201023020 、 六、發明說明： 【發明所屬之技術領域】 本發明是有種電子_示裝置，且制是有關於一 種觸控式電子紙顯示裝置及其製造方法。 【先前技術】 目前’電腦通常被用來處理及儲存大量資料。然而，由於 其本身之體積、重量及操作等因素使得電腦難以像紙張印刷物 -樣方便攜帶及閱讀。為同時兼顧紙張印刷物的方便攜帶及閱 讀性、電腦的資料處理能力、環保及低功耗等特點，電子紙顯 Ό 示裝置被提出，具體可參見美國公開第20080062506號專利申 請，其揭露之内容在此作為參考。電子紙顯示裝置係一種雙穩 態（Bi-stable )顯示裝置，其主要有微膠囊电泳型（啊^ Electrophoretic)、擰轉球型（Gyric〇nBead)及膽固醇液晶型 (Cholesteric Liquid Crystal)電子紙顯示裝置等三種類型。對 於雙穩態顯示裝置，當一個影像被寫入後，不必再輸入額外的 电源，此影像會一直被保留。 參見圖1，其示出一種習知之觸控式電子紙顯示裝置1〇， ❹ 包括一薄膜電晶體基板11、一電子紙層12以及一觸控面板 13，電子紙層12夾設於薄膜電晶體基板U與觸控面板13之 間，觸控面板13係貼附於電子紙層12上來達到觸控目的。其 中，薄膜電晶體基板11通常包括一基板以及形成於基板上的 複數條掃瞄線（GateLine)、與掃瞄線相互交叉的複數條資料 線（DataLine)、與掃猫線及資料線相連接的複數個薄膜電晶 體以及與薄膜電晶體分別電性連接的複數個像素電極。掃瞒 線、資料線、薄臈電晶體及像素電極係利用半導體製程建構在 基板上。 然而’對於前述之觸控式電子紙顯示裝置10，由於觸控 3 201023020 面板13與薄膜電晶體基板U係採用分離製程製作，其在一 程度上會造成整個觸控式電子紙顯示裝置1〇之製造成本相對 較高。 【發明内容】 本發明的目的就是在提供一種觸控式電子紙顯示 盆 具有相對較低的製造成本。 〃 本發明的又-目的就是在提供_種觸控式電子紙顯示裝 置的製造方法，其具有相對較低的製造成本。 本發明提出-種觸控式電子紙顯示裝置，其包括： 電晶體基板’_電晶體基板包括—基板以及形成於基板上的 複數個薄膜電晶體、複數條第一電極線及複數個與第一電極線 相互交叉的第二電極線，薄膜電晶體電性輕接至第一電極線及 第二電極線；至少部分第二電極線與第一電極線之重疊位置分 別形成有-中空結構且此至少部分第二電極線與第—電 於此些重疊位置彼此電性絕緣。 ❹ 本發明又提出-種觸控式電子紙顯示裝置的製造方法，其 包括=驟:⑷提供—基板；⑻於基板上形成複數條第二 電極線，（e)於基板上形成—第—絕緣相覆蓋住此些第一 電極線’·（d)於第—絕緣層上形賴數個孔域構以局部地 ηΐ::極線；（〇於孔穴結構内形成-第二絕緣層 電極線；⑴於第—絕緣層上形成複數個 體亦:應地形成，薄膜電晶體係電性_至此些第一 至少部分第二電極線於此些孔穴結構位置 ；以及(g)藉由—顧刻製程選擇性_ 刻第一絕緣層以暴露此些第一電極線。 4 201023020 本發明藉由對薄膜電晶體基板之結構設計，於至少 二電極線與第-電極線之重疊位置分別形成―中空結構，ς一 外力施加；極線上料二電極線可向下彎曲 f線接觸導通，使得第—電極線與第二電極線除可分別作為執 仃顯不功能之相互交叉的掃瞄線與資料線之外，還可分別兼作 執行觸控面板功能之相互交叉的第一偵測線與第二價測線；因 此本發明提供的觸控式電子紙裝置及其製造方法可具有相 較低的製造成本。 〇 為讓本發明之上述和其他目的、特徵和優點能更明顯易 懂，下文特舉較佳實施例，並配合所附圖式，作詳細說明如下。 【實施方式】 有關本發明之前述及其他技術内容、特點與功效，在以下配 合參考圖式之一較佳實施例的詳細說明中，將可清楚的呈現。以 下實施例中所提到的方向用語，例如：上、下、左、右、前或後 等’僅是參考附加圖式的方向。因此，使用的方向用語是用來說 明並非用來限制本發明。 _ 參見圖2，本發明實施例提出之一種觸控式電子紙顯示裝 置20 ’其包括一薄膜電晶體基板21及一設置於薄膜電晶體基 板21上的電子紙層22 ’電子紙層22包括一顯示層（例如一 电泳層、擰轉球層或膽固醇液晶層）（圖中未示出）及一位於 其之遠離薄膜電晶體基板21的一侧之一透明電極層（圖中未 示出）。 參見圖3，薄膜電晶體基板21包括一基板211以及設置 於基板211上的複數個薄膜電晶體212、一絕緣層213、複數 條（圖3示出兩個僅為示意）第一電極線214及複數條（圖3 示出兩個僅為示意）第二電極線216。複數條第一電極線214 5 201023020 與複數條第二電極線216係相互交叉設置，其藉由形成於兩者 之間的絕緣層213 (例如氮矽化物（SiNx)層）彼此電性絕緣。 其中，絕緣層213係覆蓋住複數條第一電極線214，而第二電 極線216係形成於絕緣層213上。複數條第一電極線214係沿 一第一方向相互平行設置，而複數條第二電極線216係沿一與 第一方向正交的第二方向相互平行設置；複數條第一電極線 214與複數條第二電極線216之重疊位置215的周圍分別形成 有一孔穴結構217。本實施例中，孔穴結構217係貫穿於絕緣 ❿層213。複數個薄膜電晶體212係分別電性耦接至與其相鄰的 第一電極線214及第二電極線216 ;具體而言，每一薄膜電晶 體212之閘極G係電性耦接至與其相鄰的一第一電極線214， 其之汲極D電性耦接至與其相鄰的一第二電極線216，而其之 源極S電性耦接至一畫素電極（圖中未示出）。 參見圖4’複數條第二電極線216與複數條第一電極線214 之重疊位置215分別形成有一中空結構2151且透過此些中空 結構2151彼此電性絕緣。中空結構2151係位於孔穴結構217 内。複數條第一電極線214之位於孔穴結構217位置的部分沿 ⑬與其相互交叉的第二電極線216之長度方向（亦即第一電極線 2H之寬度方向）的寬度小於孔穴結構217沿此長度方向的寬 度W1 ;複數條第一電極線214之位於孔穴結構217位置的部 分之最高頂面2141係不低於孔穴結構217的最低底面2171。 複數條第二電極線214之位於孔穴結構217位置的部分係凹設 於孔穴結構217内，其大致呈「u」形；當一外力施加於此位 置時’第二電極線216可向下彎曲與第一電極線214接觸導通。 參見圖5 ’複數條第二電極線216之位於孔穴結構217位 置的部分沿與其相互交叉的第一電極線214之長度方向（亦即 201023020 第-電極線2丨6之寬度方向）的寬度小於孔穴結構217沿此長 度方向的寬度W2。 ❹ ❹ 參見圖6 ’複數條第一電極線214係可透過-第-切換開 關23選擇性地電性輕接至_閘極驅動電路及—第—觸控偵 電路27 ’複數條第二電極線216係可透過一第二切換開關 24選擇性電性耦接至一源極驅動電路％及一第二觸控偵測電 路^8。利用電子紙顯示裳置之固有的雙穩態特性，當需要輸 入子衫像時，藉由第—及第二切換開關23、24將複數條第 電極線214及複數條第二電極線216分別電性耦接至閘極驅 Ϊ電路25及雜_電路26，使觸控式電子紙顯示裝置20 於t/像顯tfHx執行顯示功能，此時，複數條第—電極線 214及複數條第二電極線216分別係作為_線及資料線使 用。當此電子影像寫人完畢後’再藉由第—及第二切換開關 φ將複數條第一電極線214及複數條第二電極線216分 別電性_接至第—觸控偵測電路27及第二觸控_電路28, 式電，Α顯示裝置2G處於觸控偵測狀態以執行觸控面 此> 複數條第一電極線214及複數條第二電極線 係/刀別作為第θΐ測線及第二偵測線使用。 番本發明實施例提出之觸控式電子紙顯示裝 祕砼一條第二電極線216和與其相互交叉的第一 允·άτ1诚i之.疊位置215分別形成有一中空結構2151 ;其 求，僅部分第二電極線216和與其相互交叉的 ’ 之重疊位置215分別形成有一中空結構2151。 觸u’下面將簡要說明本發明實施例提出之 ^控式電子、，.氏為|置2G的—種製造方法，其可包括以下步 201023020 參見圖7，提供一基板211，其可為一軟性基板或一剛性 基板（例如玻璃基板）；於基板211上形成複數條第一電極線 214。 參見圖8，於基板211上形成一絕緣層213a以覆蓋住第 一電極線214 ;絕緣層213的材質可為氮矽化物（siNx)。 參見圖9，於絕緣層213a (以下將標示為213)上形成複 數個孔穴結構217以局部地暴露複數條第一電極線214 ;本實 施例中，複數個孔穴結構217係貫穿於絕緣層213。 ❹ 參見圖10，於複數個孔穴結構217内形成一第二絕緣層 213b，第一絕緣層213b之材質與絕緣層213之材質係不同， 第二絕緣層213b的厚度係小於孔穴結構217之深度。 參見圖11，於絕緣層213上形成複數個與此些第一電極 線214相互交叉的第二電極線216且複數個薄膜電晶體21¾如 圖3所示）亦相應地形成。複數個薄膜電晶體212係分別電性 柄接至複數條第一電極線214及複數條第二電極線216，且至 少部分第二電極線216在孔穴結構217位置與第一電極線214 重疊。由於第一絕緣層213b的厚度係小於孔穴結構217之深 ❹ 度，此至少部分第二電極線216之位於孔穴結構217的部分係 凹设於孔穴結構217内。另外，本領域技術人員熟知的是，在 形成第二電極線216之前，會在絕緣層213上形成一半導體層 (圖中未顯示），以作為複數個薄膜電晶體212之通道層。 之後，藉由一濕蝕刻製程選擇性地蝕刻第二絕緣層213b 以暴露此些第一電極線214，而絕緣層213不會被蝕刻，進而 使此至少部分第二電極線216與第一電極線214的重疊位置 215分別形成一中空結構2151 (如圖4所示），進而可製得一 觸控式電子紙顯示裝置2〇。其申，第二絕緣層2i3b可以是完 201023020 全被侧掉或部分被蚀刻掉，只要能達成暴露此些第一電極線 214之目的均可。 ^综上所述，本發明實施例藉由對薄膜電晶體基板21之結 構《λ»十於至少部分第—電極線216與第一電極線ΜΑ之重疊 位置215分別形成有一中空結構2⑸’當一外力施加於第二 電極線216上時第二電極線216可向下彎曲與第一電極線叫 接觸導通，使得第-電極線214與第二電極線216除可分別作 為執行顯示功能之相互交又的掃瞄線與資料線之外，還可分別 ❹兼純行難面板魏之相互交叉的第—侧線與第二侧 線；換而言之，第-電極線214係可切換式地作為掃猫線及第 -偵測線之-，第二電極線216係可切換式作為資料線及第 二镇測線之—。並且，觸控式電子紙裝置2G之薄膜電晶體基 板21可採用目前很成熟的半導體製程來製造，因此本發明實 施例提供的觸控式電子紙裝置2〇及其製造方法可具有相對較 低的製造成本。 此外，本領频術人貞射對前述實施财的第—電極線 214及/或第二電極線216之結構作適當變更，如圖12所示， Ο 可在第一電極線214之位於孔穴結構217的部分（亦即，對應 重疊位置215之部分）形成有向上延伸的凸塊2142。進一步 的，當凸塊2142足夠高時，如圖13所示，第二電極線216之 位於孔穴結構217的部分可無需凹設於孔穴結構217内，亦即 第二電極線216之位於孔穴結構217的部分係直條狀（亦即平 設設置）’其之下表面2162與絕緣層213之上表面2132共面； 相應地，在觸控式電子紙顯示裝置2〇的製造過程中，可將第 二絕緣層213b (參見圖10及圖u)的厚度設為等於孔穴結構 217之深度，而非如前述之小於孔穴結構217之深度。當然， 9 201023020 定；例如圖」2及51 13所示的凸塊2142貝·J可根據實際需要而 位於:?丨〜姓圖14及圖15所示之態樣，當第二電極線216之 構217的部分為平設或凸設設置時，其同樣可向下 /、 電極線214接觸導通，則可不設置凸塊2142。 太恭=然^發明已以較佳實施例揭露如上’然其並非用以限定 内，X合可熟習此技藝者，在不脫離本發明之精神和範園 附之田申請更動與潤飾，因此本發明之保護軸當視後 胃寻利範圍所界定者為準。 【圖式簡單說明】 圖1所示為習知一種鵷控式電子紙顯示裝置之結構示意 圖0 圖2所示為本發明實施例提出的一種觸控式電子紙顯示 裝置之結構示意圖。 圖3所示為圖2所示觸控式電子紙顯示裝置之薄膜電晶體 基板之結構示意圖。 圖4係圖3所示薄膜電晶體基板沿剖線IV-IV之局部剖示 圖。 Ο 圖5係圖3所示薄膜電晶體基板沿剖線ν-ν之局部剖示 圖。 圖6係圖3所示薄膜電晶體基板之第一及第二電極線與驅 動電路之連接關係圖。 ~ 圖7至圖11所示為本發明實施例提出的一種電子紙顯示 裝置的製造方法之流程圖。 圖12係本發明再一實施例提出的一種薄膜電晶體基板之 一局部剖示圖。 圖13係本發明又一實施例提出的一種薄膜電晶體基板之 201023020 一局部剖示圖。 圖14及圖15係本發明其他實施例提出的薄膜電晶體基板 之局部剖示圖。 【主要元件符號說明】 10 :觸控式電子紙顯示裝置 11 :薄膜電晶體基板 12 :電子紙 13 :觸控面板 20 :觸控式電子紙顯示裝置 ® 21:薄膜電晶體基板 22 :電子紙 211 :基板 212 :薄膜電晶體 213、213a :絕緣層 2132 :絕緣層的上表面 213b :第二絕緣層 214 :第一電極線 ❹ 2141 :第一電極線的最高頂面 2142 :凸塊 215 :重疊位置 2151 :中空結構 216 :第二電極線 2162:第二電極線之下表面 217 :孔穴結構 2171 ··孔穴結構的最低底面 W卜W2:孔穴結構的寬度 11 201023020 23 :第一切換開關 24 :第二切換開關 25 :閘極驅動電路 26 :源極驅動電路 27 :第一觸控偵測電路 28 :第二觸控偵測電路201023020, VI. Description of the Invention: [Technical Field] The present invention relates to an electronic display device, and relates to a touch electronic paper display device and a method of fabricating the same. [Prior Art] Currently, computers are often used to process and store large amounts of data. However, due to its own size, weight and operation, the computer is difficult to carry and read like a paper print. In order to take into account the convenience of carrying and reading of paper printed materials, the data processing capability of the computer, the environmental protection and the low power consumption, the electronic paper display device is proposed. For details, refer to the patent application of US Publication No. 20080062506, the disclosure of which is incorporated herein by reference. This is hereby incorporated by reference. The electronic paper display device is a bi-stable display device mainly comprising a microcapsule electrophoretic type (Gyric Electron), a Gyric〇nBead, and a Cholesteric Liquid Crystal electronic paper. There are three types of display devices. For bistable display devices, when an image is written, there is no need to input additional power, and the image will be retained. Referring to FIG. 1 , a conventional touch electronic paper display device 1A includes a thin film transistor substrate 11 , an electronic paper layer 12 , and a touch panel 13 . The electronic paper layer 12 is sandwiched between the thin film electrodes. Between the crystal substrate U and the touch panel 13, the touch panel 13 is attached to the electronic paper layer 12 for touch purposes. The thin film transistor substrate 11 generally includes a substrate and a plurality of gate lines (GateLine) formed on the substrate, and a plurality of data lines (DataLine) crossing the scan line, and connected to the sweeping cat line and the data line. a plurality of thin film transistors and a plurality of pixel electrodes electrically connected to the thin film transistors, respectively. The broom line, the data line, the thin germanium transistor, and the pixel electrode are fabricated on the substrate using a semiconductor process. However, for the touch-sensitive electronic paper display device 10 described above, since the touch panel 3 201023020 panel 13 and the thin film transistor substrate U are fabricated by a separate process, the entire touch-sensitive electronic paper display device is caused to a certain extent. The manufacturing cost is relatively high. SUMMARY OF THE INVENTION It is an object of the present invention to provide a touch-sensitive electronic paper display basin having a relatively low manufacturing cost. Further, another object of the present invention is to provide a method of manufacturing a touch type electronic paper display device which has a relatively low manufacturing cost. The present invention provides a touch-sensitive electronic paper display device comprising: a transistor substrate _ a transistor substrate comprising a substrate and a plurality of thin film transistors formed on the substrate, a plurality of first electrode lines, and a plurality of a second electrode line crossing the electrode lines, the thin film transistor is electrically connected to the first electrode line and the second electrode line; at least a portion of the overlapping positions of the second electrode line and the first electrode line are respectively formed with a hollow structure and The at least a portion of the second electrode lines are electrically insulated from each other at the overlapping locations. The present invention further provides a method for manufacturing a touch-sensitive electronic paper display device, comprising: a step: (4) providing a substrate; (8) forming a plurality of second electrode lines on the substrate, and (e) forming a substrate-- The insulating phase covers the first electrode lines '·(d) on the first insulating layer and is formed by a plurality of holes to locally ηΐ::polar lines; (formed in the hole structure - the second insulating layer electrode a line; (1) forming a plurality of individual bodies on the first insulating layer: also formed, the thin film electro-crystal system electrical _ to the first at least part of the second electrode lines at the positions of the hole structures; and (g) by The engraving process selectively etches the first insulating layer to expose the first electrode lines. 4 201023020 The present invention forms a superposition of at least two electrode lines and a first electrode line by a structural design of the thin film transistor substrate. The hollow structure is applied by an external force; the two-electrode wire on the electrode line can be bent downward and the f-line contact is turned on, so that the first electrode line and the second electrode line can be respectively used as the scan lines of the intersecting display function and the function. In addition to the data line, they can also double The first detecting line and the second measuring line of the touch panel function are mutually intersected; therefore, the touch type electronic paper device and the manufacturing method thereof provided by the present invention can have a relatively low manufacturing cost. The above and other objects, features, and advantages will be more apparent and understood from the description of the preferred embodiments illustrated < The efficiencies will be clearly shown in the following detailed description of a preferred embodiment of the reference drawings. The directional terms mentioned in the following embodiments, such as: up, down, left, right, front or back, etc. The direction of the additional drawings is only used. Therefore, the directional terminology used is not intended to limit the present invention. _ Referring to FIG. 2, a touch type electronic paper display device 20' is included in the embodiment of the present invention. A thin film transistor substrate 21 and an electronic paper layer 22 disposed on the thin film transistor substrate 21 'the electronic paper layer 22 includes a display layer (for example, an electrophoretic layer, a twisted ball layer or a cholesterol liquid) a layer (not shown) and a transparent electrode layer (not shown) on a side away from the thin film transistor substrate 21. Referring to FIG. 3, the thin film transistor substrate 21 includes a substrate 211 and a plurality of thin film transistors 212 disposed on the substrate 211, an insulating layer 213, a plurality of strips (the two are shown in FIG. 3 are only schematic), the first electrode lines 214 and a plurality of strips (the two shown in FIG. 3 are only schematic) The second electrode line 216. The plurality of first electrode lines 214 5 201023020 and the plurality of second electrode lines 216 are disposed to intersect each other by an insulating layer 213 formed between the two (for example, a silicon nitride (SiNx) layer The insulating layer 213 covers the plurality of first electrode lines 214, and the second electrode lines 216 are formed on the insulating layer 213. The plurality of first electrode lines 214 are disposed in parallel with each other along a first direction, and the plurality of second electrode lines 216 are disposed in parallel with each other along a second direction orthogonal to the first direction; the plurality of first electrode lines 214 are A hole structure 217 is formed around the overlapping positions 215 of the plurality of second electrode lines 216, respectively. In the present embodiment, the hole structure 217 is penetrated through the insulating layer 213. The plurality of thin film transistors 212 are electrically coupled to the first electrode line 214 and the second electrode line 216 adjacent thereto; specifically, the gate G of each of the thin film transistors 212 is electrically coupled to the same An adjacent first electrode line 214 is electrically coupled to a second electrode line 216 adjacent thereto, and a source S thereof is electrically coupled to a pixel electrode (not shown) show). Referring to Fig. 4', the overlapping positions 215 of the plurality of second electrode lines 216 and the plurality of first electrode lines 214 are respectively formed with a hollow structure 2151 and electrically insulated from each other through the hollow structures 2151. The hollow structure 2151 is located within the aperture structure 217. The width of the portion of the plurality of first electrode lines 214 located at the position of the hole structure 217 along the length direction of the second electrode line 216 crossing the first electrode line 216 (that is, the width direction of the first electrode line 2H) is smaller than the length of the hole structure 217. The width W1 of the direction; the highest top surface 2141 of the portion of the plurality of first electrode lines 214 located at the position of the hole structure 217 is not lower than the lowest bottom surface 2171 of the hole structure 217. A portion of the plurality of second electrode lines 214 located at the position of the hole structure 217 is recessed in the hole structure 217 and has a substantially "u" shape; when an external force is applied to the position, the second electrode line 216 can be bent downward. The first electrode line 214 is in contact with the conduction. Referring to Fig. 5, the portion of the plurality of second electrode lines 216 located at the position of the hole structure 217 has a width smaller than the length direction of the first electrode line 214 which intersects with each other (i.e., the width direction of the 201023020 first electrode line 2丨6). The width θ of the hole structure 217 along this length direction. ❹ ❹ Referring to FIG. 6 'the plurality of first electrode lines 214 are selectively permeable to the first - switch 23 to the _ gate drive circuit and the first - touch detection circuit 27 'the plurality of second electrodes The line 216 is selectively electrically coupled to a source driving circuit % and a second touch detecting circuit 24 via a second switch 24 . Using the electronic paper to display the inherent bistable characteristic of the skirt, when the input of the sub-shirt image is required, the plurality of first electrode lines 214 and the plurality of second electrode lines 216 are respectively separated by the first and second switching switches 23, 24 Electrically coupled to the gate driving circuit 25 and the impurity circuit 26, the touch electronic paper display device 20 performs a display function on the t/image display tfHx. At this time, the plurality of first electrode lines 214 and the plurality of lines The two electrode lines 216 are used as the _ line and the data line, respectively. After the electronic image is written, the plurality of first electrode lines 214 and the plurality of second electrode lines 216 are electrically connected to the first touch detection circuit 27 by the first and second switching switches φ. And the second touch_circuit 28, the electric device, the display device 2G is in the touch detection state to execute the touch surface; the plurality of first electrode lines 214 and the plurality of second electrode lines/knife are used as the first The θ ΐ line and the second detection line are used. The touch-sensitive electronic paper display assembly proposed in the embodiment of the present invention has a second electrode line 216 and a first allowable ά 1 1 1 、 、 、 、 、 、 、 、 、 、 、 、 、 、 、 、 、 、 A portion of the second electrode line 216 and the overlapping position 215 of the intersection thereof are formed with a hollow structure 2151, respectively. The following is a brief description of the manufacturing method of the electronic device of the embodiment of the present invention, which may include the following steps: 201023020. Referring to FIG. 7, a substrate 211 may be provided, which may be a A flexible substrate or a rigid substrate (for example, a glass substrate); a plurality of first electrode lines 214 are formed on the substrate 211. Referring to Fig. 8, an insulating layer 213a is formed on the substrate 211 to cover the first electrode line 214; the material of the insulating layer 213 may be nitrogen telluride (siNx). Referring to FIG. 9, a plurality of hole structures 217 are formed on the insulating layer 213a (hereinafter referred to as 213) to partially expose the plurality of first electrode lines 214. In the embodiment, the plurality of hole structures 217 are penetrated through the insulating layer 213. . Referring to FIG. 10, a second insulating layer 213b is formed in the plurality of hole structures 217. The material of the first insulating layer 213b is different from the material of the insulating layer 213, and the thickness of the second insulating layer 213b is smaller than the depth of the hole structure 217. . Referring to Fig. 11, a plurality of second electrode lines 216 crossing the first electrode lines 214 are formed on the insulating layer 213, and a plurality of thin film transistors 213a (shown in Fig. 3) are formed correspondingly. A plurality of thin film transistors 212 are electrically connected to the plurality of first electrode lines 214 and the plurality of second electrode lines 216, respectively, and at least a portion of the second electrode lines 216 overlap the first electrode lines 214 at the positions of the hole structures 217. Since the thickness of the first insulating layer 213b is smaller than the depth of the hole structure 217, the portion of the at least partial second electrode line 216 located in the hole structure 217 is recessed in the hole structure 217. Further, it is well known to those skilled in the art that a semiconductor layer (not shown) is formed on the insulating layer 213 as a channel layer of the plurality of thin film transistors 212 before the second electrode line 216 is formed. Thereafter, the second insulating layer 213b is selectively etched by a wet etching process to expose the first electrode lines 214, and the insulating layer 213 is not etched, thereby causing the at least a portion of the second electrode lines 216 and the first electrode. The overlapping positions 215 of the lines 214 respectively form a hollow structure 2151 (shown in FIG. 4), and a touch type electronic paper display device 2 can be manufactured. It is claimed that the second insulating layer 2i3b may be partially or partially etched away after 201023020, as long as the first electrode lines 214 are exposed. In summary, the embodiment of the present invention forms a hollow structure 2(5)' by respectively forming the structure "λ» of the thin film transistor substrate 21 at an overlapping position 215 of at least a portion of the first electrode line 216 and the first electrode line 215. When an external force is applied to the second electrode line 216, the second electrode line 216 can be bent downward to be in contact with the first electrode line, so that the first electrode line 214 and the second electrode line 216 can respectively serve as mutual display functions. In addition to the scanning line and the data line, the first side line and the second side line which are mutually intersected by the hard-working panel Wei Wei; respectively, in other words, the first-electrode line 214 is switchable. As the sweeping cat line and the first detecting line, the second electrode line 216 is switchable as the data line and the second line. The touch-type electronic paper device 21 of the touch-type electronic paper device 2G can be manufactured by using a well-established semiconductor process. Therefore, the touch-type electronic paper device 2 and the manufacturing method thereof can be relatively low. Manufacturing costs. In addition, the structure of the first electrode line 214 and/or the second electrode line 216 of the aforementioned implementation is appropriately changed as shown in FIG. 12, and the 电极 may be located in the hole structure of the first electrode line 214. Portions of 217 (i.e., portions corresponding to overlapping locations 215) are formed with upwardly extending bumps 2142. Further, when the bump 2142 is sufficiently high, as shown in FIG. 13, the portion of the second electrode line 216 located in the hole structure 217 may not need to be recessed in the hole structure 217, that is, the second electrode line 216 is located in the hole structure. The portion of the portion 217 is straight (ie, flat). The lower surface 2162 is coplanar with the upper surface 2132 of the insulating layer 213; correspondingly, during the manufacturing process of the touch-sensitive electronic paper display device 2 The thickness of the second insulating layer 213b (see FIGS. 10 and u) is set to be equal to the depth of the hole structure 217 instead of being less than the depth of the hole structure 217 as described above. Of course, 9 201023020; for example, the bumps 2142 shown in Figures 2 and 51 13 can be located according to actual needs: ? 丨 ~ surname 14 and Figure 15, when the second electrode line 216 When the portion of the structure 217 is flat or convex, it can also be turned down/, and the electrode line 214 is in contact with the conduction, and the bump 2142 can be omitted. The present invention has been disclosed in the preferred embodiments as described above. However, it is not intended to be limiting, and X is a person skilled in the art, and applies for modification and retouching without departing from the spirit of the present invention. The protection axis of the invention is subject to the definition of the range of the stomach after the sight. BRIEF DESCRIPTION OF THE DRAWINGS FIG. 1 is a schematic structural view of a conventional electronic paper display device of the present invention. FIG. 2 is a schematic structural view of a touch electronic paper display device according to an embodiment of the present invention. 3 is a schematic view showing the structure of a thin film transistor substrate of the touch type electronic paper display device shown in FIG. Figure 4 is a partial cross-sectional view of the thin film transistor substrate of Figure 3 taken along line IV-IV. Figure 5 is a partial cross-sectional view of the thin film transistor substrate shown in Figure 3 taken along line ν-ν. Fig. 6 is a view showing the connection relationship between the first and second electrode lines of the thin film transistor substrate shown in Fig. 3 and the driving circuit. 7 to 11 are flowcharts showing a method of manufacturing an electronic paper display device according to an embodiment of the present invention. Figure 12 is a partial cross-sectional view showing a thin film transistor substrate according to still another embodiment of the present invention. FIG. 13 is a partial cross-sectional view showing a thin film transistor substrate according to still another embodiment of the present invention. 14 and 15 are partial cross-sectional views showing a thin film transistor substrate according to another embodiment of the present invention. [Description of Main Components] 10: Touch-type electronic paper display device 11: Thin film transistor substrate 12: Electronic paper 13: Touch panel 20: Touch-type electronic paper display device® 21: Thin film transistor substrate 22: Electronic paper 211: substrate 212: thin film transistor 213, 213a: insulating layer 2132: upper surface 213b of insulating layer: second insulating layer 214: first electrode line ❹ 2141: highest top surface 2142 of first electrode line: bump 215: Overlapping position 2151: hollow structure 216: second electrode line 2162: second electrode line lower surface 217: hole structure 2171 · · lowest bottom surface of the hole structure W b: width of the hole structure 11 201023020 23 : first switch 24 The second switch 25 is: the gate drive circuit 26: the source drive circuit 27: the first touch detection circuit 28: the second touch detection circuit