TW200702936A - Method for forming a pattern - Google Patents

Method for forming a pattern

Info

Publication number
TW200702936A
TW200702936A TW095110843A TW95110843A TW200702936A TW 200702936 A TW200702936 A TW 200702936A TW 095110843 A TW095110843 A TW 095110843A TW 95110843 A TW95110843 A TW 95110843A TW 200702936 A TW200702936 A TW 200702936A
Authority
TW
Taiwan
Prior art keywords
forming
resin film
laminate
pattern
substrate
Prior art date
Application number
TW095110843A
Other languages
Chinese (zh)
Inventor
Kenji Nakamura
Tomohiko Ushijima
Nobunori Abe
Original Assignee
Zeon Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Zeon Corp filed Critical Zeon Corp
Publication of TW200702936A publication Critical patent/TW200702936A/en

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/16—Coating processes; Apparatus therefor
    • G03F7/168—Finishing the coated layer, e.g. drying, baking, soaking

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Materials For Photolithography (AREA)
  • Application Of Or Painting With Fluid Materials (AREA)

Abstract

Method for forming a pattern comprising steps of forming a resin film by applying a photosensitive resin composition on a substrate and drying; heating -under atmospheric pressure the substrate on which the resin film is formed) forming latent image of a pattern in the resin film by irradiating light; and forming a resin pattern on the substrate by developing the latent image, wherein (1) said drying is conducted under reduced pressure and (2) value A of the photosensitive resin composition which is calculated by formula [1] : A=(1/Z) x 1n(X/Y) is 0.8 or less, X, Y and Z each representing the light transmittance (%) of a laminate of a quartz glass substrate and a resin film of the photosensitive resin composition formed on the quartz glass substrate under given conditions, the light transmittance (%) of the laminate after irradiating a light of 6000 mJ/cm<SP>2</SP> on the laminate and the thickness (μ m) of the resin film of the laminate, respectively.
TW095110843A 2005-03-30 2006-03-29 Method for forming a pattern TW200702936A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2005098031 2005-03-30

Publications (1)

Publication Number Publication Date
TW200702936A true TW200702936A (en) 2007-01-16

Family

ID=37073596

Family Applications (1)

Application Number Title Priority Date Filing Date
TW095110843A TW200702936A (en) 2005-03-30 2006-03-29 Method for forming a pattern

Country Status (4)

Country Link
JP (1) JPWO2006107056A1 (en)
KR (1) KR20070116665A (en)
TW (1) TW200702936A (en)
WO (1) WO2006107056A1 (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN106816365A (en) * 2016-12-23 2017-06-09 信利（惠州）智能显示有限公司 A kind of method of the via angle of gradient for increasing via layer

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5329999B2 (en) 2009-01-29 2013-10-30 ＡｚエレクトロニックマテリアルズＩｐ株式会社 Pattern formation method
US8526213B2 (en) 2010-11-01 2013-09-03 Micron Technology, Inc. Memory cells, methods of programming memory cells, and methods of forming memory cells

Family Cites Families (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4150834B2 (en) * 1999-03-04 2008-09-17 Ｊｓｒ株式会社 Photosensitive resin composition, photosensitive resin film and bump forming method using the same
JP2000267270A (en) * 1999-03-19 2000-09-29 Clariant (Japan) Kk Photosensitive resin composition for roll coating and roll coating method
JP4132548B2 (en) * 2000-03-01 2008-08-13 富士フイルム株式会社 Planographic printing plate precursor
JP4438080B2 (en) * 2000-09-29 2010-03-24 日本ゼオン株式会社 Radiation-sensitive resin composition for forming insulating film and insulating film for organic electroluminescence device
JP2002263548A (en) * 2001-03-12 2002-09-17 Tokyo Ohka Kogyo Co Ltd Coating forming apparatus and coating forming method
US7001705B2 (en) * 2002-04-18 2006-02-21 Nissan Chemical Industries, Ltd. Positively photosensitive resin composition and method of pattern formation
JP2005049842A (en) * 2003-07-11 2005-02-24 Sumitomo Chemical Co Ltd Photosensitive resin composition
JP4384452B2 (en) * 2003-08-28 2009-12-16 富士フイルム株式会社 Photocurable coloring resin composition, color filter and method for producing the same
JP2005284115A (en) * 2004-03-30 2005-10-13 Nippon Zeon Co Ltd Radiation sensitive resin composition for slit spin coat and its usage
JP2005284114A (en) * 2004-03-30 2005-10-13 Nippon Zeon Co Ltd Radiation sensitive resin composition for spinless slit coat and use thereof
KR101042667B1 (en) * 2004-07-05 2011-06-20 주식회사 동진쎄미켐 Photoresist composition

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN106816365A (en) * 2016-12-23 2017-06-09 信利（惠州）智能显示有限公司 A kind of method of the via angle of gradient for increasing via layer
CN106816365B (en) * 2016-12-23 2019-05-07 信利（惠州）智能显示有限公司 A method of increasing the via hole angle of gradient of via layer

Also Published As

Publication number Publication date
JPWO2006107056A1 (en) 2008-09-25
KR20070116665A (en) 2007-12-10
WO2006107056A1 (en) 2006-10-12

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