TW200533582A - Substrate carrying device - Google Patents
Substrate carrying device Download PDFInfo
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- TW200533582A TW200533582A TW094102869A TW94102869A TW200533582A TW 200533582 A TW200533582 A TW 200533582A TW 094102869 A TW094102869 A TW 094102869A TW 94102869 A TW94102869 A TW 94102869A TW 200533582 A TW200533582 A TW 200533582A
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- substrate
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- E—FIXED CONSTRUCTIONS
- E04—BUILDING
- E04F—FINISHING WORK ON BUILDINGS, e.g. STAIRS, FLOORS
- E04F15/00—Flooring
- E04F15/02—Flooring or floor layers composed of a number of similar elements
- E04F15/04—Flooring or floor layers composed of a number of similar elements only of wood or with a top layer of wood, e.g. with wooden or metal connecting members
- E04F15/041—Flooring or floor layers composed of a number of similar elements only of wood or with a top layer of wood, e.g. with wooden or metal connecting members with a top layer of wood in combination with a lower layer of other material
- E04F15/043—Flooring or floor layers composed of a number of similar elements only of wood or with a top layer of wood, e.g. with wooden or metal connecting members with a top layer of wood in combination with a lower layer of other material the lower layer being of organic plastic with or without reinforcements or filling materials
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B21/00—Layered products comprising a layer of wood, e.g. wood board, veneer, wood particle board
- B32B21/02—Layered products comprising a layer of wood, e.g. wood board, veneer, wood particle board the layer being formed of fibres, chips, or particles, e.g. MDF, HDF, OSB, chipboard, particle board, hardboard
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- E—FIXED CONSTRUCTIONS
- E04—BUILDING
- E04F—FINISHING WORK ON BUILDINGS, e.g. STAIRS, FLOORS
- E04F15/00—Flooring
- E04F15/02—Flooring or floor layers composed of a number of similar elements
- E04F15/10—Flooring or floor layers composed of a number of similar elements of other materials, e.g. fibrous or chipped materials, organic plastics, magnesite tiles, hardboard, or with a top layer of other materials
- E04F15/102—Flooring or floor layers composed of a number of similar elements of other materials, e.g. fibrous or chipped materials, organic plastics, magnesite tiles, hardboard, or with a top layer of other materials of fibrous or chipped materials, e.g. bonded with synthetic resins
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- Engineering & Computer Science (AREA)
- Architecture (AREA)
- Life Sciences & Earth Sciences (AREA)
- Wood Science & Technology (AREA)
- Civil Engineering (AREA)
- Structural Engineering (AREA)
- Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
- Non-Mechanical Conveyors (AREA)
- Framework For Endless Conveyors (AREA)
Abstract
Description
200533582 九、發明說明： 【發明所屬之技術領域】 本發明係關於一種基板搬送裝置，本發明係關於特別在 串聯（inline)方式的真空處理裝置内部，將lm以上的大型 玻璃基板保持在托架（t r a y )上，並高速地搬送之基板搬送 裝置。 【先前技術】 在用於液晶顯示裝置或電漿顯示裝置等之大型玻璃基 ® 板之成膜處理等中，採用多個處理室連接之串聯（i η 1 i n e ) 方式之真空處理裝置。將玻璃基板保持在基板托架上，呈 略垂直，依序將其送至各處理室，進行指定的處理。200533582 IX. Description of the invention: [Technical field to which the invention belongs] The present invention relates to a substrate conveying device, and the present invention relates to holding a large glass substrate of lm or more in a bracket, particularly in a vacuum processing device of an inline method. (Tray), and a high-speed substrate transfer device. [Prior art] In the film-forming process of large glass-based ® boards used in liquid crystal display devices or plasma display devices, a vacuum processing device of a series (i η 1 i n e) method connected with multiple processing chambers is used. The glass substrate is held on the substrate holder and is slightly vertical, and the glass substrate is sequentially sent to each processing chamber for a predetermined process.
此處，為了防止基板托架的歪倒，而沿搬送通路在其上 部設置有軸承等的導引構件，但若顯示裝置朝高精細度方 向進行，由於導引構件而產生的粒化造成的膜缺陷等更加 顯現，故為了防止該情況，提出有各種非接觸型的導引構 件。 圖5表示此類搬送裝置之一個例子。圖5 ( a )為沿搬送方 向觀看真空室1 0内部的示意性剖面圖。在真空室1 〇的内 部，沿搬送通路，裝設有支承導引保持玻璃基板之基板托 架（基板保持件）2 3之軸承1 2與以非接觸方式對基板托架 上部進行導引之U字型導引構件1 5。透過驅動裝置1 6，軸 承旋轉，基板托架2 3在軸承1 2上以垂直狀態移動。 該U字型導引構件1 5係以圍繞基板托架上部的方式設 置，如圖5 ( b)的部分擴大圖所示般，在導引構件内側安裝 5 312XP/發明說明書(補件)/94-05/94102869 200533582 有兩個磁鐵1 6 a、1 6 b。另一方面，以排斥兩個磁鐵1 6 a、 16b的方式，在基板托架23安裝磁鐵26，藉由磁鐵16a、 1 6 b與磁鐵2 6之排斥力，基板托架上部以隨時位於U字型 導引構件1 5内部的中心之方式，對基板托架進行導引。透 過採用此類非接觸構造之導引機構，可抑制基板上方之粒 化的發生，且可穩定地搬送基板托架。 同樣地，作為利用磁鐵的導引機構，亦揭示有以基板托 架的磁鐵和其兩側的磁鐵相互吸引之方式設置而所構成之 •搬送裝置。 [專利文獻1 ]曰本專利特開平1 0 — 1 2 0 1 7 1號公報 [專利文獻2]日本專利實公平7 — 435號公報 【發明内容】 (發明所欲解決之問題）Here, in order to prevent the substrate bracket from being tilted, a guide member such as a bearing is provided along the conveyance path along the upper portion thereof. However, if the display device is moved in a high-definition direction, it may be caused by granulation due to the guide member. Since film defects and the like are more prominent, various non-contact type guide members have been proposed in order to prevent this. Fig. 5 shows an example of such a transfer device. Fig. 5 (a) is a schematic cross-sectional view of the inside of the vacuum chamber 10 viewed in the conveying direction. Inside the vacuum chamber 10, a bearing 12 for supporting a substrate holder (substrate holder) 2 3 for guiding and holding a glass substrate is installed along the conveying path, and the upper part of the substrate holder is guided in a non-contact manner. U-shaped guide member 1 5. Through the driving device 16, the bearing rotates, and the substrate holder 2 3 moves vertically on the bearing 12. The U-shaped guide member 15 is provided so as to surround the upper part of the substrate bracket. As shown in the enlarged view of a part of FIG. 5 (b), 5 312XP / Invention Manual (Supplement) / 94-05 / 94102869 200533582 has two magnets 1 6 a, 1 6 b. On the other hand, in order to repel the two magnets 16a and 16b, a magnet 26 is mounted on the substrate holder 23. By the repulsive force of the magnets 16a, 16b and the magnet 26, the upper part of the substrate holder is positioned at U at any time. The center of the font guide member 15 guides the substrate holder. By adopting such a non-contact structure of the guide mechanism, it is possible to suppress the occurrence of granulation above the substrate and to stably transport the substrate holder. Similarly, as a guide mechanism using a magnet, a conveying device constituted by providing a magnet of a substrate holder and magnets on both sides of the substrate holder to each other is disclosed. [Patent Document 1] Japanese Patent Laid-Open Publication No. 10 — 1 2 0 1 7 1 [Patent Document 2] Japanese Patent Real Equity 7 — 435 [Summary of the Invention] (Problems to be Solved by the Invention)
但當基板大型化，且伴隨該情況，基板托架的重量增加 時，則由在圖5所示之習知之搬送裝置（日本專利特開平 1 0 — 1 2 0 1 7 1號公報）可知，基板托架上部搖動/振動變大， 一旦產生振動，則不易停止而長期持續。又，亦知道該振 動除會損壞轴承，縮短其壽命之外，並且使軸承部的粒化 發生量增加，將真空室污染。因此，為了抑制粒化的發生， 而必須降低基板托架的搬送速度，結果不得不犧牲通量 (throughput)。 又，在採用利用磁鐵吸引力之導引機構的搬送裝置（曰 本專利實公平7 _ 4 3 5號文獻）中，也有相同問題。在此情 況下，進而具有當基板托架傾斜至某種程度以上，則有基 6 312XP/發明說明書(補件)/94-05/94102869 200533582 板托架的磁鐵和導引構件中一邊的磁鐵吸引之情形，如果 設置用於防止該情形的構件’則有因該構件與基板托架之 碰撞，而產生灰塵的問題。 在此情況下，本發明之目的在於提供一種基板搬送裝 置，係可高速搬送大型基板的搬送裝置，其可抑制基板托 架的搖動，進而抑制灰塵的產生，不污染環境，且可穩定 地高速搬送。 (解決問題之手段）However, when the substrate becomes larger and the weight of the substrate holder increases with this situation, it can be known from the conventional conveying device shown in FIG. 5 (Japanese Patent Laid-Open Publication No. 10—12 0 1 71). The vibration / vibration of the upper part of the substrate holder becomes large, and once vibration occurs, it is difficult to stop and continues for a long time. It is also known that in addition to damaging the bearing and shortening its life, the vibration increases the amount of granulation in the bearing portion and contaminates the vacuum chamber. Therefore, in order to suppress the occurrence of granulation, it is necessary to reduce the conveyance speed of the substrate holder, and as a result, the throughput has to be sacrificed. In addition, a conveying device using a guide mechanism that utilizes the attraction force of a magnet (Japanese Patent Application Publication No. 7_435) has the same problem. In this case, when the substrate holder is tilted to a certain degree or more, there is a base 6 312XP / Invention Specification (Supplement) / 94-05 / 94102869 200533582 and a magnet on one side of the guide member. In the case of attraction, if a member for preventing such a situation is provided, there is a problem that dust is generated due to the collision between the member and the substrate holder. In this case, an object of the present invention is to provide a substrate conveying device, which is a conveying device capable of conveying large substrates at high speed, which can suppress the shaking of the substrate holder, thereby suppressing the generation of dust, does not pollute the environment, and can stably high speed Transport. (Means for solving problems)
本發明之基板搬送裝置係係沿真空室内的搬送通路，搬 送基板者，其特徵在於，由安裝有保持基板的基板托架 (tray)之載送器、搬送上述載送器之載送器搬送機構、及 沿搬送通路，以非接觸方式對上述載送器的上部進行導引 之載送器導引機構所構成， 上述導引機構係由在略垂直方向上被磁化之第一磁鐵 排及在略垂直方向上被磁化之第二磁鐵排按照相互吸引的 方式而設置，該第一磁鐵排為沿搬送方向安裝於上述載送 器的上部之一個或多個磁鐵，該第二磁鐵排在該第一磁鐵 排的上方或下方，按照指定間距隔開，沿搬送通路安裝固 定於真空室之一個或多個磁鐵。另一特徵為按照相鄰磁鐵 排之間，以磁化方向相反的方式，將上述第一磁鐵排及上 述第二磁鐵排以多排設置在垂直於搬送方向之方向。 如上述般，按照上下相互吸引的方式，進行設置安裝於 載送器上的第一磁鐵排，與固定而安裝於真空室的第二磁 鐵排，由此可實現更加穩定的載送器搬送。 7 312XP/發明說明書(補件)/94-05/94102869The substrate transfer device of the present invention is a person who transfers a substrate along a transfer path in a vacuum chamber, and is characterized in that the substrate is transported by a carrier on which a substrate tray holding a substrate is mounted, and a carrier that transports the carrier. Mechanism, and a carrier guide mechanism for guiding the upper part of the carrier in a non-contact manner along the conveying path, the guide mechanism is composed of a first magnet row magnetized in a substantially vertical direction and A second magnet row magnetized in a slightly vertical direction is provided to attract each other. The first magnet row is one or more magnets installed in the upper part of the carrier in the conveying direction. The second magnet row is Above or below the first magnet row, one or more magnets fixed to the vacuum chamber are installed along the conveying path and spaced at a specified interval. Another feature is that the first magnet row and the second magnet row are arranged in a plurality of rows in a direction perpendicular to the conveying direction in a manner that the magnetization directions are opposite between adjacent magnet rows. As described above, the first magnet bar mounted on the carrier and the second magnet bar fixed to the vacuum chamber are installed in such a manner as to attract each other up and down, thereby achieving more stable carrier transfer. 7 312XP / Invention Specification (Supplement) / 94-05 / 94102869
200533582 另外，透過使第一及第二磁鐵排分別按照磁化方向 相反的方式，設置成兩排以上，則可構成為在相面對 一及第二磁鐵排之間，使吸引力作用，在斜向的第一 二磁鐵排之間，使排斥力作用。此結果係即使在垂直 方向之方向上施加力，則相面對之磁鐵排之間的吸引 斜向的磁鐵排之間的排斥力，仍有相乘性作用，而可 防止從搬送通路之偏離。又，即使因某種原因而施加 的力，而使基板托架偏離，產生搖動/振動，亦可使該 動/振動在較短時間内結束，並可極力抑制粒化的發4 此外，透過採用兩個基板托架本身以對稱方式設置 送器上之穩定的自立構造，而使搬送穩定性進一步提 上述固定於真空室中的第二磁鐵排係以設置於上述 送器之第一磁鐵排上方為佳。透過上述構造，磁力可 起上述載送器的方向作用，可減少作用於支撐載送器 身重量的軸承上之負荷，除延長軸承之壽命之外，亦 一歩抑制粒化之發生。 又，本發明之特徵在於上述第一磁鐵排及/或第二^ 排中之上述多個磁鐵係按照間距隔開的方式安裝。 本發明之特徵在於上述基板托架係具有用於從處理 之相反側對基板進行加熱之開口 。又，以將上述指定 作成相對於垂直方向呈0 . 5〜3 °為佳。 透過以該範圍之角度安裝基板托架，可進一步提高 穩定性。另外，在該角度為0 . 5 °以上，則可消除基板 動或從基板托架飛出之事故，又，在為了從内面側進 312XP/發明說明書(補件)/94-05/94102869 交替 之第 及第 搬送 力與 有效 較大 等搖 〇 於載 南。 載 在提 之自 可進 兹鐵 面 角度 搬送 的振 行加 8 200533582 熱處理等，而於基板托架裝設開口之情況下，透過使角度 在3 °以下，則可防止基板本身的撓曲，而可進行均勻性較 高的成膜處理等。特別適合於邊長為1 m以上的方形基板。 本發明之特徵在於上述載送器係按照上述兩個基板托 架相互面對的方式而安裝之載送器，以將在該載送器上部 之相對垂直於搬送方向之力之磁鐵阻力，除以搬送方向之 上述基板托架之長度，所得到的值為5 . 9〜1 0 2 . 9 N / m之方 式，設置上述第一磁鐵排及第二磁鐵排。透過上述磁鐵設 ® 置，則可在沒有搖動等的情況下，穩定搬送各種尺寸的基 板。 (發明效果）200533582 In addition, by setting the first and second magnet rows in two or more rows in a manner that the magnetization directions are opposite to each other, it can be configured to make the attractive force between the facing one and the second magnet rows in an oblique manner. Between the first and second magnet rows, a repulsive force acts. This result is that even if a force is applied in the vertical direction, the repulsive force between the opposing magnet rows that attracts the oblique magnet rows still has a multiplicative effect, and the deviation from the transport path can be prevented. . In addition, even if the substrate bracket is deviated due to a force applied for some reason, and shaking / vibration occurs, the movement / vibration can be ended in a short time, and the generation of granulated particles can be suppressed as much as possible. 4 The two substrate brackets are used to set a stable self-supporting structure on the feeder in a symmetrical manner, so that the conveying stability is further improved. The second magnet row fixed in the vacuum chamber is further provided to the first magnet row of the feeder. Above is better. Through the above structure, the magnetic force can act as the direction of the carrier and reduce the load on the bearing that supports the weight of the carrier. In addition to extending the life of the bearing, it can also suppress the occurrence of granulation. In addition, the present invention is characterized in that the plurality of magnets in the first magnet row and / or the second magnet row are mounted at intervals. The present invention is characterized in that the substrate holder has an opening for heating the substrate from the opposite side of the processing. In addition, it is preferable that the above designation is 0.5 to 3 ° with respect to the vertical direction. By mounting the substrate holder at an angle within this range, the stability can be further improved. In addition, if the angle is 0.5 ° or more, the accident of moving the substrate or flying out of the substrate holder can be eliminated, and 312XP / Invention Manual (Supplement) / 94-05 / 94102869 can be alternated for entering from the inner side. The first and second conveying forces and effectiveness are relatively large. It is included in the vibration line that can be transported from the angle of the ferrite surface plus 8 200533582 heat treatment, etc., and when the opening is installed in the substrate holder, the substrate itself can be prevented from deflection by making the angle below 3 °. On the other hand, it is possible to perform a film forming process with high uniformity. Particularly suitable for square substrates with sides longer than 1 m. The present invention is characterized in that the above-mentioned carrier is a carrier mounted in such a way that the two substrate trays face each other, so that the resistance of the magnet on the upper part of the carrier relative to the force perpendicular to the conveying direction is divided by The first magnet bar and the second magnet bar are provided in such a manner that the length of the substrate holder in the conveying direction is 5.9 to 102. 9 N / m. With the above magnet setting, substrates of various sizes can be stably transported without shaking or the like. (Inventive effect)
如上所述，根據本發明，則可在抑制基板托架的搖動/ 振動的同時，進行高速的搬送。因此，可在不降低通量的 情況下，應對基板尺寸的增加。另外，抑制基板托架的搖 動或振動，且即使在產生該搖動/振動的情況下，由於馬上 衰減，故可抑制粒化的發生。結果係可適用於更高精細度 之顯示裝置之製造。又，由於將載送器作成將兩個基板托 架連接的自立構造，故搬送穩定性可進一步提高，另外， 可同時處理兩個基板，使生產性也進一步提高。 【實施方式】 以下，透過實施例，對本發明的基板搬送裝置進行更加 詳細之說明。 [實施例1 ] 圖1為表示本發明的具有基板搬送裝置的真空處理裝置 9 312XP/發明說明書(補件)/94·05/94102869As described above, according to the present invention, high-speed conveyance can be performed while suppressing shaking and vibration of the substrate holder. Therefore, it is possible to cope with an increase in the size of the substrate without reducing the throughput. In addition, it is possible to suppress the shaking or vibration of the substrate holder, and even if the shaking / vibration occurs, it is immediately attenuated, so that the occurrence of granulation can be suppressed. As a result, it is applicable to the manufacture of higher-definition display devices. In addition, since the carrier has a self-supporting structure that connects two substrate holders, the conveying stability can be further improved, and two substrates can be processed at the same time, thereby further improving the productivity. [Embodiment] Hereinafter, the substrate transfer apparatus of the present invention will be described in more detail through examples. [Example 1] Fig. 1 shows a vacuum processing apparatus having a substrate transfer apparatus according to the present invention. 9 312XP / Invention Specification (Supplement) / 94 · 05/94102869
200533582 的一個例子之示意圖。圖1 ( a )為從垂直搬送方向 觀看真空處理裝置内部之示意圖，圖1 ( b )為沿圖 A — A /線的箭視圖。 如圖1 ( a )所示，真空處理室1 0、1 (Γ透過門閥 valve)40而連接，在各真空處理室中，係有支撐 基板托架2 3之載送器2 0之軸承1 2，與用以對載 上部進行導引之第二磁鐵排1 4沿搬送通路敷設。 排1 4係設置於固定在真空室之支柱1 1之支撐體 載送器2 0構成為透過連接構件2 1，將兩個基i 上部連接之構造，在連接構件2 1下面，安裝有第 2 2。在各基板托架2 3下部，以與軸承1 2係合的 裝有係合構件2 5，載送器係介由該係合構件2 5， 承1 2上的方式導引而移動。 各基板托架係相對於垂直方向，以具有指定角 安裝。此處，在基板的一邊長度為1 m以上之情況 述角度在0 . 5 °以上為佳，藉此防止搬送中之基板 而可高速穩定搬送（例如，5 0 0〜6 0 0 m m /秒）。另外 本實施例之基板托架2 3上，設置有用以從内側對 加熱之開口 24，故如果角度增加，則在開口部處 撓曲，而以上述角度在3°以下為佳。 基板3 0透過例如安裝於基板托架2 3四邊上之 (未圖示），利用四邊按壓而保持。 圖2表示安裝於連接構件21和支撐體13上之 排2 2及第二磁鐵排1 4的設置。圖2為圖1的部名 312XP/發明說明書(補件)/94-05/94102869 之方向， 1 (a)中 (gate 具有兩個 送器20 第二磁鐵 1 3上。 &托架2 3 一磁鐵排 方式，安 支撑於軸 度的方式 下，以上 的飛出， ，由於在 基板進行 產生基板 固定夾具 第一磁鐵 —擴大圖， 10 200533582 如圖所示般，第一磁鐵排2 2及第二磁鐵排1 4均在垂直方 向上磁化，以相互吸引的方式設置。又，第一磁鐵排（及第 二磁鐵排）沿垂直搬送方向之方向的方式，平行設置成兩 排，相鄰磁鐵排2 2 a和2 2 b ( 1 4 a和1 4 b )的磁化方向為相反。 透過如此設置及磁化方向’在相面對的磁鐵排之間’亦 即，磁鐵排1 4 a與2 2 a以及1 4 b與2 2 b之間，作用有吸引 力，在相鄰磁鐵排之間，亦即，在磁鐵排1 4 a與2 2 b以及 1 4 b與2 2 a之間，作用有排斥力，透過此兩種力之相乘效 ® 果，沿第二磁鐵排，順利導引載送器。 此處，第一磁鐵排2 2和第二磁鐵排1 4之間的間距係根 據搬送速度、基板尺寸（載送器重量）及所採用磁鐵的種類 而適當地決定，通常為1〜10mm左右。另外，在第一和第二 磁鐵排中，相鄰磁鐵排（2 2 a與2 2 b，1 4 a與1 4 b )之間的間 距也按照相同方式決定、通常為0〜1 0 mm左右。200533582 A schematic illustration of an example. Fig. 1 (a) is a schematic view of the inside of the vacuum processing apparatus viewed from the vertical conveying direction, and Fig. 1 (b) is an arrow view taken along the line A-A /. As shown in FIG. 1 (a), the vacuum processing chambers 10, 1 (Γ are connected through a gate valve valve) 40, and each vacuum processing chamber is provided with a bearing 1 supporting a carrier 2 0 of a substrate holder 2 3 2, and a second magnet row 14 for guiding the upper part of the load is laid along the conveying path. Row 1 4 is a support carrier 2 0 provided on a pillar 11 fixed in a vacuum chamber, and is configured to pass through a connecting member 21 to connect two upper portions of the base i. Below the connecting member 21, a first twenty two. At the lower portion of each substrate holder 23, a coupling member 25 is fitted to the bearing 12, and the carrier is guided and moved through the coupling member 25 and the carrier 12. Each substrate bracket is mounted at a specified angle with respect to the vertical direction. Here, when the length of one side of the substrate is 1 m or more, it is preferable that the angle is 0.5 or more, so that the substrate can be transported at a high speed and stably (for example, 500 to 600 mm / sec.). ). In addition, the substrate holder 23 of this embodiment is provided with an opening 24 for heating from the inside, so if the angle is increased, the opening is deflected, and the above-mentioned angle is preferably 3 ° or less. The substrate 30 passes through (for example, not shown) attached to the four sides of the substrate holder 2 3 and is held by pressing on the four sides. Fig. 2 shows the arrangement of the rows 22 and the second magnet rows 14 mounted on the connecting member 21 and the supporting body 13. Fig. 2 shows the direction of the part name 312XP / Invention Specification (Supplement) / 94-05 / 94102869 in Fig. 1, 1 (a) (gate has two feeders 20, second magnets 1 and 3, and bracket 2) 3 A magnet bar method, which is supported by the axis, the above fly out, because the first magnet of the substrate fixing fixture is generated on the substrate-enlarged view, 10 200533582 As shown in the figure, the first magnet bar 2 2 Both the second magnet bar 14 and the second magnet bar 14 are magnetized in a vertical direction and are arranged to attract each other. In addition, the first magnet bar (and the second magnet bar) are arranged in two rows in parallel with each other in the direction of the vertical conveying direction. The magnetization directions of the adjacent magnet bars 2 2 a and 2 2 b (1 4 a and 1 4 b) are opposite. With this arrangement and the magnetization direction 'between the facing magnet bars', that is, the magnet bars 1 4 a And 2 2 a and 1 4 b and 2 2 b are attractive, between adjacent magnet rows, that is, between magnet rows 1 4 a and 2 2 b and 1 4 b and 2 2 a There is a repulsive force between them, and through the multiplication effect of these two forces, the carrier is guided smoothly along the second magnet row. Here, the first magnet The distance between the iron bar 22 and the second magnet bar 14 is appropriately determined according to the transfer speed, the size of the substrate (the weight of the carrier), and the type of magnet used, and is usually about 1 to 10 mm. In the first and second magnet rows, the distance between adjacent magnet rows (2 2 a and 2 2 b, 1 4 a and 1 4 b) is also determined in the same manner, and is usually about 0 to 10 mm.
接著，下面說明採用圖1所示搬送裝置來搬送基板，在 真空中加熱基板，進行成膜處理時之具體構成例。 加熱室1 0和成膜室1 0 /透過門閥4 0而連接，在加熱室 的情形，在與兩塊基板相對的壁面上，分別設置有燈加熱 器（未圖示），在成膜室1 0 /，分別按照與各基板面對的方 式，安裝有濺鍍靶材（未圖示）。又，形成為可將用於即使 在成膜中，仍將玻璃基板加熱到指定温度的沸騰加熱器（未 圖示）安裝於支柱1 1之間，透過基板托架的開口，對基板 進行加熱之構造。另外，在真空室中，分別安裝有排氣器（未 圖Next, a specific configuration example when the substrate is transferred using the transfer device shown in FIG. 1 and the substrate is heated in a vacuum to perform a film forming process will be described. The heating chamber 10 and the film formation chamber 10 are connected through a gate valve 40. In the case of the heating chamber, a lamp heater (not shown) is provided on the wall surface opposite to the two substrates. 10 /, sputter targets (not shown) are mounted so as to face each substrate. In addition, a boiling heater (not shown) for heating the glass substrate to a predetermined temperature even during film formation is installed between the pillars 11 and passes through the opening of the substrate holder to heat the substrate. Of the structure. In addition, the exhaust chamber (not shown) is installed in the vacuum chamber.
11 312XP/發明說明書(補件)/94-05/94102869 200533582 在未圖示的基板裝載室中，將長度（搬送方向）1. 7m、高 度1 . 6 3 m、厚度1 5 m m的鋁製基板托架2 3傾斜2 °，在利用 連接構件2 1而連接的載送器2 0上，安裝有兩塊1 . 3 (搬送 方向）X 1 . 1 m (厚度0 . 5 m m )的玻璃基板3 0。此時，載送器整 體重量約為2 0 0 k g，因係相對於搬送通路，而為對稱的自 立構造，故透過軸承穩定支承著。11 312XP / Invention Specification (Supplement) / 94-05 / 94102869 200533582 In a substrate loading chamber (not shown), the length (conveying direction) is 1. 7 m, the height is 1.6 mm, and the thickness is 15 mm. The substrate holder 23 is tilted 2 °, and two pieces of glass 1.3 (carrying direction) X 1.1 m (thickness 0.5 mm) are mounted on the carrier 20 connected by the connecting member 21. Substrate 3 0. At this time, the overall weight of the carrier is about 200 kg. Since it is a symmetrical and independent structure with respect to the conveying path, it is stably supported by the bearing.
將該載送器搬送到加熱室10，利用燈加熱器，將玻璃基 板3 0力口熱到2 5 0 °C 。然後，打開門閥4 0，搬送到成膜室 1 (Γ，進行排氣直至1 〇 _5 p a後，利用沸騰加熱器，將玻璃 基板保持在指定溫度’同時導入氣體’對革巴材施加南頻電 力，進行指定時間之濺鍍。在成膜後，將載送器搬送到非 裝載室（未圖示），回收處理基板，結束處理。反覆進行該 步驟，藉此可連續地對多塊基板進行成膜處理。 另外，雖未圖示，在基板托架之下端部，沿搬送方向形 成有直線齒輪，與其咬合之驅動齒輪設置於真空室，透過 驅動齒輪的旋轉，使載送器移動。作為搬送機構，除了此 類齒條齒輪型以外，還可適合採用例如曰本專利特開2 0 0 2 一 8 2 2 6號公報所揭示之磁式偶合型者。 在本實施例中，採用多個肥粒鐵系磁鐵片（2 0 X 1 5 X 4 0 m m )，以形成第一和第二磁鐵排。亦即，作為第二磁鐵排’ 係以5mm的間距隔開，磁化方向相互相反的方式設置兩個 磁鐵片，使其連續橫跨真空室的長度地安裝於支撐體1 3 上。另一方面，作為第一磁鐵排，係同樣地以5mm的間距， 設置兩個上述磁鐵片，沿搬送方向，依各種間距安裝之。 12 312XP/發明說明書(補件)/94-05/94102869 200533582 如上述般，改變各種載送器2 0上的磁鐵片之搬送方向 的間距，調整上述磁鐵間之吸引力及排斥力，進行5 0 0 m in / 秒的高速搬送實驗。結果係若作成相對於垂直在載送器上 部之搬送方向之方向的力F (參照圖1 ( b ))之阻力在1 Ο N以 上的磁鐵構造，則搖動、振動幾乎沒有，可穩定搬送。此 處，阻力係指在連接構件2 1上設置鉤，利用彈簧秤，沿垂 直搬送方向之方向平行地拉伸，顯示第一和第二磁鐵排偏 離0.5mm時之彈簧枰之表示值。The carrier was transported to the heating chamber 10, and the glass substrate was heated at a force of 30 to 250 ° C by a lamp heater. Then, open the gate valve 40 and transfer it to the film forming chamber 1 (Γ, exhaust it to 1 〇_5 pa, and then use a boiling heater to keep the glass substrate at a specified temperature while simultaneously introducing gas. High-frequency power, and perform sputtering for a specified time. After film formation, the carrier is transported to a non-loading chamber (not shown), the processing substrate is recovered, and the process is terminated. This step is repeated, so that multiple pieces can be continuously processed. The substrate is formed into a film. Although not shown, a linear gear is formed in the conveying direction at the lower end of the substrate holder, and a driving gear that is engaged with the linear gear is installed in the vacuum chamber. The carrier is moved by the rotation of the driving gear. As the conveying mechanism, in addition to this rack-and-pinion type, a magnetic coupling type disclosed in, for example, Japanese Patent Laid-Open Nos. 002-2 8 2 6 can be suitably used. In this embodiment, A plurality of ferrous iron-based magnet pieces (2 0 X 1 5 X 4 0 mm) are used to form a first and a second magnet row. That is, as a second magnet row, they are spaced at a pitch of 5 mm and the magnetization direction Set two in opposite ways The magnet pieces are mounted on the support body 1 3 continuously across the length of the vacuum chamber. On the other hand, as the first magnet row, two of the above-mentioned magnet pieces are also provided at a pitch of 5 mm, along the conveying direction, Install it at various pitches. 12 312XP / Invention Manual (Supplement) / 94-05 / 94102869 200533582 As mentioned above, change the spacing in the transport direction of the magnet pieces on various carriers 20, and adjust the attraction between the magnets. And repulsive force, a high-speed conveying experiment of 500 m in / sec was performed. The result is that if the force F (refer to FIG. 1 (b)) with respect to the direction perpendicular to the conveying direction on the upper part of the carrier is made to be 10 With a magnet structure of N or more, there is almost no shaking or vibration, and stable transportation is possible. Here, resistance means that a hook is provided on the connecting member 21, and a spring scale is used to stretch in parallel in the direction of the vertical conveying direction. The value of spring 枰 when the second magnet row deviates from 0.5 mm.
接著，對使用於更大型基板之處理的載送器，亦進行相 同實驗，求出搖動、振動幾乎沒有，且可穩定搬送之磁鐵 阻力。另外，基板托架的厚度均為1 5 m m。其結果與上述例 子一併整理在表1。 [表1 ] 基板（m) 1. 0x1 . 3 1. 3x1 . 5 1. 8x2. 2 基板托架（m ) 1.7x1.63 1.8x1.83 2.4x2.53 磁鐵阻力（N ) 1 0〜1 75 1 卜 185 14〜247 磁鐵阻力/托 架長度（N/m) 5. 9〜102. 9 5. 8〜102. 9 5. 8〜102· 9 由表1所示可知，用以確保穩定搬送之磁鐵阻力係隨著 基板托架尺寸而增加，將其除以搬送方向的托架長度而得 之值為在幾乎相同的範圍。因此，無論基板托架之大小， 以（磁鐵阻力/托架長度）在5.9〜102.9N/m之方式，選擇磁 鐵構造，藉此可穩定搬送各種尺寸的基板。 又，其結果係不必連續設置第一和第二磁鐵排，可大幅 削減磁鐵成本。另外，此處之上限值（1 0 2 · 9 N / m )為沒有間 隙地，在載送器的全長範圍内設置S m — C 〇系稀土類磁鐵時 13 312XP/發明說明書(補件)/94-05/94102S69 200533582 之值。 另一方面，如果連續使用載送器，則根據情況，而有磁 鐵溫度上升到3 0 0〜3 5 0 °C之情況。磁鐵的磁力係因伴隨溫 度的上升而下降，故磁鐵的構造、設置必須以估計該降低 量的方式進行設計。例如，為了使上述阻力在3 5 0 °C下為 1 0 N，則必須要求室溫（2 0 °C )的阻力為6 0 N之磁鐵構造、設 置。 又，若磁鐵溫度上升，則有透過從磁鐵排出的氣體，對 ® 成膜空間污染，而無法獲得所需膜質之情況。於是，為了 排除來自磁鐵所排出氣體之影響，磁鐵以密封收容於非磁 性金屬材料（例如，S U S 3 0 4 )之容器内，將其安裝於真空室 内及載送器為佳。 [實施例2 ] 以下，參照圖2，說明本發明的第2實施例。Next, the same experiment was performed on the carrier used for processing of larger substrates, and the resistance of the magnet which can be stably conveyed with almost no shaking and vibration was obtained. In addition, the thicknesses of the substrate holders were all 15 mm. The results are shown in Table 1 together with the above examples. [Table 1] Substrate (m) 1. 0x1. 3 1. 3x1. 5 1. 8x2. 2 Substrate bracket (m) 1.7x1.63 1.8x1.83 2.4x2.53 Magnet resistance (N) 1 0 ~ 1 75 1 185 185 14 ~ 247 Magnet resistance / length of bracket (N / m) 5. 9 ~ 102. 9 5. 8 ~ 102. 9 5. 8 ~ 102 · 9 As shown in Table 1, it is used to ensure stability The resistance of the conveyed magnet increases with the size of the substrate holder, and the value obtained by dividing it by the length of the holder in the conveying direction is in almost the same range. Therefore, regardless of the size of the substrate holder, the magnet structure is selected so that (magnet resistance / bracket length) is 5.9 to 102.9 N / m, so that substrates of various sizes can be stably transported. As a result, it is not necessary to provide the first and second magnet rows in succession, and the cost of the magnet can be significantly reduced. In addition, the upper limit (10.2 · 9 N / m) here is when there is no gap, and the S m — C 〇 rare earth magnet is installed over the entire length of the carrier 13 312XP / Invention Specification (Supplementary Document) ) / 94-05 / 94102S69 200533582. On the other hand, if the carrier is continuously used, the temperature of the magnet may increase to 300 to 350 ° C depending on the situation. The magnetic force of the magnet decreases with the increase in temperature. Therefore, the structure and installation of the magnet must be designed to estimate the amount of reduction. For example, in order for the above resistance to be 10 N at 350 ° C, a magnet structure and setting of resistance of 60 N at room temperature (20 ° C) must be required. In addition, if the temperature of the magnet rises, the gas emitted from the magnet may pollute the ® film-forming space, and the desired film quality may not be obtained. Therefore, in order to eliminate the influence of the gas discharged from the magnet, the magnet is sealedly stored in a container of a non-magnetic metal material (for example, SU S 3 0 4), and it is better to install it in a vacuum chamber and a carrier. [Embodiment 2] Hereinafter, a second embodiment of the present invention will be described with reference to Fig. 2.
本實施例係如為連接構件周邊的擴大圖之圖3所示般， 在第二磁鐵排（1 4 a…1 4 f)及第一磁鐵排（2 2 a…2 2 f)分別為 六排的情況下，藉此可進行更加穩定之載送器搬送。亦即， 藉由磁鐵排數之增加，使相對於垂直搬送方向之方向的力 (F )之阻力與偏離情形之恢復力進一步增加，提高搬送穩定 性。 [實施例3 ] 圖4表示本發明的第3實施例。圖4為朝載送器的搬送 方向，觀看真空室内部之示意圖。 在本實施例中，支撐體1 3設置於真空室1 0的頂板上， 14 312XP/發明說明書(補件)/94-05/94102869 200533582 在其下端面，安裝有多排之第二磁鐵排，而多排第一磁鐵 排則安裝於載送器連接構件2 1之上端面。除此之外，與實 施例1和2相同。亦即，磁鐵排的磁化方向均為垂直方向， 相鄰磁鐵排之間則為相反。又，設置成為在支撐體1 3和連 接構件2 1之相面對的磁鐵排之間，作用有吸引力，在相鄰 磁鐵排之間，作用有排斥力之狀態。In this embodiment, as shown in FIG. 3 which is an enlarged view of the connecting member, the second magnet row (1 4 a ... 1 4 f) and the first magnet row (2 2 a ... 2 2 f) are respectively six. In this case, it is possible to perform more stable carrier conveyance. That is, by increasing the number of magnet rows, the resistance to the force (F) in the direction perpendicular to the conveying direction and the restoring force of the deviation situation are further increased, and the conveying stability is improved. [Embodiment 3] Fig. 4 shows a third embodiment of the present invention. Fig. 4 is a schematic view of the inside of the vacuum chamber when viewed in the direction of the carrier. In this embodiment, the support body 13 is provided on the top plate of the vacuum chamber 10, and 14 312XP / Invention Specification (Supplement) / 94-05 / 94102869 200533582 On the lower end surface, a plurality of rows of second magnet bars are installed. , And a plurality of rows of first magnet rows are mounted on the upper end surface of the carrier connection member 21. Other than that, it is the same as those of Examples 1 and 2. That is, the magnetization directions of the magnet rows are all vertical, and the adjacent magnet rows are opposite. In addition, the magnets are arranged between the supporting magnets 13 and the magnet bars facing each other to connect the members 21, and the magnets are attracted to each other, and a repulsive force is applied between the adjacent magnets.
透過形成此類磁鐵設置，由於在載送器上，作用有利用 磁鐵而向上方提起的力，故減小對支撐載送器的軸承之負 荷。結果係不僅軸承的壽命延長，且可防止來自軸承之粒 化的發生，以進行更高品質之處理。 在以上的實施例中，載送器雖構成為透過連接構件，連 接固定基板托架，支撐各基板托架下部，並進行搬送的方 案，但本發明並不限於此，也可用於一個基板的情況。另 外，載送器搬送機構亦除了上述齒條齒輪型者以外，可為 驅動直接軸承者或磁力上浮型之直線馬達搬送系統等之任 何的搬送機構。 另外，磁鐵的種類可根據搬送速度的條件、溫度等處理 條件，適當地選擇，然而，例如除了採用上述的肥粒體鐵 系磁鐵、S m — C 〇系稀土類磁鐵之外，還可採用N d _ F e — B 系稀土類磁鐵等。又，在上述實施例中，採用預先考慮了 加熱所造成之磁鐵之磁鐵構造，亦可進行使磁鐵的冷卻之 構造。 【圖式簡單說明】 圖1 ( a )、（ b )為表示實施例1的具有基板搬送裝置的真 15 312XP/發明說明書(補件)/94-05/94102869 200533582 空處理裝置的一個例子之示意圖。 圖2為圖1的載送器上部周邊部之部分擴大圖。 圖3為表示實施例2的搬送裝置的導引機構之示意圖。 圖4為表示實施例3的基板搬送裝置之示意圖。 圖5 ( a )、（ b )為表示習知之基板搬送裝置的一個例子之 示意圖。 【主要元件符號說明】 1 (Τ 10、 11 12 13 14 14a 14b 14f 15 16 真空處理室 支柱 軸承 支撐體 第二磁鐵排 磁鐵 磁鐵 磁鐵 導引構件 驅動裝置 1 6 a、1 6 b 磁鐵 20 載送器 2 1 連接構件 22 第一磁鐵排 22a 磁鐵 2 2b 磁鐵 2 2 f 磁鐵 16 312ΧΡ/發明說明書(補件)/94-05/94102869 200533582By forming such an arrangement of magnets, since the force to be lifted upward by the magnets acts on the carrier, the load on the bearing supporting the carrier is reduced. As a result, not only the life of the bearing is prolonged, but also granulation from the bearing can be prevented for a higher quality treatment. In the above embodiments, although the carrier is configured to pass through the connection member, connect and fix the substrate tray, support the lower portion of each substrate tray, and carry out the solution, but the present invention is not limited to this, and can also be used for a substrate Happening. In addition to the rack and pinion type described above, the carrier transfer mechanism may be any type of transfer mechanism that drives a direct bearing or a magnetically floating linear motor transfer system. In addition, the type of magnet can be appropriately selected according to the processing conditions such as the conveying speed and temperature. However, for example, in addition to the ferritic iron magnets and Sm-C0 rare earth magnets described above, it can also be used. N d _ F e — B series rare earth magnets, etc. Further, in the above-mentioned embodiment, a magnet structure in which a magnet due to heating is taken into consideration is adopted, and a structure for cooling the magnet may be used. [Brief Description of the Drawings] Figures 1 (a) and (b) show an example of a true 15 312XP / Invention Specification (Supplement) / 94-05 / 94102869 200533582 empty processing device with a substrate transfer device of Example 1. schematic diagram. FIG. 2 is an enlarged view of a part of an upper peripheral portion of the carrier of FIG. 1. FIG. FIG. 3 is a schematic diagram showing a guide mechanism of a conveying device according to a second embodiment. FIG. 4 is a schematic diagram showing a substrate transfer apparatus of Example 3. FIG. 5 (a) and (b) are schematic diagrams showing an example of a conventional substrate transfer apparatus. [Description of main component symbols] 1 (T 10, 11 12 13 14 14a 14b 14f 15 16 Vacuum processing chamber pillar bearing support second magnet row magnet magnet magnet guide member driving device 1 6 a, 1 6 b magnet 20 carrying Device 2 1 connecting member 22 first magnet row 22a magnet 2 2b magnet 2 2 f magnet 16 312XP / Invention Manual (Supplement) / 94-05 / 94102869 200533582
23 基 板 托 % (tray) 24 開 V 25 係 合 構 件 26 磁 鐵 30 基 板 40 門 閥 312XP/發明說明書(補件)/94-05/94102869 1723 Base plate bracket% (tray) 24 open V 25 coupling components 26 magnet 30 base plate 40 door valve 312XP / Invention Manual (Supplement) / 94-05 / 94102869 17
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| JP2004105072A JP4471708B2 (en) | 2004-03-31 | 2004-03-31 | Substrate transfer device |
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| Publication Number | Publication Date |
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| TW200533582A true TW200533582A (en) | 2005-10-16 |
| TWI334401B TWI334401B (en) | 2010-12-11 |
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| Application Number | Title | Priority Date | Filing Date |
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| TW094102869A TWI334401B (en) | 2004-03-31 | 2005-01-31 | Substrate transport apparatus |
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| JP (1) | JP4471708B2 (en) |
| KR (1) | KR101088665B1 (en) |
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| TW (1) | TWI334401B (en) |
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| JP2687306B2 (en) * | 1994-05-16 | 1997-12-08 | 株式会社エイコー・エンジニアリング | Substrate transfer device in vacuum system |
| CH691680A5 (en) * | 1996-10-15 | 2001-09-14 | Unaxis Deutschland Gmbh | Transport apparatus for workpieces in a vacuum system. |
| EP1027730A1 (en) * | 1997-09-30 | 2000-08-16 | Semitool, Inc. | Semiconductor processing apparatus having linear conveyor system |
| US6206176B1 (en) * | 1998-05-20 | 2001-03-27 | Applied Komatsu Technology, Inc. | Substrate transfer shuttle having a magnetic drive |
| JP2000177842A (en) * | 1998-12-10 | 2000-06-27 | Mitsubishi Heavy Ind Ltd | Carrying device and vacuum processing device |
| JP3842935B2 (en) * | 1999-10-22 | 2006-11-08 | 三菱重工業株式会社 | Trayless diagonal substrate transfer device |
-
2004
- 2004-03-31 JP JP2004105072A patent/JP4471708B2/en not_active Expired - Lifetime
-
2005
- 2005-01-31 TW TW094102869A patent/TWI334401B/en active
- 2005-02-03 KR KR1020050009809A patent/KR101088665B1/en active IP Right Grant
- 2005-03-31 CN CN2005100598529A patent/CN1676445B/en active Active
Also Published As
| Publication number | Publication date |
|---|---|
| CN1676445A (en) | 2005-10-05 |
| TWI334401B (en) | 2010-12-11 |
| JP4471708B2 (en) | 2010-06-02 |
| KR20060041618A (en) | 2006-05-12 |
| JP2005289556A (en) | 2005-10-20 |
| KR101088665B1 (en) | 2011-12-01 |
| CN1676445B (en) | 2011-06-08 |
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