TW200643582A - Inspection method, and manufacturing method for liquid crystal display using inspection method - Google Patents
Inspection method, and manufacturing method for liquid crystal display using inspection methodInfo
- Publication number
- TW200643582A TW200643582A TW095110674A TW95110674A TW200643582A TW 200643582 A TW200643582 A TW 200643582A TW 095110674 A TW095110674 A TW 095110674A TW 95110674 A TW95110674 A TW 95110674A TW 200643582 A TW200643582 A TW 200643582A
- Authority
- TW
- Taiwan
- Prior art keywords
- inspection method
- pattern element
- region
- joints
- accuracy
- Prior art date
Links
Classifications
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/1303—Apparatus specially adapted to the manufacture of LCDs
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/1306—Details
- G02F1/1309—Repairing; Testing
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/1333—Constructional arrangements; Manufacturing methods
- G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
- G02F1/133509—Filters, e.g. light shielding masks
- G02F1/133514—Colour filters
- G02F1/133516—Methods for their manufacture, e.g. printing, electro-deposition or photolithography
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/027—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/1333—Constructional arrangements; Manufacturing methods
- G02F1/133354—Arrangements for aligning or assembling substrates
Landscapes
- Physics & Mathematics (AREA)
- Nonlinear Science (AREA)
- Engineering & Computer Science (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Chemical & Material Sciences (AREA)
- Crystallography & Structural Chemistry (AREA)
- Optics & Photonics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Mathematical Physics (AREA)
- Liquid Crystal (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Devices For Indicating Variable Information By Combining Individual Elements (AREA)
Abstract
The present invention provides an inspection method that is capable of quantitatively measuring the accuracy of joints between patterns and thereby improving the accuracy of joints between patterns, and also provides a manufacturing method for liquid crystal displays using this inspection method. The inspection method for inspecting the accuracy of joints between patterns involving different exposures when a substrate is divided into a plurality of regions for separate exposures to form a predetermined pattern includes the step of, in an overlap region where a first and a second regions out of the plurality of regions overlap each other, measuring a first distance between a first pattern element obtained during exposure of the first region and a second pattern element obtained during exposure of the first region and located approximately parallel to the first pattern element; the step of, in the overlap region, measuring a second distance between the second pattern element and a third pattern element obtained during exposure of the second region and joined with the first pattern element; and the step of determining a difference between the first and the second distances to quantify the accuracy of joints by measurement.
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2005161038A JP2006337631A (en) | 2005-06-01 | 2005-06-01 | Inspection method and method for manufacturing liquid crystal display apparatus using same |
Publications (1)
Publication Number | Publication Date |
---|---|
TW200643582A true TW200643582A (en) | 2006-12-16 |
Family
ID=37484041
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
TW095110674A TW200643582A (en) | 2005-06-01 | 2006-03-28 | Inspection method, and manufacturing method for liquid crystal display using inspection method |
Country Status (5)
Country | Link |
---|---|
JP (1) | JP2006337631A (en) |
KR (1) | KR100812322B1 (en) |
CN (1) | CN1873538A (en) |
SG (1) | SG127790A1 (en) |
TW (1) | TW200643582A (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US10276438B2 (en) | 2016-08-23 | 2019-04-30 | Au Optronics Corporation | Marked pixel unit, display device using the same, and method for fabricating the display device |
Families Citing this family (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR100911331B1 (en) * | 2008-12-30 | 2009-08-07 | 주식회사 탑 엔지니어링 | Array tester and method for measuring a point of substrate of the same |
KR100911330B1 (en) * | 2008-12-30 | 2009-08-07 | 주식회사 탑 엔지니어링 | Array tester, method for measuring a point of substrate of the same and method for measuring a position cordinate |
CN102243382B (en) * | 2010-05-13 | 2014-12-31 | 上海天马微电子有限公司 | Liquid crystal display device and manufacturing method thereof, and detection and improvement device |
CN109856930B (en) * | 2017-11-30 | 2021-05-25 | 京东方科技集团股份有限公司 | Alignment mark, substrate, manufacturing method of substrate and exposure alignment method |
Family Cites Families (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6077756A (en) * | 1998-04-24 | 2000-06-20 | Vanguard International Semiconductor | Overlay target pattern and algorithm for layer-to-layer overlay metrology for semiconductor processing |
JP2000277425A (en) * | 1999-03-26 | 2000-10-06 | Nec Corp | Electron beam lithography method and its device |
JP3348783B2 (en) * | 1999-07-28 | 2002-11-20 | 日本電気株式会社 | Mark for overlay and semiconductor device |
JP4635354B2 (en) * | 2001-03-07 | 2011-02-23 | 株式会社ニコン | Exposure method, splice error measurement method, and device manufacturing method |
DE60108082T2 (en) * | 2001-05-14 | 2005-10-13 | Infineon Technologies Ag | A method of performing an alignment measurement of two patterns in different layers of a semiconductor wafer |
US7190823B2 (en) * | 2002-03-17 | 2007-03-13 | United Microelectronics Corp. | Overlay vernier pattern for measuring multi-layer overlay alignment accuracy and method for measuring the same |
-
2005
- 2005-06-01 JP JP2005161038A patent/JP2006337631A/en active Pending
-
2006
- 2006-03-24 SG SG200601991A patent/SG127790A1/en unknown
- 2006-03-28 TW TW095110674A patent/TW200643582A/en unknown
- 2006-04-25 CN CNA2006100792720A patent/CN1873538A/en active Pending
- 2006-05-25 KR KR1020060046934A patent/KR100812322B1/en not_active IP Right Cessation
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US10276438B2 (en) | 2016-08-23 | 2019-04-30 | Au Optronics Corporation | Marked pixel unit, display device using the same, and method for fabricating the display device |
Also Published As
Publication number | Publication date |
---|---|
KR20060125476A (en) | 2006-12-06 |
CN1873538A (en) | 2006-12-06 |
JP2006337631A (en) | 2006-12-14 |
KR100812322B1 (en) | 2008-03-10 |
SG127790A1 (en) | 2006-12-29 |
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