200920465 九、發明說明 【發明所屬之技術領域】 本發明係有關於一種適合於包含有至少二種液體相之 多相化學反應用的直立式反應爐的反應爐底。該等液體相 必須要分別地自該反應爐分別地排放出來。 【先前技術】 就此而言，反應爐底要設置一種分離裝置，其係設計 成可讓液體相部份的臨時性變化亦可被分離開而個別地排 放出去’再者’溶解或懸浮於該等液體內的氣泡亦可被移 除。 許多的技術文件及工業文獻均描述過供包含有二種液 體及一種氣體相之系統使用的分離裝置，本文中特別要強 調的是 “Wayne D. Monnery, William Y. Svrcek; Successfully Specify Three-Phase Separators; Chemical Engineering Progress; September 1 994，Pages 2 9 to 40” 的出版物。 在大部份的情形中，水平或直立設置的容器上設有一 設於底部供高密度液體相使用的排放管嘴、一設於頂部供 氣體相使用的排放設備、以及一於其他之排放裝置之間某 處而供低密度相使用的排放設備。該等容器在不同的位置 處設有分隔板、堰部、以及沉浸封隔件，其等係設置成僅 於各排放末端處得到所需的相。 如果一反應爐係用於產生多種不同的相，則在反應爐 -5- 200920465 排放末端會產生一問題，亦即得到該等相位的穩定輸出而 使其得以在排放管線及下游側輸送設備內避免相的解離， 其中有可能會發生氣體封圍、孔穴、以及類似的技術問 題。再者，現有的型式並不適合於直接整合於反應爐上。 【發明內容】 因此，本發明的目的是要提供一種多相反應爐，以及 一種多相分離及排放用的裝置，其等可整合成使前述問題 不會發生。 前述目的是由前面所提及而定義於申請專利範圍第1 項內的裝置來加以達成的，因此是透過一直立配置之反應 爐的反應爐底來加以達成的，該反應爐係適合用於進行具 有至少二液體相的多相化學反應，具有下列的技術細節： • 三個靠在一起設置的腔室，由分隔壁加以分隔 開； • 該等腔室在氣體側係可供穿入至該反應爐內，以 及 • 其等全部具有至少一位在底部的排放裝置， • 該等腔室中的二個係被防護免於來自該反應爐的 液體向下流的流入， • 該第三腔室設有一塡充裝置，設置於頂部，適合 於供來自該反應爐之液體向下流的流入，以及 • 該另外二個腔室之每一者均有一供液體流通的連 接部， -6- 200920465 • 該第三腔室連通至該等另二腔室之一者的液體連 接部可以讓來自該第三腔室的液體溢流至相關的另一腔室 內，以及 • 該第三腔室具有一沉浸式封隔件，來自該第三腔 室的液體在溢流至該另一腔室內之前必須要通過該沉浸式 封隔件，以及 • 該第三腔室連通至該二腔室之另一者的液體連接 部可以讓液體自該第三腔室流入至位在該第三腔室內一低 點處的冒口內，以及 • 該冒口係設計成可讓液體由該低點以向上流動的 方式流動通過該冒口，以及 • 該冒口具有一出口開通至該等二腔室中的另一 者，上升的液體可經由之而溢流過一堰部，因之而自由地 進入至該二腔室中的該另一者內。 在該反應爐運轉時，來自反應區域內的多相混合物會 進入至反應爐底，其一或多種液體相有時也會含有氣體相 的氣泡。如果是使用殻管式反應爐的話，則該多相混合物 亦可離開個別的管子。當二腔室被防護免於液體向下流的 流入時，全部的液體會流入至該第三腔室內而在其產生相 解離，高密度液體相會向下流，而低密度液體相則向上 流，可能伴隨著氣泡流動。 低密度液體相會通過一堰部，流入至其餘二個腔室中 一個內，而高密度液體相則進入至位在第三腔室之低點處 的冒口內，並前進至該二被防護免於液體向下流流入的腔 200920465 室中的另一者內。低密度及高密度液體相會自該二被防護 免於液體向下流流入的腔室內排出。 當這二個被防護免於液體向下流流入的腔室及該第三 腔室係連接至氣體側時，所有的腔室均是在相同的壓力運 作。因此，液體要自其內排出的這些腔室的液位幾乎可以 無止盡加以調整，使得其不需要供此目的用的個別進給桶 槽，這是本發明的一項優點。各液位的最大高度一方面是 由溢流堰部加以限制，而另一方面則是由冒口的高度加以 限制。 根據本發明之一實施例，該等靠在一起而將各個腔室 互相分隔開的壁係直立地配置。在本發明的另一實施例 中，該等靠在一起而將腔室分隔開的壁係設計成平直表 面，其可節省製造成本。根據本發明的另一實施例，該等 靠在一起而將腔室分隔開的壁係設計成自該反應爐中心線 沿著徑向方向指向外側的表面。 這些直立分隔壁原則上是能以多種方式加以配置，其 中的二種配置在圓形的反應爐截面的情形中是有其優點。 一方面，該等分隔壁可以裝設成互相平行，以使得腔室的 截面成爲一圓的片段，而另一方面，該等分隔壁可以設置 成自該中心線徑向地朝向外壁，以使得該等腔室截面成爲 一圓的扇弧區。在後一種情形中，該等分隔壁可以配置並 固定成能讓個別腔室的容積能透過移動扇弧區邊界而加 大，如果反應技術要改變成會使個別相的比例也改變的程 度的話。平直的表面有助於節省材料。但是，在特定的情 -8- 200920465 形中，其會有需要裝設具有較大而爲邊緣至邊緣之長度的 溢流堰部，以供在堰部區域內減低流動速度。在這些情形 中，設置捲曲的表面來做分隔壁是會是有用的。 根據本發明的另些實施例，該等三個腔室中至少有二 個具有人孔，可供在開啓時進入。該免於液體向下流流入 的防護係由設置在該等腔室上方的傾斜表面來加以達成 的。其建議是讓位於該等腔室上方的該等板表面牢固地連 接至該等溢流堰部的沉浸式封隔件上。 在本發明的另些實施例中，該免於液體向下流流入之 防護的氣體穿入性係由每一腔室上的至少一開口來加以確 保的，該開口在向上方向上是由一罩蓋加以封蓋住，且在 流出之液體的流動方向上是由一包封住該開口的液體偏導 件加以防護。可以有利地將該罩蓋及該液體偏導件設計成 一結構單元。 本發明的另些實施例是有關於該冒口，其可設置成一 升流管，且係配置於該腔室空間的上游側區域內，該上游 側區域係包圍著該升流管的液體排放口。在此情形中，由 該反應爐進入至該第三腔室及在液流上將該第三腔室連接 至該等另二腔室之一者內的該升流管內的液體進料，自垂 直方向視之，係水平地互相偏離開。該升流管連接至該第 三腔室亦可設有一液體偏導件，設置於該升流管的入口的 前方，此可額外地有助於防止低密度相跟隨之流動。 做爲一選項，其可以分隔出該第三腔室之一區域。此 區域在底部具有一入口，並具有通向該第三腔室的開口， -9- 200920465 以及一位於頂部而朝向該腔室的排放口，該腔室可供收集 該高密度液體相。 【實施方式】 本發明將依據第1圖至第6圖中所示來加以說明，其 中顯示出一典型的結構，但本發明並不僅限於此範例。第 1圖顯示出一設有本發明所述之裝置的反應爐底的縱向 圖。第2圖至第4圖顯示出該反應爐底的三個剖面圖A-A’、B-B’、以及C-C’。第5圖顯示出根據申請專利範圍 第5項之分隔壁之設計變化的另一種型式剖面圖C-C’。 第6圖顯示出冒口的另一種型式。 第1圖顯示出在上半部設有反應區域2 (僅以叉叉標 示）的反應爐1的下半部。此區域內所發生的化學反應會 在有一氣體相存在的情形下產生二種無法混合而具有不同 密度的液體相，該等氣體有一部份會被封圍於該二液體相 內而成爲小氣泡。如此生成的液體會因重力而向下落至蓋 板3及4上，並進入至間隙型式開口 5內。 蓋板3及4上設有開口 6及7，其等係受罩蓋8及9 的防護而免於液體向下流的流入。罩蓋8及9係固定成可 讓沿任何方向通過開口 6及7的氣體無法攜帶來自蓋板3 及4的液體向下流。該氣體可經由氣體開口 1 〇而自反應 爐1內移除。 任何經由間隙型式開口 5進入的液體向沿著分隔壁 11向下流入至分離腔室12內，此二液體相會在該分離腔 -10- 200920465 室內分離開，並形成一相分離層13。此二相中的低密度 液體相在分離腔室12內會聚集於層13的上方，並經由堰 部1 4排於進入至腔室1 5內。 此腔室1 5的容積大小係可使其不需要設置下游側進 料容器。爲可供能在不管製程爲的情形下，在腔室15內 進行各種的液位調整，必須要設置開口 7，其可進行桶槽 透氣的功能。如果此環境內有較大量的氣體流動，並影響 到反應區域2內的化學反應’則氣體開口 1 〇可以施行氣 體回送方法。由化學反應所形成的氣體可經由該側向氣體 開口 1 0來加以分別地移除。 爲防止未解離的液體部份在通過間隙型式開口 5及堰 部1 4後直接進入至腔室1 5內，在此裝設有沉浸式封隔件 1 6。該丨几浸式封隔件可以设3十成如冋分隔板_樣，其下方 邊緣一定要位在相分離層13的上方。 該二液體相中的高密度相會在分離腔室12內聚集於 相分離層1 3的下方。該高密度相會經由升流管1 7排出， 該升流管係在液流上將分離腔室1 2連接至供高密度相使 用的腔室18。升流管17連通至腔室18的分枝貫穿過分 隔壁11而進入至分離腔室12內。此系統構成一液體改向 方法。因此’如果低密度相的液滴跟隨排放流通過間隙型 式開口 5，則該等液滴會被改向成水平向，有助於他們重 新進入至上升流內。亦可裝設其他的改向設備，以進一步 減低液體向下流的垂直速度，因之而減低跟隨著的液滴 量。 -11- 200920465 升流管1 7的出口大小及位置必須要是使其可以永遠 於腔室1 8內的液位上方。腔室1 8的容積小同樣是可以使 其不需要下游側進料桶槽。爲可供能在不管製程爲的情形 下，在腔室1 8內進行液位調整，必須要設置開口 6，以 進行桶槽透氣的功能。 腔室1 5與1 8的容積比値應該是大約爲低及高密度相 間的比値；腔室1 8的容積係由升流管1 7的上方邊緣起加 以計算，而腔室1 5則是由堰部1 4的高度起來加以計算。 升流管1 7及堰部1 4的相對高度亦代表相分離層1 3的位 置，因此是代表沉浸式封隔件1 6的深度，其必定不可超 過自堰部1 4測量起的高度，亦即Η!。此高度Η,是堰部 1 4與升流管1 7之出口間的高度差ΔΗ與高密度液體之密 度的乘積除以該二液體間的密度差。其與高度Η2無關， 亦即高密度液體位於相分離表面下方的液柱高度。在實務 上，這表示腔室15及18的容積大小可藉由延長液柱底部 之長度而滿足於任何所需之容積。此大小的下限可自相分 離層13必須要位於升流管17入口的下方這一事實來推求 得知。 腔室15的產物排放口 19，以及腔室18的產物排放 口 2 0，必須要在反應爐底上設置成儘可能地低，以使得 該爐底可以完全地排空。爲能將分離腔室12也完全地排 放完畢，也爲能移除諸如觸媒顆粒或類似者之類的固態沉 積物，分離腔室12在底部設有一出口 21。腔室15及18 之每一者均分別設有一人孔22或23，以便能進行清潔及 -12- 200920465 組裝作業。 第2圖顯不出第1圖中所示之反應爐1的爐底的示意 剖面圖A-A’’其在此例中是一平面圖。反應區域2所生 成的氣體/液體混合物會掉落至蓋板3及4上，並進入至 間隙型式開口 5內’該間隙型式開口在此設計中所具有的 長度係僅涵蓋住位於下方之分離腔室12的寬度的一部 份。所得到之液體的主要部份會沿著分隔壁1 1流下。 第2圖亦顯示出罩蓋8及9，以及在此無法看到但以 虛線圓圏加以標示而位於該等罩蓋下方的開口 6及7。在 有需要時，該等開口可用來將來自氣體開口 1 0的氣體加 以移除。再者，在此也顯示出人口 22及23。 第3圖顯示出具有第1圖所示之爐底的反應爐1自下 方側觀視時的示意剖面圖B-B ’。與第2圖中一樣，在此 可以看到蓋板3及4，以及間隙型式開口 5、氣體開口 1 0 及分隔壁1 1。開口 6及7可自此下方側直接看到，第3 圖中另外顯示出堰部14及沉浸式封隔件16。爲能在堰部 1 4的區域及在沉浸式封隔件1 6的下方邊緣處得到儘可能 地緩慢及平靜的液流，堰部1 4及沉浸式封隔件1 6係以可 能的全寬來設置的。 第4圖顯示出前述具有第1圖所示之爐底的反應爐1 的示意剖面圖.C-C’。此圖中包含有分隔壁I1及堰部14 的下半部、產物排放口 1 9及2 0、排放管嘴2 1、以及升流 管17，該管貫穿過分隔壁11而進入至分離腔室12內。 第5圖顯示出具有不同於第1圖所示之設計的反應爐 -13- 200920465 底的不意剖面圖C-C’’亦即腔室15及18以及分離腔室 12各自的截面構成爲圓形的扇弧區域。雖然產物排放口 19及20、排放管嘴21、以及貫穿過分隔壁u進入至分 離腔室1 2內的升流管1 7係設計成幾乎一樣，但此例中的 堰部1 4較短。此縮短情形在技術上是可行且有用的，如 果該二種液體具有特別好的解離效果，且密度上的差値夠 大而可確保高密度相不會在較低的流動速度下跟隨著向上 流動。在此情形中，分隔壁1 1包含有二部份，其中一部 份是腔室15中朝向著分離腔室12者，而另一部份則是朝 向著腔室1 8者。如果蓋板3及4是設計成漏斗的形式， 則分隔壁1 1及堰部1 4可以製做成可移動的形式，以使其 可以滿足於製造低密度及高密度液體相所需的不同條件， 亦即提供腔室15及18適當的容積。 第6圖顯示出一冒口的示意圖，其係由與第三腔室隔 開的區域所構成的，用來做爲升流管1 7。該管的下方區 段具有一開口，朝向著分離腔室12，在實務上，其可以 設計成讓用來將升流管1 7自分離腔室1 2上分隔開的分隔 板無需向下伸至最低的柱盤內。上半區域則具有一開口， 朝向著腔室18。此升流管17具有一蓋，位在向上的方向 上，甚至可以製做成相對於分離腔室1 2呈氣密狀。 【圖式簡單說明】 第1圖顯示出一設有本發明所述之裝置的反應爐底的 縱向圖。 -14- 200920465 第2圖至第4圖顯示出該反應爐底的三個剖面圖A-A’、B-B’、以及 C-C’。 第5圖顯示出根據申請專利範圍第5項之分隔壁之設 計變化的另一種型式剖面圖C-C’。 第6圖顯示出冒口的另一種型式。 【主要元件符號說明】 1 :反應爐 2 :反應區域 3 :蓋板 4 :蓋板 5 :間隙型式開口 6 :開口 7 :開口 8 :罩蓋 9 :罩蓋 1 〇 :氣體開口 1 1 :分隔壁 12 :分離腔室 1 3 :相分離層 1 4 :堰部 1 5 :腔室 1 6 :沉浸式封隔件 1 7 :升流管 -15- 200920465 1 8 :腔室 1 9 :產物排放口 2 〇 :產物排放口 2 1 :排放管嘴 22 :人孔 23 :人孔BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a reaction furnace bottom suitable for an upright reactor for multiphase chemical reaction comprising at least two liquid phases. The liquid phases must be separately discharged from the reactor separately. [Prior Art] In this regard, the bottom of the reaction furnace is provided with a separation device designed to allow temporary changes in the liquid phase portion to be separated and individually discharged to be 'dissolved' or dissolved in the reactor. Bubbles in the liquid can also be removed. Many technical documents and industrial literature describe separation devices for systems containing two liquids and one gas phase. In this article, "Wayne D. Monnery, William Y. Svrcek; Successfully Specify Three-Phase" is particularly emphasized. Separators; Chemical Engineering Progress; September 1 994, Pages 2 9 to 40" publication. In most cases, the horizontally or uprightly disposed container is provided with a discharge nozzle disposed at the bottom for the high density liquid phase, a discharge device disposed at the top for the gas phase, and one of the other discharge devices. Emission equipment for use in a low density phase somewhere. The containers are provided at different locations with dividers, crotch, and immersion packs that are arranged to obtain the desired phase only at each discharge end. If a reactor is used to produce a plurality of different phases, a problem arises at the end of the reactor-5-200920465 discharge, that is, a stable output of the phases is obtained so that it can be in the discharge line and downstream conveying equipment. Avoid phase dissociation, where gas entrapment, voiding, and similar technical problems may occur. Furthermore, the existing versions are not suitable for direct integration into the reactor. SUMMARY OF THE INVENTION Accordingly, it is an object of the present invention to provide a multi-phase reaction furnace, and a device for multiphase separation and discharge, which can be integrated so that the aforementioned problems do not occur. The foregoing object is achieved by the apparatus as defined in the first item of the patent application, and is therefore achieved by the reaction bottom of the reactor in an upright configuration, which is suitable for use in a reaction furnace. Performing a multiphase chemical reaction with at least two liquid phases with the following technical details: • Three chambers placed together, separated by a dividing wall; • These chambers are permeable to the gas side Up to the reactor, and • all of them have at least one discharge device at the bottom, • two of the chambers are protected from inflow of liquid from the reactor, • the third The chamber is provided with a charging device, disposed at the top, adapted to flow downward from the liquid of the reaction furnace, and • each of the other two chambers has a connection for liquid circulation, -6- 200920465 • The liquid connection of the third chamber to one of the other chambers allows liquid from the third chamber to overflow into the associated other chamber, and • the third chamber An immersed pack member, liquid from the third chamber must pass through the immersed packer before overflowing into the other chamber, and • the third chamber communicates to the other of the two chambers a liquid connection portion allows liquid to flow from the third chamber into a riser at a low point in the third chamber, and • the riser is designed to allow liquid to pass upward from the low point Flowing through the riser, and • the riser has an outlet open to the other of the two chambers through which the ascending liquid can overflow and pass freely Up to the other of the two chambers. During operation of the reactor, the multiphase mixture from the reaction zone will enter the bottom of the reactor and one or more of the liquid phases will sometimes contain gas bubbles. If a shell and tube reactor is used, the multiphase mixture can also exit individual tubes. When the two chambers are protected from the inflow of liquid downflow, all of the liquid will flow into the third chamber where it will dissociate, the high density liquid phase will flow downward, and the low density liquid phase will flow upwards. May be accompanied by the flow of bubbles. The low-density liquid phase flows through one of the helium into one of the remaining two chambers, while the high-density liquid phase enters into the riser at the low point of the third chamber and proceeds to the second The protection is protected from the flow of liquid downward into the other chamber of the chamber 200920465. The low density and high density liquid phase will be discharged from the chamber where the second is protected from the downward flow of liquid. When the two chambers are protected from the downward flow of liquid and the third chamber is connected to the gas side, all of the chambers operate at the same pressure. Therefore, the liquid level of the chambers from which the liquid is to be discharged can be adjusted almost indefinitely so that it does not require individual feed tanks for this purpose, which is an advantage of the present invention. The maximum height of each liquid level is limited by the overflow weir on the one hand and by the height of the riser on the other hand. According to an embodiment of the invention, the walls that are spaced apart to separate the chambers from each other are arranged upright. In another embodiment of the invention, the walls that are spaced together to separate the chambers are designed as a flat surface that saves manufacturing costs. According to another embodiment of the invention, the walls that are spaced apart to separate the chambers are designed to point outwardly from the centerline of the reactor in a radial direction. These upstanding partition walls can in principle be configured in a number of ways, two of which have advantages in the case of a circular reactor section. In one aspect, the dividing walls can be mounted parallel to each other such that the cross-section of the chamber becomes a circular segment, and on the other hand, the dividing walls can be disposed radially from the centerline toward the outer wall such that The equal chamber section becomes a circular arc area. In the latter case, the dividing walls can be configured and fixed so that the volume of the individual chambers can be increased by moving the boundary of the arcing zone, if the reaction technique is to be changed to such an extent that the proportion of the individual phases also changes. . A flat surface helps save material. However, in the particular case -8-200920465, it would be necessary to install a weir portion having a larger edge to edge length to reduce the flow velocity in the crotch region. In these cases, it may be useful to provide a curled surface as a dividing wall. According to further embodiments of the invention, at least two of the three chambers have a manhole for access when opened. This protection against the downward flow of liquid is achieved by inclined surfaces disposed above the chambers. The suggestion is to have the surfaces of the panels above the chambers securely attached to the immersed packs of the weirs. In other embodiments of the invention, the gas penetration of the shield from the downward flow of liquid is ensured by at least one opening in each chamber, the opening being covered by a cover in the upward direction The lid is capped and protected by a liquid deflector enclosing the opening in the direction of flow of the flowing liquid. The cover and the liquid deflector can advantageously be designed as a structural unit. Further embodiments of the present invention relate to the riser, which may be disposed as a riser tube and disposed in an upstream side region of the chamber space, the upstream side region surrounding the liquid discharge of the riser tube mouth. In this case, the liquid feed from the reactor into the third chamber and the third chamber in the flow to the riser in one of the other chambers, Viewed from the vertical direction, they are horizontally offset from each other. The riser tube is coupled to the third chamber and may also be provided with a liquid deflector disposed in front of the inlet of the riser tube, which may additionally help prevent low density followed flow. As an option, it can separate an area of the third chamber. This region has an inlet at the bottom and has an opening to the third chamber, -9-200920465 and a vent located at the top toward the chamber for collecting the high density liquid phase. [Embodiment] The present invention will be described with reference to Figs. 1 to 6, in which a typical structure is shown, but the present invention is not limited to this example. Figure 1 shows a longitudinal view of a reaction furnace bottom provided with the apparatus of the present invention. Figures 2 through 4 show three cross-sectional views A-A', B-B', and C-C' of the bottom of the reactor. Fig. 5 is a view showing another type of sectional view C-C' of the design change of the partition wall according to the fifth aspect of the patent application. Figure 6 shows another version of the riser. Fig. 1 shows the lower half of the reaction furnace 1 in which the reaction zone 2 (only indicated by a fork) is provided in the upper half. The chemical reaction occurring in this region produces two liquid phases which cannot be mixed and have different densities in the presence of a gas phase, and some of the gases are enclosed in the two liquid phases to become small bubbles. . The liquid thus generated falls by gravity to the cover sheets 3 and 4 and enters into the gap type opening 5. The covers 3 and 4 are provided with openings 6 and 7, which are protected by the cover 8 and 9 from the downward flow of liquid. The covers 8 and 9 are fixed so that the gas passing through the openings 6 and 7 in any direction cannot carry the liquid from the covers 3 and 4 downward. This gas can be removed from the reactor 1 via the gas opening 1 。. Any liquid entering via the gap pattern opening 5 flows downwardly along the partition wall 11 into the separation chamber 12, and the two liquid phases are separated in the separation chamber -10-200920465 chamber, and a phase separation layer 13 is formed. The low density liquid phase of the two phases will collect above the layer 13 in the separation chamber 12 and will enter the chamber 15 via the weir portion 14. The volume of this chamber 15 is such that it does not require the provision of a downstream side feed container. In order to be able to perform various liquid level adjustments in the chamber 15 in the case where the control is not possible, it is necessary to provide an opening 7, which can perform the function of venting the tank. If there is a relatively large amount of gas flowing in this environment and affects the chemical reaction in the reaction zone 2, then the gas opening 1 〇 can perform the gas return method. Gas formed by the chemical reaction can be separately removed via the lateral gas opening 10. In order to prevent the undissociated liquid portion from entering the chamber 15 directly after passing through the gap pattern opening 5 and the weir portion 14, there is provided an immersed packer 16 . The immersed packer may be provided with 30% of the slabs, and the lower edge thereof must be positioned above the phase separation layer 13. The high density phase in the two liquid phases will collect below the phase separation layer 13 in the separation chamber 12. The high density phase is discharged via a riser tube 17 which connects the separation chamber 12 to the chamber 18 for use in the high density phase on the liquid stream. The branch of the riser tube 17 that communicates with the chamber 18 extends through the partition wall 11 into the separation chamber 12. This system constitutes a liquid redirection method. Thus, if droplets of the low density phase follow the discharge stream through the gap pattern opening 5, the droplets will be redirected to a horizontal orientation, facilitating their re-entry into the upflow. Other redirecting devices can also be installed to further reduce the vertical velocity of the liquid downflow, thereby reducing the amount of droplets that follow. -11- 200920465 The outlet of the riser 1 7 must be sized and positioned so that it can always be above the level in the chamber 18. The small volume of the chamber 18 is also such that it does not require a downstream side feed tank. In order to be able to adjust the liquid level in the chamber 18 without the control, the opening 6 must be provided to perform the function of the tank groove. The volume ratio 腔 of the chambers 15 to 18 should be approximately the ratio of the low and high density phases; the volume of the chamber 18 is calculated from the upper edge of the riser tube 17, while the chamber 15 is It is calculated from the height of the crotch 14. The relative heights of the riser tube 17 and the jaw portion 14 also represent the position of the phase separation layer 13 and therefore represent the depth of the immersed packer 16 which must not exceed the height measured from the jaw portion 14 . That is to say! This height Η is the product of the height difference ΔΗ between the crotch portion 14 and the outlet of the riser pipe 17 and the density of the high-density liquid divided by the density difference between the two liquids. It is independent of the height Η2, that is, the height of the liquid column below which the high-density liquid is located. In practice, this means that the volume of chambers 15 and 18 can be satisfied by any desired volume by extending the length of the bottom of the column. The lower limit of this size can be derived from the fact that the phase separation layer 13 must be located below the inlet of the riser tube 17. The product discharge port 19 of the chamber 15, and the product discharge port 20 of the chamber 18, must be placed as low as possible on the bottom of the reaction chamber so that the furnace bottom can be completely emptied. In order to be able to completely discharge the separation chamber 12 as well as to remove solid deposits such as catalyst particles or the like, the separation chamber 12 is provided with an outlet 21 at the bottom. Each of the chambers 15 and 18 is provided with a manhole 22 or 23, respectively, for cleaning and -12-200920465 assembly work. Fig. 2 shows a schematic sectional view A-A'' of the hearth of the reactor 1 shown in Fig. 1, which is a plan view in this example. The gas/liquid mixture generated in the reaction zone 2 will fall onto the cover plates 3 and 4 and into the gap pattern opening 5. The gap type opening has a length in this design that only covers the separation below. A portion of the width of the chamber 12. The main portion of the resulting liquid will flow down the partition wall 1 1 . Figure 2 also shows the covers 8 and 9 and the openings 6 and 7 which are not visible here but are indicated by dashed circles and which are located below the covers. These openings can be used to remove gas from the gas opening 10 as needed. Furthermore, populations 22 and 23 are also shown here. Fig. 3 is a schematic cross-sectional view B-B' showing the reaction furnace 1 having the furnace bottom shown in Fig. 1 viewed from the lower side. As in Fig. 2, the cover plates 3 and 4, as well as the gap type opening 5, the gas opening 10 and the partition wall 11 can be seen here. The openings 6 and 7 can be seen directly from the lower side, and the crotch portion 14 and the immersed packer 16 are additionally shown in Fig. 3. In order to be able to obtain as slowly and calmly as possible a flow in the region of the crotch portion 14 and at the lower edge of the immersed packer 16, the crotch portion 14 and the immersed packer 16 are possible Wide to set. Fig. 4 is a schematic cross-sectional view showing a reaction furnace 1 having the hearth shown in Fig. 1 and showing a C-C'. The figure includes a partition wall I1 and a lower half of the weir portion 14, a product discharge port 19 and 20, a discharge nozzle 21, and a riser pipe 17, which penetrates through the partition wall 11 and enters the separation chamber. 12 inside. Figure 5 shows an unintentional cross-sectional view C-C'' of the reactor-13-200920465 bottom having a design different from that shown in Fig. 1, that is, the respective sections of the chambers 15 and 18 and the separation chamber 12 are rounded. Shaped arc area. Although the product discharge ports 19 and 20, the discharge nozzle 21, and the riser pipe 17 that has passed through the partition wall u into the separation chamber 12 are designed to be almost the same, the crotch portion 14 in this example is short. This shortening is technically feasible and useful if the two liquids have a particularly good dissociation effect and the difference in density is large enough to ensure that the high density phase does not follow upwards at lower flow velocities. flow. In this case, the partition wall 11 includes two portions, one of which is the one facing the separation chamber 12 in the chamber 15, and the other portion facing the chamber 18. If the cover plates 3 and 4 are in the form of a funnel, the partition wall 1 1 and the weir portion 14 can be made in a movable form so that it can satisfy the requirements for manufacturing a low-density and high-density liquid phase. Conditions, that is, providing appropriate volumes for chambers 15 and 18. Fig. 6 shows a schematic view of a riser which is formed by a region spaced apart from the third chamber and is used as a riser tube 17. The lower section of the tube has an opening facing the separation chamber 12, which in practice may be designed such that the dividing plate used to separate the riser tube 1 from the separation chamber 1 2 need not be Draw down to the lowest column. The upper half has an opening that faces the chamber 18. The riser tube 17 has a cover which is located in the upward direction and can even be made airtight with respect to the separation chamber 12. BRIEF DESCRIPTION OF THE DRAWINGS Fig. 1 is a longitudinal view showing a reaction furnace bottom provided with the apparatus of the present invention. -14- 200920465 Figures 2 through 4 show three cross-sectional views A-A', B-B', and C-C' of the bottom of the reactor. Fig. 5 shows another type of sectional view C-C' of the design change of the partition wall according to item 5 of the patent application. Figure 6 shows another version of the riser. [Explanation of main components] 1 : Reaction furnace 2 : Reaction zone 3 : Cover 4 : Cover 5 : Gap type opening 6 : Opening 7 : Opening 8 : Cover 9 : Cover 1 〇 : Gas opening 1 1 : Partition wall 12: separation chamber 13: phase separation layer 1 4: jaw portion 15: chamber 16: immersed packer 1 7: riser tube-15- 200920465 1 8 : chamber 19: product discharge Port 2 〇: product discharge port 2 1 : discharge nozzle 22 : manhole 23 : manhole