TW200744790A - Apparatus and method for polishing objects using object cleaners - Google Patents
Apparatus and method for polishing objects using object cleanersInfo
- Publication number
- TW200744790A TW200744790A TW095133211A TW95133211A TW200744790A TW 200744790 A TW200744790 A TW 200744790A TW 095133211 A TW095133211 A TW 095133211A TW 95133211 A TW95133211 A TW 95133211A TW 200744790 A TW200744790 A TW 200744790A
- Authority
- TW
- Taiwan
- Prior art keywords
- cleaners
- polishing objects
- object cleaner
- polishing
- objects
- Prior art date
Links
- 238000000034 method Methods 0.000 title abstract 2
- 238000005498 polishing Methods 0.000 title abstract 2
- 238000012423 maintenance Methods 0.000 abstract 1
- 239000004065 semiconductor Substances 0.000 abstract 1
- 235000012431 wafers Nutrition 0.000 abstract 1
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B37/00—Lapping machines or devices; Accessories
- B24B37/34—Accessories
- B24B37/345—Feeding, loading or unloading work specially adapted to lapping
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B49/00—Measuring or gauging equipment for controlling the feed movement of the grinding tool or work; Arrangements of indicating or measuring equipment, e.g. for indicating the start of the grinding operation
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B08—CLEANING
- B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
- B08B13/00—Accessories or details of general applicability for machines or apparatus for cleaning
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B08—CLEANING
- B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
- B08B7/00—Cleaning by methods not provided for in a single other subclass or a single group in this subclass
- B08B7/04—Cleaning by methods not provided for in a single other subclass or a single group in this subclass by a combination of operations
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B37/00—Lapping machines or devices; Accessories
- B24B37/04—Lapping machines or devices; Accessories designed for working plane surfaces
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
- H01L21/302—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to change their surface-physical characteristics or shape, e.g. etching, polishing, cutting
- H01L21/304—Mechanical treatment, e.g. grinding, polishing, cutting
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67155—Apparatus for manufacturing or treating in a plurality of work-stations
- H01L21/67207—Apparatus for manufacturing or treating in a plurality of work-stations comprising a chamber adapted to a particular process
- H01L21/67219—Apparatus for manufacturing or treating in a plurality of work-stations comprising a chamber adapted to a particular process comprising at least one polishing chamber
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/677—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations
- H01L21/67739—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations into and out of processing chamber
- H01L21/67742—Mechanical parts of transfer devices
Landscapes
- Engineering & Computer Science (AREA)
- Mechanical Engineering (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Robotics (AREA)
- Finish Polishing, Edge Sharpening, And Grinding By Specific Grinding Devices (AREA)
- Mechanical Treatment Of Semiconductor (AREA)
- Cleaning Or Drying Semiconductors (AREA)
- Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US71575105P | 2005-09-09 | 2005-09-09 | |
US83025806P | 2006-07-12 | 2006-07-12 |
Publications (1)
Publication Number | Publication Date |
---|---|
TW200744790A true TW200744790A (en) | 2007-12-16 |
Family
ID=37836553
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
TW095133211A TW200744790A (en) | 2005-09-09 | 2006-09-08 | Apparatus and method for polishing objects using object cleaners |
Country Status (5)
Country | Link |
---|---|
US (1) | US7674154B2 (zh) |
JP (1) | JP2009507660A (zh) |
KR (1) | KR100981766B1 (zh) |
TW (1) | TW200744790A (zh) |
WO (1) | WO2007030779A2 (zh) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
TWI654047B (zh) | 2014-10-10 | 2019-03-21 | 日商荏原製作所股份有限公司 | 拋光處理裝置、基板處理裝置及拋光處理方法 |
Families Citing this family (13)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US7775853B2 (en) * | 2006-06-14 | 2010-08-17 | Komico Technology, Inc. | Configurable polishing apparatus |
CN102119202A (zh) * | 2008-06-23 | 2011-07-06 | 圣戈班磨料磨具有限公司 | 高孔隙率的超级磨料树脂产品以及制造方法 |
WO2010008430A1 (en) | 2008-06-23 | 2010-01-21 | Saint-Gobain Abrasives, Inc. | High porosity vitrified superabrasive products and method of preparation |
KR101040082B1 (ko) * | 2008-10-29 | 2011-06-09 | 주식회사 케이씨텍 | 화학 기계적 연마장치 |
JP5635112B2 (ja) | 2009-10-27 | 2014-12-03 | サンーゴバン アブレイシブズ,インコーポレイティド | ガラス質ボンド砥粒 |
EP2493660A4 (en) | 2009-10-27 | 2015-08-26 | Saint Gobain Abrasives Inc | RESIN-BONDED GRINDING |
US20110104997A1 (en) * | 2009-11-03 | 2011-05-05 | Jeong In-Kwon | Apparatuses and methods for polishing and cleaning semiconductor wafers |
WO2012016477A1 (zh) * | 2010-08-05 | 2012-02-09 | 清华大学 | 化学机械抛光机及具有它的化学机械抛光设备 |
CN101934496B (zh) * | 2010-08-05 | 2012-02-15 | 清华大学 | 化学机械抛光机及具有它的化学机械抛光设备 |
US9266220B2 (en) | 2011-12-30 | 2016-02-23 | Saint-Gobain Abrasives, Inc. | Abrasive articles and method of forming same |
JP6727044B2 (ja) * | 2016-06-30 | 2020-07-22 | 株式会社荏原製作所 | 基板処理装置 |
JP2020131367A (ja) * | 2019-02-20 | 2020-08-31 | 株式会社ディスコ | 研削装置 |
CN111524833B (zh) * | 2020-04-28 | 2023-04-21 | 华海清科股份有限公司 | 一种化学机械抛光***和化学机械抛光方法 |
Family Cites Families (12)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP3583490B2 (ja) * | 1994-12-28 | 2004-11-04 | 株式会社荏原製作所 | ポリッシング装置 |
US6212714B1 (en) * | 1995-01-03 | 2001-04-10 | Hill-Rom, Inc. | Hospital bed and mattress having a retracting foot section |
JP3231659B2 (ja) * | 1997-04-28 | 2001-11-26 | 日本電気株式会社 | 自動研磨装置 |
JP2000108023A (ja) * | 1998-10-05 | 2000-04-18 | Speedfam-Ipec Co Ltd | 片面研磨装置及びワークピース配置方法 |
US6309279B1 (en) * | 1999-02-19 | 2001-10-30 | Speedfam-Ipec Corporation | Arrangements for wafer polishing |
WO2001064391A2 (en) * | 2000-02-29 | 2001-09-07 | Applied Materials, Inc. | Planarization system with a wafer transfer corridor and multiple polishing modules |
US6413356B1 (en) * | 2000-05-02 | 2002-07-02 | Applied Materials, Inc. | Substrate loader for a semiconductor processing system |
TWI222154B (en) * | 2001-02-27 | 2004-10-11 | Asm Nutool Inc | Integrated system for processing semiconductor wafers |
JP4197103B2 (ja) * | 2002-04-15 | 2008-12-17 | 株式会社荏原製作所 | ポリッシング装置 |
JP2006524142A (ja) * | 2003-04-21 | 2006-10-26 | イノプラ インコーポレーテッド | 一つ以上の研磨面を使用して半導体ウェーハを研磨するための装置及び方法 |
JP4464113B2 (ja) * | 2003-11-27 | 2010-05-19 | 株式会社ディスコ | ウエーハの加工装置 |
US7195219B2 (en) * | 2003-12-10 | 2007-03-27 | A-Dec, Inc. | Modular dental chair equipment mounting system |
-
2006
- 2006-09-08 WO PCT/US2006/035183 patent/WO2007030779A2/en active Application Filing
- 2006-09-08 TW TW095133211A patent/TW200744790A/zh unknown
- 2006-09-08 US US11/517,903 patent/US7674154B2/en not_active Expired - Fee Related
- 2006-09-08 KR KR1020087005467A patent/KR100981766B1/ko not_active IP Right Cessation
- 2006-09-08 JP JP2008530248A patent/JP2009507660A/ja active Pending
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
TWI654047B (zh) | 2014-10-10 | 2019-03-21 | 日商荏原製作所股份有限公司 | 拋光處理裝置、基板處理裝置及拋光處理方法 |
Also Published As
Publication number | Publication date |
---|---|
WO2007030779A3 (en) | 2007-09-20 |
KR20080042867A (ko) | 2008-05-15 |
US7674154B2 (en) | 2010-03-09 |
KR100981766B1 (ko) | 2010-09-14 |
US20070060023A1 (en) | 2007-03-15 |
WO2007030779A2 (en) | 2007-03-15 |
JP2009507660A (ja) | 2009-02-26 |
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