200921290 九、發明說明： 【發明所屬之技術領域】 ·· 本發明係有關使印刷配绩其此★ 裝置。線基板之兩面曝光的兩面曝光 【先前技術】 錢㈣配線基板之表面與背面時光 面同時曝光裝置中，以往為了你主 了，、尤之千仃先兩 里士 * 马了使表面與背面各自曝弁而办· 置有表面用與背面用的兩個燈作為光源。 【發明内容】 (發明欲解決的課題） 惟，在以往的裝置中，由於 ur itt w - '元/原表置有兩台’故因個 別之裝置或燈的個體差異，# 主报\ t 表與背面之曝光條件改變 難，不易處理的問題,。 相同曝光之調整及控制困 卜由於對σ曝光裳置搭载兩台份的光源裝置， 故有成本咼及裝置大型化的問題。 本發明的目的在於上述以往技術之問題。 (解決課題的手段） ' 為了達成上述目的，.本發明之兩面曝光裝置，係具備： 一個光源；分光體’使該光源之光的一半反射，另一半穿 透’第1目田準鏡（colllmati〇n mim小使該分光體所反 ㈣的光照射至屬於曝光對象之印刷配線基板的一面側； 第2猫準鏡’使穿透過該分光體的光照射至屬於曝光對象 之印刷配線基板的-面側；第i光源遮蔽器，設置於上述 320545 5 200921290 、先體'、第1目田準鏡間’調節來自分光體的光量；以及第 、…原‘蔽δ又置於上述分先體與第2瞄準鏡間，調節 * 來自分光體的光量。 在以上的構成巾，使料—之光源，藉由使從該光源 、>射之光的半反射，另一半穿透的分光體而分光為兩個 光束，可實現兩面同時曝光。 (發明的效果） &照本發明之兩面曝光裝置，由於光源為單―，而容 易$行保養。此外交換作業時間縮短，沒有因燈之個體差 ^這成之表面與背面之曝光條件的變化。此外，裝置係小 垔化，5又置空間可較小，而有保養空間等較為寬廣的效果。 更進步有可實現裝置之構造簡單化，裝置成本與運轉成 本降低等的效果。 【實施方式】 以下根據圖式說明本發明之實施形態。 L 在第1圖中，係為以下之構成：屬於曝光對象之基板 50係被載置於光罩52上，且將描繪在位於基板5〇之上方 的光罩51與光罩52之圖案曝光於基板50之表背側。 該兩。面曝光裝置之光源裝置係具備：單一的光源部 、刀光單元2、以及分別設置於基板5〇之表側與背侧的 瞄準鏡3，3 〇 光源部1係具備：光源燈10、橢圓鏡u、反射鏡12、 乂及枚眼透鏡（fly eye lens)l3，其中，從光源燈發出 的光係由橢圓鏡11聚光，並以反射鏡12折返後，以使焦 320545 6 200921290 點集中在複眼透鏡13部分的方式構成。 -分光單元2係具備··分光鏡2〇、以及光源遮蔽哭21 2卜其t，從複眼透鏡13發出的光係由分光鏡2()分光為 反射光與穿透光，個別成為基板5()之表面以及背 用的光。 *元 士在分光鏡20的兩側分別設置光源遮蔽器' 21，2ι，且 藉由該光源遮蔽器21來控制先量。 分光鏡20有許多種类員，例如在破璃形成抓（二氧化 矽)— 或Ta2〇5(五氧化二组）等多層膜者.，或是以格子狀進行 鋁瘵鑛者等較為晋遍，可採用該等之構成。 目苗準鏡3(c〇liimation mirr〇r)係分別配置於基板5〇 的表侧與背側兩方。分光鏡2〇所反射的光係於基板5〇之 表側（上側）的瞒準鏡3被反射，成為平行光，穿透光罩Μ 而照射至基板50的表側上。 另方面，穿透分光鏡2〇的光係於基板5〇之背側（下 側）的目苗準鏡3被反射，成為平行光，穿透光罩52而照射 至基板5 0的背側上。 另外，在瞄準鏡3, 3設置有累積光量計（未圖示），並 根據該S積光1計之光量測定進行光源遮蔽器21，21的控 制，以進行光量的調整。 ，依據以上的構成，由於單一光源部i的冑光光係於分 光鏡20被分光’並藉由瞄準鏡3, 3在基板5〇的表裡曝光， 故可由單一的光源部丨進行兩面曝光。 因此，沒有光源部1或光源燈10之個體差異，不進行 320545 7 200921290 麻煩的凋整或控制而可使基板5 〇之表面與背面的曝光條 件統—。此外’可實現成本的降低、裝置的小型化。 【圖式簡單說明】 第1圖係顯示本發明之一實施形態的概要圖。 主要元件符號說明】 1 光源部 3 2 分光單元 猫準鏡 1 橢圓鏡 13 複眼透鏡 21 光源遮蔽器 51 ' Μ光罩 10 光源燈 12 反射鏡 20 分光鏡 50 基板 320545 8200921290 IX. Description of the Invention: [Technical Field to Which the Invention Is A.] The present invention relates to a device for making a print performance. Two-sided exposure of the two sides of the line substrate [Prior Art] The surface of the wiring substrate and the back surface of the light surface are simultaneously exposed to the device. Since it is exposed, two lamps for the surface and the back are used as the light source. SUMMARY OF THE INVENTION (Problems to be Solved by the Invention) However, in the conventional device, since there are two sets of ur itt w - 'yuan/original table, the individual difference of the individual devices or lamps, #主报The exposure conditions of the watch and the back are difficult to change, and it is difficult to handle. Adjustment and Control of the Same Exposure Because there are two sets of light source devices mounted on the σ exposure, there is a problem of cost and large size of the device. The object of the present invention is to solve the above problems of the prior art. (Means for Solving the Problem) In order to achieve the above object, the double-sided exposure apparatus of the present invention comprises: one light source; the light splitter 'reflects half of the light of the light source, and the other half penetrates the 'first 1 field microscope ( Colllmati〇n mim causes the light of the opposite (4) of the beam splitter to be irradiated to one side of the printed wiring board to be exposed; and the second cat sight mirror 'illuminates the light that has passed through the beam splitter to the printed wiring board to be exposed The i-light source shader is disposed in the above-mentioned 320545 5 200921290, the precursor ', the first object, the first mirror, and adjusts the amount of light from the beam splitter; and the first ... The amount of light from the beam splitter is adjusted between the precursor and the second scope. In the above composition, the light source of the material is half-reflected by the light emitted from the light source and the other half. The light splitter is split into two light beams, and simultaneous exposure of both sides can be achieved. (Effect of the Invention) According to the two-side exposure apparatus of the present invention, since the light source is single, it is easy to maintain. In addition, the exchange operation time is shortened, and there is no cause. light Individual difference ^ This is the change of the exposure conditions on the surface and the back. In addition, the device is small, the space can be smaller, and there is a wider effect of maintenance space. More advanced can realize the simple structure of the device [Embodiment] The embodiment of the present invention will be described below with reference to the drawings. L In the first embodiment, the configuration is as follows: the substrate 50 to be exposed is placed. The mask 52 and the mask 52 are exposed on the front and back sides of the substrate 50. The light source device of the two-surface exposure device has a single light source. The unit, the knife unit 2, and the scopes 3 and 3 disposed on the front side and the back side of the substrate 5, respectively, and the light source unit 1 includes a light source lamp 10, an elliptical mirror u, a mirror 12, a pupil, and an eye lens ( The fly eye lens l3, wherein the light emitted from the light source lamp is condensed by the elliptical mirror 11 and folded back by the mirror 12, so that the focal point 320545 6 200921290 is concentrated on the portion of the fly-eye lens 13. - Splitting unit 2 series has ·· The beam splitter 2〇 and the light source shield the crying 21 2, and the light emitted from the fly-eye lens 13 is split by the beam splitter 2 () into reflected light and transmitted light, and individually becomes the surface of the substrate 5 () and used for backing. Light. * The Yuanshi sets the light source shutters '21, 2ι on both sides of the beam splitter 20, and controls the amount by the light source shutter 21. The beam splitter 20 has many types of members, for example, in the form of broken glass. (Secondary cerium oxide) - or a multilayer film such as Ta2 〇 5 (penta pentoxide group), or a group of bismuth ore bismuth or the like, which can be used in the form of lattices. The c〇liimation mirr〇r) is disposed on both the front side and the back side of the substrate 5〇. The light reflected by the dichroic mirror 2 is reflected on the front side (upper side) of the substrate 5A, and is reflected as parallel light, and is transmitted through the mask Μ to the front side of the substrate 50. On the other hand, the light passing through the dichroic mirror 2 系 is reflected on the back side (lower side) of the substrate 5〇, and is reflected as parallel light, which penetrates the mask 52 and is irradiated to the back side of the substrate 50. on. Further, an accumulating light amount meter (not shown) is provided in the scopes 3, 3, and the light source shutters 21, 21 are controlled based on the light amount measurement of the S accumulated light 1 to adjust the amount of light. According to the above configuration, since the dimming light of the single light source unit i is split by the beam splitter 20 and is exposed by the scopes 3 and 3 on the surface of the substrate 5, the double-sided exposure can be performed by a single light source unit. . Therefore, there is no individual difference between the light source unit 1 or the light source lamp 10, and the exposure conditions of the surface of the substrate 5 and the back surface can be made without the troublesome trimming or control of 320545 7 200921290. In addition, cost reduction and miniaturization of the device can be achieved. BRIEF DESCRIPTION OF THE DRAWINGS Fig. 1 is a schematic view showing an embodiment of the present invention. Main component symbol description] 1 Light source part 3 2 Splitting unit Cat sight glass 1 Elliptical mirror 13 Complex eye lens 21 Light source shutter 51 'Tuning cover 10 Light source lamp 12 Mirror 20 Beam splitter 50 Substrate 320545 8