TW200707086A - Photomask with pellicle and its pellicle - Google Patents

Photomask with pellicle and its pellicle

Info

Publication number
TW200707086A
TW200707086A TW095121564A TW95121564A TW200707086A TW 200707086 A TW200707086 A TW 200707086A TW 095121564 A TW095121564 A TW 095121564A TW 95121564 A TW95121564 A TW 95121564A TW 200707086 A TW200707086 A TW 200707086A
Authority
TW
Taiwan
Prior art keywords
pellicle
photomask
sized
present
coating
Prior art date
Application number
TW095121564A
Other languages
Chinese (zh)
Inventor
Ryu Ohtaguro
Original Assignee
Hoya Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hoya Corp filed Critical Hoya Corp
Publication of TW200707086A publication Critical patent/TW200707086A/en

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/62—Pellicles, e.g. pellicle assemblies, e.g. having membrane on support frame; Preparation thereof
    • G03F1/64—Pellicles, e.g. pellicle assemblies, e.g. having membrane on support frame; Preparation thereof characterised by the frames, e.g. structure or material, including bonding means therefor
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/62—Pellicles, e.g. pellicle assemblies, e.g. having membrane on support frame; Preparation thereof
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/66—Containers specially adapted for masks, mask blanks or pellicles; Preparation thereof
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70908—Hygiene, e.g. preventing apparatus pollution, mitigating effect of pollution or removing pollutants from apparatus
    • G03F7/70916—Pollution mitigation, i.e. mitigating effect of contamination or debris, e.g. foil traps
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70983—Optical system protection, e.g. pellicles or removable covers for protection of mask

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Atmospheric Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Environmental & Geological Engineering (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)

Abstract

The present invention is provided to solve various problems due to a large-sized pellicle associated with a large-sized photomask, and to produce the large-size photomask with the pellicle coating. The photomask with the pellicle coating of the present invention is composed of a rigid and translucent material, wherein the pellicle layer (1) composed of the pellicle film (3) was coated on the surface of the photomask (4). The above-mentioned pellicle film (3) is larger than 4000 cm2 surface area.
TW095121564A 2005-06-23 2006-06-16 Photomask with pellicle and its pellicle TW200707086A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2005182858A JP2007003747A (en) 2005-06-23 2005-06-23 Photomask with pellicle, and pellicle

Publications (1)

Publication Number Publication Date
TW200707086A true TW200707086A (en) 2007-02-16

Family

ID=37583371

Family Applications (1)

Application Number Title Priority Date Filing Date
TW095121564A TW200707086A (en) 2005-06-23 2006-06-16 Photomask with pellicle and its pellicle

Country Status (4)

Country Link
JP (1) JP2007003747A (en)
KR (1) KR20060134815A (en)
CN (1) CN1885158A (en)
TW (1) TW200707086A (en)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2009025562A (en) * 2007-07-19 2009-02-05 Shin Etsu Chem Co Ltd Pellicle frame
JP5189614B2 (en) * 2010-03-29 2013-04-24 信越化学工業株式会社 Pellicle, method of attaching the pellicle, mask with pellicle and mask
TW202326286A (en) * 2018-09-12 2023-07-01 美商福昌公司 Pellicle for flat panel display photomask

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4007752B2 (en) * 1999-07-30 2007-11-14 旭化成エレクトロニクス株式会社 Large pellicle frame and large pellicle
JP2002055439A (en) * 2000-06-01 2002-02-20 Asahi Glass Co Ltd Pellicle and method for using the same
JP2002040628A (en) * 2000-07-31 2002-02-06 Asahi Glass Co Ltd Pellicle and method for bonding pellicle plate to pellicle frame
JP2002323751A (en) * 2001-04-24 2002-11-08 Asahi Glass Co Ltd Pellicle
JP2003043671A (en) * 2001-07-30 2003-02-13 Asahi Glass Co Ltd Pellicle
JP2004012597A (en) * 2002-06-04 2004-01-15 Asahi Glass Co Ltd Pellicle
JP2005062640A (en) * 2003-08-19 2005-03-10 Hoya Corp Photomask with pellicle
JP2005070120A (en) * 2003-08-27 2005-03-17 Shin Etsu Chem Co Ltd Pellicle for lithography

Also Published As

Publication number Publication date
CN1885158A (en) 2006-12-27
KR20060134815A (en) 2006-12-28
JP2007003747A (en) 2007-01-11

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