TW200933779A - Stocker with purge condition sensing - Google Patents
Stocker with purge condition sensing Download PDFInfo
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- TW200933779A TW200933779A TW97130976A TW97130976A TW200933779A TW 200933779 A TW200933779 A TW 200933779A TW 97130976 A TW97130976 A TW 97130976A TW 97130976 A TW97130976 A TW 97130976A TW 200933779 A TW200933779 A TW 200933779A
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67242—Apparatus for monitoring, sorting or marking
- H01L21/67253—Process monitoring, e.g. flow or thickness monitoring
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
- G03F1/66—Containers specially adapted for masks, mask blanks or pellicles; Preparation thereof
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67017—Apparatus for fluid treatment
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/673—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere using specially adapted carriers or holders; Fixing the workpieces on such carriers or holders
- H01L21/6735—Closed carriers
- H01L21/67353—Closed carriers specially adapted for a single substrate
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/673—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere using specially adapted carriers or holders; Fixing the workpieces on such carriers or holders
- H01L21/6735—Closed carriers
- H01L21/67359—Closed carriers specially adapted for containing masks, reticles or pellicles
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/673—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere using specially adapted carriers or holders; Fixing the workpieces on such carriers or holders
- H01L21/6735—Closed carriers
- H01L21/67389—Closed carriers characterised by atmosphere control
- H01L21/67393—Closed carriers characterised by atmosphere control characterised by the presence of atmosphere modifying elements inside or attached to the closed carrierl
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/677—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations
- H01L21/67763—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations the wafers being stored in a carrier, involving loading and unloading
- H01L21/67769—Storage means
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- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
- Preparing Plates And Mask In Photomechanical Process (AREA)
Abstract
Description
200933779 九、發明說明: 【發明所屬之技術領域】 本發明係關於提供一種用以保護基板之方法、系統及組件,更 具體而言,本發明係關於用以提供清潔並及確認清潔晶圓及光罩 之方法、系統及組件。 【先前技術】 微粒及氣載分子污染物(airborne m〇lecular contaminant; AMC ) 會於半導體製造場所中造成相當大之問題。該等污染物可導致例 ❹ 如霧霾等光罩(recticle)缺陷°通常’於儲存及運輸期間使用光 罩傳送盒來保護光罩免受該等污染物之影響。但是,該等污染物 在光罩傳送盒中之積聚很常見’此可降低總體之光罩品質。由於 · 存在此種污染物積聚,當使用半導體工具自光罩傳送盒移出光罩 以進行使用時,泠染物便有機會進入光罩傳送盒中。霧霾亦係一 與晶圓加工相關之問題° 本文所述基板係指光罩及半導體晶圓。使一光罩傳送盒内之污 染物最少化之一典塑方法涉及遇期性清潔。週期性清潔之一缺點 ® 係有可能降低製造效率° 已知可用氮氣清潔晶圓及光罩。用氮氣清潔可清除光罩容器中 之污染物,卻因需容納及控制氮氣而帶來各種問題。儘管氮氣並 不被視為有毒,俱氮氣富集環境中氧氣減少,可導致窒息。因此, 氮氣洩漏入有人之空間係不可接受的°氮氣富集僅能用精密之感 測設備偵測到。純的潔淨氣*氣並不低廉。傳統之氮氣清潔仍可發 生霧霾。 6 200933779 因此,仍極其需要於儲存及運輸期間經濟而安全地保護光罩及 晶圓免受污染物影響及防止出現霧霾。涉及到清潔之解決方案需 要確認適當性並於原位進行清潔。被稱為儲存櫃(stocker)之基 板儲存系統可具有用於大量基板容器之許多狹槽,且當涉及到清 潔時,將期望能夠監測或確認清潔系統之功能及適當性。此種監 測及確認理想地係於基板容器嵌置位置之分立狹槽處進行。 【發明内容】 ^ 本發明提供一種用以保護基板(例如光罩及晶圓)且具體而言 〇 用以使儲存及使用期間基板上之霧霾形成最小化之方法、系統及 組件,其包含一處於具連續清潔能力之載具中之基板儲存櫃以及 - 一感測系統,該感測系統用以分別確認每一基板傳送盒容置區域 • 中之清潔功能。藉由於光罩上實質且持續地保持較佳以具有減低 之濕度水準之額外乾燥潔淨空氣進行清潔或藉由在不進行清潔時 於一容器中靠近一吸附劑或乾燥媒體暫時儲存該光罩,可消除、 最小化或充分地控制霧霾形成。此外,該容器中之一過濾媒體可 〇 放置成在實質持續地清潔該光罩期間被「重新補充」,在當前不清 潔該容器時可輕易地在該光罩容器中保持一減低之所期望濕度水 準。儘管本文之實施例係具體地提及光罩及光罩傳送盒,然而該 等發明概念亦適用於晶圓及晶圓容器或傳送盒。 本發明包含光罩儲存器,其包含一具有複數所儲存之光罩或複 數光罩儲存容座之儲存外殼,該等容座係用以容置光罩傳送盒, 例如光罩標準機械介面(SMIF)傳送盒。該儲存外殼可包含一檢 驗區域或複數搁架,各該搁架包含複數用於光罩傳送盒之光罩儲 7 200933779 存容座。該儲存外殼可係為一光罩儲存櫃、庫或工具,用以將光 罩自例如光罩標準機械介面(SMIF)傳送盒等光罩運輸容器轉移 至一工具庫待用。該儲存外殼亦可係為或包含一淨化室、檢驗區 域或其組合。在一實施例中,該清潔系統包含複數清潔管線,各 清潔管線連接至各該光罩儲存容座之一擱架之出口。該出口朝上 分配空氣,以使得當一光罩傳送盒安放於該容座中之定位上時, 該出口之連接使清潔流體流入光罩傳送盒内。當一光罩傳送盒尚 未處於定位時,該清潔流體仍可於一清潔流中朝上排放至儲存外 ◎ 殼之環境中。 一包含一握爪之自動化機械傳遞機構可於每一握爪上具有一空 氣流感測器,以偵測並確認各該容座處之清潔流體流。於一較佳 - 實施例中,該握爪具有一 U形部及一延伸部,其中一空氣流感測 ’ 器位於該延伸部上。該延伸部之位置使得當一光罩傳送盒朝容座 上之一安放位置運動時,感測器運動經過該清潔流體流並偵測及 確認該清潔流體流。200933779 IX. Description of the Invention: [Technical Field] The present invention relates to a method, system and assembly for protecting a substrate, and more particularly to providing cleaning and confirming cleaning of a wafer and Photomask methods, systems and components. [Prior Art] Particles and airborne molecular contaminants (AMC) can cause considerable problems in semiconductor manufacturing sites. Such contaminants can cause defects such as smog recticles. Typically, a reticle transfer case is used during storage and transportation to protect the reticle from such contaminants. However, the accumulation of such contaminants in the reticle transfer box is common. This reduces the overall reticle quality. Because of the accumulation of such contaminants, when a semiconductor tool is used to remove the reticle from the reticle transfer case for use, the smear has an opportunity to enter the reticle transfer case. The smog is also a problem related to wafer processing. The substrate described herein refers to a reticle and a semiconductor wafer. Minimizing the contamination in a reticle transfer box involves a process of cleaning. One of the disadvantages of periodic cleaning is that it is possible to reduce manufacturing efficiency. It is known that nitrogen and wafers can be cleaned with nitrogen. Cleaning with nitrogen removes contaminants from the reticle container, but causes problems due to the need to contain and control nitrogen. Although nitrogen is not considered toxic, the reduction of oxygen in the nitrogen-enriched environment can lead to suffocation. Therefore, the leakage of nitrogen into the human space is unacceptable. Nitrogen enrichment can only be detected with sophisticated sensing equipment. Pure clean air is not cheap. Traditional nitrogen cleaning can still cause haze. 6 200933779 Therefore, there is still a great need to economically and safely protect reticle and wafer from contaminants and to prevent smog during storage and transportation. Solutions involving cleaning require proper identification and cleaning in situ. A substrate storage system, referred to as a stocker, can have many slots for a large number of substrate containers, and when it comes to cleaning, it would be desirable to be able to monitor or confirm the functionality and suitability of the cleaning system. Such monitoring and validation is desirably performed at discrete slots in the substrate container placement location. SUMMARY OF THE INVENTION The present invention provides a method, system, and assembly for protecting substrates (e.g., reticle and wafer) and, in particular, for minimizing smog formation on substrates during storage and use, including A substrate storage cabinet in a continuous cleaning capability and a sensing system for separately confirming the cleaning function in each of the substrate transfer cassette accommodation areas. Cleaning the reticle by temporarily and continuously maintaining additional dry clean air preferably with a reduced humidity level or by temporarily storing the reticle in a container adjacent to a sorbent or drying medium without cleaning. The haze formation can be eliminated, minimized or adequately controlled. In addition, one of the filter media in the container can be placed to be "replenished" during substantially continuous cleaning of the reticle, which can be easily maintained in the reticle container when the container is not currently cleaned. Humidity level. Although the embodiments herein specifically refer to reticle and reticle transfer cartridges, the inventive concepts are also applicable to wafer and wafer containers or transport boxes. The present invention comprises a reticle reservoir comprising a storage housing having a plurality of stored reticle or a plurality of reticle storage receptacles for receiving a reticle transfer box, such as a reticle standard mechanical interface ( SMIF) transfer box. The storage enclosure may include a test area or a plurality of shelves, each of the shelves containing a plurality of reticle reservoirs for the reticle transfer box. The storage enclosure can be a reticle storage cabinet, library or tool for transferring the reticle from a reticle transport container, such as a reticle standard mechanical interface (SMIF) transport cassette, to a tool library for use. The storage enclosure may also be or include a clean room, inspection area, or a combination thereof. In one embodiment, the cleaning system includes a plurality of cleaning lines, each cleaning line being coupled to an outlet of one of the reticle storage receptacles. The outlet distributes air upwardly such that when a reticle transfer box is placed in the receptacle, the connection of the outlet causes cleaning fluid to flow into the reticle transfer case. When a reticle transfer box is not yet positioned, the cleaning fluid can still be discharged upwards in a clean stream to the environment in which the outer casing is stored. An automated mechanical transmission mechanism including a gripper can have an air flu detector on each grip to detect and confirm the flow of cleaning fluid at each of the receptacles. In a preferred embodiment, the grip has a U-shaped portion and an extension, wherein an air flu detector is located on the extension. The extension is positioned such that when a reticle transfer box is moved toward one of the seating positions of the receptacle, the sensor moves through the flow of cleaning fluid and detects and confirms the flow of cleaning fluid.
本發明之一較佳實施例可於每一光罩容座或光罩容器(例如一 Q 光罩SMIF傳送盒)之入口使用一擴散器,該擴散器使自相關聯清 潔管線進入各該傳送盒之氣體之分佈更為均勻。該擴散器可安裝 於該容座或容器之入口或注入孔處或安裝於使氣體流入傳送盒之 清潔管線出口處。該光罩傳送盒之排氣較佳經由一通至該儲存外 殼之環境中之過濾器進行。該機械傳遞機構可具有一具恰當位置 之空氣流感測器,以週期性地感測及確認來自光罩傳送盒之排氣。 本發明之系統亦可包含連接至該清潔系統之一清潔氣體源,其 8 200933779 包含一潔淨乾燥空氣(clean dry air ; CDA )、特佳的CDA或例如 氮氣等乾燥惰性氣體之氣體源。本發明之一較佳實施例使用特佳 的 CDA。 在一實施例中,本發明系統之每一儲存容座可係用以容置一光 罩傳送盒,例如容器或載具。該光罩傳送盒包含一入口來連接該 清潔系統之清潔管線至少其令之一。本發明系統之實例性光罩傳 送盒可係基於標準機械介面(standard mechanical interface; SMIF) ©載具,例如概括地闡述於主張優先於美國申請案第60/668,189號 之一美國申請案中者,該美國申請案係於2005年4月4日提出申 請並且名稱為「於光罩SMIF傳送盒中之環境控制 (ENVIRONMENTAL CONTROL IN A RETICLE SMIF POD)」(現 為美國專利第7,400,383號’該申請案之内容(包括美國申請案第 60/668,189號在内)特此以引用方式倂入本文中。此外,一光罩傳 送盒可包括一包含石英材料之習知光罩。較佳地,本發明系統之 光罩傳送盒包含一過濾部件。舉例而言,該過濾部件可包含微粒 〇 或吸附性媒體及其組合,用以在儲存及運輸期間保護該光罩免受 污染物影響。 本發明祕之清潔氣體㈣可包含在各光罩傳送盒或其他光罩 儲存系統巾保持小於針億分之1G (1G响)之水濃度之氣體。 错倾供_實質上不含水之儲存環境,可實質降低或消除水進入 具有^光罩之卫具中之風險。並且,—實f上不含水之環境可降 民二木物或微粒洛於或形成於該光罩上、尤其是其石英材料上之 可此性。因此’可降低於工具之光學系統中或於至少一光罩表面 9 200933779 上形成霧霾之速率。霧霾通常可自硫酸銨形成,此可於存在硫酸、 氨水及水時發生。因此,藉由去除該光罩環境中之水,可實質降 低或消除該光罩表面上硫酸銨之形成。 本發明之系統亦可包含一半導體工具光罩儲存室。舉例而言, 該光罩儲存室可與例如微影工具等習知半導體工具相關聯。在一 實施例中,該光罩儲存室可連接至一室清潔管線。本發明亦提供 一種清潔光罩儲存器之方法,其可係持續的。較佳地,該方法包 含:經由至少一清潔管線向本發明系統之儲存外殼之光罩儲存容 座提供包含CDA或較佳地包含特佳的CDA之氣體。本發明亦包 含用於清潔光罩儲存櫃、晶圓容器儲存櫃、庫、工具、淨化室及 檢驗區域之系統及方法。另外,本發明之一方法可包含向由一光 罩儲存容座所容置之光罩傳送盒引入氣體。一方法亦可包含使設 置於該光罩傳送盒中之一光罩與包含CDA或特佳的CDA之氣體 接觸。 另外,本發明之系統可包含與該清潔系統相關聯之一離化器。 舉例而言,該離化器可與該清潔系統之複數清潔管線至少其中之 一相關聯。 【實施方式】 本發明提供一種用以清潔光罩儲存器之系統,包含具有複數容 器容置區域之一儲存外殼,該等容器容置區域被配置成儲存容座 形式。該儲存外殼可包含複數分別包含複數光罩儲存容座之搁 架。該系統亦包含與該儲存外殼相關聯之一清潔系統。在一實施 例中,該清潔系統包含複數清潔管線,各清潔管線連接至該等儲 200933779 存谷座其中之—。另外,本發明之系統可包含與該清潔系統相關 聯之-離化器。舉例而言,該離化器可與該清潔系統之複數清潔 g線至/其中之一相關聯。本發明之系統亦可包含連接至該清潔 系、’先並且包含一 CDA或特佳的A源之一清潔氣體源。係 定義為具有小於2 (百萬分率)之水濃度之空氣。特佳的CDA 在本文中係定義為具有小於!响(十億分率)之水遭度之氣體。A preferred embodiment of the present invention can use a diffuser at the entrance of each reticle receptacle or reticle container (e.g., a Q-mask SMIF transfer cartridge) that allows the associated cleaning line to enter each of the transfers The gas distribution of the box is more uniform. The diffuser can be mounted at the inlet or injection port of the receptacle or container or at the outlet of the cleaning line that allows gas to flow into the transfer box. The venting of the reticle transfer box is preferably carried out via a filter that passes into the environment of the storage housing. The mechanical transmission mechanism can have an air flu detector in position to periodically sense and confirm exhaust from the reticle transfer box. The system of the present invention may also comprise a source of cleaning gas coupled to the cleaning system, 8 200933779 comprising a clean dry air (CDA), a particularly good CDA or a source of dry inert gas such as nitrogen. A preferred embodiment of the invention uses a particularly good CDA. In one embodiment, each storage receptacle of the system of the present invention can be used to house a reticle transfer case, such as a container or carrier. The reticle transfer case includes an inlet to connect at least one of the cleaning lines of the cleaning system. An exemplary reticle transfer cartridge of the system of the present invention can be based on a standard mechanical interface (SMIF) © vehicle, for example, as generally described in the U.S. Application No. 60/668,189, the disclosure of which is incorporated herein by reference. The U.S. application was filed on April 4, 2005 and entitled "Environmental Control IN A RETICLE SMIF POD" (now U.S. Patent No. 7,400,383) The contents of the present invention, including U.S. Application Serial No. 60/668,189, the disclosure of which is incorporated herein by reference in its entirety in its entirety in its entirety in its entirety in its entirety in the the the the the the the The reticle transfer case includes a filter member. For example, the filter member can comprise particulate mash or adsorptive media and combinations thereof for protecting the reticle from contaminants during storage and transportation. The gas (4) may be included in each reticle transfer box or other reticle storage system towel to maintain a water concentration less than 1G (1G ring) of water. The storage environment without water can substantially reduce or eliminate the risk of water entering the sanitary ware with the reticle. Moreover, the environment without water in the real f can be reduced or formed in the light. This can be achieved on the cover, especially on its quartz material. Therefore, it can be reduced in the optical system of the tool or on the at least one reticle surface 9 200933779. The smog can usually be formed from ammonium sulphate. This can occur in the presence of sulfuric acid, aqueous ammonia, and water. Thus, by removing water from the reticle environment, the formation of ammonium sulphate on the surface of the reticle can be substantially reduced or eliminated. The system of the present invention can also include a semiconductor tool light. A hood storage chamber. For example, the reticle storage chamber can be associated with conventional semiconductor tools such as lithography tools. In one embodiment, the reticle storage chamber can be coupled to a chamber cleaning line. The invention also provides A method of cleaning a reticle reservoir, which may be continuous. Preferably, the method includes providing a blister storage receptacle of a storage enclosure of the system of the present invention with at least one cleaning line comprising CDA or Preferably, the invention comprises a gas of a particularly good CDA. The invention also includes systems and methods for cleaning a reticle storage cabinet, a wafer container storage cabinet, a library, a tool, a clean room, and an inspection area. The method includes introducing a gas into the reticle transfer case housed by a reticle storage receptacle. A method can also include contacting a reticle disposed in the reticle transfer case with a gas containing a CDA or a particularly good CDA. Additionally, the system of the present invention can include an ionizer associated with the cleaning system. For example, the ionizer can be associated with at least one of a plurality of cleaning lines of the cleaning system. A system for cleaning a reticle reservoir is provided, comprising a storage housing having a plurality of container receiving regions configured to store a receptacle. The storage enclosure can include a plurality of shelves each containing a plurality of reticle storage receptacles. The system also includes a cleaning system associated with the storage enclosure. In one embodiment, the cleaning system includes a plurality of cleaning lines, each of which is connected to the storage tanks of the 200933779. Additionally, the system of the present invention can include an ionizer associated with the cleaning system. For example, the ionizer can be associated with one of the plurality of cleaning glines of the cleaning system. The system of the present invention may also comprise a source of cleaning gas coupled to the cleaning system, 'first and comprising a CDA or a particularly good source of A. It is defined as air with a water concentration of less than 2 (parts per million). A particularly good CDA is defined in this article as having less than! The gas that is ringing (billions of points) is used.
第1a及第lb圖係為本發明系統之一實例性光罩傳送盒之示意 圖如圖所不’ 一光罩傳送盒2可裝備有一化學過濾系統或吸濕 劑。該光罩傳送盒通常包含—門或基座部4,其與—載具殼或蓋6 配口形成氣密性密封之空間8,以提供—受控環境。在該密封環 i兄内三可儲存並轉移_光罩9。舉例而言,光罩9可包含易於被微 粒及孤相化H物損壞之石英减、光料或基板。此一光罩 傳送盒更^細地揭示於以引用方式併人本文中之美时請案第 11/396,949 L相案第鳩/祕川號中。 較佳地,第1a及第1b圖之Η部4可包含相對的―門上表面1〇 及門下表面U,二者由—橫向壁12隔開。在第ia及第lb圖中, 複數光罩支揮件14、# g也丨^〜 尤罩側面定位部件16及背面定位部件18毗 鄰過遽器22上方該門志 上表面之一上部周緣並且大體環繞該門上表 面之一中央部2〇向外 _ L伸並且以間隔開之關係設置。該等光罩支 撐件可係用於㈣上表面—預定高度保持該光罩。該等光罩 侧面定位部件及背面定位部件可用㈣導對該光罩之手動定位, 以確保該光罩於其支樘 久保件上之正確橫向及後向放置。 在一實施例中,第. 圖之過濾器22可具有多種構造,各該構造 11 200933779 提供一可透過流體的高效低壓降吸附性複合過濾器,例如由美國 專利第 7,014,693 號、第 6,761,753 號、第 6,610,128 號及第 6,447,584 號所概括闞述者,該等專利案之内容特此以引用方式併入本文 中。舉例而言,該過濾器之吸附性媒體可包含但不限於化學吸附 性或物理吸附性媒體及其組合。用於該過濾器之其他媒體可包 含’舉例而言’尚效微粒空氣(high efficiency particulate air; HEPA) 或超低穿透率空氣(ultra low penetration air ; ULPA )過遽媒體, 該等媒體亦可組合使用或與吸附性媒體一起使用。較佳地,本發1a and 1b are schematic illustrations of an exemplary reticle transfer case of the system of the present invention. A reticle transfer case 2 can be equipped with a chemical filtration system or a moisture absorbent. The reticle transfer case typically includes a door or base portion 4 that mates with the carrier housing or cover 6 to form a hermetically sealed space 8 to provide a controlled environment. In the seal ring, the three can store and transfer the reticle 9. For example, the reticle 9 may comprise a quartz subtractive, glazing or substrate that is susceptible to damage by the granules and the solitized H species. This reticle transfer box is more closely disclosed in the reference to the article No. 11/396,949 L. Preferably, the crotch portion 4 of Figures 1a and 1b may comprise opposing "door upper surface 1" and a lower door surface U separated by a transverse wall 12. In the ia and lb diagrams, the plurality of reticle support members 14, #g 丨 〜 尤 侧面 侧 侧 侧 侧 侧 侧 侧 侧 侧 侧 侧 侧 侧 侧 侧 侧 侧 侧 侧 侧 侧 侧 侧 侧 侧 侧 侧 侧 侧 侧A central portion 2 that generally surrounds the upper surface of the door extends outwardly and is disposed in a spaced apart relationship. The reticle supports can be used for (4) the upper surface - maintaining the reticle at a predetermined height. The reticle side locating members and the back locating members can be used to manually position the reticle to ensure proper lateral and rearward placement of the reticle on its support. In one embodiment, the filter 22 of the first embodiment can have a variety of configurations, each of which provides a fluid permeable, low pressure drop absorbent composite filter, such as U.S. Patent No. 7,014,693, No. 6,761,753. No. 6,610,128 and 6, 447, 584, the contents of each of which are hereby incorporated by reference. For example, the adsorbent media of the filter can include, but is not limited to, chemisorbent or physically adsorptive media and combinations thereof. Other media used in the filter may include 'for example' high efficiency particulate air (HEPA) or ultra low penetration air (ULPA) media, such media Can be used in combination or with adsorptive media. Preferably, the present hair
明系統之一光罩傳送盒可包含一被動式純化器或乾燥部件。實炉 性被動式純化器或乾燥部件可降低污染物可能接觸光罩之程度。A reticle transfer cartridge of the present invention can include a passive purifier or drying unit. A solid-state passive purifier or drying unit reduces the extent to which contaminants may come into contact with the reticle.
第1圖中光罩傳送盒2之氣密性密封空間8内之濕氣濃度較哲 保持在接近幾個ppb之濃度水準。本發明-較佳實施例之系統/力 能將該光罩傳送盒内之濕度水準保持或控制至小於約H)PPb之才 濃度在實施例中,第1圖之光罩傳送盒可與本發明之系統和 關聯以達成此等濕度水準^本發明—較佳實施例之系統提供自 含CDA或更佳地包含特佳的cda之週期性或持續性清潔。本袭 月預期/月潔乳體可係為惰性氣體,例如乾燥之氯氣或乳氣。 本發月之H村藉由注人或人口孔24與光罩傳送盒2相關聯, 或孔24可連接到至少―清潔管線。人口孔μ <裝西己肩 一擴散元件25,其可使該清潔氣體在各傳送盒内更均勻地流動。 元料具有1-3微米(叫)之孔徑之多孔材料 末而製成。料孔^鎳或獨鋼等金屬,藉由燒結該金廣之彩 可允許直徑小於3奈米(nm)之粒子通過, 12 200933779 更大之粒子不能通過。該擴散器亦可位於該清潔氡體 盒之每-清潔管線出口處或用以對任何光罩儲存外殼人該傳送 檢驗工具或用於使光罩自運輸傳送盒轉移至庫之工具光罩庫、 儲存或使用之工具之清潔。 /、s彼等用於 過濾器22亦可包含一如下文所更詳細闡釋之抽取部 情況下,孔5.0及5.丨二者構成入口孔。 。在此一 m 在-實施例中’第la及第lb圖中之門部4之上周 使入口 5.0及純孔5」沿大體平行於其橫向壁12之攝造成 :面與下:面間貫穿其延一口及抽取孔亦可用以同= 入口接頭26及-抽取器接頭本發明亦涵蓋用於 及孔之其他連接構件。舉例^ 、-等接頭 伐偁仟舉例而s,該入口接頭能可拆卸地耦合至 =發明系統之-清潔管線。而且,該抽取器接頭亦能可拆卸地輕 °至一清潔氣移除管線,該清潔《时線可與-清潔氣體排空 ^相關聯。該人σ及抽取器接頭亦可裝财止關,用以容許 一單向氣流。當本發明之系統*在清潔該光罩傳送料,止回間 會阻止污染物進人絲職密性密封之8。 此外,具有狹縫之隔膜閥,例如由其内容特此以引用方式併入 本文中之吳國專利第5,482,101號所概括閣述之隔膜間,亦可與該 止回閥相結合或不與該止回閥相結合地用於該等人口及抽取器: 頭。隔膜閥及止回閥亦可限制過遽器22及其媒體暴露至光罩傳送 盒2外部之周圍條件。本發明亦涵蓋,制—本發明系統於麼力 下將包3 CDA、特佳的CDA、氮氣或其他惰性氣體之清潔氣體注 入氣密性密封之空間8中可使得至少一部分清潔氣體經由該過濾 13 200933779 器流出並排出該光罩值 由耗合至該氣趙入口广。在一實施例中’該抽取器接頭亦可 等入口接頭流人心罩值^接頭替代。因此,清潔氣體經由此 清潔氣龍後經由過送盒可使該氣密性密封之空間加壓。該 通常,對第1圖所亍^排出該氣密性密封之空間。 軋密性密封之空間8進行清潔可藉由在氣 流中帶走痕量污染物 巧染物去除。在一實施例中,藉由本發 明之系統進行清潔可蔣 移走並去除微粒及其他污染物,例如與該過 ❹ / 冑吸附性媒體相關聯之微粒及t他污染物。用CDA 或特佳的CDA進行、、主、知 〃 組 μ潔亦可保持並控制光罩傳送盒2内之濕度水 準。舉例而言,本路BB * < 月之系統可去除過濾器22之濕氣。此外,本 發明系統之—清潔管線可與絲㈣送幻目_,讀潔污染物 =在該光罩傳送盒内保持小於約1〇 _之水濃度。舉例而言,該 、、可連接至該光罩傳送盒之—或多個儲存容座。該清潔管 線亦可係為本發明系統之-清料'統的-部分。 一實施例中’該清潔管線亦可與一習知離化器相關聯。舉例 ❹ 而I來自包含CDA或特佳的CDA之氣源之清潔氣體進入該清 潔管線並穿過與之㈣聯之—離化器m氣體然後自該清潔 讀排出並且可被狀—光罩賴n存容座中。或者,該離 化益可與本發明系統之—清潔系統相關聯。經過此等離化器之清 潔氣體流速可係為約15立方英尺/分鐘(cfm),但本發明亦涵蓋 可根據例如該光罩傳送盒中之減水準等參數加以調節之其他適 宜流速。 本發明***之一離化器之歧管壓力可係自約0至70磅/平方英吋 14 200933779 ❹ 參 (PSI)。在一實施例中,該離化器可包含與一或多個清潔管線相 關聯之超潔淨 TEFLON (Ε· 1. du Pont de Nemours and Company, 1007 Market Street,Wilmington, Delaware 19898 )管作為一直列式 裝置。實例性管之直徑可係自約6至10毫米(mm )。本發明系統 之一離化器亦可與複數清潔管線相關聯。較佳地,一離化器可採 用穩態直流電子發射。本發明亦涵蓋使用由位於加州柏克萊 (Berkeley, California )之Ion Systems公司銷售之直列式離化器 在一實施例中’本發明系統之一光軍傳送盒可包含一傳送人某 座部及一傳送盒殼部,其配合形成一受控環境。該傳送^義皿: 可包含構造成位於該受控環境内部之一第一表面。^ 〇Ρ 成匕夕卜,_第- 表面可構造成位於該受控環境之外部。該光罩傳详人 — 疋i亦可包含由 該第一及第二表面環繞並且於該第一及第二表面間界定枝 徑之中央孔。較佳地,該光罩傳送盒可包含安裝於 私机路 、〜第一表面上 之複數光罩支撐件及導軌,以於其上面支撐一朵¥ ^ 元罩。舉例而言, 該等光罩支撐件及導軌可界定一光罩容置區域,对止明 ^先罩容置區域 具有實質上與該光罩之一圖案化表面共同伸展之一办 合罝表面。 此外,該光罩傳送盒可包含具有一開口端及多孔之底端 。 器框。一橫向壁可連接該開口端至該多孔之底端,以於其 °、 —縱向氣流通道。該過濾器框可緊密容置於一中^ 甲央孔内並與_The moisture concentration in the hermetic sealed space 8 of the reticle transfer case 2 in Fig. 1 is maintained at a concentration level close to several ppb. The system/force of the preferred embodiment of the present invention maintains or controls the humidity level in the reticle transfer case to a concentration less than about H) PPb. In the embodiment, the reticle transfer case of FIG. 1 can be used with Systems and Associations of the Invention to Achieve Such Humidity Levels The system of the present invention - the preferred embodiment provides periodic or continuous cleaning of a self-contained CDA or, more preferably, a particularly good cda. This month's expected/monthly cleansing body can be an inert gas such as dry chlorine or milk. The H-mura of this month is associated with the reticle transfer box 2 by the injection or population aperture 24, or the aperture 24 can be connected to at least the "cleaning line." The population hole μ <<>> has a diffusing element 25 which allows the cleaning gas to flow more evenly within each of the transport boxes. The material is made of a porous material having a pore diameter of 1-3 μm. A metal such as nickel or a single steel can allow particles having a diameter of less than 3 nanometers (nm) to pass through by sintering the gold color. 12 200933779 Larger particles cannot pass. The diffuser may also be located at each of the cleaning line outlets of the cleaning cartridge or for transferring any inspection tool to the reticle housing or a tool mask library for transferring the reticle from the shipping container to the library Cleaning of tools stored or used. /, s, etc. for the filter 22 may also comprise an extraction section as explained in more detail below, with the apertures 5.0 and 5. 构成 forming the inlet aperture. . In this embodiment, in the embodiment, the entrances 5.0 and the pure holes 5 are circumferentially parallel to the lateral wall 12 of the door portion 4 in the first and second lb diagrams: face to face: face to face: The extension and the extraction opening may also be used for the same as the inlet joint 26 and the extractor joint. The present invention also covers other connecting members for the bore. For example, ^, -, etc., for example, s, the inlet joint can be detachably coupled to the cleaning line of the invention system. Moreover, the extractor joint can also be detachably lightened to a cleaning gas removal line, which can be associated with - cleaning gas evacuation ^. The person σ and the extractor connector can also be used to allow a one-way airflow. When the system of the present invention* is cleaning the reticle transfer material, the check will prevent contaminants from entering the wire seal 8 . In addition, a diaphragm valve having a slit, for example, may be combined with the check valve or may be associated with the diaphragm as described in the U.S. Patent No. 5,482,101, the disclosure of which is incorporated herein by reference. The check valve is used in combination with the population and extractor: head. The diaphragm valve and the check valve may also limit the conditions in which the filter 22 and its medium are exposed to the outside of the reticle transfer box 2. The present invention also contemplates that the system of the present invention injects a cleaning gas of a package of CDA, a particularly good CDA, nitrogen or other inert gas into the hermetically sealed space 8 such that at least a portion of the cleaning gas is passed through the filtration. 13 200933779 The device exits and discharges the mask value from the consumption to the entrance of the gas. In one embodiment, the extractor connector can be replaced by an inlet connector flow cap value. Therefore, the cleaning gas can pressurize the space of the hermetic seal via the delivery box after the cleaning gas is cleaned. Generally, the space of the hermetic seal is discharged from the first figure. The cleaning of the tight-sealing space 8 can be removed by removing trace contaminants from the gas stream. In one embodiment, cleaning by the system of the present invention removes and removes particulates and other contaminants, such as particulates and contaminants associated with the ❹/胄 absorbing media. The CDA or the excellent CDA can be used to maintain and control the humidity level in the reticle transfer box 2. For example, the BB* < month system can remove moisture from the filter 22. In addition, the cleaning line of the system of the present invention can be supplied with the wire (4), and the cleaning contaminant = maintains a water concentration of less than about 1 〇 in the reticle transfer case. For example, the , can be connected to the reticle transfer box - or a plurality of storage receptacles. The cleaning line can also be part of the system of the present invention. In one embodiment, the cleaning line can also be associated with a conventional ionizer. For example, a cleaning gas from a gas source containing a CDA or a particularly good CDA enters the cleaning line and passes through the (iv)-ionizer m gas and then is discharged from the cleaning reading and can be shaped like a mask. n in the storage seat. Alternatively, the separation benefit can be associated with a cleaning system of the system of the present invention. The purge gas flow rate through the isolators can be about 15 cubic feet per minute (cfm), but the invention also encompasses other suitable flow rates that can be adjusted based on, for example, the level of depreciation in the reticle transfer box. The manifold pressure of the ionizer of one of the systems of the present invention can range from about 0 to 70 pounds per square inch 14 200933779 ❹ ginseng (PSI). In one embodiment, the ionizer may comprise an ultra-clean TEFLON (Ε· 1. du Pont de Nemours and Company, 1007 Market Street, Wilmington, Delaware 19898) tube associated with one or more cleaning lines as a continuous column Device. The diameter of the exemplary tube can be from about 6 to 10 millimeters (mm). One of the systems of the present invention can also be associated with a plurality of cleaning lines. Preferably, an ionizer can employ steady state DC electron emission. The present invention also contemplates the use of an in-line ionizer sold by Ion Systems, Inc. of Berkeley, Calif., in one embodiment. 'One of the systems of the present invention can include a carrier. And a transfer case portion that cooperates to form a controlled environment. The transport container: can include a first surface configured to be located within the controlled environment. ^ 〇Ρ 〇Ρ , , _ _ _ 表面 表面 _ _ 表面 表面 表面 表面 表面 表面 表面 表面 表面 表面The reticle detailer - 疋i may also include a central aperture surrounded by the first and second surfaces and defining a path between the first and second surfaces. Preferably, the reticle transfer case may include a plurality of reticle support members and guide rails mounted on the private machine path, the first surface, to support a RM cover thereon. For example, the reticle support and the guide rail may define a reticle receiving area, and the occlusion cover area has a surface that is substantially coextensive with one of the patterned surfaces of the reticle. . Further, the reticle transfer case may include an open end and a porous bottom end. Box. A transverse wall can connect the open end to the bottom end of the hole for its longitudinal flow passage. The filter frame can be tightly placed in a central hole and with _
罩傳送盒氣密喷合。在一實施例中,該開口端可位I 丨尔*近一第一表 面。該多孔底端亦可自該第一表面凹陷。較佳地,社、 琢光罩傳送盒 包含一過濾器’該過濾器具有界定一過濾器形狀及過、慮器时 範圍。該過濾器可分層並與該開口端密封嚙合地設置於;品=之 15 200933779 道内,以使實質上所有進入或離開該過濾器之氣體皆經過該過濾 器區域。 用於但不限於本發明系統之光罩傳送盒、儲存櫃、庫、工具、 淨化室或檢驗區域之過濾器可包含一離子交換樹脂Q舉例而言, 可於本發明之系統中納入一包含至少一種離子交換樹脂之過濾 器,以於儲存及運輸期間保護光罩。或者,用於一本發明系統之 過濾器可不包含一離子交換樹脂。此等離子交換樹脂之特點可係 具有高於約300毫升/克之孔隙率。較佳地,該過濾器之離子交換 樹脂可係為具有約1.8毫當量/克之化學酸性元點濃度之陽離子交 換樹脂。舉例而言’ 一過濾器或其各層之一交換樹脂可包含約45 平方米/克之表面積。過濾器之實例性樹脂可以商品名 AMBERLYST (Rohm and Hass Company, 100 Independence Mall West,Philadelphia, Pennsylvania 19106)購得。 較佳地,光罩傳送盒之過濾器可製作成經相當之使用時間後耗 盡。舉例而言,本發明涵蓋使用需要一同維護或更換之各過濾層。 在一實施例中,包含一化學吸附性媒體之過濾層可製作成薄於具 有一物理吸附性媒體之層,此乃因物理吸附性媒體往往先於化學 吸附性媒體耗盡。採用在相當之使用時間後耗盡之各過濾層之過 濾器可藉由使任何潛在之故障時間相—致而降低運作成本。第2 圖係本發明系統之一光罩傳送盒之實例性過濾器及其各層之示意 圖。如圖所示,第一過濾層28及第二過濾層3〇可設置成彼此連 通。舉例而言,該第一過濾層可設置於第二過濾層3〇之—表面上。 該第一及第二過濾層亦可包含一覆蓋片。如圖所示,第二過濾層 200933779 30之特點係具有一覆蓋片32。覆蓋片32可係為一聚酯不織材料。 較佳地,該第一及第二過渡層包含一化學吸附性或物理吸附性材 料,用於去除例如揮發性含二氧化矽化合物等污染物。 在一實施例中,本發明系統之一光罩傳送盒、儲存櫃、庫、工 具、淨化室或檢驗區域包含具有一物理吸附性媒體之一第一過渡 層。一實例性物理吸附性媒體可包含活性碳。一物理吸附性媒體 之活性碳可未經處理或經處理並且粒化。一本發明系統之特點亦 係具有包含一化學吸附性媒體之一第二過滤層。舉例而言,一第 二過濾層之化學吸附性媒體可包含一陽離子交換樹脂。較佳地, 該陽離子交換樹脂包含一共聚物,例如具有至少一酸性官能基之 二乙烯基苯苯乙烯共聚物。 用於一過濾系統之一過濾層之實例性化學吸附性媒體係為一陽 離子交換樹脂,例如一化學上係酸性之共聚物。在一實施例中, 用於一過濾層之物理吸附性媒體可包含活性碳,其可未經處理或 經處理並粒化。物理吸附性媒體可形成藉由黏結劑材料而保持在 一起之塊。實例性物理吸附性媒體在化學上可係為酸並且自例如 煤等有機來源獲得。如圖所示,第3圖中之過濾器或過濾層34包 含一覆蓋片36。在一實施例中,該覆蓋片包含一聚酯不織材料。 較佳地,該過濾器包含一化學吸附性或物理吸附性媒體。此外, 一過濾器38包含一第一覆蓋片40及第二覆蓋片42。過濾器38 亦包含一設置於該第一覆蓋片上之一本體部44。 光罩傳送盒之過濾器之實例性覆蓋片可包含過濾性或非過濾性 不織材料,例如聚酯、聚醯胺、聚丙烯或其任意組合。舉例而言, 17 200933779 包含過濾性不織材料之覆蓋片可去除經其穿過之氣流中所含之微 粒。亦可使用一覆蓋片來保持蜂窩狀或褶皺式元件。另外,一覆 蓋片可保持給定的媒體,例如,舉例而言,活性碳或包含磺化二 乙烯基苯苯乙烯共聚物之珠粒。較佳地,一過濾器之覆蓋片可包 含化學惰性材料,例如,舉例而言,聚酯或聚丙烯。 舉例而言,本發明系統之一光罩傳送盒、儲存櫃、庫、工具、 淨化室或檢驗區域之過濾器可由任何適宜容器或框架保持。此等 容器或框架亦適用於使過濾層更換更容易。一過濾器或過濾層可 包含具有褶皺式元件之一過濾部件。褶皺式元件可增加過濾部件 表面積,從而可有助於去除經其穿過之氣流路徑中所含微粒或污 染物。第3圖係為本發明系統之一光罩傳送盒之實例性過濾器之 示意圖。在一實施例中,過慮層46包含一高表面積過渡部件。此 外,該過濾層可包含一化學吸附性或物理吸附性媒體及黏結劑型 材料。較佳地,包含一高表面積過渡部件之過渡層係包含設置於 例如一複合材料48上面之一媒體。亦可向該媒體引入該黏結劑型 材料,以有助於其黏結。 舉例而言,一光罩傳送盒之一第一或第二過滤層可採用一不織 複合材料,其包含至少一種可黏合至氣載污染物之陽離子交換樹 脂。包含一化學吸附性媒體之實例性第一或第二過濾層以及製作 此等過濾層之方法概括地闡述於美國專利第6,447,584號、第 6,740,147號、第6,610,128號及第6,761,753號中,該等專利之内 容特此以引用方式併入本文中。亦可藉由以下方式製作一過濾 層:將化學吸附性媒體乾施加至一不織複合或earner材料,然後 18 200933779 加熱並壓延之。 舉例而言,此一不織複合材料可係為聚酯。在一實施例中,該 化學吸附性媒體係為包含酸性官能基之多孔二乙稀基苯苯乙烯共 聚物。實例性酸性官能基包含磺酸及羧酸官能基。該化學吸附性 媒體之特點可係具有介於約50至400埃(A)之間之孔徑。此外, 該媒體之表面積可係為大於約20平方米/克。舉例而言,一苯苯乙 烯共聚物之酸性官能基之特點亦係具有一高於約1毫當量/克之酸 度水準。 在一實施例中,一第一或第二過渡層包含分佈於整個材料(例 如不織材料、纖維基質材料或聚酯材料等)中之化學吸附性媒體 粒子。較佳地,一過濾層之化學吸附性媒體粒子可包含一陽離子 交換樹脂。舉例而言,該等媒體粒子可係為化學酸性粒子。此等 媒體粒子之特點可係為具有自約0.3 mm至1.2 mm之實例性粒 徑。此外,一化學吸附性媒體粒子可例如具有分別係為約0.3毫升 /克及250 A之孔隙率及平均孔徑。 一光罩傳送盒過濾器之一第一或第二過濾層之化學吸附性媒體 尤其適用於去除污染物。此外,例如(舉例而言)當微粒之粒徑 大於媒體之孔徑時,該化學吸附性媒體能夠去除一氣體流中之微 粒。在一實施例中,一光罩傳送盒之第一或第二過濾層可包含一 物理吸附性媒體。一實例性物理吸附性媒體係為活性碳。活性碳 概括地闡述於美國專利第5,607,647號及第5,582,865號中,該等 專利之内容特此以引用方式併入本文中。 較佳地,本發明系統之一光罩傳送盒之第一或第二過濾層用物 19 200933779 理吸:性媒趙包含未經處理之活性碳。或者,該物理吸附性媒體 可包含例如(舉例而言)概括地闡述於美國專利第5,834 114號中 之合成碳材料,該美國專利之内容特此以弓丨用方式併入本文中。 實f »成喊材料亦可與活性碳相結合地用於一物理吸附性媒 體。在一實施例中,含-物理吸附性媒體之一過渡器或過濾層包 含未經處理之粒化活性碳,其能夠去除氣體流中所含的例如揮發 性含二氧化矽化合物等污染物。 在一實施例中,本發明之系統包含與一储存外殼相關聯之一清 潔系統。該清潔系統可包含複數儲存管線,各該儲存管線連㈣ ◎ ^傳送盒之至少一儲存容座。較佳地,該清潔系統可經由至少 -清潔管線向—或多個儲存容座提供包含CDa或特佳的CM之 /月潔氣體本發明亦涵蓋,該清潔系統可向該等儲存容座提供例 如乾燥氮氣或氬氣等惰性氣體。舉例而言,用於製備特佳的 之月/絜系統係由位於§an Diego,California之Aeronex,The cover transfer box is hermetically sprayed. In one embodiment, the open end is positionable near the first surface. The porous bottom end may also be recessed from the first surface. Preferably, the reticle transfer box contains a filter' that has a filter shape and a range of filters. The filter may be layered and disposed in sealing engagement with the open end; in the passage of 2009 20091, so that substantially all of the gas entering or exiting the filter passes through the filter region. Filters for, but not limited to, reticle transfer boxes, storage cabinets, libraries, tools, clean rooms or inspection areas of the system of the present invention may comprise an ion exchange resin Q, for example, which may be included in the system of the present invention. A filter of at least one ion exchange resin to protect the reticle during storage and transportation. Alternatively, the filter used in a system of the invention may not comprise an ion exchange resin. The plasma exchange resin can be characterized by a porosity of greater than about 300 ml/g. Preferably, the filter ion exchange resin can be a cationic exchange resin having a chemical acid point concentration of about 1.8 meq/g. For example, a filter or one of its various layers of exchange resin may comprise a surface area of about 45 square meters per gram. An exemplary resin for the filter is commercially available under the tradename AMBERLYST (Rohm and Hass Company, 100 Independence Mall West, Philadelphia, Pennsylvania 19106). Preferably, the filter of the reticle transfer cassette can be made to be depleted after a considerable period of use. For example, the invention contemplates the use of various filter layers that need to be maintained or replaced together. In one embodiment, the filter layer comprising a chemisorbable medium can be made thinner than the layer having a physically adsorbable medium because the physically adsorbable medium tends to be depleted prior to the chemisorbent medium. Filters that use the various filter layers that are depleted after a comparable period of time can reduce operating costs by causing any potential failure time to phase out. Figure 2 is a schematic illustration of an exemplary filter of a reticle transfer cartridge of the system of the present invention and its various layers. As shown, the first filter layer 28 and the second filter layer 3 can be placed in communication with each other. For example, the first filter layer can be disposed on the surface of the second filter layer 3 . The first and second filter layers may also comprise a cover sheet. As shown, the second filter layer 200933779 30 features a cover sheet 32. The cover sheet 32 can be a polyester nonwoven material. Preferably, the first and second transition layers comprise a chemisorbent or physically adsorbable material for removing contaminants such as volatile cerium oxide compounds. In one embodiment, a reticle transfer case, storage cabinet, library, tool, clean room or inspection area of the system of the present invention comprises a first transition layer having a physically adsorbable medium. An exemplary physically adsorbent medium can comprise activated carbon. The activated carbon of a physically adsorbent medium can be untreated or treated and granulated. A system of the invention is also characterized by having a second filter layer comprising a chemisorbable medium. For example, a chemisorbent medium of a second filter layer can comprise a cation exchange resin. Preferably, the cation exchange resin comprises a copolymer, such as a divinyl styrene copolymer having at least one acidic functional group. An exemplary chemisorbent medium for use in a filter layer of a filtration system is a cationic ion exchange resin, such as a chemically acidic copolymer. In one embodiment, the physically adsorbent medium for a filter layer can comprise activated carbon which can be untreated or treated and granulated. The physically adsorbent medium can form a block that is held together by the binder material. Exemplary physically adsorbent media can be chemically acidated and obtained from organic sources such as coal. As shown, the filter or filter layer 34 of Figure 3 includes a cover sheet 36. In one embodiment, the cover sheet comprises a polyester nonwoven material. Preferably, the filter comprises a chemisorbent or physically adsorbable medium. In addition, a filter 38 includes a first cover sheet 40 and a second cover sheet 42. The filter 38 also includes a body portion 44 disposed on the first cover sheet. An exemplary cover sheet for a filter of a reticle transfer cartridge can comprise a filterable or non-filterable nonwoven material, such as polyester, polyamide, polypropylene, or any combination thereof. For example, 17 200933779 A cover sheet comprising a filterable nonwoven material removes the particles contained in the gas stream passing therethrough. A cover sheet can also be used to hold the honeycomb or pleated elements. Alternatively, a cover sheet can hold a given medium such as, for example, activated carbon or beads comprising a sulfonated divinyl styrene copolymer. Preferably, the cover sheet of a filter may comprise a chemically inert material such as, for example, polyester or polypropylene. For example, a filter of a reticle transfer case, storage cabinet, library, tool, clean room or inspection area of a system of the present invention can be held by any suitable container or frame. These containers or frames are also suitable for making filter layer replacement easier. A filter or filter layer can comprise a filter component having a pleated element. The pleated element increases the surface area of the filter element to help remove particulates or contaminants contained in the airflow path therethrough. Figure 3 is a schematic illustration of an exemplary filter of a reticle transfer cartridge of the system of the present invention. In an embodiment, the pass layer 46 comprises a high surface area transition component. Additionally, the filter layer can comprise a chemisorbent or physically adsorbent medium and a binder type material. Preferably, the transition layer comprising a high surface area transition component comprises a medium disposed on, for example, a composite material 48. The binder type material can also be introduced into the media to aid in bonding. For example, one of the first or second filter layers of a reticle transfer cartridge can utilize a nonwoven composite material comprising at least one cation exchange resin that can be bonded to airborne contaminants. Exemplary first or second filter layers comprising a chemisorbable medium and methods of making such filter layers are generally described in U.S. Patent Nos. 6,447,584, 6,740,147, 6,610,128, and 6,761,753. The contents of these patents are hereby incorporated by reference herein. A filter layer can also be made by applying a chemisorbent medium dry to a non-woven composite or earner material, which is then heated and calendered at 18 200933779. For example, the nonwoven composite can be a polyester. In one embodiment, the chemosorbable medium is a porous diethylstilbene styrene copolymer comprising an acidic functional group. Exemplary acidic functional groups include sulfonic acid and carboxylic acid functional groups. The chemisorbent medium can be characterized by a pore size of between about 50 and 400 angstroms (A). Additionally, the surface area of the media can be greater than about 20 square meters per gram. For example, the acidic functional groups of the styrene-butadiene copolymer are also characterized by an acidity level above about 1 meq/g. In one embodiment, a first or second transition layer comprises chemisorbent media particles distributed throughout the material (e.g., nonwoven material, fibrous matrix material, or polyester material, etc.). Preferably, a filter layer of chemosorbable media particles may comprise a cation exchange resin. For example, the media particles can be chemically acidic particles. Such media particles can be characterized as having an exemplary particle diameter of from about 0.3 mm to about 1.2 mm. Further, a chemisorbable media particle can have, for example, a porosity and an average pore diameter of about 0.3 ml/g and 250 A, respectively. A chemisorbent medium of one of the first or second filter layers of a reticle transfer cartridge filter is particularly useful for removing contaminants. Further, the chemisorbable medium is capable of removing particulates in a gas stream, for example, when the particle size of the particles is greater than the pore size of the medium. In one embodiment, the first or second filter layer of a reticle transfer cartridge can comprise a physically adsorbable medium. An exemplary physical adsorptive media is activated carbon. The activated carbon is generally described in U.S. Patent Nos. 5,607,647 and 5,582,865, the disclosures of each of each of Preferably, the first or second filter layer of the reticle transfer case of the system of the present invention is used for the first or second filter layer. Alternatively, the physically adsorptive medium may comprise, for example, a synthetic carbon material, as generally described in U.S. Patent No. 5,834,114, the disclosure of which is incorporated herein by reference. Real f » Shouting materials can also be used in combination with activated carbon for a physically adsorbable medium. In one embodiment, the one or-physical-adhesive medium transition or filter layer comprises untreated granulated activated carbon capable of removing contaminants such as volatile cerium oxide compounds contained in the gas stream. In one embodiment, the system of the present invention includes a cleaning system associated with a storage enclosure. The cleaning system may comprise a plurality of storage lines, each of the storage lines being connected to (four) ◎ ^ at least one storage receptacle of the transfer box. Preferably, the cleaning system can provide a CD containing a CDa or a particularly good CM via at least a cleaning line to or from a plurality of storage receptacles. The invention also covers that the cleaning system can provide the storage receptacles For example, an inert gas such as dry nitrogen or argon is used. For example, the moon/絜 system used to make the best is from Aeronex, §an Diego, California.
Incorporated公司所製造。實例性CDA或特佳的CDA源亦概括地 闡述於美國公開案第2005/0017198號及第2006/0118138號中,該 ❹ 等公開案之内容特此以引用方式併入本文中。 第4圖係為本發明系統之一實例性清潔系統之示意圖。如圖所 示’ 一入口氣體引入至清潔系統50。在一實施例中,該入口氣體 可係為CDA。舉例而言,一包含CDA之入口氣體可達到國際標準 化組織(International Standards Organization (ISO)) 8573-1 之技術 規範之要求。通常,該等技術規範可要求入口氣體包含分別係為 約小於0.1 μπι、小於0.1 mgiif3、-20°C及〇.〇1 mgm·3之微粒粒徑、 20 200933779 微粒濃度、露點及油濃度。該清潔系統亦可具有自約〇至10巴及 約15至33°C之CDA入口壓力及溫度。對於一 CDA入口氣體,其 實例性污染物濃度包含於表1中。 表1 污染物 濃度 揮發性無機化合物,例如so2、H2S、 H2S04、HF、HC1 及 H3P04 約 5 ppbv 揮發性鹼,例如NH3、NMP及小分子胺 約 100 ppbv 可濃縮有機物 約 100 ppbv 水 約 2000 ppbv 高熔點化合物’例如含s、P或Si之碳 氫化合物 約 1 ppbv 第4圖中之清潔系統50亦包含一排出氣體,該排出氣體包含用 於—或多個儲存容座之清潔氣體。在一實施例中,來自該清潔系 、统之π /繁氣體可包含-清潔氣體源。$例而t,該清潔氣體源可 ❿包含CDA或特佳的CDA1於包含特佳的CDA之清潔氣體源, 其實例性污染物濃度包含於表2中。 表2 污染物 濃度 揮發性無機化合物,例如so2、H2S、 H2S〇4、HF、HC1 及 H3P〇4 約 < 0.001 ppbv 揮發性鹼,例如NH3、NMP及小分 子胺 約 < 1 ppbv 21 200933779 可濃縮有機物 約 < 0.1 ppbv 水 約 < 1 ppbv 高熔點化合物,例如含S、P或Si 之碳氫化合物 約 < 0_001 ppbv 較佳地,該清潔系統之壓降可係為小於約1巴。該清潔氣體可 以自約6至7巴之壓力及約15至34°C之溫度排出該清潔系統。來 自該清潔系統之清潔氣體之流速亦可係為約300公升/分鐘。Manufactured by Incorporated. An exemplary CDA or a particularly good source of CDA is also generally described in U.S. Publication Nos. 2005/0017198 and 2006/0118138, the disclosures of each of which are hereby incorporated by reference. Figure 4 is a schematic illustration of an exemplary cleaning system of the system of the present invention. An inlet gas is introduced to the cleaning system 50 as shown. In one embodiment, the inlet gas can be a CDA. For example, an inlet gas containing CDA meets the requirements of the International Standards Organization (ISO) 8573-1. Generally, such specifications may require that the inlet gas contain particle sizes of less than about 0.1 μm, less than 0.1 mgiif3, -20 ° C, and 〇.1 mgm·3, respectively, 20 200933779 particle concentration, dew point, and oil concentration. The cleaning system can also have a CDA inlet pressure and temperature from about 〇 to 10 bar and from about 15 to 33 °C. For a CDA inlet gas, exemplary pollutant concentrations are listed in Table 1. Table 1 Contaminant concentrations Volatile inorganic compounds, such as so2, H2S, H2S04, HF, HC1 and H3P04 about 5 ppbv volatile bases, such as NH3, NMP and small molecular amines about 100 ppbv condensable organic matter about 100 ppbv water about 2000 ppbv The high melting point compound 'e.g., a hydrocarbon containing s, P or Si about 1 ppbv. The cleaning system 50 of Fig. 4 also includes an exhaust gas containing a cleaning gas for - or a plurality of storage receptacles. In one embodiment, the π/combustion gas from the cleaning system may comprise a source of cleaning gas. For example, t, the source of cleaning gas may comprise CDA or a particularly good CDA1 for a source of cleaning gas comprising a particularly good CDA, the exemplary contaminant concentrations are included in Table 2. Table 2 Contaminant Concentrations Volatile inorganic compounds such as so2, H2S, H2S〇4, HF, HC1 and H3P〇4 about < 0.001 ppbv volatile bases such as NH3, NMP and small molecular amines < 1 ppbv 21 200933779 Concentrated organic matter about < 0.1 ppbv water about < 1 ppbv high melting point compound, such as hydrocarbon containing S, P or Si about < 0_001 ppbv Preferably, the pressure drop of the cleaning system can be less than about 1 bar. The cleaning gas can be discharged from the cleaning system at a pressure of from about 6 to 7 bar and a temperature of from about 15 to 34 °C. The flow rate of the cleaning gas from the cleaning system can also be about 300 liters per minute.
第4圖中之清潔系統50亦可包含一可選排出口。第5a圖係為 本發明.系統之一實例性清潔系統之示意圖。如圖所示,一入口氣 體被引入清潔系統52。較佳地,該入口氣體可係為CDA。舉例而 言,一入口氣體可包含CDA。該清潔系統亦可包含一可選排出口 及儀用空氣、電源、或輸入。此外,該清潔系統可包含一排出氣 體,該排出氣體包含用於一或多個儲存容座之清潔氣體。該清潔 系統可包含與一儲存外殼54相關聯之一清潔氣體源。在一實施例 中,一清潔氣體源排出該清潔系統並且可經由一或多個清潔管線 引入儲存外殼54。可於一清潔出口管線上或於該清潔系統中增加 一離化器55。該清潔氣體源亦可包含特佳的CDA。包含CDA及 特佳的CDA之入口及出口氣體可係如本文中例如分別在表1及表 2中所述。 參照第5b圖,一或二個用於提供CDA或特佳的CDA之清潔系 統50, 52連接至一儲存外殼,例如一光罩傳送盒儲存櫃54.1。該 儲存櫃具有構造成搁架形式之容座58,其與該等清潔管線垂直, 以向安放於該等容座上之光罩傳送盒中提供清潔CDA或特佳的 22 200933779 CDA。該等傳送盒分別將該清潔或特佳的cda排放入光罩 傳送盒儲存櫃54.1之封閉之内部環境54 2,如箭頭5(7所示。一 吸濕劑或乾燥劑54.8位於該光置傳送盒中作為―過渡器㈣並且 位於該清潔流動流中,藉以使其可自該CDA或特佳的CDA清潔 流中有效地得到重新補充及除濕。另外,如另外的清潔管線54.9 所指示’亦可用CDA或特麵⑽清洗料光罩舰盒。構造 成光罩傳送盒儲存櫃形式之該儲存外殼可排空該封閉之内部環The cleaning system 50 of Figure 4 can also include an optional discharge port. Figure 5a is a schematic illustration of an exemplary cleaning system of the present invention. As shown, an inlet gas is introduced into the cleaning system 52. Preferably, the inlet gas can be CDA. For example, an inlet gas can contain CDA. The cleaning system can also include an optional drain and instrument air, power, or input. Additionally, the cleaning system can include an exhaust gas containing cleaning gas for one or more storage receptacles. The cleaning system can include a source of cleaning gas associated with a storage enclosure 54. In one embodiment, a source of cleaning gas exits the cleaning system and can be introduced into the storage enclosure 54 via one or more cleaning lines. An ionizer 55 can be added to a cleaning outlet line or to the cleaning system. The source of cleaning gas can also contain a particularly good CDA. The inlet and outlet gases comprising CDA and particularly preferred CDA can be as described herein, for example, in Tables 1 and 2, respectively. Referring to Figure 5b, one or two cleaning systems 50, 52 for providing a CDA or a particularly good CDA are coupled to a storage enclosure, such as a reticle transfer box storage cabinet 54.1. The storage cabinet has receptacles 58 in the form of shelves that are perpendicular to the cleaning lines to provide a cleaning CDA or a particularly good 22 200933779 CDA to a reticle transfer box housed in the receptacles. The transport boxes respectively discharge the clean or particularly good cda into the enclosed interior environment 54 2 of the reticle transfer box storage cabinet 54.1, as indicated by arrow 5 (7). A moisture absorbent or desiccant 54.8 is located in the light. The transfer box acts as a "transitioner (4) and is located in the clean flow stream so that it can be effectively replenished and dehumidified from the CDA or the superior CDA cleaning stream. Additionally, as indicated by the additional cleaning line 54.9' The CDA or the special (10) cleaning material reticle can also be used. The storage casing in the form of a reticle transfer box storage cabinet can empt the closed inner ring
境’如由排出箭頭56.2所指示。通常,此排出口較佳係位於該外 威之下部區域,並且輔助入α 56 3係位於該外殼之上部區域。 在實施例中,本發明系統之一清潔系統包含複數清潔管線。 舉例而言,-清潔系統之-清潔管線可連接至至少—儲存容座。 較佳地一儲存外殼之—擱架可包含複數儲存容座。第&圖係為 包含複數儲存容座之本發明系統之實例性搁架之示意圖。如圖所 不,搁架56包含複數儲存容座58。儘管第如圖中之搁架係包含The environment ' is indicated by the discharge arrow 56.2. Typically, the discharge port is preferably located in the lower portion of the outer casing, and the auxiliary inlet 56 3 is located in the upper region of the outer casing. In an embodiment, one of the cleaning systems of the system of the present invention comprises a plurality of cleaning lines. For example, the cleaning system - the cleaning line can be connected to at least the storage receptacle. Preferably, a storage enclosure - the shelf can comprise a plurality of storage receptacles. The & diagram is a schematic illustration of an exemplary shelf of the system of the present invention comprising a plurality of storage receptacles. As shown, the shelf 56 includes a plurality of storage receptacles 58. Although the shelf in the figure is included
四個用以容置光罩傳送盒之儲存容座,但本發明涵蓋任何其他適 宜數目之容座。各雜存容座可㈣容置—光罩傳送盒。該光罩 傳送盒包含連接至-或多個清潔管線之至少—人口,例如一入口 孔。 第6a圖中之擱架56可與用於至少一清潔管線之連接管6〇相關 聯。該等連接管可㈣_中?丨人包含但秘於鳴或特佳的 CDA之di體源。在—實施例中,該撋架可包含通道a,1可 向—储存容座58提供—清潔氣體源。較佳地,與該娜相關聯之 該等通道可分別包含*_出σ 64。該擱架之實例性出口可與一或多 23 200933779 個儲存容座相關聯。如圖所示,該擱架之該等出口可用以連接或 耗合至一光罩傳送盒之一入口孔、一出口孔或其組合。舉例而言, 該擱架之該等儲存容座容置一光罩傳送盒,該光罩傳送盒包含至 少一入口孔用,以引入一清潔空氣源。在該光罩傳送盒容置於該 儲存容座時,該傳送盒之入口孔可與該擱架之至少一出口相關聯。 關於本發明之該等及相關態樣之更多揭示内容係揭示於美國臨 時申請案第60/892,196號中,該申請案之名稱係為「Purge System for a Reticle SMIF Pod (光罩SMIF傳送盒之清潔系統)」並且由本 發明之擁有者擁有。該申請案以引用方式併入本文中。該揭示内 容闡釋光罩傳送盒與儲存容座間之一清潔連接選項。容座部與光 罩傳送盒間之一實例性連接系統可係為一彈性套管,其作為光罩 傳送盒之門上之清潔入口,與位該儲存容座搁架上之一金屬喷嘴 (清潔出口)相配合。 在一實施例中,一光罩傳送盒之一入口孔可連接至一或多個清 潔管線。舉例而言,一入口孔可與一清潔管線相連接或相關聯, 用於經由第6a、第6b、第6c及第6d圖中之搁架56之一或多個 連接管60、複數通道62及複數出口 64引入一清潔氣體源。如上 文所述,一清潔管線可連接至與包含該擱架之一儲存外殼相關聯 之一清潔系統。較佳地,一清潔管線與由一儲存容座所容置之光 罩傳送盒之一入口孔之關聯可由自動化構件達成,該等自動化構 件可係為例如但不限於習知之程式化電腦系統及裝置,該等程式 化電腦系統及裝置可執行程式以指示對作為一儲存櫃控制系統之 一部分之光罩傳送盒及擱架之操控。此項技術中之一般技術者可 24 光罩傳送盒之入口連接 光罩儲存容座之另一實Four storage receptacles for receiving the reticle transfer case, but the present invention contemplates any other suitable number of receptacles. Each of the storage receptacles can be (4) accommodated - a reticle transfer box. The reticle transfer box contains at least a population connected to - or a plurality of cleaning lines, such as an inlet aperture. The shelf 56 in Figure 6a can be associated with a connecting tube 6〇 for at least one cleaning line. These connecting pipes can be (4) _ in the middle? The deaf person contains but is secretive or special CDA di body source. In an embodiment, the truss may include a channel a, 1 may be provided to the storage receptacle 58 - a source of cleaning gas. Preferably, the channels associated with the Na may contain *_out σ 64, respectively. An exemplary outlet for the shelf can be associated with one or more 23 200933779 storage receptacles. As shown, the outlets of the shelf can be used to connect or mate to an inlet aperture, an exit aperture, or a combination thereof. For example, the storage receptacles of the shelf house a reticle transfer box that includes at least one inlet aperture for introducing a source of clean air. The inlet opening of the transfer box may be associated with at least one outlet of the shelf when the reticle transfer case is received in the storage receptacle. Further disclosure of such and related aspects of the present invention is disclosed in U.S. Provisional Application Serial No. 60/892,196, the entire disclosure of which is incorporated herein by reference in its entirety in The cleaning system) is owned by the owner of the present invention. This application is incorporated herein by reference. This disclosure illustrates one of the clean connection options between the reticle transfer case and the storage receptacle. An exemplary connection system between the receptacle portion and the reticle transfer box can be an elastic sleeve that serves as a clean inlet on the door of the reticle transfer box and a metal nozzle on the storage receptacle shelf ( Clean the exit) to match. In one embodiment, an inlet aperture of a reticle transfer box can be coupled to one or more cleaning lines. For example, an inlet port can be connected or associated with a cleaning line for one or more of the connecting tubes 60, the plurality of channels 62 via the shelves 56 of FIGS. 6a, 6b, 6c, and 6d. And a plurality of outlets 64 introduce a source of cleaning gas. As noted above, a cleaning line can be coupled to a cleaning system associated with a storage enclosure containing one of the shelves. Preferably, the association of a cleaning line with an inlet opening of a reticle transfer box received by a storage receptacle may be achieved by an automated component such as, but not limited to, a conventional stylized computer system and Devices, such programmed computer systems and devices are executable to indicate manipulation of the reticle transfer case and shelf as part of a storage cabinet control system. The general practitioner of the art can connect the entrance of the photomask transfer box to the other of the photomask storage receptacle.
❹ 200933779 選擇實例性程式化電腦系統及裝置來將 至一清潔管線。 參照第6b、第6c及第6d圖,耸淑 施例。一 U形之獨架界定一空間64 )、 ^迷且具有清潔屯口 64。一具 有一握爪70.2之自動化機械裝置於 、〇緣7〇.4處抓握光罩傳送盒。 一空氣流動感測器71.2與該握爪 匙孤握尤早 流。該確認可於將光罩傳送盒66以聯並且⑽確認清潔空氣 傳送盒之後實施。 於容座71.7之前或於安放該 第7a、第7b、第7c圖係為由光 早餘存容座所容置之實例性光 罩傳送盒之示意圖,該等光罩儲存〜 輯谷置 各座與第6a或第6b圖所示類 型之搁架相關聯。如圖所示,一或夕, 夕個光罩傳送盒66可設置於一 儲存外殼70之一搁架68上。在—魯^ I施例中,該儲存外殼包含複 數擱架。舉例而言,各該擱架可包人 3主少—光罩儲存容座。第乃、 第7b、第7c圖中之光罩傳送各 了刀別由該擱架之一儲存容座容 置。較佳地,該等光罩傳送盒白.χ 匕3—入口孔,該入口孔可連接至 該等清絲線至少其巾之-。實例性清㈣射似置於該儲存 外殼之空間72内並且向該光罩傳送盒提供—清潔氣體源。該等清 潔管線亦可與該娜及其通道或出口相連接或相關聯。 第7a、第7b、第7c圖中之光罩傳送盒66亦可由具有握爪7〇 2 之一自動化裝置74在儲存櫃控制系統之控制下操控。習知之自動 化裝置及系統包含如由美國專利第6,991,416號、第6,364,595號、 第7,039,499號及美國公開案第2006/0078407號所概括闡述之用 於光罩健存及運輸之自動化裝置,該等專利案及公開案之内容特 25 200933779 此以引用方式併入本文中。本發 多個可用於光罩儲存及運輪之 法可分別包含-或 72亦可包含經由習知孔或門存取::::而:’储存外殼 用,門,_輔助地用手存取光= 該儲存外殼亦可包含―循環系統,該循環以可沖洗 ㈣、特佳的CDA或其他惰性氣體等清潔氣 =❹ 200933779 Select an exemplary stylized computer system and device to clean the pipeline. Referring to Figures 6b, 6c and 6d, let's take a look at the example. A U-shaped frame defines a space 64), and has a clean mouth 64. An automated mechanical device having a grip 70.2 grasps the reticle transfer box at the rim edge 7〇.4. An air flow sensor 71.2 is particularly early with the gripper. This confirmation can be performed after the reticle transfer case 66 is joined and (10) the clean air transfer case is confirmed. Before the receptacle 71.7 or the placement of the 7a, 7b, and 7c diagrams is an illustration of an exemplary reticle transfer case housed by a light preserving receptacle, the reticle storage The seat is associated with a shelf of the type shown in Figure 6a or 6b. As shown, a reticle transfer case 66 can be disposed on a shelf 68 of a storage housing 70. In the embodiment of the invention, the storage enclosure comprises a plurality of shelves. For example, each of the shelves can be packaged with 3 main-small-storage storage receptacles. The reticle transfer in the first, seventh, and seventh embodiments is stored in one of the shelves. Preferably, the reticle transport boxes are white χ — 3 - inlet apertures, the inlet apertures being connectable to the clearing wires at least. An exemplary cleaning (4) is placed in the space 72 of the storage enclosure and provides a source of cleaning gas to the reticle transfer box. These cleaning lines can also be connected or associated with the Na and its passage or outlet. The reticle transfer case 66 of Figures 7a, 7b, 7c can also be operated by an automated device 74 having grips 7 在 2 under the control of the storage cabinet control system. The automated devices and systems of the prior art include automated devices for reticle storage and transportation as outlined in U.S. Patent Nos. 6,991,416, 6,364, 595, 7,039, 499, and U.S. Patent Publication No. 2006/0078407, each of which is incorporated herein by reference. The contents of the case and the public disclosure 25 200933779 This is incorporated herein by reference. The plurality of methods that can be used for the reticle storage and transport wheel can respectively include - or 72 can also be accessed via a conventional hole or door:::: and: 'Storage housing, door, _ auxiliary hand storage Light extraction = The storage enclosure can also contain a "circulation system" that is cleanable with flushable (four), excellent CDA or other inert gases.
盒’以防止污染物積聚於其上面以及使該等光罩傳送盒 所吸收之濕氣最少化。該循環系統能夠在—個門打開時在該° ,中Γ正壓力,從而防止污染物經由該打開之門進入該:殼存 在-實施例中,-光罩儲存容座可用以容置具有一入口之 罩傳送盒’該人π與至少—清潔管線相連接或相關聯。舉例而言, 第7a及第7b圖中之光罩傳送盒66由一掷架⑽之—贿容座容 置並且與之相關聯之清潔管線可向該傳送盒提供 如圖所示,-清潔氣體源經由-清潔管線76與該掷架相連^相 關聯,並且可與設置於其上面之光罩傳送盒連通。較佳地,該搁 架包含-出口,用於經由該清潔管線所提供之清潔氣體源。該掷 架之實例性出口可用以連接或耦合至一光罩傳送盒之一入口。該The box 'to prevent contaminants from accumulating thereon and to minimize the moisture absorbed by the reticle transfer boxes. The circulation system is capable of positive pressure at the ° when the door is opened, thereby preventing contaminants from entering through the open door: the shell is present - in the embodiment, the reticle storage receptacle can be used to accommodate one The entrance cover transfer box 'this person π is connected or associated with at least the cleaning line. For example, the reticle transfer case 66 of Figures 7a and 7b is received by a throwing frame (10) and a cleaning line associated therewith can be provided to the transfer case as shown, - cleaning A gas source is associated with the throwing frame via a cleaning line 76 and is connectable to a reticle transfer box disposed thereon. Preferably, the shelf contains an outlet for a source of cleaning gas provided via the cleaning line. An exemplary outlet of the thrower can be used to connect or couple to an inlet of a reticle transfer box. The
光罩傳送盒之入口可係為經由該擱架之一或多個連接管、通道及 出口與該清潔管線相連接或相關聯之一入口孔。 此外,本發明之系統包含具有複數光罩儲存容座之一儲存外 殼。本發明系統之儲存外殼可係為任何習知之儲存外般,包含如 由美國專利第6,562,094號及第6,848,876號以及美國公開案第 2004/40158348號所概括闡述之彼等自動化儲存外殼,該等專利案 26 200933779 及A開案之内4特此^財式併人本文^ 存:殼於,竟中安全而高效地儲存光罩或光罩 之複:容=Π由設置於一本發”統之儲存外Μ 中之光罩之污染物所=最,=存外殼使可能接觸光果傳送盒或其 二= = =,可與,單元相關聯,取單 傳送盒。該禅存單=:在-起’用於存取及分段運輸光單 存容座之可移動有複數用於容置光罩傳送盒之館 在光罩傳送純取及運輸運作期間外可係性=儲存外殼除 存外殼亦可係、實質上不具有馬達、移動部件^路^的。該儲 產^污=物之乡且件。該等部件亦可位於_存外殼外部及其他會 活Γ生圖,該等搁架可圍繞一轴線幻旋轉,以提供儲存靈 ❹ 2㈣,_存外殼可允許—清潔氣體在其整個内部中 ^。精由㈣如CDA或特佳的CDA等清潔氣體錢 == 環,可使暴露至光翠傳送盒及其中之光罩之潛二 儲存外:二架 固所不,儲存外殼78包The inlet of the reticle transfer box may be an inlet aperture connected or associated with the cleaning line via one or more of the shelves, passages and outlets. Additionally, the system of the present invention includes a storage enclosure having a plurality of reticle storage receptacles. The storage enclosure of the system of the present invention may be any conventional storage, including such automated storage enclosures as generally described in U.S. Patent Nos. 6,562,094 and 6,848,876, and U.S. Pat. Case 26 200933779 and A opened within the 4th paragraph of this ^ ^ 式 并 本文 本文 本文 : : : : : : : : : : : : : : : : : : : : : : : : : : : : : : : : : : : : : : : : : Store the contaminants in the outer cover = the most, = save the outer casing so that it may contact the light fruit transfer box or its two = = =, can be associated with the unit, take the single transfer box. The Zen deposit list =: in - The movable compartment for accessing and staging the optical storage receptacles has a plurality of housings for accommodating the reticle transfer box. The detachability during the reticle transfer and the transport operation is optional. It can also be, and does not have, a motor or a moving part. The storage and production of the material is the same as the home of the object. The components can also be located outside the _ storage enclosure and other live-action maps. The frame can be rotated around an axis to provide a storage coffin 2 (four), _ storage enclosure allows The cleaning gas is in its entire interior. The fines (4) such as CDA or special CDA clean gas == ring, can be exposed to the light green box and the hood of the light cover. No, storage case 78 pack
數擱架8〇相關聯之複數光罩儲存容座。在一實施例中,—清潔 統可與該儲存外殼相關聯。實例性清潔系統可包含複數 線。第及第奶圖中之清潔管線82沿該儲存外殼之二侧堤Z 27 200933779 罩傳送益84提供-清潔氣體源。該清潔氣體源可包含一⑶ 特佳的CDA源,以用於去除光罩傳送盒或光罩中之污染物。/ 座=所I : 2線82分別連接至棚架8〇之該等光罩储存容 座,、中之…該等儲存容座係用以容置其 傳送盒84。在一實施例中,儲广 、 、罩之光罩 頁例中儲存外殼78可包含複數擱架,其 包含複數儲存容座。第8A圖中之 、 ❹ 光罩傳送盒及其中之光罩之習知裝置及:件,包含== 動化機械傳遞機構85可於^容置該等光罩傳送盒之容座8 移動。較佳地,—光罩儲存容座可用以容置具有-人π之光罩傳 送盒’該人口與至少-清潔管線相連接或相關聯…清潔氣體源 可經由-清潔管線與-搁架相連接或相關聯。另外,—清潔氣體 源可與設置於-擱架上之—光罩傳送盒相連通。—實例性掷架包 含-出口,用歧由該清潔管線所提供之清潔氣體源。 〇 參見第9、第1G、第11及第12圖’其例示-握爪9〇與—光罩 傳送盒相响合以放置及自容座上移除光罩傳送盒之不同視圖。出 於例示目的,圖中顯示該握爪與自動化機械傳遞機構隔離。於此 種配置中’難爪藉由簡單地將叉子92、93插人光罩傳送盒料 之頂部凸緣96下方,將光罩傳送盒緊固於由該等叉形物所界定之 凹槽98内。升尚該握爪以使其嚙合凸緣之底面,藉以使握爪隨後 支撐光罩傳送盒。然後,移動握爪以傳送光罩傳送盒。 具體而言參見第12及第13圖,該握爪具有一空氣流感測器 102,空氣流感測器102可係為嵌置於握爪之手部1 〇4内之熱線式 風速計(hot wire anemometer )。該空氣流感測器可用以感測及量 28 200933779 測非空氣清潔氣體,例如氮氣以及CDA。參見第14圖,一方塊圖 例示感測系統110之各組件之一實例性佈置。 如第10圖所示位於容座上方之握爪位置可將空氣流感測器定位 於自出口 64流出之清潔流上方並偵測及量測該清潔流。第15圖 例示一自動化機械傳遞機構之一實例,其於一儲存櫃中在各排容 座之間移動以放置光罩傳送盒。當握爪移動經過來自一容座上之 出口之清潔流時,感測系統會感測及量測清潔氣流。顯示為約1 升/分鐘或5升/分鐘之資料點可表明清潔系統存在問題。 舉例而言,可將一習知裝置設置於該殼體内,用於自每一外殼 中取出光罩及將光罩重新放入每一外殼中。該裝置可係為包含一 驅動系統之標準機械裝置。用於控制該機械裝置之驅動系統之控 制器可於實施一所命令的運動前計算該運動之一曲線。該控制器 亦可多次重新計算一曲線,直至該控制器決定待實施之運動為 止。該機械裝置亦可包含一握爪臂,用於抓起該儲存外殼中之光 罩傳送盒。該握爪臂可由一握爪臂驅動器驅動,以遠離及朝該儲 存外殼移動。該機械裝置可包含一垂直柱,該握爪臂可移動地安 裝至該垂直柱上。該握爪臂相對於該垂直柱之垂直移動可由一垂 直驅動器提供。該機械裝置亦可包含一在上面可旋轉地安裝該垂 直柱之支架。該機械手臂係受控於儲存櫃控制系統。 雖然本文中係結合較佳實施例對本發明進行說明,但此項技術 中之一般技術者於閱讀上文後可對本文所述内容作出等效的變 化、替代及其他類型之改變。各上述實施例中亦可已包含或併入 關於所有其他實施例所揭示之此等變化。因此,由專利證書授予 29 200933779 之保護在廣度及範圍上將僅受隨附申請專利範圍及其任何等效範 圍中所含定義之限制。 【圖式簡單說明】 第la圖係為本發明系統之一實例性光罩傳送盒之***圖; 第lb圖係為第la圖之光罩傳送盒之立體圖; 第2圖係為本發明系統之一光罩傳送盒之實例性過濾器之示意 圖; 第3圖係為本發明系統之一光罩傳送盒之一實例性過濾器之示 & ❹ 意圖; 第4圖係為本發明系統之一實例性清潔系統之示意圖; 第5a圖係為本發明系統之一實例性清潔系統之示意圖; 第5b圖係為本發明系統之一實例性清潔系統之示意圖; 第6a圖係為一根據本發明之儲存容座之實例性搁架之俯視圖; 第6b圖係為構造成U型之一替代儲存容座之俯視圖,其中清潔 出口孔位於開口之毗鄰侧上; 第6c圖係為與一光罩傳送盒並且與一空氣流動感測器嚙合之一 © 機械握爪之側面圖; 第6d圖係為第6c圖之握爪、光罩傳送盒及容座之俯視圖; 第7a圖係為實例性光罩傳送盒之俯視圖,該等實例性光罩傳送 盒係容置於與第6a圖所示類型之擱架相關聯之光罩儲存容座; 第7b圖係為三個疊置之搁架之側視圖; 第8a圖係為本發明系統之一實例性儲存外殼之示意圖,該系統 具有具一握爪之機械傳遞機構; 30 200933779 第8b圖係為容座掷架之朝上之立Μ 及放置於擱架上之光罩傳送盒; 第9圖係為一與置於 體圖; 第1〇圖係為肖—光罩傳送盒㈣合之握爪之俯視圖,該光罩 傳送盒位於-躲叙錢位置㈣離之位置上 ,該位置可係處The number of shelves 8 is associated with a plurality of reticle storage receptacles. In an embodiment, a cleaning system can be associated with the storage enclosure. An exemplary cleaning system can include a plurality of lines. The cleaning line 82 in the first and third milk maps provides a source of cleaning gas along the two side banks Z 27 200933779 of the storage enclosure. The source of cleaning gas may comprise a (3) particularly good source of CDA for removing contaminants in the reticle transfer box or reticle. / Block = I: The 2 lines 82 are respectively connected to the reticle storage receptacles of the scaffolding 8 ,, and the storage receptacles are for accommodating their transport boxes 84. In one embodiment, the storage enclosure 78 of the storage, cover, and hood may include a plurality of shelves that include a plurality of storage receptacles. The conventional device and device of the reticle transfer case and the reticle therein are shown in Fig. 8A, and include a == kinetic mechanical transmission mechanism 85 for accommodating the receptacle 8 of the reticle transfer case. Preferably, the reticle storage receptacle can be used to accommodate a reticle transfer box having a human π. The population is connected or associated with at least the cleaning line... the cleaning gas source can be via the -cleaning line and the shelf Connected or associated. Alternatively, the source of cleaning gas can be coupled to a reticle transfer box disposed on the shelf. - An exemplary throwing frame contains an outlet for the source of cleaning gas provided by the cleaning line.参见 See Figures 9, 1G, 11 and 12' for illustrations - the gripper 9〇 is coupled to the reticle transfer case to place and remove the different views of the reticle transfer case from the receptacle. For illustrative purposes, the gripper is shown isolated from the automated mechanical transmission mechanism. In such a configuration, the "difficult jaws" are secured to the recess defined by the prongs by simply inserting the forks 92, 93 under the top flange 96 of the reticle transfer cartridge. Within 98. The gripper is raised to engage the bottom surface of the flange so that the gripper subsequently supports the reticle transfer case. Then, the gripper is moved to convey the reticle transfer case. Specifically, referring to Figures 12 and 13, the gripper has an air flu detector 102, and the air flu detector 102 can be a hot wire anemometer (hot wire) embedded in the hand 1 〇4 of the gripper. Anemometer ). The air flu detector can be used to sense and measure 28 200933779 to measure non-air cleaning gases such as nitrogen and CDA. Referring to Figure 14, a block diagram illustrates an exemplary arrangement of one of the components of sensing system 110. The position of the gripper above the receptacle, as shown in Figure 10, positions the air flu detector over the clean stream exiting the outlet 64 and detects and measures the clean stream. Fig. 15 illustrates an example of an automated mechanical transfer mechanism that moves between rows of receptacles in a storage cabinet to place a reticle transfer box. The sensing system senses and measures the clean airflow as it moves past the clean stream from the outlet on a receptacle. A data point of approximately 1 liter/minute or 5 liters/minute may indicate a problem with the cleaning system. For example, a conventional device can be disposed within the housing for removing the reticle from each of the housings and repositioning the reticle into each of the housings. The device can be a standard mechanical device that includes a drive system. The controller for controlling the drive system of the mechanism can calculate a curve of the motion prior to performing a commanded motion. The controller can also recalculate a curve multiple times until the controller determines the motion to be performed. The mechanism can also include a gripper arm for grasping the reticle transfer case in the storage case. The gripper arm can be driven by a gripper arm drive to move away from and toward the storage housing. The mechanism can include a vertical post that is movably mounted to the vertical post. The vertical movement of the gripper arm relative to the vertical post can be provided by a vertical drive. The mechanism can also include a bracket that rotatably mounts the vertical post thereon. The robotic arm is controlled by a storage cabinet control system. Although the present invention has been described in connection with the preferred embodiments thereof, those of ordinary skill in the art can make equivalent changes, substitutions, and other types of changes to the contents described herein. Such variations as disclosed in all other embodiments may also be included or incorporated in each of the above embodiments. Therefore, the protection granted by the patent certificate 29 200933779 will be limited only by the definition contained in the scope of the accompanying patent application and any equivalent scope thereof. BRIEF DESCRIPTION OF THE DRAWINGS The first drawing is an exploded view of an exemplary reticle transfer case of the system of the present invention; the lb is a perspective view of the reticle transfer case of the first drawing; A schematic diagram of an exemplary filter of a reticle transfer case; FIG. 3 is an illustration of an exemplary filter of a reticle transfer case of the system of the present invention; FIG. 4 is a system of the present invention A schematic diagram of an exemplary cleaning system; Figure 5a is a schematic diagram of an exemplary cleaning system of the system of the present invention; Figure 5b is a schematic diagram of an exemplary cleaning system of the system of the present invention; Figure 6a is a diagram of A top view of an exemplary shelf of the inventive storage receptacle; Figure 6b is a top view of one of the U-shaped alternative storage receptacles, wherein the cleaning exit aperture is located on the adjacent side of the opening; Figure 6c is a light a side view of the cover box and one of the air flow sensors © mechanical grip; Figure 6d is a top view of the grip of the 6c figure, the reticle transfer case and the receptacle; Figure 7a is an example Top view of the reticle transfer box, An exemplary reticle transfer case is housed in a reticle storage receptacle associated with a shelf of the type illustrated in Figure 6a; Figure 7b is a side view of three stacked shelves; Figure 8a A schematic view of an exemplary storage enclosure of the system of the present invention having a mechanical transfer mechanism having a grip; 30 200933779 Figure 8b is an upwardly facing riser of the receptacle and a light placed on the shelf Cover transfer box; Fig. 9 is a plan view of the body; the first picture is a top view of the handle of the shawl-transfer transfer box (four), the reticle transfer box is located at the position of hiding the money (4) Position, this position can be tied
於將光罩傳送盒玫置於容座上過程中或處於移除容座過程中,且 該位置適。於感剛來自容座上之出口之清潔流; 第11圖係為第1G圖所示握爪及光罩傳送盒之俯視圖,其中光 罩傳送盒位於容座上; 第12圖係為—其中具有清潔流感測器之握爪之立體圖; 第13圖係為—具有空氣流感測器之握爪之一延伸部之詳細*** 圖; 第14圖係為感測系統中各組件之連接方塊圖;以及 ❹ ’該等容座具有清潔管線 容座上之光罩傳送盒相嚙合之握爪之立 第15 ®料1表,其解在—儲存櫃巾傳送光罩傳送盒 中清潔流感測系纟細實施之監測。 4·門或基座部 5.0 :孔 6:載具殼或蓋 9 :光罩 11 ·門下表面 14 :光罩支撑件 【主要元件符號說明】 2:光罩傳送盒 5:載具殼或蓋 5-1 :孔 8:氣密性密封之空間 10 :門上表面 12 :橫向壁 31 200933779 16 :光罩側面定位部件 18 : 背面定位部件 20 :中央部 22 : 過遽器 24 :注入或入口孔 25 : 擴散元件 26 :入口接頭 27 : 抽取器接頭 28 :第一過濾層 30 : 第二過濾層 32 :覆蓋片 34 : 過濾、器或過遽層 36 :覆蓋片 38 : 過濾器 40 :第一覆蓋片 42 : 第二覆蓋片 44 :本體部 46 : 過濾、層 48 :複合材料 50 : 清潔系統 52 :清潔系統 54 : 儲存外殼 54.1 :光罩傳送盒儲存櫃 54.2 :封閉之内部環境 4.7 :箭頭 54.8 :過遽器 54.9 :清潔管線 55 : 離化器 56.2 :排出箭頭 56.3 :輔助入口 55 :離化器 56 : 搁架 58 :儲存容座 60 : 連接管 62 :通道 64 : 出σ 64.2 :空間 66 · 光罩傳送盒 68 :搁架 70 : 儲存外殼 70.2 :握爪 70.4 :凸緣 71.2 :空氣流動感測器 71.7 :容座 72 :儲存外殼之空間 74 : 自動化裝置In the process of placing the reticle transfer box on the receptacle or in the process of removing the receptacle, and the position is suitable. The cleaning flow from the outlet on the receptacle is shown in Fig. 1 is a top view of the gripper and the reticle transfer case shown in Fig. 1G, wherein the reticle transfer case is located on the receptacle; Fig. 12 is - A perspective view of a gripper having a cleaned influenza detector; Figure 13 is a detailed exploded view of an extension of a gripper having an air flu detector; and Fig. 14 is a block diagram of connections of components in the sensing system; And ❹ 'The receptacles have the gripper of the reticle transfer box on the clean line receptacle, the 15th material 1 table, the solution is in the storage cabinet towel transfer reticle transfer box to clean the influenza test system Fine implementation of monitoring. 4. Door or base part 5.0: Hole 6: Carrier case or cover 9: Photomask 11 • Door lower surface 14: Photomask support [Main component symbol description] 2: Photomask transfer case 5: Carrier case or cover 5-1: Hole 8: Space for hermetic sealing 10: Door upper surface 12: Transverse wall 31 200933779 16: Mask side positioning member 18: Back positioning member 20: Center portion 22: Filter 24: Injection or inlet Hole 25: Diffusion element 26: Inlet joint 27: Extractor joint 28: First filter layer 30: Second filter layer 32: Cover sheet 34: Filter, or damper layer 36: Cover sheet 38: Filter 40: A cover sheet 42: second cover sheet 44: body portion 46: filter, layer 48: composite material 50: cleaning system 52: cleaning system 54: storage housing 54.1: reticle transfer box storage cabinet 54.2: closed internal environment 4.7: Arrow 54.8: Filter 54.9: Cleaning line 55: Ionizer 56.2: Discharge arrow 56.3: Auxiliary inlet 55: Ionizer 56: Shelf 58: Storage receptacle 60: Connection tube 62: Channel 64: Out σ 64.2: Space 66 · Photomask transfer box 68: Shelf 70: Storage housing 70.2 : Grip 70.4 : Flange 71.2 : Air flow sensor 71.7 : Housing 72 : Space for storage housing 74 : Automation
32 200933779 76 : 清潔管線 78 : 80 : 搁架 82 : 84 : 光罩傳送盒 87 : 90 : 握爪 92 : 93 : 叉子 96: 98 : 凹槽 102 104 :握爪之手部 110 儲存外殼 清潔管線 容座 叉子 頂部凸緣 :空氣流感測器 :感測系統32 200933779 76 : Cleaning line 78 : 80 : Shelf 82 : 84 : Photomask transfer box 87 : 90 : Grip 92 : 93 : Fork 96 : 98 : Groove 102 104 : Hand grip 110 Storage housing cleaning line Rack fork top flange: air flu detector: sensing system
❿ 33❿ 33
Claims (1)
Applications Claiming Priority (1)
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US96476807P | 2007-08-14 | 2007-08-14 |
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TW200933779A true TW200933779A (en) | 2009-08-01 |
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TW97130976A TW200933779A (en) | 2007-08-14 | 2008-08-14 | Stocker with purge condition sensing |
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TW (1) | TW200933779A (en) |
WO (1) | WO2009023787A2 (en) |
Families Citing this family (5)
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CN102376606B (en) * | 2010-08-09 | 2014-03-19 | 家登精密工业股份有限公司 | Mask box provided with sensor |
US10593576B2 (en) | 2015-03-03 | 2020-03-17 | Brooks Automation (Germany) Gmbh | Inspection system |
TWI673565B (en) * | 2018-04-03 | 2019-10-01 | 特銓股份有限公司 | Side cover type box cover device and side cover type box cover method |
US10871722B2 (en) * | 2018-07-16 | 2020-12-22 | Taiwan Semiconductor Manufacturing Co., Ltd. | Photomask purging system and method |
US20220301909A1 (en) * | 2021-03-19 | 2022-09-22 | Taiwan Semiconductor Manufacturing Company Limited | Airflow detection device and methods of use |
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US5351415A (en) * | 1992-05-18 | 1994-10-04 | Convey, Inc. | Method and apparatus for maintaining clean articles |
US7084466B1 (en) * | 2002-12-09 | 2006-08-01 | Novellus Systems, Inc. | Liquid detection end effector sensor and method of using the same |
US8776841B2 (en) * | 2006-06-19 | 2014-07-15 | Entegris, Inc. | System for purging reticle storage |
-
2008
- 2008-08-14 TW TW97130976A patent/TW200933779A/en unknown
- 2008-08-14 WO PCT/US2008/073198 patent/WO2009023787A2/en active Application Filing
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WO2009023787A2 (en) | 2009-02-19 |
WO2009023787A3 (en) | 2009-06-04 |
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