TW201030234A - Vacuum pumping device, vacuum processing device, and vacuum processing method - Google Patents
Vacuum pumping device, vacuum processing device, and vacuum processing method Download PDFInfo
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- TW201030234A TW201030234A TW098138638A TW98138638A TW201030234A TW 201030234 A TW201030234 A TW 201030234A TW 098138638 A TW098138638 A TW 098138638A TW 98138638 A TW98138638 A TW 98138638A TW 201030234 A TW201030234 A TW 201030234A
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- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F04—POSITIVE - DISPLACEMENT MACHINES FOR LIQUIDS; PUMPS FOR LIQUIDS OR ELASTIC FLUIDS
- F04B—POSITIVE-DISPLACEMENT MACHINES FOR LIQUIDS; PUMPS
- F04B37/00—Pumps having pertinent characteristics not provided for in, or of interest apart from, groups F04B25/00 - F04B35/00
- F04B37/10—Pumps having pertinent characteristics not provided for in, or of interest apart from, groups F04B25/00 - F04B35/00 for special use
- F04B37/14—Pumps having pertinent characteristics not provided for in, or of interest apart from, groups F04B25/00 - F04B35/00 for special use to obtain high vacuum
- F04B37/16—Means for nullifying unswept space
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- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F04—POSITIVE - DISPLACEMENT MACHINES FOR LIQUIDS; PUMPS FOR LIQUIDS OR ELASTIC FLUIDS
- F04B—POSITIVE-DISPLACEMENT MACHINES FOR LIQUIDS; PUMPS
- F04B37/00—Pumps having pertinent characteristics not provided for in, or of interest apart from, groups F04B25/00 - F04B35/00
- F04B37/06—Pumps having pertinent characteristics not provided for in, or of interest apart from, groups F04B25/00 - F04B35/00 for evacuating by thermal means
- F04B37/08—Pumps having pertinent characteristics not provided for in, or of interest apart from, groups F04B25/00 - F04B35/00 for evacuating by thermal means by condensing or freezing, e.g. cryogenic pumps
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- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F04—POSITIVE - DISPLACEMENT MACHINES FOR LIQUIDS; PUMPS FOR LIQUIDS OR ELASTIC FLUIDS
- F04B—POSITIVE-DISPLACEMENT MACHINES FOR LIQUIDS; PUMPS
- F04B37/00—Pumps having pertinent characteristics not provided for in, or of interest apart from, groups F04B25/00 - F04B35/00
- F04B37/10—Pumps having pertinent characteristics not provided for in, or of interest apart from, groups F04B25/00 - F04B35/00 for special use
- F04B37/18—Pumps having pertinent characteristics not provided for in, or of interest apart from, groups F04B25/00 - F04B35/00 for special use for specific elastic fluids
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- Engineering & Computer Science (AREA)
- Mechanical Engineering (AREA)
- General Engineering & Computer Science (AREA)
- Treating Waste Gases (AREA)
- Compressors, Vaccum Pumps And Other Relevant Systems (AREA)
- Drying Of Semiconductors (AREA)
- Oxygen, Ozone, And Oxides In General (AREA)
Abstract
Description
201030234 六、發明說明： 【發明所屬之技術領域】 本發明係有關使用冷凍泵的真空排氣裝置、真空處理 裝置及真空處理方法。 【先前技術】 冷束泵是尚真空排氣泵的一種，被使用在以膜形成、 表面改質、圖案描繪、分析及蒸發乾燥等為目的之真空處 理装置。冷凍泵有利於水分子的排氣，原理上可容易獲得 清淨的真空環境。亦即，冷凍泵係捕集式泵，其透過低溫 =結和低溫吸附之原理，將真空處理裝置内所放出的氣 體、或被導入真空處理裝置内之處理氣體累積在泵殼内部 而排放氣體。因此’有必要定期地進行將累積的氣體再氣 化並排出之操作(再生）（參考專利文獻1、2)。 近年來，在光學裝置之製造領域中，隨著導入氧(〇2) 作為處理氣體的真空處理變得普遍，在真空槽的内部，由 活性化的氧分子經過化學性反應過程而產生臭氧(〇3)的事 例逐漸增加。當在此種真空處理使用冷凍泵時，臭氧亦與 ，^空處理的其他氣體同樣，在冷凍泵的内部被累積成 臭氧之混合凝結固體。氧/臭氧之混合凝結固體係在前述 2束泵之操作過程巾相變滅含臭氧舰態氧，接著再氣 ^蒸+發。此液態氧中，由於比臭氧沸點還低的氧會先行 乳化:蒸發，故此液態氧中之溶存臭氧成為濃縮液態臭氧。 八/辰鈿液態臭氧係不穩定而依物理、化學性刺激快速地 =解成氧，但此分解反應係伴隨著發熱所引起之火花和爆 衝擊而具有破壞性。再加上，若操作時在冷凍泵内部是 3/32 201030234 充滿可燃性氛圍氣體的狀態下發生臭氧的分解反應，則會 有反應熱所產生的火花在氛圍氣體中著火而導致冷; 東果燒 損之事故。201030234 VI. Description of the Invention: [Technical Field of the Invention] The present invention relates to a vacuum exhausting device, a vacuum processing device, and a vacuum processing method using a refrigerating pump. [Prior Art] The cold beam pump is a type of vacuum exhaust pump that is used in vacuum processing apparatuses for film formation, surface modification, patterning, analysis, and evaporative drying. The refrigerating pump facilitates the venting of water molecules and in principle provides a clean vacuum environment. That is, the refrigerating pump is a trapping pump that accumulates the gas discharged from the vacuum processing device or the processing gas introduced into the vacuum processing device into the interior of the pump casing through the principle of low temperature = junction and low temperature adsorption. . Therefore, it is necessary to periodically perform the operation (regeneration) of re-gasifying and discharging the accumulated gas (refer to Patent Documents 1 and 2). In recent years, in the field of manufacturing optical devices, vacuum processing has become common as oxygen (〇2) is introduced as a processing gas, and inside the vacuum chamber, activated oxygen molecules are subjected to a chemical reaction process to generate ozone ( The case of 〇3) is gradually increasing. When a refrigerating pump is used in such a vacuum process, ozone is also accumulated as a mixed solid of ozone in the interior of the refrigerating pump, similarly to other gases which are treated in the air. The oxygen/ozone mixed condensed solid is in the operation of the aforementioned two-beam pump, and the ozone phase is extinguished, and then steamed and sent. In this liquid oxygen, since oxygen lower than the boiling point of ozone is first emulsified: evaporated, the dissolved ozone in the liquid oxygen becomes concentrated liquid ozone. The liquid ozone of Ba/Chen is unstable and relies on physical and chemical stimuli to rapidly resolve to oxygen. However, this decomposition reaction is destructive with the spark and explosion shock caused by heat. In addition, if the decomposition reaction of ozone occurs in the state where the inside of the refrigeration pump is 3/32 201030234 filled with a flammable atmosphere, the spark generated by the reaction heat will ignite in the atmosphere and cause cold; Burning accident.
累積在冷凍泵之臭氧發火所造成的影響，係臭氧的量 越大就越嚴重。於是，有透過頻繁地操作冷滚果以防止臭 氧蓄積量增加之方法。但是，於操作時真空裝置無法連續 排氣，因而不得不頻繁地停止真空處理。又，因為沒有能 直接且定量地監視真空處理環境中之臭氧生成量之觀測手 法，所以要預測迄至臭氧被累積既定量為止之裝置運用時 間(利用冷凍泵之連續排氣時間）乃極為困難。 另一方面，目 氧無害化的技術。 則存在各種在真空下透過觸媒作用使臭 '例如，在專散獻3 _—齡聽之錢的無害化 方法及其裝置’係把具有臭氧分解觸媒作㈣金化 成形體設置於廢氣㈣出配管，分解廢氣中所含之 之無害化並朝大氣壓環境排出。 六乳仗The effect of ozone igniting accumulated in the refrigerating pump is greater as the amount of ozone is increased. Therefore, there is a method of preventing the increase in the amount of ozone accumulation by frequently operating the cold rolling fruit. However, the vacuum apparatus cannot be continuously exhausted during operation, and thus the vacuum processing has to be stopped frequently. Moreover, since there is no observation method capable of directly and quantitatively monitoring the amount of ozone generated in the vacuum processing environment, it is extremely difficult to predict the operation time of the device (using the continuous exhaust time of the refrigerating pump) until the ozone is accumulated. . On the other hand, the technology of harmless oxygenation. There is a variety of ways to make the odor of the odor by the action of the catalyst under vacuum, for example, the device and the device for dissipating the money to be used for the purpose of providing the ozone decomposing catalyst (4). The piping is discharged to decompose the detoxification contained in the exhaust gas and discharge it to the atmospheric pressure environment. Six milk thistle
…〜啊裡旲軋题理裝置，係在^ ^解裝置的上游側設置加熱機構，用以將光阻劑等 =凝結的《成分熱分解。此純處理裝置係藉由防』 =氣體成分在臭氧分_置+之觸絲面赌 分解裝置缝氣巾之缝分解的性㈣崎低。心 氧氣其輪 燥狀態的分霧器及冷牌。 潑六氣成^ 【先行技術文獻】 【專利文獻】 4/32 201030234 曰本特開平1Μ66477號公報(段落 【專利文獻1 [0006] ’第三圖） [圓]【)專利文獻2】日本特開平6-154505號公報(段落 3520325 ^^^^[〇〇〇9]) 【專利5·號公報__】） _3]) 】日本特開2〇04·167352號公報(段落 因此在獻二、的裝置是利用觸媒分峨^ 、、译。访山\ 觸媒有可能會在真空中成為放也氣體 〇、 出氣體源係成為污染真空的原g，4 + s ±、 高真空處軸科合彻臭^。在^康泵的 層之ί游獻5所記载的構成中，設置在臭氧分解 捕集成固㈣^除去用冷牌，不僅將水分亦將臭氧氣體 或紐。因此，在操作該冷㈣，若溶存於水 Ο 为^臭氧之濃縮度高，則有濃縮液態臭氧產生分解反應 而者火之虞，具有和上述同樣的問題。 w 又’專利文獻5所記載之構成’乃是以設置在臭氧分 解槽上游的流量調整_縮大氣壓的廢臭氧流，而在 分解槽内部做出依據其差壓的真空壓力之方式，故不適合 作為需要冷;東泵那種高真空處理之真空排氣裝置。再者I 專利文獻5所記載之構成’乃是利用設置在臭氧分解 游的體積移送式真空泵將廢臭氧流由真空壓力朝大氣^連 續排出的方式’並非解決屬觸式真空泵的冷妓中之 述問題者。 5/32 201030234 【發明内容】 、有蓉於以上的情事’纟發明之目的在於提供一種可 制冷凌泵中臭氧之累積的真空排氣装置、真空處理 真空排氣方法。 、久 本發明之-形態的真空排氣裝置，係用以對真空處理 用的處理室進行排氣，具備有栗單元及加熱單元。 片上述科元具有：可觸廢氣的糾、制以將前述 f氣由前述處理室朝前述冷㈣引的排氣通路。上述加敎 ^係於前述排氣通路，將由前述處理室朝向前述冷胖: 則述廢氣中所含之臭氧熱分解。 本發明之-形態的毅處理裝置具備有··真空處理用 的處理室'泵單元及加熱單元。 ，土述，單元具有冷_及排氣通路，該冷㈣以捕集廢 雜氣通路用以將前述廢氣由前述處理室朝前述冷牌 引"上述加熱單元係把由前述處理室朝向前述冷啡之前 述廢氣中所含之臭氧熱分解。 ❹ 鱼、翁ίΓ月之—形態的真空排氣方法，係有關以冷涞泵將 f氧所存在的處理室進行排氣的真空排氣方法。以上述真 言’係包含在排氣途中使廢氣中之臭氧與發 冷牌被凝結。订熱分解者。接著，上述廢氣係在冷綠的 係用以對真空 具備有：泵單 本叙明之—實施形態的真空排氣裝置 處理用的處理室進行排氣的真空排氣裝置 元及加熱單元。 .....•仰木概乳叼尽丨开、及用以將上述 廢乳由㈣處理室朝上述冷料引的排氣通路。上述加熱 上述泵單元具有：可捕集廢氣的冷阱 1 1^3 Hll tih TOT -¾.. * _ . 6/32 201030234 =係:上述排氣通路將由上述處理室朝向 述廢氣中所含之臭氧熱分解。 上 上述真空排氣裝置，係建構成在廢氣到達冷 以，皁元將廢氣所含之臭氧作熱分解。藉此 之臭氧的濃度降低而能抑制冷財之臭氧的凝結β風 參 之J此藉Γ上述真空排氣裝置’可抑制冷中臭氧 =二:操作時隨壤縮液態臭氧： 上:====之冷峨損。 形成上述排氣通路的配管:又:上述加成： 有配置在上述配管内部的發熱面之構成"了，構成具 的極 的冷:熱單元之發熱面係配置在與栗單元 低温咖轉在既定 交又之方向 取二:::在舆上述排氣通路的㈣ 藉此係、可在無損及排氣效 之與上述處理室側 氣之接觸機率㈣致率地熱分解聽Γ ^發熱面與廢 上述加熱單元亦可具有 二：熱面亦可配置在上述支撐： 藉此 冷胖的溫度來自發熱面的純射喊成栗單元之 上述支禮 朝泵單元之冷_2含遮熱層。藉此’能遮斷從發熱面 溫域。 ，、、、輻射，可將冷阱維持在所期望的極低 7/32 201030234 上述加熱單元亦可更具有旋動機構部，用以使上 撐體在與上述配管軸向交又的方向之周圍旋動。 藉此，可將發熱體設置在廢氣中的臭氧與發熱面之 觸機率提高的角度位置上。x，亦可調整通過排氣通 廢氣之排氣速度。 -方面’上述發熱面亦可順著上述排氣通路的轴向取 間隔而配置複數個。...~ 啊 旲 题 题 题 题 , 旲 旲 旲 旲 旲 旲 题 题 题 题 题 题 题 题 题 题 题 题 题 设置 设置 设置 设置 设置 设置 设置 设置 设置 设置 设置This pure processing device is decomposed by the anti-"= gas component in the ozone splitting-distributing device" (4). Heart Oxygen in its whirlwinder and cold card. [6] [Patent Literature] 4/32 201030234 曰本特开平1Μ66477号(Paragraph [Patent Document 1 [0006] 'Third Chart) [Circle] [) Patent Document 2] Kaiping 6-154505 (paragraph 3520325 ^^^^[〇〇〇9]) [patent 5· __] _3]) 】 Japanese Special Report 2〇04·167352 (the paragraph is therefore in the second The device uses the catalyst to separate and translate. The visitor\catalyst may become a gas in the vacuum, and the gas source becomes the original g of the pollution vacuum, 4 + s ±, high vacuum In the structure described in the 5th section of the 康Kun pump, it is installed in the ozone decomposing and trapping integrated solid (4), and the cold card is removed, not only the ozone but also the ozone gas. In the case of the operation of the cold (4), if it is dissolved in the water, the concentration of the ozone is high, and the concentrated liquid ozone is decomposed and the fire is destroyed, and the same problem as described above is obtained. The composition is based on the flow rate of the upstream of the ozone decomposing tank, which is adjusted to reduce the atmospheric pressure. The inside of the tank is made by the vacuum pressure of the differential pressure, so it is not suitable as a vacuum evacuation device that requires high-vacuum treatment, such as the East Pump. Further, the composition described in Patent Document 5 is used in the ozone. The method of splitting the volume transfer vacuum pump to continuously discharge the waste ozone flow from the vacuum pressure to the atmosphere is not a solution to the problem described in the cold heading of the touch vacuum pump. 5/32 201030234 [Summary of the Invention] The purpose of the invention is to provide a vacuum exhaust device for vacuum accumulation in a refrigerated pump, and a vacuum evacuation method for vacuum processing. The vacuum exhaust device of the present invention is used for vacuum processing. The processing chamber is exhausted, and includes a pump unit and a heating unit. The unit has an exhaust passage for guiding the exhaust gas from the processing chamber toward the cold (four). In the exhaust passage, the processing chamber is turned toward the above-mentioned cold fat: the ozone contained in the exhaust gas is thermally decomposed. a processing chamber for vacuum processing, a pump unit and a heating unit. The unit has a cold_and exhaust passage, and the cold (4) captures a waste gas passage for guiding the exhaust gas from the processing chamber toward the cold plate. "The above heating unit thermally decomposes the ozone contained in the aforementioned exhaust gas from the processing chamber toward the chilled broth. The method of vacuum evacuation of the squid, the squid, is related to the cold oxygen pump The vacuum evacuation method for exhausting the existing processing chamber is carried out. The above-mentioned mantra is included in the exhausting process so that the ozone in the exhaust gas and the chill card are condensed. The heat is decomposed. Then, the exhaust gas is in the cold green A vacuum exhausting device and a heating unit for exhausting a processing chamber for processing a vacuum exhaust device according to an embodiment of the present invention. .....• The top of the milk is used to open the exhaust passage from the (4) treatment chamber to the cold material. The above-mentioned heating pump unit has a cold trap capable of trapping exhaust gas 1 1^3 Hll tih TOT -3⁄4.. * _ . 6/32 201030234 = system: the exhaust passage will be directed from the processing chamber to the exhaust gas Ozone thermal decomposition. The above vacuum exhausting device is constructed such that the exhaust gas reaches a cold state, and the soap element thermally decomposes the ozone contained in the exhaust gas. By this, the concentration of ozone can be lowered to suppress the condensation of cold ozone. The above-mentioned vacuum exhaust device can suppress the ozone in the cold = two: the liquid crystal with the liquid shrinks during operation: upper:== == cold damage. The piping forming the exhaust passage: the addition: the configuration of the heat generating surface disposed inside the piping, and the formation of the pole of the cold: the heat generating surface of the heat unit is disposed in the low temperature coffee machine with the pump unit Take the second direction in the direction of the established intersection::: in the above-mentioned exhaust passage (4), the system can contact the side air of the treatment chamber in the non-destructive and exhaust effect (4) to cause thermal decomposition of the hearing surface. And the above-mentioned heating unit may also have two: the hot surface may also be disposed on the above support: thereby the cold fat temperature from the heat generating surface of the pure shot shouting into the pump unit, the above-mentioned support to the pump unit of the cold _2 containing the heat shield . This can be used to block the temperature range from the heating surface. ,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,, Rotate around. Thereby, the heating element can be placed at an angular position where the ozone in the exhaust gas and the heat generating surface are increased in probability. x, also adjusts the exhaust velocity through the exhaust gas. - Aspects The heat generating surface may be arranged in plural along the axial direction of the exhaust passage.
依此構成，亦可在無損及排氣效率之下，提高發熱面 與廢氣之接觸機率而有效率地熱分解臭氧。 再者，上述加熱單元亦可含有網目狀的發熱體。或者， 上述加熱單元亦可含有筒狀的發熱體。 在此等構成中，亦可在無損及排氣效率之下，提高發 熱面與廢氣之接觸機率而有效率地熱分解臭氧。 同x 上述配管能以連接於上述處理室側之第一管構件及連 接於上述泵室側之第二管構件來構成。在此情況，上述真 空排氣裝置亦可更具備閥室’其配置在上述第一管構件與According to this configuration, it is also possible to efficiently decompose ozone by increasing the contact probability of the heat generating surface with the exhaust gas under the nondestructive and exhausting efficiency. Furthermore, the heating unit may also include a mesh-shaped heating element. Alternatively, the heating unit may include a tubular heating element. In such a configuration, it is also possible to efficiently thermally decompose ozone by increasing the contact probability of the heat generating surface with the exhaust gas under the nondestructive and exhausting efficiency. The piping of the same type as x can be configured by a first pipe member connected to the processing chamber side and a second pipe member connected to the pump chamber side. In this case, the above-described vacuum exhausting device may further include a valve chamber, which is disposed in the first pipe member and
上述第二管構件之間。上述閥室係容置用以開閉上述排氣 通路的閥體。 透過以閥體調整排氣通路的開度，可控制朝向泵室之 廢氣流及排氣速度。又，利用上述構成，可變化廢氣中之 臭氧分子對發熱面的衝撞頻度。 例如，可將上述發熱面配置於上述第一營 部。此情況，發熱面係位在比上述閥體還靠處理室侧j因 此，透過廢氣中之臭氧分子與閥體衝揸以提高臭氧分子與 發熱面接觸之機會。藉此，可提升臭氧的分解效率。〃 上述發熱面可配置於上述閥室的内部，配置於上述第 8/32 201030234 -管構件的内部亦可。此情況亦可因應賴的開度而控制 依據與發熱面之接觸所致臭氧的分解效率。發熱面的位置 可依閥體的位置作適宜調整。 办其-人，本發明之一實施形態的真空處理裝置係具備： 真空處理用的處理室、泵單元及加熱單元。 上述泵單元係具有可捕集廢氣的冷阱、及用以將上述 ，氣由上域理室朝上述糾導引之職通路。上述加熱Between the above second tube members. The valve chamber houses a valve body for opening and closing the exhaust passage. By adjusting the opening of the exhaust passage with the valve body, the exhaust gas flow and the exhaust velocity toward the pump chamber can be controlled. Further, with the above configuration, the collision frequency of the ozone molecules in the exhaust gas with respect to the heat generating surface can be changed. For example, the heat generating surface may be disposed in the first camp. In this case, the heat generating surface is located closer to the processing chamber side than the valve body, so that the ozone molecules in the exhaust gas are flushed with the valve body to increase the chance of contact of the ozone molecules with the heat generating surface. Thereby, the decomposition efficiency of ozone can be improved. 〃 The heat generating surface may be disposed inside the valve chamber, and may be disposed inside the tube member 8/32 201030234. In this case, the decomposition efficiency of ozone due to contact with the heating surface can also be controlled depending on the opening degree. The position of the heating surface can be adjusted according to the position of the valve body. A vacuum processing apparatus according to an embodiment of the present invention includes: a processing chamber for vacuum processing, a pump unit, and a heating unit. The pump unit has a cold trap capable of trapping exhaust gas, and a passage for guiding the gas from the upper chamber to the above-mentioned correction. Above heating
單，係將由上述處理室朝向上述冷if之上述廢氣中所含之 臭氧熱分解。 依據上述真空處理襄置，可使廢氣中之臭氧濃度減低 ^抑制冷时之臭氧的凝結量。因此，可抑制冷_中臭 氧之累積，可防止在冷凍泵操作時隨濃縮液態臭氧之分解 反應而引起著火之危險及因此所造成之冷凍泵燒損。 …上述加熱單元可設置在上述排氣通路，設置在上述處 ，室亦可。又，上述加熱單元亦可分別設置在排氣通路和 處理室雙方。 "透過將加熱單元設置於排氣通路，可有效率地熱分解 從處理室排出之氣體中的臭氧。又，透過將加熱單元設置 於處理至，可將在處理室生成的臭氧於處理㈣進行熱分 ^ ° …、 其-人，本發明之一實施形態的真空排氣方法，係有關 和用冷束泵將臭氧所存在的處理室作排氣之真空排氣方 ，。上述真空排氣方法巾，包含在排氣途巾使廢氣中的臭 乳接觸發熱®以進行熱分解。魄，上述減被冷涞果的 冷阱所凝結。 上述真空排氣方法係在廢氣到達冷拼之前，利用加熱 9/32 201030234 因此，依據上述真空排氣方法，可抑 2積。藉此，可防止在冷妓操作時= 分解反_㈣著火之危險及因此所造成之冷躲=之 【實施方式】 以下，依據圖式來說明本發明的實施形熊。 (第一實施形態） 第-圖係概略顯示本發明之—實施形態的真空處理裝 置1之構成的側剖視圖。本實施形態的真空處理裝置1^ 備真空槽1G。真空槽1G包含：用以處理基板w的處理^ 二、用以將處理$ 11排氣的泵室12、及將處理室U和栗 室12之間作連接的配管13。真空槽1〇整體 鐘 鋼等之金屬材料所構成。 飞不鏽 本實施形態中，配管13係形成從處理室u朝泵室Η 導引廢氣的排氣通路13A。配管13係由第—管構件和 第二管構件132所構成。第一管構件131連接於處理室“， 第二管構件132連接於果室12。紐，在第—管構件⑶ 和第二管構件132之間構成配管13的一部分，因此設置了 亦屬真空槽10的一部分之閥室14。 處理室11具有支撐基板W之支撐台15。處理室u係 形成將支撐台15所支撐的基板w進行真空處理的真空 ，。在本實施形態中，作為真空處理，係例舉了使用處理 氣體中含有氧、臭氧的氣體之成膜處理(例如濺鍍法、蒸鍍 法）、或使用了此等氣體的電漿(第一圖中以標號p表示。） 10/32 201030234 之處理等。處理氣體經由氣體導入管18而被導入處理室11 内。此外，在真空槽10之外部或内部設置有未圖示的電漿 產生源(高頻線圈、磁控管、微波振盪器等）。 . 在真空處理的例子方面，除上述以外，亦可以是使用 電子束的曝光、分析、表面觀察等。以本實施形態而言， 可適用在處理室Π内生成臭氧的各種處理。 在泵室12的内部配置冷凍泵19的冷阱（極低溫 部)161。真空槽10内的氣體係在冷阱161吸附或被凝結。 ® 藉此，真空槽10内部係排氣而維持於既定的高真空。所捕 集的廢氣(處理氣體)係成為凝結固體被累積於冷凍泵19 内，於冷凍泵19操作時暫時液化後，最後氣化、蒸發。 冷凍泵19係由屬冷凍泵的殼、屬真空槽1〇的一部分 之泵至12、使被喪入設置於泵室I]的 GM(Giff〇rd-McMah〇n)冷凍機等之低溫產生的機械式冷凍 機162、屬機械式冷凍機162的一部分、屬低溫生成部位的 低溫部(cold head)163、以及在熱性方面是與低溫部。16.3保 • 持良好接觸地作設置並用以將廢氣凝結或吸附之冷阱161 所構成。 冷阱161係透過機械式冷凍機162而被保持成極低 溫。冷阱161可採用平面狀、線圈狀及其他的形狀。-閥室14内部收容有閥體17。閥體17係建構成可在開 放排氣通路13A的開位置與遮蔽排氣通路13A的閉位置之 間移動自如。閥體17係使通過排氣通路13A的氣體之氣導 (conductance)變化。此外，閥體π亦可如同閘閥或縱切閥 等具有可將處理室11和泵室12之間進行氣密隔絶的閥構 造。 11/32 201030234 真空處理裝置1更具備加熱單元20，用以對存在於真 ，槽10内的臭氧分子進行熱分解。本實施形態中顯示加熱 單元20被配置在排氣通路13A内的構成例。 加熱單元20係具有單數或複數個加熱器21和加熱用 電源(省略圖示）。在本實施形態中，加熱器21係在與排氣 通路13A的軸向交又的方向取間隔而配置複數個。加熱器 2】具有發熱面2〗1和支撐體212。發熱面2n可由電阻發 熱體、内建加熱源的金屬板等所構成。支撐體212係板狀 構件，在其與處理室1丨側對向的面支撐發熱面21丨。支撐 體212係經由軸部m而被安裝於第一管構件131。有關從 上述加熱用電源對發熱面211之電力供給，例如可將抽心 作為配線的一部分來使用，或在軸部m的内部裝入欖線亦 可。 發熱面211係被加熱至足以讓臭氧熱分解的溫度。從 處理室11排放之氣體的—部分係在聽通路13A和發熱面 211接觸。與發熱面211接觸的氣體中之臭氧分子係經過以 下第⑴式所示的熱分解反應而還元成無害的氧。 203-302 ...(1) _ 在臭氧濃度是-定的情況下，臭氧的熱分解反應為加 熱溫度越高所進行的時間越短。因此，發熱面211的溫度 越高’越能有效率地分解臭氧。又，透過提高發熱面2ιι 的加熱溫A ’可有效率地減低廢氣巾之臭氧濃度。發熱面 211的溫度可設為例如3〇〇。〇以上。 發熱面211的加熱温度可設定成適宜的值。依據熱活 性之刀子的刀解’係發熱體的溫度越高，與分解反應所要 的發熱體表面之近接時間越短就可完成，可提高臭氧分解 12/32 201030234 效率。若將鎢(W)或銖(Re)等之高熔點金屬作為發熱體使 用’則甚至可保持3_t：以上的溫度。但是，對發'熱體供 、給電流的導體，在工業上通常是使用銅(Cu)，其炫點，純銅 - 大概是〗080°c。又，以超過l〇〇(TC的溫度而言，由於來自 發熱體的輻射熱係每lCm2超過1〇w，所以就算是採用表面 積小的發熱體’亦有朝向冷;東果之輻射熱會成為問題的情 形。一方面，在發熱體是鋼的情況，可知在加熱成3⑻。^的 狀態能以數秒的等級將空氣中的臭氧濃度減半。依以上那 Ο 樣的理由’發熱面211之加熱溫度的上限可設為1000°c， 特別是在發熱面211是由銅所構成的情況，其加熱溫度的 下限可設為300。〇 加熱器21之配置間隔係能以排氣通路13Α所要求之氣 體的排氣速度和臭氧的分解效率為基準來作設定。亦即， 配置間隔越大氣導變越高，故能減低廢氣之流阻，另一方 面，由於臭氧分子與發熱體之接觸機率降低，故臭氧的分 解效率降低。反之，配置間隔越小，臭氧的分解效率越是 參 提升’但因為氣導變低故排氣阻力變高。因此，係因應在 處理室11所實施之真空處理條件(臭氧的生成量、排氣速度） 而設定加熱器21之配置間隔。 雕在上述構成之加熱器21中，發熱面211係配置在支搜 肽212之處理至11侧的面。藉此，可使來自處理室η的 廢氣與發熱面211有效率地接觸。且能將加熱單元21的發 熱面遠離冷It 161，故祕冷牌161轉餘㈣極低溫以 確保所期望的排氣作用。 /支撐體212亦可因應需要而含有遮熱層^藉此，可遮 斷k發熱面211朝冷阱161放射的輻射熱。上述遮熱層為， 13/32 201030234 可在支撐體212疊層絕熱材 材來構成亦可。 ’或支撐體212 的整體以絕熱 將發^ =11 Μ的轴部m亦可建構成旋_。此卜兄可 ==定在與排氣通路UA的軸：： 角度位置。藉此，可任意地調整 《任思的 之接觸機率。 乳巾H與發熱面211 :熱器21之旋動位置的調整為， ^Single, the ozone contained in the exhaust gas from the above-mentioned processing chamber toward the above-mentioned cold if is thermally decomposed. According to the vacuum treatment device described above, the concentration of ozone in the exhaust gas can be reduced to suppress the amount of condensation of ozone during cooling. Therefore, the accumulation of cold odor and oxygen can be suppressed, and the danger of ignition due to the decomposition reaction of the concentrated liquid ozone during the operation of the refrigerating pump can be prevented and the refrigeration pump burned thereby. The heating unit may be provided in the above-described exhaust passage, and may be provided at the above-mentioned room or chamber. Further, the heating means may be provided in each of the exhaust passage and the processing chamber. " By placing the heating unit in the exhaust passage, the ozone in the gas discharged from the processing chamber can be thermally decomposed efficiently. Further, by disposing the heating unit in the process, the ozone generated in the processing chamber can be subjected to heat treatment in the treatment (four), and the vacuum evacuation method according to an embodiment of the present invention is related to the use of cold. The beam pump exhausts the processing chamber in which ozone is present as a vacuum exhaust. The vacuum evacuation method towel is included in the exhaust towel so that the odor in the exhaust gas contacts the heat generation® for thermal decomposition.魄, the above-mentioned cold trap that is reduced by the cold capsule is condensed. The vacuum evacuation method described above utilizes heating 9/32 201030234 before the exhaust gas reaches the cold spelling. Therefore, according to the vacuum evacuation method described above, the product can be suppressed. Thereby, it is possible to prevent the risk of igniting the anti-(four) ignition during the cold heading operation and the resulting cold hiding. [Embodiment] Hereinafter, the embodiment of the present invention will be described based on the drawings. (First Embodiment) Fig. 1 is a side cross-sectional view showing the configuration of a vacuum processing apparatus 1 according to an embodiment of the present invention. The vacuum processing apparatus 1 of the present embodiment is provided with a vacuum chamber 1G. The vacuum chamber 1G includes a process for processing the substrate w, a pump chamber 12 for exhausting the process $11, and a pipe 13 for connecting the process chamber U and the chest chamber 12. The vacuum chamber is made of a metal material such as a whole bell steel. Flying stainless In the present embodiment, the piping 13 forms an exhaust passage 13A for guiding the exhaust gas from the processing chamber u toward the pump chamber 。. The pipe 13 is composed of a first pipe member and a second pipe member 132. The first pipe member 131 is connected to the processing chamber ", and the second pipe member 132 is connected to the fruit chamber 12. The button member forms a part of the pipe 13 between the first pipe member (3) and the second pipe member 132, and thus is also provided with a vacuum. A valve chamber 14 of a part of the tank 10. The processing chamber 11 has a support table 15 that supports the substrate W. The processing chamber u forms a vacuum for vacuum-treating the substrate w supported by the support table 15. In the present embodiment, as a vacuum The treatment is exemplified by a film formation treatment (for example, a sputtering method or a vapor deposition method) using a gas containing oxygen or ozone in a treatment gas, or a plasma using such a gas (indicated by the reference p in the first drawing). Processing of 10/32 201030234, etc. The processing gas is introduced into the processing chamber 11 through the gas introduction pipe 18. Further, a plasma generating source (high-frequency coil, magnetic) (not shown) is provided outside or inside the vacuum chamber 10. In the case of the vacuum processing, in addition to the above, exposure, analysis, surface observation, etc. using an electron beam may be used. In the present embodiment, it is applicable to the processing chamber. Ozone generating Various treatments: A cold trap (very low temperature portion) 161 of the refrigeration pump 19 is disposed inside the pump chamber 12. The gas system in the vacuum chamber 10 is adsorbed or condensed in the cold trap 161. The collected exhaust gas (process gas) is accumulated in the refrigeration pump 19 as a solidified solid, and is temporarily liquefied when the refrigeration pump 19 is operated, and finally vaporized and evaporated. It is a casing of a refrigerating pump, a pump which is part of the vacuum tank 1 to 12, and a low-temperature mechanical refrigerator which is immersed in a GM (Giff〇rd-McMah〇n) refrigerator or the like provided in the pump chamber I] 162. It is a part of the mechanical refrigerator 162, a cold head 163 which is a low-temperature generating part, and is thermally disposed in a good contact with the low temperature part. 16.3 is used to condense or adsorb the exhaust gas. The cold trap 161 is held at a very low temperature by the mechanical refrigerator 162. The cold trap 161 can be formed in a planar shape, a coil shape, or the like. The valve body 14 is housed inside the valve chamber 14. The body 17 is constructed to be openable in the exhaust passage 13A. The position moves freely between the closed position of the shielded exhaust passage 13A. The valve body 17 changes the conductance of the gas passing through the exhaust passage 13A. Further, the valve body π may have a gate valve or a slit valve or the like. A valve structure that can be hermetically sealed between the processing chamber 11 and the pump chamber 12. 11/32 201030234 The vacuum processing apparatus 1 further includes a heating unit 20 for thermally decomposing ozone molecules present in the tank 10. In the present embodiment, a configuration example in which the heating unit 20 is disposed in the exhaust passage 13A is shown. The heating unit 20 has a single or a plurality of heaters 21 and a heating power source (not shown). In the present embodiment, the heaters 21 are arranged at a plurality of intervals in the direction intersecting the axial direction of the exhaust passage 13A. The heater 2 has a heat generating surface 2 and a support body 212. The heat generating surface 2n may be composed of a resistance heating body, a metal plate of a built-in heating source, or the like. The support body 212 is a plate-like member, and the heat-generating surface 21 is supported on the surface facing the side of the processing chamber 1 . The support body 212 is attached to the first pipe member 131 via the shaft portion m. For the power supply from the heating power source to the heat generating surface 211, for example, the core may be used as a part of the wiring, or the ridge line may be incorporated in the shaft portion m. The heating surface 211 is heated to a temperature sufficient to thermally decompose the ozone. The portion of the gas discharged from the processing chamber 11 is in contact with the heat generating surface 211 at the hearing path 13A. The ozone molecules in the gas in contact with the heat generating surface 211 are reduced to harmless oxygen by the thermal decomposition reaction represented by the following formula (1). 203-302 (1) _ In the case where the ozone concentration is constant, the thermal decomposition reaction of ozone is performed for the time when the heating temperature is higher. Therefore, the higher the temperature of the heat generating surface 211, the more efficiently the ozone can be decomposed. Further, by increasing the heating temperature A' of the heat generating surface 2, the ozone concentration of the exhaust towel can be effectively reduced. The temperature of the heat generating surface 211 can be set, for example, to 3 Torr. 〇 Above. The heating temperature of the heat generating surface 211 can be set to an appropriate value. According to the knife solution of the heat-acting knife, the higher the temperature of the heating element, the shorter the contact time with the surface of the heating element required for the decomposition reaction, and the ozone decomposing efficiency of 12/32 201030234 can be improved. When a high melting point metal such as tungsten (W) or ruthenium (Re) is used as a heating element, a temperature of 3 Torr or more can be maintained. However, for conductors that supply 'hot bodies' and supply current, copper (Cu) is usually used in industry, and its bright point, pure copper - is about 080 °c. In addition, in the case of more than 10 〇〇 (the temperature of TC, since the radiant heat system from the heating element exceeds 1 〇w per lCm2, even if a heating element having a small surface area is used, it is also oriented toward cold; radiant heat of Dongguo will become a problem. On the other hand, in the case where the heating element is steel, it can be seen that the state of heating to 3 (8) can reduce the concentration of ozone in the air by a few seconds. For the above reason, the heating of the heating surface 211 The upper limit of the temperature can be set to 1000 ° C. In particular, when the heat generating surface 211 is made of copper, the lower limit of the heating temperature can be set to 300. The arrangement interval of the heater 21 can be required by the exhaust passage 13 The exhaust gas velocity of the gas and the decomposition efficiency of the ozone are set as a reference. That is, the larger the arrangement interval is, the higher the gas conductance is, so that the flow resistance of the exhaust gas can be reduced, and on the other hand, the probability of contact between the ozone molecules and the heat generating body When the concentration is lowered, the decomposition efficiency of ozone is lowered. Conversely, the smaller the arrangement interval is, the more the decomposition efficiency of ozone is increased. However, since the air conduction becomes lower, the exhaust resistance becomes higher. Therefore, it is determined in the processing chamber 11 The arrangement conditions of the heaters 21 are set by the vacuum processing conditions (the amount of ozone generated and the exhaust velocity). In the heater 21 having the above configuration, the heat generating surface 211 is disposed on the side of the processing of the branch peptide 212 to the side 11. Thereby, the exhaust gas from the processing chamber η can be brought into efficient contact with the heat generating surface 211. The heat generating surface of the heating unit 21 can be kept away from the cold It 161, so that the cold cold card 161 is turned to a minimum temperature to ensure the desired temperature. The venting action of the support body 212 may also include a heat shielding layer as needed to block the radiant heat radiated by the k heat generating surface 211 toward the cold trap 161. The above heat shielding layer is, 13/32 201030234 can be supported The body 212 may be formed by laminating a heat insulating material. 'Or the whole of the support body 212 may be formed by adiabatic heating of the shaft portion m of the ^=11 。. This can be defined as the venting path. UA axis:: Angle position. By this, the contact probability of Rensi can be arbitrarily adjusted. The wiper H and the heat surface 211: the rotation position of the heater 21 is adjusted, ^
^共通的該位置，亦可設定成各_立_度位^ 透過調整各個加熱_ 21的肖度位置，可㈣ 13A之廢氣的排氣速度。又 β軋、 排氣通路以關度之閥來發揮功^。1係成為可作為^ 知:以上那心，構成本貫施形態的真空處理裝置1。又， 利用泵至12、配Ί* 13(排氣通路13Α)及冷牌161(冷束泵19) ，構成本發明之-實施形態的泵單元。再者，利用上述果 單元及加熱單元2〇來構成本發明之一實施形態的真空排氣 裝置。 在上述構成之真空處理裝置！中，存在於真空槽1〇内 邛的水分及氣體係在冷阱161被凝結或吸附。藉此，真空 槽1 〇的内部被維持成與中間流領域(intermediate region)或分子流領域(molecular flow region)相當之高真空 或超高真空。因此，在處理室11被生成或導入之含臭氧的 廢氣係從處理室11經由排氣通路13A被導入泵室12。在 此排氣過程中，廢氣所含之臭氧係透過與被加熱成高溫(例 如300°C〜1〇〇〇。〇的發熱面211接觸或衝撞而作熱分解。藉 此’除去廢氣中的臭氧或減低廢氣中的臭氧濃度。 依據本實施形態，可效率地減低累積於冷凍泵19之廢 14/32 201030234 氣的凝結_巾的臭氧濃度。因此，在伴隨著凝結固體之 液化及氣化、蒸發之冷凍泵的操作步驟中，可防止對人體 有告的尚濃度臭氧氣體被放出於大氣中。又能 縮液態臭氧之分解反應引起著火的原因所造成的冷 損。 又，依據本實施形態，臭氧並非利用觸媒作用而是作 成僅利用加熱個進行分解、料’故能將真空槽1〇的内 部維持清淨的高真空狀態。^The common position can also be set to _立_度位^ By adjusting the position of each heating _ 21, the exhaust velocity of the exhaust gas can be (4) 13A. In addition, the β-rolling and exhausting passages function as valves of the degree of closure. The 1st system is a vacuum processing apparatus 1 which can be used as a general knowledge. Further, the pump unit of the embodiment of the present invention is constituted by the pump 12, the fitting * 13 (exhaust passage 13), and the cold plate 161 (cold beam pump 19). Further, the above-described fruit unit and heating unit 2〇 constitute a vacuum exhaust apparatus according to an embodiment of the present invention. The vacuum processing device constructed as above! The moisture and gas system existing in the vacuum chamber 1 is condensed or adsorbed in the cold trap 161. Thereby, the inside of the vacuum chamber 1 is maintained at a high vacuum or an ultra-high vacuum equivalent to an intermediate region or a molecular flow region. Therefore, the ozone-containing exhaust gas generated or introduced into the processing chamber 11 is introduced into the pump chamber 12 from the processing chamber 11 via the exhaust passage 13A. In this exhausting process, the ozone contained in the exhaust gas is thermally decomposed by being in contact with or colliding with the heat generating surface 211 heated to a high temperature (for example, 300 ° C to 1 Torr.) Ozone or reducing the concentration of ozone in the exhaust gas. According to the present embodiment, the ozone concentration of the condensed towel which is accumulated in the waste 14/32 201030234 of the refrigerating pump 19 can be efficiently reduced. Therefore, the liquefaction and gasification accompanying the condensed solids In the operation steps of the evaporating refrigerating pump, it is possible to prevent the ozone gas which is still present in the human body from being released into the atmosphere, and to reduce the cold damage caused by the decomposition reaction of the liquid ozone. In the form, ozone is not used as a catalyst, but is made into a high-vacuum state in which the inside of the vacuum chamber 1 is cleaned by decomposing only by heating.
再者，構成加熱單元20的複數個加熱器21係取適 度的間隔作配置，故能在無損及㈣的魏效率之〒有效 率地除去氣體中的臭氧。 ；Further, since the plurality of heaters 21 constituting the heating unit 20 are arranged at an appropriate interval, the ozone in the gas can be efficiently removed without impairing the efficiency of (IV). ;
如同上述’臭氧之除去效率係按配置在排氣通路13A 上之發熱面211的大小、數量、設置角度等而變化。此等 ^熱面211之配置條件可任意地調整，因而可依對應基板 之真空處理的種類、條件等而作適宜設^，同時能抑制 裝置構成的複雜化。 (第二實施形態） 第二圖係概略顯示本發明第二實施形態的真空處理裝 置2之構成的侧剖視圖。此外，就圖中與上述的真空處理 褒置1(第-圖)對應的部分係賦予同一舰且省略其詳細的 說明。 ^實麵態的真空處縣置2，在有關轉分解廢氣 中的臭氧之加熱單it 20是配置在排氣通路13A這點上是盘 ^述真空處理裝置1共通’但在有關此加熱單元扣是配 在閥室14。。内部這點上，不同於上述真空處理裝置丨。 加熱單το 20係具備在有關與減通路13A的轴向交又 15/32 201030234 的方向上取間隔作配置的複數個加熱器21。加熱器2丨（考 面2Π)的大小、數量、位置未特別限定，乃依閥室〗4 ， 積、排氣通路13A的流路面積等作適宜設定。 '谷 真空處理裝置2中，閥體17係配置在比加熱單元 還靠處理室11側。亦即，限定在處理室Η排氣時，和〇 加熱單元20齡解廢氣中的臭氧。因此，在以閱= 排氣通路13Α，並對處理室u導入定量的臭氧以處理基斷 等的情況，可執行臭氧量不變動之穩定的基板處理。反 閥體17亦可不受上述例子所限而配置在比加熱單元 還靠泵室I2側。此情況，由於就算是排氣通路13α被 17遮斷的狀態’還是可獲得處理室η内之臭氧的熱分解^ 用，故亦適合於無可避免產生臭氧那樣的基板處理。 又’加熱單元20亦可分別配置在排氣通路第—其 構件及啦U。藉此，在處理f η排氣時，由於加二 器21順著排氣通路13Α的軸向作多段配置，故能有效^ 除去廢氣中的臭氧。在此情況’藉由將位在上游侧的加熱 器21和位在下游側的加熱器2卜各自配置在從處理室 侧看為相互分離的位置，可提升廢氣與發熱面2ΐι之接觸 機率。 (第三實施形態） 第三圖係概略顯示本發明第三實施形態 置3之構成的侧剖视圖。此外，就圖中與上 置1(第—圖)對應的部分係賦词—符號且省略其詳細的^ 明0 本實施形心的真空處理襄置3，在 中的臭氧之加鮮元㈣配置在魏通路Μ這點 16/32 201030234 上Ϊ:空處理裝置1共通，但在此加熱單元20是配置在第 二部這點上，不同於上述真空處理裝置置Γ 口…、早疋20係具備在有關與排氣通路13A之轴向交叉 面21^間隔作配置的複數個加熱器21。加熱器21(發軌 面，小、數量、位置未特別限定，乃依(= 132的谷積、流路剖面等作適宜設定。 構午As described above, the ozone removal efficiency changes depending on the size, the number, the installation angle, and the like of the heat generating surface 211 disposed on the exhaust passage 13A. The arrangement conditions of the hot surface 211 can be arbitrarily adjusted, and thus can be appropriately set depending on the type and condition of the vacuum processing of the corresponding substrate, and the complication of the device configuration can be suppressed. (Second Embodiment) Fig. 2 is a side cross-sectional view showing the configuration of a vacuum processing apparatus 2 according to a second embodiment of the present invention. In addition, in the figure, the part corresponding to the above-described vacuum processing apparatus 1 (first drawing) is given to the same ship, and detailed description thereof is omitted. ^The vacuum of the real surface state is set to 2, and the heating unit of the ozone in the decomposition-decomposed exhaust gas is 20 is disposed at the point of the exhaust passage 13A, which is common to the vacuum processing apparatus 1 but in the heating unit The buckle is fitted in the valve chamber 14. . Internally, this is different from the vacuum processing device described above. The heating unit τ 20 includes a plurality of heaters 21 arranged in a space in the direction of the axial direction 15/32 201030234 of the subtracting passage 13A. The size, number, and position of the heater 2 (the surface 2) are not particularly limited, and are appropriately set depending on the valve chamber 4, the flow path area of the product and the exhaust passage 13A, and the like. In the valley vacuum processing apparatus 2, the valve body 17 is disposed closer to the processing chamber 11 than the heating unit. That is, when the process chamber is exhausted, the enthalpy heating unit 20 disregards the ozone in the exhaust gas. Therefore, in the case of reading the exhaust passage 13 and introducing a predetermined amount of ozone into the processing chamber u to process the base or the like, stable substrate processing in which the amount of ozone does not change can be performed. The valve body 17 may be disposed on the pump chamber I2 side of the heating unit without being limited to the above example. In this case, even if the exhaust passage 13α is blocked by the state 117, or the thermal decomposition of ozone in the processing chamber η can be obtained, it is also suitable for substrate processing such as ozone inevitably. Further, the heating unit 20 may be disposed in each of the exhaust passages and its components. Thereby, when the f η exhaust gas is processed, since the adder 21 is arranged in a plurality of stages along the axial direction of the exhaust passage 13 ,, ozone in the exhaust gas can be effectively removed. In this case, the contact between the exhaust gas and the heat generating surface 2ΐ can be improved by arranging the heater 21 positioned on the upstream side and the heater 2 positioned on the downstream side at positions separated from each other as viewed from the processing chamber side. (Third Embodiment) Fig. 3 is a side cross-sectional view schematically showing a configuration of a third embodiment of the present invention. In addition, in the figure, the part corresponding to the upper part 1 (the first figure) is a word-symbol and the detailed description thereof is omitted. The vacuum processing device 3 of the embodiment centroid is added, and the ozone is added in the fresh element (4) The configuration is at the point 16/32 201030234 of the Wei Path: the empty processing device 1 is common, but here the heating unit 20 is disposed at the second portion, which is different from the vacuum processing device described above. The plurality of heaters 21 are disposed at intervals in the axial direction intersecting with the exhaust passage 13A. The heater 21 (the orbital surface is small, the number, and the position are not particularly limited, and it is appropriately set according to the valley product of the 132, the flow path profile, etc.
在真空處理裝置3中，與上述真空處理裝置工、2相較 了加熱單兀20係配置在最接近泵室12的位置。因此， ^氣中的臭氧係在快被冷心61捕集之前就被加熱器Μ除 。此情況亦同樣地，在比該加熱單元Μ還靠處理室U 或閥室14)可再配置加熱單·。藉 此此有效率地除去廢氣中的臭氧。 此外，如同上述，透過使支撐發熱面211的支撐體 具有遮熱性，可保護糾161免受來自於發熱面2ιι之輕 射熱的影響。 (第四實施形態） 第四圖係概略顯示本發明第四實施形態的真空處理裝 置4之構成的侧剖視圖。此外，就圖中與上述真空處理裝 置1(第-®)對應的部分係鮮同1號且省略其詳細 明。 本實施形態的真空處理裝置4,在有關用以熱分解廢氣 中的臭氧之加熱單元是配置在排氣通路13A這點上是與上 述真空處理裝置1共通，但在此加熱單元22是由複數個格 子狀(條紋狀)或網目狀的發熱體所構成這點上，不同於上述 真空處理裝置1。 在第四圖所示的真空處理裝置4中，加熱單元22係由 17/32 201030234 多段地配置於第一管構件]3】的内部之兩個網目狀的發熱 體22A、22B所構成。各發熱體22A、22B，典型的是可由 電阻發熱體所構成。 透過使此等發熱體22A、22B發熱至臭氧的熱分解溫度 以上，除去通過排氣通路13A之廢氣所含的臭氧。依此， 減低到達冷阱161之廢氣的臭氧濃度而可獲得與上述第一 實施形態同樣的效果。 發熱體22A、22B係發熱面形成格子狀或網目狀，藉此 可在不阻害排氣通路13A中之廢氣的流阻之下有效率地使 廢氣與發無闕。_提高錢巾之純的分解效率。In the vacuum processing apparatus 3, the heating unit 20 is disposed at a position closest to the pump chamber 12 as compared with the above-described vacuum processing apparatus. Therefore, the ozone in the gas is removed by the heater before being captured by the cold heart 61. In this case as well, the heating unit can be relocated to the processing chamber U or the valve chamber 14). Thereby, the ozone in the exhaust gas is efficiently removed. Further, as described above, by providing the support body supporting the heat generating surface 211 with heat shielding property, the correction 161 can be protected from the light heat from the heat generating surface 2 ι. (Fourth embodiment) FIG. 4 is a side cross-sectional view showing the configuration of a vacuum processing apparatus 4 according to a fourth embodiment of the present invention. In the drawings, the portions corresponding to the above-described vacuum processing apparatus 1 (---) are the same as those in the first embodiment, and the detailed description thereof will be omitted. The vacuum processing apparatus 4 of the present embodiment is common to the vacuum processing apparatus 1 in that the heating means for thermally decomposing the ozone in the exhaust gas is disposed in the exhaust passage 13A, but the heating unit 22 is plural The vacuum processing apparatus 1 is different from the grid type (striped) or mesh-shaped heating element. In the vacuum processing apparatus 4 shown in Fig. 4, the heating unit 22 is composed of two mesh-shaped heat generating bodies 22A and 22B which are disposed in a plurality of stages of the first pipe member]3 by 17/32 201030234. Each of the heating elements 22A and 22B is typically constituted by a resistance heating element. By heating the heat generating bodies 22A and 22B to the thermal decomposition temperature of ozone or more, the ozone contained in the exhaust gas passing through the exhaust passage 13A is removed. As a result, the ozone concentration of the exhaust gas reaching the cold trap 161 is reduced, and the same effects as those of the first embodiment described above can be obtained. The heat generating bodies 22A and 22B are formed in a lattice shape or a mesh shape, whereby the exhaust gas can be efficiently prevented from flowing under the flow resistance of the exhaust gas in the exhaust passage 13A. _ Improve the pure decomposition efficiency of the money towel.
可 工 折 發熱體22A，22B的發熱面不限於是平坦面，曲面亦 亦即’發熱體22A、22B不限於是將板狀發熱體加屋加 而形成者’亦包含將線編織成格子狀 彎成線圈狀、璇渦狀者。 吾至疋 個，跡細攸置數量不限為像上述例子中的兩 置土曰所’、可’—個以上亦可。又，發熱體22A、22B的設The heat generating surface of the workable heat generating bodies 22A and 22B is not limited to a flat surface, and the curved surface, that is, the 'heat generating bodies 22A and 22B are not limited to those formed by adding a plate-shaped heat generating body to the house', also includes knitting the wire into a lattice shape. It is bent into a coil shape and vortexed. As far as I am concerned, the number of traces is not limited to two or more of the two types of soils in the above example. Moreover, the heating elements 22A and 22B are provided
為第—管構件131的内部，亦可在第二管構件 132的内部，可能的話亦可在閥室 官構仵 數個場所同時設置發熱體。 ’、°此等複 (第五實施形態） 置辭本發㈣五實施形態的真空處理裝 置！(第t 圖。此外，就圖中與上述真空處理Ϊ ^第—圖)對應的部分係賦予 = ’在有關用双熱分解廢氣 13A這點上是與上 本實施形態的真空處理裝置5，在本 中的臭氧之加熱單元是配置在排氣通路 18/32 201030234 述真空處理裝置1共通，但本實施形態中，在加熱單元23 是建構成筒狀這點上，不同於上述真空處理裝置1。 在第五圖所示的真空處理裝置5中，加熱單元23係在 具有圓筒形狀的支撐體之周面安裝發熱體所構成。第六圖 係詳細顯示加熱單元23之放大上視圖。 如第六圖所示’加熱單元23具有位在内周侧的第一圓 筒狀支撐體231及位在外周側的第二圓筒狀支撐體234。在 第一及第一圓请狀支樓體231、234的外周面，分別固定有 發熱體232、235。發熱體232、235係以複數個環狀的發熱 材料構成’而在支撑體231、234的軸向取間隔作配置。第 一圓筒狀支撐體231及第二圓筒狀支撐體234,係藉由複數 個平板狀的中繼構件233而相互同心地形成一體。 m 上述那樣構成的加熱單元23乃如第五圖所示沿排氣通 路13A(第一管構件131)的軸向配置。因此，來自處理室η 的廢氣係通過加熱單元23的内周部及外周部而到達泵室 12此日^•，使各發熱體232、235分別發熱至3〇〇。〇以上的 溫度’藉以熱分解與發熱體232、235接觸的廢氣中之臭氧 並予以除去。觀’龜到達料101之純的臭氧濃度， 而可獲得與上述第一實施形態同樣的效果。 加熱單元23亦可配置在第二管構件132側。又，支樓 發熱體的支雜不限額筒狀，村為㈣形狀，亦可組 合複數種雜難的切财岐兩層的例 子，亦可，二層以上亦可。再者，亦可將第一圖所示 201第四圖所示之加熱單元22組合來使用。 232'235 支撑細、234輸_子，钟 19/32 201030234 同圓筒狀支撐體的内周側。 (第六實施形態） 第七圖係概略顯示本發明第六實施形態的真空處理裝 置6之構成的侧剖視圖。此外，就圖中與上述真空處理裝 置1(第-圖)對應的部分係賦傾_紐且省略其詳細的說 明。 c 本實施形態的真空處理裝置6，在有關用以熱分解廢氣 中的臭氧之加熱單元不崎在職祕13A岐配The inside of the first pipe member 131 may be provided inside the second pipe member 132, and if possible, a heating element may be provided at a plurality of places in the valve chamber. </ RTI> </ RTI> </ RTI> <RTIgt; </ RTI> <RTIgt; </ RTI> <RTIgt; </ RTI> <RTIgt; (T-th diagram. In addition, in the figure, the part corresponding to the above-described vacuum processing Ϊ^---) is given the same as that of the vacuum processing apparatus 5 of the present embodiment. The ozone heating unit in the present embodiment is disposed in the exhaust passage 18/32 201030234, and the vacuum processing apparatus 1 is common. However, in the present embodiment, the heating unit 23 is formed into a cylindrical shape, which is different from the vacuum processing apparatus described above. 1. In the vacuum processing apparatus 5 shown in Fig. 5, the heating unit 23 is configured by attaching a heating element to a circumferential surface of a cylindrical support. The sixth figure shows an enlarged top view of the heating unit 23 in detail. As shown in Fig. 6, the heating unit 23 has a first cylindrical support body 231 positioned on the inner peripheral side and a second cylindrical support body 234 positioned on the outer peripheral side. Heat generating bodies 232 and 235 are fixed to the outer circumferential surfaces of the first and first circular request bodies 231 and 234, respectively. The heating elements 232 and 235 are formed by a plurality of annular heat generating materials, and are arranged in the axial direction of the supporting members 231 and 234. The first cylindrical support body 231 and the second cylindrical support body 234 are integrally formed concentrically with each other by a plurality of flat relay members 233. m The heating unit 23 configured as described above is disposed in the axial direction of the exhaust passage 13A (first pipe member 131) as shown in Fig. 5 . Therefore, the exhaust gas from the processing chamber η passes through the inner peripheral portion and the outer peripheral portion of the heating unit 23 to reach the pump chamber 12, and the heating elements 232 and 235 are respectively heated to 3 Torr. The temperature above 〇 is thermally decomposed and removed from the exhaust gas in contact with the heating elements 232, 235. By observing the pure ozone concentration of the turtle arrival material 101, the same effects as those of the first embodiment described above can be obtained. The heating unit 23 may also be disposed on the side of the second pipe member 132. In addition, the supporting structure of the heating element of the branch building is not limited to a tubular shape, and the village is in the shape of (4). It is also possible to combine two types of foods of the two types of miscellaneous food, or two or more layers. Further, the heating unit 22 shown in Fig. 4, which is shown in Fig. 201, may be used in combination. 232'235 support fine, 234 lose _ child, clock 19/32 201030234 with the inner peripheral side of the cylindrical support. (Sixth embodiment) FIG. 7 is a side cross-sectional view showing the configuration of a vacuum processing apparatus 6 according to a sixth embodiment of the present invention. Further, in the drawings, the portions corresponding to the above-described vacuum processing apparatus 1 (first drawing) are assigned, and detailed description thereof will be omitted. c The vacuum processing apparatus 6 of the present embodiment is equipped with a heating unit for decomposing ozone in the exhaust gas.
理室11㈣這點上’不同於上述真空處理裝置卜本實施 形態的衫處理裝置6係建構成作為產生臭氧㈣的電聚 以對基板(圖不略)進行處理的電漿處理裝置。 熱分解臭制的加絲(加鮮元例係設置在處理室 11的内部。在此顯示了加熱器3G分別配置在處理室u内 周面的近旁及躺職树13A祕的魏口之近旁的例 子0 處理至11之内周面近旁所配置的加熱器so,亦可鱼處 理室11關面對向地作單數錢數個 .In the processing room 11 (four), the trouser processing apparatus 6 which is different from the vacuum processing apparatus described above is constructed as a plasma processing apparatus which processes the substrate (not shown) as electric generation for generating ozone (4). The thermal decomposition odor is added to the inside of the processing chamber 11. Here, it is shown that the heater 3G is disposed in the vicinity of the inner peripheral surface of the processing chamber u, and near the Weikou of the 13A secret. Example 0 deals with the heater so that is arranged near the inner circumference of the inside of the 11th, and can also make a single amount of money facing the ground in the fish processing room 11 .
第七圈中物表示)的形成空間之 12= 』30的形狀可為平面，亦可為 的方。Ρ或上述排氣口的周圍。又 板的支撐_式略)作為加熱_1 支推基 各個加熱器30係具有發埶而 (接觸）而熱4賴彻成她）。依此， 20/32 ^ 30 201030234 ^排氣 13Α·从室12之觀㈣氧濃度係被減 低0 Ζ本實施形態之真空處理裝置6,可有效率地減低累 之廢氣的凝結固體中之臭氧濃度。因此，在 =隨者凝、_狀液化及氣化、蒸叙冷綠的操作步驟 中’可防场人财㈣高濃度臭魏難放出大氣中。 ^能防止时縮液態臭氧之分解反應弓丨起著火的原因所造 成之冷凍泵燒損。The shape of the space formed by the object in the seventh circle can be either a plane or a square. Ρ or around the above exhaust port. Further, the support of the plate is abbreviated as a heating _1 pusher. Each of the heaters 30 has a hairpin (contact) and the heat 4 is made into her). Accordingly, 20/32 ^ 30 201030234 ^Exhaust gas 13Α·View from chamber 12 (IV) Oxygen concentration is reduced to 0 Ζ The vacuum processing device 6 of the present embodiment can effectively reduce ozone in the solidified solids of the exhaust gas concentration. Therefore, in the operation steps of = condensate, _ liquefaction and gasification, and evaporation of cold green, it is possible to prevent the field from being rich (4). ^ It can prevent the freezing pump from burning due to the decomposition reaction of the shrinking liquid ozone.
、又依據本實施形態，由於作成非以觸媒作用而是僅 以加熱作用來分解、除去臭氧，故能將真緖的内部維 持清淨的高真空狀態。 第八圖(A)至(D)顯示加熱器3〇之典型的構成例。 第八圖(A)顯示由發熱體311和支撐發熱體的支撐體 312所構成的加熱器31。發熱體311係以臨近處理室之内 =側的方式配置在支撐體312。支撐體312係能以固定在真 空槽10的單數或複數辦板或曲板來形成。在構成加熱器 31方面，支撐體312非必須，當然亦可將發熱體311單獨 设置於處理室U的既定位置。這與上述的真空處理裝置 1(第一圖)相同。 第八圖(B)顯示由線狀發熱體所構成的加熱器32。作為 線狀發熱體’可使用由鎢等之高熔點金屬材料構成的線材 或勒式加熱器等之棒狀發熱體，將其拉掛於處理室11而構 成加熱器32。此種加熱器32之設置自由度較高，不僅是處 理室11 ’亦可設置於排氣通路13A。又，亦可附加未具有 發熱作用的支撐體用作線狀發熱體的支撐。 第八圖(C)顯示以網狀發熱體構成的加熱器33。相較於 21/32 201030234 線狀發熱體，係具有所謂可加大有效面積的優點。作為網 狀發熱鱧，不限於網目狀者，格子狀發熱體或沖孔金屬等 亦可適用。加熱器33不僅是處理室n，亦可設置於排氣通 路13A。又’亦可附加未具發熱作用的支撲體用作網狀發 熱體之支樓，。 ❹ 第八圖(D)顯示由多錄發熱體所構成的加熱器％。多 孔性物質因表©積大，能提高臭氧的分解效率。作為多孔 狀發熱體的典賴，可舉出多孔f Sic發熱體·此之外， ，可適用毛狀的發熱體。加料34不僅是處理室n，亦可 設置於排氣通路13Αβ又，多錄發熱體亦可由非發熱性 的多孔性物質及對其加熱的發熱體所構成。 如第九圖所示，在處理室m(真空槽)内僅設置一根銅 線120。將處理室ηι内維持在既定壓⑼叫，將銅線 加熱成高溫_。〇。然後，將臭氧產生機140生成的臭氧 朝處理室111導人，利用四極f譜儀15()測定了處理室⑴ 内的殘存臭氧。由臭氧產生機140生成之臭氧的濃度(〇3/〇2) 係设為 7〇〇〇ppjjj。 第十圖顯*在使鋼線⑽發熱$情況(⑽)和不使之發 熱的情況(OFF)下之四極質譜儀15〇的臭氧檢測輸出。可理 發熱並在其表面溫度為9〇()°C處，臭氧的檢測 顯者的減少。反之，當停止銅線12〇之發熱時，臭 氧的檢測輸出係回復到初期值。 從第十圖可明白’臭氧係依高溫的銅線⑽而確實地 梯Z:解。又’從導人臭氧而由分析器15G所檢測輸出之 、、L、i(a)、及銅線12G 熱時由分析器15G所檢測輸出的 / y⑼之比值(b/a) ’ 了解到臭氧的分解效率是82%。 22/32 201030234 ，以與臭氧分子之衝撞機率較小的線狀發熱體來構成 加熱器的上述實驗例中，亦能獲得高效率的臭氧分解作 用因而透過設置複數支該線狀發熱體或使用面狀發熱 體，可觸臭氧分解效轉更加提升。由以上的結果可知， 本發明作為真空中之臭氧分解機構係非常地有效。 在上述實驗例中，熱線係使用鐵線及銦線取代銅線 。120 ’進行了同樣的實驗。其結果，在鐵線的情況，於970 c的表面溫度可獲得68%的臭氧分解效率，在鋼線的情 罾 ^於l_t可獲得挪的臭較舰率。纽等結果可 I解’與線的材f無關’透過將表面溫度保持在適切的高 溫度(在上㈣雜質的情關l_t)，可魏與銅線同 程度的臭氧分解效率。這暗示臭氧分解效率未與高溫表面 的材質相依存而僅與表面溫度強烈地相依存。又，由於高 溫表面所使用的材質未限制為特定材質，故意味著可選定 適合於真空處理的諸條件及真空褒置之要求的材質。 欠’由於要確認上述的實驗絲之妥當性，故利用 ® 酿氣體分子的運動和衝撞之計算機模擬來求得第九圖之 實驗模式中的臭氧分子朝熱線之衝撞機率。其結果顯示於 第十一圖® 如第十-圖實線所示，得到臭氧分子朝熱線之衝撞機 率係與真空排氣系統的主排氣閥之開度相依存這樣的結 I°相對地’由上述實驗之結果可獲得之臭氧分解效率， 落在第十-圖的黑正方形的點附近，可了解與模擬結果非 常接近。 因為能以依據模擬的分子衝撞來說明實驗值，故可說 是臭氧分子的分解效率等於臭氧分子朝向高温表面之衝揸 23/32 201030234 機率二這顯示本發明的原理亦即臭氧分子會因為與高溫表 面之衝撞而直接熱分解之原理實際上是JE確的。 mn。又，在楔擬中透過縮小主排氣閥的開度可獲得接近 %的臭氧分解效率。這表示可將臭氧分解效率設定並維 *在目的值。高温表面的形態、面積、設置部位等雖依真 —的構&而受到很多限制，但透過調整主排氣閥的開 陡可實現高的臭氧分解效率。這可說是本發明之一大便利Further, according to the present embodiment, since the ozone is decomposed and removed by heating only by the action of the catalyst, the inside of the true state can be maintained in a clean high vacuum state. The eighth (A) to (D) shows a typical configuration example of the heater 3A. The eighth diagram (A) shows the heater 31 composed of the heating element 311 and the support body 312 supporting the heating element. The heating element 311 is disposed on the support body 312 so as to be adjacent to the inside of the processing chamber. The support body 312 can be formed by a single or a plurality of plates or curved plates fixed to the vacuum slot 10. In terms of constituting the heater 31, the support body 312 is not essential, and of course, the heat generating body 311 may be separately provided at a predetermined position of the processing chamber U. This is the same as the above-described vacuum processing apparatus 1 (first drawing). The eighth diagram (B) shows the heater 32 composed of a linear heating element. As the linear heating element, a wire-shaped heating element such as a wire made of a high-melting-point metal material such as tungsten or a rod heater can be used, and the heater 32 can be formed by being pulled around the processing chamber 11. Such a heater 32 has a high degree of freedom of installation, and may be provided not only in the processing chamber 11 but also in the exhaust passage 13A. Further, a support body having no heat generating effect may be added as a support for the linear heat generating body. The eighth diagram (C) shows the heater 33 composed of a mesh heating element. Compared with the 21/32 201030234 linear heating element, it has the advantage of increasing the effective area. The mesh heating element is not limited to a mesh shape, and a lattice-shaped heating element or a punched metal may be applied. The heater 33 is not only the processing chamber n but also the exhaust passage 13A. Further, it is also possible to add a branch body which does not have a heat generating effect as a branch of a mesh-shaped heat generating body.第八 Figure 8 (D) shows the heater % composed of a multi-recorded heating element. The porous material can increase the decomposition efficiency of ozone due to the accumulation of the table. As a typical example of the porous heating element, a porous f Sic heating element can be cited, and a hair-shaped heating element can be applied. The addition material 34 may be provided not only in the processing chamber n but also in the exhaust passage 13??, and the multi-recording heating element may be composed of a non-heat generating porous material and a heating element for heating the same. As shown in the ninth figure, only one copper wire 120 is provided in the processing chamber m (vacuum tank). The processing chamber ηι is maintained at a predetermined pressure (9), and the copper wire is heated to a high temperature _. Hey. Then, the ozone generated by the ozone generator 140 is led to the processing chamber 111, and the residual ozone in the processing chamber (1) is measured by the quadrupole spectrometer 15 (). The concentration of ozone (〇3/〇2) generated by the ozone generator 140 is set to 7 〇〇〇 ppjjj. The tenth figure shows the ozone detection output of the quadrupole mass spectrometer 15 在 under the condition that the steel wire (10) generates heat ((10)) and the case where it does not heat (OFF). It is possible to heat up and at a surface temperature of 9 〇 () ° C, the detection of ozone is significantly reduced. On the other hand, when the heat generation of the copper wire 12 is stopped, the detection output of the ozone returns to the initial value. It can be understood from the tenth figure that the ozone is based on the high temperature copper wire (10) and is surely the solution Z: solution. Further, 'the ratio (b/a) of the /y(9) detected by the analyzer 15G when the output of the analyzer 15G is detected by the analyzer 15G, L, i(a), and the time when the copper wire 12G is hot is known. The decomposition efficiency of ozone is 82%. 22/32 201030234, in the above experimental example in which the heater is constituted by a linear heating element having a small collision probability with ozone molecules, high-efficiency ozonolysis can be obtained, and a plurality of linear heating elements can be provided or used. The surface heating element can be improved by the ozone decomposing effect. From the above results, the present invention is very effective as an ozone decomposing mechanism in a vacuum. In the above experimental example, the hot wire is replaced by a copper wire and an indium wire. 120 ’ did the same experiment. As a result, in the case of the iron wire, 68% of the ozone decomposition efficiency can be obtained at the surface temperature of 970 c, and the odds ratio of the steel wire can be obtained at the l_t of the steel wire. The results of New Zealand can be solved by the fact that the surface temperature is kept at an appropriate high temperature (in the case of the upper (four) impurity l_t), and the ozone decomposition efficiency is the same as that of the copper wire. This suggests that the ozone decomposition efficiency is not dependent on the material of the high temperature surface and is only strongly dependent on the surface temperature. Further, since the material used for the high-temperature surface is not limited to a specific material, it means that a material suitable for the conditions of the vacuum treatment and the vacuum chamber can be selected. In order to confirm the validity of the above test wire, the collision of the ozone molecules toward the hot line in the experimental mode of the ninth figure was obtained by computer simulation of the motion and collision of the brewed gas molecules. The result is shown in the eleventh figure. As shown in the tenth line of the solid line, the collision probability of the ozone molecules toward the hot line is dependent on the opening degree of the main exhaust valve of the vacuum exhaust system. 'The ozone decomposition efficiency obtained from the results of the above experiments is close to the point of the black square of the tenth-graph, and it can be understood that it is very close to the simulation result. Since the experimental value can be explained by the molecular collision according to the simulation, it can be said that the decomposition efficiency of the ozone molecule is equal to the impact of the ozone molecule toward the high temperature surface. 23/32 201030234 probability 2 This shows that the principle of the present invention is that the ozone molecule will be The principle of direct thermal decomposition of high temperature surfaces is actually JE. Mn. Further, in the wedge, an ozone decomposing efficiency close to % can be obtained by reducing the opening degree of the main exhaust valve. This means that the ozone decomposition efficiency can be set and maintained at the target value. The shape, area, and location of the high-temperature surface are subject to many limitations due to the true structure and/or; however, high ozone decomposing efficiency can be achieved by adjusting the opening and closing of the main exhaust valve. This can be said to be one of the great conveniences of the present invention.
^本發明群就主排氣閥的開度與臭氧分解效率之關係， 二吏用第十一圖概略顯示的構成之排氣系統作了單純的考 祭。此外，就第十二圖中與第一圖對應的部分係賦予 符號且省略其詳細的說明。The present invention relates to the relationship between the opening degree of the main exhaust valve and the ozone decomposition efficiency, and the exhaust system of the configuration shown schematically in the eleventh figure is simply sacrificed. In addition, in the twelfth-figure, the part corresponding to the first figure is given a symbol and the detailed description thereof is omitted.
第十二圖所示的排氣系統為，在真空槽10與冷凍泵19 之間所配置的配管13之内部，以從真空槽1G側來看依序 配置加熱器21賴體17的構成，與第—圖是同樣的。此 構成係透過料主排賴(隱Π)的開度岐獲得較高臭 氧分解效率之構成中的一種。在此排氣系統的内部，；氧 分子係由吸入側交界面入射(ηί)，而在加熱器21之周圍的空 間無秩序崎動。減分子不久與加料21 _猶即= 分解(nh)，或者是在壁面散亂(nw)，或者從排出侧交界面逃 出（ne)，抑或從吸入侧交界面逃出(nb)。在此，打、打 及nb係表示經驗了上述的過程之時間附近之臭氣11分子^〜 若臭氧分子的入射(ni)及臭氧的分解是規律狀熊，則在 吸入侧交界面與排出側交界面之間的空間，由於=贫又 數始終一定，所以第(2)式成立。 、、軋刀子 ni=nh+ne+nb -..(2) 24/32 201030234 故未含於第(2)式。） (由於nw只不過是在壁面之散氣 臭氧分解效率（7)係如第(3)式。 ’ r =nh/ni --(3) 故將第(2)式代人第(3)式而成為第(4)式。 r =l/{l+(ne/nh)+(n5/nh)} 面積：頻度係與人射表面的In the exhaust system shown in FIG. 12, the inside of the piping 13 disposed between the vacuum chamber 10 and the refrigerating pump 19 is configured such that the heater 21 is disposed in the order of the vacuum chamber 1G. The same as the first picture. This configuration is one of the components for obtaining a higher ozone decomposition efficiency by the opening degree of the main discharge (concealed). Inside the exhaust system, the oxygen molecules are incident (ηί) from the suction side interface, and the space around the heater 21 is disorderly. The subtraction of the molecule and the addition of 21 _ will be = decomposition (nh), or the wall is scattered (nw), or escape from the discharge side interface (ne), or escape from the suction side interface (nb). Here, the hit, hit, and nb systems indicate that the odor of the molecule near the time of the above process is 11 molecules. ^ If the incidence of ozone molecules (ni) and the decomposition of ozone are regular bears, the interface and discharge at the suction side are The space between the lateral interfaces is established because the number of leans is always constant. ,, rolling knife ni=nh+ne+nb -..(2) 24/32 201030234 is not included in the formula (2). (Because nw is only the ozone decomposition efficiency on the wall (7) is as in the formula (3). ' r =nh/ni --(3) Therefore, the second (3) generation (3) Equation (4): r = l / {l + (ne / nh) + (n5 / nh)} Area: frequency and human surface
切，即綱(5)式。 因此，第(4)式成4次式之第⑹式。 r=l{l+(Ae/Ah)+C}…⑹ 以第（5)式那樣單純的面積比來表 數）。 此外，触入側交界面逃出的分子 Ί之形狀與配置、及配管η的形狀相依存，由於無i ，故設成(nb/nh)=C(常 由第⑹式可知，當縮小主排氣閥(閥體1<7)的開度時， Ae變小’臭氧分解效率⑺係漸近最大值丨。反之， 可知透過開啓主排氣閥17 ’使Ae接近崎132的剖面積 (Ac) 1臭氧分解效率係漸近最小值1/{1+(Ac/Ah)+C} 。以理 似的”又相s ’由於常數c小，故第⑹式也可設成第⑺式。 r=Ui+(Ae/Ah)}…⑺。 迄至操作冷束泵為止的生命期（r)，係依容許冷;東泵排 出之臭氧的容許量(M)、及真空射每小時產生之臭氧的量 (G)所決定，而成為第(8)式。 r，/G)/(i-r) ·.•⑻。 由此式可說’相較於例如臭氧完全未分解的情況（r 25/32 201030234 =〇) ’在欲將生命期延長成兩倍的情況，係期望臭氧的分解 效率為至少寫以上（7^〇.5)。 與臭氧分解效率50%相對應之主排氣閥的開度(Ae)係 由第(7)式而成為第(9)式。Cut, that is, the outline (5). Therefore, the formula (4) is the formula (6) of the fourth formula. r = l {l + (Ae / Ah) + C} (6) The simple area ratio as shown in the formula (5) is expressed as a number). In addition, the shape and arrangement of the molecules that escape from the side interface are dependent on the arrangement and the shape of the pipe η. Since there is no i, it is set to (nb/nh)=C (often by the formula (6), when the main is reduced When the opening degree of the exhaust valve (the valve body 1 < 7) is small, Ae becomes small. 'The ozone decomposition efficiency (7) is an asymptotic maximum value 丨. Conversely, it can be seen that the Ae is close to the cross-sectional area of the strip 132 by opening the main exhaust valve 17' (Ac) 1 Ozone decomposition efficiency is the asymptotic minimum 1/{1+(Ac/Ah)+C}. The reason is that the phase s ' is small because the constant c is small, so the formula (6) can also be set to the formula (7). =Ui+(Ae/Ah)}...(7). The lifetime (r) until the cold beam pump is operated is allowed to be cold; the allowable amount of ozone (M) discharged from the east pump and the ozone generated by vacuum injection per hour The amount (G) is determined by the formula (8). r, /G) / (ir) ·.•(8). This formula can be said to be 'compared with, for example, ozone completely undecomposed (r 25/ 32 201030234 =〇) 'In the case where the life span is to be doubled, it is expected that the decomposition efficiency of ozone is at least written above (7^〇.5). The main exhaust valve corresponding to the ozone decomposition efficiency of 50% Opening degree (Ae) is from equation (7) For the first (9).
Ae~Ah ."(9)。 亦即，透過縮小主排氣閥的開度(Ae)迄至與發熱面211 的合計面積(Ah)相同程度為止，而矸達成50%之臭氧分解效 率。Ah係與設計相依存，但為了不明顯損及排氣系統的氣 導’限制成配管剖面積(Ae)的1/2程度較為妥當。由此條件，® 第(9)式成為第(1〇)式。 〇<Ae$Ac/2 ...(1〇)。 亦即’透過將主排氣閥的開度縮小(在Ah小的情況縮更 小）成配管剖面積(Ac)的5〇%以下，以達成5〇%以上的臭氧 分解效率。 、 一以上，係就本發明的實施形態作了說明，但本發明不 受此所限定’可依據本發明之技術思想作各種變形。 例如在以上的實施形態中，係以透過電漿之形成而在 參 處理室内產生臭氧的真空處理為例所作的說明。但不受此 所限，即使是在用以形成運用於試料的表面分析、表面加 工的電子束、或廣泛利用於離子佈植製程之離子束等的荷 電粒子線之各種真空處理裝置上，本發明仍可適用。 又，在以上的實施形態中，說明了各種形態之熱分解 臭氧用的加熱器(發熱體），但發熱體的形態不限定為上述的 例子，又，此等發熱體的設置部位不限定為參考圖式所示 的位置，可因應所使用之真空裝置的規袼而適·更。” 又’本發明亦可適用於以吸附劑將氣體低溫吸附之低 26/32 201030234 溫吸附泵(Cryosorption pump)中，用於防止其操作時濃縮 液態臭氧著火及以此為原因之吸附劑的燃燒等上。 【圖式簡單說明】 第一圖係概略顯示本發明第一實施形態的真空處理裝 置之構成的側剖視圖。 第二圖係概略顯示本發明第二實施形態的真空處理裝 置之構成的側剖視圖。 ❿ 第三圖係概略顯示本發明第三實施形態的真空處理裳 置之構成的側剖視圖。 第四圖係概略顯示本發明第四實施形態的真空處理裝 置之構成的側剖視圖。 第五圖係概略顯示本發明第五實施形態的真空處理裝 置之構成的側剖視圖。 、見圖第六圖係第五圖所示之真空處理裝置的要部之放大上 第七圖係概略顯示本發明第六實施形態的真空處理奘 置之構成的側刮視圖。 第八圖係顯示第七圖所示之真空處理裝置的要部之槿 成例的側剖視圖。 第九圖係顯示確認本發明實施形態之效果用的實驗模 式之要部的側刮視圖。 、 例 十圖係顯示第九圖所示之實驗模式的一實驗結果 果 第十一 圖係顯示依據第九圖所示實驗模式之模擬結 27/32 201030234 第十二圖係說明本發明一實施形態中，閥體的開度與 臭氧分解效率之關係的模式圖。 【主要元件符號說明】 卜2、3、4、5、6 真空處理裝置 10 真空槽 11 處理室 12 泵室 13 配管 131 第一管構件 132 第二管構件 13A 排氣通路 14 閥室 15 支撐台 17 閥體 18 氣體導入管 19 冷珠泉 20 加熱單元 21 加熱器 211 發熱面 212 支撐體 22 加熱單元 22A、22B 發熱體 23 加熱單元 231 第一圓筒狀支撐體 234 第二圓筒狀支撐體 28/32 201030234 232、235 發熱體 233 中繼構件 3卜32、33、34 加熱器 311 發熱體 312 支撐體 111 處理室 120 銅線 140 臭氧產生機 φ 150 四極質譜儀 161 冷阱 162 機械式冷凍機 163 低溫部 Μ 軸部 Ρ 電漿 W 基板Ae~Ah ."(9). That is, by reducing the opening degree (Ae) of the main exhaust valve to the same extent as the total area (Ah) of the heat generating surface 211, the ozone decomposing efficiency of 50% is achieved. The Ah system is dependent on the design, but it is more appropriate to limit the air conduction of the exhaust system to 1/2 of the cross-sectional area (Ae) of the piping. With this condition, ® (9) becomes the (1〇) formula. 〇<Ae$Ac/2 ...(1〇). In other words, the opening degree of the main exhaust valve is reduced (in the case where Ah is small) to be less than 5% by weight of the cross-sectional area (Ac) of the pipe to achieve an ozone decomposition efficiency of 5% or more. One or more embodiments of the present invention have been described, but the present invention is not limited thereto. Various modifications can be made in accordance with the technical idea of the present invention. For example, in the above embodiment, the vacuum treatment for generating ozone in the reaction chamber by the formation of the plasma is exemplified. However, it is not limited to this, even in various vacuum processing apparatuses for forming surface analysis, surface processing electron beam applied to a sample, or ion beam lines widely used for ion implantation processes, etc. The invention is still applicable. Further, in the above embodiments, various types of heaters (heat generating elements) for thermally decomposing ozone have been described. However, the form of the heating elements is not limited to the above-described example, and the installation position of the heating elements is not limited to Refer to the position shown in the drawing, which can be adapted to the specifications of the vacuum device used. The invention can also be applied to a low-temperature 26/32 201030234 temperature adsorption pump (Cryosorption pump) which adsorbs gas at a low temperature by an adsorbent, and is used for preventing the concentrated liquid ozone from being ignited during operation and the adsorbent for this purpose. BRIEF DESCRIPTION OF THE DRAWINGS Fig. 1 is a side cross-sectional view showing the configuration of a vacuum processing apparatus according to a first embodiment of the present invention. The second diagram schematically shows the configuration of a vacuum processing apparatus according to a second embodiment of the present invention. 3 is a side cross-sectional view showing a configuration of a vacuum processing apparatus according to a third embodiment of the present invention. The fourth drawing schematically shows a side cross-sectional view of a vacuum processing apparatus according to a fourth embodiment of the present invention. Fig. 5 is a side cross-sectional view showing the configuration of a vacuum processing apparatus according to a fifth embodiment of the present invention. Fig. 6 is a plan view showing the outline of the main part of the vacuum processing apparatus shown in Fig. 5 A side view of the configuration of the vacuum processing apparatus according to the sixth embodiment of the present invention. The eighth figure shows the main part of the vacuum processing apparatus shown in the seventh embodiment. A side cross-sectional view of an example of the experimental mode for confirming the effects of the embodiment of the present invention is shown in the ninth figure, and an experimental result of the experimental mode shown in the ninth figure is shown in the tenth figure. Fig. 11 is a schematic diagram showing the relationship between the opening degree of the valve body and the ozone decomposition efficiency in an embodiment of the present invention, in accordance with the simulation of the experimental mode shown in the ninth figure. [Description of main component symbols] Bub 2, 3, 4, 5, 6 Vacuum processing apparatus 10 Vacuum chamber 11 Processing chamber 12 Pump chamber 13 Piping 131 First pipe member 132 Second pipe member 13A Exhaust passage 14 Valve chamber 15 Support table 17 Valve body 18 Gas introduction pipe 19 Cold bead spring 20 Heating unit 21 Heater 211 Heating surface 212 Support body 22 Heating unit 22A, 22B Heating element 23 Heating unit 231 First cylindrical support 234 Second cylindrical support 28/32 201030234 232, 235 Heating element 233 Relay member 3 Bu 32, 33, 34 Heater 311 Heating element 312 Support body 111 Processing chamber 120 Copper wire 140 Ozone generator φ 150 Quadrupole mass spectrometer 161 Cold trap 162 Mechanical Freezer 163 Low Temperature Section Μ Shaft Section Ρ Plasma W Substrate
29/3229/32
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| KR101713977B1 (en) * | 2016-11-22 | 2017-03-09 | 주식회사 삼흥에너지 | Cold trap |
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