and closing valve of the bypass technique. Fig. 10 is a partial pattern diagram of the flute of the buffer tube, the modification of the ^1 and the vicinity thereof. 39 201139855 Fig. 11 is a 9w-style diagram of the buffer tube. The pattern of the brother/worry case and its vicinity is 〇 Figure 12 is a section along the line u Π - X π of the u-th diagram. Figure 1 3 shows the flute of the buffer tube q 变形 The variant of the 3rd and the section of the section near itFig. 14 shows the suction port pressure and apparent displacement of the 2nd Yuangu + ^ Yizhen second system And the graph of the relationship between the required power in the case of opening and closing the valve of the official line in the early sequence closing. Figure 15 is a graph showing the relationship between the suction pressure of the two-way θ i true two-pump device, the apparent exhaust gas 3: and the dynamic power of the opening and closing valve of the bypass line in the backward timing. . Fig. 16 is a table for sorting the measurement results of the 筮 筮 ' to the sixteenth embodiment. Fig. 7 is a diagram showing the gas of the third comparative example, J, and the vowel of the carcass refining system. Fig. 18 is a view of the " A graph of the measurement results. Measurement of the Example of the Comparative Example 3 Figure 19 shows the table of the 17th to the 22nd sinus. Fig. 2 is a graph showing the measurement of the 17th to 22nd embodiments. [Main component symbol description] X1 gas refining system, I 〇A, 1 〇β adsorption tower, II gas passage port, 40 201139855 12 gas Passing port, 21 material blower, 22 tank, Y1 PSA unit, Y2 two-connected vacuum pump unit, Y3 silencer, 31, 32, 33, 34 piping, 31', 32', 33' main road, 31A, 31B, 32A , 32B, 33A, 33B branch, 31a, 31b, 32a, 32b, 33a, 33b, 34a automatic valve, El, E2, E3, E4, E5, E6, E7 end, 40A, 40B vacuum pump, 40a housing, 40b Rotor, 41 suction port, 42 exhaust port, 51 motor, 52 connecting line, 5 3 piping, 60 bypass line, 61 open and close valve, 61 a shaft, Z1 buffer tube, 71, 72 end wall, 41 201139855 73 , 80 pressure detectors. 42