TW200615053A - Coating apparatus and method - Google Patents
Coating apparatus and methodInfo
- Publication number
- TW200615053A TW200615053A TW094126237A TW94126237A TW200615053A TW 200615053 A TW200615053 A TW 200615053A TW 094126237 A TW094126237 A TW 094126237A TW 94126237 A TW94126237 A TW 94126237A TW 200615053 A TW200615053 A TW 200615053A
- Authority
- TW
- Taiwan
- Prior art keywords
- coating liquid
- pooled
- space
- opening
- shot
- Prior art date
Links
Landscapes
- Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- General Physics & Mathematics (AREA)
- Coating Apparatus (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Application Of Or Painting With Fluid Materials (AREA)
- Degasification And Air Bubble Elimination (AREA)
Abstract
To provide a coating device and coating method, which can hold a constant discharge amount of a coating liquid at each shot even if shots (applications) of plural times are carried out continuously. When the first shot finishes, opening and closing valves 14 and 21 are closed, an opening and closing valve 11 is opened, and a syringe pump 9 is returned to the original position to send the coating liquid again in a coating liquid-pooled space S via a degassing module 8. At this time, the inside of the coating liquid-pooled space S is under a positive pressure with an excessive pressure in order to prevent the entrainment of air from outside. Thereafter, the opening and closing valve 11 is closed to open an opening and closing valve 17 of a branch line 15 at the same time. Similarly, the excessive pressure inside the coating liquid-pooled space S is removed and decreases up to pressures close to the atmosphere pressure. Thus, by removing the excessive pressure inside the coating liquid-pooled space S just before each shot, the state before the discharge of each shot can be held always in a constant condition.
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2004228105A JP4522187B2 (en) | 2004-08-04 | 2004-08-04 | Coating apparatus and coating method |
Publications (2)
Publication Number | Publication Date |
---|---|
TW200615053A true TW200615053A (en) | 2006-05-16 |
TWI353892B TWI353892B (en) | 2011-12-11 |
Family
ID=36022751
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
TW094126237A TWI353892B (en) | 2004-08-04 | 2005-08-02 | Coating apparatus and method |
Country Status (4)
Country | Link |
---|---|
JP (1) | JP4522187B2 (en) |
KR (1) | KR101099256B1 (en) |
CN (1) | CN1736923B (en) |
TW (1) | TWI353892B (en) |
Families Citing this family (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US8397955B2 (en) | 2006-02-21 | 2013-03-19 | Musashi Engineering, Inc. | Liquid material discharge device with debubbling mechanism |
JP2008036542A (en) * | 2006-08-07 | 2008-02-21 | Tokyo Ohka Kogyo Co Ltd | Chemical liquid supply method |
JP5355881B2 (en) * | 2007-12-05 | 2013-11-27 | 東京応化工業株式会社 | Coating device |
JP5272422B2 (en) * | 2008-01-30 | 2013-08-28 | 大日本印刷株式会社 | Coating liquid supply system |
JP5419616B2 (en) | 2009-09-25 | 2014-02-19 | 武蔵エンジニアリング株式会社 | Bubble mixing prevention mechanism, liquid material discharging apparatus including the mechanism, and liquid material discharging method |
JP6942497B2 (en) * | 2016-09-08 | 2021-09-29 | 東京エレクトロン株式会社 | Processing liquid supply device |
JP2018099654A (en) * | 2016-12-21 | 2018-06-28 | アネスト岩田株式会社 | Liquid supply system using syringe pump, and method for supplying liquid to syringe pump |
CN107029913A (en) * | 2017-04-06 | 2017-08-11 | 武汉华星光电技术有限公司 | A kind of apparatus for coating and coating method |
JP7309297B2 (en) * | 2021-03-03 | 2023-07-18 | 株式会社Screenホールディングス | Liquid supply device, coating device, aging device, liquid supply method, and aging method |
Family Cites Families (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH11333352A (en) * | 1998-05-29 | 1999-12-07 | Dainippon Printing Co Ltd | Paste supply apparatus and production of plasma display panel using the same |
JP4166465B2 (en) * | 2001-12-14 | 2008-10-15 | 三菱化学株式会社 | Coating apparatus, coating method, and coated substrate manufacturing method |
JP2004141744A (en) * | 2002-10-23 | 2004-05-20 | Toppan Printing Co Ltd | Apparatus and method for supplying coating liquid |
-
2004
- 2004-08-04 JP JP2004228105A patent/JP4522187B2/en active Active
-
2005
- 2005-07-28 KR KR1020050068859A patent/KR101099256B1/en active IP Right Grant
- 2005-08-02 TW TW094126237A patent/TWI353892B/en active
- 2005-08-04 CN CN2005100885684A patent/CN1736923B/en active Active
Also Published As
Publication number | Publication date |
---|---|
TWI353892B (en) | 2011-12-11 |
JP2006043584A (en) | 2006-02-16 |
KR101099256B1 (en) | 2011-12-27 |
JP4522187B2 (en) | 2010-08-11 |
CN1736923B (en) | 2010-11-03 |
CN1736923A (en) | 2006-02-22 |
KR20060048854A (en) | 2006-05-18 |
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