TW200633011A - Exposure device - Google Patents

Exposure device

Info

Publication number
TW200633011A
TW200633011A TW095104159A TW95104159A TW200633011A TW 200633011 A TW200633011 A TW 200633011A TW 095104159 A TW095104159 A TW 095104159A TW 95104159 A TW95104159 A TW 95104159A TW 200633011 A TW200633011 A TW 200633011A
Authority
TW
Taiwan
Prior art keywords
optical device
reticle
projection optical
frame
illumination optical
Prior art date
Application number
TW095104159A
Other languages
Chinese (zh)
Inventor
Toshimasa Shimoda
Original Assignee
Nikon Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nikon Corp filed Critical Nikon Corp
Publication of TW200633011A publication Critical patent/TW200633011A/en

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70858—Environment aspects, e.g. pressure of beam-path gas, temperature
    • G03F7/709—Vibration, e.g. vibration detection, compensation, suppression or isolation
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70808—Construction details, e.g. housing, load-lock, seals or windows for passing light in or out of apparatus
    • G03F7/70833—Mounting of optical systems, e.g. mounting of illumination system, projection system or stage systems on base-plate or ground

Landscapes

  • Health & Medical Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Environmental & Geological Engineering (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Atmospheric Sciences (AREA)
  • Toxicology (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)

Abstract

The invention provides an exposure device which is used in the photolithography process For semiconductor circuit. The goal of the invention is to maintain the relative position of the illumination optical device and the projection optical device highly and precisely. The exposure device of the invention includes an illumination optical device and a projection optical device. The illumination optical device illuminates the light on the reticle, and the projection optical device projects the light from the reticle to an induction substrate. The characteristic of the invention is that the exposure device is supporting the illumination optical device and the projection optical device on a frame, and the frame is supported in the chamber by a vibration resistant device, further the projection optical device and a reticle-side interferometer which measures the position of the reticle are fixed on the frame.
TW095104159A 2005-02-14 2006-02-08 Exposure device TW200633011A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2005036255 2005-02-14

Publications (1)

Publication Number Publication Date
TW200633011A true TW200633011A (en) 2006-09-16

Family

ID=36793096

Family Applications (1)

Application Number Title Priority Date Filing Date
TW095104159A TW200633011A (en) 2005-02-14 2006-02-08 Exposure device

Country Status (2)

Country Link
TW (1) TW200633011A (en)
WO (1) WO2006085524A1 (en)

Families Citing this family (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP3226073A3 (en) 2003-04-09 2017-10-11 Nikon Corporation Exposure method and apparatus, and method for fabricating device
TW201834020A (en) 2003-10-28 2018-09-16 日商尼康股份有限公司 Optical illumination device, exposure device, exposure method and device manufacturing method
TW201809801A (en) 2003-11-20 2018-03-16 日商尼康股份有限公司 Optical illuminating apparatus, exposure device, exposure method, and device manufacturing method
TWI437618B (en) 2004-02-06 2014-05-11 尼康股份有限公司 Polarization changing device, optical illumination apparatus, light-exposure apparatus and light-exposure method
EP1881521B1 (en) 2005-05-12 2014-07-23 Nikon Corporation Projection optical system, exposure apparatus and exposure method
US8451427B2 (en) 2007-09-14 2013-05-28 Nikon Corporation Illumination optical system, exposure apparatus, optical element and manufacturing method thereof, and device manufacturing method
JP5267029B2 (en) 2007-10-12 2013-08-21 株式会社ニコン Illumination optical apparatus, exposure apparatus, and device manufacturing method
EP2179329A1 (en) 2007-10-16 2010-04-28 Nikon Corporation Illumination optical system, exposure apparatus, and device manufacturing method
EP2179330A1 (en) 2007-10-16 2010-04-28 Nikon Corporation Illumination optical system, exposure apparatus, and device manufacturing method
US8379187B2 (en) 2007-10-24 2013-02-19 Nikon Corporation Optical unit, illumination optical apparatus, exposure apparatus, and device manufacturing method
US9116346B2 (en) 2007-11-06 2015-08-25 Nikon Corporation Illumination apparatus, illumination method, exposure apparatus, and device manufacturing method
US20090190117A1 (en) * 2008-01-24 2009-07-30 Nikon Corporation Exposure apparatus, manufacturing method and supporting method thereof
KR101695034B1 (en) 2008-05-28 2017-01-10 가부시키가이샤 니콘 Inspection device for spatial light modulator, illuminating optical system, exposure device, inspecting method, method for adjusting illuminating optical system, illuminating method, exposure method, and device manufacturing method

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2001148341A (en) * 1999-11-19 2001-05-29 Nikon Corp Aligner
JP4314054B2 (en) * 2003-04-15 2009-08-12 キヤノン株式会社 Exposure apparatus and device manufacturing method

Also Published As

Publication number Publication date
WO2006085524A1 (en) 2006-08-17

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