TH176998B -
Plasma source using a large particle reduction coating and a plasma source method That uses a coating to reduce large particles For thin film coating deposition and surface modification
- Google Patents
Plasma source using a large particle reduction coating and a plasma source method That uses a coating to reduce large particles For thin film coating deposition and surface modification
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Publication number
TH176998B
TH176998BTH1701003078ATH1701003078ATH176998BTH 176998 BTH176998 BTH 176998BTH 1701003078 ATH1701003078 ATH 1701003078ATH 1701003078 ATH1701003078 ATH 1701003078ATH 176998 BTH176998 BTH 176998B
1. แหล่งพลาสมา (plasma source) ที่ประกอบรวมด้วย อิเล็กโทรดที่หนึ่งและอิเล็กโทรดที่สองที่ถูกแยกโดยพื้นที่บรรจุก๊าซ โดยที่สารเคลือบถูก สะสมบนอย่างน้อยที่สุดส่วนหนึ่งของอิเล็กโทรดที่หนึ่งและอิเล็กโทรดที่สองแต่ละอัน แหล่งพลังงานอิเล็กโทรดที่หนึ่งและสองถูกเชื่อมต่อทางไฟฟ้าถูกปรับแต่งเพื่อจัดส่ง แรงดันไฟฟ้าที่สลับระหว่างบวกและลบเพื่อก่อให้เกิดแรงดันไฟฟ้าที่ถู:1. Plasma source (plasma source) that consists of The first and second electrodes separated by gas-filled areas. Where the coating was Cumulative on at least part of the first electrode and each second electrode. The first and second electrodes were electrically connected, tuned for delivery. The voltage alternating between positive and negative to produce a voltage rubbing:
TH1701003078A2014-12-05
Plasma source using a large particle reduction coating and a plasma source method That uses a coating to reduce large particles For thin film coating deposition and surface modification
TH176998A
(en)
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Plasma source using a large particle reduction coating and a plasma source method That uses a coating to reduce large particles For thin film coating deposition and surface modification
Plasma source using a large particle reduction coating and a plasma source method That uses a coating to reduce large particles For thin film coating deposition and surface modification