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Application filed by Chia-Hua Chan, Asia Vision Chemical Matericals Tech CofiledCriticalChia-Hua Chan
Priority to TW094138932ApriorityCriticalpatent/TW200718476A/en
Publication of TW200718476ApublicationCriticalpatent/TW200718476A/en
Micrometer structure materials with higher periodic order are made by etching technology currently. Although the etching technology can manufacture the micro-structure material with higher periodic order, its process is too complex and too expensive. The practice application still has many restrictions. This patent adopts nanomerter particles as template substrates, and simultaneously adds metaloxane, metal particles or metallic oxide particles as filler. By controlling the rotation speed and the concentration, the filler is filled with intervals between the nano-particles. The nano-particles are finally removed through solution extraction or high temperature calcination to obtain the material having nano-porous. Another material then is embedded to the material to acquire the composite material with nanometer structure.
TW094138932A2005-11-072005-11-07Nanometer structure materials and preparation the same
TW200718476A
(en)
Process for producing nanostructure composite covered structure, nanostructure composite covered structure, and reactor using the nanostructure composite covered structure
Raw material for direct reduction applications, method for producing raw material for direct reduction applications, and method for producing reduced iron.