TW200900726A

TW200900726A - Layer system for wipe-resistant reflectors

Info

Publication number: TW200900726A
Application number: TW097107266A
Authority: TW
Inventors: Torsten Schmauder
Original assignee: Leybold Optics Gmbh
Priority date: 2007-02-28
Filing date: 2008-02-29
Publication date: 2009-01-01
Also published as: TWI417565B; DE102007010124A1; WO2008104389A2; WO2008104389A3

Abstract

In the layer system for wipe-resistant optical reflectors on a substrate, comprising an optically reflective material layer and a transparent upper layer structure disposed on the side of the metal layer opposite the substrate, wherein the layer structure comprises a cover layer made of a hard layer deposited based on a plasma method, the hard layer being based on at least one silicone-organic compound and optionally having at least one intermediate layer, it is provided that the layer thickness of the upper layer structure is selected such that a spectral mean reflection level Rs dependent on the layer thickness of the upper layer structure has a maximum Rmax, that a spectral mean value Rs of a reflection level dependent on the layer thickness of the upper layer structure has a value of > Rmetal - 1/3 Δ R, wherein Rmetal is a spectral mean value Rmetal, determined in an analog fashion to Rs, of a reflection level of the unprotected metal layer determined in an analog fashion to Rs and wherein Δ R = Rmetal - Rmin is true, and Rmin refers to the minimum of the reflection level dependent on the layer thickness of the upper layer structure, or is a color difference Δ E* = root[(L*s - L*m)**2 + (a*s - a*m) **2 + (b*s - b*m)**2] < 2.0 between a color impression Fs = (L*s, a*s, b*s) dependent on the layer thickness of the upper layer structure and the color impression of the unprotected metal layer Fm = (L*m, a*m, b*m). The invention further relates to a method for producing such a layer system.

Description

200900726 九、發明說明：【發明所屬之技術領域】本發明關於一種在一基質上的耐擦拭的反射器用的層系統，包含一個光學反射金屬層和一個在該基質上設在金屬層相反侧的透明層構造，該層構造具有一蓋層，由一電漿辅助析出的硬層構成，該硬層係以至少一種矽有機化合物為基礎者，且該層構造還可具有至少一中間層，其中， 4上層構造的層厚度選設成使得和該上層構造的層厚度有關的光譜平均反射程度有一最大值Rmax，且和該上層構造的層厚度有關的反射程度的光譜平均值R的一 A R其中Rmetal係為该未保護的金屬層之一個類似於 Rs測定的反射程度的一個類似於1所形成的光譜平均值， △ Rmetal Rmin，且Rmin表示該依上層構造的層厚度而疋的反射程度的最小&，或者在該與上層構造的層厚度有關的顏色印象Fs= (L*s，，b、)與該未受保護的金屬層的 ^ ^ F象Fm - (L m，& m，b m)之間有-段顏色間隔△ E* = 。此外還關於一種製造這種層系統的方法。，【先前技術】异多燈具除了本身的光源（燈泡、燈管 _ / yp ,還使用 :固或數個反射性表面（反射器）以改變光路徑以及改· :明作用以及分佈。今曰許多這類反射器由-塑膠楔製件 :成，其表面鍍金屬而得到反射器功能。在—些應用領域，述反射器在製造時（例如在個別部件運送及燈具安裝 5 200900726 時）或在燈具的整個使用壽命過程中（例如作洗洗）時受到機械應力。在性質上，對於反射器一般希望至少在一波長範圍中 (在此範圍中該燈具要當作光源）的光要有儘量最高的反射，典型的範圍係對人眼可見的頻域，約400奈米〜約800 奈米。塑膠表面以及一般利用真空鍍金屬製造的鍍覆層極易叉機械性刮傷。為了避免該構件早天（往往在燈具安裝時已會發生）’故需要一附加之機械性保護覆層。迄今，此覆層一般係利用上漆製造。具有一透明硬蓋層的室内下照燈反射器（Ind〇〇r_ Downlight-Reflektor )的覆層係習知者。例如在德專利DE 196 34 334 Cl中所述，有各種不同的相關方法以製造具有一光學反射器層及一封閉之護層的反射覆層。依一第一方法係作真空鍍金屬，藉此構成—由金屬構成的反射層，再利用浸覆或射出方法將一封閉的護漆施在該反射層上，該護漆保護反射層以免受機械應力（例如擦拭）損壞。在此方法中，由於真空鍍覆及上漆的方法步驟互相分離，它們需一真空鍍覆室及一浸覆或射出設備，因此投資成本提高，由於在上漆程序，因為形成灰塵及液滴造成品質的損失（Embufi)導致廢品率提高，因此成本更進一步提高。此外，上漆不牢的情形也屢見不鮮。在第二種方法，反射鍍覆層設以一種電漿輔助析出的護層。在此，在一個利用真空鍍金屬造成的反射性金屬層 200900726 上’利用電漿聚合方法製造一硬的蓋層。舉例而言，一機械性護層可藉著將矽有機化合物與氧利用電漿轉變（PECVD)而製造。所用之矽有機物的例子為六甲基二矽氧烷（HMOS〇 )或四甲基二矽氧烷 (TMDSO)。所用之氧的來源除了氧（〇2)外還有臭氧（ο。、一氧化二氮（Νζο)或其他能提供氧的物質。利用pEc 從矽氧烷製造硬層的說明，舉例而言見於文獻DE34i3〇i9 A1 及 EP 007 48259 B1。製造以石夕氧烧為基礎的硬層當作護層以防機械性負荷 (特別是擦傷）的做法，要和制pECVD從梦有化合物不加氧製造化學護層（特为丨县#应t、将另]疋耐腐蝕濩層）的做法有區別別。舉例而言，這類防腐護層綱"隻赝係用於保護車燈的反射器上的反射性鋁層者，例如DE 2537 416 ai所述者。利用石夕氧烧不加氧用PECvd所俨夕s , L VL>所侍之層的性質係和一種矽力康橡膠相似。它們仫矛从 Μ 們係柔軟、有彈性、具高度化學抵抗性。在本發明的範疇中，蝕護層。員^在以下％為矽氧烷防腐而利用PECVD從發襄，ρ Λ ^ /軋烷加軋所得的層則似。它們係透明、硬且脆玻璃更相以下这些層稱為氧此外，習知技術還有利用描"^烷硬層式從彈性之底層過渡變到耐刮損的蓋層以」又式方地配合該同樣地較軟％ _ _ 層，而使該硬層有利平乂軟的塑膠基質。其200900726 IX. Description of the Invention: [Technical Field] The present invention relates to a layer system for a wipe resistant reflector on a substrate comprising an optically reflective metal layer and a layer disposed on the opposite side of the metal layer on the substrate a transparent layer structure having a cap layer composed of a plasma-assisted hard layer, the hard layer being based on at least one cerium organic compound, and the layer structure may further have at least one intermediate layer, wherein The layer thickness of the upper layer structure is selected such that the spectral average reflection degree associated with the layer thickness of the upper layer structure has a maximum value Rmax, and an average value of the spectral average R of the degree of reflection associated with the layer thickness of the upper layer structure is Rmetal is a spectral average of the unprotected metal layer similar to the degree of reflection measured by Rs, which is similar to 1 , Δ Rmetal Rmin, and Rmin represents the degree of reflection of the layer thickness according to the upper layer structure. Minimum & or the color impression associated with the layer thickness of the superstructure Fs = (L*s,, b,) and the unprotected metal layer ^ ^ F like Fm - (L m, & m, b m) has a - segment color interval Δ E* = . It is also a method of making such a layer system. [Prior Art] In addition to its own light source (bulb, tube _ / yp, also used: solid or several reflective surfaces (reflectors) to change the light path and change: Ming effect and distribution. Many of these reflectors are made of a plastic wedge: a metal plated surface that provides a reflector function. In some applications, the reflector is manufactured (for example, when individual parts are transported and the fixture is installed 5 200900726) or Mechanical stress is applied throughout the life of the luminaire (for example, for washing). In nature, it is generally desirable for the reflector to have at least one wavelength range (in which the luminaire is to be used as a light source) The highest possible reflection, the typical range is visible to the human eye in the frequency domain, about 400 nm ~ about 800 nm. The plastic surface and the plating layer made of vacuum metallization are generally easy to fork mechanical scratches. To avoid This component is available early (often when the luminaire is installed), so an additional mechanical protective coating is required. To date, this coating has been manufactured by lacquering. It has a transparent hard cover. A coating of an indoor downlight reflector (Ind〇〇r_Downlight-Reflektor) is known from the prior art. For example, in German Patent DE 196 34 334 Cl, there are various related methods for manufacturing an optical reflector. a layer and a reflective coating of a closed sheath. According to a first method, vacuum metallization is used to form a reflective layer made of metal, and a closed paint is applied by the dipping or injection method. On the reflective layer, the varnish protects the reflective layer from mechanical stress (eg, wiping). In this method, since the vacuum plating and lacquering method steps are separated from each other, they require a vacuum plating chamber and a dipping or Since the injection equipment is used, the investment cost is increased, and the cost is further increased due to the quality loss caused by the formation of dust and droplets in the painting process (Embufi). In addition, it is not uncommon for the paint to be weak. In the second method, the reflective plating layer is provided with a plasma-assisted protective layer. Here, the use of a reflective metal layer 200900726 by vacuum metallization is utilized. The slurry polymerization method produces a hard cap layer. For example, a mechanical sheath can be produced by plasma-transformation (PECVD) of a cerium organic compound and oxygen. An example of the cerium organic compound used is hexamethyldiazine. Oxygen (HMOS®) or tetramethyldioxane (TMDSO). The source of oxygen used is ozone (ο., nitrous oxide (Νζο) or other oxygen-providing sources in addition to oxygen (〇2). Substance. A description of the use of pEc to make a hard layer from a decane, as exemplified in the documents DE34i3〇i9 A1 and EP 007 48259 B1. The production of a hard layer based on Shixia Oxygen is used as a protective layer to prevent mechanical loading ( In particular, the practice of scratching is different from the practice of making pECVD from the dream compound without oxygen to produce a chemical protective layer (specially for the county, should be another). For example, such an anti-corrosion layer is only used to protect a reflective aluminum layer on a reflector of a lamp, such as that described in DE 2537 416 ai. The nature of the layer served by PECvd, which is not oxygenated by Shixi Oxygen, is similar to that of a Likang rubber. They are soft, elastic, and highly chemically resistant. In the context of the present invention, an etchant layer. The member is the same as the layer obtained by the PECVD from the following %, ρ Λ ^ / rolling mill in the following %. They are transparent, hard and brittle glass. The layers below are called oxygen. In addition, the prior art also uses the hard layer of the trace to change from the elastic underlayer to the scratch-resistant cap. The same softer % _ _ layer is blended to make the hard layer a flat plastic matrix. its

34130 19 Α1。丨子為上达之DE 將塑膠基質上受保護以防機械性損壞的金屬反射層 200900726 的層系統的計的一重要特點為層的順序。一種良好的保護係藉著將該硬層施到金屬層上之背向基質的那一侧上而達成。但在此有一缺點：該護層須被要反射的光通過，因此它會造成反射程度的損失’大致係由於在硬層中吸收以及干涉造成’此外這些損失和波長有關，且造成不想要的顏色效果。層在實用上有充分為了硬保一種電漿之防刮損的作用’故需要有某種層厚度，其中在較厚的層的場合，會發生反射光顏色混淆。在DE 1 96 34 334 ci中: 為了提高薄的HMDSO |的機械穩性，係主張將㈣㈣損的保護作用的層的儘量多的部分放到反射式金屬層下方’而只有一小部分呈硬蓋層的形式施到反射性金二層上。因此依DE 196 34 334 C1，一袖戸由個厚度50〜100奈米的 HMCSO蓋層被金屬層下方的—厚硬的底層支持，且在製造時’該HMDSO蓋層被金屬層下方的—厚硬的底層支持，34130 19 Α1. An important feature of the layer system of 200900726 is the order of the layers of the metal reflective layer on the plastic substrate that is protected from mechanical damage. A good protection is achieved by applying the hard layer to the side of the metal layer that faces away from the substrate. However, there is a disadvantage in that the sheath must be passed by the light to be reflected, so that it causes a loss of the degree of reflection 'substantially due to absorption and interference in the hard layer'. In addition, these losses are related to the wavelength and cause unwanted Color effect. The layer is practically sufficient to protect against the scratching action of a plasma. Therefore, it is necessary to have a certain layer thickness, and in the case of a thick layer, the color of the reflected light may be confused. In DE 1 96 34 334 ci: In order to improve the mechanical stability of the thin HMDSO |, it is advocated that as much as possible of the protective layer of the (four) (four) damage is placed under the reflective metal layer 'only a small part is hard The cover layer is applied to the reflective gold layer. Thus, according to DE 196 34 334 C1, a sleeve of HMCSO having a thickness of 50 to 100 nm is supported by a thick, hard underlayer beneath the metal layer, and at the time of manufacture 'the HMDSO cap layer is under the metal layer' Thick hard bottom support,

且在製造時，1¾ HMDS0蓋層的析出作用在一厚度時此厚度時就開始形成干涉色）就終止。【發明内容】本發明的目的在提供一種耐擦科 ^ ①轼的先反射器用的層系、、以及一種製造這種層系統的方 ’、成糸統有一個呈右八耐刮損性的硬蓋層，同時其光學八无刀屬厣办yθ 象相對於所要保護的金屬層來，儘量不會混淆。叉J至此目的係利用申請專利範圍獨岡领立項的特點達成。依本發明這種目的解決之道係田種在一基質上的耐 8 200900726 擦拭的反射器用的層系統著手，該车可丁邊糸統包含一個光學反射金屬層和一個在該基質上設在今屬展知eη 仗尨屬層相反側的透明層構造’該層構造具有一蓋層，由—雷爿fMftAkiL· ^ i曰田 €水補助析出的硬層構成，該硬層係以至少一種矽有機化合物為基礎者，且該層構造還可具有至少-中間層，其巾，該上層構造的層厚^選= 成使得和該上層構造的層厚度有關的光譜平均反射程度有一最大值Rmax。又At the time of manufacture, the precipitation of the 13⁄4 HMDS0 cap layer terminates at the thickness when the thickness begins to form an interference color. SUMMARY OF THE INVENTION It is an object of the present invention to provide a layer system for a front reflector that is resistant to rubbing, and a method for manufacturing such a layer system, which has a right-eight scratch resistance. The hard cover layer, while its optical eight-no-blade y θ image is relative to the metal layer to be protected, try not to be confused. Fork J to This purpose is achieved by using the characteristics of the patent application scope. According to the invention, the object of the invention is to solve the problem of a layer system for a reflector of a 200900726 wiped on a substrate, which comprises an optically reflective metal layer and a substrate on the substrate. This is a transparent layer structure on the opposite side of the eη 仗尨 layer. The layer structure has a cap layer composed of a hard layer which is subsidized by the 爿爿 fMftAkiL· ^ i曰田€水, which is at least one The organic compound is based on the organic compound, and the layer structure may further have at least an intermediate layer, the towel having a layer thickness of the upper layer configured such that the spectral average reflection degree associated with the layer thickness of the upper layer structure has a maximum value Rmax . also

本發明係根據一項認知：隨著上層構造（特別是蓋層）的層厚度增加，不相要的里 .,,, 不心要的效果一一例如由於和波長有關的干涉造成之漸增的顏色混淆作用隨著化的反射程度在各光 =範圍發生且使反射程度減少、，然而在蓋層的—定厚度的範圍中’這種效果減少，且反射的顏色印象相對於未受保護的金屬層來’顯得更中性。當上層構造的層厚度進一步，高超出㈣域時，則反射程度遽降（特別是在短波長的场合），且因此反射光的顏色混淆情事加大。當層厚度更進步增加時，得到具有大致中性顏色印象的重新反射的光。出乎意料地’可用以下方法達成極小的顏色混淆，將上層構造的層厚度顯設成使平均之光譜反射程值 Rmax。 / ^述對於所產生之反射器之儘量最大的反射的要求往 =伴1^另—種要求不能由於光譜中不同頻率吸收不同或干涉造成不要的頻色印象。這種組合的要求需要品質標 ^配合各用途，以評估所予之層系統的性質’其中依本發明，係用反射程度之光譜平均值Rs當作標準。 9 200900726 所用之反射程度的光譜平均值Rs的定義係為所測的反射程度的平均值，係在反射的光線的一預設波長範圍中用一適當之權重函數形成，此波長範圍對於在可見光譜中的應用係在360奈米〜830奈米範圍，但最少包含4〇〇奈米〜700奈米範圍。平均值係利用一種與具體使用情形有關的權重函數形成。舉例而言，在最簡單的情形可使用一術平均值，雖然其他函數也很有用。 r 反射程度的光譜平均值之計算的具體方法係配合反射器的各具體目的針對波長範圍以及其中所含波長的相對權重（反射益要在該範圍中工作）。一習知之方法係測定顏色座標L、a% b、用於心理顏色刺激辨識的標準系統（由cie委員會開發）稱為 L a b*。顏色系統（Commission international e de lAclairage，刊物 CIE No. 15.2, Colorimetry，第二版，Central Bureau of the CIE, Vienna, 1986 )，例如在 ASTM Designation 308-01 所述（Standard Practice for Computing the Colors ofThe present invention is based on the recognition that as the layer thickness of the superstructure (especially the cap layer) increases, the undesired effects, such as undesired effects, are increased, for example, due to wavelength-dependent interference. The color confusing effect occurs with the degree of reflection in each light=range and reduces the degree of reflection, however, in the range of the thickness of the cap layer, the effect is reduced, and the reflected color impression is relative to the unprotected The metal layer comes 'behaves more neutral. When the layer thickness of the upper layer structure is further higher than the (four) domain, the degree of reflection is reduced (especially in the case of short wavelengths), and thus the color confusion of the reflected light is increased. As the layer thickness is more progressively increased, re-reflected light having a substantially neutral color impression is obtained. Unexpectedly, minimal color confusing can be achieved by the following method, and the layer thickness of the upper layer structure is set to an average spectral reflectance value Rmax. / ^ Describe the requirements for the largest possible reflection of the reflector produced. = = 1 ^ Another requirement. Do not absorb unwanted or interference due to different frequencies in the spectrum. The requirements for such a combination require quality standards to be used in conjunction with each application to evaluate the properties of the layer system to which the layer is applied. In accordance with the present invention, the spectral average Rs of the degree of reflection is used as a standard. 9 200900726 The spectral mean value Rs of the degree of reflection used is defined as the average of the degree of reflection measured, formed by a suitable weighting function in a predetermined wavelength range of the reflected light, which is visible Applications in the spectrum range from 360 nm to 830 nm, but at least 4 nm to 700 nm. The average is formed using a weight function associated with the specific use case. For example, in the simplest case, an average can be used, although other functions are also useful. r The specific method of calculating the spectral mean of the degree of reflection is to match the specific range of wavelengths and the relative weights of the wavelengths contained therein (reflections are expected to work in this range). A conventional method for determining color coordinates L, a% b, and a standard system for mental color stimuli identification (developed by the cie committee) is called L a b*. The colour system (Commission international e de lAclairage, publication CIE No. 15.2, Colorimetry, second edition, Central Bureau of the CIE, Vienna, 1986), for example as described in ASTM Designation 308-01 (Standard Practice for Computing the Colors of

Objects by Using the CIE System, 2001 年 li 月）。在本發明，該顏色印象L*a*b*係用一 CIE標準照明的 (宜為D65)觀測器（且宜2。或1〇。）求出。舉例而言，要測量光譜反射程度，可使用Χ-Rite公司（43〇〇 44th Street SE Grand Rapids, MI，49512 USA)的顏色測量儀器 M〇del SP60 ° 由於反射程度和反射之光線的觀看角度以及入射角度有關’因此反射程度沿在反射器一典型觀看位置的方向且 200900726 對入射光的一典型入射角度測度。 ▲依本發明另一特點，上層構造的層厚度選設成使得和 S亥上層構造的層厚度有關的光譜平均度有—最大值尺max ° 和該上層構造的層厚度有關的反射程度的光譜平均值 RS的值> Rmetal — m △ R，其巾Rme⑷係、為該未保^的金屬層之一個類似於Rs測定的反射程度的—個類似於&所形成的光譜平均值’而’且U:該依上層構造的層厚度而定的反射程度的最小值，或者在令與上層構造的層厚度有關的顏色印象Fs== (L*s，b*)與今未受保護的金屬層的顏色印象Fm= (L*m , a*m，b*m)之間有一段顏色間隔△ E = / ( (L*s- L*m)z+ (a*s- (b*s- < 2_0。此類似Rs形成之光譜平均值Rmetai係用和Rs相同的權重函數以及經由和Rs相同的波長範圍形成。該未受保護的金屬層之和Rs相似地測定的反射程度係在和該與上層構造層厚度有關的反射程度相同的條件下及相同的測量方法測定。用於心理顏色刺激辨識的標準系統（由CIE委員會開發）稱為 L a b。顏色糸統（Commission international e de l6clairage，刊物 CIE No. 15.2，Colorimetry，第二版，Central Bureau of the CIE, Vienna, 1986 )’ 例如在 ASTM Designation 308-01 所述（Standard Practice for Computing the Colors of Objects by Using the CIE System, 2001 年 11 月）。 11 200900726 在本發明’該顏色印象I/a*b*係用一 CIE標準照明的 (宜為D65 )觀測器（且宜2。或J 〇。）求出。舉例而言，要測量光譜反射程度’可使用x_Rite公司（43〇〇 44th street SE Grand Rapids，MI，49512 USA)的顏色測量儀器 Model SP60 °Objects by Using the CIE System, li 2005). In the present invention, the color impression L*a*b* is determined using a CIE standard illuminated (preferably D65) observer (and preferably 2 or 1 〇.). For example, to measure the degree of spectral reflectance, use the color measurement instrument M〇del SP60 ° from Χ-Rite (43〇〇44th Street SE Grand Rapids, MI, 49512 USA) due to the degree of reflection and the viewing angle of the reflected light And the angle of incidence is related to 'so the degree of reflection is in the direction of a typical viewing position of the reflector and a typical incident angle measure of incident light is 200900726. According to another feature of the present invention, the layer thickness of the upper layer structure is selected such that the spectral average degree associated with the layer thickness of the S-up layer structure has a spectrum of the maximum degree max ° and the degree of reflection of the layer thickness of the upper layer structure. The value of the average value of the index > Rmetal — m Δ R, the Rme (4) of the towel, is one of the unprotected metal layers, which is similar to the degree of reflection measured by Rs, and is similar to the spectral average formed by & 'And U: the minimum value of the degree of reflection depending on the layer thickness of the upper layer structure, or the color impression Fs== (L*s, b*) related to the layer thickness of the upper layer structure and the unprotected The color impression of the metal layer Fm= (L*m, a*m, b*m) has a color interval △ E = / ( (L*s- L*m)z+ (a*s- (b*s - < 2_0. This spectral mean value Rmetai formed by Rs is formed by the same weight function as Rs and by the same wavelength range as Rs. The degree of reflection measured similarly to the sum Rs of the unprotected metal layer is Determined under the same conditions as the thickness of the upper structural layer and the same measurement method. The standard system for color stimuli identification (developed by the CIE committee) is called L ab. Commission international e de l6clairage, publication CIE No. 15.2, Colorimetry, second edition, Central Bureau of the CIE, Vienna, 1986 ' For example, in ASTM Designation 308-01 (Standard Practice for Computing the Colors of Objects by Using the CIE System, November 2001). 11 200900726 In the present invention, the color impression I/a*b* uses a CIE Standard illumination (preferably D65) observer (and should be 2 or J 〇.). For example, to measure the degree of spectral reflection' can be used by x_Rite (43〇〇44th street SE Grand Rapids, MI, 49512 USA) color measuring instrument Model SP60 °

如果依本發明’上層構造的層厚度選設成使得一反射程度（它與上反射構造的層厚度有關）的光譜平均值Rs的 1/3AR，則得到一種光學反射，其反射光大致不會混淆，且它同時具有高度耐擦拭及刮損強度。在此， Rmetal係為該未保護的金屬層之一類似Rs測定的反射程度的一種類似於Rs形成的光譜的平均值，而R = — vmetalIf the layer thickness of the 'upper layer structure according to the invention is chosen such that a degree of reflection (which is related to the layer thickness of the upper reflection structure) is 1/3 AR of the spectral mean value Rs, an optical reflection is obtained, the reflected light is substantially not Confused, and it is also highly resistant to wiping and scratching. Here, Rmetal is an average value of the spectrum formed by Rs, which is one of the unprotected metal layers, similar to the reflection of Rs, and R = - vmetal

Rmin，其中表示該與上層構造的層厚度有關的反射程度Rs-的取小值。在一較佳實施例中，對選設之上層構造的層厚度，一種與上層構造的層厚度有關的反射程度的光譜平均值RJ>Rmeta丨—cAR，其中C在1/1〇到1/4範圍。 ^出乎意料地，全球性參數Rmetai和適用於將上層系 '充的層厚度测疋’使得該層系統的顏色印象大致為中性者0 如不採此方式，則建議使用該Lvb*顏色系統以代表反射光4寸性’且將上層構造的層厚度選設成使得在一個與上層構造層厚度有關的顏色印象Fs=K，b*s)與—未保護之金屬層的顏色印象乂，b*m)之間有一段顏色距離 ΔΕ*，。依本發明此特點，顏色印象係依上層構造的層厚度而 12 200900726 疋與未受保護的金屬層的顏色印鏖4 & , 貝巴印象比較。此L*a*b*顏色系統係基於人感覺的性質，且 ",、 …士且比（例如）反射程度的算術平均值更適合用於代表光學斤„ 衣光予反射窃的顏色印象的特性。1/為冗度的一種值，a*為顏色印象 * ^ 丨豕、，工-綠值，b為顏色印象的普- 篮值。 ’、上層構造的層厚度在110奈米〜細奈米的範圍。厚度宜為由13〇奈㈣15G奈米（特別是對於以梦氧烧為基礎的硬層）。蓋層的層厚度宜在11〇奈米〜19〇奈米之間的範圍，如此可達到層系統的高耐擦傷強度。本發明可用於不同反射器： /飞車之車頭燈反射器（它係初級反射器）設計成使所用之照明手段的特定光束有最佳反射者，其中該平均值的形成在大多為較短波（藍光）鹵素燈或氙氣燈輻射線的份置比較長波的輻射線強。在先前技術框部分〔圖框（Bezel )〕舉例而言，迄今彺往用電鍍方式鍍鉻，鍍覆上一硬覆層。由於電鍍覆層（特別是絡電鍍）需要較大量的有毒物質，故使用這種方法要化較大成本在程序安全及廢棄處理上，因此基本上要避免。一框要將金屬層之一定之裝飾性顏色再生，因此依本發明達到顏色距離△ E* < 2。要將舒適作用的白光分佈的天花板燈，對於具有光譜平均值的儘量最好的反射而言，係對應於人眼的敏感度作 13 200900726 最佳化。依本發明，可使用比迄今更厚之上護層，因為利用本發明的層系統可避免—般的顏色混清（捧雜）及反射損失 (Ε — ιιβ ) 。φ於層系、统的耐擦傷強度隨蓋層厚度增加，故依本發明可提供具高度耐擦拭及㈣㈣度的光學反射器’同時有高光學品質。 μ在本發明-有利的進一步特點中，在金屬層之朝向基貝的那-側上設有一底^，它提高金屬層在基性或層系統的機械穩定性. 底層可為一受電衆辅助析出的層。該層係、以至少一種石夕有機化合物為基礎’最好使用一硬底材料，它可防止設在其上方的層的機械性斷裂，而且如果要避免蓋層厚度= 加（因為否則的話，反射器的光學印象會變差）也能夠^ 步提高耐括損強度。在本發明另一特點中，在蓋層與金屬層之間 —xb ΒΒ / 〇又頁 ^ S θ 。此上中間層宜具有保護金屬層以防氧化的功能。刀Rmin, which represents the small value of the degree of reflection Rs- associated with the layer thickness of the superstructure. In a preferred embodiment, the layer thickness of the upper layer structure, a spectral average of the degree of reflection associated with the layer thickness of the upper layer structure, RJ>Rmeta丨-cAR, where C is between 1/1 and 1/1 4 range. ^ Unexpectedly, the global parameter Rmetai and the thickness of the layer used to supercharge the layer of the upper layer make the color impression of the layer system roughly neutral. 0 If this method is not used, it is recommended to use the Lvb* color. The system is selected to represent the reflected light and the layer thickness of the upper layer is chosen such that a color impression associated with the thickness of the upper structural layer Fs = K, b * s) and the color of the unprotected metal layer 乂There is a color distance ΔΕ* between , b*m). According to this feature of the invention, the color impression is based on the layer thickness of the upper layer structure. 12 200900726 比较Compared with the color of the unprotected metal layer 4 & This L*a*b* color system is based on the nature of human perception, and the arithmetic mean of the degree of reflection, for example, is more suitable for representing the color impression of optical ecstasy. The characteristic is 1/ is a value of redundancy, a* is the color impression* ^ 丨豕,, work-green value, b is the general-basket value of the color impression. ', the layer thickness of the upper layer is 110 nm~ The range of fine nanometer. The thickness should be 15G nanometer (four) 15G nanometer (especially for the hard layer based on dream oxygenation). The thickness of the cover layer should be between 11〇 nanometer and 19〇 nanometer. Scope, the high scratch resistance of the layer system is achieved. The invention can be used for different reflectors: / The headlight reflector of a flying car (which is a primary reflector) is designed to optimally reflect a particular beam of illumination used. The average value is formed in a relatively short-wave (blue) halogen lamp or a xenon lamp radiation, and the longer-wavelength radiation is stronger. In the prior art frame [Bezel], for example, Chrome plating by electroplating, plating a hard coating Since the electroplating coating (especially the electroplating) requires a relatively large amount of toxic substances, the use of this method requires a large cost in the process safety and disposal, so it is basically to be avoided. Decorative color reproduction, thus achieving a color distance Δ E* < 2 according to the invention. A ceiling light to distribute a comfortable white light, for the best possible reflection with a spectral mean, corresponds to the human eye Sensitivity is optimized for 13 200900726. According to the invention, it is possible to use a thicker overcoat than heretofore, since the layer system of the invention avoids the general color mixing and the loss of reflection (Ε - ιιβ) The φ in the layer system and the scratch resistance increase with the thickness of the cover layer, so according to the invention, it is possible to provide an optical reflector with high scratch resistance and (four) (four degrees) while having high optical quality. μ in the present invention - advantageous further In the feature, a bottom is provided on the side of the metal layer facing the base, which improves the mechanical stability of the metal layer in the basic or layer system. The bottom layer can be a layer that is assisted by the power receiver. The layer, based on at least one zealand organic compound, preferably uses a hard bottom material that prevents mechanical breakage of the layer disposed above it, and if cover thickness is to be avoided = because otherwise The optical impression of the reflector may be deteriorated. It is also possible to improve the resistance to the damage. In another feature of the invention, between the cap layer and the metal layer - xb ΒΒ / 〇 page ^ S θ. The layer should have the function of protecting the metal layer against oxidation.

此外’在底層與金屬層之間可設至少一附加的中間層，特別是具有保護金屬層以防氧化的功能。 S 下中間層及/或上中間層的層厚度宜1〇奈 '、/、 4。此處宜使用上文稱文矽氧烷腐蝕防護層的護層。知 “將σ玄矽有機化合物宜為HMDS0或TMDS0，它們利用〜電水裂％且呈層或層組成的形式析出，當製造該電漿輔助 14 200900726 析出的硬層時，氧及/或氮結合入一個層中，該層在製造時當作反應性成份供應。如習知者，此反應性成份以一和 HMDSO或TMDSO對應成份1 : 〇·5到1.20的流率比例供應。Furthermore, at least one additional intermediate layer may be provided between the underlayer and the metal layer, in particular having the function of protecting the metal layer from oxidation. The layer thickness of the lower intermediate layer and/or the upper intermediate layer of S is preferably 1%, /, 4. The protective layer referred to above as the protective layer of the oxime oxide should be used here. It is known that the organic compound of σ 矽矽宜 is preferably HMDS0 or TMDS0, which are precipitated in the form of a layer or a layer composed of ~ electro-hydraulic cracking, and oxygen and/or nitrogen when the hard layer precipitated by the plasma assisted 14 200900726 is produced. Incorporating into a layer which is supplied as a reactive component at the time of manufacture. As is customary, the reactive component is supplied in a flow ratio of one component of HMDSO or TMDSO: 〇·5 to 1.20.

特別適用於光反射器的層係一種金屬層，它至少包含一種以下成份：鋁、銅、銀、金、鈦、鎂、鐵、鋼、鉻或這些東西形成的合金。金屬層的厚度宜在2〇〜15〇奈米之間。本發明的層系統可以有效、廉價地用中頻到低頻的電磁波激發（例如以40仟赫的頻率）以高品質在一傳統的單室鍍覆設備中製造。本發明其他特點與優點在以下配合圖式中的實施例說明，但其範圍不限於此。【實施方式】圖1以示意方式顯示一本發明的層系統的構造，具有 -基質⑽、-金屬層（2G)、_蓋層（3G)' _上中間層州、一底層(50)、及一下中間層(60)。基質宜為一塑膠基質（例如由聚羧酸酯構成者）或一光反射器用的金屬層，金屬層()可為銘、銅、銀、金、鈦、鎂、鐵、鋼、鉻或一由它們形成的合金，此合金剎 m 、，利用濺鍍方法、物理或化學蒸铲方法或離子束方法施覆者。 ‘、、1 出的硬層，它基於至少—錄（)係一種受電漿辅助析 ^ 、種矽有機化合物為基礎且呈有古度耐擦傷強度。底層. 思且/、有问八物1沈爲受電製辅助析出的石夕有機化合物或-漆層。它宜為硬層 ’機化宜為電聚輔助析出的化合物，：：層(40)與下中間層_ 口物，且以矽有機化合物為基礎 15 200900726 者i用之石夕有機化合物宜為⑽或TMds〇。圖2中顯不―種層系、統（它具有由一厚層及一選擇性之中間層的層構造）的平均反射層度r和層厚度的典型關 :系典型的情形’反射程度隨著層厚度增加而從一種未保護的金屬層的值開私舌庄、士 /“，结成少，並達到一最小值、，然後到一苐一最大值，卩音銘$ 隨後再到另一最大值，而在最大值之間的最小值的值則增加，在本發明的層***，該層構造的 rA layer particularly suitable for use in a light reflector is a metal layer comprising at least one of the following components: aluminum, copper, silver, gold, titanium, magnesium, iron, steel, chromium or an alloy formed from these. The thickness of the metal layer is preferably between 2 〇 and 15 〇 nanometers. The layer system of the present invention can be efficiently and inexpensively fabricated with intermediate frequency to low frequency electromagnetic wave excitation (e.g., at a frequency of 40 kHz) in a conventional single chamber plating apparatus with high quality. Other features and advantages of the present invention are described below in conjunction with the embodiments in the drawings, but the scope is not limited thereto. [Embodiment] FIG. 1 shows a schematic configuration of a layer system of the present invention, having a matrix (10), a metal layer (2G), a cap layer (3G)', an upper layer state, and a bottom layer (50). And the middle layer (60). The substrate is preferably a plastic substrate (for example, composed of a polycarboxylate) or a metal layer for a light reflector, and the metal layer can be made of copper, silver, gold, titanium, magnesium, iron, steel, chromium or The alloy formed by them, the alloy brake, is applied by a sputtering method, a physical or chemical steaming method or an ion beam method. The hard layer of ‘,、1 is based on at least a recording () based on a plasma-assisted analysis, an organic compound based on the species, and has a scratch-resistant strength. The bottom layer. Think and /, have questions Eight objects 1 sink into the electric compound to help precipitate the Shixi organic compound or - paint layer. It should be a hard layer 'mechanization, which is suitable for electropolymerization-assisted precipitation, :: layer (40) and lower middle layer _ mouth material, and based on bismuth organic compound 15 200900726 (10) or TMds〇. The typical reflection layer r and layer thickness of the layer system, which has a layer structure consisting of a thick layer and a selective intermediate layer, are typical of the case: the typical degree of reflection The thickness of the layer is increased and the value of an unprotected metal layer is opened to the private tongue, the gentleman / ", the formation is less, and reaches a minimum, and then to a maximum of one, the first sound, then the other a maximum value, while the value of the minimum value between the maximum values is increased. In the layer system of the present invention, the layer is constructed with r

=度的值選設成使得平均反射程度R>R_— i/3ar。一寸土的層糸統的層厚度在第—或第二最大值的範圍中造成一種平均反射程度。在圖3的圖示中，的範圍。 2 要製造本發明的層系覆設備（例如本申請人的室中’在其中有雲母電極陰極（它具有鋁製的靶）要鑛覆之表面和乾對立。板電極達成，它們接在一仟瓦。統’係將一光學反射器放入一鍍一種PolorMet IV設備）的真空以供入電磁能量，並有磁子濺鍍，反射器和靶對立設置，其中所層之電漿辅助析出作用利用二個 40什赫產生器，其最大功率為5 用以下程序步驟將—種耐擦拭的層 3mm厚的聚羧酸酯基質上〔電漿預處理〕 2空室抽空到壓力3χ1〇-2毫巴。將氬氣體以約議sccm 頻：：空室中，其中利用電磁…仟瓦功率及40什赫。約30秒激發-電毁。將基f利用該電聚清洗，並 16 200900726 活化以使以後的層有較佳之附著。〔硬底層之電漿CVD〕一個350奈米厚的層利用電層能在4〇仟赫之電磁激發的％合以4.5仟赫功率及15〇 sccm HMDS〇及75〇氧的氣流在約4x1 Ο·2亳巴的程序壓力在24〇秒的程序時期施加。〔中間層的電漿CVD〕、在程序麼力4xl0·2毫巴將HMDSO以100 seem的流率 ‘入真二至中，且利用電磁能以4.5仟赫的功率及40什赫的頻率作用約20秒觸發一電漿，其中一個約5〜1〇奈来厚的中間層析出到基質上。〔濺鍍一金屬層〕將真空室抽空到基本壓力小於1〇-8毫巴，然後在54〇 seem的氬氣流在3χ1〇-3毫巴程序壓力及7〇仟瓦之濺鍍功率將一反射性鋁層（層厚度約8〇奈米）在約15秒的程序期間減:鑛。〔將一中間層作電漿CVD〕在程序壓力4x10-2毫巴將HMDS〇〇以1〇〇 sccm流率 ‘入真二至，並利用電磁能以4.5仟瓦之功率及4〇仟赫頻率作用約20秒觸發一電漿，其中在基質上析出一層约5〜 1 〇奈米厚的中間層。〔蓋層之電漿CVD〕將HMDSO以15〇 sccm流及將氧以6〇〇 sccm流率以4〇〇仟赫用4仟瓦電漿功率激發。在此步驟9〇秒的期間，將 17 .200900726 一 1 60奈米厚的護層析出’較短或較長的程序時間會造成較薄或較厚的護層。在將該室通入空氣後’可將鍍覆過的基質拿出。如此所處理的基質的反射光譜在平均反射層度8〇%造成顏色座標L*、=94.3、a* = -1.8及15，其中在波長4〇〇〜700奈米得到一算術平均值。該層由數條膠帶拉離物 (Abzug)構成，在一種Tesa 4124-包裝室的場合。在一先 f '刖的格段沒有層撕離現象，且用l%NaOH溶液作作用30 刀，用30分沒有可見的損壞。在圖3中顯示一個施在一厚約3mm的聚叛酸g旨板上的層系、”充的光δ普反射程度，係對於由一硬層及一中間層構成的上層構造的不同層厚度在4〇〇奈米〜7〇〇奈米之間的波長範圍的隋形，測S作用利用公司的一光譜光度計 SP60對於D65照明及一 2。觀看者所作。金屬層由用磁子濺鍍的鋁構成，層厚度100奈米。此層系統利用上述方法 ( 製造’上中間層為1 0奈米。由圖3可看出，在整個所看的波長範圍，該未保護的金屬層的反射層度（亦即蓋層厚度為〇)為最大。當蓋層厚度40奈米時，在短波長時已可發現反射程度有破壞 (nbruch )。當蓋層的厚度進一步增加時，可看到反射 =度向較大波長減少。當層厚度16〇奈米時，在45〇〜⑼〇 :米間的平均波長範圍可看到反射程度增加，當層厚度1 奈米時，反射程度再向較短波長急遽下降。又在表1中顯示對於CIE L*aV顏色印象、ΔΕ*以及平均 18 200900726 反射程度（相對於入射光的％)的數值。此外，在〜攔「注意」中放入主觀顏印象的評估中。此層厚度160奈米的層线有-最大反射層度及—△以以。我們可看出固然在盍層180奈米時發生較高亮度，但有黃色之顏色印象。The value of = degree is selected such that the average degree of reflection R > R_ - i / 3ar. The layer thickness of a layer of soil layer causes an average degree of reflection in the range of the first or second maximum. In the illustration of Figure 3, the scope. 2 To fabricate the layer-covering apparatus of the present invention (for example, in the applicant's chamber 'where there is a mica electrode cathode (which has a target made of aluminum), the surface of the ore is to be coated and the opposite is dry.仟。。。。。。。。。。。。。。。。。。。。。。。。。。。。。。。。。。。。。。。。。。。。。。。。。。。。。。。 The function utilizes two 40 Shih generators with a maximum power of 5. The following procedure is used to evacuate the 3mm thick polycarboxylate matrix (plasma pretreatment) 2 to the pressure of 3χ1〇- 2 mbar. The argon gas is arbitrarily sccm:: in an empty chamber, which uses electromagnetic... wattage power and 40 Hz. About 30 seconds of excitation - electrical destruction. The base f is cleaned with the electropolymer and activated at 200900726 to provide better adhesion to subsequent layers. [plasma CVD of hard underlayer] A layer of 350 nm thick utilizes an electrical layer capable of electromagnetic excitation at 4 kHz with a combined power of 4.5 kHz and a flow rate of 15 〇 sccm HMDS 〇 and 75 〇 oxygen at approximately 4 x 1 The program pressure of Ο·2亳巴 is applied during the program period of 24 〇. [plasma CVD of the intermediate layer], in the program force 4xl0·2 mbar, HMDSO is taken into the true two to the flow rate of 100 seem, and the electromagnetic energy is used at a power of 4.5 kHz and a frequency of 40 Hz. A plasma is triggered for about 20 seconds, one of which is about 5 to 1 angstrom thick intermediate chromatographed out onto the substrate. [sputtering a metal layer] The vacuum chamber is evacuated to a base pressure of less than 1 〇 -8 mbar, then the argon gas flow at 54 〇 seem is at a pressure of 3 χ 1 〇 -3 mbar and the sputtering power of 7 watts will be The reflective aluminum layer (layer thickness about 8 〇 nanometer) was reduced during the process of about 15 seconds: mine. [Using an intermediate layer for plasma CVD] At a programmed pressure of 4x10-2 mbar, the HMDS ' is flown at a flow rate of 1 〇〇sccm and uses electromagnetic energy at a power of 4.5 watts and 4 Hz. A frequency effect of about 20 seconds triggers a plasma in which a layer of about 5 to 1 nanometer thick intermediate layer is deposited on the substrate. [plasma CVD of the cap layer] HMDSO was excited at a flow rate of 15 〇 sccm and oxygen at a flow rate of 6 〇〇 sccm at 4 〇〇仟 with 4 watts of plasma power. During this step of 9 seconds, the 17 .200900726 - 1 60 nm thick protection is cut out to a shorter or longer program time resulting in a thinner or thicker sheath. The plated substrate can be taken out after the chamber is vented to air. The reflection spectrum of the substrate thus treated resulted in color coordinates L*, = 94.3, a* = -1.8 and 15 at an average reflection layer degree of 8 〇, wherein an arithmetic mean value was obtained at a wavelength of 4 〜 to 700 nm. This layer consists of several tape pulls (Abzug) in the case of a Tesa 4124-packaging room. There was no layer peeling phenomenon in the first f '刖 segment, and 30% of the knife was used with 1% NaOH solution, and no visible damage was observed with 30 points. In Fig. 3, a layer of a polyphenolic acid plate having a thickness of about 3 mm is shown, "the degree of reflection of the charged light δ, which is a different layer of the upper layer structure composed of a hard layer and an intermediate layer. The thickness of the 隋 shape in the wavelength range between 4 〇〇 nanometers ~ 7 〇〇 nanometers, measured by the use of a company's spectrophotometer SP60 for D65 illumination and a 2. The viewer made the metal layer by the use of magnetons Sputtered aluminum consisting of a layer thickness of 100 nm. This layer system uses the above method (manufacturing 'the upper middle layer is 10 nm. As can be seen from Figure 3, the unprotected metal is seen throughout the wavelength range seen. The reflective layer of the layer (that is, the thickness of the cap layer is 〇) is the largest. When the thickness of the cap layer is 40 nm, the degree of reflection is found to be destructive at a short wavelength. When the thickness of the cap layer is further increased, It can be seen that the reflection = degree decreases to a larger wavelength. When the layer thickness is 16 nanometers, the degree of reflection can be seen in the average wavelength range between 45 〇 and (9) 〇: meters, and when the layer thickness is 1 nm, the reflection is The degree drops sharply toward shorter wavelengths. Also shown in Table 1 for CIE L*aV color Image, ΔΕ*, and average 18 200900726 The degree of reflection (% relative to the incident light). In addition, the evaluation of the subjective impression is placed in the ~Note "Note". The layer thickness of 160 nm is - The maximum reflection layer degree and - △ to . We can see that although the high brightness occurs in the enamel layer 180 nm, but there is a yellow color impression.

【圖式簡單說明】圖1係一本發明的層系統的示意圖，圖2係—與層厚度有關的反射程度的示圖， »· Ί 3係對不同之層厚度之一反射程度對反射光之波長座祆圖此反射層度係施有一層系統的基質之所測量之反射程度。、【主要元件符號說明】 (1〇)基質 (2〇) 金屬層 ^30)蓋層 (40)上中間層 ^50)底層 (60)下中間層 19BRIEF DESCRIPTION OF THE DRAWINGS Fig. 1 is a schematic view of a layer system of the present invention, and Fig. 2 is a diagram showing the degree of reflection related to the thickness of the layer, »· Ί 3 is a reflection degree of the thickness of one of the different layers to the reflected light The wavelength of the reflection layer is the degree of reflection measured by the substrate of a system. [Main component symbol description] (1〇) substrate (2〇) metal layer ^30) cap layer (40) upper middle layer ^50) bottom layer (60) lower middle layer 19

Claims

200900726 十，申請專利範園： 1 _ 一種在一基質上的耐擦拭的反射器用的層系統，勺含一個光學反射金屬層和一個在該基質上在金屬層相反側的透明層構造，該層構造具有一蓋層，由一電漿辅助析出的硬層構成’該硬層係以至少一種矽有機化合物為美礎者’且該層構造還可具有至少一中間層，其特徵在：該上層構造的層厚度選設成使得200900726 X. Patent application: 1 _ A layer system for a scratch-resistant reflector on a substrate, the spoon containing an optically reflective metal layer and a transparent layer on the substrate opposite the metal layer, the layer The structure has a cap layer, and the hard layer assisted by a plasma constitutes 'the hard layer is based on at least one bismuth organic compound' and the layer structure may further have at least one intermediate layer characterized by: the upper layer The layer thickness of the structure is selected such that

和該上層構造的層厚度有關的光譜平均反射程产最大值Rmax， " 和該上層構造的層厚度有關的反射程度的光譜平均值 Rs的值> Rmetal — 1/3ΔΚ，其中係為該未保護的金屬曰们顯似於Rs測定的反射程度的一個類似於所形成的光譜平均值’而Μ〜al—R，且Rm“：該依上層構造的層厚度而定的反射程度的最 n)1+(b*s—b*m)1i < 叉保護的金屬層的顏色印象bK，D之間有一段顏色間隔△ e*= 2.0。項之層系統，其中：的那一側上在該金屬層與基質 ’其中：宜為厚的）層，它種（宜為硬的） 3 如申請專利範圍第2項之層系統该底層為—受電漿辅助析出的（且基於至少一種矽有機化合物為基礎或為 20 1 ·如申請專利範圍第1 在该金屬層之朝向基質間設有一底層。 200900726 漆層 4·如申請專利範圍第1或第2項之層系統在該蓋層與金屬層之間至少設有-上中間/、中： 5·如申請專利範圍第2項之層系統，复中。在該底層與金屬層之間至少設有—附加· I;申請專利範圍第1或第2項之層系統，1:層。下中間層及Α戈上中間層，具有防中. f 該金屬層。 β遷乳以保護 7 ·如申請專利範圍第1或第2項之層*** 該石夕有機化合物為六甲基二嫩或：甲：中：烷。 Λ四甲基二矽氧夕如申請專利範圍第i或第2項之層系統，其中：氧及/或氮儲在至少一硬層中。 9.如申請專利範圍第8項之層系統，其中：該金屬層包含至少一夥伴成份，由銀、金、圍鎂、鐵、鋼、鉻選出或由這些金屬所形成的合金選出。 1 〇·如申請專利範圍第1或第2項之層系統，其'中：° 該上層構造的層厚度在丨10奈米與200奈米之間的範 ^ 一種在一基質上製造耐擦拭之光學反層器用的層系統的方法，其中在金屬層之與該基質相反的那—側上將 —透明之上層構造施到一光學上反射的金屬層上，該透明上層構造具有一蓋層及至少一中間層，該蓋層由—受電漿輔助析出的硬層構成，以至少一種矽有機化合物為基礎， 21 200900726 其特徵在： 6亥上層構造的層厚度選設成使得一與該上層構造的層厚度有關的光譜平均反射程度\有一最大值R ，既丄、max 和j上層構造的層厚度有關的反射程度的光譜平均值 Rs的值〉Rmetal- 1/3AR，其巾Rnmai係為該未保護的金屬層之一個類似於Rs測定的反射程度的一個類似於&所形成的光譜平均值，而R 一 R ， * _ _ ^ metal vmm 且Kmin表不該依〇上層構造的層厚度而定的反射程度的最小值，或者在該與上層構造的層厚度有關的顏色印象Fs= (L*s，與該未 /~[ (L^1- L*J2-T(a；- a*m)2+7b*s- b*mp〇 < 受保護的金屬層的顏色印象Fm=K。之間有—段顏色間隔△ E* 2.0。 1 2 .如申請專利範圍第u項之方法，其中：該真空在製造層系統時保持不中斷。 1 3_如申清專利範圍第11或12項之方法，其中：該金屬層利用一濺鍍方法、物理或化學蒸鍍方法或— 球子束方法施加。 1 4 ·如申請專利範圍第11項之方法，其中：該石夕有機化合物為六甲二矽氧烷或四甲基二矽氧烷，其中在製造該蓋層時，將一反應性成分如氧及/或氮供應。 1 5 ·如申請專利範圍第μ項之方法，其中：該反應性成分以六曱基二矽氧烷或四甲基二矽氧烷對 δ亥反應性成分的流率比例1 : 0.5到1 : 2〇供應。 22 200900726 1 6 .如申請專利範圍第11項之方法，其中·· 施一上層構造，其層厚度在110奈米〜200奈米範圍十一、圖式：如次頁。 23The spectral average reflection path yield maximum value Rmax associated with the layer thickness of the upper layer structure, " the value of the spectral average value Rs of the degree of reflection associated with the layer thickness of the upper layer structure> Rmetal — 1/3ΔΚ, where The unprotected metal is similar to the degree of reflection measured by Rs, which is similar to the average value of the spectrum formed, and Μ~al-R, and Rm": the maximum degree of reflection depending on the layer thickness of the upper layer structure. n)1+(b*s-b*m)1i < color impression of the metal layer of the fork protection bK, D has a color interval Δ e*= 2.0. The layer system, where: the side a layer of the metal layer and the substrate 'where: is preferably thick, which is (preferably hard) 3 as in the layer system of claim 2, the bottom layer is - plasma-assisted (and based on at least one矽Organic compound based or 20 1 ·As claimed in the patent range 1 , a base layer is provided between the metal layers facing the substrate. 200900726 Paint layer 4 · The layer system of the first or second aspect of the patent application is in the cover layer At least between the metal layer and the upper layer /, medium: 5 · If you apply for the layer system of the second paragraph of the patent scope, the middle of the system. At least between the bottom layer and the metal layer - additional · I; the patent system scope 1 or 2 layer system, 1 : Layer. Lower middle layer and upper layer on the upper layer, with anti-medium. f The metal layer. β milking to protect 7 · As in the patent system scope 1 or 2 layer system, the Shixi organic compound is Rokko乙二嫩或:甲:中: alkane. Λtetramethyl oxime as in the layer system of claim i or 2, wherein: oxygen and/or nitrogen are stored in at least one hard layer. The layer system of claim 8 wherein: the metal layer comprises at least one partner component selected from the group consisting of silver, gold, magnesium, iron, steel, chromium or an alloy formed of these metals. The layer system of claim 1 or 2, wherein the middle layer has a layer thickness of between 10 nm and 200 nm, and a scratch-resistant optical counter layer is formed on a substrate. Method for a layer system, wherein the side of the metal layer opposite to the substrate will be transparent The upper layer structure is applied to an optically reflective metal layer having a cap layer and at least one intermediate layer, the cap layer being composed of a hard layer assisted by plasma, based on at least one cerium organic compound , 21 200900726 is characterized by: the layer thickness of the upper layer structure of 6 hai is selected such that a spectral average reflection degree related to the layer thickness of the upper layer structure has a maximum value R, which is related to the layer thickness of the upper layer structure of 丄, max and j The value of the spectral mean value Rs of the degree of reflection is > Rmetal - 1/3AR, and the towel Rnmai is a spectral average of the degree of reflection of the unprotected metal layer similar to that measured by Rs, And R - R , * _ _ ^ metal vmm and Kmin should not depend on the minimum degree of reflection depending on the layer thickness of the upper layer structure, or the color impression related to the layer thickness of the upper layer structure Fs = (L* s, and the color of the protected metal layer Fm=K with the un/~[(L^1-L*J2-T(a;- a*m)2+7b*s-b*mp〇< There is a - segment color interval △ E* 2.0. 1 2 . The method of claim 5, wherein: the vacuum is maintained without interruption during the manufacture of the layer system. The method of claim 11, wherein the metal layer is applied by a sputtering method, a physical or chemical vapor deposition method, or a ball bundle method. The method of claim 11, wherein: the organic compound is hexamethyldioxane or tetramethyldioxane, wherein a reactive component such as oxygen is produced in the production of the cap layer. And / or nitrogen supply. 1 5 The method of claim 5, wherein: the reactive component has a flow ratio of hexamethylene dioxane or tetramethyldioxane to the δ hai reactive component: 0.5 to 1 : 2〇 supply. 22 200900726 1 6 . The method of claim 11 , wherein the upper layer structure has a layer thickness ranging from 110 nm to 200 nm. 11. The following figure: twenty three