TW200937050A - Color filter and method of producing the same, and liquid crystal display - Google Patents

Abstract

The present invention provides a method for manufacturing a color filter, having a procedure of forming a black matrix, including forming a phototonus black combination layer on a substrate by using phototonus black combination, exposing the phototonus black combination layer and developing the phototonus black combination layer after exposure to form a black matrix pattern with undercut, wherein the length of the undercut is from -2.0 μm to 5.0 μm in the width direction of the black matrix, then roasting the black matrix pattern; a procedure of forming a coloring pattern, including forming a phototonus coloring combination layer on the substrate formed with the black matrix after roasting the phototonus coloring combination, exposing the phototonus coloring combination layer, developing the phototonus coloring combination after exposure, and roasting the phototonus coloring combination layer after developing to form a coloring pattern, wherein a part of the coloring pattern after roasting lapped with the black matrix has a length from 2.0 μm to 9.0 μm in the width direction of the black matrix.

Description

200937050 • 六、發明說明： 【發明所屬之技術領域】 本發明係有關於一種彩色濾光片（color filter)及其製 法、與液晶顯示裝置。 【先前技術】 在液晶顯不器（Liquid Crystal Display:LCD)或固體攝 像元件，彩色濾光片係不可缺少的構成組件。 例如，液晶顯示器逐漸被使用作爲電視用途，液晶顯 ® 示器用彩色濾光片與先前的筆記型電腦（laptop computer)、監視器（monitor)用的彩色濾光片比較，被要求 具有更高品質的畫質。又，爲了生產大型TV，基板尺寸擴 大，逐漸增加對提升產率及降低成本之要求。 關於上述畫質的提升，在製造彩色濾光片時，在黑色 矩陣（black matrix)與著色像素之邊界部分，起因於著色圖 案***、彩色濾光片不平坦，成爲成爲產生畫質變差之問 題（參照特開平9-113721號公報）。前述境界部分的***會 〇 有造成對比（contrast)降低或顏色不均等問題之情況。 因此，先前係藉由在製造像素後，硏磨彩色濾光片的 表面或在像素上形成保護（overcoat)層（以下，會有稱爲「〇C 層」之情形）來因應。但是，進行形成硏磨或OC層時，彩 色濾光片的製程增加而成本提高。而且，在硏磨時亦會有 彩色濾光片產生傷痕的缺點，因此，要求有一種能夠將硏 磨製程及/或OC層的形成製程省略之方法。 對此，有嘗試藉由降低黑色矩陣的錐角（taper angle)， 來解決前述邊界部分的***之問題（例如，參照特開平 200937050 9-113721號公報及特開2003-161826號公報）。 特開2003-161826號公報係藉由噴墨（inkjet)法在黑色 矩陣框內只有賦與著色組成物。 但是特開平9- 1 1 3 72 1號公報所記載之方法，爲了得到 具有上述錐角的黑色矩陣致使製程增加，該方法係在基板 上塗布彩色濾光片用的感光性濃色組成物並乾燥後，進而 塗布正型光阻（Positive resist)，並費功夫調整該感光性濃 色組成物與正型光阻的顯像速度比。 又，爲了減小錐角而增加底切（undercut)長度時，顯像 時底切的顯像條件依存性變大，又，相反地，使底切不會 變爲過大時，黑色矩陣的線寬之顯像條件依存性變大，任 一者的情況都會有難以安定生產之問題。 ’ 而且，只有調整錐角時對抑制著色圖案的***的效果 不充分。而且，該技術無法適應1公尺xl公尺以上的大型 基板。 另一方面’特開2003-161826號公報時，因爲係藉由 噴墨法將著色組成物賦予至基板來形成著色圖案，無法適 合於抑制藉由著色組成物的塗布、轉印等形成著色圖案時 在黑色矩陣與著色圖案重疊之重疊部（overlap)所產生的著 色圖案***。不如說是在黑色矩陣與著色像素的邊界部 分’黑色矩陣比著色像素高而產生段差，致使用彩色濾光 片不平坦，同樣地會有產生畫質變差的問題之情形。 【發明內容】 〔發明所欲解決之課題〕 鑒於上述情形’本發明的目的係提供一種彩色濾光片 200937050 及其製法、與液晶顯示裝置，該彩色濾光片能夠藉由低成 本且簡易的方法，不必追加硏磨或設置OC層等製程而能 夠抑制在黑色矩陣與著色像素之邊界部分之著色圖案的隆 起，來得到高品質的畫像。 [解決課題之手段] 用以達成前述課題之具體的手段如下。 &lt;1&gt;一種彩色濾光片的製造方法，係具有以下製程： 黑色矩陣形成製程，其係使用感光性濃色組成物在基 〇 板上形成感光性濃色組成物層，並將前述感光性濃色組成 物層曝光，且將曝光後的前述感光性濃色組成物層顯像來 形成具有底切之黑色矩陣，在此，該底切長度在黑色矩陣 的寬度方向爲- 2.0微米〜5.0微米，而且包含藉由將黑色矩 陣圖案烘烤來形成黑色矩陣；與 該著色圖案形成製程，其係藉由在形成有烘烤後的黑 色矩陣之前述基板上，使用感光性著色組成物形成感光性 著色組成物層，並將前述感光性著色組成物層曝光，且將 〇 曝光後的前述感光性著色組成物層顯像，而且將顯像後的 前述感光性著色組成物層烘烤來形成著色圖案，在此，該 烘烤後的該著色圖案與前述黑色矩陣重疊的重疊部在黑色 矩陣寬度方向之長度爲2.0〜9·0微米。 &lt;2&gt;如&lt;1&gt;之彩色濾光片的製造方法，其中在前述基板上所 形成的前述感光性濃色組成物層之厚度爲0.2微米〜2.2微 米。 &lt;3&gt;如&lt;1&gt;之彩色濾光片的製造方法，其中在前述黑色矩陣 形成製程之前述顯像，顯像溫度爲20T：〜3(TC。 200937050 &lt;4&gt;如&lt;1&gt;之彩色濾光片的製造方法，其中前述黑色矩陣形 ' 成製程係在前述感光性濃色組成物層形成製程之後，且在 前述在曝光製程之前，更含有預烘烤。 &lt;5&gt;如&lt;4&gt;之彩色濾光片的製造方法，其中在前述預烘烤製 程之預烘烤溫度爲60°C〜140°C。 &lt;6&gt;如&lt;4&gt;之彩色濾光片的製造方法，其中在前述預烘烤製 程之預烘烤時間爲3 0秒〜3 00秒。 &lt;7 &gt;如&lt;1&gt;之彩色濾光片的製造方法，其中在前述感光性著 色組成物層的層厚度爲1.8微米〜2.8微米。 0 &lt;8&gt;如&lt;1&gt;之彩色濾光片的製造方法，其中在前述著色圖案 形成製程之前述曝光，透過光罩圖案來進行曝光，且曝光 圖案與黑色矩陣的重疊部分在黑色矩陣的寬度方向之長度 爲2.0微米〜9.0微米。 &lt;9&gt;如&lt;8&gt;之彩色濾光片的製造方法，其中在前述著色圖案 形成製程之前述顯像，顯像溫度爲20 °C〜35 °C，且顯像時 間爲20秒〜120秒。 &lt;10&gt;如&lt;8&gt;之彩色濾光片的製造方法，其中在前述著色圖案 0 形成製程，曝光圖案與黑色矩陣的重疊部分在黑色矩陣的 寬度方向之前述長度爲2.0微米〜8.0微米，前述顯像溫度 爲21 °C〜30 °C，且前述顯像時間爲25〜80秒。 &lt;11&gt;如&lt;8&gt;之彩色濾光片的製造方法，其中前述重疊部分在 黑色矩陣的寬度方向之長度爲2.0微米〜7.0微米，前述顯 像溫度爲22 °C〜26 °C，且前述顯像時間爲35秒〜75秒。 &lt;12&gt;—種彩色濾光片，係由&lt;1&gt;〜&lt;11&gt;中任一項之彩色濾光 片的製造方法所製造的彩色濾光片，其中具有黑色矩陣與 200937050 著色圖案重疊之重疊部，且前述重叠部在黑色矩陣的寬度 方向之長度爲2.0微米〜9.0微米。 &lt;13&gt;如&lt;12&gt;之彩色濾光片，其中前述著色圖案的表面之 中，在前述重疊部離基板表面最遠的部分與前述重疊部以 外的部分之間在基板的法線方向之距離爲0.50微米以下。 &lt;14&gt;一種液晶顯示裝置，其係具備如&lt;12&gt;之彩色濾光片。 &lt;15&gt;—種液晶顯示裝置，其係具備如&lt;13&gt;之彩色濾光片。 [發明之效果] φ 依照本發明，能夠提供一種彩色濾光片及其製法、與 液晶顯示裝置，該彩色濾光片能夠藉由低成本且簡易的方 法，不必追加硏磨或設置OC層等製程而能夠抑制在黑色 矩陣與著色像素之境界部分之著色圖案的***，來得到高 品質的畫像。 【實施方式】 〔實施發明之最佳形態〕 以下，詳細地說明本發明的彩色濾光片及其製法、與 Q 液晶顯示裝置》 彩色濾光片之製法 本發明的彩色濾光片之製法係具有黑色矩陣形成製程 及著色圖案形成製程，而且亦可按照必要更具有保護層形 成製程、液晶配向輔助圖案形成製程、及柱間隙物（column spacer)形成製程等其他的製程。 任一製程在玻璃基板形成膜，均可以在玻璃基板接塗 布布感光性組成液來形成，或是將感光性組成液塗布在暫 時支撐體後，轉印至玻璃基板來形成。 200937050 以下，分開說明黑色矩陣形成製程及著色圖案形成製 程。 黑色矩陣形成製程 在本發明，黑色矩陣形成製程係在基板上至少使用感 光性濃色組成物形成感光性濃色組成物層（感光性濃色組 成物層形成製程），並將前述感光性濃色組成物層曝光（曝 光製程），且將前述曝光後的前述感光性濃色組成物層顯像 (顯像製程），來形成在黑色矩陣的寬度方向之底切長度爲 -2.0微米〜5.0微米的黑色矩陣圖案，並且藉由將所形成的 黑色矩陣圖案烘烤（烘烤製程）來形成黑色矩陣。黑色矩陣 形成製程除了上述各製程以外，亦可按照必要設置其他的 製程。 黑色矩陣 在本發明，黑色矩陣之光學濃度（OD値）以2.0〜8.0爲 佳，以2.5〜8.0爲較佳，以3.5〜6.0爲更佳。光學濃度爲 2.0以上時，能夠抑制對比降低等顯示裝置的顯示品質之降 低。 而且，在此所稱光學濃度係指ISO Visual(視感）透射光 學濃度。測定ISO Visual透射光學濃度能夠使用的測定器 可舉出例如阪田INXENG股份公司（S AKATA INX ENG. C0.， Ltd.)之 X-Rite 361T(V)。 又，黑色矩陣的線寬（夾於著色圖案之間且在與黑色矩 陣長度方向正交的方向之長度）爲5微米〜30微米，從藉由 高開口率來確保亮度的觀點，乃是較佳。從減小黑色矩陣 與著色圖案重疊之重疊部的***（較佳是0.50微米以下）之 200937050 * 觀點，黑色矩陣的厚度（黑色矩陣在基板法線方向之長度） 以0.2微米〜2.0微米爲佳，以0.2〜1.6微米爲較佳，以 0.7〜1.3微米爲更佳。在該厚度範圍，能夠適當地維持設 置有黑色矩陣之基板的凹凸、亦即黑色矩陣的形成區域、 非形成區域的段差，且在形成黑色矩陣後，於其上形成RGB 等的著色圖案（著色像素）時亦能夠高精確度地形成。 感光性濃色組成物層形成製程 本製程係使用感光性濃色組成物在基板上形成感光性 〇 濃色組成物層。 在本製程能夠使用的基板，可舉出例如液晶顯示元件 等所使用的無鹼玻璃、鈉鈣玻璃、派勒斯（PYREX、註冊商 標）玻璃、石英玻璃及在該等黏附透明導電膜而成者，或固 體攝像元件等所使用的光電轉換元件基板、例如矽基板 等。而且亦可以使用塑膠基板。其中，從耐藥品性或耐熱 性之觀點，以無鹼玻璃爲佳。該等基板係首先以隔離各像 素的方式格子狀等地形成黑色矩陣，隨後在格子的敞開部 Q 分形成著色像素。 又，在該等基板上，亦可按照必要設置底塗層，用以 改良與上部的層之黏附、防止物質擴散或基板表面的平坦 化。基板係大型（大約1邊爲1公尺以上）時，更能夠達成 本發明的效果，乃是較佳。 又，在基板上形成感光性濃色組成物層之方法，有例 如藉由在基板上塗布感光性濃色組成物來賦予之方法。 基板上賦予感光性濃色組成物之方法，能夠應用狹縫 塗布（slit coating)、噴墨法、旋轉塗布、流延塗布（cast 200937050 coating)、輥塗布（r〇ii coating)、網版印刷法（screen printing) 等各種賦予方法。其中，從精確度及速度的觀點，以狹縫 塗布爲佳。在進行前述的各種塗布時，從塗布性提升的觀 點’在進行該等塗布之前，以使用紫外線或各種洗淨液洗 淨基板爲佳。 又，亦能夠應用將藉由上述的賦予方法預先在暫時支 撐體上賦予而形成的塗膜，轉印至基板上之方法。 關於轉印方法，在特開2006-23 696號公報的段落號碼 [0023]、 [0036]〜[0051]、或特開2006-47592號公報的段落 號碼[0096]〜[0108]所記載之製法亦可應用在本發明。 轉印時所使用的層壓機（laminator)能夠適合應用在 WO2006-4225公報的第24圖所記載之大型雙輥層壓機或 國際申請號碼JP2007/069 1 3 2號公報所記載之層壓機。藉 由使用該等層壓機，能夠得到高生產性。 在基板上賦予感光性濃色組成物時之厚度（例如，塗布 厚度）能夠藉由所形成黑色矩陣的厚度之設計値來適當地 調整，通常以0.2微米〜2.2微米爲佳，以〇.2微米〜1.6 微米爲更佳，以0.7〜1.3微米爲最佳。 曝光製程 曝光製程係將在前述感光性濃色組成物層形成製程所 形成的感光性濃色組成物層，透過規定的光罩圖案（mask pattern)進行曝光，來加以圖案化（patterning)(負型組成物 (negative composition)時係只有使被光照射的塗布膜部分 硬化）。在曝光時能夠使用的放射線，以使用g射線、h射 線、i射線、j射線或k射線等的紫外線爲特佳。照射量以 -10- 200937050 ^ 5〜500mJ/cm2爲佳，以ι〇〜300mJ/cm2爲更佳，以1〇〜 200mJ/cm2 爲最佳。 曝光機可使用接近（proximity)方式的曝光機，亦可使 用鏡面投影（mirror projection)方式的曝光機，又，亦可以 使用步進機（stepper)方式。 顯像製程 接著’藉由進行鹼性顯像處理，例如感光性濃色組成 物係負型時，能夠使上述曝光之光未照射部分溶出至鹼性 Φ 水溶液，而只有殘留經光硬化的部分。 顯像液能夠使用有機鹼性顯像液或無機鹼性顯像液或 其混合液。 顯像液所使用的鹼劑可舉出例如氫氧化鈉、氫氧化 鉀、碳酸鈉、碳酸氫鈉、砂酸鈉、偏砂酸鈉、氨水、乙胺、 二乙胺、二甲基乙醇胺、氫氧化四甲銨、氫氧化四乙銨、 膽驗（choline)、啦略（pyrrole)、脈陡（piperidine)、及 1,8-二氧雜環-[5.4·0]-7-十一嫌（l，8-diazabicylco-[5,4,0] -7-Q undecene)等的有機鹼性化合物，以將該等鹼劑以濃度爲 0.001〜10質量％、較佳是〇.〇1~1質量％的方式以純水稀釋 而成之鹼性水溶液作爲顯像液爲佳。又，使用由此種鹼性 水溶液所構成的顯像液時，通常係在顯像後使用純水洗淨 (rinse)。在此洗淨不足時，因爲未硬化的殘渣容易殘留且 容易產生不均，在本發明以進行高壓水洗者爲佳。 在本發明，於本顯像製程後且在後述的烘烤製程之 前，以底切長度爲- 2.0微米〜5.0微米的方式形成黑色矩陣 圖案。黑色矩陣的形狀特別是底切的形狀能夠藉由曝光、 -11- 200937050 顯像及後述的預烘烤的各條件來控制。因此，首先詳細地 說明底切。 在黑色矩陣的形成製程，將曝光後的感光性濃色組成 物層顯像時，與感光性濃色組成物層的表面（係未接觸基板 之面；以下，對黑色矩陣亦同樣地稱呼）及該表面附近的層 內部（以下，亦稱爲「感光性濃色組成物層上部」，對黑色 矩陣亦稱爲「黑色矩陣上部」）比較，感光性濃色組成物層 的背面（係指接觸基板之面；以下對黑色矩陣同樣地稱呼） 及該背面附近的層內部（以下，亦稱爲「感光性濃色組成物 層下部」，對黑色矩陣亦稱爲「黑色矩陣下部」）之顯像進 展較快。此時，感光性濃色組成物層下部係成爲挖空狀態， 將形成有感光性濃色組成物層（黑色矩陣）之基板，在黑色 矩陣的寬度方向切斷，如第1圖、2圖所示，感光性濃色 組成物層的形狀係成爲逆錐狀（reverse taper)。將此種狀態 稱爲具有底切狀態。 藉由在感光性濃色組成物層（黑色矩陣）設置底切，在 後面的製程，在形成有黑色矩陣之基板（以下，亦稱爲「黑 色矩陣基板」）的上面塗布感光性著色組成物來設置著色像 素時，能夠使黑色矩陣與著色像素的邊界部分不容易隆 起。藉此，製造彩色濾光片並使其顯示影像時，能夠抑制 液晶配向混亂或漏光，能夠得到高品質的影像。 以下，使用圖示更詳細地說明底切。 第1圖及第2圖係顯示在黑色矩陣（感光性濃色組成物 層）設置有底切的狀態之黑色矩陣基板之剖面圖。 如第1圖所示，感光性濃色組成物層4的寬度方向之 •12- 200937050 - 一端P與感光性濃色組成物層4下部之中，感光性濃色組 成物層4係挖空而成爲無感光性濃色組成物的部分’底切 長度a係求取從前述一端P至前述寬度方向最遠部分Q之 間的距離。從前述一端P至前述寬度方向最遠部分未限定 係如第1圖所示之感光性濃色組成物層4表面與基板2之 接點。如第2圖所示，感光性濃色組成物層4的厚度方向 之上端（表面）與下端（底面）之間的中間部分被挖空時，從前 述一端P至感光性濃色組成物層4之中具有被挖空部分’ φ 底切長度a係從前述一端P至前述寬度方向最遠部分R之 距離。 又，與上述底切的形成相反地，在顯像進行過程的較 早時期，厚度方向下端的顯像進行與上端比較，會有較慢 之情形。此時，感光性濃色組成物層下部係比感光性濃色 組成物層上部突出之狀態，感光性濃色組成物層下部係呈 現比感光性濃色組成物層上部突出的狀態，將形成有感光 性濃色組成物層（黑色矩陣）之基板在黑色矩陣的寬度方向 Q 切斷時，感光性濃色組成物層的形狀爲錐狀（正台形狀）。 在本發明，將此種感光性濃色組成物層下部在比感光 性濃色組成物層上部的一端往前述寬度方向一端突出之狀 態定義爲底切爲負（-)。又，負的底切之長度係感光性濃色 組成物層之中從感光性濃色組成物層上部的寬度方向一端 突出之部分，係從前述一端至前述寬度方向最遠離部分之 距離。 從使線寬及底切的顯像溫度依存性較小之觀點，底切 的長度以- 2.0微米〜5.0微米爲佳，以- 2.0微米〜4.0微米 -13- 200937050 爲更佳，以-1.5微米〜3.0微米爲最佳。 爲了精確度良好地形成黑色矩陣’適當地調整曝光及/ 或顯像條件係重要的，特別是藉由使顯像條件變化，能夠 調整線寬及底切長度。槪念性地藉由比通常經常使用之顯 像條件稍微較強的條件進行顯像時，能夠增大底切量（底切 的長度）。但是較强的顯像條件下時，亦即藉由稍微地變動 製程條件，會有底切量產生大幅度變化之情形。又，顯像 條件進而往較強的方向變時，較容易產生缺損。因此，必 須將曝光及/或顯像條件設定在更安定的方向。 說明本發明的彩色濾光片之製造方法之較佳曝光條 件。若只有感光性濃色組成物層（例如黑色光阻（black resist) 層）的表面硬化時，會有藉由控制顯像條件來控制底切量變 爲不安定之情形。因此，相對於i射線、h射線及/或g射 線，以將j射線及/或k射線的比率降低至不會對層整體的 硬化度造成不良影響之程度爲佳。 接著，說明較佳顯像條件。因爲底切部分的形成對顯 像條件、特別是液溫（顯像液的溫度）、液濃度（顯像液的濃 度）及疲勞度之感受性高’以使用將液溫、液濃度及液疲勞 度保持一定之顯像系統爲佳。 將液濃度及液疲勞度保持一定之方法，可舉出例如邊 監視液濃度邊自動地補充新液或補充液之方法；或是每一 定時間或是每處理一定片數時補充新液或補充液之方法。 又’爲了抑制溫度變化’液溫以設定爲接近周圍的環境溫 度之溫度爲佳。具體上，以20 °C〜30 6C爲佳，以21。(：〜27 °C爲更佳，以2 2 °C〜2 5 °C爲特佳。 200937050 又，從防止感光性濃色組成物層（例如’黑色矩陣）的 缺損而言，在洗淨時之噴淋壓力以0.01 MPa〜0.5 MPa爲 佳，以 0.05MPa 〜0.4MPa 爲較佳，以 〇_〇5MPa 〜0.3MPa 爲 更佳。 烘烤製程 接著，對黑色矩陣施加所謂的烘烤處理（後烘烤）。烘 烤係顯像後的加熱處理，用以使感光性濃色組成物的硬化 完全，通常係進行150 °C〜260 °C的熱硬化處理。 〇 * 烘烤溫度以150°c〜260°C爲佳，以180°C〜260°c爲更 佳，以200 °C〜250°C爲最佳。烘烤時間以1〇分鐘〜150分 鐘爲佳，以20分鐘〜90分鐘爲更佳，以20分鐘〜60分鐘 爲最佳。 藉由在上述條件範圍烘烤感光性濃色組成物層，在形 成有黑色矩陣之基板上形成著色像素時，能夠抑制黑色矩 陣與著色像素之重疊部的*** 烘烤處理能夠藉由將顯像後的感光性濃色組成物層， 〇 以成爲上述條件的方式使用熱板（hotplate)、對流式烘箱 (convection oven)(熱風循環式乾燥機）、或高頻加熱機等加 工手法並以連續式或分批（batch)式進行。 其他的製程 在本發明之黑色矩陣形成製程亦可進而在述感光性濃 色組成物層形成製程之後且在前述曝光製程之前，增加預 烘烤製程，亦可在前述顯像製程後且前述烘烤（後烘焙）製 程前，按照必要含有藉由曝光來使所形成的黑色矩陣硬化 之製程》 -15- 200937050 感光性濃色組成物層的預烘烤溫度以60 °C〜140 °C爲 佳，以8 0 °C〜1 2 0 °C爲更佳。烘烤時間以3 0秒〜3 0 0秒爲 佳，以80秒〜200秒爲更佳。 著色圖案形成製程 在本發明，著色圖案形成製程係至少在形成有烘烤後 的感光性濃色組成物層（黑色矩陣）之基板上，使用感光性 著色組成物形成感光性著色組成物層（感光性著色組成物 層形成製程），並將前述感光性著色組成物層曝光（著色組 成物層曝光製程），且將曝光後的前述感光性著色組成物層 顯像（著色層顯像製程），而且藉由將顯像後的前述感光性 著色組成物層烘烤（著色層烘烤製程），且以在該烘烤後之 前述黑色矩陣與前述著色圖案重疊的重疊部在黑色矩陣i 度方向之長度爲2.0微米〜9.0微米的方式來形成著色圖 案。 在本發明，從抑制重疊部分的***之觀點，感光性濃 色組成物層的層厚度以較薄爲佳。具體上，以1.8微米〜 2.8微米爲佳，以1.8微米〜2.5微米爲更佳。 著色圖案形成製程係除了上述各製程以外，亦可按照 必要設置預烘烤製程等其他的製程。 首先，說明前述「重疊」。 重疊 在形成有黑色矩陣之基板上，將感光性著色組成物塗 布等來形成著色圖案（著色像素）時，通常是以在黑色矩陣 與著色像素之間不產生間隙的方式且以感光性著色組成物 與黑色矩陣係重疊的方式使感光性著色組成物若干被覆 -16- 200937050 (使重疊）在黑色矩陣來形成著色圖案。在本發明，除了前 述的底切以外，亦加上藉由將重疊部的長度調整爲2.0微 米〜9.0微米來得到高品質的彩色濾光片或液晶顯示裝置。 前述「重疊部的長度」係指使用感光性濃色組成物層 所形成的著色圖案與黑色矩陣重疊之重疊部在黑色矩陣寬 度方向之長度。使用圖示對其更詳細地說明。 第3圖係在形成有黑色矩陣4之基板2上，將感光性 著色組成物塗布等來形成感光性著色組成物層6，並顯示 〇 形成有黑色矩陣4與感光性著色組成物層6重疊之重疊部 8的狀態之彩色濾光片的部分剖面圖。在此，重疊部8係 長度b的區域，重疊部8的長度b能夠求取在黑色矩陣4 的寬度方向之與感光性著色組成物層6面對側的最外端 S，與以重疊於黑色矩陣4的寬度方向的方式設置而成之感 光性著色組成物層6在黑色矩陣4上的位置的最外端T之 間在黑色矩陣4的寬度方向之距離（長度）。 實際上，求取重疊部8的長度b時，能夠藉由在與黑 〇 色矩陣4圖案之長度方向垂直的方向切割彩色濾光片，並 測定其剖面來求取。 在本發明，從減小重疊部的***（較佳是0.50微米以 下）之觀點，前述重疊部的長度爲2.0〜9·0微米，以2,0〜 8.0微米爲更佳，以2.0〜7.0微米爲最佳。 又，藉由使前述重疊部的長度爲9.0微米以下，在大 型基板（1邊1公尺以上），能夠穩定地製造彩色濾光片及顯 示裝置。 重疊的長度能夠藉由改變感光性著色組成物層的曝光 -17- 200937050 圖案位置或顯像條件來調整。具體上，使曝光圖案與黑色 矩陣的重疊量越少時能夠使重疊的重疊量越少，使顯像條 件越弱、例如使顯像溫度越低或使顯像時間越短，能夠增 加重疊量。 更具體地，爲了使前述重疊部的長度爲2.0〜9.0微 米，曝光圖案與黑色矩陣重疊部分在黑色短陣的密度方向 之長度以2.0〜9.0微米爲佳。又，顯像溫度以20〜35 °C爲 佳，以21〜30°C爲更佳，以22〜26°C爲最佳。而且，顯像 時間以2 0秒〜1 2 0秒爲佳，以2 5秒〜8 0秒爲更佳，以3 5 秒〜75秒爲最佳。 上述各條件的較佳組合係使曝光圖案與黑色矩陣之重 疊部分的長度爲2.0微米〜9.0微米，以使顯像溫度爲20 °C〜3 5°C，而且使顯像時間爲20秒〜120秒之組合爲佳。 更佳組合係使曝光圖案與黑色矩陣之重疊部分的長度 爲2.0微米〜8.0微米，使顯像溫度爲21 °C〜30 °C，而且使 顯像時間爲2 5秒〜8 0秒之組合。 最佳組合係曝光圖案與黑色矩陣之重疊部分的長度爲 2.0微米〜7.0微米，使顯像溫度爲22 °C〜26 °C，而且使顯 像時間爲3 5秒〜7 5秒之組合。 如上述，在黑色矩陣與感光性著色組成物層之重疊 部，因爲係以感光性著色組成物係以黑色矩陣與感光性著 色組成物層一部分重疊的方式覆蓋於黑色矩陣，所以該部 分係呈***狀態。藉由減小該重疊部的***程度，能夠抑 制液晶配向的混亂或漏光，能夠得到高品質的影像。使用 圖示說明重疊部的***。 200937050 ^ 第4圖係在形成有黑色矩陣4之基板2上，將感光性 著色組成物塗布等來形成感光性著色組成物層，並進行曝 光、顯像等而作爲著色圖案6,在黑色矩陣4與著色圖案6 重疊的重疊部8產生***的狀態之彩色濾光片的部分剖面 圖。 前述「重疊部的***程度」，更詳細地係指著色圖案6 的表面之中，離前述重疊部8的基板2表面（基板2之與黑 色矩陣4或著色圖案6接觸的面）之最遠部分、與前述重疊 Ο 部8以外的平坦表面部分之間在基板法線之距離。換言 之，前述「重疊部的***程度」係指基板2表面與著色圖 案6的表面之中，重疊部8離基板2表面最遠部分之間在 基板法線之距離c，減去基板2表面與著色圖案6的表面 之中，重疊部8以外的部分之間在基板法線之距離d而成 的距離e。 以下，爲了方便將前述重疊部的***稱爲「角部 (horn)」，將前述距離e稱爲「角部的高度」。爲了得高品質 〇 的影像，角部的高度以0.5微米以下爲佳，以0.4微米以下 爲更佳，以〇·3微米以下爲最佳。 角部的高度能夠藉由適當地設定上述底切長度、重疊 部的長度及黑色矩陣的厚度來調整。 前述底切長度、重疊部的長度及黑色矩陣的厚度之較 佳組合，係以底切長度爲- 2.0微米〜5.0微米，重叠部的長 度爲2.0微米〜9.0微米，且黑色矩陣的厚度爲0.2微米〜 2.2微米爲佳。 更佳組合爲底切長度爲- 2.0微米〜4.0微米，重疊部的 -19- 200937050 長度爲2.0微米〜8.0微米，而且黑色矩陣的厚度爲0.2〜 1.6微米。 最佳組合爲底切長度爲-1.5微米〜3.0微米，重疊部的 長度爲2.0微米〜7.0微米，而且黑色矩陣的厚度爲0.7〜 1 .3微米。 接著，敘述在本發明之著色圖案形成製程所進行的各 種製程。 感光性著色組成物層形成製程 感光性著色組成物層形成製程係在形成有烘烤後的感 ^ 〇 光性濃色組成物層（黑色矩陣）之基板上，使用感光性著色 組成物形成感光性著色組成物層。 在形成有黑色矩陣之基板上形成感光性著色組成物層 之方法能夠使用與在基板上形成感光性濃色組成物層之方 法同樣的方法、亦即塗布方法或轉印方法。 其中，就達成本發明的效果而言，以使用狹縫塗布器 等在形成有黑色矩陣之基板前面，塗布感光性著色組成物 方法爲佳。 ◎ 爲了得到充分的再現區域且得到充分的面板亮度，感 光性著色組成物層的層厚度以0.5微米〜3.0微米爲佳，以 1.0微米〜2.5微米的範圍爲更佳。 著色層曝光製程 著色層曝光製程係將前述感光性著色組成物層曝光。 感光性著色組成物層的曝光處理能夠與感光性濃色組 成物層的曝光製程同樣地進行。形成複數顏色的著色圖案 時’能夠透過各色規定的光罩圖案（mask pattern)對各色每 -20- 200937050 ' 個曝光，來將被光照射過之各色的感光性著色組成物層圖 案化（patterning)(負型組成物（negative composition)時係 只有將被光照射的位置硬化）。 著色層顯像製程 著色層顯像製程係將曝光後的前述感光性著色組成物 層顯像。 曝光後的感光性著色組成物層之顯像處理能夠進行與 在感光性濃色組成物層的顯像製程的說明所記載之操作同 〇 樣的操作，且能夠適合使用在前述顯像製程說明過之顯像 液。 爲了調整在黑色矩陣與著色像素之重疊部所產生重疊 部的長度及角部高度，顯像條件以使用在前述重疊部的說 明所記載之顯像條件來將感光性著色組成物層顯像爲佳。 著色層烘烤製程 著色層烘烤製程係烘烤顯像後的前述感光性著色組成 物層。 @ 烘烤顯像後的前述感光性著色組成物層之方法，能夠 使用與烘烤前述的感光性濃色組成物層之烘烤製程同樣的 方法。 在形成RGB(Red、Green、Blue)3色相等複數色相的著 色圖案時，可按照需要色相數目重複進行感光性著色組成 物層的形成、曝光、顯像及烘烤之循環’亦可各色相每個 形成感光性著色組成物層，並進行曝光及顯像後，最後全 部色相彙總進行烘烤。藉此’能夠製造具備由黑色矩陣及 需要色相所構成的著色像素之彩色濾光片。 -21 - 200937050 其他的製程 在著色圖案形成製程，在感光性著色組成物層形成製 程後且著色層曝光製程之前，亦可設置預烘烤感光性著色 組成物層之製程（著色層預烘烤製程），用以使感光性著色 組成物乾燥。 感光性著色組成物層的預烘烤溫度以6 (TC〜1 4 0 °C爲 佳，以80°C〜120°C爲更佳。預烘烤時間以30秒〜3 00秒 爲佳，以80秒〜20 0秒爲更佳。 接著，詳細地說明本發明的彩色濾光片之製造所使用 的感光性著色組成物及感光性濃色組成物。 感光性著色組成物 作爲本發明的彩色濾光片之著色圖案形成用所使用的 感光性著色組成物係感放射線性組成物（例如，負型時係藉 由光而硬化之感放射線性組成物），以含有（A-1)著色劑、（B) 黏合劑聚合物、（C-1)聚合性化合物、（D)光聚合引發劑及（E) 溶劑爲佳，亦可按照需要更含有高分子分散劑或界面活性 劑等其他的添加物。 在本發明，用以形成著色圖案之感光性著色組成物的 物性，係以能夠抑制與所形成的黑色矩陣重疊部分的厚度 之方法調整爲佳。例如以液黏度較低者爲佳，又，以在乾 燥製程時之液體的流動性高者爲佳。 (A-1)著色劑 著色劑能夠適當地選自染料，顏料。作爲著色劑所使 用的顏料可以是無機顔料，亦可以是有機顏料，考慮高透 射率較佳時，以盡可能使用粒子尺寸較小者爲佳。平均粒 -22- 200937050 ' 子尺 的範 物， 小時 能夠 機顏 物。 ❹ 鋅、 93、 15 5 176 ❹ 60、 15 1 寸以10奈米〜100奈米爲佳，以在10奈米〜50奈米 圍爲更佳。因爲在本發明所使用的感光性著色組成 藉由使用後述的高分子分散劑，即便著色劑的尺寸較 顏料分散性、分散安定性亦良好，即便膜厚度較薄亦 形成色純度優良的著色像素。 著色圖案（著色像素）形成用的著色劑，能夠使用的無 料可舉出金屬氧化物、金屬錯合物等所示之金屬化合 具體上可舉出鐵、鈷、鋁 '鎘、鉛、銅、鈦、鎂、鉻、 銻等金屬氧化物及前述金屬的複合氧化物等。 又，有機顏料可舉出例如 C.I.顏料黃（C.I.PigmentYellow)ll、24、31、53、83、 99、108、109、110、138、139、147、150、151、154、 、167、 180、 185、 199 ； C.I.顏料橙 36、38、43、71; C.I.顏料紅 81、105、122、149、150、155、171、175、 、177 、 209 、 220 、 224 、 242 &gt; 254 、 255 、 264 、 270 ； C.I.顏料紫 19、23、32、37、39; C.I.顔料藍 1、2、15、15: 1、15: 3、15: 6、16、22、 66 ； C.I.顏料綠 7、36、37 ; C.I.顏料棕 25、28; C.I.顏料黑1等。 在本發明，沒有特別限定，以下述的顏料爲佳。 C.I.顏料黃 11、24、108、109、110、138、139、150、 、154' 167、 180、 185； -23- 200937050 C.I.顔料檀 36、71; 171、175、177、209、224、242、 C.1·顔料紅 1 22、1 5〇 254 、 255 、 264 ； C.I.顏料紫 19、23、37 ; 22 、 60 ' 66 ； C.I.顏料藍 15: i、is: 3、is: C.I.顏料綠 7、36、37 ; 此等有機顏料可單獨或是組合各種使用來提高色純 度。組合的具體例如以下所示。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a color filter, a method of manufacturing the same, and a liquid crystal display device. [Prior Art] In a liquid crystal display (LCD) or a solid-state imaging device, a color filter is an indispensable component. For example, liquid crystal displays are increasingly being used as televisions, and color filters for liquid crystal displays are required to have higher quality than color filters for previous laptop computers and monitors. The quality of the picture. Moreover, in order to produce a large TV, the size of the substrate is enlarged, and the requirements for increasing the yield and reducing the cost are gradually increased. When the color filter is manufactured, when the color filter is manufactured, the boundary between the black matrix and the colored pixel is caused by the coloring pattern bulging and the color filter is not flat, resulting in deterioration of image quality. Question (refer to Japanese Patent Publication No. 9-113721). The bulging of the aforementioned boundary portion may cause problems such as contrast reduction or color unevenness. Therefore, it has previously been responded to by honing the surface of the color filter or forming an overcoat layer on the pixel after the pixel is formed (hereinafter, there will be a case called "〇C layer"). However, when the honing or OC layer is formed, the process of the color filter is increased and the cost is increased. Further, there is a disadvantage that the color filter is scratched during honing. Therefore, a method capable of omitting the honing process and/or the OC layer forming process is required. In this regard, there has been attempted to solve the problem of the bulging of the boundary portion by reducing the taper angle of the black matrix (for example, see Japanese Patent Laid-Open Publication No. Hei. No. Hei. No. Hei. No. Hei. No. 2003-161826). Japanese Laid-Open Patent Publication No. 2003-161826 discloses only a coloring composition in a black matrix frame by an inkjet method. However, in the method described in Japanese Laid-Open Patent Publication No. Hei 9- 1 1 3 72 No., in order to obtain a black matrix having the above-described taper angle, the process is increased by applying a photosensitive color composition for a color filter on a substrate. After drying, a positive resist is applied, and the development speed ratio of the photosensitive rich composition to the positive photoresist is adjusted. Further, when the undercut length is increased in order to reduce the taper angle, the development condition dependency of the undercut at the time of development becomes large, and conversely, when the undercut does not become excessive, the line of the black matrix The condition of wide imaging conditions becomes larger, and in either case, there is a problem that it is difficult to stabilize production. Further, the effect of suppressing the ridge of the colored pattern is insufficient when the taper angle is adjusted. Moreover, this technology cannot accommodate large substrates of 1 m x 1 m or more. On the other hand, in the case of the inkjet method, the colored composition is applied to the substrate to form a colored pattern, and it is not suitable for suppressing formation of a colored pattern by application, transfer, or the like of the colored composition. The colored pattern generated by the overlap of the black matrix and the colored pattern is raised. Rather, the black matrix is higher than the colored pixels in the boundary portion of the black matrix and the colored pixels, and a step is generated, so that the color filter is not flat, and similarly, there is a problem that the image quality is deteriorated. SUMMARY OF THE INVENTION [Problems to be Solved by the Invention] In view of the above circumstances, an object of the present invention is to provide a color filter 200937050, a method of manufacturing the same, and a liquid crystal display device capable of being low-cost and simple. According to the method, it is possible to suppress the swell of the coloring pattern at the boundary portion between the black matrix and the colored pixels without adding a honing or setting process such as the OC layer, thereby obtaining a high-quality image. [Means for Solving the Problem] The specific means for achieving the above problems are as follows. &lt;1&gt; A method for producing a color filter, which has the following process: a black matrix forming process for forming a photosensitive dense color composition layer on a base plate using a photosensitive rich color composition, and sensitizing the foregoing The concentrated color composition layer is exposed, and the exposed photosensitive color composition layer is exposed to form a black matrix having an undercut, wherein the undercut length is -2.0 μm in the width direction of the black matrix. 5.0 micron, and comprising forming a black matrix by baking a black matrix pattern; and forming the coloring pattern by forming a photosensitive coloring composition on the substrate on which the baked black matrix is formed Photosensitively coloring the composition layer, exposing the photosensitive coloring composition layer, developing the photosensitive coloring composition layer after the ruthenium exposure, and baking the photosensitive coloring composition layer after development The coloring pattern is formed. Here, the overlapping portion of the colored pattern after baking and the black matrix overlaps has a length in the width direction of the black matrix of 2.0 to 9·0 μm. &lt;2&gt; <1> The method of producing a color filter according to the above aspect, wherein the photosensitive green color composition layer formed on the substrate has a thickness of 0.2 μm to 2.2 μm. &lt;3&gt;&lt;1&gt; The method of manufacturing a color filter, wherein the development of the black matrix forming process is performed, and the development temperature is 20T: 〜3 (TC. 200937050) &lt;4&gt; <1> The method of producing a color filter according to the above aspect, wherein the black matrix-forming process is performed after the photosensitive rich color composition layer forming process, and further includes pre-baking before the exposure process. &lt;5&gt;&lt;4&gt; The method of producing a color filter, wherein the prebaking temperature in the prebaking process is 60 ° C to 140 ° C. &lt;6&gt;&lt;4&gt; The method of producing a color filter, wherein the prebaking time in the prebaking process is from 30 seconds to 300 seconds. &lt;7 &gt;&lt;1&gt; The method of producing a color filter, wherein the layer thickness of the photosensitive coloring composition layer is from 1.8 μm to 2.8 μm. 0 &lt;8&gt; <1> The method of producing a color filter according to the above aspect, wherein the exposure in the coloring pattern forming process is performed by exposure through a mask pattern, and the length of the overlapping portion of the exposure pattern and the black matrix in the width direction of the black matrix is 2.0 microns to 9.0 microns. &lt;9&gt;&lt;8&gt; The method for producing a color filter, wherein the development of the coloring pattern forming process is performed at a developing temperature of 20 ° C to 35 ° C and a developing time of 20 seconds to 120 seconds. &lt;10&gt;&lt;8&gt; The method of manufacturing a color filter, wherein the coloring pattern 0 is formed in a process, and the overlapping portion of the exposure pattern and the black matrix has a length of 2.0 μm to 8.0 μm in the width direction of the black matrix, and the developing temperature is the same It is 21 ° C to 30 ° C, and the aforementioned development time is 25 to 80 seconds. &lt;11&gt;&lt;8&gt; The method of producing a color filter, wherein the overlapping portion has a length in the width direction of the black matrix of 2.0 μm to 7.0 μm, and the developing temperature is 22 ° C to 26 ° C, and the aforementioned developing time It is 35 seconds to 75 seconds. &lt;12&gt; - a color filter, &lt;1&gt;~ The color filter manufactured by the method for producing a color filter according to any one of the preceding claims, wherein the color filter has a superimposed portion in which the black matrix overlaps with the 200937050 colored pattern, and the length of the overlapping portion in the width direction of the black matrix is 2.0 microns to 9.0 microns. &lt;13&gt; The color filter of the above-mentioned coloring pattern, wherein a distance between a portion of the overlapping portion farthest from the substrate surface and a portion other than the overlapping portion in the normal direction of the substrate is 0.50 μm. the following. &lt;14&gt; A liquid crystal display device comprising &lt;12&gt; color filter. &lt;15&gt; - A liquid crystal display device having &lt;13&gt; color filter. [Effects of the Invention] According to the present invention, it is possible to provide a color filter, a method of manufacturing the same, and a liquid crystal display device which can be manufactured by a low-cost and simple method without additional honing or setting of an OC layer or the like. The process can suppress the swell of the color pattern in the boundary portion between the black matrix and the colored pixel to obtain a high-quality image. [Embodiment] [Best Mode for Carrying Out the Invention] Hereinafter, a color filter of the present invention, a method for producing the same, and a method for producing a color filter of a Q liquid crystal display device will be described in detail. The black matrix forming process and the color pattern forming process are further provided, and other processes such as a protective layer forming process, a liquid crystal alignment assisting pattern forming process, and a column spacer forming process may be further provided as necessary. In any of the processes, a film is formed on the glass substrate, and the photosensitive substrate can be formed by applying a photosensitive composition liquid to the glass substrate, or by applying the photosensitive composition liquid to the temporary support and transferring the film to the glass substrate. 200937050 Hereinafter, the black matrix forming process and the color pattern forming process will be separately described. In the present invention, the black matrix forming process is formed on the substrate by using at least a photosensitive rich color composition to form a photosensitive concentrated color composition layer (photosensitive concentrated color composition layer forming process), and the photosensitive property is concentrated. The color composition layer is exposed (exposure process), and the exposed photosensitive color composition layer after the exposure is developed (developing process) to form an undercut length in the width direction of the black matrix of -2.0 μm to 5.0. A black matrix pattern of micrometers, and a black matrix is formed by baking (baking process) the formed black matrix pattern. The black matrix forming process can be set in addition to the above processes, and other processes can be set as necessary. Black matrix In the present invention, the optical density (OD値) of the black matrix is preferably 2.0 to 8.0, more preferably 2.5 to 8.0, and even more preferably 3.5 to 6.0. When the optical density is 2.0 or more, the deterioration of the display quality of the display device such as the contrast reduction can be suppressed. Moreover, the term "optical concentration" as used herein refers to the ISO Visual transmission optical density. The measuring device which can be used for measuring the ISO visual transmission optical density is, for example, X-Rite 361T (V) of Sakata INXENG Co., Ltd. (S AKATA INX ENG. C0., Ltd.). Further, the line width of the black matrix (the length between the coloring patterns and the direction orthogonal to the longitudinal direction of the black matrix) is 5 μm to 30 μm, and the viewpoint of ensuring the brightness by the high aperture ratio is good. From the viewpoint of reducing the ridge of the overlapping portion of the black matrix and the colored pattern (preferably 0.50 μm or less) of 200937050*, the thickness of the black matrix (the length of the black matrix in the normal direction of the substrate) is preferably 0.2 μm to 2.0 μm. It is preferably 0.2 to 1.6 μm, more preferably 0.7 to 1.3 μm. In this thickness range, it is possible to appropriately maintain the unevenness of the substrate on which the black matrix is provided, that is, the formation region of the black matrix and the step of the non-formation region, and after forming the black matrix, a color pattern such as RGB is formed thereon (coloring) The pixel can also be formed with high precision. Photosensitive thick color composition layer forming process This process uses a photosensitive rich color composition to form a photosensitive 〇 dense color composition layer on a substrate. Examples of the substrate that can be used in the present process include an alkali-free glass, a soda-lime glass, a Pyrex (registered trademark) glass, a quartz glass, and the like, which are used in a liquid crystal display element. A photoelectric conversion element substrate used in a solid-state imaging device or the like, for example, a germanium substrate or the like. Plastic substrates can also be used. Among them, alkali-free glass is preferred from the viewpoint of chemical resistance or heat resistance. In the substrate, a black matrix is first formed in a lattice shape or the like so as to isolate the pixels, and then colored pixels are formed in the open portion Q of the lattice. Further, on the substrates, an undercoat layer may be provided as necessary to improve adhesion to the upper layer, prevent diffusion of substances, or planarize the surface of the substrate. When the substrate is large (about 1 meter or more on one side), the effect of the present invention can be further achieved, which is preferable. Further, a method of forming a photosensitive rich color composition layer on a substrate is, for example, a method of applying a photosensitive rich color composition on a substrate. A method of applying a photosensitive rich color composition on a substrate can be applied by slit coating, inkjet method, spin coating, cast coating (cast 200937050 coating), roll coating (r〇ii coating), screen printing. Various methods of imparting such as screen printing. Among them, slit coating is preferred from the viewpoint of accuracy and speed. In the case of performing the above various coatings, it is preferable to wash the substrate with ultraviolet rays or various cleaning liquids before the coating is carried out from the viewpoint of improving the coating property. Further, a method of transferring the coating film formed on the temporary support by the above-described application method to the substrate can be applied. The transfer method is described in paragraph numbers [0023], [0036] to [0051] of JP-A-2006-23696, and paragraph numbers [0096] to [0108] of JP-A-2006-47592. The method of manufacture can also be applied to the present invention. The laminator used for the transfer can be suitably applied to the lamination described in the large-sized two-roll laminator described in the 24th drawing of WO2006-4225 or the international application number JP2007/069 1 3 2 . machine. By using these laminating machines, high productivity can be obtained. The thickness (for example, the coating thickness) when the photosensitive concentrated composition is applied to the substrate can be appropriately adjusted by the design of the thickness of the formed black matrix, and is usually 0.2 μm to 2.2 μm, preferably 〇.2. Micron to 1.6 micron is more preferred, and 0.7 to 1.3 micron is preferred. The exposure process exposure process performs patterning by exposing a photosensitive rich color composition layer formed in the photosensitive rich color composition layer forming process to a predetermined mask pattern (negative) In the case of a negative composition, only the coating film partially irradiated with light is hardened. It is particularly preferable to use ultraviolet rays such as g-rays, h-rays, i-rays, j-rays, or k-rays for radiation that can be used during exposure. The irradiation amount is preferably -10-200937050^5~500mJ/cm2, more preferably ι〇~300mJ/cm2, and most preferably 1〇~200mJ/cm2. The exposure machine can use a proximity type exposure machine, a mirror projection type exposure machine, or a stepper method. The developing process is followed by 'basic development processing, for example, when the photosensitive rich color composition is negative, the exposed portion of the exposed light can be eluted to the alkaline Φ aqueous solution, and only the photohardened portion remains. . The developing solution can use an organic alkaline developing solution or an inorganic alkaline developing solution or a mixture thereof. The alkali agent used in the developing solution may, for example, be sodium hydroxide, potassium hydroxide, sodium carbonate, sodium hydrogencarbonate, sodium silicate, sodium metasilicate, aqueous ammonia, ethylamine, diethylamine or dimethylethanolamine. Tetramethylammonium hydroxide, tetraethylammonium hydroxide, choline, pyrrole, piperidine, and 1,8-dioxane-[5.4·0]-7- An organic basic compound such as (l,8-diazabicylco-[5,4,0] -7-Q undecene) is used, and the concentration of the alkaline agent is 0.001 to 10% by mass, preferably 〇.〇1 An alkaline aqueous solution diluted with pure water in a form of ~1% by mass is preferred as the developing solution. Further, when a developing solution composed of such an alkaline aqueous solution is used, it is usually washed with pure water after development. When the cleaning is insufficient, the unhardened residue tends to remain and the unevenness is likely to occur. In the present invention, it is preferred to carry out high-pressure water washing. In the present invention, after the present developing process and before the baking process described later, a black matrix pattern is formed in such a manner that the undercut length is -2.0 μm to 5.0 μm. The shape of the black matrix, particularly the shape of the undercut, can be controlled by exposure, -11-200937050 development, and various conditions of prebaking described later. Therefore, the undercut is first explained in detail. In the black matrix forming process, when the photosensitive photosensitive color composition layer after exposure is developed, the surface of the photosensitive dense color composition layer (the surface which is not in contact with the substrate; hereinafter, the same applies to the black matrix) And the inside of the layer near the surface (hereinafter, also referred to as "the upper portion of the photosensitive rich color composition layer", and the black matrix is also referred to as the "black matrix upper portion"), and the back side of the photosensitive dense color composition layer The surface of the substrate is referred to below; the black matrix is similarly referred to below) and the inside of the layer near the back surface (hereinafter also referred to as "the lower portion of the photosensitive rich color layer", and the black matrix is also referred to as the "black matrix lower portion"). The development progressed faster. At this time, the lower portion of the photosensitive rich color composition layer is in a hollow state, and the substrate on which the photosensitive rich color composition layer (black matrix) is formed is cut in the width direction of the black matrix, as shown in FIGS. 1 and 2 As shown, the shape of the photosensitive rich color composition layer is a reverse taper. This state is referred to as having an undercut state. By providing an undercut in the photosensitive dense color composition layer (black matrix), a photosensitive coloring composition is applied onto the upper surface of the substrate on which the black matrix is formed (hereinafter also referred to as "black matrix substrate"). When the colored pixels are set, the boundary portion between the black matrix and the colored pixels can be prevented from being easily swelled. As a result, when a color filter is manufactured and an image is displayed, it is possible to suppress liquid crystal alignment disorder or light leakage, and to obtain a high-quality image. Hereinafter, the undercut will be described in more detail using the drawings. Fig. 1 and Fig. 2 are cross-sectional views showing a black matrix substrate in which a black matrix (photosensitive concentrated composition layer) is provided with an undercut. As shown in Fig. 1, in the width direction of the photosensitive rich color composition layer 4, 12-200937050 - the one end P and the lower portion of the photosensitive rich color composition layer 4, the photosensitive dense color composition layer 4 is hollowed out On the other hand, the portion "the undercut length a" of the non-photosensitive concentrated color composition is obtained from the one end P to the farthest portion Q in the width direction. The farthest portion from the one end P to the width direction is not limited to the contact point between the surface of the photosensitive rich color composition layer 4 shown in Fig. 1 and the substrate 2. As shown in Fig. 2, when the intermediate portion between the upper end (surface) and the lower end (bottom surface) in the thickness direction of the photosensitive rich color composition layer 4 is hollowed out, from the one end P to the photosensitive rich color composition layer 4 has a hollowed out portion 'φ undercut length a from the one end P to the farthest portion R in the width direction. Further, contrary to the formation of the undercut, the development of the lower end in the thickness direction is slower than that of the upper end at an early stage of the development process. At this time, the lower portion of the photosensitive rich color composition layer is protruded from the upper portion of the photosensitive rich color composition layer, and the lower portion of the photosensitive rich color composition layer is in a state of being protruded from the upper portion of the photosensitive rich color composition layer, and is formed. When the substrate having the photosensitive rich color composition layer (black matrix) is cut in the width direction Q of the black matrix, the shape of the photosensitive rich color composition layer is tapered (stationary shape). In the present invention, a state in which the lower portion of the photosensitive rich color composition layer protrudes toward one end in the width direction from one end of the upper portion of the photosensitive rich color composition layer is defined as a negative (-) undercut. Further, the length of the negative undercut is a portion of the photosensitive rich color composition layer which protrudes from one end in the width direction of the upper portion of the photosensitive rich color composition layer, and is a distance from the one end to the farthest portion in the width direction. From the viewpoint of making the line width and undercut image temperature dependence small, the length of the undercut is preferably -2.0 μm to 5.0 μm, and more preferably -2.0 μm to 4.0 μm to 13-200937050, and -1.5. Micron ~ 3.0 microns is optimal. It is important to appropriately adjust the exposure and/or development conditions in order to accurately form the black matrix. In particular, by changing the development conditions, the line width and the undercut length can be adjusted. It is possible to increase the amount of undercut (the length of the undercut) by fascinatingly developing the image under conditions which are slightly stronger than the usual imaging conditions. However, under strong development conditions, that is, by slightly changing the process conditions, there is a case where the amount of undercut changes greatly. Further, when the development condition is further changed to a stronger direction, the defect is more likely to occur. Therefore, the exposure and/or development conditions must be set in a more stable direction. Preferred exposure conditions for the method of producing a color filter of the present invention will be described. If only the surface of the photosensitive concentrated composition layer (for example, a black resist layer) is hardened, there is a case where the undercut amount is controlled to be unstable by controlling the development conditions. Therefore, it is preferable to reduce the ratio of the j-ray and/or the k-ray to an extent that does not adversely affect the degree of hardening of the entire layer with respect to the i-ray, the h-ray, and/or the g-ray. Next, preferred development conditions will be described. Because the formation of the undercut portion is highly sensitive to the development conditions, particularly the liquid temperature (the temperature of the developing liquid), the liquid concentration (the concentration of the developing liquid), and the fatigue degree, to use the liquid temperature, the liquid concentration, and the liquid fatigue. It is better to maintain a certain imaging system. The method of keeping the liquid concentration and the liquid fatigue degree constant may be, for example, a method of automatically replenishing a new liquid or a replenishing liquid while monitoring the liquid concentration; or replenishing a new liquid or replenishing every certain time or every certain number of treatments. The method of liquid. Further, in order to suppress the temperature change, the liquid temperature is preferably set to a temperature close to the ambient temperature. Specifically, it is preferably 20 ° C to 30 6 C to 21 . (: ~27 °C is better, and 2 2 °C to 2 5 °C is particularly good. 200937050 Also, in order to prevent defects in the photosensitive color layer (for example, 'black matrix'), wash The spraying pressure is preferably 0.01 MPa to 0.5 MPa, preferably 0.05 MPa to 0.4 MPa, more preferably 〇 〇 5 MPa to 0.3 MPa. The baking process is followed by applying a so-called baking treatment to the black matrix. (post-baking). The heat treatment after baking is used to complete the hardening of the photosensitive concentrated composition, usually by heat hardening at 150 ° C to 260 ° C. 〇 * baking temperature 150 ° c ~ 260 ° C is better, 180 ° C ~ 260 ° C is better, 200 ° C ~ 250 ° C is best. Baking time is preferably 1 〜 ~ 150 minutes, 20 minutes Preferably, it is preferably from 90 minutes to 60 minutes. By baking the photosensitive concentrated composition layer under the above-mentioned condition range, when a colored pixel is formed on the substrate on which the black matrix is formed, the black matrix can be suppressed. The bump baking treatment with the overlapping portion of the colored pixels can be performed by using the photosensitive thick color composition layer after development The method of achieving the above conditions is performed by a hot plate, a convection oven (hot air circulation dryer), or a high-frequency heating machine, and is carried out in a continuous or batch manner. The process of the black matrix forming process of the present invention may further increase the prebaking process after the photosensitive color composition layer forming process and before the exposure process, or after the aforementioned developing process and the foregoing baking ( After the post-baking process, the process of hardening the formed black matrix by exposure is carried out as necessary. -15- 200937050 The pre-baking temperature of the photosensitive concentrated composition layer is preferably 60 ° C to 140 ° C. It is more preferably from 80 ° C to 1 2 0 ° C. The baking time is preferably from 30 seconds to 300 seconds, preferably from 80 seconds to 200 seconds. The coloring pattern forming process is in the present invention, the coloring pattern The formation process is to form a photosensitive coloring composition layer (photosensitive coloring composition layer forming process) using a photosensitive coloring composition on at least a substrate on which a photosensitive photosensitive composition layer (black matrix) after baking is formed, And Exposing the photosensitive coloring composition layer (coloring composition layer exposure process), and developing the photosensitive coloring composition layer after exposure (coloring layer development process), and by performing the aforementioned photosensitivity after development The colored composition layer is baked (colored layer baking process), and the overlapping portion of the black matrix and the colored pattern after the baking is in a length of 2.0 μm to 9.0 μm in the i-direction of the black matrix. In the present invention, the layer thickness of the photosensitive rich color composition layer is preferably thinner from the viewpoint of suppressing the ridge of the overlapping portion. Specifically, it is preferably 1.8 μm to 2.8 μm, more preferably 1.8 μm to 2.5 μm. In addition to the above respective processes, the coloring pattern forming process may be provided with other processes such as a prebaking process as necessary. First, the above "overlap" will be explained. When a colored pattern (colored pixel) is formed by laminating a photosensitive coloring composition on a substrate on which a black matrix is formed, it is usually formed by photosensitive coloring without causing a gap between a black matrix and a colored pixel. The manner in which the object overlaps with the black matrix causes the photosensitive coloring composition to be coated with a plurality of coatings-16-200937050 (overlapping) in a black matrix to form a colored pattern. In the present invention, in addition to the undercut described above, a high-quality color filter or liquid crystal display device is obtained by adjusting the length of the overlapping portion to 2.0 μm to 9.0 μm. The term "length of the overlapping portion" means the length of the overlapping portion of the colored pattern formed by using the photosensitive rich color composition layer and the black matrix in the width direction of the black matrix. It will be explained in more detail using the illustration. In the third embodiment, the photosensitive coloring composition layer 6 is formed by coating the photosensitive coloring composition on the substrate 2 on which the black matrix 4 is formed, and the black matrix 4 is formed to overlap the photosensitive coloring composition layer 6. A partial cross-sectional view of the color filter in the state of the overlapping portion 8. Here, the overlapping portion 8 is a region of the length b, and the length b of the overlapping portion 8 can be obtained at the outermost end S on the side facing the photosensitive colored composition layer 6 in the width direction of the black matrix 4, and overlapped with The distance (length) in the width direction of the black matrix 4 between the outermost ends T of the positions of the photosensitive coloring composition layers 6 on the black matrix 4 in the width direction of the black matrix 4 is set. Actually, when the length b of the overlapping portion 8 is obtained, the color filter can be cut in a direction perpendicular to the longitudinal direction of the pattern of the black matrix 4, and the cross section can be measured. In the present invention, from the viewpoint of reducing the ridge of the overlapping portion (preferably 0.50 μm or less), the length of the overlapping portion is 2.0 to 9·0 μm, more preferably 2,0 to 8.0 μm, and 2.0 to 7.0. Micron is the best. Further, by making the length of the overlapping portion 9.0 μm or less, it is possible to stably manufacture a color filter and a display device on a large substrate (one side or more of one side). The length of the overlap can be adjusted by changing the exposure position of the photosensitive coloring composition layer -17-200937050 pattern position or development condition. Specifically, when the amount of overlap between the exposure pattern and the black matrix is smaller, the amount of overlap can be made smaller, and the development condition can be made weaker, for example, the lower the development temperature or the shorter the development time, and the amount of overlap can be increased. . More specifically, in order to make the length of the overlapping portion 2.0 to 9.0 μm, the length of the overlapping portion of the exposure pattern and the black matrix in the density direction of the black short array is preferably 2.0 to 9.0 μm. Further, the developing temperature is preferably 20 to 35 ° C, more preferably 21 to 30 ° C, and most preferably 22 to 26 ° C. Moreover, the development time is preferably from 20 seconds to 120 seconds, preferably from 25 seconds to 80 seconds, and preferably from 35 seconds to 75 seconds. A preferred combination of the above conditions is such that the length of the overlapping portion of the exposure pattern and the black matrix is from 2.0 μm to 9.0 μm so that the development temperature is from 20 ° C to 35 ° C, and the development time is 20 seconds. A combination of 120 seconds is preferred. A more preferable combination is that the length of the overlapping portion of the exposure pattern and the black matrix is 2.0 μm to 8.0 μm, the development temperature is 21 ° C to 30 ° C, and the development time is a combination of 25 seconds to 80 seconds. . The optimum combination of the exposure pattern and the overlap of the black matrix has a length of 2.0 μm to 7.0 μm, a development temperature of 22 ° C to 26 ° C, and a combination of a display time of 35 seconds to 75 seconds. As described above, in the overlapping portion of the black matrix and the photosensitive colored composition layer, since the photosensitive colored composition is covered with the black matrix so that the black matrix partially overlaps the photosensitive colored composition layer, the portion is formed. Uplifted state. By reducing the degree of bulging of the overlapping portion, it is possible to suppress the disorder or light leakage of the liquid crystal alignment, and it is possible to obtain a high-quality image. Use the illustration to illustrate the bulging of the overlap. 200937050 ^ Fig. 4 shows a photosensitive coloring composition layer formed by coating a photosensitive coloring composition on a substrate 2 on which a black matrix 4 is formed, and performing exposure, development, or the like as a coloring pattern 6, in a black matrix 4 A partial cross-sectional view of the color filter in a state in which the overlapping portion 8 overlapping the colored pattern 6 is raised. The above-mentioned "degree of bulging of the overlapping portion" means, in more detail, the farthest from the surface of the substrate 2 of the overlapping portion 8 (the surface of the substrate 2 that is in contact with the black matrix 4 or the colored pattern 6). The distance between the portion and the flat surface portion other than the aforementioned overlapping portion 8 is at the substrate normal. In other words, the “degree of bulging of the overlapping portion” refers to the distance c between the surface of the substrate 2 and the colored pattern 6 and the farthest portion of the overlapping portion 8 from the surface of the substrate 2 at the substrate normal, minus the surface of the substrate 2 and Among the surfaces of the colored pattern 6, a distance e between the portions other than the overlapping portion 8 at a distance d from the substrate normal. Hereinafter, in order to facilitate the ridge of the overlapping portion, it is referred to as a "horn", and the distance e is referred to as a "height of a corner portion". In order to obtain a high-quality image, the height of the corner portion is preferably 0.5 μm or less, more preferably 0.4 μm or less, and most preferably 〇·3 μm or less. The height of the corner portion can be adjusted by appropriately setting the undercut length, the length of the overlapping portion, and the thickness of the black matrix. A preferred combination of the undercut length, the length of the overlap portion, and the thickness of the black matrix is such that the undercut length is -2.0 μm to 5.0 μm, the length of the overlap portion is 2.0 μm to 9.0 μm, and the thickness of the black matrix is 0.2. Micron ~ 2.2 microns is preferred. More preferably, the undercut length is -2.0 μm to 4.0 μm, the overlap portion -19-200937050 has a length of 2.0 μm to 8.0 μm, and the black matrix has a thickness of 0.2 to 1.6 μm. The optimum combination is an undercut length of -1.5 μm to 3.0 μm, a length of the overlap portion of 2.0 μm to 7.0 μm, and a thickness of the black matrix of 0.7 to 1.3 μm. Next, various processes performed in the color pattern forming process of the present invention will be described. Photosensitive coloring composition layer forming process The photosensitive coloring composition layer forming process is formed on a substrate on which a baked photosensitive coloring composition layer (black matrix) is formed, and a photosensitive coloring composition is used to form a photosensitive layer. Sexually coloring the composition layer. The method of forming the photosensitive coloring composition layer on the substrate on which the black matrix is formed can use the same method as the method of forming the photosensitive rich color composition layer on the substrate, that is, the coating method or the transfer method. Among them, in order to achieve the effects of the present invention, it is preferred to apply a photosensitive coloring composition to the front surface of a substrate on which a black matrix is formed by using a slit coater or the like. ◎ In order to obtain a sufficient reproduction area and obtain sufficient panel brightness, the layer thickness of the photosensitive colored composition layer is preferably 0.5 μm to 3.0 μm, more preferably 1.0 μm to 2.5 μm. Colored Layer Exposure Process The colored layer exposure process exposes the aforementioned photosensitive coloring composition layer. The exposure treatment of the photosensitive coloring composition layer can be carried out in the same manner as the exposure process of the photosensitive concentrated color composition layer. When a color pattern of a plurality of colors is formed, it is possible to pattern the photosensitive coloring composition layers of the respective colors that are irradiated with light by exposure to a predetermined mask pattern of -20 to 200937050 for each color. (Negative composition only hardens the position to be illuminated by light). Colored layer developing process The colored layer developing process develops the exposed photosensitive coloring composition layer after exposure. The development process of the photosensitive coloring composition layer after the exposure can be performed in the same manner as the operation described in the description of the development process of the photosensitive rich color composition layer, and can be suitably used in the above-described development process description. After the imaging solution. In order to adjust the length of the overlapping portion and the height of the corner portion which are formed in the overlapping portion between the black matrix and the colored pixel, the developing condition is to develop the photosensitive colored composition layer as the development condition described in the description of the overlapping portion. good. Colored layer baking process The colored layer baking process is the aforementioned photosensitive coloring composition layer after baking development. @ The method of baking the photosensitive coloring composition layer after development can be carried out in the same manner as the baking process of baking the photosensitive green color composition layer described above. When forming a color pattern of three or more RGB (Red, Green, Blue) color complexes, the formation of the photosensitive coloring composition layer, the exposure, the development, and the baking cycle can be repeated as needed. Each of the photosensitive coloring composition layers is formed, and after exposure and development, all of the hue is collectively baked. Thereby, a color filter having colored pixels composed of a black matrix and a desired hue can be manufactured. -21 - 200937050 Other processes are in the coloring pattern forming process, and the process of pre-baking the photosensitive coloring composition layer may be provided before the photosensitive coloring composition layer forming process and the colored layer exposure process (coloring layer prebaking) Process) for drying the photosensitive coloring composition. The prebaking temperature of the photosensitive coloring composition layer is preferably 6 (TC to 140 ° C, more preferably 80 ° C to 120 ° C. The prebaking time is preferably 30 seconds to 300 seconds. More preferably, it is 80 second to 20 seconds. Next, the photosensitive coloring composition and the photosensitive rich color composition used for the manufacture of the color filter of this invention are demonstrated in detail. The photosensitive coloring composition is this invention. The photosensitive coloring composition used for forming the color pattern of the color filter is a radiation-sensitive linear composition (for example, a negative-type radiation-sensitive composition that is hardened by light) to contain (A-1) a coloring agent, (B) a binder polymer, (C-1) a polymerizable compound, (D) a photopolymerization initiator, and (E) a solvent, and may further contain a polymer dispersant or a surfactant as needed. In the present invention, the physical properties of the photosensitive colored composition for forming the colored pattern are preferably adjusted so as to suppress the thickness of the portion overlapping the formed black matrix. For example, the liquid viscosity is lower. Better, in addition, to the flow of liquid during the drying process (A-1) The colorant colorant can be appropriately selected from dyes and pigments. The pigment used as the colorant may be an inorganic pigment or an organic pigment, and when high transmittance is preferred, It is better to use the smaller particle size as much as possible. Average particle-22- 200937050 'The rule of the sub-scale, the hour can be machine-made. 锌 Zinc, 93, 15 5 176 ❹ 60, 15 1 inch to 10 nm ~ 100 Preferably, it is preferably in the range of 10 nm to 50 nm. Since the photosensitive coloring composition used in the present invention uses a polymer dispersing agent to be described later, even if the coloring agent has a smaller pigment dispersibility, The dispersion stability is also good, and a colored pixel having excellent color purity is formed even when the film thickness is thin. A coloring agent (coloring pixel) is used as a coloring agent, and any material that can be used is a metal oxide or a metal complex. Specific examples of the metal compound include metal oxides such as iron, cobalt, aluminum, cadmium, lead, copper, titanium, magnesium, chromium, and cerium, and composite oxides of the above metals. Further, the organic pigment may, for example, be a CI pigment. Huang (CI PigmentYellow) 11, 24, 31, 53, 83, 99, 108, 109, 110, 138, 139, 147, 150, 151, 154, 167, 180, 185, 199; CI Pigment Orange 36, 38, 43, 71; CI Pigment Red 81, 105, 122, 149, 150, 155, 171, 175, 177, 209, 220, 224, 242 &gt; 254, 255, 264, 270; CI Pigment Violet 19, 23, 32, 37, 39; CI Pigment Blue 1, 2, 15, 15: 1, 15: 3, 15: 6, 16, 22, 66; CI Pigment Green 7, 36, 37; CI Pigment Brown 25, 28; CI Pigment Black 1 and so on. The present invention is not particularly limited, and the following pigments are preferred. CI Pigment Yellow 11, 24, 108, 109, 110, 138, 139, 150, 154' 167, 180, 185; -23- 200937050 CI Pigment Tan 36, 71; 171, 175, 177, 209, 224, 242 , C.1·Pigment Red 1 22, 1 5〇254, 255, 264; CI Pigment Violet 19, 23, 37; 22, 60 '66; CI Pigment Blue 15: i, is: 3, is: CI Pigment Green 7, 36, 37; These organic pigments can be used singly or in combination to improve color purity. The details of the combination are as follows.

例如’例如紅色相（R)用的顏料能夠使用蒽醌 (anthraquinone)顏料、茈（peryiene)顏料、二嗣吡咯并吡咯 (diketopyrr〇l〇Pyrr〇ie)顏料單獨或其等之至少—種與雙偶 氮黃色（bisazo)顏料、異吲哚滿（isoindiline)黃色顏料、喹 琳黃（quinophthalone)黃色顏料之至少—種及/或菲 (?61^^11〇紅色顏料的混合等。例如蒽醌顏料可舉出（：1顏 料紅177’茈顏料可舉出C.I.顏料紅155、C.I.顏料紅224, 二酮吡咯并吡咯顏料可舉出C.I.顏料紅254,從色再現性而 ❹ 言，以與C.I.顏料黃139混合爲佳。又，從得到充分的色 純度及抑制從NTSC(美國國家電視系統委員會：NationalFor example, 'for example, the pigment for the red phase (R) can use anthraquinone pigment, peryiene pigment, diketopyrr〇l〇Pyrr〇ie pigment alone or at least Bisazo pigment, isoindiline yellow pigment, quinophthalone yellow pigment, at least one species and/or phenanthrene (?61^^11 red pigment blend, etc., for example 蒽Examples of the bismuth pigment include: (1) Pigment Red 177' 茈 pigment, CI Pigment Red 155, CI Pigment Red 224, and diketopyrrolopyrrole pigment, CI Pigment Red 254, which is based on color reproducibility. It is better to mix with CI Pigment Yellow 139. Also, from obtaining sufficient color purity and suppression from NTSC (National Television System Committee: National)

Television Standards Committee)基準的色相偏移之觀點，紅 色顏料及黃色顏料的質量比以100: 5~100: 50爲佳。特別 是上述質量比以1〇〇: 1〇〜100: 30的範圍爲最佳。又，組 合紅色顏料之間時能夠配合色度來調整。 又，綠色相（G)用的顏料能夠單獨使用鹵化酞菁顏料或 是混合使用其與雙偶氮黃色顏料、喹啉黃黃色顏料、偶氮 甲川黃色（azomethine)顏料或異Π引晚滿黃色顏料。例如’此 -24- 200937050 種例子以混合C.I·顏料綠7、36或37與c.I.顔料黃83、 C.I.顏料黃138、C.I_顏料黃139、C_I.顏料黃150、C.I.顏 料黃180、或C.I.顏料黃185爲佳。從得到充分的色純度及 抑制從NTSC基準的色相偏移之觀點，綠顏料與黃色顏料 的質量比（綠顔料：黃顔料）以1〇〇: 5〜100: 150爲佳。質 量比以100: 30〜100: 120的範圍爲特佳。 藍色相（B)用的顏料能夠單獨使用酞菁顏料、或是混合 使用其與二噚阱紫色顏料。例如混合C.I.顏料藍15: 6與 © C.I.顏料紫23爲佳。藍色顔料與紫色顏料的質量比以100 : 0~100: 50爲佳，以100: 5〜100: 30爲更佳。 在本發明所使用的感光性著色組成物層中之（A-1)著 色劑（顏料）的含量，係相對於該組成物的總固體成分（質量） 以25〜75質量％爲佳，以32〜70質量％爲更佳。（A-1)著 色劑（顏料）的含量在前述範圍內時，色濃度充分且能夠有 效地確保優良的顏色特性。 _ (B)黏合劑聚合物 ❹ 爲了提升皮膜特性、賦予顯像特性之目的，本發明的 前述感光性著色組成物以含有黏合劑聚合物爲佳。黏合劑 聚合物能夠使用下述的鹼可溶性樹脂。 本發明所使用的鹼可溶性樹脂係直鏈狀有機高分子聚 合物，能夠從分子（較佳是以丙烯酸系共聚物、苯乙烯系共 聚物作爲主鏈之分子）中具有至少一個促進鹼可溶性的基 (例如羧基、磷酸基、磺酸基、或羥基等）之鹼可溶性樹脂 中適當地選擇。 -25- 200937050 上述作爲鹼可溶性樹脂之較佳者’可舉出在側鏈具有 羧酸基之聚合體，例如特開昭59-44615號、特公昭54-34327 號、特公昭5 8- 1 2577號、特公昭54-2595 7號、特開昭 59-53836號、特開昭59-71048號所記載之甲基丙烯酸共聚 物、丙烯酸共聚物、伊康酸共聚物、巴豆酸共聚物、順丁 烯二酸共聚物、部分酯化之順丁烯二酸共聚物等，及在側 鏈具有羧酸之酸性纖維素衍生物、具有羥基之聚合物加添 酸酐而成者等的丙烯酸系共聚物。 上述鹼可溶性樹脂的酸價爲10〜200mgKOH/g，以30 〜180mgKOH/g爲佳，50〜150mgKOH/g的範圍爲更佳。 鹼可溶性樹脂之具體的構成單位係以（甲基）丙烯酸與 能夠與其共聚合的其他單體之共聚物爲特佳，前述能夠能 夠與（甲基）丙烯酸共聚合的其他單體可舉出（甲基）丙烯酸 烷酯、（甲基）丙烯酸芳酯及乙烯系化合物等。在此烷基及 芳基的氫原子亦可被取代基取代。 前述（甲基）丙烯酸烷酯及（甲基）丙烯酸芳酯係 CHfC^R^KCOOR3)，在此，R1係表示氫原子或碳數1〜5的 烷基’ R3係表示碳數1〜8的烷基或碳數6〜12的芳烷基。 具體例可舉出（甲基）丙烯酸甲酯、（甲基）丙烯酸乙酯、（甲 基）丙烯酸丙酯、（甲基）丙烯酸丁酯、（甲基）丙烯酸異丁酯、 (甲基）丙烯酸戊酯、（甲基）丙烯酸己酯、（甲基）丙烯酸辛 酯、（甲基）丙烯酸苯酯、（甲基）丙烯酸苄酯、（甲基）丙烯酸 甲苯酯、（甲基）丙烯酸萘酯、（甲基）丙稀酸環己酯、（甲基） 200937050 丙烯酸羥基烷酯（烷基係碳數1〜8的烷基）、甲基丙烯酸羥 基環氧丙酯及甲基丙烯酸四氫糠酯等。 又，亦可舉出在分子側鏈具有聚環氧烷鏈之樹脂作爲 鹸可溶性樹脂的較佳例。前述聚環氧烷鏈係聚環氧乙烷 鏈、聚環氧丙烷鏈及聚伸丁二醇鏈或亦可並用該等，末端 係氫原子或是直鏈或分枝的烷基。 聚環氧乙烷鏈及/或聚環氧丙烷鏈的重複單位以1〜20 爲佳，以2〜12爲更佳。在該等的側鏈具有聚環氧烷鏈之 丙烯酸系共聚物係例如以聚乙二醇一（甲基）丙烯酸酯、聚 丙二醇一（甲基）丙烯酸酯、聚（乙二醇-丙二醇）一（甲基）丙 烯酸酯等及將該等末端OH基以烷基加以舍鎖而成之化合 物、例如甲氧基聚乙二醇一（甲基）丙烯酸酯、乙氧基聚丙 二醇一（甲基）丙烯酸酯、甲氧基聚（乙二醇-丙二醇）一（甲基） 丙烯酸酯等作爲共聚合成分之丙烯酸共聚物。 前述乙烯系化合物係CHfCRiR2[在此，R1係表示氫原 φ 子或碳數1~5的烷基，R2係表示碳數6〜10的芳香族烴 環]，具體上，可舉出苯乙烯、〇：-甲基苯乙烯、苯乙烯基 甲苯、丙烯腈、丙酸乙烯酯、Ν-乙烯基吡咯啶酮、聚苯乙 烯大分子單體及聚甲基丙烯酸甲酯大分子等。 能夠共聚合之其他單體可單獨使用1種，亦可組合使 用2種以上。此等之中，以（甲基）丙烯酸苄酯/(甲基）丙烯 酸共聚物或（甲基）丙烯酸苄酯/(甲基）丙烯酸共聚物/其他 單體所構成的多元共聚物爲特佳。 -27- 200937050 丙烯酸系樹脂係如前所述，具有20〜2 00mgKOH/g的 範圍之酸價。酸價爲200以下時，丙烯酸系樹脂對鹼之溶 解性不會變爲太大，能夠防止顯像適當範圍（顯像寬容度 (latitude)變窄。另一方面，20以上時，因爲對鹼之溶解性 不會變小，能夠防止顯像時間的長時間化。 又，爲了實現使感光性著色組成物在塗布等製程上容 易使用的黏度範圍，且爲了確保膜強度，丙烯酸系樹脂的 重量平均分子量 Mw(依照 GPC 法（Gel Permeation Chromatography ;凝膠滲透色譜法）所測定之聚苯乙稀換算 値），以2,000〜100,000爲佳，以3,000〜50,000爲更佳。 又，爲了提升在本發明之感光性著色組成物的交聯效 率，能夠單獨使用在鹼可溶性樹脂具有聚合性基之樹脂或 並用未具有聚合性基的鹼可溶性樹脂，在側鏈含有芳基、 (甲基）丙烯基、或芳氧基烷基等之聚合物等係有用的。具 有聚合性雙鍵之鹸可溶性樹脂係能夠在鹼性顯像液顯像， 而且具光硬化性及熱硬化性者。含有該等聚合性基之聚合 物的例子係如以下所示，若在1分子中，含有COOH基、 OH基等的鹼可溶性基與碳-碳間不飽和鍵者時，沒有特別 限定。 (1)藉由使含有預先使異氰酸酯與OH基反應而殘留1個未 反應的異氰酸酯基及至少1個（甲基）丙烯醯基之化合物、 與含有羧基丙烯酸樹脂反應而得到之胺基甲酸酯改性而成 之含聚合性雙鍵的丙烯酸樹脂， -28- 200937050 (2) 藉由含羧基之丙烯酸樹脂與在分子內同時具有環氧基 及聚合性雙鍵之化合物反應而得到之含不飽和基的丙烯酸 樹脂， (3) 酸側接型環氧丙烯酸樹脂， (4) 使含有OH基之丙烯酸樹脂與具有聚合性雙鍵之二元酸 酐反應而成之含有聚合性雙鍵之丙烯酸樹脂。 上述之中以（1)及（2)的樹脂爲佳。 赢 具體例能夠使用在具有OH基之例如丙烯酸2-羥基乙 ❹ 酯、含有COOH基之例如甲基丙烯酸及能夠與此等共聚合 之丙烯酸系或乙烯系化合物等的單體之共聚物，使含有具 有對OH基具有反應性之環氧環及碳間不飽和鍵基之化合 物（例如丙烯酸環氧丙酯等的化合物）反應而得到的化合物 等。與OH基反應時除了環氧環以外，亦可使用具有酸酐、 異氰酸酯基、丙烯醯基之化合物。 又，亦能夠使用在特開平6-1 02669號公報、特開平 〇 6-1938號公報所記載之具有環氧環之化合物使如丙烯酸之 不飽和羧酸反應而得到的化合物，使飽和或不飽和多元酸 酐對其反應而得到的反應物。 同時具有如COOH基之鹼可溶化基及碳間不飽和基之 化合物可舉出例如 DIANAL NR 系列（三菱 RAYON(股）（Mitsubishi Rayon Co.，Ltd)製）；Photomer 6173(含 COOH 基之聚胺基甲酸酯丙烯酸低聚物 (Polyurethane acrylic olgomer)、Diamond Shamrock 公司 製）；VISCOTE R-264、KS RESIST 106(都是大阪有機化學 -29- 200937050 工業（Osaka Organic Chemical Industry Ltd.)製）； - CYLCOMER P系列、PLACCEL系列（都是DAICEL化學工 業（股）（DAICEL Chemical Industries，Ltd·)製）；Ebecryl 3 800(DAICEL-CYTEC (股）製）等。 鹼可溶性樹脂的添加量係在感光性濃色組成物層的總 固體成分中，以3〜30質量％的範圍爲佳，以5〜20質量％ 爲更佳。 調製感光性濃色組成物時，作爲黏合劑聚合物除了上 述鹼可溶性樹脂以外，以進而亦添加下述的環氧樹脂爲 © 佳。環氧樹脂可舉出雙酚（bisphen〇l)A型環氧樹脂、甲酚 酷醛清漆（cresolnovolac)型環氧樹脂、聯苹（biphenyl)型環 氧樹脂、脂環族環氧化合物等在分子中含有2個以上環氧 環之化合物。 例如，雙酚A型環氧樹脂可舉出EPOTOHTO YD- 1 1 5、 YD-118T、YD-127、YD-128、YD-134、YD-8125、YD-7011R、 ZX-1059、YDF-8170、YDF-170 等（以上、東都化成（股）（Tohto kasei Co.，Ltd.)製）、DENACOL ΕΧ-11(Π、EX-1102、EX-1103 ❹ 等（以上、Nagase ChemteX(股）製）、PLACCEL GL-61、 GL-62、G101、G102(以上、DAICEL化學工業（股）製）等。 此外，亦可舉出能夠使用與此種類似之雙酚F型環氧樹脂 及雙酚S型環氧樹脂。 又，亦能夠使用 Ebecryl 3 7 00、3 70 1、600(以上' DAICEL-CYTEC(股）製）等的環氧丙烯酸酯。甲酚酚醛清漆 型可舉出 EPOTOTHOYDPN-6 3 8、YDPN-701、YDPN-702、 -30- 200937050 • YDPN-703 &gt; YDPN-704 等（以上、東都化成（股）製）、 DENACOLEM-125等（以上NAGASE 化成製）。聯苯型環氧 樹脂可舉出3,5,3’ ，5’ -四甲基-4,4’ -二環氧丙基聯苯 等、脂環族環氧化合物可舉出CELL OXIDE 2021、2081、 2083、2085、EPOLEAD GT-301、GT-302、GT-401、GT403、 EHPE-3150(以上、DAICEL 化學工業（股）製）、S ΑΝΤΟΗΤΟ ST-3000、ST-4000 &gt; ST-5080、ST-5100 等（以上、東都化成 (股）製）、Epiclon430、同 673、同 695、同 850S、同 4032(以 φ 上、大日本INK化學工業（股）（DICC〇rp〇rati〇n)製）等。又， 亦能夠使用1，1，2,2-肆（對環氧苯氧基苯基）乙烷、參（對環 氧丙氧基苯基）甲烷、三環氧丙基參（羥乙基）異三聚氰酸 酯、鄰酞酸二環氧丙酯、對酞酸二環氧丙酯、此外亦能夠 使用胺型環氧樹脂之EPOTOTHOYH-434、YH-434L及在雙 酚 A型環氧樹脂的骨架中將二聚酸改性而成之環氧丙酯 等。 此等之中，以「分子量/環氧環的數目」爲1〇〇以上爲 0 佳，以130〜500爲更佳。「分子量/環氧環的數目」較小時 硬化性高且硬化時的收縮大，又’太大時時硬化性不足且 缺乏信賴性，或平坦性變差。 較佳化合物的具體例可舉出 EPOTOTHO YD-115、 118T、127&gt; YDF-170' YDPN-638 ' YDPN-701' YDPN-702 ' PLACCEL GL-61、GL-62、3,5,3’ ，5’ -四甲基-4,4’ -二環 氧丙基聯苯、CELLOXIDE 2021、2081、EPOLEAD GT-302、 GT403 及 EHPE-3 1 50 等。 (C -1 )聚合性化合物 -31 - 200937050 在本發明所使用的感光性濃色組成物以含有（C-1)聚 合性化合物爲佳。 在本發明能夠使用的聚合性化合物係具有至少一個乙 烯性不飽和雙鍵之加成聚合性化合物，能夠選自具有至少 1個、較佳是具有2以上末端乙烯性不飽和鍵之化合物。 此種化合物群在該產業領域係廣被知悉者，在本發明，此 等沒有特別限定而可以使用。此等具有例如單體、預聚物 (亦即二聚物、三聚物）及低聚物、或此等的混合物及此等 的共聚物等的化學形態。單體及其共聚物的例子能夠舉出 不飽羧酸（例如，丙烯酸、甲基丙烯酸、伊康酸、巴豆酸、 異巴豆酸、順丁烯二酸等）、或其酯類、醯胺類，較佳是使 用不飽和羧酸與脂肪族多元醇化合物之酯、不飽和羧酸與 脂肪族多元胺化合物之醯胺類。又，具有羥基、胺基或氫 硫基等親核性取代基之不飽羧酸酯或醯胺類與單官能或多 官能異氰酸酯類或環氧類的加成反應物，及與單官能或多 官能羧酸之脫水縮合反應物等亦適合使用。又，具有異氰 酸酯基或環氧基等親電子性取代基之不飽和羧酸酯或醯胺 類與單官能或多官能的醇類 '胺類、硫醇類之加成反應物， 進而具有鹵素基、或對甲苯磺醯氧基等脫離性取代基之不 飽和羧酸酯或醯胺類與單官能或多官能醇類、胺類、硫醇 類之取代反應物亦適合。又，其他例子亦能夠使用不飽和 磺酸、苯乙烯、或乙烯醚等取代上述不飽和羧酸而成之化 合物群。 脂肪族多元醇化合物與不飽和羧酸之酯之單體的具體 例，丙烯酸酯有乙二醇二丙烯酸酯、三甘醇二丙烯酸酯、 -32- 200937050 • I3· 丁二醇二丙烯酸酯、伸丁二醇二丙烯酸酯、丙二醇二 丙烯酸酯、新戊二醇二丙烯酸酯、三羥甲基三丙烯酸酯、 三羥甲基丙烷三（丙烯醯氧基丙基）醚、三羥甲基乙烷三丙 烯酸酯、己二醇二丙烯酸酯、I，4-環己二醇二丙烯酸酯、 四甘醇二丙烯酸酯、新戊四醇二丙烯酸酯、新戊四醇三丙 烯酸酯、新戊四醇四丙烯酸酯、二新戊四醇二丙烯酸酯、 二新戊四醇六丙烯酸酯、山梨糖醇三丙烯酸酯、山梨糖醇 四丙烯酸酯、山梨糖醇五丙烯酸酯、山梨糖醇六丙烯酸酯、 〇 參（丙烯醯氧基乙基）異三聚氰酸酯、聚酯型丙烯酸酯低聚 物及異三聚氰酸Ε Ο改性三丙烯酸酯等。 甲基丙烯酸酯有伸丁二醇二甲基丙烯酸酯、三甘醇二 甲基丙烯酸酯、新戊二醇二甲基丙烯酸酯、三羥甲基丙烷 三甲基丙烯酸酯、三羥甲基乙烷三甲基丙烯酸酯、乙二醇 二甲基丙烯酸酯、1，3-丁二醇二甲基丙烯酸酯、己二醇二 甲基丙烯酸酯、新戊四醇二甲基丙烯酸酯、新戊四醇三甲 基丙烯酸酯、新戊四醇四甲基丙烯酸酯、二新戊四醇二甲 Q 基丙烯酸酯、二新戊四醇六甲基丙烯酸酯、山梨糖醇三甲 基丙烯酸酯、山梨糖醇四甲基丙烯酸酯、雙[對- (3-甲基丙 烯醯氧基-2-羥基丙氧基）苯]二甲基甲烷及雙-[對（甲基丙 烯醯氧基乙氧基）苯基]二甲基甲烷等。 伊康酸酯有乙二醇二伊康酸酯、丙二醇二伊康酸醋、 1，3-丁二醇二伊康酸酯、1,4-丁二醇二伊康酸酯、伸丁二醇 二伊康酸酯、新戊四醇二伊康酸酯、山梨糖醇四伊康酸酯 等。 巴豆酸酯有乙二醇二巴豆酸酯、伸丁二醇二巴豆酸 -33- 200937050 酯、新戊四醇二巴豆酸酯及山梨糖醇四巴豆酸酯等。 異巴豆酸酯有乙二醇二異巴豆酸酯、新戊四醇二異巴 豆酸酯、山梨糖醇四異巴豆酸酯等。 順丁烯二酸酯有乙二醇二順丁烯二酸酯、三甘醇二順 丁烯二酸酯、新戊四醇二順丁烯二酸酯及山梨糖醇四順丁 烯二酸酯等。 其他的酯之例子，例如有特公昭5 1 - 4 7 3 3 4、特開昭 5 7 - 1 9623 1所記載之脂肪族醇系酯類、或特開昭59- 5 240、 特開昭59-5241、特開平2-226149所記載之具有芳香族系 0 骨架之酯類、特開平1-165613所記載之含有胺基之酯類者 等亦可適用。而且，前述酯單體亦能夠以混合物的形式使 用。 ' 又，脂肪族多元胺化合物與不飽和羧酸之醯胺的單體 之具體例有亞甲基雙丙烯醯胺、亞甲基雙甲基丙烯醯胺、 1,6-六亞甲基雙丙烯醯胺、ι，6·六亞甲基雙甲基丙烯醯胺、 二伸乙三胺三丙烯醯胺、苯二甲基雙丙烯醯胺、苯二甲基 雙甲基丙烯酸酯等。其他的較佳醯胺系單體可舉出例如特 ^ ❹ 公昭54-2 1 726號公報所記載之具有環己烯結構之醯胺。 又’使用異氰酸酯與羥基的加成反應而製成的胺基甲 酸酯系加成聚合性化合物亦佳，此種具體例可舉出例如特 公昭48-41708號公報中所記載之對在！分子具有2個以上 異氰酸酯基之聚異氰酸酯化合物，加添下述通式（V)所示之 含有羥基之乙烯單體而成之在1分子中具有2個以上聚合 物乙烯基之乙烯基胺基甲酸酯化合物等。 CH2 = C(R4)C00CH2CH(R5)0H (V) -34- 200937050 • (其中，通式（A)中，R4及R5係表示Η或CH3) 又，特開昭51-37193號、特公平2-32293號及特公平 2-16765號所記載之丙烯酸胺基甲酸酯類、特公昭58-4 9860 號、特公昭 5 6 - 1 7 6 5 4號、特公昭 62-3 94 1 7號及特公昭 62- 3 94 1 8號所記載之具有環氧乙烷系骨架之胺基甲酸酯化 合物類亦佳。而且藉由使用特開昭63-277653號、特開昭 63- 260909號及特開平1-105238號所記載之在分子內具有 胺基結構或硫醚結構之加成聚合性化合物，能夠得到感光 〇 速度非常優良之光聚合性組成物。 其他的例子，可舉出例如特開昭48-64 1 83號、特公昭 49-43 1 9 1號及特公昭5 2-3 0490號各公報所記載之聚酯型丙 烯酸酯類及環氧樹脂與（甲基）丙烯酸而成之環氧丙烯酸酯 類等多官能丙烯酸酯及甲基丙烯酸酯。又，亦可舉出例如 特公昭46-43946號、特公平1-40337號及特公平1-40336 號各公報所記載之特定不飽和化合物 '或特開平2-25493 號所記載之乙烯基磺酸系化合物。又，某種情況下，特開 ❹ 昭61 -22048號所記載之含有全氟烷基結構係適合使用的。 而且，亦可使用日本黏著協會刊物（Journal of the Adhesion Society of Japan)第 20 卷、第 7 期、第 3 00〜3 08 頁（1984 年）介紹作爲光硬化性單體及低聚物者。 此等聚合性化合物之結構、單獨使用或並用、添加量 使用方法之詳細能夠配合著色硬化性組成物最後性能設計 而任意設定。例如，能夠從以下觀點選擇。 從敏感度而言，以每1分子之不飽和基含量多的結構 爲佳，多半情況係以2官能基以上爲佳。又，爲了提高提 -35- 200937050 高著色影像部亦即感光性著色組成物層的強度’以3官能 以上者爲更佳，而且，藉由並用不同官能數、不同聚合性 基（例如丙烯酸酯、甲基丙烯酸酯、苯乙烯系化合物、乙嫌 基醚系化合物），來調節敏感度及強度雙方的方法亦是有效 的。從硬化敏感度的觀點，以使用含有2個以上（甲基）丙 烯酸酯結構之化合物爲佳，以使用含有3個以上之化合物 爲更佳，以使用含有4個以上之化合物爲最佳。又，從硬 化敏感度及未曝光部的顯像性之觀點，以含有EO改性體 爲佳。又，從硬化敏感度及曝光部強度之觀點，以含有胺 基甲酸酯鍵爲佳。 又，對於與在感光性著色組成物層中所含有的其他成 分（例如，黏合劑聚合物、引發劑、著色劑（顏料或染料）等） 之相溶性及/或分散性，加成聚合化合物的選擇、使用方法 係重要因素，例如藉由使用低純度化合物或並用2種以 上，能夠提升相溶性。又，爲了提高與基板等的黏附性之 目的，亦能夠選擇特定構造。 從以上的觀點，可舉出較佳者有雙酚A二丙烯酸酯、 雙酚A二丙烯酸酯EO改性體、三羥甲基丙烷三丙烯酸酯、 三羥甲基丙烷三（丙烯醯氧基丙基）醚、三羥甲基乙烷三丙 烯酸酯、四甘醇二丙烯酸酯、新戊四醇二丙烯酸酯、新戊 四醇三丙烯酸酯、新戊四醇四丙烯酸酯、二新戊四醇四丙 烯酸酯、二新戊四醇五丙烯酸酯、二新戊四醇六丙烯酸酯、 山梨糖醇三丙烯酸酯、山梨糖醇四丙烯酸酯、山梨糖醇五 丙烯酸酯、山梨糖醇六丙烯酸酯、三（丙烯醯氧基乙基）異 三聚氰酸酯、新戊四醇四丙烯酸酯EO改性體及二新戊四 200937050 醇六丙烯酸酯EO改性體爲佳。又’市售品以胺基甲酸酯 低聚物（urethane olygomer)UAS-10、UAB-140(日本製紙 Chemicals(股）（Nippon Paper Chemicals)製）、DPHA (日本 化藥公司（Nippon Kayaku Co_，Ltd.)製）、UA-306H、 UA-306T、UA-306I、AH-600、T-600、AI-600(共榮社化學 工業（股）（Kyoeisha Chemical Co.，Ltd.)製）爲佳。 其中，以雙酚A二丙烯酸酯EO改性體、新戊四醇三 丙烯酸酯、新戊四醇四丙烯酸酯、二新戊四醇五丙烯酸酯、 二新戊四醇六丙烯酸酯、三（丙烯醯氧基乙基）異三聚氰酸 酯、新戊四醇四丙烯酸酯EO改性體及二新戊四醇六丙烯 酸酯EO改性體等爲更佳，市售品係以DPHA(日本化藥公 司製）、UA-306H、UA-306T、UA-306I、AH-600、T-600、 AI-600(共榮社化學工業（股）製）爲更佳。 (C-1)聚合性化合物的含量係在本發明之感光性著色 組成物層層中的總固體成分中，以5〜55質量％爲佳，以 10~50質量％爲較佳，以15〜45質量％爲更佳。 (D)光聚合引發劑 本發明的感光性濃色組成物以含有（D)光聚合引發劑 爲佳。 前述光聚合引發劑係藉由光線分解來引發、促進前述 (C-1)聚合性化合物的聚合之化合物，以在波長300-500奈 米的區域具有吸收者爲佳。又，光聚合引發劑可單獨或並 用2種以上。 光聚合引發劑可舉出例如有機鹵素化合物、噚二唑 (oxidiazole)化合物、鑛基化合物、縮嗣（ketal)化合物、苯 -37- 200937050 偶姻（benzoin)化合物、tff淀（acridine)化合物、有機過氧化 化合物、偶氮化合物、香豆素（coumarin)化合物、疊氮（azide) 化合物、金屬茂（metallocene)化合物、六芳基二咪哩 (hexaaryl biiimidazoe)化合物、有機硼化合物、二擴酸化 合物、聘醋（oxime ester)化合物、鎗鹽（onium salt)化合物、 酿基鱗（氧化物）（acyphosphine oxide)化合物。 有機鹵素化合物具體上可舉出在若林等「Bull Chem. Soc Japan」42、2924(1969 年）、美國專利第 3,905,815 號 說明書、特公昭46-4 605號、特開昭48-36281號、特開昭 55-32070 號、特開昭 60-239736 號、特開昭 61-169835 號、 特開昭 61-1 69837號、特開昭 62-58241號、特開昭 62-212401 號、特開昭 63-70243 號、特開昭 63-298339 號、 Μ. P. Hutt “ 雜環化學期刊（Journal of Heterocyclic Chemistry” 1(第3期），（1970年）」之文章所記載之化合 物，特別是可舉出三鹵甲基取代之噚二唑化合物及s-三哄 化合物。 s-三畊化合物更佳是至少1個單、雙、或三鹵素取代 甲基鍵結於s-三畊環而成之s-三阱衍生物，具體上可舉出 例如2,4,6-參（一氯甲基）-s-三阱、2,4,6-參（二氯甲基）-s-三 哄、2,4,6-參（二氯甲基）-s-二哄、2 -甲基- 4,6-雙（二氯）-s-三阱、2-正丙基-4,6-雙（三氯甲基）-3-三阱、2-(«，《，；8-三氯乙基）-4,6-雙（三氯甲基）-s-三畊、2-苯基-4,6-雙（三氯 甲基）-s-三阱、2-(對甲氧基苯基）-4,6-雙（三氯甲基）-s-三 哄、2-(3,4 -環氧基苯基）-4,6·雙（三氯甲基）-s -三阱、2-(對 氯苯基）-4,6-雙（三氯甲基）-s-三阱、2-[1-(對甲氧基苯 200937050 ❹ Ο 基）·2,4 -丁二嫌]-4,6 -雙（三氯甲基）-s·三哄、2 -苯乙嫌基 -4,6-雙（三氯甲基）-s-三哄、2-(對甲氧基苯乙烯基）-4,6-雙 (三氯甲基）-s-三畊、2-(對異丙氧基苯乙烯基）-4,6-雙（三氯 甲基）-s -三哄、2-(對甲苯基）-4,6 -雙（三氯甲基）-s -二哄、 2-(4-萘氧基萘基）-4,6-雙（三氯甲基）-s-三畊、2-苯硫基-4,6-雙（三氯甲基）-s-三畊、2-苄硫基-4,6·雙（三氯甲基）-s-三 畊、4-(鄰溴·對N，N-(二乙氧基羰基胺基）·苯基二（三 氯甲基）-s-三畊、2,4,6-參（二溴甲基）-s-三畊、2,4,6-參（三 溴甲基）-s-三畊、2-甲基_4,6-雙（三氯甲基）-s-三畊及2-甲 氧基-4,6-雙（三溴甲基）_s-三畊等。 噚二哩化合物可舉出2 _三氯甲基-5_苯乙烯-1，3，4-噚 二哇、2-三氯甲基- 5-(氰基苯乙嫌）-1，3，4-噚二唑、2_二氯 甲基- 5- (萘-1-基）-1，3，4 -曙二哩、2 -三氯甲基- 5- (4-苯乙稀） 苯乙烯-1，3,4-嗶二唑等。 羰基化合物可舉出二苯基酮（benzophenone)、米其勒嗣 (MUhler，S ketone)、2-甲基二苯基酮、3-甲基二苯基酮、 4 -甲基二苯基酮、2 -氣二苯基酮、4 -溴二苯基酮、2_竣基二 苯基酮等二苯基酮衍生物、2，2-二甲氧基·2_苯基乙醯苯、 2,2-二乙氧基乙醯苯、卜羥基環己基苯基酮、α-羥基-2_甲 基苯基丙酮、1-羥基-1-甲基乙基·（對異丙基苯基）酮、丨-羥 基-1-(對十二烷基苯基）酮、2-甲基-(4’-(甲硫基）苯基）-2-味啉-1-丙酮、2-苄基-2-二甲胺基-1-(4-味啉基苯基）-丁酮 _1、2,4,6 -三甲基苯甲醯基-二苯基-膦氧化物、三氯 甲基-(對丁基苯基）酮、2_苄基·2_二甲胺_4·味啉丁醯苯等乙 醯苯衍生物、噻噸酮（thioxanthone)、2-乙基噻噸酮、2-異丙 -39- 200937050 基噻噸酮、2-氯噻噸酮、2，4-二甲基噻噸酮、2,4-二乙基噻 噸酮、2,4-二異丙基噻噸酮等噻噸酮衍生物、對二甲胺苯 甲酸酯、對二乙胺苯甲酸酯等苯甲酸酯衍生物等。 縮酮化合物可舉出苄基二甲基縮酮、苄基·β_甲氧基乙 基縮醛等。 苯偶姻化合物可舉出間苯偶姻丙基醚、苯偶姻異丁基 醚、苯偶姻乙基醚、甲基鄰苯甲醯基苯甲酸酯等。 吖啶化合物可舉出9-苯基吖啶、9-耻啶基吖啶、9-吡 阱基吖啶、1,2-二（9-吖啶基）乙烷、1，3-二（9-吖啶基）丙烷、 1，4-二（9-吖啶基）丁烷、1,5-二（9-吖啶基）戊烷、1，6-二（9-吖啶基）己烷、1，7_二（9-吖啶基）庚烷、1,8-二（9-吖啶基）辛 烷、1，9-二（9-吖啶基）壬烷、1，1〇-二（9 -吖啶基）癸烷' 1,11-二（9-吖啶基）十一烷及1，12-二（9-吖啶基）十二烷等的二（9-V陡基）鍵院等。 有機過氧化化合物可舉出例如過氧化三甲基環己酮、 過氧化醯基丙酮、1，1-雙（第三丁基過氧）-3,3,5-三甲基環己 烷、1,1-雙（第三丁基過氧）環己烷、2，2-雙（第三丁基過氧） 丁烷、第三丁基過氧化氫、氫過氧化異丙苯（cumene hydroperoxide)、二異丙基苯過氧化氫、2,5·二甲基己院 -2,5-二過氧化氫、1，1，3,3-四甲基丁基過氧化氫、過氧化第 三丁基異丙苯、過氧化二異丙苯（dicumy1 Peroxide)、2,5-二甲基-2,5-二（第三丁基過氧）己烷、2,5-過氧化噚烷醯 (2，5-oxanoyl peroxide)、過氧化琥拍酸、過氧化苯偶姻、 過氧化2,4-二氯苯甲醯、二異丙基過氧化二碳酸酯、二-2-乙基己基過氧化二碳酸酯、二乙氧基己基過氧化二碳酸 -40- 200937050 ' 酯、二甲氧基異丙基過氧化二碳酸酯、二（3-甲基-3-甲氧基 丁基）過氧化二碳酸酯、第三丁基過氧化乙酸酯、第三丁基 過氧化三甲基乙酸醋（ter-butyl peroxypivalate)、第三丁基 過氧化新癸酸酯、第三丁基過氧化辛酸酯、第三丁基過氧 化月桂酸酯、第三碳酸酯、3,3’，4,4’-四-(第三丁基過氧化 羰基）二苯基酮、3,3’，4,4’-四-(第三己基過氧化羰基）二苯 基酮、3,3’，4,4’-四-(對異丙基異丙苯基過氧化羰基）二苯基 酮、羰基二（第三丁基過氧化二氫二酞酸酯）、羰基二（第三 〇 己基過氧化二氫二酞酸酯）等。 偶氮化合物可舉出例如特開平8- 1 0862 1號公報所記載 之偶氮化合物等。 香豆素化合物可舉出例如3-甲基-5-胺基- ((S-三阱-2-基）胺基）-3-苯基香豆素、3-氯-5-二乙基胺基-((s-三阱-2-基）胺基）-3-苯基香豆素、及3-丁基-5-二乙基胺基-((s-三畊 •2·基）胺基）-3-苯基香豆素等。 疊氮化合物可舉出例如美國專利第2848328號說明 ❹ 書、美國專利第2 8 5 23 79號說明書及美國專利第2940853 號說明書所記載之有機疊氮化合物、2,6-雙（4-疊氮亞苄 基）-4-乙基環己酮（BAC-E)等。 金屬茂化合物可舉出特開昭5 9- 1 523 96號公報、特開 昭61-151197號公報、特開昭63-41 484號公報、特開平 2-2 49號公報、特開平2-4 705號公報、特開平5-83588號 公報所記載之各種二茂鈦（titanocene)化合物、例如二-環戊 二烯-Ti-聯苯、二·環戊二烯-Ti-雙-2,6-二氟苯-1-基、二-環戊二烯-Ti-雙-2,4-二氟苯-1-基' 二-環戊二烯_Ti_雙 -41- 200937050 -2,4,6-三氟苯-1-基、二-環戊二烯-Ti-雙-2,3,5,6-四氟苯-κ 基、二-環戊二烯-Ti-雙- 2,3,4，5，6-五氟苯-1-基、二·甲基環 戊二烯-1^-雙-2,6-二氟苯-1-基、二-甲基環戊二烯_丁丨-雙 -2,4,6-三氟苯-1-基、二-甲基環戊二烯-丁丨-雙_2,3,5,6-四氟 苯-1-基、二-甲基環戊二烯- Ti-雙-2，3,4,5,6-五氟苯-1-基、 特開平1-30 44 53號公報及特開平1_1521〇9號公報所記載 之鐵-芳烴（arene)錯合物等。 六芳基二咪唑化合物可舉出例如特公平6·29285號公 報、美國專利第3,479,185號、同第4,311，783號、同第 4,622,286號等各說明書所記載之各種化合物，具體上可舉 出2,2*-雙（鄰氯苯基）-4,4’，5,5’-四苯基二咪唑、2,2’-雙（鄰 溴苯基））4,4’，5,5’-四苯基二咪唑、2,2’-雙（鄰，對二氯苯 基））4,4’，5,5’·四苯基二咪唑、2,2’-雙（鄰氯苯基））4,4’，5,5’-肆（間甲氧基苯基）二咪唑、2，2’-雙（鄰，鄰，-二氯苯 基））4,4 ’，5,5 四苯基二咪唑、2,2’-雙（鄰硝基苯 基）-4,4 ’，5,5 四苯基二咪唑、2,2’-雙（鄰甲基苯 基）-4,4 ’，5,5’-四苯基二咪唑、及 2，2’ -雙（鄰三氟苯 基）-4,4’，5，5’-四苯基二咪唑等。 有機硼酸鹽化合物可舉出的具體例，例如特開昭 62-143044 號、特開昭 62-150242 號、特開平 9-188685 號、 特開平9-188686號、特開平9-188710號、特開2000-131837 號、特開 2002- 1 079 1 6號、特許第 2764769號、特開 2002- 1 1 6539 號等各公報及 Kunz，Martin “Rad Tech’ 98. Proceeding April 19-22，1998 年，Chicago” 等所記載之有 機硼酸鹽、特開平6- 1 57623號公報、特開平6- 1 7 5 5 64號 200937050 ‘ 公報、特開平6-175561號公報所記載之有機硼锍錯合物或 有機硼氧锍（boronoxosulfonium)錯合物、特開平6- 1 7 5 554 號公報、特開平6- 1 75 5 5 3號公報所記載之有機硼碘鑰 (boron iodonium)錯合物、特開平9- 1 8 87 1 0號公報所記載 之有機硼鏑（boron phosphonium)錯合物、特開平6-3 4 80 1 1 號公報、特開平7- 128785號公報、特開平7-140589號公 報、特開平7-306527號公報、特開平7-292014號公報等 之有機硼過渡金屬配位錯合物等。 Φ 二碾化合物可舉出例如特開昭61 -1 66544號公報、特 開2002-328465說明書等所記載之化合物等。 月弓酯（oxime ester)化合物可舉出例如 J.C.S. Perkin 11(1979) 1653-1660)、 J.C.S. Perkin 11(1979)156-162、光聚 合物科學及技術期刊（Journal of Photopolymer Science and Technology )( 1 995 年）202-232、特開 2000-66385 號公報記 載之化合物、及特開2000-80068號公報、特表2004-534797 號公報所記載之化合物。具體例係以 CIBA SPECIALTY φ CHEMICALS 公司（Ciba Japan K.K.)製的 IRGACURE OXE-01、OXE-02 等爲佳。 鐵鹽化合物可舉出例如S. I. Schlesinger, Photogr. Sci. Eng., 18,387(1974 年）、T. S. Bal 等人 » Polymer, 21,423 (1980年）所記載之二哇鎗（diazonium)鹽、美國專利第 4,069,055號說明書、特開平4-3 65049號等所記載之銨鹽、 美國專利第4,069,055號、同4,069,056號的各說明書所記 載之鑰鹽、歐洲專利第104、143號、特開平2-150848號 公報、特開平2-2965 1 4號公報之各公報所記載之碘鎗鹽等。 -43- 200937050 本發明適合使用的碘鎩鹽係二芳基碘鎗鹽，從安定性 的觀點’以被2個以上院基、院氧基、芳氧（aryl〇Xy)基等 電子給予性基取代爲佳。 本發明適合使用之锍鹽可舉出歐洲專利第370,693號 說明書、同390,214號說明書、同233,567號說明書、同 297,443號說明書、同297,442號說明書、美國專利第 4,93 3,3 77號說明書、同4,760,0 1 3號說明書、同4734,444 號說明書、同2,833,827號說明書、德國專利第2,904,626 號說明書、同3,6〇4,580號說明書、同3,604,581號說明書 之各說明書所記載之鑰鹽，從安定性的敏感度而言，以被 電子吸引性基取代爲佳。電子吸引性基之哈曼特値以比0 大爲佳。較佳之電子吸引性基可舉出鹵素原子及羧酸等。 又，其他較佳锍鹽可舉出三芳基锍鹽之一個取代基具 有香豆素、蒽醌結構且在3 0 0奈米以上具有吸收之锍鹽。 另外之較佳锍鹽可舉出三芳基锍鹽具有芳氧（aryl oxy)基、 芳硫基作爲取代基且在3 00奈米以上具有吸收之毓鹽。 又，鑰鹽化合物可舉出】.V. Crivello 等人，大分子 (Macromolecules)，10(6)，1 3 07( 1 97 7 年）、J. V. Crivello 等 人，J. Polymer Sci.，Polymer C hem Ed ., 1 7，1 0 4 7 ( 1 9 7 9 年） 所記載之硒鑰（selenonium)鹽、C. S_ Wen 等人，丁£11,?]'〇〇· Conf. Rad. Curing ASIA,第 478 頁 To k y ο，1 0 月（1 9 8 8 年） 所記載之砷鎗鹽（arsonium)等鎗鹽。 醯基膦（氧化物）化合物可舉出 CIBA SPECIALTY CHEMICAL 公司製之 IRGACURE8 1 9、DAROCURE 4265、 DAROCURE TPO 等。 200937050 ' 從曝光敏感度化的觀點，（D)光聚合引發劑以選自由三 鹵甲基三阱系化合物、苄基二甲基縮酮化合物、羥基酮 化合物、α-胺基酮化合物、醯基膦化合物、氧化膦系化合 物、金屬茂化合物、肟系化合物、三芳基咪唑二聚物 (triarylimidazole)、鎗系化合物、苯并噻哇化合物、二苯 基酮系化合物、乙醯苯化合物及其衍生物、環戊二烯-苯-鐵錯合物及其鹽、鹵甲基嗶二唑化合物、3 -芳基取代香豆 素化合物所組成群組之化合物爲佳。 〇 以三鹵甲基三畊系化合物、α-胺基酮化合物、醯基膦 化合物、氧化膦系化合物、肟系化合物、三芳基咪唑二聚 物、鑰系化合物、二苯基酮系化合物及乙醯苯化合物爲更 佳。以選自由三鹵甲基三阱系化合物、α-胺基酮化合物、 肟系化合物、三芳基咪唑二聚物及二苯基酮系化合物所組 成群組之至少一種化合物爲最佳。 (D)光聚合引發劑的含量係相對於感光性著色組成物 層中的總固體成分以〇·1〜20質量％爲佳，以0.5〜15質量 Q %爲更佳，以1〜10質量％爲特佳。在此範圍能夠得到良好 的敏感度及圖案形成性。 (Ε)溶劑 本發明所使用的感光性著色組成物，通常能夠使用溶 劑來調製。 作爲溶劑，酯類有例如乙酸乙酯、乙酸正丁酯、乙酸 異丁酯、甲酸戊酯、乙酸異戊酯、乙酸異丁酯、丙酸丁酯、 丁酸異丙酯、丁酸乙酯、丁酸丁酯、烷酯類、乳酸甲酯、 乳酸乙酯、羥基乙酸甲酯、羥基乙酸乙酯、羥基乙酸丁酯、 -45- 200937050 甲氧基乙酸甲酯、甲氧基乙酸乙酯、甲氧基乙酸丁酯、乙 氧基乙酸甲酯、乙氧基乙酸乙酯；3-羥基丙酸甲酯、及3-羥基丙酸乙酯等的3-羥基丙酸烷酯類（例如3-甲氧基丙酸 甲酯、3-甲氧基丙酸乙酯、3-乙氧基丙酸甲酯及3-乙氧基 丙酸乙酯等）；2-羥基丙酸甲酯、2-羥基丙酸乙酯、2-羥基 丙酸丙酯等的2-羥基丙酸烷酯類（2-甲氧基丙酸甲酯、2-甲 氧基丙酸乙酯、2 -甲氧基丙酸丙酯、2 -乙氧基丙酸甲酯、 2-乙氧基丙酸乙酯、2-羥基-2-甲基丙酸甲酯、2-羥基-2-甲 基丙酸乙酯、2-甲氧基-2-甲基丙酸甲酯、2-乙氧基-2-甲基 丙酸乙酯）、及丙酮酸甲酯、丙酮酸乙酯、丙酮酸丙酯、乙 醯乙酸甲酯、乙醯乙酸乙酯、2-側氧基丁酸甲酯、2-側氧 基丙酸乙酯、1，3-丁二醇二乙酸酯等； ’ 醚類有例如二甘醇二甲基醚、四氫呋喃 (tetrahydrofuran)、乙二醇一甲基醚、乙二醇單乙基醚、甲 基賽路蘇乙酸酯（methyl cellosolve acetate)、乙基賽路蘇乙 酸酯、二甘醇一甲基醚、二甘醇一乙基醚、二甘醇一丁基 醚、丙二醇甲基醚乙酸酯、丙二醇乙基醚乙酸酯、丙二醇 丙基醚乙酸酯、二甘醇二乙基醚、二甘醇一乙基醚乙酸酯、 二甘醇一丁基醚、二甘醇一丁基醚乙酸酯、丙二醇正丙基 醚乙酸酯、丙二醇二乙酸酯、丙二醇正丁基醚乙酸酯、丙 二醇苯基醚、丙二醇苯基醚乙酸酯、二伸丙甘醇一甲基醚 乙酸酯、二伸丙甘醇正丙基醚乙酸酯、二伸丙甘醇正丁基 醚乙酸酯、三伸丙甘醇一正丁基醚及三伸丙甘醇一甲基醚 乙酸酯等； 酮類有例如丙酮、甲基乙基酮、環己酮 -46- 200937050 (cyclohexanone)、2-庚酮及 3-庚酮等； 醇類有例如乙醇、異丙醇、丙二醇甲基醚、丙二醇一 正丙基醚、丙二醇一正丁基醚；及 芳香族烴類有例如甲苯、二甲苯等。 此等之中，以3 -乙氧基丙酸甲酯、3·乙氧基丙酸乙酯、 乙基賽路蘇乙酸酯、乳酸乙酯、二甘醇二甲基醚、乙酸丁 酯、3 -甲氧基丙酸甲醋、2 -庚酮、環己酮、乙基卡必醇乙 酸酯、丁基卡必醇乙酸酯、丙二醇甲基醚、丙二醇甲基醚 Q 乙酸酯及丙二醇乙基醚乙酸酯等爲佳。 溶劑可單獨使用，亦可組合2種以上而使用。 其他的添加物 又，在本發明所使用的感光性著色組成物除了上述成 分以外，亦可按照目的更使用各種眾所周知的添加劑。 以下，敘述此種添加劑。 分散劑 本發明之感光性著色組成物以含有高分子分散劑爲 φ 佳。該高分子分散劑係重量平均分子量爲3,000〜100,000 的範圍之樹脂。而且，酸價以20〜300mg/g爲佳。以下， 會有將此種高分子聚合物簡稱爲「分散樹脂」之情形。 在本發明之分散樹脂係具有能夠作爲前述作爲（A-1) 著色劑所舉出顏料的分散劑、或在後述用以形成黑色矩陣 之感光性濃色組成物作爲遮光劑（黑色矩陣形成用顏料）的 分散劑之功能之化合物。 因爲分散樹脂必須具有特定的酸價，以具有酸性基之 高分子化合物爲佳。 -47- 200937050 該高分子化合物的高分子骨架以選自由乙烯系單體的 聚合物或共聚物、酯系聚合物、醚系聚合物、胺基甲酸酯 系聚合物、醯胺系聚合物、環氧系聚合物、聚矽氧（si lie one) 系聚合物及該等改性物或共聚物[例如包含聚醚/聚胺基甲 酸酯共聚物、聚醚/乙烯系單體的聚合物之共聚物等（無規 共聚物、嵌段共聚物、接枝共聚物之任一者均可）]所組成 群組之至少一種爲佳，以選自由乙烯系單體的聚合物或共 聚物、酯系聚合物、醚系聚合物、胺基甲酸酯系聚合物及 該等改性物或共聚物所組成群組之至少一種爲更佳，以乙 烯系單體的聚合物及乙烯系共聚物爲特佳。 又，在如上述的高分子骨架導入酸性基之方法，可舉 出例如在聚合上述的高分子骨架時與含有酸性基之單體共 聚合之方法：或在聚合上述的高分子骨架後藉由高分子反 應來導入之方法。 含有酸性基之單體可舉出例如（甲基）丙烯酸、巴豆酸 (crotonic acid)、伊康酸（itaconic acid)、順丁 稀二酸（maleic acid)、反丁 稀二酸（phmalic acid)、桂皮酸（cinnamic acid)、 丙烯酸二聚物（acrylic acid dimer)、乙烯基苯甲酸、苯乙烯 基磺酸、2-丙烯醯胺-2-甲基丙磺酸、磷酸一（甲基）丙烯醯 乙酯、或是藉由使甲基丙烯酸2-羥基乙酯等的含醇性羥基 之單體與順丁烯二酸酐、酞酸酐等的環狀酸酐等反應所得 到的單體等。 而且，具有酸性基之高分子化合物亦可以是進而含乙 烯系單體成分作爲共聚合成分者。 前述乙烯基單體沒有特別限定，例如以（甲基）丙烯酸 200937050 二酿jt 酸烯Η 二丙} ¾}基 HSE- _~~, 甲 ίν 順{及 、 、 類 類類烯 酯酯乙 烯二苯 乙酸、 、康類 類伊酯 酯、的 酸類醇 豆酯烯 巴二乙 、 酸 、 類二類 酯烯醚 酯胺 腈 佳 . 爲 類類等 丁烯 反乙 基基 性酯 酸酸 Γ 硫 述一 前 、 基 酸The Television Standards Committee has a viewpoint of the hue shift of the reference. The mass ratio of the red pigment to the yellow pigment is preferably 100: 5 to 100: 50. In particular, the above mass ratio is preferably in the range of 1 〇〇: 1 〇 to 100: 30. In addition, the combination of the red pigments can be adjusted in accordance with the chromaticity. Further, the pigment for the green phase (G) can be a halogenated phthalocyanine pigment alone or in combination with a disazo yellow pigment, a quinoline yellow pigment, an azomethine pigment or an isoindole. pigment. For example, 'this -24- 200937050 examples to mix C. I·Pigment Green 7, 36 or 37 and c. I. Pigment Yellow 83, C. I. Pigment Yellow 138, C. I_Pigment Yellow 139, C_I. Pigment Yellow 150, C. I. Yan Huang 180, or C. I. Pigment Yellow 185 is preferred. From the viewpoint of obtaining sufficient color purity and suppressing the hue shift from the NTSC standard, the mass ratio of the green pigment to the yellow pigment (green pigment: yellow pigment) is preferably 1 〇〇: 5 to 100: 150. The mass ratio is particularly good in the range of 100: 30 to 100:120. The pigment for the blue phase (B) can be used alone or in combination with a diterpene violet pigment. For example, mixing C. I. Pigment Blue 15: 6 with © C. I. Pigment Violet 23 is preferred. The mass ratio of the blue pigment to the purple pigment is preferably 100:0 to 100:50, and more preferably 100:5 to 100:30. The content of the (A-1) colorant (pigment) in the photosensitive coloring composition layer used in the present invention is preferably 25 to 75 mass% based on the total solid content (mass) of the composition. 32 to 70% by mass is more preferred. (A-1) When the content of the coloring agent (pigment) is within the above range, the color density is sufficient and excellent color characteristics can be effectively ensured. _ (B) Binder polymer ❹ The photosensitive coloring composition of the present invention preferably contains a binder polymer for the purpose of improving film properties and imparting development characteristics. The binder polymer can use the following alkali-soluble resin. The alkali-soluble resin-based linear organic high molecular polymer used in the present invention can have at least one alkali-suppressing property from a molecule (preferably an acrylic copolymer or a styrene copolymer as a main chain). An alkali-soluble resin of a group (for example, a carboxyl group, a phosphoric acid group, a sulfonic acid group, or a hydroxyl group) is appropriately selected. -25-200937050 The above-mentioned preferred product of the alkali-soluble resin is a polymer having a carboxylic acid group in a side chain, for example, JP-A-59-44615, JP-A-54-34327, and JP-A-5 8- 1 a methacrylic acid copolymer, an acrylic copolymer, an itaconic acid copolymer, a crotonic acid copolymer, and a crotonic acid copolymer, which are described in JP-A-54-59536, JP-A-59-53836, JP-A-59-71048, Acrylic acid such as a maleic acid copolymer, a partially esterified maleic acid copolymer, or the like, and an acidic cellulose derivative having a carboxylic acid in a side chain, a polymer having a hydroxyl group, and an acid anhydride added thereto Copolymer. The acid value of the alkali-soluble resin is preferably 10 to 200 mgKOH/g, more preferably 30 to 180 mgKOH/g, and still more preferably 50 to 150 mgKOH/g. The specific constituent unit of the alkali-soluble resin is particularly preferably a copolymer of (meth)acrylic acid and another monomer copolymerizable therewith, and the other monomer which can be copolymerized with (meth)acrylic acid is exemplified ( Alkyl methacrylate, aryl (meth) acrylate, vinyl compound, and the like. The hydrogen atom of the alkyl group and the aryl group may also be substituted by a substituent. The alkyl (meth)acrylate and the aryl (meth)acrylate are CHfC^R^KCOOR3). Here, R1 represents a hydrogen atom or an alkyl group having a carbon number of 1 to 5, and R3 represents a carbon number of 1 to 8. An alkyl group or an aralkyl group having a carbon number of 6 to 12. Specific examples thereof include methyl (meth)acrylate, ethyl (meth)acrylate, propyl (meth)acrylate, butyl (meth)acrylate, isobutyl (meth)acrylate, and (methyl). Amyl acrylate, hexyl (meth) acrylate, octyl (meth) acrylate, phenyl (meth) acrylate, benzyl (meth) acrylate, toluene (meth) acrylate, naphthalene (meth) acrylate Ester, cyclohexyl (meth) acrylate, (methyl) 200937050 hydroxyalkyl acrylate (alkyl group having 1 to 8 carbon atoms), hydroxyglycidyl methacrylate and tetrahydro methacrylate Ester ester and the like. Further, a resin having a polyalkylene oxide chain in a molecular side chain as a bismuth soluble resin is also preferred. The above polyalkylene oxide chain-based polyethylene oxide chain, polypropylene oxide chain, and polybutadiene glycol chain may be used in combination, and the terminal hydrogen atom may be a linear or branched alkyl group. The repeating unit of the polyethylene oxide chain and/or the polypropylene oxide chain is preferably 1 to 20, more preferably 2 to 12. The acrylic copolymer having a polyalkylene oxide chain in the side chain is, for example, polyethylene glycol mono(meth)acrylate, polypropylene glycol mono(meth)acrylate, poly(ethylene glycol-propylene glycol). a (meth) acrylate or the like and a compound obtained by interlocking the terminal OH group with an alkyl group, for example, methoxypolyethylene glycol mono(meth)acrylate or ethoxypolypropylene glycol (a) Acrylic acid copolymer, such as acrylate, methoxy poly(ethylene glycol-propylene glycol) mono(meth) acrylate, etc. as a copolymerization component. The vinyl compound is CHfCRiR2 (wherein R1 represents a hydrogen atom φ or an alkyl group having 1 to 5 carbon atoms, and R2 represents an aromatic hydrocarbon ring having 6 to 10 carbon atoms), and specific examples thereof include styrene. 〇: -methylstyrene, styryltoluene, acrylonitrile, vinyl propionate, oxime-vinylpyrrolidone, polystyrene macromonomer and polymethyl methacrylate macromolecule. The other monomers which can be copolymerized may be used singly or in combination of two or more. Among these, a multicomponent copolymer composed of a benzyl (meth)acrylate/(meth)acrylic acid copolymer or a benzyl (meth)acrylate/(meth)acrylic acid copolymer/other monomer is particularly preferred. . -27- 200937050 The acrylic resin has an acid value in the range of 20 to 200 mgKOH/g as described above. When the acid value is 200 or less, the solubility of the acrylic resin to the alkali does not become too large, and it is possible to prevent an appropriate range of development (development latitude is narrowed. On the other hand, when it is 20 or more, The solubility is not reduced, and the development time can be prevented from being prolonged. In order to achieve a viscosity range in which the photosensitive coloring composition is easily used in a coating process or the like, and to ensure film strength, the weight of the acrylic resin The average molecular weight Mw (in terms of polystyrene measured by GPC method (Gel Permeation Chromatography)) is preferably 2,000 to 100,000, more preferably 3,000 to 50,000. In the crosslinking efficiency of the photosensitive coloring composition of the invention, the resin having a polymerizable group in the alkali-soluble resin or the alkali-soluble resin having no polymerizable group may be used alone, and the aryl group or the (meth)acryl group may be contained in the side chain. A polymer such as an aryloxyalkyl group or the like is useful. The hydrazine-soluble resin having a polymerizable double bond can be imaged in an alkaline developing solution, and is photocurable. In the case of a polymer having such a polymerizable group, when an alkali-soluble group such as a COOH group or an OH group or a carbon-carbon unsaturated bond is contained in one molecule, (1) A compound obtained by reacting a compound containing an unreacted isocyanate group and at least one (meth) acrylonitrile group by reacting an isocyanate with an OH group in advance, and reacting with a carboxyl group-containing acrylic resin A urethane-modified acrylic resin containing a polymerizable double bond, -28- 200937050 (2) Reactive with a carboxyl group-containing acrylic resin and a compound having both an epoxy group and a polymerizable double bond in the molecule And the obtained unsaturated group-containing acrylic resin, (3) acid side-contact type epoxy acrylate resin, (4) polymerizable property obtained by reacting an OH group-containing acrylic resin with a dibasic acid anhydride having a polymerizable double bond The double-bonded acrylic resin is preferably the resin of (1) and (2). The specific example can be used, for example, 2-hydroxyethyl acrylate having an OH group, and methacrylic acid having a COOH group, and Able with this A copolymer of a monomer such as a copolymerized acrylic or vinyl compound, which contains a compound having an epoxy ring and an intercarbon unsaturated bond group reactive with an OH group (for example, a compound such as glycidyl acrylate) In the reaction with the OH group, a compound having an acid anhydride, an isocyanate group or an acrylonitrile group may be used in addition to the epoxy ring. Further, it can also be used in JP-A-6-1 02669, A compound obtained by reacting a compound having an epoxy ring as described in JP-A-6-1938 with an unsaturated carboxylic acid such as acrylic acid, and reacting a saturated or unsaturated polybasic acid anhydride. Examples of the compound having an alkali solubilizing group and an intercarbonic unsaturated group such as a COOH group include, for example, DIANAL NR series (Mitsubishi Rayon Co.). , Ltd.); Photomer 6173 (Polyurethane acrylic olgomer, manufactured by Diamond Shamrock Co., Ltd.); VISCOTE R-264, KS RESIST 106 (both Osaka Organic Chemistry - 29- 200937050 Industry (Osaka Organic Chemical Industry Ltd. )) - CYLCOMER P series, PLACEL series (all manufactured by DAICEL Chemical Industries, Ltd.); Ebecryl 3 800 (manufactured by DAICEL-CYTEC). The amount of the alkali-soluble resin to be added is preferably from 3 to 30% by mass, more preferably from 5 to 20% by mass, based on the total solid content of the photosensitive concentrated composition layer. When the photosensitive thick color composition is prepared, it is preferable to add the following epoxy resin as the binder polymer in addition to the above-mentioned alkali-soluble resin. Examples of the epoxy resin include a bisphenol (bisphen〇l) type A epoxy resin, a cresol novolac varnish (cresolnovolac) type epoxy resin, a biphenyl type epoxy resin, and an alicyclic epoxy compound. A compound containing two or more epoxy rings in the molecule. For example, bisphenol A type epoxy resins include EPOTOHTO YD-115, YD-118T, YD-127, YD-128, YD-134, YD-8125, YD-7011R, ZX-1059, YDF-8170 , YDF-170, etc. (above, Dongdu Huacheng) (Tohto kasei Co. ,Ltd. )), DENACOL ΕΧ-11 (Π, EX-1102, EX-1103 ❹, etc. (above, Nagase ChemteX), PLACCEL GL-61, GL-62, G101, G102 (above, DAICEL Chemical Industry ( In addition, it is also possible to use a bisphenol F type epoxy resin and a bisphenol S type epoxy resin similar to this. It is also possible to use Ebecryl 3 7 00, 3 70 1 , 600. (The above epoxy acrylates such as 'DAICEL-CYTEC Co., Ltd.'). The cresol novolak type can be exemplified by EPOTOTHOYDPN-6 3 8 , YDPN-701, YDPN-702, -30- 200937050 • YDPN-703 &gt; YDPN-704 (above, Dongdu Chemical Co., Ltd.), DENACOLEM-125, etc. (above NAGASE). Biphenyl type epoxy resins include 3,5,3',5'-tetramethyl-4 Examples of the alicyclic epoxy compounds such as 4'-diepoxypropyl biphenyl include CELL OXIDE 2021, 2081, 2083, 2085, EPOLEAD GT-301, GT-302, GT-401, GT403, and EHPE-3150. (above, DAICEL Chemical Industry Co., Ltd.), S ΑΝΤΟΗΤΟ ST-3000, ST-4000 &gt; ST-5080, ST-5100, etc. (above, Dongdu Chemical Co., Ltd.), Epiclon 430, and 673 With the same 695, the same 850S, the same 4032 (in φ, the Japanese IKK Chemical Industry Co., Ltd. (DICC〇rp〇rati〇n)), etc., can also use 1,1,2,2-肆 ( P-epoxyphenoxyphenyl)ethane, ginseng (p-glycidoxyphenyl)methane, triepoxypropyl ginseng (hydroxyethyl) isocyanurate, o-nonanoic acid di-glycidyl Ester, bis-glycidyl phthalate, EPOTOTHOYH-434, YH-434L which can also use amine type epoxy resin, and ring made of dimer acid in the skeleton of bisphenol A type epoxy resin Oxypropyl propyl ester, etc. Among these, "the number of molecular weights / epoxy rings" is preferably 1 or more, preferably from 130 to 500. When the "molecular weight / number of epoxy rings" is small, it is hardened. It has high elasticity and high shrinkage at the time of hardening, and is too large to be insufficient in hardenability and lacks reliability, or flatness is deteriorated. Specific examples of preferred compounds include EPOTOTHO YD-115, 118T, 127&gt; YDF-170 ' YDPN-638 ' YDPN-701' YDPN-702 ' PLACCEL GL-61, GL-62, 3,5,3' , 5' -Tetramethyl-4,4'-diepoxypropylbiphenyl, CELLOXIDE 2031, 2081, EPOLEAD GT-302 GT403 EHPE-3 1 50, and the like. (C-1) Polymerizable Compound -31 - 200937050 The photosensitive color mixture composition used in the present invention preferably contains (C-1) a polymerizable compound. The polymerizable compound which can be used in the present invention is an addition polymerizable compound having at least one ethylenically unsaturated double bond, and can be selected from compounds having at least one, preferably two or more terminal ethylenically unsaturated bonds. Such a compound group is widely known in the industrial field, and in the present invention, it can be used without particular limitation. These have chemical forms such as monomers, prepolymers (i.e., dimers, trimers) and oligomers, or mixtures thereof, and the like. Examples of the monomer and the copolymer thereof include unsaturated carboxylic acids (for example, acrylic acid, methacrylic acid, itaconic acid, crotonic acid, isocrotonic acid, maleic acid, etc.), or esters thereof, and decylamine. Preferably, an ester of an unsaturated carboxylic acid and an aliphatic polyol compound, an amide of an unsaturated carboxylic acid and an aliphatic polyamine compound are used. Further, an addition reaction of an unsaturated carboxylate or a guanamine having a nucleophilic substituent such as a hydroxyl group, an amine group or a thiol group with a monofunctional or polyfunctional isocyanate or epoxy group, and a monofunctional or A dehydration condensation reaction product of a polyfunctional carboxylic acid or the like is also suitably used. Further, an unsaturated carboxylic acid ester having an electrophilic substituent such as an isocyanate group or an epoxy group or an oxime amine and an addition reaction product of a monofunctional or polyfunctional alcohol 'amine or a thiol, and further having a halogen Suitable substituted carboxylic acid esters or guanamines of a destructive substituent such as a p-toluenesulfonyloxy group and a monofunctional or polyfunctional alcohol, an amine or a mercaptan are also suitable. Further, in other examples, a compound group obtained by substituting an unsaturated sulfonic acid, styrene, or vinyl ether for the above unsaturated carboxylic acid can be used. Specific examples of the monomer of the aliphatic polyol compound and the ester of an unsaturated carboxylic acid include ethylene glycol diacrylate, triethylene glycol diacrylate, -32-200937050 • I3·butylene glycol diacrylate, Butanediol diacrylate, propylene glycol diacrylate, neopentyl glycol diacrylate, trimethylol triacrylate, trimethylolpropane tris(propylene methoxypropyl) ether, trimethylol Alkane triacrylate, hexanediol diacrylate, I,4-cyclohexanediol diacrylate, tetraethylene glycol diacrylate, neopentyl alcohol diacrylate, neopentyl alcohol triacrylate, neopenta tetra Alcohol tetraacrylate, dipentaerythritol diacrylate, dipentaerythritol hexaacrylate, sorbitol triacrylate, sorbitol tetraacrylate, sorbitol pentaacrylate, sorbitol hexaacrylate , ginseng (propylene oxyethyl) isomeric cyanurate, polyester acrylate oligomer and yttrium cyanuric acid hydride modified triacrylate. Methacrylates are butanediol dimethacrylate, triethylene glycol dimethacrylate, neopentyl glycol dimethacrylate, trimethylolpropane trimethacrylate, trimethylol B Alkenyl trimethacrylate, ethylene glycol dimethacrylate, 1,3-butylene glycol dimethacrylate, hexanediol dimethacrylate, neopentyl alcohol dimethacrylate, neopentyl Tetraol trimethacrylate, pentaerythritol tetramethacrylate, dipentaerythritol dimethyl methacrylate, dipentaerythritol hexamethacrylate, sorbitol trimethacrylate, Sorbitol tetramethacrylate, bis[p-(3-methylpropenyloxy-2-hydroxypropoxy)benzene]dimethylmethane and bis-[p-(methacryloxy ethoxy ethoxylate) Base) phenyl] dimethylmethane and the like. Iconic acid esters include ethylene glycol diconconate, propylene glycol diconic acid vinegar, 1,3-butanediol diconconate, 1,4-butanediol diconcanate, and dibutyl Alcohol diconconate, neopentyl alcohol diconconate, sorbitol tetraconate, and the like. The crotonate is ethylene glycol dicrotonate, butanediol dicrotonic acid-33-200937050 ester, pentaerythritol dicrotonate, and sorbitol tetracrotonate. The isocrotonate is ethylene glycol diisocrotonate, pentaerythritol diisocrotonate, sorbitol tetraisocrotonate or the like. Maleic acid esters include ethylene glycol dimaleate, triethylene glycol dimaleate, pentaerythritol dimaleate, and sorbitol tetramaleic acid Ester and the like. Examples of the other esters include, for example, the aliphatic alcohol esters described in Japanese Patent Publication No. 5 1 - 4 7 3 3 4, and JP-A-59-196236, or JP-A-59-500 An ester having an aromatic 0 skeleton described in JP-A No. 2-226149 and an amine group-containing ester described in JP-A-1-156613 can also be used. Moreover, the aforementioned ester monomers can also be used in the form of a mixture. Further, specific examples of the monomer of the aliphatic polyamine compound and the carboxylic acid of the unsaturated carboxylic acid are methylene bis acrylamide, methylene bis methacrylamide, 1,6-hexamethylene double Acrylamide, iota, hexamethylene bis methacrylamide, diethylenetriamine propylene amide, benzodimethyl bis decylamine, benzene dimethyl methacrylate, and the like. Other preferred guanamine-based monomers include decylamine having a cyclohexene structure as described in JP-A-54-2 1726. Further, the urethane-based addition polymerizable compound produced by the addition reaction of an isocyanate and a hydroxy group is also preferable. Specific examples thereof include those described in JP-A-48-41708. A polyaminoisocyanate compound having two or more isocyanate groups, and a vinylamine group having two or more polymer vinyl groups in one molecule, which is a hydroxyl group-containing ethylene monomer represented by the following formula (V). Formate compound, etc. CH2 = C(R4)C00CH2CH(R5)0H (V) -34- 200937050 • (In the general formula (A), R4 and R5 are Η or CH3) Further, JP-A-51-37193, special fair The urethane urethanes described in No. 2-32293 and JP-A No. 2-16765, No. Sho 58-4 9860, Te Gong Sho 5 6 - 1 7 6 5 4, and Tegong Sho 62-3 94 1 7 It is also preferable to use a urethane-based urethane compound as described in JP-A-62- 3 94 1-8. The photosensitive polymerizable compound having an amine structure or a thioether structure in the molecule described in JP-A-63-277653 A photopolymerizable composition having a very high speed. Other examples include polyester acrylates and epoxies described in each of JP-A-48-64 1 83, JP-A-49-43 191, and JP-A-5-2-3490. A multifunctional acrylate or methacrylate such as an epoxy acrylate such as a resin or (meth)acrylic acid. Further, for example, the specific unsaturated compound described in each of the publications of Japanese Patent Publication No. Hei. No. Hei. No. Hei. No. Hei. Acid compound. Further, in some cases, the perfluoroalkyl group-containing structure described in JP-A-61-22048 is suitably used. Further, as a photocurable monomer and oligomer, the Journal of the Adhesion Society of Japan, Vol. 20, No. 7, and pages 00 to 3 08 (1984) can also be used. The structure of these polymerizable compounds, used alone or in combination, and the amount of addition can be arbitrarily set in accordance with the final performance design of the colored curable composition. For example, it can be selected from the following points of view. From the viewpoint of sensitivity, a structure having a large content of unsaturated groups per molecule is preferred, and most of the cases are preferably a bifunctional group or more. In addition, it is more preferable to increase the strength of the photosensitive coloring composition layer, which is a high-color image portion, in the case of a high-color image portion, and it is preferable to use a different functional number and a different polymerizable group (for example, acrylate). A method of adjusting both sensitivity and strength by using a methacrylate, a styrene-based compound or an ethylidene ether-based compound is also effective. From the viewpoint of the hardening sensitivity, a compound containing two or more (meth) acrylate structures is preferably used, and a compound containing three or more compounds is more preferably used, and a compound containing four or more is preferably used. Further, it is preferable to contain an EO-modified body from the viewpoint of hardening sensitivity and development of an unexposed portion. Further, from the viewpoint of the hardening sensitivity and the strength of the exposed portion, it is preferred to contain a urethane bond. Further, an addition polymerization compound is added to the compatibility and/or dispersibility with other components (for example, a binder polymer, an initiator, a colorant (pigment or dye), etc.) contained in the photosensitive coloring composition layer. The selection and the method of use are important factors. For example, by using a low-purity compound or a combination of two or more types, compatibility can be improved. Further, in order to improve adhesion to a substrate or the like, a specific structure can be selected. From the above viewpoints, preferred are bisphenol A diacrylate, bisphenol A diacrylate EO modified product, trimethylolpropane triacrylate, trimethylolpropane tri(propylene decyloxy group). Propyl)ether, trimethylolethane triacrylate, tetraethylene glycol diacrylate, neopentyl alcohol diacrylate, neopentyl alcohol triacrylate, neopentyl alcohol tetraacrylate, dipentaerythritol Alcohol tetraacrylate, dipentaerythritol pentaacrylate, dipentaerythritol hexaacrylate, sorbitol triacrylate, sorbitol tetraacrylate, sorbitol pentaacrylate, sorbitol hexaacrylate Further, tris(propylene methoxyethyl) isomeric cyanurate, neopentyl alcohol tetraacrylate EO modified body and dicotyl pentoxide 200937050 alcohol hexaacrylate EO modified body are preferred. Further, 'commercial products are urethane olygomer UAS-10, UAB-140 (Nippon Paper Chemicals Co., Ltd.), DPHA (Nippon Kayaku Co.) ,Ltd. )), UA-306H, UA-306T, UA-306I, AH-600, T-600, AI-600 (Kyoeisha Chemical Co.) ,Ltd. )) is better. Among them, bisphenol A diacrylate EO modified body, neopentyl alcohol triacrylate, neopentyl alcohol tetraacrylate, dipentaerythritol pentaacrylate, dipentaerythritol hexaacrylate, three ( More preferably, propylene methoxyethyl) isomeric cyanurate, neopentyl alcohol tetraacrylate EO modified product, and dipentaerythritol hexaacrylate EO modified product are commercially available as DPHA ( It is more preferable that Nippon Chemical Co., Ltd., UA-306H, UA-306T, UA-306I, AH-600, T-600, and AI-600 (manufactured by Kyoeisha Chemical Industry Co., Ltd.). (C-1) The content of the polymerizable compound is preferably from 5 to 55% by mass, more preferably from 10 to 50% by mass, based on the total solid content of the photosensitive coloring composition layer layer of the present invention. ~45% by mass is better. (D) Photopolymerization initiator The photosensitive color mixture of the present invention preferably contains (D) a photopolymerization initiator. The photopolymerization initiator is a compound which initiates and promotes polymerization of the (C-1) polymerizable compound by light decomposition, and preferably has an absorption in a region of a wavelength of 300 to 500 nm. Further, the photopolymerization initiator may be used alone or in combination of two or more. The photopolymerization initiator may, for example, be an organohalogen compound, an oxidiazole compound, a mineral-based compound, a ketal compound, a benzo-37-200937050 benzoin compound, a tf-acridine compound, Organic peroxidic compound, azo compound, coumarin compound, azide compound, metallocene compound, hexaaryl biiimidazoe compound, organoboron compound, dipropionic acid Compound, oxime ester compound, onium salt compound, acyphosphine oxide compound. Specific examples of the organohalogen compound include "Bull Chem."  Soc Japan, No. 42, 2924 (1969), U.S. Patent No. 3,905,815, Japanese Patent Publication No. Sho 46-4605, JP-A-48-36281, JP-A-55-32070, JP-A-60-239736, JP-A-61-169835, JP-A-61-169837, JP-A-62-58241, JP-A-62-212401, JP-A-63-70243, JP-A-63-298339, Μ .  P.  Hutt "The compound described in the article "Journal of Heterocyclic Chemistry" 1 (No. 3), (1970)", in particular, a trihalomethyl-substituted oxadiazole compound and s-three Preferably, the s-three-till compound is an s-tripper derivative in which at least one mono-, di-, or tri-halogen-substituted methyl group is bonded to the s-three-till ring, and specifically, for example, 2 is exemplified. 4,6-paraxyl(monochloromethyl)-s-tripper, 2,4,6-glucos(dichloromethyl)-s-triterpene, 2,4,6-cis (dichloromethyl)- S-dioxin, 2-methyl- 4,6-bis(dichloro)-s-tripper, 2-n-propyl-4,6-bis(trichloromethyl)-3-trimole, 2- («, ",; 8-trichloroethyl)-4,6-bis(trichloromethyl)-s-three tillage, 2-phenyl-4,6-bis(trichloromethyl)-s- Tri-trap, 2-(p-methoxyphenyl)-4,6-bis(trichloromethyl)-s-triterpene, 2-(3,4-epoxyphenyl)-4,6·double (trichloromethyl)-s-tripper, 2-(p-chlorophenyl)-4,6-bis(trichloromethyl)-s-tripper, 2-[1-(p-methoxybenzene 200937050 ❹ Ο ))·2,4-dibutyl sulphate]-4,6-bis(trichloromethyl)-s·trisole, 2-phenylethylidene-4,6- (trichloromethyl)-s-triterpene, 2-(p-methoxystyryl)-4,6-bis(trichloromethyl)-s-three tillage, 2-(p-isopropoxybenzene) Vinyl)-4,6-bis(trichloromethyl)-s-triterpene, 2-(p-tolyl)-4,6-bis(trichloromethyl)-s-dioxin, 2-(4 -naphthyloxynaphthyl)-4,6-bis(trichloromethyl)-s-three tillage, 2-phenylthio-4,6-bis(trichloromethyl)-s-three tillage, 2- Benzylthio-4,6·bis(trichloromethyl)-s-three tillage, 4-(o-bromo-p-N,N-(diethoxycarbonylamino)-phenyldi(trichloromethyl) )-s-three tillage, 2,4,6-gin (dibromomethyl)-s-three tillage, 2,4,6-gin (tribromomethyl)-s-three tillage, 2-methyl_ 4,6-bis(trichloromethyl)-s-three tillage and 2-methoxy-4,6-bis(tribromomethyl)_s-three tillage, etc. 噚二哩 compounds can be cited as 2 _ three Chloromethyl-5-styrene-1,3,4-indenyl, 2-trichloromethyl-5-(cyanobenzene)-1,3,4-oxadiazole, 2-dichloro Methyl-5-(naphthalen-1-yl)-1,3,4-indenyl, 2-trichloromethyl-5-(4-phenylethylene)styrene-1,3,4-anthracene Oxazole, etc. Examples of the carbonyl compound include benzophenone and MUhler. ,S ketone), 2-methyldiphenyl ketone, 3-methyldiphenyl ketone, 4-methyldiphenyl ketone, 2- gas diphenyl ketone, 4-bromodiphenyl ketone, 2_ a diphenyl ketone derivative such as mercapto diphenyl ketone, 2,2-dimethoxy-2-phenyl acetophenone, 2,2-diethoxyethyl benzene, and hydroxycyclohexyl phenyl ketone , α-hydroxy-2-methylphenylacetone, 1-hydroxy-1-methylethyl·(p-isopropylphenyl)one, 丨-hydroxy-1-(p-dodecylphenyl) ketone , 2-methyl-(4'-(methylthio)phenyl)-2-sodium phthalate-1-propanone, 2-benzyl-2-dimethylamino-1-(4-morpholinylphenyl) )-butanone_1,2,4,6-trimethylbenzimidyl-diphenyl-phosphine oxide, trichloromethyl-(p-butylphenyl)one, 2-benzyl group·2_ Ethyl benzene derivatives such as dimethylamine _4· benzoin butyl benzene, thioxanthone, 2-ethyl thioxanthone, 2-isopropyl-39-200937050 thioxanthone, 2-chlorothiazide a thioxanthone derivative such as ketone, 2,4-dimethylthioxanthone, 2,4-diethylthioxanthone, 2,4-diisopropylthioxanthone, p-dimethylamine benzoic acid a benzoate derivative such as an ester or p-diethylamine benzoate. The ketal compound may, for example, be a benzyldimethylketal or a benzyl-β-methoxyethylacetal. Examples of the benzoin compound include m-benzoin propyl ether, benzoin isobutyl ether, benzoin ethyl ether, and methyl phthalyl benzoyl benzoate. The acridine compound may, for example, be 9-phenyl acridine, 9-aziridine acridine, 9-pyridyl acridine, 1,2-bis(9-acridinyl)ethane or 1,3-di ( 9-Acridine)propane, 1,4-bis(9-acridinyl)butane, 1,5-bis(9-acridinyl)pentane, 1,6-di(9-acridinyl) Hexane, 1,7-bis(9-acridinyl)heptane, 1,8-bis(9-acridinyl)octane, 1,9-bis(9-acridinyl)decane, 1, 1〇-bis(9-acridinyl)decane' 1,11-bis(9-acridinyl)undecane and 1,12-bis(9-acridinyl)dodecane, etc. -V steep base) Keyyard and so on. The organic peroxidic compound may, for example, be trimethylcyclohexanone peroxide, perylene peroxide, 1,1-bis(t-butylperoxy)-3,3,5-trimethylcyclohexane, 1,1-bis(t-butylperoxy)cyclohexane, 2,2-bis(t-butylperoxy)butane, tert-butyl hydroperoxide, cumene hydroperoxide ), diisopropylbenzene hydroperoxide, 2,5·dimethylhexyl-2,5-dihydroperoxide, 1,1,3,3-tetramethylbutyl hydroperoxide, peroxidation Tributyl cumene, dicumyl peroxide, 2,5-dimethyl-2,5-di(t-butylperoxy)hexane, 2,5-peroxydecane 2,5-oxanoyl peroxide, icylic acid peroxide, benzoin peroxide, 2,4-dichlorobenzamide, diisopropylperoxydicarbonate, di-2-ethyl Hexylperoxydicarbonate, diethoxyhexylperoxydicarbonate-40- 200937050 'ester, dimethoxyisopropyl peroxydicarbonate, bis(3-methyl-3-methoxybutyl) Peroxydicarbonate, tert-butyl peroxyacetate, tert-butylperoxytrimethyl b Tert-butyl peroxypivalate, tert-butyl peroxy neodecanoate, tert-butyl peroxyoctanoate, tert-butylperoxylaurate, third carbonate, 3,3',4 , 4'-tetrakis-(t-butylperoxycarbonyl)diphenyl ketone, 3,3',4,4'-tetra-(t-hexylperoxycarbonyl)diphenyl ketone, 3,3', 4,4'-tetrakis-(p-isopropylcumylperoxycarbonyl)diphenyl ketone, carbonyl di(t-butylperoxydihydrodicarboxylate), carbonyldi(third decyl hexyl) Dihydrogen dicarboxylate) and the like. The azo compound, for example, an azo compound described in JP-A-8-108621. The coumarin compound may, for example, be 3-methyl-5-amino-((S-trit-2-yl)amino)-3-phenylcoumarin, 3-chloro-5-diethyl Amino-((s-trit-2-yl)amino)-3-phenylcoumarin, and 3-butyl-5-diethylamino-((s-three tillage•2·yl) Amino)-3-phenylcoumarin and the like. The azide compound may, for example, be an organic azide compound or a 2,6-bis (4-added group) as described in the specification of U.S. Patent No. 2,848,328, the specification of U.S. Patent No. 2,85,237, and the specification of U.S. Patent No. 2,940,853. Nitrobenzylidene)-4-ethylcyclohexanone (BAC-E) and the like. The metallocene compound is disclosed in Japanese Unexamined Patent Publication No. Hei. No. Hei. No. Hei. No. Hei. No. Hei. No. 61-151197, No. Sho. Various titanocene compounds described in JP-A-H05-83588, for example, di-cyclopentadiene-Ti-biphenyl and dicyclopentadiene-Ti-bis-2, 6-difluorophenyl-1-yl, di-cyclopentadiene-Ti-bis-2,4-difluorophenyl-1-yl' di-cyclopentadiene_Ti_double-41- 200937050 -2, 4,6-trifluorophenyl-1-yl, di-cyclopentadiene-Ti-bis-2,3,5,6-tetrafluorobenzene-κ, di-cyclopentadiene-Ti-bis-2 ,3,4,5,6-pentafluorophenyl-1-yl, di-methylcyclopentadienyl-1^-bis-2,6-difluorophenyl-1-yl, di-methylcyclopentane Alkene-Butyl-bis-2,4,6-trifluorophenyl-1-yl, bis-methylcyclopentadiene-butane-bis-2,3,5,6-tetrafluorophenyl-1-yl , bis-methylcyclopentadiene-Ti-bis-2,3,4,5,6-pentafluorophenyl-1-yl, Japanese Patent Laid-Open No. 1-30 44 53 and Japanese Patent Publication No. 1_1521〇9 An iron-arene complex or the like is described. Examples of the hexaaryldiimidazole compound include various compounds described in each specification, such as JP-A No. 6,29,285, U.S. Patent No. 3,479,185, the disclosure of which is incorporated herein by reference. , 2*-bis(o-chlorophenyl)-4,4',5,5'-tetraphenyldiimidazole, 2,2'-bis(o-bromophenyl))4,4',5,5' -tetraphenyldiimidazole, 2,2'-bis(o-,p-dichlorophenyl))4,4',5,5'-tetraphenyldiimidazole, 2,2'-bis(o-chlorophenyl) )) 4,4',5,5'-肆(m-methoxyphenyl)diimidazole, 2,2'-bis(o-,o-,-dichlorophenyl))4,4 ',5,5 Tetraphenyldiimidazole, 2,2'-bis(o-nitrophenyl)-4,4 ',5,5 tetraphenyldiimidazole, 2,2'-bis(o-methylphenyl)-4, 4 ',5,5'-tetraphenyldiimidazole, and 2,2'-bis(o-trifluorophenyl)-4,4',5,5'-tetraphenyldiimidazole, and the like. Specific examples of the organic borate compound include, for example, JP-A-62-143044, JP-A-62-150242, JP-A-9-188685, JP-A-9-188686, JP-A-9-188710, Open bulletins 2000-131837, special opening 2002-1 079 1 6 , franchise 2764769, special opening 2002-1 1 6539, and Kunz, Martin "Rad Tech' 98.  Proceeding April 19-22, 1998, Organic Borate, Japanese Patent Laid-Open Publication No. Hei. No. Hei. No. Hei. No. Hei. No. Hei. The organoboron oxime complex or the boronoxosulfonium complex, the organoboron iodine described in JP-A-6-175545 Boron phosphonium complex, which is described in Japanese Unexamined Patent Publication No. Hei No. Hei. No. Hei. An organoboron transition metal complexing complex or the like, which is disclosed in Japanese Laid-Open Patent Publication No. Hei 7- 306 527, JP-A No. 7-306527, and the like. A compound or the like described in the specification of JP-A-2002-328465, etc. The oxime ester compound may, for example, be J. C. S.  Perkin 11 (1979) 1653-1660), J. C. S.  Perkin 11 (1979) 156-162, Journal of Photopolymer Science and Technology (1995) 202-232, JP-A-2000-66385, and JP-A-2000-80068 The compound described in Japanese Laid-Open Patent Publication No. 2004-534797. The specific example is CIBA SPECIALTY φ CHEMICALS (Ciba Japan K. K. IRGACURE OXE-01, OXE-02, etc. are preferred. The iron salt compound can be exemplified by, for example, S.  I.  Schlesinger, Photogr.  Sci.  Eng. , 18, 387 (1974), T.  S.  Bal, et al., Polymer, 21, 423 (1980), diazonium salt, U.S. Patent No. 4,069,055, U.S. Patent No. 4-3,065,049, et al., U.S. Patent No. 4,069,055, the same The iodine salt described in each of the publications of the Japanese Patent Publication No. Hei. No. Hei. No. Hei. No. Hei. No. Hei. -43- 200937050 The iodonium salt-based diaryl iodine salt which is suitable for use in the present invention is electron-donating by two or more of a hospital base, a hospital oxy group, an aryloxy group (aryl 〇Xy) group, etc. from the viewpoint of stability. Substituting is preferred. The hydrazine salt suitable for use in the present invention is exemplified by the European Patent No. 370, 693, the same as 390, 214, the same as 233, 567, the same as 297, 443, the same as 297, 442, and the US Patent No. 4,93 3, 3 77. The key salts described in the specification of the specification of 4,760,0 1 3, the specification of 4734,444, the specification of 2,833,827, the specification of German Patent No. 2,904,626, the specification of 3,6,4,580, and the specification of 3,604,581, From the standpoint of the sensitivity of stability, it is preferable to be replaced by an electron attracting group. The Hammant of the electron attracting base is better than 0. Preferred examples of the electron attracting group include a halogen atom and a carboxylic acid. Further, other preferred onium salts are those in which one of the substituents of the triarylsulfonium salt has a coumarin, an anthracene structure and has an absorption at 300 nm or more. Further preferred sulfonium salts include sulfonium salts in which the triarylsulfonium salt has an aryloxy group and an arylthio group as a substituent and has an absorption of 300 nm or more. Further, the key salt compound can be exemplified. V.  Crivello et al., Macromolecules, 10(6), 1 3 07 (1997), J.  V.  Crivello et al., J.  Polymer Sci. , Polymer C hem Ed . , 1 7,1 0 4 7 (1 9 7 9) The selenonium salt, C.  S_ Wen et al., Ding £11,?]'〇〇· Conf.  Rad.  Curing ASIA, p. 478 To k y ο, gun salt of arsonium, etc., recorded in January (19.8). Examples of the mercaptophosphine (oxide) compound include IRGACURE 8 19, DAROCURE 4265, DAROCURE TPO, and the like manufactured by CIBA SPECIALTY CHEMICAL CO., LTD. 200937050 ' From the viewpoint of exposure sensitivity, (D) the photopolymerization initiator is selected from the group consisting of a trihalomethyl tritrap compound, a benzyl dimethyl ketal compound, a hydroxyketone compound, an α-amino ketone compound, and ruthenium a phosphine compound, a phosphine oxide compound, a metallocene compound, an anthraquinone compound, a triarylimidazole, a gun compound, a benzothiazide compound, a diphenylketone compound, an ethyl benzene compound and A compound of the group consisting of a derivative, a cyclopentadiene-benzene-iron complex and a salt thereof, a halomethyl oxadiazole compound, and a 3-aryl-substituted coumarin compound is preferred. a trihalomethyl tri-tillage compound, an α-amino ketone compound, a mercaptophosphine compound, a phosphine oxide compound, an anthraquinone compound, a triaryl imidazole dimer, a key compound, a diphenyl ketone compound, and The acetaminophen compound is more preferred. It is preferred to use at least one compound selected from the group consisting of a trihalomethyl tritrap compound, an α-amino ketone compound, an anthraquinone compound, a triaryl imidazole dimer, and a diphenyl ketone compound. The content of the (D) photopolymerization initiator is preferably from 1 to 20% by mass based on the total solid content of the photosensitive coloring composition layer, and is 0. 5 to 15 masses Q% is more preferable, and 1 to 10% by mass is particularly preferable. Good sensitivity and pattern formation can be obtained in this range. (Ε) Solvent The photosensitive coloring composition used in the present invention can usually be prepared by using a solvent. As the solvent, esters are, for example, ethyl acetate, n-butyl acetate, isobutyl acetate, amyl formate, isoamyl acetate, isobutyl acetate, butyl propionate, isopropyl butyrate, ethyl butyrate. Butyl butyrate, alkyl esters, methyl lactate, ethyl lactate, methyl glycolate, ethyl hydroxyacetate, butyl glycolate, -45- 200937050 methyl methoxyacetate, ethyl methoxyacetate An alkyl 3-hydroxypropionate such as butyl methoxyacetate, methyl ethoxyacetate or ethyl ethoxylate; methyl 3-hydroxypropionate or ethyl 3-hydroxypropionate (for example) Methyl 3-methoxypropionate, ethyl 3-methoxypropionate, methyl 3-ethoxypropionate and ethyl 3-ethoxypropionate; etc.; methyl 2-hydroxypropionate, 2-hydroxypropionic acid alkyl esters such as ethyl 2-hydroxypropionate and propyl 2-hydroxypropionate (methyl 2-methoxypropionate, ethyl 2-methoxypropionate, 2-methoxy) Propyl propyl propionate, methyl 2-ethoxypropionate, ethyl 2-ethoxypropionate, methyl 2-hydroxy-2-methylpropanoate, 2-hydroxy-2-methylpropionic acid Ester, methyl 2-methoxy-2-methylpropanoate, 2-ethoxy-2-methylpropionic acid And methyl pyruvate, ethyl pyruvate, propyl pyruvate, methyl acetate, ethyl acetate, ethyl 2-oxobutanoate, ethyl 2-oxopropionate, 1,3-butanediol diacetate or the like; 'ethers such as diethylene glycol dimethyl ether, tetrahydrofuran, ethylene glycol monomethyl ether, ethylene glycol monoethyl ether, methyl race Methyl cellosolve acetate, ethyl celecoxib acetate, diethylene glycol monomethyl ether, diethylene glycol monoethyl ether, diethylene glycol monobutyl ether, propylene glycol methyl ether acetate Ester, propylene glycol ethyl ether acetate, propylene glycol propyl ether acetate, diethylene glycol diethyl ether, diethylene glycol monoethyl ether acetate, diethylene glycol monobutyl ether, diethylene glycol monobutyl Ethyl acetate, propylene glycol n-propyl ether acetate, propylene glycol diacetate, propylene glycol n-butyl ether acetate, propylene glycol phenyl ether, propylene glycol phenyl ether acetate, diethylene glycol Ethyl acetate, dipropylene glycol n-propyl ether acetate, dipropylene glycol n-butyl ether acetate, tri-n-glycol-n-butyl ether and tri-glycolyl alcohol Ether acetate or the like; ketones such as acetone, methyl ethyl ketone, cyclohexanone-46-200937050 (cyclohexanone), 2-heptanone and 3-heptanone; and alcohols such as ethanol, isopropanol, Propylene glycol methyl ether, propylene glycol mono-n-propyl ether, propylene glycol mono-n-butyl ether; and aromatic hydrocarbons such as toluene, xylene, and the like. Among these, methyl 3-ethoxypropionate, ethyl ethoxypropionate, ethyl celecoxib acetate, ethyl lactate, diethylene glycol dimethyl ether, butyl acetate , 3-methoxypropionic acid methyl vinegar, 2-heptanone, cyclohexanone, ethyl carbitol acetate, butyl carbitol acetate, propylene glycol methyl ether, propylene glycol methyl ether Q acetic acid Ester and propylene glycol ethyl ether acetate are preferred. The solvent may be used singly or in combination of two or more. Other Additives In addition to the above components, the photosensitive coloring composition used in the present invention may further use various well-known additives in accordance with the purpose. Hereinafter, such an additive will be described. Dispersant The photosensitive coloring composition of the present invention preferably contains a polymer dispersant as φ. The polymer dispersant is a resin having a weight average molecular weight of 3,000 to 100,000. Further, the acid value is preferably 20 to 300 mg/g. Hereinafter, such a polymer will be simply referred to as a "dispersion resin". The dispersing resin of the present invention has a dispersing agent which can be used as the coloring agent of (A-1), or a photosensitive dark coloring composition for forming a black matrix which will be described later as a light shielding agent (for black matrix formation) A compound of the function of a dispersant of a pigment). Since the dispersion resin must have a specific acid value, a polymer compound having an acidic group is preferred. -47- 200937050 The polymer skeleton of the polymer compound is selected from the group consisting of polymers or copolymers of vinyl monomers, ester polymers, ether polymers, urethane polymers, and amide polymers. , an epoxy-based polymer, a poly(oxygen)-based polymer, and the like or a copolymer (for example, comprising a polyether/polyurethane copolymer, a polyether/vinyl monomer) At least one of the group consisting of a copolymer of a polymer (any of a random copolymer, a block copolymer, and a graft copolymer) is preferably selected from a polymer derived from a vinyl monomer or More preferably, at least one of a copolymer, an ester polymer, an ether polymer, a urethane polymer, and a group of the modified or copolymer, and a vinyl monomer polymer and A vinyl copolymer is particularly preferred. In addition, the method of introducing an acidic group into the polymer skeleton as described above may be, for example, a method of copolymerizing a monomer having an acidic group when polymerizing the polymer skeleton described above: or by polymerizing the polymer skeleton described above. A method of introducing a polymer reaction. Examples of the acid group-containing monomer include (meth)acrylic acid, crotonic acid, itaconic acid, maleic acid, and phmalic acid. , cinnamic acid, acrylic acid dimer, vinyl benzoic acid, styryl sulfonic acid, 2-propenylamine-2-methylpropane sulfonic acid, mono(methyl) propylene phosphate Ethyl ruthenium or a monomer obtained by reacting a monomer having an alcoholic hydroxyl group such as 2-hydroxyethyl methacrylate with a cyclic acid anhydride such as maleic anhydride or phthalic anhydride. Further, the polymer compound having an acidic group may further contain an ethylene-based monomer component as a copolymerization component. The above-mentioned vinyl monomer is not particularly limited, and for example, (meth)acrylic acid 200937050 second-handed jt acid olefin fluorene dipropylene} 3⁄4}-based HSE- _~~, 甲ίν 顺{和, , class-like ester ester ethylene two Phenylacetic acid, keto-like ester esters, acid phenolic olefinic acid, acid, and class II ester ether ester amine nitrile.  a class of isobutylene-based esters, sulphuric acid, sulphur, sulphur, sulphur

J 磺羧 、 以 基’ 酸基 羧酸 如硼 例及 有基 子酯 例酸 佳磷 較一 的、 出基 舉酸 可磷 佳 特 爲 基 酸 磷 及 基 、'酸 基磺 酸、 磺基 、 酸 基羧 酸以 基 酯 酸 硫 佳 更 爲 基 酯 酸 磷 一 及 基 酸 磷 子 原 氮 性 鹼 有 具 述 前 〇 基 ， 之 性子 散原 分氮 高性 提鹼 了有 爲具 ，有 又含 更 可 亦 物 成 組 色 著 性 光 感 之 明 發 本 nmogen atom)之基可舉出的較佳例子有例如胺基（_NH2)、 取代亞胺基（-NHR8或-NR9R1G ;在此，R8、R9及R1G係各 自獨立地表示碳數idO的烷基、碳數6以上的芳基、或碳 數 7以上的芳烷基）、下述化學式（a 1)所示之胍基 (guanidyl)、或下述化學式（a2)所示之眺基（amidinyl)等。 ❹ a a 2) 上述化學式（al)中，Ri1及R12係各自獨立地表示碳數 1〜2 0的烷基、碳數6以上的芳基、或碳數7以上的芳烷基。 上述化學式U2)中，Ri3及R14係各自獨立地表示碳數 1~2 0的烷基、碳數6以上的芳基、或碳數7以上的芳烷基。 此等之中，胺基（-NH2)、取代胺基（-NHR8、或NR9R1(); 在此，R8、R9及RU係各自獨立地表示碳數1〜10的烷基、 -49- 200937050 苯基或苄基）、前述化學式（al)所示之胍基[化學式U1)中， R11及R12係各自獨立地表示碳數1〜的烷基、苯基或苄 基]、前述化學式（a2)所示之脒基[化學式（a2)中’R13及R14 係各自獨立地表示碳數1~1〇的烷基、苯基或苄基]等，係 含有由1〜200個的氫原子及〇〜20硫原子所形成的基，該 等可以是未取代，亦可以進而具有取代基。 其他分散劑 本發明所使用的感光性著色組成物除了分散樹脂以 外，亦可並用先前以來眾所周知的分散劑（顏料分散劑）。 眾所周知的分散劑（顏料分散劑）可舉出高分子分散劑 (例如聚醯胺及其鹽、高分子量不飽和酸酯、改性聚胺基甲 酸酯、改性聚酯、改性聚（甲基）丙烯酸酯、（甲基）丙烯酸系 共聚物）、及聚氧化乙烯烷基磷酸酯、聚氧化乙烯烷基胺、 烷醇胺及顏料衍生物等。 高分子分散劑依其結構亦可進而分類爲直鏈狀高分 子、末端改性高分子、接枝型高分子（graft Polymer)及嵌段 型高分子（block polymer)。 高分子分散劑的作用係吸附在顏料的表面，用以防止 再凝聚。因此，可舉出較佳結構有對顏料表面具有錨固 (anchor)部位之末端改性型高分子、接枝型筒分子、嵌段型 高分子。另一方面，顏料衍生物係具有藉由將顏料表面改 性來促進高分子分散劑的吸附之作用° 本發明能夠使用之眾所周知的分散劑（顏料分散劑）的 具體例，可舉出BYKChemie公司製的Disperbyk-107(羧酸 酯）、130(聚醯胺）、161、162、163、164、165、166、170(¾ 200937050 、分子共聚物）、EFKA 公司製「EFKA4047、4050、4010、 4165(聚胺基甲酸酯系）、EFKA43 30、4340(嵌段共聚物）、 44 00、4402(改性聚丙烯酸酯）、5010(聚酯型醯胺）、6220(脂 肪酸聚酯）、6745(酞菁衍生物）、6750(偶氮衍生物）」、 AJINOMOTO FINE-TECHNO 公司製的 AJISPER PB821、 PB822、共榮社化學公司（Kyoeisha Chemical Co_，Ltd)製的 FLOWLEN TG-710(胺基甲酸酯低聚物）、POLYFLOW No.50E、No.3 0 0 (丙烯酸系共聚物）、楠本化成公司 ❹ (Kusumoto Chemicals Ltd.)製 DISPARLON #7004(聚酸 酯）、DA-703 -50、DA-705、DA-72 5、花王公司（KAO Corporation)製 EMULGEN920、93 0、93 5、9 8 5 (聚氧乙烯壬 基苯基醚）、ACETAMIN 86 (硬脂醯胺乙酸酯）、LUBRIZOL 公司（The Lubrizol Corporation)製的 SOLPERSE 5000(酞菁 衍生物）、22000(偶氮顏料衍生物）、1 3240(聚酯型胺）、 3000、17000、27000(在末端具有功能部之高分子）、24000、 28000、3 2000、3 8 5 0 0 (接枝型高分子）、日光 C Η Ε ΜIC AL 公 ρ 司（Nikko Chemicals Co·，Ltd)製的 NIKKOL Τ106(聚氧乙烯 山梨糖醇酐一油酸酯）及MYS-IEX(聚氧乙烯一硬脂酸酯）」 等。 上述之眾所周知的分散劑能夠按照必要相對於分散樹 脂，能夠在 10〜100質量％亦即分散劑/分散樹脂=1/10〜 1/(等量）的範圍使用。 界面活性劑 因爲增大顏料濃度時通常塗布液的觸變性（thixotropy) 變大’在基板上塗布或轉印感光性著色組成物而形成感光 -51- 200937050 性著色組成物層（著色層塗膜）後，容易產生膜厚度不均。 又，特別是使用狹縫塗布法形成感光性著色組成物層（著色 層塗膜）時，至乾燥爲止感光性著色組成物層形成用的塗布 液調平而形成均勻厚度的塗膜係重要的。因此，以使前述 感光性著色組成物中含有適當的界面活性劑爲佳。上述界 面活性劑可舉出較佳者有特開2003 -3 3 7424號公報、特開 平1 1 - 1 3 3 60 0號公報所揭示之界面活性劑。 用以提高塗布性之界面活性劑可添加非離子系 (nonionic)界面活性劑、氟系界面活性劑、聚砂氧（silicone) 系界面活性劑等。 非離子系界面活性劑可舉出例如聚氧乙二醇類、聚氧 丙二醇類、聚氧化乙烯烷基醚類、聚氧化乙烯烷基芳基醚 類、聚氧化乙烯烷酯類、聚氧化丙烯烷基醚類、聚氧化丙 烯烷基芳基醚類、聚氧化丙烯烷酯類、山梨糖醇酐烷酯類 及一甘油酯烷酯類等。 非離子系界面活性劑的具體例可舉出聚氧乙二醇、聚 氧丙二醇等的聚氧烷二醇類；聚氧化乙烯月桂醚、聚氧化 丙烯硬脂醚、聚氧化乙烯油醚等的聚氧化烯烷酯類；聚氧 化乙烯辛基苯基醚、聚氧化乙烯苯乙烯化醚、聚氧化乙烯 三苄基苯基醚、聚氧化乙烯-丙烯聚苯乙烯化醚、聚氧化乙 烯壬基苯基醚等的聚氧化乙烯芳基醚類；聚氧化乙烯二月 桂酸酯、聚氧化乙烯二硬脂酸酯等的聚氧化烯二烷酯；山 梨糖醇酐脂肪酸酯·，及聚氧化烯山梨糖醇酐脂肪酸酯類等。 該等之進一步的具體例有例如ADEKA PLURONIC系 列、ADEKANOL 系列、TETRONIC 系歹IJ (以上 ADEKA(股） -52- 200937050 ' (ADEKA Corporation)製）、EMULGEN 系列、RHEODOL 系 列（以上花王（股）（KAO Corporation)製）、ELEMINOL 系歹IJ、 NONIPOL 系列、OCTARPOL 系列、DODECAPOL 系歹!J、 NEWPOL 系歹！J (以上三洋化成（股）（Sanyo Chemical Industries Ltd.)製）、PIONIN 系列（以上竹本油脂（股）（Takemoto Oil&amp;Fat Co.，Ltd)製）、NISSAN NONION 系列（以上曰本油 脂（股）（NOF Corporation)製）等。能夠適當地使用該等市售 品。HLB(Hydrophile-LipophileBalance)値以 8〜20 爲佳， ❹ 以10〜17爲更佳。 氟系界面活性劑的例子可舉出在末端、主鏈及側鏈之 至少任一部位具有氟烷基或氟伸烷基之化合物。 具體上的市售品有例如MEGAFAC F142D、同F172、 同 F173、同 F176、同 F177、同 F183、同 780、同 781、同 R30、同 R08(大日本 INK(股）（DIC Corporation)製、 FLUORAD FC-1 35、同 FC-170C、同 FC-430、同 FC-431(住 友 3M(股）（Sumitomo 3M Limited)製）、SURFLON S-112、 p 同 S-113、同 S-131、同 S-141、同 S-145、同 S-382、同 SC-101 &gt; 同 SC-102、同 SC-103、同 SC-104、同 SC-105、 同 SC-106(矽硝子（股）（Asahi Glass Co.，Ltd.)製）、EFT0P EF351、同 3 5 2、同 801、同 8 0 2 (J E M C 0 (股）（J E M C Ο Inc.) 製）等。 聚矽氧系界面活性劑可舉出例如（Torey Silicone)DC3PA、同 DC7PA、同 SH11PA、同 SH21PA、同 SH28PA、同 SH29PA、同 SH30PA、同 SH-190、同 SH-193 、 同 SZ-6032、同 SF-8428、同 DC-57、同 DC-190(以上、 -53- 200937050 TORAY-DOWCORNING SILICONE(股）（Dow Corning Toray Silicone Co.，Ltd.)製）、TSF-4440、TSF-4300、TSF-4445、 TSF-4446 、 TSF-4460 、 TSF-4452(以上、MomentiveJ sulfonyl carboxylate, carboxylic acid-based carboxylic acid, such as boron, and basal ester-like acid, phosphorus, phosphorus, phosphonic acid, sulfonic acid, sulfonic acid, sulfonic acid, sulfonic acid The acid-based carboxylic acid has a sulfhydryl group and a phosphatidyl alkaloid. The sulphur-based carboxylic acid has a sulphide base. Preferred examples of the base of the nmogen atom containing a more holographic color sensitizing light are, for example, an amine group (_NH2), a substituted imido group (-NHR8 or -NR9R1G; here, R8, R9 and R1G each independently represent an alkyl group having a carbon number of idO, an aryl group having 6 or more carbon atoms, or an aralkyl group having 7 or more carbon atoms, and a guanidyl group represented by the following chemical formula (a1) Or an amidinyl group represented by the following chemical formula (a2). ❹ a a 2) In the above chemical formula (al), Ri1 and R12 each independently represent an alkyl group having 1 to 20 carbon atoms, an aryl group having 6 or more carbon atoms, or an aralkyl group having 7 or more carbon atoms. In the above chemical formula U2), Ri3 and R14 each independently represent an alkyl group having 1 to 20 carbon atoms, an aryl group having 6 or more carbon atoms, or an aralkyl group having 7 or more carbon atoms. Among these, an amine group (-NH2), a substituted amine group (-NHR8, or NR9R1(); Here, R8, R9 and RU each independently represent an alkyl group having 1 to 10 carbon atoms, -49-200937050 Phenyl or benzyl), a mercapto group represented by the above formula (al) [Chemical Formula U1], R11 and R12 each independently represent an alkyl group having 1 to 10 carbon atoms, a phenyl group or a benzyl group], and the aforementioned chemical formula (a2) The fluorenyl group shown in the formula (a2) wherein 'R13 and R14 each independently represent an alkyl group having 1 to 1 carbon number, a phenyl group or a benzyl group, etc., and 1 to 200 hydrogen atoms and The group formed by 〇~20 sulfur atom may be unsubstituted or may further have a substituent. Other Dispersing Agent The photosensitive coloring composition used in the present invention may be used in combination with a dispersing agent (pigment dispersing agent) which has been conventionally known in addition to the dispersing resin. Well-known dispersing agents (pigment dispersing agents) include polymeric dispersing agents (for example, polyamines and salts thereof, high molecular weight unsaturated acid esters, modified polyurethanes, modified polyesters, modified poly( Methyl) acrylate, (meth)acrylic copolymer), and polyoxyethylene alkyl phosphate, polyoxyethylene alkylamine, alkanolamine, and pigment derivatives. The polymer dispersant may be further classified into a linear polymer, a terminal modified polymer, a graft polymer, and a block polymer depending on the structure. The polymer dispersant acts on the surface of the pigment to prevent re-agglomeration. Therefore, a terminal-modified polymer, a graft-type cartridge molecule, and a block-type polymer having an anchor portion on the surface of the pigment can be preferably used. On the other hand, the pigment derivative has an action of promoting the adsorption of the polymer dispersant by modifying the surface of the pigment. Specific examples of the dispersant (pigment dispersant) which can be used in the present invention include BYK Chemie. Disperbyk-107 (carboxylate), 130 (polyamide), 161, 162, 163, 164, 165, 166, 170 (3⁄4 200937050, molecular copolymer), EFKA 4047, 4050, 4010, 4165 (polyurethane type), EFKA43 30, 4340 (block copolymer), 44 00, 4402 (modified polyacrylate), 5010 (polyester decylamine), 6220 (fatty acid polyester), 6745 (phthalocyanine derivative), 6750 (azo derivative), AJISPER PB821, PB822 manufactured by AJINOMOTO FINE-TECHNO Co., Ltd., FLOWLEN TG-710 (amino group) manufactured by Kyoeisha Chemical Co., Ltd. Formate oligomer), POLYFLOW No. 50E, No. 300 (acrylic copolymer), Kusmoto Chemical Co., Ltd. (DISSULON #7004 (polyacrylate), DA-703 -50) , DA-705, DA-72 5. EMULGEN920 by Kao Corporation 93 0, 93 5, 9 8 5 (polyoxyethylene nonylphenyl ether), ACETAMIN 86 (stearylamine acetate), SOLPERSE 5000 (phthalocyanine derivative) manufactured by LUBRIZOL Corporation (The Lubrizol Corporation), 22000 (azo pigment derivative), 1 3240 (polyester type amine), 3000, 17000, 27000 (polymer having a functional moiety at the end), 24000, 28000, 3 2000, 3 8 5 0 0 (graft type) Polymer), Nikki C Η Μ IC NIKKOL Τ106 (polyoxyethylene sorbitan monooleate) and MYS-IEX (polyoxyethylene monostearate) manufactured by Nikko Chemicals Co., Ltd. Ester)" and so on. The above-mentioned well-known dispersing agent can be used in a range of 10 to 100% by mass, i.e., a dispersant/dispersion resin = 1/10 to 1 / (equal amount), as necessary with respect to the dispersion resin. When the surfactant is increased in pigment concentration, the thixotropy of the coating liquid is generally increased. 'The photosensitive coloring composition is coated or transferred on the substrate to form a photosensitive layer. 51-200937050 Colored coloring composition layer (coloring layer coating film) After that, film thickness unevenness is likely to occur. In particular, when a photosensitive coloring composition layer (coloring layer coating film) is formed by a slit coating method, it is important to form a coating film for forming a uniform thickness until the coating liquid for forming a photosensitive coloring composition layer is dried. . Therefore, it is preferred that the photosensitive coloring composition contains a suitable surfactant. The surfactants disclosed in Japanese Laid-Open Patent Publication No. Hei. No. Hei. No. Hei. A nonionic surfactant, a fluorine-based surfactant, a silicone surfactant, or the like may be added to the surfactant for improving coatability. Examples of the nonionic surfactant include polyoxyethylene glycols, polyoxypropylene glycols, polyoxyethylene alkyl ethers, polyoxyethylene alkyl aryl ethers, polyoxyethylene alkyl esters, and polyoxypropylene. Alkyl ethers, polyoxypropylene alkyl aryl ethers, polyoxypropylene alkyl esters, sorbitan alkyl esters, and monoglyceride alkyl esters. Specific examples of the nonionic surfactant include polyoxyalkylene glycols such as polyoxyethylene glycol and polyoxypropylene glycol; polyoxyethylene lauryl ether, polyoxypropylene stearyl ether, and polyethylene oxide oleyl ether. Polyoxyalkylene alkyl esters; polyoxyethylene octyl phenyl ether, polyoxyethylene styrene ether, polyoxyethylene tribenzyl phenyl ether, polyoxyethylene-propylene polystyrene ether, polyoxyethylene fluorenyl Polyoxyethylene aryl ethers such as phenyl ether; polyoxyalkylene dialkyl esters such as polyoxyethylene dilaurate or polyoxyethylene distearate; sorbitan fatty acid esters, and polyoxidation Olylene sorbitan fatty acid esters and the like. Further specific examples of such are, for example, the ADEKA PLURONIC series, the ADEKANOL series, the TETRONIC system 歹IJ (above ADEKA Corporation -52-200937050' (made by ADEKA Corporation), the EMULGEN series, the RHEODOL series (above Kao (share)) KAO Corporation), ELEMINOL System IJ, NONIPOL Series, OCTARPOL Series, DODECAPOL System! J, NEWPOL System! J (above Sanyo Chemical Industries Ltd.), PIONIN series (made by Takemoto Oil &amp; Fat Co., Ltd.), NISSAN NONION series (above 曰本油) ) (made by NOF Corporation) and the like. These commercial products can be suitably used. HLB (Hydrophile-Lipophile Balance) is preferably 8 to 20, and preferably 10 to 17. Examples of the fluorine-based surfactant include compounds having a fluoroalkyl group or a fluorine-extended alkyl group at at least any one of a terminal, a main chain and a side chain. Specific commercial products include, for example, MEGAFAC F142D, F172, F173, F176, F177, F183, 780, 781, R30, and R08 (DIC Corporation). FLUORAD FC-1 35, same as FC-170C, FC-430, FC-431 (Sumitomo 3M Limited), SURFLON S-112, p with S-113, same as S-131, Same as S-141, the same S-145, the same S-382, the same SC-101 &gt; the same SC-102, the same SC-103, the same SC-104, the same SC-105, the same SC-106 (made by Asahi Glass Co., Ltd.), EFT0P EF351, the same as 3 5 2, the same as 801, the same 8 0 2 (JEMC 0 (share) (JEMC Ο Inc.)), etc. Examples of the agent include (Torey Silicone) DC3PA, DC7PA, SH11PA, SH21PA, SH28PA, SH29PA, SH30PA, SH-190, SH-193, SZ-6032, and SF-8428. DC-57, same as DC-190 (above, -53-200937050 TORAY-DOWCORNING SILICONE (Dow Corning Toray Silicone Co., Ltd.)), TSF-4440, TSF-4300, TSF-4445, TSF- 4446, TSF-4460, TSF-4452 ( On, Momentive

Performance Materials Japan 製）等 » 該等界面活性劑係相對於用以形成感光性著色組成物 層的塗布液1〇〇質量份，以使用5質量份以下爲佳，以使 用2質量份以下爲更佳。界面活性劑大於5質量份時在塗 布乾燥時容易產生表面粗糙，平滑性容易變差。 又，爲了促進未硬化部的鹼溶解性，謀求更提升光硬 化性組成物的顯像性時，能夠進行添加有機羧酸、較佳是 分子量1 000以下之低分子量有機羧。具體上可舉出例如甲 酸、乙酸、丙酸、丁酸、戊酸、三甲基乙酸、己酸、二乙 基乙酸、庚酸（enanthic acid)、辛酸等的脂肪族一羧酸；草 酸、丙二酸、琥珀酸、戊二酸、己二酸、庚二酸（pimelic acid)、辛二酸（suberic acid)、壬二酸（azelaic acid)、癸二 酸（sebacicacid)、十三垸二酸（brasylicacid)、甲基丙二酸 (methylmalonic acid)、乙基丙二酸、二甲基丙二酸、甲基 琥珀酸、四甲基琥珀酸、檸康酸（citraconic acid)等脂肪族 二羧酸；1，2,3-丙三甲酸（tricarballyic acid)、烏頭酸 (aconitic acid)、降樟腦三酸（camphoronic acid)等脂肪族三 羧酸；苯甲酸、苯乙酸（toluic acid)、異丙苯酸（cuminic acid)、2,3-二甲苯甲酸（hemellitic acid)、3,5-二甲基苯甲 酸（mesityleneacid)等芳香族一殘酸；酞酸、異駄酸、對酞 酸、1,2,4-苯三甲酸（trimellitic acid)、1，3,5-苯三甲酸 (1；]^11163^&amp;。1(1)、1，2,3,5-苯四甲酸（111611〇卩113111。&amp;(^(1)、焦 200937050 、 蜜石酸（pyromellitic acid)等芳香族聚羧酸；苯基乙酸、苯 氧基乙酸、甲氧基苯氧基乙酸、氫阿托酸（hydratropic acid)、氫桂皮酸（hydrocinnamic acid)、苦杏仁酸（mandelic acid)、苯基號拍酸、阿托酸（atropic acid)、桂皮酸、桂皮 酸甲酯、桂皮酸苄酯、亞桂皮基乙酸（cinnamylidene acetate)、香豆酸（cumaric acid)、繳形酸（umbellic acid)等 其他的羧酸。 院氧基矽院（alkoxysilane)化合物 φ 從提升與基板的黏附性之觀點，本發明所使用的感光 性著色組成物能夠使用烷氧基矽烷化合物、特別是使用矽 烷偶合劑》 矽烷偶合劑以具有烷氧基矽烷基作爲能夠與無機材料 化學鍵結之加水分解基者爲佳，以與有機樹脂之間相互作 用或鍵結形成而顯示親和性之（甲基）丙烯醯基、苯基、氫 硫基、環氧矽烷爲佳，其中以（甲基）丙烯醯基丙基三甲氧 基矽烷爲更佳。 g 使用矽烷偶合劑時之添加量係在本發明所使用的感光 性著色組成物層中的總固體成分中，以0.2〜5.0質量％的 範圍爲佳，以0.5〜3.0質量％爲更佳。 共敏化劑 本發明所使用的感光性著色組成物層亦可按照必要含 有共敏化劑。在本發明，共敏化劑具有更提升敏化色料及/ 或引發劑對活性放射線的敏感度，或是具有抑制氧對聚合 性化合物的聚合阻礙等作用。 此種共敏化劑可舉出例如胺類、例如M.R. Sander等 -55- 200937050 著「聚合物學會期刊（Journal of Polymer Society)」第10 卷第3173頁（1972年）、特公昭44-20189號公報、特開昭 5 1 -82 1 02號公報、特開昭 52-1 34692號公報、特開昭 59- 1 3 8205號公報、特開昭 60-84305號公報、特開昭 62- 1 8537號公報、特開昭 64-33 1 04號公報、硏究發表 (Research Disclosure)第33825號所記載之化合物等，具體 上，可舉出三乙醇胺、對二甲胺基苯甲酸乙酯、對甲醯基 二甲基苯胺、對甲硫基二甲基苯胺等。 共敏化劑之另外例子係硫醇及硫醚類，可舉出例如特 @ 開昭53-702號公報、特公昭55-500806號公報、特開平 5- 1427 72號公報所記載之硫醇化合物、特開昭56-75643號 公報之二硫醚化合物等，具體上可舉出2-氫硫基苯并噻 唑、2-氫硫基苯并噚唑、2-氫硫基苯并咪唑、2-氫硫基 -4(3 H)-唾唑啉、氫硫基萘等。 又，其他的共敏化劑之例子可舉出胺基酸化合物（例 如，N-苯基甘胺酸等）、特公昭48-4 2965號公報所記載之 有機金屬化合物（例如乙酸三丁基錫（tributyl tin acetate) ^ 等）、特公昭5 5 - 3 44 1 4號公報所記載之氫給予體、特開平 6- 308727號公報所記載之硫化合物（例如三聚甲硫醛等） 等。 從藉由聚合成長速度及鏈轉移的平衡來提升硬化速度 之觀點，相對於光硬化性組成物之總固體成分的質量，此 等共敏化劑的含量以0.1〜30質量％的範圍爲佳，以1〜25 質量％的範圍爲較佳，以0.5〜20質量％的範圍爲更佳。 聚合抑制劑 -56- 200937050 v 在本發明，在感光性著色組成物的製造中或保存中， 爲了阻止具有能夠聚合的乙烯性不飽和雙鍵之化合物產生 不需要的熱聚合，以在感光性著色組成物添加少量的熱聚 合抑制劑爲佳。 本發明所使用的熱聚合抑制劑可舉出氫醌 (hydroquinone )、對甲氧基苯酚、二-第三丁基-對甲酚、 五倍子酣（pyrogallol)、第三丁基兒茶酣（t-butyl catechol)、苯醌（benzoquinone)、4,4’-硫代雙（3 -甲基-6-第 φ 三丁基苯酚）、2,2’-亞甲基雙（4-甲基-6-第三丁基苯酚）及 N-亞硝基苯基羥基胺第一铈鹽等。 熱聚合抑制劑的添加量係相對於感光性著色組成物層 中的質量，以約0.01質量％〜約5質量％爲佳。又，爲了 防止因氧引起的聚合阻礙，亦可添加如蘿酸（behenic acid) 或蘿酸醯胺之高級脂肪酸衍生物等，並使其在塗布的乾燥 過程偏在於感光層的表面。高級脂肪酸衍生物以總組成物 的約0.5質量％〜約10質量％爲佳。 φ 可塑劑 而且，在本發明，爲了改良感光性著色組成物層的物 性，亦可添加無機塡料或可塑劑、能夠提升感光層表面的 印墨著墨性之感脂化劑等。 可塑劑有例如酞酸二辛酯、酞酸二·十二烷酯、三甘醇 二辛酸酯、酞酸二甲基乙二醇酯、磷酸三甲苯酯（tricksy1 phosphate)、己二酸二辛酯、癸二酸二丁酯及三乙醯甘油 等，使用結合劑時，相對於具有乙烯性不飽和雙鍵之化合 物及結合劑的合計質量’可添加1 0質量％以下的可塑劑。 -57- 200937050 藉由使用上述成分，本發明之感光性著色組成物能夠 以高敏感度硬化且保存安定性亦變爲良好。又，顯示對基 板的高黏附性。因此，含有前述各種成分之感光性著色組 成物能夠適合使用於彩色濾光片。 感光性濃色組成物 本發明所使用的的感光性濃色組成物以含有（A - 2)遮 光劑、（B)黏合劑聚合物、（C-2)聚合性化合物、（D)光聚合 引發劑及（E)溶劑爲佳，能夠按照必要含有分散劑或界面活 性劑等其他的添加劑。 (A-2)遮光劑 (A-2)遮光劑除了前述（A-1)著色劑以外，可舉出碳黑 (carbon black)、鈦黑（titanium black)、金屬微粒子、金’屬 氧化物、硫化物的微粒子等。其中，以遮光性及成本的平 衡優良之碳黑爲特佳。 該等能夠按照必要單獨使用，亦可組合使用複數種。 例如’碳黑單獨' 混合有機顏料及並用碳黑及有機顏料等。 遮光用的材料先前以來係並用至少2種以上的顏料作 爲黑色著色劑，來遮蔽可見光區域。該等顏料可舉出特開 2005-17716 號公報[0038]〜[0040]或特開 2005-17521 號公 報[0080]~[0088]所記載之顏料。在特開平7-271020平號公 報等有揭示使用該等顏料之遮蔽層的形成。 爲了更增大遮光效果，在特開2000-147240號公報、 特開2000-143985號公報、特開2005-338328號公報、特 開2006- 1 54849號公報等開發了碳黑、鈦黑或石墨等作爲 較佳遮光材料。在本發明’從遮光性或成本的觀點，碳黑 -58- 200937050 係一種較佳的遮光材料。 碳黑的例子以顏料黑（pigment black)7(碳黑）爲佳。碳 黑可舉出例如三菱化學公司（Mitsubishi Chemical Corporation)製的碳黑（Carbon Black)#2400 、 #2350 、 #2300、 #2200 、 #1000、 #980、 #970 &gt; #960、 #950 &gt; #900、 #850、#MCF88、#650、MA600、MA7、MA8、MA11、ΜΑΙΟ 0、 MA220、IL30B、IL31B、IL7B、IL11B、IL52B、#4000、 #4010、 #55、 #52 ' #50 、 #47、 #45、 #44、 #40、 #33、 #32 &gt;It is preferable to use 5 parts by mass or less, and 2 parts by mass or less, more preferably 2 parts by mass or less, based on 1 part by mass of the coating liquid for forming the photosensitive coloring composition layer. good. When the surfactant is more than 5 parts by mass, the surface roughness is likely to occur when the coating is dried, and the smoothness is liable to be deteriorated. Further, in order to promote the alkali solubility of the uncured portion and to improve the developability of the photohardenable composition, it is possible to add an organic carboxylic acid, preferably a low molecular weight organic carboxy group having a molecular weight of 1,000 or less. Specific examples thereof include aliphatic monocarboxylic acids such as formic acid, acetic acid, propionic acid, butyric acid, valeric acid, trimethylacetic acid, caproic acid, diethylacetic acid, enanthic acid, and octanoic acid; oxalic acid; Malonic acid, succinic acid, glutaric acid, adipic acid, pimelic acid, suberic acid, azelaic acid, sebacic acid, thirteen Acidic (brasylic acid), methylmalonic acid, ethylmalonic acid, dimethylmalonic acid, methyl succinic acid, tetramethyl succinic acid, citraconic acid, etc. Carboxylic acid; aliphatic tricarboxylic acid such as tricarballyic acid, aconitic acid, camphoronic acid; benzoic acid, toluic acid, different An aromatic residual acid such as cuminic acid, hemellitic acid, or mesitylene acid; citric acid, isophthalic acid, citric acid, 1,2,4-benzenetricarboxylic acid (trimellitic acid), 1,3,5-benzenetricarboxylic acid (1;]^11163^&amp;1(1), 1,2,3,5-benzene Acid (111611〇卩113111.&amp;(^(1), coke 200937050, pyromellitic acid, etc. aromatic polycarboxylic acid; phenylacetic acid, phenoxyacetic acid, methoxyphenoxyacetic acid, hydrogen Hydratropic acid, hydrocinnamic acid, mandelic acid, phenyl acid, atropic acid, cinnamic acid, methyl cinnamate, benzyl cinnamate , other carboxylic acids such as cinnamylidene acetate, cumaric acid, umbellic acid, etc. Alkoxysilane compound φ from the viewpoint of improving adhesion to the substrate The photosensitive coloring composition used in the present invention can be an alkoxydecane compound, particularly a decane coupling agent, a decane coupling agent, preferably having an alkoxyalkylene group as a hydrolyzable group capable of chemically bonding with an inorganic material. a (meth) acryl fluorenyl group, a phenyl group, a thiol group, an epoxy decane, which exhibits affinity with an organic resin for interaction or bonding formation, wherein (meth) propylene decyl propyl group three Methoxydecane is more preferred. g The amount of the decane coupling agent to be added is preferably from 0.2 to 5.0% by mass, more preferably from 0.5 to 3.0% by mass, based on the total solid content of the photosensitive coloring composition layer used in the present invention. Co-sensitizer The photosensitive coloring composition layer used in the present invention may contain a co-sensitizer as necessary. In the present invention, the co-sensitizer has a function of increasing the sensitivity of the sensitizing colorant and/or the initiator to the actinic radiation, or suppressing the polymerization inhibition of the polymerizable compound by oxygen. Such a co-sensitizer may, for example, be an amine, for example, MR Sander, etc. -55-200937050 "Journal of Polymer Society", Vol. 10, p. 3173 (1972), Special Public Sho 44-20189 Japanese Unexamined Patent Publication No. JP-A No. Hei. No. Hei. No. Hei. No. 5, No. 5, No. 5, No. In the case of the compound described in Research Disclosure No. 33825, specifically, triethanolamine or ethyl p-dimethylaminobenzoate is exemplified. , p-Mercaptodimethylaniline, p-methylthiodimethylaniline, and the like. In addition, the thiol and the thioethers are exemplified by the thiol and the thioethers, and the thiol described in JP-A-53-500806, JP-A-55-500806, and JP-A-5-1427 72 The compound, the disulfide compound of JP-A-56-75643, etc., specifically, 2-hydrothiobenzothiazole, 2-hydrothiobenzoxazole, 2-hydrothiobenzimidazole, 2-Hydroxythio-4(3H)-salazoline, thiosylnaphthalene, and the like. Further, examples of the other co-sensitizers include an amino acid compound (for example, N-phenylglycine), and an organometallic compound (for example, tributyltin acetate (Japanese Patent Publication No. 48-4 2965). A hydrogen compound (for example, trimeric methyl mercapaldehyde or the like) described in JP-A-H05-308727, and the like. From the viewpoint of increasing the curing speed by the balance of the polymerization growth rate and the chain transfer, the content of the co-sensitizer is preferably in the range of 0.1 to 30% by mass based on the total solid content of the photocurable composition. It is preferably in the range of 1 to 25 mass%, more preferably in the range of 0.5 to 20 mass%. Polymerization Inhibitor-56-200937050 v In the present invention, in the production or storage of a photosensitive coloring composition, in order to prevent undesired thermal polymerization of a compound having a polymerizable ethylenically unsaturated double bond, in photosensitivity It is preferred to add a small amount of a thermal polymerization inhibitor to the coloring composition. The thermal polymerization inhibitor used in the present invention may, for example, be hydroquinone, p-methoxyphenol, di-tert-butyl-p-cresol, pyrodallol, or tert-butyl catechin (t -butyl catechol), benzoquinone, 4,4'-thiobis(3-methyl-6- 1,3-tributylphenol), 2,2'-methylenebis(4-methyl- 6-tert-butylphenol) and N-nitrosophenylhydroxylamine first sulfonium salt and the like. The amount of the thermal polymerization inhibitor added is preferably from about 0.01% by mass to about 5% by mass based on the mass of the photosensitive coloring composition layer. Further, in order to prevent polymerization inhibition by oxygen, a higher fatty acid derivative such as behenic acid or decylamine may be added and the drying process of the coating may be applied to the surface of the photosensitive layer. The higher fatty acid derivative is preferably from about 0.5% by mass to about 10% by mass based on the total composition. φ Plasticizer Further, in the present invention, in order to improve the physical properties of the photosensitive coloring composition layer, an inorganic coating material or a plasticizer may be added, and a grease-sensing agent capable of improving ink inking property on the surface of the photosensitive layer may be added. Plasticizers are, for example, dioctyl phthalate, didodecyl phthalate, triethylene glycol dicaprylate, dimethyl glycol phthalate, tricksy1 phosphate, adipic acid When a binder is used, octyl ester, dibutyl sebacate, triethylene glycol glycerin or the like can be added with a plasticizer of 10% by mass or less based on the total mass of the compound having an ethylenically unsaturated double bond and a binder. -57-200937050 By using the above components, the photosensitive coloring composition of the present invention can be cured with high sensitivity and storage stability is also good. Also, it shows high adhesion to the substrate. Therefore, the photosensitive coloring composition containing the above various components can be suitably used for a color filter. Photosensitive concentrated composition The photosensitive concentrated composition used in the present invention contains (A - 2) opacifier, (B) binder polymer, (C-2) polymerizable compound, and (D) photopolymerization. The initiator and the (E) solvent are preferred, and other additives such as a dispersant or a surfactant may be contained as necessary. (A-2) Sunscreen (A-2) Sunscreen In addition to the above (A-1) colorant, carbon black, titanium black, metal fine particles, and gold's oxides may be mentioned. , sulphide particles, etc. Among them, carbon black excellent in light-shielding property and cost balance is particularly preferable. These can be used alone as needed, or a plurality of them can be used in combination. For example, 'carbon black alone' is a mixture of organic pigments and carbon black and organic pigments. The material for light-shielding has previously used at least two or more kinds of pigments as black colorants to shield the visible light region. The pigments described in JP-A-2005-17716 [0038] to [0040] or JP-A-2005-17521 (0080) to [0088] can be mentioned. The formation of a shielding layer using such pigments is disclosed in Japanese Laid-Open Patent Publication No. Hei 7-271020. In order to increase the light-shielding effect, carbon black, titanium black or graphite has been developed, for example, in JP-A-2000-147240, JP-A-2000-143985, JP-A-2005-338328, JP-A-2006-148849, and the like. Etc. as a preferred shading material. In the present invention, carbon black-58-200937050 is a preferred light-shielding material from the viewpoint of light-shielding property or cost. An example of carbon black is pigment black 7 (carbon black). Examples of the carbon black include Carbon Black #2400, #2350, #2300, #2200, #1000, #980, #970 &gt;#960,#950 &gt by Mitsubishi Chemical Corporation. ; #900, #850,#MCF88,#650,MA600,MA7,MA8,MA11,ΜΑΙΟ 0, MA220, IL30B, IL31B, IL7B, IL11B, IL52B, #4000, #4010, #55, #52 ' #50 , #47, #45, #44, #40, #33, #32 &gt;

#30、#20、#10、#5、CF9、#3050、#3150、#3250 ' #3750、 #3 95 0、 DIABLACK A、 DIABLACK N220M、 DIABLACK N23 4、 DIABLACK I、 DIABLACK LI、DIABLACK II、 DIABLACK N339 、 DIABLACK SH 、 DIABLACK SHA 、#30,#20,#10,#5,CF9,#3050,#3150,#3250 ' #3750, #3 95 0, DIABLACK A, DIABLACK N220M, DIABLACK N23 4, DIABLACK I, DIABLACK LI, DIABLACK II, DIABLACK N339, DIABLACK SH, DIABLACK SHA,

DIABLACK LH、DIABLACK H、DIABLACK HA、DIABLACK SF、DIABLACK N5 5 0M、DIABLACK E、DIABLACK G、 DIABLACK R、DIABLACK 760M、DIABLACK LP; DEGUSSA 公司（Evonik Degussa Japan)製的碳黑 Color Black FW200、 Color Black FW2 ' Color Black FW1 ' Color Black FW18 ' Color Black S170、Color Black S160、Special Black 6、 Special Black 5、Special Black 4、Special Black 4A、Printex U、Printex V、Printex 140U、Printex 140V、Printex 3 5 ; Cabot 公司製的碳黑 REGAL 400、REGAL 400R、REGAL XC72、VULCAN XC72R、MOGUL、MONARCH 1 400、 MONARCH 1000、BLACK PEARLS 1400 ;旭 CARBON 公司 (Asahi Carbon Co., Ltd)製的碳黑 SUNBLACK900、同 910、同930、同960、同970等。又，爲了提高電阻，以 -59- 200937050 使用高分子化合物被覆該等而成者爲佳。該等碳黑之單粒 子的大小以10奈米〜100奈米爲佳’以10奈米〜50奈米 爲更佳。 (C-2)聚合性化合物 在黑色矩陣形成用感光性濃色組成物之（C-2)聚合性 化合物，可舉出的較佳之物有在前述感光性著色組成物所 使用的（C-1)聚合性化合物，以下所示者爲特佳。 在感光性濃色組成物之聚合性化合物以具有2個以上 的乙烯性不飽和雙鍵且藉由照射光線而加成聚合之單體或 低聚物爲佳。此種單體及低聚物可舉出在分子中具有至少 1個能夠加成聚合的乙嫌性不飽和雙鍵且沸點在常壓爲 1〇〇 °C以上的化合物。其例子可舉出聚乙二醇一（甲基）丙烯 酸酯、聚丙二醇一（甲基）丙烯酸酯及（甲基）丙烯酸苯氧基乙 酯等單官能丙烯酸酯及單官能（甲基）丙烯酸酯：聚乙二醇 二（甲基）丙烯酸酯、聚丙二醇二（甲基）丙烯酸酯、三羥甲基 乙烷三丙烯酸酯、三羥甲基丙烷三（甲基）丙烯酸酯、三羥 甲基丙烷二丙烯酸酯、新戊二醇二（甲基）丙烯酸酯、新戊 四醇四（甲基）丙烯酸酯、新戊四醇三（甲基）丙烯酸酯、二新 戊四醇六（甲基）丙烯酸酯、二新戊四醇五（甲基）丙烯酸酯' 己二醇二（甲基）丙烯酸酯、三羥甲基丙烷三（丙烯醯氧基丙 基）醚、三（丙烯醯氧基丙基）異三聚氰酸酯、三（丙烯醯氧基 乙基）三聚氰酸酯、甘油三（甲基）丙烯酸酯；及在三羥甲基 丙院或甘油等的多官能醇加添環氧乙烷或環氧丙烷後（甲 基）丙嫌酸酯化而成之物等多官能丙烯酸酯或多官能甲基 丙烯酸酯。 -60- 200937050 ' 又，酸性多官能光硬化性化合物亦是較佳的化合物。 酸性多官能光硬化性化合物的例子可舉出（1)將具有羥基 且同時具有3個以上的光硬化性官能基之單體或低聚物， 使用二元酸酐改性而導入羧基而成者；（2)將具有羥基且同 時具有3個以上的光硬化性官能基之單體或低聚物，藉由 加添同時具有環氧丙基或異氰酸酯基及COOH基之化合物 等而導入羧基而成者：或（3)將具有3個以上的光硬化性官 能基之芳香族化合物使用濃硫酸或發煙硫酸改性而導入磺 0 酸基而成者等。又，亦可以將含有以酸性多官能光硬化性 化合物本身之單體作爲重複單位之低聚物，使用作爲酸性 多官能光硬化性化合物。酸性多官能光硬化性化合物的例 子以下述通式（i)、通式（ii)所示者爲佳。又，在通式（i)及 通式（ii)，T或G爲氧化烯基（oxyalkylene)基時，碳原子側 的末端係鍵結於R、X及W。 ch2-(T)-r R—(T)n—CH2—(p-CH2~~(T)n—X (i)DIABLACK LH, DIABLACK H, DIABLACK HA, DIABLACK SF, DIABLACK N5 5 0M, DIABLACK E, DIABLACK G, DIABLACK R, DIABLACK 760M, DIABLACK LP; Carbon Black Color Black FW200, Color Black FW2 by DEGUSSA (Evonik Degussa Japan) ' Color Black FW1 ' Color Black FW18 ' Color Black S170, Color Black S160, Special Black 6, Special Black 5, Special Black 4, Special Black 4A, Printex U, Printex V, Printex 140U, Printex 140V, Printex 3 5 ; Cabot The company's carbon black REGAL 400, REGAL 400R, REGAL XC72, VULCAN XC72R, MOGUL, MONARCH 1 400, MONARCH 1000, BLACK PEARLS 1400; Asahi Carbon Co., Ltd. carbon black SUNBLACK900, the same 910, Same as 930, same 960, same as 970, etc. Further, in order to increase the electric resistance, it is preferable to coat the polymer compound with -59 to 200937050. The size of the single particles of the carbon black is preferably from 10 nm to 100 nm, and more preferably from 10 nm to 50 nm. (C-2) The (C-2) polymerizable compound in which the polymerizable compound is a photosensitive color mixture for forming a black matrix, and a preferred product is used in the photosensitive coloring composition (C- 1) A polymerizable compound is particularly preferred as shown below. The polymerizable compound of the photosensitive concentrated composition is preferably a monomer or oligomer which has two or more ethylenically unsaturated double bonds and is subjected to addition polymerization by irradiation with light. Examples of such a monomer and oligomer include a compound having at least one ethyl septic unsaturated double bond capable of addition polymerization in a molecule and having a boiling point of 1 〇〇 ° C or more. Examples thereof include monofunctional acrylates such as polyethylene glycol mono(meth)acrylate, polypropylene glycol mono(meth)acrylate, and phenoxyethyl (meth)acrylate, and monofunctional (meth)acrylic acid. Ester: polyethylene glycol di(meth)acrylate, polypropylene glycol di(meth)acrylate, trimethylolethane triacrylate, trimethylolpropane tri(meth)acrylate, trishydroxyl Propane diacrylate, neopentyl glycol di(meth) acrylate, neopentyl alcohol tetra (meth) acrylate, neopentyl alcohol tri (meth) acrylate, dipentaerythritol hexa Acrylate, dipentaerythritol penta (meth) acrylate 'hexane diol di(meth) acrylate, trimethylolpropane tris(propylene methoxy propyl) ether, tris(propylene oxy oxy) Isopropyl)isocyanate, tris(propyleneoxyethyl)polycyanate, tris(meth)acrylate; and polyfunctional alcohols such as trimethylol propyl or glycerol Multifunctional C, such as a product obtained by adding (meth)propane after addition of ethylene oxide or propylene oxide A acrylate or polyfunctional methacrylate. -60- 200937050 ' Further, an acidic polyfunctional photocurable compound is also a preferred compound. Examples of the acidic polyfunctional photocurable compound include (1) a monomer or oligomer having a hydroxyl group and having three or more photocurable functional groups, which are modified by a dibasic acid anhydride to be introduced into a carboxyl group. (2) a monomer or oligomer having a hydroxyl group and having three or more photocurable functional groups, and a carboxyl group is introduced by adding a compound having a glycidyl group, an isocyanate group, and a COOH group. In addition, (3) an aromatic compound having three or more photocurable functional groups is modified by using concentrated sulfuric acid or fuming sulfuric acid to introduce a sulfonic acid group. Further, an oligomer containing a monomer having an acid polyfunctional photocurable compound itself as a repeating unit may be used as the acidic polyfunctional photocurable compound. Examples of the acidic polyfunctional photocurable compound are preferably those represented by the following formula (i) and formula (ii). Further, in the general formula (i) and the general formula (ii), when T or G is an oxyalkylene group, the terminal on the carbon atom side is bonded to R, X and W. Ch2-(T)-r R—(T)n—CH2—(p-CH2~~(T)n—X (i)

© CH2-(T)n-R CH2-(G)rW CHa-iG^W W-(G)p~CH2~e-CH2~Z-CH2-e~CH2-(G)p-W (i i)© CH2-(T)n-R CH2-(G)rW CHa-iG^W W-(G)p~CH2~e-CH2~Z-CH2-e~CH2-(G)p-W (i i)

CH2-(G)「W CH^G^W 通式（i)中，R係表示（甲基）丙烯醯基，X係表示_C00H 基或-0P03H2基。T係表示氧化稀基（oxyalkylene group)， 在此伸烷基（alkylenegroup)之碳數爲1〜4。η爲0〜20。 -61 - 200937050 通式（ii)中，W係與在通式（i)之R或X同義，且6個 W之中，3個以上的W與R同義。G係與通式（i)之T同義。 z 係表示-0-或-〇C = ONH(CH2)qNHCOO-。p 爲 0〜20，q 爲 1〜8。在一分子內複數存在之R、T、G、W可各自相同亦 可不同。 通式（i)及通式（Π)所示之酸性多官能光硬化性化合物 的市售品可舉出例如東亞合成（股KTOAGOSEI Co.，Ltd)製 的含羧基之3官能丙烯酸酯亦即TO-75 6，及含羧基之5官 能丙烯酸酯亦即TO- 1 3 82等。 而且，可舉出特公昭48-4 1 708號公報、特公昭5 0-6034 號公報及特開昭51-37193號公報所記載之丙烯酸胺基甲酸 酯類；特開昭4 8 -64 1 8 3號公報、特公昭49-43 1 9 1號公報 及特公昭52-3 0490號公報所記載之聚酯型丙烯酸酯類；環 氧樹脂與（甲基）丙烯酸的反應生成物之環氧丙烯酸酯類等 多官能丙烯酸酯及多官能甲基丙烯酸酯。上述之中，以三 羥甲基丙烷三（甲基）丙烯酸酯、新戊四醇四（甲基）丙烯酸 酯、二新戊四醇六（甲基）丙烯酸酯及二新戊四醇五（甲基） 丙烯酸酯爲佳。又，此外可適合舉出的較佳之物有特開平 1 1 - 1 3 3 600號公報所記載之「聚合性化合物B」。 在作爲黑色矩陣形成用所使用的感光性濃色組成物之 (C_ 2)聚合性化合物的含量，係相對於感光性濃色組成物的 總固體成分，以5〜50質量％爲佳，以7〜40質量％爲較佳， 以10〜35質量％爲更佳。 在感光性濃色組成物所使用的（B)黏合劑聚合物、（D) 聚合引發劑、（E)溶劑及其他的添加劑等係與在前述著色圖 200937050 ' 案形成用的感光性著色組成物同樣’較佳含量亦同樣。 彩色濾光片 本發明的彩色濾光片依照本發明的彩色濾光片之製法 所製造的彩色濾光片，黑色矩陣與著色圖案具有重疊的重 疊部，且前述重疊部在黑色矩陣寬度方向之距離爲2·0微 米〜9.0微米。 使用上述感光性著色組成物及感光性濃色組成物並依 照本發明的彩色濾光片之製法所製造之本發明的彩色濾光 φ 片，係能夠抑制角部的高度且重疊部的長度亦適當’能夠 高品質顯示者。以前述重疊部的長度爲2.0微米〜9.0微 米，且前述角部的高度爲〇.5〇微米以下爲佳。 液晶顯示裝置 本發明之液晶顯示裝置係具備有本發明的彩色濾光片 之液晶顯示裝置。因此，能夠顯示高品質的影像。 間隙物可適合使用藉由塗布之製造方法或藉由轉印之 製造方法。就製程簡單而言，以藉由塗布之製造方法。就 p 間隙物高度的均勻性良好而言，以藉由轉印之製造方法爲 佳。關於藉由轉印之方法以特開2008- 1 460 1 8號公報所記載 之方法爲特佳。 顯示裝置的定義各顯示裝置的說明係例如記載於「電 子顯示裝置（佐佐木昭夫著、工業調查會（股）1990年發 行）」、「顯示裝置（伊吹順章著、產業圖書（股）1 989發行）」 等。又，關於液晶顯示裝置，例如能夠應用於「下世代液 晶顯示裝置技術（內田龍男編集、工業調查會（股）1 994年 發行）」。本發明能夠應用之液晶顯示裝置沒有特別限制’ -63- 200937050 例如能夠應用在上述「下世代液晶顯示裝置技術」所記載 之各式各樣方式的液晶顯示裝置。 在此等之中，本發明以對彩色TFT(薄膜電晶體；Thin Film Transistor)方式之液晶顯示裝置特別有效。彩色TFT 方式之液晶顯示裝置係例如「彩色TFT液晶顯示裝置（共立 出版（股）1 996年發行）」所記載。而且，本發明亦能夠應用 於IPS(面內切換；In-Plane Switching)等橫向電場驅動方 式、Μ V A (多疇垂直配向；M u 11 i - d 〇 m a i η V e r t i c a 1 A1 i g n m e n t) 等像素分割方式等視野角擴大的液晶顯示裝置、或STN(超 扭曲向列；Super-twisted Nematic)、TN(扭曲向列；Twisted N e m a t i c)、V A (垂直配向；V e r t i c a 1 A1 i g n m e n t)、Ο C S (晶片 間隙物；On Chip Spacer)、FFS(邊界電場交換式；Fringe Field Switching)及 R-OCB(反射光學補償彎曲；Reflective Optically Compensated Bend)等。此等方式係例如「EL(電 致發光；Elecro-Luminesence)、PDP(電獎顯示器；Plasma Display Panel)、LCD顯示裝置技術及市場之最新動向（東 麗硏發中心（Toray Research Center)調査硏究部門 2001年 發行）」之第43頁所記載。 液晶顯示裝置除了彩色濾光片以外，係由電極基板、 偏光薄膜、相位差薄膜、背光板（backlight)、間隙物 (spacer)、視野角保障薄膜等各式各樣的組件所構成。本發 明的附帶遮光膜之基板能夠應用在該等眾所周知的構件所 構成的液晶顯示裝置。 該等構件係例如「’94年液晶顯示裝置周邊材料化學材 料的市場（島 健太郎 CMC(股）（CMC Publishing Co., 200937050CH2-(G) "W CH^G^W In the formula (i), R represents a (meth)acryloyl group, and X represents a _C00H group or a -OPO3H2 group. The T system represents an oxyalkylene group. Wherein the carbon number of the alkylene group is 1 to 4. η is 0 to 20. -61 - 200937050 In the formula (ii), the W system is synonymous with R or X in the formula (i), Among the six Ws, three or more Ws are synonymous with R. The G system is synonymous with T of the general formula (i). The z system represents -0- or -〇C = ONH(CH2)qNHCOO-.p is 0~ 20, q is 1 to 8. R, T, G, and W in a plurality of molecules may be the same or different in one molecule. The acidic polyfunctional photocurable compound represented by the formula (i) and the formula (Π) The commercially available product may, for example, be a carboxyl group-containing trifunctional acrylate manufactured by East Asia Synthetic Co., Ltd., that is, TO-75 6, and a carboxyl group-containing 5-functional acrylate, that is, TO-1 3 82, etc. Further, the urethane urethanes described in Japanese Patent Publication No. Sho 48-4 1 708, Japanese Patent Publication No. Sho 590-1034, and JP-A-51-37193 can be cited. 1 8 3 Gazette, Special Gong Zhao 49-43 1 9 1 and Special Gong Zhao 52-3 0490 A polyester acrylate described in the publication, a polyfunctional acrylate such as an epoxy acrylate such as a reaction product of an epoxy resin and (meth)acrylic acid, and a polyfunctional methacrylate. Hydroxymethylpropane tri(meth)acrylate, pentaerythritol tetra(meth)acrylate, dipentaerythritol hexa(meth)acrylate, and dipentaerythritol penta(meth)acrylate Further, a "polymerizable compound B" described in JP-A No. 1 1 - 1 3 3 600 is also preferable. The content of the (C 2 ) polymerizable compound which is a photosensitive rich color composition used for forming a black matrix is preferably 5 to 50% by mass based on the total solid content of the photosensitive concentrated composition. 7 to 40% by mass is more preferably 10 to 35% by mass. (B) binder polymer, (D) polymerization initiator, (E) solvent, and other additives used in the photosensitive concentrated composition are photosensitive coloring compositions for forming the coloring pattern 200937050'. The same 'best content' is also the same. Color filter The color filter of the present invention is a color filter manufactured by the method for producing a color filter of the present invention, wherein the black matrix and the colored pattern have overlapping overlapping portions, and the overlapping portion is in the width direction of the black matrix. The distance is from 2.00 microns to 9.0 microns. The color filter φ sheet of the present invention produced by the method for producing a color filter according to the present invention using the photosensitive coloring composition and the photosensitive rich color composition can suppress the height of the corner portion and the length of the overlapping portion. Appropriate 'can show high quality. The length of the overlapping portion is preferably 2.0 μm to 9.0 μm, and the height of the corner portion is preferably 〇5 μm or less. Liquid crystal display device The liquid crystal display device of the present invention is provided with a liquid crystal display device having the color filter of the present invention. Therefore, it is possible to display high quality images. The spacer may be suitably used in a manufacturing method by coating or a manufacturing method by transfer. In terms of the process, the manufacturing method by coating is simple. As for the uniformity of the height of the p-gap, it is preferable to use a transfer manufacturing method. The method described in Japanese Laid-Open Patent Publication No. 2008-1 460 181 is particularly preferred. Definition of display device Description of each display device is described in, for example, "Electronic display device (sasaki Sasaki, Industrial Research Association, issued in 1990)", "Display device (Ibuki Shunzhang, Industrial Book Co., Ltd.) 1 989 Issue) and so on. In addition, the liquid crystal display device can be applied to, for example, the next generation liquid crystal display device technology (issued by Uchida Ryoko, Industrial Research Association (issued) in 1994). The liquid crystal display device to which the present invention is applicable is not particularly limited. - 63 - 200937050 For example, various types of liquid crystal display devices described in the "Next Generation Liquid Crystal Display Device Technology" can be applied. Among these, the present invention is particularly effective for a liquid crystal display device of a color TFT (Thin Film Transistor) type. A liquid crystal display device of a color TFT type is described, for example, in "Color TFT liquid crystal display device (Kyoritsu Publishing Co., Ltd., issued in 1996)". Furthermore, the present invention can also be applied to a horizontal electric field driving method such as IPS (In-Plane Switching), a pixel such as Μ VA (multi-domain vertical alignment; M u 11 i - d 〇 mai η V ertica 1 A1 ignment). Liquid crystal display device with enlarged viewing angle such as division method, or STN (Super-twisted Nematic), TN (Twisted Nematic), VA (Vertical Alignment; V ertica 1 A1 ignment), Ο CS (Wafer spacer; On Chip Spacer), FFS (Fringe Field Switching), and R-OCB (Reflective Optically Compensated Bend). These methods are, for example, "EL (Electro Luminescence), PDP (Plasma Display Panel), LCD display device technology, and the latest trends in the market (Toray Research Center survey) The research department published in 2001) is described on page 43. The liquid crystal display device is composed of a wide variety of components such as an electrode substrate, a polarizing film, a retardation film, a backlight, a spacer, and a viewing angle securing film, in addition to the color filter. The substrate with a light-shielding film of the present invention can be applied to a liquid crystal display device comprising such well-known members. These components are, for example, "the market for the chemical materials of peripheral materials for liquid crystal display devices in the '94" (Kita Minami CMC Co., Ltd.) (CMC Publishing Co., 200937050)

Ltd)、1 994年發行）」、「2003年液晶顯示裝置相關市場的 現狀及將來展望（下卷）（表良吉 Fuj i C himer a Re se arch Institute (股）2003年發行）」所記載。 關於背光板係記載於SID meeting Digest 1 3 80(2005 年）（A. Konno等人）或顯示器月刊 2005年12月號之第18 〜24頁（島康裕）、同25〜30頁（八木隆明）等。 本發明的彩色濾光片與先前眾所周知的冷陰極管之三 波長管組合時，能夠實現高對比（contrast)，而且，藉由將 φ 紅、綠、藍的LED光源（RGB-LED)作爲背光，能夠提供亮 度高且色純度高、再現性良好之液晶顯示裝置。 又，另一方面，液晶顯示裝置被要求提升影像響應速 度之性能。進行改良液晶的配向速度來提升響應速度。另 —方面從液晶胞（cell)的結構方面而言，降低液晶層的厚度 在降低成本上亦是必要的。降低液晶層的厚度所必要的另 一種技術係降低在著色像素與黑色矩陣的境界部分之液晶 配向混亂。因此，要求減小在著色像素與黑色矩陣的境界 II 部分之***（角部）。 依照本發明之彩色濾光片的製法所製造的彩色濾光 片，藉由在黑色矩陣形成用的感光性濃色組成物層，設置 有-2.0〜5.0微米的底切，且著色圖案（著色像素）形成用的 感光性著色組成物層與黑色矩陣的重叠部之長度爲2.0微 米〜9微米，能夠使角部減小。 如此，因爲角部較小，所以本發明的彩色濾光片能夠 降低在前述重叠部之液晶配向的混亂，顯像時之視認性亦 提升。在本發明的液晶顯示裝置，藉由使用本發明的彩色 -65- 200937050 濾光片，能夠使各著色像素之與黑色矩陣重疊部平坦，平 坦性良好時能夠使液晶層平坦化，或是在敷設透明電極 Iτο之前不必進行硏磨，或不必賦予平坦化層，能夠對製 程的合理化進而降低成本、大量生產性有貢獻。 [實施例] 以下舉出實施例來更具體地說明本發明。在以下實施 例所示之材料、試藥、比率、機器、操作等，只要在未脫 離本發明的範圍，能夠適當地變更。因此，本發明的範圍 未限定於下示具體例。又，在以下的實施例，若未預先告 知，「％」及「份」係表示「質量。/。」及「質量份」，分子量 係表示重量平均分子量。又，「wt%」係表示「質量％ J。 實施例1 1.感光性濃色組成物的調製 黑色矩陣分散液（K-1)的調製 依照下述處方來調製碳黑分散液（K-1)。 •碳黑（DEGUSSA 公司製的 COLOR BLACK FW2) • · · 26.7 份 •分散劑（楠本化成製DISPARLON DA7500 酸價26胺價 4 0) · · · 3.3 份 •甲基丙烯酸苄酯/甲基丙烯酸共聚物 ( = 72/28 [莫耳比]共聚物、分子量30,000、丙二醇一甲醚乙 酸酯的5 0質。/。溶液） · · · 1 0份 •丙二醇一甲基醚乙酸酯 ·，·60份 將上述各成分以 3 000rpm 的條件使用均化器 (homogenizer)攪拌1小時。藉由使用0.3毫米氧化锆珠粒 200937050 (zirconium beads)之珠粒分散機（商品名：DESPERMAT、 GETZMANN 公司（VMA-GETZMANN GMBH)製）將所得到的 混合溶液施加微分散處理8小時，得到碳黑分散液（K-1)。 使用所得到的碳黑分散液（K-1)，並依照下述表1的處 方調製感光性濃色組成物塗布液CK-1、CK-3及CK-4。表 1中的數値係質量比。 [表1] 感光性濃色組成物 CK-1 CK-3 CK-4 遮光劑 碳黑 峨黑 Τ,μ* bw 娠黑 分散液(K-1)液量 31.0 20.7 45.0 樹脂溶液C-2 3.0 5.6 3.0 UV硬化性樹脂C-3 2.0 3.6 2.0 聚合性化合物C-5 2.2 3.2 2.2 引發劑C-7 0.8 1.2 0.8 聚合抑制劑 對甲氧基苯酣 0.0002 0.0002 0.0002 界面活性劑C-8 0.001 0.001 0.001 溶劑 PGMEA 46.0 49.0 46.0 EEP 15.0 16.7 15.0 表1中的各成分之詳細係如下述。 ❹ ❹ •樹脂溶液C-2:甲基丙烯酸苄酯/甲基丙烯酸（ = 85/15[莫 耳比])共聚物（分子量1 0,000、丙二醇一甲醚乙酸酯的50 wt%溶液） • UV硬化性樹脂 C-3:商品名 CYCLOMER P ACA-250 DAICEL化學工業（股）製[在側鏈具有脂環基、COOH基及丙 -67- 200937050 烯醯基之丙烯酸系共聚物、丙二醇一甲基醚乙酸酯溶液（固 體成分：50質量％溶液）] •聚合性化合物C-5 :商品名 TO- 1 3 82(東亞合成（股）製） (以具有將二新戊四醇五丙烯酸酯的末端的OH基之一部分 取代成爲COOH基而成的5官能丙烯醯基之單體作爲主成 分） •引發劑 C-7 :商品名「OXE-02」CIBA SPECIALTY CHEMICALS公司製 •界面活性劑C-8 :商品名「MEGAFAC R30」大日本INK ▲ 〇 化學工業（股）公司製 •溶劑：PGMEA =丙二醇一甲基醚乙酸酯 EEP =丙烯酸3-乙氧基乙酯 2.藉由塗布之黑色矩陣的形成 感光性濃色組成物層形成製程 將所得到的感光性濃色組成物CK-1使用狹縫塗布器 (Slit coater)(型號 HC6000、平田機工股份公司（Hirata C operation)製），以後烘烤後的膜厚度成爲1.1微米的方式 ◎ 調整狹縫及玻璃基板間的間隔、吐出量且以塗布速度爲1 20 毫米/秒塗布在洗淨的玻璃基板（CORNING公司製 MILLENIUM 0.7 毫米厚）。 預烘烤製程、曝光製程 接著，使用熱板（hot plate)，在90°C進行加熱（預烘烤處 理）120 秒後，使用接近式（proximity)曝光機（型號 LE5565A、日立 High-Technologies 股份有限公司（Hitachi High- Technologies Corporation)製），以 6〇mJ/cm2 曝光。 -68- 200937050 ' 顯像製程 隨後，使用水平搬運型的顯示裝置進行顯像。亦即， 使用氫氧化鉀系顯像液 CDK-1(富士軟片電子材料 (股）FUJIFILM Electronic Materials Co.，Ltd.)製的 1.0% 顯 像液（亦即，含有1質量份CDK-1及99質量份純水之稀釋 液；23°C)並設定噴淋壓力爲O.lOMPa，顯像55秒並以純 水洗淨，來得到顯像後的黑色矩陣。 在此，使用顯微測長度機進行黑色矩陣的線寬度測定 Φ 時’爲23.4微米。又’使用SEM(掃描型電子顯微鏡；Scanning Electron Microscope)，拍攝剖面照片並測定底切長度時， 爲1.0微米。 SEM攝影係在黑色矩陣的格子的長邊之中央附近，在 黑色矩陣的寬度方向且與基板表面垂直地，將黑色矩陣與 基板一同切斷來進行。而且將顯像溫度各自變更爲22°C及 24°C (23°C ± 1°C )而顯像，各自測定在該等顯像條件之線寬 及底切長度（底切量）。將在各溫度的線寬之差異作爲△線 〇 寬，且將在各溫度的底切量之差異作爲△底切。 烘烤製程 接著，於220°C的潔淨烘箱（clean oven)進行後烘烤處 理40分鐘，來形成著色像素形成區域的開口爲90微米χ2 00 微米，黑色矩陣的厚度爲1.2微米且黑色矩陣的線寬度爲 25微米之格子狀黑色矩陣基板。 使用 X-Rite 361T(V)(SAKATA INX ENG. Co.，Ltd.(股） 製）測定完成的黑色矩陣之光學濃度（OD)時，爲4.1。 3.感光性著色組成物的調製 -69- 200937050 3-1.紅色（R)用感光性著色組成物塗布液CR-1的調製- 依照下述處方來調製紅色（R)用分散液（R-1) ° •顏料紅254(以SEM觀察的平均粒徑爲43奈米） ..· U 份 •顏料紅177(以SEM觀察的平均粒徑爲58奈米） ...4 份 •下述分散樹脂A-3的溶液 ..·5份 •分散劑（商品名：Disperbyk-161、BYK-Chemie 公司（ΒγκLtd., issued in 1994), "The status and future prospects of the liquid crystal display device-related market in 2003 (volume)" (Formed by Fuj i C himer a Rese arch Institute (issued in 2003)". The backlight panel is described in SID meeting Digest 1 3 80 (2005) (A. Konno et al.) or the monthly display of the December 2005 issue of pages 18 to 24 (Island Kang Yu), the same 25 to 30 pages (Yamamu Longming) )Wait. When the color filter of the present invention is combined with a previously known three-wavelength tube of a cold cathode tube, high contrast can be achieved, and by using φ red, green, and blue LED light sources (RGB-LED) as backlights A liquid crystal display device having high luminance, high color purity, and good reproducibility can be provided. On the other hand, liquid crystal display devices are required to improve the performance of image response speed. Improve the alignment speed of the liquid crystal to improve the response speed. On the other hand, in terms of the structure of the liquid crystal cell, it is also necessary to reduce the thickness of the liquid crystal layer in terms of cost reduction. Another technique necessary to reduce the thickness of the liquid crystal layer is to reduce the liquid crystal alignment disorder in the boundary portion between the colored pixel and the black matrix. Therefore, it is required to reduce the ridge (corner) of the boundary portion II between the colored pixel and the black matrix. The color filter manufactured by the method for producing a color filter according to the present invention is provided with an undercut of -2.0 to 5.0 μm and a coloring pattern by coloring a photosensitive color composition layer for forming a black matrix. The length of the overlapping portion of the photosensitive coloring composition layer for forming the pixel and the black matrix is 2.0 μm to 9 μm, and the corner portion can be reduced. As described above, since the corner portion is small, the color filter of the present invention can reduce the disorder of the liquid crystal alignment in the overlapping portion, and the visibility at the time of development is also improved. In the liquid crystal display device of the present invention, by using the color-65-200937050 filter of the present invention, the overlapping portion of the colored pixels with the black matrix can be made flat, and when the flatness is good, the liquid crystal layer can be flattened, or Before the transparent electrode Iτο is applied, it is not necessary to perform honing, or it is not necessary to provide a planarization layer, and it is possible to contribute to rationalization of the process, cost reduction, and mass productivity. [Examples] Hereinafter, the present invention will be more specifically described by way of examples. The materials, reagents, ratios, equipment, operations, and the like shown in the following examples can be appropriately changed without departing from the scope of the invention. Therefore, the scope of the present invention is not limited to the specific examples shown below. Further, in the following examples, "%" and "parts" indicate "mass./." and "parts by mass", and the molecular weight means a weight average molecular weight. In addition, "wt%" means "mass % J. Example 1 1. Preparation of a modulated black matrix dispersion (K-1) of a photosensitive concentrated composition The carbon black dispersion was prepared according to the following prescription (K- 1) • Carbon black (COLOR BLACK FW2 manufactured by DEGUSSA) • · · 26.7 parts • Dispersant (DISPARLON DA7500 acid price 26 amine price 4 0) · · · 3.3 parts • Benzyl methacrylate / A Acrylic acid copolymer (= 72/28 [mole ratio] copolymer, molecular weight 30,000, propylene glycol monomethyl ether acetate 50% solution) · · · 10 parts • propylene glycol monomethyl ether acetate Ester····60 parts The above components were stirred for 1 hour using a homogenizer at 3 000 rpm by using a bead disperser of 0.3 mm zirconia beads 200937050 (zirconium beads) (trade name: DESPERMAT) The obtained mixed solution was subjected to a microdispersion treatment for 8 hours to obtain a carbon black dispersion (K-1). The obtained carbon black dispersion (K-1) was used, and The photosensitive concentrated color composition coating liquid CK-1, CK- was prepared according to the prescription of Table 1 below. 3 and CK-4. The mass ratio of the number of lanthanum in Table 1. [Table 1] Photosensitive concentrated composition CK-1 CK-3 CK-4 Sunscreen carbon black 峨 black Τ, μ* bw Black dispersion (K-1) Liquid amount 31.0 20.7 45.0 Resin solution C-2 3.0 5.6 3.0 UV curable resin C-3 2.0 3.6 2.0 Polymerizable compound C-5 2.2 3.2 2.2 Initiator C-7 0.8 1.2 0.8 Polymerization inhibitor Oxybenzoquinone 0.0002 0.0002 0.0002 Surfactant C-8 0.001 0.001 0.001 Solvent PGMEA 46.0 49.0 46.0 EEP 15.0 16.7 15.0 The details of the components in Table 1 are as follows. ❹ ❹ • Resin solution C-2: benzyl methacrylate Ester/methacrylic acid (=85/15 [mole ratio]) copolymer (molecular weight 10,000, 50 wt% solution of propylene glycol monomethyl ether acetate) • UV curable resin C-3: trade name CYCLOMER P ACA -250 DAICEL Chemical Industry Co., Ltd. [Acrylic copolymer with alicyclic group, COOH group and C-67-200937050 olefin group in the side chain, propylene glycol monomethyl ether acetate solution (solid content: 50 mass) % solution)] • Polymeric compound C-5: trade name TO- 1 3 82 (manufactured by East Asia Synthetic Co., Ltd.) A monomer of a 5-functional acrylonitrile group in which one of the OH groups at the terminal of the tetraol pentaacrylate is substituted with a COOH group as a main component) • Initiator C-7: trade name "OXE-02" manufactured by CIBA SPECIALTY CHEMICALS • Surfactant C-8: Trade name "MEGAFAC R30" Dainippon INK ▲ 〇Chemical Industry Co., Ltd. • Solvent: PGMEA = propylene glycol monomethyl ether acetate EEP = 3-ethoxyethyl acrylate 2 The formation of the photosensitive green color composition layer by the coating of the black matrix. The obtained photosensitive concentrated color composition CK-1 is a slit coater (Model HC6000, Hirata Machinery Co., Ltd. (Hirata) C operation), the film thickness after baking was 1.1 micrometers. ◎ Adjusting the interval between the slit and the glass substrate, and the amount of discharge, and applying it to the cleaned glass substrate at a coating speed of 1 20 mm/sec (CORNING) The company's MILLENIUM is 0.7 mm thick). Prebaking process and exposure process Next, using a hot plate, heating at 90 ° C (prebaking treatment) for 120 seconds, using a proximity exposure machine (model LE5565A, Hitachi High-Technologies shares) Ltd. (manufactured by Hitachi High-Technologies Corporation), exposed at 6 〇 mJ/cm 2 . -68- 200937050 'Developing process Subsequently, the horizontal transfer type display unit was used for development. That is, a 1.0% developing solution made of potassium hydroxide-based developing liquid CDK-1 (Fuji Film Electronic Materials Co., Ltd.) (that is, containing 1 part by mass of CDK-1 and 99 parts by mass of a dilution of pure water; 23 ° C) and set the spray pressure to 0.1 MPa, imaged for 55 seconds and washed with pure water to obtain a black matrix after development. Here, the line width measurement of the black matrix using the microscopic length measuring machine was φ' at 23.4 μm. Further, when a cross-sectional photograph was taken and an undercut length was measured using an SEM (Scanning Electron Microscope), it was 1.0 μm. The SEM imaging is performed by cutting the black matrix together with the substrate in the vicinity of the center of the long side of the lattice of the black matrix in the width direction of the black matrix and perpendicular to the surface of the substrate. Further, the development temperature was changed to 22 ° C and 24 ° C (23 ° C ± 1 ° C), and the line width and the undercut length (undercut amount) under the development conditions were measured. The difference in line width at each temperature was taken as the Δ line 〇 width, and the difference in the undercut amount at each temperature was used as the Δ undercut. The baking process was followed by post-baking treatment in a clean oven at 220 ° C for 40 minutes to form an opening of the colored pixel formation region of 90 μm χ 2 00 μm, a black matrix thickness of 1.2 μm and a black matrix. A grid-like black matrix substrate having a line width of 25 μm. When the optical density (OD) of the completed black matrix was measured using X-Rite 361T (V) (manufactured by SAKATA INX ENG. Co., Ltd.), it was 4.1. 3. Preparation of photosensitive coloring composition - 69- 200937050 3-1. Preparation of photosensitive coloring composition coating liquid CR-1 for red (R) - Preparation of red (R) dispersion according to the following prescription (R) -1) ° • Pigment Red 254 (average particle size observed by SEM is 43 nm) ..· U parts • Pigment Red 177 (average particle size observed by SEM is 58 nm) ... 4 parts • Lower Solution of Dispersing Resin A-3..·5 parts•Dispersant (trade name: Disperbyk-161, BYK-Chemie Company (Βγκ

Japan ΚΚ製）（丙二醇一甲基醚乙酸酯的3 0%涪液） _ ...3 份 •鹼可溶性樹脂：甲基丙烯酸苄酯/甲基丙烯酸共聚物 ( = 7 5 /2 5 [莫耳比]共聚物、分子量3 0,00 0、丙二醇一甲基醚 乙酸酯溶液（固體成分：50質量％)) . · · 9份 •溶劑B:丙二醇一甲基醚乙酸酯 ·，·68份 將上述各成分使用均化器以3 000rpm的條件攪拌1小 時。將所得到的混合溶液使用0.3毫米氧化銷珠粒之珠粒 分散機（商品名：DESPERMAT、GETZMANN公司製）將所得 到的混合溶液施加微分散處理4小時，得到紅色（R)用分散 液（R-1)。使用SEM觀察所得到的紅色（R)用分散液（R-1)中 的分散粒子時，平均粒徑爲36奈米。 使用所得到的紅色（R)用分散液（R -1 )’依照下述處方來 調製紅色（R)用感光性著色組成物塗布液CR-1。 •紅色（R)用分散液（R-1) · · .100份 •環氧樹脂：（商品名EHPE3150 DAICEL化學工業公司製 • · · 2 份 -70- 200937050 •聚合性化合物：商品名：DPHA日本化藥（股）製 • · · 8 份 (乙氧基羰基甲基）胺基- • · · 1 份 -1-(4-味啉苯基）_丁酮-1 • · · 1 份 .· · 0 · 5 份 • · · 0.001 份 •聚合引發劑：4-(鄰溴-對Ν,Ν-苯基）-2,6-二（三氯甲基）-s-三阱 •聚合引發劑：2-苄基-2-二甲胺 •聚合引發劑：二乙基噻噸酮 .· •聚合抑制劑：對甲氧基苯酚 · · ❹ •氟系界面活性劑（商品名：Megafac R30大日本INK化學 工業（股）公司製） ._ · 0.01份 .非離子系界面活性劑（商品名：TETRONIC R150 ADEKA 公司製） · · · 0.2份 •溶劑：丙二醇正丁基醚乙酸酯 · · ·30份 •溶劑：丙二醇一甲基醚乙酸酯 · ♦ ·100份 將上述成分混合攪拌，得到紅色（R)用感光性著色組成 物塗布液CR-1。 φ 3-2.綠色（G)用感光性著色組成物塗布液CG-1的調製 依照下述處方調製綠色（G)用分散液（G-l)° •顏料綠36(以SEM觀察的平均粒徑爲47奈米） .· · 1 1 份 •顏料黃150(以SEM觀察的平均粒徑爲39奈米） ...7 份 •下述分散樹脂Α·3的溶液 · · ·5份 •分散劑（商品名：Disperbyk-161、BYK-Chemie 公司製 30% 3份 溶液） · · -71- 200937050 •鹼可溶性樹脂：甲基丙烯酸苄酯/甲基丙烯酸共聚物 (=85/15[莫耳比]共聚物、分子量3〇,〇〇〇、丙二醇—甲基醚 乙酸酯溶液（固體成分：50質量％)) · · · 11份 •溶劑：丙二醇一甲基醚乙酸酯 ...70份 將上述各成分使用均化器以3000rpm的條件攪拌1小 時。將所得到的混合溶液使用0.3毫米氧化鍩珠粒之珠粒 分散機（商品名：DESPERMAT、GETZMANN公司製）將所得 到的混合溶液施加微分散處理8小時，得到綠色（G)用分散 液（G-1)。 使用所得到的綠色（G)用分散液（G-1)，依照下述處方 調製綠色（G)用感光性著色組成物塗布液CG-1。使用SEM 觀察時，平均粒徑爲32奈米。 •綠色（G)用分散液（G-1) · · · 100份 •環氧樹脂：（商品名EHPE3150 DAICEL化學工業公司製 • · · 2 份 •聚合性化合物：（商品名：DPHA日本化藥（股）製） • · · 8 份 •聚合性化合物：新戊四醇的四（乙氧基丙烯酸酯） • · · 2 份 •聚合引發劑：1,3-雙三鹵甲基-5-苯并氧雜戊環三阱 • · · 2 份 •聚合引發劑：2-苄基-2-二甲胺基-1-(4-味啉苯基）-丁酮-1 • · · 1 份 .聚合引發劑：二乙基_噸酮 · · .0.5份 •聚合抑制劑：對甲氧基苯酚 ···0.00&quot;* -72- 200937050 •氟系界面活性劑（商品名：Megafac R08大日本INK化學 工業公司製） ...0.02份 •非離子系界面活性劑（商品名：EMALGNE A-60 花王公 司製） · · . 0 · 5份 •溶劑：丙二醇一甲基醚乙酸酯 · . ·120份 •溶劑：丙二醇正丙基醚乙酸酯 · · · 3 〇份 將上述成分混合攪拌，得到綠色（G)用感光性著色組成 物塗布液CG-1。 © 3-3.藍色（Β)用感光性著色組成物塗布液CB-1的調製— 依照下述處方調製藍色（Β)用分散液（B-l)° •顏料藍15: 6 (以S EM觀察的平均粒徑爲55奈米） • · · 14 份 •顏料紫23 (以SEM觀察的平均粒徑爲61奈米） • . · 1 份 •下述分散樹脂A-3的溶液 · . ·5份 •分散劑（商品名：Disperbyk-161、BYK-Chemie 公司製 30% © 溶液） · . . 3份 •鹼可溶性樹脂：甲基丙烯酸苄酯/甲基丙烯酸共聚物 ( = 80/20[莫耳比]共聚物、分子量3 0,000、丙二醇一甲基醚 乙酸酯溶液（固體成分：50質量％)) . · .4份 •溶劑··丙二醇一甲基醚乙酸酯 .· · 73份 將上述各成分使用均化器以3 0 0 0 rpm的條件攪拌1小 時。將所得到的混合溶液使用〇 · 3毫米氧化锆珠粒之珠粒 分散機（商品名：DESPERMAT、GETZMANN公司製）將所得 到的混合溶液施加微分散處理4小時，得到藍色（B)用分散 -73- 200937050 液（Β-l)。使用SEM觀察時，平均粒徑爲39奈米。 使用所得到的藍色（B)用分散液（B-1)，依照下述處方來 調製藍色（B)用感光性著色組成物塗布液CB-1。 •藍色（B)用分散液（B-1) · · ·100份 •鹼可溶性樹脂：甲基丙烯酸苄酯/甲基丙烯酸共聚物 ( = 80/20[莫耳比]共聚物、分子量3 0,000、丙二醇一甲基醚 乙酸酯溶液（固體成分：50質量％)) · · · 7份 •環氧樹脂：（商品名CELLOXIDE 2080 DAICEL化學工業 公司製 · · · 2份 υ • UV 硬化性樹脂：（商品名 CYCLOMERP ACA-250 DAICEL 化學工業公司製）（在側鏈具有脂環基、COOH基及丙烯醯基 之丙烯酸系共聚物、丙二醇一甲基醚乙酸酯溶液（固體成 分：5 0質％) · · · 4份 •聚合性化合物：（商品名：DPHA日本化藥（股）製） • · · 1 2 份 •聚合引發劑：1-(9-乙基-6-(2-甲基苯甲醯基）-9Η-咔唑-3-基）-1-(鄰乙醯肟）乙酮 · · · 3份 〇 •聚合抑制劑：對甲氧基苯酚 · · . 0.001份 •氟系界面活性劑（商品名：Megafac R08大日本INK化學 工業（股）公司製） ...0.02份 •非離子系界面活性劑（商品名：EMALGNE A-60花王公 司製） .· · 1.0份 •溶劑：3 -乙氧基丙酸乙酯 ...20份 •溶劑：丙二醇一甲基醚乙酸酯 ..·150份 將上述成分混合攪拌’得到藍色（Β)用感光性著色組成 -74- 200937050 ' 物塗布液CB-1。 4.分散樹脂A-3的合成 4-1.鏈轉移劑A-3的合成 將7.83份二新戊四醇六（3·氫硫基丙烯酸酯）[DPMP; 堺化學工業（股）（Sakai Chemical Industry Co_，Ltd.)製](下 述化合物（33))、及4.55份具有吸附部位且具有碳-碳雙鍵 之下述化合物（m-6)，溶解於28.90份丙二醇一甲基醚，在 氮氣流下加熱至7〇°C。對此添加〇.〇4份2,2’-偶氮雙（2,4-φ 二甲基戊腈）[V-65、和光純藥工業（股）（Wak〇 Pure Chemical Industries Ltd.)製]並加熱3小時。更添加〇·〇4份V-65 ’ 並在氮氣流下於7 0 °C使其反應3小時。藉由冷卻至室溫’ 來得到以下所示之硫醇（mercaptan)化合物（鏈轉移劑A3)的 3 0 %溶液。Japan ΚΚ) (30% sputum of propylene glycol monomethyl ether acetate) _ ... 3 parts • Alkali-soluble resin: benzyl methacrylate / methacrylic acid copolymer ( = 7 5 /2 5 [ Mohr's copolymer, molecular weight 300,00 0, propylene glycol monomethyl ether acetate solution (solid content: 50% by mass)) · · 9 parts • Solvent B: Propylene glycol monomethyl ether acetate · 68 parts The above components were stirred for 1 hour at a temperature of 3 000 rpm using a homogenizer. The obtained mixed solution was subjected to a microdispersion treatment for 4 hours using a 0.3 mm oxidized pin bead bead disperser (trade name: DESPERMAT, manufactured by GETZMANN) to obtain a red (R) dispersion ( R-1). When the dispersed particles in the red (R) dispersion (R-1) obtained were observed by SEM, the average particle diameter was 36 nm. The red (R) photosensitive coloring composition coating liquid CR-1 was prepared in accordance with the following formulation using the obtained red (R) dispersion (R -1 )'. • Red (R) dispersion (R-1) · · .100 parts • Epoxy resin: (trade name: EHPE3150 DAICEL Chemical Industry Co., Ltd. • · · 2 parts -70- 200937050 • Polymeric compound: Trade name: DPHA Nippon Chemical Co., Ltd. • · · 8 parts (ethoxycarbonylmethyl)amine- • · · 1 part of 1-(4-morpholinylphenyl)-butanone-1 • · · 1 part. · · · · · · · · · · 0.001 parts • Polymerization initiator: 4-(o-bromo-p-oxime, fluorenyl-phenyl)-2,6-di(trichloromethyl)-s-tripper Agent: 2-benzyl-2-dimethylamine • Polymerization initiator: diethyl thioxanthone. • Polymerization inhibitor: p-methoxyphenol · · ❹ • Fluorine-based surfactant (trade name: Megafac R30 Dainippon INK Chemical Industry Co., Ltd.) ._ · 0.01 parts. Nonionic surfactant (trade name: manufactured by TETRONIC R150 ADEKA) · · · 0.2 parts • Solvent: propylene glycol n-butyl ether acetate · · 30 parts • Solvent: propylene glycol monomethyl ether acetate · ♦ · 100 parts The above components are mixed and stirred to obtain a photosensitive coloring composition coating liquid CR-1 for red (R). φ 3-2. Green (G) Preparation of photosensitive coloring composition coating liquid CG-1 The green (G) dispersion (Gl) was prepared according to the following prescription. • Pigment green 36 (average particle diameter observed by SEM was 47 nm) .·· 1 1 part • Pigment Yellow 150 (average particle diameter observed by SEM is 39 nm) ... 7 parts • Solution of the following dispersion resin Α·3 · · · 5 parts • Dispersant (trade name: Disperbyk-161, 30% 3 parts by BYK-Chemie) · · -71- 200937050 • Alkali-soluble resin: benzyl methacrylate/methacrylic acid copolymer (=85/15 [mole ratio] copolymer, Molecular weight 3〇, hydrazine, propylene glycol-methyl ether acetate solution (solid content: 50% by mass)) · · · 11 parts • Solvent: propylene glycol monomethyl ether acetate... 70 parts The ingredients were stirred for 1 hour at 3000 rpm using a homogenizer. The obtained mixed solution was subjected to microdispersion using a 0.3 mm cerium oxide bead bead disperser (trade name: DESPERMAT, GETZMANN). After treating for 8 hours, a green (G) dispersion (G-1) was obtained. The obtained green (G) was used. In the dispersion (G-1), the photosensitive coloring composition coating liquid CG-1 for green (G) was prepared according to the following procedure. When observed by SEM, the average particle diameter was 32 nm. • Green (G) dispersion (G-1) · · · 100 parts • Epoxy resin: (trade name: EHPE3150 DAICEL Chemical Industry Co., Ltd. • · · 2 parts • Polymeric compound: (trade name: DPHA Japanese chemical) (Stock)) • · · 8 parts • Polymeric compound: tetrakis(ethoxy acrylate) of pentaerythritol • · · 2 parts • Polymerization initiator: 1,3-bistrihalomethyl-5- Benzooxacyclopentane triple trap • · · 2 parts • Polymerization initiator: 2-benzyl-2-dimethylamino-1-(4-morpholinylphenyl)-butanone-1 • · · 1 part .Polymerization initiator: diethyl _ ton ketone · · · 0.5 parts • polymerization inhibitor: p-methoxy phenol · · · 0.00 &quot; * -72- 200937050 • Fluorine-based surfactant (trade name: Megafac R08 large Japan INK Chemical Industry Co., Ltd.) ...0.02 parts • Nonionic surfactant (trade name: EMALGNE A-60, Kao Corporation) · · · 0 · 5 parts • Solvent: propylene glycol monomethyl ether acetate · · 120 parts • Solvent: propylene glycol n-propyl ether acetate · · · 3 parts of the above ingredients are mixed and stirred to obtain a green (G) photosensitive coloring composition CG-1. © 3-3. Blue (Β) Preparation of photosensitive coloring composition coating liquid CB-1 - Preparation of blue (Β) dispersion (Bl) ° according to the following prescription • Pigment Blue 15: 6 (average particle size observed by S EM is 55 nm) • · · 14 parts • Pigment Violet 23 (average particle size observed by SEM is 61 nm) • · 1 part • Disperse resin A-3 below Solution · · · 5 parts • Dispersant (trade name: Disperbyk-161, BYK-Chemie 30% © solution) · . . 3 parts • Alkali-soluble resin: benzyl methacrylate / methacrylic acid copolymer ( = 80/20 [mole ratio] copolymer, molecular weight 3 0,000, propylene glycol monomethyl ether acetate solution (solid content: 50% by mass)) · · 4 parts • Solvent · Propylene glycol monomethyl ether acetate Ester. · · 73 parts The above components were stirred for 1 hour at 300 rpm using a homogenizer. The obtained mixed solution was a bead disperser using 〇 3 mm zirconia beads (trade name: DESPERMAT, manufactured by GETZMANN), the obtained mixed solution was subjected to a microdispersion treatment for 4 hours to obtain a dispersion of blue (B)-73-200937050 (Β- l). When observed by SEM, the average particle diameter was 39 nm. Using the obtained blue (B) dispersion (B-1), the blue (B) was prepared according to the following prescription. Coating liquid CB-1. • Blue (B) dispersion (B-1) · · · 100 parts • Alkali-soluble resin: benzyl methacrylate/methacrylic acid copolymer (= 80/20 [mole ratio] copolymer, molecular weight 3 0,000, propylene glycol monomethyl ether acetate solution (solid content: 50% by mass)) · · · 7 parts • Epoxy resin: (trade name: CELLOXIDE 2080 DAICEL Chemical Industry Co., Ltd. · · · 2 parts υ • UV curability Resin: (trade name: CYCLOMERP ACA-250 DAICEL Chemical Industry Co., Ltd.) (acrylic copolymer with alicyclic group, COOH group and acrylonitrile group in the side chain, propylene glycol monomethyl ether acetate solution (solid content: 5 0% by mass) · · · 4 parts • Polymerizable compound: (trade name: DPHA Nippon Chemical Co., Ltd.) • · · 1 2 parts • Polymerization initiator: 1-(9-ethyl-6-(2) -Methylbenzylidene)-9Η-oxazol-3-yl)-1-(o-ethylidene)ethanone · · · 3 parts 〇•Polymerization inhibitor: p-methoxyphenol·· . 0.001 part • Fluoride-based surfactant (trade name: Megafac R08, manufactured by INK Chemical Industry Co., Ltd.) ...0.02 parts • Nonionic surfactant Product name: EMALGNE A-60 Kao Corporation) ·· · 1.0 parts • Solvent: 3-ethoxypropionate ethyl ester...20 parts • Solvent: propylene glycol monomethyl ether acetate..·150 parts will The above components are mixed and stirred to obtain a photosensitive coloring composition of blue (Β)-74-200937050 'object coating liquid CB-1. 4. Synthesis of dispersion resin A-3 4-1. Synthesis of chain transfer agent A-3 7.83 parts of dipentaerythritol hexa(3·hydroxythio acrylate) [DPMP; manufactured by Sakai Chemical Industry Co., Ltd.] (the following compound (33)), and 4.55 parts have The following compound (m-6) having an adsorption site and having a carbon-carbon double bond was dissolved in 28.90 parts of propylene glycol monomethyl ether, and heated to 7 ° C under a nitrogen stream. To this, 4 parts of 2, 2 were added. '-Azobis(2,4-φ-dimethylvaleronitrile) [V-65, manufactured by Wak〇 Pure Chemical Industries Ltd.] and heated for 3 hours. 4 parts of V-65' and reacted for 3 hours at 70 ° C under a nitrogen stream. By cooling to room temperature ', 30% of the mercaptan compound (chain transfer agent A3) shown below was obtained. Solution.

Q r&lt;3r〇 一 f eW ^CHrQ r&lt;3r〇 a f eW ^CHr

ch2-shCh2-sh

S〇#t ίβι^6) 關 :1 / 3.5加成體） 4-2.分散樹脂Α-3的合成 將4.99份將如此進行所得到的鏈轉移劑A3的30% 溶液、19.0份甲基丙烯酸甲酯、及1.0份甲基丙烯酸、4.66 份丙二醇一甲基醚的混合溶液，在氮氣流下加熱至90°C。 邊攪拌該混合溶液邊以2.5小時滴加0.139份2,2’ -偶氮雙 -75- 200937050S〇#t ίβι^6) Off: 1 / 3.5 Addition) 4-2. Synthesis of Dispersion Resin Α-3 4.99 parts of a 30% solution of the chain transfer agent A3 thus obtained, 19.0 parts of methyl group A mixed solution of methyl acrylate and 1.0 part of methacrylic acid and 4.66 parts of propylene glycol monomethyl ether was heated to 90 ° C under a nitrogen stream. While stirring the mixed solution, 0.139 parts of 2,2'-azobis-75-200937050 was added dropwise over 2.5 hours.

異丁酸二甲酯[V-601、和光純藥工業（股）製]、5.36份丙二 醇一甲基醚、9.40份丙二醇一甲基醚乙酸酯的混合溶液。 滴加結束後，於90 °C反應2.5小時後，投入0.046份2,2’ -偶氮雙異丁酸二甲酯、4.00份丙二醇一甲基醚乙酸酯的混 合溶液，進而反應2小時。在反應液添加1.52份丙二醇一 甲基醚、21.7份丙二醇一甲基醚乙酸酯，並冷卻至室溫， 來得到特定分散樹脂A-3(聚苯乙烯換算的重量平均分子量 爲24000)的溶液（特定分散樹脂30質量％、丙二醇一甲基 醚21質量％、丙二醇一甲基醚乙酸酯49質量％)。 該特定分散樹脂A-3的酸價爲4 8mgKOH/g。分散樹脂 A-3的結構係如下所示。A mixed solution of dimethyl isobutyrate [V-601, manufactured by Wako Pure Chemical Industries, Ltd.], 5.36 parts of propylene glycol monomethyl ether, and 9.40 parts of propylene glycol monomethyl ether acetate. After the completion of the dropwise addition, the mixture was reacted at 90 ° C for 2.5 hours, and then a mixed solution of 0.046 parts of dimethyl 2,2'-azobisisobutyrate and 4.00 parts of propylene glycol monomethyl ether acetate was added thereto, and further reacted for 2 hours. . 1.52 parts of propylene glycol monomethyl ether and 21.7 parts of propylene glycol monomethyl ether acetate were added to the reaction liquid, and the mixture was cooled to room temperature to obtain a specific dispersion resin A-3 (weight average molecular weight in terms of polystyrene was 24,000). Solution (specific dispersion resin: 30% by mass, propylene glycol monomethyl ether 21% by mass, propylene glycol monomethyl ether acetate: 49% by mass). The acid value of the specific dispersion resin A-3 was 48 mgKOH/g. The structure of the dispersion resin A-3 is as follows.

彩色濾光片的製造 感光性著色組成物層形成製程 將所得到的紅色（R)用感光性著色組成物塗布液 CR-1，塗布在前述黑色矩陣基板的黑色矩陣形成面側。具 體上，與形成感光性濃色組成物層時同樣地，以後烘烤後 之感光性著色組成物層的層厚度爲約2.4微米的方式調節 狹縫與黑色矩陣基板間的間隔、吐出量，並以塗布速度120 毫米/秒進行塗布。 -76- 200937050 ' 著色層預烘烤製程、著色層曝光製程 接著，使用熱板於100°C進行加熱（預烘烤處理）120秒 後，使用接近式曝光機（型號LE5565A、日立HIGHTECH NOLOGIES公司製），並以60mJ/cm2曝光。 又，以曝光圖案與黑色矩陣的重疊（曝光重疊量）爲4.5 微米的方式來設定光罩圖案及曝光機。 著色層顯像製程、著色層烘烤製程 隨後，使用氫氧化鉀系顯像液CD K-l(富士電子材料 0 (股）製）的1.0%顯像液（含1質量份CDK-1及99質量份純水 之稀釋液、25°C)並設定噴淋壓力爲0.2MPa，顯像45秒並 以純水洗淨。 接著，在220 °C的潔淨烘箱後烘烤處理30分鐘，來形 成經熱處理過的紅色像素。 接著，在上述感光性著色組成物層形成製程、著色層 預烘烤製程、著色層曝光製程、著色層顯像製程及著色層 烘烤製程，除了使用綠色（G)用感光性著色組成物塗布液 φ CG-1代替紅色（R)用感光性著色組成物塗布液CR-1以外， 同樣地形成綠色像素。而且，隨後除了使用藍色（B)用感光 性著色組成物塗布液CB-1代替紅色（R)用感光性著色組成 物塗布液CR-1以外，同樣地形成藍色像素而得到彩色濾光 片。 拍攝任意選取的10像素的SEM剖面照片，測定感光 性著色組成物層與黑色矩陣之重疊距離時，算術平均爲4.5 微米。 前述SEM剖面照片係在黑色矩陣的長邊的中央附近於 -77- 200937050 與長度方向垂直地切割剖面並進行SEM拍攝。 又，使用接觸式表面粗糙計 P-10(KLA-TENCOR(股） 製），測定任意選擇的100個著色圖案的[角部]之高度時， 算術平均爲〇. 2 5微米。***的高度測定係如第5圖所示進 行，在黑色矩陣10之格子長邊的中央附近，在前述黑色矩 陣10的寬度方向（A方向）移動觸針12來進行。 又，各色的著色圖案與黑色矩陣所形成的***高度， 係求取著色圖案的表面之中，從重叠部的基板表面最遠的 部分與重疊部以外之平坦的表面部分之間在基板的法線之 距離。 液晶顯示裝置的製造 在依照上述所得到的彩色濾光片的R像素、G像素及 B像素和黑色矩陣上，進而使用濺鍍（sputtering)形成 ITO(Indium Tin Oxide ;銦錫氧化物）透明電極。另外，準 備玻璃基板作爲相對基板，並同樣地使用濺鑛形成ITO透 明電極。然後，在相當於前述ITO透明電極上的隔牆上方 部分設置柱狀光間隙物（photospacer)，且在其上面設置由 聚醯亞胺所構成的配向膜。 隨後，在相當於以包圍彩色濾光片的著色像素群之方 式設置而成之黑色矩陣外框的位置，使用分配器方式塗布 紫外線硬化樹脂的密封劑，滴加TN模式用液晶並與相對 基板貼合，且使用UV照射貼合後的基板之後，熱處理使 密封劑硬化。如此進行而得到液晶胞。在該液晶胞的兩面 貼上 SANRITZ Corporation(股）製的偏光板 HLC2-2518，接 著，構成冷陰極管的背光板並配置在設置有前述偏光板之 -78- β 200937050 ' 液晶胞的背面側，來作爲液晶顯示裝置。 液晶顯示裝置的囊質評價 在液晶顯示裝置通電並藉由目視觀察各種顯示影像’ 並依照下述評價基準進行評價。結果如下述表3所示。 (評價基準） ◎:無不均且顯希非常鮮明而感到有吸引力。 〇 :無不均且顯眾鮮明而感到有吸引力 △ ··雖然無不均’但是感到顯示無吸引力。 φ χ :有不均’或帶白色而不値得觀賞。 (實施例2〜實施例9及比較例1〜比較例4 在實施例1，除了將黑色矩陣的底切量、及在著色圖 案形成製程之重疊量變更爲表示所示之値以外，與實施例 1同樣地進行來製造彩色濾光片，並使用該彩色濾光片與 實施例1同樣地進行來製造液晶顯示裝置。 [表2] 底切量 重叠量 實施例2 1.0微米 2.5微米 實施例3 1.0微米 6.5微米 實施例4 1.0微米 7.5微米 實施例5 -2.0微米 4.5微米 實施例6 -1 .0微米 4.5微米 實施例7 2.5微米 4.5微米 實施例8 4.0微米 4.5微米 實施例9 5.0微米 4.5微米 比較例1 -3.0微米 4.5微米 比較例2 6.0微米 4.5微米 比較例3 1.0微米 1.0微米 比較例4 1.0微米 10.0微米 ❹ -79- 200937050 在上述實施例2〜實施例9及比較例1〜比較例4所製 造的各液晶顯示裝置，係與實施例1同樣地進行評價畫 質。結果如表3所示。 又，在比較例3，因爲在黑色矩陣與像素之間有一部 分間隙發生等而產生白點，係無法適合隨後的評價及製造 顯示裝置之彩色濾光片。 [表6] 底切量 (微米） 重疊量 (微米） ***高度 (微米） △線寬 (微米） Δ底切 (微米） 畫質 實施例1 1.0 4.5 0.25 0.8 0.9 ◎ 實施例2 1.0 2.5 0.1 0.9 0.8 ◎ *施例3 1.0 6.5 0.29 0.8 0.8 ◎ 實施例4 1.0 7.5 0.39 0.7 0.8 〇 實施例5 -2.0 4.5 0.3 2.1 0.6 〇 實施例ό -1.0 4.5 0.27 1.4 0.7 ◎ 實施例7 2.5 4.5 0.24 0.8 1.1 ◎ 實施例8 4.0 4.5 0.23 0.6 L8 〇 實施例9 5.0 4.5 0.2 0.5 2.3 〇 比較例1 -3.0 4.5 0.26 3.8 0.5 X 比較例2 6.0 4.5 0.25 0.7 3.2 X 比較例3 1.0 1.0 - 0.8 0.8 - 比較例4 1.0 1〇.〇 ,.一 0.55 0.9 0.8 X 表3中，底切量、重疊量、角部的高度、△線寬及△ 底切的單位係任/者均是「微米」。(Production of Color Filter) Photosensitive Colored Composition Layer Forming Process The obtained red (R) photosensitive coloring composition coating liquid CR-1 is applied onto the black matrix forming surface side of the black matrix substrate. Specifically, in the same manner as in the case of forming the photosensitive rich color composition layer, the interval between the slit and the black matrix substrate and the amount of discharge are adjusted so that the layer thickness of the photosensitive colored composition layer after baking is about 2.4 μm. The coating was carried out at a coating speed of 120 mm/sec. -76- 200937050 'Colored layer prebaking process, colored layer exposure process Next, using a hot plate at 100 ° C for heating (prebaking treatment) for 120 seconds, using a proximity exposure machine (Model LE5565A, Hitachi HIGHTECH NOLOGIES (), and exposed at 60mJ/cm2. Further, the mask pattern and the exposure machine were set such that the overlap of the exposure pattern and the black matrix (exposure overlap amount) was 4.5 μm. Coloring layer developing process, coloring layer baking process Subsequently, 1.0% developing solution (containing 1 mass part of CDK-1 and 99 mass) using potassium hydroxide-based developing solution CD Kl (manufactured by Fuji Electronics Co., Ltd.) A dilution of pure water, 25 ° C) and set the spray pressure to 0.2 MPa, for 45 seconds and washed with pure water. Next, it was baked for 30 minutes in a clean oven at 220 ° C to form heat-treated red pixels. Next, in the photosensitive coloring composition layer forming process, the colored layer prebaking process, the colored layer exposure process, the colored layer developing process, and the coloring layer baking process, except that the photosensitive coloring composition is coated with green (G) The liquid φ CG-1 was formed in the same manner as the photosensitive coloring composition coating liquid CR-1 for red (R), and a green pixel was formed in the same manner. Then, in addition to using the photosensitive coloring composition coating liquid CB-1 for blue (B) instead of the photosensitive coloring composition coating liquid CR-1 for red (R), blue pixels are similarly formed to obtain color filter. sheet. When an SEM cross-sectional photograph of an arbitrary 10 pixels was taken and the overlapping distance between the photosensitive colored composition layer and the black matrix was measured, the arithmetic mean was 4.5 μm. In the SEM cross-sectional photograph, the cross section was cut perpendicularly to the longitudinal direction at -77-200937050 near the center of the long side of the black matrix, and SEM photographing was performed. Further, when the height of the [corner portion] of the arbitrarily selected 100 coloring patterns was measured using a contact surface roughness meter P-10 (manufactured by KLA-TENCOR Co., Ltd.), the arithmetic mean was 〇.25 μm. The height measurement of the ridge is performed as shown in Fig. 5, and the stylus 12 is moved in the width direction (direction A) of the black matrix 10 in the vicinity of the center of the long side of the lattice of the black matrix 10. Further, the height of the ridges formed by the colored patterns of the respective colors and the black matrix is determined by the method between the portion farthest from the substrate surface of the overlapping portion and the flat surface portion other than the overlapping portion among the surfaces of the colored pattern. The distance of the line. The liquid crystal display device is manufactured by forming an ITO (Indium Tin Oxide) transparent electrode by sputtering using R pixels, G pixels, and B pixels and a black matrix of the color filter obtained as described above. . Further, a glass substrate was prepared as a counter substrate, and ITO transparent electrodes were formed by sputtering in the same manner. Then, a columnar photo spacer is provided on the partition wall corresponding to the ITO transparent electrode, and an alignment film made of polyimine is provided on the surface. Subsequently, the sealant of the ultraviolet curable resin is applied by a dispenser method at a position corresponding to the black matrix outer frame provided so as to surround the colored pixel group surrounding the color filter, and the liquid crystal for TN mode is dropped and the opposite substrate After bonding, and after bonding the bonded substrate with UV irradiation, the heat treatment cures the sealant. This was carried out to obtain a liquid crystal cell. A polarizing plate HLC2-2518 manufactured by SANRITZ Corporation was attached to both sides of the liquid crystal cell, and then a backlight plate constituting the cold cathode tube was disposed on the back side of the -78-β 200937050' liquid crystal cell provided with the polarizing plate. , as a liquid crystal display device. Evaluation of the quality of the liquid crystal display device The liquid crystal display device was energized, and various display images were visually observed and evaluated according to the following evaluation criteria. The results are shown in Table 3 below. (Evaluation criteria) ◎: There is no unevenness and it is very clear and attractive. 〇 : I feel unattractive and unobtrusive. △ ·· Although there is no unevenness, I feel unattractive. φ χ : There is unevenness or white with no viewing. (Example 2 to Example 9 and Comparative Example 1 to Comparative Example 4) In Example 1, except that the undercut amount of the black matrix and the amount of overlap in the coloring pattern forming process were changed to those shown in the figure, In the same manner as in Example 1, a color filter was produced, and a liquid crystal display device was produced in the same manner as in Example 1. [Table 2] Undercut amount overlap amount Example 2 1.0 μm 2.5 μm Example 3 1.0 micron 6.5 micron embodiment 4 1.0 micron 7.5 micron embodiment 5 - 2.0 micron 4.5 micron Example 6 - 1.0 micron 4.5 micron Example 7 2.5 micron 4.5 micron Example 8 4.0 micron 4.5 micron Example 9 5.0 micron 4.5 Micron Comparative Example 1 - 3.0 μm 4.5 μm Comparative Example 2 6.0 μm 4.5 μm Comparative Example 3 1.0 μm 1.0 μm Comparative Example 4 1.0 μm 10.0 μm ❹ -79- 200937050 In the above Example 2 to Example 9 and Comparative Example 1 to comparison In each liquid crystal display device manufactured in Example 4, the image quality was evaluated in the same manner as in Example 1. The results are shown in Table 3. Further, in Comparative Example 3, since there was a part between the black matrix and the pixel. The white spots generated by the gaps and the like are not suitable for the subsequent evaluation and manufacturing of the color filters of the display device. [Table 6] Undercut amount (micrometer) The amount of overlap (micrometer) The height of the ridge (micrometer) △ line width (micrometer) Δ undercut (micron) image quality Example 1 1.0 4.5 0.25 0.8 0.9 ◎ Example 2 1.0 2.5 0.1 0.9 0.8 ◎ * Example 3 1.0 6.5 0.29 0.8 0.8 ◎ Example 4 1.0 7.5 0.39 0.7 0.8 〇 Example 5 -2.0 4.5 0.3 2.1 0.6 〇Example ό -1.0 4.5 0.27 1.4 0.7 ◎ Example 7 2.5 4.5 0.24 0.8 1.1 ◎ Example 8 4.0 4.5 0.23 0.6 L8 〇 Example 9 5.0 4.5 0.2 0.5 2.3 〇Comparative Example 1 -3.0 4.5 0.26 3.8 0.5 X Comparative Example 2 6.0 4.5 0.25 0.7 3.2 X Comparative Example 3 1.0 1.0 - 0.8 0.8 - Comparative Example 4 1.0 1〇.〇,.0.55 0.9 0.8 X In Table 3, the amount of undercut, the amount of overlap, and the height of the corner The units of the △ line width and the Δ undercut are all "micron".

從表3得知，實施例1〜實施例9之彩感光性濃色組 成物能夠抑制角度的高度’使用該等彩色滤光片而成的液 -80- 200937050 ' 晶顯示裝置’具有高品質的畫質。 特別是使用本發明的製造方法所製造之實施例1〜實 施例9的彩色濾光片亦能抑制顯示不均，這是未預期到的 效果。 【圖式簡單說明】 第1圖係設置有底切之黑色矩陣基板的部分剖面圖。 第2圖係設置有底切之黑色矩陣基板的部分剖面圖。 第3圖係形成有重疊部之彩色濾光片的部分剖面圖。 〇 第4圖係在重疊部具有角部之彩色濾光片的部分剖面 圖。 第5圖係用以求取角部的高度的測定方法之槪念圖。 第6圖本發明的彩色濾光片之剖面圖。 【主要元件符號說明】 2 基板 4 黑色矩陣（感光性濃色組成物層） 6 著色圖案（感光性著色組成物層） ® 8 重疊部 10 黑色矩陣 12 觸針 a 底切長度 b 距離 e 距離 d 距離 p 寬度方向的一端 -81- 200937050 Q 離P最遠部分 R 離P最遠部分 S 最外端 T 最外端It is understood from Table 3 that the color photosensitive rich color compositions of Examples 1 to 9 can suppress the height of the angle. The liquid-80-200937050 'crystalline display device' using the color filters has high quality. The quality of the picture. In particular, the color filters of Examples 1 to 9 produced by the production method of the present invention can suppress display unevenness, which is an unexpected effect. BRIEF DESCRIPTION OF THE DRAWINGS Fig. 1 is a partial cross-sectional view showing a black matrix substrate provided with an undercut. Fig. 2 is a partial cross-sectional view showing a black matrix substrate provided with an undercut. Fig. 3 is a partial cross-sectional view showing a color filter in which an overlapping portion is formed. 〇 Fig. 4 is a partial cross-sectional view showing a color filter having corners at the overlapping portion. Fig. 5 is a conceptual diagram for determining a method of determining the height of a corner. Figure 6 is a cross-sectional view of a color filter of the present invention. [Main component symbol description] 2 Substrate 4 Black matrix (photosensitive color composition layer) 6 Coloring pattern (photosensitive coloring composition layer) ® 8 Overlap 10 Black matrix 12 Contact pin a Undercut length b Distance e Distance d One end from the width direction of the p-81- 200937050 Q The farthest part from the P R The farthest part from the P S The outermost end T The outermost end

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Claims (1)

200937050 ' 七、申請專利範圍： 1. 一種彩色濾光片的製造方法，係具有以下製程： 黑色矩陣形成製程，其係使用感光性濃色組成物在基板 上形成感光性濃色組成物層，並將該感光性濃色組成物 層曝光，且將曝光後的該感光性濃色組成物層顯像來形 成具有底切之黑色矩陣，在此，該底切長度在黑色矩陣 的寬度方向爲- 2.0微米〜5.0微米，而且包含藉由將黑色 矩陣圖案烘烤來形成黑色矩陣；與 ❹ 著色圖案形成製程係藉由在形成有烘烤後的黑色矩陣 之該基板上，使用感光性著色組成物形成感光性著色組 成物層，並將該感光性著色組成物層曝光，且將曝光後 的該感光性著色組成物層顯像，而且將顯像後的該感光 性著色組成物層烘烤來形成著色圖案，在此，該烘烤後 的該著色圖案與該黑色矩陣重疊的重疊部在黑色矩陣寬 度方向之長度爲2.0〜9.0微米。 〇 2.如申請專利範圍第1項之彩色濾光片的製造方法，其中 在該基板上所形成的該感光性濃色組成物層之厚度爲 0.2微米〜2.2微米。 3. 如申請專利範圍第1項之彩色濾光片的製造方法，其中 在該黑色矩陣形成製程之該顯像，顯像溫度爲2(TC〜30 〇C。 4. 如申請專利範圍第1項之彩色濾光片的製造方法，其中 該黑色矩陣形成製程係在該感光性濃色組成物層形成製 -83- 200937050 程之後，且在該在曝光製程之前，更含有預烘烤。 5 .如申請專利範圍第4項之彩色濾光片的製造方法’其中 在該預烘烤製程之預烘烤溫度爲60°C〜l4〇°C ° 6. 如申請專利範圍第4項之彩色濾光片的製造方法’其中 在該預烘烤製程之預烘烤時間爲3 0秒〜3 00秒。 7. 如申請專利範圍第1項之彩色濾光片的製造方法，其中 在該感光性著色組成物層的層厚度爲 I8微米〜2.8微 米。 8. 如申請專利範圍第1項之彩色濾光片的製造方法，其中 在該著色圖案形成製程之該曝光，透過光罩圖案來進行 曝光，且曝光圖案與黑色矩陣的S疊部分在黑色矩陣的 寬度方向之長度爲2.0微米〜9.0微米。 9. 如申請專利範圍第8項之彩色濾光片的製造方法，其中 在該著色圖案形成製程之該顯像，顯像溫度爲20°C〜35 °C，且顯像時間爲20秒〜120秒。 10. 如申請專利範圍第8項之彩色濾光片的製造方法，其中 該重疊部分在黑色矩陣的寬度方向之該長度爲2.0微# 〜8.0微米，該顯像溫度爲21°C〜30°C，且該顯像時間 爲25〜80秒。 11. 如申請專利範圍第8項之彩色濾光片的製造方法，_ + 該重疊部分在黑色矩陣的寬度方向之長度爲2.0微# ^ 7.0微米，該顯像溫度爲22 °C〜26 °C，且該顯像時間爲 3 5秒〜7 5秒。 -84- 200937050 12. —種彩色濾光片，係由如申請專利範圍第1至1 1項中 任一項之彩色濾光片的製造方法所製造的彩色爐光片’ 其中具有黑色矩陣與著色圖案重疊之重疊部’且該重疊 部在黑色矩陣的寬度方向之長度爲2.0微米〜9.0微米。 13. 如申請專利範圍第12項之彩色濾光片，其中該著色圖 案的表面之中，在該重疊部離基板表面最遠的部分與該 重疊部以外的部分之間在基板的法線方向之距離爲0.50 微米以下。 14. 一種液晶顯示裝置，其係具備如申請專利範圍第12項 之彩色濾光片。 15. —種液晶顯示裝置，其係具備如申請專利範圍第13項 之彩色濾光片。200937050 ' VII. Patent application scope: 1. A method for manufacturing a color filter, which has the following processes: a black matrix forming process for forming a photosensitive dense color composition layer on a substrate by using a photosensitive rich color composition. And exposing the photosensitive dense color composition layer, and developing the exposed photosensitive color composition layer to form a black matrix having an undercut, wherein the undercut length is in the width direction of the black matrix - 2.0 micrometers to 5.0 micrometers, and comprising forming a black matrix by baking a black matrix pattern; and ❹ a coloring pattern forming process by using a photosensitive coloring composition on the substrate on which the baked black matrix is formed Forming a photosensitive coloring composition layer, exposing the photosensitive coloring composition layer, developing the photosensitive coloring composition layer after exposure, and baking the photosensitive coloring composition layer after development The colored pattern is formed. Here, the overlapping portion of the colored pattern and the black matrix after baking is 2.0 to 9.0 μm in the width direction of the black matrix. The method of producing a color filter according to the first aspect of the invention, wherein the photosensitive concentrated composition layer formed on the substrate has a thickness of 0.2 μm to 2.2 μm. 3. The method of manufacturing a color filter according to claim 1, wherein the development of the black matrix forming process has a development temperature of 2 (TC 〜 30 〇 C. 4. Patent Application No. 1 The method of manufacturing a color filter, wherein the black matrix forming process is formed after the photosensitive concentrated composition layer is formed, and further comprises pre-baking before the exposure process. The method for manufacturing a color filter according to claim 4, wherein the prebaking temperature in the prebaking process is 60 ° C to 14 ° C ° 6. The color of the fourth item in the patent application scope The method for manufacturing a filter, wherein the prebaking time in the prebaking process is from 30 seconds to 300 seconds. 7. The method of manufacturing a color filter according to claim 1, wherein the photosensitive film The layer thickness of the coloring composition layer is from 1 to 8 μm. 8. The method of manufacturing a color filter according to claim 1, wherein the exposure in the coloring pattern forming process is performed through the mask pattern. Exposure, and exposure pattern with black matrix S The length of the color matrix in the width direction of the black matrix is from 2.0 μm to 9.0 μm. 9. The method of manufacturing the color filter of claim 8, wherein the image is formed in the coloring pattern forming process, and the developing temperature is 20 ° C to 35 ° C, and the development time is 20 seconds to 120 seconds. 10. The method of manufacturing the color filter of claim 8 wherein the overlapping portion is in the width direction of the black matrix The imaging temperature is from 21 ° C to 30 ° C, and the development temperature is from 21 ° C to 30 ° C, and the development time is from 25 to 80 sec. 11. The method for manufacturing a color filter according to claim 8 of the patent application, _ + The length of the overlap portion in the width direction of the black matrix is 2.0 μm ^ 7.0 μm, the development temperature is 22 ° C to 26 ° C, and the development time is 35 seconds to 75 seconds. - 200937050 12. A color filter, which is manufactured by a method for manufacturing a color filter according to any one of claims 1 to 11, wherein has a black matrix and a colored pattern. Overlapping overlap 'and the length of the overlap in the width direction of the black matrix The color filter of claim 12, wherein the color filter has a portion of the surface of the coloring pattern that is farthest from the surface of the substrate and a portion other than the overlapping portion. The distance between the substrate and the normal direction of the substrate is 0.50 μm or less. 14. A liquid crystal display device comprising the color filter of claim 12, wherein the liquid crystal display device is provided with an application. Color filter of the 13th patent range. -85 --85 -