TW200739892A - An image sensor with Cu wiring and method of eliminating high reflectivity interfaces therefrom - Google Patents

An image sensor with Cu wiring and method of eliminating high reflectivity interfaces therefrom

Info

Publication number
TW200739892A
TW200739892A TW095112265A TW95112265A TW200739892A TW 200739892 A TW200739892 A TW 200739892A TW 095112265 A TW095112265 A TW 095112265A TW 95112265 A TW95112265 A TW 95112265A TW 200739892 A TW200739892 A TW 200739892A
Authority
TW
Taiwan
Prior art keywords
pixel
image sensor
barrier layer
array
layer metal
Prior art date
Application number
TW095112265A
Other languages
Chinese (zh)
Inventor
James W Adkisson
Jeffrey P Gambino
Mark D Jaffe
Robert K Leidy
Richard J Rassel
Anthony K Stamper
Original Assignee
Ibm
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Ibm filed Critical Ibm
Priority to TW095112265A priority Critical patent/TW200739892A/en
Publication of TW200739892A publication Critical patent/TW200739892A/en

Links

Abstract

An Image sensor and method of fabrication wherein the sensor includes Copper (Cu) metallization levels allowing for incorporation of a thinner interlevel dielectric stack to result in a pixel array exhibiting increased light sensitivity. The image sensor includes structures having a minimum thickness of barrier layer metal that traverses the optical path of each pixel in the sensor array or, that have portions of barrier layer metal selectively removed from the optical paths of each pixel, thereby minimizing reflectance. That is, by implementing various block or single mask methodologies, portions of the barrier layer metal are completely removed at locations of the optical path for each pixel in the array. In a further embodiment, the barrier metal layer may be formed atop the Cu metallazation by a self-aligned deposition.
TW095112265A 2006-04-06 2006-04-06 An image sensor with Cu wiring and method of eliminating high reflectivity interfaces therefrom TW200739892A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
TW095112265A TW200739892A (en) 2006-04-06 2006-04-06 An image sensor with Cu wiring and method of eliminating high reflectivity interfaces therefrom

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
TW095112265A TW200739892A (en) 2006-04-06 2006-04-06 An image sensor with Cu wiring and method of eliminating high reflectivity interfaces therefrom

Publications (1)

Publication Number Publication Date
TW200739892A true TW200739892A (en) 2007-10-16

Family

ID=57913893

Family Applications (1)

Application Number Title Priority Date Filing Date
TW095112265A TW200739892A (en) 2006-04-06 2006-04-06 An image sensor with Cu wiring and method of eliminating high reflectivity interfaces therefrom

Country Status (1)

Country Link
TW (1) TW200739892A (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US9343356B2 (en) 2013-02-20 2016-05-17 Taiwan Semiconductor Manufacturing Co., Ltd. Back end of the line (BEOL) interconnect scheme
JP2021528847A (en) * 2018-06-18 2021-10-21 ケーエルエー コーポレイション Backside illumination sensor and sensor manufacturing method

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US9343356B2 (en) 2013-02-20 2016-05-17 Taiwan Semiconductor Manufacturing Co., Ltd. Back end of the line (BEOL) interconnect scheme
JP2021528847A (en) * 2018-06-18 2021-10-21 ケーエルエー コーポレイション Backside illumination sensor and sensor manufacturing method
TWI809124B (en) * 2018-06-18 2023-07-21 美商克萊譚克公司 Back-illuminated sensor and a method of manufacturing a sensor

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