TW200731390A - Selective removal chemistries for semiconductor applications, methods of production and uses thereof - Google Patents

Selective removal chemistries for semiconductor applications, methods of production and uses thereof

Info

Publication number
TW200731390A
TW200731390A TW095116492A TW95116492A TW200731390A TW 200731390 A TW200731390 A TW 200731390A TW 095116492 A TW095116492 A TW 095116492A TW 95116492 A TW95116492 A TW 95116492A TW 200731390 A TW200731390 A TW 200731390A
Authority
TW
Taiwan
Prior art keywords
production
methods
selective removal
semiconductor applications
removal chemistries
Prior art date
Application number
TW095116492A
Other languages
Chinese (zh)
Inventor
Deborah L Yellowaga
Ben Palmer
John S Starzynski
John A Mcfarland
Marie Lowe
Original Assignee
Honeywell Int Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from PCT/US2004/038761 external-priority patent/WO2006054996A1/en
Priority claimed from US11/352,124 external-priority patent/US20060255315A1/en
Application filed by Honeywell Int Inc filed Critical Honeywell Int Inc
Publication of TW200731390A publication Critical patent/TW200731390A/en

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  • Cleaning Or Drying Semiconductors (AREA)

Abstract

Removal chemistry solutions and methods of production thereof are described herein that include at least one fluorine-based constituent, at least one chelating component, surfactant component, oxidizing component or combination thereof, and at least one solvent or solvent mixture. Removal chemistry solutions and methods of production thereof are also described herein that include at least one low H2O content fluorine-based constituent and at least one solvent or solvent mixture.
TW095116492A 2004-11-19 2006-05-10 Selective removal chemistries for semiconductor applications, methods of production and uses thereof TW200731390A (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
PCT/US2004/038761 WO2006054996A1 (en) 2004-11-19 2004-11-19 Selective removal chemistries for semiconductor applications, methods of production and uses thereof
US11/352,124 US20060255315A1 (en) 2004-11-19 2006-02-10 Selective removal chemistries for semiconductor applications, methods of production and uses thereof

Publications (1)

Publication Number Publication Date
TW200731390A true TW200731390A (en) 2007-08-16

Family

ID=57913132

Family Applications (1)

Application Number Title Priority Date Filing Date
TW095116492A TW200731390A (en) 2004-11-19 2006-05-10 Selective removal chemistries for semiconductor applications, methods of production and uses thereof

Country Status (1)

Country Link
TW (1) TW200731390A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US9771550B2 (en) 2013-12-11 2017-09-26 Fujifilm Electronic Materials U.S.A., Inc. Cleaning formulation for removing residues on surfaces

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US9771550B2 (en) 2013-12-11 2017-09-26 Fujifilm Electronic Materials U.S.A., Inc. Cleaning formulation for removing residues on surfaces

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