TW201130009A - Enhanced integrity projection lens assembly - Google Patents
Enhanced integrity projection lens assemblyInfo
- Publication number
- TW201130009A TW201130009A TW99134564A TW99134564A TW201130009A TW 201130009 A TW201130009 A TW 201130009A TW 99134564 A TW99134564 A TW 99134564A TW 99134564 A TW99134564 A TW 99134564A TW 201130009 A TW201130009 A TW 201130009A
- Authority
- TW
- Taiwan
- Prior art keywords
- projection lens
- lens assembly
- enhanced integrity
- present
- integrity projection
- Prior art date
Links
Landscapes
- Electron Beam Exposure (AREA)
Abstract
The present invention relates to a projection lens assembly module for directing a multitude of charged particle beamlets onto an image plane located in a downstream direction, and a method for assembling such a projection lens assembly. In particular the present invention discloses a modular projection lens assembly with enhanced structural integrity and/or increased placement precision of its most downstream electrode.
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US25033609P | 2009-10-09 | 2009-10-09 | |
NL2003619A NL2003619C2 (en) | 2009-10-09 | 2009-10-09 | Projection lens assembly. |
Publications (2)
Publication Number | Publication Date |
---|---|
TW201130009A true TW201130009A (en) | 2011-09-01 |
TWI492261B TWI492261B (en) | 2015-07-11 |
Family
ID=50180092
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
TW099134564A TWI492261B (en) | 2009-10-09 | 2010-10-11 | Enhanced integrity projection lens assembly |
Country Status (1)
Country | Link |
---|---|
TW (1) | TWI492261B (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
TWI798715B (en) * | 2020-06-10 | 2023-04-11 | 荷蘭商Asml荷蘭公司 | Module for supporting a device configured to manipulate charged particle paths in a charged particle apparatus and method of aligning an electron-optical device with charged particle beam, or multi-beam, within a charged particle apparatus |
Family Cites Families (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP3827359B2 (en) * | 1996-03-19 | 2006-09-27 | 富士通株式会社 | Charged particle beam exposure method and apparatus |
JP4947841B2 (en) * | 2000-03-31 | 2012-06-06 | キヤノン株式会社 | Charged particle beam exposure system |
EP1383158B1 (en) * | 2002-07-16 | 2014-09-10 | Canon Kabushiki Kaisha | Charged-particle beam lens |
EP1779403A4 (en) * | 2004-07-05 | 2009-05-06 | Cebt Co Ltd | Method for controlling electron beam in multi-microcolumn and multi-microcolumn using the same |
JP2007266525A (en) * | 2006-03-30 | 2007-10-11 | Canon Inc | Charged particle beam lens array, charged particle beam exposure device employing the charged particle beam lens array |
EP2250660A1 (en) * | 2008-02-26 | 2010-11-17 | Mapper Lithography IP B.V. | Projection lens arrangement |
-
2010
- 2010-10-11 TW TW099134564A patent/TWI492261B/en active
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
TWI798715B (en) * | 2020-06-10 | 2023-04-11 | 荷蘭商Asml荷蘭公司 | Module for supporting a device configured to manipulate charged particle paths in a charged particle apparatus and method of aligning an electron-optical device with charged particle beam, or multi-beam, within a charged particle apparatus |
US11961698B2 (en) | 2020-06-10 | 2024-04-16 | Asml Netherlands B.V. | Replaceable module for a charged particle apparatus |
Also Published As
Publication number | Publication date |
---|---|
TWI492261B (en) | 2015-07-11 |
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