TW200712105A - The leavening agent - Google Patents

The leavening agent

Info

Publication number
TW200712105A
TW200712105A TW094134261A TW94134261A TW200712105A TW 200712105 A TW200712105 A TW 200712105A TW 094134261 A TW094134261 A TW 094134261A TW 94134261 A TW94134261 A TW 94134261A TW 200712105 A TW200712105 A TW 200712105A
Authority
TW
Taiwan
Prior art keywords
group
substrate
volume percentage
leavening agent
solvent
Prior art date
Application number
TW094134261A
Other languages
Chinese (zh)
Other versions
TWI314939B (en
Inventor
Jing-Hong Zheng
Ren-Zhang Huang
Original Assignee
Taiwan Uyemura Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Taiwan Uyemura Co Ltd filed Critical Taiwan Uyemura Co Ltd
Priority to TW094134261A priority Critical patent/TW200712105A/en
Publication of TW200712105A publication Critical patent/TW200712105A/en
Application granted granted Critical
Publication of TWI314939B publication Critical patent/TWI314939B/zh

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  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
  • Compositions Of Macromolecular Compounds (AREA)

Abstract

The present invention provides a leavening agent comprising one or more than one solvents, where the solvents contain at least one solvent selected from the group consists of amides, alkanolamines and glycol ethers and the volume percentage of this solvent is between 2% to 98%. Another solvent has the following general chemical formula: Ra-CO-Rb-CO-Rc, wherein Ra and Rc are alkyl group, alkenyl group, alkinyl group, phenyl group, hydroxy group or carbonate group having 1 ~ 10 carbon atoms; Rb is alkyl group having 1 ~ 6 carbon atoms, and having the volume percentage between 98% to 0%. The leavening agent also contains a alkaline solution having the concentration of 20 g/L to 120 g/L with the volume percentage between 0% to 98%. The present invention provides the excellent swollen effect to general Tg (glass transition temperature) substrate, high Tg substrate, non-halogen environmental friendly substrate and BT substrate. Such Due to the low cost and low toxicity, the cost for material and wastewater treatment can be greatly reduced.
TW094134261A 2005-09-30 2005-09-30 The leavening agent TW200712105A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
TW094134261A TW200712105A (en) 2005-09-30 2005-09-30 The leavening agent

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
TW094134261A TW200712105A (en) 2005-09-30 2005-09-30 The leavening agent

Publications (2)

Publication Number Publication Date
TW200712105A true TW200712105A (en) 2007-04-01
TWI314939B TWI314939B (en) 2009-09-21

Family

ID=45073008

Family Applications (1)

Application Number Title Priority Date Filing Date
TW094134261A TW200712105A (en) 2005-09-30 2005-09-30 The leavening agent

Country Status (1)

Country Link
TW (1) TW200712105A (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN113980753A (en) * 2021-10-26 2022-01-28 江西超洋科技有限公司 Novel leavening agent and preparation method thereof
CN114133994A (en) * 2021-11-19 2022-03-04 广东世运电路科技股份有限公司 Swelling agent for manufacturing printed circuit board

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN113980753A (en) * 2021-10-26 2022-01-28 江西超洋科技有限公司 Novel leavening agent and preparation method thereof
CN113980753B (en) * 2021-10-26 2024-02-13 江西超洋科技有限公司 Leavening agent for high-speed plates and common plates and preparation method thereof
CN114133994A (en) * 2021-11-19 2022-03-04 广东世运电路科技股份有限公司 Swelling agent for manufacturing printed circuit board

Also Published As

Publication number Publication date
TWI314939B (en) 2009-09-21

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Legal Events

Date Code Title Description
MM4A Annulment or lapse of patent due to non-payment of fees