SU789639A1 - Device for continuous control of galvanic plating thickness - Google Patents
Device for continuous control of galvanic plating thickness Download PDFInfo
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- SU789639A1 SU789639A1 SU792736362A SU2736362A SU789639A1 SU 789639 A1 SU789639 A1 SU 789639A1 SU 792736362 A SU792736362 A SU 792736362A SU 2736362 A SU2736362 A SU 2736362A SU 789639 A1 SU789639 A1 SU 789639A1
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- USSR - Soviet Union
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- witness
- electrode
- bath
- sensing element
- elements
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Description
II
Изобретение относитс к гальвано.технике и может быть использовано дл контрол толщины покрыти в процессе осаждени .The invention relates to galvano-technology and can be used to control the thickness of a coating during the deposition process.
Наиболее близким по технической сущности к прецлагаемому вл етс устройство ал непрерывного контрол толщины гальванического покрыти , соаержащее установленный в ванне чувствительный элемент с электродом-свидетелем, задающий генератор, чувствительный элемент с эталоном и измерительную схему, включающую усилитель, преобразователь, блок сравнени , индикатор и исполнительный орган.The closest in technical essence to the present is a device for continuous monitoring of the thickness of the electroplated coating, containing a sensitive element installed in the bath with a witness electrode, a master oscillator, a sensing element with a standard and a measuring circuit including an amplifier, a converter, a comparison unit, an indicator and an actuator organ.
Каждый чувствительный элемент выполнен в виде двук катушек, расположенных соосно одна относительно другой. Электрод-свидетель помещен в зазоре между катушками одного чувствительного элемента, а эталон - между катуш ками другого.Each sensing element is designed in the form of two coils arranged coaxially one relative to another. The witness electrode is placed in the gap between the coils of one sensitive element, and the standard between the coils of the other.
Чувствительный элемент с электродом-свидетелем , подключенным к катодуSensing element with a witness electrode connected to the cathode
ванны, помещен в электролит вместе с детал ми обрабатываемой партии, а чувствительный элемент с эталоном находитс в воздушной среде Ij.The bath is placed in the electrolyte together with the parts of the batch being processed, and the sensor element with the standard is in the air medium Ij.
Недостаток устройства в том, что на электроде-свидетеле в процессе работы накапливаютс хаотично расположенные пузырьки газов (Н2 и другие, как результат вторичных химических реакций), которые мешают равномерному наращи10 ванию покрыти . Другим недостатком вл етс то, что точность измерени снижаетс из-оа работы чувствительных элементов в различных средах, так как электролит и воздух имеют различную The drawback of the device is that randomly located gas bubbles (H2 and others, as a result of secondary chemical reactions) that interfere with the uniform growth of the coating accumulate on the witness electrode. Another disadvantage is that the measurement accuracy decreases due to the operation of sensitive elements in different environments, since the electrolyte and air have different
«5 электропроводность и температуру."5 electrical conductivity and temperature.
Цель изобретени - повышение точности контрол путем размещени чувствительных элементов в одной среде и The purpose of the invention is to improve the accuracy of control by placing sensitive elements in the same medium and
20 удалени пузырьков водорода с электрода ..;видетел .20 removal of hydrogen bubbles from the electrode ..;
Claims (1)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
SU792736362A SU789639A1 (en) | 1979-03-11 | 1979-03-11 | Device for continuous control of galvanic plating thickness |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
SU792736362A SU789639A1 (en) | 1979-03-11 | 1979-03-11 | Device for continuous control of galvanic plating thickness |
Publications (1)
Publication Number | Publication Date |
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SU789639A1 true SU789639A1 (en) | 1980-12-23 |
Family
ID=20815080
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
SU792736362A SU789639A1 (en) | 1979-03-11 | 1979-03-11 | Device for continuous control of galvanic plating thickness |
Country Status (1)
Country | Link |
---|---|
SU (1) | SU789639A1 (en) |
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1979
- 1979-03-11 SU SU792736362A patent/SU789639A1/en active
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