Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from JP2003014274Aexternal-prioritypatent/JP3944734B2/en
Application filed by Shinetsu Chemical CofiledCriticalShinetsu Chemical Co
Publication of TW200420621ApublicationCriticalpatent/TW200420621A/en
Application grantedgrantedCritical
Publication of TWI318989BpublicationCriticalpatent/TWI318989B/zh
A novel organosiloxane polymer is obtained by addition reaction of an organohydrogenpolysiloxane (1), an alkenyl-containing organopolysiloxane (2) and an unsaturated compound of formula (3) or (4). Using the organosiloxane polymer, a photo-curable resin composition is prepared which can be exposed to radiation having a wide range of wavelength and developed to form a pattern.
TW93101668A2003-01-232004-01-20Organosiloxane polymer, photo-curable resin composition, patterning process, and substrate protective film
TW200420621A
(en)
Radiation-curing resin composition and preservation method thereof, forming method of curing film, forming method and operating method of pattern, electronic device and optical wave guide