SU738456A1 - METHOD OF OBTAINING AN IMAGE ON A POLYMERIC SUBSTRATE, MOSTLY ON POLYMETHYLMETHACRYLATE - Google Patents

METHOD OF OBTAINING AN IMAGE ON A POLYMERIC SUBSTRATE, MOSTLY ON POLYMETHYLMETHACRYLATE

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Publication number
SU738456A1
SU738456A1 SU2597057/21A SU2597057A SU738456A1 SU 738456 A1 SU738456 A1 SU 738456A1 SU 2597057/21 A SU2597057/21 A SU 2597057/21A SU 2597057 A SU2597057 A SU 2597057A SU 738456 A1 SU738456 A1 SU 738456A1
Authority
SU
USSR - Soviet Union
Prior art keywords
substrate
polymethylmethacrylate
obtaining
image
protective mask
Prior art date
Application number
SU2597057/21A
Other languages
Russian (ru)
Inventor
М.А. Пашков
Ю.И. Немтинов
В.Н. Куликов
Original Assignee
М.А. Пашков
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by М.А. Пашков filed Critical М.А. Пашков
Priority to SU2597057/21A priority Critical patent/SU738456A1/en
Application granted granted Critical
Publication of SU738456A1 publication Critical patent/SU738456A1/en

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Abstract

Способ получения изображения на полимерной подложке, преимущественно на полиметилметакрилате, включающий нанесение на поверхность подложки светочувствительного материала, формирование защитной маски, окрашивание пробельных участков поверхности подложки в растворе органического красителя, удаление защитной маски, отличающийся тем, что, с целью повышения качества изображения, перед нанесением светочувствительного материала на поверхность подложки последовательно наносят слой токопроводящей эмали и гальванический слой меди, а после формирования защитной маски проводят избирательное удаление нанесенных слоев.A method of obtaining an image on a polymer substrate, mainly on polymethylmethacrylate, comprising applying a photosensitive material to the surface of the substrate, forming a protective mask, painting the blank areas of the substrate surface in an organic dye solution, removing the protective mask, before photosensitive material on the surface of the substrate is consistently applied a layer of conductive enamel and a galvanic layer of copper, and e of the formation of a protective mask carry out selective removal of the applied layers.

SU2597057/21A 1978-03-24 1978-03-24 METHOD OF OBTAINING AN IMAGE ON A POLYMERIC SUBSTRATE, MOSTLY ON POLYMETHYLMETHACRYLATE SU738456A1 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
SU2597057/21A SU738456A1 (en) 1978-03-24 1978-03-24 METHOD OF OBTAINING AN IMAGE ON A POLYMERIC SUBSTRATE, MOSTLY ON POLYMETHYLMETHACRYLATE

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
SU2597057/21A SU738456A1 (en) 1978-03-24 1978-03-24 METHOD OF OBTAINING AN IMAGE ON A POLYMERIC SUBSTRATE, MOSTLY ON POLYMETHYLMETHACRYLATE

Publications (1)

Publication Number Publication Date
SU738456A1 true SU738456A1 (en) 1999-06-20

Family

ID=60521282

Family Applications (1)

Application Number Title Priority Date Filing Date
SU2597057/21A SU738456A1 (en) 1978-03-24 1978-03-24 METHOD OF OBTAINING AN IMAGE ON A POLYMERIC SUBSTRATE, MOSTLY ON POLYMETHYLMETHACRYLATE

Country Status (1)

Country Link
SU (1) SU738456A1 (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
RU2478226C1 (en) * 2011-09-06 2013-03-27 Марк Аврамович Брук Method of forming masking image in positive electron resists

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
RU2478226C1 (en) * 2011-09-06 2013-03-27 Марк Аврамович Брук Method of forming masking image in positive electron resists

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