TW200615368A - Polishing pad and method for manufacturing the polishing pad - Google Patents
Polishing pad and method for manufacturing the polishing padInfo
- Publication number
- TW200615368A TW200615368A TW093134916A TW93134916A TW200615368A TW 200615368 A TW200615368 A TW 200615368A TW 093134916 A TW093134916 A TW 093134916A TW 93134916 A TW93134916 A TW 93134916A TW 200615368 A TW200615368 A TW 200615368A
- Authority
- TW
- Taiwan
- Prior art keywords
- polishing pad
- manufacturing
- nonwoven cloth
- polymer
- fibers
- Prior art date
Links
Landscapes
- Mechanical Treatment Of Semiconductor (AREA)
- Nonwoven Fabrics (AREA)
Abstract
A polishing pad includes a nonwoven cloth and a continuous porous polymer. The nonwoven cloth has fibers, and the polymer has a plurality of continuous holes and is solidified in and joined to the nonwoven cloth, wherein a surface of the grind pad is constituted by the fibers of the nonwoven cloth and the polymer.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
TW093134916A TW200615368A (en) | 2004-11-15 | 2004-11-15 | Polishing pad and method for manufacturing the polishing pad |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
TW093134916A TW200615368A (en) | 2004-11-15 | 2004-11-15 | Polishing pad and method for manufacturing the polishing pad |
Publications (1)
Publication Number | Publication Date |
---|---|
TW200615368A true TW200615368A (en) | 2006-05-16 |
Family
ID=57807946
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
TW093134916A TW200615368A (en) | 2004-11-15 | 2004-11-15 | Polishing pad and method for manufacturing the polishing pad |
Country Status (1)
Country | Link |
---|---|
TW (1) | TW200615368A (en) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
TWI413570B (en) * | 2010-03-10 | 2013-11-01 | San Fang Chemical Industry Co | Method for making a polishing pad |
US8647179B2 (en) | 2007-02-01 | 2014-02-11 | Kuraray Co., Ltd. | Polishing pad, and method for manufacturing polishing pad |
-
2004
- 2004-11-15 TW TW093134916A patent/TW200615368A/en unknown
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US8647179B2 (en) | 2007-02-01 | 2014-02-11 | Kuraray Co., Ltd. | Polishing pad, and method for manufacturing polishing pad |
TWI413570B (en) * | 2010-03-10 | 2013-11-01 | San Fang Chemical Industry Co | Method for making a polishing pad |
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