30046twf.doc/n 201028220 六、發明說明： 【發明所屬之技術領域】 本發明是有關於一種濕式清洗々 -種能使基板各部位得到良好清潔“的濕式於 【先前技術】30046twf.doc/n 201028220 VI. Description of the Invention: [Technical Field] The present invention relates to a wet cleaning method which is capable of providing good cleaning of various parts of a substrate. [Prior Art]
由於平面顯示技術的突飛猛進，其應用逐漸 螢f延伸絲用電财電子產品。就_ HFmD)製程而言，清洗步驟經常連接 步驟之前、t、後等時機，用以維持顯示器基 板在生產過程中之表面潔淨度。 習知之濕式清洗設備是在基板搬運裝置上方設主 洗液供應裝置。基板搬運裝置以—行財向搬運待清洗^ 基板。當進行清雜序時’基板是置於基板搬運裝置上傳 輸，而清洗液供應裝置則是喷灑清洗液至基板上以進行、、主 潔清潔程序。 β 然而’隨著基板的尺寸逐漸加大，為了提升對大面積 之基板的清潔效果，有一種使用傾斜清洗的方式進行基板 的清潔程序已被提出。然而，此種傾斜清洗方式在對應於 基板之較高部位與基板之較低部位處受到清洗液的液壓或 流量會有分布不均的情形，因而使得基板整體的清潔效果 不均勻，導致產品品質受到影響。 201028220 30046twf.doc/n 【發明内容】 有鑑於此，本發明提出—種濕式清洗設備，能使基板 上的各部位得到良好清潔效果。 本發明k出之一種濕式清洗設備，包括基板搬運裝置 以及清洗液供應裝置。基板搬運裝置具有承載面，其^基 板搬運裝置之承載面具有傾斜角度，因而承載面具^較$ 部位以及較低部位。清洗液供應裝置設置於基板搬運裝置 ❹ 的上方，其中π洗液供應裝置包括至少一清洗液供應管路 以及多個喷嘴。清洗液供應管路的延伸方向與基板搬運裝 置的承載面實質平行。多個噴嘴裝設於清洗液供應管路 上，其中對應設置在承載面之較高部位的喷嘴之清洗液喷 出i總合大於對應設置於承载面之較低部位的喷嘴之清洗 液喷出量總合。 在本發明之一實施例中，上述之傾斜角度為2〜8度。 在本發明之一實施例中’上述對應設置在承载面之較 尚部位的噴嘴之分布密度大於對應設置於承載面之較低部 •位的喷嘴之分布密度。 在本發明之一實施例中，上述對應設置在承載面之較 高部位與較低部位之間之喷嘴的分布密度，介於對應設置 在承載面之較高部位的喷嘴之分布密度以及對應設置於承 载面之較低部位的喷嘴之分布密度之間。 在本發明之一實施例中，上述噴嘴的分布密度是自對 應設置於承載面之較高部位逐漸往對應設置於承載面之較 低部位降低。 4 30046twf.doc/n 201028220 4 一在本發明之一實施例中，上述對應設置在承載面之較 兩部位的噴嘴之清洗液喷出流速大於對應設置於承載面之 較低部位的喷嘴之清洗液喷出流速。 ^在本發明之一實施例中，上述對應設置在承载面之較 同。卩位與較低部位之間之喷嘴的清洗液噴出流速介於對應 設^在承載面之較高部位的喷嘴之清洗液喷出流速以及對 應设置於承載面之較低部位的喷嘴之清洗液喷出流速之 間。 在本發明之一實施例中，上述之喷嘴的清洗液喷出流 速疋自對應没置於承載面之較高部位逐漸往對應設置於承 載面之較低部位降低。 在本發明之一實施例中，上述對應設置在承載面之較 高部位的噴嘴之出口面積大於對應設置於承載面之較低部 位的噴嘴之出口面積。 在本發明之一實施例中，上述對應設置在承載面之較 高部位與較低部位之間之喷嘴的出口面積，介於對應設置 • 在承載面之較高部位的噴嘴之出口面積以及對應設置於承 载面之較低部位的喷嘴之出口面積之間。 在本發明之一實施例中，上述噴嘴的出口面積是自對 應設置於承載面之較高部位逐漸往對應設置於承載面之較 低部位降低。 在本發明之一實施例中，上述對應設置在承載面之較 高部位的噴嘴之流量大於對應設置於承載面之較低部位的 喷嘴之流量。 5 30046twf.doc/n 201028220 _在本發明之一實施例中，上述對應設置在承載面之較 高部位與較低部位之間之噴嘴的流量介於對應設置在承載 面之較尚部位的喷嘴之流量以及對應設置於該承載面之較 低部位的喷嘴之流量之間。 在本發明之一實施例中，上述喷嘴的流量是自對應設 置於承載面之較尚部位逐漸往對應設置於承載面之較低部 位降低。 • 在本發明之一實施例中，上述清洗液供應管路的延伸 向與基板搬運裝置的行進方向實質垂直。 在本發明之一實施例中，上述位於清洗液供應管路兩 的嗔嘴分別與承载面之較高部位以及較低部位對應。 敕基於上述’本發明所提出之濕式清洗設備，可藉由調 =洗液供應管路上噴做置之密度、㈣面積、清洗液 旦’丨L速或仙_里，使清洗液在承载面較高部份有較多的喷出 里因此可使基板上的各部位得到良好清潔效果。 ® *〜為讓本發明之上述賴和優點能更明顯賴，下文特 牛貫施例，並配合所附圖式作詳細說明如下。 【實施方式】 第一實施例 圖1為本發明第一實施例之—種濕式清洗設備示意 :。睛參照圖卜在本實施例巾，濕式清洗設備包括 二反搬運裝置210以及清洗液供應裝置22〇。基板搬運裝 210具有承載面21〇a’其中基板搬運裝置21〇之承載面 6 201028220 ^ iw vuv/^ v〇4 30046twf.d.oc/n 210a具有傾斜角度Θ，因此承載面2i〇a具有較高部位pj以 及較低部位L。清洗液供應裝置220設置於基板搬運裝置 210的上方，其中清洗液供應裝置22〇包括至少一清洗液 供應管路222以及多個喷嘴224a。清洗液供應管路222的 延伸方向D與基板搬運裝置210的承載面21〇a實質平行。 多個噴嘴224a裝設於清洗液供應管路222上，其中對應設 置在承載面210a之較高部位Η的噴嘴224a之清洗液c喷 φ 出量總合’大於對應設置於承載面210a之較低部位L的 喷嘴224a之清洗液C喷出量總合，以達到良好的洗淨效 果。 針對上述之濕式清洗設備200，所要說明的是，其中 承載面210a所具有之傾斜角度θ，其範圍可以在2〜8度之 間，在此範圍内可使清洗液C有效帶走基板S上的懸浮粒 子(未繪示）或其他髒污以避免殘留，且基板s也不致於在 承載面210a上滑動。此外，上述清洗液供應管路222的延 伸方向D與基板搬運裝置210的行進方向μ實質上是可 • 彼此垂直的。而位於清洗液供應管路222兩端的噴嘴 224a，則可分別與承載面210a之較高部位η以及較低部 位L對應，其可以與載面210a之較高部位η以及較低部 位L對齊設置或是略超出承載面21〇a之較高部位η以及 較低部位L的位置，以確保基板s容置於洗淨範圍内。另 外’本實發明不限制清洗液供應管路222的數量，本實施 例之圖式所繪示的清洗液供應管路2 2 2僅是用以說明本發 201028220a 30046twf.doc/n 請繼續參照圖1，在本實施例中特別要注意的是，上 述對應設置在承載面210a之較高部位Η的噴嘴224a，其 分布密度可大於對應設置於承載面210a之較低部位L的 嘴嘴224a分布在'度。而對應設置在承載面2i〇a之較高部 位Η與較低部位L之間之喷嘴224a的分布密度，則可介 於對應設置在承載面210a之較高部位Η的喷嘴224a之分 布密度，以及對應設置於承載面210a之較低部位L的噴 嘴224a之分布密度之間。然而，本月並不以此為限，對 應設置在承載面210a之較高部位Η與較低部位L之間之 喷嘴224a的分布密度，可視承載面2i〇a的傾斜角度θ、承 載面210a所搬運的基板S尺寸及擺放位置、或是其他考量 而作調整。換言之，本實施例之噴嘴224a的分布密度是以 三種密度分佈於對應在承載面210a之較高部位H、較低部 位L以及位於較高部位與較低部位L之間的中間部位。然 而，在其他的實施例中，亦可以僅設計兩種喷嘴密度，或 是設計四種或以上的喷嘴密度，惟不限於此，可依實際需 求調整。 圖2為本發明第一實施例之另一種喷嘴設置示意圖。 請參照圖2’除了上述可在對應承載面21〇a之不同部作分 段式的喷嘴分布密度外，在本發明之另一實施例中，喷嘴 224a的分布密度還可以自對應設置於承載面21〇a之較高 部位H逐漸往對應設置於承載面210a之較低部位L降低。 在上述實施例中，由於清洗液C藉由喷嘴220b喷灑 至承載面210a上之基板s，而此時較高部位η的喷嘴220b 30046twf.doc/n 201028220 ......4 分布密度較大’其意味著在較高部位H中會有較多的清洗 液C被喷濃至基板s上，因此可以改善基板s在對應較高 部位Η所被噴灑的清洗液c與於較低部位l所被喷灑的清 潔液C不均所導致基板整體清潔不均勻的問題，而使基板 S之整體清洗效果得到提升。 第二實施例 φ 圖3為本發明第二實施例之一種濕式清洗設備示意 圖。請參照圖3 ’本發明第二實施例之濕式清洗設備300， 其設置大致和第一實施例相同，其主要的差異在於，本實 施例是透過調整喷嘴224b之出口面積，而達到使對應設置 在承載面210a之較高部位η的噴嘴224b之清洗液C喷出 量總合大於對應設置於承載面2i〇a之較低部位l的喷嘴 224b之清洗液c喷出量總合之效果。如圖3所示，在對應 没置在承載面S之較高部位η的喷嘴224b，可各具有相同 大小的出口面積，且此出口面積大於對應設置在承載面 • 21〇a之較低部位L的喷嘴224b的出口面積。至於對應設 置在較高與較低部位Η、L之間的噴嘴224b，其出口面積 的大小則可介於高低兩部位H、L之喷嘴224b出口面積之 間。類似地，此處僅為舉例說明，上述對應設置在較高與 較低部位H、L之間喷嘴2施的出口面積還可以根據實^ 情況加以設計，只要能使較高部位Ή之清洗液c噴出量總 和大於較低部位L，皆在本發明所涵蓋之範圍。換言之， 本貝靶例之噴嘴224b的出口面積是以三種出口面積於對 30046twf.doc/n 201028220 >«+ 應在承载面210a之較高部位H、較低部位L以及位於較高 邻位Η與較低部位L之間的中間部位。然而，在其他的實 施例中，亦可以僅設計兩種出口面積，或是設計四種或以 上的出口面積，惟不限於此，可依實際需求調整。 圖4為本發明第二實施例之另一種喷嘴設置示意圖。 請參照圖4 ’承上述，喷嘴224b除了可以在不同部位有不 同的出口面積外’在另一實施例中，喷嘴224b的出口面積 φ 還可以自對應設置於承載面210a之較高部位Η逐漸往承 載面21〇a之較低部位L降低。 第三實施例 圖5為本發明第三實施例之一種種濕式清洗設備示意 圖。請參照圖5，本發明第三實施例之濕式清洗設備400， 其設置大致和第一實施例相同，其主要的差異在於，本實 施例之濕式清洗設備400是透過調整喷嘴224a之清洗液C 噴出流速或流量，而達到使對應設置在承載面210 a之較高 © 部位Η的喷嘴224a之清洗液C喷出量總合大於對應設置 於承載面210a之較低部位L的噴嘴224b之清洗液C噴出 量總合之效果。對應設置在承載面210a之較高部位Η的 噴嘴224a之清洗液C喷出流速或流量，可大於對應設置 於承载面210a之較低部位L的喷嘴224a之清洗液C喷出 流速或流量。而對應設置在承載面210a之較高部位Η與 較低部位L之間之喷嘴224a的清洗液C喷出流速或流量’ 則可介於對應設置在承載面210a之較高部位Η的喷嘴 30046twf.doc/a 201028220 *+ 224a之清洗液C噴出流速或流量、以及對應設置於承載面 之較低部位L的喷嘴224a之清洗液c喷出流速或流 量之間。同樣地，本發明亦可使喷嘴224a在不同部分之可 具有不同流速或流量。更詳細而言，本實施例之喷嘴22乜 的流，或流量是以三種流速或流量於龍在承載面2ι〇& 之較局部位Η、較低部位l以及位於較高部位與較低部位 L之間的中間部位。然而，在其他的實施例中，亦可以僅 鲁 2㈣觀速錢量，或是設計四誠以上的流速或流 量，惟不限於此，可依實際需求調整。 此外，還可根據承載面2i〇a之傾斜角度θ，或其他之 考I，使喷嘴224a在不同部位具有不同的清洗液c嘴出 流速或流量。舉例來說，在本發明之另一實施例中，上述 喷觜224a的^洗液c喷出流逮或流量，也可以自對應設 置於承載面21〇a之較高部位Η逐漸往承載面21〇&之較低 部位L降低。 f際使㈣，例如可加裝流速㈣器，使對應設 •置在承ΐ面21〇&之較高部位H的喷嘴224a可具有較大流 ，j流置。當然，其他還有許多可以控制噴嘴22乜流速或 流量之方法’此處之流速控制器·僅為舉例說明，並非 用以限定本發明。 基本上，只要能夠使對應於承載面210a較高部分H： 之β洗液C喷出置總和，大於對應較低部分l之清洗液c 噴出量總和，皆符合本發明之精神。 综上所述，本發明所提出之至少具有下列優點： 201028220」4 3〇046twf.doc/n ^過調整噴嘴設置之密度、出口面積、清洗液之流速 =加·里可使清洗液在承載面較高的位置有較多的喷出 $ ’因而改善了較高部位清潔效果不佳㈣ 體有較麵潔淨度。 m 雖…:本發明已以實施例揭露如上，然其並非用以限定 本發明，任何所屬技術領域中具有通常知識者，在不脫離 本發明之精神和範圍内，當可作些許之更動與潤飾，故本 ❹發明之保護範圍當視後附之申請專利範圍所界定者為準。 【圖式簡單說明】 圖1為本發明第-實施例之—種濕式清洗設備示意 圖。 圖2為本發明第一實施例之另—種噴嘴設置示意圖。 圖3為本發明第二實施例之—種濕式清洗設備示意 圖。 圖4為本發明第二實施例之另—種噴嘴設置示意圖。 ® 圖5為本發明第三實施例之一種種濕式清洗設備示意 圖。 【主要元件符號說明】 200、300、400 :濕式清洗設備 210 .基板搬運裝置 210a :承載面 220 :清洗液供應裝置 12 201028220 30046twf.doc/n 222 :清洗液供應管路 224a、224b :喷嘴 C :清洗液 D :延伸方向 Η :較高部位 L :較低部位 Μ:行進方向 S :基板 Θ :傾斜角度 201028220 30046twf.doc/nDue to the rapid advancement of flat-panel display technology, its application has gradually expanded its use of electronic products. In the case of the _ HFmD process, the cleaning step is often connected before, after, and after the steps to maintain the surface cleanliness of the display substrate during production. The conventional wet cleaning apparatus is provided with a main washing liquid supply device above the substrate carrying device. The substrate transfer device transports the substrate to be cleaned in a row. When the cleaning sequence is performed, the substrate is placed on the substrate transfer device for transfer, and the cleaning liquid supply device is sprayed with the cleaning liquid onto the substrate to perform the cleaning process. β However, as the size of the substrate is gradually increased, in order to improve the cleaning effect on the large-area substrate, a cleaning procedure for the substrate using the oblique cleaning has been proposed. However, such a tilt cleaning method is unevenly distributed in the hydraulic pressure or flow rate of the cleaning liquid at a higher portion corresponding to the substrate and the lower portion of the substrate, thereby making the overall cleaning effect of the substrate uneven, resulting in product quality. affected. SUMMARY OF THE INVENTION In view of the above, the present invention provides a wet cleaning apparatus which can achieve good cleaning effects on various parts of a substrate. A wet cleaning apparatus according to the present invention comprises a substrate carrying device and a cleaning liquid supply device. The substrate carrying device has a bearing surface, and the bearing surface of the substrate carrying device has an inclined angle, thereby carrying the mask ^ compared to the lower portion and the lower portion. The cleaning liquid supply device is disposed above the substrate handling device ,, wherein the π washing liquid supply device includes at least one cleaning liquid supply line and a plurality of nozzles. The direction in which the cleaning liquid supply line extends is substantially parallel to the bearing surface of the substrate carrying device. a plurality of nozzles are disposed on the cleaning liquid supply line, wherein a total of the cleaning liquid discharge i corresponding to the nozzles disposed at a higher portion of the bearing surface is larger than a cleaning liquid discharge amount corresponding to the nozzles disposed at a lower portion of the bearing surface total. In an embodiment of the invention, the tilt angle is 2 to 8 degrees. In an embodiment of the invention, the distribution density of the nozzles corresponding to the corresponding portions of the bearing surface is greater than the distribution density of the nozzles corresponding to the lower portions of the bearing surface. In an embodiment of the present invention, the distribution density of the nozzle correspondingly disposed between the upper portion and the lower portion of the bearing surface is between the distribution density of the nozzle corresponding to the higher portion of the bearing surface and the corresponding setting. Between the distribution densities of the nozzles at the lower portion of the bearing surface. In an embodiment of the invention, the distribution density of the nozzles is gradually decreased from a higher portion corresponding to the bearing surface to a lower portion corresponding to the bearing surface. 4 30046 twf.doc/n 201028220 4 In one embodiment of the present invention, the cleaning liquid discharge flow rate corresponding to the nozzles disposed at two more portions of the bearing surface is greater than the cleaning of the nozzle corresponding to the lower portion of the bearing surface. The liquid ejects the flow rate. In an embodiment of the invention, the corresponding arrangement is the same on the carrying surface. The cleaning liquid discharge flow rate of the nozzle between the clamp position and the lower portion is between the discharge flow rate of the cleaning liquid corresponding to the nozzle disposed at the upper portion of the bearing surface and the cleaning liquid corresponding to the nozzle disposed at the lower portion of the bearing surface Between the spray rates. In an embodiment of the present invention, the cleaning liquid discharge flow rate of the nozzle is gradually lowered from a higher portion corresponding to the bearing surface to a lower portion corresponding to the bearing surface. In an embodiment of the invention, the outlet area of the nozzle correspondingly disposed at a higher portion of the bearing surface is larger than the outlet area of the nozzle corresponding to the lower portion of the bearing surface. In an embodiment of the invention, the corresponding outlet area of the nozzle disposed between the upper portion and the lower portion of the bearing surface is corresponding to the corresponding area of the nozzle at the upper portion of the bearing surface and corresponding It is disposed between the outlet areas of the nozzles at the lower portion of the bearing surface. In an embodiment of the invention, the outlet area of the nozzle is lowered from a higher portion corresponding to the bearing surface to a lower portion corresponding to the bearing surface. In an embodiment of the invention, the flow rate of the nozzle correspondingly disposed at a higher portion of the bearing surface is greater than the flow rate of the nozzle corresponding to the lower portion of the bearing surface. 5 30046 twf.doc/n 201028220 _ In one embodiment of the invention, the flow rate of the nozzle correspondingly disposed between the upper portion and the lower portion of the bearing surface is between the nozzle corresponding to the more common portion of the bearing surface The flow rate is corresponding to the flow rate of the nozzle disposed at the lower portion of the bearing surface. In an embodiment of the invention, the flow rate of the nozzle is gradually decreased from a corresponding portion of the corresponding bearing surface to a lower portion corresponding to the bearing surface. • In an embodiment of the invention, the cleaning liquid supply line extends substantially perpendicular to the direction of travel of the substrate handling device. In an embodiment of the invention, the nozzles located in the cleaning fluid supply lines correspond to the upper portion and the lower portion of the bearing surface, respectively.敕Based on the above-mentioned wet cleaning device proposed by the present invention, the cleaning liquid can be carried on the load by adjusting the density of the spray supply line, the area of the cleaning liquid, the cleaning liquid denier, or the speed of the cleaning liquid. The higher part of the surface has more discharges, so that the parts on the substrate can be cleaned well. ® *~ In order to make the above-mentioned advantages and advantages of the present invention more obvious, the following detailed description will be given in detail with reference to the accompanying drawings. [Embodiment] FIG. 1 is a schematic view of a wet cleaning apparatus according to a first embodiment of the present invention. Referring to the drawings, the wet cleaning apparatus includes a second reverse conveying device 210 and a cleaning liquid supply device 22A. The substrate carrying device 210 has a bearing surface 21〇a' in which the carrying surface 6 of the substrate carrying device 21〇 201028220 ^ iw vuv/^ v〇4 30046twf.d.oc/n 210a has an oblique angle Θ, so the bearing surface 2i〇a has The upper part pj and the lower part L. The cleaning liquid supply device 220 is disposed above the substrate handling device 210, wherein the cleaning liquid supply device 22 includes at least one cleaning liquid supply line 222 and a plurality of nozzles 224a. The extending direction D of the cleaning liquid supply line 222 is substantially parallel to the bearing surface 21A of the substrate carrying device 210. The plurality of nozzles 224a are disposed on the cleaning liquid supply line 222, wherein the cleaning liquid c corresponding to the nozzle 224a disposed at the upper portion of the bearing surface 210a is larger than the correspondingly disposed on the bearing surface 210a. The amount of the cleaning liquid C discharged from the nozzle 224a of the low portion L is summed to achieve a good cleaning effect. For the above-described wet cleaning apparatus 200, it is to be noted that the bearing surface 210a has an inclination angle θ, which may range between 2 and 8 degrees, in which the cleaning liquid C can effectively carry the substrate S away. The suspended particles (not shown) or other dirt on the surface to avoid residue, and the substrate s does not slide on the bearing surface 210a. Further, the extending direction D of the cleaning liquid supply line 222 and the traveling direction μ of the substrate carrying device 210 are substantially perpendicular to each other. The nozzles 224a located at the two ends of the cleaning liquid supply line 222 respectively correspond to the upper portion η and the lower portion L of the bearing surface 210a, and can be aligned with the upper portion η and the lower portion L of the carrier surface 210a. Or slightly beyond the higher portion η of the bearing surface 21〇a and the position of the lower portion L to ensure that the substrate s is accommodated in the cleaning range. In addition, the present invention does not limit the number of the cleaning liquid supply line 222. The cleaning liquid supply line 2 2 2 shown in the drawings of the present embodiment is only used to explain the present invention 201028220a 30046twf.doc/n. 1 , in the present embodiment, it is particularly noted that the nozzle 224a correspondingly disposed at a higher portion of the bearing surface 210a may have a distribution density greater than a nozzle 224a corresponding to the lower portion L of the bearing surface 210a. Distributed in 'degrees. The distribution density of the nozzle 224a corresponding between the upper portion Η and the lower portion L of the bearing surface 2i〇a may be between the distribution density of the nozzle 224a corresponding to the upper portion of the bearing surface 210a. And corresponding to the distribution density of the nozzles 224a disposed at the lower portion L of the bearing surface 210a. However, this month is not limited thereto, corresponding to the distribution density of the nozzle 224a disposed between the upper portion Η and the lower portion L of the bearing surface 210a, the inclination angle θ of the visible bearing surface 2i〇a, the bearing surface 210a The size of the substrate to be transported, the placement position, or other considerations are adjusted. In other words, the distribution density of the nozzles 224a of the present embodiment is distributed at three densities at the upper portion H corresponding to the bearing surface 210a, the lower portion L, and the intermediate portion between the upper portion and the lower portion L. However, in other embodiments, only two nozzle densities may be designed, or four or more nozzle densities may be designed, but are not limited thereto, and may be adjusted according to actual needs. Fig. 2 is a schematic view showing another nozzle arrangement according to the first embodiment of the present invention. Referring to FIG. 2', in addition to the above-mentioned nozzle distribution density which can be segmented in different portions of the corresponding bearing surface 21A, in another embodiment of the present invention, the distribution density of the nozzle 224a can also be self-corresponding to the bearing. The upper portion H of the surface 21A is gradually lowered toward the lower portion L corresponding to the bearing surface 210a. In the above embodiment, since the cleaning liquid C is sprayed to the substrate s on the bearing surface 210a by the nozzle 220b, the nozzle 220b of the higher portion η at this time is 30046twf.doc/n 201028220 ... 4 Larger' means that more cleaning liquid C is sprayed onto the substrate s in the higher portion H, so that the cleaning liquid c sprayed on the substrate s at the corresponding higher portion can be improved and lower. The unevenness of the cleaning liquid C sprayed by the portion l causes a problem that the entire substrate is not uniformly cleaned, and the overall cleaning effect of the substrate S is improved. Second Embodiment φ Figure 3 is a schematic view of a wet cleaning apparatus according to a second embodiment of the present invention. Referring to FIG. 3, a wet cleaning apparatus 300 according to a second embodiment of the present invention is substantially the same as that of the first embodiment, and the main difference is that the embodiment achieves the corresponding area by adjusting the exit area of the nozzle 224b. The total amount of the cleaning liquid C discharged from the nozzle 224b of the upper portion η of the bearing surface 210a is greater than the total amount of the cleaning liquid c corresponding to the nozzle 224b disposed at the lower portion 1 of the bearing surface 2i〇a. . As shown in FIG. 3, the nozzles 224b corresponding to the higher portions η of the bearing surface S may each have an exit area of the same size, and the outlet area is larger than the corresponding lower portion of the bearing surface 21 〇a. The exit area of the nozzle 224b of L. As for the nozzle 224b disposed between the upper and lower portions Η, L, the outlet area may be between the high and low portions H, L of the nozzle 224b. Similarly, for the sake of exemplification, the above-mentioned corresponding outlet area of the nozzle 2 between the upper and lower portions H and L can be designed according to the actual situation, as long as the cleaning liquid of the higher portion can be made. The sum of the c discharge amounts is greater than the lower portion L, and is within the scope of the present invention. In other words, the outlet area of the nozzle 224b of the present embodiment is three kinds of outlet areas at 30046 twf.doc/n 201028220 > «+ should be at the upper portion H of the bearing surface 210a, the lower portion L, and the higher ortho position The middle part between the Η and the lower part L. However, in other embodiments, it is also possible to design only two types of outlet areas, or to design four or more outlet areas, but it is not limited thereto, and can be adjusted according to actual needs. Fig. 4 is a schematic view showing another nozzle arrangement according to a second embodiment of the present invention. Referring to FIG. 4, the nozzle 224b can have different outlet areas at different locations. In another embodiment, the outlet area φ of the nozzle 224b can be gradually increased from the corresponding portion of the bearing surface 210a. The lower portion L of the bearing surface 21A is lowered. Third Embodiment Fig. 5 is a schematic view showing a wet cleaning apparatus according to a third embodiment of the present invention. Referring to FIG. 5, the wet cleaning apparatus 400 of the third embodiment of the present invention is substantially the same as the first embodiment, and the main difference is that the wet cleaning apparatus 400 of the present embodiment is cleaned by the adjustment nozzle 224a. The liquid C ejects a flow rate or a flow rate so that the total amount of the cleaning liquid C discharged from the nozzle 224a corresponding to the higher portion of the bearing surface 210a is larger than the nozzle 224b corresponding to the lower portion L of the bearing surface 210a. The total amount of the cleaning liquid C is combined. The flow rate or flow rate of the cleaning liquid C corresponding to the nozzle 224a disposed at the upper portion of the bearing surface 210a may be larger than the flow rate or flow rate of the cleaning liquid C corresponding to the nozzle 224a disposed at the lower portion L of the bearing surface 210a. The discharge flow rate or flow rate of the cleaning liquid C corresponding to the nozzle 224a disposed between the upper portion Η and the lower portion L of the bearing surface 210a may be in the nozzle 30046twf corresponding to the upper portion of the bearing surface 210a. .doc/a 201028220 *+ The flow rate or flow rate of the cleaning liquid C of the 224a, and the flow rate or flow rate of the cleaning liquid c corresponding to the nozzle 224a disposed at the lower portion L of the bearing surface. Similarly, the present invention also allows nozzles 224a to have different flow rates or flow rates in different sections. In more detail, the flow, or flow rate of the nozzle 22 of the present embodiment is at three flow rates or flow rates at the local position of the dragon at the bearing surface 2, the lower portion l and the lower portion and the lower portion. The middle part between the parts L. However, in other embodiments, it is also possible to adjust the flow rate or the flow rate of only four (four) or the flow rate or flow of the above four, but it is not limited thereto, and can be adjusted according to actual needs. Further, depending on the inclination angle θ of the bearing surface 2i〇a, or other test I, the nozzle 224a may have a different flow rate or flow rate of the cleaning liquid at different portions. For example, in another embodiment of the present invention, the washing liquid or the flow rate of the washing liquid c of the squirt 224a may be gradually transferred from the corresponding portion of the bearing surface 21〇a to the bearing surface. The lower part of 21〇&L is lowered. For example, if the flow rate (4) is added, the nozzle 224a corresponding to the upper portion H of the bearing surface 21〇& can have a larger flow and a j flow. Of course, there are many other ways in which the flow rate or flow rate of the nozzle 22 can be controlled. The flow rate controller herein is for illustrative purposes only and is not intended to limit the invention. Basically, it is in accordance with the spirit of the present invention that the sum of the discharges of the washing liquid C corresponding to the upper portion H of the bearing surface 210a can be made larger than the sum of the discharge amount of the cleaning liquid c corresponding to the lower portion 1. In summary, the present invention proposes at least the following advantages: 201028220"4 3〇046twf.doc/n ^The density of the nozzle setting, the exit area, and the flow rate of the cleaning solution = plus · can make the cleaning liquid carry The higher position has more sprayed out of $', thus improving the cleaning effect of the higher part (4). The body has better cleanliness. Although the present invention has been disclosed in the above embodiments, it is not intended to limit the invention, and any one of ordinary skill in the art can make a few changes without departing from the spirit and scope of the invention. Retouching, the scope of protection of this invention is subject to the definition of the scope of the patent application attached. BRIEF DESCRIPTION OF THE DRAWINGS Fig. 1 is a schematic view of a wet cleaning apparatus according to a first embodiment of the present invention. 2 is a schematic view showing another nozzle arrangement according to the first embodiment of the present invention. Figure 3 is a schematic view of a wet cleaning apparatus in accordance with a second embodiment of the present invention. 4 is a schematic view showing another nozzle arrangement according to a second embodiment of the present invention. Figure 5 is a schematic view of a wet cleaning apparatus in accordance with a third embodiment of the present invention. [Main component symbol description] 200, 300, 400: wet cleaning device 210. substrate conveying device 210a: bearing surface 220: cleaning liquid supply device 12 201028220 30046twf.doc/n 222: cleaning liquid supply line 224a, 224b: nozzle C: cleaning solution D: extending direction Η: higher part L: lower part Μ: traveling direction S: substrate Θ: inclination angle 201028220 30046twf.doc/n
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