TW200725161A - Optical lighting device, exposure device and exposure method - Google Patents

Optical lighting device, exposure device and exposure method

Info

Publication number
TW200725161A
TW200725161A TW095140940A TW95140940A TW200725161A TW 200725161 A TW200725161 A TW 200725161A TW 095140940 A TW095140940 A TW 095140940A TW 95140940 A TW95140940 A TW 95140940A TW 200725161 A TW200725161 A TW 200725161A
Authority
TW
Taiwan
Prior art keywords
optical
lighting device
light
exposure
polarization distribution
Prior art date
Application number
TW095140940A
Other languages
English (en)
Inventor
Hirohisa Tanaka
Original Assignee
Nikon Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nikon Corp filed Critical Nikon Corp
Publication of TW200725161A publication Critical patent/TW200725161A/zh

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
    • G03F7/7055—Exposure light control in all parts of the microlithographic apparatus, e.g. pulse length control or light interruption
    • G03F7/70566—Polarisation control
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/70091—Illumination settings, i.e. intensity distribution in the pupil plane or angular distribution in the field plane; On-axis or off-axis settings, e.g. annular, dipole or quadrupole settings; Partial coherence control, i.e. sigma or numerical aperture [NA]
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/70191—Optical correction elements, filters or phase plates for controlling intensity, wavelength, polarisation, phase or the like
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
    • G02B27/28—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00 for polarising
    • G02B27/286—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00 for polarising for controlling or changing the state of polarisation, e.g. transforming one polarisation state into another

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Polarising Elements (AREA)
  • Light Sources And Details Of Projection-Printing Devices (AREA)
  • Optical Elements Other Than Lenses (AREA)
  • Microscoopes, Condenser (AREA)
TW095140940A 2005-11-10 2006-11-06 Optical lighting device, exposure device and exposure method TW200725161A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2005325787 2005-11-10

Publications (1)

Publication Number Publication Date
TW200725161A true TW200725161A (en) 2007-07-01

Family

ID=38023125

Family Applications (1)

Application Number Title Priority Date Filing Date
TW095140940A TW200725161A (en) 2005-11-10 2006-11-06 Optical lighting device, exposure device and exposure method

Country Status (6)

Country Link
US (1) US20090115989A1 (zh)
EP (1) EP1953805A4 (zh)
JP (2) JP5067162B2 (zh)
KR (1) KR20080066041A (zh)
TW (1) TW200725161A (zh)
WO (1) WO2007055120A1 (zh)

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KR101532824B1 (ko) 2003-04-09 2015-07-01 가부시키가이샤 니콘 노광 방법 및 장치, 그리고 디바이스 제조 방법
TWI573175B (zh) 2003-10-28 2017-03-01 尼康股份有限公司 照明光學裝置、曝光裝置、曝光方法以及元件製造 方法
TWI519819B (zh) 2003-11-20 2016-02-01 尼康股份有限公司 光束變換元件、光學照明裝置、曝光裝置、以及曝光方法
JP4958562B2 (ja) * 2004-01-16 2012-06-20 カール・ツァイス・エスエムティー・ゲーエムベーハー 偏光変調光学素子
US20070019179A1 (en) * 2004-01-16 2007-01-25 Damian Fiolka Polarization-modulating optical element
US8270077B2 (en) * 2004-01-16 2012-09-18 Carl Zeiss Smt Gmbh Polarization-modulating optical element
TWI395068B (zh) 2004-01-27 2013-05-01 尼康股份有限公司 光學系統、曝光裝置以及曝光方法
TW201809727A (zh) 2004-02-06 2018-03-16 日商尼康股份有限公司 偏光變換元件
DE102007010650A1 (de) * 2007-03-02 2008-09-04 Carl Zeiss Smt Ag Beleuchtungseinrichtung einer mikrolithographischen Projektionsbelichtungsanlage
KR100871024B1 (ko) * 2007-03-08 2008-11-27 삼성전기주식회사 바타입의 회절형 광변조기를 이용한 디스플레이 장치
US7872731B2 (en) * 2007-04-20 2011-01-18 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
DE102007055567A1 (de) * 2007-11-20 2009-05-28 Carl Zeiss Smt Ag Optisches System
DE102008001892A1 (de) * 2008-05-21 2009-11-26 Carl Zeiss Smt Ag Optisches System für die Mikrolithographie
US20110037962A1 (en) * 2009-08-17 2011-02-17 Nikon Corporation Polarization converting unit, illumination optical system, exposure apparatus, and device manufacturing method
JP5531518B2 (ja) * 2009-09-08 2014-06-25 株式会社ニコン 偏光変換ユニット、照明光学系、露光装置、およびデバイス製造方法
US20110205519A1 (en) * 2010-02-25 2011-08-25 Nikon Corporation Polarization converting unit, illumination optical system, exposure apparatus, and device manufacturing method
DE102012200368A1 (de) * 2012-01-12 2013-07-18 Carl Zeiss Smt Gmbh Polarisationsbeeinflussende optische Anordnung, insbesondere in einer mikrolithographischen Projektionsbelichtungsanlage
JP6041503B2 (ja) * 2012-03-13 2016-12-07 株式会社トプコン 光量調整機構
DE102013201133A1 (de) 2013-01-24 2014-07-24 Carl Zeiss Smt Gmbh Optisches System einer mikrolithographischen Projektionsbelichtungsanlage
FR3002332B1 (fr) * 2013-02-15 2015-02-27 Thales Sa Dispositif de depolarisation ameliore
US8922753B2 (en) * 2013-03-14 2014-12-30 Carl Zeiss Smt Gmbh Optical system for a microlithographic projection exposure apparatus
US9995850B2 (en) 2013-06-06 2018-06-12 Kla-Tencor Corporation System, method and apparatus for polarization control
DE102015223982A1 (de) 2015-12-02 2017-06-08 Carl Zeiss Smt Gmbh Optisches System einer mikrolithographischen Projektionsbelichtungsanlage oder einer Waferinspektionsanlage
US9945988B2 (en) * 2016-03-08 2018-04-17 Microsoft Technology Licensing, Llc Array-based camera lens system
US10012834B2 (en) 2016-03-08 2018-07-03 Microsoft Technology Licensing, Llc Exit pupil-forming display with reconvergent sheet
US10942135B2 (en) 2018-11-14 2021-03-09 Kla Corporation Radial polarizer for particle detection
US10948423B2 (en) 2019-02-17 2021-03-16 Kla Corporation Sensitive particle detection with spatially-varying polarization rotator and polarizer
JP7178932B2 (ja) * 2019-03-12 2022-11-28 キヤノン株式会社 露光装置、および物品製造方法

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KR0153796B1 (ko) * 1993-09-24 1998-11-16 사토 후미오 노광장치 및 노광방법
JP3341269B2 (ja) * 1993-12-22 2002-11-05 株式会社ニコン 投影露光装置、露光方法、半導体の製造方法及び投影光学系の調整方法
JPH10142555A (ja) * 1996-11-06 1998-05-29 Nikon Corp 投影露光装置
JP3303758B2 (ja) * 1996-12-28 2002-07-22 キヤノン株式会社 投影露光装置及びデバイスの製造方法
EP1277073B1 (en) * 2000-04-25 2006-11-15 ASML Holding N.V. Optical reduction system with control of illumination polarization
TW200412617A (en) * 2002-12-03 2004-07-16 Nikon Corp Optical illumination device, method for adjusting optical illumination device, exposure device and exposure method
JP2005005521A (ja) * 2003-06-12 2005-01-06 Nikon Corp 露光装置、露光方法、および偏光状態測定装置
DE10328938A1 (de) * 2003-06-27 2005-01-20 Carl Zeiss Smt Ag Korrektureinrichtung zur Kompensation von Störungen der Polarisationsverteilung sowie Projektionsobjektiv für die Mikrolithografie
AU2003304487A1 (en) * 2003-09-26 2005-04-14 Carl Zeiss Smt Ag Microlithographic projection exposure
JP2005108925A (ja) * 2003-09-29 2005-04-21 Nikon Corp 照明光学装置、露光装置および露光方法
WO2005036619A1 (ja) * 2003-10-09 2005-04-21 Nikon Corporation 照明光学装置、露光装置および露光方法
TWI573175B (zh) * 2003-10-28 2017-03-01 尼康股份有限公司 照明光學裝置、曝光裝置、曝光方法以及元件製造 方法
TWI519819B (zh) * 2003-11-20 2016-02-01 尼康股份有限公司 光束變換元件、光學照明裝置、曝光裝置、以及曝光方法
US6970233B2 (en) * 2003-12-03 2005-11-29 Texas Instruments Incorporated System and method for custom-polarized photolithography illumination
TW201809727A (zh) * 2004-02-06 2018-03-16 日商尼康股份有限公司 偏光變換元件
JP4497968B2 (ja) * 2004-03-18 2010-07-07 キヤノン株式会社 照明装置、露光装置及びデバイス製造方法
JP2005302826A (ja) * 2004-04-07 2005-10-27 Nikon Corp 照明光学装置、露光装置及び露光方法
DE102004035595B4 (de) * 2004-04-09 2008-02-07 Carl Zeiss Smt Ag Verfahren zur Justage eines Projektionsobjektives
US7324280B2 (en) * 2004-05-25 2008-01-29 Asml Holding N.V. Apparatus for providing a pattern of polarization
JP5159027B2 (ja) * 2004-06-04 2013-03-06 キヤノン株式会社 照明光学系及び露光装置
US7245353B2 (en) * 2004-10-12 2007-07-17 Asml Netherlands B.V. Lithographic apparatus, device manufacturing method
US7791874B2 (en) * 2004-12-30 2010-09-07 Microsoft Corporation Removable module for a console
TWI423301B (zh) * 2005-01-21 2014-01-11 尼康股份有限公司 照明光學裝置、曝光裝置、曝光方法以及元件製造方法
US20060164711A1 (en) * 2005-01-24 2006-07-27 Asml Holding N.V. System and method utilizing an electrooptic modulator

Also Published As

Publication number Publication date
WO2007055120A1 (ja) 2007-05-18
JP2012182479A (ja) 2012-09-20
KR20080066041A (ko) 2008-07-15
US20090115989A1 (en) 2009-05-07
JP5067162B2 (ja) 2012-11-07
EP1953805A1 (en) 2008-08-06
EP1953805A4 (en) 2010-03-31
JPWO2007055120A1 (ja) 2009-04-30

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