TW200600263A - Voiceprint data monitor system of chemical mechanical polishing equipment - Google Patents
Voiceprint data monitor system of chemical mechanical polishing equipmentInfo
- Publication number
- TW200600263A TW200600263A TW093117760A TW93117760A TW200600263A TW 200600263 A TW200600263 A TW 200600263A TW 093117760 A TW093117760 A TW 093117760A TW 93117760 A TW93117760 A TW 93117760A TW 200600263 A TW200600263 A TW 200600263A
- Authority
- TW
- Taiwan
- Prior art keywords
- voiceprint data
- equipment
- chemical mechanical
- mechanical polishing
- polishing equipment
- Prior art date
Links
Landscapes
- General Factory Administration (AREA)
Abstract
A voiceprint data monitor system applied in a chemical mechanical polishing equipment includes a voiceprint data recording device, an equipment situation collecting device, and a comparison device. The voiceprint data recording device is installed in one side of the chemical mechanical polishing equipment and used to collect the voiceprint data generated when the chemical mechanical polishing equipment carries out polishing process. The equipment situation collecting device utilizes a communication link to carry out communication connection with the chemical mechanical polishing equipment to obtain a plurality of equipment process parameters which represents the current states of chemical mechanical polishing equipment. The comparison device is built in a standard voiceprint database and connected to the voiceprint data recording device and the equipment situation collecting device to, according to the equipment process parameters collected by the equipment situation collecting device, a correspondent standard voiceprint data to compare between the standard voiceprint data and the voiceprint data collected by the voiceprint data recording device to judge if the polishing process is under normal situation. This invention can immediately get to know if the current process is abnormal by means of the comparison of voiceprint data to further provide the process engineer to carry out correct handling.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
TW093117760A TW200600263A (en) | 2004-06-18 | 2004-06-18 | Voiceprint data monitor system of chemical mechanical polishing equipment |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
TW093117760A TW200600263A (en) | 2004-06-18 | 2004-06-18 | Voiceprint data monitor system of chemical mechanical polishing equipment |
Publications (1)
Publication Number | Publication Date |
---|---|
TW200600263A true TW200600263A (en) | 2006-01-01 |
Family
ID=57806782
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
TW093117760A TW200600263A (en) | 2004-06-18 | 2004-06-18 | Voiceprint data monitor system of chemical mechanical polishing equipment |
Country Status (1)
Country | Link |
---|---|
TW (1) | TW200600263A (en) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN108188931A (en) * | 2017-12-22 | 2018-06-22 | 华侨大学 | The on-line control system that workpiece crushes in two-sided planet grinding/attrition process |
TWI739906B (en) * | 2016-10-18 | 2021-09-21 | 日商荏原製作所股份有限公司 | Substrate processing control system, substrate processing control method, and program |
-
2004
- 2004-06-18 TW TW093117760A patent/TW200600263A/en unknown
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
TWI739906B (en) * | 2016-10-18 | 2021-09-21 | 日商荏原製作所股份有限公司 | Substrate processing control system, substrate processing control method, and program |
CN108188931A (en) * | 2017-12-22 | 2018-06-22 | 华侨大学 | The on-line control system that workpiece crushes in two-sided planet grinding/attrition process |
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