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Application filed by Univ Nat Cheng KungfiledCriticalUniv Nat Cheng Kung
Priority to TW095118940ApriorityCriticalpatent/TW200743660A/zh
Publication of TW200743660ApublicationCriticalpatent/TW200743660A/zh
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Publication of TWI327156BpublicationCriticalpatent/TWI327156B/zh
material inorgânico, para produzir um material inorgânico, líquido de revestimento fotocatalisador, uso de um material inorgânico, e, método para decompor um gás nocivo