TW200628966A - Image exposure method and image exposure device - Google Patents
Image exposure method and image exposure deviceInfo
- Publication number
- TW200628966A TW200628966A TW094143307A TW94143307A TW200628966A TW 200628966 A TW200628966 A TW 200628966A TW 094143307 A TW094143307 A TW 094143307A TW 94143307 A TW94143307 A TW 94143307A TW 200628966 A TW200628966 A TW 200628966A
- Authority
- TW
- Taiwan
- Prior art keywords
- image
- modulation elements
- light modulation
- image exposure
- light
- Prior art date
Links
- 230000003287 optical effect Effects 0.000 abstract 3
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70216—Mask projection systems
- G03F7/70283—Mask effects on the imaging process
- G03F7/70291—Addressable masks, e.g. spatial light modulators [SLMs], digital micro-mirror devices [DMDs] or liquid crystal display [LCD] patterning devices
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03B—APPARATUS OR ARRANGEMENTS FOR TAKING PHOTOGRAPHS OR FOR PROJECTING OR VIEWING THEM; APPARATUS OR ARRANGEMENTS EMPLOYING ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ACCESSORIES THEREFOR
- G03B27/00—Photographic printing apparatus
- G03B27/32—Projection printing apparatus, e.g. enlarger, copying camera
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03B—APPARATUS OR ARRANGEMENTS FOR TAKING PHOTOGRAPHS OR FOR PROJECTING OR VIEWING THEM; APPARATUS OR ARRANGEMENTS EMPLOYING ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ACCESSORIES THEREFOR
- G03B21/00—Projectors or projection-type viewers; Accessories therefor
- G03B21/005—Projectors using an electronic spatial light modulator but not peculiar thereto
- G03B21/008—Projectors using an electronic spatial light modulator but not peculiar thereto using micromirror devices
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70216—Mask projection systems
- G03F7/7025—Size or form of projection system aperture, e.g. aperture stops, diaphragms or pupil obscuration; Control thereof
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70216—Mask projection systems
- G03F7/70275—Multiple projection paths, e.g. array of projection systems, microlens projection systems or tandem projection systems
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Mechanical Light Control Or Optical Switches (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Projection-Type Copiers In General (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2004356409A JP4588428B2 (ja) | 2004-12-09 | 2004-12-09 | 画像露光方法および装置 |
Publications (1)
Publication Number | Publication Date |
---|---|
TW200628966A true TW200628966A (en) | 2006-08-16 |
Family
ID=36577970
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
TW094143307A TW200628966A (en) | 2004-12-09 | 2005-12-08 | Image exposure method and image exposure device |
Country Status (6)
Country | Link |
---|---|
US (1) | US20100044596A1 (zh) |
JP (1) | JP4588428B2 (zh) |
KR (1) | KR101140621B1 (zh) |
CN (1) | CN101080675A (zh) |
TW (1) | TW200628966A (zh) |
WO (1) | WO2006062145A1 (zh) |
Families Citing this family (10)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US20100036294A1 (en) * | 2008-05-07 | 2010-02-11 | Robert Mantell | Radially-Firing Electrohydraulic Lithotripsy Probe |
KR101064627B1 (ko) * | 2008-12-03 | 2011-09-15 | 주식회사 프로텍 | 확산광 차단 기능을 갖는 노광장치용 마이크로프리즘 어레이 |
CA3160475A1 (en) | 2013-03-11 | 2014-09-18 | Northgate Technologies Inc. | Unfocused electrohydraulic lithotripter |
KR20150087949A (ko) * | 2014-01-23 | 2015-07-31 | 삼성디스플레이 주식회사 | 마스크리스 노광 장치 |
JP2017090523A (ja) | 2015-11-04 | 2017-05-25 | 日東電工株式会社 | 偏光板 |
US11776989B2 (en) | 2016-06-10 | 2023-10-03 | Applied Materials, Inc. | Methods of parallel transfer of micro-devices using treatment |
US11756982B2 (en) | 2016-06-10 | 2023-09-12 | Applied Materials, Inc. | Methods of parallel transfer of micro-devices using mask layer |
KR102427231B1 (ko) * | 2016-06-10 | 2022-07-28 | 어플라이드 머티어리얼스, 인코포레이티드 | 마이크로-디바이스들의 무마스크 병렬 픽-앤-플레이스 이송 |
CN111201778B (zh) * | 2017-10-19 | 2022-02-08 | 索尼公司 | 成像装置、曝光控制方法、计算机可读存储介质和成像器件 |
CN116626997A (zh) * | 2023-05-23 | 2023-08-22 | 无锡物联网创新中心有限公司 | 一种高精度数字光刻机 |
Family Cites Families (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO1997034171A2 (en) | 1996-02-28 | 1997-09-18 | Johnson Kenneth C | Microlens scanner for microlithography and wide-field confocal microscopy |
US6628390B1 (en) * | 2000-01-24 | 2003-09-30 | Kenneth C. Johnson | Wafer alignment sensor using a phase-shifted microlens array |
JP4279053B2 (ja) * | 2002-06-07 | 2009-06-17 | 富士フイルム株式会社 | 露光ヘッド及び露光装置 |
US6876494B2 (en) * | 2002-09-30 | 2005-04-05 | Fuji Photo Film Co., Ltd. | Imaging forming apparatus |
JP4208141B2 (ja) * | 2004-01-05 | 2009-01-14 | 富士フイルム株式会社 | 画像露光方法および装置 |
JP2005309380A (ja) * | 2004-03-26 | 2005-11-04 | Fuji Photo Film Co Ltd | 画像露光装置 |
-
2004
- 2004-12-09 JP JP2004356409A patent/JP4588428B2/ja active Active
-
2005
- 2005-12-01 US US11/721,018 patent/US20100044596A1/en not_active Abandoned
- 2005-12-01 CN CNA2005800419387A patent/CN101080675A/zh active Pending
- 2005-12-01 KR KR1020077013057A patent/KR101140621B1/ko active IP Right Grant
- 2005-12-01 WO PCT/JP2005/022512 patent/WO2006062145A1/en active Application Filing
- 2005-12-08 TW TW094143307A patent/TW200628966A/zh unknown
Also Published As
Publication number | Publication date |
---|---|
KR20070085985A (ko) | 2007-08-27 |
CN101080675A (zh) | 2007-11-28 |
WO2006062145A1 (en) | 2006-06-15 |
JP2006163102A (ja) | 2006-06-22 |
KR101140621B1 (ko) | 2012-05-02 |
US20100044596A1 (en) | 2010-02-25 |
JP4588428B2 (ja) | 2010-12-01 |
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