TW200745772A - Exposure apparatus and device manufacturing method - Google Patents
Exposure apparatus and device manufacturing methodInfo
- Publication number
- TW200745772A TW200745772A TW096105986A TW96105986A TW200745772A TW 200745772 A TW200745772 A TW 200745772A TW 096105986 A TW096105986 A TW 096105986A TW 96105986 A TW96105986 A TW 96105986A TW 200745772 A TW200745772 A TW 200745772A
- Authority
- TW
- Taiwan
- Prior art keywords
- polarization
- reticle
- exposure apparatus
- adjuster
- illuminate
- Prior art date
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70058—Mask illumination systems
- G03F7/70091—Illumination settings, i.e. intensity distribution in the pupil plane or angular distribution in the field plane; On-axis or off-axis settings, e.g. annular, dipole or quadrupole settings; Partial coherence control, i.e. sigma or numerical aperture [NA]
- G03F7/70108—Off-axis setting using a light-guiding element, e.g. diffractive optical elements [DOEs] or light guides
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70058—Mask illumination systems
- G03F7/70191—Optical correction elements, filters or phase plates for controlling intensity, wavelength, polarisation, phase or the like
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
- G03F7/7055—Exposure light control in all parts of the microlithographic apparatus, e.g. pulse length control or light interruption
- G03F7/70566—Polarisation control
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2006037422A JP2007220767A (ja) | 2006-02-15 | 2006-02-15 | 露光装置及びデバイス製造方法 |
Publications (1)
Publication Number | Publication Date |
---|---|
TW200745772A true TW200745772A (en) | 2007-12-16 |
Family
ID=38171301
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
TW096105986A TW200745772A (en) | 2006-02-15 | 2007-02-15 | Exposure apparatus and device manufacturing method |
Country Status (5)
Country | Link |
---|---|
US (1) | US7508493B2 (zh) |
EP (1) | EP1821149A3 (zh) |
JP (1) | JP2007220767A (zh) |
KR (1) | KR100856976B1 (zh) |
TW (1) | TW200745772A (zh) |
Families Citing this family (24)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP3226073A3 (en) | 2003-04-09 | 2017-10-11 | Nikon Corporation | Exposure method and apparatus, and method for fabricating device |
TW201834020A (zh) | 2003-10-28 | 2018-09-16 | 日商尼康股份有限公司 | 照明光學裝置、曝光裝置、曝光方法以及元件製造方法 |
TW201809801A (zh) | 2003-11-20 | 2018-03-16 | 日商尼康股份有限公司 | 光學照明裝置、曝光裝置、曝光方法、以及元件製造方法 |
TWI395068B (zh) | 2004-01-27 | 2013-05-01 | 尼康股份有限公司 | 光學系統、曝光裝置以及曝光方法 |
TWI437618B (zh) | 2004-02-06 | 2014-05-11 | 尼康股份有限公司 | 偏光變換元件、光學照明裝置、曝光裝置以及曝光方法 |
JP2008108851A (ja) * | 2006-10-24 | 2008-05-08 | Canon Inc | 照明装置及び当該照明装置を有する露光装置、並びに、デバイス製造方法 |
US7952685B2 (en) * | 2007-03-15 | 2011-05-31 | Carl Zeiss Smt Ag | Illuminator for a lithographic apparatus and method |
WO2008119794A1 (en) * | 2007-04-03 | 2008-10-09 | Carl Zeiss Smt Ag | Optical system, in particular illumination device or projection objective of a microlithographic projection exposure apparatus |
JP4971932B2 (ja) * | 2007-10-01 | 2012-07-11 | キヤノン株式会社 | 照明光学系、露光装置、デバイス製造方法および偏光制御ユニット |
NL1036407A1 (nl) * | 2008-01-23 | 2009-07-27 | Asml Netherlands Bv | Polarization control apparatus and method. |
JP2009206373A (ja) * | 2008-02-28 | 2009-09-10 | Canon Inc | 露光装置及びデバイス製造方法 |
TW200938957A (en) * | 2008-03-05 | 2009-09-16 | Nanya Technology Corp | Feedback system and feedback method for controlling power ratio of light source |
WO2009152867A1 (en) * | 2008-06-20 | 2009-12-23 | Carl Zeiss Smt Ag | Optical system of a microlithographic projection exposure apparatus and microlithographic exposure method |
DE102008040611A1 (de) * | 2008-07-22 | 2010-01-28 | Carl Zeiss Smt Ag | Verfahren zum Modifizieren einer Polarisationsverteilung in einer mikrolithographischen Projektionsbelichtungsanlage, sowie mikrolithographische Projektionsbelichtungsanlage |
CN102124299B (zh) * | 2008-08-20 | 2014-02-26 | 国立大学法人东北大学 | 形状、倾斜度检测和/或计测光学装置和方法及其关联装置 |
JP2011014707A (ja) * | 2009-07-01 | 2011-01-20 | Canon Inc | 露光装置およびデバイス製造方法 |
DE102011003035A1 (de) * | 2010-02-08 | 2011-08-11 | Carl Zeiss SMT GmbH, 73447 | Polarisationsbeeinflussende optische Anordnung, sowie optisches System einer mikrolithographischen Projektionsbelichtungsanlage |
NL2005958A (en) * | 2010-02-09 | 2011-08-10 | Asml Netherlands Bv | Lithographic method and apparatus. |
DE102010029905A1 (de) * | 2010-06-10 | 2011-12-15 | Carl Zeiss Smt Gmbh | Optisches System einer mikrolithographischen Projektionsbelichtungsanlage |
CN103154818B (zh) * | 2010-09-28 | 2015-07-15 | 卡尔蔡司Smt有限责任公司 | 微光刻投射曝光设备的光学***以及降低图像位置误差的方法 |
TWI557432B (zh) | 2011-06-13 | 2016-11-11 | 尼康股份有限公司 | 照明方法、曝光方法、元件製造方法、照明光學系統、以及曝光裝置 |
US9732934B2 (en) | 2011-10-28 | 2017-08-15 | Nikon Corporation | Illumination device for optimizing polarization in an illumination pupil |
DE102012203944A1 (de) * | 2012-03-14 | 2013-10-02 | Carl Zeiss Smt Gmbh | Verfahren zur Justage eines optischen Systems einer mikrolithographischen Projektionsbelichtungsanlage |
US10133184B2 (en) * | 2012-04-25 | 2018-11-20 | Nikon Corporation | Using customized lens pupil optimization to enhance lithographic imaging in a source-mask optimization scheme |
Family Cites Families (10)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR100426097B1 (ko) * | 2002-04-30 | 2004-04-06 | 삼성전자주식회사 | 포토닉 크리스탈을 이용한 편광변환장치 및 이를 이용한디스플레이장치 |
JP3689681B2 (ja) | 2002-05-10 | 2005-08-31 | キヤノン株式会社 | 測定装置及びそれを有する装置群 |
TW200412617A (en) * | 2002-12-03 | 2004-07-16 | Nikon Corp | Optical illumination device, method for adjusting optical illumination device, exposure device and exposure method |
US20040248043A1 (en) * | 2003-06-03 | 2004-12-09 | Nikon Corporation | Exposure method, exposure apparatus and device manufacturing method |
JP4323903B2 (ja) | 2003-09-12 | 2009-09-02 | キヤノン株式会社 | 照明光学系及びそれを用いた露光装置 |
JP4470095B2 (ja) * | 2003-11-20 | 2010-06-02 | 株式会社ニコン | 照明光学装置、露光装置および露光方法 |
JP4552428B2 (ja) | 2003-12-02 | 2010-09-29 | 株式会社ニコン | 照明光学装置、投影露光装置、露光方法及びデバイス製造方法 |
JP4497968B2 (ja) | 2004-03-18 | 2010-07-07 | キヤノン株式会社 | 照明装置、露光装置及びデバイス製造方法 |
JP4776891B2 (ja) * | 2004-04-23 | 2011-09-21 | キヤノン株式会社 | 照明光学系、露光装置、及びデバイス製造方法 |
TW200923418A (en) * | 2005-01-21 | 2009-06-01 | Nikon Corp | Exposure device, exposure method, fabricating method of device, exposure system, information collecting device, and measuring device |
-
2006
- 2006-02-15 JP JP2006037422A patent/JP2007220767A/ja not_active Abandoned
-
2007
- 2007-02-15 EP EP07003213A patent/EP1821149A3/en not_active Withdrawn
- 2007-02-15 TW TW096105986A patent/TW200745772A/zh unknown
- 2007-02-15 US US11/675,204 patent/US7508493B2/en not_active Expired - Fee Related
- 2007-02-15 KR KR1020070015765A patent/KR100856976B1/ko not_active IP Right Cessation
Also Published As
Publication number | Publication date |
---|---|
KR100856976B1 (ko) | 2008-09-04 |
EP1821149A3 (en) | 2009-08-05 |
EP1821149A2 (en) | 2007-08-22 |
JP2007220767A (ja) | 2007-08-30 |
US7508493B2 (en) | 2009-03-24 |
US20070188730A1 (en) | 2007-08-16 |
KR20070082547A (ko) | 2007-08-21 |
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