TW200701361A - Plasma processing apparatus - Google Patents

Plasma processing apparatus

Info

Publication number
TW200701361A
TW200701361A TW095111269A TW95111269A TW200701361A TW 200701361 A TW200701361 A TW 200701361A TW 095111269 A TW095111269 A TW 095111269A TW 95111269 A TW95111269 A TW 95111269A TW 200701361 A TW200701361 A TW 200701361A
Authority
TW
Taiwan
Prior art keywords
electric power
frequency electric
high frequency
processing apparatus
plasma processing
Prior art date
Application number
TW095111269A
Other languages
Chinese (zh)
Other versions
TWI409872B (en
Inventor
Ryo Sato
Masato Minami
Original Assignee
Tokyo Electron Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Tokyo Electron Ltd filed Critical Tokyo Electron Ltd
Publication of TW200701361A publication Critical patent/TW200701361A/en
Application granted granted Critical
Publication of TWI409872B publication Critical patent/TWI409872B/en

Links

Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B60—VEHICLES IN GENERAL
    • B60H—ARRANGEMENTS OF HEATING, COOLING, VENTILATING OR OTHER AIR-TREATING DEVICES SPECIALLY ADAPTED FOR PASSENGER OR GOODS SPACES OF VEHICLES
    • B60H1/00—Heating, cooling or ventilating [HVAC] devices
    • B60H1/00642—Control systems or circuits; Control members or indication devices for heating, cooling or ventilating devices
    • B60H1/00985—Control systems or circuits characterised by display or indicating devices, e.g. voice simulators
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B60—VEHICLES IN GENERAL
    • B60R—VEHICLES, VEHICLE FITTINGS, OR VEHICLE PARTS, NOT OTHERWISE PROVIDED FOR
    • B60R11/00—Arrangements for holding or mounting articles, not otherwise provided for
    • B60R11/02—Arrangements for holding or mounting articles, not otherwise provided for for radio sets, television sets, telephones, or the like; Arrangement of controls thereof
    • B60R11/0229—Arrangements for holding or mounting articles, not otherwise provided for for radio sets, television sets, telephones, or the like; Arrangement of controls thereof for displays, e.g. cathodic tubes
    • B60R11/0235—Arrangements for holding or mounting articles, not otherwise provided for for radio sets, television sets, telephones, or the like; Arrangement of controls thereof for displays, e.g. cathodic tubes of flat type, e.g. LCD
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B60—VEHICLES IN GENERAL
    • B60R—VEHICLES, VEHICLE FITTINGS, OR VEHICLE PARTS, NOT OTHERWISE PROVIDED FOR
    • B60R16/00—Electric or fluid circuits specially adapted for vehicles and not otherwise provided for; Arrangement of elements of electric or fluid circuits specially adapted for vehicles and not otherwise provided for
    • B60R16/02—Electric or fluid circuits specially adapted for vehicles and not otherwise provided for; Arrangement of elements of electric or fluid circuits specially adapted for vehicles and not otherwise provided for electric constitutive elements
    • B60R16/023—Electric or fluid circuits specially adapted for vehicles and not otherwise provided for; Arrangement of elements of electric or fluid circuits specially adapted for vehicles and not otherwise provided for electric constitutive elements for transmission of signals between vehicle parts or subsystems
    • B60R16/0231—Circuits relating to the driving or the functioning of the vehicle
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01H—ELECTRIC SWITCHES; RELAYS; SELECTORS; EMERGENCY PROTECTIVE DEVICES
    • H01H25/00—Switches with compound movement of handle or other operating part
    • H01H25/04—Operating part movable angularly in more than one plane, e.g. joystick
    • H01H25/041—Operating part movable angularly in more than one plane, e.g. joystick having a generally flat operating member depressible at different locations to operate different controls

Landscapes

  • Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • Automation & Control Theory (AREA)
  • Physics & Mathematics (AREA)
  • Thermal Sciences (AREA)
  • Plasma Technology (AREA)
  • Drying Of Semiconductors (AREA)

Abstract

To provide a plasma processing apparatus for suppressing arc discharge by preventing the plasma entrance into the gas hole of a showerhead even in case of applying a first high frequency electric power, by generating a sheath firstly with a second high frequency electric power, by adding the second high frequency electric power of 300 W to 1,000 W lower than the first frequency electric power, then adding the first frequency electric power to an upper electrode, with a time delay for 1 to 3 seconds. The plasma processing apparatus 10 is provided with an upper electrode 13 and a lower electrode 14 facing oppositely in a processing chamber 12. The second high frequency electric power is applied first to the upper electrode 13, and then with a time delay for 1 to 3 seconds after that, the first high frequency electric power is superimposed and applied.
TW095111269A 2005-03-31 2006-03-30 A plasma processing apparatus, a plasma processing method, and a computer memory medium TWI409872B (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2005102705A JP4515950B2 (en) 2005-03-31 2005-03-31 Plasma processing apparatus, plasma processing method, and computer storage medium

Publications (2)

Publication Number Publication Date
TW200701361A true TW200701361A (en) 2007-01-01
TWI409872B TWI409872B (en) 2013-09-21

Family

ID=37029927

Family Applications (1)

Application Number Title Priority Date Filing Date
TW095111269A TWI409872B (en) 2005-03-31 2006-03-30 A plasma processing apparatus, a plasma processing method, and a computer memory medium

Country Status (4)

Country Link
JP (1) JP4515950B2 (en)
KR (1) KR100801769B1 (en)
CN (1) CN1840740B (en)
TW (1) TWI409872B (en)

Families Citing this family (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20070066038A1 (en) * 2004-04-30 2007-03-22 Lam Research Corporation Fast gas switching plasma processing apparatus
US7708859B2 (en) 2004-04-30 2010-05-04 Lam Research Corporation Gas distribution system having fast gas switching capabilities
JP4827081B2 (en) * 2005-12-28 2011-11-30 東京エレクトロン株式会社 Plasma etching method and computer-readable storage medium
JP2008186939A (en) * 2007-01-29 2008-08-14 Tokyo Electron Ltd Plasma treatment equipment and plasma treatment method, and storage medium
SG10201407723PA (en) * 2007-12-19 2014-12-30 Lam Res Corp A composite showerhead electrode assembly for a plasma processing apparatus
JP5371238B2 (en) * 2007-12-20 2013-12-18 東京エレクトロン株式会社 Plasma processing apparatus and plasma processing method
US20090286397A1 (en) * 2008-05-15 2009-11-19 Lam Research Corporation Selective inductive double patterning
US20140256147A1 (en) * 2011-09-26 2014-09-11 Tokyo Electron Limited Plasma processing apparatus and plasma processing method
JP6424024B2 (en) * 2014-06-24 2018-11-14 株式会社日立ハイテクノロジーズ Plasma processing apparatus and plasma processing method
CN108471666B (en) * 2017-02-23 2021-06-08 北京北方华创微电子装备有限公司 Plasma generating method and device and semiconductor processing equipment
KR20230048459A (en) * 2018-06-22 2023-04-11 도쿄엘렉트론가부시키가이샤 Control method and plasma treatment device

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3437926B2 (en) * 1998-04-28 2003-08-18 シャープ株式会社 Plasma CVD apparatus, film forming method, and cleaning method
US6849154B2 (en) * 1998-11-27 2005-02-01 Tokyo Electron Limited Plasma etching apparatus
JP4831853B2 (en) * 1999-05-11 2011-12-07 東京エレクトロン株式会社 Capacitively coupled parallel plate plasma etching apparatus and plasma etching method using the same
JP4578651B2 (en) * 1999-09-13 2010-11-10 東京エレクトロン株式会社 Plasma processing method, plasma processing apparatus, and plasma etching method
JP4115337B2 (en) * 2003-05-30 2008-07-09 俊夫 後藤 Plasma processing equipment
JP3905870B2 (en) * 2003-08-01 2007-04-18 東京エレクトロン株式会社 Plasma processing equipment

Also Published As

Publication number Publication date
KR20060105667A (en) 2006-10-11
CN1840740B (en) 2011-10-12
JP2006286791A (en) 2006-10-19
KR100801769B1 (en) 2008-02-11
JP4515950B2 (en) 2010-08-04
CN1840740A (en) 2006-10-04
TWI409872B (en) 2013-09-21

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Legal Events

Date Code Title Description
MM4A Annulment or lapse of patent due to non-payment of fees