TR202001999A2 - LOW-STRESS STEREOLITOGRAPHY - Google Patents
LOW-STRESS STEREOLITOGRAPHYInfo
- Publication number
- TR202001999A2 TR202001999A2 TR2020/01999A TR202001999A TR202001999A2 TR 202001999 A2 TR202001999 A2 TR 202001999A2 TR 2020/01999 A TR2020/01999 A TR 2020/01999A TR 202001999 A TR202001999 A TR 202001999A TR 202001999 A2 TR202001999 A2 TR 202001999A2
- Authority
- TR
- Turkey
- Prior art keywords
- tank
- resin
- axis
- platform
- laser
- Prior art date
Links
- 239000011347 resin Substances 0.000 claims description 105
- 229920005989 resin Polymers 0.000 claims description 105
- 230000033001 locomotion Effects 0.000 claims description 65
- 238000000034 method Methods 0.000 claims description 30
- 238000007639 printing Methods 0.000 claims description 17
- 230000008014 freezing Effects 0.000 claims description 11
- 238000007710 freezing Methods 0.000 claims description 11
- 239000000463 material Substances 0.000 claims description 11
- 230000008569 process Effects 0.000 claims description 11
- 230000007246 mechanism Effects 0.000 claims description 8
- -1 Polyethylene Terephthalate Polymers 0.000 claims description 6
- 229920003229 poly(methyl methacrylate) Polymers 0.000 claims description 6
- 229920000139 polyethylene terephthalate Polymers 0.000 claims description 6
- 239000005020 polyethylene terephthalate Substances 0.000 claims description 6
- 239000004926 polymethyl methacrylate Substances 0.000 claims description 6
- 239000004812 Fluorinated ethylene propylene Substances 0.000 claims description 5
- 230000005540 biological transmission Effects 0.000 claims description 5
- 229920009441 perflouroethylene propylene Polymers 0.000 claims description 5
- 229920001343 polytetrafluoroethylene Polymers 0.000 claims description 5
- 239000004810 polytetrafluoroethylene Substances 0.000 claims description 5
- NIXOWILDQLNWCW-UHFFFAOYSA-M Acrylate Chemical compound [O-]C(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-M 0.000 claims description 3
- 230000015572 biosynthetic process Effects 0.000 claims description 3
- HQQADJVZYDDRJT-UHFFFAOYSA-N ethene;prop-1-ene Chemical group C=C.CC=C HQQADJVZYDDRJT-UHFFFAOYSA-N 0.000 claims description 3
- 239000004417 polycarbonate Substances 0.000 claims description 3
- 229920000515 polycarbonate Polymers 0.000 claims description 3
- 230000003068 static effect Effects 0.000 claims description 3
- 239000011145 styrene acrylonitrile resin Substances 0.000 claims description 3
- 238000003466 welding Methods 0.000 claims description 3
- NLHHRLWOUZZQLW-UHFFFAOYSA-N Acrylonitrile Chemical compound C=CC#N NLHHRLWOUZZQLW-UHFFFAOYSA-N 0.000 claims description 2
- 239000000446 fuel Substances 0.000 claims description 2
- 238000004519 manufacturing process Methods 0.000 claims description 2
- 230000006835 compression Effects 0.000 claims 1
- 238000007906 compression Methods 0.000 claims 1
- 239000011152 fibreglass Substances 0.000 claims 1
- 238000000926 separation method Methods 0.000 description 4
- 239000004575 stone Substances 0.000 description 3
- 230000009471 action Effects 0.000 description 2
- 238000010276 construction Methods 0.000 description 2
- 238000005516 engineering process Methods 0.000 description 2
- 239000000178 monomer Substances 0.000 description 2
- 230000010355 oscillation Effects 0.000 description 2
- 229920000642 polymer Polymers 0.000 description 2
- RSWGJHLUYNHPMX-UHFFFAOYSA-N Abietic-Saeure Natural products C12CCC(C(C)C)=CC2=CCC2C1(C)CCCC2(C)C(O)=O RSWGJHLUYNHPMX-UHFFFAOYSA-N 0.000 description 1
- 235000008733 Citrus aurantifolia Nutrition 0.000 description 1
- 241001282135 Poromitra oscitans Species 0.000 description 1
- 241000220317 Rosa Species 0.000 description 1
- KHPCPRHQVVSZAH-HUOMCSJISA-N Rosin Natural products O(C/C=C/c1ccccc1)[C@H]1[C@H](O)[C@@H](O)[C@@H](O)[C@@H](CO)O1 KHPCPRHQVVSZAH-HUOMCSJISA-N 0.000 description 1
- 235000011941 Tilia x europaea Nutrition 0.000 description 1
- 206010048232 Yawning Diseases 0.000 description 1
- 229920001893 acrylonitrile styrene Polymers 0.000 description 1
- 239000000853 adhesive Substances 0.000 description 1
- 230000001070 adhesive effect Effects 0.000 description 1
- 230000032683 aging Effects 0.000 description 1
- 230000001174 ascending effect Effects 0.000 description 1
- 238000006243 chemical reaction Methods 0.000 description 1
- 210000003298 dental enamel Anatomy 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 230000008030 elimination Effects 0.000 description 1
- 238000003379 elimination reaction Methods 0.000 description 1
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 1
- 239000010931 gold Substances 0.000 description 1
- 229910052737 gold Inorganic materials 0.000 description 1
- 239000004571 lime Substances 0.000 description 1
- 238000002844 melting Methods 0.000 description 1
- 230000008018 melting Effects 0.000 description 1
- SCUZVMOVTVSBLE-UHFFFAOYSA-N prop-2-enenitrile;styrene Chemical compound C=CC#N.C=CC1=CC=CC=C1 SCUZVMOVTVSBLE-UHFFFAOYSA-N 0.000 description 1
- 230000035945 sensitivity Effects 0.000 description 1
- 230000003746 surface roughness Effects 0.000 description 1
- 230000009897 systematic effect Effects 0.000 description 1
- KHPCPRHQVVSZAH-UHFFFAOYSA-N trans-cinnamyl beta-D-glucopyranoside Natural products OC1C(O)C(O)C(CO)OC1OCC=CC1=CC=CC=C1 KHPCPRHQVVSZAH-UHFFFAOYSA-N 0.000 description 1
- 230000007704 transition Effects 0.000 description 1
- 238000002834 transmittance Methods 0.000 description 1
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
- B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
- B29C64/00—Additive manufacturing, i.e. manufacturing of three-dimensional [3D] objects by additive deposition, additive agglomeration or additive layering, e.g. by 3D printing, stereolithography or selective laser sintering
- B29C64/10—Processes of additive manufacturing
- B29C64/106—Processes of additive manufacturing using only liquids or viscous materials, e.g. depositing a continuous bead of viscous material
- B29C64/124—Processes of additive manufacturing using only liquids or viscous materials, e.g. depositing a continuous bead of viscous material using layers of liquid which are selectively solidified
- B29C64/129—Processes of additive manufacturing using only liquids or viscous materials, e.g. depositing a continuous bead of viscous material using layers of liquid which are selectively solidified characterised by the energy source therefor, e.g. by global irradiation combined with a mask
- B29C64/135—Processes of additive manufacturing using only liquids or viscous materials, e.g. depositing a continuous bead of viscous material using layers of liquid which are selectively solidified characterised by the energy source therefor, e.g. by global irradiation combined with a mask the energy source being concentrated, e.g. scanning lasers or focused light sources
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
- B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
- B29C64/00—Additive manufacturing, i.e. manufacturing of three-dimensional [3D] objects by additive deposition, additive agglomeration or additive layering, e.g. by 3D printing, stereolithography or selective laser sintering
- B29C64/20—Apparatus for additive manufacturing; Details thereof or accessories therefor
- B29C64/227—Driving means
- B29C64/241—Driving means for rotary motion
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
- B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
- B29C64/00—Additive manufacturing, i.e. manufacturing of three-dimensional [3D] objects by additive deposition, additive agglomeration or additive layering, e.g. by 3D printing, stereolithography or selective laser sintering
- B29C64/20—Apparatus for additive manufacturing; Details thereof or accessories therefor
- B29C64/255—Enclosures for the building material, e.g. powder containers
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
- B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
- B29C64/00—Additive manufacturing, i.e. manufacturing of three-dimensional [3D] objects by additive deposition, additive agglomeration or additive layering, e.g. by 3D printing, stereolithography or selective laser sintering
- B29C64/20—Apparatus for additive manufacturing; Details thereof or accessories therefor
- B29C64/264—Arrangements for irradiation
- B29C64/268—Arrangements for irradiation using laser beams; using electron beams [EB]
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B33—ADDITIVE MANUFACTURING TECHNOLOGY
- B33Y—ADDITIVE MANUFACTURING, i.e. MANUFACTURING OF THREE-DIMENSIONAL [3-D] OBJECTS BY ADDITIVE DEPOSITION, ADDITIVE AGGLOMERATION OR ADDITIVE LAYERING, e.g. BY 3-D PRINTING, STEREOLITHOGRAPHY OR SELECTIVE LASER SINTERING
- B33Y10/00—Processes of additive manufacturing
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B33—ADDITIVE MANUFACTURING TECHNOLOGY
- B33Y—ADDITIVE MANUFACTURING, i.e. MANUFACTURING OF THREE-DIMENSIONAL [3-D] OBJECTS BY ADDITIVE DEPOSITION, ADDITIVE AGGLOMERATION OR ADDITIVE LAYERING, e.g. BY 3-D PRINTING, STEREOLITHOGRAPHY OR SELECTIVE LASER SINTERING
- B33Y30/00—Apparatus for additive manufacturing; Details thereof or accessories therefor
Abstract
Buluş, hareketli lazer ve salınım hareketi yapabilen eğimli yapıya sahip hareketli bir tank içeren Düşük-Stres Stereolitografi ile ilgilidir.The invention relates to Low-Stress Stereolithography comprising a moving laser and a mobile tank with an oscillating curved structure.
Description
TARIFNAME DÜSÜK-STRES STEREOLITOGRAFI Bulusun Ilgili Oldugu Teknik Alan Bulus, hareketli lazer ve sal inim hareketi yapabilen egimli yaplya sahip hareketli bir tank içeren Düsük-Stres Stereolitografi ile ilgilidir. DESCRIPTION LOW-STRESS STEREOLITOGRAPHY Technical Field of the Invention The invention includes a mobile laser and a mobile tank with a curved structure capable of oscillating swing motion. It is related to Low-Stress Stereolithography.
Bulusla Ilgili Teknigin Bilinen Durumu (Önceki Teknik) Hali haz Eda iki türlü temel SLA yöntemi piyasaya sunulmus durumdad i Bunlardan birincisi, ilk kesfedildigi haliyle ve US4575330A patent numaras] ile Amerikan 3D SYSTEMS firmasElîl kesfettigi yöntemdir. Bu yöntemde: bir tank içerisinde bulunan @[ga duyarlü monomer ve oligomer esaslLlreçine ve bu tankLn ve reçinenin içerisinde yer alan ve hassas olarak dikey alanda hareket kabiliyetine sahip bir platform mevcuttur. Tankin üst tarafinda yer alan mor ötesi bir lazerin, lsiga duyarli lreçineyi katmanlar halinde dondurarak üç boyutlu objeler olusturmaktadlî. Her katman sonrasi dikeyde çallSan baskTplatformu, belirlenen katman kal EilfgEkadar alçalmakta, reçine yüzey üzerinde bir sgßßüile düzeltilmekte ve yeni bir katman için cihaz tekrar çalßmaktadî Bu yöntem farklEfirmalar taraf idari lazer yerine DLP bazl jjroj ektörler kullan [[arak da fark] [East &Elm St m. State of the Art of the Invention (Prior Art) Currently, Eda has introduced two basic SLA methods to the market. The first of these is American 3D SYSTEMS as first discovered and patent number US4575330A] The firm is the method Elîl discovered. In this method: @[ga sensitive in a tank monomer and oligomer based resin and the sensitive materials contained in this tank and resin. There is a platform that can move vertically. Located at the top of the tank where a field ultraviolet laser freezes the light-sensitive resin in layers, resulting in three-dimensional create objects. After each layer, the vertically running print platform, the specified layer stay EilfgE lowers down, the resin is smoothed with a sgßsule on the surface and new device was working again for a layer. This method differs. Instead of administrative laser by different companies Use DLP-based chargers [[difference by] [East &Elm St m.
Yöntemlerden ikincisinde ise, bas asagJSLA olarak da bilinen, 3D SYSTEMS firmasElEl patentinin bitmesiyle ortaya çikan ve yayg Ellasan, daha küçük ebatljparçalarm 3B olarak bas Masnjaglayan bir sistem ortaya konulmustur. Bu sistemde, daha az hacimli ve alt kLsmU seffaf olan bir tank içerisinde isiga duyarli monomer ve oligomer esasli reçine, tankin üstünde ve tanktan belirlenen katman uzakl g nda duran bir platform yer almaktadir. Bu yöntemde, mor ötesi Tsfk kaynagî lazer veya diyot, tankii altîlda Çal Fsarak katmanlar halinde bask Wapmaya saglayan bir sisteme dönüsmüstür. Bask Eplatformu ile tankm alt kßm Earas Eida stkßan reçine, ER kaynagE sayesinde dondurulduktan sonra, platform belirlenen katman yüksekliginde yükselerek veya tank öne egilerek, bir önceki dondurulmus katmanâ tanki alt idari ayrüinasü ve yeni reçinenin yeni katman& olusturulmas jiçin bu alana dolmas Esaglanî Bu yöntemde lazer kaynagEyerine, LCD bazljekranlar kullanarak sistemli bir SU& geçirgenligi veya DLP teknolojisini kullanan proj ektörler de kullanmaktad E. Hatta yeni gelistirilen reçineler sayesinde, mor ötesi yerine, gün stgjle dondurulan reçinelerin de kullan iiiLbaslam Lsit Ji Burada bahsi geçen cihazlar& ortak birkaç noktasübulunmaktad& Bu hususlar teklif edilen yöntemi etkilememekte ancak, anlas &nasîÇkolaylast&&Eblabilecektir. Bahsi geçen ürünlerin çal sabilmesi için Lstga duyarlLreçineye ihtiyaçlarLbulunmaktadLr. BazLsistemlerde bu reçine otomatik olarak, cihaz tarafindan miktarl ayarlanarak, ana bir merkezden aktarllmaktaa bazl cihazlarda ise kullanlcl ltaraf ndan cihaza doldurulmaktadlr. Dolum sekli cihazn ne kadar otoinatiklestirildigi ile ilgili bir husustur. In the second method, 3D SYSTEMS company, also known as bass-asagJSLA. Ellasan, which emerged with the expiration of its patent and widely used, produced smaller sized parts in 3D. Bas Masnjaglayan a system has been put forward. In this system, less bulky and sub kLsmU In a transparent tank, heat-sensitive monomer and oligomer-based resin is placed on the tank. and a platform standing at a distance of the determined layer from the tank. In this method, purple beyond Tsfk source laser or diode, Tankii Altîlda Fsarak print in layers Wapmaya transformed into a system that provides With Basque Eplatform, the lower part of the tank is made of Earas Eida stuck resin, After being frozen by the ER source, the platform is at the determined layer height. sub-administrative separation of the previous frozen layer of the tank by ascending or leaning the tank forward and the new resin is filled in this area to create a new layer. Esaglanî In this method Instead of a laser source, a systematic SU& transmittance or DLP using LCD-based displays Projectors using technology also use E. Even newly developed resins Thanks to this, instead of ultraviolet, resins that are frozen during the day can also be used. The devices mentioned here & they have a few common points & These aspects are the proposed it does not affect the method, but it will be understandable and very easy. of the aforementioned products It needs a Lstga sensitive resin to work. In base systems, this resin automatically, quantified by the device and transmitted from a main center. on devices, it is filled into the device by the user. How much is your filling device? It is a matter of being autoindependent.
Bahsi geçen cihaz türlerinin hepsi bilgisayar kontrollü cihazlard & Endüstriyel tip cihazlarda, cihaz ile birlikte gelen bir bilgisayar katman hesaplamasijve bu katmanlar& lazer taraf &dan nas] taranacag&Eve Ek miktar&Ekendisi hesaplamakta ve dgarîian tek bekledigi bir 3 boyutlu dosya olmaktad IL Son kullanßütipi cihazlarda ise, cihaz& elektronik ve mekatronik altyapîlü bu hesaplamalarj yapabilecek düzeyde bilgisayarlar içermemekte, bahsi geçen hesaplamalar :yapabilmek için d&ar&an bir bilgisayar destegine ihtiyaç duymaktad & Teknigin bilinen durumunda yer alan US 9452567 numaralüpatent doküman&da yer alan tankn yaptLgLhareket esnemeye dayalLbir harekettir. Tank& yaptLgLhareket yukarilogru bir hareket silsilesidir ve tank 11 bir tarafl lsabit tutularak yapllrnaktad n. Yer alan tank hareketi, yap San her katman& donma sonraslnda tamamen sökülmesine yönelik bir harekettir. Tank hareketinin reçinenin karßltîhnas &a yönelik bir fonksiyonu belirtilmemistir. All of the mentioned device types are computer controlled devices & Industrial type devices, A computer comes with the device for layer calculationjand these layers&from the laser side how] will be scanned&Eve Additional amount&Ef calculates itself and all it expects is a 3 size file, and for end-use type devices, device & electronic and mechatronics The infrastructure does not contain computers at a level that can perform these calculations, the aforementioned calculations :needs an external computer support to perform & In the patent document numbered US 9452567, which is in the state of the art, The movement made by the tank is a movement based on stretching. Tank& builtLgLmovement It is a sequence of movements and the tank 11 is made by holding fixed on one side. The tank movement involved, Yap San is a movement to completely remove each layer & after freezing. Tank A function of the movement of the resin relative to the resin is not specified.
Teknigin bilinen durumunda yer alan US 10201963 numaralEpatent doküinan &da Patentte yer alan tankîi yapt gEhareket esnemeye dayalEbir harekettir. Tank& yapt [g :hareket tek veya çok noktadan tank& alt yüzeyinin esnetilmesini içeren bir hareket silsilesidir ve tankîi d& hattîlîl sabit olmas&Egerektirmektedir. Tank& alt yüzeyinin esnek olmas: hareket eden rulo tipi sökücülerin islevini yapabilmesi için sartti ve malzeme yorulmas &a, dolayßglla hülüas &ma ve eskimeye maruzdur. Tank& yaptEgEhareket, yap &an birden çok katman& donma sonras &da sökülmesine yönelik bir harekettir. Tank hareketinin reçinenin karLsltLijLlrnas &a yönelik bir fonksiyonu belirtilmemistir. Included in the patent documenting the US 10201963 numbered Epatent, which is in the state of the art. The movement made by the field tank is a movement based on stretching. Tank& made [g :movement single or multiple It is a movement sequence that includes stretching the tank& bottom surface from the point and tankî d& hattîlîl It requires &E to be fixed. Flexibility of tank & bottom surface: moving roller type It is necessary for the removers to function and the material does not get tired and is subject to aging. Tank & buildMotion, multiple layers at &do & post freeze It is an act of dismantling. Tank movement is a reaction to the mixing of the resin. function is not specified.
Teknigin bilinen durumunda yer alan, piyasaya nüfuz etmeye baslams bas asagl SLA cihazlarîiîi temel sorunlar&dan en önemlisi tank alt&& polimer esaslîeçineye yapFslmasTve yeni reçine almada yasanan sorunlard &.Head-down SLA, which is in the state of the art and has begun to penetrate the market The most important one of the main problems of the devices is the bonding to the bottom of the tank & polymer-based resin. problems in getting new resin &.
Bulusun K Sa Aç klamasl ive Amaçlari \ Mevcut bulus, yukar Ila bahsedilen gereksinimleri kars [[ayan, tüm dezavantaj lar: ortadan kald Lijan ve ilave baz davantaj lar getiren Düsük-Stres Stereolitografi ile ilgilidir. Brief Description and Objectives of the Invention \ The present invention does not meet the above-mentioned requirements, all disadvantages: eliminated. It relates to the remaining Lijan and Low-Stress Stereolithography, which brings some additional advantages.
Bulusun amaci, piyasaya nüfuz etmeye baslamis bas asagi SLA cihazlar nin temel sorunlarîidan en önemlisi olan, tank altmm polimer esaslTreçineye yapFsmasFh/e yeni reçine alma sorunlarina çözüm bularak, baskl lhizlni birkaç kat arttlrmak, böylece toplam baskl zamanlîl _önemli bir ölçüde ksaltmakt _ri_ Önemli olan basl Elar, asag Ila listelenmistir. The aim of the invention is to develop the basics of upside down SLA devices that have begun to penetrate the market. The most important problem is the bonding of the bottom of the tank to the polymer-based resinFh/e new resin By finding solutions to working problems, increasing the pressure speed several times, thus the total pressure to shorten time _significantly_ The main items that are important are listed below.
- Baskji &Il E önerilen tank hareketi sayesinde hüland Emnasü - Katmanlar aras Igeçis s Ilas Eda olusan çekim kuvvetinin ortadan kaldmülnasü - BasszEas Eida kullan Ian reçinenin devamlühareket halinde tutularak reçine karßünmß çökmesinin engellenmesi, - Her katman için dikeyde yap Jinas E gereken platformla tankEi alt tabanEiD ayrßt EBE hareketlere gerek kalmamash - Platform hareketleri nedeniyle reçine arasinda slkisan havanin olusumunun engellenmesi Bulusun temel amacl da, hem daha hizli, hem de daha verimli bir sekilde çal isan bir 3B yazma yöntemi ve bunu gerçeklestiren bir Cihaz sunmaktîl. - Huland Emnasü thanks to the Baskji &Il E recommended tank movement - Elimination of the gravitational force formed during the transition between layers - The resin using BasszEas Eida is kept in constant motion and the resin is mixed prevent collapse, - Build vertically for each layer Jinas E separates tankEi subbaseEiD with required platform EBE no need for movements - Preventing the formation of compressed air between the resin due to platform movements The main purpose of the invention is to create a 3D writing that works both faster and more efficiently. method and a Device that accomplishes it.
Bulusu Aç klayan Sekillerin Tan mlari | Bu bulusla gelistirilen, Düsük-Stres Stereolitografi daha iyi anlasüabilmesi için hazmlanan sekiller asag da aç klanmaktad hi. Definitions of Figures Explaining the Invention | Developed with this invention, Low-Stress Stereolithography has been prepared for better understanding. Figures are also explained below.
Sekil 1: Bas-asag iSLA Cihazina entegre edilmis yeni reçine tank ltasarlm ri ri izometrik görünümü verilmistir. Figure 1: New resin tank design ri ri isometric integrated into the upside-down iSLA Device view is given.
Sekil 2: Bas-asagîSLA cihazma entegre edilmis yeni reçine tank Ftasarîhmm üstten görünümü ve kesit çizgisi verilmistir. Figure 2: Top view of the new resin tank Ftasarîhmm integrated into my upside-down SLA device and the section line is given.
Sekil 3: Bas-asagJSLA cihazEia entegre edilmis yeni reçine tankEtasarEiiIi önden kesit görünümü verilmistir. Figure 3: Front section of the new resin tankEdesign with integrated upside-down JSLA device view is given.
Sekil 4: Bas-asagESLA cihazma entegre edilmis yeni reçine tanklasarîhßß çal Sma seklinin basamaklar halinde gösterimi verilmistir. Bu sekilde üç adet tank konumu gösterilmistir. Her konuma ait bir harf atanmsti ve konumda yer alan kritik hareket mekanizmalarEhartlerin yanlar nda numaraland nlln Lst Ji Islemin baslad Lg J“Baslang ç” olarak adland Dilan konum “A” harfiyle kodlanmg, islemin süreç boyunca devam ettigi “Orta Konum” “B” harfiyle kodlanmß ve islemin sonlandildgjve tekrar baslamak üzere ters yönden hareket edecegi “Bitis ve Geri Dönüs” konumu da “C” harfiyle kodlanm stt Ji Bu konumlarda “Basleatformu Kolu” hareketi Dolay.slyla, “Baslangç” hareketinde bahsedilen “Tank” hareketi “3A” olarak gösterilmistir.Figure 4: The way I work with the new resin tanks integrated into my head-down ESLA shown in steps. Three tank positions are shown in this figure. Each a letter for the location was assigned, and the critical movement mechanisms involved in the location Lst Ji The operation started Lg J named as “Start” Dilan location “A” coded with the letter “Mid Position”, where the process continues throughout the process, is coded with the letter “B” and “Finish and Back” where the process is terminated and will move from the opposite direction to start again. The “Turn” position is also coded with the letter “C” stt Ji The “Basleatform Lever” movement at these positions Therefore, the “Tank” movement mentioned in the “Start” movement is denoted as “3A”.
Her konum kendi içerisinde numaraland litlhî Tstm. Each location is numbered within itself.
Bulusu olusturan unsurlar Ei/kßinlar ß/parçalarîi tan Eiilarj Bu bulusla gelistirilen Düsük-Stres Stereolitografinin daha iyi aç Fltlanabilmesi için haz ilanan sekilde yer alan parçalar/kEEnlar/unsurlar ayr Eayr Enumaralandmümß olup her bir numaranEi aç klamas Easag Ela verilmektedir. l Strüktür Bask :platformu ray ü Bask :platformu kolu Bask :platformu Lazer kaynag l DOHONU'i-IÄUJN Lazer sn | Bulusun Detayli lâç'klamasl | Bu detaylEaç [klamada bulus konusu yenilik sadece konunun daha iyi anlas Ülnas Iia yönelik hiçbir sEiElayElDetki olusturrnayacak örneklerle açtklanmaktadm Söz konusu olan bulus, Düsük-Stres Stereolitografi ile ilgilidir. Elements of the invention Ei/kşiinlar ß/parts tan Eiilarj Delighted for better opening of Low-Stress Stereolithography developed by this invention The parts/elements/elements in the figure are enumerated separately and each number The description is given to Easag Ela. l Structure Basque: platform rail Basque :platform arm Basque :platform laser welding DOHONU'i-IÄUJN laser sec | Detailed description of the invention | In this detail, the innovation that is the subject of the invention is only intended for a better understanding of the subject, Ülnas. The invention in question is explained with examples that will not create any sEiElayEl Impact. It is related to Low-Stress Stereolithography.
Bulusun temel hareket yaplsl Ve faydasl,lyukarl verilen Sekil 4°te yer alan kesitte gösterilmistir.The basic motion structure and usefulness of the invention is shown in the section given in Figure 4 above.
Bu kesitin al îldEgDbölge ve hak& aç @Eda Sekil 2”de gösterilmistir. Asag Ela bahsi geçen ögelerin bu kesitte hangi numara ile yer aldEg Eda sekil 3 ”te gösterilmistir. Bu yap Etüt daha kolay anlas Jlnas :ad Era hareketin baz EbasamaklarEve bir bask Ekatman îlEblusturana kadar geçirdigi fazdan aç [klayß D oldugu düsünülen 3 pozisyon resmedilmistir. Bu bahsi geçen konuma gelmeden evvel iki basamagîl tamamlanmß olmas ;gerekmektedir Birincisi, reçine tank Ela (5) baskItçin ihtiyaç duyulacak reçinenin (6) konulmus olmas Dikincisi de, baskE :istenilen ögenin bask ?ayarlar Il Ii cihaza gönderilmis olmas Egerekmektedir.The take of this section îldEgDregion and the right&open @Eda are shown in Figure 2. Asag Ela mentioned The number of the items in this section is shown in figure 3 in Eda. Make it Easier to study alas Jlnas :ad Era that the movement went through until some EstepsEve a raid Ekatman îlEblustur 3 positions that are thought to be open [closed D] are illustrated. to this location Two steps must be completed before arriving. First, the resin tank Ela (5) The resin (6) needed for the print must be placed. Print Settings Required to be sent to Illi device.
Hareket basamaklar Eidan ilkinde, bask :platformu (4) ilk katman Eolusturmak için reçine tankE (5) üzerinde yerini alm Stm (1A). Bu yerin reçine tankL(5) ile aras Lnda kalan mesafe, katman kal nl gl olarak bilinmektedir. Movement steps Eidan in the first, the printing platform (4) the resin tank to form the first layer E (5) replaced on Stm (1A). The distance between this place and the resin tank(5), layer It is known as thick gl.
Reçine tank l(5), katmanl olusturmak için baslanglç pozisyonundaki yerini almlst n. Reçine tank7(5) bu pozisyondayken, reçine tankT(5) merkezinden Y ekseni etrafiida dönmüs ve X ekseninde merkezden kaçm st 11 (3A). Bu kaç lt] lk ve dönme sayesinde, reçine tankln m (5) baskl | platformuna (4) en yakîi kenar Fteget hale gelmistir. Bu hareketin devam Eda, reçine tank T(5), inerkezinden yaptIglZhareketlerle (3B, 3C) katman bitis noktas Ela kadar salEiEnßa, lazer Sürü Reçine tankßß (5) baskEplatformu (4) alt @da yaptIgEbu salih hareketinde en önemli nokta, reçine tankîlîl (5) salEiEn hareketinin kaymadan yap Illnas ilaglamakt E. Dolayßgila, reçine tankîl Il (5) yaptlg :bu sal Elin& kontrollü ve bir sekilde merkezinde yer alan noktadan Y ekseni etraf nda dönerken, ayn Jzamanda X eksenin hareket etmesinin saglanmaskltr. Resin tank 1(5) has taken its place in its initial position to form layers. Rosin When tank7(5) is in this position, the resin rotates around the Y axis from the center of the tankT(5) and the X st 11 (3A). This is how many liters] first and thanks to the rotation, the resin tank m (5) is pressed | The edge closest to the platform (4) has become Fteget. Continuing this movement Eda, resin tank T(5), with movements (3D, 3C) from the center of the layer until the end point Ela salEiEnßa, laser Swarm Resin tankßß (5) baskEplatform (4) at the bottom @gE the most important point in this righteous movement, resin tank (5) make the salEiEn movement without slipping Illnas ilaglamakt E. Dolayßgila, resin tankîl Il (5) construction: this is the swing of the Hand& controlled and somehow the Y axis from the point in the center While rotating around it, it is ensured that the X axis moves at the same time.
Lazer kaynagl (7), reçine tanklnln (5) alt nda, reçine tanklnln (5) baskl platformuna (4) en yak 11 oldugu konumda yerini almlst 11 (2A). Bu ald gl lkonum sayesinde, lazer Islnl (8), baskl | platformunun (4) kenarrlda, reçine tanklîla (5) dik bir sekilde Tslîha yapabilecektir. Lazer @ITH-l (8) katman olusturmaya baslarken ilk olarak Y ekseninde tarama yapacak, daha sonra bir sonraki pozisyona X ekseninde geçecektir. Lazer kaynagmm (7) X ekseninde yaptEgEhareket miktar] lazer Emil& (8) çap Era ve bir önceki tarama ile örtüstürme miktar Ea baglEolarak degisiklik gösterebilir ancak, bu hareket miktar Elle reçine tankîi El (5) merkezinin (3A>3B>3 C) X ekseninde yapt g Ihareket miktarüaynüölçüdedir. Bu hareket silsilesi, katman olusturma boyunca devam edecektir (2B, 2C). Özel bir ayar yapLljnadLgLsürece, bundan sonraki bütün katmanlar aynikaltnltkta olacak, dolay s yla, baskl platform kolu (3), bask lplatformunu (4), her katman bitisinde, katman kalrllgl lmesafesi kadar Z ekseninde kaldlracaktlr. Bask lplatformu (4) bir sonraki katman kal îll gm _olusturmak için Z ekseninde kaldim `Ertan sonra, reçine tank F(5) ve lazer kaynaglîîlîl (7) hareketleri bir sonraki katman Eolusturmak üzere ters yönde (3C>3B>3A) devam edecektir.The laser source (7) is located at the bottom of the resin tank (5) closest to the printed platform (4) of the resin tank (5). took its place in its current position 11 (2A). Thanks to this position, the laser is illuminated (8), printed | At the edge of the platform (4), it will be able to build Tsliha vertically with the resin tank (5). Laser @ITH-l (8) when starting to create a layer, it will first scan in the Y-axis, then a will move to the next position on the X-axis. The laser source (7) made in the X-axis amount] laser Emi& (8) diameter Era and overlap with previous scan depending on amount Ea The amount of movement may vary, but the amount of manual resin tank El (5) center (3A>3B>3 C) The amount of g movement made in the X axis is the same. This sequence of movements, layering will continue throughout (2B, 2C). As long as you make a custom settingLljnadLgL, all subsequent layers will be in the same gold, therefore, the printed platform arm (3), the printing platform (4), at each layer end, layer It will be lifted on the Z axis as much as the distance of the thickness. Basque platform (4) next layer I stayed on the Z axis to create a kal îll gm `After tan, resin tank F(5) and laser welded (7) will continue the movements in the opposite direction (3C>3B>3A) to form the next layer E.
Reçine tankE(5) ve lazer kaynag D(7) baslangg pozisyonuna geri döndüklerinde, iki katman olusturulmus olacak ve bu git gel hareketi tüm katmanlar olusturulana kadar devam edecektir.When the resin tank E(5) and laser source D(7) return to the starting position, the two layers will be created and this commute will continue until all layers have been created.
Reçine tankEiEi (5) yaptglalEiEh hareketleri, donmus olan reçinenin (6), soyulma hareketiyle, reçine tankEldan (5) ayr Ülnasîiüsaglayacakt B. Bu ayrEüna, lazer @Etüt (8) Odak büyüklügünün Y ekseninde dondurdugu çizgi kadar olacag ndan; reçine (6) ile reçine tank L(5) aras nda olusan ayr lma kuvveti, günümüz bas-asag SLA yöntemlerine k yasla, çok daha düsük olacaktln. Bu sayede de, reçinenin (6), hem reçine tanklna (5) güçlü bir sekilde yap smasl hem de baski l platformundan (4) kopmas %ngellenebilecektir. Resin tankEiEi (5) madetglalEiEh movements, frozen resin (6), with peeling action, resin tankEldan (5) separate Ülnasîüusagacakt B. In this respect, laser @Etude (8) Focal size Since it will be as much as the line it freezes on the Y axis; formed between the resin (6) and the resin tank L(5) The separation force will be much lower compared to today's push-down SLA methods. This In this way, the resin (6) both strongly adheres to the resin tank (5) and is compressed. It will be possible to prevent it from breaking off from the platform (4).
Sekillerde verilen unsurlar n numaralar na bagl blarak açiklamalarl asagi listelenmistir. The elements given in the figures are listed below with explanations depending on their numbers.
Strüktür(1): SLA cihazmm temel birlesim elemanlîllü Bu eleman, diger bütün elemanlarlîi baglandîg] statik ve dinamik kuvvetlerin aktarEdEgEyapEal olgudur. Basküplatformu rayE strüktüre baglElE ve bu ray üzerinde hareket eden basküplatformu kolunu tanka dik açma tutmaya yarar. Structure(1): with basic joint elements of the SLA device This element includes all other elements baglandîg] transferEdEgEyapEal phenomenon of static and dynamic forces. Bascuitplatform rayE depending on the structure and opening the arm of the scale platform moving on this rail perpendicular to the tank worth keeping.
Bask. platformu rayl (2): Rayln temel amac ,lbaskl platformu kolunun reçine tanklna dik bir sekilde Z ekseninde hareketini hassas bir sekilde saglamas d It Bu raya bagll olarak bir hareket aktarma mekanizmas Tkullan flmaktad E. Bu mekanizinada kullan ilan itici güç aktarma 0rgan|_| lineer motor, trapezoid Vida veya bilyaljvida olarak ihtiyaca göre sekillenebilmektir. Teklif edilen yönteme bir etkisi bulunmamaktad E. Basque. platform rail (2): The main purpose of the rail is to mount a vertical platform arm to the resin tank of the printed platform arm. d It provides a precise movement in the Z axis in this way. transmission mechanism Tu flaktad E. Use this mechanic ad propulsion power transmission 0rgan|_| It can be shaped as a linear motor, trapezoidal screw or ball screw according to the needs. Offer There was no effect on the method used.
Baskdplatformu kolu (3): BaskLplatformu ile tasyodray arasLndaki parça, dikligin ve pozisyonlanabilmenin saglanabilmesi için tank n ortaslna kadar varan bir tas yld dlri. Bu kolun temel amaçlarindan birisi, bask lplatformunu tanka dik tutabilmek ve bu sayede baskll platformunun tank yüzeyine indigi zaman yüzeysel temas kurabilmesini saglayabilmektir.Baskdplatform arm (3): The piece between the BaskLplatform and the tasyodray, the perpendicularity and In order to ensure positioning, it was a stone that reaches up to the middle of the tank. This is your arm One of its main purposes is to keep the printing platform perpendicular to the tank and thus is to ensure that the platform can establish surface contact when it descends to the tank surface.
Bunu saglayabilmek adEla, basküplatform kolu üzerinde çesitli hassas ayarlar bulanabilir. In order to achieve this, various sensitive settings can be found on the platform arm.
Teklif edilen yöntemde dikligin ve bu yüzey temasîlîl var oldugu kabul edilmektedir. In the proposed method, it is accepted that perpendicularity and this surface contact exist.
Baskfplatformu (4): Is ga duyarl Iteçinenin donarak üzerine yap ßttgüjlatformdur. Bu platform, platform kolu ile sayesinde ray üzerinde hassas bir sekilde Z ekseninde hareket ederek katmanlü imalatît yap EllandmümasEiE saglamaktad E. Bu platformun tabanEiEi düze olmasü donmus reçinenin basar LlLbir sekilde tutunabilmesi (yap Lslabilmesi) için önem tas ihaktad Lt. Bu parçanLn tank taban lile arasinda kalan mesafe, dondurulacak reçinenin ne kadar süre ile is na maruz kalmas igerektigini ve dolaylsiyla baski hizini `etkilemektedir. Aynl @aman da, bu mesafe ile çktîiîl ne kadar çözünürlüge sahip oldugu ve yüzey pürüzlülügünün ne düzeyde olacagrda etkilenmektedir.Baskfplatform (4): It is a heat sensitive Item that freezes and sticks on it. This platform Thanks to the platform arm, it moves precisely in the Z axis on the rail and layered manufacture E. The base of this platform is frozen. Lt. This partLn The distance between the tank bottom and the bottom of the tank is how long the resin to be frozen is exposed to heat. it should stay on and therefore it affects the printing speed. Aynl @aman too, with this distance How much resolution the output has and what level the surface roughness will be. is affected.
Tank (5): Altjseffaf veya seffafa yakEi olan ve yan duvarlarEçesitli malzemelerden (Polimetil Metakrilat (PMMA), Polikarbonat (PC), Polietilen Tereftalat (PET), Stiren Akrilonitril (SAN), Akrilonitril Stren Akrilat (ASA) vb. malzemeler) imal edilebilecek bu tank, teklif edilen yöntemin esasnl blusturmaktad n. Teklif edilen tankln alt yapISl, günümüze kadar gelen diger örneklerinden farklrdm. Tankm alti] bir silindirin parças Tolacak egimli tasarlanmsth. Bu alt taban, günümüz örneklerinde genellikle bir düzlem olarak, delikli, yarlkll veya saf olarak buluninaktad î. Bu düzlemin yarattfgWapFsma ve bu nedenle olusan yüksek güçlerin as flmasÜ ad Ea yap [llngsl olan egimli yüzeyin çal Sma prensibi soyulma/soyma hareketine dayanmaktad E.Tank (5): Bottom transparent or nearly transparent and side walls made of various materials (Polymethyl Methacrylate (PMMA), Polycarbonate (PC), Polyethylene Terephthalate (PET), Styrene Acrylonitrile (SAN), Acrylonitrile Strene Acrylate (ASA) etc. materials) this tank, which can be manufactured The basis of the method was to meet. The infrastructure of the proposed tank, other I was different from the examples. The bottom of the tank] is designed inclined to collect part of a cylinder. this sub the sole is usually in today's examples as a plane, perforated, split or pure. findinaktad î. This plane created the WapFsma and the overcoming of the higher forces thus created. name Ea do [The working principle of the inclined surface is based on the peeling/peeling action E.
Tankîl alt tabanli olusturdugu silindir parçasEiEi merkezinde dönmesi ve aynEzamanda X ekseninde salîlInEsayesinde, tank besik benzeri bir hareket olusturmakta ve teklif edilen hareket gerçeklesmektedir. Bu tanki alt yüzeyinin mümkün oldugunca yap Emaya dirençli bir malzemeden (Florlu etilen propilen (FEP), politetrafloraetilen (PTFE) vb.) olusturulmasütank taban :ile baskEplatformu aras Eida donan reçinenin, tank taban îlda o düzeyde kolay ayr hnas &lü saglamaktad Ji ls :ga duyarlüreçine (6): Günümüz teknolojisinde kullanlan SLA reçine türleri 365nm ile 450nm aras @da @Eli duyarlüfgma göre tasarlanmaktad IL Ancak 405nm sonrasEkullanEan reçinelere mor ötesi reçine olarak degil, gün SEgEreçine olarak hitap edilmektedir. Teklif edilen sistemde, reçine türü sistemi etkilememektedir. The cylinder part formed by the tank bottom base rotates in the center and at the same time X Thanks to the swing on its axis, the tank creates a cradle-like movement and the proposed movement is taking place. Make the bottom surface of this tank as much as possible an enamel resistant made of material (Fluorinated ethylene propylene (FEP), polytetrafluoroethylene (PTFE) etc.) Base : Eida freezing resin between the base and the baskEplatform is easily separated at that level in the tank base. provided Ji ls :ga sensitive resin (6): SLA resin types used in today's technology with 365nm It is designed according to the sensitivity of @Eli at 450nm IL But after 405nm UseEan resins are not addressed as ultraviolet resin, but as day SEgResin. Proposed In the system, the type of resin does not affect the system.
Lazer kaynagÜ(7): Kullan Tan lazer Tsfgmile reçinenin uyumlulugu önem taslînaktadlî. Lazer kaynaklar: frekans aralEgE olarak diger @Ek kaynaklarEidan daha dar kapsama sahip olduklar îldan dogru frekans tercihinin yap [llnas :Verimli bir sekilde reçinenin dondurulabilmesi için önem tasEnaktadE. Lazer kaynagmi gücünün ve dondurdugu alan odaklanmashm, reçinenin donmasüzida çok önemli bir rolü bulunmaktadE. Ancak, kullanüan lazer türünün, teklif edilen sistemin çalgma seklinde bir rolü bulunmamaktad& Önemli nokta, baskÜ platformunun tümüne hitap edebilecek bir hareket sekli ile, lazerin X ve Y eksenlerinde kontrollü bir sekilde hareket edebilmesinin saglanabilmesidir. Hareket mekanizmasLnLd saglanmas liçin kullanllacak aktarma organlarlnln türünün teklif edilen sistem için önemi bulunmamaktad n. Laser source(7): The compatibility of the resin with the Tan laser Tsfgm is important. Laser sources: in frequency range, other @Additional sourcesEidan has narrower scope Make the right frequency preference from the province they are in [llnas : The ability to freeze the resin efficiently importance for tasEnaktadE. Focusing of laser source power and frozen area, resin has a very important role in freezing. However, the type of laser used the proposed system has no operational role& The important point is that the pressure in the X and Y axes of the laser, with a movement pattern that can address the entire platform. to be able to move in a controlled manner. Movement mechanismLnLd The importance of the type of drivetrain to be used for the proposed system did not exist n.
Lazer SEKS): Lazer @mm verimli bir sekilde çal Emas Elçin dogru bir odaklanmaya ve dogru bir odak sekline ihtiyac Ebulunmaktad E. Teklif edilen sistem için önemli olan, odaklanan lazer Sißi, tankEJ alt tabanEiEi baskjplatformuna en yakîi oldugu noktaya dik olmas Eve bu noktay :hep takip etmesi, bu konumda reçine dondurma isleminin gerçeklesmesidir. Laser SEX): Laser @mm work efficiently Emas Elçin has a correct focus and E. Focusing laser is important for the proposed system. The bottle must be perpendicular to the point where the tankEJ bottom base is closest to the printing platform. The point is that it always follows, that the resin freezing process takes place at this location.
Söz konusu olan bulus da yer alan tankln yapt gl hareketlerde esneme, dolay dlyla herhangi bir deforinasyon yoktur. Söz konusu olan bulus da yer alan tankln yaptigi hareket bir besik salinim hareketidir ve iki yöne dogrudur, tank herhangi bir tarafa bagl Tdegildir. Söz konusu olan bulus da yer alan tank hareketi, katmanln tamamlna degil, her dondurulan çizginin sökülmesine yönelik devamITbir harekettir. Söz konusu olan bulus da yer alan tank hareketiyse, devamlÜ sal E 11 sayesinde reçinenin kar Et ihnas Esaglanmaktad E. In the strong movements of the tank, which is included in the invention in question, there is no yawning, therefore any there is no deforination. The movement of the tank included in the invention in question is a cradle oscillation. It is a movement and is in two directions, the tank is not attached to any side. the invention in question The tank movement in Continuing towards IT is a movement. When it comes to the tank movement in the invention, it is continuous. Thanks to sal E 11, the profit of the resin Et ihnas E.
Söz konusu olan bulus da yer alan tankm alt yüzeyi esnek degildir, sert malzemedir, sürtünmeye maruz degildir ve zamanla esneklik kaybetmesi gibi bir durumu bulunmamaktad E. The bottom surface of the tank in the subject invention is not flexible, it is a hard material, it is resistant to friction. It is not exposed and does not lose flexibility over time. E.
Söz konusu olan bulus da yer alan tank hareketi, her dondurulan çizginin sökülmesine yönelik devaml bir harekettir. The tank movement of the present invention is a method for removing each frozen line. It is a continuous movement.
Söz konusu olan bulus da yer alan tanki hareketi ile birlikte, devamlüsalßîn sayesinde, reçinenin kar slt ii lmas Baglanmaktadln. Together with the tanki movement in the invention in question, thanks to the continuum, snow melting of the resin Connected.
Bulus, Tank tabanjile baskjplatformu arasîlda donan, tank tabanEidan donma isleminden sonra ayrflhbilen Isfga duyarlüreçine (6) kullanIan Düsük-Stres Stereolitografi cihaz Dolup özelligi; 0 Bütün elemanlarîi baglandîgjstatik ve dinamik kuvvetlerin aktarfldfgEStrüktür (1), - Baskjplatformu kolunun (3) reçine tankEia dik bir sekilde Z ekseninde hareketini hassas bir sekilde saglayan, bag] Tblarak bir hareket aktarma mekanizmasmçeren Baskl_ platformu ray :(2) , o Bask lplatformu ile tas y d lray aras ndaki parça, dikligin ve pozisyonlanabilmenin saglanabilmesi için tankîi ortas ?Ja kadar varan bir tas ya Baskîplatformu kolu(3), - Isîga duyarll lreçinenin donarak üzerine yap St gl lplatform olan, platform kolu ile sayesinde ray üzerinde hassas bir sekilde Z ekseninde hareket ederek katmanlLirnalatLn yapland'ii linaslnl Saglayan Bask platformu (4), 0 Alt kIsJma ve yan duvarlara sahip, alt tabanEida egimli silindirik parça içeren, X ekseninde baskjplatformu (4) altEida kontrollü ve merkezinde yer alan noktadan Y ekseni etrafßda bir mekanizma yardiiýla dönerken, aynüzamanda X ekseninde bir dogrusal k aak yap s. Sayesinde hareket ile sal nm hareketi yapan tank (5), o Reçine dondurma isleminin gerçeklesmesi için, lazerin X ve Y eksenlerinde kontrollü bir sekilde hareket edebilmesini saglayan, reçine tankîlß (5) alt ßda, reçine tankßü (5) bask ijlatformuna (4) en yaki oldugu konumda konumland Barak, lazer Gülü& baskE platformunun (4) kenar Eda, reçine tankEia (5) dik bir sekilde @Ela yapan lazer kaynagü - Reçine dondurma isleminin gerçeklesmesi için, tankîi alt tabanIiIi baskEplatformuna en yakm oldugu noktaya dik olan ve bu noktayühep takip eden, katman olusturmayü saglayan lazer 3 E :(8) unsurlarmüçermesidir. The invention is based on the freezing process between the tank base and the printing platform. Low-Stress Stereolithography device using a Light-sensitive resin (6) that can be separated after feature; 0 It is a structure that transfers static and dynamic forces to which all its elements are connected (1), - Movement of the Baskjplatform arm (3) perpendicular to the resin tank in the Z axis. Baskl_ platform rail :(2) , o The part between the printing platform and the stone y lray ensures that the perpendicularity and positioning A stone or Baskîplatform arm(3), reaching up to the middle of the tank in order to provide - Stick on the heat sensitive resin by freezing St gl lplatform, with platform arm Thanks to the layered Lime, it moves precisely in the Z axis on the rail. Basque platform (4), 0 X On its axis, the baskjplatform (4) is controlled from the bottom and from the point located in the center of the Y While it rotates around its axis with the help of a mechanism, at the same time it rotates around the X axis. make linear flow p. The tank (5), which makes oscillating movement with movement thanks to it, o In order to realize the resin freezing process, the laser must be controlled in the X and Y axes. resin tank (5) below, resin tank (5) Barak, laser Rose & print the edge of the platform (4) Eda, the resin tank Eia (5) vertically @Ela laser welding - To perform the resin freezing process, the tank must be placed on the printing platform with the bottom base. Create a layer that is perpendicular to and always follows the closest point laser 3 E :(8) is a combination of elements.
Reçine tankEiîi (5) baskEplatformu (4) altmda yaptEgEbu salEiEn hareketinde en önemli nokta, reçine tank n n ( 5) sal 11 m hareketinin kaymadan yap Lljnas Ln Lisaglamakt Lr. The most important point in the movement of the resin tank (5) under the printing platform (4) is, Make the movement of the resin tank (5) raft 11 m without slipping Lljnas Ln Lisaglamakt Lr.
Bu ayrllma, lazer isinin (8) odak büyüklügünün Y ekseninde dondurdugu çizgi kadar olacag ndan, reçine (6) ile reçine tanki (5) araslnda olusan ayrllma kuvveti, günümüz bas-asagl | SLA yöntemlerine kß/asla, çok daha düsük olaC-aktm. Bu sayede de, reçinenin (6), hem reçine tankIia (5) güçlü bir sekilde yap SmasE hem de baskü platformundan (4) kopmasE engellenebilecektir. This separation is as much as the line that the focal size of the laser beam (8) rotates in the Y axis. will be, the separation force between the resin (6) and the resin tank (5), today's head-down | kß/never, much lower-transfer to SLA methods. In this way, both the resin (6) and the resin build it strongly with the tank (5), as well as do not break away from the pressure platform (4) can be prevented.
Düsük-Stres Stereolitografinin cihazi] çal Islma yöntemi; o Reçine tankia (5) basküiçin ihtiyaç duyulacak reçinenin (6) konulmus ve baskßü istenilen ögenin bask :ayarlarmß cihaza gönderilmis olmasÇ o Bask _platformu (4) ilk katman Tblusturmak için reçine tank _(5) üzerinde yerini almasÜ (1A), o Reçine tank (5), katmanl olusturmak için baslanglç pozisyonundaki yerini almasl (3A), o Lazer kaynag17), reçine tankßß (5) alt Eda, reçine tankEiEi (5) baskEplatformuna (4) en yakit oldugu konumda yerini almas 12A). 0› Lazer 3318) katman olusturmaya baslarken ilk olarak Y ekseninde tarama yapmasÇ daha sonra bir sonraki pozisyona X ekseninde geçmesi, 1› Bu hareket silsilesi, katman olusturma boyunca devam etmesi (213, 2C) , - Reçine tankE(5) bu pozisyondayken, reçine tankE(5) merkezinden Y ekseni etraf Eda dönmüs ve X ekseninde merkezden kaçmas L(3A), 0 Bu kaç Elf& ve dönme sayesinde, reçine tankîii (5) basküplatformuna (4) en yakEi kenar leget hale gelmesi ve lazer @mm (8) hep bu teget çizgiyi taramasÇ 0 Bu hareketin devaminda, reçine tanki (5), merkezinden yapt gl hareketlerle (3B, 3C) katman bitis noktas na kadar sal nimina, lazer lslnl (8) esliginde devam etmesi, 0 Özel bir ayar yapilhiadîgjsürece, bundan sonraki bütün katmanlar aynükalEilÜ-gta olmas yla, baski platform kolu (3), baski platformunu (4), her katman bitisinde, katman kalînl Ägl mesafesi kadar Z ekseninde kald Ilmasl, o Baskjplatforrnu (4) bir sonraki katman kal Blîg'îlj olusturmak için Z ekseninde kaldEIdIIltan sonra, reçine tankD(5) ve lazer kaynagEiEi (7) hareketleri bir sonraki katman :blusturmak üzere ters yönde (3 C>3 B>3A) devam etmesi, 0 Reçine tankE(5) ve lazer kaynag 3(7) baslangßi pozisyonuna geri döndüklerinde, iki katman olusturulmus olmasEve bu git gel hareketi tüm katmanlar olusturulana kadar devam etmesi islem ad mlar n içermesidir. Low-Stress Stereolithography device] Working method; o Resin tank (5) where the resin (6) needed for printing has been placed and printed print :settings of the desired item have been sent to the device o Basque _platform (4) takes its place on the resin tank _(5) to make the first layer Tb (1 A), o The resin tank (5) takes its place in the initial position to form the layer (3A), o Laser welding17), resin tankßß (5) lower Eda, resin tankEiEi (5) to printingEplatform (4) 12A) to take its place in the position where it is the most fuel. 0› Laser 3318) must first scan in the Y axis when starting to layer. then move to the next position on the X axis, 1› This sequence of motion continues throughout layering (213, 2C) , - With the resin tankE(5) in this position, the Y axis around the center of the resin tankE(5) rotated and off-center in the X-axis L(3A), 0 Thanks to these few Elves and rotations, the resin tank (5) is the closest to the scale platform (4). the edge becomes leget and the laser @mm (8) always scans this tangential line 0 In the continuation of this movement, the resin tank (5), with strong movements from its center (3B, 3C) continuation of the oscillation until the layer end point, accompanied by laser light (8), 0 As long as a special setting is made, all subsequent layers are aynukalEilÜ-gta the printing platform arm (3), the printing platform (4), at each layer end, layer If it stays on the Z axis as much as the thickness Ägl distance, o Baskjplatforrnu (4) on the Z axis to create the next layer stay Blîg'îlj After the removal, the movements of the resin tankD(5) and laser welder (7) will be followed by the next layer :continues in the opposite direction (3 C>3 B>3A) to merge, 0 When the resin tank E(5) and laser source 3(7) return to their starting position, two even if the layer is created to continue The process includes the steps.
Bulusun tercih edilen bir yap Ühnmas Eta göre yukar Ela bahsi geçen yöntemi kullanan bir cihaz olmas Il Il. A preferred embodiment of the invention is a device using the method mentioned above according to Ühnmas Eta. to be Il.
Bulusun tercih edilen bir yapflhnmasj bahsi geçen hareket aktarma mekanizmasjitici güç aktarma organ jçermesidir. A preferred adhesive of the invention is said motion transmission mechanism driving force. is the powertrain.
Bulusun tercih edilen bir diger yap [[anmasÇ bahsi geçen itici güç aktarma organElEl lineer motor, trapezoid vida veya bilyalüvida olmasElE. Another preferred structure of the invention [[mentioned propulsion powertrainElEl linear without motor, trapezoidal screw or ball screw.
Bulusun tercih edilen bir diger yapilanmasl, bahsi geçen Tankln (5) alt klsm nin seffaf veya seffafa yakin olan malzemeden, yan duvarlarlnln malzemesinin Polimetil Metakrilat (PMMA), Polikarbonat (PC), Polietilen Tereftalat (PET), Stiren Akrilonitril (SAN), Akrilonitril Stren Akrilat (ASA) olmas 11 E. Another preferred embodiment of the invention is that the lower part of said Tank (5) is transparent or From the material close to transparent, the material of the side walls is Polymethyl Methacrylate (PMMA), Polycarbonate (PC), Polyethylene Terephthalate (PET), Styrene Acrylonitrile (SAN), Acrylonitrile Styrene Being acrylate (ASA) 11 E.
Bulusun tercih edilen bir diger yap [Ianmasü bahsi geçen TankEi (5) alt yüzeyinin yap @maya dirençli Florlu etilen propilen (FEP), politetratloraetilen (PTFE) malzemeden olmasEIE. 1. Baslangiç 2. Orta Konum 3. Bitis ve Geri Dönüs Another preferred structure of the invention is the construction of the bottom surface of the aforementioned TankEi (5). resistant Fluorinated ethylene propylene (FEP), polytetrafluoroethylene (PTFE) materialEIE. 1. Beginning 2. Middle Position 3. End and Return
Claims (2)
Priority Applications (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| TR2020/01999A TR202001999A2 (en) | 2020-02-11 | 2020-02-11 | LOW-STRESS STEREOLITOGRAPHY |
| EP20918330.0A EP4087720A4 (en) | 2020-02-11 | 2020-05-04 | Low-stress stereolithography |
| PCT/TR2020/050371 WO2021162654A1 (en) | 2020-02-11 | 2020-05-04 | Low-stress stereolithography |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| TR2020/01999A TR202001999A2 (en) | 2020-02-11 | 2020-02-11 | LOW-STRESS STEREOLITOGRAPHY |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| TR202001999A2 true TR202001999A2 (en) | 2021-08-23 |
Family
ID=77292524
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| TR2020/01999A TR202001999A2 (en) | 2020-02-11 | 2020-02-11 | LOW-STRESS STEREOLITOGRAPHY |
Country Status (3)
| Country | Link |
|---|---|
| EP (1) | EP4087720A4 (en) |
| TR (1) | TR202001999A2 (en) |
| WO (1) | WO2021162654A1 (en) |
Family Cites Families (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US9452567B2 (en) * | 2013-08-27 | 2016-09-27 | Kao-Chih Syao | Stereolithography apparatus |
| WO2015126461A1 (en) * | 2014-02-20 | 2015-08-27 | Global Filtration Systems, A Dba Of Gulf Filtration Systems Inc. | Apparatus and method for forming three-dimensional objects using a tilting solidification substrate |
| US9895843B2 (en) * | 2014-07-17 | 2018-02-20 | Formlabs, Inc. | Systems and methods for an improved peel operation during additive fabrication |
-
2020
- 2020-02-11 TR TR2020/01999A patent/TR202001999A2/en unknown
- 2020-05-04 WO PCT/TR2020/050371 patent/WO2021162654A1/en unknown
- 2020-05-04 EP EP20918330.0A patent/EP4087720A4/en active Pending
Also Published As
| Publication number | Publication date |
|---|---|
| EP4087720A4 (en) | 2023-06-28 |
| EP4087720A1 (en) | 2022-11-16 |
| WO2021162654A1 (en) | 2021-08-19 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| JP7356459B2 (en) | Improved stereolithography techniques and related systems and methods | |
| CN109822891B (en) | High-precision large-format stereoscopic projection 3D printing system and printing method thereof | |
| TWI580519B (en) | Three dimensional printing apparatus | |
| JP5073284B2 (en) | 3D modeling equipment | |
| Lipkowitz et al. | Injection continuous liquid interface production of 3D objects | |
| US9914292B2 (en) | Additive manufacturing device | |
| CN1202131A (en) | Selective deposition modeling method and apparatus for forming three-dimensional objects and supports | |
| CN1819894A (en) | Lens having at least one lens centration mark and methods of making and using same | |
| Koyama et al. | Ultrasonic variable-focus optical lens using viscoelastic material | |
| CN203831648U (en) | After-treatment device and three-dimensional printer applied to light curing rapid molding | |
| TR202001999A2 (en) | LOW-STRESS STEREOLITOGRAPHY | |
| JP5786579B2 (en) | Structure forming device | |
| CN203766033U (en) | Bearing body for containing photosensitive resin and three-dimensional (3D) printer | |
| CN105044805B (en) | A kind of elastic film astigmatic correction liquid lens | |
| CN215661861U (en) | Three-dimensional modeling apparatus | |
| JP5419005B2 (en) | Variable focus lens | |
| Cruz-Campa et al. | Microlens rapid prototyping technique with capability for wide variation in lens diameter and focal length | |
| Jo et al. | Liquid bridge stereolithography: a proof of concept | |
| US11225020B2 (en) | Three-dimensional printing system with sloped build plane | |
| Huang et al. | The research on surface characteristics of optical lens by 3D printing technique and precise diamond turning technique | |
| CN1356574A (en) | Imaging device | |
| JP6296679B2 (en) | Microlens array manufacturing method and diffusion plate manufacturing method | |
| CN1204277A (en) | Method and apparatus for data manipulation and system control in selective deposition modeling system | |
| EP4197743A1 (en) | A bottom-up 3d printer, a platform for this printer, and a method of 3d printing | |
| CN1641409A (en) | Simple horizontal line projecting apparatus |