TW200615368A - Polishing pad and method for manufacturing the polishing pad - Google Patents

Polishing pad and method for manufacturing the polishing pad

Info

Publication number
TW200615368A
TW200615368A TW093134916A TW93134916A TW200615368A TW 200615368 A TW200615368 A TW 200615368A TW 093134916 A TW093134916 A TW 093134916A TW 93134916 A TW93134916 A TW 93134916A TW 200615368 A TW200615368 A TW 200615368A
Authority
TW
Taiwan
Prior art keywords
polishing pad
manufacturing
nonwoven cloth
polymer
fibers
Prior art date
Application number
TW093134916A
Other languages
Chinese (zh)
Inventor
Chung-Ching Feng
Chen-Hsiang Chao
I-Peng Yao
Yung-Chang Hung
Jyh-Jen Lee
Original Assignee
San Fang Chemical Industry Co
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by San Fang Chemical Industry Co filed Critical San Fang Chemical Industry Co
Priority to TW093134916A priority Critical patent/TW200615368A/en
Publication of TW200615368A publication Critical patent/TW200615368A/en

Links

Landscapes

  • Mechanical Treatment Of Semiconductor (AREA)
  • Nonwoven Fabrics (AREA)

Abstract

A polishing pad includes a nonwoven cloth and a continuous porous polymer. The nonwoven cloth has fibers, and the polymer has a plurality of continuous holes and is solidified in and joined to the nonwoven cloth, wherein a surface of the grind pad is constituted by the fibers of the nonwoven cloth and the polymer.
TW093134916A 2004-11-15 2004-11-15 Polishing pad and method for manufacturing the polishing pad TW200615368A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
TW093134916A TW200615368A (en) 2004-11-15 2004-11-15 Polishing pad and method for manufacturing the polishing pad

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
TW093134916A TW200615368A (en) 2004-11-15 2004-11-15 Polishing pad and method for manufacturing the polishing pad

Publications (1)

Publication Number Publication Date
TW200615368A true TW200615368A (en) 2006-05-16

Family

ID=57807946

Family Applications (1)

Application Number Title Priority Date Filing Date
TW093134916A TW200615368A (en) 2004-11-15 2004-11-15 Polishing pad and method for manufacturing the polishing pad

Country Status (1)

Country Link
TW (1) TW200615368A (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI413570B (en) * 2010-03-10 2013-11-01 San Fang Chemical Industry Co Method for making a polishing pad
US8647179B2 (en) 2007-02-01 2014-02-11 Kuraray Co., Ltd. Polishing pad, and method for manufacturing polishing pad

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US8647179B2 (en) 2007-02-01 2014-02-11 Kuraray Co., Ltd. Polishing pad, and method for manufacturing polishing pad
TWI413570B (en) * 2010-03-10 2013-11-01 San Fang Chemical Industry Co Method for making a polishing pad

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