TW201133157A - Light irradiation device - Google Patents

Light irradiation device Download PDF

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Publication number
TW201133157A
TW201133157A TW100101100A TW100101100A TW201133157A TW 201133157 A TW201133157 A TW 201133157A TW 100101100 A TW100101100 A TW 100101100A TW 100101100 A TW100101100 A TW 100101100A TW 201133157 A TW201133157 A TW 201133157A
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Taiwan
Prior art keywords
light
mirror
collecting mirror
cooling air
bulb
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TW100101100A
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Chinese (zh)
Inventor
Kazuyoshi Suzuki
Yoshiharu Inomata
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Ushio Electric Inc
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Publication of TW201133157A publication Critical patent/TW201133157A/en

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    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20Exposure; Apparatus therefor
    • G03F7/2002Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image
    • G03F7/2004Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image characterised by the use of a particular light source, e.g. fluorescent lamps or deep UV light
    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B27/00Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
    • G02B27/18Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00 for optical projection, e.g. combination of mirror and condenser and objective
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058Mask illumination systems
    • G03F7/7015Details of optical elements
    • G03F7/70166Capillary or channel elements, e.g. nested extreme ultraviolet [EUV] mirrors or shells, optical fibers or light guides
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058Mask illumination systems
    • G03F7/7015Details of optical elements
    • G03F7/70175Lamphouse reflector arrangements or collector mirrors, i.e. collecting light from solid angle upstream of the light source
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216Mask projection systems
    • G03F7/70233Optical aspects of catoptric systems, i.e. comprising only reflective elements, e.g. extreme ultraviolet [EUV] projection systems
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70Microphotolithographic exposure; Apparatus therefor
    • G03F7/708Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70991Connection with other apparatus, e.g. multiple exposure stations, particular arrangement of exposure apparatus and pre-exposure and/or post-exposure apparatus; Shared apparatus, e.g. having shared radiation source, shared mask or workpiece stage, shared base-plate; Utilities, e.g. cable, pipe or wireless arrangements for data, power, fluids or vacuum
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
    • G03F9/7096Arrangement, mounting, housing, environment, cleaning or maintenance of apparatus

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Environmental & Geological Engineering (AREA)
  • Computer Networks & Wireless Communication (AREA)
  • Health & Medical Sciences (AREA)
  • Optics & Photonics (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Non-Portable Lighting Devices Or Systems Thereof (AREA)
  • Arrangement Of Elements, Cooling, Sealing, Or The Like Of Lighting Devices (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)

Abstract

Problem to be solved: to achieve a cooling air structure capable of supplying adequate cooling air to the condensing lens without overcooling the lamp. Solution: a light irradiation device includes a bulb, and a condensing lens having a curved reflection surface for reflecting the light from the bulb, a condensing lens supporting mechanism for upwardly supporting the condensing lens, a cooling air inlet for taking in the cooling air used to cool the bulb and the condensing lens, and a cooling air exhaust port for exhausting the cooling air after it has been used for cooling the bulb and the condensing lens, wherein the condensing lens comprises: a plurality of supporting bodies of support rods that use elastomer to lift the condensing lens from the back side toward the normal direction of the curved surface of condensing lens, a frame body for installing the support bodies, and a push plate for pressing the peripheral of light export of the condensing lens. The peripheral of light export of the condensing lens is pressed in between the opening of the condensing lens push plate and the ventilation holes formed around the opening.

Description

201133157 六、發明說明: 【發明所屬之技術領域】 本發明,是有關於光照射裝置’其被使用在供製造半 導體元件、印刷電路基板、液晶基板等用的曝光裝置。 【先前技術】 供半導體元件、印刷電路基板、液晶顯示基板的曝光 裝置所使用的光源’一直是使用短弧型的放電燈泡’例如 數k W至數1 0 k W的大型的超高壓水銀燈泡。 在第6圖中,是顯示作爲上述曝光裝置的光照射部被 使用的習知的光照射裝置的構造的一例。 光照射裝置,具備:短弧型的放電燈泡1、橢圓集光 鏡2、第1平面鏡13、積分器透鏡14、擋板機構15、第2平 面鏡16、準直透鏡17等。 燈泡1,是被配置於使發光點位於橢圓集光鏡2的第一 焦點的位置。來自燈泡1的包含紫外線的光,是藉由形成 於集光鏡2的內側的反射面而被反射並被集光後,從同圖 上側的光射出口 2b射出。 從光射出口 2b射出的光,是藉由第1平面鏡13被反射 後,被入射至被配置於集光鏡的第二焦點的積分器透鏡14 。積分器透鏡1 4也稱爲蠅眼透鏡,具有將光照射面1 8中的 照度分布均一化的作用。 從積分器透鏡Μ射出的光,是透過擋板機構15藉由第 二平面鏡1 6被折返後,入射至將光變成爲平行光的準直透 -5- 201133157 鏡1 7後’成爲平行光並從光照射裝置射出後,照射至光照 射面1 8。又,可取代準直透鏡1 7而使用如準直鏡也可以。 在第7圖中,顯示具備習知的光照射裝置的燈泡及集 光鏡的光源部的放大圖。且第8圖,是顯示習知的光源部 的集光鏡及集光鏡的支撐板的關係的立體圖。使用這些的 圖,說明燈泡及集光鏡的支撐構造。 集光鏡2,是具有曲面的反射面,且形成有:將由此 反射面反射的光射出的光射出口 2b、及位於該光射出口 2b 相反側的貫通孔2 a。 且集光鏡2,是使光射出口 2b朝上方的方式被放置於 集光鏡支撐板3上,貫通孔2 a的周邊部是與集光鏡支撐板3 的表面接觸並被支撐。又,在集光鏡支撐板3也形成有與 集光鏡的貫通孔2a幾乎相同徑的貫通孔3c。 集光鏡支撐板3,是透過彈簧3a被安裝於框架6。藉由 此彈簧3a’在集光鏡支撐板3中,使集光鏡2朝同圖上方向 擧升的力會作動。藉此,集光鏡2是使光射出口 2b的周緣 被推至集光鏡推板7。又,在集光鏡推板7中,形成有供從 光射出口 2b射出的光通過用的開口 7b。 被安裝於集光鏡內的短弧型的燈泡1,是將燈泡的軸 la通過集光鏡2的貫通孔2a及集光鏡支撐板3的貫通孔3c, 並透過框架6的冷卻風流入口 6 a被固定支撐於被設在集光 鏡2的外側背後的台座4。此台座4是被安裝於光照射裝置 的燈泡軸調機構5。 燈泡軸調機構5,是具備將燈泡1朝XYZ方向移動的平 201133157 台。藉由移動燈泡軸調機構5,來調節燈泡1使其發光點位 於集光鏡2的第一焦點。 且台座4是與燈泡點燈電源1 1連接。朝燈泡1的電力供 給,在被固定於燈泡的台座4側的極是透過此台座4,在另 一方集光鏡2的光射出口 2 b側的極,安裝有來自燈泡電源 1 1的供電線1 1 a,並透過此供電線1 1 a進行。 如此,有關於將光射出口朝上方配置的集光鏡的支撐 構造的先行技術,如專利文獻1。 [先行技術文獻] [專利文獻] [專利文獻1]日本特開2000-40655號公報 【發明內容】 (本發明所欲解決的課題) 如上述,冷卻風是被使用在燈泡及集光鏡的冷卻。光 照射裝置是作爲曝光裝置的光照射部被使用的情況時,集 光鏡多使用:於反射面形成不會反射不需要曝光的光(例 如可視光和紅外光)只反射需要曝光的光(例如紫外線) 的蒸著膜的反射鏡。[Technical Field] The present invention relates to a light irradiation device which is used in an exposure apparatus for manufacturing a semiconductor element, a printed circuit board, a liquid crystal substrate, or the like. [Prior Art] A light source used for an exposure device for a semiconductor element, a printed circuit board, or a liquid crystal display substrate has been a large-sized ultrahigh pressure mercury bulb using a short arc type discharge bulb such as several k W to several 10 kW. . In the sixth drawing, an example of the structure of a conventional light irradiation device used as the light irradiation portion of the exposure device is shown. The light irradiation device includes a short arc type discharge bulb 1, an elliptical concentrating mirror 2, a first plane mirror 13, an integrator lens 14, a shutter mechanism 15, a second plane mirror 16, and a collimator lens 17. The bulb 1 is disposed at a position where the light-emitting point is located at the first focus of the elliptical concentrating mirror 2. The light containing ultraviolet rays from the bulb 1 is reflected by the reflecting surface formed inside the collecting mirror 2, and is collected, and then emitted from the light exiting opening 2b on the upper side of the same drawing. The light emitted from the light exiting opening 2b is reflected by the first plane mirror 13 and then incident on the integrator lens 14 disposed at the second focus of the collecting mirror. The integrator lens 14 is also called a fly-eye lens and has a function of uniformizing the illuminance distribution in the light-irradiating surface 18. The light emitted from the integrator lens is deflected by the baffle mechanism 15 by the second plane mirror 16 and then incident on the collimated light that turns the light into parallel light -5-201133157 mirror 1 7 'becomes parallel light After being emitted from the light irradiation device, it is irradiated to the light irradiation surface 18 . Further, a collimator lens may be used instead of the collimator lens 17. In Fig. 7, an enlarged view of a light source unit of a bulb and a collecting mirror having a conventional light irradiation device is shown. Further, Fig. 8 is a perspective view showing the relationship between the collecting mirror of the conventional light source unit and the supporting plate of the collecting mirror. Use these figures to illustrate the support structure of the bulb and the concentrator. The collecting mirror 2 is a reflecting surface having a curved surface, and is formed with a light exiting opening 2b that emits light reflected by the reflecting surface, and a through hole 2a located on the opposite side of the light emitting opening 2b. Further, the collecting mirror 2 is placed on the collecting mirror support plate 3 such that the light exiting opening 2b faces upward, and the peripheral portion of the through hole 2a is in contact with and supported by the surface of the collecting mirror support plate 3. Further, the collecting mirror support plate 3 is also formed with a through hole 3c having a diameter substantially the same as that of the through hole 2a of the collecting mirror. The illuminator support plate 3 is attached to the frame 6 via a spring 3a. By the spring 3a' in the concentrating mirror support plate 3, the force that lifts the concentrating mirror 2 toward the upper direction of the drawing is activated. Thereby, the collecting mirror 2 pushes the peripheral edge of the light exiting opening 2b to the collecting mirror platen 7. Further, in the collecting mirror plate 7, an opening 7b through which the light emitted from the light exiting opening 2b passes is formed. The short-arc type bulb 1 mounted in the collecting mirror passes the shaft la of the bulb through the through hole 2a of the collecting mirror 2 and the through hole 3c of the collecting mirror supporting plate 3, and passes through the cooling airflow inlet of the frame 6. 6 a is fixedly supported by the pedestal 4 provided behind the outer side of the collecting mirror 2. This pedestal 4 is a bulb shaft adjustment mechanism 5 that is attached to a light irradiation device. The bulb shaft adjustment mechanism 5 is provided with a flat 201133157 unit that moves the bulb 1 in the XYZ direction. The bulb 1 is adjusted to have its light-emitting point at the first focus of the collecting mirror 2 by moving the bulb axis adjusting mechanism 5. And the pedestal 4 is connected to the bulb lighting power source 11. The power supply to the bulb 1 is transmitted through the pedestal 4 on the side of the pedestal 4 fixed to the bulb, and the supply from the bulb power supply 1 1 is attached to the pole on the side of the light exit 2 b of the other concentrating mirror 2 The wire 1 1 a is conducted through the power supply line 1 1 a. As described above, there is a prior art of a support structure of a collecting mirror in which a light exiting opening is disposed upward, as in Patent Document 1. [PRIOR ART DOCUMENT] [Patent Document 1] JP-A-2000-40655 [Invention] [Problems to be Solved by the Invention] As described above, the cooling air is used in a bulb and a concentrating mirror. cool down. When the light irradiation device is used as a light irradiation portion of the exposure device, the light collection mirror is often used such that light that does not need to be reflected (for example, visible light and infrared light) is reflected on the reflection surface to reflect only light that needs to be exposed ( For example, ultraviolet light) a mirror of a vaporized film.

使用如此的蒸著膜反射鏡的情況時,爲了使蒸著膜不 會剝離’有需要將反射鏡的溫度保持在例如3 5 0 °C以下。 對於此,被稱爲燈泡的封體的發光管的部分的點燈中的最 適溫度爲650 °C〜750 °C。因此,不進行集光鏡的冷卻的話 ’因爲來自燈泡的封體的輻射熱等會使溫度上昇至350 °C 201133157 以上,所以會有蒸著膜產生剝離等的問題。 即,集光鏡必需保持在比燈泡更更低的溫度,因此冷 卻的重點,是集光鏡比燈泡重要。集光鏡2,特別是燈泡 的軸通過貫通孔2a的附近的部分(從貫通孔2a的周緣約寬 度10mm的領域),因爲最接近燈泡的發光部分所以溫度 容易變高。因此,冷卻風,必需大量供給至集光鏡的貫通 孔2 a的附近。 另一方面,流動於光源部的冷卻風,是如上述被分開 成:從貫通孔2 a進入並流入集光鏡2內側(反射面側)的 風(第7圖(a))、及繞流於集光鏡2外側的風(第7圖的(b) )的二道。在此,從貫通孔2a進入集光鏡2內側的冷卻風 (a),大部分是沿著燈泡1的表面流動用來冷卻燈泡。另 一方面,集光鏡2的冷卻,實質上是藉由繞流於集光鏡2外 側的風(b )進行。 但是如上述,集光鏡2是藉由集光鏡支撐板3被支撐在 貫通孔2a的周邊部。因此,如第8圖所示,在集光鏡2的貫 通孔2a的周圍具有集光鏡支撐板3,如第7圖所示,此集光 鏡支撐板3是成爲遮風板,使繞流於集光鏡2的外側的風( b),無法接近溫度成爲最高的集光鏡2的貫通孔2a的附近 〇 在這種狀態下,冷卻風無法效率佳地將集光鏡2冷卻 。欲使集光鏡2的溫度作爲下降而增加冷卻風量的話,該 部分燈泡的冷卻風也會增加。因此,燈泡會成爲如上述所 示的適切的溫度範圍(650 °C〜750 °C)以下,即成爲過冷 201133157 卻,依據情況燈泡有可能熄滅。 另一方面,爲了使燈泡在上述適切的溫度範圍而將冷 卻風減少的話,因爲將集光鏡冷卻用的風量也減少,所以 集光鏡的溫度會成爲蒸著膜的極限剝離溫度(35〇t )以 上,而成爲蒸著膜的剝離的原因。 本發明,是鑑於上述的問題點,目的爲提供一種構造 ,可以實現:使流動於集光鏡的外側的風,儘可能多流動 至集光鏡的溫度成爲最高的貫通孔附近的領域,即,在集 光鏡的外側且貫通孔附近的領域,儘可能供給大多的冷卻 風構造,且不會增加朝燈泡的冷卻風,即不會讓燈泡的溫 度下降(燈泡不會過冷卻),只讓集光鏡的溫度下降的方 式,朝集光鏡供給充分的冷卻風。 (用以解決課題的手段) 習知,是藉由板狀的集光鏡支撐板將集光鏡擧升支撐 。因此,其會成爲流動於集光鏡的外側的冷卻風的遮風板 ,成爲冷卻風無法到達集光鏡的貫通孔的外側附近的原因 〇 在此,在本發明中’藉由將使集光鏡光射出口朝上方 支撐的集光鏡支撐機構如下地構成’就可解決上述課題。 一種光照射裝置,具備:燈泡、及具有將來自此燈泡 的光反射的曲面的反射面的集光鏡、及將此集光鏡朝上方 地支撐的集光鏡支撐機構、及將冷卻燈泡及集光鏡用的冷 卻風取入的冷卻風取入口、及將冷卻燈泡及集光鏡之後的 -9 - 201133157 冷卻風排氣的冷卻風排氣口,其中,集光鏡支撐機構,具 ϋ:設有將集光鏡從背面側對於集光鏡的曲面朝法線方向 胃$彈性體擧升的支撐棒的複數個支撐體、及將支撐體安 框架、及將集光鏡的光射出口的周緣壓住的集光鏡推 板。 集光鏡的光射出口的周緣,是被壓在集光鏡推板的開 口及形成於此開口周邊的通風孔之間》 [發明的效果] 本發明,可以獲得以下的效果。 因爲藉由呈複數點狀配置的支撐體進行集光鏡的擧升 ’所以不會將流動於集光鏡的外側的冷卻風遮風,冷卻風 會流動至集光鏡的貫通孔附近。因此,集光鏡的溫度成爲 最高的貫通孔附近的領域的溫度的可以降低。 進一步,因爲在集光鏡推板之使集光鏡的光射出口的 周緣被壓住的部分的周邊形成通風孔,所以流動於集光鏡 的外側的冷卻風,會沿著集光鏡的背面流動,將集光鏡整 體效率佳地冷卻並排氣。因此,可以降低集光鏡整體的溫 度。 【實施方式】 在第1圖中,顯示作爲曝光裝置的光照射部被使用的 本發明的光照射裝置的構造的一例。 本發明的光照射裝置,除了具備燈泡1及集光鏡2的光 -10- 201133157 源部1 〇的構造以外,基本上與第6圖的構成相同。 燈泡1 ’是使用短弧型的超高壓水銀燈泡,集光鏡2, 是使用玻璃製的橢圓集光鏡。且,放電燈泡1的發光中心 是被配置成位於集光鏡2的第1焦點的位置。 集光鏡2 ’是爲了反射需要曝光的光也就是紫外線並 去除不需要的紅外線和可視光,將可讓紫外線反射並可讓 紅外線和可視光透過的無機多層蒸著膜,形成於曲面的光 反射面的表面。由光反射面所反射的包含紫外線的光是從 光射出口 2b被射出。 從集光鏡2的光射出口 2 b射出的光,是由第1平面鏡1 3 被反射,入射至將照射領域中的照度分布均一化的積分器 透鏡I 4。 從積分器透鏡14射出的光,是透過被配置於積分器透 鏡1 4的光射出側的擋板機構1 5,朝第2平面鏡1 6被反射, 並入射至準直透鏡17。入射至準直透鏡17的光是成爲平行 光,照射被載置於光照射面1 8的遮罩和工件的被照射物。 又,可取代準直透鏡1 7使用準直鏡也可以。 被照射物的紫外線照射量是藉由擋板機構1 5的開閉被 控制。又,擋板機構1 5,是配置於積分器透鏡1 4的光入射 側也可以。 將燈泡1及集光鏡2冷卻的冷卻風,是從光照射裝置的 被設在集光鏡2的光射出口 2b相反側的冷卻風取入口 1 〇a被 取入,藉由設在集光鏡2的光射出口 2 b側的排氣風扇2 0從 排氣口 19被排氣。 -11 - 201133157 在第2圖中,顯示具備本發明的光照射裝置的燈泡及 集光鏡的光源部的放大圖。同圖,是與第7圖同樣,只顯 示冷卻風的流動圖的左側。且,在第3圖中,顯示本發明 的光源部的集光鏡及集光鏡的支撐體及集光鏡推板的關係 的立體圖。 使用第2圖及第3圖,說明光源部的構造及冷卻風的流 動。 與習知同樣,集光鏡2,是具有曲面的光反射面,形 成有:將反射的光射出的光射出口 2b、及位於光射出口 2b 相反側的貫通孔2 a。且,藉由集光鏡支撐機構,使光射出 口 2b朝上方地被支撐。對於集光鏡支撐機構的詳細如後述 。如上述,在集光鏡2的光反射面中,被蒸著有讓紫外線 反射並讓紅外線和可視光透過的無機多層膜。 被安裝於集光鏡2內的短弧型的燈泡1,該燈泡1的軸 la是貫通集光鏡的貫通孔2 a及形成於框架6的冷卻風流入 口 6a,被固定支撐於被設在集光鏡2的外側背後的台座4。 此台座4是被安裝於光照射裝置的燈泡軸調機構5,燈 泡軸調機構5,具備將燈泡1朝XYZ方向移動的平台。台座 4是與燈泡點燈電源1 1連接,且,在集光鏡2的開口 2b側的 燈泡1的極中,安裝有來自燈泡電源1 1的供電線1 1 a,朝燈 泡1的電力的供給是透過台座4及此供電線1 1 a進行。 接著說明集光鏡支撐機構的構造。 集光鏡支撐機構,具備:藉由呈點狀與集光鏡2的背 面接觸的彈性體的力將集光鏡朝上擧升的複數個支撐體30 -12- 201133157 、及安裝有支撐體3〇的框架6、及將藉由支撐體30被擧升 的集光鏡2壓住的集光鏡推板7。 集光鏡2,是使光射出口 2b朝上地被被放置於集光鏡 支撐體30上。集光鏡支撐體30是藉由將被載在其上的集光 鏡2由彈性體的力擧升’使集光鏡2的光射出口 2b的周緣壓 住集光鏡推板7。由此集光鏡2是在光射出口 2b成爲朝上的 狀態下被支撐固定。對於集光鏡支撐體3 0的詳細構造如後 述。 集光鏡支撐體30,是被固定設置於複數個框架6上。 且,在框架6中形成有冷卻風流入口 6a,其是供將從光照 射裝置的冷卻風取入口 1 〇 a取入的冷卻風朝光源部1 0導入 用。 在集光鏡推板7中,形成有讓從集光鏡2的光射出口 2b 射出的光通過的開口 7b,進一步,在此開口 7b的周邊,形 成有讓流動至集光鏡2的外側的冷卻風通過的通風孔7a。 藉由集光鏡支撐體30擧升的集光鏡2的光射出口 2b的周緣 ,是被壓在此開口 7b及通風孔7a之間。 接著,說明集光鏡支撐體30的構造。 第4圖是集光鏡支撑體30的剖面圖’同圖(a)是顯不 集光鏡支撐體30未將集光鏡2支撐的狀態,(b )是顯示將 集光鏡2支撐的狀態。且,第5圖是顯示集光鏡支撐體的立 體圖。 集光鏡支撐體30,具備:在框架6由螺栓等被固定的 本體部3 1、及呈點狀與集光鏡2的背面(反射面的相反側 -13- 201133157 的面)接觸而擧升的支撐棒32。 支撐棒32,是透過被設在本體部31內部的彈簧33等的 彈性體而被安裝於本體部31。支撐棒32是藉由彈簧33可對 於本體部31出入。 支撐棒32的先端是與集光鏡2的背面接觸。因此,使 不會弄傷集光鏡2且耐高溫的方式,將耐熱性的緩衝材34 安裝在支撐棒32的先端。 集光鏡支撐體30未將集光鏡2支撐的情況時,如第4圖 (a)所示,彈簧33會延伸使支撐棒32大大地突出本體。 另一方面,集光鏡支撐體30是將集光鏡2支撐的情況 時,如第4圖(b)所示,藉由集光鏡2的重量使彈簧33短 縮,在支撐棒32中將集光鏡2朝上推舉的力會作用。由此 ,集光鏡2的光射出口 2b的周緣是被壓在集光鏡推板7,使 集光鏡2被支撐固定。 在此,集光鏡支撐體30的支撐棒32,是爲了防止過度 的力項施加在玻璃製的集光鏡2,基本上是配置成對於集 光鏡的曲面朝法線方向加上力。 集光鏡支撐體30將集光鏡2支撐的位置,即支撐棒32 與集光鏡2的背面接觸的位置,是從集光鏡2的下端(貫通 孔2 a的周緣)朝上側距離40mm〜50mm。如上述’集光鏡2 的溫度成爲最高的部分,是從貫通孔2a的周緣開始的寬:度 約10mm的領域,支撐棒32接觸此領域的話,該部分因爲 無法與冷卻風接觸,所以不易被冷卻。 且爲了將集光鏡2確實地支撐固定,將集光鏡2朝集光 -14 - 201133157 鏡推板7壓住的力,即將集光鏡2擧升的力是愈大良好。 集光鏡支撐體30的支撐棒32是對於集光鏡2的曲面朝 法線方向加上力量時,爲了加大集光鏡2的擧升力量’支 撐棒3 2是配置於集光鏡2的儘可能下側(接近貫通孔2 a部 分)較佳。 但是如上述,集光鏡的下側(接近貫通孔2a部分)’ 因爲是成爲最高溫即最需進行冷卻的部分所以無法配置支 撑棒3 2。在此,支擦棒3 2 ’是配置於:迴避集光鏡的溫度 成爲最高的貫通孔2 a附近的領域’且’對於集光鏡2的曲 面朝法線方向加上力量時,使集光鏡2擧升的力量儘可能 增大的部分。 且集光鏡支撐體3〇的數量’是考慮:集光鏡2的大小 和重量、支撐狀態下的集光鏡的穩定性來決定。將3個至4 個等間隔地配置在框架6的冷卻風流入口 6 a的周邊部較佳 〇 接著,說明光源部的冷卻風的流動。 從光照射裝置的被設在集光鏡2的光射出口 2b相反側 的冷卻風取入口 l〇a取入的冷卻風,是從形成於框架6的冷 卻風流入口 6a進入光源部1〇後’被分開成:從集光鏡2的 貫通孔2 a進入集光鏡2的內側將燈泡1冷卻的流動(a )、 及繞著集光鏡2的外側從背面側集光鏡2冷卻的流動(b ) 〇 集光鏡支撐部體3 0,是如上述呈點狀將集光鏡2支撐 。因此,集光鏡支撐部體30 ’實質上不會妨害流動於集光 -15- 201133157 鏡2的外側的冷卻風沿著集光鏡2背面流動。即,流動於集 光鏡2的外側的冷卻風,如第2圖(b )所示,是與接近燈 泡的發光部分的溫度成爲最高的集光鏡2的貫通孔2a@ % 近背面接觸,其後一邊將集光鏡2整體的熱奪取—邊沿著 集光鏡2的背面上昇。 另一方面,集光鏡2的光射出口 2b的周緣,是被壓在 :集光鏡推板7的光通過的開口 7b及形成於其周邊的通風 孔7a之間的部分。 因此,將集光鏡2的外側沿著背面流動的冷卻風,是 朝向通風孔7a且不會遠離集光鏡2的背面地流向通風孔7a 。且’從通風孔7a流出的將集光鏡2冷卻的冷卻風,是與 將燈泡1冷卻的冷卻風一起朝向排氣口 1 9流動並被排氣。 藉此,流動於集光鏡2的外側的冷卻風,可以將集光 鏡2整體效率佳地冷卻。因此,集光鏡的貫通孔2a的附近 的溫度’習知約320 °C〜約350 °C,但是在本發明中,不需 改變冷卻風量就可以下降至約180°C〜約240°C。由此,可 以不會將燈泡過冷卻地使集光鏡的溫度下降。 【圖式簡單說明】 [第1圖]顯示作爲曝光裝置的光照射部使用的本發明的 光照射裝置的構造的一例的圖。 [第2圖]顯示具備本發明的光照射裝置的燈泡及集光鏡 的光源部的放大圖。 [第3圖]顯示本發明的光源部的集光鏡及集光鏡的支撐 -16- 201133157 體及集光鏡推板的關係的立體圖。 [第4圖]顯示集光鏡支撐體的剖面圖。 [第5圖]顯示集光鏡持體的立體圖。 [第6圖]顯不作爲曝光裝置的光照射部使用的習知的光 照射裝置的構造的一例的圖。 [第7圖]顯示具備習知的光照射裝置的燈泡及集光鏡的 光源部的放大圖。 [第8圖]顯示習知的光源部的集光鏡及集光鏡的支撐板 的關係的立體圖。 【主要元件符號說明】 1 :燈泡 1 a :燈泡的軸 2 :集光鏡 2 a :貫通孔 2 b :光射出口 3 :集光鏡支撐板 4 :台座 5 :燈泡軸調機構 6 :框架 6a :冷卻風流入口 7 :集光鏡推板 7a :通風孔 7b :開口 -17- 201133157 1 〇 :光源部 10a:冷卻風取入口 1 1 :燈泡點燈電源 1 1 a :供電線 1 2 :框體 1 3 :第1平面鏡 14 :積分器透鏡 1 5 :擋板機構 1 6 :第2平面鏡 1 7 :準直透鏡 1 8 :光照射面 1 9 :排氣口 2 0 :排氣風扇 3 0 :集光鏡支撐體 3 1 :本體部 3 2 :支撐棒 3 3 :彈簧 3 4 :緩衝材When such a vapor deposition mirror is used, in order to prevent the vapor deposition film from being peeled off, it is necessary to maintain the temperature of the mirror at, for example, 550 ° C or lower. For this reason, the optimum temperature in the lighting of the portion of the arc tube called the envelope of the bulb is 650 ° C to 750 ° C. Therefore, if the cooling of the concentrating mirror is not performed, the temperature rises to 350 °C and 201133157 or more due to the radiant heat from the envelope of the bulb, and there is a problem that the vaporized film is peeled off. That is, the concentrating mirror must be kept at a lower temperature than the bulb, so the focus of cooling is that the concentrating mirror is more important than the bulb. The collecting mirror 2, in particular, the portion of the bulb passing through the vicinity of the through hole 2a (a region having a width of about 10 mm from the peripheral edge of the through hole 2a) is likely to become high in temperature because it is closest to the light emitting portion of the bulb. Therefore, the cooling air must be supplied in a large amount to the vicinity of the through hole 2a of the collecting mirror. On the other hand, the cooling air flowing through the light source unit is divided into the wind which enters from the through hole 2 a and flows into the inside of the collecting mirror 2 (the reflecting surface side) (Fig. 7(a)), and the winding. The two winds flowing through the outside of the collecting mirror 2 ((b) of Fig. 7). Here, the cooling air (a) entering the inside of the collecting mirror 2 from the through hole 2a flows mostly along the surface of the bulb 1 to cool the bulb. On the other hand, the cooling of the collecting mirror 2 is substantially performed by the wind (b) flowing around the outside of the collecting mirror 2. However, as described above, the collecting mirror 2 is supported by the peripheral portion of the through hole 2a by the collecting mirror support plate 3. Therefore, as shown in Fig. 8, the collecting mirror support plate 3 is provided around the through hole 2a of the collecting mirror 2, and as shown in Fig. 7, the collecting mirror supporting plate 3 is a windshield plate and is wound around The wind (b) flowing outside the collecting mirror 2 cannot approach the vicinity of the through hole 2a of the collecting mirror 2 having the highest temperature. In this state, the cooling wind cannot efficiently cool the collecting mirror 2. If the temperature of the collecting mirror 2 is to be lowered to increase the amount of cooling air, the cooling air of the portion of the bulb will also increase. Therefore, the bulb will become below the appropriate temperature range (650 °C to 750 °C) as shown above, which becomes too cold. 201133157 However, depending on the situation, the bulb may be extinguished. On the other hand, in order to reduce the cooling air in the above-mentioned appropriate temperature range, the air volume for cooling the collecting mirror is also reduced, so the temperature of the collecting mirror becomes the limit peeling temperature of the evaporated film (35〇). t) The above causes the peeling of the vaporized film. The present invention has been made in view of the above problems, and it is an object of the invention to provide a structure in which the wind flowing outside the collecting mirror is caused to flow as much as possible to the vicinity of the through hole having the highest temperature of the collecting mirror, that is, In the field near the outside of the collecting mirror and in the vicinity of the through hole, most of the cooling air structure is supplied as much as possible, and the cooling wind toward the bulb is not increased, that is, the temperature of the bulb is not lowered (the bulb is not supercooled), only A method of reducing the temperature of the collecting mirror supplies a sufficient cooling air to the collecting mirror. (Means for Solving the Problem) Conventionally, the concentrating mirror is supported by a plate-shaped concentrating mirror support plate. Therefore, it becomes a windshield of the cooling air which flows in the outer side of a concentrating mirror, and it is the cause of the cooling wind which cannot approach the outer side of the through-hole of the condensing mirror. In this invention, The above-described problem can be solved by the fact that the illuminator support mechanism supported by the light-radiation exit port is configured as follows. A light irradiation device comprising: a light bulb; and a concentrating mirror having a reflecting surface that reflects a light from the bulb; and a concentrating mirror supporting mechanism that supports the concentrating mirror upward, and a cooling bulb and The cooling air intake port for the condensing mirror is taken in, and the cooling air exhaust port for cooling the -9 - 201133157 cooling air after cooling the bulb and the concentrating mirror, wherein the collecting mirror support mechanism is provided a plurality of support bodies having a support rod that lifts the light collecting mirror from the back side to the curved surface of the collecting mirror toward the normal direction of the stomach $elastomer, and the frame that surrounds the support body and the light of the collecting mirror The collecting mirror is pressed by the periphery of the exit. The periphery of the light exit opening of the collecting mirror is pressed between the opening of the illuminating mirror plate and the vent hole formed around the opening. [Effect of the Invention] According to the present invention, the following effects can be obtained. Since the lifting of the collecting mirror is performed by the support arranged in a plurality of dots, the cooling air flowing outside the collecting mirror is not shielded from the wind, and the cooling air flows to the vicinity of the through hole of the collecting mirror. Therefore, the temperature of the field in which the temperature of the collecting mirror becomes the highest in the through hole can be lowered. Further, since the vent hole is formed around the portion of the illuminator push plate that causes the periphery of the light exit opening of the concentrating mirror to be pressed, the cooling wind flowing outside the concentrating mirror is along the concentrating mirror. The back side flows, and the overall efficiency of the concentrator is cooled and vented. Therefore, the temperature of the entire concentrating mirror can be lowered. [Embodiment] In the first embodiment, an example of the structure of the light irradiation device of the present invention used as the light irradiation portion of the exposure device is shown. The light irradiation device of the present invention is basically the same as the configuration of Fig. 6 except that the light source of the bulb 1 and the condensing mirror 2 has a structure of the source portion 1 〇. The bulb 1 'is an ultra-high pressure mercury bulb using a short arc type, and the collecting mirror 2 is an elliptical concentrating mirror made of glass. Further, the center of illumination of the discharge bulb 1 is disposed at a position of the first focus of the collecting mirror 2. The light collecting mirror 2' is an inorganic multilayer vaporized film that reflects the light that needs to be exposed, that is, ultraviolet light and removes unnecessary infrared rays and visible light, and allows infrared rays to be reflected and transmitted through the visible light. The surface of the reflective surface. The ultraviolet ray-containing light reflected by the light reflecting surface is emitted from the light exiting opening 2b. The light emitted from the light exiting opening 2 b of the collecting mirror 2 is reflected by the first plane mirror 13 and incident on the integrator lens I 4 which uniformizes the illuminance distribution in the irradiation region. The light emitted from the integrator lens 14 is transmitted through the shutter mechanism 15 disposed on the light emitting side of the integrator lens 14, and is reflected toward the second plane mirror 16 and incident on the collimator lens 17. The light incident on the collimator lens 17 is parallel light, and illuminates the irradiated object placed on the mask of the light-irradiating surface 18 and the workpiece. Further, a collimator lens may be used instead of the collimator lens 17. The amount of ultraviolet irradiation of the object to be irradiated is controlled by opening and closing of the shutter mechanism 15. Further, the shutter mechanism 15 may be disposed on the light incident side of the integrator lens 14. The cooling air for cooling the bulb 1 and the collecting mirror 2 is taken in from the cooling air intake port 1 〇a of the light irradiation device provided on the opposite side of the light exiting opening 2b of the collecting mirror 2, and is set in the set. The exhaust fan 20 on the light exit port 2b side of the light mirror 2 is exhausted from the exhaust port 19. -11 - 201133157 In Fig. 2, an enlarged view of a light source unit including a bulb and a collecting mirror of the light irradiation device of the present invention is shown. In the same figure, as in Fig. 7, only the left side of the flow pattern of the cooling air is shown. Further, in Fig. 3, a perspective view showing the relationship between the concentrating mirror of the light source unit of the present invention, the support of the concentrating mirror, and the concentrator platen is shown. The structure of the light source unit and the flow of the cooling air will be described using Figs. 2 and 3 . Similarly to the conventional light, the collecting mirror 2 is a light reflecting surface having a curved surface, and is formed with a light exiting opening 2b for emitting reflected light and a through hole 2a located on the opposite side of the light emitting opening 2b. Further, the light exiting opening 2b is supported upward by the collecting mirror supporting mechanism. The details of the concentrating mirror support mechanism will be described later. As described above, in the light reflecting surface of the collecting mirror 2, an inorganic multilayer film which reflects ultraviolet rays and transmits infrared rays and visible light is evaporated. a short-arc type bulb 1 mounted in the collecting mirror 2, the shaft la of the bulb 1 is a through hole 2a penetrating the collecting mirror, and a cooling airflow inlet 6a formed in the frame 6, and is fixedly supported and provided The pedestal 4 behind the outside of the collecting mirror 2. This pedestal 4 is a bulb shaft adjustment mechanism 5 attached to a light irradiation device, and the bulb axis adjustment mechanism 5 is provided with a platform for moving the bulb 1 in the XYZ direction. The pedestal 4 is connected to the bulb lighting power source 1 1 , and the power supply line 1 1 a from the bulb power source 1 1 is mounted on the pole 1 of the bulb 2 on the side of the opening 2 b of the concentrating mirror 2, and the electric power toward the bulb 1 is mounted. The supply is performed through the pedestal 4 and the power supply line 1 1 a. Next, the configuration of the concentrating mirror support mechanism will be described. The illuminator support mechanism includes: a plurality of support bodies 30 -12-201133157 that are lifted upward by a force of an elastic body that is in contact with the back surface of the concentrating mirror 2, and a support body is mounted thereon The frame 6 of 3 turns, and the collecting mirror plate 7 which is pressed by the collecting mirror 2 which is lifted by the supporting body 30. The collecting mirror 2 is placed on the illuminating mirror support 30 with the light exiting opening 2b facing upward. The collecting mirror support 30 presses the peripheral edge of the light exiting opening 2b of the collecting mirror 2 against the collecting mirror platen 7 by raising the illuminator 2 carried thereon by the force of the elastic body. Thereby, the collecting mirror 2 is supported and fixed in a state where the light exiting opening 2b is directed upward. The detailed configuration of the concentrating mirror support 30 will be described later. The illuminator support 30 is fixedly disposed on a plurality of frames 6. Further, a cooling air inlet 6a for introducing the cooling air taken in from the cooling air intake port 1A of the light-emitting device toward the light source unit 10 is formed in the frame 6. In the collecting mirror plate 7, an opening 7b through which light emitted from the light exiting opening 2b of the collecting mirror 2 passes is formed, and further, a periphery of the opening 7b is formed to flow to the outside of the collecting mirror 2 The cooling air passes through the vent 7a. The peripheral edge of the light exiting opening 2b of the collecting mirror 2 lifted by the collecting mirror support 30 is pressed between the opening 7b and the vent hole 7a. Next, the configuration of the collecting mirror support 30 will be described. 4 is a cross-sectional view of the collecting mirror support 30. FIG. 4(a) shows a state in which the collecting mirror 30 is not supported by the collecting mirror 2, and (b) shows the supporting of the collecting mirror 2. status. Further, Fig. 5 is a perspective view showing the illuminator support. The illuminator support body 30 is provided in such a manner that the frame portion 6 is fixed to the main body portion 31 by bolts or the like, and is in contact with the back surface of the illuminating mirror 2 (the opposite side of the reflecting surface 13-201133157). The support rod 32 is raised. The support rod 32 is attached to the main body portion 31 through an elastic body such as a spring 33 provided inside the main body portion 31. The support rod 32 is detachable from the body portion 31 by the spring 33. The tip end of the support rod 32 is in contact with the back surface of the collecting mirror 2. Therefore, the heat-resistant cushioning material 34 is attached to the tip end of the support rod 32 so as not to damage the collecting mirror 2 and to withstand high temperatures. When the illuminator support 30 does not support the concentrating mirror 2, as shown in Fig. 4(a), the spring 33 is extended to cause the support rod 32 to largely protrude from the body. On the other hand, when the illuminator support 30 supports the concentrating mirror 2, as shown in FIG. 4(b), the spring 33 is shortened by the weight of the concentrating mirror 2, and will be in the support rod 32. The force that the collector 2 pushes up will work. Thereby, the peripheral edge of the light exiting opening 2b of the collecting mirror 2 is pressed against the collecting mirror plate 7, and the collecting mirror 2 is supported and fixed. Here, the support bar 32 of the illuminator support 30 is for preventing excessive force from being applied to the concentrating mirror 2 made of glass, and is basically arranged to apply a force to the normal direction of the curved surface of the concentrating mirror. . The position where the collecting mirror support 30 supports the collecting mirror 2, that is, the position at which the support bar 32 is in contact with the back surface of the collecting mirror 2 is a distance from the lower end of the collecting mirror 2 (the periphery of the through hole 2a) to the upper side by a distance of 40 mm. ~50mm. As described above, the portion where the temperature of the collecting mirror 2 is the highest is the width from the periphery of the through hole 2a: a degree of about 10 mm. When the supporting rod 32 contacts the field, the portion is not easily contacted with the cooling air, so that it is difficult. It is cooled. In order to securely support and fix the concentrating mirror 2, the force that the concentrating mirror 2 is pressed toward the concentrating light-collecting plate 7 is that the force for lifting the collecting mirror 2 is better. The support rod 32 of the illuminator support 30 is a lifting force for the concentrating mirror 2 when the surface of the illuminating mirror 2 is applied with a force in the normal direction. The support rod 3 2 is disposed in the concentrating mirror. It is preferable that the lower side of 2 is as close as possible to the through hole 2 a portion. However, as described above, the lower side of the concentrating mirror (close to the through hole 2a) ′ is the portion that needs to be cooled at the highest temperature, so that the support rod 3 2 cannot be disposed. Here, the wiping stick 3 2 ′ is disposed in a field near the through hole 2 a where the temperature of the collecting mirror is the highest, and when the surface of the collecting mirror 2 is applied with a force in the normal direction, The portion of the light collecting mirror 2 that lifts as much as possible. Further, the number "the number of the collecting mirror supports 3" is determined in consideration of the size and weight of the collecting mirror 2 and the stability of the collecting mirror in the supporting state. It is preferable to arrange three to four equally spaced peripheral portions of the cooling airflow inlet 6a of the frame 6. Next, the flow of the cooling air in the light source section will be described. The cooling air taken in from the cooling air intake port 10a of the light irradiation device, which is provided on the opposite side of the light exiting opening 2b of the collecting mirror 2, enters the light source unit 1 from the cooling airflow inlet 6a formed in the frame 6. 'Divided into: a flow (a) for cooling the bulb 1 from the inside of the collecting mirror 2 from the through hole 2 a of the collecting mirror 2, and cooling from the back side collecting mirror 2 around the outside of the collecting mirror 2 Flow (b) The concentrating mirror support portion 30 is supported by the collecting mirror 2 in a dot shape as described above. Therefore, the illuminating mirror supporting body 30' does not substantially impede the flow of cooling air flowing outside the concentrating light -15-201133157 along the back surface of the collecting mirror 2. In other words, as shown in FIG. 2(b), the cooling air flowing outside the collecting mirror 2 is in close contact with the through hole 2a@% of the collecting mirror 2 having the highest temperature of the light emitting portion close to the bulb. Thereafter, the heat of the entire collecting mirror 2 is taken up along the back surface of the collecting mirror 2. On the other hand, the peripheral edge of the light exiting opening 2b of the collecting mirror 2 is a portion which is pressed between the opening 7b through which the light of the collecting mirror platen 7 passes and the vent hole 7a formed in the periphery thereof. Therefore, the cooling air flowing along the outer side of the collecting mirror 2 flows toward the vent hole 7a and does not flow away from the back surface of the collecting mirror 2 to the vent hole 7a. Further, the cooling air which flows out from the vent hole 7a and cools the collecting mirror 2 flows toward the exhaust port 119 together with the cooling air which cools the bulb 1, and is exhausted. Thereby, the cooling air flowing outside the collecting mirror 2 can efficiently cool the entire collecting mirror 2 as a whole. Therefore, the temperature in the vicinity of the through hole 2a of the collecting mirror is conventionally about 320 ° C to about 350 ° C, but in the present invention, it can be lowered to about 180 ° C to about 240 ° C without changing the amount of cooling air. . Thereby, the temperature of the collecting mirror can be lowered without excessively cooling the bulb. [Brief Description of the Drawings] [Fig. 1] A diagram showing an example of a structure of a light irradiation device of the present invention used as a light irradiation unit of an exposure apparatus. Fig. 2 is an enlarged view showing a light source unit including a bulb and a collecting mirror of the light irradiation device of the present invention. [Fig. 3] A perspective view showing the relationship between the light collecting mirror and the concentrating mirror of the light source unit of the present invention -16-201133157 and the collecting plate. [Fig. 4] A cross-sectional view showing the illuminator support. [Fig. 5] A perspective view showing the holding body of the collecting mirror. [Fig. 6] A view showing an example of a structure of a conventional light irradiation device used as a light irradiation unit of an exposure apparatus. Fig. 7 is an enlarged view showing a light source unit of a bulb and a collecting mirror having a conventional light irradiation device. Fig. 8 is a perspective view showing a relationship between a collecting mirror of a conventional light source unit and a supporting plate of a collecting mirror. [Description of main component symbols] 1 : Lamp 1 a : Shaft 2 of the bulb: concentrator 2 a : Through hole 2 b : Light exit 3 : concentrator support plate 4 : pedestal 5 : bulb shaft adjustment mechanism 6 : frame 6a: Cooling airflow inlet 7: concentrating mirror pusher 7a: venting hole 7b: opening -17- 201133157 1 〇: light source part 10a: cooling air intake inlet 1 1 : bulb lighting power supply 1 1 a : power supply line 1 2 : Frame 1 3 : first plane mirror 14 : integrator lens 1 5 : shutter mechanism 1 6 : second plane mirror 1 7 : collimator lens 1 8 : light irradiation surface 1 9 : exhaust port 2 0 : exhaust fan 3 0: concentrating mirror support 3 1 : body portion 3 2 : support rod 3 3 : spring 3 4 : cushioning material

Claims (1)

201133157 七、申請專利範圍: 1 一種光照射裝置,具備:燈泡、及具有將來自該 燈泡的光反射的曲面的反射面並且形成有使由上述反射面 反射的光被射出的光射出口及位於該光射出口相反側的貫 通孔的集光鏡 '及使上述光射出口朝上方地支撐該集光鏡 的集光鏡支撐機構、及將冷卻上述燈泡及上述集光鏡的冷 卻風從上述集光鏡的光射出口相反側取入的冷卻風取入口 、及將從該冷卻風取入口取入的冷卻風從上述集光鏡的光 射出口側排氣的冷卻風排氣口,其特徵爲: 上述集光鏡支撐機構,具備:設有將上述集光鏡從背 面側對於集光鏡的曲面朝法線方向藉由彈性體擧升的支撐 棒的複數個支撐體、及安裝有該支撐體並且形成有將從上 述冷卻風取入口取入的冷卻風取入的冷卻風流入口的框架 、及在從上述集光鏡的光射出***出的光所通過的開口及 該開口的周邊形成有供冷卻風通過的通風孔且在上述開口 及上述通風孔之間使藉由上述支撐體的支撐棒被擧升的集 光鏡的光射出口的周緣被壓住的集光鏡推板。 -19·201133157 VII. Patent application scope: 1 A light irradiation device comprising: a light bulb; and a reflection surface having a curved surface that reflects light from the light bulb; and a light exit port and a light exiting the light reflected by the reflection surface are formed a collecting mirror of the through hole on the opposite side of the light exiting port, a collecting mirror supporting mechanism for supporting the light collecting mirror with the light emitting opening upward, and a cooling wind for cooling the bulb and the collecting mirror from the above a cooling air intake port taken in from the opposite side of the light exit port of the collecting mirror, and a cooling air exhaust port that exhausts the cooling air taken in from the cooling air intake port from the light exit side of the collecting mirror, The illuminator support mechanism includes: a plurality of support bodies provided with support rods for lifting the curved surface of the concentrating mirror from the back side toward the normal direction by the elastic body, and mounting a support body having a frame through which a cooling air flow inlet taken in from the cooling air intake inlet is taken in, and an opening through which light emitted from the light exit port of the collecting mirror passes A vent hole through which a cooling air passes is formed in the periphery of the port, and a light collecting port of the light-emitting port of the collecting mirror lifted by the support rod of the support body is pressed between the opening and the vent hole Mirror push plate. -19·
TW100101100A 2010-03-26 2011-01-12 Light irradiation device TW201133157A (en)

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JP6197641B2 (en) * 2013-12-26 2017-09-20 ウシオ電機株式会社 Vacuum ultraviolet irradiation treatment equipment
CN104879707B (en) * 2015-06-10 2017-04-05 苏州睿绮电子有限公司 A kind of rotation radiating artistic lamp
CN105487352B (en) * 2016-02-16 2017-06-27 武汉华星光电技术有限公司 The replacing options of exposure machine and Exposing Lamp
CN107588334A (en) * 2017-10-25 2018-01-16 徐州赛欧电子科技有限公司 A kind of adjustable LED of airflow radiating type
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