TW200701361A - Plasma processing apparatus - Google Patents
Plasma processing apparatusInfo
- Publication number
- TW200701361A TW200701361A TW095111269A TW95111269A TW200701361A TW 200701361 A TW200701361 A TW 200701361A TW 095111269 A TW095111269 A TW 095111269A TW 95111269 A TW95111269 A TW 95111269A TW 200701361 A TW200701361 A TW 200701361A
- Authority
- TW
- Taiwan
- Prior art keywords
- electric power
- frequency electric
- high frequency
- processing apparatus
- plasma processing
- Prior art date
Links
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B60—VEHICLES IN GENERAL
- B60H—ARRANGEMENTS OF HEATING, COOLING, VENTILATING OR OTHER AIR-TREATING DEVICES SPECIALLY ADAPTED FOR PASSENGER OR GOODS SPACES OF VEHICLES
- B60H1/00—Heating, cooling or ventilating [HVAC] devices
- B60H1/00642—Control systems or circuits; Control members or indication devices for heating, cooling or ventilating devices
- B60H1/00985—Control systems or circuits characterised by display or indicating devices, e.g. voice simulators
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B60—VEHICLES IN GENERAL
- B60R—VEHICLES, VEHICLE FITTINGS, OR VEHICLE PARTS, NOT OTHERWISE PROVIDED FOR
- B60R11/00—Arrangements for holding or mounting articles, not otherwise provided for
- B60R11/02—Arrangements for holding or mounting articles, not otherwise provided for for radio sets, television sets, telephones, or the like; Arrangement of controls thereof
- B60R11/0229—Arrangements for holding or mounting articles, not otherwise provided for for radio sets, television sets, telephones, or the like; Arrangement of controls thereof for displays, e.g. cathodic tubes
- B60R11/0235—Arrangements for holding or mounting articles, not otherwise provided for for radio sets, television sets, telephones, or the like; Arrangement of controls thereof for displays, e.g. cathodic tubes of flat type, e.g. LCD
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B60—VEHICLES IN GENERAL
- B60R—VEHICLES, VEHICLE FITTINGS, OR VEHICLE PARTS, NOT OTHERWISE PROVIDED FOR
- B60R16/00—Electric or fluid circuits specially adapted for vehicles and not otherwise provided for; Arrangement of elements of electric or fluid circuits specially adapted for vehicles and not otherwise provided for
- B60R16/02—Electric or fluid circuits specially adapted for vehicles and not otherwise provided for; Arrangement of elements of electric or fluid circuits specially adapted for vehicles and not otherwise provided for electric constitutive elements
- B60R16/023—Electric or fluid circuits specially adapted for vehicles and not otherwise provided for; Arrangement of elements of electric or fluid circuits specially adapted for vehicles and not otherwise provided for electric constitutive elements for transmission of signals between vehicle parts or subsystems
- B60R16/0231—Circuits relating to the driving or the functioning of the vehicle
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01H—ELECTRIC SWITCHES; RELAYS; SELECTORS; EMERGENCY PROTECTIVE DEVICES
- H01H25/00—Switches with compound movement of handle or other operating part
- H01H25/04—Operating part movable angularly in more than one plane, e.g. joystick
- H01H25/041—Operating part movable angularly in more than one plane, e.g. joystick having a generally flat operating member depressible at different locations to operate different controls
Landscapes
- Engineering & Computer Science (AREA)
- Mechanical Engineering (AREA)
- Automation & Control Theory (AREA)
- Physics & Mathematics (AREA)
- Thermal Sciences (AREA)
- Plasma Technology (AREA)
- Drying Of Semiconductors (AREA)
Abstract
To provide a plasma processing apparatus for suppressing arc discharge by preventing the plasma entrance into the gas hole of a showerhead even in case of applying a first high frequency electric power, by generating a sheath firstly with a second high frequency electric power, by adding the second high frequency electric power of 300 W to 1,000 W lower than the first frequency electric power, then adding the first frequency electric power to an upper electrode, with a time delay for 1 to 3 seconds. The plasma processing apparatus 10 is provided with an upper electrode 13 and a lower electrode 14 facing oppositely in a processing chamber 12. The second high frequency electric power is applied first to the upper electrode 13, and then with a time delay for 1 to 3 seconds after that, the first high frequency electric power is superimposed and applied.
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2005102705A JP4515950B2 (en) | 2005-03-31 | 2005-03-31 | Plasma processing apparatus, plasma processing method, and computer storage medium |
Publications (2)
Publication Number | Publication Date |
---|---|
TW200701361A true TW200701361A (en) | 2007-01-01 |
TWI409872B TWI409872B (en) | 2013-09-21 |
Family
ID=37029927
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
TW095111269A TWI409872B (en) | 2005-03-31 | 2006-03-30 | A plasma processing apparatus, a plasma processing method, and a computer memory medium |
Country Status (4)
Country | Link |
---|---|
JP (1) | JP4515950B2 (en) |
KR (1) | KR100801769B1 (en) |
CN (1) | CN1840740B (en) |
TW (1) | TWI409872B (en) |
Families Citing this family (11)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US20070066038A1 (en) * | 2004-04-30 | 2007-03-22 | Lam Research Corporation | Fast gas switching plasma processing apparatus |
US7708859B2 (en) | 2004-04-30 | 2010-05-04 | Lam Research Corporation | Gas distribution system having fast gas switching capabilities |
JP4827081B2 (en) * | 2005-12-28 | 2011-11-30 | 東京エレクトロン株式会社 | Plasma etching method and computer-readable storage medium |
JP2008186939A (en) * | 2007-01-29 | 2008-08-14 | Tokyo Electron Ltd | Plasma treatment equipment and plasma treatment method, and storage medium |
SG10201407723PA (en) * | 2007-12-19 | 2014-12-30 | Lam Res Corp | A composite showerhead electrode assembly for a plasma processing apparatus |
JP5371238B2 (en) * | 2007-12-20 | 2013-12-18 | 東京エレクトロン株式会社 | Plasma processing apparatus and plasma processing method |
US20090286397A1 (en) * | 2008-05-15 | 2009-11-19 | Lam Research Corporation | Selective inductive double patterning |
US20140256147A1 (en) * | 2011-09-26 | 2014-09-11 | Tokyo Electron Limited | Plasma processing apparatus and plasma processing method |
JP6424024B2 (en) * | 2014-06-24 | 2018-11-14 | 株式会社日立ハイテクノロジーズ | Plasma processing apparatus and plasma processing method |
CN108471666B (en) * | 2017-02-23 | 2021-06-08 | 北京北方华创微电子装备有限公司 | Plasma generating method and device and semiconductor processing equipment |
KR20230048459A (en) * | 2018-06-22 | 2023-04-11 | 도쿄엘렉트론가부시키가이샤 | Control method and plasma treatment device |
Family Cites Families (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP3437926B2 (en) * | 1998-04-28 | 2003-08-18 | シャープ株式会社 | Plasma CVD apparatus, film forming method, and cleaning method |
US6849154B2 (en) * | 1998-11-27 | 2005-02-01 | Tokyo Electron Limited | Plasma etching apparatus |
JP4831853B2 (en) * | 1999-05-11 | 2011-12-07 | 東京エレクトロン株式会社 | Capacitively coupled parallel plate plasma etching apparatus and plasma etching method using the same |
JP4578651B2 (en) * | 1999-09-13 | 2010-11-10 | 東京エレクトロン株式会社 | Plasma processing method, plasma processing apparatus, and plasma etching method |
JP4115337B2 (en) * | 2003-05-30 | 2008-07-09 | 俊夫 後藤 | Plasma processing equipment |
JP3905870B2 (en) * | 2003-08-01 | 2007-04-18 | 東京エレクトロン株式会社 | Plasma processing equipment |
-
2005
- 2005-03-31 JP JP2005102705A patent/JP4515950B2/en not_active Expired - Fee Related
-
2006
- 2006-02-17 CN CN200610007667XA patent/CN1840740B/en active Active
- 2006-03-30 TW TW095111269A patent/TWI409872B/en not_active IP Right Cessation
- 2006-03-31 KR KR1020060029671A patent/KR100801769B1/en active IP Right Grant
Also Published As
Publication number | Publication date |
---|---|
KR20060105667A (en) | 2006-10-11 |
CN1840740B (en) | 2011-10-12 |
JP2006286791A (en) | 2006-10-19 |
KR100801769B1 (en) | 2008-02-11 |
JP4515950B2 (en) | 2010-08-04 |
CN1840740A (en) | 2006-10-04 |
TWI409872B (en) | 2013-09-21 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
MM4A | Annulment or lapse of patent due to non-payment of fees |